TW376535B - Mask for recycling and fabrication method thereof - Google Patents

Mask for recycling and fabrication method thereof

Info

Publication number
TW376535B
TW376535B TW087106993A TW87106993A TW376535B TW 376535 B TW376535 B TW 376535B TW 087106993 A TW087106993 A TW 087106993A TW 87106993 A TW87106993 A TW 87106993A TW 376535 B TW376535 B TW 376535B
Authority
TW
Taiwan
Prior art keywords
mask
thin film
recycling
frame
fabrication method
Prior art date
Application number
TW087106993A
Other languages
English (en)
Inventor
Seung-Seok Yoo
Original Assignee
Magnachip Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Magnachip Semiconductor Ltd filed Critical Magnachip Semiconductor Ltd
Application granted granted Critical
Publication of TW376535B publication Critical patent/TW376535B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW087106993A 1997-12-17 1998-05-06 Mask for recycling and fabrication method thereof TW376535B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019970070071A KR100253381B1 (ko) 1997-12-17 1997-12-17 재활용 마스크 및 그 제조방법과 재활용방법

Publications (1)

Publication Number Publication Date
TW376535B true TW376535B (en) 1999-12-11

Family

ID=19527727

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087106993A TW376535B (en) 1997-12-17 1998-05-06 Mask for recycling and fabrication method thereof

Country Status (3)

Country Link
US (1) US6340541B1 (zh)
KR (1) KR100253381B1 (zh)
TW (1) TW376535B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001133960A (ja) * 1999-11-08 2001-05-18 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル及びペリクルの使用方法
US6791661B2 (en) * 1999-12-09 2004-09-14 Nikon Corporation Gas replacement method and apparatus, and exposure method and apparatus
EP1160624B1 (en) * 2000-06-01 2006-04-26 Asahi Glass Company Ltd. Pellicle and method of using the same
US7068347B2 (en) * 2002-12-20 2006-06-27 Intel Corporation Apparatus for reducing pellicle darkening
US20060083997A1 (en) * 2003-10-15 2006-04-20 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask with wavelength reduction material and pellicle
JP5984187B2 (ja) * 2013-04-22 2016-09-06 信越化学工業株式会社 ペリクルとフォトマスクのアセンブリ

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5397665A (en) * 1990-04-27 1995-03-14 Dai Nippon Printing Co., Ltd. Photomask with pellicle and method of treating and storing the same
US5240796A (en) * 1991-07-09 1993-08-31 Micron Technology, Inc. Method of fabricating a chromeless phase shift reticle
JPH05323582A (ja) * 1992-05-15 1993-12-07 Mitsubishi Electric Corp 露光装置およびこの露光装置を用いた露光方法
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
JPH07159974A (ja) 1993-12-09 1995-06-23 Ryoden Semiconductor Syst Eng Kk パターン転写マスクおよびその製造方法
US5453816A (en) * 1994-09-22 1995-09-26 Micro Lithography, Inc. Protective mask for pellicle
US5958631A (en) * 1998-02-17 1999-09-28 International Business Machines Corporation X-ray mask structure

Also Published As

Publication number Publication date
KR100253381B1 (ko) 2000-06-01
KR19990050880A (ko) 1999-07-05
US6340541B1 (en) 2002-01-22

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