TW373291B - Semiconductor device having isolation trenches - Google Patents
Semiconductor device having isolation trenchesInfo
- Publication number
- TW373291B TW373291B TW087105221A TW87105221A TW373291B TW 373291 B TW373291 B TW 373291B TW 087105221 A TW087105221 A TW 087105221A TW 87105221 A TW87105221 A TW 87105221A TW 373291 B TW373291 B TW 373291B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor device
- isolation trenches
- trenches
- channel stopper
- diffused layer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76224—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using trench refilling with dielectric materials
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9085082A JPH10284589A (ja) | 1997-04-03 | 1997-04-03 | 半導体装置及びその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW373291B true TW373291B (en) | 1999-11-01 |
Family
ID=13848695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087105221A TW373291B (en) | 1997-04-03 | 1998-04-01 | Semiconductor device having isolation trenches |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH10284589A (zh) |
KR (1) | KR100279102B1 (zh) |
TW (1) | TW373291B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100511679B1 (ko) * | 2003-06-27 | 2005-09-01 | 주식회사 하이닉스반도체 | 반도체 소자의 소자분리막 형성방법 |
US8698244B2 (en) * | 2009-11-30 | 2014-04-15 | International Business Machines Corporation | Silicon-on-insulator (SOI) structure configured for reduced harmonics, design structure and method |
US8471340B2 (en) | 2009-11-30 | 2013-06-25 | International Business Machines Corporation | Silicon-on-insulator (SOI) structure configured for reduced harmonics and method of forming the structure |
-
1997
- 1997-04-03 JP JP9085082A patent/JPH10284589A/ja active Pending
-
1998
- 1998-04-01 TW TW087105221A patent/TW373291B/zh not_active IP Right Cessation
- 1998-04-02 KR KR1019980011595A patent/KR100279102B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100279102B1 (ko) | 2001-01-15 |
JPH10284589A (ja) | 1998-10-23 |
KR19980081013A (ko) | 1998-11-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |