TW369682B - Chip retainer of polishing head for chemical mechanical polishing machine set - Google Patents

Chip retainer of polishing head for chemical mechanical polishing machine set

Info

Publication number
TW369682B
TW369682B TW086118024A TW86118024A TW369682B TW 369682 B TW369682 B TW 369682B TW 086118024 A TW086118024 A TW 086118024A TW 86118024 A TW86118024 A TW 86118024A TW 369682 B TW369682 B TW 369682B
Authority
TW
Taiwan
Prior art keywords
polishing
chip retainer
chemical mechanical
machine set
retainer ring
Prior art date
Application number
TW086118024A
Other languages
Chinese (zh)
Inventor
Chin-Kun Lin
Chien-Hsin Lai
Peng-Yih Peng
Hau-Guang Chiou
Kuen-Lin Wu
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW086118024A priority Critical patent/TW369682B/en
Priority to US09/059,750 priority patent/US6062963A/en
Priority to DE19839086A priority patent/DE19839086B4/en
Priority to FR9810824A priority patent/FR2767735B1/en
Priority to JP10246219A priority patent/JP3067741B2/en
Priority to GB9920572A priority patent/GB2344302B/en
Priority to GB9920573A priority patent/GB2344303B/en
Priority to GB9820209A priority patent/GB2342605B/en
Priority to GB9920574A priority patent/GB2345257B/en
Priority to US09/157,041 priority patent/US6241582B1/en
Priority to NL1010252A priority patent/NL1010252C2/en
Application granted granted Critical
Publication of TW369682B publication Critical patent/TW369682B/en
Priority to US09/425,130 priority patent/US6183350B1/en
Priority to US09/425,454 priority patent/US6234876B1/en
Priority to US09/426,937 priority patent/US6293850B1/en
Priority to FR0011872A priority patent/FR2797603B1/en

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A kind of chip retainer ring of polishing head for chemical mechanical polishing machine set, comprising: polishing table, polishing pad, polishing head, and chip retainer ring, wherein polishing pad is installed on polishing table, polishing head is located on polishing pad, and chip retainer ring is located on the polishing head, for the improvement of chip retainer ring, a plurality of pipe holes are designed to form the chip retainer ring, wherein the direction of pipe holes is in the centrifugal direction, with a structure of gradual expansion from outer toward inner.
TW086118024A 1997-09-01 1997-12-01 Chip retainer of polishing head for chemical mechanical polishing machine set TW369682B (en)

Priority Applications (15)

Application Number Priority Date Filing Date Title
TW086118024A TW369682B (en) 1997-12-01 1997-12-01 Chip retainer of polishing head for chemical mechanical polishing machine set
US09/059,750 US6062963A (en) 1997-12-01 1998-04-14 Retainer ring design for polishing head of chemical-mechanical polishing machine
DE19839086A DE19839086B4 (en) 1997-09-01 1998-08-27 Retaining ring for a chemical mechanical polishing apparatus and chemical mechanical polishing apparatus therewith
FR9810824A FR2767735B1 (en) 1997-09-01 1998-08-28 CHEMICAL MECHANICAL POLISHING MACHINE AND METHOD AND RETAINING SLEEVE USED IN THIS MACHINE
JP10246219A JP3067741B2 (en) 1997-09-01 1998-08-31 Chemical mechanical polishing machine and manufacturing method using the polishing machine
GB9920573A GB2344303B (en) 1997-09-01 1998-09-16 Chemical-mechanical polishing machine and retainer ring thereof
GB9920572A GB2344302B (en) 1997-09-01 1998-09-16 Chemical-mechanical polishing machine and retainer ring thereof
GB9820209A GB2342605B (en) 1997-09-01 1998-09-16 Chemical-mechanical polishing machine and retainer ring thereof
GB9920574A GB2345257B (en) 1997-09-01 1998-09-16 Chemical-mechanical polishing method and fabricating method
US09/157,041 US6241582B1 (en) 1997-09-01 1998-09-18 Chemical mechanical polish machines and fabrication process using the same
NL1010252A NL1010252C2 (en) 1997-09-01 1998-10-05 Retaining ring for use in a chemical mechanical polishing machine and manufacturing process using it.
US09/425,130 US6183350B1 (en) 1997-09-01 1999-10-22 Chemical-mechanical polish machines and fabrication process using the same
US09/425,454 US6234876B1 (en) 1997-09-01 1999-10-22 Chemical-mechanical polish machines and fabrication process using the same
US09/426,937 US6293850B1 (en) 1997-09-01 1999-10-22 Chemical-mechanical polish machines and fabrication process using the same
FR0011872A FR2797603B1 (en) 1997-09-01 2000-09-18 CHEMICAL-MECHANICAL POLISHING MACHINE AND METHOD AND RETAINING SLEEVE USED IN THIS MACHINE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086118024A TW369682B (en) 1997-12-01 1997-12-01 Chip retainer of polishing head for chemical mechanical polishing machine set

Publications (1)

Publication Number Publication Date
TW369682B true TW369682B (en) 1999-09-11

Family

ID=57941433

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086118024A TW369682B (en) 1997-09-01 1997-12-01 Chip retainer of polishing head for chemical mechanical polishing machine set

Country Status (1)

Country Link
TW (1) TW369682B (en)

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