TW366546B - Bump leveling apparatus and method thereof - Google Patents

Bump leveling apparatus and method thereof

Info

Publication number
TW366546B
TW366546B TW086118224A TW86118224A TW366546B TW 366546 B TW366546 B TW 366546B TW 086118224 A TW086118224 A TW 086118224A TW 86118224 A TW86118224 A TW 86118224A TW 366546 B TW366546 B TW 366546B
Authority
TW
Taiwan
Prior art keywords
bump
level
applied pressure
pressure required
leveling apparatus
Prior art date
Application number
TW086118224A
Other languages
English (en)
Inventor
Akihiro Yamamoto
Makoto Imanishi
Takahiro Yonezawa
Shinzo Eguchi
Osamu Nakao
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Application granted granted Critical
Publication of TW366546B publication Critical patent/TW366546B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)
TW086118224A 1996-12-05 1997-12-04 Bump leveling apparatus and method thereof TW366546B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8324479A JPH10163215A (ja) 1996-12-05 1996-12-05 バンプレベリング装置及びその方法

Publications (1)

Publication Number Publication Date
TW366546B true TW366546B (en) 1999-08-11

Family

ID=18166270

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086118224A TW366546B (en) 1996-12-05 1997-12-04 Bump leveling apparatus and method thereof

Country Status (5)

Country Link
US (1) US5899140A (zh)
JP (1) JPH10163215A (zh)
KR (1) KR100516617B1 (zh)
SG (1) SG74033A1 (zh)
TW (1) TW366546B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133672A (ja) 1998-10-28 2000-05-12 Seiko Epson Corp 半導体装置及びその製造方法、回路基板並びに電子機器
JP2000164630A (ja) * 1998-11-26 2000-06-16 Matsushita Electric Ind Co Ltd 電子部品の実装方法及び電子部品実装基板
JP4371497B2 (ja) * 1999-10-19 2009-11-25 パナソニック株式会社 バンプボンディング用加熱装置
US6590404B2 (en) 2001-07-05 2003-07-08 International Business Machines Corp. Force and centrality measuring tool
JP2005286166A (ja) * 2004-03-30 2005-10-13 Nec Electronics Corp コイニング装置およびコイニング方法
JP4918351B2 (ja) * 2006-12-28 2012-04-18 日本電産リード株式会社 基板処理装置
JP5735085B2 (ja) * 2012-12-04 2015-06-17 キヤノンマシナリー株式会社 プレス装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4784058A (en) * 1986-08-13 1988-11-15 Kabushiki Kaisha Kobe Seiko Sho Press control for maintaining a level position and a uniform pressure on a workpiece

Also Published As

Publication number Publication date
KR19980063802A (ko) 1998-10-07
JPH10163215A (ja) 1998-06-19
US5899140A (en) 1999-05-04
SG74033A1 (en) 2000-07-18
KR100516617B1 (ko) 2005-12-14

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