TW365066B - Memory cell having a polymer capacitor and method for its production - Google Patents
Memory cell having a polymer capacitor and method for its productionInfo
- Publication number
- TW365066B TW365066B TW086113016A TW86113016A TW365066B TW 365066 B TW365066 B TW 365066B TW 086113016 A TW086113016 A TW 086113016A TW 86113016 A TW86113016 A TW 86113016A TW 365066 B TW365066 B TW 365066B
- Authority
- TW
- Taiwan
- Prior art keywords
- memory cell
- production
- polymer capacitor
- polymer
- selection transistor
- Prior art date
Links
- 239000003990 capacitor Substances 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 title abstract 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19640239A DE19640239A1 (de) | 1996-09-30 | 1996-09-30 | Speicherzelle mit Polymerkondensator |
Publications (1)
Publication Number | Publication Date |
---|---|
TW365066B true TW365066B (en) | 1999-07-21 |
Family
ID=7807399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086113016A TW365066B (en) | 1996-09-30 | 1997-09-09 | Memory cell having a polymer capacitor and method for its production |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE19640239A1 (zh) |
TW (1) | TW365066B (zh) |
WO (1) | WO1998014989A1 (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NO20005980L (no) | 2000-11-27 | 2002-05-28 | Thin Film Electronics Ab | Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling |
WO2002091384A1 (en) * | 2001-05-07 | 2002-11-14 | Advanced Micro Devices, Inc. | A memory device with a self-assembled polymer film and method of making the same |
AU2002340795A1 (en) | 2001-05-07 | 2002-11-18 | Advanced Micro Devices, Inc. | Reversible field-programmable electric interconnects |
JP4514016B2 (ja) | 2001-05-07 | 2010-07-28 | アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド | 複合分子材料を使用したフローティングゲートメモリデバイス |
EP1388179A1 (en) | 2001-05-07 | 2004-02-11 | Advanced Micro Devices, Inc. | Switching element having memory effect |
WO2002091385A1 (en) | 2001-05-07 | 2002-11-14 | Advanced Micro Devices, Inc. | Molecular memory cell |
AU2002340793A1 (en) | 2001-05-07 | 2002-11-18 | Coatue Corporation | Molecular memory device |
US6858481B2 (en) | 2001-08-13 | 2005-02-22 | Advanced Micro Devices, Inc. | Memory device with active and passive layers |
KR100860134B1 (ko) | 2001-08-13 | 2008-09-25 | 어드밴스드 마이크로 디바이시즈, 인코포레이티드 | 메모리 셀 |
US6838720B2 (en) | 2001-08-13 | 2005-01-04 | Advanced Micro Devices, Inc. | Memory device with active passive layers |
US6768157B2 (en) | 2001-08-13 | 2004-07-27 | Advanced Micro Devices, Inc. | Memory device |
US6806526B2 (en) | 2001-08-13 | 2004-10-19 | Advanced Micro Devices, Inc. | Memory device |
DE10156470B4 (de) | 2001-11-16 | 2006-06-08 | Infineon Technologies Ag | RF-ID-Etikett mit einer Halbleiteranordnung mit Transistoren auf Basis organischer Halbleiter und nichtflüchtiger Schreib-Lese-Speicherzellen |
DE10200475A1 (de) * | 2002-01-09 | 2003-07-24 | Samsung Sdi Co | Nichtflüchtiges Speicherelement und Anzeigematrizen daraus |
US7012276B2 (en) | 2002-09-17 | 2006-03-14 | Advanced Micro Devices, Inc. | Organic thin film Zener diodes |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60113474A (ja) * | 1983-11-25 | 1985-06-19 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置及びその製造方法 |
DE3602887A1 (de) * | 1986-01-31 | 1987-08-06 | Bayer Ag | Nichtfluechtiger elektronischer speicher |
US5423285A (en) * | 1991-02-25 | 1995-06-13 | Olympus Optical Co., Ltd. | Process for fabricating materials for ferroelectric, high dielectric constant, and integrated circuit applications |
US5356500A (en) * | 1992-03-20 | 1994-10-18 | Rutgers, The State University Of New Jersey | Piezoelectric laminate films and processes for their manufacture |
-
1996
- 1996-09-30 DE DE19640239A patent/DE19640239A1/de not_active Withdrawn
-
1997
- 1997-08-07 WO PCT/DE1997/001666 patent/WO1998014989A1/de active Application Filing
- 1997-09-09 TW TW086113016A patent/TW365066B/zh active
Also Published As
Publication number | Publication date |
---|---|
WO1998014989A1 (de) | 1998-04-09 |
DE19640239A1 (de) | 1998-04-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW365066B (en) | Memory cell having a polymer capacitor and method for its production | |
EP0767464A3 (en) | Ferroelectric memory and method of reading out data from the ferroelectric memory | |
TW281762B (en) | Ferroelectric memory using reference charge circuit | |
AU3889395A (en) | Split-polysilicon cmos process for multi-megabit dynamic memories with stacked capacitor cells | |
EP0717413A3 (en) | Memory cell and wordline driver for embedded dram in ASIC process | |
MY104092A (en) | Complementary metal-oxide-semiconductor transistor and one-capacitor dynamic-random-access memory cell and fabrication process therefor. | |
GB2363663B (en) | Dynamic content addressable memory cell | |
TW200501402A (en) | Memory core and accessing method thereof | |
KR970707589A (ko) | 스택 커패시터 dram 내에 비트선 접촉부의 형성 방법(method of forming bit line contacts in stacked capacitor drams) | |
EP1024498A3 (en) | Semiconductor memory device and method of operation | |
TW277133B (en) | Ferroelectric memory using ferroelectric reference cells | |
WO2002001567A3 (en) | Structure and process for 6f<2> trench capacitor dram cell with vertical mosfet and 3f bitline pitch | |
ATE222403T1 (de) | Dram-speicherzelle mit vertikalem transistor und verfahren zur herstellung derselben | |
TW363165B (en) | Multibyte operations for a flash memory | |
HK1003545A1 (en) | Method of making a dram storage cell with vertical transistor | |
TW365675B (en) | Semiconductor memory device | |
EP0359404A3 (en) | Non-volatile memory cell and sensing method | |
EP0615247A3 (en) | Ferroelectric memory cell and read and write process of its polarization state. | |
TW348316B (en) | Dynamic memory | |
TW354416B (en) | Arrangement and producing method for a memory unit | |
EP0757354A3 (en) | Ferroelectric memory device | |
TW430794B (en) | Ferroelectric memory device and method for operating thereof | |
CA2198839A1 (en) | Enhanced asic process cell | |
TW324857B (en) | Strong dielectric memory apparatus capable of decreasing array noise and power consumption | |
EP0844618A4 (en) | DATA READING METHOD FOR FERROELECTRIC MEMORY AND FERROELECTRIC MEMORY |