TW356562B - Overlay accuracy measuring method - Google Patents
Overlay accuracy measuring methodInfo
- Publication number
- TW356562B TW356562B TW086116155A TW86116155A TW356562B TW 356562 B TW356562 B TW 356562B TW 086116155 A TW086116155 A TW 086116155A TW 86116155 A TW86116155 A TW 86116155A TW 356562 B TW356562 B TW 356562B
- Authority
- TW
- Taiwan
- Prior art keywords
- overlay
- accuracy
- pattern
- measuring
- measuring method
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7019—Calibration
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1081197 | 1997-01-24 | ||
JP26152497A JP3902839B2 (ja) | 1997-01-24 | 1997-09-26 | 重ね合わせ精度測定方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW356562B true TW356562B (en) | 1999-04-21 |
Family
ID=26346149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086116155A TW356562B (en) | 1997-01-24 | 1997-10-30 | Overlay accuracy measuring method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3902839B2 (zh) |
KR (1) | KR100325088B1 (zh) |
TW (1) | TW356562B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4496565B2 (ja) * | 1999-06-04 | 2010-07-07 | 株式会社ニコン | 重ね合わせ測定装置及び該装置を用いた半導体デバイス製造方法 |
KR100349106B1 (ko) * | 1999-12-31 | 2002-08-14 | 아남반도체 주식회사 | 반도체 미세 패턴 변위 측정 방법 |
US9606453B2 (en) | 2010-09-30 | 2017-03-28 | Kla-Tencor Corporation | Method and system for providing tool induced shift using a sub-sampling scheme |
US8860941B2 (en) * | 2012-04-27 | 2014-10-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Tool induced shift reduction determination for overlay metrology |
CN102681370B (zh) * | 2012-05-09 | 2016-04-20 | 上海华虹宏力半导体制造有限公司 | 光刻套刻方法和提高ldmos器件击穿稳定性的方法 |
-
1997
- 1997-09-26 JP JP26152497A patent/JP3902839B2/ja not_active Expired - Fee Related
- 1997-10-30 TW TW086116155A patent/TW356562B/zh not_active IP Right Cessation
- 1997-11-14 KR KR1019970060083A patent/KR100325088B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR19980070093A (ko) | 1998-10-26 |
KR100325088B1 (ko) | 2002-06-29 |
JP3902839B2 (ja) | 2007-04-11 |
JPH10270354A (ja) | 1998-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |