TW353729B - Photomask pattern correction method - Google Patents

Photomask pattern correction method

Info

Publication number
TW353729B
TW353729B TW086107360A TW86107360A TW353729B TW 353729 B TW353729 B TW 353729B TW 086107360 A TW086107360 A TW 086107360A TW 86107360 A TW86107360 A TW 86107360A TW 353729 B TW353729 B TW 353729B
Authority
TW
Taiwan
Prior art keywords
pattern
correction
correction method
photomask
obtaining
Prior art date
Application number
TW086107360A
Other languages
English (en)
Inventor
San-Der Tz
Jr-Chiang Tu
Jia-Huei Lin
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW086107360A priority Critical patent/TW353729B/zh
Application granted granted Critical
Publication of TW353729B publication Critical patent/TW353729B/zh

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW086107360A 1997-05-30 1997-05-30 Photomask pattern correction method TW353729B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086107360A TW353729B (en) 1997-05-30 1997-05-30 Photomask pattern correction method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086107360A TW353729B (en) 1997-05-30 1997-05-30 Photomask pattern correction method

Publications (1)

Publication Number Publication Date
TW353729B true TW353729B (en) 1999-03-01

Family

ID=57940154

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086107360A TW353729B (en) 1997-05-30 1997-05-30 Photomask pattern correction method

Country Status (1)

Country Link
TW (1) TW353729B (zh)

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Legal Events

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