TW350933B - X-ray absorbing layer in the X-ray mask and the manufacturing method - Google Patents

X-ray absorbing layer in the X-ray mask and the manufacturing method

Info

Publication number
TW350933B
TW350933B TW086108562A TW86108562A TW350933B TW 350933 B TW350933 B TW 350933B TW 086108562 A TW086108562 A TW 086108562A TW 86108562 A TW86108562 A TW 86108562A TW 350933 B TW350933 B TW 350933B
Authority
TW
Taiwan
Prior art keywords
ray
layer
absorbing layer
manufacturing
mask
Prior art date
Application number
TW086108562A
Other languages
English (en)
Inventor
Don-Hee Lee
Chil-Keun Park
Ki-Chang Song
Young-Sam Jeon
Jeong-Soo Lee
Original Assignee
Lg Semicon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1019960056874A external-priority patent/KR19980038038A/ko
Priority claimed from KR1019970015438A external-priority patent/KR100249209B1/ko
Application filed by Lg Semicon Co Ltd filed Critical Lg Semicon Co Ltd
Application granted granted Critical
Publication of TW350933B publication Critical patent/TW350933B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW086108562A 1996-11-23 1997-06-19 X-ray absorbing layer in the X-ray mask and the manufacturing method TW350933B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019960056874A KR19980038038A (ko) 1996-11-23 1996-11-23 엑스-레이 마스크의 흡수체 및 그 제조방법
KR1019970015438A KR100249209B1 (ko) 1997-04-24 1997-04-24 엑스-레이(X-ray) 마스크의 흡수체 및 그 제조방법

Publications (1)

Publication Number Publication Date
TW350933B true TW350933B (en) 1999-01-21

Family

ID=26632290

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086108562A TW350933B (en) 1996-11-23 1997-06-19 X-ray absorbing layer in the X-ray mask and the manufacturing method

Country Status (4)

Country Link
US (1) US5928816A (zh)
JP (1) JP3002963B2 (zh)
DE (1) DE19747775C2 (zh)
TW (1) TW350933B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000330264A (ja) * 1999-05-19 2000-11-30 Nikon Corp 転写マスクブランクスの製造方法
KR101071471B1 (ko) * 2006-02-28 2011-10-10 호야 가부시키가이샤 포토마스크 블랭크 및 포토마스크와 그들의 제조 방법
US20140117509A1 (en) * 2012-10-26 2014-05-01 Infineon Technologies Ag Metal Deposition with Reduced Stress
US9034716B2 (en) 2013-01-31 2015-05-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method of making a FinFET device
US20170309490A1 (en) * 2014-09-24 2017-10-26 Hitachi Kokusai Electric Inc. Method of manufacturing semiconductor device
JP6384672B2 (ja) * 2015-03-25 2018-09-05 三菱マテリアル株式会社 窒化物熱電変換材料及びその製造方法並びに熱電変換素子

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3119682A1 (de) * 1981-05-18 1982-12-02 Philips Patentverwaltung Gmbh, 2000 Hamburg "verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels strahlungslithographie"
JPH05343299A (ja) * 1992-06-08 1993-12-24 Mitsubishi Electric Corp Ｘ線マスク及びｘ線マスクの製造方法
JPH08314116A (ja) * 1995-03-15 1996-11-29 Toshiba Corp 露光用マスク及びその製造方法

Also Published As

Publication number Publication date
JP3002963B2 (ja) 2000-01-24
DE19747775A1 (de) 1998-06-04
JPH10163105A (ja) 1998-06-19
DE19747775C2 (de) 2000-08-31
US5928816A (en) 1999-07-27

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees