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Application filed by Samsung Electronics Co LtdfiledCriticalSamsung Electronics Co Ltd
Priority to TW086105858ApriorityCriticalpatent/TW329031B/en
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Publication of TW329031BpublicationCriticalpatent/TW329031B/en
The semiconductor wafer thermal processing appatatus comprises: A process chamber forming a closed space; a susceptor in which a resistance heater mounted on the susceptor for heating the susceptor ;a lamp installed on the top of the process chamber for raising an inner temperature of the process chamber up to a temperature required in the process; a gas injector installed on one the of the process chamber; and a gas heater mounted on the gas injector for preheating a gas suppplied to the inner of the process chamber.