經濟部中央梂準局員工消費合作社印製 293076 A7 _ _B7_._ 五、發明説明（) 發明頜域： 本發明的領域係有關於晶片刷洗機（wafer scrubber) 方面的技術，特别是有關於一種將晶片刷洗機中所有 之去離子水（deionized water)所通過之輸送管路及紫外 線（ultraviolet ，UV)殺菌系統皆以非金屬之材質製 成，藉以防止去離子水遭受微金屬粒子之污染。 發明背景： 按，晶片刷洗機爲一種半導體製程設備，用以將 半導體製程中製作完成之晶片表面刷洗乾淨。第1圖顯 ’示一習知之晶片刷洗機的系統架構示意圖，其中由廠 務之一去離子水供應装置100所供應之去離子水首先 通過一紫外線殺菌裝置2QQ ，再接著輸送至一二氧化 碳（C〇2)混合裝置3 0 0中與二氧化碳混合後，再經由軟 管400輸送至噴嘴501 ， 502後，在由噴嘴501 ， 5 0 2將去離子水喷灑至一置放於一晶片刷洗台6 0 0上 之晶片C上’精此達到刷洗晶片C之目的。 然而上述之晶片刷洗機的一項缺點在於其中之紫 外線殺菌裝置2 0 0 及喷嘴5 0 1 ， 5 0 2 均係由金屬 (例如不銹鋼）製成，此使得去離子水在流通過紫外線 殺菌装置200及喷嘴501 ， 502後，會對金屬内堃 引起腐蝕作用，造成去離子水遭受微金屬粒子污染。 此遭受微金屬粒子污染之去離子水將嚴重影響到晶片 刷洗之品質。 -2 - 本紙張尺度適用中國國家揉準（CNS ) A4規格（2丨0X297公釐） (請先閲讀背面之注意事項再填寫本頁) .裝· 經濟部中央橾準局員工消费合作社印製 A7 .B7 ·五、發明説明（） 發明之目的與概述： 签於以上所述習知技術之缺點，本發明之主要目 的便是在於提供一種新穎之輸送管路，其具有一非金 屬式之内堃，可防止其所輸送之去離子水遭微金屬粒 子之污染。 根據以上所述之目的，本發明提供了一種新穎之 晶片刷洗機用之去離子水輸迭管路，其具有一非金屬 式之内壁，可防止其所輸送之遭微金屬粒子污染。此 去離子水輸迭管路之特徵在於該喷嘴之内壁上套入一 層鐵弗龍之共聚高分子化合物製成之薄膜，例如可爲 氣化乙缔-丙稀（Fluorinated Ethylene-Propylene ， FEP)。 此化合物爲一種非金屬材質，套入於不銹鋼製之噴嘴 的内壁上便可防止去離子水與不銹鋼接觸，因而可防 止去離子水遭受微金屬粒子之污染，確保晶片刷洗之 其中所輸 送之液體不欲受到微金屬粒子污杂的液體輸送管路， 其中該液體輸送管路之特徵在於其内璧套入一層鐵弗 龍之共聚高分子化合物製之薄膜。 圖示之簡單説明： 以下參佐所附圖示詳細説明本發明之實施例： (請先閲讀背面之注意事項再填寫本頁) •裝. 訂Printed 293076 A7 _ _B7 _._ by the Employee Consumer Cooperative of the Central Bureau of Economic Affairs of the Ministry of Economy V. Description of the invention () Invention field: The field of the invention is related to the technology of wafer scrubber, especially about a kind of wafer scrubber The transmission pipeline and ultraviolet (UV) sterilization system through which all the deionized water in the wafer scrubbing machine passes are made of non-metallic materials to prevent the deionized water from being polluted by micro metal particles. Background of the Invention: The wafer scrubbing machine is a semiconductor process equipment, which is used to clean the surface of the wafer produced in the semiconductor process. Figure 1 shows a schematic diagram of the system architecture of a conventional wafer scrubbing machine, in which the deionized water supplied by a deionized water supply device 100 of a factory service first passes through an ultraviolet sterilization device 2QQ, and then is delivered to a carbon dioxide ( C〇2) After mixing with carbon dioxide in the mixing device 300, and then conveyed to the nozzle 501, 502 through the hose 400, after the nozzle 501, 502 spray deionized water to a place placed on a wafer brush The wafer C on the platform 600 can precisely clean the wafer C. However, a disadvantage of the above wafer scrubber is that the ultraviolet sterilization device 200 and the nozzles 50 1 and 5 0 2 are made of metal (such as stainless steel), which makes deionized water flow through the ultraviolet sterilization device. After 200 and the nozzles 501 and 502, it will cause corrosion to the metal inner knots, causing the deionized water to be contaminated with micro metal particles. The deionized water contaminated with micro metal particles will seriously affect the quality of wafer cleaning. -2-This paper standard applies to China National Standard (CNS) A4 (2 丨 0X297mm) (please read the precautions on the back and then fill in this page). Installed by the Ministry of Economic Affairs Central Counseling Bureau Staff Consumer Cooperative Printed A7 .B7 · Fifth, the description of the invention () The purpose and summary of the invention: Signed the shortcomings of the above-mentioned conventional technology, the main purpose of the present invention is to provide a novel delivery pipeline, which has a non-metallic type Naikun can prevent the deionized water it is transported from being contaminated by micro metal particles. According to the above-mentioned object, the present invention provides a novel deionized water delivery pipeline for a wafer scrubber, which has a non-metallic inner wall, which can prevent the micro metal particles from being contaminated by the conveyed. The feature of this deionized water transmission pipeline is that the inner wall of the nozzle is covered with a film made of Teflon's copolymer polymer compound, such as Fluorinated Ethylene-Propylene (FEP) . This compound is a non-metallic material, which is fitted on the inner wall of the nozzle made of stainless steel to prevent the deionized water from contacting the stainless steel, thus preventing the deionized water from being contaminated by micro metal particles and ensuring the liquid transported by the wafer cleaning A liquid delivery pipe that does not want to be contaminated by micro metal particles, wherein the liquid delivery pipe is characterized in that its inner wall is sheathed with a film made of Teflon's copolymer polymer compound. A brief description of the illustrations: The following attached drawings illustrate the embodiments of the present invention in detail: (Please read the precautions on the back before filling this page) • Install. Order
本紙張尺度適用中國國家標準（CNS ) A4规格（210X297公釐） 203076 A7 經濟部中央標準局員工消费合作社印製 B7五、發明説明（) 第1圖顯示一習知之晶片刷洗機的系統架構示意圖； 且 第2圖顯示根據本發明所設計之一具有非金屬内壁之不 銹鋼製之噴嘴。 發明之詳細説明： 於以下所揭露之本發明的實施例係應用於防止一 晶片刷洗機中之去離子水遭微金屬粒子之污染。但首 先須注意此1實施例並非用以限定本發明之應用範圍。 廣義而言，本發明可應用於任何一種其中所輪送之液 體不欲受到微金屬粒子污染的液體輸送管路。 請參閲第2圖，本發明係在不銹鋼製之噴嘴5 0 1的 内璧套入一層用鐵弗龍（TEFLOM)之共聚高分子化合物所 製成之薄膜7〇〇。此鐵弗龍之共聚高分子化合物可爲 •氣化乙稀-丙稀（F1 u 〇 r i na t ed E t hy i e n e - P r 〇 p y 1 en e，FEP)。此 化合物爲一種非金屬材質，套入於不鎮鋼製之喷嘴的 内壁上便可防止去離子水與不銹鋼接觸。 同理，不銹鋼製之紫外線殺菌装置2 0 0的内堃上 亦可貼置一層FEP製之薄膜，藉以防止去離子水在紫外 線殺菌装置2 0 0中遭受微金屬粒子之污染。 由以上可知本發明之輸送管路可防止去離子水遭 受微金屬粒子之污染，因此可確保晶片刷洗之品質。 以上所述僅爲本發明之較佳實施例而已並非用以 限定本發明之範圍，凡其它未脱離.本發明所揭示之精 (請先閲讀背面之注意事項再填寫本頁) -4 - 本紙張尺度適用中國國家揉準（CNS ) A4規格（210X297公釐） 五、發明説明（ A7 B7 利 專之述 下在 含 包 應均飾 修 或 變 改效 等之成 完 · 所内 下圍 神範 (請先閲讀背面之注意事項再填寫本頁) 裝· 訂 經濟部中央橾準局員工消費合作社印製 本紙張尺度適用中國國家橾準（CNS ) A4規格（210X 297公釐）This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 203076 A7 Printed by the Consumer Standardization Bureau of the Central Standards Bureau of the Ministry of Economic Affairs B7 V. Invention description () Figure 1 shows a schematic diagram of the system architecture of a conventional wafer scrubber ; And Figure 2 shows a stainless steel nozzle with a non-metallic inner wall designed according to the present invention. Detailed Description of the Invention: The embodiments of the present invention disclosed below are applied to prevent the deionized water in a wafer scrubber from being contaminated by micro metal particles. But first, it should be noted that this embodiment is not intended to limit the scope of application of the present invention. Broadly speaking, the present invention can be applied to any kind of liquid conveying pipeline in which the liquid being rotated does not want to be contaminated by micro metal particles. Referring to Fig. 2, the present invention is to insert a layer of film 700 made of TEFLOM copolymer polymer into the inner wall of the nozzle 501 made of stainless steel. The Teflon copolymer polymer compound may be • gasified ethylene-propylene (F1 u 〇 r i na t ed E t hy i e n e-P r 〇 p y 1 en e, FEP). This compound is a kind of non-metallic material, which is fitted on the inner wall of the nozzle made of stainless steel to prevent the deionized water from contacting the stainless steel. In the same way, a layer of FEP film can also be placed on the inner wall of the ultraviolet sterilization device 200 made of stainless steel to prevent deionized water from being contaminated by micro metal particles in the ultraviolet sterilization device 200. From the above, it can be seen that the delivery pipeline of the present invention can prevent the deionized water from being contaminated by micro metal particles, thus ensuring the quality of wafer scrubbing. The above are only the preferred embodiments of the present invention and are not intended to limit the scope of the present invention. Anything else does not deviate. The essence disclosed by the present invention (please read the precautions on the back before filling this page) -4- This paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210X297mm). Fifth, the description of the invention (under the description of A7 B7 Li Zhuan should be completed or repaired or modified in the package, etc. Fan (please read the precautions on the back before filling in this page) Binding and ordering The paper printed by the Central Consumer Standardization Bureau of the Ministry of Economic Affairs of the People ’s Consumer Cooperative applies to the China National Standard (CNS) A4 (210X 297mm)