TW284748B - - Google Patents
Info
- Publication number
- TW284748B TW284748B TW084102811A TW84102811A TW284748B TW 284748 B TW284748 B TW 284748B TW 084102811 A TW084102811 A TW 084102811A TW 84102811 A TW84102811 A TW 84102811A TW 284748 B TW284748 B TW 284748B
- Authority
- TW
- Taiwan
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/62222—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products obtaining ceramic coatings
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- H10P14/6689—
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- H10P14/6929—
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- H10W74/43—
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- H10P14/6342—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Inorganic Insulating Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/223,297 US5436084A (en) | 1994-04-05 | 1994-04-05 | Electronic coatings using filled borosilazanes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW284748B true TW284748B (index.php) | 1996-09-01 |
Family
ID=22835900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW084102811A TW284748B (index.php) | 1994-04-05 | 1995-03-23 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5436084A (index.php) |
| EP (1) | EP0677871A3 (index.php) |
| JP (1) | JPH07323224A (index.php) |
| KR (1) | KR950032512A (index.php) |
| TW (1) | TW284748B (index.php) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5448111A (en) * | 1993-09-20 | 1995-09-05 | Fujitsu Limited | Semiconductor device and method for fabricating the same |
| US5558908A (en) * | 1994-11-07 | 1996-09-24 | Lanxide Technology Company, Lp | Protective compositions and methods of making same |
| TW353108B (en) * | 1995-06-16 | 1999-02-21 | Dow Corning | Composite electronic coatings |
| US5635240A (en) * | 1995-06-19 | 1997-06-03 | Dow Corning Corporation | Electronic coating materials using mixed polymers |
| US5711987A (en) * | 1996-10-04 | 1998-01-27 | Dow Corning Corporation | Electronic coatings |
| US5776235A (en) * | 1996-10-04 | 1998-07-07 | Dow Corning Corporation | Thick opaque ceramic coatings |
| US5730792A (en) * | 1996-10-04 | 1998-03-24 | Dow Corning Corporation | Opaque ceramic coatings |
| US5807611A (en) * | 1996-10-04 | 1998-09-15 | Dow Corning Corporation | Electronic coatings |
| US5863595A (en) * | 1996-10-04 | 1999-01-26 | Dow Corning Corporation | Thick ceramic coatings for electronic devices |
| US5855962A (en) * | 1997-01-09 | 1999-01-05 | International Business Machines Corporation | Flowable spin-on insulator |
| US6417115B1 (en) * | 1998-05-26 | 2002-07-09 | Axeclis Technologies, Inc. | Treatment of dielectric materials |
| WO2000019479A1 (en) * | 1998-09-29 | 2000-04-06 | Fujitsu Limited | Method of manufacturing plasma display and substrate structure |
| US6225238B1 (en) * | 1999-06-07 | 2001-05-01 | Allied Signal Inc | Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes |
| US6426127B1 (en) * | 1999-12-28 | 2002-07-30 | Electron Vision Corporation | Electron beam modification of perhydrosilazane spin-on glass |
| EP1495493B1 (de) * | 2002-04-15 | 2015-06-03 | Schott AG | Verwendung einer Borosilikatglasschicht |
| US7153754B2 (en) * | 2002-08-29 | 2006-12-26 | Micron Technology, Inc. | Methods for forming porous insulators from “void” creating materials and structures and semiconductor devices including same |
| JP4588304B2 (ja) * | 2003-08-12 | 2010-12-01 | Azエレクトロニックマテリアルズ株式会社 | コーティング組成物、およびそれを用いて製造した低誘電シリカ質材料 |
| US20060223937A1 (en) * | 2005-04-04 | 2006-10-05 | Herr Donald E | Radiation curable cycloaliphatic barrier sealants |
| US20070219516A1 (en) * | 2006-03-14 | 2007-09-20 | Tyco Healthcare Group Lp | X-ray detectable element for association with surgical absorbent substrates and method of making |
| EP2530128A2 (en) | 2006-12-19 | 2012-12-05 | Seiko Epson Corporation | Pigment dispersion, ink compostion, inkset, and recording device |
| EP1942157B1 (en) * | 2006-12-19 | 2011-05-11 | Seiko Epson Corporation | Inkjet recording method and recorded matter |
| JP2010168412A (ja) * | 2009-01-20 | 2010-08-05 | Seiko Epson Corp | 表面処理顔料、インク組成物、及びインクジェット記録方法 |
| JP2010168411A (ja) * | 2009-01-20 | 2010-08-05 | Seiko Epson Corp | 表面処理顔料、インク組成物、及びインクジェット記録方法 |
| DE102009000884B3 (de) | 2009-02-16 | 2010-10-07 | Semikron Elektronik Gmbh & Co. Kg | Halbleitermodul mit Gehäuse aus präkeramischem Polymer |
| DE102009000885A1 (de) * | 2009-02-16 | 2010-08-26 | Semikron Elektronik Gmbh & Co. Kg | Halbleitermodul |
| JP2010229197A (ja) * | 2009-03-26 | 2010-10-14 | Seiko Epson Corp | 耐水化アルミニウム顔料分散液の製造方法、耐水化アルミニウム顔料およびそれを含有する水性インク組成物 |
| JP2011132483A (ja) | 2009-04-07 | 2011-07-07 | Seiko Epson Corp | 耐水化アルミニウム顔料分散液およびそれを含有する水性インク組成物、ならびに耐水化アルミニウム顔料分散液の製造方法 |
| JP2011140609A (ja) * | 2009-04-07 | 2011-07-21 | Seiko Epson Corp | 耐水化アルミニウム顔料および耐水化アルミニウム顔料分散液、それらを含有する水性インク組成物、ならびに耐水化アルミニウム顔料分散液の製造方法 |
| JP2010241976A (ja) * | 2009-04-07 | 2010-10-28 | Seiko Epson Corp | 耐水化アルミニウム顔料分散液の製造方法、耐水化アルミニウム顔料およびそれを含有する水性インク組成物 |
| JP2010265422A (ja) * | 2009-05-18 | 2010-11-25 | Seiko Epson Corp | 表面処理顔料、インク組成物、及びインクジェット記録方法 |
| CN116041073B (zh) * | 2023-01-16 | 2023-11-10 | 哈尔滨工业大学 | 一种改性SiBCN陶瓷材料及其制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4482689A (en) * | 1984-03-12 | 1984-11-13 | Dow Corning Corporation | Process for the preparation of polymetallo(disily)silazane polymers and the polymers therefrom |
| JPH01221466A (ja) * | 1988-03-01 | 1989-09-04 | Toa Nenryo Kogyo Kk | コーティング用組成物及びコーティング方法 |
| FR2637602B1 (fr) * | 1988-10-06 | 1990-12-14 | Rhone Poulenc Chimie | Procede de synthese de polymeres a base de bore et d'azote precurseurs de nitrure de bore et produits susceptibles d'etre ainsi obtenus |
| US5179048A (en) * | 1988-10-24 | 1993-01-12 | Ethyl Corporation | Preceramic compositions and ceramic products |
| US4910173A (en) * | 1989-04-14 | 1990-03-20 | Ethyl Corporation | Preceramic compositions and ceramic products |
| JPH0352287A (ja) * | 1989-07-20 | 1991-03-06 | Tonen Corp | セラミック回路基板,パッケージ,その製法及び材料 |
| US5171736A (en) * | 1989-10-16 | 1992-12-15 | Massachusetts Institute Of Technology | Preceramic organosilicon-boron polymers |
| US4973526A (en) * | 1990-02-15 | 1990-11-27 | Dow Corning Corporation | Method of forming ceramic coatings and resulting articles |
| JPH03250082A (ja) * | 1990-02-27 | 1991-11-07 | Tonen Corp | 導電性接着剤 |
| US5258229A (en) * | 1990-10-15 | 1993-11-02 | Ethyl Corporation | Preceramic composition and ceramic product |
| WO1993002472A1 (fr) * | 1991-07-16 | 1993-02-04 | Catalysts & Chemicals Industries Co., Ltd. | Dispositif a semiconducteur et sa production |
| CA2084243A1 (en) * | 1991-12-20 | 1993-06-21 | Daniel R. Petrak | Ceramic matrix composites and method for making same |
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1994
- 1994-04-05 US US08/223,297 patent/US5436084A/en not_active Expired - Fee Related
-
1995
- 1995-03-23 TW TW084102811A patent/TW284748B/zh active
- 1995-03-27 EP EP95302023A patent/EP0677871A3/en not_active Withdrawn
- 1995-03-30 KR KR1019950006963A patent/KR950032512A/ko not_active Ceased
- 1995-03-31 JP JP7076265A patent/JPH07323224A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| EP0677871A3 (en) | 1997-05-14 |
| US5436084A (en) | 1995-07-25 |
| JPH07323224A (ja) | 1995-12-12 |
| EP0677871A2 (en) | 1995-10-18 |
| KR950032512A (ko) | 1995-12-22 |