TW268014B - - Google Patents

Info

Publication number
TW268014B
TW268014B TW081108814A TW81108814A TW268014B TW 268014 B TW268014 B TW 268014B TW 081108814 A TW081108814 A TW 081108814A TW 81108814 A TW81108814 A TW 81108814A TW 268014 B TW268014 B TW 268014B
Authority
TW
Taiwan
Application number
TW081108814A
Original Assignee
Hercules Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules Inc filed Critical Hercules Inc
Application granted granted Critical
Publication of TW268014B publication Critical patent/TW268014B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
TW081108814A 1991-11-01 1992-11-04 TW268014B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US78663291A 1991-11-01 1991-11-01

Publications (1)

Publication Number Publication Date
TW268014B true TW268014B (zh) 1996-01-11

Family

ID=25139163

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081108814A TW268014B (zh) 1991-11-01 1992-11-04

Country Status (6)

Country Link
US (1) US5601965A (zh)
EP (1) EP0540050B1 (zh)
JP (1) JPH06110208A (zh)
CA (1) CA2081965A1 (zh)
DE (1) DE69221072T2 (zh)
TW (1) TW268014B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0260746A1 (en) * 1986-09-17 1988-03-23 Koninklijke Philips Electronics N.V. Method of manufacturing flakes from a magnetic material having a preferred crystallite orientation, flakes and magnets manufactured therefrom
US20090191491A1 (en) * 2008-01-28 2009-07-30 John Ganjei Method of Creating an Image in a Photoresist Laminate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2309613A1 (de) * 1973-02-27 1974-09-05 Agfa Gevaert Ag Lichtempfindliches material und verfahren zur herstellung von reliefdruckformen
US3943103A (en) * 1974-04-09 1976-03-09 Union Carbide Corporation Radiation curable compositions of vinyl acetate polymers
US3984244A (en) * 1974-11-27 1976-10-05 E. I. Du Pont De Nemours And Company Process for laminating a channeled photosensitive layer on an irregular surface
US3996394A (en) * 1975-03-24 1976-12-07 Union Carbide Corporation Method of improving adhesion to plastic substrates
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
US4371566A (en) * 1980-09-10 1983-02-01 Panelgraphic Corporation Abrasion resistant coating composition
JPS5997140A (ja) * 1982-11-26 1984-06-04 Fuji Photo Film Co Ltd カラ−プル−フイングシ−トの製法
US4686171A (en) * 1986-02-14 1987-08-11 Hercules Incorporated Photopolymerizable films containing plasticizer silica combinations
US5124234A (en) * 1989-01-20 1992-06-23 Fuji Photo Film Co., Ltd. Liquid light-sensitive resin composition

Also Published As

Publication number Publication date
EP0540050A1 (en) 1993-05-05
DE69221072T2 (de) 1997-11-13
EP0540050B1 (en) 1997-07-23
CA2081965A1 (en) 1993-05-02
US5601965A (en) 1997-02-11
JPH06110208A (ja) 1994-04-22
DE69221072D1 (de) 1997-09-04

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