TW254860B - - Google Patents

Info

Publication number
TW254860B
TW254860B TW081109782A TW81109782A TW254860B TW 254860 B TW254860 B TW 254860B TW 081109782 A TW081109782 A TW 081109782A TW 81109782 A TW81109782 A TW 81109782A TW 254860 B TW254860 B TW 254860B
Authority
TW
Taiwan
Application number
TW081109782A
Other languages
Chinese (zh)
Original Assignee
Nippon Pionex Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Pionex Kk filed Critical Nippon Pionex Kk
Application granted granted Critical
Publication of TW254860B publication Critical patent/TW254860B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treating Waste Gases (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Separation Of Gases By Adsorption (AREA)
  • Gas Separation By Absorption (AREA)
TW081109782A 1991-12-11 1992-12-07 TW254860B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32757691 1991-12-11
JP04169104A JP3073321B2 (en) 1991-12-11 1992-06-26 How to purify harmful gases

Publications (1)

Publication Number Publication Date
TW254860B true TW254860B (en) 1995-08-21

Family

ID=18200604

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081109782A TW254860B (en) 1991-12-11 1992-12-07

Country Status (3)

Country Link
JP (1) JP3073321B2 (en)
KR (1) KR0126123B1 (en)
TW (1) TW254860B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3781871B2 (en) * 1997-07-22 2006-05-31 ズードケミー触媒株式会社 Chloride absorber
FR2776536B1 (en) * 1998-03-31 2000-04-28 Rhodia Chimie Sa PROCESS FOR THE ELIMINATION OF HALOGEN COMPOUNDS CONTAINED IN A GAS OR A LIQUID WITH A COMPOSITION BASED ON AT LEAST ONE METAL ELEMENT
JP4276333B2 (en) * 1998-09-22 2009-06-10 日本パイオニクス株式会社 Exhaust gas purification method
TW581708B (en) 1998-09-22 2004-04-01 Japan Pionics Cleaning agent and cleaning method for halogen-containing exhaust gas
KR100520450B1 (en) * 1999-06-08 2005-10-12 주식회사 코캣 Cleaning agent of waste gas containing halogen compounds from semiconductor etching process and cleaning method using the same
KR20020025466A (en) * 2000-09-29 2002-04-04 조승훈 Dechlorination device
JP4711550B2 (en) * 2001-07-04 2011-06-29 サンワケミカル株式会社 How to remove halogen gas
JP5008801B2 (en) * 2001-04-23 2012-08-22 サンワケミカル株式会社 Halogen gas removal method
JP4620897B2 (en) * 2001-04-23 2011-01-26 サンワケミカル株式会社 Halogen gas removal method
KR20010025405A (en) * 2000-12-15 2001-04-06 조창균 Chlorine gas neutralization device using air.
WO2009125457A1 (en) * 2008-04-11 2009-10-15 カンケンテクノ株式会社 Process for treatment of exhaust gas containing both silane gas and fluorine gas and exhasut gas treatment facility for the process
JP5639757B2 (en) * 2009-12-10 2014-12-10 中部電力株式会社 Gas processing method
JP2011062697A (en) * 2010-11-26 2011-03-31 Sanwa Chemical Kk Method for removing halogen gas
CN109012092A (en) * 2018-08-09 2018-12-18 全椒南大光电材料有限公司 A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method
KR102256134B1 (en) * 2019-12-05 2021-05-25 상우기업(주) Highly concentrated liquid eliminator for removing harmful gases

Also Published As

Publication number Publication date
JP3073321B2 (en) 2000-08-07
JPH05237324A (en) 1993-09-17
KR930012082A (en) 1993-07-20
KR0126123B1 (en) 1997-12-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees