CN109012092A - A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method - Google Patents
A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method Download PDFInfo
- Publication number
- CN109012092A CN109012092A CN201810903024.6A CN201810903024A CN109012092A CN 109012092 A CN109012092 A CN 109012092A CN 201810903024 A CN201810903024 A CN 201810903024A CN 109012092 A CN109012092 A CN 109012092A
- Authority
- CN
- China
- Prior art keywords
- chlorine trifluoride
- high concentration
- exhaust gas
- gas
- vacuum generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/685—Halogens or halogen compounds by treating the gases with solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/30—Alkali metal compounds
- B01D2251/304—Alkali metal compounds of sodium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/30—Alkali metal compounds
- B01D2251/306—Alkali metal compounds of potassium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/40—Alkaline earth metal or magnesium compounds
- B01D2251/404—Alkaline earth metal or magnesium compounds of calcium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/60—Inorganic bases or salts
- B01D2251/604—Hydroxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/20—Halogens or halogen compounds
- B01D2257/204—Inorganic halogen compounds
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses a kind of high concentration chlorine trifluoride exhaust gas processing devices, including sequentially connected dilution system, dry treatment system and spray system, dilution system includes venturi vacuum generator and source nitrogen, venturi vacuum generator is equipped with adsorbent chamber entrance and compressed gas entrance, adsorbent chamber entrance is connect with tail gas gas source, and is equipped with one way stop peturn valve between the two；Compressed gas entrance is connect with source nitrogen；Dry treatment system includes pretreatment unit and primary processing unit, the inlet end of pretreatment unit is connect with the outlet side of the venturi vacuum generator, the inlet end of primary processing unit and the outlet side of pretreatment unit connect, pretreatment unit is identical with the structure of primary processing unit, include shell, is filled with alkaline reaction agent in shell.The invention also discloses a kind of high concentration chlorine trifluoride exhaust gas treating methods, it is an advantage of the current invention that handling by gradient dilution, the absorption completed after reaction to chlorine trifluoride gas, have the advantages that reverse-filling, highly-safe.
Description
Technical field
The invention belongs to tail gas disposal technique fields, and in particular to a kind of high concentration chlorine trifluoride exhaust gas processing device and place
Reason method.
Background technique
Chlorine trifluoride is a kind of hypertoxic strong oxidizing property medium, can almost be reacted with institute's organic and/or inorganic materials, for example,
Chlorine trifluoride generates a large amount of hydrogen fluoride, hydrogen chloride, chlorine oxonium compound after meeting water, this can be further exacerbated by it to inorganic material
Burn into flame mechanism, especially intermediate product chlorine oxonium compound be explosion cause key factor.Chlorine trifluoride initially as
The oxidant of propellant, because the 900Kg leakage accident occurred in the U.S. causes concrete construction that vigorous combustion explosion occurs,
Lead to heavy casualties.The accident was once becoming the classical case of Combustion, also promoted field technical staff for chlorine trifluoride
Storage container and medium are furtherd investigate.Chlorine trifluoride is also widely used in the recycling of uranium in nuke rubbish simultaneously.
It in recent years,, at room temperature can be with semiconductor material because of the high reaction activity of chlorine trifluoride in IC industry
Material reacts, and is chiefly used in the cleaning on the spot of inorganic plasma semiconductor production.Use process is changed in production and technique
In, it is related to the remaining remaining steel cylinder gas of the processing of a large amount of chlorine trifluoride exhaust gas, especially integrated circuit industry etching technics
Processing.As long as moisture content of the chlorine trifluoride conveyance conduit containing ppm rank, oxygen, chlorine trifluoride easily react and generate chlorine
Oxygen compound, and then cause corrosion leakage, thus when its concentration is higher than 1%, traditional dry type and tail cannot be directly accessed
Gas spray treatment device.In addition, chlorine trifluoride belongs to pole low pressure liquefied gas, boiling point is 11.5 DEG C, under the conditions of operating condition relatively low temperature
It directly carries out handling and easily occurs to flow backward risk.
Summary of the invention
Technical problem to be solved by the present invention lies in: high concentration chlorine trifluoride gas cannot directly access conventional dry and
Tail gas spray equipment is handled, and is directly diluted and is easily occurred to flow backward risk.
The present invention solves above-mentioned technical problem using following technical scheme:
A kind of high concentration chlorine trifluoride exhaust gas processing device is connect with chlorine trifluoride tail gas gas source, including sequentially connected
Dilution system, dry treatment system and spray system, the dilution system include venturi vacuum generator and source nitrogen, described
Venturi vacuum generator is equipped with adsorbent chamber entrance and compressed gas entrance, and the adsorbent chamber entrance is connect with tail gas gas source, and
It is equipped with one way stop peturn valve between the two；The compressed gas entrance is connect with source nitrogen；The dry treatment system includes pretreatment dress
It sets and primary processing unit, the inlet end of the pretreatment unit is connect with the outlet side of the venturi vacuum generator, described
The inlet end of primary processing unit and the outlet side of pretreatment unit connect, and pretreatment unit is identical with the structure of primary processing unit,
Include shell, is filled with alkaline reaction agent in the shell.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, the pretreatment unit are two
A, the inlet end of two pretreatment units is connect with the outlet side of venturi vacuum generator respectively, two pretreatment units
Outlet side is connect with the inlet end of primary processing unit respectively.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention is additionally provided with violet in the shell
Green stone, the alkaline reaction agent and cordierite are arranged in shell with being alternately stacked.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, the tail gas gas source are storage
There is the steel cylinder of chlorine trifluoride, the one way stop peturn valve is arranged in steel cylinder exit.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, at the tail gas source outlet
Equipped with first pressure meter；Flowmeter and second pressure meter are equipped between the source nitrogen and venturi vacuum generator.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, the venturi vacuum occur
The adsorbent chamber entrance of device is also connected with helium detection device.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, the alkaline reaction agent are calcium
Lime, soda lime, calcium hydroxide or sodium hydroxide.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas processing device of the present invention, the spray process system make
Spray liquid is sodium hydroxide solution or potassium hydroxide solution.
The present invention also provides a kind of high concentration chlorine trifluoride exhaust gas treating methods, based on a kind of above-mentioned high concentration three
Chlorine fluoride exhaust gas processing device first adjusts the aperture of tail gas gas source valve and the air inflow of nitrogen, forms tail gas branch micro- negative
Vacuum system is pressed, tail gas enters dilution in venturi vacuum generator, then after dry treatment system mixing and absorption, reaction, into
Enter spray system processing.
Preferably, a kind of high concentration chlorine trifluoride exhaust gas treating method of the present invention, chlorine trifluoride are true in venturi
Mixed proportion in empty generator is 3.5%-6.6%.
The technology of the present invention the utility model has the advantages that
Technical solution of the present invention is by dilution system, the introducing of the dry treatment system of two-stage treatment, so that high concentration three
Chlorine fluoride enters back into after gradient dilution, reaction does last processing in spray system, avoid the borontrifluoride chlorine of high concentration
Body directly handles the safety problem of initiation and flows backward problem, also avoids the processing of waste water containing fluorine.The device and method draws
The gradient processing theory entered has high safety, has extremely strong applicability in chlorine trifluoride vent gas treatment.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of high concentration chlorine trifluoride exhaust gas processing device described in the embodiment of the present invention.
Specific embodiment
For convenient for those skilled in the art understand that technical solution of the present invention, now in conjunction with Figure of description to the technology of the present invention side
Case is described further.
Refering to fig. 1, a kind of high concentration chlorine trifluoride exhaust gas processing device disclosed in the present embodiment, including it is tail gas gas source 1, dilute
Release system 2, dry treatment system 3 and spray system 4.
Tail gas gas source 1 in the present embodiment is chlorine trifluoride steel cylinder gas, such as integrated circuit industry etching technics is remaining
Remaining steel cylinder gas.
The dilution system 2 includes venturi vacuum generator 21 and source nitrogen 22, the venturi vacuum generator 21
It is equipped with adsorbent chamber entrance (not shown) and compressed gas entrance (not shown), the adsorbent chamber entrance and steel cylinder connect
It connects, and is equipped with one way stop peturn valve 5 and first pressure meter 6 between the two, first pressure meter 6 shows that pressure is denoted as P1；The pressure
Contracting gas entrance is connect with source nitrogen 22, and is equipped with flowmeter 7 and second pressure meter 8 between the two, and second pressure meter 8 shows pressure
It is denoted as P2。
The dry treatment system 3 includes pretreatment unit 31 and primary processing unit 32, in the present embodiment, the pretreatment
Device 31 is set as two, the inlet end of two pretreatment units 31 outlet side with the venturi vacuum generator 21 respectively
Connection, the outlet side of two pretreatment units 31 is connect with the inlet end of the primary processing unit 32 respectively.Pretreatment unit 31
Identical but size is different with the structure of primary processing unit 32, both includes shell (being not marked in figure), the shell in structure
It is filled with alkaline reaction agent (being not marked in figure) and cordierite square (being not marked in figure), and the alkaline reaction agent and violet in vivo
Green stone square is alternately stacked setting.
Alkaline reaction agent used in dry treatment system 3 can be selected from calcium lime, soda lime, calcium hydroxide, hydroxide
Sodium or other alkali solid medicaments.Wherein, the calcium lime by 70% calcium hydroxide, 10% sodium hydroxide, 5% hydrogen-oxygen
Change the forming agent composition of potassium and 15%；The soda lime by 50% calcium hydroxide, 35% sodium hydroxide and 15% molding
Agent is constituted.
Specifically, the shell for two pretreatment units 31 selected in the present embodiment be diameter 10cm, height 100cm not
Become rusty steel drum；The shell of the primary processing unit 32 is the cylindric stainless steel barrel of diameter 30cm, height 85cm, volume 60L.It is used
The volume of cordierite square is 1cm3.Preferably, the alkaline reaction agent filled in pretreatment unit 31 in the present embodiment is anti-
Answer activity and the preferable calcium lime of absorptive capacity；The alkaline reaction agent filled in primary processing unit 32 is soda lime.
The spray system 4 is conventional vent gas treatment spray equipment, and the spray liquid that the present embodiment is selected is sodium hydroxide
Solution, potassium hydroxide solution or other alkaline solutions.
In addition, the adsorbent chamber entrance of the venturi vacuum generator 21 is also connected with helium detection device 9 to carry out
Leak detection, helium leak check do not have positive connection as a kind of routine operation means, with improvement of the invention, do not do herein
Detailed description.
It is described in detail below and chlorine trifluoride steel cylinder gas is carried out by above-mentioned high concentration chlorine trifluoride exhaust gas processing device
The process of processing.
The aperture of cylinder valve and the air inflow of nitrogen are adjusted first, by the introducing of big flow nitrogen, in chlorine trifluoride
Branch forms tiny structure vacuum system, its pressure is made to be lower than the vapour pressure of gas, so that the positive draft of chlorine trifluoride is formed,
Under the assistance of one way stop peturn valve 5, the phenomenon that gas flows backward back steel cylinder is effectively prevented.Chlorine trifluoride gas is in Wen Qiu at the same time
In vacuum occur 21 in dilution.
Under conditions of 10 DEG C to 25 DEG C of operating condition, chlorine trifluoride saturated vapour pressure from 14psig to 26psig, has respectively
There is the characteristics of big viscosity, poor fluidity.By adjusting nitrogen pressure and nitrogen flow, cause in chlorine trifluoride branch different true
Reciprocal of duty cycle, so that regulating and controlling mixed proportion of the chlorine trifluoride in nitrogen is 0-6.6%, it is three under different nitrogen pressures shown in table 1
The mixed proportion of chlorine fluoride.
The mixed proportion of chlorine trifluoride under the different nitrogen pressures of table 1
In the present embodiment, the nitrogen pressure being passed through into venturi vacuum generator 21 is 4atm, chlorine trifluoride control stream
Speed is 200-800g/h, mixed proportion 1.6-6.4%.
Then, dry treatment system 3 is flowed by diluted chlorine trifluoride gas, the alkali in the dry treatment system 3
Property reactant be based on calcirm-fluoride fluorite structure chlorine trifluoride exhaust gas is handled, make chlorine trifluoride gas generate fluoro-gas and
Chlorine etc..Gas carries out first absorption, reaction in pretreatment unit 31 first, reduces gas concentration.Then gas again into
Enter into primary processing unit 32 to carry out second adsorption, reaction.In pretreatment unit 31, primary processing unit 32, it is stacked
Alkaline reaction agent under vapour lock effect, extends retention time of the gas in dry treatment system 3 there are certain vapour lock,
Improve processing validity.The setting of cordierite makes vapour lock be unlikely to excessive and influence passing through for air-flow again, while can also drop
Low reaction temperatures.
By the synergy of pretreatment unit 31 and primary processing unit 32, chlorine trifluoride gas is completed to convert, and will
The fluoro-gas solidification arrived, so that the gas of outflow dry treatment system 3 is the not fluoric-containing acid gas such as chlorine.Following equation
The as reaction that occurs in dry treatment system 3 of chlorine trifluoride gas:
2ClF3+3Ca(OH)2→3CaF2+ClO+ClO2 +3H2O (1)
ClO+1/2Ca(OH)2→1/4Ca(ClO)2+1/4CaCl2+1/2O2↑+1/2H2O (2)
ClO+1/4Ca(OH)2→1/4CaCl2+1/4Cl2↑+5/8O2↑+1/4H2O (3)
ClO2 +1/2Ca(OH)2→1/4Ca(ClO)2+1/4CaCl2+O2↑+1/2H2O (4)
ClO2 +1/4Ca(OH)2→1/4CaCl2+1/4Cl2↑+9/8O2↑+1/4H2O (5)
In above-mentioned reaction (2) into (5) it may be clearly seen that intermediate product chlorine oxonium compound, which further reacts, generates chlorine
Equal by-products avoid chlorine oxonium compound and the contact of a large amount of aqueous solutions in subsequent spray process in this way, fire to reduce
Risk.In addition, above-mentioned reaction can release a large amount of heat, the nitrogen of big flow not only acts as the effect of diluent, additionally it is possible to drive
Reaction system cooling.
Finally, residual exhaust does last processing under the action of the alkaline spray liquid that spray system 4 sprays, complete highly concentrated
Spend the complete processing of chlorine trifluoride gas.
In the present embodiment, the average treatment efficiency of chlorine trifluoride is 300g/h, totals about 200Kg chlorine trifluoride tail gas
Processing.The absorption efficiency of the calcium lime is about 15Kg/h up to 25Kg/h, the adsorption efficiency of soda lime.
By the successively effect of pretreatment system 31 and host processing system 32 in dilution system 2, dry treatment system 3,
Gradient dilution, reaction treatment are carried out to chlorine trifluoride gas, so that fluoro-gas is not finally contained in the gas of spray-absorption,
Achieve the purpose that safe handling.
The present invention is described by taking chlorine trifluoride steel cylinder gas as an example in above-described embodiment, in actual production, trifluoro
Change chlorine tail gas gas source and is also possible to other process tail gas.
Technical solution of the present invention is exemplarily described invention above in conjunction with attached drawing, it is clear that present invention specific implementation
It is not subject to the restrictions described above, changes as long as using the various unsubstantialities that the inventive concept and technical scheme of the present invention carry out
Into, or it is not improved the conception and technical scheme of invention are directly applied into other occasions, in protection scope of the present invention
Within.
Claims (10)
1. a kind of high concentration chlorine trifluoride exhaust gas processing device is connect with chlorine trifluoride tail gas gas source, which is characterized in that including according to
Dilution system, dry treatment system and the spray system of secondary connection, the dilution system include venturi vacuum generator and nitrogen
Gas source, the venturi vacuum generator are equipped with adsorbent chamber entrance and compressed gas entrance, the adsorbent chamber entrance and tail gas gas
Source connection, and it is equipped with one way stop peturn valve between the two；The compressed gas entrance is connect with source nitrogen；The dry treatment system includes
The outlet side of pretreatment unit and primary processing unit, the inlet end of the pretreatment unit and the venturi vacuum generator connects
It connects, the inlet end of the primary processing unit and the outlet side of pretreatment unit connect, the knot of pretreatment unit and primary processing unit
Structure is identical, includes shell, is filled with alkaline reaction agent in the shell.
2. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1, which is characterized in that the pretreatment
Device is two, and the inlet end of two pretreatment units is connect with the outlet side of venturi vacuum generator respectively, two pre- places
The outlet side of reason device is connect with the inlet end of primary processing unit respectively.
3. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1 or 2, which is characterized in that the shell
It is additionally provided with cordierite in vivo, the alkaline reaction agent and cordierite are arranged in shell with being alternately stacked.
4. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1, which is characterized in that the tail gas gas
Source is the steel cylinder for being stored with chlorine trifluoride, and the one way stop peturn valve is arranged in steel cylinder exit.
5. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1, which is characterized in that the tail gas gas
Source exit is equipped with first pressure meter；Flowmeter and second pressure meter are equipped between the source nitrogen and venturi vacuum generator.
6. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1, which is characterized in that the venturi
The adsorbent chamber entrance of vacuum generator is also connected with helium detection device.
7. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 3, which is characterized in that the alkalinity is anti-
Answering agent is calcium lime, soda lime, calcium hydroxide or sodium hydroxide.
8. a kind of high concentration chlorine trifluoride exhaust gas processing device according to claim 1, which is characterized in that at the spray
The spray liquid that reason system uses is sodium hydroxide solution or potassium hydroxide solution.
9. a kind of high concentration chlorine trifluoride exhaust gas treating method is based on a kind of described in any item high concentrations of claim 1-8
Chlorine trifluoride exhaust gas processing device, which is characterized in that adjust the aperture of tail gas gas source and the air inflow of nitrogen, make tail gas branch shape
At tiny structure vacuum system, tail gas enters dilution in venturi vacuum generator, then through dry treatment system mixing and absorption, reaction
Afterwards, into spray system processing.
10. a kind of high concentration chlorine trifluoride exhaust gas treating method according to claim 9, which is characterized in that the trifluoro
Changing mixed proportion of the chlorine in venturi vacuum generator is 3.5%-6.6%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810903024.6A CN109012092A (en) | 2018-08-09 | 2018-08-09 | A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810903024.6A CN109012092A (en) | 2018-08-09 | 2018-08-09 | A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109012092A true CN109012092A (en) | 2018-12-18 |
Family
ID=64632523
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810903024.6A Pending CN109012092A (en) | 2018-08-09 | 2018-08-09 | A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109012092A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110563016A (en) * | 2019-10-09 | 2019-12-13 | 江西理工大学 | Method for treating waste gas containing fluorine and chlorine by using white tungsten slag |
| CN114963002A (en) * | 2022-05-31 | 2022-08-30 | 广东众大智能科技有限公司 | Explosion-proof treatment device for combustible tail gas |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1150240A (en) * | 1995-07-17 | 1997-05-21 | 缔酸株式会社 | Gas recovery unit |
| KR0126123B1 (en) * | 1991-12-11 | 1997-12-19 | 야마자끼 료이찌 | Process for cleaning harmful gas |
| CN101733031A (en) * | 2009-12-28 | 2010-06-16 | 上海竟茨环保科技有限公司 | Venturi mixer |
| JP2011143329A (en) * | 2010-01-12 | 2011-07-28 | Central Glass Co Ltd | Apparatus for detoxifying gas comprising chlorine trifluoride |
-
2018
- 2018-08-09 CN CN201810903024.6A patent/CN109012092A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0126123B1 (en) * | 1991-12-11 | 1997-12-19 | 야마자끼 료이찌 | Process for cleaning harmful gas |
| CN1150240A (en) * | 1995-07-17 | 1997-05-21 | 缔酸株式会社 | Gas recovery unit |
| CN101733031A (en) * | 2009-12-28 | 2010-06-16 | 上海竟茨环保科技有限公司 | Venturi mixer |
| JP2011143329A (en) * | 2010-01-12 | 2011-07-28 | Central Glass Co Ltd | Apparatus for detoxifying gas comprising chlorine trifluoride |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110563016A (en) * | 2019-10-09 | 2019-12-13 | 江西理工大学 | Method for treating waste gas containing fluorine and chlorine by using white tungsten slag |
| CN114963002A (en) * | 2022-05-31 | 2022-08-30 | 广东众大智能科技有限公司 | Explosion-proof treatment device for combustible tail gas |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0362641B2 (en) | ||
| Sun et al. | Simultaneous absorption of SO2 and NOx with pyrolusite slurry combined with gas-phase oxidation of NO using ozone: Effect of molar ratio of O2/(SO2+ 0.5 NOx) in flue gas | |
| CN109012092A (en) | A kind of high concentration chlorine trifluoride exhaust gas processing device and processing method | |
| CN109665503A (en) | A kind of nitrogen oxides preparation method and device | |
| JP2010179061A (en) | Ethylene oxide gas sterilizing and collecting system | |
| JP2014189471A (en) | Apparatus for recovering nitrogen monoxide gas | |
| CN103920385B (en) | A kind of is the oxidative absorption method of potash fertilizer by high concentration dinitrogen tetroxide exhaust gas conversion | |
| CN208626983U (en) | A kind of high concentration nitrogen oxide flue gas denitrification system | |
| CN101982404B (en) | Equipment and method for preparing chlorine dioxide solution | |
| CN107117581A (en) | A kind of preparation of chlorine dioxide with high purity and control decomposition method | |
| CN111068476A (en) | NO in process of dissolving metal by nitric acidXTail gas treatment device and method and terminal | |
| JP3660709B2 (en) | Apparatus for producing ferric sulfate solution and basic ferric sulfate solution | |
| CN103011102B (en) | Cooling process for desalted water conveyed to nitric acid absorbing tower | |
| CN206853451U (en) | A kind of oxidation and denitration device | |
| CN1114632A (en) | Method for preparation of chlorine dioxide and generator thereof | |
| CN105964119A (en) | Ozone denitration device and process | |
| CN105293523A (en) | Continuous preparation method for production raw material ammonia water of ketazine process hydrazine hydrate | |
| CN209702323U (en) | It is a kind of can self-produced nitric acid two sodium devices | |
| CN113800472A (en) | Preparation method of stable chlorine dioxide bleaching solution | |
| CN201362589Y (en) | Chlorine dioxide generator with safety valve | |
| CN109603471A (en) | The absorption process of tail gas in a kind of indium nitrate preparation process | |
| CN209865789U (en) | A diluting device for liquid ammonia emergency treatment | |
| CN104524944B (en) | Nitric acid pot area exhaust treatment system | |
| CN109045963A (en) | A kind of method that oxidation-absorption removes gaseous state selenium dioxide in coal-fired flue-gas | |
| CN106744747A (en) | The production method of dust technology and the production equipment of dust technology |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181218 |