TW245877B - - Google Patents

Info

Publication number
TW245877B
TW245877B TW082108295A TW82108295A TW245877B TW 245877 B TW245877 B TW 245877B TW 082108295 A TW082108295 A TW 082108295A TW 82108295 A TW82108295 A TW 82108295A TW 245877 B TW245877 B TW 245877B
Authority
TW
Taiwan
Application number
TW082108295A
Original Assignee
Ei Denshi Kogyo Kk
Oba Kazuo
Shima Yoshinori
Oba Akira
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ei Denshi Kogyo Kk, Oba Kazuo, Shima Yoshinori, Oba Akira filed Critical Ei Denshi Kogyo Kk
Application granted granted Critical
Publication of TW245877B publication Critical patent/TW245877B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Drying Of Semiconductors (AREA)
TW082108295A 1992-10-09 1993-10-07 TW245877B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4272046A JP2693899B2 (ja) 1992-10-09 1992-10-09 Ｅｃｒプラズマ加工方法

Publications (1)

Publication Number Publication Date
TW245877B true TW245877B (zh) 1995-04-21

Family

ID=17508359

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082108295A TW245877B (zh) 1992-10-09 1993-10-07

Country Status (5)

Country Link
US (1) US5370779A (zh)
EP (1) EP0592129A1 (zh)
JP (1) JP2693899B2 (zh)
KR (1) KR970010265B1 (zh)
TW (1) TW245877B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3365067B2 (ja) * 1994-02-10 2003-01-08 ソニー株式会社 プラズマ装置およびこれを用いたプラズマ処理方法
WO1997011207A1 (fr) * 1995-09-18 1997-03-27 Hitachi, Ltd. Procede d'attaque a sec
JP3599564B2 (ja) 1998-06-25 2004-12-08 東京エレクトロン株式会社 イオン流形成方法及び装置
US6054390A (en) * 1997-11-05 2000-04-25 Chartered Semiconductor Manufacturing Ltd. Grazing incident angle processing method for microelectronics layer fabrication
US6566272B2 (en) 1999-07-23 2003-05-20 Applied Materials Inc. Method for providing pulsed plasma during a portion of a semiconductor wafer process
KR100782579B1 (ko) * 2006-09-26 2007-12-06 가부시키가이샤 나노빔 Ｅｃｒ 이온소스
US7772571B2 (en) 2007-10-08 2010-08-10 Advanced Ion Beam Technology, Inc. Implant beam utilization in an ion implanter
EP3305038B1 (en) * 2015-05-26 2020-01-15 Antaya Science & Technology Isochronous cyclotron with superconducting flutter coils and non-magnetic reinforcement

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2580427B1 (fr) * 1985-04-11 1987-05-15 Commissariat Energie Atomique Source d'ions negatifs a resonance cyclotronique des electrons
DE3729347A1 (de) * 1986-09-05 1988-03-17 Mitsubishi Electric Corp Plasmaprozessor
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
JPH01243359A (ja) * 1988-03-25 1989-09-28 Matsushita Electric Ind Co Ltd プラズマドーピング方法
KR930004713B1 (ko) * 1990-06-18 1993-06-03 삼성전자 주식회사 변조방식을 이용한 플라즈마 발생장치 및 방법
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source
JPH0521392A (ja) * 1991-07-17 1993-01-29 Fuji Electric Co Ltd プラズマ加工装置

Also Published As

Publication number Publication date
JPH06124797A (ja) 1994-05-06
KR970010265B1 (ko) 1997-06-23
US5370779A (en) 1994-12-06
KR940008817A (ko) 1994-05-16
EP0592129A1 (en) 1994-04-13
JP2693899B2 (ja) 1997-12-24

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