TW245746B - - Google Patents

Info

Publication number
TW245746B
TW245746B TW083103359A TW83103359A TW245746B TW 245746 B TW245746 B TW 245746B TW 083103359 A TW083103359 A TW 083103359A TW 83103359 A TW83103359 A TW 83103359A TW 245746 B TW245746 B TW 245746B
Authority
TW
Taiwan
Prior art keywords
metal structure
corrosive environment
preventing corrosion
zinc silicate
silicate coating
Prior art date
Application number
TW083103359A
Other languages
English (en)
Original Assignee
Riffe William J
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riffe William J filed Critical Riffe William J
Application granted granted Critical
Publication of TW245746B publication Critical patent/TW245746B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/08Anti-corrosive paints
TW083103359A 1993-03-19 1994-04-15 TW245746B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/034,783 US5352342A (en) 1993-03-19 1993-03-19 Method and apparatus for preventing corrosion of metal structures

Publications (1)

Publication Number Publication Date
TW245746B true TW245746B (zh) 1995-04-21

Family

ID=21878573

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083103359A TW245746B (zh) 1993-03-19 1994-04-15

Country Status (16)

Country Link
US (2) US5352342A (zh)
EP (1) EP0690933B1 (zh)
JP (1) JP3183889B2 (zh)
KR (1) KR100325385B1 (zh)
AT (1) ATE204032T1 (zh)
AU (1) AU728739B2 (zh)
CA (1) CA2158558C (zh)
DE (1) DE69429937T2 (zh)
DK (1) DK0690933T3 (zh)
ES (1) ES2162624T3 (zh)
IL (1) IL108990A0 (zh)
PT (1) PT690933E (zh)
SA (1) SA94150014B1 (zh)
TW (1) TW245746B (zh)
WO (1) WO1994021843A1 (zh)
ZA (1) ZA941892B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778111B (zh) * 2017-08-04 2022-09-21 丹麥商沃旭風力能源公司 離岸風機的支撐系統以及支撐系統的保護方法、以及用於保護支撐系統的陰極保護系統及陰極保護系統的用途

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US5650060A (en) * 1994-01-28 1997-07-22 Minnesota Mining And Manufacturing Company Ionically conductive agent, system for cathodic protection of galvanically active metals, and method and apparatus for using same
US6080334A (en) * 1994-10-21 2000-06-27 Elisha Technologies Co Llc Corrosion resistant buffer system for metal products
US5750071A (en) * 1995-06-08 1998-05-12 Lucent Technologies Inc. Corrosion protection employing alternating voltage
JP2958751B2 (ja) * 1996-07-03 1999-10-06 本田技研工業株式会社 電気防食法
US6322687B1 (en) 1997-01-31 2001-11-27 Elisha Technologies Co Llc Electrolytic process for forming a mineral
CA2277067C (en) 1997-01-31 2010-01-26 Robert L. Heimann An electrolytic process for forming a mineral containing coating
EP1785510A1 (en) 1997-01-31 2007-05-16 Elisha Holding LLC Electrodeposition medium
US6599643B2 (en) 1997-01-31 2003-07-29 Elisha Holding Llc Energy enhanced process for treating a conductive surface and products formed thereby
US6153080A (en) * 1997-01-31 2000-11-28 Elisha Technologies Co Llc Electrolytic process for forming a mineral
US6592738B2 (en) 1997-01-31 2003-07-15 Elisha Holding Llc Electrolytic process for treating a conductive surface and products formed thereby
US6325915B1 (en) * 1999-12-09 2001-12-04 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
US6551491B2 (en) 2000-06-02 2003-04-22 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
US6524466B1 (en) * 2000-07-18 2003-02-25 Applied Semiconductor, Inc. Method and system of preventing fouling and corrosion of biomedical devices and structures
US6508349B1 (en) 2001-02-23 2003-01-21 Scott J. Lewin Parking meter with electric grounding arrangement for corrosion reduction
US6562201B2 (en) * 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
US6693441B2 (en) * 2001-11-30 2004-02-17 Stmicroelectronics, Inc. Capacitive fingerprint sensor with protective coating containing a conductive suspension
US20040188262A1 (en) * 2002-02-05 2004-09-30 Heimann Robert L. Method for treating metallic surfaces and products formed thereby
AU2003209010A1 (en) * 2002-02-05 2003-09-02 Elisha Holding Llc Method for treating metallic surfaces and products formed thereby
US6866770B2 (en) * 2002-06-03 2005-03-15 Corrosion Restoration Technologies, Inc. Protective ground mat for induced potentials and method therefor
US6933046B1 (en) * 2002-06-12 2005-08-23 Tda Research, Inc. Releasable corrosion inhibitor compositions
US7244498B2 (en) * 2002-06-12 2007-07-17 Tda Research, Inc. Nanoparticles modified with multiple organic acids
US20040134795A1 (en) * 2002-08-15 2004-07-15 Demarco Daniel R. System and method for protecting metals
US6811681B2 (en) * 2002-11-12 2004-11-02 Applied Semiconductor International Ltd. Semiconductive corrosion and fouling control apparatus, system, and method
JP4472325B2 (ja) * 2003-12-25 2010-06-02 三和パッキング工業株式会社 緩衝装置
KR100463438B1 (ko) * 2004-11-03 2004-12-23 김동진 다량의 이온을 발생시키는 스트리머 방전형 피뢰침
US7318889B2 (en) * 2005-06-02 2008-01-15 Applied Semiconductor International, Ltd. Apparatus, system and method for extending the life of sacrificial anodes on cathodic protection systems
US8496511B2 (en) 2010-07-15 2013-07-30 3M Innovative Properties Company Cathodically-protected pad conditioner and method of use
CA3061869A1 (en) 2017-05-01 2018-11-08 Farzad HASHEMI Cathodic protection of metal substrates
US10290719B1 (en) 2017-12-27 2019-05-14 International Business Machines Corporation Indium gallium arsenide metal oxide semiconductor field effect transistor having a low contact resistance to metal electrode

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778111B (zh) * 2017-08-04 2022-09-21 丹麥商沃旭風力能源公司 離岸風機的支撐系統以及支撐系統的保護方法、以及用於保護支撐系統的陰極保護系統及陰極保護系統的用途

Also Published As

Publication number Publication date
JPH08510503A (ja) 1996-11-05
CA2158558C (en) 2005-06-07
ES2162624T3 (es) 2002-01-01
KR100325385B1 (ko) 2002-06-29
PT690933E (pt) 2002-01-30
DE69429937T2 (de) 2002-06-13
JP3183889B2 (ja) 2001-07-09
WO1994021843A1 (en) 1994-09-29
ATE204032T1 (de) 2001-08-15
SA94150014B1 (ar) 2006-11-11
EP0690933B1 (en) 2001-08-08
DE69429937D1 (de) 2002-03-28
ZA941892B (en) 1994-10-18
EP0690933A4 (en) 1996-06-26
US5478451A (en) 1995-12-26
IL108990A0 (en) 1994-06-24
CA2158558A1 (en) 1994-09-29
US5352342A (en) 1994-10-04
DK0690933T3 (da) 2001-11-05
EP0690933A1 (en) 1996-01-10
AU6408794A (en) 1994-10-11
AU728739B2 (en) 2001-01-18

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