TW233378B - - Google Patents
Info
- Publication number
- TW233378B TW233378B TW082100865A TW82100865A TW233378B TW 233378 B TW233378 B TW 233378B TW 082100865 A TW082100865 A TW 082100865A TW 82100865 A TW82100865 A TW 82100865A TW 233378 B TW233378 B TW 233378B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/701—Off-axis setting using an aperture
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5752692 | 1992-02-10 | ||
| JP4233083A JPH05303209A (ja) | 1992-02-10 | 1992-08-07 | リソグラフィ工程 |
| JP4233081A JPH05308048A (ja) | 1992-02-10 | 1992-08-07 | リソグラフィ工程 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW233378B true TW233378B (pt) | 1994-11-01 |
Family
ID=13058195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW082100865A TW233378B (pt) | 1992-02-10 | 1993-02-09 |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JPH05303209A (pt) |
| KR (1) | KR0123931B1 (pt) |
| MY (1) | MY119984A (pt) |
| TW (1) | TW233378B (pt) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4564186B2 (ja) * | 2001-02-16 | 2010-10-20 | 株式会社東芝 | パターン形成方法 |
| KR100680401B1 (ko) * | 2004-07-02 | 2007-02-08 | 주식회사 하이닉스반도체 | 이머젼 리소그래피용 액체 조성물 및 이를 이용한리소그래피 방법 |
| JP2007150102A (ja) * | 2005-11-29 | 2007-06-14 | Fujitsu Ltd | 露光装置及び光学素子の洗浄方法 |
| JP5531955B2 (ja) * | 2008-06-12 | 2014-06-25 | 株式会社ニコン | 照明装置、露光装置及びデバイス製造方法 |
-
1992
- 1992-08-07 JP JP4233083A patent/JPH05303209A/ja active Pending
- 1992-08-07 JP JP4233081A patent/JPH05308048A/ja active Pending
-
1993
- 1993-02-09 MY MYPI93000202A patent/MY119984A/en unknown
- 1993-02-09 TW TW082100865A patent/TW233378B/zh not_active IP Right Cessation
- 1993-02-10 KR KR1019930001784A patent/KR0123931B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| MY119984A (en) | 2005-08-30 |
| JPH05303209A (ja) | 1993-11-16 |
| JPH05308048A (ja) | 1993-11-19 |
| KR930018679A (ko) | 1993-09-22 |
| KR0123931B1 (ko) | 1997-11-20 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |