TW221716B - - Google Patents
Info
- Publication number
- TW221716B TW221716B TW081108385A TW81108385A TW221716B TW 221716 B TW221716 B TW 221716B TW 081108385 A TW081108385 A TW 081108385A TW 81108385 A TW81108385 A TW 81108385A TW 221716 B TW221716 B TW 221716B
- Authority
- TW
- Taiwan
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4035670A JP2674415B2 (ja) | 1992-01-27 | 1992-01-27 | 感光性樹脂組成物及び電子部品用保護膜 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW221716B true TW221716B (en, 2012) | 1994-03-11 |
Family
ID=12448313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW081108385A TW221716B (en, 2012) | 1992-01-27 | 1992-10-21 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0554040A3 (en, 2012) |
| JP (1) | JP2674415B2 (en, 2012) |
| KR (1) | KR930016828A (en, 2012) |
| TW (1) | TW221716B (en, 2012) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2787531B2 (ja) * | 1993-02-17 | 1998-08-20 | 信越化学工業株式会社 | 感光性樹脂組成物及び電子部品用保護膜 |
| JP3324250B2 (ja) * | 1993-02-25 | 2002-09-17 | チッソ株式会社 | 感光性樹脂組成物 |
| TW200512543A (en) * | 2003-08-06 | 2005-04-01 | Sumitomo Bakelite Co | Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device |
| CN101373296B (zh) * | 2007-08-24 | 2012-07-04 | 株式会社日立显示器 | 液晶显示装置及其制造方法 |
| JP6487875B2 (ja) * | 2016-04-19 | 2019-03-20 | 信越化学工業株式会社 | テトラカルボン酸ジエステル化合物、ポリイミド前駆体の重合体及びその製造方法、ネガ型感光性樹脂組成物、ポジ型感光性樹脂組成物、パターン形成方法、及び硬化被膜形成方法 |
| JP6637871B2 (ja) * | 2016-10-27 | 2020-01-29 | 信越化学工業株式会社 | テトラカルボン酸ジエステル化合物、ポリイミド前駆体の重合体及びその製造方法、ネガ型感光性樹脂組成物、パターン形成方法、及び硬化被膜形成方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63305348A (ja) * | 1987-06-05 | 1988-12-13 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| JPH0358048A (ja) * | 1989-07-27 | 1991-03-13 | Nitto Denko Corp | ポジ型感光性ポリイミド組成物 |
| EP0431971B1 (en) * | 1989-12-07 | 1995-07-19 | Kabushiki Kaisha Toshiba | Photosensitive composition and resin-encapsulated semiconductor device |
| US5114826A (en) * | 1989-12-28 | 1992-05-19 | Ibm Corporation | Photosensitive polyimide compositions |
| JP2606402B2 (ja) * | 1990-03-23 | 1997-05-07 | 信越化学工業株式会社 | 硬化性樹脂及びその製造方法 |
| EP0459395B1 (en) * | 1990-05-29 | 1999-08-18 | Sumitomo Bakelite Company Limited | Positive photo-sensitive resin composition |
| JPH04313756A (ja) * | 1991-04-11 | 1992-11-05 | Shin Etsu Chem Co Ltd | 感光材及びその製造方法 |
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1992
- 1992-01-27 JP JP4035670A patent/JP2674415B2/ja not_active Expired - Fee Related
- 1992-10-21 TW TW081108385A patent/TW221716B/zh active
-
1993
- 1993-01-26 EP EP19930300536 patent/EP0554040A3/en not_active Withdrawn
- 1993-01-26 KR KR1019930000927A patent/KR930016828A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| KR930016828A (ko) | 1993-08-30 |
| EP0554040A2 (en) | 1993-08-04 |
| JP2674415B2 (ja) | 1997-11-12 |
| EP0554040A3 (en) | 1993-12-29 |
| JPH05204156A (ja) | 1993-08-13 |