TW207030B - - Google Patents

Info

Publication number
TW207030B
TW207030B TW081107310A TW81107310A TW207030B TW 207030 B TW207030 B TW 207030B TW 081107310 A TW081107310 A TW 081107310A TW 81107310 A TW81107310 A TW 81107310A TW 207030 B TW207030 B TW 207030B
Authority
TW
Taiwan
Application number
TW081107310A
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Application granted granted Critical
Publication of TW207030B publication Critical patent/TW207030B/zh

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW081107310A 1991-07-26 1992-09-16 TW207030B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/736,153 US5210779A (en) 1991-07-26 1991-07-26 Apparatus and method for focusing hard x-rays

Publications (1)

Publication Number Publication Date
TW207030B true TW207030B (zh) 1993-06-01

Family

ID=24958717

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081107310A TW207030B (zh) 1991-07-26 1992-09-16

Country Status (7)

Country Link
US (1) US5210779A (zh)
EP (1) EP0550734A1 (zh)
JP (1) JPH06502747A (zh)
KR (1) KR950012546B1 (zh)
CA (1) CA2089557A1 (zh)
TW (1) TW207030B (zh)
WO (1) WO1993003424A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5880467A (en) * 1997-03-05 1999-03-09 The United States Of America As Represented By The Secretary Of Commerce Microcalorimeter x-ray detectors with x-ray lens
US6389100B1 (en) * 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system
CZ299759B6 (cs) * 2007-07-20 2008-11-12 Ceské vysoké ucení technické v Praze Optický clen pro rentgenovou mikroskopii

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106031A (en) * 1980-12-23 1982-07-01 Toshiba Corp Transferring device for fine pattern
US4429411A (en) * 1981-04-20 1984-01-31 The United States Of America As Represented By The United States Department Of Energy Instrument and method for focusing X-rays, gamma rays and neutrons
DE3217235A1 (de) * 1982-05-07 1983-11-24 Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Verfahren zum erzeugen eines hochkollimierten roentgenstrahlungsbuendels durch sechsstrahl-borrmann-beugung
JPS6221223A (ja) * 1985-07-19 1987-01-29 Shimadzu Corp 軟ｘ線用投影結像装置
US5063586A (en) * 1989-10-13 1991-11-05 At&T Bell Laboratories Apparatus for semiconductor lithography
US4987582A (en) * 1989-10-19 1991-01-22 Hughes Aircraft Company X-ray fluorescence imaging of elements

Also Published As

Publication number Publication date
WO1993003424A1 (en) 1993-02-18
KR950012546B1 (ko) 1995-10-18
CA2089557A1 (en) 1993-01-27
JPH06502747A (ja) 1994-03-24
US5210779A (en) 1993-05-11
EP0550734A1 (en) 1993-07-14

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