TW202506982A - 清洗液、清洗方法、及半導體元件之製造方法 - Google Patents

清洗液、清洗方法、及半導體元件之製造方法 Download PDF

Info

Publication number
TW202506982A
TW202506982A TW113121900A TW113121900A TW202506982A TW 202506982 A TW202506982 A TW 202506982A TW 113121900 A TW113121900 A TW 113121900A TW 113121900 A TW113121900 A TW 113121900A TW 202506982 A TW202506982 A TW 202506982A
Authority
TW
Taiwan
Prior art keywords
cleaning solution
group
acid
cleaning
atom
Prior art date
Application number
TW113121900A
Other languages
English (en)
Chinese (zh)
Inventor
岩本絋明
鈴木步
瀨戶暢介
大崎愛姬子
Original Assignee
日商Ａｇｃ股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Ａｇｃ股份有限公司 filed Critical 日商Ａｇｃ股份有限公司
Publication of TW202506982A publication Critical patent/TW202506982A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
    • C11D17/08—Liquid soap, e.g. for dispensers; capsuled
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW113121900A 2023-06-14 2024-06-13 清洗液、清洗方法、及半導體元件之製造方法 TW202506982A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023097860 2023-06-14
JP2023-097860 2023-06-14

Publications (1)

Publication Number Publication Date
TW202506982A true TW202506982A (zh) 2025-02-16

Family

ID=93852186

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113121900A TW202506982A (zh) 2023-06-14 2024-06-13 清洗液、清洗方法、及半導體元件之製造方法

Country Status (4)

Country Link
JP (1) JPWO2024257814A1 (enExample)
CN (1) CN121153103A (enExample)
TW (1) TW202506982A (enExample)
WO (1) WO2024257814A1 (enExample)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101622862B1 (ko) * 2007-05-17 2016-05-19 엔테그리스, 아이엔씨. Ｃｍｐ후 세정 제제용 신규한 항산화제
US10308592B2 (en) * 2014-09-23 2019-06-04 3M Innovative Properties Company Nitrogen containing hydrofluoroethers and methods of using same
JPWO2019181435A1 (ja) * 2018-03-22 2021-03-18 富士フイルム株式会社 ろ過装置、精製装置、薬液の製造方法
US11560533B2 (en) * 2018-06-26 2023-01-24 Versum Materials Us, Llc Post chemical mechanical planarization (CMP) cleaning
JPWO2023095806A1 (enExample) * 2021-11-25 2023-06-01

Also Published As

Publication number Publication date
JPWO2024257814A1 (enExample) 2024-12-19
WO2024257814A1 (ja) 2024-12-19
CN121153103A (zh) 2025-12-16

Similar Documents

Publication Publication Date Title
JP6503102B2 (ja) 窒化チタンハードマスク及びエッチ残留物除去
TWI418622B (zh) 銅鈍化之後段化學機械拋光清洗組成物及利用該組成物之方法
JP7645682B2 (ja) 表面処理組成物、表面処理組成物の製造方法、表面処理方法、及び半導体基板の製造方法
TW202010872A (zh) 含腐蝕抑制劑之清洗組合物
KR20060126970A (ko) 입자 없는 화학적 기계적 연마 조성물 및 이를 포함하는연마 공정
CN108431931B (zh) 用于化学机械抛光后清洁的组合物
CN101855334A (zh) 高负电动势多面体倍半硅氧烷组合物及无损坏半导体湿式清洁方法
JP6801964B2 (ja) 研磨用組成物及びシリコン基板の研磨方法
WO2012043767A1 (ja) 半導体デバイス用基板の洗浄液及び洗浄方法
CN108473918A (zh) 用于化学机械抛光后清洁的组合物
CN110114856A (zh) 硅晶片用冲洗剂组合物
KR20200038014A (ko) 표면처리 조성물 및 그것을 이용한 표면처리 방법
CN114250124A (zh) 表面处理组合物、表面处理组合物的制造方法、表面处理方法和半导体基板的制造方法
US10319605B2 (en) Semiconductor treatment composition and treatment method
TW202407090A (zh) 組成物，其用途及清潔包含鈷及銅之基板之方法
US11732217B2 (en) Cleaning solution composition and cleaning method using the same
IL263453B (en) Cleaning agent after mechanical-chemical polishing
JP6849564B2 (ja) 表面処理組成物およびこれを用いた表面処理方法
CN116234893A (zh) 化学机械平面化（cmp）后清洁
US20240327761A1 (en) Cleaning compositions and methods of use thereof
JP2004165447A (ja) 半導体基板製造工程用組成物
US20200208051A1 (en) Composition for semiconductor surface treatment and treatment method of semiconductor surface
TWI855138B (zh) 半導體處理用組成物及處理方法
WO2024257814A1 (ja) 洗浄液、洗浄方法、及び半導体素子の製造方法
CN115992031A (zh) 化学机械研磨后清洗液组合物