TW202440507A - 化合物之製造方法、聚合物、組成物、圖型形成方法 - Google Patents

化合物之製造方法、聚合物、組成物、圖型形成方法 Download PDF

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TW202440507A
TW202440507A TW112149832A TW112149832A TW202440507A TW 202440507 A TW202440507 A TW 202440507A TW 112149832 A TW112149832 A TW 112149832A TW 112149832 A TW112149832 A TW 112149832A TW 202440507 A TW202440507 A TW 202440507A
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formula
compound
aforementioned
acid
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TW112149832A
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大松禎
片岡健太郎
松本正裕
新美結士
小熊威
堀內淳矢
山本拓央
飯沼雅崇
松浦耕大
佐藤��
岡田悠
牧野嶋高史
越後雅敏
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日商三菱瓦斯化學股份有限公司
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    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/08—Preparation of carboxylic acid esters by reacting carboxylic acids or symmetrical anhydrides with the hydroxy or O-metal group of organic compounds
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    • C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
    • C07C37/11—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms
    • C07C37/20—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by reactions increasing the number of carbon atoms using aldehydes or ketones
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    • C07C37/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring
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    • C07C37/62—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom of a six-membered aromatic ring by introduction of halogen; by substitution of halogen atoms by other halogen atoms
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    • C07C39/19—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring monocyclic with unsaturation outside the aromatic ring containing carbon-to-carbon double bonds but no carbon-to-carbon triple bonds
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    • C07C39/24—Halogenated derivatives
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    • C07C45/29—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by oxidation of hydroxy groups
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    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
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    • C07C47/00—Compounds having —CHO groups
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    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/28—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group
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    • C07C67/293—Preparation of carboxylic acid esters by modifying the hydroxylic moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
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    • C07C69/12—Acetic acid esters
    • C07C69/14—Acetic acid esters of monohydroxylic compounds
    • C07C69/145—Acetic acid esters of monohydroxylic compounds of unsaturated alcohols
    • C07C69/157—Acetic acid esters of monohydroxylic compounds of unsaturated alcohols containing six-membered aromatic rings
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    • C07C69/02—Esters of acyclic saturated monocarboxylic acids having the carboxyl group bound to an acyclic carbon atom or to hydrogen
    • C07C69/12—Acetic acid esters
    • C07C69/16—Acetic acid esters of dihydroxylic compounds
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    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
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    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F12/22—Oxygen
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    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Polymers & Plastics (AREA)
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112149832A 2022-12-20 2023-12-20 化合物之製造方法、聚合物、組成物、圖型形成方法 TW202440507A (zh)

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JP2022203721 2022-12-20
JP2022-203721 2022-12-20
JP2023182078 2023-10-23
JP2023-182078 2023-10-23

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JP (1) JPWO2024135708A1 (https=)
KR (1) KR20250126726A (https=)
CN (1) CN120435452A (https=)
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WO (1) WO2024135708A1 (https=)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316995A (en) 1981-02-05 1982-02-23 International Flavors & Fragrances Inc. Process for preparing vinyl phenol
EP0502819A1 (de) 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
JP2851472B2 (ja) * 1992-02-04 1999-01-27 信越化学工業株式会社 オレフィン化合物の製造方法
JP4379970B2 (ja) * 1999-09-07 2009-12-09 住友化学株式会社 オレフィン化合物の製造法
US7586013B2 (en) 2004-03-26 2009-09-08 E.I. Du Pont De Nemours And Company Method for preparing hydroxystyrenes and acetylated derivatives thereof
JP2009196963A (ja) 2008-02-25 2009-09-03 Nippon Oxirane Kk スチレンの製造方法
JP6008201B2 (ja) 2013-05-10 2016-10-19 東レ・ファインケミカル株式会社 スチレン誘導体の製造方法
JP6196897B2 (ja) 2013-12-05 2017-09-13 東京応化工業株式会社 ネガ型レジスト組成物、レジストパターン形成方法及び錯体
JP7222674B2 (ja) 2017-12-15 2023-02-15 信越化学工業株式会社 反射防止膜、反射防止膜の製造方法、及び眼鏡型ディスプレイ
EP3779596A4 (en) 2018-03-30 2021-07-07 FUJIFILM Corporation NEGATIVE LIGHT SENSITIVE COMPOSITION FOR EUV LIGHT, METHOD OF PATTERN SHAPING AND METHOD OF MANUFACTURING AN ELECTRONIC DEVICE
CN120136703A (zh) * 2019-08-09 2025-06-13 三菱瓦斯化学株式会社 化合物、聚合物、组合物、膜形成用组合物、图案形成方法、绝缘膜的形成方法及化合物的制造方法
TWI849314B (zh) * 2020-06-01 2024-07-21 日商住友化學股份有限公司 化合物、樹脂、抗蝕劑組成物及抗蝕劑圖案的製造方法
JP7814674B2 (ja) * 2020-12-21 2026-02-17 三菱瓦斯化学株式会社 化合物、重合体、組成物、膜形成用組成物、パターンの形成方法、絶縁膜の形成方法及び化合物の製造方法

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