TW202413078A - optical laminate - Google Patents

optical laminate Download PDF

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TW202413078A
TW202413078A TW112119513A TW112119513A TW202413078A TW 202413078 A TW202413078 A TW 202413078A TW 112119513 A TW112119513 A TW 112119513A TW 112119513 A TW112119513 A TW 112119513A TW 202413078 A TW202413078 A TW 202413078A
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substrate
surface protection
protection film
present
meth
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TW112119513A
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Chinese (zh)
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小川圭太
浦上和也
石﨑優
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日商日東電工股份有限公司
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Abstract

本發明提供一種即便隔著表面保護膜,色相、亮度不均之檢查性亦優異之包含表面保護膜及偏光板之光學積層體。 本發明之實施方式之光學積層體包含表面保護膜及光學構件,該表面保護膜具有基材及黏著劑層,該光學構件具有偏光板,該表面保護膜之正面相位差R0為R0≦2500 nm或R0≧3000 nm,該偏光板之吸收軸與該表面保護膜所具有之基材之慢軸所成的角度為30°以下。 The present invention provides an optical laminate including a surface protection film and a polarizing plate, which has excellent hue and brightness unevenness inspection performance even through the surface protection film. The optical laminate of the embodiment of the present invention includes a surface protection film and an optical component, the surface protection film has a substrate and an adhesive layer, the optical component has a polarizing plate, the front phase difference R0 of the surface protection film is R0≦2500 nm or R0≧3000 nm, and the angle between the absorption axis of the polarizing plate and the slow axis of the substrate of the surface protection film is less than 30°.

Description

光學積層體Optical laminate

本發明係關於一種光學積層體。The present invention relates to an optical multilayer body.

於顯示器或攝像裝置等光學設備、電子設備、作為該等設備之構成零件之膜或玻璃材料等之表面,出於保護表面或賦予耐衝擊性等目的而設置有表面保護膜。作為表面保護膜,就代表性而言,有於設備之組裝、加工、運輸等使用前之狀態下暫時黏著並在使用設備前再剝離者(用作工程材料者)、於使用設備時亦以貼附至設備表面之狀態使用者(以永久接著為目的者)(例如,參照專利文獻1)。Surface protection films are provided on the surfaces of optical devices such as displays and camera devices, electronic devices, and films or glass materials that are components of such devices for the purpose of protecting the surface or imparting impact resistance. Surface protection films are typically those that are temporarily adhered to the device before use such as assembly, processing, and transportation of the device and then peeled off before the device is used (those used as engineering materials), and those that are also attached to the surface of the device when the device is used (those for the purpose of permanent adhesion) (for example, refer to Patent Document 1).

用作工程材料之表面保護膜及用以永久接著之表面保護膜均於膜基材之主面具備黏著劑層,並經由該黏著劑層貼合於作為保護對象之被黏著體之表面(例如,參照專利文獻2)。The surface protection film used as an engineering material and the surface protection film used for permanent bonding are both provided with an adhesive layer on the main surface of the film substrate, and are adhered to the surface of the adherend as the protection object through the adhesive layer (for example, refer to patent document 2).

慣例上,一般會對液晶顯示裝置等包含偏光板之光學構件進行檢查以評價色相、亮度不均。然而,先前,對在包含偏光板之光學構件貼合有表面保護膜之光學積層體,隔著表面保護膜進行色相、亮度不均之檢查之情形時,有時因表面保護膜所具有之各向異性等,而無法進行適當之檢查。 [先前技術文獻] [專利文獻] Conventionally, optical components including polarizing plates such as liquid crystal display devices are generally inspected to evaluate hue and brightness unevenness. However, in the past, when an optical laminate having a surface protective film attached to an optical component including a polarizing plate is inspected for hue and brightness unevenness through the surface protective film, it is sometimes impossible to perform a proper inspection due to the anisotropy of the surface protective film. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利第3518677號公報 [專利文獻2]日本專利第6249617號公報 [Patent document 1] Japanese Patent No. 3518677 [Patent document 2] Japanese Patent No. 6249617

[發明所欲解決之問題][The problem the invention is trying to solve]

本發明之問題在於提供一種即便隔著表面保護膜,色相、亮度不均之檢查性亦優異之包含表面保護膜及偏光板之光學積層體。 [解決問題之技術手段] The problem of the present invention is to provide an optical laminate including a surface protection film and a polarizing plate, which has excellent hue and brightness unevenness inspection performance even through the surface protection film. [Technical means for solving the problem]

[1]本發明之實施方式之光學積層體包含表面保護膜及光學構件,該表面保護膜具有基材及黏著劑層,該光學構件具有偏光板,該表面保護膜之正面相位差R0為R0≦2500 nm或R0≧3000 nm,該偏光板之吸收軸與該表面保護膜所具有之基材之慢軸所成之角度為30°以下。 [2]如上述[1]所記載之光學積層體,其中上述光學積層體之RGB標準偏差可為9.50以下。 [3]如上述[1]或[2]所記載之光學積層體,其中上述光學積層體之色散熵S CD可為2.52×10 -14以上。 [發明之效果] [1] The optical multilayer of the embodiment of the present invention comprises a surface protection film and an optical component, wherein the surface protection film has a substrate and an adhesive layer, and the optical component has a polarizing plate, the front phase difference R0 of the surface protection film is R0≦2500 nm or R0≧3000 nm, and the angle between the absorption axis of the polarizing plate and the slow axis of the substrate of the surface protection film is less than 30°. [2] The optical multilayer as described in [1] above, wherein the RGB standard deviation of the optical multilayer can be less than 9.50. [3] The optical multilayer as described in [1] or [2] above, wherein the dispersion entropy SCD of the optical multilayer can be greater than 2.52× 10-14 . [Effects of the Invention]

根據本發明,可提供一種即便隔著表面保護膜,色相、亮度不均之檢查性亦優異之包含表面保護膜及偏光板之光學積層體。According to the present invention, an optical laminate including a surface protection film and a polarizing plate can be provided, which has excellent inspection performance for color and brightness unevenness even through the surface protection film.

於本說明書中表示為「質量」之情形亦可替換成先前一般常用作重量單位之「重量」,反之,於本說明書中表示為「重量」之情形亦可替換成常用作表示重量之SI系單位之「質量」。The "mass" in this manual may be replaced by the "weight" which is a commonly used unit of weight. Conversely, the "weight" in this manual may be replaced by the "mass" which is a commonly used SI unit of weight.

於本說明書中,「慢軸與長度方向(MD方向)所成之角度」之情形時之該角度意指以長度方向(MD方向)為基準於逆時針方向所成之角度。In this specification, the angle "formed by the slow axis and the longitudinal direction (MD direction)" means the angle formed in the counterclockwise direction with respect to the longitudinal direction (MD direction).

於本說明書中表示為「(甲基)丙烯酸」之情形意指「丙烯酸及/或甲基丙烯酸」,表示為「(甲基)丙烯酸酯」之情形意指「丙烯酸酯及/或甲基丙烯酸酯」,表示為「(甲基)烯丙基」之情形意指「烯丙基及/或甲基烯丙基」,表示為「(甲基)丙烯醛」之情形意指「丙烯醛及/或甲基丙烯醛」。In this specification, “(meth)acrylic acid” means “acrylic acid and/or methacrylic acid”, “(meth)acrylate” means “acrylate and/or methacrylate”, “(meth)allyl” means “allyl and/or methallyl”, and “(meth)acrolein” means “acrolein and/or methacrolein”.

本發明之實施方式之光學積層體包含表面保護膜及光學構件。表面保護膜具有基材及黏著劑層。光學構件具有偏光板。The optical laminate of the embodiment of the present invention comprises a surface protection film and an optical component. The surface protection film has a substrate and an adhesive layer. The optical component has a polarizing plate.

圖1係本發明之光學積層體之一實施方式,光學積層體1000包含表面保護膜100及光學構件200,該表面保護膜100具有基材10及黏著劑層20。FIG. 1 shows an embodiment of the optical laminate of the present invention. The optical laminate 1000 includes a surface protection film 100 and an optical component 200. The surface protection film 100 has a substrate 10 and an adhesive layer 20.

本發明之實施方式之光學積層體只要包含表面保護膜及光學構件即可,亦可於無損本發明之效果之範圍內包含任意適當之其他層。The optical laminate of the embodiment of the present invention only needs to include a surface protection film and an optical component, and may also include any other appropriate layers within the scope that does not impair the effect of the present invention.

此種其他層例如可例舉玻璃、顯示器、攝像裝置、透鏡、(半)反射鏡。Examples of such other layers include glass, displays, cameras, lenses, and (semi) mirrors.

本發明之實施方式之光學積層體亦可於無損本發明之效果之範圍內包含任意適當之添加劑。The optical layered body of the embodiment of the present invention may also contain any appropriate additives within the scope that does not impair the effect of the present invention.

此種添加劑例如可例舉:抗氧化劑、紫外線吸收劑、光穩定劑、成核劑、填充劑、顏料、界面活性劑、抗靜電劑。Examples of such additives include antioxidants, ultraviolet absorbers, light stabilizers, nucleating agents, fillers, pigments, surfactants, and antistatic agents.

本發明之實施方式之光學積層體之總厚度可根據光學構件之種類採用任意適當之厚度。典型而言,本發明之實施方式之光學積層體之總厚度較佳為10 μm~1000 μm,更佳為25 μm~800 μm,進而較佳為30 μm~800 μm,進而較佳為40 μm~700 μm,進而較佳為40 μm~600 μm,尤佳為50 μm~500 μm,最佳為100 μm~500 μm。The total thickness of the optical laminate of the embodiment of the present invention can be any appropriate thickness according to the type of optical component. Typically, the total thickness of the optical laminate of the embodiment of the present invention is preferably 10 μm to 1000 μm, more preferably 25 μm to 800 μm, further preferably 30 μm to 800 μm, further preferably 40 μm to 700 μm, further preferably 40 μm to 600 μm, particularly preferably 50 μm to 500 μm, and most preferably 100 μm to 500 μm.

本發明之實施方式之光學積層體中,偏光板之吸收軸與表面保護膜所具有之基材之慢軸所成之角度為30°以下。若偏光板之吸收軸與表面保護膜所具有之基材之慢軸所成之角度處於此種範圍內,則可進一步呈現本發明之效果。就可進一步呈現本發明之效果之方面而言,偏光板之吸收軸與表面保護膜所具有之基材之慢軸所成之角度較佳為25°以下,更佳為20°以下,進而較佳為15°以下,進而較佳為10°以下,進而較佳為5°以下,尤佳為2°以下,最佳為1°以下。再者,本發明中所謂之「偏光板之吸收軸與表面保護膜所具有之基材之慢軸所成之角度」係指因偏光板之吸收軸與表面保護膜所具有之基材之慢軸的交叉而形成之4個部位之角度中90°以下之角度。In the optical multilayer of the embodiment of the present invention, the angle formed by the absorption axis of the polarizing plate and the slow axis of the substrate possessed by the surface protection film is 30° or less. If the angle formed by the absorption axis of the polarizing plate and the slow axis of the substrate possessed by the surface protection film is within this range, the effect of the present invention can be further demonstrated. In terms of further demonstrating the effect of the present invention, the angle formed by the absorption axis of the polarizing plate and the slow axis of the substrate possessed by the surface protection film is preferably 25° or less, more preferably 20° or less, further preferably 15° or less, further preferably 10° or less, further preferably 5° or less, particularly preferably 2° or less, and most preferably 1° or less. Furthermore, the "angle formed by the absorption axis of the polarizing plate and the slow axis of the substrate possessed by the surface protection film" in the present invention refers to the angle of less than 90° among the four angles formed by the intersection of the absorption axis of the polarizing plate and the slow axis of the substrate possessed by the surface protection film.

本發明之實施方式之光學積層體之RGB標準偏差越小越好,較佳為9.50以下,更佳為9.40以下,進而較佳為9.30以下,進而較佳為9.20以下,進而較佳為9.17以下,進而較佳為9.14以下,尤佳為9.11以下,最佳為9.10以下。藉由RGB標準偏差處於上述範圍內,可進一步呈現本發明之效果。The smaller the RGB standard deviation of the optical multilayer of the embodiment of the present invention, the better, preferably 9.50 or less, more preferably 9.40 or less, further preferably 9.30 or less, further preferably 9.20 or less, further preferably 9.17 or less, further preferably 9.14 or less, particularly preferably 9.11 or less, and most preferably 9.10 or less. By the RGB standard deviation being within the above range, the effect of the present invention can be further demonstrated.

本發明之實施方式之光學積層體之色散熵S CD越大越好,較佳為2.52×10 -14以上,更佳為2.53×10 -14以上,進而較佳為2.54×10 -14以上,尤佳為2.55×10 -14以上。藉由色散熵S CD處於上述範圍內,可進一步呈現本發明之效果。 The larger the dispersion entropy S CD of the optical multilayer of the embodiment of the present invention, the better, preferably 2.52×10 -14 or more, more preferably 2.53×10 -14 or more, further preferably 2.54×10 -14 or more, and particularly preferably 2.55×10 -14 or more. When the dispersion entropy S CD is within the above range, the effect of the present invention can be further demonstrated.

本發明之實施方式之光學積層體中,RGB標準偏差/色散熵S CD較佳為3.50×10 14~3.80×10 14,更佳為3.52×10 14~3.70×10 14,進而較佳為3.53×10 14~3.65×10 14,尤佳為3.53×10 14~3.60×10 14,最佳為3.53×10 14~3.57×10 14。藉由RGB標準偏差/色散熵S CD處於上述範圍內,可進一步呈現本發明之效果。 In the optical laminate of the embodiment of the present invention, the RGB standard deviation/dispersion entropy S CD is preferably 3.50×10 14 ~3.80×10 14 , more preferably 3.52×10 14 ~3.70×10 14 , further preferably 3.53×10 14 ~3.65×10 14 , particularly preferably 3.53×10 14 ~3.60×10 14 , and most preferably 3.53×10 14 ~3.57×10 14 . When the RGB standard deviation/dispersion entropy S CD is within the above range, the effect of the present invention can be further demonstrated.

≪≪表面保護膜≫≫ 表面保護膜通常具有基材及黏著劑層。 ≪≪Surface protection film≫≫ Surface protection film usually has a base material and an adhesive layer.

表面保護膜亦可於無損本發明之效果之範圍內具有除基材及黏著劑層以外之任意適當之其他層。The surface protection film may also have any other appropriate layers in addition to the substrate and the adhesive layer within the scope that does not impair the effects of the present invention.

此種其他層例如可例舉:易接著層、易滑層、抗黏連層、抗靜電層、抗反射層、抗低聚物層。Such other layers include, for example, an easy-adhesion layer, an easy-slip layer, an anti-adhesion layer, an anti-static layer, an anti-reflection layer, and an anti-oligomer layer.

於本發明之實施方式之表面保護膜中,為了黏著劑層之保護等,亦可於黏著劑層之與基材為相反側之表面設置剝離襯墊。該剝離襯墊通常於使用本發明之實施方式之表面保護膜時剝離。In the surface protection film of the embodiment of the present invention, a peeling pad may be provided on the surface of the adhesive layer opposite to the substrate for the purpose of protecting the adhesive layer. The peeling pad is usually peeled off when the surface protection film of the embodiment of the present invention is used.

表面保護膜亦可於無損本發明之效果之範圍內包含任意適當之添加劑。The surface protection film may also contain any appropriate additives within the scope that does not impair the effects of the present invention.

此種添加劑例如可例舉:抗氧化劑、紫外線吸收劑、光穩定劑、成核劑、填充劑、顏料、界面活性劑、抗靜電劑。Examples of such additives include antioxidants, ultraviolet absorbers, light stabilizers, nucleating agents, fillers, pigments, surfactants, and antistatic agents.

如圖1所示,表面保護膜之一實施方式中,表面保護膜100包含基材10及黏著劑層20。As shown in FIG. 1 , in one embodiment of a surface protection film, the surface protection film 100 includes a substrate 10 and an adhesive layer 20 .

表面保護膜之正面相位差R0較佳為R0≦2500 nm或R0≧3000 nm,更佳為R0≦2500 nm或R0≧4000 nm,進而較佳為R0≦2300 nm或R0≧4500 nm,進而較佳為R0≦2100 nm或R0≧5000 nm,進而較佳為R0≦1900 nm或R0≧5500 nm,尤佳為R0≦1700 nm或R0≧5500 nm,最佳為R0≦1700 nm或R0≧6000 nm。藉由將表面保護膜之面內相位差調整至上述範圍內,可進一步呈現本發明之效果。再者,於本發明之說明中,上述正面相位差R0之較佳範圍之規定係例如以「R0≦2500 nm或R0≧3000 nm」之形式以規定值以下或規定值以上之組合分段記載,但上述正面相位差R0之較佳之範圍並不限定於所記載之組合,例如,亦可為「R0≦1900 nm」之範圍與「R0≧4500 nm」之範圍之組合(「R0≦1900 nm或R0≧4500 nm」)。又,關於以規定值以下或規定值以上之組合分段記載之規定,例如於規定為「R0≦2500 nm或R0≧3000 nm」之情形時,如其所言意指「R0≦2500 nm」或「R0≧3000 nm」。再者,關於本發明之實施方式之表面保護膜之正面相位差R0之測定,於預先於表面保護膜之黏著劑層之與基材為相反側之表面設置有剝離襯墊之情形時係對剝離該剝離襯墊後者進行測定。The front phase difference R0 of the surface protection film is preferably R0≦2500 nm or R0≧3000 nm, more preferably R0≦2500 nm or R0≧4000 nm, further preferably R0≦2300 nm or R0≧4500 nm, further preferably R0≦2100 nm or R0≧5000 nm, further preferably R0≦1900 nm or R0≧5500 nm, particularly preferably R0≦1700 nm or R0≧5500 nm, and most preferably R0≦1700 nm or R0≧6000 nm. By adjusting the in-plane phase difference of the surface protection film to the above range, the effect of the present invention can be further demonstrated. Furthermore, in the description of the present invention, the preferred range of the above-mentioned front phase difference R0 is specified, for example, in the form of "R0≦2500 nm or R0≧3000 nm" in segments with combinations below or above the specified value, but the above-mentioned preferred range of the front phase difference R0 is not limited to the specified combinations, for example, it can also be a combination of the range of "R0≦1900 nm" and the range of "R0≧4500 nm" ("R0≦1900 nm or R0≧4500 nm"). In addition, regarding the provisions described in sections with a combination of below or above a specified value, for example, when the provision is "R0≦2500 nm or R0≧3000 nm", it means "R0≦2500 nm" or "R0≧3000 nm". Furthermore, regarding the measurement of the front phase difference R0 of the surface protection film of the embodiment of the present invention, when a peeling pad is provided in advance on the surface of the adhesive layer of the surface protection film on the opposite side to the substrate, the measurement is performed after the peeling pad is peeled off.

於表面保護膜之正面相位差R0為R0≦2500 nm之情形時,其下限值越小越好,但鑒於材料選擇等因素,現實中較佳為100 nm以上。When the front phase difference R0 of the surface protection film is R0≦2500 nm, the lower limit value is as small as possible, but in practice it is preferably above 100 nm due to factors such as material selection.

於表面保護膜之正面相位差R0為R0≧3000 nm之情形時,其上限值越大越好,但鑒於材料選擇等因素,現實中較佳為30000 nm以下。When the front phase difference R0 of the surface protection film is R0≧3000 nm, the upper limit value is as large as possible, but in practice it is preferably below 30000 nm due to factors such as material selection.

≪基材≫ 基材可為由1層構成之基材,亦可為由2層以上之積層構造構成之基材。 ≪Base material≫ The base material may be a base material composed of one layer or a base material composed of a layered structure of two or more layers.

基材之厚度可於無損本發明之效果之範圍內採用任意適當之厚度。就可進一步呈現本發明之效果之方面而言,基材之厚度較佳為5 μm~1000 μm,更佳為10 μm~800 μm,進而較佳為20 μm~600 μm,尤佳為30 μm~400 μm。The thickness of the substrate can be any appropriate thickness within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the thickness of the substrate is preferably 5 μm to 1000 μm, more preferably 10 μm to 800 μm, further preferably 20 μm to 600 μm, and particularly preferably 30 μm to 400 μm.

基材之正面相位差R0較佳為R0≦2500 nm或R0≧3000 nm,更佳為R0≦2500 nm或R0≧4000 nm,進而較佳為R0≦2300 nm或R0≧4500 nm,進而較佳為R0≦2100 nm或R0≧5000 nm,進而較佳為R0≦1900 nm或R0≧5500 nm,尤佳為R0≦1700 nm或R0≧5500 nm,最佳為R0≦1700 nm或R0≧6000 nm。藉由採用此種基材,可進一步呈現本發明之效果。再者,於本發明之說明中,上述正面相位差R0之較佳之範圍之規定係例如以「R0≦2500 nm或R0≧3000 nm」之形式以規定值以下或規定值以上之組合分段記載,但上述正面相位差R0之較佳之範圍並不限定於所記載之組合,例如亦可為「R0≦1900 nm」之範圍與「R0≧4500 nm」之範圍之組合(「R0≦1900 nm或R0≧4500 nm」)。又,關於以規定值以下或規定值以上之組合分段記載之規定,例如於規定為「R0≦2500 nm或R0≧3000 nm」之情形時,如其所言意指「R0≦2500 nm」或「R0≧3000 nm」。The front phase difference R0 of the substrate is preferably R0≦2500 nm or R0≧3000 nm, more preferably R0≦2500 nm or R0≧4000 nm, further preferably R0≦2300 nm or R0≧4500 nm, further preferably R0≦2100 nm or R0≧5000 nm, further preferably R0≦1900 nm or R0≧5500 nm, particularly preferably R0≦1700 nm or R0≧5500 nm, and most preferably R0≦1700 nm or R0≧6000 nm. By adopting such a substrate, the effect of the present invention can be further demonstrated. Furthermore, in the description of the present invention, the preferred range of the above-mentioned front phase difference R0 is specified, for example, in the form of "R0≦2500 nm or R0≧3000 nm" in combination of below or above the specified value, but the above-mentioned preferred range of the front phase difference R0 is not limited to the specified combination, for example, it can also be a combination of the range of "R0≦1900 nm" and the range of "R0≧4500 nm" ("R0≦1900 nm or R0≧4500 nm"). Furthermore, regarding regulations that are described in sections with a combination of values below or above a prescribed value, for example, when the regulation reads “R0≦2500 nm or R0≧3000 nm”, it means “R0≦2500 nm” or “R0≧3000 nm” as stated.

於基材之正面相位差R0為R0≦2500 nm之情形時,其下限值越小越好,但鑒於材料選擇等因素,現實中較佳為100 nm以上。When the front phase difference R0 of the substrate is R0≦2500 nm, the lower limit value is as small as possible, but in practice it is preferably above 100 nm due to factors such as material selection.

於基材之正面相位差R0為R0≧3000 nm之情形時,其上限值越大越好,但鑒於材料選擇等因素,現實中較佳為30000 nm以下。When the front phase difference R0 of the substrate is R0≧3000 nm, the upper limit value is as large as possible. However, in practice, it is preferably below 30000 nm due to factors such as material selection.

作為獲得正面相位差R0處於上述範圍內之基材之方法,可於無損本發明之效果之範圍內採用任意適當之方法。此種方法例如可例舉:使將塑膠作為材料之基材延伸之方法、利用超雙折射膜之方法、使將塑膠作為材料之基材積層2層以上之方法、利用正面相位差R0為R0≦2600 nm之晶質PET(聚對苯二甲酸乙二酯)基材之方法。As a method for obtaining a substrate having a front phase difference R0 within the above range, any appropriate method can be adopted within the range that does not impair the effect of the present invention. Such methods include, for example, a method of stretching a substrate made of plastic, a method of using a super birefringent film, a method of laminating a substrate made of plastic with two or more layers, and a method of using a crystalline PET (polyethylene terephthalate) substrate having a front phase difference R0 of R0≦2600 nm.

作為基材之材料,可於無損本發明之效果之範圍內採用任意適當之材料。就可進一步呈現本發明之效果之方面而言,此種材料較佳為例舉塑膠。As the material of the substrate, any appropriate material can be used within the scope of not damaging the effect of the present invention. In terms of further demonstrating the effect of the present invention, such material is preferably exemplified by plastic.

作為塑膠,可於無損本發明之效果之範圍內採用任意適當之塑膠。就可進一步呈現本發明之效果之方面而言,此種塑膠較佳為例舉熱塑性樹脂。As the plastic, any appropriate plastic can be used within the scope of not impairing the effect of the present invention. In terms of further demonstrating the effect of the present invention, such plastic is preferably exemplified by a thermoplastic resin.

熱塑性樹脂例如可例舉:聚酯、丙烯酸系樹脂、胺基甲酸酯系樹脂、聚碳酸酯、三乙醯纖維素(TAC)、聚烯烴(烯烴均聚物、烯烴與其他單體之共聚物)、聚醯胺(尼龍)、全芳香族聚醯胺(aramid)、聚醯亞胺(PI)、聚氯乙烯(PVC)、聚乙酸乙烯酯、環狀烯烴系聚合物。Examples of thermoplastic resins include polyester, acrylic resin, urethane resin, polycarbonate, triacetyl cellulose (TAC), polyolefins (olefin homopolymers, copolymers of olefins and other monomers), polyamide (nylon), wholly aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyvinyl acetate, and cyclic olefin polymers.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂較佳為聚酯。聚酯例如可例舉聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯(PBT),就可進一步呈現本發明之效果之方面而言,較佳為聚對苯二甲酸乙二酯(PET)。In terms of further demonstrating the effects of the present invention, the thermoplastic resin is preferably polyester. Examples of polyester include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene terephthalate (PBT). In terms of further demonstrating the effects of the present invention, polyethylene terephthalate (PET) is preferred.

<基材之一較佳實施方式A> 基材之一較佳實施方式A為經延伸之熱塑性樹脂基材。以下,有時將用於延伸之熱塑性樹脂基材簡稱為「熱塑性樹脂基材」,將經延伸之熱塑性樹脂基材稱為「延伸熱塑性樹脂基材」。 <One preferred embodiment A of the substrate> One preferred embodiment A of the substrate is a stretched thermoplastic resin substrate. Hereinafter, the thermoplastic resin substrate used for stretching is sometimes referred to as a "thermoplastic resin substrate", and the stretched thermoplastic resin substrate is sometimes referred to as a "stretched thermoplastic resin substrate".

作為實施方式A之延伸熱塑性樹脂基材之厚度可於無損本發明之效果之範圍內採用任意適當之厚度。就可進一步呈現本發明之效果之方面而言,延伸熱塑性樹脂基材之厚度較佳為1 μm~100 μm,更佳為2 μm~80 μm,進而較佳為3 μm~70 μm,尤佳為5 μm~60 μm。The thickness of the stretched thermoplastic resin substrate of embodiment A can be any appropriate thickness within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the thickness of the stretched thermoplastic resin substrate is preferably 1 μm to 100 μm, more preferably 2 μm to 80 μm, further preferably 3 μm to 70 μm, and particularly preferably 5 μm to 60 μm.

延伸熱塑性樹脂基材之正面相位差R0較佳為R0≦2500 nm,更佳為R0≦2100 nm,進而較佳為R0≦1700 nm,進而較佳為R0≦1300 nm,進而較佳為R0≦1000 nm,尤佳為R0≦800 nm,最佳為R0≦700 nm。若延伸熱塑性樹脂基材之正面相位差R0處於上述範圍內,則可進一步呈現本發明之效果。The front phase difference R0 of the stretched thermoplastic resin substrate is preferably R0≦2500 nm, more preferably R0≦2100 nm, further preferably R0≦1700 nm, further preferably R0≦1300 nm, further preferably R0≦1000 nm, particularly preferably R0≦800 nm, and most preferably R0≦700 nm. If the front phase difference R0 of the stretched thermoplastic resin substrate is within the above range, the effect of the present invention can be further demonstrated.

延伸熱塑性樹脂基材之正面相位差R0之下限值越小越好,但鑒於材料選擇等因素,現實中較佳為100 nm以上。The lower limit of the front phase difference R0 of the stretched thermoplastic resin substrate is as small as possible, but in practice it is preferably above 100 nm due to factors such as material selection.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂基材較佳為具有規定範圍之吸水率。熱塑性樹脂基材之吸水率較佳為0.2%以上,更佳為0.3%以上。具有此種吸水率之熱塑性樹脂基材可於下述水中延伸中吸收水,水發揮如塑化劑之作用而塑化。其結果為可大幅降低延伸應力,可高倍率地進行延伸,熱塑性樹脂基材之延伸性可較下述空中延伸時優異。若使此種熱塑性樹脂基材延伸,則可成為具有優異光學特性之基材,因此可進一步呈現本發明之效果。另一方面,熱塑性樹脂基材之吸水率較佳為3.0%以下,更佳為1.0%以下。具有此種吸水率之熱塑性樹脂基材之尺寸穩定性優異,故而可防止將此種熱塑性樹脂基材延伸後之延伸熱塑性樹脂基材之外觀變差等不良情形,又,於下述水中延伸步驟中,可防止基材斷裂。再者,吸水率係依據JIS K 7209所求得之值。In order to further demonstrate the effects of the present invention, the thermoplastic resin substrate preferably has a water absorption rate within a specified range. The water absorption rate of the thermoplastic resin substrate is preferably 0.2% or more, and more preferably 0.3% or more. The thermoplastic resin substrate with such a water absorption rate can absorb water during the following underwater stretching, and the water acts like a plasticizer and plasticizes. As a result, the stretching stress can be greatly reduced, and the stretching can be performed at a high rate. The stretchability of the thermoplastic resin substrate can be better than the following aerial stretching. If such a thermoplastic resin substrate is stretched, it can become a substrate with excellent optical properties, so that the effects of the present invention can be further demonstrated. On the other hand, the water absorption rate of the thermoplastic resin substrate is preferably 3.0% or less, and more preferably 1.0% or less. The thermoplastic resin substrate having such a water absorption rate has excellent dimensional stability, so that it is possible to prevent the appearance of the stretched thermoplastic resin substrate from being deteriorated after stretching the thermoplastic resin substrate, and to prevent the substrate from being broken in the following underwater stretching step. The water absorption rate is a value obtained in accordance with JIS K 7209.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂基材較佳為具有規定範圍之玻璃轉移溫度(Tg)。熱塑性樹脂基材之玻璃轉移溫度(Tg)較佳為170℃以下。藉由使用此種熱塑性樹脂基材,可呈現優異之延伸性。進而,若考慮到順利地進行利用水之熱塑性樹脂基材之塑化、及水中延伸,則熱塑性樹脂基材之玻璃轉移溫度(Tg)較佳為120℃以下。另一方面,熱塑性樹脂基材之玻璃轉移溫度(Tg)較佳為60℃以上。藉由使用此種熱塑性樹脂基材,可防止熱塑性樹脂基材之變形(例如,凹凸、鬆弛、或皺褶等之產生)等不良情形。再者,玻璃轉移溫度(Tg)係依據JIS K 7121所求得之值。In order to further demonstrate the effects of the present invention, the thermoplastic resin substrate preferably has a glass transition temperature (Tg) within a specified range. The glass transition temperature (Tg) of the thermoplastic resin substrate is preferably below 170°C. By using such a thermoplastic resin substrate, excellent elongation can be exhibited. Furthermore, considering the smooth plasticization of the thermoplastic resin substrate using water and the elongation in water, the glass transition temperature (Tg) of the thermoplastic resin substrate is preferably below 120°C. On the other hand, the glass transition temperature (Tg) of the thermoplastic resin substrate is preferably above 60°C. By using such a thermoplastic resin substrate, deformation of the thermoplastic resin substrate (for example, the generation of bumps, sagging, or wrinkles) and other undesirable conditions can be prevented. The glass transition temperature (Tg) is a value obtained according to JIS K 7121.

作為熱塑性樹脂基材之材料,就可進一步呈現本發明之效果之方面而言,較佳為例舉熱塑性樹脂基材之吸水率及玻璃轉移溫度處於上述範圍內材料。吸水率例如可藉由向材料導入改性基而進行調整。玻璃轉移溫度例如可藉由向材料導入改性基、或使用結晶材料並進行加熱而進行調整。As the material of the thermoplastic resin substrate, in order to further demonstrate the effects of the present invention, it is preferred that the water absorption rate and glass transition temperature of the thermoplastic resin substrate be within the above ranges. The water absorption rate can be adjusted by, for example, introducing a modifying group into the material. The glass transition temperature can be adjusted by, for example, introducing a modifying group into the material, or using a crystallized material and heating it.

作為熱塑性樹脂基材之材料,就可進一步呈現本發明之效果之方面而言,較佳為例舉聚對苯二甲酸乙二酯(PET)系樹脂,更佳為例舉非晶質(不會結晶)之聚對苯二甲酸乙二酯(PET)系樹脂,進而較佳為例舉非晶性(不易結晶)之聚對苯二甲酸乙二酯(PET)系樹脂。作為非晶性之聚對苯二甲酸乙二酯(PET)系樹脂之具體例,例如可例舉進而包含作為二羧酸之間苯二甲酸之共聚物、或進而包含作為二醇之環己烷二甲醇之共聚物。As the material of the thermoplastic resin substrate, in terms of further demonstrating the effects of the present invention, preferably, for example, a polyethylene terephthalate (PET) resin is used, more preferably, an amorphous (non-crystallizable) polyethylene terephthalate (PET) resin is used, and further preferably, an amorphous (non-crystallizable) polyethylene terephthalate (PET) resin is used. Specific examples of amorphous polyethylene terephthalate (PET) resins include copolymers further including isophthalic acid as a dicarboxylic acid, or copolymers further including cyclohexanedimethanol as a diol.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂基材之厚度(延伸前之厚度)較佳為10 μm~500 μm,更佳為20 μm~400 μm,進而較佳為30 μm~300 μm,尤佳為50 μm~200 μm。In order to further demonstrate the effects of the present invention, the thickness of the thermoplastic resin substrate (thickness before stretching) is preferably 10 μm to 500 μm, more preferably 20 μm to 400 μm, further preferably 30 μm to 300 μm, and particularly preferably 50 μm to 200 μm.

具有代表性之熱塑性樹脂基材之延伸為使用水浴作為延伸浴之水中延伸(濕式延伸)。藉由採用水中延伸,若熱塑性樹脂基材具有上述吸水率,則水可發揮如塑化劑之作用而塑化。其結果為可大幅降低延伸應力,可高倍率地進行延伸,熱塑性樹脂基材之延伸性可較下述空中延伸時優異。因此,由於獲得具有優異之光學特性之基材,故而可進一步呈現本發明之效果。又,藉由採用水中延伸,可於較熱塑性樹脂基材之玻璃轉移溫度低之溫度下高倍率地進行延伸。A typical stretching method for thermoplastic resin substrates is underwater stretching (wet stretching) using a water bath as a stretching bath. By adopting underwater stretching, if the thermoplastic resin substrate has the above-mentioned water absorption rate, water can play a role like a plasticizer and plasticize. As a result, the stretching stress can be greatly reduced, and stretching can be performed at a high rate. The stretchability of the thermoplastic resin substrate can be better than the following aerial stretching. Therefore, since a substrate with excellent optical properties is obtained, the effect of the present invention can be further demonstrated. In addition, by adopting underwater stretching, stretching can be performed at a high rate at a temperature lower than the glass transition temperature of the thermoplastic resin substrate.

熱塑性樹脂基材之延伸方向較佳為長條狀之熱塑性樹脂基材之橫向(短邊方向)。The extending direction of the thermoplastic resin substrate is preferably the lateral direction (short side direction) of the long strip-shaped thermoplastic resin substrate.

作為水中延伸之延伸方法,可於無損本發明之效果之範圍內採用任意適當之方法。此種延伸方法例如可例舉固定端延伸、自由端延伸(例如,使積層體於周速不同之輥間通過而進行單軸延伸之方法)。延伸可以一階段進行,亦可以多階段進行。於多階段地進行之情形時,延伸倍率(最大延伸倍率)為各階段之延伸倍率之積。As a stretching method for underwater stretching, any appropriate method can be adopted within the scope that does not impair the effect of the present invention. Such stretching methods include fixed end stretching and free end stretching (for example, a method of uniaxial stretching by passing the laminate between rollers with different circumferential speeds). Stretching can be performed in one stage or in multiple stages. In the case of multiple stages, the stretching ratio (maximum stretching ratio) is the product of the stretching ratios of each stage.

水中延伸之延伸溫度(延伸浴之液溫)可於無損本發明之效果之範圍內採用任意適當之溫度。就可進一步呈現本發明之效果之方面而言,較佳為30℃以上,更佳為40℃~90℃,進而較佳為45℃~85℃,尤佳為50℃~80℃。若延伸浴之溫度過低,則即便考慮利用水使熱塑性樹脂基材塑化,亦有無法良好地進行延伸之虞。The stretching temperature (liquid temperature of the stretching bath) of the stretching in water can be any appropriate temperature within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, it is preferably 30°C or higher, more preferably 40°C to 90°C, further preferably 45°C to 85°C, and particularly preferably 50°C to 80°C. If the temperature of the stretching bath is too low, even if the thermoplastic resin substrate is plasticized by water, there is a risk that stretching cannot be performed well.

水中延伸之延伸時間可於無損本發明之效果之範圍內採用任意適當之時間。就可進一步呈現本發明之效果之方面而言,較佳為15秒~5分鐘。The extension time in water can be any appropriate time within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, it is preferably 15 seconds to 5 minutes.

水中延伸之最大延伸倍率相對於熱塑性樹脂基材之原始長度較佳為5.0倍以上。於本說明書中,「最大延伸倍率」係指基材即將斷裂前之延伸倍率,另行確認基材斷裂之延伸倍率,「最大延伸倍率」係指較該值低0.2之值。又,進行水中延伸時,最大延伸倍率會較僅以乾式延伸進行延伸時高。The maximum stretching ratio of underwater stretching is preferably 5.0 times or more relative to the original length of the thermoplastic resin substrate. In this specification, "maximum stretching ratio" refers to the stretching ratio before the substrate breaks. The stretching ratio at which the substrate breaks is confirmed separately, and "maximum stretching ratio" refers to a value 0.2 lower than this value. In addition, when underwater stretching is performed, the maximum stretching ratio will be higher than when stretching is performed only by dry stretching.

作為熱塑性樹脂基材之延伸,亦可將空中延伸(乾式延伸)與上述水中延伸進行組合。空中延伸可於無損本發明之效果之範圍內採用任意適當之延伸方法。藉由將空中延伸與水中延伸進行組合,可抑制熱塑性樹脂基材之配向同時進行延伸。熱塑性樹脂基材隨著其配向性提高而延伸張力變大,難以進行穩定之延伸或熱塑性樹脂基材斷裂。因此,可藉由在抑制熱塑性樹脂基材之配向之同時進行延伸,而更高倍率地進行延伸。其結果,可獲得具有更優異之光學特性之基材,因此可進一步呈現本發明之效果。As a stretching method for the thermoplastic resin substrate, aerial stretching (dry stretching) can be combined with the above-mentioned underwater stretching. Any appropriate stretching method can be adopted for aerial stretching within the scope that does not damage the effect of the present invention. By combining aerial stretching with underwater stretching, the stretching can be performed while suppressing the orientation of the thermoplastic resin substrate. As the orientation of the thermoplastic resin substrate increases, the stretching tension increases, making it difficult to perform stable stretching or the thermoplastic resin substrate breaks. Therefore, by performing stretching while suppressing the orientation of the thermoplastic resin substrate, it is possible to perform stretching at a higher magnification. As a result, a substrate with better optical properties can be obtained, thereby further demonstrating the effect of the present invention.

空中延伸之延伸方法與上述水中延伸同樣,可為固定端延伸,亦可為自由端延伸(例如,使積層體通過周速不同之輥間而進行單軸延伸之方法)。又,延伸可以一階段進行,亦可以多階段進行。於以多階段進行之情形時,延伸倍率為各階段之延伸倍率之積。延伸方向較佳為與上述水中延伸之延伸方向大致相同。The stretching method of aerial stretching is the same as the above-mentioned underwater stretching, and can be fixed-end stretching or free-end stretching (for example, a method of making the laminate pass between rollers with different circumferential speeds to perform uniaxial stretching). In addition, the stretching can be performed in one stage or in multiple stages. When it is performed in multiple stages, the stretching ratio is the product of the stretching ratios of each stage. The stretching direction is preferably substantially the same as the stretching direction of the above-mentioned underwater stretching.

空中延伸之延伸溫度可於無損本發明之效果之範圍內採用任意適當之溫度。就可進一步呈現本發明之效果之方面而言,空中延伸之延伸溫度較佳為95℃~150℃。The stretching temperature of the air stretching can be any appropriate temperature within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the stretching temperature of the air stretching is preferably 95°C to 150°C.

空中延伸之延伸時間可於無損本發明之效果之範圍內採用任意適當之時間。就可進一步呈現本發明之效果之方面而言,空中延伸之延伸時間較佳為15秒~5分鐘。The extension time of the aerial extension can be any appropriate time within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the extension time of the aerial extension is preferably 15 seconds to 5 minutes.

空中延伸之延伸倍率可於無損本發明之效果之範圍內採用任意適當之倍率。就可進一步呈現本發明之效果之方面而言,空中延伸之延伸倍率較佳為3.5倍以下。The stretching ratio of the mid-air stretching can be any appropriate ratio within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the stretching ratio of the mid-air stretching is preferably 3.5 times or less.

將空中延伸與水中延伸進行組合之情形時之最大延伸倍率相對於熱塑性樹脂基材之原始長度較佳為5.0倍以上,更佳為5.5倍以上,進而較佳為6.0倍以上。When the aerial stretching and the underwater stretching are combined, the maximum stretching ratio is preferably 5.0 times or more, more preferably 5.5 times or more, and further preferably 6.0 times or more relative to the original length of the thermoplastic resin substrate.

作為基材之一較佳實施方式A之經延伸之熱塑性樹脂基材亦可採用例如日本專利特開2012-73580號公報所記載之經延伸之熱塑性樹脂基材。The stretched thermoplastic resin substrate of the preferred embodiment A as the substrate may be, for example, the stretched thermoplastic resin substrate described in Japanese Patent Application Publication No. 2012-73580.

<基材之一較佳實施方式B> 基材之一較佳實施方式B為超雙折射膜基材。 <One of the preferred embodiments B of the substrate> One of the preferred embodiments B of the substrate is a super birefringent film substrate.

作為實施方式B之超雙折射膜基材之厚度可於無損本發明之效果之範圍內採用任意適當之厚度。就可進一步呈現本發明之效果之方面而言,超雙折射膜基材之厚度較佳為10 μm~500 μm,更佳為15 μm~300 μm,進而較佳為25 μm~200 μm,尤佳為30 μm~100 μm。The thickness of the super birefringent film substrate of embodiment B can be any appropriate thickness within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the thickness of the super birefringent film substrate is preferably 10 μm to 500 μm, more preferably 15 μm to 300 μm, further preferably 25 μm to 200 μm, and particularly preferably 30 μm to 100 μm.

超雙折射膜基材之正面相位差R0較佳為R0≧4000 nm,更佳為R0≧5000 nm,進而較佳為R0≧6000 nm,進而較佳為R0≧6500 nm,進而較佳為R0≧7000 nm,尤佳為R0≧7500 nm,最佳為R0≧8000 nm。若超雙折射膜基材之正面相位差R0處於上述範圍內,則可進一步呈現本發明之效果。The front phase difference R0 of the super birefringent film substrate is preferably R0≧4000 nm, more preferably R0≧5000 nm, further preferably R0≧6000 nm, further preferably R0≧6500 nm, further preferably R0≧7000 nm, particularly preferably R0≧7500 nm, and most preferably R0≧8000 nm. If the front phase difference R0 of the super birefringent film substrate is within the above range, the effect of the present invention can be further demonstrated.

超雙折射膜基材之正面相位差R0之上限值越大越好,但鑒於材料選擇等因素,現實中較佳為30000 nm以下。The upper limit of the front phase difference R0 of the super birefringent film substrate is as large as possible, but in practice it is preferably below 30,000 nm due to factors such as material selection.

作為超雙折射膜基材之材料,可於無損本發明之效果之範圍內採用任意適當之塑膠。就可進一步呈現本發明之效果之方面而言,此種塑膠較佳為例舉熱塑性樹脂。As the material of the super birefringent film substrate, any appropriate plastic can be used within the scope of not impairing the effect of the present invention. In terms of further demonstrating the effect of the present invention, such plastic is preferably exemplified by thermoplastic resin.

熱塑性樹脂例如可例舉:聚酯、丙烯酸系樹脂、胺基甲酸酯系樹脂、聚碳酸酯、三乙醯纖維素(TAC)、聚烯烴(烯烴均聚物、烯烴與其他單體之共聚物)、聚醯胺(尼龍)、全芳香族聚醯胺(aramid)、聚醯亞胺(PI)、聚氯乙烯(PVC)、聚乙酸乙烯酯、環狀烯烴系聚合物。Examples of thermoplastic resins include polyester, acrylic resin, urethane resin, polycarbonate, triacetyl cellulose (TAC), polyolefin (olefin homopolymer, copolymer of olefin and other monomers), polyamide (nylon), wholly aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyvinyl acetate, and cyclic olefin polymers.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂較佳為聚酯。聚酯例如可例舉聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯(PBT),就可進一步呈現本發明之效果之方面而言,較佳為聚對苯二甲酸乙二酯(PET)。In terms of further demonstrating the effects of the present invention, the thermoplastic resin is preferably polyester. Examples of polyester include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene terephthalate (PBT). In terms of further demonstrating the effects of the present invention, polyethylene terephthalate (PET) is preferred.

超雙折射膜基材亦可為經延伸之基材。The super birefringent film substrate may also be a stretched substrate.

<基材之一較佳實施方式C> 基材之一較佳實施方式C為以塑膠作為材料之基材之2層以上之積層體。以下,有時將以塑膠作為材料之基材稱為「塑膠基材」。 <One preferred embodiment C of the substrate> One preferred embodiment C of the substrate is a laminate of two or more layers of a substrate made of plastic. Hereinafter, a substrate made of plastic will sometimes be referred to as a "plastic substrate".

作為實施方式C之積層體之厚度可於無損本發明之效果之範圍內採用任意適當之厚度。就可進一步呈現本發明之效果之方面而言,作為實施方式C之積層體之厚度較佳為50 μm~1000 μm,更佳為100 μm~800 μm,進而較佳為150 μm~700 μm,尤佳為200 μm~600 μm。The thickness of the laminate of embodiment C can be any appropriate thickness within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the thickness of the laminate of embodiment C is preferably 50 μm to 1000 μm, more preferably 100 μm to 800 μm, further preferably 150 μm to 700 μm, and particularly preferably 200 μm to 600 μm.

如上所述,作為實施方式C之積層體之積層數為2層以上,就可進一步呈現本發明之效果之方面而言,較佳為2層~20層,更佳為2層~15層,進而較佳為2層~12層,尤佳為2層~10層。As described above, the number of layers of the laminate of embodiment C is 2 or more. In order to further demonstrate the effect of the present invention, it is preferably 2 to 20 layers, more preferably 2 to 15 layers, further preferably 2 to 12 layers, and particularly preferably 2 to 10 layers.

作為實施方式C之積層體之正面相位差R0較佳為R0≧2500 nm,更佳為R0≧3000 nm,進而較佳為R0≧3500 nm,進而較佳為R0≧4000 nm,進而較佳為R0≧4500 nm,尤佳為R0≧5000 nm,最佳為R0≧5500 nm。藉由採用此種基材,可進一步呈現本發明之效果。所積層之複數片塑膠基材可均為異種(材料不同)之基材,亦可至少2片為同種(材料相同)之基材。The front phase difference R0 of the laminate of embodiment C is preferably R0≧2500 nm, more preferably R0≧3000 nm, further preferably R0≧3500 nm, further preferably R0≧4000 nm, further preferably R0≧4500 nm, particularly preferably R0≧5000 nm, and most preferably R0≧5500 nm. By adopting such a substrate, the effect of the present invention can be further presented. The laminated multiple plastic substrates can all be substrates of different types (different materials), or at least two of them can be substrates of the same type (same material).

作為實施方式C之積層體之正面相位差R0之上限值越大越好,但鑒於材料選擇等因素,現實中較佳為30000 nm以下。As for the upper limit of the front phase difference R0 of the multilayer body of implementation method C, the larger the better. However, in practice, it is preferably below 30000 nm in view of factors such as material selection.

作為實施方式C中可使用之塑膠基材之材料,可於無損本發明之效果之範圍內可採用任意適當之塑膠。就可進一步呈現本發明之效果之方面而言,此種塑膠較佳例舉為熱塑性樹脂。As the material of the plastic substrate that can be used in Embodiment C, any appropriate plastic can be used within the scope that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, such plastic is preferably exemplified by thermoplastic resin.

熱塑性樹脂例如可例舉:聚酯、丙烯酸系樹脂、胺基甲酸酯系樹脂、聚碳酸酯、三乙醯纖維素(TAC)、聚烯烴(烯烴均聚物、烯烴與其他單體之共聚物)、聚醯胺(尼龍)、全芳香族聚醯胺(aramid)、聚醯亞胺(PI)、聚氯乙烯(PVC)、聚乙酸乙烯酯、環狀烯烴系聚合物。Examples of thermoplastic resins include polyester, acrylic resin, urethane resin, polycarbonate, triacetyl cellulose (TAC), polyolefin (olefin homopolymer, copolymer of olefin and other monomers), polyamide (nylon), wholly aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyvinyl acetate, and cyclic olefin polymers.

就可進一步呈現本發明之效果之方面而言,熱塑性樹脂較佳為聚酯。聚酯例如可例舉聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯(PBT),就可進一步呈現本發明之效果之方面而言,較佳為聚對苯二甲酸乙二酯(PET)。In terms of further demonstrating the effects of the present invention, the thermoplastic resin is preferably polyester. Examples of polyester include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene terephthalate (PBT). In terms of further demonstrating the effects of the present invention, polyethylene terephthalate (PET) is preferred.

作為實施方式C中可使用之塑膠基材,可採用作為實施方式A之延伸熱塑性樹脂基材,亦可採用作為實施方式B之超雙折射膜基材。The plastic substrate that can be used in embodiment C can be the stretched thermoplastic resin substrate of embodiment A or the super birefringent film substrate of embodiment B.

<基材之一較佳實施方式D> 基材之一較佳實施方式D為正面相位差R0為R0≦2600 nm之晶質PET(聚對苯二甲酸乙二酯)基材。 <One of the preferred embodiments of the substrate D> One of the preferred embodiments of the substrate D is a crystalline PET (polyethylene terephthalate) substrate with a front phase difference R0 of R0≦2600 nm.

作為實施方式D之晶質PET基材之厚度可於無損本發明之效果之範圍內採用任意適當之厚度。就可進一步呈現本發明之效果之方面而言,晶質PET基材之厚度較佳為10 μm~500 μm,更佳為15 μm~300 μm,進而較佳為25 μm~200 μm,尤佳為30 μm~100 μm,最佳為30 μm~50 μm。The thickness of the crystalline PET substrate of embodiment D can be any appropriate thickness within the range that does not impair the effect of the present invention. In terms of further demonstrating the effect of the present invention, the thickness of the crystalline PET substrate is preferably 10 μm to 500 μm, more preferably 15 μm to 300 μm, further preferably 25 μm to 200 μm, particularly preferably 30 μm to 100 μm, and most preferably 30 μm to 50 μm.

如上所述,作為實施方式D之晶質PET基材之正面相位差R0為R0≦2600 nm,較佳為R0≦2500 nm,更佳為R0≦2400 nm,進而較佳為R0≦2300 nm,尤佳為R0≦2100 nm,最佳為R0≦1900 nm。若晶質PET基材之正面相位差R0處於上述範圍內,則可進一步呈現本發明之效果。As described above, the front phase difference R0 of the crystalline PET substrate of embodiment D is R0≦2600 nm, preferably R0≦2500 nm, more preferably R0≦2400 nm, further preferably R0≦2300 nm, particularly preferably R0≦2100 nm, and most preferably R0≦1900 nm. If the front phase difference R0 of the crystalline PET substrate is within the above range, the effect of the present invention can be further demonstrated.

作為實施方式D之晶質PET基材之正面相位差R0之下限值越小越好,但鑒於材料選擇等因素,現實中較佳為100 nm以上,更佳為500 nm以上,進而較佳為800 nm以上,尤佳為1000 nm以上,最佳為1200 nm以上。The lower limit of the front phase difference R0 of the crystalline PET substrate of implementation method D is as small as possible, but in view of factors such as material selection, it is preferably above 100 nm, more preferably above 500 nm, further preferably above 800 nm, particularly preferably above 1000 nm, and most preferably above 1200 nm.

晶質PET基材亦可為經延伸之基材。The crystalline PET substrate may also be a stretched substrate.

作為晶質PET基材,就可進一步呈現本發明之效果之方面而言,寬度方向(TD方向)之拉伸強度與長度方向(MD方向)之拉伸強度之比(TD/MD)較佳為1.2~3.3。再者,如下所述,上述拉伸強度係依據JIS C 2151:2019,使用拉伸試驗機以200 mm/min之速度拉伸測定對象使該測定對象切斷(斷裂)時之強度(單位:MPa)。As a crystalline PET substrate, in order to further demonstrate the effect of the present invention, the ratio of the tensile strength in the width direction (TD direction) to the tensile strength in the length direction (MD direction) (TD/MD) is preferably 1.2 to 3.3. Furthermore, as described below, the tensile strength is the strength (unit: MPa) when the object to be measured is stretched at a speed of 200 mm/min using a tensile testing machine in accordance with JIS C 2151:2019 so that the object to be measured is cut (broken).

≪黏著劑層≫ 黏著劑層可為由1層構成之黏著劑層,亦可為由2層以上之積層構造構成之黏著劑層。 ≪Adhesive layer≫ The adhesive layer may be composed of one layer or may be composed of a layered structure of two or more layers.

就可進一步呈現本發明之效果之方面而言,黏著劑層之厚度較佳為0.5 μm~150 μm,更佳為1 μm~100 μm,進而較佳為2 μm~80 μm,進而較佳為3 μm~50 μm,進而較佳為5 μm~30 μm,進而較佳為7 μm~27 μm,尤佳為9 μm~25 μm,最佳為11 μm~23 μm。In order to further demonstrate the effect of the present invention, the thickness of the adhesive layer is preferably 0.5 μm to 150 μm, more preferably 1 μm to 100 μm, further preferably 2 μm to 80 μm, further preferably 3 μm to 50 μm, further preferably 5 μm to 30 μm, further preferably 7 μm to 27 μm, particularly preferably 9 μm to 25 μm, and most preferably 11 μm to 23 μm.

構成黏著劑層之黏著劑較佳為選自由丙烯酸系黏著劑、胺基甲酸酯系黏著劑、及聚矽氧系黏著劑所組成之群中之至少1種。The adhesive constituting the adhesive layer is preferably at least one selected from the group consisting of acrylic adhesives, urethane adhesives, and silicone adhesives.

黏著劑層更佳為由丙烯酸系黏著劑構成。The adhesive layer is more preferably composed of an acrylic adhesive.

丙烯酸系黏著劑係由丙烯酸系黏著劑組合物所形成。The acrylic adhesive is formed from an acrylic adhesive composition.

丙烯酸系黏著劑可如此規定為由丙烯酸系黏著劑組合物所形成者。其原因在於,丙烯酸系黏著劑係藉由丙烯酸系黏著劑組合物因加熱或紫外線照射等產生交聯反應等而成為丙烯酸系黏著劑,因此無法根據其結構直接特定出丙烯酸系黏著劑,又,由於存在一般不實際之情況(「不可能、不實際之情況」),故而藉由「由丙烯酸系黏著劑組合物所形成者」之規定,將丙烯酸系黏著劑合理地特定為「物」。Acrylic adhesives can be defined as those formed from an acrylic adhesive composition. The reason for this is that acrylic adhesives are formed by a crosslinking reaction of an acrylic adhesive composition due to heating or ultraviolet irradiation, and therefore acrylic adhesives cannot be directly identified based on their structure. Also, since there are generally unrealistic situations ("impossible and unrealistic situations"), acrylic adhesives are reasonably specified as "objects" by defining "formed from an acrylic adhesive composition".

丙烯酸系黏著劑於23℃、相對濕度50%之環境下,拉伸速度300 mm/分鐘、剝離角度180度時相對於丙烯酸系樹脂板之剝離力較佳為0.01 N/25 mm以上,更佳為0.03 N/25 mm以上,進而較佳為0.05 N/25 mm以上,尤佳為0.07 N/25 mm以上。再者,上述剝離力之上限值之較佳範圍會根據本發明之光學積層體所具有之表面保護膜之用途而不同。典型而言,於永久接著用途(以永久接著為目的之表面保護膜)之情形時,不存在上限值,越高越好,於再剝離用途(例如,用作工程材料之表面保護膜)之情形時,上限值較佳為5 N/25 mm以下,更佳為3 N/25 mm以下,進而較佳為1 N/25 mm以下。The peeling force of the acrylic adhesive relative to the acrylic resin sheet at 23°C, relative humidity 50%, at a tensile speed of 300 mm/min and a peeling angle of 180 degrees is preferably 0.01 N/25 mm or more, more preferably 0.03 N/25 mm or more, further preferably 0.05 N/25 mm or more, and particularly preferably 0.07 N/25 mm or more. Furthermore, the preferred range of the upper limit of the above peeling force will vary depending on the purpose of the surface protective film of the optical laminate of the present invention. Typically, in the case of permanent bonding applications (surface protection films for the purpose of permanent bonding), there is no upper limit, the higher the better, and in the case of re-stripping applications (for example, surface protection films used as engineering materials), the upper limit is preferably 5 N/25 mm or less, more preferably 3 N/25 mm or less, and further preferably 1 N/25 mm or less.

黏著劑層可藉由任意適當之方法而形成。此種方法例如可例舉以下方法:將形成構成黏著劑層之黏著劑之黏著劑組合物塗佈於任意適當之基材上,視需要進行加熱或乾燥,並視需要使其硬化而於基材上形成黏著劑層;將形成構成黏著劑層之黏著劑之黏著劑組合物塗佈於任意適當之剝離襯墊等膜上,視需要進行加熱或乾燥,並視需要使其硬化而於該膜上形成黏著劑層,於該黏著劑層上貼合任意適當之基材而進行轉印,藉此於該基材上形成黏著劑層。The adhesive layer can be formed by any appropriate method. Such methods include, for example, the following methods: applying an adhesive composition that forms an adhesive constituting the adhesive layer on any appropriate substrate, heating or drying as needed, and hardening it as needed to form an adhesive layer on the substrate; applying an adhesive composition that forms an adhesive constituting the adhesive layer on any appropriate film such as a peel-off pad, heating or drying as needed, and hardening it as needed to form an adhesive layer on the film, and attaching any appropriate substrate to the adhesive layer for transfer printing to form an adhesive layer on the substrate.

塗佈丙烯酸系黏著劑組合物之方法可於無損本發明之效果之範圍內採用任意適當之方法。此種塗佈方法例如可例舉:輥式塗佈法、凹版輥塗佈法、逆輥塗佈法、接觸輥塗佈法、浸漬輥塗佈法、棒式塗佈法、輥刷塗佈法、噴塗法、刮塗法、氣刀塗佈法、缺角輪塗佈法、直接塗佈法、模嘴塗佈法。The method of applying the acrylic adhesive composition may be any appropriate method within the scope of not impairing the effect of the present invention. Such coating methods include, for example, roll coating, gravure roll coating, reverse roll coating, contact roll coating, dip roll coating, rod coating, roll brush coating, spray coating, scraper coating, air knife coating, notch wheel coating, direct coating, and die nozzle coating.

丙烯酸系黏著劑組合物之加熱或乾燥可於無損本發明之效果之範圍內採用任意適當之方法。此種加熱或乾燥之方法例如可例舉加熱至60℃~180℃,或者例如以室溫左右之溫度進行熟化處理。The acrylic adhesive composition can be heated or dried by any appropriate method within the scope that does not impair the effect of the present invention. Such heating or drying methods include, for example, heating to 60°C to 180°C, or aging at room temperature.

丙烯酸系黏著劑組合物之硬化可於無損本發明之效果之範圍內採用任意適當之方法。此種硬化之方法例如可例舉:熱、紫外線照射、雷射光線照射、α射線照射、β射線照射、γ射線照射、X射線照射、電子束照射。The acrylic adhesive composition can be cured by any appropriate method within the scope of not impairing the effect of the present invention. Such curing methods include, for example, heat, ultraviolet irradiation, laser irradiation, α-ray irradiation, β-ray irradiation, γ-ray irradiation, X-ray irradiation, and electron beam irradiation.

就可進一步呈現本發明之效果之方面而言,丙烯酸系黏著劑組合物較佳為包含丙烯酸系聚合物及交聯劑。In order to further exhibit the effects of the present invention, the acrylic adhesive composition preferably comprises an acrylic polymer and a crosslinking agent.

丙烯酸系聚合物係丙烯酸系黏著劑之領域中可稱為基礎聚合物者。丙烯酸系聚合物可僅為1種,亦可為2種以上。The acrylic polymer is a base polymer in the field of acrylic adhesives. The acrylic polymer may be only one type or may be two or more types.

丙烯酸系黏著劑組合物中之丙烯酸系聚合物之含有率以固形物成分換算較佳為60重量%~99.9重量%,更佳為65重量%~99.9重量%,進而較佳為70重量%~99.9重量%,尤佳為75重量%~99.9重量%,最佳為80重量%~99.9重量%。The content of the acrylic polymer in the acrylic adhesive composition is preferably 60% to 99.9% by weight, more preferably 65% to 99.9% by weight, further preferably 70% to 99.9% by weight, particularly preferably 75% to 99.9% by weight, and most preferably 80% to 99.9% by weight, based on solid content.

丙烯酸系聚合物可於無損本發明之效果之範圍內採用任意適當之丙烯酸系聚合物。Any appropriate acrylic polymer may be used as long as the effects of the present invention are not impaired.

就可進一步呈現本發明之效果之方面而言,丙烯酸系聚合物之重量平均分子量較佳為30萬~250萬,更佳為35萬~200萬,進而較佳為40萬~180萬,尤佳為50萬~150萬。In order to further exhibit the effects of the present invention, the weight average molecular weight of the acrylic polymer is preferably 300,000 to 2.5 million, more preferably 350,000 to 2 million, further preferably 400,000 to 1.8 million, and particularly preferably 500,000 to 1.5 million.

作為丙烯酸系聚合物,就可進一步呈現本發明之效果之方面而言,較佳為由組合物(M)藉由聚合而形成之丙烯酸系聚合物,該組合物(M)包含烷基酯部分之烷基之碳數為4~12之(甲基)丙烯酸烷基酯(a成分)、及選自由具有OH基之(甲基)丙烯酸酯及(甲基)丙烯酸所組成之群中之至少1種(b成分)。a成分、b成分分別獨立地可僅為1種,亦可為2種以上。As the acrylic polymer, in terms of further exhibiting the effects of the present invention, an acrylic polymer formed by polymerization of a composition (M) comprising an alkyl (meth)acrylate having an alkyl group with 4 to 12 carbon atoms in the alkyl ester portion (component a), and at least one selected from the group consisting of (meth)acrylates having an OH group and (meth)acrylic acid (component b). Component a and component b may be either one or two or more, respectively, independently.

烷基酯部分之烷基之碳數為4~12之(甲基)丙烯酸烷基酯例如可例舉:(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯等。其等之中,就可進一步呈現本發明之效果之方面而言,較佳為(甲基)丙烯酸正丁酯、(甲基)丙烯酸2-乙基己酯,更佳為丙烯酸正丁酯、丙烯酸2-乙基己酯。Examples of the (meth)acrylic acid alkyl esters in which the alkyl group of the alkyl ester part has 4 to 12 carbon atoms include n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, t-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, and dodecyl (meth)acrylate. Among them, n-butyl (meth)acrylate and 2-ethylhexyl (meth)acrylate are preferred, and n-butyl acrylate and 2-ethylhexyl acrylate are more preferred in terms of further exhibiting the effects of the present invention.

具有OH基之(甲基)丙烯酸酯例如可例舉(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯等具有OH基之(甲基)丙烯酸酯。其等之中,就可進一步呈現本發明之效果之方面而言,較佳為(甲基)丙烯酸羥基乙酯,更佳為丙烯酸羥基乙酯。Examples of (meth)acrylates having an OH group include hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, and the like. Among them, hydroxyethyl (meth)acrylate is preferred, and hydroxyethyl acrylate is more preferred, in terms of further exhibiting the effects of the present invention.

就可進一步呈現本發明之效果之方面而言,(甲基)丙烯酸較佳為丙烯酸。The (meth)acrylic acid is preferably acrylic acid in that the effects of the present invention can be further exhibited.

組合物(M)亦可包含除a成分及b成分以外之共聚性單體。共聚性單體可僅為1種,亦可為2種以上。此種共聚性單體例如可例舉:伊康酸、馬來酸、富馬酸、丁烯酸、異丁烯酸、其等之酸酐(例如,馬來酸酐、伊康酸酐等含酸酐基之單體)等含羧基之單體(其中,(甲基)丙烯酸除外);(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-甲氧基甲基(甲基)丙烯醯胺、N-丁氧基甲基(甲基)丙烯醯胺、N-羥基乙基(甲基)丙烯醯胺等含醯胺基之單體;(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等含胺基之單體;(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯等含環氧基之單體;丙烯腈或甲基丙烯腈等含氰基之單體;N-乙烯基-2-吡咯啶酮、(甲基)丙烯醯𠰌啉、N-乙烯基哌啶酮、N-乙烯基哌𠯤、N-乙烯基吡咯、N-乙烯基咪唑、乙烯基吡啶、乙烯基嘧啶、乙烯基㗁唑等含雜環之乙烯基系單體;乙烯基磺酸鈉等含磺酸基之單體;2-羥基乙基丙烯醯磷酸酯等含磷酸之單體;環己基馬來醯亞胺、異丙基馬來醯亞胺等含醯亞胺基之單體;2-甲基丙烯醯氧基乙基異氰酸酯等含異氰酸基之單體;(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異𦯉酯等具有脂環式烴基之(甲基)丙烯酸酯;(甲基)丙烯酸苯酯、苯氧基乙基(甲基)丙烯酸酯、(甲基)丙烯酸苄酯等具有芳香族烴基之(甲基)丙烯酸酯;乙酸乙烯酯、丙酸乙烯酯等乙烯酯;苯乙烯、乙烯基甲苯等芳香族乙烯基化合物;乙烯、丁二烯、異戊二烯、異丁烯等烯烴類或二烯類;乙烯基烷基醚等乙烯醚類;氯乙烯等。The composition (M) may also contain copolymerizable monomers other than the components a and b. The copolymerizable monomers may be only one or may be two or more. Examples of such copolymerizable monomers include: carboxyl group-containing monomers (except (meth)acrylic acid) such as itaconic acid, maleic acid, fumaric acid, crotonic acid, isomethacrylic acid, and anhydrides thereof (for example, monomers containing anhydride groups such as maleic anhydride and itaconic anhydride); (meth)acrylamide, N,N-dimethyl (meth)acrylamide, N-hydroxymethyl (meth)acrylamide, N-methoxymethyl (meth)acrylamide, N-butoxymethyl (meth)acrylamide, N-hydroxy monomers containing an amide group such as 1,2-dimethylaminoethyl (meth)acrylamide; monomers containing an amine group such as aminoethyl (meth)acrylate, dimethylaminoethyl (meth)acrylate, and tert-butylaminoethyl (meth)acrylate; monomers containing an epoxy group such as glycidyl (meth)acrylate and methyl glycidyl (meth)acrylate; monomers containing a cyano group such as acrylonitrile or methacrylonitrile; N-vinyl-2-pyrrolidone, (meth)acryloyl phenoxylate, N-vinyl piperidone, N-vinyl piperidine, and N-vinyl piperidine; Vinyl monomers containing heterocyclic groups such as vinylpiperidinium, N-vinylpyrrole, N-vinylimidazole, vinylpyridine, vinylpyrimidine, and vinyloxazole; monomers containing sulfonic acid groups such as sodium vinylsulfonate; monomers containing phosphoric acid groups such as 2-hydroxyethylacryloyl phosphate; monomers containing imide groups such as cyclohexylmaleimide and isopropylmaleimide; monomers containing isocyanate groups such as 2-methacryloyloxyethyl isocyanate; cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, etc. (Meth)acrylates having alicyclic hydrocarbon groups such as (meth)acrylate, isobutyl (meth)acrylate, etc.; (meth)acrylates having aromatic hydrocarbon groups such as phenyl (meth)acrylate, phenoxyethyl (meth)acrylate, benzyl (meth)acrylate, etc.; vinyl esters such as vinyl acetate and vinyl propionate; aromatic vinyl compounds such as styrene and vinyl toluene; olefins or dienes such as ethylene, butadiene, isoprene, and isobutylene; vinyl ethers such as vinyl alkyl ether; vinyl chloride, etc.

共聚性單體亦可採用多官能性單體。多官能性單體係指於一分子中具有2個以上之乙烯性不飽和基之單體。乙烯性不飽和基可於無損本發明之效果之範圍內採用任意適當之乙烯性不飽和基。此種乙烯性不飽和基例如可例舉:乙烯基、丙烯基、異丙烯基、乙烯醚基(乙烯氧基)、烯丙醚基(烯丙氧基)等自由基聚合性官能基。多官能性單體例如可例舉:己二醇二(甲基)丙烯酸酯、丁二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷三(甲基)丙烯酸酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸乙烯酯、二乙烯苯、環氧丙烯酸酯、聚酯丙烯酸酯、胺基甲酸酯丙烯酸酯等。此種多官能性單體可僅為1種,亦可為2種以上。Copolymerizable monomers may also be multifunctional monomers. Multifunctional monomers refer to monomers having two or more ethylenic unsaturated groups in one molecule. Any appropriate ethylenic unsaturated group may be used as long as the effect of the present invention is not impaired. Examples of such ethylenic unsaturated groups include free radical polymerizable functional groups such as vinyl, propenyl, isopropenyl, vinyl ether (vinyloxy), and allyl ether (allyloxy). Examples of the multifunctional monomer include hexanediol di(meth)acrylate, butanediol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, tetrahydroxymethylmethane tri(meth)acrylate, allyl (meth)acrylate, vinyl (meth)acrylate, divinylbenzene, epoxy acrylate, polyester acrylate, urethane acrylate, etc. Such a multifunctional monomer may be only one kind or two or more kinds.

共聚性單體亦可採用(甲基)丙烯酸烷氧基烷基酯。(甲基)丙烯酸烷氧基烷基酯例如可例舉:(甲基)丙烯酸2-甲氧基乙酯、(甲基)丙烯酸2-乙氧基乙酯、(甲基)丙烯酸甲氧基三乙二醇、(甲基)丙烯酸3-甲氧基丙酯、(甲基)丙烯酸3-乙氧基丙酯、(甲基)丙烯酸4-甲氧基丁酯、(甲基)丙烯酸4-乙氧基丁酯等。(甲基)丙烯酸烷氧基烷基酯可僅為1種,亦可為2種以上。The copolymerizable monomer may also be an alkoxyalkyl (meth)acrylate. Examples of the alkoxyalkyl (meth)acrylate include 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, methoxytriethylene glycol (meth)acrylate, 3-methoxypropyl (meth)acrylate, 3-ethoxypropyl (meth)acrylate, 4-methoxybutyl (meth)acrylate, and 4-ethoxybutyl (meth)acrylate. The alkoxyalkyl (meth)acrylate may be one or more.

就可進一步呈現本發明之效果之方面而言,烷基酯部分之烷基之碳數為4~12之(甲基)丙烯酸烷基酯(a成分)之含量相對於構成丙烯酸系聚合物之單體成分總量(100重量%)較佳為30重量%以上,更佳為35重量%~99重量%,進而較佳為40重量%~98重量%,尤佳為50重量%~95重量%。In order to further demonstrate the effects of the present invention, the content of the (meth)acrylic acid alkyl ester (component a) in which the alkyl group of the alkyl ester part has 4 to 12 carbon atoms is preferably 30 wt % or more, more preferably 35 wt % to 99 wt %, further preferably 40 wt % to 98 wt %, and particularly preferably 50 wt % to 95 wt % relative to the total amount of monomer components constituting the acrylic polymer (100 wt %).

就可進一步呈現本發明之效果之方面而言,選自由具有OH基之(甲基)丙烯酸酯及(甲基)丙烯酸所組成之群中之至少1種(b成分)之含量相對於構成丙烯酸系聚合物之單體成分總量(100重量%)較佳為1重量%以上,更佳為1重量%~30重量%,進而較佳為2重量%~20重量%,尤佳為3重量%~10重量%。In order to further demonstrate the effect of the present invention, the content of at least one (component b) selected from the group consisting of (meth)acrylates having an OH group and (meth)acrylic acid is preferably 1 wt % or more, more preferably 1 wt % to 30 wt %, further preferably 2 wt % to 20 wt %, and particularly preferably 3 wt % to 10 wt % relative to the total amount (100 wt %) of monomer components constituting the acrylic polymer.

組合物(M)可於無損本發明之效果之範圍內含有任意適當之其他成分。此種其他成分例如可例舉聚合起始劑、鏈轉移劑、溶劑等。該等其他成分之含量可於無損本發明之效果之範圍內採用任意適當之含量。The composition (M) may contain any other appropriate components within the scope that does not impair the effects of the present invention. Such other components may include, for example, polymerization initiators, chain transfer agents, solvents, etc. The content of these other components may be any appropriate content within the scope that does not impair the effects of the present invention.

聚合起始劑可根據聚合反應之種類採用熱聚合起始劑或光聚合起始劑(光起始劑)等。聚合起始劑可僅為1種,亦可為2種以上。The polymerization initiator may be a thermal polymerization initiator or a photopolymerization initiator (photoinitiator) according to the type of polymerization reaction. The polymerization initiator may be only one kind or two or more kinds.

熱聚合起始劑在藉由溶液聚合獲得丙烯酸系聚合物時可能被較佳地採用。此種熱聚合起始劑例如可例舉:2,2'-偶氮二異丁腈(AIBN)、2,2'-偶氮雙-2-甲基丁腈、2,2'-偶氮雙(2-甲基丙酸)二甲酯、4,4'-偶氮雙-4-氰基戊酸、偶氮二異戊腈、2,2'-偶氮雙(2-脒基丙烷)二鹽酸鹽、2,2'-偶氮雙[2-(5-甲基-2-咪唑啉-2-基)丙烷]二鹽酸鹽、2,2'-偶氮雙(2-甲基丙脒)二硫酸鹽、2,2'-偶氮雙(N,N'-二亞甲基異丁基脒)、2,2'-偶氮雙[N-(2-羧基乙基)-2-甲基丙脒]水合物(VA-057,和光純藥工業(股)製造)等偶氮系起始劑;過硫酸鉀、過硫酸銨等過硫酸鹽、過氧化二碳酸二(2-乙基己基)酯、過氧化二碳酸二(4-第三丁基環己基)酯、過氧化二碳酸二第二丁酯、過氧化新癸酸第三丁酯、過氧化特戊酸第三己酯、過氧化特戊酸第三丁酯、過氧化二月桂醯、過氧化二正辛醯、過氧化2-乙基己酸1,1,3,3-四甲基丁酯、過氧化二(4-甲基苯甲醯)、過氧化二苯甲醯、過氧化異丁酸第三丁酯、1,1-二(第三己基過氧基)環己烷、第三丁基過氧化氫、過氧化氫等過氧化物系起始劑;過硫酸鹽與亞硫酸氫鈉之組合、過氧化物與抗壞血酸鈉之組合等將過氧化物與還原劑組合而成之氧化還原系起始劑;苯基取代乙烷等取代乙烷系起始劑;芳香族羰基化合物。Thermal polymerization initiators may be preferably used when obtaining acrylic polymers by solution polymerization. Examples of such thermal polymerization initiators include: 2,2'-azobisisobutyronitrile (AIBN), 2,2'-azobis-2-methylbutyronitrile, 2,2'-azobis(2-methylpropionic acid) dimethyl ester, 4,4'-azobis-4-cyanovaleric acid, azobisisovaleronitrile, 2,2'-azobis(2-amidinopropane) dihydrochloride, 2,2'-azobis[2-(5-methyl-2-imidazoline)] Azo initiators such as 2,2'-azobis(2-methylpropionamidine) dihydrochloride, 2,2'-azobis(2-methylpropionamidine) disulfate, 2,2'-azobis(N,N'-dimethyleneisobutylamidine), 2,2'-azobis[N-(2-carboxyethyl)-2-methylpropionamidine] hydrate (VA-057, manufactured by Wako Pure Chemical Industries, Ltd.); persulfates such as potassium persulfate and ammonium persulfate, peroxide Di(2-ethylhexyl) dicarbonate, di(4-tert-butylcyclohexyl) peroxydicarbonate, di(2-butyl) peroxydicarbonate, tert-butyl peroxyneodecanoate, tert-hexyl peroxypivalate, tert-butyl peroxypivalate, dilauryl peroxide, dioctyl peroxide, 1,1,3,3-tetramethylbutyl peroxy-2-ethylhexanoate, di(4-methylbenzoyl) peroxide, Peroxide-based initiators such as dibenzoyl peroxide, tert-butyl peroxyisobutyrate, 1,1-di(tert-hexylperoxy)cyclohexane, tert-butyl hydroperoxide, and hydrogen peroxide; redox-based initiators formed by combining peroxides with reducing agents, such as a combination of persulfate and sodium hydrogen sulfite, and a combination of peroxide and sodium ascorbate; substituted ethane-based initiators such as phenyl-substituted ethane; and aromatic carbonyl compounds.

光聚合起始劑在藉由活性能量線聚合獲得丙烯酸系聚合物時可能被較佳地採用。光聚合起始劑例如可例舉:安息香醚系光聚合起始劑、苯乙酮系光聚合起始劑、α-酮醇系光聚合起始劑、芳香族磺醯氯系光聚合起始劑、光活性肟系光聚合起始劑、苯偶姻系光聚合起始劑、苯偶醯系光聚合起始劑、二苯甲酮系光聚合起始劑、縮酮系光聚合起始劑、9-氧硫𠮿系光聚合起始劑。Photopolymerization initiators may be preferably used when obtaining acrylic polymers by active energy ray polymerization. Examples of photopolymerization initiators include benzoin ether-based photopolymerization initiators, acetophenone-based photopolymerization initiators, α-ketol-based photopolymerization initiators, aromatic sulfonyl chloride-based photopolymerization initiators, photoactive oxime-based photopolymerization initiators, benzoin-based photopolymerization initiators, benzoyl-based photopolymerization initiators, benzophenone-based photopolymerization initiators, ketal-based photopolymerization initiators, 9-oxysulfonyl chloride-based photopolymerization initiators, and the like. It is a photopolymerization initiator.

安息香醚系光聚合起始劑例如可例舉:安息香甲醚、安息香乙醚、安息香丙醚、安息香異丙醚、安息香異丁醚、2,2-二甲氧基-1,2-二苯乙烷-1-酮、大茴香醚甲醚等。苯乙酮系光聚合起始劑例如可例舉:2,2-二乙氧基苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1-羥基環己基苯基酮、4-苯氧基二氯苯乙酮、4-(第三丁基)二氯苯乙酮。α-酮醇系光聚合起始劑例如可例舉2-甲基-2-羥基苯丙酮、1-[4-(2-羥基乙基)苯基]-2-甲基丙-1-酮。芳香族磺醯氯系光聚合起始劑例如可例舉2-萘磺醯氯。光活性肟系光聚合起始劑例如可例舉1-苯基-1,1-丙二酮-2-(鄰乙氧基羰基)-肟。苯偶姻系光聚合起始劑例如可例舉苯偶姻。苯偶醯系光聚合起始劑例如可例舉苯偶醯。二苯甲酮系光聚合起始劑例如可例舉:二苯甲酮、苯甲醯苯甲酸、3,3'-二甲基-4-甲氧基二苯甲酮、聚乙烯基二苯甲酮、α-羥基環己基苯基酮。縮酮系光聚合起始劑例如可例舉苯偶醯二甲基縮酮。9-氧硫𠮿系光聚合起始劑例如可例舉:9-氧硫𠮿、2-氯9-氧硫𠮿、2-甲基9-氧硫𠮿、2,4-二甲基9-氧硫𠮿、異丙基9-氧硫𠮿、2,4-二異丙基9-氧硫𠮿、十二烷基9-氧硫𠮿Examples of benzoin ether-based photopolymerization initiators include benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzoin isopropyl ether, benzoin isobutyl ether, 2,2-dimethoxy-1,2-diphenylethane-1-one, and anisole methyl ether. Examples of acetophenone-based photopolymerization initiators include 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1-hydroxycyclohexylphenyl ketone, 4-phenoxydichloroacetophenone, and 4-(tert-butyl)dichloroacetophenone. Examples of α-ketoalcohol-based photopolymerization initiators include 2-methyl-2-hydroxypropiophenone and 1-[4-(2-hydroxyethyl)phenyl]-2-methylpropan-1-one. Examples of aromatic sulfonyl chloride-based photopolymerization initiators include 2-naphthalenesulfonyl chloride. Examples of photoactive oxime-based photopolymerization initiators include 1-phenyl-1,1-propanedione-2-(o-ethoxycarbonyl)-oxime. Examples of benzoin-based photopolymerization initiators include benzoin. Examples of benzoyl-based photopolymerization initiators include benzoyl. Examples of benzophenone-based photopolymerization initiators include benzophenone, benzoylbenzoic acid, 3,3'-dimethyl-4-methoxybenzophenone, polyvinylbenzophenone, and α-hydroxycyclohexylphenyl ketone. Examples of ketal-based photopolymerization initiators include benzoyl dimethyl ketal. 9-Oxosulfuron Examples of photopolymerization initiators include: 9-sulfuryl sulfide , 2-chloro-9-oxysulfuron , 2-methyl 9-oxosulfuron , 2,4-dimethyl 9-oxosulfuron 、Isopropyl 9-oxysulfide 、2,4-Diisopropyl 9-oxysulfide , dodecyl 9-oxysulfide .

聚合起始劑之使用量可於無損本發明之效果之範圍內設定為任意適當之使用量。The amount of the polymerization initiator used can be set to any appropriate amount within the range that does not impair the effect of the present invention.

丙烯酸系黏著劑組合物亦可包含交聯劑。藉由使用交聯劑,可提高丙烯酸系黏著劑之凝集力,可進一步呈現本發明之效果。交聯劑可僅為1種,亦可為2種以上。The acrylic adhesive composition may also contain a crosslinking agent. By using a crosslinking agent, the cohesive force of the acrylic adhesive can be increased, and the effect of the present invention can be further demonstrated. The crosslinking agent may be only one kind or may be two or more kinds.

交聯劑例如可例舉:異氰酸酯系交聯劑、環氧系交聯劑、聚矽氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、矽烷系交聯劑、烷基醚化三聚氰胺系交聯劑、金屬螯合物系交聯劑、過氧化物等交聯劑,就可進一步呈現本發明之效果之方面而言,較佳為選自由異氰酸酯系交聯劑、環氧系交聯劑、及過氧化物所組成之群中之至少1種(c成分)。Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, polysiloxane crosslinking agents, oxazoline crosslinking agents, aziridine crosslinking agents, silane crosslinking agents, alkyl etherified melamine crosslinking agents, metal chelate crosslinking agents, and peroxide crosslinking agents. In terms of further demonstrating the effect of the present invention, it is preferably at least one crosslinking agent selected from the group consisting of isocyanate crosslinking agents, epoxy crosslinking agents, and peroxide crosslinking agents (component c).

異氰酸酯系交聯劑可使用於一分子中具有2個以上之異氰酸基(包含利用封端劑或聚體化等暫時保護異氰酸基而成之異氰酸酯再生型極性基)之化合物。異氰酸酯系交聯劑例如可例舉:甲苯二異氰酸酯、二甲苯二異氰酸酯等芳香族異氰酸酯;異佛爾酮二異氰酸酯等脂環族異氰酸酯;六亞甲基二異氰酸酯等脂肪族異氰酸酯。Isocyanate crosslinking agents can be used for compounds having two or more isocyanate groups in one molecule (including isocyanate-regenerated polar groups formed by temporarily protecting isocyanate groups by blocking agents or polymerization). Examples of isocyanate crosslinking agents include aromatic isocyanates such as toluene diisocyanate and xylene diisocyanate; alicyclic isocyanates such as isophorone diisocyanate; and aliphatic isocyanates such as hexamethylene diisocyanate.

異氰酸酯系交聯劑例如可例舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯、多亞甲基多苯基異氰酸酯等芳香族二異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(例如,Tosoh公司製造、商品名Coronate L)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如,Tosoh公司製造、商品名:Coronate HL)、六亞甲基二異氰酸酯之異氰尿酸酯體(例如,Tosoh公司製造、商品名:Coronate HX)等異氰酸酯加成物;苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學公司製造、商品名:Takenate D110N)、苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學公司製造、商品名:Takenate D120N)、異佛爾酮二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學公司製造、商品名:Takenate D140N)、六亞甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學公司製造、商品名:Takenate D160N)、甲苯二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學公司製造、商品名:Takenate D101E);聚醚聚異氰酸酯、聚酯聚異氰酸酯、以及其等與各種多元醇之加成物;藉由異氰尿酸酯鍵結、縮二脲鍵結、脲基甲酸酯鍵結等而多官能化之聚異氰酸酯。其等之中,就可平衡良好地兼顧變形性及凝集力之方面而言,較佳為芳香族異氰酸酯、脂環式異氰酸酯。Examples of the isocyanate crosslinking agent include low-order aliphatic polyisocyanates such as butyl diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentyl diisocyanate, cyclohexyl diisocyanate, and isophorone diisocyanate; aromatic diisocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate, and polymethylene polyphenyl isocyanate; trihydroxymethylpropane/toluene diisocyanate trimer adduct (e.g., manufactured by Tosoh Corporation, trade name: Coronate L), trihydroxymethylpropane/hexamethylene diisocyanate trimer adduct (e.g., manufactured by Tosoh Corporation, trade name: Coronate HL), isocyanurate of hexamethylene diisocyanate (e.g., manufactured by Tosoh Co., Ltd., trade name: Coronate HX), etc. isocyanate adducts; trihydroxymethylpropane adducts of xylylenediisocyanate (e.g., manufactured by Mitsui Chemicals Co., Ltd., trade name: Takenate D110N), trihydroxymethylpropane adducts of xylylenediisocyanate (e.g., manufactured by Mitsui Chemicals Co., Ltd., trade name: Takenate D120N), trihydroxymethylpropane adducts of isophorone diisocyanate (e.g., manufactured by Mitsui Chemicals Co., Ltd., trade name: Takenate D140N), trihydroxymethylpropane adducts of hexamethylene diisocyanate (e.g., manufactured by Mitsui Chemicals Co., Ltd., trade name: Takenate D160N), trihydroxymethylpropane adduct of toluene diisocyanate (e.g., Mitsui Chemicals, trade name: Takenate D101E); polyether polyisocyanate, polyester polyisocyanate, and adducts thereof with various polyols; polyisocyanates multifunctionalized by isocyanurate bonding, biuret bonding, allophanate bonding, etc. Among them, aromatic isocyanates and alicyclic isocyanates are preferred in terms of good balance between deformability and cohesion.

環氧系交聯劑可使用於一分子中具有2個以上之環氧基之多官能環氧化合物。環氧系交聯劑例如可例舉:N,N,N',N'-四縮水甘油基間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油胺甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨醇聚縮水甘油醚、丙三醇聚縮水甘油醚、季戊四醇聚縮水甘油醚、聚丙三醇聚縮水甘油醚、山梨醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)異氰尿酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚-S-二縮水甘油醚、於分子內具有2個以上之環氧基之環氧系樹脂。環氧系交聯劑之市售品例如可例舉Mitsubishi Gas Chemical公司製造之商品名「Tetrad C」、「Tetrad X」。Epoxy crosslinking agents can be used for polyfunctional epoxy compounds having two or more epoxy groups in one molecule. Examples of epoxy crosslinking agents include: N,N,N',N'-tetraglycidyl-m-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, sorbitol polyglycidyl ether. , glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, trihydroxymethylpropane polyglycidyl ether, adipate diglycidyl ester, phthalate diglycidyl ester, tri(2-hydroxyethyl)isocyanuric acid triglycidyl ester, resorcinol diglycidyl ether, bisphenol-S-diglycidyl ether, epoxy resin having two or more epoxy groups in the molecule. Commercial products of epoxy crosslinking agents include, for example, the trade names "Tetrad C" and "Tetrad X" manufactured by Mitsubishi Gas Chemical Co., Ltd.

過氧化物例如可例舉:過氧化二苯甲醯、過氧化二異丙苯、過氧化二第三丁基、二第三丁基過氧化基-3,3,5-三甲基環己烷、氫過氧化二第三丁基、過氧化第三丁基異丙苯、2,5-二甲基-2,5-二(第三丁基過氧基)己炔-3、2,5-二甲基-2,5-二(苯甲醯基過氧基)己烷、2,5-二甲基-2,5-單(第三丁基過氧基)-己烷、α,α'-雙(第三丁基過氧基-間異丙基)苯、過氧化二碳酸二(2-乙基己基)酯、過氧化二碳酸二(4-第三丁基環己基)酯、過氧化二碳酸二第二丁酯、過氧化新癸酸第三丁酯、過氧化特戊酸第三己酯、過氧化特戊酸第三丁酯、過氧化二月桂醯、過氧化二正辛醯、過氧化2-乙基己酸1,1,3,3-四甲基丁酯、過氧化二(4-甲基苯甲醯)、過氧化異丁酸第三丁酯、1,1-二(第三己基過氧基)環己烷、1,1-二(第三丁基過氧基)環己烷、過氧化2-乙基己基碳酸第三丁酯、過氧化異丙基碳酸第三戊酯、過氧化3,5,5-三甲基己醯、過氧化2-己酸第三丁酯、過氧化特戊酸第三丁酯、過氧化特戊酸第三己酯。過氧化物之市售品例如可例舉日本油脂股份有限公司製造之商品名「Nyper BMT」系列、「Nyper BW」系列。Examples of peroxides include dibenzoyl peroxide, diisopropylbenzene peroxide, di-t-butyl peroxide, di-t-butylperoxy-3,3,5-trimethylcyclohexane, di-t-butyl hydroperoxide, t-butyl isopropylbenzene peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexyne-3, 2,5-dimethyl-2,5-di(benzoylperoxy)hexane, 2,5-dimethyl-2,5-mono(t-butylperoxy)-hexane, α,α'-bis(t-butylperoxy-m-isopropyl)benzene, di(2-ethylhexyl) peroxydicarbonate, di(4-t-butylcyclohexyl) peroxydicarbonate, Di-sec-butyl dicarbonate, t-butyl peroxyneodecanoate, t-hexyl peroxypivalate, t-butyl peroxypivalate, dilauryl peroxide, di-n-octyl peroxide, 1,1,3,3-tetramethylbutyl peroxy-2-ethylhexanoate, di(4-methylbenzoyl) peroxide, t-butyl peroxyisobutyrate, 1,1-di(t-hexylperoxy)cyclohexane, 1,1-di(t-butylperoxy)cyclohexane, t-butyl peroxy-2-ethylhexyl carbonate, t-amyl peroxyisopropyl carbonate, 3,5,5-trimethylhexanoyl peroxide, t-butyl peroxy-2-hexanoate, t-butyl peroxypivalate, t-hexyl peroxypivalate. Examples of commercially available peroxides include the "Nyper BMT" series and "Nyper BW" series manufactured by NOF Corporation.

丙烯酸系黏著劑組合物中之交聯劑之含量可於無損本發明之效果之範圍內採用任意適當之含量。關於該含量,例如就可進一步呈現本發明之效果之方面而言,相對於丙烯酸系聚合物之固形物成分(100重量份)較佳為0.05重量份~20重量份,更佳為0.1重量份~18重量份,進而較佳為0.5重量份~15重量份,尤佳為0.5重量份~10重量份。The content of the crosslinking agent in the acrylic adhesive composition can be any appropriate content within the range that does not impair the effect of the present invention. For example, in order to further demonstrate the effect of the present invention, the content is preferably 0.05 to 20 parts by weight, more preferably 0.1 to 18 parts by weight, further preferably 0.5 to 15 parts by weight, and particularly preferably 0.5 to 10 parts by weight relative to the solid content (100 parts by weight) of the acrylic polymer.

丙烯酸系黏著劑組合物可於無損本發明之效果之範圍內含有任意適當之其他成分。此種其他成分例如可例舉:丙烯酸系聚合物以外之聚合物成分、交聯促進劑、交聯觸媒、矽烷偶合劑、黏著賦予樹脂(松香衍生物、聚萜烯樹脂、石油樹脂、油溶性酚等)、防老化劑、無機填充劑、有機填充劑、金屬粉、著色劑(顏料或染料等)、箔狀物、紫外線吸收劑、抗氧化劑、光穩定劑、成核劑、鏈轉移劑、塑化劑、軟化劑、界面活性劑、抗靜電劑、導電劑、穩定劑、表面潤滑劑、調平劑、抗腐蝕劑、耐熱穩定劑、聚合抑制劑、潤滑劑、溶劑、觸媒等。The acrylic adhesive composition may contain any other appropriate components within the scope that does not impair the effect of the present invention. Such other components include, for example: polymer components other than acrylic polymers, crosslinking promoters, crosslinking catalysts, silane coupling agents, adhesion-imparting resins (rosin derivatives, polyterpene resins, petroleum resins, oil-soluble phenols, etc.), anti-aging agents, inorganic fillers, organic fillers, metal powders, colorants (pigments, etc.), and other components. materials or dyes, etc.), foils, UV absorbers, antioxidants, light stabilizers, nucleating agents, chain transfer agents, plasticizers, softeners, surfactants, antistatic agents, conductive agents, stabilizers, surface lubricants, leveling agents, anti-corrosion agents, heat-resistant stabilizers, polymerization inhibitors, lubricants, solvents, catalysts, etc.

≪≪光學構件≫≫ 光學構件具有偏光板。光學構件只要具有偏光板,則亦可於無損本發明之效果之範圍內包含任意適當之其他構件。 ≪≪Optical component≫≫ The optical component has a polarizing plate. As long as the optical component has a polarizing plate, it may also include any other appropriate components within the scope that does not impair the effect of the present invention.

其他構件例如可例舉黏著劑層、亮度提昇膜。Other components include, for example, an adhesive layer and a brightness enhancement film.

光學構件之厚度可視其種類採用任意適當之厚度。典型而言,光學構件之厚度較佳為10 μm~1000 μm,更佳為30 μm~800 μm,進而較佳為50 μm~700 μm,尤佳為100 μm~600 μm,最佳為100 μm~500 μm。 [實施例] The thickness of the optical component can be any appropriate thickness depending on its type. Typically, the thickness of the optical component is preferably 10 μm to 1000 μm, more preferably 30 μm to 800 μm, further preferably 50 μm to 700 μm, particularly preferably 100 μm to 600 μm, and most preferably 100 μm to 500 μm. [Example]

以下,藉由實施例對本發明進行具體說明,但本發明並不限定於該等實施例。再者,實施例等中之試驗及評價方法如下所述。再者,記載為「份」之情形時,除非另有說明,否則意指「重量份」,記載為「%」之情形時,除非另有說明,否則意指「重量%」。Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to the examples. Furthermore, the test and evaluation methods in the examples are as follows. Furthermore, when "parts" are recorded, unless otherwise specified, they mean "parts by weight", and when "%" is recorded, unless otherwise specified, they mean "% by weight".

<基材之拉伸強度之測定> 依據JIS C 2151:2019,使用拉伸試驗機(島津製作所製造、製品名「Autograph」),以速度200 mm/min於寬度方向(TD方向)或長度方向(MD方向)拉伸測定對象之基材,測定該測定對象之基材切斷(斷裂)時之強度(單位:MPa)。 <Determination of tensile strength of substrate> According to JIS C 2151:2019, a tensile testing machine (manufactured by Shimadzu Corporation, product name "Autograph") is used to stretch the substrate of the measurement object in the width direction (TD direction) or the length direction (MD direction) at a speed of 200 mm/min, and the strength of the substrate of the measurement object when it is cut (broken) is measured (unit: MPa).

<正面相位差及慢軸與長度方向(MD方向)所成之角度之測定> 將各製造例中所獲得之基材或各實施例及各比較例中所獲得之表面保護膜切割成210 mm×300 mm之尺寸,將表面保護膜之剝離襯墊自黏著劑層剝離,藉由偏光-相位差測定系統(Axometrics製造之「AxoScan」、使用軟體(Multi-order-retardance)),於23℃、相對濕度50%之環境下,以測定波長590 nm於面內12點(X[mm]=25、150、275、Y[mm]=15、75、135、195之交點)測定正面相位差及慢軸與長度方向(MD方向)所成之角度,並求出該等12點之平均值。再者,如圖2所示,慢軸與長度方向(MD方向)所成之角度意指以長度方向(MD方向)為基準而將該長度方向(MD方向)設為0°時慢軸與該長度方向(MD方向)於逆時針方向上所成之角度θ。 <Measurement of front phase difference and angle between slow axis and longitudinal direction (MD direction)> The substrate obtained in each manufacturing example or the surface protection film obtained in each embodiment and each comparative example was cut into a size of 210 mm × 300 mm, and the peeling pad of the surface protection film was peeled off from the adhesive layer. The polarization-phase difference measurement system ("AxoScan" manufactured by Axometrics, using software (Multi-order-retardance)) was used to measure the wavelength 590 nm measured the front phase difference and the angle between the slow axis and the longitudinal direction (MD direction) at 12 points in the plane (intersection points of X[mm]=25, 150, 275, Y[mm]=15, 75, 135, 195), and calculated the average value of the 12 points. Furthermore, as shown in Figure 2, the angle between the slow axis and the longitudinal direction (MD direction) means the angle θ between the slow axis and the longitudinal direction (MD direction) in the counterclockwise direction when the longitudinal direction (MD direction) is set to 0° with the longitudinal direction (MD direction) as the reference.

<虹不均> 自表面保護膜將剝離襯墊剝離,以該表面保護膜之基材之慢軸與偏光板(a)(日東電工製造、商品名「SEG1423DU」)之吸收軸所成之角度中,90°以下之角度即軸偏移量成為0°、15°、30°、45°之方式,將該表面保護膜之黏著劑層與偏光板(a)貼合。 其次,於上述表面保護膜之基材側上,以與貼合於上述表面保護膜之偏光板形成正交偏光之方式配置另一偏光板(b)(日東電工製造、商品名「SEG1423DU」)。 自偏光板(b)之下側照射螢光燈之光,藉由對透過光進行目測而根據下述基準於極角0°~85°、方位角0°~360°之間對虹不均之產生程度進行評價。 ◎:於任一極角、方位角均未確認到虹不均。 〇:於特定之極角、方位角略微確認到虹不均。 △:確認到較強之虹不均。 ×:確認到較強之虹不均。 <Iridescence unevenness> The peelable pad is peeled off from the surface protection film, and the adhesive layer of the surface protection film is bonded to the polarizing plate (a) (manufactured by Nitto Denko, trade name "SEG1423DU") so that the angles formed by the slow axis of the substrate of the surface protection film and the absorption axis of the polarizing plate (a) (manufactured by Nitto Denko, trade name "SEG1423DU") are 90° or less, i.e., the axis offset is 0°, 15°, 30°, and 45°. Next, another polarizing plate (b) (manufactured by Nitto Denko, trade name "SEG1423DU") is arranged on the substrate side of the surface protection film so as to form orthogonal polarization with the polarizing plate bonded to the surface protection film. Fluorescent light was irradiated from the bottom side of the polarizing plate (b), and the transmitted light was visually observed to evaluate the degree of rainbow unevenness at polar angles of 0° to 85° and azimuth angles of 0° to 360° according to the following criteria. ◎: No rainbow unevenness was observed at any polar angle or azimuth angle. ○: Slight rainbow unevenness was observed at specific polar angles and azimuth angles. △: Strong rainbow unevenness was observed. ×: Strong rainbow unevenness was observed.

<色相、亮度之測定> 將偏光板(日東電工製造、商品名「SEG1423DU」)切割成180 mm×250 mm之尺寸,以偏光板之吸收軸與亮度提昇膜之反射軸對齊之方式與亮度提昇膜(3M Japan Products製造、商品名「APF-V3」)貼合,製成附亮度提昇膜之偏光板。自表面保護膜將剝離襯墊剝離,以表面保護膜之基材之慢軸與附亮度提昇膜之偏光板之吸收軸所成之角度中,90°以下之角度即軸偏移量成為0°、15°、30°、45°之方式,將表面保護膜之黏著劑層與附亮度提昇膜之偏光板之亮度提昇膜側貼合。又,為了儘量使軸偏移量於面內均勻,需要控制表面保護膜之基材於面內之慢軸之軸角度之不均,因此表面保護膜之基材係使用面內之慢軸之軸角度之最大值-面內之慢軸之軸角度之最小值為1.15°以下者。 於背光裝置上依序設置表面保護膜、附亮度提昇膜之偏光板、測定裝置,藉由2D分光放射計(TOPCON TECHNOHOUSE股份有限公司製造之「SR-5000HS」,使用XYZ模式),將樣品與檢測相機之距離設為590 mm而測定色相、亮度。又,對未貼合表面保護膜之僅附亮度提昇膜之偏光板亦進行同樣之測定。 再者,所使用之背光裝置為(角柱薄片/擴散板/導光板[邊緣型LED]/反射板)之構成,面內之亮度Y之平均值為9500 cd/m 2~10000 cd/m 2,背光裝置之W為(色度座標x=0.28~0.31,色度座標y=0.27~0.32),RGB為R(631 nm)(色度座標x=0.62~0.72,色度座標y=0.22~0.32)、G(535 nm)(色度座標x=0.18~0.26,色度座標y=0.62~0.78)、B(450 nm)(色度座標x=0.08~0.18,色度座標y=0.01~0.12)。 <Measurement of hue and brightness> A polarizing plate (manufactured by Nitto Denko, trade name "SEG1423DU") was cut into a size of 180 mm x 250 mm, and was bonded to a brightness enhancement film (manufactured by 3M Japan Products, trade name "APF-V3") in such a way that the absorption axis of the polarizing plate and the reflection axis of the brightness enhancement film were aligned to produce a polarizing plate with a brightness enhancement film. The peeling pad was peeled off from the surface protective film, and the adhesive layer of the surface protective film was bonded to the brightness enhancement film side of the polarizing plate with a brightness enhancement film in such a way that the angle formed by the slow axis of the substrate of the surface protective film and the absorption axis of the polarizing plate with a brightness enhancement film was 0°, 15°, 30°, or 45°. In order to make the axis offset as uniform as possible within the plane, it is necessary to control the unevenness of the axis angle of the slow axis of the substrate of the surface protection film within the plane. Therefore, the substrate of the surface protection film uses the maximum value of the axis angle of the slow axis within the plane - the minimum value of the axis angle of the slow axis within the plane is less than 1.15°. The surface protection film, the polarizing plate with the brightness enhancement film, and the measuring device are set on the backlight device in sequence. The hue and brightness are measured by a 2D spectroradiometer ("SR-5000HS" manufactured by TOPCON TECHNOHOUSE Co., Ltd., using the XYZ mode) with the distance between the sample and the detection camera set to 590 mm. In addition, the same measurement is also performed on the polarizing plate with only the brightness enhancement film attached without the surface protection film. Furthermore, the backlight device used is composed of (corner column sheet/diffuser plate/light guide plate [edge-type LED]/reflector plate), the average value of the in-plane brightness Y is 9500 cd/ m2 ~10000 cd/ m2 , the W of the backlight device is (chromaticity coordinate x=0.28~0.31, chromaticity coordinate y=0.27~0.32), RGB is R (631 nm) (chromaticity coordinate x=0.62~0.72, chromaticity coordinate y=0.22~0.32), G (535 nm) (chromaticity coordinate x=0.18~0.26, chromaticity coordinate y=0.62~0.78), B (450 nm) (chromaticity coordinate x=0.08~0.18, chromaticity coordinate y=0.01~0.12).

<RGB標準偏差> 由上述<色相、亮度之測定>中所獲得之(1)僅偏光板之RGB各者之資料、及(2)表面保護膜+偏光板之RGB各者之資料算出RGB標準偏差。 於算出時進行以下評價。首先,於算出上述(1)與上述(2)之差時,因軸偏移而存在表面保護膜未貼合至偏光板之部分,因此使用樣品面內之X:0 px~910 px(200 mm)、Y:0 px~730 px(160 mm)中之X:200 px~800 px、Y:100 px~600 px之值。其後,計算RGB各者之標準偏差,最後獲得RGB各者之標準偏差之和,藉此算出RGB標準偏差。 <RGB standard deviation> The RGB standard deviation is calculated from (1) the data of each RGB of the polarizing plate only and (2) the data of each RGB of the surface protection film + polarizing plate obtained in the above <Hue and brightness measurement>. The following evaluation is performed during the calculation. First, when calculating the difference between (1) and (2), due to the axis offset, there is a part where the surface protection film is not attached to the polarizing plate, so the values of X: 200 px to 800 px, Y: 100 px to 600 px in the sample surface X: 0 px to 910 px (200 mm), Y: 0 px to 730 px (160 mm) are used. Then, the standard deviation of each RGB is calculated, and finally the sum of the standard deviations of each RGB is obtained to calculate the RGB standard deviation.

<色散熵S CD> 由上述<色相、亮度之測定>中所獲得之(1)僅偏光板之RGB各者之資料、及(2)表面保護膜+偏光板之RGB各者之資料算出色散熵S CD。 於算出時進行以下評價。首先,於算出上述(1)與上述(2)之差時,因軸偏移而存在表面保護膜未貼合至偏光板之部分,因此使用樣品面內之X:0 px~900 px、Y:0 px~700 px中之X:200 px~800 px、Y:100 px~600 px之值。 繼而,如下所述,定義色散熵S CD並算出。 S CD=S RCD+S GCD+S BCD於R之情形時如下所述。 S RCD=k BlnW k B:玻耳茲曼常數 X:200 px~800 px、Y:100 px~600 px之範圍內之R之上述(1)與上述(2)之差值加上255之值之合計(X:200 px~800 px、Y:100 px~600 px之範圍內之R之上述(1)與上述(2)之差值處於-255~255之範圍,因此為了作為正數進行處理,加上255而作為0~510之值進行處理) N Rn:以10 px×10 px劃分之框中之R之上述(1)與上述(2)之差值加上255之值之合計 W:各框中之N R1、N R2、・・・、N Rn之情形時之數量 W=N R!/(N R1!, N R2!, ..., N Rn!) 又,由於計算較為繁雜,因此使用Stirling公式進行近似計算,根據下式進行計算。 <Dispersion entropy S CD > The dispersion entropy S CD is calculated from (1) the data of each RGB of the polarizing plate only and (2) the data of each RGB of the surface protection film + polarizing plate obtained in the above <Measurement of hue and brightness > . The following evaluation is performed when calculating. First, when calculating the difference between the above (1) and the above (2), due to the axis offset, there is a part where the surface protection film is not attached to the polarizing plate, so the value of X: 200 px ~ 800 px, Y: 100 px ~ 600 px in the sample surface X: 0 px ~ 900 px, Y: 0 px ~ 700 px is used. Then, as described below, the dispersion entropy S CD is defined and calculated. S CD = SRCD + SGCD + SBCD in the case of R is as follows. S RCD = k B lnW k B : Boltzmann constant X: The sum of the difference between (1) and (2) of R in the range of 200 px to 800 px, Y: 100 px to 600 px plus 255 (The difference between (1) and (2) of R in the range of X: 200 px to 800 px, Y: 100 px to 600 px is in the range of -255 to 255, so in order to handle it as a positive number, 255 is added to it and it is handled as a value of 0 to 510) N Rn : The sum of the difference between (1) and (2) of R in the frame divided by 10 px × 10 px plus 255 W: The number W = NR !/(N R1 , NR2 , ..., NRn in each frame) R1 !, N R2 !, ..., N Rn !) Since the calculation is rather complicated, Stirling's formula is used for approximate calculation, and the calculation is performed according to the following formula.

[數學式1] 於G、B之情形時亦以與R相同之方式算出色散熵S CD。 再者,於表中之「色散熵S CD」及「RGB標準偏差/S CD」欄中,記載為「aEb」(a、b為數值)之情形意指「a×10 b」。 [Mathematical formula 1] In the case of G and B, the dispersion entropy S CD is calculated in the same manner as R. In the "Dispersion entropy S CD " and "RGB standard deviation/S CD " columns in the table, "aEb" (a and b are numerical values) means "a×10 b ".

<相對於丙烯酸系樹脂板之剝離力之評價> 將各實施例及各比較例中所獲得之表面保護膜切割成寬度25 mm、長度100 mm之尺寸,將剝離襯墊自黏著劑層剝離,並以壓力0.25 MPa、進給速度0.3 m/分鐘輥壓接於丙烯酸系樹脂板(Mitsubishi Chemical公司製造之「Acrylite」、厚度:2 mm、寬度:70 mm、長度:100 mm)。將該試樣於溫度23℃、相對濕度50%之環境下靜置30分鐘後,於該環境下以剝離角度180°、拉伸速度300 mm/分鐘進行剝離試驗,測定相對於丙烯酸系樹脂板之剝離力。 <Evaluation of peeling force relative to acrylic resin sheet> The surface protective film obtained in each embodiment and each comparative example was cut into a size of 25 mm in width and 100 mm in length, the peeling liner self-adhesive layer was peeled off, and the peeling liner was pressed onto an acrylic resin sheet ("Acrylite" manufactured by Mitsubishi Chemical Co., Ltd., thickness: 2 mm, width: 70 mm, length: 100 mm) with a roller pressure of 0.25 MPa and a feed speed of 0.3 m/min. After the sample was placed in an environment with a temperature of 23°C and a relative humidity of 50% for 30 minutes, a peeling test was performed in the environment with a peeling angle of 180° and a tensile speed of 300 mm/min to measure the peeling force relative to the acrylic resin board.

[製造例1] <丙烯酸系聚合物1之聚合> 向具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內添加作為單體成分之丙烯酸2-乙基己酯(2EHA)96.2質量份、丙烯酸羥基乙酯(HEA)3.8質量份、作為聚合起始劑之2,2'-偶氮二異丁腈(AIBN)0.2質量份、以及乙酸乙酯150質量份,於23℃緩慢攪拌並且導入氮氣而進行氮氣置換。其後,將液溫保持於65℃左右而進行6小時之聚合反應,製備丙烯酸系聚合物1之溶液(濃度40質量%)。丙烯酸系聚合物1之重量平均分子量為54萬。 <丙烯酸系黏著劑1之製備> 向丙烯酸系聚合物1之溶液中加入乙酸乙酯而稀釋至濃度20質量%。向該溶液500質量份(固形物成分100質量份)中加入作為交聯劑之六亞甲基二異氰酸酯之異氰尿酸酯體(Tosoh公司製造之「Coronate HX」)4質量份、作為交聯觸媒之二月桂酸二丁基錫(1質量%乙酸乙酯溶液)3質量份(固形物成分0.03質量份)並進行攪拌,從而製備丙烯酸系黏著劑1。 [Production Example 1] <Polymerization of acrylic polymer 1> 96.2 parts by mass of 2-ethylhexyl acrylate (2EHA) as monomer components, 3.8 parts by mass of hydroxyethyl acrylate (HEA), 0.2 parts by mass of 2,2'-azobisisobutyronitrile (AIBN) as a polymerization initiator, and 150 parts by mass of ethyl acetate were added to a reaction vessel equipped with a thermometer, a stirrer, a condenser, and a nitrogen inlet pipe, and nitrogen replacement was performed while slowly stirring at 23°C and introducing nitrogen. Thereafter, the polymerization reaction was performed for 6 hours while maintaining the liquid temperature at about 65°C to prepare a solution of acrylic polymer 1 (concentration 40% by mass). The weight average molecular weight of acrylic polymer 1 was 540,000. <Preparation of acrylic adhesive 1> Ethyl acetate was added to the solution of acrylic polymer 1 to dilute it to a concentration of 20% by mass. 4 parts by mass of isocyanurate of hexamethylene diisocyanate ("Coronate HX" manufactured by Tosoh Corporation) as a crosslinking agent and 3 parts by mass of dibutyltin dilaurate (1% by mass ethyl acetate solution) as a crosslinking catalyst were added to 500 parts by mass of the solution (100 parts by mass of solid content) and stirred to prepare acrylic adhesive 1.

[製造例2] <丙烯酸系聚合物2之聚合> 向具備溫度計、攪拌機、冷凝器及氮氣導入管之反應容器內添加作為單體成分之丙烯酸丁酯95質量份及丙烯酸5質量份、作為聚合起始劑之AIBN0.2質量份、以及乙酸乙酯186質量份,於23℃緩慢攪拌並且導入氮氣而進行氮氣置換。其後,將液溫保持於63℃左右而進行10小時之聚合反應,製備丙烯酸系聚合物B之溶液(濃度35質量%)。丙烯酸系聚合物2之重量平均分子量為50萬。 <丙烯酸系黏著劑2之製備> 向丙烯酸系聚合物2之溶液中加入乙酸乙酯而稀釋至濃度20質量%。向該溶液500質量份(固形物成分100質量份)中加入作為交聯劑之四官能環氧系化合物(Mitsubishi Gas Chemical公司製造之「Tetrad C」)0.075質量份並進行攪拌,從而製備丙烯酸系黏著劑2。 [Production Example 2] <Polymerization of acrylic polymer 2> Into a reaction vessel equipped with a thermometer, a stirrer, a condenser, and a nitrogen inlet pipe, 95 parts by mass of butyl acrylate and 5 parts by mass of acrylic acid as monomer components, 0.2 parts by mass of AIBN as a polymerization initiator, and 186 parts by mass of ethyl acetate were added, and nitrogen was introduced while slowly stirring at 23°C to perform nitrogen replacement. Thereafter, the polymerization reaction was carried out for 10 hours while maintaining the liquid temperature at about 63°C to prepare a solution of acrylic polymer B (concentration 35% by mass). The weight average molecular weight of acrylic polymer 2 is 500,000. <Preparation of acrylic adhesive 2> Ethyl acetate was added to the solution of acrylic polymer 2 to dilute it to a concentration of 20% by mass. 0.075 parts by mass of a tetrafunctional epoxy compound ("Tetrad C" manufactured by Mitsubishi Gas Chemical Co., Ltd.) as a crosslinking agent was added to 500 parts by mass of the solution (100 parts by mass of solid content) and stirred to prepare an acrylic adhesive 2.

[製造例3] <基材(1)之準備> 於作為熱塑性樹脂基材之吸水率0.60%、Tg80℃之非晶質聚對苯二甲酸乙二酯膜(Mitsubishi Chemical Holdings Group製造、商品名「Novacrea」、厚度100 μm)之單面,於60℃塗佈聚合度2600、皂化度99.9%之聚乙烯醇(PVA)樹脂(日本合成化學工業股份有限公司製造、商品名「Gosenol(註冊商標)NH-26」)之水溶液並使其乾燥,形成厚度7 μm之PVA系樹脂層,製成積層體。 將所獲得之積層體於120℃之烘箱內於周速不同之輥間在縱向(長度方向)上單軸延伸至2倍,繼而,於液溫30℃之不溶浴(相對於水100重量份調配硼酸4重量份而獲得之硼酸水溶液)中浸漬30秒鐘,繼而,於液溫30℃之染色浴(相對於水100重量份調配碘0.2重量份並調配碘化鉀2重量份而獲得之碘水溶液)中浸漬60秒鐘,繼而,於液溫30℃之交聯浴(相對於水100重量份調配碘化鉀3重量份並調配硼酸3重量份而獲得之硼酸水溶液)中浸漬30秒鐘,其後,一面使積層體浸漬於液溫60℃之硼酸水溶液(相對於水100重量份調配硼酸4重量份並調配碘化鉀5重量份而獲得之水溶液),一面於周速不同之輥間於縱向(長度方向)進行單軸延伸。硼酸水溶液中之浸漬時間為120秒,延伸進行至積層體即將斷裂。 其後,使積層體浸漬於洗浄浴(相對於水100重量調配碘化鉀3重量份而獲得之水溶液)之後,利用60℃之熱風使其乾燥。 以此方式獲得於熱塑性樹脂基材上形成有薄型偏光膜之最大延伸倍率6.5倍之光學膜積層體。此處,「最大延伸倍率」係指積層體即將斷裂前之延伸倍率,另行確認積層體斷裂之延伸倍率,將較該值低0.2之值設為「最大延伸倍率」。 最後,藉由剝離將熱塑性樹脂基材自所獲得之光學膜積層體中取出,設為基材(1)。 所使用之基材(1)之厚度為40 μm,正面相位差R0為668 nm。 [Production Example 3] <Preparation of substrate (1)> On one side of an amorphous polyethylene terephthalate film (Mitsubishi Chemical Holdings Group, trade name "Novacrea", thickness 100 μm) with a water absorption rate of 0.60% and a Tg of 80°C as a thermoplastic resin substrate, an aqueous solution of a polyvinyl alcohol (PVA) resin (Nippon Synthetic Chemical Industry Co., Ltd., trade name "Gosenol (registered trademark) NH-26") with a polymerization degree of 2600 and a saponification degree of 99.9% was applied at 60°C and dried to form a PVA-based resin layer with a thickness of 7 μm, thereby producing a laminate. The obtained laminate was uniaxially stretched to 2 times in the longitudinal direction (length direction) between rollers of different peripheral speeds in an oven at 120°C, then immersed in an insoluble bath (a boric acid aqueous solution obtained by mixing 4 parts by weight of boric acid with 100 parts by weight of water) at a liquid temperature of 30°C for 30 seconds, and then immersed in a dyeing bath (an iodine aqueous solution obtained by mixing 0.2 parts by weight of iodine with 2 parts by weight of potassium iodide with 100 parts by weight of water) at a liquid temperature of 30°C for 60 seconds. Seconds, then, immersed in a crosslinking bath at a liquid temperature of 30°C (a boric acid aqueous solution obtained by mixing 3 parts by weight of potassium iodide with 100 parts by weight of water and 3 parts by weight of boric acid) for 30 seconds, and then, while the laminate is immersed in a boric acid aqueous solution at a liquid temperature of 60°C (a water solution obtained by mixing 4 parts by weight of boric acid with 100 parts by weight of water and 5 parts by weight of potassium iodide), it is uniaxially stretched in the longitudinal direction (length direction) between rollers with different peripheral speeds. The immersion time in the boric acid aqueous solution is 120 seconds, and the stretching is carried out until the laminate is about to break. After that, the laminate was immersed in a cleaning bath (an aqueous solution obtained by mixing 3 parts by weight of potassium iodide with 100 parts by weight of water), and then dried using hot air at 60°C. In this way, an optical film laminate with a maximum stretch ratio of 6.5 times was obtained, in which a thin polarizing film was formed on a thermoplastic resin substrate. Here, the "maximum stretch ratio" refers to the stretch ratio before the laminate breaks. The stretch ratio at which the laminate breaks was separately confirmed, and the value 0.2 lower than this value was set as the "maximum stretch ratio". Finally, the thermoplastic resin substrate was removed from the obtained optical film laminate by peeling and set as the substrate (1). The thickness of the substrate (1) used is 40 μm, and the front phase difference R0 is 668 nm.

[製造例4] <基材(2)之準備> 將4片製造例3中所獲得之基材(1)積層而製成基材(2)。以基材之積層方向與基材之慢軸方向儘量一致之方式積層。 所使用之基材(2)之厚度為242 μm,正面相位差R0為2769 nm。 [Production Example 4] <Preparation of substrate (2)> Four substrates (1) obtained in Production Example 3 were layered to produce substrate (2). The layering was performed in such a way that the layering direction of the substrate and the slow axis direction of the substrate were as consistent as possible. The thickness of the substrate (2) used was 242 μm, and the front phase difference R0 was 2769 nm.

[製造例5] <基材(3)之準備> 將6片製造例3中所獲得之基材(1)積層而製成基材(3)。以基材之積層方向與基材之慢軸方向儘量一致之方式積層。 所使用之基材(3)之厚度為368 μm,正面相位差R0為4069 nm。 [Production Example 5] <Preparation of substrate (3)> Six substrates (1) obtained in Production Example 3 were layered to produce substrate (3). The layering was performed in such a way that the layering direction of the substrate and the slow axis direction of the substrate were as consistent as possible. The thickness of the substrate (3) used was 368 μm, and the front phase difference R0 was 4069 nm.

[製造例6] <基材(4)之準備> 將9片製造例3中所獲得之基材(1)積層而製成基材(4)。以基材之積層方向與基材之慢軸方向儘量一致之方式積層。 所使用之基材(4)之厚度為557 μm,正面相位差R0為6011 nm。 [Production Example 6] <Preparation of substrate (4)> Nine substrates (1) obtained in Production Example 3 were layered to produce substrate (4). The layering was performed in such a way that the layering direction of the substrate and the slow axis direction of the substrate were as consistent as possible. The thickness of the substrate (4) used was 557 μm, and the front phase difference R0 was 6011 nm.

[製造例7] <基材(5)之準備> 將超雙折射聚酯膜(Toyobo股份有限公司製造、商品名「COSMOSHINE SRF-1」、厚度=80 μm)設為基材(5)。 所使用之基材(5)之正面相位差R0為8369 nm。 [Production Example 7] <Preparation of substrate (5)> A super birefringent polyester film (manufactured by Toyobo Co., Ltd., trade name "COSMOSHINE SRF-1", thickness = 80 μm) was used as substrate (5). The front phase difference R0 of the substrate (5) used was 8369 nm.

[製造例8] <基材(6)之準備> 將晶質PET膜(Toray股份有限公司製造、商品名「XF60R」、厚度=38 μm)設為基材(6)。該基材(6)之寬度方向(TD方向)之拉伸強度與長度方向(MD方向)之拉伸強度之比(TD/MD)為1.38。 作為所使用之基材(6),藉由改變自主捲筒分割之位置而採用正面相位差R0為1438 nm、1654 nm、1675 nm、1827 nm、1859 nm之5種基材(6)。 [Production Example 8] <Preparation of substrate (6)> A crystalline PET film (manufactured by Toray Co., Ltd., trade name "XF60R", thickness = 38 μm) was used as substrate (6). The ratio (TD/MD) of the tensile strength in the width direction (TD direction) of the substrate (6) was 1.38. As the substrate (6) used, five types of substrates (6) with front phase differences R0 of 1438 nm, 1654 nm, 1675 nm, 1827 nm, and 1859 nm were used by changing the position of the main roll split.

[製造例9] <基材(7)之準備> 將聚酯膜(Mitsubishi Chemical股份有限公司製造、商品名「T100C38」、厚度=38 μm)設為基材(7)。 所使用之基材(7)之正面相位差R0為755 nm。 [Production Example 9] <Preparation of substrate (7)> A polyester film (manufactured by Mitsubishi Chemical Co., Ltd., trade name "T100C38", thickness = 38 μm) was used as substrate (7). The front phase difference R0 of the substrate (7) used was 755 nm.

[製造例10] <塗敷液A之製備> 將含乙烯基之加成型聚矽氧(信越化學工業公司製造、商品名「KS-847T」、30%甲苯溶液)100質量份、鉑觸媒(信越化學工業公司製造、商品名「CAT-PL-50T」)3質量份、作為稀釋溶媒之甲苯15000質量份、正己烷1500質量份混合,製備塗敷液A(參照日本專利特開2015-151473號公報)。 [Production Example 10] <Preparation of coating liquid A> 100 parts by mass of vinyl-containing addition-type polysilicone (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "KS-847T", 30% toluene solution), 3 parts by mass of platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "CAT-PL-50T"), 15,000 parts by mass of toluene as a dilution solvent, and 1,500 parts by mass of n-hexane were mixed to prepare coating liquid A (refer to Japanese Patent Publication No. 2015-151473).

[製造例11] <剝離襯墊A之製作> 使用邁耶棒將塗敷液A塗佈於厚度38 μm之聚對苯二甲酸乙二酯(PET)膜(Mitsubishi Chemical股份有限公司製造,商品名「T100C38」,厚度=38 μm)之一個面後,利用熱風乾燥機以130℃加熱1分鐘,獲得剝離襯墊A。再者,塗敷液A之塗佈量以固形物成分計設為0.1 g/m 2。又,塗敷液A之塗佈面係設為PET膜之電暈處理面。 [Production Example 11] <Production of Peelable Liner A> After applying the coating liquid A on one side of a 38 μm thick polyethylene terephthalate (PET) film (manufactured by Mitsubishi Chemical Co., Ltd., trade name "T100C38", thickness = 38 μm) using a Mayer bar, the film was heated at 130°C for 1 minute using a hot air dryer to obtain a peelable liner A. The coating amount of the coating liquid A was set to 0.1 g/m 2 in terms of solid content. In addition, the coating surface of the coating liquid A was set to the corona-treated surface of the PET film.

[實施例1] 將製造例1中所獲得之丙烯酸系黏著劑1塗佈於剝離襯墊A之表面並使其乾燥而於該剝離襯墊上形成厚度10 μm之黏著劑層。將製造例3中所獲得之基材(1)貼合於所獲得之黏著劑層,獲得附剝離襯墊之表面保護膜(1)。 其次,將偏光板(日東電工製造,商品名「SEG1423DU」)切割成180 mm×250 mm之尺寸,與亮度提昇膜(3M Japan Products製造、商品名「APF-V3」)貼合,使偏光板之吸收軸與亮度提昇膜之反射軸對齊,而製成附亮度提昇膜之偏光板(A)。 自所獲得之附剝離襯墊之表面保護膜(1)將剝離襯墊剝離,於黏著劑層對附有亮度提昇膜之偏光板(A),以該表面保護膜(1)之基材之慢軸與該偏光板之吸收軸所成之角度中90°以下之角度即軸偏移量成為0°之方式,將該附亮度提昇膜之偏光板之亮度提昇膜側與該表面保護膜之黏著劑層貼合,而獲得光學積層體(1)。 將各種評價結果示於表1。 [Example 1] The acrylic adhesive 1 obtained in Preparation Example 1 was applied to the surface of a peeling pad A and dried to form an adhesive layer with a thickness of 10 μm on the peeling pad. The substrate (1) obtained in Preparation Example 3 was attached to the obtained adhesive layer to obtain a surface protective film (1) attached to a peeling pad. Next, cut the polarizing plate (manufactured by Nitto Denko, trade name "SEG1423DU") into a size of 180 mm × 250 mm, and laminate it with the brightness enhancement film (manufactured by 3M Japan Products, trade name "APF-V3"), so that the absorption axis of the polarizing plate and the reflection axis of the brightness enhancement film are aligned, thus making a polarizing plate with brightness enhancement film (A). The peelable liner is peeled off from the obtained surface protective film (1) with a peelable liner, and the polarizing plate (A) with a brightness enhancement film is bonded to the adhesive layer of the surface protective film so that the angle between the slow axis of the substrate of the surface protective film (1) and the absorption axis of the polarizing plate is 90° or less, i.e., the axis offset is 0°, thereby obtaining an optical laminate (1). The various evaluation results are shown in Table 1.

[實施例2] 除將軸偏移量變更為15°以外,以與實施例1相同之方式進行,而獲得附剝離襯墊之表面保護膜(2)、光學積層體(2)。 將各種評價結果示於表1。 [Example 2] Except that the axis offset was changed to 15°, the same method as Example 1 was used to obtain a surface protection film (2) with a peel-off pad and an optical laminate (2). The various evaluation results are shown in Table 1.

[實施例3] 除將軸偏移量變更為30°以外,以與實施例1相同之方式進行,獲得附剝離襯墊之表面保護膜(3)、光學積層體(3)。 將各種評價結果示於表1。 [Example 3] Except that the axis offset was changed to 30°, the same method as Example 1 was used to obtain a surface protection film (3) with a peel-off pad and an optical laminate (3). The various evaluation results are shown in Table 1.

[實施例4] 將製造例1中所獲得之丙烯酸系黏著劑1塗佈於製造例8中所獲得之正面相位差R0為1438 nm之基材(6)之表面並使其乾燥,於該基材(6)上形成厚度10 μm之黏著劑層。將剝離襯墊A貼合於所獲得之黏著劑層之與基材(6)為相反側之表面,獲得附剝離襯墊之表面保護膜(4)。 自所獲得之附剝離襯墊之表面保護膜(4)將剝離襯墊剝離,將附亮度提昇膜之偏光板(A)以該表面保護膜之基材之慢軸與該偏光板之吸收軸所成之角度中90°以下之角度即軸偏移量成為0°之方式貼合於黏著劑層,獲得光學積層體(4)。 將各種評價結果示於表1。 [Example 4] The acrylic adhesive 1 obtained in Preparation Example 1 is applied to the surface of the substrate (6) having a front phase difference R0 of 1438 nm obtained in Preparation Example 8 and dried to form an adhesive layer with a thickness of 10 μm on the substrate (6). A peelable liner A is attached to the surface of the obtained adhesive layer on the opposite side to the substrate (6) to obtain a surface protective film (4) with a peelable liner. The peelable liner is peeled off from the obtained surface protective film (4) with the peelable liner, and the polarizing plate (A) with the brightness enhancement film is attached to the adhesive layer in such a manner that the angle between the slow axis of the substrate of the surface protective film and the absorption axis of the polarizing plate is 90° or less, that is, the axis offset is 0°, thereby obtaining an optical laminate (4). The various evaluation results are shown in Table 1.

[實施例5] 除將軸偏移量變更為15°以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(5)、光學積層體(5)。 將各種評價結果示於表1。 [Example 5] Except that the axis offset was changed to 15°, the same method as Example 4 was used to obtain a surface protection film (5) with a peel-off pad and an optical laminate (5). The various evaluation results are shown in Table 1.

[實施例6] 除將軸偏移量變更為30°以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(6)、光學積層體(6)。 將各種評價結果示於表1。 [Example 6] Except that the axis offset was changed to 30°, the same method as Example 4 was used to obtain a surface protection film (6) with a peel-off pad and an optical laminate (6). The various evaluation results are shown in Table 1.

[實施例7] 除使用製造例2中所獲得之丙烯酸系黏著劑2代替製造例1中所獲得之丙烯酸系黏著劑1以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(7)、光學積層體(7)。 將各種評價結果示於表1。 [Example 7] Except that the acrylic adhesive 2 obtained in Preparation Example 2 was used instead of the acrylic adhesive 1 obtained in Preparation Example 1, the same method as Example 4 was used to obtain a surface protective film (7) with a peel-off pad and an optical laminate (7). The various evaluation results are shown in Table 1.

[實施例8] 除使用製造例8中所獲得之正面相位差R0為1675 nm之基材(6)代替製造例8中所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(8)、光學積層體(8)。 將各種評價結果示於表1。 [Example 8] Except that the substrate (6) with a front phase difference R0 of 1675 nm obtained in Manufacturing Example 8 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Manufacturing Example 8, the same method as Example 4 was used to obtain a surface protection film (8) with a peel-off pad and an optical laminate (8). The various evaluation results are shown in Table 1.

[實施例9] 除將軸偏移量變更為15°以外,以與實施例8相同之方式進行,獲得附剝離襯墊之表面保護膜(9)、光學積層體(9)。 將各種評價結果示於表1。 [Example 9] Except that the axis offset was changed to 15°, the same method as Example 8 was used to obtain a surface protection film (9) with a peel-off pad and an optical laminate (9). The various evaluation results are shown in Table 1.

[實施例10] 除將軸偏移量變更為30°以外,以與實施例8相同之方式進行,獲得附剝離襯墊之表面保護膜(10)、光學積層體(10)。 將各種評價結果示於表1。 [Example 10] Except that the axis offset was changed to 30°, the same method as Example 8 was used to obtain a surface protection film (10) with a peel-off pad and an optical laminate (10). The various evaluation results are shown in Table 1.

[實施例11] 除使用製造例8中所獲得之正面相位差R0為1654 nm之基材(6)代替製造例8中所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(11)、光學積層體(11)。 將各種評價結果示於表1。 [Example 11] Except that the substrate (6) with a front phase difference R0 of 1654 nm obtained in Manufacturing Example 8 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Manufacturing Example 8, the same method as Example 4 was used to obtain a surface protection film (11) with a peel-off pad and an optical laminate (11). The various evaluation results are shown in Table 1.

[實施例12] 除將軸偏移量變更為15°以外,以與實施例11相同之方式進行,獲得附剝離襯墊之表面保護膜(12)、光學積層體(12)。 將各種評價結果示於表1。 [Example 12] Except that the axis offset was changed to 15°, the same method as Example 11 was used to obtain a surface protection film (12) with a peel-off pad and an optical laminate (12). The various evaluation results are shown in Table 1.

[實施例13] 除將軸偏移量變更為30°以外,以與實施例11相同之方式進行,獲得附剝離襯墊之表面保護膜(13)、光學積層體(13)。 將各種評價結果示於表1。 [Example 13] Except that the axis offset was changed to 30°, the same method as Example 11 was used to obtain a surface protection film (13) with a peel-off pad and an optical laminate (13). The various evaluation results are shown in Table 1.

[實施例14] 除使用製造例8所獲得之正面相位差R0為1859 nm之基材(6)代替製造例8所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(14)、光學積層體(14)。 將各種評價結果示於表1。 [Example 14] Except that the substrate (6) with a front phase difference R0 of 1859 nm obtained in Example 8 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Example 8, the same method as Example 4 was used to obtain a surface protection film (14) with a peel-off pad and an optical laminate (14). The various evaluation results are shown in Table 1.

[實施例15] 除將軸偏移量變更為15°以外,以與實施例14相同之方式進行,獲得附剝離襯墊之表面保護膜(15)、光學積層體(15)。 將各種評價結果示於表1。 [Example 15] Except that the axis offset was changed to 15°, the same method as Example 14 was used to obtain a surface protection film (15) and an optical laminate (15) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例16] 除將軸偏移量變更為30°以外,以與實施例14相同之方式進行,獲得附剝離襯墊之表面保護膜(16)、光學積層體(16)。 將各種評價結果示於表1。 [Example 16] Except that the axis offset was changed to 30°, the same method as Example 14 was used to obtain a surface protection film (16) and an optical laminate (16) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例17] 除使用製造例8所獲得之正面相位差R0為1827 nm之基材(6)代替製造例8所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(17)、光學積層體(17)。 將各種評價結果示於表1。 [Example 17] Except that the substrate (6) with a front phase difference R0 of 1827 nm obtained in Manufacturing Example 8 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Manufacturing Example 8, the same method as Example 4 was used to obtain a surface protection film (17) with a peel-off pad and an optical laminate (17). The various evaluation results are shown in Table 1.

[實施例18] 除將軸偏移量變更為15°以外,以與實施例17相同之方式進行,獲得附剝離襯墊之表面保護膜(18)、光學積層體(18)。 將各種評價結果示於表1。 [Example 18] Except that the axis offset was changed to 15°, the same method as Example 17 was used to obtain a surface protection film (18) and an optical laminate (18) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例19] 除將軸偏移量變更為30°以外,以與實施例17相同之方式進行,獲得附剝離襯墊之表面保護膜(19)、光學積層體(19)。 將各種評價結果示於表1。 [Example 19] Except that the axis offset was changed to 30°, the same method as Example 17 was used to obtain a surface protection film (19) and an optical laminate (19) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例20] 除使用製造例5中所獲得之基材(3)代替製造例3中所獲得之基材(1)以外,以與實施例1相同之方式進行,獲得附剝離襯墊之表面保護膜(20)、光學積層體(20)。 將各種評價結果示於表1。 [Example 20] Except that the substrate (3) obtained in Production Example 5 was used instead of the substrate (1) obtained in Production Example 3, the same method as in Example 1 was used to obtain a surface protective film (20) with a peel-off pad and an optical laminate (20). The various evaluation results are shown in Table 1.

[實施例21] 除將軸偏移量變更為15°以外,以與實施例20相同之方式進行,獲得附剝離襯墊之表面保護膜(21)、光學積層體(21)。 將各種評價結果示於表1。 [Example 21] Except that the axis offset was changed to 15°, the same method as Example 20 was carried out to obtain a surface protection film (21) with a peel-off pad and an optical laminate (21). The various evaluation results are shown in Table 1.

[實施例22] 除將軸偏移量變更為30°以外,以與實施例20相同之方式進行,獲得附剝離襯墊之表面保護膜(22)、光學積層體(22)。 將各種評價結果示於表1。 [Example 22] Except that the axis offset is changed to 30°, the same method as Example 20 is carried out to obtain a surface protection film (22) with a peel-off pad and an optical laminate (22). The various evaluation results are shown in Table 1.

[實施例23] 除使用製造例6中所獲得之基材(4)代替製造例3中所獲得之基材(1)以外,以與實施例1相同之方式進行,獲得附剝離襯墊之表面保護膜(23)、光學積層體(23)。 將各種評價結果示於表1。 [Example 23] Except that the substrate (4) obtained in Preparation Example 6 was used instead of the substrate (1) obtained in Preparation Example 3, the same method as Example 1 was used to obtain a surface protective film (23) with a peel-off pad and an optical laminate (23). The various evaluation results are shown in Table 1.

[實施例24] 除將軸偏移量變更為15°以外,以與實施例23相同之方式進行,獲得附剝離襯墊之表面保護膜(24)、光學積層體(24)。 將各種評價結果示於表1。 [Example 24] Except that the axis offset was changed to 15°, the same method as Example 23 was used to obtain a surface protection film (24) with a peel-off pad and an optical laminate (24). The various evaluation results are shown in Table 1.

[實施例25] 除將軸偏移量變更為30°以外,以與實施例23相同之方式進行,獲得附剝離襯墊之表面保護膜(25)、光學積層體(25)。 將各種評價結果示於表1。 [Example 25] Except that the axis offset was changed to 30°, the same method as Example 23 was used to obtain a surface protection film (25) with a peel-off pad and an optical laminate (25). The various evaluation results are shown in Table 1.

[實施例26] 除使用製造例7中所獲得之基材(5)代替製造例8所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(26)、光學積層體(26)。 將各種評價結果示於表1。 [Example 26] Except that the substrate (5) obtained in Production Example 7 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Production Example 8, the same method as in Example 4 was used to obtain a surface protection film (26) with a peel-off pad and an optical laminate (26). The various evaluation results are shown in Table 1.

[實施例27] 除將軸偏移量變更為15°以外,以與實施例26相同之方式進行,獲得附剝離襯墊之表面保護膜(27)、光學積層體(27)。 將各種評價結果示於表1。 [Example 27] Except that the axis offset was changed to 15°, the same method as Example 26 was used to obtain a surface protection film (27) and an optical laminate (27) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例28] 除將軸偏移量變更為30°以外,以與實施例26相同之方式進行,獲得附剝離襯墊之表面保護膜(28)、光學積層體(28)。 將各種評價結果示於表1。 [Example 28] Except that the axis offset is changed to 30°, the same method as Example 26 is carried out to obtain a surface protection film (28) and an optical laminate (28) with a peel-off pad. The various evaluation results are shown in Table 1.

[實施例29] 除使用製造例2中所獲得之丙烯酸系黏著劑2代替製造例1中所獲得之丙烯酸系黏著劑1以外,以與實施例26相同之方式進行,獲得附剝離襯墊之表面保護膜(29)、光學積層體(29)。 將各種評價結果示於表1。 [Example 29] Except that the acrylic adhesive 2 obtained in Preparation Example 2 was used instead of the acrylic adhesive 1 obtained in Preparation Example 1, the same method as Example 26 was used to obtain a surface protective film (29) with a peel-off pad and an optical laminate (29). The various evaluation results are shown in Table 1.

[比較例1] 除使用製造例4中所獲得之基材(2)代替製造例3中所獲得之基材(1)以外,以與實施例1相同之方式進行,獲得附剝離襯墊之表面保護膜(C1)、光學積層體(C1)。 將各種評價結果示於表1。 [Comparative Example 1] Except that the substrate (2) obtained in Production Example 4 was used instead of the substrate (1) obtained in Production Example 3, the same method as in Example 1 was used to obtain a surface protective film (C1) with a peel-off pad and an optical laminate (C1). The various evaluation results are shown in Table 1.

[比較例2] 除將軸偏移量變更為15°以外,以與比較例1相同之方式進行,獲得附剝離襯墊之表面保護膜(C2)、光學積層體(C2)。 將各種評價結果示於表1。 [Comparative Example 2] Except that the axis offset was changed to 15°, the same method as in Comparative Example 1 was used to obtain a surface protection film (C2) and an optical laminate (C2) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例3] 除將軸偏移量變更為30°以外,以與比較例1相同之方式進行,獲得附剝離襯墊之表面保護膜(C3)、光學積層體(C3)。 將各種評價結果示於表1。 [Comparative Example 3] Except that the axis offset was changed to 30°, the same method as in Comparative Example 1 was used to obtain a surface protection film (C3) and an optical laminate (C3) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例4] 除將軸偏移量變更為45°以外,以與比較例1相同之方式進行,獲得附剝離襯墊之表面保護膜(C4)、光學積層體(C4)。 將各種評價結果示於表1。 [Comparative Example 4] Except that the axis offset was changed to 45°, the same method as in Comparative Example 1 was used to obtain a surface protection film (C4) and an optical laminate (C4) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例5] 除將軸偏移量變更為45°以外,以與實施例20相同之方式進行,獲得附剝離襯墊之表面保護膜(C5)、光學積層體(C5)。 將各種評價結果示於表1。 [Comparative Example 5] Except that the axis offset was changed to 45°, the same method as Example 20 was used to obtain a surface protection film (C5) and an optical laminate (C5) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例6] 除使用製造例9中所獲得之基材(7)代替製造例3中所獲得之基材(1)以外,以與實施例1相同之方式進行,獲得附剝離襯墊之表面保護膜(C6)、光學積層體(C6)。 將各種評價結果示於表1。 [Comparative Example 6] Except that the substrate (7) obtained in Production Example 9 was used instead of the substrate (1) obtained in Production Example 3, the same method as in Example 1 was used to obtain a surface protective film (C6) and an optical laminate (C6) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例7] 除使用製造例9中所獲得之基材(7)代替製造例8所獲得之正面相位差R0為1438 nm之基材(6)以外,以與實施例4相同之方式進行,獲得附剝離襯墊之表面保護膜(C7)、光學積層體(C7)。 將各種評價結果示於表1。 [Comparative Example 7] Except that the substrate (7) obtained in Manufacturing Example 9 was used instead of the substrate (6) with a front phase difference R0 of 1438 nm obtained in Manufacturing Example 8, the same method as in Example 4 was used to obtain a surface protective film (C7) and an optical laminate (C7) with a peel-off pad. The various evaluation results are shown in Table 1.

[比較例8] 除使用製造例2中所獲得之丙烯酸系黏著劑2代替製造例1中所獲得之丙烯酸系黏著劑1以外,以與比較例7相同之方式進行,獲得附剝離襯墊之表面保護膜(C8)、光學積層體(C8)。 將各種評價結果示於表1。 [Comparative Example 8] Except that the acrylic adhesive 2 obtained in Production Example 2 was used instead of the acrylic adhesive 1 obtained in Production Example 1, the same method as in Comparative Example 7 was used to obtain a surface protective film (C8) and an optical laminate (C8) with a peel-off pad. The various evaluation results are shown in Table 1.

[表1] 實施例/比較例 基材 黏著劑層 表面保護膜 光學積層體 種類 厚度 [μm] 正面相位差R0 [nm] 種類 塗敷 方式 厚度 [μm] 相對於丙烯酸系樹脂板之剝離力 [N/25 mm] 正面相位差R0 [nm] 慢軸與長度方向(MD方向)所成之角度面內平均值[º] 慢軸與長度方向(MD方向)所成之角度面內最大值[º] 慢軸與長度方向(MD方向)所成之角度面內最小值[º] 慢軸與長度方向(MD方向)所成之角度最大值-最小值[º] 軸偏移 [º] 虹不均評價 RGB標準偏差 色散熵S CD RGB標準偏差/S CD 實施例1 (1) 40 668 1 轉印 10 0.09 672 88.99 89.18 88.82 0.36 0 9.04 2.56E-14 3.53E+14 實施例2 (1) 40 668 1 轉印 10 0.09 672 88.99 89.18 88.82 0.36 15 9.31 2.56E-14 3.63E+14 實施例3 (1) 40 668 1 轉印 10 0.09 672 88.99 89.18 88.82 0.36 30 9.39 2.54E-14 3.69E+14 實施例4 (6) 38 1438 1 直印 10 0.09 1452 89.77 90.28 89.20 1.08 0 9.10 2.57E-14 3.54E+14 實施例5 (6) 38 1438 1 直印 10 0.09 1452 89.77 90.28 89.20 1.08 15 9.25 2.56E-14 3.61E+14 實施例6 (6) 38 1438 1 直印 10 0.09 1452 89.77 90.28 89.20 1.08 30 9.31 2.54E-14 3.67E+14 實施例7 (6) 38 1438 2 直印 13 10.5 1449 89.75 90.26 89.18 1.08 0 9.11 2.55E-14 3.54E+14 實施例8 (6) 38 1675 1 直印 15 0.09 1688 91.23 91.85 90.71 1.14 0 9.08 2.56E-14 3.55E+14 實施例9 (6) 38 1675 1 直印 15 0.09 1688 91.23 91.85 90.71 1.14 15 9.10 2.57E-14 3.54E+14 實施例10 (6) 38 1675 1 直印 15 0.09 1688 91.23 91.85 90.71 1.14 30 9.28 2.56E-14 3.63E+14 實施例11 (6) 38 1654 1 直印 20 0.09 1643 90.78 91.21 90.18 1.03 0 9.09 2.57E-14 3.54E+14 實施例12 (6) 38 1654 1 直印 20 0.09 1643 90.78 91.21 90.18 1.03 15 9.13 2.55E-14 3.58E+14 實施例13 (6) 38 1654 1 直印 20 0.09 1643 90.78 91.21 90.18 1.03 30 9.25 2.55E-14 3.63E+14 實施例14 (6) 38 1859 1 直印 15 0.09 1843 82.65 83.22 82.13 1.09 0 9.11 2.57E-14 3.54E+14 實施例15 (6) 38 1859 1 直印 15 0.09 1843 82.65 83.22 82.13 1.09 15 9.22 2.57E-14 3.59E+14 實施例16 (6) 38 1859 1 直印 15 0.09 1843 82.65 83.22 82.13 1.09 30 9.34 2.56E-14 3.65E+14 實施例17 (6) 38 1827 1 直印 20 0.09 1804 83.49 83.96 83.04 0.92 0 9.13 2.57E-14 3.55E+14 實施例18 (6) 38 1827 1 直印 20 0.09 1804 83.49 83.96 83.04 0.92 15 9.20 2.54E-14 3.62E+14 實施例19 (6) 38 1827 1 直印 20 0.09 1804 83.49 83.96 83.04 0.92 30 9.36 2.55E-14 3.67E+14 實施例20 (3) 368 4069 1 轉印 10 0.09 4074 89.37 89.60 89.09 0.51 0 9.57 2.54E-14 3.76E+14 實施例21 (3) 368 4069 1 轉印 10 0.09 4074 89.37 89.60 89.09 0.51 15 9.61 2.54E-14 3.78E+14 實施例22 (3) 368 4069 1 轉印 10 0.09 4074 89.37 89.60 89.09 0.51 30 9.61 2.54E-14 3.78E+14 實施例23 (4) 557 6011 1 轉印 10 0.09 6039 87.16 87.51 86.36 1.15 0 9.17 2.57E-14 3.57E+14 實施例24 (4) 557 6011 1 轉印 10 0.09 6039 87.16 87.51 86.36 1.15 15 9.29 2.56E-14 3.64E+14 實施例25 (4) 557 6011 1 轉印 10 0.09 6039 87.16 87.51 86.36 1.15 30 9.39 2.54E-14 3.70E+14 實施例26 (5) 80 8369 1 直印 10 0.09 8375 91.81 92.31 91.35 0.96 0 9.17 2.57E-14 3.57E+14 實施例27 (5) 80 8369 1 直印 10 0.09 8375 91.81 92.31 91.35 0.96 15 9.24 2.56E-14 3.61E+14 實施例28 (5) 80 8369 1 直印 10 0.09 8375 91.81 92.31 91.35 0.96 30 9.31 2.55E-14 3.65E+14 實施例29 (5) 80 8369 2 直印 13 10.5 8378 91.83 92.33 91.37 0.96 0 9.17 2.57E-14 3.57E+14 比較例1 (2) 242 2769 1 轉印 10 0.09 2705 89.35 89.64 89.04 0.60 0 × 9.25 2.45E-14 3.78E+14 比較例2 (2) 242 2769 1 轉印 10 0.09 2705 89.35 89.64 89.04 0.60 15 × 9.40 2.44E-14 3.86E+14 比較例3 (2) 242 2769 1 轉印 10 0.09 2705 89.35 89.64 89.04 0.60 30 × 9.46 2.38E-14 3.98E+14 比較例4 (2) 242 2769 1 轉印 10 0.09 2705 89.35 89.64 89.04 0.60 45 × 9.66 2.34E-14 4.13E+14 比較例5 (3) 368 4069 1 轉印 10 0.09 4074 89.37 89.60 89.09 0.51 45 × 9.87 2.50E-14 3.95E+14 比較例6 (7) 38 755 1 轉印 10 0.09 741 100.78 104.19 98.36 5.83 - × 9.60 1.52E-14 6.30E+14 比較例7 (7) 38 755 1 直印 10 0.09 765 108.20 111.96 104.79 7.17 - × 9.78 1.54E-14 6.37E+14 比較例8 (7) 38 755 2 直印 13 10.5 763 108.15 111.91 104.74 7.17 - × 9.72 1.53E-14 6.36E+14 [產業上之可利用性] [Table 1] Example/Comparative Example Substrate Adhesive layer Surface protection film Optical laminate Type Thickness [μm] Front phase difference R0 [nm] Type Application method Thickness [μm] Relative peeling force of acrylic board [N/25 mm] Front phase difference R0 [nm] Average value of the angle between the slow axis and the longitudinal direction (MD direction) [°] The maximum value of the angle between the slow axis and the longitudinal direction (MD direction) in the plane [°] Minimum value of the angle between the slow axis and the longitudinal direction (MD direction) in the plane [°] The maximum and minimum angles between the slow axis and the longitudinal direction (MD direction) [°] Axis offset [°] Rainbow uneven evaluation RGB standard deviation Dispersion entropy S CD RGB standard deviation/S CD Embodiment 1 (1) 40 668 1 Transfer 10 0.09 672 88.99 89.18 88.82 0.36 0 9.04 2.56E-14 3.53E+14 Embodiment 2 (1) 40 668 1 Transfer 10 0.09 672 88.99 89.18 88.82 0.36 15 9.31 2.56E-14 3.63E+14 Embodiment 3 (1) 40 668 1 Transfer 10 0.09 672 88.99 89.18 88.82 0.36 30 9.39 2.54E-14 3.69E+14 Embodiment 4 (6) 38 1438 1 Direct printing 10 0.09 1452 89.77 90.28 89.20 1.08 0 9.10 2.57E-14 3.54E+14 Embodiment 5 (6) 38 1438 1 Direct printing 10 0.09 1452 89.77 90.28 89.20 1.08 15 9.25 2.56E-14 3.61E+14 Embodiment 6 (6) 38 1438 1 Direct printing 10 0.09 1452 89.77 90.28 89.20 1.08 30 9.31 2.54E-14 3.67E+14 Embodiment 7 (6) 38 1438 2 Direct printing 13 10.5 1449 89.75 90.26 89.18 1.08 0 9.11 2.55E-14 3.54E+14 Embodiment 8 (6) 38 1675 1 Direct printing 15 0.09 1688 91.23 91.85 90.71 1.14 0 9.08 2.56E-14 3.55E+14 Embodiment 9 (6) 38 1675 1 Direct printing 15 0.09 1688 91.23 91.85 90.71 1.14 15 9.10 2.57E-14 3.54E+14 Embodiment 10 (6) 38 1675 1 Direct printing 15 0.09 1688 91.23 91.85 90.71 1.14 30 9.28 2.56E-14 3.63E+14 Embodiment 11 (6) 38 1654 1 Direct printing 20 0.09 1643 90.78 91.21 90.18 1.03 0 9.09 2.57E-14 3.54E+14 Embodiment 12 (6) 38 1654 1 Direct printing 20 0.09 1643 90.78 91.21 90.18 1.03 15 9.13 2.55E-14 3.58E+14 Embodiment 13 (6) 38 1654 1 Direct printing 20 0.09 1643 90.78 91.21 90.18 1.03 30 9.25 2.55E-14 3.63E+14 Embodiment 14 (6) 38 1859 1 Direct printing 15 0.09 1843 82.65 83.22 82.13 1.09 0 9.11 2.57E-14 3.54E+14 Embodiment 15 (6) 38 1859 1 Direct printing 15 0.09 1843 82.65 83.22 82.13 1.09 15 9.22 2.57E-14 3.59E+14 Embodiment 16 (6) 38 1859 1 Direct printing 15 0.09 1843 82.65 83.22 82.13 1.09 30 9.34 2.56E-14 3.65E+14 Embodiment 17 (6) 38 1827 1 Direct printing 20 0.09 1804 83.49 83.96 83.04 0.92 0 9.13 2.57E-14 3.55E+14 Embodiment 18 (6) 38 1827 1 Direct printing 20 0.09 1804 83.49 83.96 83.04 0.92 15 9.20 2.54E-14 3.62E+14 Embodiment 19 (6) 38 1827 1 Direct printing 20 0.09 1804 83.49 83.96 83.04 0.92 30 9.36 2.55E-14 3.67E+14 Embodiment 20 (3) 368 4069 1 Transfer 10 0.09 4074 89.37 89.60 89.09 0.51 0 9.57 2.54E-14 3.76E+14 Embodiment 21 (3) 368 4069 1 Transfer 10 0.09 4074 89.37 89.60 89.09 0.51 15 9.61 2.54E-14 3.78E+14 Embodiment 22 (3) 368 4069 1 Transfer 10 0.09 4074 89.37 89.60 89.09 0.51 30 9.61 2.54E-14 3.78E+14 Embodiment 23 (4) 557 6011 1 Transfer 10 0.09 6039 87.16 87.51 86.36 1.15 0 9.17 2.57E-14 3.57E+14 Embodiment 24 (4) 557 6011 1 Transfer 10 0.09 6039 87.16 87.51 86.36 1.15 15 9.29 2.56E-14 3.64E+14 Embodiment 25 (4) 557 6011 1 Transfer 10 0.09 6039 87.16 87.51 86.36 1.15 30 9.39 2.54E-14 3.70E+14 Embodiment 26 (5) 80 8369 1 Direct printing 10 0.09 8375 91.81 92.31 91.35 0.96 0 9.17 2.57E-14 3.57E+14 Embodiment 27 (5) 80 8369 1 Direct printing 10 0.09 8375 91.81 92.31 91.35 0.96 15 9.24 2.56E-14 3.61E+14 Embodiment 28 (5) 80 8369 1 Direct printing 10 0.09 8375 91.81 92.31 91.35 0.96 30 9.31 2.55E-14 3.65E+14 Embodiment 29 (5) 80 8369 2 Direct printing 13 10.5 8378 91.83 92.33 91.37 0.96 0 9.17 2.57E-14 3.57E+14 Comparison Example 1 (2) 242 2769 1 Transfer 10 0.09 2705 89.35 89.64 89.04 0.60 0 × 9.25 2.45E-14 3.78E+14 Comparison Example 2 (2) 242 2769 1 Transfer 10 0.09 2705 89.35 89.64 89.04 0.60 15 × 9.40 2.44E-14 3.86E+14 Comparison Example 3 (2) 242 2769 1 Transfer 10 0.09 2705 89.35 89.64 89.04 0.60 30 × 9.46 2.38E-14 3.98E+14 Comparison Example 4 (2) 242 2769 1 Transfer 10 0.09 2705 89.35 89.64 89.04 0.60 45 × 9.66 2.34E-14 4.13E+14 Comparison Example 5 (3) 368 4069 1 Transfer 10 0.09 4074 89.37 89.60 89.09 0.51 45 × 9.87 2.50E-14 3.95E+14 Comparative Example 6 (7) 38 755 1 Transfer 10 0.09 741 100.78 104.19 98.36 5.83 - × 9.60 1.52E-14 6.30E+14 Comparison Example 7 (7) 38 755 1 Direct printing 10 0.09 765 108.20 111.96 104.79 7.17 - × 9.78 1.54E-14 6.37E+14 Comparative Example 8 (7) 38 755 2 Direct printing 13 10.5 763 108.15 111.91 104.74 7.17 - × 9.72 1.53E-14 6.36E+14 [Industrial Availability]

本發明之光學積層體可用於任意適當之用途。較佳為將本發明之光學積層體較佳地用於光學構件或電子構件領域。The optical multilayer of the present invention can be used for any appropriate purpose. Preferably, the optical multilayer of the present invention is used in the field of optical components or electronic components.

10:基材 20:黏著劑層 100:表面保護膜 200:光學構件 1000:光學積層體 θ:角度 10: substrate 20: adhesive layer 100: surface protection film 200: optical component 1000: optical laminate θ: angle

圖1係表示本發明之光學積層體之一實施方式之概略剖視圖。 圖2係對慢軸與長度方向(MD方向)所成之角度進行說明之概略說明圖。 FIG1 is a schematic cross-sectional view showing one embodiment of the optical multilayer body of the present invention. FIG2 is a schematic explanatory view for explaining the angle between the slow axis and the longitudinal direction (MD direction).

10:基材 10: Base material

20:黏著劑層 20: Adhesive layer

100:表面保護膜 100: Surface protection film

200:光學構件 200: Optical components

1000:光學積層體 1000:Optical multilayer

Claims (3)

一種光學積層體, 其包含表面保護膜及光學構件, 該表面保護膜具有基材及黏著劑層, 該光學構件具有偏光板, 該表面保護膜之正面相位差R0為R0≦2500 nm或R0≧3000 nm, 該偏光板之吸收軸與該表面保護膜所具有之基材之慢軸所成之角度為30°以下。 An optical laminate, comprising a surface protection film and an optical component, the surface protection film having a substrate and an adhesive layer, the optical component having a polarizing plate, the front phase difference R0 of the surface protection film being R0≦2500 nm or R0≧3000 nm, the angle between the absorption axis of the polarizing plate and the slow axis of the substrate of the surface protection film being less than 30°. 如請求項1之光學積層體,其中上述光學積層體之RGB標準偏差為9.50以下。An optical multilayer as claimed in claim 1, wherein the RGB standard deviation of the optical multilayer is less than 9.50. 如請求項1之光學積層體,其中上述光學積層體之色散熵S CD為2.52×10 -14以上。 The optical multilayer of claim 1, wherein the dispersion entropy S CD of the optical multilayer is greater than 2.52×10 -14 .
TW112119513A 2022-05-25 2023-05-25 optical laminate TW202413078A (en)

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JP2022-085170 2022-05-25
JP2023-072789 2023-04-26

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