TW202412990A - Processing equipment - Google Patents

Processing equipment Download PDF

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Publication number
TW202412990A
TW202412990A TW112118899A TW112118899A TW202412990A TW 202412990 A TW202412990 A TW 202412990A TW 112118899 A TW112118899 A TW 112118899A TW 112118899 A TW112118899 A TW 112118899A TW 202412990 A TW202412990 A TW 202412990A
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Taiwan
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suction
suction cup
workpiece
diagnostic unit
cup
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TW112118899A
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Chinese (zh)
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木佐貫誠
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日商迪思科股份有限公司
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Publication of TW202412990A publication Critical patent/TW202412990A/en

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Abstract

[課題]簡單且確實地檢查來自搬送機構的吸盤或吸引路徑的空氣的洩漏,並正確地掌握吸盤、配管等的適當的更換時機。[解決手段]在具備吸引保持晶圓(被加工物)W並進行搬送之搬送機構70與診斷部100之切割裝置(加工裝置)1中,搬送機構70具備:搬送墊74,其具備至少四個吸盤75;升降機構71,其使該搬送墊74升降;配管(吸引路徑)76A、76B,其等使吸盤75與吸引源78連通;閥V1;以及壓力計79,其測量配管76A、76B內的壓力,並且,在使吸盤75與該吸盤75能吸引的上表面接觸且使吸盤75與吸引源78連通時,壓力計79測量之負壓P的絕對值|P|若超過預先設定之值|P 0|,則診斷部100判斷吸盤75及配管76A、76B為正常,若未超過預先設定之值|P 0|,則診斷部100判斷吸盤75及配管76A、76B為異常。 [Topic] To easily and reliably check for air leakage from the suction pads or suction paths of the transport mechanism, and to accurately determine the appropriate replacement timing for the suction pads, piping, etc. [Solution] In a cutting device (processing device) 1 having a transport mechanism 70 and a diagnostic unit 100 for holding and transporting a wafer (processing object) W by suction, the transport mechanism 70 has: a transport pad 74 having at least four suction cups 75; a lifting mechanism 71 for lifting and lowering the transport pad 74; piping (suction path) 76A, 76B, etc., which connect the suction cup 75 with a suction source 78; a valve V1; and a pressure gauge 79, which measures the pressure in the piping 76A, 76B, and when the suction cup 75 is brought into contact with an upper surface that the suction cup 75 can suck and the suction cup 75 is connected to the suction source 78, if the absolute value |P| of the negative pressure P measured by the pressure gauge 79 exceeds a preset value |P If the value |P 0 | does not exceed the preset value |P 0 |, the diagnosis unit 100 determines that the suction plate 75 and the pipes 76A and 76B are abnormal.

Description

加工裝置Processing equipment

本發明係關於一種具備搬送機構之加工裝置,所述搬送機構藉由至少四個吸盤而吸引保持晶圓等被加工物並進行搬送。The present invention relates to a processing device having a transport mechanism, wherein the transport mechanism transports a workpiece such as a wafer by sucking and holding the workpiece by at least four suction cups.

例如,在加工薄的圓板狀的晶圓之加工裝置中進行下述動作:藉由搬送機構而吸引保持將膠膜黏貼於環狀框架與晶圓而成之工件組並搬送往預定的位置。在此,搬送機構係包含下述構件所構成:搬送墊,其具備吸引被加工物亦即晶圓的上表面之至少四個吸盤;升降機構,其使該搬送墊升降;吸引路徑,其使該吸盤與吸引源連通;以及閥,其設置於該吸引路徑(例如,參照專利文獻1)。For example, in a processing device for processing thin disk-shaped wafers, the following operation is performed: a workpiece assembly consisting of a film adhered to a ring-shaped frame and a wafer is sucked and held by a conveying mechanism and conveyed to a predetermined position. Here, the conveying mechanism is composed of the following components: a conveying pad having at least four suction cups for sucking the upper surface of the workpiece, i.e., the wafer; a lifting mechanism for lifting the conveying pad; a suction path for connecting the suction cup to a suction source; and a valve disposed on the suction path (for example, refer to Patent Document 1).

在此種搬送機構中,開啟閥使至少四個吸盤透過吸引路徑而與吸引源連通,藉此使各吸盤產生吸引力(負壓)並吸引保持工件組。In this transport mechanism, a valve is opened to connect at least four suction cups to a suction source through a suction path, thereby causing each suction cup to generate suction force (negative pressure) and to suck and hold the workpiece group.

然而,在吸盤劣化或在使吸盤與吸引源連通之吸引路徑產生空氣的漏出(洩漏)之情形中,吸盤未產生充分的吸引力,而產生在搬送途中工件組從搬送墊落下,在此工件組中藉由膠膜而黏貼於環狀框架之晶圓會破損之問題。因此,會定期地將吸盤更換成新的吸盤。 [習知技術文獻] [專利文獻] However, if the suction pad deteriorates or air leaks (leakage) occurs in the suction path connecting the suction pad to the suction source, the suction pad does not generate sufficient suction force, and the workpiece group falls from the conveying pad during transportation, and the wafer in the workpiece group that is adhered to the ring frame by the adhesive film may be damaged. Therefore, the suction pad is replaced with a new one regularly. [Known technical literature] [Patent literature]

[專利文獻1]日本特開2019-057618號公報[Patent Document 1] Japanese Patent Application Publication No. 2019-057618

[發明所欲解決的課題] 然而,在現階段,尚未確立檢查來自吸盤、吸引路徑、其他接頭等的空氣的漏出(洩漏)之方法,例如,無法正確地掌握吸盤的適當的更換時機。因此,儘管為仍能充分使用的吸盤,亦有可能產生將此吸盤更換為新的吸盤之浪費。 [Problem to be solved by the invention] However, at present, there is no established method for checking the leakage of air from the suction cup, suction path, other joints, etc., and, for example, it is impossible to accurately grasp the appropriate timing of replacing the suction cup. Therefore, even if the suction cup can still be fully used, it may be a waste to replace the suction cup with a new one.

本發明為鑒於上述問題而完成者,其目的在於提供一種加工裝置,其可簡單且確實地檢查來自搬送機構的吸盤、吸引路徑之空氣的洩漏,並正確地掌握吸盤、配管等的適當的更換時機。The present invention has been made in view of the above-mentioned problems, and its object is to provide a processing device that can simply and accurately check the leakage of air from the suction cup of the conveying mechanism and the suction path, and accurately grasp the appropriate replacement timing of the suction cup, piping, etc.

[解決課題的技術手段] 為了達成上述目的,本發明係一種加工裝置,其特徵在於,具備:卡盤台,其以保持面保持被加工物;加工手段,其將被保持於該保持面之被加工物進行加工;搬送機構,其將被加工物搬入該保持面或將被保持於該保持面之被加工物搬出;以及診斷部,並且,該搬送機構具備:搬送墊,其具備吸引被加工物的上表面之至少四個吸盤;升降機構,其使該搬送墊升降;吸引路徑,其使該吸盤與吸引源連通;閥,其設置於該吸引路徑;以及壓力計,其測量該吸盤與該閥之間的該吸引路徑內的壓力,並且,在使該吸盤與至少四個該吸盤能吸引的上表面接觸且使該吸盤與該吸引源連通時,該壓力計測量之負壓的絕對值若超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為正常,若未超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為異常。 [Technical means for solving the problem] In order to achieve the above-mentioned purpose, the present invention is a processing device, which is characterized by having: a chuck table, which holds the workpiece with a holding surface; a processing means, which processes the workpiece held on the holding surface; a conveying mechanism, which moves the workpiece into the holding surface or moves the workpiece held on the holding surface out; and a diagnosis unit, and the conveying mechanism has: a conveying pad, which has at least four suction cups for sucking the upper surface of the workpiece; a lifting mechanism, which raises and lowers the conveying pad; a suction path, The suction cup is connected to a suction source; a valve is provided in the suction path; and a pressure gauge is provided to measure the pressure in the suction path between the suction cup and the valve, and when the suction cup is brought into contact with at least four upper surfaces that the suction cup can attract and the suction cup is connected to the suction source, if the absolute value of the negative pressure measured by the pressure gauge exceeds a preset value, the diagnosis unit determines that the suction cup and the suction path are normal; if it does not exceed the preset value, the diagnosis unit determines that the suction cup and the suction path are abnormal.

[發明功效] 若根據本發明,則診斷部在已使搬送機構的至少四個吸盤與該吸盤能吸引的上表面接觸之狀態下,開啟閥而使吸盤與吸引源連通,並藉由壓力計而測量吸引路徑內的壓力,藉由此壓力計所測量之壓力(負壓)的絕對值若超過預先設定之值(負壓的絕對值),則判斷吸盤及吸引路徑為正常,若未超過預先設定之值,則判斷吸盤及吸引路徑為異常,因此能得到下述功效:可簡單且確實地檢查有無來自搬送機構的吸盤、吸引路徑的空氣的洩漏,並正確地掌握吸盤、配管等的適當的更換時機。 [Effect of the invention] According to the present invention, the diagnostic unit opens the valve to connect the suction cup to the suction source after at least four suction cups of the conveying mechanism have been brought into contact with the suction surface of the suction cup, and measures the pressure in the suction path by means of a pressure gauge. If the absolute value of the pressure (negative pressure) measured by the pressure gauge exceeds a preset value (negative pressure If the value exceeds the absolute value), the suction cup and suction path are judged to be normal. If it does not exceed the preset value, the suction cup and suction path are judged to be abnormal. Therefore, the following effects can be obtained: the suction cup of the conveying mechanism and the air leakage of the suction path can be easily and accurately checked, and the appropriate replacement time of the suction cup, piping, etc. can be accurately grasped.

以下基於隨附圖式而說明本發明的實施方式。The following describes the implementation of the present invention based on the accompanying drawings.

[加工裝置的構成] 首先,以下基於圖1而說明作為本發明之加工裝置的一態樣的切割裝置的整體構成。此外,在以下的說明中,將圖1中之左右方向設為X軸方向,將前後方向設為Y軸方向,將上下方向設為Z軸方向。 [Structure of processing device] First, the overall structure of a cutting device as one embodiment of the processing device of the present invention is described below based on FIG. 1. In addition, in the following description, the left-right direction in FIG. 1 is set as the X-axis direction, the front-back direction is set as the Y-axis direction, and the up-down direction is set as the Z-axis direction.

圖1係本發明之切割裝置的立體圖,圖示的切割裝置1為所謂的雙切割機(dual dicer),且具備下述要素作為主要的構成要素:卡匣台10,其載置卡匣11,所述卡匣11容納包含被加工物亦即晶圓W之多個工件組WS(在圖1中僅圖示一個);抽出機構20,其從已載置於該卡匣台10之卡匣11抽出工件組WS;一對框架導件30,其暫置藉由該抽出機構20所抽出之工件組WS;卡盤台40,其保持工件組WS;加工手段50,其切割被保持於該卡盤台40之晶圓W;第一搬送機構70與第二搬送機構80,所述第一搬送機構70將工件組WS搬入卡盤台40,所述第二搬送機構80從卡盤台40搬出工件組WS;旋轉清洗機構90,其清洗切割加工後的晶圓W;以及診斷部100(參照圖2),其在第一搬送機構70與第二搬送機構80的洩漏檢查中診斷有無洩漏(正常或異常)。FIG. 1 is a perspective view of a cutting device of the present invention. The cutting device 1 shown in the figure is a so-called dual dicer and has the following elements as main components: a cassette table 10 on which a cassette 11 is placed. The cassette 11 contains a plurality of workpiece sets WS (only one is shown in FIG. 1 ) including a workpiece to be processed, i.e., a wafer W; a pull-out mechanism 20 for pulling out a workpiece set WS from the cassette 11 placed on the cassette table 10; a pair of frame guides 30 for temporarily placing the workpiece set WS pulled out by the pull-out mechanism 20; a chuck table 40 for holding the workpiece set WS; and a processing means 50. , which cuts the wafer W held on the chuck table 40; a first conveying mechanism 70 and a second conveying mechanism 80, the first conveying mechanism 70 conveys the workpiece group WS into the chuck table 40, and the second conveying mechanism 80 conveys the workpiece group WS from the chuck table 40; a rotary cleaning mechanism 90, which cleans the wafer W after the cutting process; and a diagnostic unit 100 (refer to FIG. 2), which diagnoses whether there is leakage (normal or abnormal) in the leakage inspection of the first conveying mechanism 70 and the second conveying mechanism 80.

接著,分別針對構成切割裝置1之主要的要素亦即卡匣台10、抽出機構20、框架導件30、卡盤台40、加工手段50、第一及第二搬送機構70、80、旋轉清洗機構90以及診斷部100進行說明。Next, the main elements constituting the cutting device 1, namely, the cassette stage 10, the extraction mechanism 20, the frame guide 30, the chuck stage 40, the processing means 50, the first and second conveying mechanisms 70 and 80, the rotary cleaning mechanism 90 and the diagnosis unit 100 are described respectively.

(卡匣台) 圖1所示之切割裝置1具備支撐各構成要素之基台2。在此基台2的Y軸方向中央部開口有在X軸方向較長的矩形的開口部3,且在此開口部3的前方(-Y軸方向)的右側(+X軸方向)角部設置有藉由未圖示的升降機構而在上下方向(Z軸方向)升降之卡匣台10。然後,在此卡匣台10的上表面配置有矩形箱狀的卡匣11,所述矩形箱狀的卡匣11容納包含被加工物亦即圓板狀的晶圓W之多個工件組WS(在圖1中僅圖示一個)。此外,在圖1中,為了便於說明,僅以鏈線表示卡匣11的輪廓。 (Cassette table) The cutting device 1 shown in FIG. 1 has a base 2 for supporting various components. A rectangular opening 3 that is longer in the X-axis direction is opened in the center of the base 2 in the Y-axis direction, and a cassette table 10 that is raised and lowered in the vertical direction (Z-axis direction) by an unillustrated lifting mechanism is provided at the right side (+X-axis direction) corner in front of the opening 3 (-Y-axis direction). Then, a rectangular box-shaped cassette 11 is arranged on the upper surface of the cassette table 10, and the rectangular box-shaped cassette 11 accommodates a plurality of workpiece groups WS (only one is shown in FIG. 1) including a workpiece, i.e., a disk-shaped wafer W. In addition, in FIG. 1, for the sake of convenience, the outline of the cassette 11 is represented by a chain line only.

在此,晶圓W中,其正面(在圖1中為上表面)係藉由格子狀地排列之被稱作切割道之切斷預定線而被劃分成多個矩形區域,且在各矩形區域分別形成有IC、LSI等元件。然後,將如此地形成有多個元件之晶圓W沿著切割道切斷,藉此形成多個半導體晶片。此外,藉由在晶圓W與環狀框架F黏貼膠膜T,而構成兩者一體化而成之工件組WS。Here, the front side (the upper side in FIG. 1 ) of the wafer W is divided into a plurality of rectangular areas by predetermined cutting lines called scribe lines arranged in a grid pattern, and components such as ICs and LSIs are formed in each rectangular area. Then, the wafer W having a plurality of components formed in this way is cut along the scribe lines to form a plurality of semiconductor chips. In addition, by sticking an adhesive film T on the wafer W and the ring frame F, a workpiece set WS is formed in which the two are integrated.

(抽出機構) 抽出機構20係從卡匣11將一個工件組WS往+Y軸方向(後方)抽出之機構,且具備:滾珠螺桿軸21及導軌22,其等在基台2的+X軸方向端面(右端面)沿著Y軸方向(前後方向)被配置成上下平行;以及倒L字狀的抽出臂23,其沿著此等滾珠螺桿軸21與導軌22而在Y軸方向(前後方向)移動。 (Extraction mechanism) The extraction mechanism 20 is a mechanism for extracting a workpiece set WS from the cartridge 11 in the +Y axis direction (rearward), and comprises: a ball screw shaft 21 and a guide rail 22, which are arranged vertically parallel along the Y axis direction (front-rear direction) at the +X axis direction end face (right end face) of the base 2; and an inverted L-shaped extraction arm 23, which moves in the Y axis direction (front-rear direction) along these ball screw shafts 21 and guide rails 22.

在此,在上述滾珠螺桿軸21的軸向一端(圖1的左端)設置有驅動源亦即電動馬達24,且軸向另一端(圖1的右端)係藉由軸承25而能旋轉地被支撐於基台2。然後,抽出臂23的垂直部23a的下端部能滑動地被插通支撐於導軌22,且在垂直部23a的高度方向中間部螺合插通有滾珠螺桿軸21。並且,在從此抽出臂23的垂直部23a的上端垂直地彎曲且往-X軸方向(左方)水平地延伸之水平部23b的前端部,設置有保持工件組WS之保持部26。Here, an electric motor 24, which is a driving source, is provided at one axial end (left end in FIG. 1 ) of the ball screw shaft 21, and the other axial end (right end in FIG. 1 ) is rotatably supported on the base 2 via a bearing 25. Then, the lower end of the vertical portion 23a of the extraction arm 23 is slidably inserted and supported on the guide rail 22, and the ball screw shaft 21 is threadedly inserted and passed through the middle portion in the height direction of the vertical portion 23a. In addition, a holding portion 26 for holding the workpiece set WS is provided at the front end of the horizontal portion 23b that is vertically bent from the upper end of the vertical portion 23a of the extraction arm 23 and horizontally extends in the -X axis direction (left).

(框架導件) 框架導件30為倒L字狀地彎曲之左右一對構件,其暫時地暫置藉由抽出機構20而從卡匣11抽出之工件組WS,此等框架導件30可沿著在基台2的上表面沿著X軸方向(左右方向)直線狀地形成之狹縫狀的導孔2a而在左右方向(X軸方向)互相地往反方向移動。亦即,各框架導件30中,如圖2所示,其垂直部30a分別插通於導孔2a,且從各垂直部30a的上端起,水平部30b朝向+Y軸方向(後方)分別互相平行且水平地延伸。在此,一對框架導件30藉由設置於基台2的內部之未圖示的移動機構而沿著X軸方向(左右方向)互相地往反方向移動,藉此擴大或縮小兩者間的距離。 (Frame guide) The frame guide 30 is a pair of left and right components bent in an inverted L shape, which temporarily holds the workpiece set WS extracted from the cartridge 11 by the extraction mechanism 20, and these frame guides 30 can move in opposite directions in the left and right direction (X-axis direction) along the slit-shaped guide hole 2a formed linearly along the X-axis direction (left and right direction) on the upper surface of the base 2. That is, in each frame guide 30, as shown in FIG. 2, its vertical portion 30a is respectively inserted into the guide hole 2a, and from the upper end of each vertical portion 30a, the horizontal portion 30b extends parallel to each other and horizontally toward the +Y-axis direction (backward). Here, a pair of frame guides 30 move in opposite directions along the X-axis direction (left-right direction) by a moving mechanism (not shown) provided inside the base 2, thereby expanding or reducing the distance between the two.

(卡盤台) 卡盤台40為保持工件組WS之圓板狀的構件,且以保持面(上表面)露出之方式配置於在基台2的上表面開口之開口部3。然後,在此卡盤台40的周圍,在圓周方向以等角度間距(90°間距)配設有四個夾具41,所述四個夾具41用於從四方固定工件組WS的環狀框架F(參照圖1)。 (Chuck table) The chuck table 40 is a disk-shaped component that holds the workpiece set WS, and is arranged in the opening portion 3 opened on the upper surface of the base 2 in a manner that the holding surface (upper surface) is exposed. Then, around this chuck table 40, four clamps 41 are arranged at equal angles (90° intervals) in the circumferential direction, and the four clamps 41 are used to fix the annular frame F of the workpiece set WS from four sides (refer to Figure 1).

在此,卡盤台40可藉由配置於其下方之未圖示的旋轉驅動機構而繞著垂直的軸中心被旋轉驅動,且可藉由配置於其下方之未圖示的X軸方向移動機構而沿著X軸方向(左右方向)往返移動。此外,開口部3的卡盤台40的周圍被與該卡盤台40一起移動之矩形板狀的蓋4覆蓋,且開口部3的蓋4的X軸方向兩側(左右)分別被與蓋4一起在X軸方向移動並伸縮之蛇腹狀的伸縮蓋5覆蓋。因此,無論卡盤台40位於X軸上的哪個位置,基台2的開口部3始終都被蓋4與伸縮蓋5封閉,而能確實地防止異物等從該開口部3侵入基台2內。Here, the chuck table 40 can be rotationally driven around a vertical axis center by a rotation drive mechanism (not shown) disposed below it, and can be reciprocated along the X-axis direction (left-right direction) by an X-axis direction moving mechanism (not shown) disposed below it. In addition, the periphery of the chuck table 40 of the opening 3 is covered by a rectangular plate-shaped cover 4 that moves together with the chuck table 40, and the X-axis direction sides (left-right) of the cover 4 of the opening 3 are respectively covered by bellows-shaped retractable covers 5 that move and retract in the X-axis direction together with the cover 4. Therefore, no matter where the chuck table 40 is located on the X-axis, the opening 3 of the base 2 is always closed by the cover 4 and the retractable cover 5, and foreign matter can be reliably prevented from intruding into the base 2 through the opening 3.

(加工手段) 為雙切割機之本實施方式之切割裝置1具備並排地設置於基台2上的左側(-X軸側)之第一切割單元51與第二切割單元52作為加工手段(切割手段)。此等第一切割單元51與第二切割單元52分別被配設成隔著在基台2的上表面開口之開口部3而在此前後兩側(-Y軸側及+Y軸側)相對向,在此等第一切割單元51與第二切割單元52分別安裝有攝像單元53。在此,各攝像單元53拍攝被保持於卡盤台40的保持面上之晶圓W並檢測切割道的位置。 (Processing means) The cutting device 1 of this embodiment of a double cutting machine has a first cutting unit 51 and a second cutting unit 52 arranged side by side on the left side (-X axis side) of the base 2 as processing means (cutting means). These first cutting units 51 and second cutting units 52 are respectively arranged to face each other on the front and rear sides (-Y axis side and +Y axis side) across the opening 3 opened on the upper surface of the base 2, and imaging units 53 are respectively installed on these first cutting units 51 and second cutting units 52. Here, each imaging unit 53 photographs the wafer W held on the holding surface of the chuck table 40 and detects the position of the cutting path.

並且,第一切割單元51與第二切割單元52能藉由前後一對Z軸方向移動機構55而在Z軸方向(切入進給方向)上下移動,且能分別藉由前後一對Y軸方向移動機構60而在Y軸方向(分度進給方向)前後移動。Furthermore, the first cutting unit 51 and the second cutting unit 52 can move up and down in the Z-axis direction (cutting feed direction) by a pair of front and rear Z-axis direction moving mechanisms 55, and can move forward and backward in the Y-axis direction (indexing feed direction) by a pair of front and rear Y-axis direction moving mechanisms 60, respectively.

在此,各Z軸方向移動機構55分別係包含下述構件所構成:一對Z軸導軌56,其等互相平行地被垂直地配置於矩形板狀的滑塊61的前後;升降板57,其能沿著此等Z軸導軌56上下移動;能旋轉的Z軸滾珠螺桿軸58,其被垂直地配置於一對Z軸導軌56之間;以及能正反轉的脈衝馬達59,其旋轉驅動該Z軸滾珠螺桿軸58。然後,第一切割單元51及攝像單元53與第二切割單元52及攝像單元53分別被安裝於各升降板57的下部。此外,在各升降板57的背面突出設置有未圖示的螺帽構件,且Z軸滾珠螺桿軸58分別螺合插通於此螺帽構件。Here, each Z-axis direction moving mechanism 55 is respectively composed of the following components: a pair of Z-axis guide rails 56, which are arranged vertically and parallel to each other in front and behind the rectangular plate-shaped slider 61; a lifting plate 57, which can move up and down along these Z-axis guide rails 56; a rotatable Z-axis ball screw shaft 58, which is arranged vertically between the pair of Z-axis guide rails 56; and a forward and reverse rotatable pulse motor 59, which rotationally drives the Z-axis ball screw shaft 58. Then, the first cutting unit 51 and the camera unit 53 and the second cutting unit 52 and the camera unit 53 are respectively installed at the lower part of each lifting plate 57. In addition, a nut member (not shown) is protrudingly provided on the back side of each lifting plate 57, and the Z-axis ball screw shaft 58 is threadedly inserted through the nut member.

在如上述般所構成之Z軸方向移動機構55中,若Z軸脈衝馬達59被驅動而Z軸滾珠螺桿軸58進行正反轉,則突出設置有與該Z軸滾珠螺桿軸58螺合之未圖示的螺帽構件之升降板57會沿著一對Z軸導軌56上下移動,因此分別安裝於各升降板57之第一切割單元51及攝像單元53與第二切割單元52及攝像單元53亦會沿著Z軸方向(切入進給方向)上下移動。In the Z-axis direction moving mechanism 55 constructed as described above, if the Z-axis pulse motor 59 is driven and the Z-axis ball screw shaft 58 rotates forward and reversely, the lifting plate 57 protrudingly provided with a nut component (not shown) threadedly engaged with the Z-axis ball screw shaft 58 will move up and down along a pair of Z-axis guide rails 56, so the first cutting unit 51 and the camera unit 53 and the second cutting unit 52 and the camera unit 53 respectively mounted on each lifting plate 57 will also move up and down along the Z-axis direction (cutting feed direction).

並且,前後一對的各Y軸方向移動機構60分別具備前述滑塊61,但此等滑塊61能分別沿著上下一對Y軸導軌63而沿著Y軸方向移動,所述上下一對Y軸導軌63係沿著Y軸方向(前後方向)互相平行地被配置於垂直地立設於基台2上之門型的柱體62的正面。Furthermore, each of the front and rear pairs of Y-axis moving mechanisms 60 is respectively equipped with the aforementioned slider 61, but these sliders 61 can move along the Y-axis direction along an upper and lower pair of Y-axis guide rails 63, respectively. The upper and lower pair of Y-axis guide rails 63 are arranged parallel to each other along the Y-axis direction (front and rear direction) on the front side of a door-shaped column 62 vertically erected on the base 2.

然後,在前後一對Y軸方向移動機構60中,在上下一對Y軸導軌63之間分別配置有沿著Y軸方向(前後方向)配置之上下一對的能旋轉的Y軸滾珠螺桿軸64,且在此等Y軸滾珠螺桿軸64分別螺合有突出設置於前後一對的各滑塊61的背面之未圖示的螺帽構件。並且,各Y軸滾珠螺桿軸64的軸向一端分別與旋轉驅動源亦即Y軸脈衝馬達65(在圖1中,僅圖示一者)連結。Then, in the front and rear pair of Y-axis direction moving mechanisms 60, a pair of Y-axis ball screw shafts 64 that can rotate along the Y-axis direction (front and rear direction) are respectively arranged between the upper and lower pair of Y-axis guide rails 63, and the Y-axis ball screw shafts 64 are respectively screwed with nut components (not shown) protruding from the back of each pair of sliders 61. In addition, one axial end of each Y-axis ball screw shaft 64 is respectively connected to a rotation drive source, that is, a Y-axis pulse motor 65 (only one is shown in FIG. 1 ).

因此,在各Y軸方向移動機構60中,若驅動Y軸脈衝馬達65而使Y軸滾珠螺桿軸64正反轉,則突出設置有與此等Y軸滾珠螺桿軸64螺合之未圖示的螺帽構件之前後一對滑塊61可分別與升降板57一起沿著Y軸導軌63而在Y軸方向(分度進給方向)移動。因此,分別安裝於升降板57之第一切割單元51及攝像單元53與第二切割單元52及攝像單元53可分別沿著Y軸導軌63而在Y軸方向(分度進給方向)移動。Therefore, in each Y-axis direction moving mechanism 60, if the Y-axis pulse motor 65 is driven to rotate the Y-axis ball screw shaft 64 forward and reversely, a pair of front and rear sliders 61 protrudingly provided with a nut member (not shown) threadedly engaged with the Y-axis ball screw shaft 64 can move in the Y-axis direction (indexing feed direction) along the Y-axis guide rail 63 together with the lifting plate 57. Therefore, the first cutting unit 51 and the camera unit 53 and the second cutting unit 52 and the camera unit 53 respectively mounted on the lifting plate 57 can move in the Y-axis direction (indexing feed direction) along the Y-axis guide rail 63.

如以上所述,在圖1所示之切割裝置1中,卡盤台40與被保持於卡盤台40之晶圓W(工件組WS)能沿著X軸方向(左右方向)移動,且第一切割單元51及攝像單元53與第二切割單元52及攝像單元53能分別沿著Y軸方向(前後方向)與Z軸方向(上下方向)移動。As described above, in the cutting device 1 shown in FIG. 1 , the chuck table 40 and the wafer W (workpiece group WS) held on the chuck table 40 can move along the X-axis direction (left-right direction), and the first cutting unit 51 and the imaging unit 53 and the second cutting unit 52 and the imaging unit 53 can move along the Y-axis direction (front-back direction) and the Z-axis direction (up-down direction), respectively.

(第一及第二搬送機構) 第一搬送機構70吸引保持藉由抽出機構20而從卡匣11抽出且暫置於左右一對框架導件30上之工件組WS並搬送往卡盤台40,並可藉由圖2所示之升降機構71而在Z軸方向(上下方向)升降,且可藉由未圖示的移動機構而在XY平面上水平移動。 (First and second transport mechanisms) The first transport mechanism 70 attracts and holds the workpiece set WS extracted from the cartridge 11 by the extraction mechanism 20 and temporarily placed on the left and right pair of frame guides 30 and transports it to the chuck table 40. It can be raised and lowered in the Z-axis direction (up and down direction) by the lifting mechanism 71 shown in FIG. 2, and can be moved horizontally on the XY plane by a moving mechanism not shown.

如圖2所詳細表示,此第一搬送機構70具備安裝於L字狀的撐條73的前端部之H形的搬送墊74,且在該搬送墊74的四個角落分別安裝有吸盤75,所述L字狀的撐條73安裝於垂直的桿體72的下端。As shown in detail in Figure 2, this first conveying mechanism 70 has an H-shaped conveying pad 74 installed at the front end of an L-shaped support bar 73, and suction cups 75 are respectively installed at the four corners of the conveying pad 74, and the L-shaped support bar 73 is installed at the lower end of the vertical rod 72.

在此,如圖2所示,各吸盤75藉由橡膠等彈性體而成形為下方開口之中空圓錐台狀,且在共計四個吸盤75分別連接有具有可撓性之撓性的配管(吸引路徑)76A,四根配管(吸引路徑)76A藉由接頭77而合流並與一根配管(吸引路徑)76B連接。然後,配管(吸引路徑)76B係與真空泵等吸引源78連接,且在此配管76B的途中設置有選擇性地切斷各吸盤75與吸引源78的連通之閥V1。並且,在配管76B的接頭77與閥V1之間設置有壓力計(壓力感測器)79,所述壓力計(壓力感測器)79用於測量配管(吸引路徑)76A、76B內的壓力(負壓)。此外,閥V1與壓力計79係與診斷部100電性連接,藉由壓力計79所測量之壓力被傳送往診斷部100,如後述,診斷部100根據從壓力計79所傳送之壓力的測量值而診斷有無來自吸盤75、配管(吸引路徑)76A、76B等的空氣的洩漏(正常或異常)。Here, as shown in FIG. 2 , each suction cup 75 is formed into a hollow cone shape with an opening at the bottom by an elastic body such as rubber, and a flexible pipe (suction path) 76A is connected to each of the four suction cups 75, and the four pipes (suction paths) 76A are joined by a joint 77 and connected to a pipe (suction path) 76B. Then, the pipe (suction path) 76B is connected to a suction source 78 such as a vacuum pump, and a valve V1 is provided in the middle of the pipe 76B to selectively cut off the connection between each suction cup 75 and the suction source 78. Furthermore, a pressure gauge (pressure sensor) 79 is provided between the joint 77 of the piping 76B and the valve V1, and the pressure gauge (pressure sensor) 79 is used to measure the pressure (negative pressure) in the piping (suction path) 76A, 76B. In addition, the valve V1 and the pressure gauge 79 are electrically connected to the diagnosis unit 100, and the pressure measured by the pressure gauge 79 is transmitted to the diagnosis unit 100. As described later, the diagnosis unit 100 diagnoses the presence or absence of air leakage (normal or abnormal) from the suction plate 75, the piping (suction path) 76A, 76B, etc. based on the measured value of the pressure transmitted from the pressure gauge 79.

第二搬送機構80吸引保持具備已藉由第一切割單元51與第二切割單元52而結束預定的切割加工之晶圓W之工件組WS,並從卡盤台40搬送往旋轉清洗機構90的後述的旋轉台91,且第二搬送機構80的基本構成與前述第一搬送機構70的基本構成相同。The second conveying mechanism 80 attracts and holds the workpiece group WS having the wafer W that has completed the predetermined cutting process by the first cutting unit 51 and the second cutting unit 52, and conveys it from the chuck table 40 to the later-described rotary table 91 of the rotary cleaning mechanism 90, and the basic structure of the second conveying mechanism 80 is the same as the basic structure of the aforementioned first conveying mechanism 70.

亦即,如圖6所示,第二搬送機構80可藉由升降機構81而在Z軸方向(上下方向)升降,且可藉由未圖示的移動機構而在XY平面上水平移動。然後,如圖6所詳細地表示,此第二搬送機構80具備安裝於撐條83之H形的搬送墊84,且在該搬送墊84的四個角落分別裝設有吸盤85,所述撐條83安裝於垂直的桿體82的下端。That is, as shown in FIG6 , the second transport mechanism 80 can be raised and lowered in the Z-axis direction (up and down direction) by the lifting mechanism 81, and can be horizontally moved on the XY plane by the moving mechanism not shown. Then, as shown in detail in FIG6 , the second transport mechanism 80 has an H-shaped transport pad 84 mounted on a support bar 83, and suction cups 85 are respectively installed at the four corners of the transport pad 84, and the support bar 83 is mounted on the lower end of the vertical rod 82.

在此,在共計四個吸盤85分別連接有具有可撓性之撓性的配管(吸引路徑)86A,且四根配管(吸引路徑)86A藉由接頭87而合流並與一根配管(吸引路徑)86B連接。然後,配管(吸引路徑)86B係與吸引源88連接,且在此配管86B的途中設置有選擇性地切斷各吸盤85與吸引源88的連通之閥V2。並且,在配管86B的接頭87與閥V2之間設置有壓力計(壓力感測器)89,所述壓力計(壓力感測器)89用於測量配管(吸引路徑)86A、86B內的壓力(負壓)。此外,閥V2與壓力計89係與診斷部100電性連接,藉由壓力計89所測量之壓力被傳送往診斷部100,如後述,診斷部100根據從壓力計89所傳送之壓力的測量值而診斷有無來自吸盤85、配管(吸引路徑)86A、86B等的空氣洩漏(正常或異常)。Here, a flexible pipe (suction path) 86A is connected to each of the four suction cups 85, and the four pipes (suction paths) 86A are joined by a joint 87 and connected to a pipe (suction path) 86B. Then, the pipe (suction path) 86B is connected to a suction source 88, and a valve V2 is provided in the middle of the pipe 86B to selectively cut off the connection between each suction cup 85 and the suction source 88. In addition, a pressure gauge (pressure sensor) 89 is provided between the joint 87 of the pipe 86B and the valve V2, and the pressure gauge (pressure sensor) 89 is used to measure the pressure (negative pressure) in the pipes (suction paths) 86A and 86B. In addition, the valve V2 and the pressure gauge 89 are electrically connected to the diagnostic unit 100, and the pressure measured by the pressure gauge 89 is transmitted to the diagnostic unit 100. As described later, the diagnostic unit 100 diagnoses the presence or absence of air leakage (normal or abnormal) from the suction plate 85, the piping (suction path) 86A, 86B, etc. based on the measured value of the pressure transmitted from the pressure gauge 89.

此外,在本實施方式中,雖在第一搬送機構70的搬送墊74與第二搬送機構80的搬送墊84分別設置四個吸盤75、85,但此等吸盤75、85的數量只要為四個以上即可為任意數量。In addition, in the present embodiment, although four suction cups 75, 85 are provided on the conveying pad 74 of the first conveying mechanism 70 and the conveying pad 84 of the second conveying mechanism 80, respectively, the number of these suction cups 75, 85 may be any number as long as it is four or more.

(旋轉清洗機構) 旋轉清洗機構90用於清洗已結束切割加工之晶圓W,且如圖1所示,其被配設於基台2上的比開口部3更靠後方且靠右的部分。此旋轉清洗機構90具備:旋轉台91,其一邊吸引保持工件組WS(晶圓W)一邊旋轉;以及未圖示的噴射噴嘴,其從上方對被吸引保持於該旋轉台91上之工件組WS(晶圓W)噴射清洗液。 (Rotary cleaning mechanism) The rotary cleaning mechanism 90 is used to clean the wafer W that has been cut, and as shown in FIG1 , it is arranged on the base 2 at a portion further back and to the right than the opening 3. The rotary cleaning mechanism 90 includes: a rotary table 91 that rotates while sucking and holding the workpiece group WS (wafer W); and a spray nozzle (not shown) that sprays a cleaning liquid from above to the workpiece group WS (wafer W) sucked and held on the rotary table 91.

(診斷部) 圖2、圖5及圖6所示之診斷部100係依據藉由設置於第一搬送機構70與第二搬送機構80之各壓力計79、89所測量之配管(吸引路徑)76A、76B內及配管(吸引路徑)86A、86B內的壓力(負壓)的值(絕對值),而檢查有無來自第一搬送機構70的吸盤75、配管(吸引路徑)76A、76B與第二搬送機構80的吸盤85、配管(吸引路徑)86A、86B的空氣漏出(洩漏),所測量之壓力(絕對值)若超過預先設定之設定值(絕對值),則因無空氣漏出而診斷為正常,若未超過設定值,則因有空氣漏出而診斷為異常,關於此診斷的手法的詳細內容將於後述。 (Diagnostic section) The diagnostic section 100 shown in FIG. 2, FIG. 5 and FIG. 6 detects whether the suction cup 75 from the first conveying mechanism 70, the pipe (suction path) 86A, 86B and the pressure (negative pressure) in the pipe (suction path) 76A, 76B and the pressure (absolute value) in the pipe (suction path) 86A, 86B are positively charged based on the pressure gauges 79, 89 installed in the first conveying mechanism 70 and the second conveying mechanism 80. Air leakage (leakage) from the suction cup 85 and the piping (suction path) 86A and 86B of the second conveying mechanism 80 is detected. If the measured pressure (absolute value) exceeds the preset setting value (absolute value), it is diagnosed as normal because there is no air leakage. If it does not exceed the setting value, it is diagnosed as abnormal because there is air leakage. The details of this diagnostic method will be described later.

[切割裝置的作用] 接著,針對如以上般所構成之切割裝置1的作用進行說明。 [Function of cutting device] Next, the function of the cutting device 1 constructed as above will be described.

在對晶圓W進行切割加工時,藉由抽出機構20而從已載置於卡匣台10上之卡匣11抽出工件組WS並暫置於一對框架導件30上。此時,如圖2所示,一對框架導件30往互相接近之方向移動而縮小兩者的間隔。When the wafer W is cut, the workpiece set WS is extracted from the cassette 11 placed on the cassette table 10 by the extraction mechanism 20 and temporarily placed on a pair of frame guides 30. At this time, as shown in FIG. 2 , the pair of frame guides 30 move toward each other to reduce the distance between them.

從上述狀態開始,若第一搬送機構70藉由未圖示的移動機構而往工件組WS的上方移動,則第一搬送機構70的搬送墊74藉由升降機構71(參照圖2)而往-Z軸方向下降,設置於該搬送墊74之四個吸盤75與工件組WS的環狀框架F(參照圖1)的上表面接觸。然後,因圖2所示之閥V1被開啟,吸盤75與吸引源78經由配管(吸引路徑)76A、76B而連通,故吸盤75被吸引源78吸引而在該吸盤75產生負壓,工件組WS藉由此負壓而被吸附於吸盤75。之後,若搬送墊74藉由升降機構71而與工件組WS一起往+Z軸方向上升而工件組WS從框架導件30分離,則一對框架導件30藉由未圖示的移動機構而沿著基台2的導孔2a往互相分離之方向移動,如圖1所示,兩框架導件30間的距離擴大,而變成可使工件組WS通過此等框架導件30之間。From the above state, if the first conveying mechanism 70 moves above the workpiece set WS by means of a moving mechanism not shown in the figure, the conveying pad 74 of the first conveying mechanism 70 is lowered in the -Z axis direction by means of a lifting mechanism 71 (see FIG. 2 ), and the four suction cups 75 provided on the conveying pad 74 contact the upper surface of the annular frame F (see FIG. 1 ) of the workpiece set WS. Then, because the valve V1 shown in FIG. 2 is opened, the suction cup 75 and the suction source 78 are connected via the piping (suction path) 76A, 76B, so that the suction cup 75 is sucked by the suction source 78 and a negative pressure is generated in the suction cup 75, and the workpiece set WS is adsorbed on the suction cup 75 by means of the negative pressure. Thereafter, if the conveying pad 74 is raised in the +Z-axis direction together with the workpiece set WS by the lifting mechanism 71 and the workpiece set WS is separated from the frame guide 30, then a pair of frame guides 30 are moved in the direction of separation from each other along the guide holes 2a of the base 2 by a moving mechanism not shown, as shown in FIG. 1, and the distance between the two frame guides 30 is expanded so that the workpiece set WS can pass between these frame guides 30.

接著,卡盤台40藉由未圖示的X軸方向移動機構而沿著+X軸方向往工件組WS的下方移動,且從此狀態開始搬送墊74藉由升降機構71(參照圖2)而往-Z軸方向下降,將藉由該搬送墊74所保持之工件組WS交接至卡盤台40。然後,被交接至卡盤台40之工件組WS被吸引保持於卡盤台40的保持面,且已保持工件組WS之卡盤台40藉由未圖示的X軸方向移動機構而朝向-X軸方向移動。Next, the chuck table 40 moves below the workpiece set WS along the +X axis direction by the unillustrated X axis direction moving mechanism, and from this state, the conveying pad 74 descends in the -Z axis direction by the lifting mechanism 71 (refer to FIG. 2 ), and the workpiece set WS held by the conveying pad 74 is delivered to the chuck table 40. Then, the workpiece set WS delivered to the chuck table 40 is attracted and held on the holding surface of the chuck table 40, and the chuck table 40 holding the workpiece set WS moves toward the -X axis direction by the unillustrated X axis direction moving mechanism.

另一方面,在圖1所示之第一切割單元51與第二切割單元52中,若藉由由各攝像單元53所進行之晶圓W的正面的攝像而得到圖像,則藉由基於此圖像之圖案匹配處理而檢測應切割之切割道。如此,若檢測出晶圓W的切割道,則第一切割單元51與第二切割單元52的各切割刀片51a(在圖1中,僅圖示一者)的Y軸方向的位置分別藉由前後一對的各Y軸方向移動機構60而被分度進給,將此等切割刀片51a的Y軸方向的位置對齊於應切割之切割道的位置。On the other hand, in the first cutting unit 51 and the second cutting unit 52 shown in FIG. 1 , if an image is obtained by photographing the front side of the wafer W by each imaging unit 53, the scribe line to be cut is detected by pattern matching processing based on the image. In this way, if the scribe line of the wafer W is detected, the Y-axis direction positions of the cutting blades 51a (only one is shown in FIG. 1 ) of the first cutting unit 51 and the second cutting unit 52 are indexed and fed by a pair of Y-axis direction moving mechanisms 60, respectively, and the Y-axis direction positions of these cutting blades 51a are aligned with the positions of the scribe lines to be cut.

然後,從上述狀態開始,第一切割單元51與第二切割單元52的各切割刀片51a一邊分別以高速被旋轉驅動,一邊藉由前後一對的各Z軸方向移動機構55而分別僅下降預定的切入量,且卡盤台40與被保持於卡盤台40之工件組WS(晶圓W)藉由未圖示的X軸方向移動機構而在X軸方向移動。然後,晶圓W藉由第一切割單元51與第二切割單元52的各切割刀片51a而被沿著切割道切斷,若對一個方向的所有的切割道進行此種作業,則藉由未圖示的旋轉驅動機構而使卡盤台40與被保持於卡盤台40之工件組WS僅旋轉90°,同樣地對晶圓W進行沿著與已結束切斷之切割道正交之另一方向的切割道之切斷。然後,若結束沿著晶圓W的所有的切割道之切斷,則能得到裝配有一個個元件之多個半導體晶片。Then, starting from the above state, the cutting blades 51a of the first cutting unit 51 and the second cutting unit 52 are respectively driven to rotate at high speed, while being lowered by a predetermined cutting amount by a pair of front and rear Z-axis moving mechanisms 55, and the chuck table 40 and the workpiece group WS (wafer W) held on the chuck table 40 are moved in the X-axis direction by the X-axis moving mechanism not shown. Then, the wafer W is cut along the cutting paths by the cutting blades 51a of the first cutting unit 51 and the second cutting unit 52. If this operation is performed on all the cutting paths in one direction, the chuck table 40 and the workpiece set WS held on the chuck table 40 are rotated by 90° by a rotation drive mechanism (not shown) to similarly cut the wafer W along the cutting paths in another direction orthogonal to the cutting paths that have been cut. Then, if the cutting along all the cutting paths of the wafer W is completed, a plurality of semiconductor chips equipped with individual components can be obtained.

若如上述般進行而結束對晶圓W之切割加工,則被保持於卡盤台40之工件組WS被交接至第二搬送機構80。亦即,與第一搬送機構70同樣地,在已藉由設置於第二搬送機構80的搬送墊84之四個吸盤85而吸引保持工件組WS之狀態下,工件組WS被搬送往旋轉清洗機構90,並被交接至該旋轉清洗機構90的旋轉台91。When the dicing process of the wafer W is completed as described above, the workpiece set WS held on the chuck table 40 is transferred to the second transfer mechanism 80. That is, similarly to the first transfer mechanism 70, the workpiece set WS is transferred to the rotary cleaning mechanism 90 while being held by the four suction cups 85 provided on the transfer pad 84 of the second transfer mechanism 80, and is transferred to the rotary table 91 of the rotary cleaning mechanism 90.

被交接至旋轉台91之工件組WS在被吸引保持於旋轉台91的保持面之狀態下,一邊與旋轉台91一起以預定的速度旋轉,一邊被從未圖示的噴嘴噴射之清洗液清洗,從而去除因切割加工而附著於晶圓W之切削屑。The workpiece set WS transferred to the turntable 91 is held by attraction on the holding surface of the turntable 91, while rotating at a predetermined speed together with the turntable 91, and is cleaned by a cleaning liquid sprayed from a nozzle not shown, thereby removing cutting chips attached to the wafer W due to the cutting process.

[搬送機構的洩漏檢查] 接著,針對第一搬送機構70與第二搬送機構80的洩漏檢查(診斷有無空氣漏出)的手法進行說明。 [Leakage inspection of the transport mechanism] Next, the method of leak inspection (diagnosis of air leakage) of the first transport mechanism 70 and the second transport mechanism 80 is explained.

(第一搬送機構) 首先,以下基於圖2~圖4而說明第一搬送機構70的洩漏檢查的手法。 (First transport mechanism) First, the following describes the method of leak inspection of the first transport mechanism 70 based on Figures 2 to 4.

對於此第一搬送機構70之洩漏檢查係診斷部100診斷在設置於搬送墊74之四個吸盤75、連接各吸盤75與吸引源78之配管(吸引路徑)76A、76B是否有空氣漏出,以下依照圖3所示之流程圖與圖4所示之時間圖而說明其診斷程序。For the leakage inspection of the first conveying mechanism 70, the diagnostic unit 100 diagnoses whether there is air leakage in the four suction cups 75 arranged on the conveying pad 74 and the pipes (suction paths) 76A and 76B connecting the suction cups 75 and the suction source 78. The following describes the diagnostic procedure according to the flow chart shown in Figure 3 and the time chart shown in Figure 4.

在第一搬送機構70的洩漏檢查時,如圖2所示,在一對框架導件30已往互相接近之方向移動而縮小兩者間的距離之狀態下,搬送墊74被定位於其上方。然後,升降機構71被驅動(圖3的步驟S1),搬送墊74往-Z軸方向下降。During the leak inspection of the first conveying mechanism 70, as shown in Fig. 2, the conveying pad 74 is positioned above the pair of frame guides 30, while the pair of frame guides 30 are moving toward each other and the distance between them is reduced. Then, the lifting mechanism 71 is driven (step S1 in Fig. 3), and the conveying pad 74 descends in the -Z axis direction.

如上述,若搬送墊74下降,則判斷設置於該搬送墊74之四個吸盤75是否已與一對框架導件30的上表面接觸(步驟S2),若四個吸盤75與框架導件30的上表面(接觸面)接觸(步驟S2:是),則開啟閥V1(步驟S3)。在此,各框架導件30的各吸盤75所接觸之上表面(接觸面)的寬度L1被設定成大於各吸盤75的最大直徑φd(L1>φd),各吸盤75的整個表面係與框架導件30的上表面接觸。此外,搬送墊74的下降動作持續進行直到四個吸盤75與框架導件30的上表面接觸為止(步驟S2→步驟S1)。As described above, when the transport pad 74 descends, it is determined whether the four suction cups 75 provided on the transport pad 74 have contacted the upper surface of the pair of frame guides 30 (step S2). If the four suction cups 75 have contacted the upper surface (contact surface) of the frame guide 30 (step S2: Yes), the valve V1 is opened (step S3). Here, the width L1 of the upper surface (contact surface) contacted by each suction cup 75 of each frame guide 30 is set to be larger than the maximum diameter φd of each suction cup 75 (L1>φd), and the entire surface of each suction cup 75 is in contact with the upper surface of the frame guide 30. Furthermore, the lowering movement of the transfer pad 74 continues until the four suction cups 75 come into contact with the upper surface of the frame guide 30 (step S2 → step S1).

如前述,若開啟閥V1(步驟S3),則各吸盤75與吸引源78藉由配管(吸引路徑)76A、76B而連通,因此在各吸盤75產生負壓,測量自開啟此閥V1起的經過時間(步驟S4),且藉由壓力計79而測量配管(吸引路徑)76A、76B內的壓力(負壓)P(步驟S5)。As mentioned above, if the valve V1 is opened (step S3), each suction cup 75 is connected to the suction source 78 via the piping (suction path) 76A, 76B, so that a negative pressure is generated in each suction cup 75, and the time elapsed since the valve V1 is opened is measured (step S4), and the pressure (negative pressure) P in the piping (suction path) 76A, 76B is measured by the pressure gauge 79 (step S5).

然而,若開啟閥V1,則配管(吸引路徑)76A、76B內的壓力P會逐漸下降,在此,考慮在圖4中以實線A、虛線B、鏈線C所表示之三種模式作為壓力P下降之模式。以實線A所表示之模式係在吸盤75、配管76A、76B無空氣漏出,壓力P急遽地下降之模式,以虛線B所表示之模式係在吸盤75、配管76A、76B有些微的空氣漏出,因此壓力P的下降稍微緩慢之模式。並且,以鏈線C所表示之模式係在吸盤75、配管76A、76B有大量的空氣漏出,因此壓力P的下降非常緩慢之模式。However, if the valve V1 is opened, the pressure P in the pipes (suction paths) 76A and 76B will gradually decrease. Here, three modes represented by the solid line A, the dotted line B, and the chain line C in FIG. 4 are considered as the modes of pressure P decrease. The mode represented by the solid line A is a mode in which there is no air leakage in the suction cup 75 and the pipes 76A and 76B, and the pressure P decreases rapidly. The mode represented by the dotted line B is a mode in which there is a slight air leakage in the suction cup 75 and the pipes 76A and 76B, so the pressure P decreases slightly slowly. In addition, the mode represented by the chain line C is a mode in which there is a large amount of air leakage in the suction cup 75 and the pipes 76A and 76B, so the pressure P decreases very slowly.

如前述,若藉由壓力計79而測量配管76A、76B內的壓力P,則診斷部100會判定所測量之壓力(負壓)P的絕對值|P|是否已超過預先設定之值(絕對值)|P 0|(|P|>|P 0|?)(步驟S6)。 As described above, when the pressure P in the pipes 76A and 76B is measured by the pressure gauge 79, the diagnostic unit 100 determines whether the absolute value |P| of the measured pressure (negative pressure) P exceeds the preset value (absolute value) |P 0 | (|P|>|P 0 |?) (step S6).

在圖4中以實線A所表示之模式中,在時間t 1,壓力P的絕對值|P|在圖4所示之點a超過設定值|P 0|並下降直到壓力P 1為止。並且,在圖4中以虛線B所表示之模式中,在比時間t 1稍晚一些的時間t 2,壓力P的絕對值|P|在圖4所示之點b超過設定值|P 0|並下降直到壓力P 1為止。 In the pattern represented by the solid line A in FIG4 , at time t1 , the absolute value |P| of the pressure P exceeds the set value | P0 | at point a shown in FIG4 and decreases to the pressure P1 . Also, in the pattern represented by the dotted line B in FIG4 , at time t2 slightly later than time t1 , the absolute value |P| of the pressure P exceeds the set value | P0 | at point b shown in FIG4 and decreases to the pressure P1 .

因此,在上述兩個模式中,因藉由壓力計79所測量之壓力P的絕對值|P|分別在時間t 1與t 2超過設定值|P 0|(步驟S6:是),故診斷部100分別在時間t 1、t 2關閉閥V1(步驟S7),並測量自關閉閥V1起的經過時間(步驟S8)。 Therefore, in the above two modes, since the absolute value |P| of the pressure P measured by the pressure gauge 79 exceeds the set value | P0 | at time t1 and t2 respectively (step S6: yes), the diagnosis unit 100 closes the valve V1 at time t1 and t2 respectively (step S7), and measures the elapsed time since the valve V1 is closed (step S8).

若如上述般關閉閥V1,則由各吸盤75的配管(吸引路徑)76A、76B所進行之與吸引源78的連通被切斷,配管76A、76B內的空氣的往吸引源78的吸引被停止,並判定自關閉閥V1起是否已經過預定時間(例如,10秒鐘)ΔT 1(步驟S9),若已經過預定時間ΔT 1(步驟S9:是),則判定藉由壓力計79所測量之配管76A、76B內的壓力P的絕對值|P|是否已超過預定的設定值|P 0|(步驟S10)。在圖4中以實線A所表示之模式中,即使在已經過預定時間ΔT 1之時間t 3,壓力P亦維持固定值P 1,因此在已經過預定時間ΔT 1之時間t 3之壓力P的絕對值|P|係如以點c所表示般維持已超過設定值|P 0|之值P 1,在步驟S10中之判定結果成為是。此意指無來自吸盤75、配管76A、76B的空氣的洩漏(實際上為外部空氣的往吸盤75、配管76A、76B的流入),因此診斷部100診斷吸盤75、配管76A、76B為正常,可繼續使用此等(步驟S11),並結束一連串的診斷處理(步驟S12)。 When the valve V1 is closed as described above, the connection between the pipes (suction paths) 76A and 76B of each suction cup 75 and the suction source 78 is cut off, the suction of the air in the pipes 76A and 76B to the suction source 78 is stopped, and it is determined whether a predetermined time (for example, 10 seconds) ΔT 1 has passed since the valve V1 was closed (step S9). If the predetermined time ΔT 1 has passed (step S9: yes), it is determined whether the absolute value |P| of the pressure P in the pipes 76A and 76B measured by the pressure gauge 79 has exceeded the predetermined set value |P 0 | (step S10). In the mode indicated by the solid line A in FIG. 4 , even at time t 3 after the predetermined time ΔT 1 has passed, the pressure P is maintained at a fixed value P 1 , so the absolute value |P| of the pressure P at time t 3 after the predetermined time ΔT 1 has passed is maintained at a value P 1 exceeding the set value |P 0 | as indicated by point c, and the determination result in step S10 becomes yes. This means that there is no leakage of air from the suction cup 75 and the piping 76A and 76B (actually, the inflow of external air into the suction cup 75 and the piping 76A and 76B). Therefore, the diagnosis unit 100 diagnoses that the suction cup 75 and the piping 76A and 76B are normal and can continue to be used (step S11), and ends a series of diagnosis processing (step S12).

相對於此,在圖4中以虛線B所表示之模式中,在自關閉閥V1起已經過預定時間ΔT 1之時間t 4之由壓力計79所測得之壓力P的測量值的絕對值|P|係如在圖4中以點d所表示般未超過設定值|P 0|,因此在步驟S10中之判定結果為否。此意指有少許來自吸盤75、配管76A、76B的空氣的洩漏,因此診斷部100診斷吸盤75、配管76A、76B為異常,需要更換此等(步驟S13),並結束一連串的診斷處理(步驟S12)。 In contrast, in the mode indicated by the dotted line B in FIG. 4 , the absolute value |P| of the pressure P measured by the pressure gauge 79 at time t 4 after the predetermined time ΔT 1 has passed since the valve V1 was closed does not exceed the set value |P 0 | as indicated by point d in FIG. 4 , so the determination result in step S10 is NO. This means that there is a slight leakage of air from the suction cup 75 and the pipes 76A and 76B, so the diagnosis unit 100 diagnoses that the suction cup 75 and the pipes 76A and 76B are abnormal and need to be replaced (step S13), and ends a series of diagnosis processing (step S12).

與在圖4中以實線A所表示之模式及以虛線B所表示之模式不同,在以鏈線C所表示之模式中,藉由壓力計79所測量之壓力P的下降非常緩慢,能認為在吸盤75、配管76A、76B中產生大量的空氣的洩漏。假設此種情形,診斷部在自開啟閥V1起藉由壓力計79所測量之壓力P的絕對值|P|未超過設定值|P 0|之情形(步驟S6:否)中,判定自開啟閥V1起的經過時間是否已經過圖4所示之預定時間ΔT 2(步驟S14),在尚未經過預定時間ΔT 2(步驟S14:否)的期間,重複步驟S4~步驟S6的處理,在即使已經過預定時間ΔT 2之時間t 5,藉由壓力計79所測量之壓力P的絕對值|P|亦如在圖4中以點e所表示般表示P 3而不超過預定值|P 0|之情形(步驟S14:是)中,診斷部100診斷吸盤75、配管76A、76B為異常,需要更換此等(步驟S13),並結束一連串的診斷處理(步驟S12)。此外,在本實施方式中,雖將自開啟閥V1起的預定的經過時間ΔT 2設定為比自關閉閥V1起的預定的經過時間ΔT 1更長(ΔT 2>ΔT 1),但亦可將此設為相反(ΔT 2<ΔT 1),亦可設為相同的值(ΔT 1=ΔT 2)。 如上述,在本實施方式中,診斷部100在已使第一搬送機構70的四個吸盤75與框架導件30的平坦的上表面接觸之狀態下,開啟閥V1而使吸盤75與吸引源78連通,並藉由壓力計79而測量配管76A、76B的壓力P,藉由此壓力計79所測量之壓力(負壓)P的絕對值|P|若超過預先設定之設定值|P 0|則診斷吸盤75或配管(吸引路徑)76A、76B為正常,若未超過預先設定之設定值|P 0|則診斷吸盤75或配管(吸引路徑)76A、76B為異常,因此能得到下述功效:可簡單且確實地檢查來自第一搬送機構70的吸盤75、配管(吸引路徑)76A、76B的空氣的洩漏,並正確地掌握吸盤75、配管76A、76B等的適當的更換時機。 Unlike the mode represented by the solid line A and the mode represented by the dotted line B in FIG. 4 , in the mode represented by the chain line C, the pressure P measured by the pressure gauge 79 decreases very slowly, and it can be considered that a large amount of air leakage occurs in the suction cup 75 and the pipes 76A and 76B. Assuming this situation, when the absolute value |P| of the pressure P measured by the pressure gauge 79 since the valve V1 is opened does not exceed the set value |P 0 | (step S6: No), the diagnosis section determines whether the time elapsed since the valve V1 is opened has exceeded the predetermined time ΔT 2 shown in FIG. 4 (step S14). During the period when the predetermined time ΔT 2 has not yet elapsed (step S14: No), the processing of steps S4 to S6 is repeated. At time t 5 when the predetermined time ΔT 2 has elapsed, the absolute value |P| of the pressure P measured by the pressure gauge 79 shows P 3 and does not exceed the predetermined value |P 0 | as shown by point e in FIG. 4. | (step S14: Yes), the diagnosis unit 100 diagnoses that the suction cup 75 and the pipes 76A and 76B are abnormal and need to be replaced (step S13), and ends a series of diagnosis processing (step S12). In addition, in the present embodiment, although the predetermined elapsed time ΔT2 from opening the valve V1 is set to be longer than the predetermined elapsed time ΔT1 from closing the valve V1 ( ΔT2 > ΔT1 ), this may be set to the opposite ( ΔT2 < ΔT1 ), or may be set to the same value ( ΔT1 = ΔT2 ). As described above, in the present embodiment, the diagnostic unit 100 opens the valve V1 to connect the suction cup 75 to the suction source 78 while the four suction cups 75 of the first transport mechanism 70 are in contact with the flat upper surface of the frame guide 30, and measures the pressure P of the pipes 76A and 76B by the pressure gauge 79. If the absolute value |P| of the pressure (negative pressure) P measured by the pressure gauge 79 exceeds the preset setting value |P 0 |, the suction cup 75 or the pipes (suction path) 76A and 76B are diagnosed to be normal. If the absolute value |P| of the pressure (negative pressure) P measured by the pressure gauge 79 exceeds the preset setting value |P 0 | , the diagnostic unit 100 determines that the suction cup 75 or the pipes (suction path) 76A and 76B are normal. |The suction cup 75 or the piping (suction path) 76A, 76B is diagnosed as abnormal, so the following effect can be obtained: the air leakage from the suction cup 75 and the piping (suction path) 76A, 76B of the first conveying mechanism 70 can be simply and accurately checked, and the appropriate replacement timing of the suction cup 75, the piping 76A, 76B, etc. can be accurately grasped.

此外,在以上的實施方式中,雖使第一搬送機構70的四個吸盤75與框架導件30的平坦的上表面接觸而進行該第一搬送機構70的吸盤75、配管76A、76B的洩漏檢查,但亦可如圖5所示,使第一搬送機構70的四個吸盤75與卡盤台40的外周上表面的平坦的圓環狀部分(接觸面)40a接觸,並藉由與前述相同的手法而進行吸盤75、配管(吸引路徑)76A、76B的洩漏檢查。此情形,卡盤台40的上表面外周的圓環狀部分40a的寬度L2被設定成大於各吸盤75的最大直徑φd(L2>φd)。此外,在圖5中,對與圖2所示者相同的要素標記相同的符號,並省略關於此等要素之再次說明。此外,亦可使吸盤75不與卡盤台40的上表面外周的圓環狀部分40a接觸,而是與夾具41支撐框架F之支撐面接觸,並藉由與前述相同的手法而進行該吸盤75、配管(吸引路徑)76A、76B的洩漏檢查。In the above embodiment, the suction cups 75 of the first transport mechanism 70 and the pipes 76A and 76B are checked for leakage by making the four suction cups 75 of the first transport mechanism 70 contact the flat upper surface of the frame guide 30. However, as shown in FIG5 , the four suction cups 75 of the first transport mechanism 70 may be brought into contact with the flat annular portion (contact surface) 40a of the outer circumferential upper surface of the chuck table 40, and the suction cups 75 and the pipes (suction path) 76A and 76B may be checked for leakage by the same method as described above. In this case, the width L2 of the annular portion 40a of the outer circumference of the upper surface of the chuck table 40 is set to be larger than the maximum diameter φd of each suction cup 75 (L2>φd). In addition, in Fig. 5, the same symbols are used for the same elements as those shown in Fig. 2, and the re-explanation of these elements is omitted. In addition, the suction cup 75 may be brought into contact with the supporting surface of the supporting frame F of the fixture 41 instead of the annular portion 40a on the outer circumference of the upper surface of the chuck table 40, and the suction cup 75 and the pipes (suction paths) 76A and 76B may be inspected for leakage by the same method as described above.

(第二搬送機構) 第二搬送機構80的洩漏檢查亦可與第一搬送機構70的洩漏檢查同樣地進行。 (Second transport mechanism) The second transport mechanism 80 can be inspected for leaks in the same manner as the first transport mechanism 70.

亦即,在第二搬送機構80的洩漏檢查中,如圖6所示,使第二搬送機構80的四個吸盤85與旋轉清洗機構90的旋轉台91的外周上表面的平坦的圓環狀部分(接觸面)91a接觸,並藉由與前述相同的手法而進行吸盤85、配管(吸引路徑)86A、86B的洩漏檢查。此情形,旋轉台91的上表面外周的圓環狀部分91a的寬度L3被設定成大於各吸盤85的最大直徑φd(L3>φd)。此外,在圖6中,對與圖2及圖5所示者相同的要素標記相同的符號,並省略關於此等要素之再次說明。此外,第一搬送機構70亦可將工件組WS從卡盤台40搬送往旋轉清洗機構90的旋轉台91。That is, in the leakage inspection of the second conveying mechanism 80, as shown in FIG6, the four suction cups 85 of the second conveying mechanism 80 are brought into contact with the flat annular portion (contact surface) 91a of the outer circumferential upper surface of the rotating table 91 of the rotary cleaning mechanism 90, and the suction cups 85 and the pipes (suction paths) 86A and 86B are inspected for leakage by the same method as described above. In this case, the width L3 of the annular portion 91a of the outer circumference of the upper surface of the rotating table 91 is set to be larger than the maximum diameter φd of each suction cup 85 (L3>φd). In addition, in FIG6, the same symbols are marked for the same elements as those shown in FIG2 and FIG5, and the re-explanation of these elements is omitted. In addition, the first transport mechanism 70 may also transport the workpiece set WS from the chuck table 40 to the rotary table 91 of the rotary cleaning mechanism 90 .

此外,以上雖已說明將本發明適用於切割裝置之方式,但本發明的適用對象亦包含具備藉由吸盤而吸引保持被加工物並進行搬送之搬送機構之其他任意的加工裝置。Furthermore, although the above description has been given of a method of applying the present invention to a cutting device, the present invention is also applicable to any other processing device having a transport mechanism that sucks and holds the workpiece by a suction cup and transports it.

並且,在上述中,雖已舉出在第一搬送機構70的洩漏檢查時,使用框架導件30的上表面與卡盤台40的上表面的圓環狀部分40a作為吸盤75所接觸之接觸面,在第二搬送機構80的洩漏檢查時,使用旋轉台91的圓環狀部分91a作為吸盤85所接觸之接觸面之例子,但作為此等吸盤75、85所接觸之面,可使用其他任意的平坦的平面。Furthermore, although the above example has been given of using the upper surface of the frame guide 30 and the annular portion 40a of the upper surface of the chuck table 40 as the contact surface with which the suction cup 75 contacts when the first transport mechanism 70 is leaked, and using the annular portion 91a of the rotating table 91 as the contact surface with which the suction cup 85 contacts when the second transport mechanism 80 is leaked, any other flat surface may be used as the surface with which the suction cups 75 and 85 contact.

另外,本發明的應用不受限於以上說明之實施方式,亦當然能在發明申請專利範圍及說明書與圖式所記載之技術思想的範圍內進行各種變形。In addition, the application of the present invention is not limited to the above-described implementation methods, and various modifications can be made within the scope of the invention patent application and the technical ideas described in the specification and drawings.

1:切割裝置(加工裝置) 2:基台 2a:導孔 3:基台的開口部 4:蓋 5:伸縮蓋 10:卡匣台 11:卡匣 20:抽出機構 21:滾珠螺桿軸 22:導軌 23:抽出臂 23a:抽出臂的垂直部 23b:抽出臂的水平部 24:電動馬達 25:軸承 26:保持部 30:框架導件 30a:框架導件的垂直部 30b:框架導件的水平部 40:卡盤台 40a:卡盤台的圓環狀部分 41:夾具 50:加工手段 51:第一切割單元 51a:切割刀片 52:第二切割單元 53:攝像單元 55:Z軸方向移動機構 56:Z軸導軌 57:升降板 58:Z軸滾珠螺桿軸 59:Z軸脈衝馬達 60:Y軸方向移動機構 61:滑塊 62:柱體 63:Y軸導軌 64:Y軸滾珠螺桿軸 65:Y軸脈衝馬達 70:第一搬送機構 71:升降機構 72:桿體 73:撐條 74:搬送墊 75:吸盤 76A,76B:配管(吸引路徑) 77:接頭 78:吸引源 79:壓力計 80:第二搬送機構 81:升降機構 82:桿體 83:撐條 84:搬送墊 85:吸盤 86A,86B:配管(吸引路徑) 87:接頭 88:吸引源 89:壓力計 90:旋轉清洗機構 91:旋轉台 91a:旋轉台的圓環狀部分 100:診斷部 φd:吸盤的最大直徑 F:環狀框架 L1:環狀框架上表面的寬度 L2:卡盤台的圓環狀部分的寬度 L3:旋轉台的圓環狀部分的寬度 T:膠膜 V1,V2:閥 W:晶圓 WS:工件組 1: Cutting device (processing device) 2: Base 2a: Guide hole 3: Opening of base 4: Cover 5: Retractable cover 10: Cassette base 11: Cassette 20: Extraction mechanism 21: Ball screw shaft 22: Guide rail 23: Extraction arm 23a: Vertical part of extraction arm 23b: Horizontal part of extraction arm 24: Electric motor 25: Bearing 26: Holding part 30: Frame guide 30a: Vertical part of frame guide 30b: Horizontal part of frame guide 40: Chuck base 40a: Annular part of chuck base 41: Clamp 50: Processing means 51: First cutting unit 51a: Cutting blade 52: Second cutting unit 53: Camera unit 55: Z-axis moving mechanism 56: Z-axis guide rail 57: Lifting plate 58: Z-axis ball screw shaft 59: Z-axis pulse motor 60: Y-axis moving mechanism 61: Slide block 62: Cylinder 63: Y-axis guide rail 64: Y-axis ball screw shaft 65: Y-axis pulse motor 70: First conveying mechanism 71: Lifting mechanism 72: Rod 73: Support bar 74: Conveying pad 75: Suction cup 76A, 76B: Piping (suction path) 77: Connector 78: Suction source 79: Pressure gauge 80: Second transport mechanism 81: Lifting mechanism 82: Rod 83: Support bar 84: Transport pad 85: Suction cup 86A, 86B: Pipe (suction path) 87: Connector 88: Suction source 89: Pressure gauge 90: Rotary cleaning mechanism 91: Rotating table 91a: Annular portion of the rotating table 100: Diagnosis section φd: Maximum diameter of the suction cup F: Annular frame L1: Width of the upper surface of the annular frame L2: Width of the annular portion of the chuck table L3: Width of the annular portion of the rotating table T: Film V1, V2: Valve W: Wafer WS: Workpiece Set

圖1係本發明之加工裝置的一態樣亦即切割裝置的立體圖。 圖2係表示以本發明之切割裝置的框架導件進行第一搬送機構的洩漏檢查之狀態之局部立體圖。 圖3係表示由本發明之切割裝置中之診斷部所進行之洩漏檢查的程序之流程圖。 圖4係表示本發明之切割裝置中之第一搬送機構在洩漏檢查時之吸引壓的時間變化之時間圖。 圖5係表示以本發明之切割裝置的卡盤台進行第一搬送機構的洩漏檢查之狀態之局部立體圖。 圖6係表示以本發明之切割裝置的旋轉台進行第二搬送機構的洩漏檢查之狀態之局部立體圖。 FIG. 1 is a perspective view of a cutting device, which is one embodiment of the processing device of the present invention. FIG. 2 is a partial perspective view showing a state where a leak check of the first conveying mechanism is performed by a frame guide of the cutting device of the present invention. FIG. 3 is a flow chart showing a leak check procedure performed by a diagnostic unit in the cutting device of the present invention. FIG. 4 is a time chart showing a temporal change in suction pressure of the first conveying mechanism in the cutting device of the present invention during a leak check. FIG. 5 is a partial perspective view showing a state where a leak check of the first conveying mechanism is performed by a chuck table of the cutting device of the present invention. FIG. 6 is a partial perspective view showing a state where a leak check of the second conveying mechanism is performed by a rotary table of the cutting device of the present invention.

2a:導孔 2a: Guide hole

30:框架導件 30: Frame guide

30a:框架導件的垂直部 30a: Vertical part of the frame guide

30b:框架導件的水平部 30b: Horizontal part of the frame guide

40:卡盤台 40: Chuck table

41:夾具 41: Clamp

70:第一搬送機構 70: First transport mechanism

71:升降機構 71: Lifting mechanism

72:桿體 72: Rod

73:撐條 73:Supporting strips

74:搬送墊 74: Transport pad

75:吸盤 75: Suction cup

76A,76B:配管(吸引路徑) 76A, 76B: Piping (suction path)

77:接頭 77:Connection

78:吸引源 78: Attraction source

79:壓力計 79: Pressure gauge

100:診斷部 100: Diagnosis Department

φd:吸盤的最大直徑 φd: Maximum diameter of the suction cup

L1:環狀框架上表面的寬度 L1: Width of the upper surface of the ring frame

V1:閥 V1: Valve

Claims (5)

一種加工裝置,其具備:卡盤台,其以保持面保持被加工物;加工手段,其將被保持於該保持面之該被加工物進行加工;搬送機構,其將該被加工物搬入該保持面或將被保持於該保持面之該被加工物搬出;以及診斷部, 該搬送機構具備:搬送墊,其具備吸引該被加工物的上表面之至少四個吸盤;升降機構,其使該搬送墊升降;吸引路徑,其使該吸盤與吸引源連通;閥,其設置於該吸引路徑;以及壓力計,其測量該吸盤與該閥之間的該吸引路徑內的壓力, 在使該吸盤與至少四個該吸盤能吸引的上表面接觸且使該吸盤與該吸引源連通時,該壓力計測量之負壓的絕對值若超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為正常,若未超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為異常。 A processing device, which comprises: a chuck table, which holds a workpiece with a holding surface; a processing means, which processes the workpiece held on the holding surface; a conveying mechanism, which moves the workpiece into the holding surface or moves the workpiece held on the holding surface out; and a diagnostic unit, wherein the conveying mechanism comprises: a conveying pad, which has at least four suction cups for sucking the upper surface of the workpiece; a lifting mechanism, which raises and lowers the conveying pad; a suction path, which connects the suction cup with a suction source; a valve, which is arranged in the suction path; and a pressure gauge, which measures the pressure in the suction path between the suction cup and the valve, When the suction cup is brought into contact with at least four upper surfaces that the suction cup can attract and the suction cup is connected to the suction source, if the absolute value of the negative pressure measured by the pressure gauge exceeds the preset value, the diagnostic unit determines that the suction cup and the suction path are normal; if it does not exceed the preset value, the diagnostic unit determines that the suction cup and the suction path are abnormal. 如請求項1之加工裝置,其中,在使該吸盤與至少四個該吸盤能吸引的上表面接觸且使該吸盤與該吸引源連通時,該壓力計測量之負壓的絕對值若超過預先設定之值則該診斷部關閉該閥,並且,自關閉該閥起已經過預定的時間時的該壓力計測量之負壓的絕對值若超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為正常,若未超過預先設定之值,則該診斷部判斷該吸盤及該吸引路徑為異常。A processing device as claimed in claim 1, wherein, when the suction cup is brought into contact with at least four upper surfaces that the suction cup can attract and the suction cup is connected to the suction source, if the absolute value of the negative pressure measured by the pressure gauge exceeds a preset value, the diagnostic unit closes the valve, and, if the absolute value of the negative pressure measured by the pressure gauge after a predetermined time has passed since the valve was closed, exceeds the preset value, the diagnostic unit determines that the suction cup and the suction path are normal; if it does not exceed the preset value, the diagnostic unit determines that the suction cup and the suction path are abnormal. 如請求項1或2之加工裝置,其中,該被加工物為在環狀框架與晶圓黏貼膠膜並使其等一體化而成之工件組, 該加工裝置具備: 卡匣台,其載置容納該工件組之卡匣; 抽出機構,其從載置於該卡匣台之該卡匣抽出該工件組;以及 框架導件,其暫置藉由該抽出機構所抽出之該工件組, 該框架導件具備接觸面,該接觸面具有比該吸盤更寬廣的面積, 該診斷部在至少四個該吸盤吸引該框架導件的該接觸面的狀態下診斷該吸盤及該吸引路徑為正常或異常。 A processing device as claimed in claim 1 or 2, wherein the workpiece is a workpiece group formed by integrating a ring-shaped frame and a wafer with a film, and the processing device comprises: a cassette stage for carrying a cassette for accommodating the workpiece group; a pull-out mechanism for pulling out the workpiece group from the cassette mounted on the cassette stage; and a frame guide for temporarily placing the workpiece group pulled out by the pull-out mechanism, the frame guide having a contact surface having an area wider than that of the suction cup, and the diagnostic unit diagnoses whether the suction cup and the suction path are normal or abnormal when at least four suction cups attract the contact surface of the frame guide. 如請求項1或2之加工裝置,其中,具備:旋轉清洗機構,其使保持該被加工物之旋轉台旋轉,並對被保持於該旋轉台之該被加工物噴射清洗水而清洗該被加工物, 該旋轉台具備接觸面,該接觸面具有比該吸盤更寬廣的面積, 該診斷部在至少四個該吸盤吸引該旋轉台的該接觸面的狀態下診斷該吸盤及該吸引路徑為正常或異常。 A processing device as claimed in claim 1 or 2, wherein the device comprises: a rotary cleaning mechanism that rotates a rotary table holding the workpiece and sprays cleaning water on the workpiece held on the rotary table to clean the workpiece; The rotary table has a contact surface that is wider than the suction cup; The diagnostic unit diagnoses whether the suction cup and the suction path are normal or abnormal when at least four suction cups attract the contact surface of the rotary table. 如請求項1或2之加工裝置,其中,該卡盤台具備接觸面,該接觸面具有比該吸盤更寬廣的面積, 該診斷部在至少四個該吸盤吸引該卡盤台的該接觸面的狀態下診斷該吸盤及該吸引路徑為正常或異常。 A processing device as claimed in claim 1 or 2, wherein the chuck table has a contact surface having an area wider than that of the suction cup, and the diagnostic unit diagnoses whether the suction cup and the suction path are normal or abnormal when at least four suction cups attract the contact surface of the chuck table.
TW112118899A 2022-05-25 2023-05-22 Processing equipment TW202412990A (en)

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JP2022-085160 2022-05-25

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TW202412990A true TW202412990A (en) 2024-04-01

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