TW202412978A - Welding method and laser processing device - Google Patents

Welding method and laser processing device Download PDF

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TW202412978A
TW202412978A TW112121549A TW112121549A TW202412978A TW 202412978 A TW202412978 A TW 202412978A TW 112121549 A TW112121549 A TW 112121549A TW 112121549 A TW112121549 A TW 112121549A TW 202412978 A TW202412978 A TW 202412978A
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laser light
laser
component
welding method
workpiece
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TW112121549A
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Chinese (zh)
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山村健
長崎克俊
林佳佑
田中雄一
堀田康弘
加藤悦史
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日商片岡製作所股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20Bonding
    • B23K26/21Bonding by welding
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K15/00Methods or apparatus specially adapted for manufacturing, assembling, maintaining or repairing of dynamo-electric machines
    • H02K15/04Methods or apparatus specially adapted for manufacturing, assembling, maintaining or repairing of dynamo-electric machines of windings, prior to mounting into machines

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

A welding method for welding metals with a laser is provided with which it is possible to shorten the processing time while maintaining satisfactory weld quality. In the welding method, end surfaces of a first member and a second member are placed so as to butt against each other and disposed so that the end surfaces face a laser device 1 and the end surfaces are welded with laser light. The method is characterized by comprising a first step, in which the first member is irradiated with laser light to form a first molten portion, a second step, in which the second member is irradiated with laser light to form a second molten portion, and a third step, in which after the first molten portion and the second molten portion have been bonded to each other, the bonded, first and second molten portions are irradiated with laser light to form one molten portion, the laser light being composed of first laser light and second laser light, which differ in wavelength from each other.

Description

熔接方法以及雷射加工裝置Welding method and laser processing device

本發明係有關於一種熔接方法以及雷射加工裝置,係用以使用雷射光進行金屬熔接。The present invention relates to a welding method and a laser processing device for welding metal using laser light.

作為用以進行金屬熔接之技術之一,利用使用了雷射光的雷射熔接。當比較雷射熔接與其他的熔接技術時,能夠以藉由聚光透鏡而高密度化的能量來熔接被加工物,熔接品質高且適合細微的熔接。 近年來,在製造組入於混合式(hybrid)車輛、電動車輛之馬達用的定子(固定子)時利用此種雷射熔接。定子係由定子芯(stator core)以及複數個分段線圈(segment coil)所構成,複數個分段線圈係安裝於定子芯的溝槽(slot);定子係藉由雷射熔接來接合對應的分段線圈的端部彼此。通常,各個分段線圈係使用扁平導體;熔接面由於細微達至數平方毫米(mm²),因此適合雷射熔接。 然而,在扁平導體的前端熔接加工中會有下述情形:因為加工精密度的偏差、固定治具(fixing jig)的機構精密度、導體被覆部的厚度等之影響,於前端的對接時會產生間隙、段差。在此種情形中,當跨越兩隻扁平導體連續地照射雷射時會有下述情形:從間隙產生雷射洩漏而對扁平導體下部的被覆部照射雷射,從而產生碳化以及絕緣不良。 於專利文獻1揭示了一種扁平線(flat wire)的前端熔接加工技術,此種技術係揭示了:即使在兩個扁平線之間空出間隙,為了防止產生雷射洩漏,一邊以熔融金屬填埋間隙一邊進行熔接。尤其,在開始照射雷射時,為了防止因為熔接面處的能量密度變高導致大量發生濺射(sputter),以用以抑制開始照射時的能量密度之掃描軌跡進行熔接。 於專利文獻2揭示了一種熔接方法,係用以在接合電性導體的端部彼此時防止雷射光從電性導體的間隙洩漏。具體而言,分別熔接鄰接的兩個電性導體從而分別形成熔融部。之後,藉由按壓機構賦予按壓力從而使端部彼此接近,藉此使熔融部彼此結合。藉此,無須使電性導體的端部高精密度地對接即能夠結合端部彼此。 [先前技術文獻] [專利文獻] As one of the technologies for metal welding, laser welding using laser light is used. When comparing laser welding with other welding technologies, it is possible to weld the workpiece with energy that is highly concentrated by a focusing lens, and the welding quality is high and it is suitable for fine welding. In recent years, this type of laser welding has been used in the manufacture of stators (stators) for motors incorporated in hybrid vehicles and electric vehicles. The stator is composed of a stator core and a plurality of segment coils, and the plurality of segment coils are installed in the slots of the stator core; the stator is joined to each other by laser welding at the ends of the corresponding segment coils. Usually, each segmented coil uses a flat conductor; the welding surface is fine up to several square millimeters (mm²), so it is suitable for laser welding. However, in the front end welding process of the flat conductor, there will be the following situation: due to the influence of the deviation of processing precision, the precision of the fixing jig mechanism, the thickness of the conductor coating, etc., a gap and step difference will be generated when the front end is connected. In this case, when the laser is continuously irradiated across the two flat conductors, the following situation will occur: laser leakage will occur from the gap and the laser will be irradiated to the coating at the bottom of the flat conductor, resulting in carbonization and poor insulation. Patent document 1 discloses a flat wire front end welding process technology, which discloses that: even if there is a gap between two flat wires, in order to prevent laser leakage, the gap is filled with molten metal while welding. In particular, when laser irradiation starts, in order to prevent a large amount of sputtering due to the high energy density at the welding surface, welding is performed to suppress the scanning track of the energy density at the beginning of irradiation. Patent document 2 discloses a welding method for preventing laser light from leaking from the gap of an electrical conductor when the ends of an electrical conductor are joined together. Specifically, two adjacent electrical conductors are welded separately to form molten parts respectively. Thereafter, a pressing force is applied by a pressing mechanism to bring the ends closer to each other, thereby joining the molten parts to each other. In this way, the ends of the electrical conductors can be joined together without having to butt them together with high precision. [Prior art document] [Patent document]

[專利文獻1]日本特開2019-181506號公報。 [專利文獻2]日本特開2020-142257號公報。 [Patent Document 1] Japanese Patent Publication No. 2019-181506. [Patent Document 2] Japanese Patent Publication No. 2020-142257.

[發明所欲解決之課題][The problem that the invention wants to solve]

然而,如專利文獻1般,當跨越兩條扁平線連續地掃描雷射光時,會於橫越段差時發生大量的濺射。此外,當不考慮段差地跨越左右的扁平線均等地掃描雷射光時,熔融部的高度會左右不同而破壞平衡,且熔接強度會降低。 再者,當使用專利文獻2的技術藉由按壓力將端部彼此靠近並結合熔融部時,亦會有已經結合的熔融部傾斜且熔融部從端面滴落的可能性,難以形成漂亮的熔融球。當形成於前端部的熔融球傾斜且滴落時,會有無法滿足所要求的熔接品質且熔接強度降低之問題。 因此,本發明係有鑑於上述問題點而研創,目的在於提供一種熔接方法以及雷射加工裝置,在用以進行扁平導體的前端熔接之熔接方法中不會從扁平導體的間隙產生雷射洩漏,能夠確保良好的熔接品質以及熔接強度。 [用以解決課題的手段] However, when the laser light is continuously scanned across two flat lines as in Patent Document 1, a large amount of spatter will occur when crossing the step difference. In addition, when the laser light is scanned equally across the left and right flat lines without considering the step difference, the height of the molten part will be different on the left and right, destroying the balance and reducing the welding strength. Furthermore, when the technology of Patent Document 2 is used to press the ends together and combine the molten parts, there is also the possibility that the already combined molten parts will tilt and the molten parts will drip from the end surface, making it difficult to form a beautiful molten ball. When the molten ball formed at the front end tilts and drips, there will be a problem that the required welding quality cannot be met and the welding strength is reduced. Therefore, the present invention is developed in view of the above-mentioned problems, and its purpose is to provide a welding method and a laser processing device, which can ensure good welding quality and welding strength in the welding method for welding the front end of a flat conductor without causing laser leakage from the gap of the flat conductor. [Means for solving the problem]

為了解決上述課題,本發明為一種熔接方法,係用以將第一構件以及第二構件的端部對接後的端面與雷射加工裝置對向地配置,並藉由雷射光熔接前述端面;前述熔接方法係包含:第一步驟,係對前述第一構件照射前述雷射光,從而形成第一熔融部;第二步驟,係對前述第二構件照射前述雷射光,從而形成第二熔融部;以及第三步驟,係當前述第一熔融部以及前述第二熔融部結合時,對已經結合的前述第一熔融部以及前述第二熔融部照射前述雷射光,從而形成一個熔融部;前述雷射光係由波長彼此不同的第一雷射光以及第二雷射光所構成。 [發明功效] In order to solve the above-mentioned problem, the present invention is a welding method, which is used to arrange the end faces of the first component and the second component after the ends are butted against each other to face the laser processing device, and weld the end faces by laser light; the welding method comprises: a first step, irradiating the first component with the laser light to form a first molten portion; a second step, irradiating the second component with the laser light to form a second molten portion; and a third step, when the first molten portion and the second molten portion are combined, irradiating the combined first molten portion and the second molten portion with the laser light to form a molten portion; the laser light is composed of a first laser light and a second laser light having different wavelengths. [Effect of the invention]

依據本發明,即使在扁平線前端的對接時產生間隙之情形中,在藉由第一步驟以及第二步驟結合了兩個熔融部後再進行第三步驟,藉此抑制雷射從間隙洩漏導致對扁平導體的下部造成損傷。此外,對在第三步驟中結合的熔融部照射雷射,藉此能將熔融部均勻化從而形成左右對稱的漂亮的熔融球。According to the present invention, even if a gap is generated when the front end of the flat wire is butted, the third step is performed after the two molten parts are connected by the first step and the second step, thereby preventing the laser from leaking from the gap and causing damage to the lower part of the flat conductor. In addition, by irradiating the molten parts connected in the third step with laser, the molten parts can be made uniform, thereby forming a beautiful molten ball that is symmetrical on both sides.

[實施形態一] (1)雷射加工裝置1的整體構成 圖1係顯示雷射加工裝置1的構成之外觀圖,圖2係顯示雷射加工裝置1的功能構成之圖。 如圖1以及圖2所示,雷射加工裝置1係由下述構件所構成:第一振盪器2(藍色半導體雷射),係振盪第一雷射光L1;第二振盪器3(紅外線光纖雷射(infrared fiber laser)),係振盪第二雷射光L2;混合式振鏡掃描器10,係使第一雷射光L1以及第二雷射光L2的光軸一致,並使第一雷射光L1以及第二雷射光 L2相對於被加工物W之照射位置位移;圖像處理部9,係拍攝被加工物W的圖像,並解析各個扁平線的配置狀況;工件設置台(work set stage)11,係載置有被加工物W,且能夠將所載置的被加工物W朝三維方向(x、y、z)以及繞著z軸的旋轉方向(θ)移動;固定治具15,係將被加工物W固定於工件設置台11;控制個人電腦12,係控制雷射加工裝置1的整體;PLC(Programmable Logic Controller;可程式邏輯控制器)13,係與控制個人電腦12協力地控制各個機器;以及雷射控制器14,係控制第一振盪器2以及第二振盪器3的動作。 [Implementation Form 1] (1) Overall structure of laser processing device 1 FIG. 1 is an external view showing the structure of laser processing device 1, and FIG. 2 is a diagram showing the functional structure of laser processing device 1. As shown in FIG. 1 and FIG. 2 , the laser processing device 1 is composed of the following components: a first oscillator 2 (blue semiconductor laser) for oscillating the first laser light L1; a second oscillator 3 (infrared fiber laser) for oscillating the second laser light L2; a hybrid galvanometer scanner 10 for aligning the optical axes of the first laser light L1 and the second laser light L2 and displacing the irradiation positions of the first laser light L1 and the second laser light L2 relative to the workpiece W; an image processing unit 9 for capturing an image of the workpiece W and analyzing the configuration of each flat wire; a workpiece setting table (work set The workpiece W is placed on the workpiece placement stage 11, and can move the placed workpiece W in three-dimensional directions (x, y, z) and in a rotational direction (θ) around the z axis; the fixing fixture 15 fixes the workpiece W on the workpiece placement stage 11; the control personal computer 12 controls the entire laser processing device 1; the PLC (Programmable Logic Controller) 13 controls each machine in cooperation with the control personal computer 12; and the laser controller 14 controls the actions of the first oscillator 2 and the second oscillator 3.

此外,圖像處理部9係由照明裝置101、拍攝裝置102以及控制器103所構成;控制器103係內置於圖1的控制盤100。控制盤100係內置有用以控制雷射加工裝置1之電腦;具體而言,除了內置有圖像處理部9的控制器103之外還內置有PLC13以及雷射控制器14。此外,工件設置台11係由下述構件所構成:基台11a;x軸台11x,為用以使被加工物W於x軸方向移動之機構;y軸台11y,為用以使被加工物W於y軸方向移動之機構;θ軸台11θ,係使被加工物W繞著z軸旋轉之機構;以及z軸台11z,為用以使被加工物W與混合式振鏡掃描器10相對性地於z軸方向移動之機構。In addition, the image processing unit 9 is composed of an illumination device 101, a camera device 102, and a controller 103; the controller 103 is built into the control panel 100 of FIG. 1. The control panel 100 is a computer built into the laser processing device 1; specifically, in addition to the controller 103 with the image processing unit 9 built in, a PLC 13 and a laser controller 14 are also built in. In addition, the workpiece mounting table 11 is composed of the following components: a base 11a; an x-axis table 11x, which is a mechanism for moving the workpiece W in the x-axis direction; a y-axis table 11y, which is a mechanism for moving the workpiece W in the y-axis direction; a θ-axis table 11θ, which is a mechanism for rotating the workpiece W around the z-axis; and a z-axis table 11z, which is a mechanism for moving the workpiece W and the hybrid galvanometer scanner 10 relatively in the z-axis direction.

(2)針對雷射光 第一振盪器2以及第二振盪器3所振盪的第一雷射光L1以及第二雷射光 L2係分別被光纖傳輸並射入至混合式振鏡掃描器10。而且,第一雷射光L1以及第二雷射光 L2係藉由混合式振鏡掃描器10以光軸一致之方式重疊。經過重疊的第一雷射光L1以及第二雷射光 L2係被縮小至預定的直徑後被照射至對向的被加工物W。如此,在雷射加工裝置1中,對被加工物W照射兩個第一雷射光L1以及第二雷射光 L2從而進行熔接。 作為第一雷射光L1,使用與多模光纖(multi mode fiber)連結的藍色半導體雷射。第一雷射光L1係只要波長為300nm至600nm即可,亦可使用綠色雷射來取代藍色雷射。此外,第一雷射光L1的輸出功率較佳為500W至3kW;作為一例,在本實施形態中為600W。 (2) Regarding laser light The first laser light L1 and the second laser light L2 oscillated by the first oscillator 2 and the second oscillator 3 are respectively transmitted by optical fibers and injected into the hybrid galvanometer scanner 10. Moreover, the first laser light L1 and the second laser light L2 are overlapped by the hybrid galvanometer scanner 10 in a manner that the optical axes are consistent. The overlapped first laser light L1 and the second laser light L2 are reduced to a predetermined diameter and then irradiated onto the opposite workpiece W. In this way, in the laser processing device 1, the workpiece W is irradiated with the two first laser lights L1 and the second laser lights L2 to perform welding. As the first laser light L1, a blue semiconductor laser connected to a multi-mode fiber is used. The first laser light L1 only needs to have a wavelength of 300nm to 600nm, and a green laser can be used instead of a blue laser. In addition, the output power of the first laser light L1 is preferably 500W to 3kW; as an example, it is 600W in this embodiment.

作為第二雷射光L2,使用波長為780nm至1100nm的近紅外線單模光纖雷射。亦即,第一雷射光L1以及第二雷射光 L2的波長彼此不同,且第一雷射光L1的波長係比第二雷射光L2的波長還短。第二雷射光L2的輸出功率較佳為500W至2kW;作為一例,在本實施形態中為1.5kW。 在本實施形態中,第一雷射光L1係使用多模(multi mode),第二雷射光L2係使用單模(single mode)。與第一雷射光L1相比,第二雷射光L2為聚光直徑小的點光(spot light)。因此,使用單模光纖雷射作為第二振盪器3,藉此能有效地生成光束直徑小且能量強度為高峰值的第二雷射光L2。 As the second laser light L2, a near-infrared single-mode fiber laser with a wavelength of 780nm to 1100nm is used. That is, the wavelengths of the first laser light L1 and the second laser light L2 are different from each other, and the wavelength of the first laser light L1 is shorter than the wavelength of the second laser light L2. The output power of the second laser light L2 is preferably 500W to 2kW; as an example, it is 1.5kW in this embodiment. In this embodiment, the first laser light L1 uses multi-mode, and the second laser light L2 uses single-mode. Compared with the first laser light L1, the second laser light L2 is a spot light with a small focusing diameter. Therefore, using a single-mode fiber laser as the second oscillator 3 can effectively generate the second laser light L2 with a small beam diameter and a high peak energy intensity.

(3)針對混合式振鏡掃描器10 接著,詳細地說明混合式振鏡掃描器10。 圖3至圖5所示的混合式振鏡掃描器10係具備:合成器(combiner)部4,係將從第一振盪器2以及第二振盪器3供給的第一雷射光L1以及第二雷射光 L2重疊至同一個光軸上;焦點偏移器部6,係位於合成器部4的下游,用以調節已經重疊至同一個光軸上的第一雷射光L1以及第二雷射光 L2的焦點距離;以及振鏡掃描器部8,係位於焦點偏移器部6的下游,用以使朝向被加工物W之第一雷射光L1以及第二雷射光 L2的光軸的朝向位移。 (3) Hybrid galvanometer scanner 10 Next, the hybrid galvanometer scanner 10 is described in detail. The hybrid galvanometer scanner 10 shown in FIGS. 3 to 5 comprises: a combiner section 4 for superimposing the first laser light L1 and the second laser light L2 supplied from the first oscillator 2 and the second oscillator 3 on the same optical axis; a focus shifter section 6 located downstream of the combiner section 4 for adjusting the focal distance of the first laser light L1 and the second laser light L2 superimposed on the same optical axis; and a galvanometer scanner section 8 located downstream of the focus shifter section 6 for shifting the direction of the optical axis of the first laser light L1 and the second laser light L2 toward the workpiece W.

如圖3所示,合成器部4係例如具有:透鏡(準直透鏡(collimation lens)等)31、32,係將從第一振盪器2以及第二振盪器3供給的第一雷射光L1以及第二雷射光 L2分別予以平行光化;以及必要的鏡子(包含分光鏡(beam splitter)、半鏡(half mirror)、合成器等)33、34,係用以使已經通過透鏡31、32的各個第一雷射光L1以及第二雷射光 L2的光軸一致。當然,合成器部4亦可具有上文所說明的以外的光學要素、光纖以及其他構件等。此外,在合成器部4中亦能將波長不同的三種以上的雷射光重疊。 如圖4所示,焦點偏移器部6係具有:透鏡(凹透鏡,尤其是雙凹透鏡)41(以下亦稱為凹透鏡41、雙凹透鏡41),係將在合成器部4中重疊的第一雷射光L1以及第二雷射光 L2的直徑擴張;以及透鏡(複數片凸透鏡,尤其是作為準直透鏡以及聚光透鏡之平凸透鏡等)42、43(以下亦稱為凸透鏡42、43、準直透鏡42、聚光透鏡43),係將已經通過透鏡41的第一雷射光L1以及第二雷射光 L2的直徑縮小。當然,焦點偏移器部6亦可具有上文所說明的以外的光學要素、光纖以及其他構件等。 As shown in FIG3 , the synthesizer unit 4 has, for example: lenses (collimation lenses, etc.) 31 and 32, which collimate the first laser light L1 and the second laser light L2 supplied from the first oscillator 2 and the second oscillator 3, respectively; and necessary mirrors (including beam splitters, half mirrors, synthesizers, etc.) 33 and 34, which are used to align the optical axes of the first laser light L1 and the second laser light L2 that have passed through the lenses 31 and 32. Of course, the synthesizer unit 4 may also have optical elements, optical fibers, and other components other than those described above. In addition, three or more laser lights with different wavelengths can also be superimposed in the synthesizer unit 4. As shown in FIG4 , the focus shifter section 6 has: a lens (concave lens, especially a biconcave lens) 41 (hereinafter also referred to as concave lens 41, biconcave lens 41), which expands the diameter of the first laser light L1 and the second laser light L2 overlapped in the synthesizer section 4; and lenses (plural convex lenses, especially plano-convex lenses as collimating lenses and focusing lenses, etc.) 42, 43 (hereinafter also referred to as convex lenses 42, 43, collimating lens 42, focusing lens 43), which reduce the diameter of the first laser light L1 and the second laser light L2 that have passed through the lens 41. Of course, the focus shifter section 6 may also have optical elements, optical fibers, and other components other than those described above.

焦點偏移器部6係能夠調整從合成器部4而來的第一雷射光L1以及第二雷射光 L2的焦點距離F。因此,在圖4所示的例子中,以能夠調整沿著凹透鏡41與凸透鏡42之間的第一雷射光L1以及第二雷射光 L2的光軸之相對距離D之方式,使線性馬達台車之類的驅動機構支撐凹透鏡41以及/或者凸透鏡42中的至少一者並能夠沿著光軸方向進退移動。順帶一提,終端的聚光透鏡43亦可不沿著光軸方向進退移動。 如圖4中的(A)所示,凹透鏡41與凸透鏡42之間的相對距離D愈狹窄,則已經通過焦點偏移器部6的透鏡41、42、43的第一雷射光L1以及第二雷射光 L2的焦點距離F愈長。亦即,第一雷射光L1以及第二雷射光 L2的焦點係從焦點偏移器部6的終端的透鏡43離開。 The focus shifter unit 6 is capable of adjusting the focus distance F of the first laser light L1 and the second laser light L2 from the synthesizer unit 4. Therefore, in the example shown in FIG. 4 , a driving mechanism such as a linear motor carriage supports at least one of the concave lens 41 and/or the convex lens 42 and enables the concave lens 41 and the convex lens 42 to move forward and backward along the optical axis so that the relative distance D between the first laser light L1 and the second laser light L2 along the optical axis between the concave lens 41 and the convex lens 42 can be adjusted. Incidentally, the condenser lens 43 at the end may not move forward and backward along the optical axis. As shown in (A) of FIG. 4 , the narrower the relative distance D between the concave lens 41 and the convex lens 42, the longer the focal distance F of the first laser light L1 and the second laser light L2 that have passed through the lenses 41, 42, and 43 of the focus shifter unit 6. That is, the focal points of the first laser light L1 and the second laser light L2 are away from the lens 43 at the end of the focus shifter unit 6.

反之,如圖4中的(B)所示,凹透鏡41與凸透鏡42之間的相對距離D愈寬,則已經通過焦點偏移器部6的透鏡41、42、43的第一雷射光L1以及第二雷射光L2的焦點距離F愈短。亦即,第一雷射光L1以及第二雷射光L2的焦點係接近焦點偏移器部6的終端的透鏡43。 此外,在透鏡41、42、43中,作為普遍的物理法則,不可避免地發生色像差(color aberration)(光線的曲折率係取決於光線的波長)。因此,當欲將波長不同的複數個雷射光重疊的雷射光照射至被加工物W時,某個波長的雷射光的照射位置與應該重疊至該雷射光的照射位置之其他波長的雷射光的照射位置會在被處理物上偏離。因為此種偏離,會產生無法獲得期望的雷射處理或者加工的結果之疑慮。因此,實際上調整用以使從第一振盪器2以及第二振盪器3輸出的第一雷射光L1以及第二雷射光L2通過之透鏡31以及/或者透鏡32的位置,藉此對合被重疊的第一雷射光L1的焦點以及第二雷射光L2的焦點。 On the contrary, as shown in (B) of FIG. 4 , the wider the relative distance D between the concave lens 41 and the convex lens 42, the shorter the focal distance F of the first laser light L1 and the second laser light L2 that have passed through the lenses 41, 42, and 43 of the focus shifter section 6. That is, the focal points of the first laser light L1 and the second laser light L2 are close to the lens 43 at the end of the focus shifter section 6. In addition, in the lenses 41, 42, and 43, color aberration inevitably occurs as a general physical law (the refractive index of light depends on the wavelength of the light). Therefore, when a laser beam with multiple laser beams of different wavelengths is to be superimposed on the workpiece W, the irradiation position of a certain wavelength laser beam and the irradiation position of other wavelength laser beams that should be superimposed on the irradiation position of the laser beam will deviate on the workpiece. Because of this deviation, there is a concern that the desired laser treatment or processing result cannot be obtained. Therefore, the position of the lens 31 and/or lens 32 through which the first laser beam L1 and the second laser beam L2 output from the first oscillator 2 and the second oscillator 3 pass is actually adjusted to match the focus of the superimposed first laser beam L1 and the focus of the second laser beam L2.

如圖3以及圖5所示,振鏡掃描器部8為已知的構件,用以經由伺服馬達、步進馬達(stepping motor)等之鏡子82、84的驅動機構使鏡子81、83轉動,鏡子81、83係用以反射從焦點偏移器部6而來的第一雷射光L1以及第二雷射光L2。總之,振鏡掃描器部8係能使鏡子81、83所反射的第一雷射光L1以及第二雷射光L2的光軸的朝向位移。本實施形態中的振鏡掃描器部8係具備:鏡子83、84,為X軸振鏡掃描器,用以使朝向被加工物W之第一雷射光L1以及第二雷射光L2的光軸沿著被加工物W上的X軸方向變化;以及鏡子81、82,為Y軸振鏡掃描器,用以使朝向被加工物W之第一雷射光L1以及第二雷射光L2的光軸沿著被加工物W上的Y軸方向變化;振鏡掃描器部8係對被加工物W朝XY二維方向掃描第一雷射光L1以及第二雷射光L2,藉此能二維地控制第一雷射光L1以及第二雷射光L2在被加工物W上的照射位置。As shown in FIG. 3 and FIG. 5 , the galvanometer scanner unit 8 is a known component, and is used to rotate the mirrors 81 and 83 through the driving mechanism of the mirrors 82 and 84 such as a servo motor and a stepping motor. The mirrors 81 and 83 are used to reflect the first laser light L1 and the second laser light L2 from the focus shifter unit 6. In short, the galvanometer scanner unit 8 can displace the directions of the optical axes of the first laser light L1 and the second laser light L2 reflected by the mirrors 81 and 83. The galvanometer scanner unit 8 in the present embodiment comprises: mirrors 83 and 84, which are X-axis galvanometer scanners for changing the optical axes of the first laser light L1 and the second laser light L2 toward the workpiece W along the X-axis direction on the workpiece W; and mirrors 81 and 82, which are Y-axis galvanometer scanners for changing the optical axes of the first laser light L1 and the second laser light L2 toward the workpiece W along the Y-axis direction on the workpiece W; the galvanometer scanner unit 8 scans the first laser light L1 and the second laser light L2 in the XY two-dimensional direction on the workpiece W, thereby two-dimensionally controlling the irradiation positions of the first laser light L1 and the second laser light L2 on the workpiece W.

作為本實施形態的混合式振鏡掃描器10的特徵,能例舉使焦點偏移器部6所為的焦點距離F的調節以及振鏡掃描器部8所為的光軸的朝向的位移同步。 經由振鏡掃描器部8的鏡子81、83之第一雷射光L1以及第二雷射光L2的光軸相對於被加工物W之角度θ愈接近垂直,則從鏡子83至被加工物W為止之光路徑長度愈短。因此,以第一雷射光L1以及第二雷射光L2的光軸相對於被加工物W之角度θ愈接近垂直(90°)則愈縮短焦點偏移器部6所體現的焦點距離F之方式同步控制焦點偏移器部6以及振鏡掃描器部8。 As a feature of the hybrid galvanometer scanner 10 of this embodiment, the adjustment of the focal distance F by the focus shifter unit 6 and the displacement of the direction of the optical axis by the galvanometer scanner unit 8 can be synchronized. The closer the angle θ of the optical axis of the first laser light L1 and the second laser light L2 through the mirrors 81 and 83 of the galvanometer scanner unit 8 to the workpiece W is to the vertical, the shorter the optical path length from the mirror 83 to the workpiece W is. Therefore, the focus shifter unit 6 and the galvanometer scanner unit 8 are synchronously controlled in such a way that the focal distance F embodied by the focus shifter unit 6 is shortened as the angle θ of the optical axis of the first laser light L1 and the second laser light L2 to the workpiece W is to the vertical (90°).

反之,經由振鏡掃描器部8的鏡子81、83之第一雷射光L1以及第二雷射光L2的光軸相對於被加工物W之角度θ愈從垂直傾斜,則從鏡子83至被加工物W為止之光路徑長度愈長。因此,以第一雷射光L1以及第二雷射光L2的光軸相對於被加工物W之角度θ愈傾斜(愈從90°遠離)則愈增長焦點偏移器部6所體現的焦點距離F之方式同步控制焦點偏移器部6以及振鏡掃描器部8。 藉由上文所說明的焦點偏移器部6的透鏡41、42以及振鏡掃描器部8的鏡子81、83的同步控制,能對被加工物W上的任意的部位照射第一雷射光L1以及第二雷射光L2,且能使第一雷射光L1以及第二雷射光L2的焦點正確地對合至被加工物W的期望的處理對象面。 On the contrary, the more the angle θ of the optical axis of the first laser light L1 and the second laser light L2 passing through the mirrors 81 and 83 of the galvanometer scanner unit 8 relative to the workpiece W is tilted from the vertical, the longer the optical path length from the mirror 83 to the workpiece W is. Therefore, the focus shifter unit 6 and the galvanometer scanner unit 8 are synchronously controlled in such a way that the more the angle θ of the optical axis of the first laser light L1 and the second laser light L2 relative to the workpiece W is tilted (the farther it is from 90°), the longer the focal distance F embodied by the focus shifter unit 6 is. By synchronously controlling the lenses 41 and 42 of the focus shifter unit 6 and the mirrors 81 and 83 of the galvanometer scanner unit 8 described above, the first laser light L1 and the second laser light L2 can be irradiated to any part of the workpiece W, and the focus of the first laser light L1 and the second laser light L2 can be accurately aligned with the desired processing target surface of the workpiece W.

期望於振鏡掃描器部8的鏡子81、83與被加工物W之間不存在有用以使第一雷射光L1以及第二雷射光L2通過之透鏡(fθ透鏡等)。如此,能確實地避免已藉由振鏡掃描器部8被操作了光軸的方向之第一雷射光L1以及第二雷射光L2通過透鏡時所產生的色像差的問題。亦即,變成不會於某個波長的第一雷射光L1碰觸至被加工物W之位置與已經重疊至該位置的第二雷射光L2碰觸至被加工物W之位置之間產生偏離。因此,能獲得期望的雷射處理或者加工的結果。 然而,只要發生的色像差僅為能無視各個第一雷射光L1以及第二雷射光L2的照射位置的偏離之程度,則不會妨礙於振鏡掃描器部8的鏡子81、83與被加工物W之間存在用以使第一雷射光L1以及第二雷射光L2穿透之某種透鏡。 It is expected that there is no lens (fθ lens, etc.) between the mirrors 81 and 83 of the galvanometer scanner unit 8 and the workpiece W that is useful for passing the first laser light L1 and the second laser light L2. In this way, the problem of chromatic aberration generated when the first laser light L1 and the second laser light L2, which have been manipulated in the direction of the optical axis by the galvanometer scanner unit 8, pass through the lens can be reliably avoided. That is, there will be no deviation between the position where the first laser light L1 of a certain wavelength hits the workpiece W and the position where the second laser light L2 that has overlapped with the position hits the workpiece W. Therefore, the desired laser processing or processing result can be obtained. However, as long as the chromatic aberration is only to the extent that the deviation of the irradiation position of each of the first laser light L1 and the second laser light L2 can be ignored, it will not hinder the existence of a certain lens between the mirrors 81, 83 of the galvanometer scanner unit 8 and the workpiece W for allowing the first laser light L1 and the second laser light L2 to pass through.

此外,本實施形態中所使用的混合式振鏡掃描器並未限定於上文所說明的構成。屬於焦點偏移器部6的要素之雙凹透鏡41、準直透鏡42以及聚光透鏡43一般來說係位於屬於合成器部4的要素之鏡子33、34的下游,然而這些屬於光學要素的鏡子33、34、透鏡41、42、 43的排列並未限定於圖3所示的排列。 圖6係顯示屬於變化例的混合式振鏡掃描器10a。混合式振鏡掃描器10a係於從第一振盪器2輸出的第一雷射光L1的光軸以及從第二振盪器3輸出的第二雷射光L2的光軸各者上排列有雙凹透鏡41以及準直透鏡42。總之,雙凹透鏡41以及準直透鏡42係各存在兩片。 In addition, the hybrid galvanometer scanner used in this embodiment is not limited to the structure described above. The biconcave lens 41, the collimating lens 42, and the focusing lens 43 belonging to the focus shifter section 6 are generally located downstream of the mirrors 33 and 34 belonging to the synthesizer section 4, but the arrangement of the mirrors 33, 34, lenses 41, 42, and 43 belonging to these optical elements is not limited to the arrangement shown in FIG. 3. FIG. 6 shows a hybrid galvanometer scanner 10a belonging to a variation. The hybrid oscillator scanner 10a has a biconcave lens 41 and a collimating lens 42 arranged on the optical axis of the first laser light L1 output from the first oscillator 2 and the optical axis of the second laser light L2 output from the second oscillator 3. In short, there are two biconcave lenses 41 and two collimating lenses 42.

而且,將已經通過雙凹透鏡41以及準直透鏡42的第一雷射光L1以及第二雷射光L2經由屬於合成器部4的要素之鏡子33、34彼此重疊後,通過聚光透鏡43後最終被聚光並輸入至振鏡掃描器部8。 圖6所示的混合式振鏡掃描器10a亦與圖3的混合式振鏡掃描器10同樣地,能夠調整沿著凹透鏡41與凸透鏡42之間的第一雷射光L1以及第二雷射光L2的光軸之相對距離D。因此,能夠使線性馬達台車之類的適合的驅動機構支撐各個第一雷射光L1以及第二雷射光L2的光軸上的凹透鏡41以及/或者凸透鏡42中的至少一者並能夠沿著光軸方向進退移動。 例如,以單軸同時地控制存在於第一雷射光L1的光軸上之凹透鏡41以及存在於第二雷射光L2的光軸上之凹透鏡41,且這些凹透鏡41皆能沿著光軸方向進退。沿著分別存在於第一雷射光L1的光軸以及第二雷射光L2的光軸上之凸透鏡42的光軸方向之位置係預先配合第一雷射光L1以及第二雷射光L2的波長進行調整。 Furthermore, the first laser light L1 and the second laser light L2 that have passed through the double concave lens 41 and the collimating lens 42 are overlapped with each other through the mirrors 33 and 34 that are elements of the synthesizer unit 4, and finally are focused through the focusing lens 43 and input to the galvanometer scanner unit 8. The hybrid galvanometer scanner 10a shown in FIG6 is also capable of adjusting the relative distance D between the optical axes of the first laser light L1 and the second laser light L2 between the concave lens 41 and the convex lens 42, similarly to the hybrid galvanometer scanner 10 in FIG3. Therefore, a suitable driving mechanism such as a linear motor carriage can support at least one of the concave lens 41 and/or convex lens 42 on the optical axis of each of the first laser light L1 and the second laser light L2 and can move forward and backward along the optical axis. For example, the concave lens 41 on the optical axis of the first laser light L1 and the concave lens 41 on the optical axis of the second laser light L2 are controlled simultaneously with a single axis, and these concave lenses 41 can move forward and backward along the optical axis. The position of the convex lens 42 on the optical axis of the first laser light L1 and the optical axis of the second laser light L2 is pre-adjusted in accordance with the wavelength of the first laser light L1 and the second laser light L2.

上文所說明的相對距離D的調整,換言之亦可使焦點偏移器部6所為的焦點距離F的調節以及振鏡掃描器部8所為的光軸的朝向的位移同步。 在圖3所示的例子中,藉由合成器部4的鏡子33、34將波長彼此不同的第一雷射光L1以及第二雷射光L2重疊後,以焦點偏移器部6的透鏡41、42、43來調節第一雷射光L1以及第二雷射光L2的焦點距離。相對於此,在圖6所示的變化例中,藉由焦點偏移器部6的透鏡41、42調節各個第一雷射光L1以及第二雷射光L2的焦點距離後,藉由合成器部4的鏡子33、34將第一雷射光L1以及第二雷射光L2重疊。藉此,能良好地避免透鏡41、42中的色像差的發生,且能使用振鏡掃描器部8更精密度佳地將第一雷射光L1以及第二雷射光L2照射至被加工物W上的期望的照射位置。 The adjustment of the relative distance D described above, in other words, can also synchronize the adjustment of the focal distance F by the focus shifter unit 6 and the displacement of the direction of the optical axis by the galvanometer scanner unit 8. In the example shown in FIG. 3 , after the first laser light L1 and the second laser light L2 of different wavelengths are overlapped by the mirrors 33 and 34 of the synthesizer unit 4, the focal distances of the first laser light L1 and the second laser light L2 are adjusted by the lenses 41, 42, and 43 of the focus shifter unit 6. In contrast, in the variation shown in FIG6 , after adjusting the focal distances of the first laser light L1 and the second laser light L2 by the lenses 41 and 42 of the focus shifter unit 6, the first laser light L1 and the second laser light L2 are overlapped by the lenses 33 and 34 of the synthesizer unit 4. Thus, the occurrence of chromatic aberration in the lenses 41 and 42 can be well avoided, and the first laser light L1 and the second laser light L2 can be irradiated to the desired irradiation position on the workpiece W with better precision using the galvanometer scanner unit 8.

作為進一步的變化例,於圖7顯示混合式振鏡掃描器10b。在此種變化例中,於從第一振盪器2輸出的第一雷射光L1的光軸以及從第二振盪器3輸出的第二雷射光L2的光軸各者上排列有雙凹透鏡41、準直透鏡42以及聚光透鏡43。總之,雙凹透鏡41、準直透鏡42以及聚光透鏡43係各存在兩片。 而且,將已經通過雙凹透鏡41、準直透鏡42以及聚光透鏡43的第一雷射光L1以及第二雷射光L2經由屬於合成器部4的要素之鏡子33、34彼此重疊後,輸入至振鏡掃描器部8。 As a further variation, a hybrid galvanometer scanner 10b is shown in FIG7. In this variation, a biconcave lens 41, a collimating lens 42, and a focusing lens 43 are arranged on the optical axis of the first laser light L1 output from the first oscillator 2 and the optical axis of the second laser light L2 output from the second oscillator 3. In short, there are two biconcave lenses 41, collimating lenses 42, and focusing lenses 43. Furthermore, the first laser light L1 and the second laser light L2 that have passed through the biconcave lens 41, the collimating lens 42, and the focusing lens 43 are overlapped with each other through the mirrors 33 and 34 that are elements of the synthesizer unit 4, and then input to the galvanometer scanner unit 8.

圖7所示的混合式振鏡掃描器10b亦與圖3的混合式振鏡掃描器10同樣地,能夠調整沿著凹透鏡41與凸透鏡42之間的第一雷射光L1以及第二雷射光L2的光軸之相對距離D。因此,能夠使線性馬達台車之類的適合的驅動機構支撐各個第一雷射光L1以及第二雷射光L2的光軸上的凹透鏡41以及/或者凸透鏡42中的至少一者並能夠沿著光軸方向進退移動。 例如,以單軸同時地控制存在於第一雷射光L1的光軸上之凹透鏡41以及存在於第二雷射光L2的光軸上之凹透鏡41,且這些凹透鏡41皆能沿著光軸方向進退。沿著分別存在於第一雷射光L1的光軸以及第二雷射光L2的光軸上之凸透鏡42的光軸方向之位置係預先配合第一雷射光L1以及第二雷射光L2的波長進行調整。 The hybrid galvanometer scanner 10b shown in FIG7 is also capable of adjusting the relative distance D between the concave lens 41 and the convex lens 42 along the optical axis of the first laser light L1 and the second laser light L2, similarly to the hybrid galvanometer scanner 10 in FIG3. Therefore, a suitable driving mechanism such as a linear motor carriage can support at least one of the concave lens 41 and/or the convex lens 42 on the optical axis of each of the first laser light L1 and the second laser light L2 and can move forward and backward along the optical axis. For example, the concave lens 41 on the optical axis of the first laser light L1 and the concave lens 41 on the optical axis of the second laser light L2 are controlled simultaneously with a single axis, and these concave lenses 41 can move forward and backward along the optical axis. The positions of the convex lens 42 on the optical axis of the first laser light L1 and the optical axis of the second laser light L2 are pre-adjusted in accordance with the wavelengths of the first laser light L1 and the second laser light L2.

上文所說明的相對距離D的調整,換言之亦可使焦點偏移器部6所為的焦點距離F的調節以及振鏡掃描器部8所為的光軸的朝向的位移同步。 在圖7所示的變化例中,藉由焦點偏移器部6的透鏡41、42、43來調節各個第一雷射光L1以及第二雷射光L2的焦點距離後,藉由合成器部4的鏡子33、34將這些第一雷射光L1以及第二雷射光L2重疊。藉此,能良好地避免透鏡41、42、43中的色像差的發生,且能使用振鏡掃描器部8更精密度佳地將第一雷射光L1以及第二雷射光L2照射至被加工物W上的期望的照射位置。 The adjustment of the relative distance D described above, in other words, can also synchronize the adjustment of the focal distance F by the focus shifter unit 6 and the displacement of the direction of the optical axis by the galvanometer scanner unit 8. In the variation shown in FIG. 7 , after adjusting the focal distances of the first laser light L1 and the second laser light L2 by the lenses 41, 42, and 43 of the focus shifter unit 6, the first laser light L1 and the second laser light L2 are overlapped by the lenses 33 and 34 of the synthesizer unit 4. In this way, the occurrence of chromatic aberration in the lenses 41, 42, and 43 can be well avoided, and the galvanometer scanner unit 8 can be used to irradiate the first laser light L1 and the second laser light L2 to the desired irradiation position on the workpiece W with better precision.

(4)被加工物W的說明 接著,使用圖8至圖10說明熔接對象的被加工物W。圖8係顯示電動車等的馬達中之屬於固定子之定子50的概略構成之立體圖。如圖8所示,定子50係具有略圓筒形狀的定子芯51以及複數個扁平線(分段線圈)52。扁平線52為剖面呈矩形狀的導體(電線)。通常,扁平線52係使用純銅製的構件,然而亦可由具有高導電率的金屬材料所構成,例如以銅作為主成分之合金、由銅以及鋁所構成的合金等。各個扁平線52的端部係從定子芯51的上端部突出;雷射加工裝置1係將與定子芯51的徑方向鄰接之兩個扁平線52的端部彼此予以雷射熔接。 (4) Description of the workpiece W Next, the workpiece W to be welded is described using FIGS. 8 to 10. FIG. 8 is a perspective view showing the schematic structure of a stator 50 belonging to a stator in a motor of an electric vehicle or the like. As shown in FIG. 8 , the stator 50 has a stator core 51 having a substantially cylindrical shape and a plurality of flat wires (segmented coils) 52. The flat wires 52 are conductors (wires) having a rectangular cross-section. Usually, the flat wires 52 are components made of pure copper, but they may also be made of a metal material having a high electrical conductivity, such as an alloy having copper as a main component, an alloy consisting of copper and aluminum, etc. The end of each flat wire 52 protrudes from the upper end of the stator core 51; the laser processing device 1 laser welds the ends of two flat wires 52 that are radially adjacent to the stator core 51 to each other.

在扁平線52的前端熔接加工中,剝離前端側的絕緣被覆部,將對應的兩個扁平線的前端對接。接著,朝向對接後的端面照射雷射光。此時會有下述情形:因為各個扁平線的加工精密度的偏差、固定治具15的機構精密度、朝向溝槽54的插入狀況等,於兩個扁平線的前端的對接時產生間距(gap)(間隙、空隙)、位置偏離。 在圖9中的(a)的例子中,於兩個扁平線52之間空出間隙。在圖9中的(b)的例子中,兩個扁平線52係朝y軸方向偏離。在圖9中的(c)的例子中,兩個扁平線52係於x軸方向空出間隙且朝y軸方向偏離,且朝θ方向旋轉。 In the front end welding process of the flat wire 52, the insulating coating on the front end side is peeled off, and the front ends of the two corresponding flat wires are butted. Then, laser light is irradiated toward the butted end faces. At this time, the following situation may occur: due to the deviation of the processing precision of each flat wire, the mechanical precision of the fixing jig 15, the insertion condition toward the groove 54, etc., a gap (gap, space) and position deviation are generated when the front ends of the two flat wires are butted. In the example of (a) in Figure 9, a gap is left between the two flat wires 52. In the example of (b) in Figure 9, the two flat wires 52 are deviated in the y-axis direction. In the example of (c) in Figure 9, the two flat wires 52 are spaced in the x-axis direction and deviated in the y-axis direction, and rotated in the θ direction.

當於對應的兩個扁平線52之間存在間距(間隙、空隙)、大的位置偏離時會有下述情形:從間隙、偏離的部位產生雷射洩漏,雷射光照射至扁平線下部的被覆部從而產生碳化以及絕緣不良。此外,即使在雖然存在y軸方向的位置偏離但不產生雷射洩漏之情形中,若不針對位置偏離考量對策地跨越兩個扁平線52照射雷射光,則亦會有熔融部偏掉、傾斜從而導致熔接強度降低之問題。 此外,如圖10所示,會有在兩個扁平線52的前端的對接時因為高度方向(z方向)的偏離導致產生段差Δz之情形。此外,因為絕緣被覆部的厚度產生若干的間距(間隙、空隙)Δxy。以下,將兩個扁平線52中的z方向的段差量記載成Δz,將xy平面內的間距量記載成Δxy。 When there is a gap (gap, void) or a large positional deviation between the two corresponding flat wires 52, the following situation may occur: laser leakage occurs from the gap or the deviated part, and the laser light is irradiated to the coating part at the bottom of the flat wire, thereby causing carbonization and poor insulation. In addition, even in the case where there is a positional deviation in the y-axis direction but no laser leakage occurs, if the laser light is irradiated across the two flat wires 52 without considering the countermeasures for the positional deviation, there will be a problem that the molten part deviates and tilts, thereby reducing the welding strength. In addition, as shown in Figure 10, when the front ends of the two flat wires 52 are connected, a step difference Δz may occur due to the deviation in the height direction (z direction). In addition, a certain gap (gap, void) Δxy is generated due to the thickness of the insulating coating part. In the following, the step difference between the two flat wires 52 in the z direction is recorded as Δz, and the distance in the xy plane is recorded as Δxy.

如此,在於對應的扁平線彼此產生z軸方向的段差之情形中,當雷射光橫越該段差時,會有發生大量的濺射之情形。此外,當不考慮段差地跨越左右的扁平線均等地掃描雷射光時,熔融部的高度會左右不同而破壞平衡,且熔接強度會降低。 因此,本實施形態的雷射加工裝置1係即使在於對應的兩個扁平線52之間產生間距、位置偏離、z軸方向的段差之情形中亦實施熔接加工,該熔接加工係用以抑制產生雷射洩漏以及熔接強度降低。 In this way, when the corresponding flat wires have a step difference in the z-axis direction, a large amount of spattering may occur when the laser light crosses the step difference. In addition, when the laser light is scanned equally across the left and right flat wires without considering the step difference, the height of the molten part will be different on the left and right, destroying the balance, and the welding strength will be reduced. Therefore, the laser processing device 1 of this embodiment performs welding processing even when there is a gap, position deviation, or a step difference in the z-axis direction between the two corresponding flat wires 52. The welding processing is used to suppress the occurrence of laser leakage and the reduction of welding strength.

(5)針對圖像處理部9 在定子線圈的熔接中,為了對數毫米的扁平線適當地照射雷射,需要正確地測定扁平線的位置。因此,在雷射加工裝置1中,藉由圖像處理部9所為的圖像解析來計測相對於複數個扁平線52的前端之中心位置以及高度。此外,在藉由圖像解析進行中心位置的測定之情形中,當扁平線彼此接近或者抵接時,邊界線變得不明確,難以精密度佳地判定各個扁平線的位置。因此,即使在扁平線彼此接近或者抵接之情形中,本實施形態的圖像處理部9亦能夠精密度佳地測定各個扁平線52的中心位置。以下,詳細地說明測定方法。 (5) Regarding the image processing unit 9 In the welding of the stator coil, in order to properly irradiate the laser on the flat wire of several millimeters, it is necessary to accurately measure the position of the flat wire. Therefore, in the laser processing device 1, the center position and height relative to the front end of the plurality of flat wires 52 are measured by image analysis performed by the image processing unit 9. In addition, when the center position is measured by image analysis, when the flat wires are close to or abutting each other, the boundary line becomes unclear, and it is difficult to accurately determine the position of each flat wire. Therefore, even in the case where the flat wires are close to or abutting each other, the image processing unit 9 of this embodiment can accurately measure the center position of each flat wire 52. The following is a detailed description of the measurement method.

如圖11所示,圖像處理部9係包含:照明裝置101,係對被加工物W照射照明光;拍攝裝置102,係拍攝被照明裝置101照射的狀態下的被加工物W;以及控制器103,係使用被拍攝裝置102拍攝的圖像資料,進行被加工物W所含有的各個扁平線52的中心位置以及高度的測定。 照明裝置101以及拍攝裝置102為適合圖案投影法的照明裝置以及三維攝影機;照明裝置101係從不同的複數個方向將複數個條紋(stripe)圖案(條狀模樣)投光至被加工物W,拍攝裝置102係以CMOS(Complementary Metal-Oxide Semiconductor;互補式金屬氧化物半導體)等圖像感測器接收被加工物W的反射光。控制器103係解析投光與反射光之間的圖案的變化,藉此生成三維圖像。 As shown in FIG. 11 , the image processing unit 9 includes: an illumination device 101 for irradiating illumination light to the workpiece W; a camera 102 for photographing the workpiece W under the illumination of the illumination device 101; and a controller 103 for measuring the center position and height of each flat line 52 contained in the workpiece W using the image data photographed by the camera 102. The illumination device 101 and the camera 102 are illumination devices and three-dimensional cameras suitable for pattern projection method; the illumination device 101 projects a plurality of stripe patterns (strip-shaped patterns) onto the workpiece W from a plurality of different directions, and the camera 102 receives the reflected light of the workpiece W using an image sensor such as a CMOS (Complementary Metal-Oxide Semiconductor). The controller 103 analyzes the changes in the pattern between the projected light and the reflected light to generate a three-dimensional image.

如圖11所示,控制器103係包含記憶體104以及處理器105。於記憶體104預先記憶有測定程式111以及臨限值112。臨限值112亦可包含於測定程式111的內部。此外,記憶體104係記憶藉由處理器105所生成的座標表113。處理器105係執行測定程式111,藉此進行被加工物W所含有的全部的扁平線52的中心位置以及高度的測定,並生成座標表113(CSV(comma separated values;逗號分隔值)資料)。As shown in FIG11 , the controller 103 includes a memory 104 and a processor 105. A measurement program 111 and a critical value 112 are pre-stored in the memory 104. The critical value 112 may also be included in the measurement program 111. In addition, the memory 104 stores a coordinate table 113 generated by the processor 105. The processor 105 executes the measurement program 111 to measure the center position and height of all the flat wires 52 contained in the workpiece W, and generates a coordinate table 113 (CSV (comma separated values) data).

在此,使用圖12以及圖13說明控制器103所測定的中心位置以及高度。在圖12的例子中,兩個扁平線52係於x軸方向、y軸方向以及θ方向偏離。在圖13的例子中,以兩個扁平線52於x軸方向偏離且存在z軸方向的段差之情形作為例子來說明。 此外,為了方便說明,將一方的扁平線52記載成「A銷」,將另一方的扁平線52記載成「B銷」。 控制器103係針對A銷測定熔接面52a的中心的座標(x,y,z,θ)。將此座標記載成「A銷座標」。同樣地,亦針對B銷測定熔接面52a的中心的座標(x,y,z,θ)。將此座標記載成「B銷座標」。此外,控制器103係算出A銷與B銷之間的中間點的座標(x,y,z,θ)。將此座標記載成「AB銷座標」。在此,作為一例,將xyz正交座標系統的原點(基準點)作為載置有被加工物W之工件設置台11的上表面的中心點。此外,θ係作為xy平面上繞著z軸的角度。此外,θ亦可藉由圖像處理來測定,然而只要屬於熔接對象的定子50的構造為已知,則亦可使用從定子50的構造導出的值來取代圖像處理所為的測定。 Here, the center position and height measured by the controller 103 are explained using FIG. 12 and FIG. 13. In the example of FIG. 12, the two flat wires 52 are deviated in the x-axis direction, the y-axis direction, and the θ direction. In the example of FIG. 13, the case where the two flat wires 52 are deviated in the x-axis direction and there is a step difference in the z-axis direction is used as an example for explanation. In addition, for the convenience of explanation, one flat wire 52 is recorded as "A pin" and the other flat wire 52 is recorded as "B pin". The controller 103 measures the coordinates (x, y, z, θ) of the center of the welding surface 52a for the A pin. These coordinates are recorded as "A pin coordinates". Similarly, the coordinates (x, y, z, θ) of the center of the welding surface 52a are also measured for the B pin. These coordinates are recorded as "B pin coordinates". In addition, the controller 103 calculates the coordinates (x, y, z, θ) of the middle point between the A pin and the B pin. This coordinate is recorded as "AB pin coordinates". Here, as an example, the origin (reference point) of the xyz orthogonal coordinate system is set as the center point of the upper surface of the workpiece setting table 11 on which the workpiece W is placed. In addition, θ is the angle around the z axis on the xy plane. In addition, θ can also be measured by image processing, but as long as the structure of the stator 50 that is the object of welding is known, the value derived from the structure of the stator 50 can also be used instead of the measurement by image processing.

控制器103係針對定子50所含有的全部的扁平線52,對成為熔接對象的每一對測定各個扁平線的座標值與中心點的座標值。並且,記載成用以顯示測定結果之座標表113,並將座標表113儲存於記憶體104。 (6)針對控制個人電腦12 如圖14所示,控制個人電腦12係由控制部201、記憶部202、輸入部203、通訊部204以及顯示部205所構成。 具體而言,控制個人電腦12為電腦系統,具備下述硬體資源:CPU(Central Processing Unit;中央處理單元)、ROM(Read Only Memory;唯讀記憶體)、RAM(Random Access Memory;隨機存取記憶體)、HDD(Hard Disk Drive;硬碟驅動機)、SSD(Solid State Drive;固態硬碟)、顯示器單元、通訊介面、鍵盤以及滑鼠等輸入器件(input device)等。在使用了振鏡掃描器的熔接加工中,亦將控制個人電腦稱為「振鏡掃描器個人電腦」。 The controller 103 measures the coordinate values of each flat wire and the coordinate value of the center point for each pair of flat wires 52 to be welded. The coordinate table 113 is recorded to display the measurement results, and the coordinate table 113 is stored in the memory 104. (6) Controlling the personal computer 12 As shown in FIG. 14 , the controlling personal computer 12 is composed of a control unit 201, a memory unit 202, an input unit 203, a communication unit 204, and a display unit 205. Specifically, the control personal computer 12 is a computer system having the following hardware resources: CPU (Central Processing Unit), ROM (Read Only Memory), RAM (Random Access Memory), HDD (Hard Disk Drive), SSD (Solid State Drive), display unit, communication interface, keyboard, mouse and other input devices. In the welding process using a galvanometer scanner, the control personal computer is also called a "galvanometer scanner personal computer".

控制部201係由CPU以及屬於作業用記憶體之RAM等所構成。 記憶部202為所謂的輔助記憶器件,由HDD、SSD、ROM、快閃記憶體等非揮發性記憶體所構成。 於記憶部202記憶有各種資料,如用以控制雷射加工裝置1之電腦程式、經由輸入部203所輸入的各種雷射參數、在熔接加工中所使用的加工圖形資料110等。 控制部201係將儲存於記憶部202的電腦程式裝載至屬於作業用記憶體之RAM並執行該電腦程式,藉此控制第一振盪器2、第二振盪器3、混合式振鏡掃描器10、PLC13、雷射控制器14等,並進行被加工物W的熔接處理。此外,記憶部202所記憶的雷射參數為在第一振盪器2以及第二振盪器3中使用的雷射輸出、加工速率(雷射照射時間)、標記速度、減緩(slow up)時間、減速(slow down)時間等。 The control unit 201 is composed of a CPU and a RAM belonging to a working memory. The memory unit 202 is a so-called auxiliary memory device, which is composed of a non-volatile memory such as an HDD, an SSD, a ROM, a flash memory, etc. The memory unit 202 stores various data, such as a computer program for controlling the laser processing device 1, various laser parameters input through the input unit 203, and processing graphic data 110 used in welding processing. The control unit 201 loads the computer program stored in the memory unit 202 into the RAM belonging to the working memory and executes the computer program, thereby controlling the first oscillator 2, the second oscillator 3, the hybrid galvanometer scanner 10, the PLC 13, the laser controller 14, etc., and performs the welding process of the workpiece W. In addition, the laser parameters stored in the memory unit 202 are the laser output used in the first oscillator 2 and the second oscillator 3, the processing rate (laser irradiation time), the marking speed, the slow up time, the slow down time, etc.

輸入部203係包含鍵盤、滑鼠、各種開關等之用以受理使用者的操作之輸入器件,亦包含藉由連接USB(Universal Serial Bus;通用序列匯流排)記憶體、SD記憶體卡(secure digital memory card;安全數位記憶體卡)等之可移動的記錄媒體來輸入資料之方式。經由輸入部203所輸入的資料係被儲存於記憶部202。 通訊部204係在與藉由無線或者有線而連接的外部機器(圖像處理部9、混合式振鏡掃描器10、PLC13、雷射控制器14等)之間進行資訊通訊。 顯示部205係包含顯示器單元、視訊編碼解碼器(video codec)、GPU(Graphics Processing Unit;圖形處理單元)、畫面資料用的記憶體等,用以生成UI(User Interface;使用者介面)畫面等並顯示於顯示器單元。使用者亦可在於顯示部205顯示有UI畫面的狀態下經由輸入部203對輸入用以指示雷射控制器14之各種參數等。 The input unit 203 includes input devices such as keyboards, mice, and various switches for accepting user operations, and also includes a method of inputting data by connecting to removable recording media such as USB (Universal Serial Bus) memory and SD memory card (secure digital memory card). The data input through the input unit 203 is stored in the memory unit 202. The communication unit 204 communicates with external devices (image processing unit 9, hybrid galvanometer scanner 10, PLC 13, laser controller 14, etc.) connected by wireless or wired communication. The display unit 205 includes a display unit, a video codec, a GPU (Graphics Processing Unit), a memory for image data, etc., which is used to generate a UI (User Interface) screen and display it on the display unit. The user can also input various parameters for instructing the laser controller 14 through the input unit 203 when the UI screen is displayed on the display unit 205.

(7)雷射加工處理的整體動作 接著,參照圖15說明雷射加工裝置1的動作。 首先,將被加工物W設置於工件設置台11(步驟S11)。控制個人電腦12係經由雷射控制器14對第一振盪器2以及第二振盪器3設定雷射參數(雷射輸出、減緩時間、減速時間等)(步驟S12)。使用者係操作控制個人電腦12的輸入部203來輸入加工圖形資料110,控制個人電腦12係將加工圖形資料110登錄至記憶部202(步驟S13)。圖16係顯示使用者輸入雷射參數、加工圖形資料時屬於UI畫面的一例之登錄畫面150。登錄畫面150為UI畫面,用以登錄在第一振盪器2以及第二振盪器3中所使用的雷射參數以及在後述的第三步驟的雷射照射時在混合式振鏡掃描器10中所使用的加工圖形資料。 (7) Overall operation of laser processing Next, the operation of the laser processing device 1 is described with reference to FIG. 15 . First, the workpiece W is placed on the workpiece setting table 11 (step S11). The control personal computer 12 sets the laser parameters (laser output, deceleration time, deceleration time, etc.) for the first oscillator 2 and the second oscillator 3 via the laser controller 14 (step S12). The user operates the input unit 203 of the control personal computer 12 to input the processing graphic data 110, and the control personal computer 12 logs the processing graphic data 110 into the memory unit 202 (step S13). FIG. 16 shows a login screen 150 as an example of a UI screen when the user inputs the laser parameters and processing graphic data. The login screen 150 is a UI screen for logging in the laser parameters used in the first oscillator 2 and the second oscillator 3 and the processing graphic data used in the hybrid galvanometer scanner 10 during the laser irradiation in the third step described later.

作為一例,登錄畫面150係包含工作列表(job list)151、加工點列表152、加工影像(processing image)153、雷射參數輸入部154以及登錄按鍵155。例如,當在工作列表151中選擇「直線」且於加工點列表152追加加工點的xy座標值時,於加工影像153顯示有以直線將各個加工點連繫的圖形。當在此種狀態下使用者選擇登錄按鍵155時,顯示於加工影像153之加工圖形資料110係被登錄至記憶部102。此外,所謂加工圖形資料110為混合式振鏡掃描器10依照加工影像153掃描雷射光所需的資訊。 在此,在本實施形態中,對存在間距、位置偏離之兩個扁平線52進行由第一步驟、第二步驟以及第三步驟所構成的三個步驟的雷射照射,藉此進行熔接加工。 As an example, the login screen 150 includes a job list 151, a processing point list 152, a processing image 153, a laser parameter input unit 154, and a login button 155. For example, when "straight line" is selected in the job list 151 and the xy coordinate value of the processing point is added in the processing point list 152, a graphic connecting each processing point with a straight line is displayed in the processing image 153. When the user selects the login button 155 in this state, the processing graphic data 110 displayed in the processing image 153 is registered in the memory unit 102. In addition, the so-called processing graphic data 110 is the information required for the hybrid galvanometer scanner 10 to scan the laser light according to the processing image 153. Here, in this embodiment, two flat wires 52 with a gap and position deviation are subjected to laser irradiation in three steps consisting of a first step, a second step, and a third step, thereby performing a welding process.

步驟S11、步驟S12以及步驟S13的處理並不一定需要以此種順序進行。 使載置有被加工物W的工件設置台11移動,使被加工物W配置於圖像處理部9的正下方(步驟S14)。接著,藉由圖像處理部9進行被加工物W的圖像拍攝(步驟S13)。具體而言,照明裝置101係藉由圖案投影法從不同的複數個方向將複數個條紋圖案(條狀模樣)投光至被加工物W,並藉由拍攝裝置102拍攝各個圖像,且控制器103係將所拍攝的各個圖像予以合成並算出三維形狀(步驟S14)。 The processing of step S11, step S12 and step S13 does not necessarily need to be performed in this order. The workpiece setting table 11 carrying the workpiece W is moved so that the workpiece W is arranged directly below the image processing unit 9 (step S14). Then, the image processing unit 9 takes an image of the workpiece W (step S13). Specifically, the lighting device 101 projects a plurality of stripe patterns (strip patterns) onto the workpiece W from a plurality of different directions by a pattern projection method, and each image is taken by the shooting device 102, and the controller 103 synthesizes each of the taken images and calculates a three-dimensional shape (step S14).

接著,圖像處理部9的控制器103係進行各個扁平線52的中心位置以及高度的測定處理(步驟S17),並生成記載了測定結果的CSV資料(座標表113)。圖像處理部9係將記載了測定結果的CSV資料(座標表113)朝控制個人電腦12發送(步驟S18)。從圖像處理部9朝控制個人電腦12發送CSV資料係可經由無線或者有線的網路來發送,亦可經由USB記憶體或者SD記憶體卡等之可移動的記錄媒體來發送。Next, the controller 103 of the image processing unit 9 performs the measurement processing of the center position and height of each flat wire 52 (step S17), and generates CSV data (coordinate table 113) recording the measurement results. The image processing unit 9 sends the CSV data (coordinate table 113) recording the measurement results to the control personal computer 12 (step S18). The CSV data can be sent from the image processing unit 9 to the control personal computer 12 via a wireless or wired network, or via a removable recording medium such as a USB memory or an SD memory card.

接著,控制個人電腦12係進行雷射加工處理(步驟S19)。在本實施形態中,設想混合式振鏡掃描器10的掃描可動範圍涵蓋整個被加工物W的大小之情形。然而,在進行比振鏡掃描的掃描運作範圍還大的馬達的熔接加工之情形中,雷射加工裝置1亦可一邊藉由工件設置台11的θ軸台11θ使被加工物W旋轉一邊進行熔接加工。根據馬達的大小,有一邊每次旋轉四分之一一邊進行熔接加工之方式,亦有一邊每次旋轉八分之一一邊進行熔接加工之方式。Next, the control personal computer 12 performs laser processing (step S19). In the present embodiment, it is assumed that the scanning movable range of the hybrid galvanometer scanner 10 covers the entire size of the workpiece W. However, in the case of welding processing of a motor larger than the scanning operation range of the galvanometer scanning, the laser processing device 1 can also perform welding processing while rotating the workpiece W by the θ-axis table 11θ of the workpiece setting table 11. Depending on the size of the motor, there is a method of performing welding processing while rotating a quarter of the motor at a time, and there is also a method of performing welding processing while rotating a eighth of the motor at a time.

(8)測定處理的動作 在此,說明藉由圖像處理部9所進行的測定處理的動作以作為熔接加工的先前準備。圖17以及圖18為顯示圖像處理部9所為的測定處理的動作之流程圖,且為圖15中的步驟S17的詳細說明。實際上,藉由處理器105執行記憶於控制器103的記憶體104的測定程式111而動作。 圖像處理部9係針對被加工物W的每個測定範圍反復步驟S21至步驟S36。在本實施形態中,作為測定範圍的一例,如圖19所示,將於定子50的徑方向排列的複數個扁平線52(在此例子中為四個扁平線52)作為一個測定範圍。 (8) Measurement Processing Operation Here, the measurement processing operation performed by the image processing unit 9 as a preliminary preparation for welding processing is described. FIG. 17 and FIG. 18 are flowcharts showing the measurement processing operation performed by the image processing unit 9 and are detailed descriptions of step S17 in FIG. 15 . In practice, the measurement processing operation is performed by the processor 105 executing the measurement program 111 stored in the memory 104 of the controller 103. The image processing unit 9 repeats steps S21 to S36 for each measurement range of the workpiece W. In this embodiment, as an example of a measurement range, as shown in FIG. 19 , a plurality of flat wires 52 (four flat wires 52 in this example) arranged in the radial direction of the stator 50 are used as one measurement range.

圖像處理部9係進行第一二進制大型物件解析處理(步驟S22)。二進制大型物件解析為圖像解析的一種,用以對成為對象的圖像資料所含有的每個像素進行二值化處理,並使用二值化處理後的圖像資料進行各種解析、測定。如圖20所示,第一二進制大型物件解析處理係針對以xy平面57切斷測定範圍所含有的扁平線52時的剖面形狀進行二值化處理。 xy平面57係能夠設定成任意的高度,然而由於朝向扁平線52的端面進行雷射照射,因此需要將xy平面57設定於至少已經剝離了絕緣被覆膜58之前端側。接著,圖像處理部9係如圖19所示將扁平線52標籤化(編號化)。作為一例,從0度的排列以順時鐘方向依序標籤化。此外,在徑方向中,從定子50的中心朝向外側依序標籤化。在此,作為一例,對屬於熔接對象的一對扁平線52標籤化一個共通的數值。以共通的數值標籤化的一對扁平線52係將徑方向的內側標籤化成「A」,將徑方向的外側標籤化成「B」。 The image processing unit 9 performs the first binary large object analysis process (step S22). Binary large object analysis is a type of image analysis, which is used to perform a binarization process on each pixel contained in the target image data, and use the binarized image data to perform various analyses and measurements. As shown in FIG20, the first binary large object analysis process is to perform a binarization process on the cross-sectional shape of the flat wire 52 contained in the measurement range when the xy plane 57 is cut. The xy plane 57 can be set to an arbitrary height, but since the laser irradiation is performed toward the end face of the flat wire 52, it is necessary to set the xy plane 57 to at least the front end side where the insulating coating film 58 has been peeled off. Next, the image processing unit 9 labels (numbers) the flat wire 52 as shown in FIG19. As an example, the arrangement is labeled in a clockwise direction from 0 degrees. In addition, in the radial direction, the labels are labeled in order from the center of the stator 50 toward the outside. Here, as an example, a pair of flat wires 52 belonging to the welding object are labeled with a common value. The pair of flat wires 52 labeled with a common value is labeled "A" for the inner side in the radial direction and "B" for the outer side in the radial direction.

圖21中的(a)係顯示針對測定範圍進行了二值化處理後的圖像資料120a。二值化處理後的圖像資料實際上是以白色與黑色這兩個色階來表現,然而為了方便說明,在本實施形態中以影線(hatching)圖案來標示黑色。以下的處理係參照圖21中的(a)至圖21中的(c)來說明。 於圖像資料120a包含有二進制大型物件(blob)B21、二進制大型物件B22以及二進制大型物件B23。圖像處理部9的控制器103係針對圖像資料120a所含有的每個二進制大型物件反復步驟S24至步驟S33。首先,控制器103係測定成為對象的二進制大型物件的中心座標(x,y)(步驟S25),並進一步地測定面積(步驟S26)。接著,比較所測定的面積與預先記憶的臨限值112。藉此,判斷扁平線彼此是否接合。臨限值112只要因應扁平線52的剖面積來設定即可,作為一例係設定成剖面積的1.5倍以上至未滿2.0倍。 (a) in FIG. 21 shows the image data 120a after the measurement range has been binarized. The image data after the binarization is actually represented by two color levels, white and black, but for the convenience of explanation, the black color is indicated by a hatching pattern in this embodiment. The following processing is described with reference to (a) to (c) in FIG. 21. The image data 120a includes a binary large object (blob) B21, a binary large object B22, and a binary large object B23. The controller 103 of the image processing unit 9 repeats steps S24 to S33 for each binary large object contained in the image data 120a. First, the controller 103 measures the center coordinates (x, y) of the binary large object (step S25), and further measures the area (step S26). Then, the measured area is compared with the pre-stored threshold value 112. In this way, it is determined whether the flat wires are connected to each other. The threshold value 112 can be set according to the cross-sectional area of the flat wire 52, and as an example, it is set to more than 1.5 times and less than 2.0 times the cross-sectional area.

此外,在本實施形態中,臨限值亦可為能夠覆寫的值。亦可因應測定對象物的形狀或者素材等屬性、預測定的物理量或者值來覆寫。 在二進制大型物件的面積為臨限值以下之情形中(在步驟S27中為否),移行至步驟S32。在二進制大型物件的面積比臨限值還大之情形中(在步驟S27中為是),將遮罩區域配置於成為對象的二進制大型物件,並分割二進制大型物件(步驟S28)。例如,在分割圖21中的(a)所示的二進制大型物件B23(中心位置以元件符號P23表示)之情形中,如圖21中的(b)所示將包含了中心位置P23之細長形狀的遮罩區域配置於圖像資料上。遮罩區域為圖像處理上不進行辨識之區域。在本實施形態中,以圖像處理算出間距、段差、位置偏離等,並考慮這些間距、段差、位置偏離等來進行雷射照射,然而各個扁平線52的排列本身係被預先定位。因此,控制器103係因應與成為對象的二進制大型物件對應的扁平線52的位置,算出並配置遮罩區域的位置。此外,遮罩區域的線寬只要為一像素至二像素左右即可。圖21中的(b)係顯示配置了遮罩區域後的圖像資料120b。 In addition, in the present embodiment, the threshold value may also be a value that can be overwritten. It may also be overwritten in response to the properties such as the shape or material of the measured object, or a predetermined physical quantity or value. In the case where the area of the binary large object is below the threshold value (no in step S27), the process proceeds to step S32. In the case where the area of the binary large object is larger than the threshold value (yes in step S27), a mask area is arranged on the binary large object that is the object, and the binary large object is divided (step S28). For example, in the case of dividing the binary large object B23 (the center position is represented by the component symbol P23) shown in (a) of FIG. 21, a mask area of a thin and long shape including the center position P23 is arranged on the image data as shown in (b) of FIG. 21. The mask area is an area that is not identified in image processing. In this embodiment, the image processing calculates the spacing, step difference, position deviation, etc., and the laser irradiation is performed in consideration of these spacing, step difference, position deviation, etc., but the arrangement of each flat line 52 itself is pre-positioned. Therefore, the controller 103 calculates and configures the position of the mask area in response to the position of the flat line 52 corresponding to the large binary object being the object. In addition, the line width of the mask area only needs to be about one pixel to two pixels. (b) in Figure 21 shows the image data 120b after the mask area is configured.

接著,控制器103係對圖像資料120b進行第二二進制大型物件解析處理(步驟S29)。結果,在圖21中的(c)的圖像資料120c中,二進制大型物件B23係被分割成二進制大型物件B24以及二進制大型物件B25。控制器103係對經過分割的二進制大型物件進行標籤化(步驟S30)。藉此,能夠藉由1至48的數值以及記號A、B來識別全部的扁平線52。再者,控制器103係測定二進制大型物件B23以及二進制大型物件B24的中心座標(步驟S31)。 接著,控制器103係針對二進制大型物件解析處理的結果所獲得之包含中心位置之任意的範圍測定扁平線52的平均高度(步驟S32)。在本實施形態中,作為一例,如圖22所示針對將各個扁平線52的中心位置(P21、P22、P23)作為中心的圓(R21、R22、R23)測定平均高度。將所測定的平均高度作為該扁平線52的高度(z)。控制器103亦能夠針對各個扁平線52的中心位置的一點來測定高度,亦能如圖22所示般針對預定範圍來算出平均高度從而吸收測定誤差。 Next, the controller 103 performs a second binary large object analysis process on the image data 120b (step S29). As a result, in the image data 120c of (c) in FIG. 21 , the binary large object B23 is divided into a binary large object B24 and a binary large object B25. The controller 103 labels the divided binary large objects (step S30). Thus, all flat lines 52 can be identified by numerical values from 1 to 48 and symbols A and B. Furthermore, the controller 103 determines the center coordinates of the binary large objects B23 and B24 (step S31). Next, the controller 103 measures the average height of the flat wire 52 for an arbitrary range including the center position obtained as a result of the binary large object analysis processing (step S32). In the present embodiment, as an example, as shown in FIG22, the average height is measured for a circle (R21, R22, R23) with the center position (P21, P22, P23) of each flat wire 52 as the center. The measured average height is used as the height (z) of the flat wire 52. The controller 103 can also measure the height for a point at the center position of each flat wire 52, and can also calculate the average height for a predetermined range as shown in FIG22 to absorb the measurement error.

接著,控制器103係算出對應的兩個扁平線52的中間點的座標值(x,y,z,θ)(步驟S34)。再者,在對應的兩個扁平線52存在段差之情形中,控制器103係算出z軸偏位(offset)值(步驟S35)。針對偏位值將於後述。 當控制器103針對全部的扁平線52結束中心位置與高度(x,y,z,θ)以及中間點的座標值與高度(x,y,z,θ)的測定時,生成記載了測定結果的座標表113(步驟S37)。在此,具體而言,所生成的座標表113為CSV資料。圖21為顯示座標表113的資料構成之圖。 Next, the controller 103 calculates the coordinate value (x, y, z, θ) of the middle point of the two corresponding flat lines 52 (step S34). Furthermore, in the case where there is a step difference between the two corresponding flat lines 52, the controller 103 calculates the z-axis offset value (step S35). The offset value will be described later. When the controller 103 completes the measurement of the center position and height (x, y, z, θ) and the coordinate value and height (x, y, z, θ) of the middle point for all flat lines 52, a coordinate table 113 recording the measurement results is generated (step S37). Specifically, the generated coordinate table 113 is CSV data. Figure 21 is a diagram showing the data structure of the coordinate table 113.

如此,即使在控制器103進行兩次二進制大型物件解析處理從而使扁平線彼此接觸之情形中,亦能夠正確地進行各個扁平線52的中心位置的測定。 (9)雷射加工處理 在此,詳細地說明本實施形態的雷射加工處理。 (9-1)基本的三個步驟 首先,說明成為雷射加工裝置1所為的熔接的基本之三個步驟。 提供一種熔接方法,在本實施形態的雷射加工裝置1所為的扁平線的對接熔接中,即使空出間隙,亦不會從間隙產生雷射洩漏,能夠保持良好的熔接品質以及熔接強度並縮短處理時間。具體而言,雷射加工裝置1係進行由第一步驟、第二步驟以及第三步驟這三個步驟所構成的熔接方法。 Thus, even in the case where the controller 103 performs two binary large object analysis processes to make the flat wires contact each other, the center position of each flat wire 52 can be accurately measured. (9) Laser processing Here, the laser processing of the present embodiment is described in detail. (9-1) Three basic steps First, the three basic steps of welding performed by the laser processing device 1 are described. A welding method is provided, in which, in the butt welding of flat wires performed by the laser processing device 1 of the present embodiment, even if a gap is left, laser leakage does not occur from the gap, and good welding quality and welding strength can be maintained and the processing time can be shortened. Specifically, the laser processing device 1 performs a welding method consisting of three steps: a first step, a second step, and a third step.

使用圖24說明由三個步驟所構成的熔接方法。在此,作為一例,以下述情形作為例子來說明:將端面的大小為2.0mm×2.5mm的兩條扁平線52對接時,間隙53空出0.5mm。此外,當將第一雷射光L1的聚光直徑作為d1且將第二雷射光L2的聚光直徑作為d2時,d1=1050μm,d2=40μm。 圖24中的(a)為顯示第一步驟中的第一雷射光L1以及第二雷射光L2的照射的軌跡I1。在第一步驟中,在x軸方向處與被加工物W的中心O(中心O為包含了間隙53之被加工物W的中心)相距1.0mm的位置處,於y軸方向略直線狀地往復照射圖面左側的扁平線52的端面52a。往復照射的照射寬度係於y軸方向為1.0mm。在第一步驟中,以500mm/s的速度照射第一雷射光L1以及第二雷射光L2。 FIG24 is used to illustrate the welding method consisting of three steps. Here, as an example, the following situation is used as an example: when two flat wires 52 with end faces of 2.0 mm × 2.5 mm are butted, a gap 53 of 0.5 mm is left. In addition, when the focusing diameter of the first laser light L1 is d1 and the focusing diameter of the second laser light L2 is d2, d1 = 1050 μm, d2 = 40 μm. (a) in FIG24 shows the trajectory I1 of the irradiation of the first laser light L1 and the second laser light L2 in the first step. In the first step, the end surface 52a of the flat wire 52 on the left side of the figure is reciprocated in a substantially straight line in the y-axis direction at a position 1.0 mm away from the center O of the workpiece W in the x-axis direction (the center O is the center of the workpiece W including the gap 53). The irradiation width of the reciprocating irradiation is 1.0 mm in the y-axis direction. In the first step, the first laser light L1 and the second laser light L2 are irradiated at a speed of 500 mm/s.

圖24中的(b)為顯示第二步驟中的第一雷射光L1以及第二雷射光L2的照射的軌跡I2。在第二步驟中,在x軸方向處與被加工物W的中心O相距1.0mm的位置處,於y軸方向略直線狀地往復照射圖面右側的扁平線52的端面52a。往復照射的照射寬度係於y軸方向為1.0mm。與第一步驟同樣地,在第二步驟中以500mm/s的速度照射第一雷射光L1以及第二雷射光L2。 圖24中的(c)為顯示第三步驟中的第一雷射光L1以及第二雷射光L2的照射軌跡I3。軌跡I3係短徑為1.2mm且長徑為2.4mm的橢圓形;在第三步驟中,跨越左右的扁平導體52進行橢圓形的迴旋照射。在第三步驟中,以1000mm/s的速度照射第一雷射光L1以及第二雷射光L2。 (b) in FIG. 24 shows the irradiation trajectory I2 of the first laser light L1 and the second laser light L2 in the second step. In the second step, the end face 52a of the flat wire 52 on the right side of the figure is reciprocated in a substantially straight line in the y-axis direction at a position 1.0 mm away from the center O of the workpiece W in the x-axis direction. The irradiation width of the reciprocating irradiation is 1.0 mm in the y-axis direction. Similar to the first step, the first laser light L1 and the second laser light L2 are irradiated at a speed of 500 mm/s in the second step. (c) in FIG. 24 shows the irradiation trajectory I3 of the first laser light L1 and the second laser light L2 in the third step. The track I3 is an ellipse with a short diameter of 1.2 mm and a long diameter of 2.4 mm; in the third step, the elliptical circular irradiation is performed across the left and right flat conductors 52. In the third step, the first laser light L1 and the second laser light L2 are irradiated at a speed of 1000 mm/s.

在第一步驟、第二步驟以及第三步驟的各個步驟中,當於熔接面發生急劇的溫度上升時,會發生濺射。因此,亦可以下述方式控制功率密度高的第二雷射光L2:以低輸出開始照射,緩緩地提升功率直至到達指定的輸出。在本實施形態中,在各個步驟中亦可以下述方式控制第二雷射光L2:耗費5.0ms的時間將輸出從0提升至1.5kW。 使用圖25說明以此種方式以三個步驟進行熔接所致使的熔接面的變化。圖25為示意性地顯示熔接面的變化之概略圖。在此,為了方便說明,將圖面左側的扁平線52記載成「A」,將圖面右側的扁平線52記載成「B」。 In each of the first step, the second step, and the third step, when a rapid temperature rise occurs at the weld surface, sputtering occurs. Therefore, the second laser light L2 with a high power density can also be controlled in the following manner: irradiation starts at a low output and the power is gradually increased until the specified output is reached. In the present embodiment, the second laser light L2 can also be controlled in the following manner in each step: it takes 5.0 ms to increase the output from 0 to 1.5 kW. Figure 25 is used to illustrate the changes in the weld surface caused by welding in three steps in this way. Figure 25 is a schematic diagram schematically showing the changes in the weld surface. Here, for the convenience of explanation, the flat line 52 on the left side of the figure is recorded as "A", and the flat line 52 on the right side of the figure is recorded as "B".

(a)針對扁平線A開始第一步驟的照射,將端面52a熔融。 (b)扁平線A的端面52a的角部被熔融並呈弧狀,從而形成有第一熔融部54。雷射加工裝置1係進行第一步驟的照射(作為一例為照射68毫秒後停止照射),直至第一熔融部54的肩部下垂。在此,所謂「肩部下垂」係指形成於端面52a之第一熔融部54的一部分進入至間隙53並開始流下之狀態。 (c)接著,對扁平線B開始第二步驟的照射,將扁平線B的端面52a熔融。 (d)扁平線B的端面52a的角部被熔融並呈弧狀,從而形成有第二熔融部55。雷射加工裝置1係進行第二步驟的照射(作為一例為照射68毫秒後停止照射),直至第二熔融部55的肩部下垂。 (a) The first step of irradiation is started for the flat wire A, and the end face 52a is melted. (b) The corner of the end face 52a of the flat wire A is melted and has an arc shape, thereby forming a first molten portion 54. The laser processing device 1 performs the first step of irradiation (for example, irradiation is stopped after 68 milliseconds) until the shoulder of the first molten portion 54 sags. Here, the so-called "shoulder sag" refers to a state in which a part of the first molten portion 54 formed on the end face 52a enters the gap 53 and begins to flow down. (c) Then, the second step of irradiation is started for the flat wire B, and the end face 52a of the flat wire B is melted. (d) The corner of the end face 52a of the flat wire B is melted and has an arc shape, thereby forming a second molten portion 55. The laser processing device 1 performs the second step of irradiation (for example, irradiation is stopped after 68 milliseconds) until the shoulder of the second molten portion 55 sags.

(e)第一熔融部54以及第二熔融部55係結合。在此,由於扁平線A以及扁平線B的雷射照射的時序不同,因此在結束第二步驟的照射之時間點會有扁平線A的熔融金屬冷卻並固化的可能性。 (f)因此,在第一熔融部54以及第二熔融部55結合後,進行第三步驟的照射對扁平線A再次賦予熱能,從而將第一熔融部54以及第二熔融部55均勻化並形成一個熔融部56。第三步驟的照射亦可持續至熔融部56變成期望的大小為止(作為一例為照射70毫秒後停止照射)。 在此,如圖24以及圖25所示,在第一步驟以及第二步驟中,期望對從各個端面52a的中心偏離的位置照射雷射光,亦即期望對比中心還要接近對接面的位置(接近間隙53的位置)照射雷射光。藉此,能夠縮短直至彼此的熔融部結合為止的時間。接著,在兩個熔融部結合後進行第三步驟,藉此抑制雷射從間隙53洩漏導致對扁平線下部造成損傷。此外,對在第三步驟中已經結合的熔融部迴旋地照射雷射,藉此能將熔融部均勻化從而形成左右對稱的漂亮的熔融球。 (e) The first melting part 54 and the second melting part 55 are connected. Here, since the timing of laser irradiation of the flat wire A and the flat wire B is different, there is a possibility that the molten metal of the flat wire A is cooled and solidified at the time point of the second step irradiation. (f) Therefore, after the first melting part 54 and the second melting part 55 are connected, the third step irradiation is performed to give heat energy to the flat wire A again, thereby making the first melting part 54 and the second melting part 55 uniform and forming a melting part 56. The irradiation of the third step can also be continued until the melting part 56 becomes the desired size (as an example, the irradiation is stopped after 70 milliseconds). Here, as shown in Figures 24 and 25, in the first step and the second step, it is desired to irradiate the laser light at a position deviated from the center of each end face 52a, that is, it is desired to irradiate the laser light at a position closer to the butt surface than the center (a position close to the gap 53). This can shorten the time until the molten parts are connected. Then, the third step is performed after the two molten parts are connected, thereby preventing the laser from leaking from the gap 53 and causing damage to the lower part of the flat wire. In addition, the molten parts that have been connected in the third step are irradiated with laser in a circular manner, thereby making the molten parts uniform and forming a beautiful molten ball that is symmetrical on both sides.

此外,各個步驟的照射位置以及照射時間基本上係取決於熔接面的大小。因此,亦可對預先知道位置偏離以及段差較少的工件選擇測試照射的結果、照射位置以及照射時間各者的最佳值,並將這些最佳值記憶於控制個人電腦12。針對第一雷射光L1以及第二雷射光L2的輸出功率亦同樣地,亦可將各個雷射的最佳的功率記憶於控制個人電腦12。此外,亦可藉由照射次數來進行控制,以取代藉由照射時間來進行控制。 在上述說明中,雖然第三步驟的雷射照射的軌跡I3為橢圓形或者圓形,然而此僅為一例,第三步驟的雷射照射的軌跡並未限定於橢圓形或者圓形。 In addition, the irradiation position and irradiation time of each step basically depend on the size of the weld surface. Therefore, the results of the test irradiation, the optimal values of the irradiation position and the irradiation time can be selected for the workpiece with a known position deviation and less step difference, and these optimal values can be stored in the control personal computer 12. Similarly, for the output power of the first laser light L1 and the second laser light L2, the optimal power of each laser can also be stored in the control personal computer 12. In addition, it is also possible to control by the number of irradiations instead of by the irradiation time. In the above description, although the trajectory I3 of the laser irradiation in the third step is elliptical or circular, this is only an example, and the trajectory of the laser irradiation in the third step is not limited to elliptical or circular.

圖26為顯示第三步驟的雷射照射的軌跡的變化例。如圖26中的(a)的軌跡I7所示,雷射加工裝置1亦可跨越兩個扁平線52照射第一雷射光L1以及第二雷射光L2,並直線往復照射第一雷射光L1以及第二雷射光L2。此外,如圖26中的(b)的軌跡I8所示,雷射加工裝置1亦可跨越兩個扁平線52矩形狀地照射第一雷射光L1以及第二雷射光L2。此外,如圖26中的(c)的軌跡I9所示,雷射加工裝置1亦可跨越兩個扁平線52以8字形狀照射第一雷射光L1以及第二雷射光L2。此外,除了直線狀、矩形狀、8字形狀以外,亦可多邊形狀地照射。FIG. 26 shows an example of a variation of the trajectory of the laser irradiation in the third step. As shown in the trajectory I7 of (a) in FIG. 26 , the laser processing device 1 may also irradiate the first laser light L1 and the second laser light L2 across two flat lines 52, and irradiate the first laser light L1 and the second laser light L2 in a straight line and back and forth. In addition, as shown in the trajectory I8 of (b) in FIG. 26 , the laser processing device 1 may also irradiate the first laser light L1 and the second laser light L2 in a rectangular shape across two flat lines 52. In addition, as shown in the trajectory I9 of (c) in FIG. 26 , the laser processing device 1 may also irradiate the first laser light L1 and the second laser light L2 in an 8-shape across two flat lines 52. In addition, in addition to straight lines, rectangles, and 8-shapes, polygonal irradiation is also possible.

尤其,當矩形狀或者8字形狀地照射時,熱能容易地傳達至被加工物W的端部,從而能促進熔接面(端面52)的熔融。 此外,如圖27中的(a)所示,在扁平線52彼此正常地結合之情形中,即使以橢圓形掃描或者圓形掃描來照射雷射光,雷射光亦不會洩漏至下方;如圖27中的(b)所示,在被加工物W的端部(端面52a)的熔融量少之情形中,表面張力亦影響,成為僅扁平線52的中心附近結合的狀態。在以此種方式形成於間隙53之結合部分的面積較小之情形中,當以橢圓形掃描或者圓形掃描來照射雷射光時,雷射光會洩漏至下方。因此,在結合部分的面積較小之情形中,藉由8字形狀的雷射照射或者直線照射來抑制雷射洩漏所致使的被覆部的碳化以及絕緣不良。 In particular, when irradiating in a rectangular or figure-8 shape, heat energy is easily transmitted to the end of the workpiece W, thereby promoting the melting of the weld surface (end surface 52). In addition, as shown in (a) of FIG. 27, in the case where the flat wires 52 are normally bonded to each other, even if the laser light is irradiated by elliptical scanning or circular scanning, the laser light will not leak to the bottom; as shown in (b) of FIG. 27, in the case where the melting amount of the end (end surface 52a) of the workpiece W is small, the surface tension also affects, resulting in a state where only the center of the flat wire 52 is bonded. In the case where the area of the bonded portion formed in the gap 53 in this way is small, when the laser light is irradiated by elliptical scanning or circular scanning, the laser light will leak to the bottom. Therefore, when the area of the bonding part is small, the carbonization of the coating and poor insulation caused by laser leakage can be suppressed by 8-shaped laser irradiation or straight line irradiation.

再者,在雷射加工裝置1中,以第三步驟進行迴旋照射並非是必須的構成。如圖26中的(d)所示,亦可對已經結合的熔融部以第三步驟進行定點照射。對被加工物W的中心定點照射第一雷射光L1以及第二雷射光L2,藉此熱能從被加工物W的中心朝向端部緩緩地傳遞。在此種過程中,能夠將兩個熔融部均勻化。 如此,第三步驟係只要能實現至少將第一步驟以及第二步驟所形成的各個熔融部均勻化之處理即可。 (9-2)雷射加工處理的動作 接著,參照圖28至圖33詳細地說明雷射加工處理。 圖28為顯示雷射加工處理的動作之流程圖。此外,在此所示的動作為圖15的步驟S19的詳細內容。 Furthermore, in the laser processing device 1, it is not a necessary configuration to perform the cycloidal irradiation in the third step. As shown in (d) of FIG. 26 , the already joined molten parts can also be irradiated with a fixed point in the third step. The first laser light L1 and the second laser light L2 are irradiated at a fixed point on the center of the workpiece W, whereby heat energy is slowly transferred from the center of the workpiece W toward the end. In this process, the two molten parts can be homogenized. In this way, the third step is sufficient as long as it can achieve the processing of homogenizing at least the molten parts formed by the first step and the second step. (9-2) Action of laser processing Next, the laser processing is described in detail with reference to FIGS. 28 to 33. FIG. 28 is a flow chart showing the action of laser processing. In addition, the actions shown here are the details of step S19 in Figure 15.

雷射加工裝置1係針對屬於熔接對象的扁平線52的每一對反復步驟S41至步驟S50為止的處理。 控制個人電腦12的控制部201係參照座標表113取得現在處理中的一對段差量Δz以及間距量Δxy(步驟S42)。 控制部201係參照被儲存於記憶部102的加工速率表1100,取得與在步驟S42中所取得的段差量Δz以及間距量Δxy對應的雷射照射時間(步驟S43)。 在此,說明在雷射加工裝置1的熔接加工中所使用的加工速率表1100。圖29為顯示加工速率表1100的資料構成之圖。加工速率表1100為記載了加工速率(雷射照射時間(單位為msec))的表,該加工速率係能夠因應屬於熔接對象的一對扁平線52的z方向的段差量Δz以及xy平面內的間距量Δxy來選擇。 The laser processing device 1 repeats the processing from step S41 to step S50 for each pair of flat wires 52 to be welded. The control unit 201 that controls the personal computer 12 refers to the coordinate table 113 to obtain a pair of step difference amounts Δz and spacing amounts Δxy currently being processed (step S42). The control unit 201 refers to the processing rate table 1100 stored in the memory unit 102 to obtain the laser irradiation time corresponding to the step difference amount Δz and spacing amount Δxy obtained in step S42 (step S43). Here, the processing rate table 1100 used in the welding processing of the laser processing device 1 is described. FIG. 29 is a diagram showing the data structure of the processing rate table 1100. The processing rate table 1100 is a table recording the processing rate (laser irradiation time (unit: msec)). The processing rate can be selected according to the step difference Δz in the z direction and the spacing Δxy in the xy plane of a pair of flat wires 52 to be welded.

例如,在段差(Δz)為0.4mm且間距(Δxy)為0.6mm之情形中,參照圈選範圍(field)1111。於圈選範圍1111記載有兩個數值,上段的數值(76)係顯示高的扁平線52的雷射照射時間,下段的數值(58)係顯示低的扁平線52的雷射照射時間。 從圖29可知,與低的扁平線52的雷射照射時間相比,高的扁平線52的雷射照射時間係被設定的較長。此原因在於:為了對合高的扁平線52與低的扁平線52的高度,高的扁平線52的熔融量變多。因此,在間距量相同之情形中,段差愈大則高的扁平線52的雷射照射時間愈長。此外,當間距量大時,為了填埋間隙需要較多的熔融量,因此間距量愈大則雷射照射時間愈長。 For example, in the case where the step difference (Δz) is 0.4 mm and the spacing (Δxy) is 0.6 mm, refer to the circled range (field) 1111. Two values are recorded in the circled range 1111. The upper value (76) shows the laser irradiation time of the high flat line 52, and the lower value (58) shows the laser irradiation time of the low flat line 52. As can be seen from FIG. 29, the laser irradiation time of the high flat line 52 is set longer than the laser irradiation time of the low flat line 52. The reason for this is that in order to match the height of the high flat line 52 and the low flat line 52, the melting amount of the high flat line 52 increases. Therefore, in the case of the same spacing amount, the larger the step difference, the longer the laser irradiation time of the high flat line 52. In addition, when the pitch is large, more melting is required to fill the gap, so the larger the pitch, the longer the laser irradiation time.

在本實施形態中,亦對低的扁平線52照射雷射光。照射時間係指扁平線52的端面52a的四個角落熔融且熔融金屬的一部分開始流下至間距之狀態。此種時間為取決於扁平線52的端面52a的大小、扁平線52的材料組成、第一振盪器2以及第二振盪器3的功率、雷射波長等而制定的值,能使用藉由測試加工所獲得的值。 若端面52a的大小不同,則記載於加工速率表的照射時間自然不同。作為一例,在圖29中顯示端面52a的大小為2.0mm×2.5mm左右時的照射時間。 In this embodiment, the low flat wire 52 is also irradiated with laser light. The irradiation time refers to the state in which the four corners of the end face 52a of the flat wire 52 are melted and part of the molten metal begins to flow down to the gap. This time is a value determined depending on the size of the end face 52a of the flat wire 52, the material composition of the flat wire 52, the power of the first oscillator 2 and the second oscillator 3, the laser wavelength, etc., and the value obtained by test processing can be used. If the size of the end face 52a is different, the irradiation time recorded in the processing rate table will naturally be different. As an example, FIG. 29 shows the irradiation time when the size of the end face 52a is about 2.0mm×2.5mm.

在步驟S43中,控制部201係取得於加工速率表1100的上段以及下段所記載的兩個數值。上段所記載的數值為第一步驟的照射時間,下段所記載的數值為第二步驟的照射時間。 在此,在步驟S42中所取得的段差量Δz的值與加工速率表1100的項目(0.0mm、0.2mm、0.4mm、0.6mm、0.8mm、1.0mm)不一致之情形中,選擇更接近所取得的段差量Δz的值之項目。此外,在所取得的段差量Δz為中間值之情形中,選擇比所取得的段差量Δz還大的數值的項目。例如,在步驟S42中所取得的段差量Δz為0.5mm之情形中,控制部201係選擇加工速率表1100的圈選範圍1112。針對間距量Δxy亦同樣。 In step S43, the control unit 201 obtains two values recorded in the upper and lower sections of the processing rate table 1100. The value recorded in the upper section is the irradiation time of the first step, and the value recorded in the lower section is the irradiation time of the second step. Here, in the case where the value of the step difference Δz obtained in step S42 is inconsistent with the items (0.0mm, 0.2mm, 0.4mm, 0.6mm, 0.8mm, 1.0mm) of the processing rate table 1100, select the item that is closer to the value of the obtained step difference Δz. In addition, in the case where the obtained step difference Δz is an intermediate value, select the item with a value larger than the obtained step difference Δz. For example, in the case where the step difference Δz obtained in step S42 is 0.5mm, the control unit 201 selects the circled range 1112 of the processing rate table 1100. The same applies to the spacing Δxy.

接著,控制個人電腦12的控制部201係判斷現在處理中的一對中的哪一個扁平線較高(步驟S44)。此種判斷處理係藉由從圖像處理部9的控制器103接收用以識別高的扁平線之號碼等資訊來進行,但亦可藉由控制部101從座標表113讀出座標值來進行。座標表113係可被保存於圖像處理部9,亦可被保存於控制個人電腦12。 接著,雷射加工裝置1係進行第一步驟(步驟S45)的處理,第一步驟(步驟S45)係對高的銷照射第一雷射光L1以及第二雷射光L2。具體而言,從控制個人電腦12的控制部201對雷射控制器14發送在步驟S43中所取得的雷射照射時間,並對第一振盪器2以及第二振盪器3設定雷射照射時間。再者,從控制部201對混合式振鏡掃描器10發送控制指令,並從PLC13經由雷射控制器14對第一振盪器2以及第二振盪器3發送雷射照射指令。接收到雷射照射指令的第一振盪器2以及第二振盪器3係分別照射第一雷射光L1以及第二雷射光L2。 Next, the control unit 201 of the control personal computer 12 determines which flat line is higher in the pair currently being processed (step S44). This determination process is performed by receiving information such as the number for identifying the higher flat line from the controller 103 of the image processing unit 9, but it can also be performed by the control unit 101 reading the coordinate value from the coordinate table 113. The coordinate table 113 can be stored in the image processing unit 9 or in the control personal computer 12. Next, the laser processing device 1 performs the first step (step S45), which is to irradiate the higher pin with the first laser light L1 and the second laser light L2. Specifically, the control unit 201 for controlling the personal computer 12 sends the laser irradiation time obtained in step S43 to the laser controller 14, and sets the laser irradiation time for the first oscillator 2 and the second oscillator 3. Furthermore, the control unit 201 sends a control command to the hybrid galvanometer scanner 10, and the laser irradiation command is sent from the PLC 13 to the first oscillator 2 and the second oscillator 3 via the laser controller 14. The first oscillator 2 and the second oscillator 3 that receive the laser irradiation command irradiate the first laser light L1 and the second laser light L2, respectively.

圖30中的(a)、圖31中的(a)以及圖34中的(a)為用以說明第一步驟的處理之示意圖。此外,在圖30以及圖34的說明中,將高的扁平線52記載成「B銷」、「52(B)」,將低的扁平線52記載成「A銷」、「52(A)」。 第一步驟中的混合式振鏡掃描器10的掃描軌跡為直線往復照射。當以在步驟S43中所取得的加工速率(照射時間)照射雷射光時,B銷係熔融至A銷的高度的稍為下方為止,並形成有熔融球55b。在此,第一雷射光L1以及第二雷射光L2係直線往復照射端面52a的預定位置,然而較佳為亦可直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。 (a) in FIG. 30, (a) in FIG. 31, and (a) in FIG. 34 are schematic diagrams for explaining the processing of the first step. In addition, in the description of FIG. 30 and FIG. 34, the high flat line 52 is recorded as "B pin" and "52 (B)", and the low flat line 52 is recorded as "A pin" and "52 (A)". The scanning trajectory of the hybrid galvanometer scanner 10 in the first step is a straight line reciprocating irradiation. When the laser light is irradiated at the processing rate (irradiation time) obtained in step S43, the B pin is melted to a height slightly below the A pin, and a molten ball 55b is formed. Here, the first laser light L1 and the second laser light L2 are linearly reciprocating to irradiate the predetermined position of the end surface 52a, but it is preferable to linearly reciprocate to irradiate the position of the end surface 52a close to the butt surface 52b (the position close to the spacing).

接著,雷射加工裝置1係進行第二步驟(步驟S46)的處理,第二步驟(步驟S46)係用以對低的A銷照射雷射光。圖30中的(b)、圖31中的(b)以及圖34中的(b)為用以說明第二步驟的處理之示意圖。在第二步驟中,對A銷的熔接面照射第一雷射光L1以及第二雷射光L2。此時的混合式振鏡掃描器10的掃描軌跡係與第一步驟同樣地為直線往復照射。當以在步驟S43中所取得的加工速率(照射時間)照射雷射光時,A銷的端面52a的整體係熔融並於A銷形成有熔融球55a。如圖34中的(b)所示,由於雷射照射時間的差異,熔融球55a係比熔融球55b還小。Next, the laser processing device 1 performs the second step (step S46), which is to irradiate the low A pin with laser light. (b) in FIG. 30, (b) in FIG. 31, and (b) in FIG. 34 are schematic diagrams for illustrating the processing of the second step. In the second step, the first laser light L1 and the second laser light L2 are irradiated to the welding surface of the A pin. At this time, the scanning trajectory of the hybrid galvanometer scanner 10 is a straight reciprocating irradiation like the first step. When the laser light is irradiated at the processing rate (irradiation time) obtained in step S43, the entire end face 52a of the A pin is melted and a molten ball 55a is formed on the A pin. As shown in (b) of FIG. 34 , due to the difference in laser irradiation time, the molten ball 55a is smaller than the molten ball 55b.

此外,與第一步驟同樣地,第二步驟亦可直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。如此,對靠近內側照射雷射光,藉此能縮短熔融部(熔融球55a以及熔融球55b)結合為止的時間。 接著,控制個人電腦12的控制部201係配合A銷以及B銷的配置狀況來修正記憶於記憶部202的加工圖形資料1100(步驟S47)。 圖32中的(a)為藉由記憶於記憶部102的加工圖形資料1100所顯示的加工影像,且為8字形狀,該8字形狀係以xy正交座標系統的原點(0,0)作為中心e並連結a點、b點、c點、d點。圖32中的(b)為藉由已配合實際的A銷以及B銷的配置狀況修正了加工圖形資料1100之加工圖形資料所顯示的加工影像。 In addition, similar to the first step, the second step can also linearly reciprocate to irradiate the position of the end face 52a close to the butt surface 52b (the position close to the spacing). In this way, the laser light is irradiated close to the inner side, thereby shortening the time until the molten part (molten ball 55a and molten ball 55b) is combined. Then, the control unit 201 that controls the personal computer 12 corrects the processing graphic data 1100 stored in the memory unit 202 according to the configuration of the A pin and the B pin (step S47). (a) in Figure 32 is a processing image displayed by the processing graphic data 1100 stored in the memory unit 102, and is an 8-shaped shape. The 8-shaped shape is based on the origin (0,0) of the xy orthogonal coordinate system as the center e and connects point a, point b, point c, and point d. (b) in FIG. 32 is a processing image displayed by correcting the processing graphic data 1100 according to the actual configuration of the A pin and the B pin.

說明加工圖形資料1100的修正方法。控制個人電腦12的控制部201係使加工圖形資料1100的中心e與AB銷座標一致。而且,以連結加工圖形資料1100的a點與d點之直線的中點與A銷的座標一致且連結加工圖形資料1100的c與b點之直線的中點與B銷的座標一致之方式,使加工圖形資料1100旋轉並於x軸方向伸長。如此,經過修正的加工圖形資料為8字形狀,該8字形狀係以AB銷座標作為中心e並連結a’點、b’點、c’點、d’點。控制部201係將經過修正的加工圖形資料朝混合式振鏡掃描器10發送。A method for correcting the processing graphic data 1100 is described. The control unit 201 that controls the personal computer 12 makes the center e of the processing graphic data 1100 consistent with the AB pin coordinates. In addition, the processing graphic data 1100 is rotated and stretched in the x-axis direction in such a manner that the midpoint of the straight line connecting the points a and d of the processing graphic data 1100 is consistent with the coordinates of the A pin and the midpoint of the straight line connecting the points c and b of the processing graphic data 1100 is consistent with the coordinates of the B pin. In this way, the corrected processing graphic data is in the shape of a figure 8, and the figure 8 shape is centered on the AB pin coordinates e and connects the points a', b', c', and d'. The control unit 201 sends the corrected processing graphic data to the hybrid galvanometer scanner 10.

接著,在第三步驟的處理之前,將雷射加工裝置1的焦點位置偏位至熔融前的B銷的高度(步驟S48)。接著,兩個熔融球55a、55b結合後,雷射加工裝置1係使用修正後的加工圖形資料進行第三步驟(步驟S48)的處理,第三處理(步驟S48)係跨越A銷以及B銷照射第一雷射光L1以及第二雷射光L2。在第三步驟中,以橢圓形、圓形或者8字形狀等跨越A銷以及B銷進行迴旋照射。 雷射加工裝置1係藉由第三步驟再次對A銷以及B銷賦予熱能,從而將熔融部均勻化從而形成左右對稱的漂亮的熔融球。第三步驟的處理亦可持續至熔融球變成期望的大小為止。 Next, before the third step, the focus position of the laser processing device 1 is shifted to the height of the B pin before melting (step S48). Then, after the two molten balls 55a and 55b are combined, the laser processing device 1 uses the corrected processing graphic data to perform the third step (step S48), and the third process (step S48) is to irradiate the first laser light L1 and the second laser light L2 across the A pin and the B pin. In the third step, the irradiation is performed in a circular shape, a circle, or an 8-shaped shape across the A pin and the B pin. The laser processing device 1 applies heat energy to the A pin and the B pin again in the third step, thereby homogenizing the molten part and forming a beautiful molten ball that is symmetrical on both sides. The third step can also be continued until the molten ball becomes the desired size.

如此,在兩個熔融球55a、55b結合後進行第三步驟的處理,藉此抑制雷射光從間距洩漏導致對扁平線下部造成損傷。此外,如圖34中的(c)所示,A銷以及B銷係以熔融球55結合,然而當照射的雷射光的能量強時,會有雷射光貫通熔融球55導致對扁平線下部造成損傷的可能性。因此,在第三步驟中,將雷射光的焦點位置偏位至上方,藉此使照射至熔融球55的雷射光的能量密度降低。藉此,抑制雷射光貫通熔融球55。偏位值係使用記載於座標表113的值。作為一例,雷射加工裝置1係使用z軸台11z將混合式振鏡掃描器10的位置偏位至高的銷的熔接前的高度。In this way, after the two molten balls 55a and 55b are combined, the third step is performed to prevent the laser light from leaking from the gap and causing damage to the lower part of the flat wire. In addition, as shown in (c) in Figure 34, pin A and pin B are combined with a molten ball 55. However, when the energy of the irradiated laser light is strong, there is a possibility that the laser light penetrates the molten ball 55 and causes damage to the lower part of the flat wire. Therefore, in the third step, the focal position of the laser light is offset upward to reduce the energy density of the laser light irradiated to the molten ball 55. In this way, the laser light is prevented from penetrating the molten ball 55. The offset value uses the value recorded in the coordinate table 113. As an example, the laser processing device 1 uses the z-axis stage 11z to offset the position of the hybrid galvanometer scanner 10 to the height of the higher pin before welding.

當雷射加工裝置1結束被加工物W所含有的全部的一對扁平線的熔接處理時,結束被加工物W的熔接加工。 作為第三步驟的變化例,使用圖33來說明。圖33中的(a)係顯示於x軸方向空著間隙之情形中的第三步驟的掃描軌跡。圖33中的(b)係顯示於y軸方向存在有位置偏離之情形中的第三步驟的掃描軌跡。 在所有情形中,皆以使已經登錄的加工圖形資料1100(8字形狀)的中心點配合AB銷座標且進一步地通過A銷座標以及B銷座標之方式使加工圖形資料1100旋轉以及/或者伸縮。藉此,能以與各種A銷以及B銷的配置狀況相應的掃描軌跡來照射雷射光。 When the laser processing device 1 completes the welding process of all the pairs of flat wires contained in the workpiece W, the welding process of the workpiece W is completed. As a variation example of the third step, FIG. 33 is used for explanation. (a) in FIG. 33 shows the scanning trajectory of the third step in the case where there is a gap in the x-axis direction. (b) in FIG. 33 shows the scanning trajectory of the third step in the case where there is a positional deviation in the y-axis direction. In all cases, the center point of the registered processing graphic data 1100 (8-shaped) is matched with the AB pin coordinates and the processing graphic data 1100 is further rotated and/or stretched by the A pin coordinates and the B pin coordinates. This allows laser light to be irradiated with a scanning trajectory corresponding to the configuration of various A pins and B pins.

此外,雖然第三步驟的雷射掃描軌跡為8字形狀,然而此僅為一例,並未限定於8字形狀。第三步驟係只要能實現下述處理即可:在至少在第一步驟以及第二步驟中所形成的A銷以及B銷的各個熔融部結合的狀態下,藉由通過已經結合的熔融部的中心附近的掃描軌跡將熔融部攪拌並均勻化。 例如,如圖33中的(c)、(d)、(e)所示,第三步驟的掃描軌跡亦可為跨越A銷以及B銷之直線往復照射。在此種情形中,預先將顯示直線之加工圖形資料登錄至控制個人電腦12的記憶部202,控制部201係因應各種一對的配置狀況修正已經登錄的加工圖形資料。具體而言,以使直線的中心點配合AB銷座標且直線的始點以及終點配合A銷座標以及B銷座標之方式使直線於θ方向旋轉且於x軸方向伸縮。藉此,能實現與各種一對的配置狀況相應的直線往復照射。 In addition, although the laser scanning trajectory of the third step is in the shape of an 8, this is only an example and is not limited to the shape of an 8. The third step is sufficient as long as the following processing can be achieved: when the molten parts of the A pin and the B pin formed in at least the first step and the second step are combined, the molten parts are stirred and homogenized by passing through the scanning trajectory near the center of the combined molten parts. For example, as shown in (c), (d), and (e) in Figure 33, the scanning trajectory of the third step can also be a straight line reciprocating irradiation across the A pin and the B pin. In this case, the processing graphic data showing the straight line is pre-registered in the memory unit 202 of the control personal computer 12, and the control unit 201 corrects the registered processing graphic data according to the configuration conditions of each pair. Specifically, the straight line is rotated in the θ direction and stretched in the x-axis direction in such a way that the center point of the straight line matches the AB pin coordinates and the starting point and end point of the straight line match the A pin coordinates and the B pin coordinates. In this way, reciprocating straight line irradiation corresponding to various pair configuration conditions can be achieved.

在一對扁平線52於x軸方向、y軸方向、θ旋轉方向存在間距或者存在位置偏離之情形中,設想藉由第一步驟以及第二步驟的照射所結合的熔融部的面積變小。即使在此種熔融部的面積變小之情形中,亦以通過熔融部的中心附近的掃描軌跡來照射雷射光,藉此抑制雷射光從間隙洩漏。藉此,能抑制對扁平導體下部的被覆部照射雷射光從而導致產生碳化以及絕緣不良。In the case where a pair of flat wires 52 is spaced apart or deviated in position in the x-axis direction, the y-axis direction, or the θ rotation direction, it is assumed that the area of the molten portion connected by the irradiation of the first step and the second step becomes smaller. Even in the case where the area of the molten portion becomes smaller, the laser light is irradiated with a scanning track passing through the center of the molten portion to suppress the leakage of the laser light from the gap. In this way, it is possible to suppress the carbonization and poor insulation caused by irradiating the coating portion at the bottom of the flat conductor with laser light.

(10)實施形態的功效 雷射加工裝置1係以高速照射波長為300nm至600nm且相對於銅有高的光吸收率的第一雷射光L1,藉此於被加工物W形成熔融池。接著,在所形成的熔融池內部照射聚光直徑小且能量密度高的第二雷射光L2,藉此在熔融池內部實現局部性較深的熔入深度,從而促進熔融池的形成。 此外,與以往的熔接裝置相比,雷射加工裝置1係將聚光直徑大的第一雷射光L1使用於熔接,藉此能有效地對被加工物W賦予熱能並熔融被加工物W。 (10) Effect of the Implementation Form The laser processing device 1 irradiates the first laser light L1 with a wavelength of 300nm to 600nm and a high light absorption rate relative to copper at high speed, thereby forming a molten pool on the workpiece W. Then, the second laser light L2 with a small focusing diameter and high energy density is irradiated inside the formed molten pool, thereby achieving a local deeper melting depth inside the molten pool, thereby promoting the formation of the molten pool. In addition, compared with the previous welding device, the laser processing device 1 uses the first laser light L1 with a large focusing diameter for welding, thereby effectively giving heat energy to the workpiece W and melting the workpiece W.

此外,雷射加工裝置1並不是定點照射第一雷射光L1以及第二雷射光L2,而是高速地掃描照射第一雷射光L1以及第二雷射光L2,藉此於熔融池產生流動。藉此,將所產生的氣泡從到達至高溫的熔融池排出至外部。藉此,能抑制孔隙率(porosity)。再者,能夠防止在熔融池中熱能局部性地集中,從而能夠使熔融池穩定化並減少濺射。由於孔隙率以及濺射係成為接合不良等熔接缺陷的主要因素,因此依據本實施形態的雷射加工裝置1以及使用了雷射加工裝置1的熔接方法,能夠抑制發生熔接缺陷。 此外,如上所述,能夠抑制從扁平線的對接時所產生的間隙53產生雷射洩漏,從而能夠抑制雷射洩漏所伴隨的被覆部的碳化以及絕緣不良等。 In addition, the laser processing device 1 does not irradiate the first laser light L1 and the second laser light L2 at a fixed point, but scans and irradiates the first laser light L1 and the second laser light L2 at a high speed, thereby generating flow in the molten pool. In this way, the generated bubbles are discharged from the molten pool that has reached a high temperature to the outside. In this way, porosity can be suppressed. Furthermore, it is possible to prevent the local concentration of heat energy in the molten pool, thereby stabilizing the molten pool and reducing spattering. Since porosity and spattering are the main factors of welding defects such as poor bonding, the laser processing device 1 of this embodiment and the welding method using the laser processing device 1 can suppress the occurrence of welding defects. In addition, as described above, it is possible to suppress the laser leakage from the gap 53 generated when the flat wires are butted together, thereby suppressing the carbonization of the coating and poor insulation that are associated with the laser leakage.

雷射加工裝置1係在存在段差的兩個扁平線的前端對接熔接中,先以第一步驟將高的扁平線熔融後,再以第二步驟熔融低的扁平線。此時,將第一步驟的熔融量設定成比第二步驟的熔融量還多。藉此,能抑制段差消除後發生濺射。假設在將第一步驟的熔融量以及第二步驟的熔融量設定成相等之情形中(例如以最低限度的時間熔融至兩個熔融球結合的程度之情形中),形成有如圖34中的(d)所示般的傾斜的熔融球55c。如此,熔接品質以及熔接強度皆不足。另一方面,本實施形態的雷射加工裝置1係將第一步驟的熔融量設定成比第二步驟的熔融量還多,藉此能形成如圖34中的(c)所示般的左右均等的熔融球55,從而熔接品質以及熔接強度皆良好。The laser processing device 1 melts the higher flat wire in the first step and then melts the lower flat wire in the second step when the front ends of two flat wires with a step difference are butt-jointed. At this time, the melting amount in the first step is set to be larger than the melting amount in the second step. In this way, it is possible to suppress the occurrence of spattering after the step difference is eliminated. Assuming that the melting amount in the first step and the melting amount in the second step are set to be equal (for example, in the case where the two molten balls are melted to the extent of being combined in the minimum time), a tilted molten ball 55c is formed as shown in (d) in FIG. 34. In this way, both the welding quality and the welding strength are insufficient. On the other hand, the laser processing device 1 of this embodiment sets the melting amount of the first step to be greater than the melting amount of the second step, thereby forming a molten ball 55 that is evenly distributed on the left and right as shown in (c) of Figure 34, thereby improving the welding quality and welding strength.

此外,雷射加工裝置1係包含圖像處理部9,藉由圖像處理部9取得定子50所含有的各個銷的位置資訊(座標值),並使用所取得的位置資訊來調整雷射照射位置。尤其,雷射加工裝置1係在第三步驟的處理中以通過AB銷中心座標的掃描軌跡來照射雷射光,藉此抑制雷射光從間距、位置偏離的部位洩漏至扁平線下部。藉此,能夠抑制被覆部的碳化,且能夠確保熔接品質以及熔接強度。In addition, the laser processing device 1 includes an image processing unit 9, which obtains the position information (coordinate value) of each pin included in the stator 50, and uses the obtained position information to adjust the laser irradiation position. In particular, the laser processing device 1 irradiates the laser light with a scanning trajectory passing through the center coordinates of the AB pins in the processing of the third step, thereby suppressing the laser light from leaking to the lower part of the flat wire from the position where the spacing and position are deviated. In this way, the carbonization of the coating can be suppressed, and the welding quality and welding strength can be ensured.

[實施形態二] 接著,說明實施形態二的雷射加工裝置。 在上述實施形態一中,屬於熔接對象的被加工物W中之用以構成分段線圈之各個扁平導體的高度係在馬達整體為略均勻。然而會有下述情形:根據馬達的種類,於用以構成分段線圈之扁平導體的附近存在有用以連接於導線之高度較高的扁平導體。 當於屬於熔接對象的扁平導體的附近豎立有高度高的扁平導體時,在於屬於熔接對象的扁平導體的端面形成有熔融球之情形中,會有熔融球反射雷射光從而導致雷射光的反射光照射至高度高的扁平導體的被覆部之情形。如此,會有被覆部受到熱能所致使的損傷從而變得無法使用的可能性。 [Implementation Form 2] Next, the laser processing device of Implementation Form 2 is described. In the above-mentioned Implementation Form 1, the height of each flat conductor used to constitute the segmented coil in the workpiece W to be welded is slightly uniform in the entire motor. However, there may be a case where, depending on the type of motor, there is a flat conductor with a higher height for connecting to the wire near the flat conductor used to constitute the segmented coil. When a high flat conductor stands vertically near the flat conductor to be welded, in the case where a molten ball is formed on the end surface of the flat conductor to be welded, there may be a case where the molten ball reflects the laser light, causing the reflected light of the laser light to irradiate the coated part of the high flat conductor. In this way, there is a possibility that the coated part is damaged by heat energy and becomes unusable.

因此,實施形態二的雷射加工裝置係提供一種定子的製造方法,即使在於屬於熔接對象的扁平導體的附近豎立有高度高的扁平導體之情形中,為了抑制該高度高的扁平導體的被覆部受到熱能所致使的損傷從而變得無法使用之問題,因應屬於熔接對象的扁平導體的周邊狀況而以適當的熔接圖案來進行熔接加工。 (1)雷射加工裝置的構成 與實施形態一同樣地,實施形態二的雷射加工裝置為熔接裝置,係對被加工物W照射雷射光,將雷射光的能量予以熱轉換,藉此進行被加工物W的熔接。系統的整體構成係與圖1以及圖2所示的雷射加工裝置1相同。 Therefore, the laser processing device of the second embodiment provides a method for manufacturing a stator. Even when a high flat conductor stands vertically near a flat conductor to be welded, in order to suppress the problem that the coated portion of the high flat conductor is damaged by heat energy and becomes unusable, welding processing is performed with an appropriate welding pattern according to the peripheral condition of the flat conductor to be welded. (1) Configuration of laser processing device As in the embodiment, the laser processing device of the second embodiment is a welding device that irradiates a workpiece W with laser light and converts the energy of the laser light into heat to weld the workpiece W. The overall configuration of the system is the same as the laser processing device 1 shown in Figures 1 and 2.

在此,以與實施形態一不同的控制個人電腦22做為中心進行說明。 如圖38所示,控制個人電腦22係由控制部201、記憶部202、輸入部203、通訊部204以及顯示部205所構成。 於記憶部202儲存有用以控制雷射加工裝置之電腦程式以及各種資料。尤其,記憶部202係保持屬於本實施形態的特徵之描繪圖案121以及圖案表122,這些描繪圖案121以及圖案表122為被使用於被加工物W的熔接處理之資料。詳細係容後述。 控制部201的加工處理部211係將儲存於記憶部202的電腦程式裝載至屬於作業用記憶體的RAM並執行電腦程式,藉此控制第一振盪器2、第二振盪器3、混合式振鏡掃描器10、PLC13、雷射控制器14等,進行被加工物W的熔接處理。 Here, the control personal computer 22 which is different from the first embodiment is mainly used for explanation. As shown in FIG. 38 , the control personal computer 22 is composed of a control unit 201, a memory unit 202, an input unit 203, a communication unit 204, and a display unit 205. The memory unit 202 stores computer programs and various data for controlling the laser processing device. In particular, the memory unit 202 holds the characteristic drawing pattern 121 and the pattern table 122 of the present embodiment, and these drawing patterns 121 and the pattern table 122 are data used for the welding process of the workpiece W. The details will be described later. The processing unit 211 of the control unit 201 loads the computer program stored in the memory unit 202 into the RAM belonging to the working memory and executes the computer program, thereby controlling the first oscillator 2, the second oscillator 3, the hybrid galvanometer scanner 10, the PLC 13, the laser controller 14, etc., to perform the welding process of the workpiece W.

(2)針對被加工物W 接著,使用圖39說明屬於被加工物W的定子50。圖39中的(a)為顯示電動車輛等的馬達之屬於固定子之定子50的概略構成之立體圖。如圖39中的(a)所示,定子50係由下述構件所構成:略圓筒形狀的定子芯51,係具有於圓周方向排列的複數個溝槽54;複數個扁平導體52,係被插入至溝槽54並形成分段線圈;以及複數個扁平導體60,係被插入至溝槽54,並被使用於與外部之間的通電。 (2) Regarding the workpiece W Next, the stator 50 belonging to the workpiece W is described using FIG. 39 (a) is a perspective view showing the schematic structure of the stator 50 belonging to the stator of the motor of an electric vehicle, etc. As shown in FIG. 39 (a), the stator 50 is composed of the following components: a stator core 51 having a substantially cylindrical shape, having a plurality of grooves 54 arranged in the circumferential direction; a plurality of flat conductors 52, which are inserted into the grooves 54 and form segmented coils; and a plurality of flat conductors 60, which are inserted into the grooves 54 and are used for conducting electricity with the outside.

扁平導體52以及扁平導體60為剖面為矩形狀的電線,亦即扁平線。扁平導體52以及扁平導體60通常係使用純銅製的導體,然而亦可由具有高導電率的金屬材料所構成,如以銅作為主成分之合金、以銅以及鋁所構成的合金等所構成。扁平導體52以及扁平導體60的端部係從定子芯51的上端部突出,然而扁平導體60的突出量係比扁平導體52的突出量還大,亦即扁平導體60的高度係比扁平導體52的高度還高。雖然扁平導體52以及扁平導體60係被絕緣被覆膜被覆,然而為了電性連接,扁平導體52以及扁平導體60各者的端部的絕緣被覆膜係被剝離。The flat conductor 52 and the flat conductor 60 are electric wires having a rectangular cross section, that is, flat wires. The flat conductor 52 and the flat conductor 60 are generally made of pure copper, but may also be made of a metal material having a high electrical conductivity, such as an alloy with copper as a main component, an alloy composed of copper and aluminum, etc. The ends of the flat conductor 52 and the flat conductor 60 protrude from the upper end of the stator core 51, but the protrusion of the flat conductor 60 is greater than that of the flat conductor 52, that is, the height of the flat conductor 60 is higher than that of the flat conductor 52. Although the flat conductor 52 and the flat conductor 60 are covered with an insulating film, the insulating film at the end of each of the flat conductor 52 and the flat conductor 60 is peeled off for electrical connection.

圖39中的(b)為用以說明扁平導體52以及扁平導體60的配置的一例之放大圖。在此例子中,屬於熔接對象的兩個扁平導體52係配置成被兩個扁平導體60夾住。雷射加工裝置係在兩個扁平導體52的端面52a對接的狀態下,朝向端面52a照射雷射光並進行熔接加工。此時,如圖39中的(b)所示,在高度高的扁平導體60接近屬於熔接對象的扁平導體52之情形中,會如下述般產生反射光所致使的問題。FIG. 39( b) is an enlarged view for explaining an example of the arrangement of the flat conductor 52 and the flat conductor 60. In this example, the two flat conductors 52 to be welded are arranged to be sandwiched by the two flat conductors 60. The laser processing device irradiates the end faces 52a of the two flat conductors 52 with the end faces 52a butted against each other to perform welding processing. At this time, as shown in FIG. 39( b), when the high flat conductor 60 approaches the flat conductor 52 to be welded, a problem caused by reflected light occurs as follows.

亦即,如圖40所示,當一邊藉由混合式振鏡掃描器10掃描第一雷射光L1以及第二雷射光L2一邊將兩個扁平導體52熔接加工時,於熔接面(已經將兩個端面52a對合的區域)形成有半球狀的熔融球55。形成熔融球55後直至結束熔接加工為止之期間,第一雷射光L1以及第二雷射光L2係被熔融球55反射。當熔融球55所為的反射光L3照射至接近的扁平導體60時,會有被覆部碳化從而導致扁平導體60變得無法使用的可能性。 有鑑於此種問題點,雷射加工裝置係著重於雷射光的掃描軌跡,亦即著重於混合式振鏡掃描器10的描繪圖案,一邊抑制熔融球55所為的反射光L3照射至鄰接的扁平導體60一邊進行熔接加工。 That is, as shown in FIG40, when two flat conductors 52 are welded while the hybrid galvanometer scanner 10 scans the first laser light L1 and the second laser light L2, a hemispherical molten ball 55 is formed on the welded surface (the area where the two end faces 52a are aligned). After the molten ball 55 is formed until the welding process is completed, the first laser light L1 and the second laser light L2 are reflected by the molten ball 55. When the reflected light L3 of the molten ball 55 is irradiated to the adjacent flat conductor 60, there is a possibility that the coated portion is carbonized, making the flat conductor 60 unusable. In view of this problem, the laser processing device focuses on the scanning trajectory of the laser light, that is, the drawing pattern of the hybrid galvanometer scanner 10, and performs welding processing while suppressing the reflected light L3 caused by the molten ball 55 from irradiating the adjacent flat conductor 60.

此外,照射至熔融球55之第一雷射光L1以及第二雷射光L2中之藉由反射光對被覆部造成損傷的雷射光主要為第二雷射光L2(IR(infrared;紅外線)雷射)。IR雷射係相對於銅的吸收率為6%左右的低值,剩餘的約94%不會被吸收而是被反射。此外,雖然被熔融球55反射的第二雷射光L2會擴散,然而光纖雷射係具有光束品質高且難以擴散之特性,容易因為反射而對被覆部造成損傷。另一方面,由於第一雷射光L1(藍色雷射)係相對於銅有高的吸收率,因此反射率低。此外,由於在本實施形態中所使用的第一雷射光L1係輸出低且反射後會廣泛地擴散,因此因為反射光的功率密度非常低等原因,第一雷射光L1的反射所導致的損傷較少。In addition, of the first laser light L1 and the second laser light L2 irradiated to the molten ball 55, the laser light that causes damage to the coating by reflected light is mainly the second laser light L2 (IR (infrared) laser). The absorption rate of IR laser is a low value of about 6% relative to copper, and the remaining about 94% is not absorbed but reflected. In addition, although the second laser light L2 reflected by the molten ball 55 will diffuse, the fiber laser has the characteristics of high beam quality and difficulty in diffusion, and it is easy to cause damage to the coating due to reflection. On the other hand, since the first laser light L1 (blue laser) has a high absorption rate relative to copper, its reflectivity is low. In addition, since the first laser light L1 used in the present embodiment has low output and diffuses widely after reflection, the damage caused by the reflection of the first laser light L1 is relatively small due to the very low power density of the reflected light.

(3)針對禁止照射區域的設定以及描繪圖案 在此,說明在本實施形態的熔接加工中所使用的描繪圖案。首先,使用圖41說明禁止照射區域。 熔融球55造成影響的區域係取決於屬於熔接對象的扁平導體52與接近的扁平導體60之間的距離、扁平導體60的大小、熔融球55的大小、熔融球55的曲面形狀等。然而,熔融球55係隨著照射時間的經過而成長,熔融球55的大小並非是固定的。再者,熔融球55係一邊藉由表面張力保持在熔接面上隆起的狀態,一邊藉由雷射照射而被攪拌並晃動。因此,加工中的形狀亦不是固定的。 (3) Setting and drawing patterns for prohibited irradiation areas Here, the drawing patterns used in the welding process of this embodiment are described. First, the prohibited irradiation area is described using FIG. 41. The area affected by the molten ball 55 depends on the distance between the flat conductor 52 to be welded and the adjacent flat conductor 60, the size of the flat conductor 60, the size of the molten ball 55, the curved surface shape of the molten ball 55, etc. However, the molten ball 55 grows as the irradiation time passes, and the size of the molten ball 55 is not fixed. Furthermore, the molten ball 55 is kept in a raised state on the welding surface by surface tension, while being stirred and shaken by laser irradiation. Therefore, the shape during processing is also not fixed.

因此,在本實施形態中,如圖41所示,基於屬於熔接對象的扁平導體52與接近的扁平導體60之間的距離、扁平導體60的大小、熔接面(已經對合兩個端面52a的區域)的大小,於禁止照射區域規定以圖中的斜線部分所顯示的區域。禁止照射區域為下述區域:當雷射光通過時,反射光L3會碰觸到鄰接的扁平導體60。因此,當以雷射光不會通過熔接面上的禁止照射區域此種描繪圖案照射雷射光時,反射光L3不會照射至扁平導體60。 此外,禁止照射區域亦可使用扁平導體52與接近的扁平導體60之間的距離、扁平導體60的大小、熔融球55的大小、熔融球55的曲面形狀、端面52a的面積中的至少一個來制定。 Therefore, in the present embodiment, as shown in FIG. 41, based on the distance between the flat conductor 52 to be welded and the adjacent flat conductor 60, the size of the flat conductor 60, and the size of the weld surface (the area where the two end surfaces 52a have been matched), the area shown by the diagonal line in the figure is specified in the prohibited irradiation area. The prohibited irradiation area is the area where the reflected light L3 will hit the adjacent flat conductor 60 when the laser light passes through. Therefore, when the laser light is irradiated with a pattern such that the laser light does not pass through the prohibited irradiation area on the weld surface, the reflected light L3 will not irradiate the flat conductor 60. In addition, the prohibited irradiation area can also be specified using at least one of the distance between the flat conductor 52 and the adjacent flat conductor 60, the size of the flat conductor 60, the size of the molten ball 55, the curved surface shape of the molten ball 55, and the area of the end surface 52a.

本實施形態的雷射加工裝置係因應屬於熔接對象的扁平導體52的周邊狀況,一邊切換描繪圖案一邊進行熔接加工。亦即,在屬於熔接對象的扁平導體52鄰接有扁平導體60之情形中,以不通過禁止照射區域此種描繪圖案進行熔接加工;在屬於熔接對象的扁平導體52未鄰接有扁平導體60之情形中,藉由時間效率最佳的描繪圖案進行熔接加工,藉此使定子50整體的產距時間(tact time)縮短。 記憶於記憶部202的描繪圖案121係由複數個描繪圖案所構成,作為一例,如圖42所示包含圖案A、圖案B以及圖案C。描繪圖案121係可在顯示有用以對顯示部205輸入描繪圖案之UI畫面的狀態下,藉由使用者操作輸入部203來輸入;描繪圖案121亦可讀入記憶於可移動的記錄媒體之資訊並儲存於記憶部202。 The laser processing device of this embodiment performs welding processing while switching the depiction pattern in response to the peripheral conditions of the flat conductor 52 to be welded. That is, in the case where the flat conductor 52 to be welded is adjacent to the flat conductor 60, welding processing is performed with such a depiction pattern that does not pass through the prohibited irradiation area; in the case where the flat conductor 52 to be welded is not adjacent to the flat conductor 60, welding processing is performed with the depiction pattern with the best time efficiency, thereby shortening the tact time of the stator 50 as a whole. The depiction pattern 121 stored in the memory unit 202 is composed of a plurality of depiction patterns, as an example, including pattern A, pattern B and pattern C as shown in FIG. 42. The drawing pattern 121 can be input by the user operating the input unit 203 while displaying a UI screen for inputting the drawing pattern to the display unit 205; the drawing pattern 121 can also read information stored in a removable recording medium and store it in the storage unit 202.

圖42中的(a)所示的圖案A為描繪圖案,使用於屬於熔接對象的兩個扁平導體52未鄰接有扁平導體60之情形。在圖案A中,如軌跡I1所示,跨越兩個扁平導體52並以預定的迴旋直徑迴旋照射第一雷射光L1以及第二雷射光L2。圖案A的迴旋照射係熔融效率高,與後述的圖案B以及圖案C相比能迅速地進行熔接處理。 圖42中的(b)所示的圖案B為描繪圖案,使用於屬於熔接對象的扁平導體52鄰接有扁平導體60之情形。在圖案B中,如軌跡I2所示,以未通過禁止照射區域之8字形狀的軌跡來照射第一雷射光L1以及第二雷射光L2。 The pattern A shown in (a) of FIG. 42 is a depiction pattern, which is used when the two flat conductors 52 to be welded are not adjacent to the flat conductor 60. In the pattern A, as shown in the trajectory I1, the first laser light L1 and the second laser light L2 are irradiated in a predetermined rotation diameter across the two flat conductors 52. The rotation irradiation of the pattern A has a high melting efficiency, and can be welded more quickly than the patterns B and C described later. The pattern B shown in (b) of FIG. 42 is a depiction pattern, which is used when the flat conductor 52 to be welded is adjacent to the flat conductor 60. In the pattern B, as shown in the trajectory I2, the first laser light L1 and the second laser light L2 are irradiated in an 8-shaped trajectory that does not pass through the prohibited irradiation area.

圖42中的(c)所示的圖案C為圖案B的變化例,與圖案B同樣地為描繪圖案,使用於屬於熔接對象的扁平導體52鄰接有扁平導體60之情形。圖案C係如軌跡I3所示,朝未通過禁止照射區域的傾斜方向往復照射第一雷射光L1以及第二雷射光L2。 由於圖案C為連結兩點之間之軌跡,因此為容易與熔融部的周邊狀況對應之軌跡。此外,由於是直線圖案,因此會有描繪圖案生成的難易度低之優點。另一方面,由於熔融耗費時間,因此預想產距時間延長之情形。此外,會有形成於熔接面之熔融球55的左右平衡變差的可能性。 Pattern C shown in (c) of FIG. 42 is a variation of pattern B. It is a drawing pattern like pattern B and is used in the case where a flat conductor 52 to be welded is adjacent to a flat conductor 60. Pattern C is a trajectory I3 in which the first laser light L1 and the second laser light L2 are reciprocatedly irradiated in an inclined direction that does not pass through the prohibited irradiation area. Since pattern C is a trajectory connecting two points, it is a trajectory that is easy to correspond to the peripheral conditions of the molten portion. In addition, since it is a straight line pattern, it has the advantage of low difficulty in generating the drawing pattern. On the other hand, since melting takes time, it is expected that the production distance time will be extended. In addition, there is a possibility that the left and right balance of the molten ball 55 formed on the weld surface will deteriorate.

雷射加工裝置係一邊切換圖案A與圖案B(亦可使用圖案C來取代圖案B)一邊進行被加工物W的熔接加工,此時使用儲存於記憶部202的圖案表122。在此,使用圖43以及圖44來說明圖案表122。 圖43為簡略地顯示屬於被加工物W的一例的定子。呈一對的兩個白色的矩形係顯示屬於熔接對象的扁平導體52,黑色的矩形係顯示屬於高的銷的扁平導體60。記載有以何種描繪圖案熔接加工屬於熔接對象的扁平導體52之表為圖44所示的圖案表122。 The laser processing device performs welding processing of the workpiece W while switching between pattern A and pattern B (pattern C can also be used instead of pattern B), and at this time, the pattern table 122 stored in the memory unit 202 is used. Here, Figures 43 and 44 are used to illustrate the pattern table 122. Figure 43 is a stator that briefly shows an example of the workpiece W. The two white rectangles in a pair show the flat conductor 52 that is the object of welding, and the black rectangle shows the flat conductor 60 that is the high pin. The table that records what kind of pattern is used to weld the flat conductor 52 that is the object of welding is the pattern table 122 shown in Figure 44.

圖案表122係與被加工物W一對一地對應,並記載有與被加工物W的扁平導體的排列方式相應的描繪圖案。圖案表122係在熔接加工前被儲存於記憶部102。與描繪圖案121同樣地,使用者亦可在顯示部205顯示有用以輸入圖案表122之UI畫面的狀態下操作輸入部203進行輸入,亦可讀入記憶於記錄媒體的資訊並儲存於記憶部202,亦可經由網路接收並儲存於記憶部202。 使用銷號碼作為用以表示屬於熔接對象的扁平導體52的位置之位置資訊。如圖43所示般,銷號碼為排列於定子的圓周方向的字母與排列於定子的徑方向的數字之組合。如圖44所示,圖案表122係將銷號碼與描繪圖案賦予對應地記載。 The pattern table 122 corresponds to the workpiece W one-to-one, and records the depicted pattern corresponding to the arrangement of the flat conductors of the workpiece W. The pattern table 122 is stored in the memory unit 102 before the welding process. Similar to the depicted pattern 121, the user can also operate the input unit 203 to input when the display unit 205 displays a UI screen for inputting the pattern table 122, or read the information stored in the recording medium and store it in the memory unit 202, or receive it via the network and store it in the memory unit 202. The pin number is used as the position information for indicating the position of the flat conductor 52 that is the welding object. As shown in FIG. 43, the pin number is a combination of letters arranged in the circumferential direction of the stator and numbers arranged in the radial direction of the stator. As shown in FIG. 44, the pattern table 122 records the pin numbers and the depicted patterns in correspondence.

在本實施形態中,在屬於熔接對象的扁平導體52與高度高的一個以上的扁平導體60鄰接之情形中使用圖案B,在除此之外的情形中則使用圖案A。具體而言,以銷號碼「A-1」來識別之扁平導體52的一對係與兩個扁平導體60鄰接,並使用圖案B進行熔接加工。以銷號碼「A-2」來識別之扁平導體52的一對係與一個扁平導體60鄰接,並使用圖案B進行熔接加工。由於以銷號碼「A-3」來識別之扁平導體52的一對係未與扁平導體60鄰接,因此使用圖案A進行熔接加工。 (3)雷射加工裝置1的動作 在此,使用圖45的流程圖來說明本實施形態的雷射加工裝置1的動作。首先,在已經將被加工物W設置於工件設置台11的狀態下開始。 In the present embodiment, pattern B is used when the flat conductor 52 to be welded is adjacent to one or more high flat conductors 60, and pattern A is used in other cases. Specifically, a pair of flat conductors 52 identified by pin number "A-1" is adjacent to two flat conductors 60, and is welded using pattern B. A pair of flat conductors 52 identified by pin number "A-2" is adjacent to one flat conductor 60, and is welded using pattern B. Since a pair of flat conductors 52 identified by pin number "A-3" is not adjacent to a flat conductor 60, pattern A is used for welding. (3) Operation of laser processing device 1 Here, the operation of the laser processing device 1 of the present embodiment is explained using the flowchart of FIG. 45. First, start with the workpiece W already set on the workpiece setting table 11.

經由控制個人電腦22的輸入部203輸入與被設置於工件設置台22的被加工物W對應的圖案表(步驟S51)。接著,經由控制個人電腦22的輸入部203輸入被加工物W的熔接加工所需要的描繪圖案(圖案A、圖案B等)(步驟S52)。步驟S51以及步驟S52的順序亦可相反。 接著,從控制個人電腦22朝雷射控制器14發送第一振盪器2以及第二振盪器3的各種參數,雷射控制器14係對各個振盪器設定參數(步驟S53)。此外,從控制個人電腦22朝混合式振鏡掃描器10轉送在熔接加工中所使用的描繪圖案(圖案A、圖案B等)。 The pattern table corresponding to the workpiece W set on the workpiece setting table 22 is input through the input unit 203 of the control personal computer 22 (step S51). Then, the drawing pattern (pattern A, pattern B, etc.) required for the welding process of the workpiece W is input through the input unit 203 of the control personal computer 22 (step S52). The order of step S51 and step S52 can also be reversed. Then, various parameters of the first oscillator 2 and the second oscillator 3 are sent from the control personal computer 22 to the laser controller 14, and the laser controller 14 sets the parameters for each oscillator (step S53). In addition, the drawing pattern (pattern A, pattern B, etc.) used in the welding process is transferred from the control personal computer 22 to the hybrid galvanometer scanner 10.

接著,以混合式振鏡掃描器10與被加工物W中的混合式振鏡掃描器10的涵蓋範圍的中心對向之方式使工件設置台11動作,從而使被加工物W移動(步驟S54)。接著,使混合式振鏡掃描器10的照射位置對合至記載於圖案表的第一列的扁平導體52。至此為止的步驟為熔接加工的先前準備,以下開始被加工物W的熔接加工。 控制個人電腦22的加工處理部211係參照儲存於記憶部202的圖案表,判定與目前成為熔接對象的扁平導體52對應的描繪圖案是圖案A還是圖案B(步驟S56)。加工控制部211係朝混合式振鏡掃描器10發送加工動作指令,該加工動作指令係包含用以識別已經判別過的加工圖案之資訊。 Next, the workpiece setting table 11 is moved in such a manner that the hybrid galvanometer scanner 10 and the center of the coverage range of the hybrid galvanometer scanner 10 in the workpiece W are opposite to each other, thereby moving the workpiece W (step S54). Next, the irradiation position of the hybrid galvanometer scanner 10 is aligned with the flat conductor 52 recorded in the first row of the pattern table. The steps so far are the previous preparations for the welding process, and the welding process of the workpiece W is started below. The processing unit 211 of the control personal computer 22 refers to the pattern table stored in the memory unit 202 to determine whether the depicted pattern corresponding to the flat conductor 52 currently being the welding object is pattern A or pattern B (step S56). The processing control unit 211 sends a processing action instruction to the hybrid galvanometer scanner 10, and the processing action instruction includes information for identifying the processing pattern that has been judged.

在圖案A的情形中,亦即在扁平導體52的附近未鄰接有高度高的扁平導體60之情形中,已經接收到加工動作指令的混合式振鏡掃描器10係選擇圖案A(步驟S57)。在圖案B的情形中,亦即在扁平導體52的附近鄰接有高度高的扁平導體60之情形中,混合式振鏡掃描器10係選擇圖案B(步驟S58)。 之後,從 PLC13對第一振盪器2以及第二振盪器3發送雷射照射指令。已經接收到雷射照射指令的第一振盪器2以及第二振盪器3係分別照射第一雷射光L1以及第二雷射光L2(步驟S59)。如實施形態一所說明般,步驟S59的雷射照射為由第一步驟、第二步驟以及第三步驟所構成的三個步驟的雷射照射。亦即,步驟S59的雷射照射亦可因應屬於熔接對象的一對扁平導體52的配置狀況(間距、位置偏離、段差等)來進行實施形態一所說明的控制。 In the case of pattern A, that is, in the case where there is no high flat conductor 60 adjacent to the flat conductor 52, the hybrid oscillator scanner 10 that has received the processing action instruction selects pattern A (step S57). In the case of pattern B, that is, in the case where there is a high flat conductor 60 adjacent to the flat conductor 52, the hybrid oscillator scanner 10 selects pattern B (step S58). Afterwards, a laser irradiation instruction is sent from PLC13 to the first oscillator 2 and the second oscillator 3. The first oscillator 2 and the second oscillator 3 that have received the laser irradiation instruction irradiate the first laser light L1 and the second laser light L2 respectively (step S59). As described in the first embodiment, the laser irradiation of step S59 is a three-step laser irradiation consisting of the first step, the second step, and the third step. That is, the laser irradiation of step S59 can also be controlled as described in the first embodiment according to the configuration conditions (spacing, position deviation, step difference, etc.) of a pair of flat conductors 52 to be welded.

混合式振鏡掃描器10係將照射位置對合至屬於下一個熔接對象的扁平導體52(步驟S60)。 在本實施形態中,設想混合式振鏡掃描器10的動作範圍為被加工物W的大小的四分之一左右之情形。因此,雷射加工裝置係一邊藉由θ軸台11θ使被加工物W每次旋轉四分之一,一邊進行被加工物W的整體的熔接加工。 在步驟S60之後,加工處理部211係判斷是否已經完成被加工物W的四分之一的加工(步驟S61)。在尚未完成四分之一的加工之情形中(在步驟S61中為否),返回至步驟S55並繼續處理。 The hybrid galvanometer scanner 10 matches the irradiation position to the flat conductor 52 that is the next welding object (step S60). In this embodiment, it is assumed that the range of motion of the hybrid galvanometer scanner 10 is about one-fourth of the size of the workpiece W. Therefore, the laser processing device performs the welding process of the entire workpiece W while rotating the workpiece W by one-fourth each time by the θ-axis table 11θ. After step S60, the processing unit 211 determines whether one-fourth of the workpiece W has been processed (step S61). If one-fourth of the processing has not been completed (no in step S61), return to step S55 and continue processing.

在完成被加工物W的四分之一的加工之情形中(在步驟S61中為是),加工處理部211係判斷是否已經完成整體加工(步驟S62)。在尚未完成被加工物W的整體加工之情形中(在步驟S62中為否),加工處理部211係經由PLC13對θ軸台11θ指示將被加工物W旋轉四分之一。θ軸台11θ係驅動旋轉機構並使台旋轉四分之一(步驟S63)。之後,返回至步驟S55並繼續處理。 在完成被加工物W的整體加工之情形中(在步驟S62中為是),雷射加工裝置係結束被加工物W的熔接加工。 When the processing of one quarter of the workpiece W is completed (yes in step S61), the processing unit 211 determines whether the overall processing has been completed (step S62). When the overall processing of the workpiece W is not completed (no in step S62), the processing unit 211 instructs the θ-axis table 11θ to rotate the workpiece W by one quarter through PLC13. The θ-axis table 11θ drives the rotating mechanism and rotates the table by one quarter (step S63). After that, it returns to step S55 and continues processing. When the overall processing of the workpiece W is completed (yes in step S62), the laser processing device ends the welding processing of the workpiece W.

(4)實施形態二的功效 如上所述,本實施形態的雷射加工裝置係因應屬於熔接對象的扁平導體52的附近的狀況,一邊切換描繪圖案一邊進行定子50的整體的熔接處理。具體而言,在附近存在有屬於高的銷的扁平導體60之情形中,以不會受到熔融球所造成的反射光的影響之描繪圖案來照射雷射光;在附近未存在有扁平導體60之情形中,以熔融效率最高的描繪圖案來照射雷射光。藉此,能夠避免反射光的損傷並縮短產距時間。 (4) Effect of the second embodiment As described above, the laser processing device of this embodiment switches the drawing pattern while performing the welding process of the stator 50 as a whole according to the situation near the flat conductor 52 to be welded. Specifically, when there is a flat conductor 60 with a high pin nearby, the laser light is irradiated with a drawing pattern that will not be affected by the reflected light caused by the molten ball; when there is no flat conductor 60 nearby, the laser light is irradiated with a drawing pattern with the highest melting efficiency. In this way, it is possible to avoid damage caused by reflected light and shorten the production time.

此外,在被加工物W被變更至具有與定子50不同的銷的排列的定子之情形中,只要將與變更後的定子對應的圖案表以及描繪圖案輸入至控制個人電腦11即可。藉此,不論是何種銷的排列的定子,皆能夠避免反射光的損傷並縮短產距時間。 (5)變化例 在上述實施形態二中,說明了經由控制個人電腦22的輸入部203預先將與被加工物W的銷排列對應的描繪圖案以及圖案表儲存於記憶部202的實施形態。 Furthermore, in the case where the workpiece W is changed to a stator having a pin arrangement different from that of the stator 50, it is sufficient to input the pattern table and the drawing pattern corresponding to the changed stator into the control personal computer 11. In this way, regardless of the stator having any pin arrangement, damage caused by reflected light can be avoided and the production time can be shortened. (5) Variation In the above-mentioned second embodiment, an embodiment is described in which the drawing pattern and the pattern table corresponding to the pin arrangement of the workpiece W are stored in the memory unit 202 in advance via the input unit 203 of the control personal computer 22.

在此,說明下述變化例:圖像處理部9係解析被加工物W的銷排列,並生成描繪圖案以及圖案表。如實施形態一所說明般,圖像處理部9係具有下述功能:拍攝載置於工件設置台11的被加工物W,並解析被加工物W的銷排列。亦即,圖像處理部9係能判別於屬於熔接對象的扁平導體52的附近是否鄰接有高度高的扁平導體60。圖像處理部9係將解析結果發送至控制個人電腦22。 圖46為顯示變化例的控制個人電腦23的功能構成之方塊圖。與控制個人電腦22(圖38)的差異點在於:控制部201除了包含加工處理部211之外,還包含描繪圖案生成部212以及圖案表生成部213。 Here, the following variation is described: the image processing unit 9 analyzes the pin arrangement of the workpiece W and generates a drawing pattern and a pattern table. As described in the first embodiment, the image processing unit 9 has the following functions: photographing the workpiece W placed on the workpiece setting table 11 and analyzing the pin arrangement of the workpiece W. That is, the image processing unit 9 can determine whether a high flat conductor 60 is adjacent to the flat conductor 52 that is the welding object. The image processing unit 9 sends the analysis result to the control personal computer 22. Figure 46 is a block diagram showing the functional structure of the control personal computer 23 of the variation. The difference from the control personal computer 22 (Figure 38) is that the control unit 201 includes a drawing pattern generation unit 212 and a pattern table generation unit 213 in addition to the processing unit 211.

加工處理部211為用以負責被加工物W的熔接處理的控制之功能方塊;描繪圖案生成部212為用以使用圖像處理部9所為的解析結果來生成描繪圖案之功能方塊;圖案表生成部213為用以使用圖像處理部9所為的解析結果來生成圖案表之功能方塊。具體而言,這些功能方塊係藉由電腦程式來實現。 在此,使用圖47以及圖48的流程圖來說明變化例的雷射加工裝置的動作。首先,在已經將被加工物W設置於工件設置台11的狀態下開始。 The processing unit 211 is a functional block responsible for controlling the welding process of the workpiece W; the drawing pattern generating unit 212 is a functional block for generating a drawing pattern using the analysis result of the image processing unit 9; the pattern table generating unit 213 is a functional block for generating a pattern table using the analysis result of the image processing unit 9. Specifically, these functional blocks are implemented by computer programs. Here, the operation of the laser processing device of the variation example is explained using the flowcharts of Figures 47 and 48. First, the process starts with the workpiece W being set on the workpiece setting table 11.

圖像處理部9係拍攝被加工物W的圖像(步驟S71)。圖像處理部9係將在步驟S71中所拍攝的圖像作為基準來解析被加工物W的銷排列(步驟S72),並將解析結果朝控制個人電腦23發送。解析結果亦可以座標表113的形式朝控制個人電腦23發送。 控制個人電腦23的圖案表生成部213係使用圖像處理部9所為的被加工物W的解析結果,生成已經將銷號碼與描繪圖案賦予對應的圖案表,該銷號碼係顯示屬於熔接對象的一對扁平導體52的位置(步驟S73)。圖案表生成部213係將所生成的圖案表儲存於記憶部202。 The image processing unit 9 takes an image of the workpiece W (step S71). The image processing unit 9 uses the image taken in step S71 as a reference to analyze the pin arrangement of the workpiece W (step S72), and sends the analysis result to the control personal computer 23. The analysis result can also be sent to the control personal computer 23 in the form of a coordinate table 113. The pattern table generation unit 213 of the control personal computer 23 uses the analysis result of the workpiece W by the image processing unit 9 to generate a pattern table in which the pin number and the depicted pattern are associated, and the pin number shows the position of a pair of flat conductors 52 that are the welding objects (step S73). The pattern table generation unit 213 stores the generated pattern table in the memory unit 202.

接著,描繪圖案生成部212係使用圖像處理部9所為的被加工物W的解析結果生成描繪圖案(步驟S74)。具體而言,如圖41所說明般,根據屬於熔接對象的扁平導體52與高度高的扁平導體60之間的位置關係以及各個銷的大小等來規定禁止照射區域,並生成已經將禁止照射區域排除的描繪圖案(圖案B以及圖案C等)。再者,描繪圖案生成部212係生成屬於描繪圖案的圖案A,圖案A係使用於扁平導體52未鄰接有高度高的扁平導體60之情形。描繪圖案生成部212係將所生成的描繪圖案朝混合式振鏡掃描器10轉送。此外,步驟S73與步驟S74的順序亦可相反。Next, the drawing pattern generating unit 212 generates a drawing pattern using the analysis result of the workpiece W by the image processing unit 9 (step S74). Specifically, as shown in FIG. 41, the prohibited irradiation area is defined based on the positional relationship between the flat conductor 52 to be welded and the tall flat conductor 60 and the size of each pin, and a drawing pattern (pattern B and pattern C, etc.) is generated that excludes the prohibited irradiation area. Furthermore, the drawing pattern generating unit 212 generates pattern A belonging to the drawing pattern, and pattern A is used when the flat conductor 52 is not adjacent to the tall flat conductor 60. The drawing pattern generating unit 212 transfers the generated drawing pattern to the hybrid galvanometer scanner 10. In addition, the order of step S73 and step S74 may be reversed.

接著,從控制個人電腦23朝雷射控制器14發送第一振盪器2以及第二振盪器3的各種參數,雷射控制器14係對各個振盪器設定參數(步驟S75)。 接著,以記載於圖案表的第一列的扁平導體52與混合式振鏡掃描器10對向之方式使工件設置台11動作,從而使被加工物W移動(步驟S76)。至此為止的步驟為熔接加工的先前準備,以下開始被加工物W的熔接加工。 控制個人電腦23的加工處理部211係參照儲存於記憶部202的圖案表,判定與目前成為熔接對象的扁平導體52對應的描繪圖案是圖案A還是圖案B(步驟S77)。加工控制部211係朝混合式振鏡掃描器10發送加工動作指令,該加工動作指令係包含用以識別已經判別過的加工圖案之資訊。 Next, various parameters of the first oscillator 2 and the second oscillator 3 are sent from the control personal computer 23 to the laser controller 14, and the laser controller 14 sets the parameters for each oscillator (step S75). Next, the workpiece setting table 11 is moved in such a way that the flat conductor 52 recorded in the first row of the pattern table faces the hybrid galvanometer scanner 10, thereby moving the workpiece W (step S76). The steps so far are the previous preparations for the welding process, and the welding process of the workpiece W is started below. The processing unit 211 of the control personal computer 23 refers to the pattern table stored in the memory unit 202 to determine whether the drawing pattern corresponding to the flat conductor 52 currently being the welding object is pattern A or pattern B (step S77). The processing control unit 211 sends a processing action instruction to the hybrid galvanometer scanner 10, and the processing action instruction includes information for identifying the processing pattern that has been identified.

在圖案A的情形中,亦即在扁平導體52的附近未鄰接有高度高的扁平導體60之情形中,已經接收到加工動作指令的混合式振鏡掃描器10係選擇圖案A(步驟S79)。在圖案B的情形中,亦即在扁平導體52的附近鄰接有高度高的扁平導體60之情形中,混合式振鏡掃描器10係選擇圖案B(步驟S80)。 之後,從 PLC13對第一振盪器2以及第二振盪器3發送雷射照射指令。已經接收到雷射照射指令的第一振盪器2以及第二振盪器3係分別照射第一雷射光L1以及第二雷射光L2(步驟S81)。 In the case of pattern A, that is, when there is no high flat conductor 60 adjacent to the flat conductor 52, the hybrid oscillator scanner 10 that has received the processing action instruction selects pattern A (step S79). In the case of pattern B, that is, when there is a high flat conductor 60 adjacent to the flat conductor 52, the hybrid oscillator scanner 10 selects pattern B (step S80). Afterwards, a laser irradiation instruction is sent from PLC13 to the first oscillator 2 and the second oscillator 3. The first oscillator 2 and the second oscillator 3 that have received the laser irradiation instruction irradiate the first laser light L1 and the second laser light L2 respectively (step S81).

步驟S81的雷射照射係使用由實施形態一所說明的三個步驟所構成的熔接方法。此外,如上文所說明般,亦可因應屬於熔接對象的一對扁平導體52的配置狀況來控制雷射照射時間以及雷射照射位置。混合式振鏡掃描器10係將照射位置對合至屬於下一個熔接對象的扁平導體52(步驟S82)。 在步驟S82之後,加工處理部211係判斷是否已經完成被加工物W的四分之一的加工(步驟S83)。在尚未完成四分之一的加工之情形中(在步驟S83中為否),返回至步驟S77並繼續處理。 The laser irradiation of step S81 uses the welding method consisting of the three steps described in the first embodiment. In addition, as described above, the laser irradiation time and the laser irradiation position can also be controlled according to the configuration of a pair of flat conductors 52 that are welding objects. The hybrid galvanometer scanner 10 matches the irradiation position to the flat conductor 52 that is the next welding object (step S82). After step S82, the processing unit 211 determines whether one quarter of the processing of the object W has been completed (step S83). In the case where one quarter of the processing has not been completed (no in step S83), return to step S77 and continue processing.

在完成被加工物W的四分之一的加工之情形中(在步驟S83中為是),加工處理部211係判斷是否已經完成整體加工(步驟S84)。在尚未完成被加工物W的整體加工之情形中(在步驟S84中為否),加工處理部211係經由PLC13對工件設置台11指示將被加工物W旋轉四分之一。已經從PLC13接收到指示的工件設置台11係驅動旋轉機構(θ軸台11θ)並使台旋轉四分之一(步驟S85)。之後,返回至步驟S77並繼續處理。 在完成被加工物W的整體加工之情形中(在步驟S84中為是),雷射加工裝置係結束被加工物W的熔接加工。 When the processing of one quarter of the workpiece W is completed (yes in step S83), the processing unit 211 determines whether the overall processing has been completed (step S84). When the overall processing of the workpiece W is not completed (no in step S84), the processing unit 211 instructs the workpiece setting table 11 to rotate the workpiece W by one quarter through PLC13. The workpiece setting table 11, which has received the instruction from PLC13, drives the rotating mechanism (θ-axis table 11θ) and rotates the table by one quarter (step S85). After that, it returns to step S77 and continues processing. When the overall processing of the workpiece W is completed (yes in step S84), the laser processing device ends the welding processing of the workpiece W.

如以上所說明般,在變化例的雷射加工裝置中,除了在實施形態二中所說明的功能之外,還藉由圖像處理部9解析屬於熔接對象的扁平導體52的附近的狀況。控制個人電腦23係基於解析結果來生成描繪圖案或者圖案表。 依據本變化例,即使在已經變更被加工物W之情形中,亦無須輸入與變更後的被加工物W對應的描繪圖案以及圖案表。 此外,扁平導體52以及扁平導體60的排列為一例,當然亦可為其他的排列。針對屬於熔接對象的扁平導體52,不論在哪個位置鄰接有扁平導體60,亦能夠規定圖41所示的禁止照射區域,藉此能夠以熔融球所致使的反射光不會照射至接近的全部的扁平導體60之方式進行熔接加工。 As described above, in the laser processing device of the variation, in addition to the functions described in the second embodiment, the image processing unit 9 analyzes the conditions near the flat conductor 52 to be welded. The control personal computer 23 generates a drawing pattern or a pattern table based on the analysis result. According to this variation, even if the object W to be processed has been changed, it is not necessary to input the drawing pattern and the pattern table corresponding to the changed object W to be processed. In addition, the arrangement of the flat conductor 52 and the flat conductor 60 is an example, and other arrangements are of course possible. For the flat conductor 52 to be welded, no matter where the flat conductor 60 is adjacent, the prohibited irradiation area shown in FIG. 41 can be specified, so that the welding process can be performed in a manner that the reflected light caused by the molten ball does not irradiate all the adjacent flat conductors 60.

例如,如圖49所示,考量屬於熔接對象的扁平導體52的四方被高度高的扁平導體60圍繞之情形等。在此種情形中,如圖示的軌跡I4般,於傾斜方向往復照射,藉此能夠以熔融球所致使的反射光不會照射至接近的四個扁平導體60的全部之方式進行熔接加工。 [其他的變化例] (1)在上述實施形態一以及實施形態二中,雷射加工裝置亦可具備:遮蔽氣體(shielding gas)噴嘴,係對被加工物W供給遮蔽氣體。而且,與第一雷射光L1以及第二雷射光L2的照射同時,或者從第一雷射光L1以及第二雷射光L2的照射之前至照射結束為止或者是更長的時間,以5L/min至100L/min對熔接面噴吹屬於遮蔽氣體的氮。更佳為,以10L/min至40L/min噴吹,並在氮氛圍(nitrogen atmosphere)中進行熔接加工。 For example, as shown in FIG. 49, consider a case where the four sides of the flat conductor 52 to be welded are surrounded by the high flat conductors 60. In this case, by reciprocating the irradiation in the oblique direction as shown in the trajectory I4, the welding process can be performed in a manner that the reflected light caused by the molten ball does not irradiate all of the four adjacent flat conductors 60. [Other Variations] (1) In the above-mentioned embodiment 1 and embodiment 2, the laser processing device may also have: a shielding gas nozzle that supplies shielding gas to the workpiece W. Moreover, nitrogen as a shielding gas is sprayed on the weld surface at 5L/min to 100L/min at the same time as the irradiation of the first laser light L1 and the second laser light L2, or from before the irradiation of the first laser light L1 and the second laser light L2 to the end of the irradiation or for a longer period of time. More preferably, the welding process is performed in a nitrogen atmosphere while blowing at 10L/min to 40L/min.

例如,亦可使用兩隻遮蔽氣體噴嘴從被加工物W的左右噴吹氮。各個遮蔽氣體噴嘴相對於被加工物W之角度係相對於端面的傾斜角度為0°至90°。為了不與混合式振鏡掃描器10的動作干擾,更佳為30°左右。遮蔽氣體噴嘴的前端開口的直徑(噴嘴尖口(nozzle tip)直徑)係較佳為1mm至10mm左右。此外,屬於從遮蔽氣體噴嘴的前端開口至被加工物W為止的距離之工作距離(working distance)係較佳為5mm至15mm左右。 如此,以遮蔽氣體噴嘴對被加工物W供給氮,藉此雷射加工裝置1係在氮氛圍中進行被加工物W的熔接。藉由遮蔽氣體防止熔接面的氧化,藉此能夠抑制因為熔接面的氧化所產生的熔接強度的降低以及孔隙率的產生。再者,適當地選擇遮蔽氣體的流量、噴嘴尖口直徑、工作距離等條件,藉此能夠抑制熔融球的晃動並形成漂亮的熔融球。 For example, two shielding gas nozzles can be used to spray nitrogen from the left and right sides of the workpiece W. The angle of each shielding gas nozzle relative to the workpiece W is an inclination angle of 0° to 90° relative to the end face. In order not to interfere with the operation of the hybrid galvanometer scanner 10, it is preferably about 30°. The diameter of the front opening of the shielding gas nozzle (nozzle tip diameter) is preferably about 1mm to 10mm. In addition, the working distance (working distance) from the front opening of the shielding gas nozzle to the workpiece W is preferably about 5mm to 15mm. In this way, nitrogen is supplied to the workpiece W through the shielding gas nozzle, so that the laser processing device 1 performs welding of the workpiece W in a nitrogen atmosphere. The shielding gas prevents oxidation of the welding surface, thereby suppressing the reduction of welding strength and the generation of porosity caused by oxidation of the welding surface. Furthermore, by appropriately selecting conditions such as the flow rate of the shielding gas, the nozzle tip diameter, and the working distance, the shaking of the molten ball can be suppressed and a beautiful molten ball can be formed.

此外,亦可構成為具備氣刀(air knife),以取代遮蔽氣體的噴吹。 (2)在上述實施形態一以及實施形態二中,第一步驟的雷射照射的軌跡並未限定於直線往復照射。在第一步驟以及第二步驟中,亦可對各個扁平導體52的端面52a進行圓形的迴旋照射,亦可對各個扁平導體52的端面52a進行橢圓形的迴旋照射。較佳為以適合扁平導體52的端面的大小、形狀之照射。例如,在對矩形的端面52a進行橢圓形的迴旋照射之情形中,較佳為以矩形的長邊方向變成橢圓形的長徑之方式進行照射。藉此,能夠有效地對端面52a賦予熱能從而促進熔融。 In addition, it is also possible to configure an air knife to replace the shielding gas blowing. (2) In the above-mentioned embodiment 1 and embodiment 2, the trajectory of the laser irradiation in the first step is not limited to straight reciprocating irradiation. In the first step and the second step, the end face 52a of each flat conductor 52 can also be subjected to circular irradiation, and the end face 52a of each flat conductor 52 can also be subjected to elliptical irradiation. It is preferable to irradiate with a size and shape suitable for the end face of the flat conductor 52. For example, in the case of elliptical irradiation of the rectangular end face 52a, it is preferable to irradiate in a manner such that the long side direction of the rectangle becomes the long diameter of the ellipse. Thereby, heat energy can be effectively imparted to the end face 52a to promote melting.

(3)在上述實施形態一中以下述情形作為例子進行了說明:一對扁平線52係於x軸方向存在間距,且於y軸方向存在位置偏離,並於θ方向旋轉。說明除此之外的位置偏離的情形的第三步驟的掃描軌跡。圖33中的(a)係顯示於x軸方向空著間隙之情形的第三步驟的掃描軌跡。圖33中的(b)係顯示於y軸方向存在有位置偏離之情形的第三步驟的掃描軌跡。 在所有情形中,皆以使已經登錄的加工圖形資料1100(8字形狀)的中心點配合AB銷座標且進一步地通過A銷座標以及B銷座標之方式使加工圖形資料1100旋轉以及/或者伸縮。藉此,能以與各種A銷以及B銷的配置狀況相應的掃描軌跡來照射雷射光。 (3) In the above-mentioned first embodiment, the following situation is used as an example for explanation: a pair of flat wires 52 are spaced apart in the x-axis direction, are positionally offset in the y-axis direction, and rotate in the θ direction. The scanning trajectory of the third step for other positional offsets is explained. (a) in FIG. 33 shows the scanning trajectory of the third step for a situation where there is a gap in the x-axis direction. (b) in FIG. 33 shows the scanning trajectory of the third step for a situation where there is a positional offset in the y-axis direction. In all cases, the center point of the registered processing graphic data 1100 (8-shaped) is matched with the AB pin coordinates and the processing graphic data 1100 is further rotated and/or stretched by the A pin coordinates and the B pin coordinates. This allows laser light to be irradiated with a scanning trajectory corresponding to the configuration of various A pins and B pins.

(4)在上述實施形態一中,雖然第三步驟的雷射掃描軌跡為8字形狀,然而此僅為一例,並未限定於8字形狀。第三步驟係只要能實現下述處理即可:在至少在第一步驟以及第二步驟中所形成的A銷以及B銷的各個熔融部結合的狀態下,藉由通過已經結合的熔融部的中心附近的掃描軌跡將熔融部攪拌並均勻化。 例如,如圖33中的(c)、(d)、(e)所示,第三步驟的掃描軌跡亦可為跨越A銷以及B銷之直線往復照射。在此種情形中,預先將顯示直線之加工圖形資料登錄至控制個人電腦12的記憶部202,控制部201係因應各種一對的配置狀況修正已經登錄的加工圖形資料。具體而言,以使直線的中心點配合AB銷座標且直線的始點以及終點配合A銷座標以及B銷座標之方式使直線於θ方向旋轉且於x軸方向伸縮。藉此,能實現與各種一對的配置狀況相應的直線往復照射。 (4) In the first embodiment, although the laser scanning trajectory of the third step is in the shape of an 8, this is only an example and is not limited to the 8 shape. The third step can be performed as long as the following processing can be achieved: when the molten parts of the A pin and the B pin formed in at least the first step and the second step are combined, the molten parts are stirred and homogenized by passing through the scanning trajectory near the center of the combined molten parts. For example, as shown in (c), (d), and (e) in Figure 33, the scanning trajectory of the third step can also be a straight reciprocating irradiation across the A pin and the B pin. In this case, the processing graphic data showing the straight line is pre-registered in the memory unit 202 of the control personal computer 12, and the control unit 201 modifies the registered processing graphic data according to the configuration conditions of each pair. Specifically, the straight line is rotated in the θ direction and stretched in the x-axis direction in such a way that the center point of the straight line matches the AB pin coordinates and the starting point and the end point of the straight line match the A pin coordinates and the B pin coordinates. In this way, reciprocating straight line irradiation corresponding to the configuration conditions of each pair can be realized.

在一對扁平線52於x軸方向、y軸方向、θ旋轉方向存在間距或者存在位置偏離之情形中,設想藉由第一步驟以及第二步驟的照射所結合的熔融部的面積變小。即使在此種熔融部的面積變小之情形中,亦以通過熔融部的中心附近的掃描軌跡來照射雷射光,藉此抑制雷射光從間隙洩漏。藉此,能抑制對扁平導體下部的被覆部照射雷射光從而導致產生碳化以及絕緣不良。In the case where a pair of flat wires 52 is spaced apart or deviated in position in the x-axis direction, the y-axis direction, or the θ rotation direction, it is assumed that the area of the molten portion connected by the irradiation of the first step and the second step becomes smaller. Even in the case where the area of the molten portion becomes smaller, the laser light is irradiated with a scanning track passing through the center of the molten portion to suppress the leakage of the laser light from the gap. In this way, it is possible to suppress the carbonization and poor insulation caused by irradiating the coating portion at the bottom of the flat conductor with laser light.

(5)如上述實施形態一所說明般,當在被加工物W上產生急劇的溫度上升時會發生濺射。因此,亦可不同時照射第一雷射光L1以及第二雷射光L2,而是先對被加工物W僅照射吸收率高的第一雷射光L1,在經過預定時間後再追加地照射第二雷射光L2。藉此,能抑制被加工物W的急遽的溫度上升,從而抑制濺射的發生。再者,已經藉由第一雷射光L1提高溫度的被加工物W係能藉由提高第二雷射光L2的波長的吸收率從而使被加工物W有效率地吸收第二雷射光L2的能量,從而助於縮短處理時間。在此種情形中,期望在照射第一雷射光L1後延遲1msec以上再照射第二雷射光L2。(5) As described in the first embodiment, when a rapid temperature rise occurs on the workpiece W, sputtering will occur. Therefore, instead of irradiating the first laser light L1 and the second laser light L2 simultaneously, the workpiece W may be irradiated with only the first laser light L1 having a high absorption rate, and then the second laser light L2 may be additionally irradiated after a predetermined time. In this way, a rapid temperature rise of the workpiece W can be suppressed, thereby suppressing the occurrence of sputtering. Furthermore, the workpiece W whose temperature has been raised by the first laser light L1 can efficiently absorb the energy of the second laser light L2 by increasing the absorption rate of the wavelength of the second laser light L2, thereby helping to shorten the processing time. In this case, it is desirable to irradiate the second laser light L2 after a delay of more than 1 msec after irradiating the first laser light L1.

(6)在實施形態一以及實施形態二中,第一雷射光L1的聚光直徑d1並未限定於1050μm。能夠以第一雷射光L1的照射區域的面積(聚光面積、點面積)成為被加工物W的總面積的1%至30%之方式選擇聚光直徑d1。 此外,第二雷射光L2的聚光直徑d2亦未限定於40μm。第二雷射光L2的聚光直徑d2係能夠設定成10μm至100μm左右,較佳為設定成第一雷射光L1的聚光直徑d1的十分之一以下。 各個雷射光的聚光直徑係取決於傳送光纖的芯直徑、準直透鏡(collimated lens)的焦點距離、聚光透鏡的焦點距離,並能以下述方式來計算:聚光直徑=傳送光纖的芯直徑×(聚光透鏡的焦點距離/準直透鏡的焦點距離)。因此,調整這些光學系統,藉此能夠變更各種雷射光的聚光直徑。 (6) In the first and second embodiments, the focusing diameter d1 of the first laser light L1 is not limited to 1050 μm. The focusing diameter d1 can be selected so that the area of the irradiation region of the first laser light L1 (focusing area, point area) becomes 1% to 30% of the total area of the workpiece W. In addition, the focusing diameter d2 of the second laser light L2 is not limited to 40 μm. The focusing diameter d2 of the second laser light L2 can be set to about 10 μm to 100 μm, and is preferably set to less than one tenth of the focusing diameter d1 of the first laser light L1. The focusing diameter of each laser beam depends on the core diameter of the transmission optical fiber, the focal distance of the collimated lens, and the focal distance of the focusing lens, and can be calculated as follows: focusing diameter = core diameter of the transmission optical fiber × (focal distance of the focusing lens / focal distance of the collimated lens). Therefore, by adjusting these optical systems, the focusing diameter of each laser beam can be changed.

(7)在上述實施形態一以及實施形態二中,雖然第一步驟、第二步驟以及第三步驟中的雷射的功率係相同,然而此為一例。例如,與第一步驟以及第二步驟的處理相比,在第三步驟的處理中亦可將雷射的輸出功率設定成較弱。由於第三步驟為將已經熔融的金屬予以均勻化之處理,因此無須與第一步驟以及第二步驟同等的功率。再者,當在第三步驟中過度地對被加工物W賦予能量時,由於會有雷射從結合部洩漏的可能性,因此亦可降低雷射的輸出功率或者改變焦點,藉此限制賦予至被加工物W的能量。(7) In the above-mentioned first and second embodiments, although the power of the laser in the first step, the second step, and the third step is the same, this is only an example. For example, the output power of the laser may be set to be weaker in the third step than in the first and second steps. Since the third step is a process for homogenizing the molten metal, it is not necessary to use the same power as in the first and second steps. Furthermore, when excessive energy is applied to the workpiece W in the third step, there is a possibility that the laser may leak from the joint. Therefore, the output power of the laser may be reduced or the focus may be changed to limit the energy applied to the workpiece W.

(8)在上述實施形態一以及實施形態二中,雖然已經說明了將第一雷射光L1以及第二雷射光L2的掃描速度設定成500mm/s,然而第一雷射光L1以及第二雷射光L2的掃描速度並未限定於此,只要為100mm/s至1000mm/s的範圍即可。 (9)上述實施形態一以及實施形態二的第一步驟、第二步驟以及第三步驟的照射時間為一例,當然並未限定於上文所說明的照射時間。第一步驟的照射時間只要為形成於端面52a之熔融部的一部分進入至間隙53之時間即可;第二步驟的照射時間只要為形成於端面52a之熔融部的一部分進入至間隙53之時間即可;第三步驟的照射時間只要為已經結合的兩個熔融部均勻化直至形成一個熔融部為止之時間即可。這些照射時間亦可因應屬於熔接對象的扁平導體的尺寸、間隙的間隔等來變更。 (8) In the above-mentioned embodiments 1 and 2, although the scanning speed of the first laser light L1 and the second laser light L2 is set to 500 mm/s, the scanning speed of the first laser light L1 and the second laser light L2 is not limited thereto, and can be in the range of 100 mm/s to 1000 mm/s. (9) The irradiation time of the first step, the second step, and the third step of the above-mentioned embodiments 1 and 2 is an example, and is of course not limited to the irradiation time described above. The irradiation time of the first step only needs to be the time for a part of the molten part formed on the end face 52a to enter the gap 53; the irradiation time of the second step only needs to be the time for a part of the molten part formed on the end face 52a to enter the gap 53; the irradiation time of the third step only needs to be the time for the two molten parts that have been combined to be uniform until one molten part is formed. These irradiation times can also be changed according to the size of the flat conductor to be welded, the interval of the gap, etc.

(10)在上述實施形態中,由於第三步驟為將已經熔融的金屬予以均勻化之處理,因此無須與第一步驟以及第二步驟同等的功率。再者,當在第三步驟中過度地對被加工物W賦予能量時,會有雷射從已經結合的熔融部洩漏的可能性。因此,實施形態一的雷射加工裝置1亦可藉由以下的方法來實現第三步驟的處理。 第一種方法為:將第一雷射光L1以及第二雷射光L2的焦點位置錯開至比熔融部還要上方。藉此,伴隨著聚光直徑的擴大(發散)而使熔接面中的功率密度降低,從而能減少雷射洩漏的風險。 (10) In the above-mentioned embodiment, since the third step is to make the molten metal uniform, the power equivalent to that of the first step and the second step is not required. Furthermore, when excessive energy is given to the workpiece W in the third step, there is a possibility that the laser will leak from the already bonded molten portion. Therefore, the laser processing device 1 of the first embodiment can also achieve the processing of the third step by the following method. The first method is to shift the focal position of the first laser light L1 and the second laser light L2 to above the molten portion. Thereby, the power density in the weld surface is reduced along with the expansion (divergence) of the focusing diameter, thereby reducing the risk of laser leakage.

第二種方法為:與第一步驟以及第二步驟相比,減少第一雷射光L1以及第二雷射光L2的輸出功率。藉此,能使熔接面中的功率密度降低,從而能減少雷射洩漏的風險。 第三種方法為:提升第一雷射光L1以及第二雷射光L2的照射速度。提升照射速度,藉此能減少通過熔接面之雷射光的單位面積以及每單位時間的照射量(輸入熱量(heat input))。藉此,能減少雷射洩漏的風險。 The second method is to reduce the output power of the first laser light L1 and the second laser light L2 compared to the first step and the second step. In this way, the power density in the weld surface can be reduced, thereby reducing the risk of laser leakage. The third method is to increase the irradiation speed of the first laser light L1 and the second laser light L2. Increasing the irradiation speed can reduce the unit area of the laser light passing through the weld surface and the irradiation amount per unit time (heat input). In this way, the risk of laser leakage can be reduced.

(11)在上述實施形態中亦可構成為:設定針對間距量以及偏離量的臨限值,在存在有臨限值以上的間距、位置偏離之情形中,雷射加工裝置1亦可判斷成「錯誤(不可熔接)」並中斷處理,並移行至下一個扁平線52的一對熔接處理。在此種情形中,亦可使控制個人電腦12的記憶部202預先記憶成為「錯誤」的基準之臨限值。圖像處理部9的控制器103或者控制個人電腦12的控制部201係從各個扁平線52的位置資訊(座標值)測定間距量以及偏離量。控制部201亦可將所測定的間距量以及偏離量與記憶於記憶部202的臨限值進行比較。(11) In the above-mentioned embodiment, a critical value for the spacing amount and the deviation amount may be set. When there is a spacing or position deviation exceeding the critical value, the laser processing device 1 may determine that it is an "error (unable to weld)" and interrupt the processing, and then move to the welding process of the next pair of flat wires 52. In this case, the memory unit 202 of the control personal computer 12 may pre-memorize the critical value that serves as a reference for "error". The controller 103 of the image processing unit 9 or the control unit 201 of the control personal computer 12 measures the spacing amount and the deviation amount from the position information (coordinate value) of each flat wire 52. The control unit 201 may also compare the measured distance amount and deviation amount with the critical value stored in the memory unit 202 .

(12)在上述實施形態中,雖然說明了第一雷射光L1為多模且第二雷射光L2為單模,然而此為一例,各個雷射光的光束模式並未限定。 (13)在上述實施形態中,對於高的扁平線52的雷射照射時間係比對於低的扁平線52的雷射照射時間還長,且段差量Δz愈大則差分愈大。如此,雷射加工裝置1係根據雷射照射時間的差異而使被賦予至各個扁平線52的能量不同,然而此種實施形態為一例。本發明的雷射加工裝置1係只要至少將賦予至高的扁平線52的照射能量設定成比賦予至低的扁平線52的照射能量還多即可。 (12) In the above embodiment, although it is described that the first laser light L1 is multi-mode and the second laser light L2 is single-mode, this is an example, and the beam mode of each laser light is not limited. (13) In the above embodiment, the laser irradiation time for the high flat line 52 is longer than the laser irradiation time for the low flat line 52, and the difference is greater as the step difference Δz is greater. In this way, the laser processing device 1 makes the energy given to each flat line 52 different according to the difference in laser irradiation time, but this embodiment is an example. The laser processing device 1 of the present invention only needs to set the irradiation energy given to the high flat line 52 to be greater than the irradiation energy given to the low flat line 52.

此外,當著眼於圖29所示的加工速率表1100的圈選範圍1111時,屬於低的扁平線52的雷射照射時間的58msec係相當於本發明的「基準的能量」,屬於高的扁平線52的雷射照射時間的76msec係相當於本發明的「對基準的照射能量施加了與段差量對應的追加的照射能量」的能量。In addition, when focusing on the circled range 1111 of the processing rate table 1100 shown in Figure 29, the laser irradiation time of 58msec belonging to the low flat line 52 is equivalent to the "standard energy" of the present invention, and the laser irradiation time of 76msec belonging to the high flat line 52 is equivalent to the "additional irradiation energy corresponding to the step amount applied to the standard irradiation energy" of the present invention.

(14)在上述實施形態中,第一雷射光L1以及第二雷射光L2係將焦點對合至被加工物W(熔接面),然而在本發明中第一雷射光L1以及第二雷射光L2亦可接將焦點對合至於鉛直方向與熔接面相距±2mm的範圍的位置。 (15)在上述實施形態中,第一雷射光L1以及第二雷射光L2為圓形光束,然而第一雷射光L1以及第二雷射光L2的光束形狀並未限定於此。例如,亦可使用橢圓形狀的光束或者矩形形狀的光束。在此種情形中,較佳為在矩形的熔接面中將長邊方向作為長徑。 (14) In the above embodiment, the first laser light L1 and the second laser light L2 are focused on the workpiece W (welding surface), but in the present invention, the first laser light L1 and the second laser light L2 can also be focused to a position within a range of ±2 mm from the welding surface in the vertical direction. (15) In the above embodiment, the first laser light L1 and the second laser light L2 are circular beams, but the beam shapes of the first laser light L1 and the second laser light L2 are not limited to this. For example, an elliptical beam or a rectangular beam can also be used. In this case, it is preferred to use the long side direction as the major diameter in the rectangular welding surface.

(16)在上述實施形態一以及實施形態二中,以定子用線圈作為被加工物的例子來做說明。然而,上文所說明的熔接方法以及雷射加工裝置1並未限定於使用於定子用線圈的熔接之情形。 (17)在上述實施形態一以及實施形態二中,使第一雷射光L1的光軸以及第二雷射光L2的光軸一致,並藉由混合式振鏡掃描器10進行掃描。然而,本發明並未限定於此,第一雷射光L1的光軸以及第二雷射光L2的光軸亦可不一致,亦能夠以個別的雷射掃描光學系統(振鏡掃描器)分別進行掃描。亦即,本發明亦可包含下述構成:雷射加工裝置係具備兩個振鏡掃描器,一方的振鏡掃描器係掃描第一雷射光L1,另一方的振鏡掃描器係掃描第二雷射光L2。 (16) In the above-mentioned embodiments 1 and 2, a stator coil is used as an example of a workpiece for explanation. However, the welding method and laser processing device 1 described above are not limited to the case of being used for welding stator coils. (17) In the above-mentioned embodiments 1 and 2, the optical axis of the first laser light L1 and the optical axis of the second laser light L2 are made consistent, and scanning is performed by a hybrid galvanometer scanner 10. However, the present invention is not limited to this, and the optical axis of the first laser light L1 and the optical axis of the second laser light L2 may not be consistent, and they can also be scanned separately by separate laser scanning optical systems (galvanometer scanners). That is, the present invention may also include the following structure: the laser processing device is equipped with two galvanometer scanners, one galvanometer scanner scans the first laser light L1, and the other galvanometer scanner scans the second laser light L2.

(18)在上述雷射加工裝置1中,亦可經由振鏡掃描器個人電腦(控制個人電腦12)的輸入部203輸入第一雷射光L1以及第二雷射光L2各者的聚光直徑、輸出功率、以及第一步驟、第二步驟、第三步驟的照射軌跡、照射時間、照射速度、照射次數等資訊已經預先與被加工物W的尺寸相應的適合值。此外,亦可構成為:當輸入工件尺寸或者熔融球的成品形狀等時,控制個人電腦12的控制部201係依循預定的演算法來決定雷射的聚光直徑、輸出功率、照射軌跡、照射時間、照射速度、照射次數等。(18) In the above-mentioned laser processing device 1, the focusing diameter and output power of each of the first laser light L1 and the second laser light L2, and the irradiation trajectory, irradiation time, irradiation speed, and number of irradiations of the first step, the second step, and the third step can be inputted through the input unit 203 of the galvanometer scanner personal computer (controlling the personal computer 12), and the information can be pre-adapted to the size of the workpiece W. In addition, it can also be configured that when the workpiece size or the finished shape of the molten ball is inputted, the control unit 201 controlling the personal computer 12 determines the focusing diameter, output power, irradiation trajectory, irradiation time, irradiation speed, and number of irradiations of the laser according to a predetermined algorithm.

(19)在上述實施形態二中,設想混合式振鏡掃描器10的可動範圍為被加工物W的大小的四分之一左右之情形。因此,雷射加工裝置係一邊藉由工件設置台11使被加工物W每次旋轉四分之一,一邊進行被加工物W的整體的熔接加工。此時,以混合式振鏡掃描器10的噴嘴與已經將被加工物W分割成四份之區域的略中心對向之方式,藉由工件設置台11調整被加工物W的位置。 假設在混合式振鏡掃描器10的可動範圍能涵蓋被加工物W的整體之情形中,亦可以使混合式振鏡掃描器10的噴嘴與被加工物W的中心對向之方式進行位置對合。 (19) In the above-mentioned second embodiment, it is assumed that the movable range of the hybrid galvanometer scanner 10 is about one-fourth of the size of the workpiece W. Therefore, the laser processing device performs the welding process of the entire workpiece W while rotating the workpiece W by one-fourth each time through the workpiece setting table 11. At this time, the position of the workpiece W is adjusted by the workpiece setting table 11 in such a way that the nozzle of the hybrid galvanometer scanner 10 is opposite to the approximate center of the area that has divided the workpiece W into four parts. Assuming that the movable range of the hybrid galvanometer scanner 10 can cover the entire workpiece W, the position can also be matched in such a way that the nozzle of the hybrid galvanometer scanner 10 is opposite to the center of the workpiece W.

此外,在雷射光被高度高的銷(扁平導體60)阻礙而無法照射至屬於熔接對象的銷(扁平導體52)之情形中,使工件設置台11動作,以使屬於熔接對象的銷(扁平導體52)配置於混合式振鏡掃描器10的噴嘴的略正下方之方式調整位置。 (20)在上述實施形態二以及實施形態二的變化例中,雷射加工裝置係構成為:保持或者作成複數個描繪圖案,並因應扁平導體52附近的狀況來選擇適當的描繪圖案。然而,實施形態二以及實施形態二的變化例的雷射加工裝置所保持或者作成的資訊並未限定於描繪圖案。除了描繪圖案之外,亦可為組合了雷射的照射條件等之熔接圖案。而且,亦可構成為因應扁平導體52附近的狀況來選擇適當的熔接圖案。 In addition, in the case where the laser light is blocked by the high pin (flat conductor 60) and cannot be irradiated to the pin (flat conductor 52) to be welded, the workpiece setting table 11 is moved to adjust the position of the pin (flat conductor 52) to be welded so that it is arranged slightly directly below the nozzle of the hybrid galvanometer scanner 10. (20) In the above-mentioned second embodiment and the variation of the second embodiment, the laser processing device is configured to: maintain or create a plurality of drawing patterns, and select an appropriate drawing pattern according to the conditions near the flat conductor 52. However, the information maintained or created by the laser processing device of the second embodiment and the variation of the second embodiment is not limited to the drawing pattern. In addition to the drawing pattern, it can also be a welding pattern combined with the irradiation conditions of the laser. Furthermore, it is also possible to select an appropriate welding pattern according to the conditions near the flat conductor 52.

作為熔接圖案所含有的雷射的照射條件,例如為雷射的聚光直徑、輸出功率、照射時間、照射速度、照射次數等。 (21)在上述實施形態二中,雖然雷射加工裝置係生成描繪圖案以及圖案表,然而生成描繪圖案之動作並不是必須的。雷射加工裝置亦可基於圖像處理部9的解析結果僅生成圖案表。使用者亦可從控制個人電腦22的輸入部203輸入描繪圖案。 The irradiation conditions of the laser included in the welding pattern include, for example, the focusing diameter of the laser, the output power, the irradiation time, the irradiation speed, the number of irradiations, etc. (21) In the above-mentioned second embodiment, although the laser processing device generates a drawing pattern and a pattern table, the action of generating the drawing pattern is not necessary. The laser processing device can also only generate a pattern table based on the analysis result of the image processing unit 9. The user can also input the drawing pattern from the input unit 203 of the control personal computer 22.

(22)在上述實施形態二以及實施形態二的變化例中,接近扁平導體52之導線為扁平線之構成並不是必須的,當然亦可為其他形狀的導線。此外,接近扁平導體52之構件為導線之構成亦不是必須的,亦可為其他構件。雷射加工裝置只要至少為如下的構成即可:因應屬於熔接對象的一對扁平導體52的周邊狀況從複數個描繪圖案選擇一個描繪圖案,以所選擇的描繪圖案來照射雷射光並進行熔接加工。 (23)在此,作為變化例,使用圖50以及圖51說明於熔接對象的一對扁平線52產生xyθ的位置偏離之情形中(沒有z軸方向的段差之情形中)的熔接處理。 (22) In the above-mentioned second embodiment and the variation of the second embodiment, it is not necessary that the wire close to the flat conductor 52 is a flat wire, and it can be a wire of other shapes. In addition, it is not necessary that the component close to the flat conductor 52 is a wire, and it can be another component. The laser processing device only needs to have at least the following structure: select a drawing pattern from a plurality of drawing patterns according to the peripheral conditions of a pair of flat conductors 52 that are the objects of welding, irradiate laser light with the selected drawing pattern, and perform welding processing. (23) Here, as a variation, Figures 50 and 51 are used to explain the welding process in the case where the position deviation of a pair of flat wires 52 to be welded is generated in the xyθ direction (in the case where there is no step difference in the z-axis direction).

首先,使用者係操作控制個人電腦12的輸入部203輸入加工圖形資料1100,控制個人電腦12係將加工圖形資料1100登錄至記憶部202(步驟S91)。加工圖形資料1100係被使用於第三步驟的雷射照射。 接著,將被加工物W設置於工件設置台11。使載置有被加工物W的工件設置台11移動,從而將被加工物W配置於圖像處理部9的正下方。接著,藉由圖像處理部9的拍攝裝置101進行被加工物W的圖像拍攝(步驟S92)。 First, the user operates the input unit 203 of the control personal computer 12 to input the processing graphic data 1100, and the control personal computer 12 registers the processing graphic data 1100 into the memory unit 202 (step S91). The processing graphic data 1100 is used for laser irradiation in the third step. Then, the workpiece W is set on the workpiece setting table 11. The workpiece setting table 11 carrying the workpiece W is moved, so that the workpiece W is arranged directly below the image processing unit 9. Then, the image of the workpiece W is captured by the shooting device 101 of the image processing unit 9 (step S92).

圖像處理部9的控制器103係解析在步驟S92中所拍攝的被加工物W的圖像,藉此測定被加工物W所含有的全部的扁平線52的座標值(步驟S93)。接著,控制器103係將所測定的座標值記錄於座標表113(步驟S94)。 接著,控制個人電腦12係經由雷射控制器14對第一振盪器2以及第二振盪器3設定雷射參數(步驟S95)。工件設置台11係使被加工物W移動至混合式振鏡掃描器10的正下方。 The controller 103 of the image processing unit 9 analyzes the image of the workpiece W taken in step S92, thereby measuring the coordinate values of all the flat lines 52 contained in the workpiece W (step S93). Then, the controller 103 records the measured coordinate values in the coordinate table 113 (step S94). Then, the control personal computer 12 sets the laser parameters for the first oscillator 2 and the second oscillator 3 through the laser controller 14 (step S95). The workpiece setting table 11 moves the workpiece W to the bottom of the hybrid galvanometer scanner 10.

在本變化例中,設想混合式振鏡掃描器10的可掃描範圍為被加工物W的大小的四分之一左右之情形。因此,雷射加工裝置1係一邊藉由工件設置台11使被加工物W每次旋轉四分之一,一邊進行被加工物W的整體的熔接加工。以下,雷射加工裝置1係對被加工物W的圓周方向的每個四分之一反復從步驟S96至步驟S105為止的處理。再者,雷射加工裝置1係對屬於熔接對象的扁平線52的每一對反復從步驟S97至步驟S103為止的處理。 控制個人電腦12的控制部201係從記憶於圖像處理部9的記憶部104的座標表113取得目前處理中的一對座標值(A銷座標以及B銷座標)(步驟S98)。 In this variation, it is assumed that the scannable range of the hybrid galvanometer scanner 10 is about one-fourth of the size of the workpiece W. Therefore, the laser processing device 1 performs the overall welding of the workpiece W while rotating the workpiece W by one-fourth each time through the workpiece setting table 11. Hereinafter, the laser processing device 1 repeatedly processes from step S96 to step S105 for each quarter of the circumferential direction of the workpiece W. Furthermore, the laser processing device 1 repeatedly processes from step S97 to step S103 for each pair of flat wires 52 that are the welding objects. The control unit 201 controlling the personal computer 12 obtains a pair of coordinate values (pin A coordinates and pin B coordinates) currently being processed from the coordinate table 113 stored in the memory unit 104 of the image processing unit 9 (step S98).

雷射加工裝置1係進行第一步驟(步驟S99)的處理,第一步驟(步驟S99)係用以對一方的扁平線52(A)照射第一雷射光L1以及第二雷射光L2。具體而言,在第一步驟中,從PLC13經由雷射控制器14對第一振盪器2以及第二振盪器3發送雷射照射指令。已經接收到雷射照射指令的第一振盪器2及第二振盪器3係分別照射第一雷射光L1以及第二雷射光L2。大約在同一時間,以將在步驟S98中所取得的A銷座標作為基準,從控制個人電腦12的控制部201對混合式振鏡掃描器10發送控制指令。混合式振鏡掃描器10係因應控制指令來控制掃描位置。The laser processing device 1 performs the processing of the first step (step S99), which is used to irradiate the first laser light L1 and the second laser light L2 to the flat wire 52 (A) on one side. Specifically, in the first step, a laser irradiation instruction is sent from the PLC 13 to the first oscillator 2 and the second oscillator 3 via the laser controller 14. The first oscillator 2 and the second oscillator 3 that have received the laser irradiation instruction irradiate the first laser light L1 and the second laser light L2 respectively. At about the same time, a control instruction is sent from the control unit 201 of the personal computer 12 to the hybrid galvanometer scanner 10 based on the A pin coordinates obtained in step S98. The hybrid galvanometer scanner 10 controls the scanning position in response to the control instruction.

第一步驟的混合式振鏡掃描器10的掃描軌跡為直線往復照射,第一雷射光L1以及第二雷射光L2係於端面52a的預定位置直線往復照射。較佳為,亦可直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。在第一步驟中,持續雷射照射直至A銷的端面52a整體熔融為止。 接著,雷射加工裝置1係進行第二步驟(步驟S100)的處理,第二步驟(步驟S100)係用以對另一者的扁平線52(B)照射第一雷射光L1以及第二雷射光L2。第二步驟的雷射照射亦與第一步驟同樣地,混合式振鏡掃描器10係以在步驟S98中所取得的B銷座標作為基礎來控制掃描位置。第二步驟中的混合式振鏡掃描器10的掃描軌跡為直線往復照射,第一雷射光L1以及第二雷射光L2係直線往復照射端面52a的預定位置。第二步驟亦與第一步驟同樣地,亦可直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。在第二步驟中,持續雷射照射直至B銷的端面52a的整體熔融為止。 The scanning trajectory of the hybrid galvanometer scanner 10 in the first step is straight reciprocating irradiation, and the first laser light L1 and the second laser light L2 are straight reciprocating irradiated at the predetermined position of the end face 52a. Preferably, the position near the butt joint 52b (position close to the spacing) in the end face 52a can also be straight reciprocatingly irradiated. In the first step, the laser irradiation is continued until the end face 52a of the A pin is completely melted. Then, the laser processing device 1 performs the second step (step S100), and the second step (step S100) is used to irradiate the first laser light L1 and the second laser light L2 to the other flat line 52 (B). The laser irradiation in the second step is the same as the first step. The hybrid galvanometer scanner 10 controls the scanning position based on the B pin coordinates obtained in step S98. The scanning trajectory of the hybrid galvanometer scanner 10 in the second step is a straight reciprocating irradiation. The first laser light L1 and the second laser light L2 are straight reciprocating irradiations of the predetermined position of the end face 52a. The second step is also the same as the first step. The position of the end face 52a close to the butt surface 52b (the position close to the spacing) can also be linearly reciprocated. In the second step, the laser irradiation is continued until the end face 52a of the B pin is completely melted.

此外,第一步驟的雷射照射與第二步驟的雷射照射亦可同時進行。 當A銷的熔融部與B銷的熔融部結合時,控制個人電腦12的控制部201係配合A銷以及B銷的配置狀況來修正記憶於記憶部102的加工圖形資料1100(步驟S101)。控制部201係將經過修正的加工圖形資料發送至混合式振鏡掃描器10。之後,使用修正後的加工圖形資料進行第三步驟(步驟S102)的處理,第三步驟(步驟S102)係用以跨越A銷以及B銷照射第一雷射光L1以及第二雷射光L2。藉由第三步驟,再次對A銷以及B銷賦予熱能,將熔融部均勻化從而形成左右對稱的漂亮的熔融球。第三步驟的處理亦可持續至熔融球成為期望的大小為止。 In addition, the laser irradiation of the first step and the laser irradiation of the second step can also be performed simultaneously. When the molten portion of pin A is combined with the molten portion of pin B, the control unit 201 of the personal computer 12 corrects the processing pattern data 1100 stored in the memory unit 102 according to the configuration of pin A and pin B (step S101). The control unit 201 sends the corrected processing pattern data to the hybrid galvanometer scanner 10. Afterwards, the corrected processing pattern data is used to perform the processing of the third step (step S102), which is used to irradiate the first laser light L1 and the second laser light L2 across pin A and pin B. In the third step, heat energy is applied to pins A and B again to make the molten part uniform, thus forming a beautiful symmetrical molten ball. The third step can also be continued until the molten ball reaches the desired size.

針對成為目前處理對象的被加工物W的四分之一所含有的全部的一對扁平線進行熔接處理。此時,因應各個一對的配置狀況,一邊修正第三步驟的掃描軌跡一邊進行熔接加工。當針對被加工物W的四分之一所含有的全部的一對扁平線結束熔接加工時,控制個人電腦12係經由PLC13對工件設置台11指示將被加工物W旋轉四分之一。已經從PLC13接收到指示的工件設置台11係驅動旋轉機構(θ軸台11θ)並使台旋轉四分之一(步驟S104)。接著,返回至步驟S97,持續處理。 雷射加工裝置9係進行被加工物W的各個四分之一的處理,當結束被加工物W所含有的全部的一對扁平線的熔接處理時,結束被加工物W的熔接加工。 The welding process is performed for all pairs of flat wires contained in one quarter of the workpiece W that is currently being processed. At this time, the welding process is performed while correcting the scanning trajectory of the third step according to the configuration status of each pair. When the welding process is completed for all pairs of flat wires contained in one quarter of the workpiece W, the control personal computer 12 instructs the workpiece setting table 11 to rotate the workpiece W by one quarter through PLC13. The workpiece setting table 11, which has received the instruction from PLC13, drives the rotating mechanism (θ-axis table 11θ) and rotates the table by one quarter (step S104). Then, it returns to step S97 and continues the process. The laser processing device 9 processes each quarter of the workpiece W, and when the welding process of all pairs of flat wires contained in the workpiece W is completed, the welding process of the workpiece W is completed.

(24)在此,作為變化例,使用圖52以及圖53說明於屬於熔接對象的一對扁平線52產生z軸方向的段差之情形中(沒有xyθ方向的位置偏離之情形中)的熔接處理。 首先,在已經將被加工物W設置於工件設置台11的狀態下開始。使載置有被加工物W的工件設置台11移動,並使被加工物W配置於圖像處理部9的正下方。接著,藉由圖像處理部9的拍攝裝置101進行被加工物W的圖像拍攝(步驟S111)。 圖像處理部9的控制器103係解析在步驟S111中所拍攝的被加工物W的圖像,藉此測定被加工物W所含有的全部的扁平線52的座標值(步驟S112)。接著,控制器103係將所測定的座標值記錄於座標表113(步驟S113)。 (24) Here, as a variation example, FIG. 52 and FIG. 53 are used to explain the welding process in the case where a pair of flat wires 52 to be welded have a step difference in the z-axis direction (in the case where there is no positional deviation in the xyθ direction). First, the process starts with the workpiece W being set on the workpiece setting table 11. The workpiece setting table 11 carrying the workpiece W is moved, and the workpiece W is arranged directly below the image processing unit 9. Then, the image of the workpiece W is captured by the shooting device 101 of the image processing unit 9 (step S111). The controller 103 of the image processing unit 9 analyzes the image of the workpiece W captured in step S111, thereby measuring the coordinate values of all the flat wires 52 contained in the workpiece W (step S112). Next, the controller 103 records the measured coordinate values in the coordinate table 113 (step S113).

接著,控制個人電腦12係將加工圖形資料發送至混合式振鏡掃描器10,並經由雷射控制器14對第一振盪器2以及第二振盪器3設定雷射參數(步驟S114)。工件設置台11係使被加工物W移動至混合式振鏡掃描器10的正下方(步驟S115)。 在本實施形態中,設想混合式振鏡掃描器10的可掃描範圍為被加工物W的大小的四分之一左右的情形。因此,雷射加工裝置1係一邊藉由工件設置台11使被加工物W每次旋轉四分之一,一邊進行被加工物W的整體的熔接加工。以下,針對被加工物W的圓周方向的每個四分之一反復從步驟S116至步驟S126為止的處理。再者,雷射加工裝置1係針對屬於熔接對象的扁平線52的每一對反復從步驟S117至步驟S125為止的處理。 Next, the control personal computer 12 sends the processing graphic data to the hybrid galvanometer scanner 10, and sets the laser parameters for the first oscillator 2 and the second oscillator 3 through the laser controller 14 (step S114). The workpiece setting table 11 moves the workpiece W to the bottom of the hybrid galvanometer scanner 10 (step S115). In this embodiment, it is assumed that the scannable range of the hybrid galvanometer scanner 10 is about one-fourth of the size of the workpiece W. Therefore, the laser processing device 1 performs the overall welding processing of the workpiece W while rotating the workpiece W by one-fourth each time through the workpiece setting table 11. Hereinafter, the processing from step S116 to step S126 is repeated for each quarter of the circumferential direction of the workpiece W. Furthermore, the laser processing device 1 repeatedly processes from step S117 to step S125 for each pair of flat wires 52 to be welded.

控制個人電腦12的控制部201係從圖像處理部9取得目前處理中的一對段差量Δz以及間距量Δxy(步驟S118)。 控制部201係參照儲存於記憶部202的加工速率表110,取得與在步驟S118中所取得的段差量Δz以及間距量Δxy對應的雷射照射時間。如上所述,加工速率表110係於一個圈選範圍記載有兩個數值,控制部101係取得於上段以及下段所記載的兩個數值。於上段所記載的數值為後述的第一步驟的照射時間,於下段所記載的數值為後述的第二步驟的照射時間(步驟S119)。 The control unit 201 controlling the personal computer 12 obtains a pair of step difference Δz and spacing Δxy currently being processed from the image processing unit 9 (step S118). The control unit 201 refers to the processing rate table 110 stored in the memory unit 202 to obtain the laser irradiation time corresponding to the step difference Δz and spacing Δxy obtained in step S118. As described above, the processing rate table 110 records two values in a circled range, and the control unit 101 obtains the two values recorded in the upper and lower sections. The value recorded in the upper section is the irradiation time of the first step described later, and the value recorded in the lower section is the irradiation time of the second step described later (step S119).

接著,控制個人電腦12的控制部201係判別目前處理中的一對中的哪一個扁平線較高(步驟S120)。此種判斷處理係藉由從圖像處理部9的控制器103接收用以識別高的扁平線之號碼等的資訊來進行,然而亦可藉由控制部201從儲存於圖像處理部9的座標表113讀取座標值來進行。 接著,雷射加工裝置1係進行第一步驟(步驟S121)的處理,第一步驟(步驟S121)係用以對高的銷照射第一雷射光L1以及第二雷射光L2。具體而言,從控制個人電腦12的控制部201對雷射控制器14發送在步驟S119中所取得的雷射照射時間,並對第一振盪器2以及第二振盪器3設定雷射照射時間。再者,從控制部201對混合式振鏡掃描器10發送控制指令,並從PLC13經由雷射控制器14對第一振盪器2以及第二振盪器3發送雷射照射指令。已經接收到雷射照射指令的第一振盪器2以及第二振盪器3係分別照射第一雷射光L1以及第二雷射光L2。 Next, the control unit 201 of the personal computer 12 determines which flat line is higher in the pair currently being processed (step S120). This determination process is performed by receiving information such as the number for identifying the higher flat line from the controller 103 of the image processing unit 9, but it can also be performed by the control unit 201 reading the coordinate value from the coordinate table 113 stored in the image processing unit 9. Next, the laser processing device 1 performs the first step (step S121) of irradiating the higher pin with the first laser light L1 and the second laser light L2. Specifically, the control unit 201 for controlling the personal computer 12 sends the laser irradiation time obtained in step S119 to the laser controller 14, and sets the laser irradiation time for the first oscillator 2 and the second oscillator 3. Furthermore, the control unit 201 sends a control command to the hybrid galvanometer scanner 10, and the laser irradiation command is sent from the PLC 13 to the first oscillator 2 and the second oscillator 3 via the laser controller 14. The first oscillator 2 and the second oscillator 3 that have received the laser irradiation command irradiate the first laser light L1 and the second laser light L2, respectively.

第一步驟中的混合式振鏡掃描器10的掃描軌跡為直線往復照射。當以在步驟S9中所取得的加工速率(照射時間)照射雷射光時,B銷係熔融至A銷的高度的稍微下方為止,並形成有熔融球55b。在此,第一雷射光L1以及第二雷射光L2係直線往復照射端面52a的預定位置,較佳為直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。 接著,雷射加工裝置1係進行第二步驟(步驟S122)的處理,第二步驟(步驟S122)係用以對低的A銷照射雷射光。在第二步驟中,對A銷的熔接面照射第一雷射光L1以及第二雷射光L2。此時的混合式振鏡掃描器10的掃描軌跡係與第一步驟同樣地為直線往復照射。當以在步驟S119中所取得的加工速率(照射時間)照射雷射光時,A銷的端面52a的整體熔融,於A銷形成有熔融球。 The scanning trajectory of the hybrid galvanometer scanner 10 in the first step is a straight reciprocating irradiation. When the laser light is irradiated at the processing rate (irradiation time) obtained in step S9, the B pin is melted to a height slightly below the A pin, and a molten ball 55b is formed. Here, the first laser light L1 and the second laser light L2 are linearly reciprocating irradiated to a predetermined position of the end face 52a, preferably a position (close to the spacing) in the end face 52a close to the butt surface 52b. Then, the laser processing device 1 performs the second step (step S122), and the second step (step S122) is used to irradiate the low A pin with laser light. In the second step, the first laser light L1 and the second laser light L2 are irradiated to the welded surface of the A pin. At this time, the scanning trajectory of the hybrid galvanometer scanner 10 is a straight reciprocating irradiation like the first step. When the laser light is irradiated at the processing rate (irradiation time) obtained in step S119, the entire end surface 52a of the A pin is melted, and a molten ball is formed on the A pin.

此外,第二步驟亦與第一步驟同樣地,亦可直線往復照射端面52a中之靠近對接面52b之位置(接近間距之位置)。如此,對靠近內側處照射雷射光,藉此能縮短熔融部結合為止的時間。 接著,在第三步驟的處理之前,將第一雷射光L1以及第二雷射光L2的焦點位置偏位至熔融前的B銷的高度(步驟S123)。兩個熔融球結合後,雷射加工裝置1係進行第三步驟的處理(步驟S124)。在第三步驟中,跨越A銷以及B銷進行橢圓形或者8字形狀的迴旋照射。此時,混合式振鏡掃描器10係使用AB銷中心座標來調整加工圖形資料的位置。 In addition, the second step is similar to the first step, and the position near the butt joint 52b in the end face 52a (the position near the spacing) can also be linearly reciprocated. In this way, the laser light is irradiated near the inner side, thereby shortening the time until the molten part is combined. Then, before the processing of the third step, the focal position of the first laser light L1 and the second laser light L2 is offset to the height of the B pin before melting (step S123). After the two molten balls are combined, the laser processing device 1 performs the processing of the third step (step S124). In the third step, an elliptical or 8-shaped circular irradiation is performed across the A pin and the B pin. At this time, the hybrid galvanometer scanner 10 uses the center coordinates of the AB pin to adjust the position of the processing graphic data.

藉由第三步驟,對先前已經雷射照射過的B銷再次賦予熱能,將兩個熔融球均勻化從而形成左右對稱的漂亮的熔融球。第三步驟亦可因應扁平線52的尺寸以及形狀來進行圓形的迴旋照射而非是橢圓形的迴旋照射。 如此,在兩個熔融球結合後進行第三步驟的處理,藉此抑制雷射光從間距洩漏導致對扁平線下部造成損傷。 當結束成為目前處理對象的被加工物W的四分之一所含有的全部的一對扁平線的熔接處理時,控制個人電腦12係經由PLC13對工件設置台11指示將被加工物W旋轉四分之一。已經從PLC13接收到指示的工件設置台11係驅動旋轉機構(θ軸台11θ)使台旋轉四分之一(步驟S126)。接著,返回至步驟S117,持續處理。 In the third step, heat energy is applied again to the B pin that has been previously laser irradiated, and the two molten balls are homogenized to form beautiful molten balls that are symmetrical on both sides. The third step can also be circularly irradiated instead of elliptically irradiated according to the size and shape of the flat wire 52. In this way, the third step is processed after the two molten balls are combined, thereby suppressing the leakage of laser light from the gap and causing damage to the lower part of the flat wire. When the welding process of a pair of flat wires contained in a quarter of the workpiece W that is currently being processed is completed, the control personal computer 12 instructs the workpiece setting table 11 to rotate the workpiece W by a quarter through the PLC 13. The workpiece setting table 11, which has received instructions from PLC13, drives the rotating mechanism (θ-axis table 11θ) to rotate the table by one quarter (step S126). Then, it returns to step S117 and continues processing.

雷射加工裝置1係進行被加工物W的各個四分之一的處理,當結束被加工物W所含有的全部的一對扁平線的熔接處理時,結束被加工物W的熔接加工。 (25)圖35、圖36以及圖37係顯示於屬於振鏡掃描器個人電腦的控制個人電腦12的顯示部205所顯示的UI畫面的具體例。圖35為顯示主畫面160的一例之圖,主畫面160係顯示各個銷的座標值以及雷射加工條件。圖36為顯示加工圖形資料登錄畫面170的一例之圖。圖37為顯示加工位置確認畫面180的一例之圖,加工位置確認畫面180係顯示經已經登錄的加工圖形資料予以修正並配置的情形。 The laser processing device 1 processes each quarter of the workpiece W, and when the welding process of all pairs of flat wires contained in the workpiece W is completed, the welding process of the workpiece W is completed. (25) Figures 35, 36 and 37 are specific examples of UI screens displayed on the display unit 205 of the control personal computer 12 belonging to the galvanometer scanner personal computer. Figure 35 is a diagram showing an example of a main screen 160, which displays the coordinate values of each pin and the laser processing conditions. Figure 36 is a diagram showing an example of a processing graphic data registration screen 170. Figure 37 is a diagram showing an example of a processing position confirmation screen 180, which displays the situation where the registered processing graphic data is corrected and configured.

(26)在此,參照圖式說明用以進行複數個測定對象物的測定之系統。測定對象物的種類並無特別限定,能使用任意的對象物。在此,設想同一個形狀的對象物。此外,所謂「測定」係指測定:有無對象物、對象物的數量、對象物的面積、對象物的長度與周圍長度、對象物的位置、對象物的缺陷與形狀的特徵等。在此,作為一例,說明對測定對象物的數量進行測定之情形。 圖54的測定系統1000係包含:托盤1003,係載置有複數個測定對象物1002;照明裝置1004,係對複數個測定對象物1002照射照明光;拍攝裝置1005,係拍攝被照明裝置1004照射的狀態下的測定對象物;測定裝置1006,係使用藉由拍攝裝置1005所拍攝的圖像資料,進行針對測定對象物1002的測定;以及監控器(monitor)1009,係輸出測定結果。亦可使用拍攝裝置1005以及測定裝置1006成為一體構造的圖像處理裝置,亦可使用照明裝置1004、拍攝裝置1005以及測定裝置1006成為一體構造的圖像處理裝置。 (26) Here, a system for measuring a plurality of measurement objects is described with reference to the drawings. The type of measurement object is not particularly limited, and any object can be used. Here, objects of the same shape are assumed. In addition, the so-called "measurement" refers to the measurement of: the presence or absence of an object, the number of objects, the area of an object, the length and circumference of an object, the position of an object, defects of an object, and the characteristics of its shape. Here, as an example, the situation of measuring the number of measurement objects is described. The measurement system 1000 of Figure 54 includes: a tray 1003, which carries a plurality of measurement objects 1002; an illumination device 1004, which irradiates the plurality of measurement objects 1002 with illumination light; a photographing device 1005, which photographs the measurement objects illuminated by the illumination device 1004; a measurement device 1006, which uses the image data photographed by the photographing device 1005 to measure the measurement objects 1002; and a monitor 1009, which outputs the measurement results. The photographing device 1005 and the measuring device 1006 may be used as an image processing device in an integrated structure, and the lighting device 1004, the photographing device 1005 and the measuring device 1006 may be used as an image processing device in an integrated structure.

如圖54所示,測定裝置1006係包含記憶體1007以及處理器1008。於記憶體1007記憶有測定程式,處理器1008係執行測定程式,藉此測定裝置1006係進行測定對象物的測定處理。 在此,作為一個具體例,如圖54所示,說明測定載置於托盤1003的複數個測定對象物1002之情形。圖55係從圖面上方(鉛直方向)觀看托盤1003之圖。 在測定裝置1006所為的測定處理之前,首先,拍攝裝置1005係拍攝被照明裝置1004照明的托盤1003上的測定對象物1002。測定裝置1006係取得所拍攝的圖像資料,並基於圖像資料進行圖56所示的測定處理。 As shown in FIG54, the measuring device 1006 includes a memory 1007 and a processor 1008. The memory 1007 stores a measuring program, and the processor 1008 executes the measuring program, thereby the measuring device 1006 performs a measuring process of the measuring object. Here, as a specific example, as shown in FIG54, a case of measuring a plurality of measuring objects 1002 placed on a tray 1003 is described. FIG55 is a diagram of the tray 1003 viewed from above (vertical direction) of the drawing. Before the measuring process performed by the measuring device 1006, first, the photographing device 1005 photographs the measuring object 1002 on the tray 1003 illuminated by the lighting device 1004. The measuring device 1006 obtains the captured image data and performs the measuring process shown in FIG. 56 based on the image data.

首先,測定裝置1006係對圖像資料進行第一二進制大型物件解析處理(步驟S201)。所謂二進制大型物件解析為圖像解析的一種,用以對成為對象的圖像資料所含有的每個像素進行二值化處理,並使用二值化處理後的圖像資料進行各種解析、測定。 圖57為顯示二值化處理後的圖像資料100a之圖。此外,雖然二值化處理後的圖像資料是以白色與黑色這兩個色階來表現,然而為了方便說明,在圖57等中以影線圖案來標示黑色。在圖55中的十六個測定對象物1002的二值化處理的結果係在圖57中以二進制大型物件B1至二進制大型物件B12這十二個二進制大型物件來表現。原因在於:密接的測定對象物1002係藉由二值化處理作為一個二進制大型物件來表現。在此種狀態下,即使進行數量以及面積等各種測定,亦不會獲得正確的測定結果。 First, the measuring device 1006 performs the first binary large object analysis processing on the image data (step S201). The so-called binary large object analysis is a type of image analysis, which is used to perform a binarization process on each pixel contained in the image data that is the object, and use the image data after the binarization process to perform various analyses and measurements. Figure 57 is a diagram showing the image data 100a after the binarization process. In addition, although the image data after the binarization process is represented by two color levels of white and black, for the convenience of explanation, black is marked with a hatching pattern in Figure 57 and the like. The results of the binarization process of the sixteen measurement objects 1002 in Figure 55 are represented in Figure 57 as twelve binary large objects, namely binary large objects B1 to binary large objects B12. The reason is that the closely connected measurement object 1002 is represented as a large binary object through binarization processing. In this state, even if various measurements such as quantity and area are performed, correct measurement results will not be obtained.

因此,測定裝置1006係針對圖像資料100a所含有的每個二進制大型物件算出二進制大型物件的面積(步驟S203),並將所算出的面積與預先設定的臨限值進行比較。藉此,判斷測定對象物彼此是否已經結合。使用於比較的臨限值係只要因應測定對象物1002的面積來設定即可。在二進制大型物件的面積為臨限值以下之情形中(在步驟S204中為否),跳過(skip)步驟S205的處理移行至步驟S206。在二進制大型物件的面積比臨限值還大之情形中(在步驟S204中為是),將遮罩區域配置於成為對象的二進制大型物件,並分割二進制大型物件(步驟S205)。例如,在分割圖58中的(a)所示的二進制大型物件B1(中心位置為P1)之情形中,如圖58中的(b)所示將包含中心位置P1(x,y)且與y軸平行的細長形狀的遮罩區域配置於圖像資料上。遮罩區域為圖像處理上不進行辨識之區域,且線寬只要為一像素至二像素左右即可。Therefore, the measuring device 1006 calculates the area of each binary large object contained in the image data 100a (step S203), and compares the calculated area with a preset threshold value. In this way, it is determined whether the measured objects have been combined with each other. The threshold value used for comparison can be set according to the area of the measured object 1002. In the case where the area of the binary large object is less than the threshold value (no in step S204), the processing of step S205 is skipped and the process moves to step S206. When the area of the binary large object is larger than the threshold value (yes in step S204), a mask area is arranged on the binary large object to be the target, and the binary large object is segmented (step S205). For example, when segmenting the binary large object B1 (center position is P1) shown in (a) of FIG. 58, a mask area of a thin and long shape including the center position P1 (x, y) and parallel to the y axis is arranged on the image data as shown in (b) of FIG. 58. The mask area is an area that is not recognized in image processing, and the line width only needs to be about one pixel to two pixels.

由於測定裝置1006係以進行測定對象物1002的數量測定作為前提,因此作為一例係包含中心位置P1且作成與y軸平行的區域,然而遮罩區域的設定方法並未限定於此。能因應要測定何物而適當地變更。 接著,測定裝置1006係進行第二二進制大型物件解析處理(步驟S207),獲得圖59所示的圖像資料100b。在圖像資料100b中,二進制大型物件B1係被分割成二進制大型物件B13以及二進制大型物件B14,二進制大型物件B10係被分割成二進制大型物件B15以及二進制大型物件B16,二進制大型物件B11係被分割成二進制大型物件B17以及二進制大型物件B18。測定裝置1006係計測圖像資料100b的二進制大型物件的數量(步驟S208)。在第一二進制大型物件解析處理中,二進制大型物件的數量計測出十二個;在第二二進制大型物件解析處理中,二進制大型物件的數量計測出十六個。測定裝置1006係將計測出的二進制大型物件的數量作為測定對象物1002的數量輸出至監控器1009。 Since the measuring device 1006 is based on the premise of measuring the quantity of the measuring object 1002, as an example, an area is formed that includes the center position P1 and is parallel to the y-axis, but the setting method of the mask area is not limited to this. It can be appropriately changed according to what is to be measured. Then, the measuring device 1006 performs the second binary large object analysis process (step S207) to obtain the image data 100b shown in Figure 59. In the image data 100b, the binary large object B1 is divided into a binary large object B13 and a binary large object B14, the binary large object B10 is divided into a binary large object B15 and a binary large object B16, and the binary large object B11 is divided into a binary large object B17 and a binary large object B18. The measuring device 1006 measures the number of binary large objects in the image data 100b (step S208). In the first binary large object analysis process, the number of binary large objects is measured as twelve; in the second binary large object analysis process, the number of binary large objects is measured as sixteen. The measuring device 1006 outputs the measured number of binary large objects as the number of the measurement object 1002 to the monitor 1009.

如此,測定系統1000的測定裝置1006係進行兩次二進制大型物件解析處理,藉此能夠正確地進行測定對象物1002的測定。 (27)亦能夠適當地組合上述實施形態一、實施形態二以及上述各個變化例。 (28)此外,在上述實施形態中,各個構成要素亦可藉由執行適合各個構成要素的軟體程式來實現。各個構成要素亦可藉由CPU或者處理器等之程式執行部讀出並執行記錄於硬碟或者半導體記憶體等之記錄媒體的軟體程式來實現。 Thus, the measuring device 1006 of the measuring system 1000 performs two binary large object analysis processes, thereby being able to accurately measure the measuring object 1002. (27) The above-mentioned implementation form 1, implementation form 2 and the above-mentioned variations can also be appropriately combined. (28) In addition, in the above-mentioned implementation form, each component can also be implemented by executing a software program suitable for each component. Each component can also be implemented by the program execution unit of the CPU or processor reading and executing the software program recorded on the recording medium such as a hard disk or a semiconductor memory.

此外,各個構成要素亦可藉由硬體來實現。例如,各個構成要素亦可為電路(或者積體電路)。這些電路係可整體構成一個電路,亦可分別為獨立的電路。此外,這些電路係可分別為泛用的電路,亦可分別為專用的電路。 此外,本發明整體的態樣或者具體的態樣亦可藉由系統、裝置、方法、積體電路、電腦程式或者電腦可讀取的CD-ROM(Compact Disc Read Only Memory;唯讀光碟)等之記錄媒體來實現。此外,亦可以系統、裝置、方法、積體電路、電腦程式以及記錄媒體的任意的組合來實現。此外,本發明亦可作為記錄有此種程式的電腦可讀取之非暫時性的記錄媒體來實現。 In addition, each component can also be implemented by hardware. For example, each component can also be a circuit (or integrated circuit). These circuits can be formed as a whole circuit, or they can be independent circuits. In addition, these circuits can be general-purpose circuits or dedicated circuits. In addition, the overall aspect or specific aspect of the present invention can also be implemented by a system, device, method, integrated circuit, computer program, or computer-readable CD-ROM (Compact Disc Read Only Memory). In addition, it can also be implemented by any combination of systems, devices, methods, integrated circuits, computer programs, and recording media. In addition, the present invention can also be implemented as a non-temporary recording medium that is readable by a computer and records such a program.

此外,只要未脫離本發明的精神範圍,則將所屬技術領域中具有通常知識者所能思及的各種變化例施加至本實施形態之態樣以及組合不同的實施形態中的構成要素所構成之態樣亦包含於本發明的一個或者複數個態樣的範圍內。 [附錄] 上述實施形態以及變化例的一部分或者全部係能以下述方式來詮釋。 In addition, as long as they do not deviate from the spirit and scope of the present invention, various variations that can be thought of by a person of ordinary knowledge in the relevant technical field are applied to the aspects of this embodiment and the aspects formed by combining the constituent elements in different embodiments are also included in the scope of one or more aspects of the present invention. [Appendix] Part or all of the above embodiments and variations can be interpreted in the following manner.

(附錄1) 一種熔接方法,係用以將第一構件以及第二構件的端部對接後的端面與雷射加工裝置對向地配置,並藉由雷射光熔接前述端面;前述熔接方法係包含:第一步驟,係對前述第一構件照射前述雷射光,從而形成第一熔融部;第二步驟,係對前述第二構件照射前述雷射光,從而形成第二熔融部;以及第三步驟,係當前述第一熔融部以及前述第二熔融部結合時,對已經結合的前述第一熔融部以及前述第二熔融部照射前述雷射光,從而形成一個熔融部;前述雷射光係由波長彼此不同的第一雷射光以及第二雷射光所構成。 (Appendix 1) A welding method is used to arrange the end faces of the first component and the second component after the ends are butted against each other to face the laser processing device, and weld the end faces by laser light; the welding method comprises: a first step of irradiating the first component with the laser light to form a first molten portion; a second step of irradiating the second component with the laser light to form a second molten portion; and a third step of irradiating the first molten portion and the second molten portion that have been combined with each other with the laser light to form a single molten portion when the first molten portion and the second molten portion are combined; the laser light is composed of a first laser light and a second laser light having different wavelengths.

(附錄2) 如附錄1所記載之熔接方法,其中前述第二雷射光的聚光直徑係比前述第一雷射光的聚光直徑還小;前述第一步驟係略直線狀地往復照射前述第一構件的預定位置,從而形成前述第一熔融部;前述第二步驟係略直線狀地往復照射前述第二構件的預定位置,從而形成前述第二熔融部;前述第三步驟係當前述第一熔融部以及前述第二熔融部結合時,跨越前述第一構件以及前述第二構件照射前述雷射光。 (Appendix 2) The welding method as described in Appendix 1, wherein the focal diameter of the second laser light is smaller than the focal diameter of the first laser light; the first step is to irradiate the predetermined position of the first component in a substantially straight line back and forth, thereby forming the first molten portion; the second step is to irradiate the predetermined position of the second component in a substantially straight line back and forth, thereby forming the second molten portion; the third step is to irradiate the laser light across the first component and the second component when the first molten portion and the second molten portion are combined.

(附錄3) 如附錄2所記載之熔接方法,其中在前述第一步驟以及前述第二步驟中,前述預定位置為前述第一構件以及前述第二構件中之靠近對接面之位置。 (附錄4) 如附錄1所記載之熔接方法,其中前述第三步驟係跨越前述第一構件以及前述第二構件,以橢圓形、圓形、多邊形、直線或者八字形狀的任一種形狀掃描前述雷射光。 (Appendix 3) The welding method as described in Appendix 2, wherein in the first step and the second step, the predetermined position is a position close to the butting surface of the first component and the second component. (Appendix 4) The welding method as described in Appendix 1, wherein the third step is to scan the laser light across the first component and the second component in any shape of an ellipse, a circle, a polygon, a straight line or an eight-shaped shape.

(附錄5) 如附錄1所記載之熔接方法,其中前述第三步驟係對已經結合的前述第一熔融部以及前述第二熔融部之間的略中心定點照射前述雷射光。 (附錄6) 如附錄1所記載之熔接方法,其中前述第一雷射光的波長為300nm至600nm。 (附錄7) 如附錄6所記載之熔接方法,其中前述第一雷射光的聚光面積為前述端面的總面積的1%至30%。 (Appendix 5) The welding method as described in Appendix 1, wherein the third step is to irradiate the laser light to a fixed point approximately in the center between the first molten portion and the second molten portion that have been bonded. (Appendix 6) The welding method as described in Appendix 1, wherein the wavelength of the first laser light is 300nm to 600nm. (Appendix 7) The welding method as described in Appendix 6, wherein the focusing area of the first laser light is 1% to 30% of the total area of the end face.

(附錄8) 如附錄6所記載之熔接方法,其中前述第一雷射光及前述第二雷射光的輸出功率為500W至3kW。 (附錄9) 如附錄6所記載之熔接方法,其中在前述第三步驟中所照射的雷射的能量密度係比在前述第一步驟以及前述第二步驟中所照射的雷射的能量密度還低。 (Appendix 8) The welding method as described in Appendix 6, wherein the output power of the first laser light and the second laser light is 500W to 3kW. (Appendix 9) The welding method as described in Appendix 6, wherein the energy density of the laser irradiated in the third step is lower than the energy density of the laser irradiated in the first step and the second step.

(附錄10) 如附錄1所記載之熔接方法,其中於前述第一構件以及前述第二構件之間存在間隙;前述第一步驟的照射時間為前述第一熔融部的一部分進入至前述間隙為止之時間;前述第二步驟的照射時間為前述第二熔融部的一部分進入至前述間隙為止之時間;前述第三步驟的照射時間為直至已經結合的前述第一熔融部以及前述第二熔融部均勻化為止之時間。 (Appendix 10) The welding method as described in Appendix 1, wherein there is a gap between the first component and the second component; the irradiation time of the first step is the time until a part of the first molten portion enters the gap; the irradiation time of the second step is the time until a part of the second molten portion enters the gap; the irradiation time of the third step is the time until the first molten portion and the second molten portion that have been bonded are homogenized.

(附錄11) 如附錄1所記載之熔接方法,其中前述第二雷射光的波長為780nm至1100nm。 (附錄12) 如附錄11所記載之熔接方法,其中前述第二雷射光的聚光直徑為前述第一雷射光的聚光直徑的十分之一以下。 (附錄13) 如附錄11所記載之熔接方法,其中前述第二雷射光的聚光直徑為10μm至100μm。 (Appendix 11) The welding method as described in Appendix 1, wherein the wavelength of the second laser light is 780nm to 1100nm. (Appendix 12) The welding method as described in Appendix 11, wherein the focusing diameter of the second laser light is less than one tenth of the focusing diameter of the first laser light. (Appendix 13) The welding method as described in Appendix 11, wherein the focusing diameter of the second laser light is 10μm to 100μm.

(附錄14) 如附錄1所記載之熔接方法,其中前述第一構件以及前述第二構件為用以構成定子用的線圈之剖面矩形的扁平導體;將與前述雷射加工裝置對向地配置的兩個扁平導體的端部對接並藉由前述雷射光以及前述第二雷射光進行熔接,藉此於前述端面形成熔融球。 (附錄15) 如附錄1所記載之熔接方法,其中與前述第一雷射光以及前述第二雷射光的照射同時,或者從前述第一雷射光以及前述第二雷射光的照射之前至照射結束為止或者是更長的時間,以流量5L/min至100L/min且以相對於前述端面的傾斜角度為0°至90°對前述端面噴吹氮。 (Appendix 14) A welding method as described in Appendix 1, wherein the first component and the second component are flat conductors with rectangular cross sections for forming a coil for a stator; the ends of the two flat conductors arranged opposite to the laser processing device are butted and welded by the laser light and the second laser light, thereby forming a molten ball on the end surface. (Appendix 15) A welding method as described in Appendix 1, wherein nitrogen is sprayed on the end surface at a flow rate of 5L/min to 100L/min and at an inclination angle of 0° to 90° relative to the end surface, simultaneously with the irradiation of the first laser light and the second laser light, or from before the irradiation of the first laser light and the second laser light to the end of the irradiation or for a longer period of time.

(附錄16) 一種雷射加工裝置,係用以熔接已經將第一構件以及第二構件的端部對接之端面,並具備:第一振盪器,係振盪第一雷射光;第二振盪器,係振盪波長與前述第一雷射光不同的第二雷射光;一個以上的振鏡掃描器部,係使前述第一雷射光以及前述第二雷射光位移至任意的方向並進行照射;以及控制部,係控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部;前述雷射加工裝置係對前述第一構件照射前述第一雷射光以及前述第二雷射光從而形成第一熔融部,對前述第二構件照射前述第一雷射光以及前述第二雷射光從而形成第二熔融部,當前述第一熔融部以及前述第二熔融部結合時,對已經結合的前述第一熔融部以及前述第二熔融部照射前述第一雷射光以及前述第二雷射光從而形成一個熔融部。 (Appendix 16) A laser processing device is used to weld the end faces of the first component and the second component that have been butted together, and comprises: a first oscillator that oscillates a first laser light; a second oscillator that oscillates a second laser light having a wavelength different from that of the first laser light; one or more galvanometer scanner units that displace the first laser light and the second laser light to any direction and irradiate; and a control unit that controls the first oscillator, the second oscillator, and the oscillator. Mirror scanner unit; the laser processing device irradiates the first component with the first laser light and the second laser light to form a first melting part, irradiates the second component with the first laser light and the second laser light to form a second melting part, and when the first melting part and the second melting part are combined, the first melting part and the second melting part that have been combined are irradiated with the first laser light and the second laser light to form a melting part.

(附錄17) 如附錄16所記載之雷射加工裝置,其中前述雷射加工裝置係對前述第一構件的預定位置略直線狀地往復照射前述第一雷射光以及前述第二雷射光從而形成前述第一熔融部,對前述第二構件的預定位置略直線狀地往復照射前述第一雷射光以及前述第二雷射光從而形成前述第二熔融部,當前述第一熔融部以及前述第二熔融部結合時,跨越前述第一構件以及前述第二構件照射前述第一雷射光以及前述第二雷射光。 (附錄18) 如附錄17所記載之雷射加工裝置,其中前述雷射加工裝置係進一步地具備:合成器部,係將前述第一雷射光以及前述第二雷射光重疊至同一個光軸上;前述振鏡掃描器部係將光軸一致的前述第一雷射光以及前述第二雷射光照射至前述第一構件以及前述第二構件。 (Appendix 17) The laser processing device as described in Appendix 16, wherein the laser processing device irradiates the predetermined position of the first component with the first laser light and the second laser light in a substantially straight line to form the first melting portion, and irradiates the predetermined position of the second component with the first laser light and the second laser light in a substantially straight line to form the second melting portion, and when the first melting portion and the second melting portion are combined, the first laser light and the second laser light are irradiated across the first component and the second component. (Appendix 18) The laser processing device as described in Appendix 17, wherein the laser processing device further comprises: a synthesizer section for superimposing the first laser light and the second laser light on the same optical axis; and a galvanometer scanner section for irradiating the first laser light and the second laser light with the same optical axis to the first component and the second component.

(附錄19) 如附錄17所記載之雷射加工裝置,其中前述雷射加工裝置係進一步地具備:輸入部,係受理來自使用者的輸入;前述輸入部係受理用以控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部之各種參數,並將所受理的前述參數朝前述控制部輸出;前述控制部係基於經由前述輸入部所取得的前述參數來控制前述第一振盪器、前述第二振盪器及前述振鏡掃描器部。 (Appendix 19) The laser processing device as described in Appendix 17, wherein the laser processing device is further provided with: an input unit for accepting input from a user; the input unit for accepting various parameters for controlling the first oscillator, the second oscillator and the galvanometer scanner unit, and outputting the accepted parameters to the control unit; the control unit for controlling the first oscillator, the second oscillator and the galvanometer scanner unit based on the parameters obtained through the input unit.

(附錄20) 如附錄1所記載之熔接方法,其中在前述第一構件與前述第二構件之間存在間隙之情形中,前述第一構件以及前述第二構件各者的端面被前述雷射光熔融所形成的熔融部進入至前述間隙,藉此在兩個前述熔融部已經結合的狀態下,以通過已經結合的熔融部的中心附近之預定的掃描軌跡來照射前述雷射光。 (附錄21) 如附錄20所記載之熔接方法,其中前述熔接方法係包含下述步驟:使用圖像處理部來取得前述第一構件以及前述第二構件的位置資訊;基於所取得的前述位置資訊來控制前述雷射光的掃描。 (Appendix 20) A welding method as described in Appendix 1, wherein in the case where there is a gap between the first component and the second component, the molten portion formed by the end surface of each of the first component and the second component being melted by the laser light enters the gap, whereby the laser light is irradiated with a predetermined scanning trajectory passing through the vicinity of the center of the already bonded molten portions in a state where the two previously bonded molten portions have been bonded. (Appendix 21) A welding method as described in Appendix 20, wherein the aforementioned welding method includes the following steps: using an image processing unit to obtain position information of the first component and the second component; and controlling the scanning of the laser light based on the obtained position information.

(附錄22) 如附錄1所記載之熔接方法,其中於前述第一構件以及前述第二構件的端面存在因為高度方向的位置偏離所導致的段差;前述第一步驟係對前述第一構件以及前述第二構件中之高的一者的端面照射雷射光從而使前述端面熔融;前述第二步驟係對前述第一構件以及前述第二構件中之低的一者的端面照射雷射光從而使前述端面熔融;前述第一步驟的熔融量係比前述第二步驟的熔融量還多。 (Appendix 22) The welding method as described in Appendix 1, wherein there is a step difference between the end faces of the first component and the second component due to positional deviation in the height direction; the first step is to irradiate the end face of the higher one of the first component and the second component with laser light to melt the end face; the second step is to irradiate the end face of the lower one of the first component and the second component with laser light to melt the end face; the melting amount of the first step is greater than the melting amount of the second step.

(附錄23) 如附錄22所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用圖像處理部來檢測前述第一構件以及前述第二構件的高度。 (附錄24) 如附錄23所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用前述圖像處理部來取得前述第一構件以及前述第二構件的段差量;在前述第一步驟中,對基準的照射能量加上與段差量對應的追加的照射能量來照射雷射光;在前述第二步驟中,以基準的照射能量來照射雷射光。 (Appendix 23) The welding method as described in Appendix 22, wherein the aforementioned welding method further includes the following steps: using the image processing unit to detect the height of the aforementioned first component and the aforementioned second component. (Appendix 24) The welding method as described in Appendix 23, wherein the aforementioned welding method further includes the following steps: using the aforementioned image processing unit to obtain the step difference between the aforementioned first component and the aforementioned second component; in the aforementioned first step, adding the additional irradiation energy corresponding to the step difference to the reference irradiation energy to irradiate the laser light; in the aforementioned second step, irradiating the laser light with the reference irradiation energy.

(附錄25) 一種熔接方法,係用以將兩個扁平線的前端對接並對端面照射雷射光,藉此熔接兩個前述扁平線;於兩個前述端面存在有因為兩個前述扁平線的高度方向的位置偏離所導致的段差;前述熔接方法係包含:第一步驟,係對高的扁平線的端面照射雷射光從而使端面熔融;以及第二步驟,係對低的扁平線的端面照射雷射光從而使端面熔融;前述第一步驟的熔融量係比前述第二步驟的熔融量還多。 (Appendix 25) A welding method is used to weld the two flat wires by butting the front ends of the two flat wires and irradiating the end faces with laser light; there is a step difference between the two end faces due to the positional deviation of the two flat wires in the height direction; the welding method comprises: a first step of irradiating the end face of the higher flat wire with laser light to melt the end face; and a second step of irradiating the end face of the lower flat wire with laser light to melt the end face; the amount of melting in the first step is greater than the amount of melting in the second step.

(附錄26) 如附錄25所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用圖像處理部來檢測兩個前述扁平線的高度。 (附錄27) 如附錄26所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用前述圖像處理部來取得兩個前述扁平線的段差量;在前述第一步驟中,對基準的照射能量加上與段差量對應的追加的照射能量來照射雷射光;在前述第二步驟中,以基準的照射能量來照射雷射光。 (Appendix 26) The welding method as described in Appendix 25, wherein the aforementioned welding method further includes the following steps: using the image processing unit to detect the height of the two aforementioned flat wires. (Appendix 27) The welding method as described in Appendix 26, wherein the aforementioned welding method further includes the following steps: using the aforementioned image processing unit to obtain the step difference between the two aforementioned flat wires; in the aforementioned first step, adding the additional irradiation energy corresponding to the step difference to the reference irradiation energy to irradiate the laser light; in the aforementioned second step, irradiating the laser light with the reference irradiation energy.

(附錄28) 如附錄27所記載之熔接方法,其中前述基準的照射能量係藉由前述雷射加工裝置的功率、雷射波長、前述扁平線的尺寸、扁平線的材料的至少一者來決定。 (附錄29) 如附錄27所記載之熔接方法,其中前述基準的照射能量為前述扁平線的端面的整體熔融所需的能量。 (Appendix 28) The welding method as described in Appendix 27, wherein the aforementioned reference irradiation energy is determined by at least one of the power of the aforementioned laser processing device, the laser wavelength, the size of the aforementioned flat wire, and the material of the flat wire. (Appendix 29) The welding method as described in Appendix 27, wherein the aforementioned reference irradiation energy is the energy required for the overall melting of the end surface of the aforementioned flat wire.

(附錄30) 如附錄27所記載之熔接方法,其中追加的前述照射能量係前述段差量愈大則愈大。 (附錄31) 如附錄27所記載之熔接方法,其中於兩個前述扁平線之間存在有因為位置偏離所導致的空隙;前述熔接方法係進一步地包含下述步驟:使用前述圖像處理部來取得間距量,前述間距量係顯示兩個前述扁平線之間的空隙的大小;在前述第一步驟中,對基準的照射能量加上與段差量以及間距量對應的追加的照射能量來照射雷射光;在前述第二步驟中,對基準的照射能量加上與間距量對應的追加的照射能量來照射雷射光。 (Appendix 30) The welding method as described in Appendix 27, wherein the additional irradiation energy is greater as the step difference is greater. (Appendix 31) The welding method as described in Appendix 27, wherein there is a gap between the two flat wires due to positional deviation; the welding method further comprises the following steps: using the image processing unit to obtain a spacing amount, the spacing amount indicating the size of the gap between the two flat wires; in the first step, adding the additional irradiation energy corresponding to the step difference and the spacing amount to the reference irradiation energy to irradiate the laser light; in the second step, adding the additional irradiation energy corresponding to the spacing amount to the reference irradiation energy to irradiate the laser light.

(附錄32) 如附錄31所記載之熔接方法,其中追加的前述照射能量係兩個前述扁平線之間的間距量愈大則愈大。 (附錄33) 如附錄30或附錄32所記載之熔接方法,其中前述雷射加工裝置係記憶有表,前述表係記載有與段差量以及間距量相應的追加的能量;前述熔接方法係參照前述表來決定追加的前述能量。 (Appendix 32) The welding method described in Appendix 31, wherein the additional irradiation energy is greater as the distance between the two flat wires is greater. (Appendix 33) The welding method described in Appendix 30 or Appendix 32, wherein the laser processing device stores a table, wherein the table stores additional energies corresponding to the step amount and the distance amount; and the welding method determines the additional energy by referring to the table.

(附錄34) 如附錄25所記載之熔接方法,其中前述熔接方法係進一步地包含:第三步驟,係在前述第二步驟之後,跨越兩個前述扁平線照射雷射光,並攪拌熔融部。 (附錄35) 如附錄34所記載之熔接方法,其中在前述第三步驟中,以前述雷射光不會洩漏至熔融部的下方之方式照射至熔融部之雷射光的能量係比前述第一步驟以及前述第二步驟中被照射的雷射光的能量還小。 (Appendix 34) The welding method as described in Appendix 25, wherein the aforementioned welding method further comprises: a third step, after the aforementioned second step, irradiating the laser light across the two aforementioned flat wires and stirring the molten portion. (Appendix 35) The welding method as described in Appendix 34, wherein in the aforementioned third step, the energy of the laser light irradiated to the molten portion in a manner that the aforementioned laser light does not leak below the molten portion is smaller than the energy of the laser light irradiated in the aforementioned first step and the aforementioned second step.

(附錄36) 如附錄35所記載之熔接方法,其中在前述第三步驟中,將前述雷射光的焦點位置錯開至前述熔融部的上方。 (附錄37) 如附錄25所記載之熔接方法,其中在前述第一步驟以及前述第二步驟中,前述雷射光係往復照射各個扁平線的端面中之靠近對接面之預定位置。 (Appendix 36) The welding method as described in Appendix 35, wherein in the aforementioned third step, the focal position of the aforementioned laser light is shifted to above the aforementioned molten portion. (Appendix 37) The welding method as described in Appendix 25, wherein in the aforementioned first step and the aforementioned second step, the aforementioned laser light is reciprocated to irradiate a predetermined position near the butt surface in the end face of each flat wire.

(附錄38) 一種雷射加工裝置,係用以將高度不同的兩個扁平線的前端對接並對端面照射雷射光,藉此進行前端對接熔接;前述雷射加工裝置係具備:圖像處理部,係檢測兩個前述扁平線的高度;第一振盪器,係振盪第一雷射光;第二振盪器,係振盪波長與前述第一雷射光不同的第二雷射光;一個以上的振鏡掃描器部,係使前述第一雷射光以及前述第二雷射光位移至任意的方向並進行照射;以及控制部,係控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部;前述雷射加工裝置係對高的扁平線的端面照射前述第一雷射光以及前述第二雷射光從而使端面熔融後,再對低的扁平線的端面照射前述第一雷射光以及前述第二雷射光從而使端面熔融;高的前述扁平線的熔融量係比低的前述扁平線的熔融量還多。 (Appendix 38) A laser processing device is used to butt the front ends of two flat wires of different heights and irradiate the end faces with laser light to perform butt welding of the front ends; the laser processing device comprises: an image processing unit for detecting the height of the two flat wires; a first oscillator for oscillating a first laser light; a second oscillator for oscillating a second laser light having a wavelength different from that of the first laser light; and one or more oscillating mirror scanner units for displacing the first laser light and the second laser light. to any direction and irradiate; and a control unit controls the first oscillator, the second oscillator and the galvanometer scanner unit; the laser processing device irradiates the end face of the high flat wire with the first laser light and the second laser light to melt the end face, and then irradiates the end face of the low flat wire with the first laser light and the second laser light to melt the end face; the melting amount of the high flat wire is greater than the melting amount of the low flat wire.

(附錄39) 一種熔接方法,係用以將兩個扁平線的前端對接並使端面與雷射加工裝置對向,並對前述端面照射雷射光,藉此熔接兩個前述扁平線;在前述熔接方法中,在兩個前述扁平線之間存在間隙之情形中,兩個前述扁平線各者的端面被前述雷射光熔融所形成的熔融部係進入至前述間隙,藉此在兩個前述熔融部已經結合的狀態下,以通過已經結合的熔融部的中心附近之預定的掃描軌跡來照射前述雷射光。 (附錄40) 如附錄39所記載之熔接方法,其中前述熔接方法係包含下述步驟:使用圖像處理部來取得兩個前述扁平線的位置資訊;前述熔接方法係基於所取得的前述位置資訊來控制前述雷射光的掃描。 (Appendix 39) A welding method is used to butt the front ends of two flat wires and make the end faces face the laser processing device, and irradiate the end faces with laser light, thereby welding the two flat wires; in the above welding method, when there is a gap between the two flat wires, the molten part formed by the end faces of each of the two flat wires being melted by the above laser light enters the above gap, so that the above laser light is irradiated with a predetermined scanning trajectory passing through the center of the already combined molten parts in a state where the two above molten parts have been combined. (Appendix 40) The welding method as described in Appendix 39, wherein the above welding method includes the following steps: using an image processing unit to obtain position information of the two flat wires; the above welding method controls the scanning of the above laser light based on the obtained above position information.

(附錄41) 如附錄40所記載之熔接方法,其中前述熔接方法係使用所取得的前述位置資訊來計測兩個前述扁平線的中間點;以跨越兩個前述扁平線且通過前述中間點之前述掃描軌跡來照射前述雷射光。 (附錄42) 如附錄40所記載之熔接方法,其中前述熔接方法係使用所取得的前述位置資訊,針對兩個前述扁平線各者計測端面的中心點;以跨越兩個前述扁平線且通過兩個前述扁平線的各個端面的中心點之前述掃描軌跡來照射前述雷射光。 (Appendix 41) The welding method as described in Appendix 40, wherein the welding method uses the obtained position information to measure the middle point of the two flat wires; and irradiates the laser light with the scanning track that crosses the two flat wires and passes through the middle point. (Appendix 42) The welding method as described in Appendix 40, wherein the welding method uses the obtained position information to measure the center point of the end face of each of the two flat wires; and irradiates the laser light with the scanning track that crosses the two flat wires and passes through the center point of each end face of the two flat wires.

(附錄43) 如附錄40所記載之熔接方法,其中前述熔接方法係以跨越兩個前述扁平線之略8字形狀的前述掃描軌跡來照射前述雷射光。 (附錄44) 如附錄41至附錄43中任一附錄所記載之熔接方法,其中前述雷射加工裝置係保持加工圖形資料,前述加工圖形資料係顯示前述預定的掃描軌跡;前述熔接方法係進一步地包含下述步驟:使用所取得的前述位置資訊配合前述間隙的狀態來修正前述加工圖形資料。 (Appendix 43) A welding method as described in Appendix 40, wherein the welding method irradiates the laser light with the scanning track of a figure 8 that crosses two of the flat lines. (Appendix 44) A welding method as described in any one of Appendixes 41 to 43, wherein the laser processing device holds processing graphic data, and the processing graphic data displays the predetermined scanning track; the welding method further includes the following step: using the obtained position information to match the state of the gap to correct the processing graphic data.

(附錄45) 如附錄39所記載之熔接方法,其中在將載置有前述扁平線的台上的任意的點作為原點之xy正交座標系統中,在下述情形中產生前述間隙:於兩個前述扁平線相對性地於x軸方向偏離之情形;於兩個前述扁平線於y軸方向偏離之情形;於兩個前述扁平線於x軸方向以及y軸方向皆偏離之情形;或者於兩個前述扁平線於xy平面內相對性地旋轉之情形。 (Appendix 45) The welding method as described in Appendix 39, wherein in an xy orthogonal coordinate system with an arbitrary point on the table on which the flat wires are placed as the origin, the gap is generated in the following situations: when the two flat wires are relatively offset in the x-axis direction; when the two flat wires are offset in the y-axis direction; when the two flat wires are offset in both the x-axis direction and the y-axis direction; or when the two flat wires are relatively rotated in the xy plane.

(附錄46) 如附錄45所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:基於所取得的前述位置資訊來檢測兩個前述扁平線的相對性的偏離量;將所檢測到的偏離量與預先設定的臨限值進行比較;以及當所檢測到的偏離量超過前述臨限值時,判斷成不可熔接。 (Appendix 46) The welding method as described in Appendix 45, wherein the aforementioned welding method further comprises the following steps: detecting the relative deviation of the two aforementioned flat wires based on the aforementioned position information obtained; comparing the detected deviation with a preset threshold value; and when the detected deviation exceeds the aforementioned threshold value, determining that welding is not possible.

(附錄47) 如附錄39所記載之熔接方法,其中將前述雷射光的焦點位置錯開至前述熔融部的上方。 (附錄48) 如附錄39所記載之熔接方法,其中藉由前述雷射光攪拌已經結合的前述熔融部,並形成期望的大小或者期望的形狀的熔融球。 (Appendix 47) The welding method as described in Appendix 39, wherein the focal position of the aforementioned laser light is shifted to above the aforementioned molten portion. (Appendix 48) The welding method as described in Appendix 39, wherein the aforementioned molten portion that has been bonded is stirred by the aforementioned laser light to form a molten ball of a desired size or shape.

(附錄49) 一種熔接方法,係用以將兩個扁平線的前端對接並使端面與雷射加工裝置對向,並對前述端面照射雷射光,藉此熔接兩個前述扁平線;在前述熔接方法中,在兩個前述扁平線之間存在位置偏離,在兩個前述扁平線各者的端面被前述雷射光熔融所形成的熔融部已經結合的狀態下,以通過已經結合的熔融部的中心附近之預定的掃描軌跡來照射前述雷射光。 (Appendix 49) A welding method is used to weld the two flat wires by butting the front ends of the two flat wires together and making the end faces face the laser processing device, and irradiating the end faces with laser light, thereby welding the two flat wires; in the welding method, there is a positional deviation between the two flat wires, and when the end faces of the two flat wires are melted by the laser light and the molten parts formed are already joined, the laser light is irradiated with a predetermined scanning track passing through the vicinity of the center of the already joined molten parts.

(附錄50) 一種雷射加工裝置,係用以將兩個扁平線的前端對接並對端面照射雷射光,藉此進行前端對接熔接;前述雷射加工裝置係具備:圖像處理部,係檢測兩個前述扁平線的位置資訊;第一振盪器,係振盪第一雷射光;第二振盪器,係振盪波長與前述第一雷射光不同的第二雷射光;一個以上的振鏡掃描器部,係使前述第一雷射光以及前述第二雷射光位移至任意的方向並進行照射;以及控制部,係控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部;前述雷射加工裝置係在兩個前述扁平線之間存在有間隙之情形中,兩個前述扁平線各者的端面被前述雷射光熔融所形成的熔融部進入至前述間隙,藉此在兩個前述熔融部已經結合的狀態下,以通過已經結合的熔融部的中心附近之預定的掃描軌跡來照射前述雷射光。 (Appendix 50) A laser processing device is used to butt the front ends of two flat wires and irradiate the end faces with laser light to perform butt welding of the front ends; the laser processing device comprises: an image processing unit for detecting position information of the two flat wires; a first oscillator for oscillating a first laser light; a second oscillator for oscillating a second laser light having a wavelength different from that of the first laser light; and one or more oscillating mirror scanner units for displacing the first laser light and the second laser light to any direction. and irradiating toward the two flat wires; and a control unit controls the first oscillator, the second oscillator and the galvanometer scanner unit; the laser processing device is to irradiate the two flat wires with a predetermined scanning track passing through the vicinity of the center of the two fused parts when a gap exists between the two flat wires and the molten part formed by the end surface of each of the two flat wires melted by the laser light enters the gap, and the two fused parts are already combined.

(附錄51) 一種定子的製造方法,係用以製造使用於馬達之定子;前述定子係包含:筒狀的定子芯,係具有排列於圓周方向的複數個溝槽;以及複數個扁平導體,係被插入至前述溝槽並彼此接合,從而形成分段線圈;前述定子的製造方法係使對應的兩個扁平導體的端面對接並與雷射加工裝置對向,並因應對應的前述兩個扁平導體的周邊狀況從複數個熔接圖案選擇一個熔接圖案,且以所選擇的前述熔接圖案對前述端面照射雷射光,從而熔接前述端面。 (Appendix 51) A method for manufacturing a stator is used to manufacture a stator for use in a motor; the stator comprises: a cylindrical stator core having a plurality of grooves arranged in a circumferential direction; and a plurality of flat conductors inserted into the grooves and joined to each other to form a segmented coil; the method for manufacturing the stator comprises making the end faces of two corresponding flat conductors butt against each other and facing a laser processing device, selecting a welding pattern from a plurality of welding patterns according to the peripheral conditions of the corresponding two flat conductors, and irradiating the end faces with laser light with the selected welding pattern, thereby welding the end faces.

(附錄52) 如附錄51所記載之定子的製造方法,其中因應於屬於熔接對象的兩個前述扁平導體的附近是否存在有其他構件來選擇熔接圖案。 (附錄53) 如附錄52所記載之定子的製造方法,其中前述熔接圖案為描繪圖案,用以顯示前述端面中的前述雷射光的照射軌跡;在屬於熔接對象的兩個前述扁平導體的附近未存在有其他構件之情形中,以第一描繪圖案來照射前述雷射光;在屬於熔接對象的兩個前述扁平導體的附近存在有其他構件之情形中,以與前述第一描繪圖案不同的第二描繪圖案來照射前述雷射光。 (Appendix 52) A method for manufacturing a stator as described in Appendix 51, wherein the welding pattern is selected according to whether there are other components near the two flat conductors to be welded. (Appendix 53) A method for manufacturing a stator as described in Appendix 52, wherein the welding pattern is a drawing pattern for showing the irradiation trajectory of the laser light in the end surface; when there are no other components near the two flat conductors to be welded, the laser light is irradiated with a first drawing pattern; when there are other components near the two flat conductors to be welded, the laser light is irradiated with a second drawing pattern different from the first drawing pattern.

(附錄54) 如附錄53所記載之定子的製造方法,其中以前述第一描繪圖案照射前述雷射光來進行熔接之情形中的加工時間係比以前述第二描繪圖案照射前述雷射光來進行熔接之情形中的加工時間還短。 (附錄55) 如附錄54所記載之定子的製造方法,其中前述其他構件從前述定子芯的軸方向端面起的突出量係比前述扁平導體還大;前述第一描繪圖案為用以加速前述扁平導體的熔融之照射軌跡;前述第二描繪圖案為用以抑制於前述扁平導體的端面產生的熔融球反射前述雷射光從而導致前述雷射光的反射光照射至前述構件之照射軌跡。 (Appendix 54) A method for manufacturing a stator as described in Appendix 53, wherein the processing time in the case of welding by irradiating the laser light with the first drawing pattern is shorter than the processing time in the case of welding by irradiating the laser light with the second drawing pattern. (Appendix 55) A method for manufacturing a stator as described in Appendix 54, wherein the protrusion of the other components from the axial end surface of the stator core is greater than that of the flat conductor; the first drawing pattern is an irradiation trajectory for accelerating the melting of the flat conductor; and the second drawing pattern is an irradiation trajectory for suppressing the molten ball generated on the end surface of the flat conductor from reflecting the laser light, thereby causing the reflected light of the laser light to irradiate the components.

(附錄56) 如附錄55所記載之定子的製造方法,其中前述定子的製造方法係當前述雷射光通過熔接面上時,將前述反射光照射至前述構件之區域制定成禁止照射區域;前述第二描繪圖案為用以通過前述熔接面上將前述禁止照射區域排除的區域之照射軌跡。 (Appendix 56) A method for manufacturing a stator as described in Appendix 55, wherein the method for manufacturing the stator is that when the laser light passes through the weld surface, the area where the reflected light is irradiated onto the component is formulated as a prohibited irradiation area; the second depiction pattern is an irradiation track for excluding the prohibited irradiation area from the weld surface.

(附錄57) 如附錄56所記載之定子的製造方法,其中前述定子的製造方法係使用屬於熔接對象的兩個前述扁平導體與位於兩個前述扁平導體的附近的前述構件之間的距離、前述構件的大小、前述熔融球的大小、前述熔融球的曲面形狀以及前述熔接面的面積中的至少一者來制定前述禁止照射區域。 (附錄58) 如附錄57所記載之定子的製造方法,其中前述其他構件為使用於與外部之間的通電之導線。 (Appendix 57) The manufacturing method of the stator as described in Appendix 56, wherein the manufacturing method of the stator is to use at least one of the distance between the two flat conductors to be welded and the components located near the two flat conductors, the size of the components, the size of the molten ball, the curved surface shape of the molten ball, and the area of the welded surface to determine the prohibited irradiation area. (Appendix 58) The manufacturing method of the stator as described in Appendix 57, wherein the other components are wires used for conducting electricity to the outside.

(附錄59) 如附錄52所記載之定子的製造方法,其中前述雷射光為混合式雷射光,前述混合式雷射光係將波長彼此不同的第一雷射光與第二雷射光重疊至同一個光軸上而成。 (附錄60) 如附錄59所記載之定子的製造方法,其中前述第一雷射光的波長為300nm至600nm;前述第二雷射光的波長為780nm至1100nm。 (Appendix 59) The manufacturing method of the stator as described in Appendix 52, wherein the aforementioned laser light is a hybrid laser light, and the aforementioned hybrid laser light is formed by superimposing a first laser light and a second laser light of different wavelengths on the same optical axis. (Appendix 60) The manufacturing method of the stator as described in Appendix 59, wherein the wavelength of the aforementioned first laser light is 300nm to 600nm; the wavelength of the aforementioned second laser light is 780nm to 1100nm.

(附錄61) 如附錄60所記載之定子的製造方法,其中前述第二描繪圖案係跨越屬於熔接對象的兩個前述扁平導體以8字形狀的軌跡照射前述雷射光。 (附錄62) 如附錄60所記載之定子的製造方法,其中前述第二描繪圖案係跨越屬於熔接對象的兩個前述扁平導體朝傾斜方向照射前述雷射光。 (Appendix 61) A method for manufacturing a stator as described in Appendix 60, wherein the second depiction pattern is irradiated with the laser light in an 8-shaped trajectory across the two flat conductors to be welded. (Appendix 62) A method for manufacturing a stator as described in Appendix 60, wherein the second depiction pattern is irradiated with the laser light in an oblique direction across the two flat conductors to be welded.

(附錄63) 如附錄61或附錄62所記載之定子的製造方法,其中前述第一描繪圖案係跨越屬於熔接對象的兩個前述扁平導體以預定的迴旋直徑迴旋照射前述雷射。 (附錄64) 如附錄63所記載之定子的製造方法,其中前述定子的製造方法係一邊參照用以顯示屬於熔接對象的複數個扁平導體與其他構件之間的排列狀態之資訊,一邊選擇前述第一描繪圖案或者前述第二描繪圖案。 (Appendix 63) The manufacturing method of a stator as described in Appendix 61 or Appendix 62, wherein the first depiction pattern is to irradiate the laser with a predetermined rotation diameter across the two flat conductors to be welded. (Appendix 64) The manufacturing method of a stator as described in Appendix 63, wherein the manufacturing method of the stator is to select the first depiction pattern or the second depiction pattern while referring to information for indicating the arrangement state between the plurality of flat conductors to be welded and other components.

(附錄65) 如附錄64所記載之定子的製造方法,其中前述定子的製造方法係藉由圖像處理來解析前述定子,並生成用以顯示屬於熔接對象的複數個前述扁平導體與前述其他構件之間的排列狀態之前述資訊。 (附錄66) 一種雷射加工裝置,係用以製造使用於馬達的定子;前述定子係包含:筒狀的定子芯,係具有排列於圓周方向的複數個溝槽;以及複數個扁平導體,係被插入至前述溝槽並彼此接合,從而形成分段線圈;前述雷射加工裝置係具備:第一振盪器,係振盪第一雷射光;第二振盪器,係振盪波長與前述第一雷射光不同的第二雷射光;合成器部,係將前述第一雷射光以及前述第二雷射光重疊至同一個光軸上;振鏡掃描器部,係使光軸一致的前述第一雷射光以及前述第二雷射光位移至任意的方向並進行照射;台,係載置前述定子,使對應的兩個扁平導體的端面對接並與前述振鏡掃描器部對向;以及控制部,係控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部,以因應對應的兩個前述扁平導體的周邊狀況從複數個熔接圖案選擇一個熔接圖案,並以所選擇的前述熔接圖案對前述端面照射雷射光從而熔接前述端面。 (Appendix 65) A method for manufacturing a stator as described in Appendix 64, wherein the method for manufacturing the stator is to analyze the stator by image processing and generate the aforementioned information for displaying the arrangement state between the plurality of flat conductors and the other components to be welded. (Appendix 66) A laser processing device is used to manufacture a stator used in a motor; the stator comprises: a cylindrical stator core having a plurality of grooves arranged in a circumferential direction; and a plurality of flat conductors inserted into the grooves and joined to each other to form a segmented coil; the laser processing device comprises: a first oscillator for oscillating a first laser light; a second oscillator for oscillating a second laser light having a wavelength different from that of the first laser light; a synthesizer unit for superimposing the first laser light and the second laser light on the same optical axis; a galvanometer scanning unit; The device part displaces the first laser light and the second laser light whose optical axes are aligned to any direction and irradiates; the stage carries the stator so that the end faces of the two corresponding flat conductors are butted against each other and face the galvanometer scanner part; and the control part controls the first oscillator, the second oscillator and the galvanometer scanner part to select a welding pattern from a plurality of welding patterns according to the peripheral conditions of the two corresponding flat conductors, and irradiates the end faces with laser light with the selected welding pattern to weld the end faces.

(附錄67) 如附錄66所記載之雷射加工裝置,其中前述雷射加工裝置係進一步地具備:輸入部,係輸入用以顯示前述定子中的複數個前述扁平導體以及其他構件的排列狀況之資訊;以及記憶部,係記憶所輸入的前述資訊;前述控制部係參照記憶於前述記憶部的前述資訊,從複數個前述熔接圖案選擇一個前述熔接圖案。 (附錄68) 如附錄66所記載之雷射加工裝置,其中前述雷射加工裝置係進一步地具備:圖像處理部,係解析前述定子中的複數個前述扁平導體以及其他構件的排列狀況;以及記憶部,係記憶前述圖像處理部所為的解析結果;前述控制部係參照記憶於前述記憶部的前述解析結果,從複數個前述熔接圖案選擇一個前述熔接圖案。 (Appendix 67) The laser processing device as described in Appendix 66, wherein the aforementioned laser processing device is further equipped with: an input unit for inputting information for displaying the arrangement status of the plurality of aforementioned flat conductors and other components in the aforementioned stator; and a memory unit for storing the inputted aforementioned information; and the aforementioned control unit for selecting one aforementioned welding pattern from the plurality of aforementioned welding patterns with reference to the aforementioned information stored in the aforementioned memory unit. (Appendix 68) The laser processing device as described in Appendix 66, wherein the aforementioned laser processing device is further equipped with: an image processing unit for analyzing the arrangement of the plurality of aforementioned flat conductors and other components in the aforementioned stator; and a memory unit for storing the analysis results of the aforementioned image processing unit; the aforementioned control unit selects one aforementioned welding pattern from the plurality of aforementioned welding patterns with reference to the aforementioned analysis results stored in the aforementioned memory unit.

(附錄69) 一種雷射處理裝置,係具備:合成器部,係將波長彼此不同的複數個雷射光重疊至同一個光軸上;焦點偏移器部,係調節藉由前述合成器部所重疊的雷射光的焦點距離;以及振鏡掃描器部,係位於前述焦點偏移器部的下游,用以使朝向被處理物之雷射光的光軸的朝向位移;前述雷射處理裝置係使前述焦點偏移器部所為的焦點距離的調節與前述振鏡掃描器部所為的光軸的朝向的位移同步。 (Appendix 69) A laser processing device comprises: a synthesizer section for superimposing a plurality of laser lights of different wavelengths on the same optical axis; a focus shifter section for adjusting the focal distance of the laser lights superimposed by the synthesizer section; and a galvanometer scanner section located downstream of the focus shifter section for shifting the direction of the optical axis of the laser light toward the object to be processed; the laser processing device synchronizes the adjustment of the focal distance by the focus shifter section with the displacement of the direction of the optical axis by the galvanometer scanner section.

(附錄70) 如附錄69所記載之雷射處理裝置,其中於前述振鏡掃描器部與被處理物之間未存在有用以使雷射光通過之透鏡。 (附錄71) 如附錄69或附錄70所記載之雷射處理裝置,其中前述焦點偏移器部係具有用以藉由沿著雷射光的光軸進退從而調解相同雷射光的焦點距離之透鏡;前述雷射處理裝置係將前述合成器部配置於前述焦點偏移器部所具有的前述透鏡的下游。 (Appendix 70) A laser processing device as described in Appendix 69, wherein there is no lens for passing the laser light between the galvanometer scanner section and the object to be processed. (Appendix 71) A laser processing device as described in Appendix 69 or Appendix 70, wherein the focus shifter section has a lens for adjusting the focal distance of the same laser light by moving forward and backward along the optical axis of the laser light; the laser processing device is configured such that the synthesizer section is downstream of the lens of the focus shifter section.

(附錄72) 如附錄69或附錄70或附錄71所記載之雷射處理裝置,其中前述焦點偏移器部係具有:用以將藉由前述合成器部所重疊的雷射光的直徑擴張之透鏡;以及用以將已經通過相同透鏡的雷射光的直徑縮小之透鏡;前述雷射處理裝置係與前述振鏡掃描器部所為的光軸的朝向的位移同步地使沿著前述雷射光的光軸之兩個透鏡的相對距離擴張以及縮小。 (附錄73) 如附錄69或附錄70或附錄71或附錄72所記載之雷射處理裝置,其中對被處理物照射雷射光,從而進行熔接;將經重疊了藍色雷射光以及紅外線雷射光的雷射光經由前述合成器部、前述焦點偏移器部以及前述振鏡掃描器部照射至被處理物。 (Appendix 72) A laser processing device as described in Appendix 69, Appendix 70 or Appendix 71, wherein the focus shifter section comprises: a lens for expanding the diameter of the laser light overlapped by the synthesizer section; and a lens for reducing the diameter of the laser light that has passed through the same lens; the laser processing device expands and reduces the relative distance between the two lenses along the optical axis of the laser light in synchronization with the displacement of the direction of the optical axis by the galvanometer scanner section. (Appendix 73) A laser processing device as described in Appendix 69 or Appendix 70 or Appendix 71 or Appendix 72, wherein the object to be processed is irradiated with laser light to perform welding; the laser light on which the blue laser light and the infrared laser light are superimposed is irradiated onto the object to be processed via the aforementioned synthesizer unit, the aforementioned focus shifter unit, and the aforementioned galvanometer scanner unit.

1:雷射加工裝置 2:第一振盪器 3:第二振盪器 4:合成器部 6:焦點偏移器部 8:振鏡掃描器部 9:圖像處理部 10,10a,10b:混合式振鏡掃描器 11:工件設置台 11a:基台 11x:x軸台 11y:y軸台 11z:z軸台 11θ:θ軸台 12,22,23:控制個人電腦(振鏡掃描器個人電腦) 13:PLC 14:雷射控制器 15:固定治具 31,32:透鏡 33,34:鏡子 41:透鏡(凹透鏡、雙凹透鏡) 42:透鏡(凸透鏡、準直透鏡) 43:透鏡(凸透鏡、聚光透鏡) 50:定子 51:定子芯 52:扁平導體(扁平線) 52a:熔接面(端面) 52b:對接面 53:間隙 54:第一熔融部(溝槽) 55:第二熔融部 55,55a,55b,55c:熔融球 57:xy平面 58:絕緣被覆膜 60:扁平導體 81,82,83,84:鏡子 100:控制盤 100a,100b, 120a,120b,120c:圖像資料 101:照明裝置 102:拍攝裝置 103:控制器 104:記憶體 105:處理器 110:加工圖形資料 111:測定程式 112:臨限值 113:座標表 121:描繪圖案 122:圖案表 150:登錄畫面 151:工作列表 152:加工點列表 153:加工影像 154:雷射參數輸入部 155:登錄按鍵 160:主畫面 170:加工圖形資料登錄畫面 180:加工位置確認畫面 201:控制部 202:記憶部 203:輸入部 204:通訊部 205:顯示部 211:加工處理部 212:描繪圖案生成部 213:圖案表生成部 1000:測定系統 1002:測定對象物 1003:托盤 1004:照明裝置 1005:拍攝裝置 1006:測定裝置 1007:記憶體 1008:處理器 1009:監控器 1100:加工速率表(加工圖形資料) 1112:圈選範圍 B1至B18,B21至B25:二進制大型物件 D:相對距離 d1,d2:聚光直徑 e,O:中心 F:焦點距離 I1,I2,I3,I4,I7,I8,I9:軌跡 L1:第一雷射光 L2:第二雷射光 L3:反射光 P21,P22,P23:中心位置 R21,R22,R23:圓 S11至S19,S21至S33,S51至S63,S82至S85,S91至S105,S111至S127,S201至S209:步驟 W:被加工物 θ:角度 Δz:段差(段差量) Δxy:間距(間距量) 1: Laser processing device 2: First oscillator 3: Second oscillator 4: Synthesizer 6: Focus shifter 8: Vibration mirror scanner 9: Image processing unit 10,10a,10b: Hybrid vibration mirror scanner 11: Workpiece setting table 11a: Base 11x: x-axis table 11y: y-axis table 11z: z-axis table 11θ: θ-axis table 12,22,23: Control PC (Vibration mirror scanner PC) 13: PLC 14: Laser controller 15: Fixing fixture 31,32: Lens 33,34: Mirror 41: Lens (concave lens, biconcave lens) 42: Lens (convex lens, collimating lens) 43: Lens (convex lens, focusing lens) 50: Stator 51: Stator core 52: Flat conductor (flat wire) 52a: Welding surface (end surface) 52b: Butt surface 53: Gap 54: First molten portion (groove) 55: Second molten portion 55,55a,55b,55c: Molten ball 57: xy plane 58: Insulation coating 60: Flat conductor 81,82,83,84: Mirror 100: Control panel 100a,100b, 120a, 120b, 120c: Image data 101: Lighting device 102: Camera device 103: Controller 104: Memory 105: Processor 110: Processing graphic data 111: Measurement program 112: Threshold value 113: Coordinate table 121: Drawing pattern 122: Pattern table 150: Login screen 151: Work list 152: Processing point list 153: Processing image 154: Laser parameter input unit 155: Login button 160: Main screen 170: Processing graphic data login screen 180: Processing position confirmation screen 201: Control unit 202: Memory unit 203: Input unit 204: Communication unit 205: Display unit 211: Processing unit 212: Drawing pattern generation unit 213: Pattern table generation unit 1000: Measurement system 1002: Measurement object 1003: Tray 1004: Lighting device 1005: Camera device 1006: Measurement device 1007: Memory 1008: Processor 1009: Monitor 1100: Processing rate table (processing graphic data) 1112: Circle selection range B1 to B18, B21 to B25: Binary large object D: Relative distance d1, d2: Converging diameter e, O: Center F: Focus distance I1, I2, I3, I4, I7, I8, I9: trajectory L1: first laser beam L2: second laser beam L3: reflected light P21, P22, P23: center position R21, R22, R23: circle S11 to S19, S21 to S33, S51 to S63, S82 to S85, S91 to S105, S111 to S127, S201 to S209: steps W: workpiece θ: angle Δz: step difference (step difference amount) Δxy: spacing (spacing amount)

[圖1]係顯示雷射加工裝置1的外觀之圖。 [圖2]係顯示雷射加工裝置1的功能構成之圖。 [圖3]係顯示混合式振鏡掃描器(hybrid galvano scanner)10的構成之圖。 [圖4]係用以說明焦點偏移器(focusing shifter)部6的功能之圖。 [圖5]係用以說明振鏡掃描器(galvano scanner)部8的功能之圖。 [圖6]係顯示屬於變化例的混合式振鏡掃描器10a的構成之圖。 [圖7]係顯示屬於變化例的混合式振鏡掃描器10b的構成之圖。 [圖8]係顯示屬於被加工物的定子的概略構成之立體圖。 [圖9]中的(a)至(c)係用以說明扁平線(分段線圈)52的xyθ方向的位置偏離之圖。 [圖10]係用以說明扁平線52的z方向的段差之圖。 [圖11]係顯示圖像處理部9的功能構成之方塊圖。 [圖12]係用以說明圖像處理部9所測定的座標值之圖。 [圖13]係用以說明圖像處理部9所測定的座標值之圖。 [圖14]係顯示控制個人電腦12的功能構成之方塊圖。 [圖15]係顯示雷射加工裝置1所為的雷射加工處理的動作之流程圖。 [圖16]係顯示登錄畫面150的一例之圖。 [圖17]係顯示圖像處理部9所為的測定處理的動作之流程圖。 [圖18]係顯示圖像處理部9所為的測定處理的動作之流程圖。 [圖19]係用以說明標籤化(labeling)(編號化(numbering))之圖。 [圖20]係用以說明第一二進制大型物件解析處理(blob analysis processing)(高度的二值化(binarization))之圖。 [圖21]中,(a)係顯示藉由第一二進制大型物件解析處理所測定的中心位置之圖像資料,(b)係用以說明遮罩(mask)區域的設定之圖,(c)係顯示藉由第二二進制大型物件解析處理所測定的中心位置之圖像資料。 [圖22]係用以說明高度測定處理之圖。 [圖23]係顯示座標表113的資料構成之圖。 [圖24]中,(a)係顯示第一步驟的雷射照射的軌跡之圖,(b)係顯示第二步驟的雷射照射的軌跡之圖,(c)係顯示第三步驟的雷射照射的軌跡之圖。 [圖25]中的(a)至(f)係用以說明被加工物W(熔接面)的形狀變化之圖。 [圖26]中的(a)至(d)係顯示第三步驟的變化例之圖。 [圖27]係用以說明第三步驟的變化例的功效之圖。 [圖28]係顯示雷射加工處理的動作之流程圖。 [圖29]係顯示加工速率表1100的資料的構成之圖。 [圖30]中,(a)係用以說明存在段差之情形的第一步驟的處理之示意圖,(b)係用以說明存在段差之情形的第二步驟的處理之示意圖,(c)係用以說明存在段差之情形的第三步驟的處理之示意圖。 [圖31]中,(a)係用以說明存在xyθ方向的位置偏離之情形中的第一步驟的處理之示意圖,(b)係用以說明存在xyθ方向的位置偏離之情形中的第二步驟的處理之示意圖,(c)係用以說明存在xyθ方向的位置偏離之情形中的第三步驟的處理之示意圖。 [圖32]係用以說明加工圖形資料的修正之圖。 [圖33]中,(a)至(e)係用以說明第三步驟的變化例之圖。 [圖34]中,(a)至(c)係用以說明從加工開始至加工結束為止之熔接面的變化之示意圖,(d)係顯示習知例中的加工後的熔接面之示意圖。 [圖35]係顯示主畫面160的一例之圖。 [圖36]係顯示加工圖形資料登錄畫面170的一例之圖。 [圖37]係顯示加工位置確認畫面180的一例之圖。 [圖38]係顯示實施形態二的控制個人電腦22的功能構成之方塊圖。 [圖39]中,(a)係顯示屬於實施形態二的熔接對象的定子的概略構成之立體圖,(b)係實施形態二的扁平線52、52的放大圖。 [圖40]係用以說明加工中的雷射光的反射之圖。 [圖41]係用以說明禁止照射區域之圖。 [圖42]係用以說明描繪圖案之圖。 [圖43]係顯示扁平線的配置例子之圖。 [圖44]係顯示圖案表的資料構成之圖。 [圖45]係顯示加工處理的動作之流程圖。 [圖46]係顯示實施形態二的變化例的控制個人電腦23的功能構成之方塊圖。 [圖47]係顯示實施形態二的變化例的加工處理的動作之流程圖。 [圖48]係顯示實施形態二的變化例的加工處理的動作之流程圖。 [圖49]係用以說明實施形態二的描繪圖案的變化例之圖。 [圖50]係顯示雷射加工處理的變化例的動作之流程圖(xyθ位置偏離)。 [圖51]係顯示雷射加工處理的變化例的動作之流程圖(xyθ位置偏離)。 [圖52]係顯示雷射加工處理的變化例的動作之流程圖(z方向段差)。 [圖53]係顯示雷射加工處理的變化例的動作之流程圖(z方向段差)。 [圖54]係顯示測定系統1000的系統構成之圖。 [圖55]係用以說明載置於托盤(tray)1003的測定對象物1002的狀態之圖。 [圖56]係用以說明測定程式的動作之流程圖。 [圖57]係顯示第一二進制大型物件解析處理的結果之圖像資料。 [圖58]係用以說明遮罩區域的設定之圖。 [圖59]係顯示第二二進制大型物件解析處理的結果之圖像資料。 [FIG. 1] is a diagram showing the appearance of the laser processing device 1. [FIG. 2] is a diagram showing the functional structure of the laser processing device 1. [FIG. 3] is a diagram showing the structure of the hybrid galvano scanner 10. [FIG. 4] is a diagram for explaining the function of the focusing shifter unit 6. [FIG. 5] is a diagram for explaining the function of the galvano scanner unit 8. [FIG. 6] is a diagram showing the structure of a hybrid galvano scanner 10a belonging to a variation. [FIG. 7] is a diagram showing the structure of a hybrid galvano scanner 10b belonging to a variation. [FIG. 8] is a three-dimensional diagram showing the schematic structure of a stator belonging to a workpiece. (a) to (c) in [Fig. 9] are diagrams for explaining the position deviation of the flat wire (segmented coil) 52 in the xyθ direction. [Fig. 10] is a diagram for explaining the step difference in the z direction of the flat wire 52. [Fig. 11] is a block diagram showing the functional configuration of the image processing unit 9. [Fig. 12] is a diagram for explaining the coordinate values measured by the image processing unit 9. [Fig. 13] is a diagram for explaining the coordinate values measured by the image processing unit 9. [Fig. 14] is a block diagram showing the functional configuration of the control personal computer 12. [Fig. 15] is a flowchart showing the operation of the laser processing performed by the laser processing device 1. [Fig. 16] is a diagram showing an example of the login screen 150. [Fig. 17] is a flowchart showing the operation of the measurement processing performed by the image processing unit 9. [Figure 18] is a flowchart showing the operation of the measurement processing performed by the image processing unit 9. [Figure 19] is a diagram for explaining labeling (numbering). [Figure 20] is a diagram for explaining the first binary large object analysis processing (blob analysis processing) (height binarization). [Figure 21], (a) shows the image data of the center position measured by the first binary large object analysis processing, (b) is a diagram for explaining the setting of the mask area, and (c) is a diagram for showing the image data of the center position measured by the second binary large object analysis processing. [Figure 22] is a diagram for explaining the height measurement processing. [Figure 23] is a diagram showing the data structure of the coordinate table 113. In [Figure 24], (a) is a diagram showing the trajectory of laser irradiation in the first step, (b) is a diagram showing the trajectory of laser irradiation in the second step, and (c) is a diagram showing the trajectory of laser irradiation in the third step. [Figure 25] (a) to (f) are diagrams for explaining the shape change of the workpiece W (weld surface). [Figure 26] (a) to (d) are diagrams showing the variation example of the third step. [Figure 27] is a diagram for explaining the effect of the variation example of the third step. [Figure 28] is a flow chart showing the action of laser processing. [Figure 29] is a diagram showing the structure of the data of the processing rate table 1100. In [Figure 30], (a) is a schematic diagram for explaining the processing of the first step when there is a step difference, (b) is a schematic diagram for explaining the processing of the second step when there is a step difference, and (c) is a schematic diagram for explaining the processing of the third step when there is a step difference. In [Figure 31], (a) is a schematic diagram for explaining the processing of the first step when there is a positional deviation in the xyθ direction, (b) is a schematic diagram for explaining the processing of the second step when there is a positional deviation in the xyθ direction, and (c) is a schematic diagram for explaining the processing of the third step when there is a positional deviation in the xyθ direction. [Figure 32] is a diagram for explaining the correction of the processed graphic data. In [Figure 33], (a) to (e) are diagrams for explaining the variation example of the third step. In [Figure 34], (a) to (c) are schematic diagrams for explaining the changes of the weld surface from the start of processing to the end of processing, and (d) is a schematic diagram showing the weld surface after processing in the known example. [Figure 35] is a diagram showing an example of the main screen 160. [Figure 36] is a diagram showing an example of the processing graphic data registration screen 170. [Figure 37] is a diagram showing an example of the processing position confirmation screen 180. [Figure 38] is a block diagram showing the functional structure of the control personal computer 22 of the second embodiment. [Figure 39], (a) is a three-dimensional diagram showing the schematic structure of the stator belonging to the welding object of the second embodiment, and (b) is an enlarged view of the flat wires 52, 52 of the second embodiment. [Figure 40] is a diagram for explaining the reflection of laser light during processing. [Figure 41] is a diagram for explaining the prohibited irradiation area. [Figure 42] is a diagram for explaining the drawing pattern. [Figure 43] is a diagram showing an example of the configuration of the flat line. [Figure 44] is a diagram showing the data structure of the pattern table. [Figure 45] is a flowchart showing the operation of processing. [Figure 46] is a block diagram showing the functional structure of the control personal computer 23 of the variation of the second embodiment. [Figure 47] is a flowchart showing the operation of processing of the variation of the second embodiment. [Figure 48] is a flowchart showing the operation of processing of the variation of the second embodiment. [Figure 49] is a diagram for explaining the variation of the drawing pattern of the second embodiment. [Figure 50] is a flowchart showing the operation of the variation of the laser processing (xyθ position deviation). [Figure 51] is a flowchart showing the operation of a variation of the laser processing (xyθ position deviation). [Figure 52] is a flowchart showing the operation of a variation of the laser processing (z-direction step difference). [Figure 53] is a flowchart showing the operation of a variation of the laser processing (z-direction step difference). [Figure 54] is a diagram showing the system configuration of the measurement system 1000. [Figure 55] is a diagram for explaining the state of the measurement object 1002 placed on the tray 1003. [Figure 56] is a flowchart for explaining the operation of the measurement program. [Figure 57] is an image data showing the result of the first binary large object analysis process. [Figure 58] is a diagram for explaining the setting of the mask area. [Figure 59] shows the image data of the result of the second binary large object analysis process.

1:雷射加工裝置 1: Laser processing equipment

2:第一振盪器 2: First oscillator

3:第二振盪器 3: Second oscillator

10:混合式振鏡掃描器 10: Hybrid vibrating mirror scanner

11:工件設置台 11: Workpiece setting table

11a:基台 11a: Abutment

11x:x軸台 11x:x axis stage

11y:y軸台 11y:y-axis stage

11z:z軸台 11z: z-axis stage

11θ:θ軸台 11θ:θ axis table

12:控制個人電腦(振鏡掃描器個人電腦) 12: Control personal computer (mirror scanner personal computer)

15:固定治具 15: Fixing fixture

100:控制盤 100: Control panel

101:照明裝置 101: Lighting equipment

102:拍攝裝置 102: Filming equipment

203:輸入部 203: Input Department

205:顯示部 205: Display unit

Claims (20)

一種熔接方法,係用以將第一構件以及第二構件的端部對接後的端面與雷射加工裝置對向地配置,並藉由雷射光熔接前述端面; 前述熔接方法係包含: 第一步驟,係對前述第一構件照射前述雷射光,從而形成第一熔融部; 第二步驟,係對前述第二構件照射前述雷射光,從而形成第二熔融部;以及 第三步驟,係當前述第一熔融部以及前述第二熔融部結合時,對已經結合的前述第一熔融部以及前述第二熔融部照射前述雷射光,從而形成一個熔融部; 前述雷射光係由波長彼此不同的第一雷射光以及第二雷射光所構成。 A welding method is used to arrange the end faces of the first component and the second component after the ends are butted against each other to face the laser processing device, and weld the end faces by laser light; The welding method comprises: A first step is to irradiate the first component with the laser light to form a first molten portion; A second step is to irradiate the second component with the laser light to form a second molten portion; and A third step is to irradiate the first molten portion and the second molten portion that have been combined with the laser light when the first molten portion and the second molten portion are combined to form a molten portion; The laser light is composed of a first laser light and a second laser light having different wavelengths. 如請求項1所記載之熔接方法,其中前述第二雷射光的聚光直徑係比前述第一雷射光的聚光直徑還小; 前述第一步驟係略直線狀地往復照射前述第一構件的預定位置,從而形成前述第一熔融部; 前述第二步驟係略直線狀地往復照射前述第二構件的預定位置,從而形成前述第二熔融部; 前述第三步驟係當前述第一熔融部以及前述第二熔融部結合時,跨越前述第一構件以及前述第二構件照射前述雷射光。 The welding method as described in claim 1, wherein the focusing diameter of the second laser light is smaller than the focusing diameter of the first laser light; The first step is to irradiate the predetermined position of the first component in a substantially straight line back and forth, thereby forming the first molten portion; The second step is to irradiate the predetermined position of the second component in a substantially straight line back and forth, thereby forming the second molten portion; The third step is to irradiate the laser light across the first component and the second component when the first molten portion and the second molten portion are combined. 如請求項2所記載之熔接方法,其中在前述第一步驟以及前述第二步驟中,前述預定位置為前述第一構件以及前述第二構件中之靠近對接面之位置。A welding method as described in claim 2, wherein in the first step and the second step, the predetermined position is a position close to the mating surface in the first component and the second component. 如請求項1所記載之熔接方法,其中前述第三步驟係跨越前述第一構件以及前述第二構件,以橢圓形、圓形、多邊形、直線或者八字形狀的任一種形狀掃描前述雷射光。The welding method as recited in claim 1, wherein the third step is to scan the laser light across the first component and the second component in any shape of an ellipse, a circle, a polygon, a straight line or an eight-shaped shape. 如請求項1所記載之熔接方法,其中前述第三步驟係對已經結合的前述第一熔融部以及前述第二熔融部之間的略中心定點照射前述雷射光。The welding method as recited in claim 1, wherein the third step is to irradiate the laser light to a fixed point approximately at the center between the first molten portion and the second molten portion that have been bonded. 如請求項1所記載之熔接方法,其中前述第一雷射光的波長為300nm至600nm。The welding method as described in claim 1, wherein the wavelength of the first laser light is 300nm to 600nm. 如請求項6所記載之熔接方法,其中前述第一雷射光的聚光面積為前述端面的總面積的1%至30%。In the welding method as recited in claim 6, the focusing area of the first laser light is 1% to 30% of the total area of the end face. 如請求項6所記載之熔接方法,其中前述第一雷射光及前述第二雷射光的輸出功率為500W至3kW。The welding method as described in claim 6, wherein the output power of the first laser light and the second laser light is 500W to 3kW. 如請求項6所記載之熔接方法,其中在前述第三步驟中所照射的雷射的能量密度係比在前述第一步驟以及前述第二步驟中所照射的雷射的能量密度還低。A welding method as recited in claim 6, wherein the energy density of the laser irradiated in the aforementioned third step is lower than the energy density of the laser irradiated in the aforementioned first step and the aforementioned second step. 如請求項1所記載之熔接方法,其中於前述第一構件以及前述第二構件之間存在間隙; 前述第一步驟的照射時間為前述第一熔融部的一部分進入至前述間隙為止之時間; 前述第二步驟的照射時間為前述第二熔融部的一部分進入至前述間隙為止之時間; 前述第三步驟的照射時間為直至已經結合的前述第一熔融部以及前述第二熔融部均勻化為止之時間。 The welding method as described in claim 1, wherein there is a gap between the first component and the second component; The irradiation time of the first step is the time until a part of the first molten portion enters the gap; The irradiation time of the second step is the time until a part of the second molten portion enters the gap; The irradiation time of the third step is the time until the first molten portion and the second molten portion that have been bonded are homogenized. 如請求項1所記載之熔接方法,其中前述第二雷射光的波長為780nm至1100nm。A welding method as described in claim 1, wherein the wavelength of the second laser light is 780nm to 1100nm. 如請求項11所記載之熔接方法,其中前述第二雷射光的聚光直徑為前述第一雷射光的聚光直徑的十分之一以下。A welding method as described in claim 11, wherein the focusing diameter of the second laser light is less than one tenth of the focusing diameter of the first laser light. 如請求項11所記載之熔接方法,其中前述第二雷射光的聚光直徑為10μm至100μm。The welding method as described in claim 11, wherein the focusing diameter of the second laser light is 10 μm to 100 μm. 如請求項1所記載之熔接方法,其中前述第一構件以及前述第二構件為用以構成定子用的線圈之剖面矩形的扁平導體; 將與前述雷射加工裝置對向地配置的兩個扁平導體的端部對接並藉由前述雷射光以及前述第二雷射光進行熔接,藉此於前述端面形成熔融球。 The welding method described in claim 1, wherein the first component and the second component are flat conductors with rectangular cross-sections for forming a coil for a stator; The ends of the two flat conductors arranged opposite to the laser processing device are butted and welded by the laser light and the second laser light, thereby forming a molten ball on the end surface. 如請求項1所記載之熔接方法,其中在前述第一構件與前述第二構件之間存在間隙之情形中,前述第一構件以及前述第二構件各者的端面被前述雷射光熔融所形成的熔融部進入至前述間隙,藉此在兩個前述熔融部已經結合的狀態下,以通過已經結合的熔融部的中心附近之預定的掃描軌跡來照射前述雷射光。A welding method as described in claim 1, wherein in a case where there is a gap between the first component and the second component, a molten portion formed by melting the end faces of each of the first component and the second component by the laser light enters the gap, whereby the laser light is irradiated along a predetermined scanning trajectory passing through the vicinity of the center of the two molten portions that have been combined, in a state where the two molten portions have been combined. 如請求項15所記載之熔接方法,其中前述熔接方法係包含下述步驟:使用圖像處理部來取得前述第一構件以及前述第二構件的位置資訊; 基於所取得的前述位置資訊來控制前述雷射光的掃描。 The welding method as described in claim 15, wherein the welding method comprises the following steps: using an image processing unit to obtain position information of the first component and the second component; controlling the scanning of the laser light based on the obtained position information. 如請求項1所記載之熔接方法,其中於前述第一構件以及前述第二構件的端面存在因為高度方向的位置偏離所導致的段差; 前述第一步驟係對前述第一構件以及前述第二構件中之高的一者的端面照射雷射光從而使前述端面熔融; 前述第二步驟係對前述第一構件以及前述第二構件中之低的一者的端面照射雷射光從而使前述端面熔融; 前述第一步驟的熔融量係比前述第二步驟的熔融量還多。 The welding method as described in claim 1, wherein there is a step difference caused by positional deviation in the height direction on the end faces of the first component and the second component; The first step is to irradiate the end face of the higher one of the first component and the second component with laser light to melt the end face; The second step is to irradiate the end face of the lower one of the first component and the second component with laser light to melt the end face; The melting amount of the first step is greater than the melting amount of the second step. 如請求項17所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用圖像處理部來檢測前述第一構件以及前述第二構件的高度。The welding method as described in claim 17, wherein the welding method further comprises the following step: using an image processing unit to detect the height of the first component and the second component. 如請求項18所記載之熔接方法,其中前述熔接方法係進一步地包含下述步驟:使用前述圖像處理部來取得前述第一構件以及前述第二構件的段差量; 在前述第一步驟中,對基準的照射能量加上與段差量對應的追加的照射能量來照射雷射光; 在前述第二步驟中,以基準的照射能量來照射雷射光。 The welding method as described in claim 18, wherein the welding method further comprises the following steps: using the image processing unit to obtain the step difference between the first component and the second component; In the first step, adding the additional irradiation energy corresponding to the step difference to the baseline irradiation energy to irradiate the laser light; In the second step, irradiating the laser light with the baseline irradiation energy. 一種雷射加工裝置,係用以熔接已經將第一構件以及第二構件的端部對接之端面,並具備: 第一振盪器,係振盪第一雷射光; 第二振盪器,係振盪波長與前述第一雷射光不同的第二雷射光; 一個以上的振鏡掃描器部,係使前述第一雷射光以及前述第二雷射光位移至任意的方向並進行照射;以及 控制部,係控制前述第一振盪器、前述第二振盪器以及前述振鏡掃描器部; 前述雷射加工裝置係對前述第一構件照射前述第一雷射光以及前述第二雷射光從而形成第一熔融部,對前述第二構件照射前述第一雷射光以及前述第二雷射光從而形成第二熔融部,當前述第一熔融部以及前述第二熔融部結合時,對已經結合的前述第一熔融部以及前述第二熔融部照射前述第一雷射光以及前述第二雷射光從而形成一個熔融部。 A laser processing device is used to weld the end faces of the first component and the second component that have been butted together, and comprises: A first oscillator that oscillates a first laser light; A second oscillator that oscillates a second laser light having a wavelength different from that of the first laser light; One or more galvanometer scanner units that displace the first laser light and the second laser light to any direction and irradiate; and A control unit that controls the first oscillator, the second oscillator, and the galvanometer scanner unit; The laser processing device irradiates the first component with the first laser light and the second laser light to form a first melting portion, irradiates the second component with the first laser light and the second laser light to form a second melting portion, and when the first melting portion and the second melting portion are combined, the combined first melting portion and the second melting portion are irradiated with the first laser light and the second laser light to form a melting portion.
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