TW202411070A - Cover film-attached pressure-sensitive adhesive layer - Google Patents

Cover film-attached pressure-sensitive adhesive layer Download PDF

Info

Publication number
TW202411070A
TW202411070A TW112124526A TW112124526A TW202411070A TW 202411070 A TW202411070 A TW 202411070A TW 112124526 A TW112124526 A TW 112124526A TW 112124526 A TW112124526 A TW 112124526A TW 202411070 A TW202411070 A TW 202411070A
Authority
TW
Taiwan
Prior art keywords
adhesive layer
film
covering film
less
adhesive
Prior art date
Application number
TW112124526A
Other languages
Chinese (zh)
Inventor
道下空
竹田覚
山本真也
堤清貴
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW202411070A publication Critical patent/TW202411070A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J139/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Adhesives based on derivatives of such polymers
    • C09J139/04Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
    • C09J139/06Homopolymers or copolymers of N-vinyl-pyrrolidones
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/301Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/318Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of liquid crystal displays
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00Presence of polyester
    • C09J2467/005Presence of polyester in the release coating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2479/00Presence of polyamine or polyimide
    • C09J2479/08Presence of polyamine or polyimide polyimide
    • C09J2479/086Presence of polyamine or polyimide polyimide in the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)

Abstract

To provide an adhesive layer with a cover film, which is suitable for suppressing end adhesion and adhesive contamination. An adhesive layer (X) with a cover film, which is provided with a cover film (10), an adhesive layer (30), and a cover film (20) in this order in the thickness direction (H). The cover film (10) has a first surface (11) on the adhesive layer (30) side, and has a film end surface (12) that forms an acute angle with the first surface (11). The cover film (20) has an extended end portion (20A). The protruding end portion (20A) protrudes further outward than the end portion (30A) of the adhesive layer (30) in a plane direction (D) orthogonal to the thickness direction (H). The offset length d of the end (30A) of the adhesive layer (30) from the film end surface (12) and the extended surface (12 ') of the film end surface (12) is 5 [mu] m or less.

Description

附覆蓋膜之黏著劑層Adhesive layer with cover film

本發明係關於一種附覆蓋膜之黏著劑層。The present invention relates to an adhesive layer with a covering film.

顯示器面板例如具有包含像素面板、偏光膜、觸控面板、及覆蓋膜等元件之積層結構。在此類顯示器面板之製造過程中,為了使積層結構中所包含之元件彼此接合,例如使用透明黏著劑。The display panel, for example, has a laminated structure including components such as a pixel panel, a polarizing film, a touch panel, and a cover film. In the manufacturing process of such a display panel, in order to bond the components included in the laminated structure to each other, for example, a transparent adhesive is used.

另一方面,例如針對智慧型手機用途及平板終端用途,正在開發能夠反覆彎折(可摺疊)之顯示器面板。具體而言,可摺疊顯示器面板能夠在彎曲形狀與平坦之非彎曲形狀之間反覆變形。此類可摺疊顯示器面板中,積層結構中之各元件以能夠反覆彎折之方式製作,此類元件間之接合係使用軟質黏著劑。對於可摺疊顯示器面板等軟性裝置用片狀黏著劑(黏著片材),例如記載於下述專利文獻1中。 [先前技術文獻] [專利文獻] On the other hand, for example, for use in smartphones and tablet terminals, display panels that can be bent repeatedly (foldable) are being developed. Specifically, a foldable display panel can be repeatedly deformed between a curved shape and a flat non-curved shape. In such a foldable display panel, each element in the laminated structure is manufactured in a manner that can be bent repeatedly, and a soft adhesive is used to join such elements. For example, a sheet adhesive (adhesive sheet) for a flexible device such as a foldable display panel is described in the following patent document 1. [Prior art document] [Patent document]

[專利文獻1]日本專利特開2018-111754號公報[Patent Document 1] Japanese Patent Publication No. 2018-111754

[發明所欲解決之問題][The problem the invention is trying to solve]

先前以來,軟性裝置用黏著片材例如如下所述地進行製造。Conventionally, adhesive sheets for flexible devices are manufactured, for example, as follows.

首先,如圖6A所示,製作作為長條之原材片材之積層片材60。積層片材60在厚度方向H上依序包含剝離襯墊61、黏著劑層62、及剝離襯墊63。剝離襯墊61以能夠剝離之方式與黏著劑層62之一個面相接。剝離襯墊63以能夠剝離之方式與黏著劑層62之另一個面相接。First, as shown in FIG6A , a laminated sheet 60 is prepared as a long raw material sheet. The laminated sheet 60 includes a peeling liner 61, an adhesive layer 62, and a peeling liner 63 in order in the thickness direction H. The peeling liner 61 is in contact with one surface of the adhesive layer 62 in a peelable manner. The peeling liner 63 is in contact with the other surface of the adhesive layer 62 in a peelable manner.

繼而,如圖6B所示,藉由對積層片材60中之黏著劑層62進行沖壓加工,從而形成作為單片狀之黏著片材之黏著劑層62A(沖壓加工步驟)。具體而言,對剝離襯墊61上之黏著劑層62,藉由使加工刀(省略圖示)自剝離襯墊63側插入至剝離襯墊6為止,從而形成規定俯視形狀之黏著劑層62A(用粗實線模式性地表示加工刀之切斷部位65)。圍繞黏著劑層62A產生周圍部62a。本步驟中,亦對剝離襯墊63進行沖壓加工,形成俯視形狀與黏著劑層62A相同之剝離襯墊63A,且圍繞剝離襯墊63A產生周圍部63a。Next, as shown in FIG6B , the adhesive layer 62 in the laminated sheet 60 is punched to form an adhesive layer 62A as a single sheet of adhesive sheet (punching process step). Specifically, the adhesive layer 62 on the peeling pad 61 is formed into an adhesive layer 62A having a predetermined top view shape by inserting a processing knife (not shown) from the peeling pad 63 side to the peeling pad 61 (the cutting portion 65 of the processing knife is schematically indicated by a thick solid line). A peripheral portion 62a is generated around the adhesive layer 62A. In this step, the peeling liner 63 is also punched to form a peeling liner 63A having the same top view shape as the adhesive layer 62A, and a peripheral portion 63a is generated around the peeling liner 63A.

繼而,如圖6C所示,自剝離襯墊61上去除周圍部62a、63a(圖6B)。Next, as shown in FIG. 6C , the peripheral portions 62a and 63a ( FIG. 6B ) are removed from the peeling pad 61.

其後,如圖6D所示,將長條之剝離襯墊61切斷成單片狀之剝離襯墊61A。由此以兩面附剝離襯墊之黏著片材之形式獲得單片狀之附覆蓋膜之黏著劑層60'(剝離襯墊61A/黏著劑層62A/剝離襯墊63A)。Thereafter, as shown in Fig. 6D, the strip of release liner 61 is cut into single-piece release liner 61A, thereby obtaining a single-piece adhesive layer 60' (release liner 61A/adhesive layer 62A/release liner 63A) with a covering film in the form of an adhesive sheet with release liner attached to both sides.

對於軟性裝置用黏著片材(黏著劑層),要求高度軟質,以便具有裝置彎曲時對被黏著體之充分之追隨性、及優異之應力緩和性。然而,在上述製造方法中,黏著劑層62越軟質,則沖壓加工步驟(圖6B)中,黏著劑層62越容易附著於加工刀,容易被該加工刀拉拽。因此,如圖7所示,沖壓加工後之黏著劑層62A中容易形成突出部62E。突出部62E係黏著劑層62A之端部62e延出至較剝離襯墊63A之端部63e更靠外方之部分。先前以來,沖壓加工步驟後之突出部62E之延出長度d'為6 μm以上,較長。The adhesive sheet (adhesive layer) for a soft device is required to be highly soft so as to have sufficient tracking properties to the adherend when the device is bent and excellent stress relief properties. However, in the above-mentioned manufacturing method, the softer the adhesive layer 62 is, the easier it is for the adhesive layer 62 to adhere to the processing knife in the stamping process step (Figure 6B) and be pulled by the processing knife. Therefore, as shown in Figure 7, a protrusion 62E is easily formed in the adhesive layer 62A after stamping. The protrusion 62E is a portion of the end 62e of the adhesive layer 62A extending to the outside of the end 63e of the peeling pad 63A. Previously, the extension length d' of the protrusion 62E after the stamping process was longer than 6 μm.

於使附覆蓋膜之黏著劑層60'堆疊之情形時,突出部62E會成為相鄰之附覆蓋膜之黏著劑層60'之端部彼此附著(端部黏連)之原因。端部黏連會導致附覆蓋膜之黏著劑層60'之操作性下降。又,突出部62E會成為附覆蓋膜之黏著劑層60'之糊劑污染之原因。於在剝離襯墊61A上形成附黏著劑層之表面保護膜(黏著劑層側貼附有剝離襯墊61A)來代替黏著劑層62A及剝離襯墊63A之情形時,該等異常亦會出現。When the adhesive layers 60' with covering films are stacked, the protrusion 62E may cause the ends of the adjacent adhesive layers 60' with covering films to adhere to each other (end adhesion). End adhesion may lead to a decrease in the operability of the adhesive layers 60' with covering films. In addition, the protrusion 62E may cause the paste contamination of the adhesive layers 60' with covering films. These abnormalities may also occur when a surface protective film with an adhesive layer is formed on the peeling pad 61A (the peeling pad 61A is attached to the side of the adhesive layer) instead of the adhesive layer 62A and the peeling pad 63A.

本發明提供一種附覆蓋膜之黏著劑層,其適合於抑制端部黏連及糊劑污染。 [解決問題之技術手段] The present invention provides an adhesive layer with a covering film, which is suitable for inhibiting end adhesion and paste contamination. [Technical means for solving the problem]

本發明[1]包括一種附覆蓋膜之黏著劑層,其係在厚度方向上依序具備第1覆蓋膜、黏著劑層、及第2覆蓋膜者,且上述第1覆蓋膜具有位於上述黏著劑層側之第1面,且具有與該第1面形成銳角之膜端面,上述第2覆蓋膜具有延出端部,該延出端部在與上述厚度方向正交之面方向上延出至較上述黏著劑層之端部更靠外方,上述黏著劑層之端部距離上述膜端面、及該膜端面之延長面之位置偏移長度為5 μm以下。The present invention [1] includes an adhesive layer with a covering film, which comprises a first covering film, an adhesive layer, and a second covering film in order in the thickness direction, wherein the first covering film has a first surface located on the side of the adhesive layer and has a film end surface forming an acute angle with the first surface, and the second covering film has an extended end portion, the extended end portion extends in a surface direction perpendicular to the thickness direction to the outside of the end portion of the adhesive layer, and the positional offset length of the end portion of the adhesive layer from the film end surface and the extended surface of the film end surface is less than 5 μm.

本發明[2]包括如上述[1]所記載之附覆蓋膜之黏著劑層,其中上述黏著劑層之凝膠分率為80%以下。The present invention [2] comprises the adhesive layer with a covering film as described in the above [1], wherein the gel fraction of the adhesive layer is less than 80%.

本發明[3]包括如上述[1]或[2]所記載之附覆蓋膜之黏著劑層,其中上述黏著劑層具有5 μm以上50 μm以下之厚度。The present invention [3] includes the adhesive layer with a covering film as described in [1] or [2] above, wherein the adhesive layer has a thickness of not less than 5 μm and not more than 50 μm.

本發明[4]包括如上述[1]至[3]中任一項所記載之附覆蓋膜之黏著劑層,其中上述第1覆蓋膜中之上述銳角之角度為40°以上85°以下。The present invention [4] includes an adhesive layer with a covering film as described in any one of the above [1] to [3], wherein the angle of the sharp angle in the above first covering film is not less than 40° and not more than 85°.

本發明[5]包括如上述[4]所記載之附覆蓋膜之黏著劑層,其中上述黏著劑層具有位於上述第2覆蓋膜側之黏著面,且具有與該黏著面形成銳角之黏著劑層端面,該黏著劑層之上述銳角之角度相對於上述第1覆蓋膜之上述銳角之角度之比率為0.9以上1.5以下。The present invention [5] includes an adhesive layer with a covering film as described in [4] above, wherein the adhesive layer has an adhesive surface located on the side of the second covering film and has an adhesive layer end surface forming an acute angle with the adhesive surface, and the ratio of the acute angle of the adhesive layer to the acute angle of the first covering film is greater than 0.9 and less than 1.5.

本發明[6]包括如上述[1]至[5]中任一項所記載之附覆蓋膜之黏著劑層,其中於俯視下,表示上述第1覆蓋膜之緣端的邊緣之邊緣寬度之最大值與最小值的差為10 μm以下。 [發明之效果] The present invention [6] includes an adhesive layer with a covering film as described in any one of the above [1] to [5], wherein the difference between the maximum and minimum values of the edge width of the edge representing the edge of the above first covering film in a top view is less than 10 μm. [Effect of the invention]

本發明之附覆蓋膜之黏著劑層中,如上所述,黏著劑層之端部距離膜端面及該端面之延長面之位置偏移長度(突出量)為5 μm以下,較小。此類附覆蓋膜之黏著劑層適合於抑制上述端部黏連及糊劑污染。In the adhesive layer with a cover film of the present invention, as described above, the positional deviation length (protrusion amount) of the end of the adhesive layer from the film end surface and the extension surface of the end surface is less than 5 μm, which is small. Such an adhesive layer with a cover film is suitable for suppressing the above-mentioned end adhesion and paste contamination.

如圖1及圖2所示,作為本發明之附覆蓋膜之黏著劑層之一實施方式之附覆蓋膜之黏著劑層X具備覆蓋膜10、20、及黏著劑層30。具體而言,附覆蓋膜之黏著劑層X在厚度方向H上依序具備覆蓋膜10(第1覆蓋膜)、黏著劑層30、及覆蓋膜20(第2覆蓋膜)。附覆蓋膜之黏著劑層X在與厚度方向H正交之面方向D上擴展。As shown in FIG. 1 and FIG. 2 , an adhesive layer with a covering film X as one embodiment of the adhesive layer with a covering film of the present invention includes covering films 10, 20, and an adhesive layer 30. Specifically, the adhesive layer with a covering film X includes the covering film 10 (first covering film), the adhesive layer 30, and the covering film 20 (second covering film) in order in the thickness direction H. The adhesive layer with a covering film X extends in a plane direction D orthogonal to the thickness direction H.

覆蓋膜10例如係軟性裝置用透明表面保護膜。覆蓋膜10中,於黏著劑層30側具有第1面11,且具有膜端面12。第1面11與膜端面12形成銳角。即,膜端面12係以與第1面11形成銳角之方式傾斜之傾斜端面。黏著劑層30接合於第1面11。黏著劑層30具有位於覆蓋膜20側之黏著面31。此類覆蓋膜10及黏著劑層30形成附黏著劑層之表面保護膜Y。The covering film 10 is, for example, a transparent surface protective film for a flexible device. The covering film 10 has a first surface 11 on the side of the adhesive layer 30 and a film end surface 12. The first surface 11 forms an acute angle with the film end surface 12. That is, the film end surface 12 is an inclined end surface inclined in a manner of forming an acute angle with the first surface 11. The adhesive layer 30 is bonded to the first surface 11. The adhesive layer 30 has an adhesive surface 31 located on the side of the covering film 20. Such a covering film 10 and the adhesive layer 30 form a surface protective film Y with an adhesive layer attached.

黏著劑層30之端部30A距離覆蓋膜10之膜端面12及該膜端面12之延長面12'(圖2~圖4中以假想線表示)之位置偏移長度d(突出量)為5 μm以下。位置偏移長度d係相對於膜端面12及延長面12'之正交方向上之最大長度。圖2中示例性地表示位置偏移長度d為0 μm之情況。圖3中示例性地表示位置偏移長度d為正值之情況。位置偏移長度d為正值係具有黏著劑層30之端部30A從膜端面12及延長面12'向外方伸出之部分之含義。圖4中示例性地表示位置偏移長度d為負值之情況。位置偏移長度d為負值係黏著劑層30之端部30A凹陷至或退避至較延長面12'更靠內之含義。位置偏移長度d之測定方法具體而言係後文中如實施例所述。The position offset length d (protrusion amount) of the end 30A of the adhesive layer 30 from the film end surface 12 of the covering film 10 and the extension surface 12' of the film end surface 12 (indicated by an imaginary line in Figures 2 to 4) is less than 5 μm. The position offset length d is the maximum length in the orthogonal direction relative to the film end surface 12 and the extension surface 12'. Figure 2 exemplarily shows a case where the position offset length d is 0 μm. Figure 3 exemplarily shows a case where the position offset length d is a positive value. The positive value of the position offset length d means that the end 30A of the adhesive layer 30 protrudes outward from the film end surface 12 and the extension surface 12'. Figure 4 exemplarily shows a case where the position offset length d is a negative value. The position deviation length d being a negative value means that the end portion 30A of the adhesive layer 30 is recessed or retreated to a position further inward than the extension surface 12'. The method for measuring the position deviation length d is specifically described in the following examples.

覆蓋膜20係剝離襯墊。覆蓋膜20具有剝離面21。覆蓋膜20經由剝離面21側,以能夠剝離之方式與黏著劑層30相接。又,覆蓋膜20具有延出端部20A。延出端部20A在面方向D上延出至較黏著劑層30之端部30A更靠外方。此類覆蓋膜20在使用附黏著劑層之表面保護膜Y時自黏著劑層30剝落。The covering film 20 is a peelable liner. The covering film 20 has a peelable surface 21. The covering film 20 is in contact with the adhesive layer 30 via the peelable surface 21 side in a peelable manner. In addition, the covering film 20 has an extended end 20A. The extended end 20A extends in the surface direction D to the outside of the end 30A of the adhesive layer 30. This type of covering film 20 is peeled off from the adhesive layer 30 when using a surface protection film Y with an adhesive layer.

此類附覆蓋膜之黏著劑層X例如在軟性裝置之製造過程中,用作包含於該裝置之積層結構中之附黏著劑層之表面保護膜Y之供給材。作為軟性裝置,例如可例舉軟性顯示器面板。軟性顯示器面板例如具有包含像素面板、偏光膜、觸控面板、及覆蓋膜(表面保護膜)等元件之積層結構。Such adhesive layer X with cover film is used as a supply material of surface protection film Y with adhesive layer included in the laminated structure of the device, for example, during the manufacturing process of the flexible device. As a flexible device, for example, a flexible display panel can be cited. The flexible display panel has a laminated structure including components such as a pixel panel, a polarizing film, a touch panel, and a cover film (surface protection film).

如上所述,附覆蓋膜之黏著劑層X中,黏著劑層30之端部30A距離膜端面12及該膜端面12之延長面12'之位置偏移長度d(突出量)為5 μm以下,較小。此類附覆蓋膜之黏著劑層X適合於抑制上述端部黏連及糊劑污染。具體而言,如後述之實施例及比較例所示。As described above, in the adhesive layer X with a covering film, the positional deviation length d (protrusion amount) of the end 30A of the adhesive layer 30 from the film end surface 12 and the extension surface 12' of the film end surface 12 is less than 5 μm, which is relatively small. This type of adhesive layer X with a covering film is suitable for suppressing the above-mentioned end adhesion and paste contamination. Specifically, as shown in the following embodiments and comparative examples.

基於抑制端部黏連及抑制糊劑污染之觀點而言,位置偏移長度d較佳為4 μm以下,更佳為3 μm以下,進而較佳為2 μm以下,進一步較佳為1 μm以下,特佳為0.5 μm以下。基於確保黏著劑層30對覆蓋膜10之端部之保護功能之觀點而言,位置偏移長度d較佳為-10 μm以上,更佳為-5 μm以上,進而較佳為-3 μm以上,特佳為-0.5 μm以上。基於同時具備上述抑制端部黏連及糊劑污染、與上述確保保護功能之觀點而言,位置偏移長度d最佳為0 μm。From the viewpoint of suppressing end adhesion and suppressing paste contamination, the positional offset length d is preferably 4 μm or less, more preferably 3 μm or less, further preferably 2 μm or less, further preferably 1 μm or less, and particularly preferably 0.5 μm or less. From the viewpoint of ensuring the protective function of the adhesive layer 30 for the end of the cover film 10, the positional offset length d is preferably -10 μm or more, more preferably -5 μm or more, further preferably -3 μm or more, and particularly preferably -0.5 μm or more. From the viewpoint of simultaneously having the above-mentioned suppression of end adhesion and paste contamination and the above-mentioned ensuring protection function, the positional offset length d is optimally 0 μm.

基於確保後述邊緣寬度W之觀點而言,覆蓋膜10之第1面11與膜端面12形成之上述銳角之角度α較佳為40°以上,更佳為45°以上,進而較佳為48°以上。基於附覆蓋膜之黏著劑層X經裝置生產線搬送時防止生產線污染之觀點而言,角度α較佳為85°以下,更佳為80°以下,進而較佳為75°以下。作為角度α之調整方法,例如可例舉後述雷射加工中之雷射照射條件之調整。作為雷射照射條件,例如可例舉:雷射光之波長、雷射光之脈衝寬度、該脈衝之頻率、雷射輸出、及雷射光之光束點直徑。From the viewpoint of ensuring the edge width W described later, the angle α of the above-mentioned sharp angle formed by the first surface 11 of the covering film 10 and the film end surface 12 is preferably 40° or more, more preferably 45° or more, and further preferably 48° or more. From the viewpoint of preventing production line contamination when the adhesive layer X with the covering film is transported through the device production line, the angle α is preferably 85° or less, more preferably 80° or less, and further preferably 75° or less. As a method for adjusting the angle α, for example, the adjustment of the laser irradiation conditions in the laser processing described later can be cited. As laser irradiation conditions, for example, the wavelength of the laser light, the pulse width of the laser light, the frequency of the pulse, the laser output, and the beam spot diameter of the laser light can be cited.

基於確保對於附黏著劑層之表面保護膜Y而言之黏著力之觀點而言,黏著劑層30之厚度較佳為5 μm以上,更佳為10 μm以上,進而較佳為12 μm以上。基於附黏著劑層之表面保護膜Y之薄型化之觀點而言,黏著劑層30之厚度較佳為50 μm以下,更佳為40 μm以下,進而較佳為30 μm以下,特佳為25 μm以下。From the viewpoint of ensuring adhesion to the surface protection film Y with the adhesive layer, the thickness of the adhesive layer 30 is preferably 5 μm or more, more preferably 10 μm or more, and further preferably 12 μm or more. From the viewpoint of thinning the surface protection film Y with the adhesive layer, the thickness of the adhesive layer 30 is preferably 50 μm or less, more preferably 40 μm or less, further preferably 30 μm or less, and particularly preferably 25 μm or less.

基於確保黏著劑層30之軟質性之觀點而言,黏著劑層30之凝膠分率較佳為80%以下,更佳為75%以下,進而較佳為70%以下。基於確保黏著劑層30之凝集力之觀點而言,黏著劑層30之凝膠分率較佳為40%以上,更佳為45%以上,進而較佳為50%以上。作為凝膠分率之調整方法,例如可例舉:黏著劑層30中之基礎聚合物之種類之選擇、分子量之調整、及調配量之調整。凝膠分率之測定方法係後文中如實施例所述。From the viewpoint of ensuring the softness of the adhesive layer 30, the gel fraction of the adhesive layer 30 is preferably 80% or less, more preferably 75% or less, and further preferably 70% or less. From the viewpoint of ensuring the cohesive force of the adhesive layer 30, the gel fraction of the adhesive layer 30 is preferably 40% or more, more preferably 45% or more, and further preferably 50% or more. As a method for adjusting the gel fraction, for example, the selection of the type of base polymer in the adhesive layer 30, the adjustment of the molecular weight, and the adjustment of the formulation amount can be cited. The method for measuring the gel fraction is described in the following examples.

基於確保黏著劑層30之軟質性之觀點而言,黏著劑層30之於25℃下之剪切儲存模數較佳為200 kPa以下,更佳為100 kPa以下,進而較佳為70 kPa以下。基於確保黏著劑層30之黏著力之觀點而言,黏著劑層30之於25℃下之剪切儲存模數較佳為10 kPa以上,更佳為15 kPa以上,進而較佳為20 kPa以上,特佳為25 kPa以上。作為剪切儲存模數之調整方法,例如可例舉:黏著劑層30中之基礎聚合物之種類之選擇、分子量之調整、及調配量之調整。剪切儲存模數之測定方法係後文中如實施例所述。From the viewpoint of ensuring the softness of the adhesive layer 30, the shear storage modulus of the adhesive layer 30 at 25°C is preferably 200 kPa or less, more preferably 100 kPa or less, and further preferably 70 kPa or less. From the viewpoint of ensuring the adhesive force of the adhesive layer 30, the shear storage modulus of the adhesive layer 30 at 25°C is preferably 10 kPa or more, more preferably 15 kPa or more, further preferably 20 kPa or more, and particularly preferably 25 kPa or more. As a method for adjusting the shear storage modulus, for example, selection of the type of base polymer in the adhesive layer 30, adjustment of the molecular weight, and adjustment of the formulation amount can be cited. The method for determining the shear storage modulus is described in the examples below.

黏著劑層30較佳為具有與黏著面31形成銳角之端面32。基於確保後述邊緣寬度W之觀點而言,該銳角之角度β較佳為40°以上,更佳為45°以上,進而較佳為48°以上。基於附覆蓋膜之黏著劑層X經裝置生產線搬送時防止生產線污染之觀點而言,角度β較佳為85°以下,更佳為80°以下,進而較佳為75°以下。作為角度β之調整方法,例如可例舉後述雷射加工中之雷射照射條件之調整。The adhesive layer 30 preferably has an end face 32 that forms an acute angle with the adhesive surface 31. From the viewpoint of ensuring the edge width W described later, the angle β of the acute angle is preferably 40° or more, more preferably 45° or more, and further preferably 48° or more. From the viewpoint of preventing contamination of the production line when the adhesive layer X with a covering film is transported through the device production line, the angle β is preferably 85° or less, more preferably 80° or less, and further preferably 75° or less. As a method for adjusting the angle β, for example, the adjustment of the laser irradiation conditions in the laser processing described later can be cited.

黏著劑層30中之上述角度β相對於覆蓋膜10中之角度α之比率(β/α)較佳為0.9以上,更佳為1.00以上,進而較佳為1.01以上,進一步較佳為1.05以上,更進一步較佳為1.10以上,尤佳為1.15以上,特佳為1.20以上。比率(β/α)較佳為1.5以下,更佳為1.4以下,進而較佳為1.3以下。該等構成對於當將後述邊緣寬度W之區域用作邊緣偵測用對準標記時,抑制因檢測用相機所造成之錯誤偵測而言較佳,又,對於當利用邊緣寬度W之區域對附覆蓋膜之黏著劑層X進行尺寸測定時,抑制測定誤差而言較佳。The ratio (β/α) of the angle β in the adhesive layer 30 to the angle α in the cover film 10 is preferably 0.9 or more, more preferably 1.00 or more, further preferably 1.01 or more, further preferably 1.05 or more, further preferably 1.10 or more, particularly preferably 1.15 or more, and particularly preferably 1.20 or more. The ratio (β/α) is preferably 1.5 or less, more preferably 1.4 or less, and further preferably 1.3 or less. Such structures are better for suppressing erroneous detection caused by a detection camera when the area with edge width W described later is used as an alignment mark for edge detection, and are also better for suppressing measurement errors when the area with edge width W is used to measure the size of the adhesive layer X with a covering film.

作為覆蓋膜10(表面保護膜)之材料,例如可例舉:聚醯亞胺(PI)、聚酯、聚烯烴、及聚碳酸酯。作為聚酯,例如可例舉:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、及聚對苯二甲酸丁二酯。作為聚烯烴,例如可例舉:聚乙烯、聚丙烯、及環烯烴聚合物(COP)。Examples of materials for the cover film 10 (surface protection film) include polyimide (PI), polyester, polyolefin, and polycarbonate. Examples of polyester include polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate. Examples of polyolefin include polyethylene, polypropylene, and cycloolefin polymer (COP).

基於確保作為表面保護膜之保護功能之觀點而言,覆蓋膜10之厚度較佳為10 μm以上,更佳為15 μm以上,進而較佳為20 μm以上。基於附黏著劑層之表面保護膜Y之薄型化之觀點而言,覆蓋膜10之厚度較佳為100 μm以下,更佳為70 μm以下,進而較佳為50 μm以下。From the perspective of ensuring the protective function as a surface protective film, the thickness of the cover film 10 is preferably 10 μm or more, more preferably 15 μm or more, and further preferably 20 μm or more. From the perspective of thinning the surface protective film Y with an adhesive layer, the thickness of the cover film 10 is preferably 100 μm or less, more preferably 70 μm or less, and further preferably 50 μm or less.

覆蓋膜10在本實施方式中,於與黏著劑層30相反之側具有突條部13。突條部13係在覆蓋膜10中之與第1面11相反之側之面(第2面)上,向著與黏著劑層30相反之側突出。突條部13之突出高度例如為0.1 μm以上,又,例如為20 μm以下。又,突條部13係沿著膜端面12配置。在藉由雷射加工之後述第1外形加工步驟(圖5B)中,藉由使覆蓋膜101經過利用雷射照射之熔融,從而沿著覆蓋膜10之膜端面12形成此類突條部13。In the present embodiment, the covering film 10 has a protrusion 13 on the side opposite to the adhesive layer 30. The protrusion 13 is on the surface (second surface) on the side opposite to the first surface 11 of the covering film 10, and protrudes toward the side opposite to the adhesive layer 30. The protrusion height of the protrusion 13 is, for example, greater than 0.1 μm, and, for example, less than 20 μm. Furthermore, the protrusion 13 is arranged along the film end surface 12. In the first outer shape processing step (FIG. 5B) described later by laser processing, such a protrusion 13 is formed along the film end surface 12 of the covering film 10 by melting the covering film 101 by laser irradiation.

作為覆蓋膜20(剝離襯墊)之材料,例如可例舉:聚酯、聚烯烴、聚碳酸酯、及聚醯亞胺。作為覆蓋膜20之材料,具體而言,可例舉上文中與覆蓋膜10有關之材料。As the material of the cover film 20 (peeling pad), for example, polyester, polyolefin, polycarbonate, and polyimide can be cited. As the material of the cover film 20, specifically, the materials related to the cover film 10 mentioned above can be cited.

覆蓋膜20之剝離面21較佳為被施以剝離處理。作為剝離處理,例如可例舉:矽酮剝離處理及氟剝離處理。The peeling surface 21 of the cover film 20 is preferably subjected to a peeling treatment. Examples of the peeling treatment include silicone peeling treatment and fluorine peeling treatment.

基於確保覆蓋膜20對黏著劑層30之保護功能之觀點而言,覆蓋膜20之厚度較佳為5 μm以上,更佳為10 μm以上,進而較佳為15 μm以上。基於當將覆蓋膜20自黏著劑層30剝離時,防止剝離錯誤之觀點而言,覆蓋膜20之厚度較佳為200 μm以下,更佳為150 μm以下,進而較佳為100 μm以下。From the viewpoint of ensuring the protective function of the cover film 20 for the adhesive layer 30, the thickness of the cover film 20 is preferably 5 μm or more, more preferably 10 μm or more, and further preferably 15 μm or more. From the viewpoint of preventing peeling errors when the cover film 20 is peeled off from the adhesive layer 30, the thickness of the cover film 20 is preferably 200 μm or less, more preferably 150 μm or less, and further preferably 100 μm or less.

基於確保覆蓋膜20對黏著劑層30之保護功能之觀點而言,面方向D上之延出端部20A相對於覆蓋膜10之延出長度(距離膜端面12之延出長度)較佳為0.1 mm以上,更佳為0.5 mm以上,進而較佳為1 mm以上,特佳為1.5 mm以上。基於有效率地製造附覆蓋膜之黏著劑層X之觀點而言,該延出長度較佳為100 mm以下,更佳為50 mm以下,進而較佳為30 mm以下。From the viewpoint of ensuring the protective function of the covering film 20 for the adhesive layer 30, the extension length of the extended end portion 20A relative to the covering film 10 in the plane direction D (the extension length from the film end surface 12) is preferably 0.1 mm or more, more preferably 0.5 mm or more, further preferably 1 mm or more, and particularly preferably 1.5 mm or more. From the viewpoint of efficiently manufacturing the adhesive layer X with the covering film, the extension length is preferably 100 mm or less, more preferably 50 mm or less, and further preferably 30 mm or less.

如圖2~4所示,附覆蓋膜之黏著劑層X中,將覆蓋膜10之突條部13之面方向D上之內側端部、與覆蓋膜20之面方向D上之外方端部之間之距離設為緣端長度L。緣端長度L包含延出端部20A之上述延出長度。基於確保覆蓋膜20對黏著劑層30之保護功能之觀點而言,此類緣端長度L較佳為0.1 mm以上,更佳為0.5 mm以上,進而較佳為1 mm以上,特佳為1.5 mm以上。基於有效率地製造附覆蓋膜之黏著劑層X之觀點而言,緣端長度L較佳為100 mm以下,更佳為50 mm以下,進而較佳為30 mm以下。As shown in FIGS. 2 to 4 , in the adhesive layer X with a covering film, the distance between the inner end of the protrusion 13 of the covering film 10 in the plane direction D and the outer end of the covering film 20 in the plane direction D is set as the edge length L. The edge length L includes the above-mentioned extension length of the extension end 20A. From the viewpoint of ensuring the protective function of the covering film 20 for the adhesive layer 30, such edge length L is preferably 0.1 mm or more, more preferably 0.5 mm or more, further preferably 1 mm or more, and particularly preferably 1.5 mm or more. From the viewpoint of efficiently manufacturing the adhesive layer X with a cover film, the edge length L is preferably 100 mm or less, more preferably 50 mm or less, and further preferably 30 mm or less.

覆蓋膜20在本實施方式中,於剝離面21側沿著黏著劑層30之端面32具有半切溝22。半切溝22在厚度方向H上具有深度。如圖2所示,半切溝22具有內壁面22a(第1內壁面)、內壁面22b(第2內壁面)、及圓底22c。內壁面22a配置於半切溝22中之面方向D上之內側(黏著劑層30側)。內壁面22a與黏著劑層30之端面32為同一平面。內壁面22b配置於半切溝22中之面方向D上之外側。內壁面22b在面方向D上與內壁面22a分開,且在面方向D上與內壁面22a對向。圓底22c配置於面方向D上之內壁面22a、22b之間。於俯視下,與沿著端面32延伸之半切溝22之延伸方向正交之方向之剖面(圖2)內,圓底22c具有膨脹之彎曲形狀,例如具有1 μm以上之曲率半徑。In the present embodiment, the covering film 20 has a half-cut groove 22 along the end surface 32 of the adhesive layer 30 on the peeling surface 21 side. The half-cut groove 22 has a depth in the thickness direction H. As shown in FIG. 2 , the half-cut groove 22 has an inner wall surface 22a (first inner wall surface), an inner wall surface 22b (second inner wall surface), and a round bottom 22c. The inner wall surface 22a is arranged on the inner side (adhesive layer 30 side) in the surface direction D of the half-cut groove 22. The inner wall surface 22a and the end surface 32 of the adhesive layer 30 are in the same plane. The inner wall surface 22b is arranged on the outer side in the surface direction D of the half-cut groove 22. The inner wall surface 22b is separated from the inner wall surface 22a in the surface direction D and is opposite to the inner wall surface 22a in the surface direction D. The round bottom 22c is disposed between the inner wall surfaces 22a and 22b in the plane direction D. In a plan view, in a cross section perpendicular to the extending direction of the half-cut groove 22 extending along the end surface 32 ( FIG. 2 ), the round bottom 22c has an expanded curved shape, for example, with a curvature radius of 1 μm or more.

於俯視下,表示覆蓋膜10之緣端的邊緣之邊緣寬度W較佳為10 μm以上,更佳為15 μm以上,進而較佳為20 μm以上,特佳為25 μm以上(邊緣寬度W於本實施方式中,係覆蓋膜10之突條部13之面方向D上之內側端部、與覆蓋膜20之半切溝22之面方向D上之外方端部之間之距離)。與邊緣寬度W有關之該構成對於當將邊緣寬度W之區域(本實施方式中係突條部13之上述內側端部、與半切溝22之上述外方端部之間之區域)用作邊緣偵測用對準標記時,利用檢測用相機適當地檢測該標記而言較佳,又,對於利用邊緣寬度W之區域對附覆蓋膜之黏著劑層X精度良好地進行尺寸測定而言較佳(邊緣寬度之區域係藉由檢測用相機能夠以濃色區域之形式確認出之部分)。邊緣寬度W較佳為300 μm以下,更佳為250 μm以下,進而較佳為200 μm以下,特佳為150 μm以下。此類構成對於當將邊緣寬度W之區域用作邊緣偵測用對準標記時,抑制因檢測用相機所造成之錯誤偵測而言較佳,又,對於當利用邊緣寬度W之區域對附覆蓋膜之黏著劑層X進行尺寸測定時,抑制測定誤差而言較佳。於覆蓋膜10不具有突條部13之情形時,邊緣寬度W亦可為覆蓋膜10之膜端面12之面方向D上之內側端部、與覆蓋膜20之半切溝22之面方向D上之外方端部之間之距離。於覆蓋膜20不具有半切溝22之情形時,邊緣寬度W亦可為覆蓋膜10之突條部13之面方向D上之內側端部、與黏著劑層30端面32之面方向D上之外方端部之間之距離。於覆蓋膜10不具有突條部13,且覆蓋膜20不具有半切溝22之情形時,邊緣寬度W亦可為覆蓋膜10之膜端面12之面方向D上之內側端部、與黏著劑層30端面32之面方向D上之外方端部之間之距離。In a top view, the edge width W of the edge of the edge of the covering film 10 is preferably greater than 10 μm, more preferably greater than 15 μm, further preferably greater than 20 μm, and particularly preferably greater than 25 μm (the edge width W in the present embodiment is the distance between the inner end of the protrusion 13 of the covering film 10 in the surface direction D and the outer end of the half-cut groove 22 of the covering film 20 in the surface direction D). The configuration related to the edge width W is preferably used for appropriately detecting the mark by a detection camera when the edge width W region (in this embodiment, the region between the inner end of the protrusion 13 and the outer end of the half-cut groove 22) is used as an alignment mark for edge detection, and is also preferably used for accurately measuring the size of the adhesive layer X with a covering film by using the edge width W region (the edge width region is a portion that can be confirmed as a dark-colored region by the detection camera). The edge width W is preferably 300 μm or less, more preferably 250 μm or less, further preferably 200 μm or less, and particularly preferably 150 μm or less. This type of structure is preferably used to suppress erroneous detection caused by a detection camera when the area of the edge width W is used as an alignment mark for edge detection, and is preferably used to suppress measurement errors when the adhesive layer X with the covering film is measured using the area of the edge width W. In the case where the covering film 10 does not have the protruding strip 13, the edge width W may also be the distance between the inner end of the film end surface 12 of the covering film 10 in the surface direction D and the outer end of the half-cut groove 22 of the covering film 20 in the surface direction D. When the covering film 20 does not have the half-cut groove 22, the edge width W may also be the distance between the inner end of the protrusion 13 of the covering film 10 in the plane direction D and the outer end of the end surface 32 of the adhesive layer 30 in the plane direction D. When the covering film 10 does not have the protrusion 13 and the covering film 20 does not have the half-cut groove 22, the edge width W may also be the distance between the inner end of the film end surface 12 of the covering film 10 in the plane direction D and the outer end of the end surface 32 of the adhesive layer 30 in the plane direction D.

邊緣寬度W之最大值與最小值之差較佳為10 μm以下,更佳為7 μm以下,進而較佳為5 μm以下,特佳為3 μm以下。此類構成邊對於當將緣寬度W之區域用作邊緣偵測用對準標記時,利用檢測用相機適當地檢測該標記而言較佳,又,對於利用邊緣寬度W之區域對附覆蓋膜之黏著劑層X精度良好地進行尺寸測定而言較佳。邊緣寬度W之最大值與最小值之差係指覆蓋膜10之俯視下之周端緣之周向上之1 mm長度(切斷長度)之範圍內之邊緣寬度W之最大值與最小值的差。邊緣寬度W之最大值與最小值之差之測定方法具體而言係後文中如實施例所述。The difference between the maximum and minimum values of the edge width W is preferably 10 μm or less, more preferably 7 μm or less, further preferably 5 μm or less, and particularly preferably 3 μm or less. This type of edge structure is preferred for appropriately detecting the mark with a detection camera when the area of the edge width W is used as an alignment mark for edge detection, and is also preferred for accurately measuring the size of the adhesive layer X attached to the covering film using the area of the edge width W. The difference between the maximum and minimum values of the edge width W refers to the difference between the maximum and minimum values of the edge width W within a range of 1 mm length (cut length) in the circumferential direction of the peripheral edge of the covering film 10 when viewed from above. The method for determining the difference between the maximum value and the minimum value of the edge width W is specifically described in the examples below.

黏著劑層30係由黏著劑組合物所形成。黏著劑組合物包含基礎聚合物。基礎聚合物係表現黏著性之黏著成分。作為基礎聚合物,例如可例舉:丙烯酸聚合物、聚胺基甲酸酯聚合物、聚醯胺聚合物、及聚乙烯醚聚合物。基礎聚合物可單獨地使用,亦可併用兩種以上。基於確保黏著劑層30之良好之透明性及黏著性之觀點而言,較佳為使用丙烯酸聚合物作為基礎聚合物。The adhesive layer 30 is formed by an adhesive composition. The adhesive composition includes a base polymer. The base polymer is an adhesive component that exhibits adhesiveness. Examples of the base polymer include acrylic polymers, polyurethane polymers, polyamide polymers, and polyvinyl ether polymers. The base polymer can be used alone or in combination of two or more. From the perspective of ensuring good transparency and adhesiveness of the adhesive layer 30, it is preferred to use an acrylic polymer as the base polymer.

丙烯酸聚合物係以50質量%以上比率包含(甲基)丙烯酸酯之單體成分之共聚物。「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。作為(甲基)丙烯酸酯,較佳為使用(甲基)丙烯酸烷基酯,更佳為使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。The acrylic polymer is a copolymer containing a monomer component of (meth)acrylate at a ratio of 50 mass % or more. "(Meth)acrylic acid" means acrylic acid and/or methacrylic acid. As the (meth)acrylate, it is preferred to use an alkyl (meth)acrylate, and it is more preferred to use an alkyl (meth)acrylate having an alkyl group with 1 to 20 carbon atoms.

作為(甲基)丙烯酸烷基酯,例如可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯(即(甲基)丙烯酸月桂酯)、(甲基)丙烯酸異十三烷基酯、及(甲基)丙烯酸十四烷基酯。作為(甲基)丙烯酸烷基酯,較佳為選自由丙烯酸2-乙基己酯(2EHA)、丙烯酸月桂酯(LA)、及丙烯酸正丁酯所組成之群中之至少一種。基於適當地表現黏著劑層30之黏著性等基本特性之觀點而言,單體成分中之(甲基)丙烯酸烷基酯之比率較佳為50質量%以上,更佳為70質量%以上,進而較佳為90質量%以上,又,例如為99質量%以下。Examples of the alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, pentyl (meth)acrylate, n-hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate (i.e., lauryl (meth)acrylate), isotridecyl (meth)acrylate, and tetradecyl (meth)acrylate. The alkyl (meth)acrylate is preferably at least one selected from the group consisting of 2-ethylhexyl acrylate (2EHA), lauryl acrylate (LA), and n-butyl acrylate. From the viewpoint of appropriately expressing basic properties such as adhesion of the adhesive layer 30, the ratio of the (meth)acrylate in the monomer component is preferably 50 mass % or more, more preferably 70 mass % or more, further preferably 90 mass % or more, and, for example, 99 mass % or less.

單體成分亦可包含可與(甲基)丙烯酸烷基酯共聚之共聚性單體。作為共聚性單體,例如可例舉具有極性基之單體。作為含極性基之單體,例如可例舉:含羥基之單體、含羧基之單體、及具有含氮原子之環之單體。含極性基之單體有助於丙烯酸聚合物之改質,例如向丙烯酸聚合物導入交聯點,確保丙烯酸聚合物之凝集力等。The monomer component may also include a copolymerizable monomer that can copolymerize with the (meth)acrylic acid alkyl ester. As the copolymerizable monomer, for example, a monomer having a polar group can be cited. As the monomer containing a polar group, for example, a monomer containing a hydroxyl group, a monomer containing a carboxyl group, and a monomer having a ring containing a nitrogen atom can be cited. The monomer containing a polar group contributes to the modification of the acrylic polymer, for example, introducing a crosslinking point into the acrylic polymer, ensuring the cohesive force of the acrylic polymer, etc.

作為含羥基之單體,例如可例舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、及(甲基)丙烯酸4-羥基丁酯。作為含羥基之單體,較佳為使用選自由(甲基)丙烯酸2-羥基乙酯及(甲基)丙烯酸4-羥基丁酯所組成之群中之至少一種。基於向丙烯酸聚合物導入交聯結構,及確保黏著劑層30中之凝集力之觀點而言,單體成分中之含羥基之單體之比率較佳為1質量%以上,更佳為2質量%以上,進而較佳為3質量%以上。基於調整丙烯酸聚合物之極性(與黏著劑層30中之各種添加劑成分與丙烯酸聚合物之相容性有關)之觀點而言,該比率較佳為20質量%以下,更佳為10質量%以下。Examples of the hydroxyl-containing monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. As the hydroxyl-containing monomer, it is preferred to use at least one selected from the group consisting of 2-hydroxyethyl (meth)acrylate and 4-hydroxybutyl (meth)acrylate. From the viewpoint of introducing a crosslinking structure into the acrylic polymer and ensuring the cohesive force in the adhesive layer 30, the ratio of the hydroxyl-containing monomer in the monomer component is preferably 1% by mass or more, more preferably 2% by mass or more, and further preferably 3% by mass or more. From the viewpoint of adjusting the polarity of the acrylic polymer (related to the compatibility of the various additive components in the adhesive layer 30 with the acrylic polymer), the ratio is preferably 20% by mass or less, and more preferably 10% by mass or less.

作為具有含氮原子之環之單體,例如可例舉:N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、N-乙烯基吡啶、N-乙烯基哌啶酮、N-乙烯基嘧啶、N-乙烯基哌𠯤、N-乙烯基吡咯、N-乙烯基咪唑、及N-(甲基)丙烯醯基-2-吡咯啶酮。作為具有含氮原子之環之單體,較佳為使用N-乙烯基-2-吡咯啶酮。基於確保黏著劑層30中之凝集力、及確保黏著劑層30中之對被黏著體之密接力之觀點而言,單體成分中之具有含氮原子之環之單體的比率較佳為0.1質量%以上,更佳為0.5質量%以上,進而較佳為1質量%以上。基於調整丙烯酸聚合物之玻璃轉移溫度、及調整丙烯酸聚合物之極性(與黏著劑層30中之各種添加劑成分與丙烯酸聚合物之相容性有關)之觀點而言,該比率較佳為30質量%以下,更佳為20質量%以下。Examples of monomers having a ring containing a nitrogen atom include N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, N-vinylpyridine, N-vinylpiperidone, N-vinylpyrimidine, N-vinylpiperidone, N-vinylpyrrole, N-vinylimidazole, and N-(methyl)acryloyl-2-pyrrolidone. As a monomer having a ring containing a nitrogen atom, N-vinyl-2-pyrrolidone is preferably used. From the viewpoint of ensuring the cohesive force in the adhesive layer 30 and the close contact force of the adhesive layer 30 with the adherend, the ratio of the monomer having a ring containing a nitrogen atom in the monomer component is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and further preferably 1% by mass or more. From the viewpoint of adjusting the glass transition temperature of the acrylic polymer and adjusting the polarity of the acrylic polymer (related to the compatibility of various additive components in the adhesive layer 30 with the acrylic polymer), the ratio is preferably 30% by mass or less, and more preferably 20% by mass or less.

基礎聚合物較佳為具有交聯結構。作為向基礎聚合物導入交聯結構之方法,可例舉如下方法:於黏著劑組合物中調配具有可與交聯劑反應之官能基之基礎聚合物及交聯劑,使基礎聚合物與交聯劑於黏著劑層中進行反應之方法(第一方法);及使形成基礎聚合物之單體成分中含有作為交聯劑之多官能單體,藉由使該單體成分聚合,從而形成聚合物鏈中導入了分支結構(交聯結構)之基礎聚合物之方法(第二方法)。亦可併用該等方法。The base polymer preferably has a crosslinking structure. As methods for introducing a crosslinking structure into the base polymer, the following methods can be cited: a method of preparing a base polymer having a functional group that can react with the crosslinking agent and a crosslinking agent in an adhesive composition, and reacting the base polymer and the crosslinking agent in the adhesive layer (first method); and a method of making the monomer component forming the base polymer contain a multifunctional monomer as a crosslinking agent, and polymerizing the monomer component to form a base polymer having a branched structure (crosslinking structure) introduced into the polymer chain (second method). These methods can also be used in combination.

作為上述第一方法中所使用之交聯劑,例如可例舉與基礎聚合物中所含有之官能基(羥基及羧基等)反應之化合物。作為此類交聯劑,例如可例舉:異氰酸酯交聯劑、過氧化物交聯劑、及環氧交聯劑。交聯劑可單獨地使用,亦可併用兩種以上。As the crosslinking agent used in the first method, for example, there can be cited compounds that react with functional groups (hydroxyl groups and carboxyl groups, etc.) contained in the base polymer. As such crosslinking agents, for example, there can be cited isocyanate crosslinking agents, peroxide crosslinking agents, and epoxy crosslinking agents. The crosslinking agents can be used alone or in combination of two or more.

上述第二方法中,單體成分(包含用於導入交聯結構之多官能單體及其他單體)可一次性聚合,亦可分多階段進行聚合。多階段聚合之方法中,首先,使用於形成基礎聚合物之單官能單體聚合(預聚合),藉此製備含有部分聚合物(低聚合度之聚合物與未反應之單體之混合物)之預聚物組合物。繼而,於預聚物組合物中添加作為交聯劑之多官能單體後,使部分聚合物與多官能單體聚合(正式聚合)。作為多官能單體,例如可例舉1分子中含有2個以上乙烯性不飽和雙鍵之多官能(甲基)丙烯酸酯。作為多官能單體,基於可藉由活性能量線聚合(光聚合)而導入交聯結構之觀點而言,較佳為多官能丙烯酸酯。作為多官能(甲基)丙烯酸酯,例如可例舉:乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、及二季戊四醇六(甲基)丙烯酸酯。作為多官能(甲基)丙烯酸酯,較佳為使用二季戊四醇六丙烯酸酯(DPHA)。In the second method described above, the monomer components (including the multifunctional monomers and other monomers used to introduce the crosslinking structure) can be polymerized at once or in multiple stages. In the multistage polymerization method, first, the monofunctional monomer used to form the base polymer is polymerized (prepolymerization) to prepare a prepolymer composition containing a partial polymer (a mixture of a polymer with a low degree of polymerization and unreacted monomers). Subsequently, after adding a multifunctional monomer as a crosslinking agent to the prepolymer composition, the partial polymer is polymerized with the multifunctional monomer (formal polymerization). As a multifunctional monomer, for example, a multifunctional (meth) acrylate containing two or more ethylenically unsaturated double bonds in one molecule can be cited. As a multifunctional monomer, a multifunctional acrylate is preferred from the viewpoint that a crosslinking structure can be introduced by active energy line polymerization (photopolymerization). Examples of the multifunctional (meth)acrylate include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol hexa(meth)acrylate. As the multifunctional (meth)acrylate, dipentaerythritol hexaacrylate (DPHA) is preferably used.

丙烯酸聚合物可藉由使上述單體成分聚合而形成。作為聚合方法,例如可例舉:溶液聚合、無溶劑之光聚合(例如UV(Ultraviolet,紫外線)聚合)、塊狀聚合、及乳化聚合。作為溶液聚合之溶劑,例如使用:乙酸乙酯及甲苯。又,作為聚合之起始劑,例如使用:熱聚合起始劑及光聚合起始劑。The acrylic polymer can be formed by polymerizing the above-mentioned monomer components. Examples of the polymerization method include solution polymerization, solvent-free photopolymerization (e.g., UV (Ultraviolet) polymerization), bulk polymerization, and emulsion polymerization. Examples of solvents used in solution polymerization include ethyl acetate and toluene. Examples of polymerization initiators include thermal polymerization initiators and photopolymerization initiators.

基於確保黏著劑層30中之凝集力之觀點而言,基礎聚合物之重量平均分子量較佳為10萬以上,更佳為30萬以上,進而較佳為50萬以上。該重量平均分子量較佳為500萬以下,更佳為300萬以下,進而較佳為200萬以下。基礎聚合物之重量平均分子量係藉由凝膠凝膠滲透層析儀(GPC,Gel permeation chromatography)進行測定,並根據聚苯乙烯換算而算出。From the viewpoint of ensuring the cohesive force in the adhesive layer 30, the weight average molecular weight of the base polymer is preferably 100,000 or more, more preferably 300,000 or more, and further preferably 500,000 or more. The weight average molecular weight is preferably 5 million or less, more preferably 3 million or less, and further preferably 2 million or less. The weight average molecular weight of the base polymer is measured by gel permeation chromatography (GPC) and calculated based on polystyrene conversion.

基於確保黏著劑層30之柔軟性之觀點而言,基礎聚合物之玻璃轉移溫度(Tg)較佳為0℃以下,更佳為-10℃以下,進而較佳為-20℃以下。該玻璃轉移溫度例如-80℃以上。From the viewpoint of ensuring the softness of the adhesive layer 30, the glass transition temperature (Tg) of the base polymer is preferably below 0°C, more preferably below -10°C, and further preferably below -20°C. The glass transition temperature is, for example, above -80°C.

關於基礎聚合物之玻璃轉移溫度(Tg),可使用基於下述Fox公式求出之玻璃轉移溫度(理論值)。Fox公式係聚合物之玻璃轉移溫度Tg、與構成該聚合物之單體之均聚物之玻璃轉移溫度Tgi之間之關係式。下述Fox公式中,Tg表示聚合物之玻璃轉移溫度(℃),Wi表示構成該聚合物之單體i之重量分率,Tgi表示由單體i所形成之均聚物之玻璃轉移溫度(℃)。均聚物之玻璃轉移溫度可使用文獻值。例如,「聚合物手冊(Polymer Handbook)」(第4版,John Wiley & Sons, Inc., 1999年)及「新高分子文庫7 塗料用合成樹脂入門」(北岡協三編著,高分子刊行會,1995年)中例舉了各種均聚物之玻璃轉移溫度。另一方面,單體之均聚物之玻璃轉移溫度亦可利用日本專利特開2007-51271號公報中具體記載之方法而求出。Regarding the glass transition temperature (Tg) of the base polymer, the glass transition temperature (theoretical value) obtained based on the following Fox formula can be used. The Fox formula is a relationship between the glass transition temperature Tg of the polymer and the glass transition temperature Tgi of the homopolymer of the monomer constituting the polymer. In the following Fox formula, Tg represents the glass transition temperature of the polymer (°C), Wi represents the weight fraction of the monomer i constituting the polymer, and Tgi represents the glass transition temperature of the homopolymer formed by the monomer i (°C). The glass transition temperature of the homopolymer can be a literature value. For example, "Polymer Handbook" (4th edition, John Wiley & Sons, Inc., 1999) and "New Polymer Library 7: Introduction to Synthetic Resins for Coatings" (edited by Kyozo Kitaoka, Polymer Publishing Company, 1995) list the glass transition temperatures of various homopolymers. On the other hand, the glass transition temperature of a homopolymer of a monomer can also be obtained by the method specifically described in Japanese Patent Publication No. 2007-51271.

Fox公式       1/(273+Tg)=Σ[Wi/(273+Tgi)]Fox formula 1/(273+Tg)=Σ[Wi/(273+Tgi)]

黏著劑組合物亦可視需要含有其他成分。作為其他成分,例如可例舉:溶劑、矽烷偶合劑、紫外線吸收劑、黏著賦予劑、軟化劑、及抗氧化劑。作為溶劑,例如可例舉:使丙烯酸聚合物聚合時視需要使用之聚合溶劑、及聚合後添加於聚合反應溶液中之溶劑。作為該溶劑,例如使用:乙酸乙酯及甲苯。The adhesive composition may contain other components as needed. Examples of other components include solvents, silane coupling agents, ultraviolet absorbers, adhesion promoters, softeners, and antioxidants. Examples of solvents include polymerization solvents used as needed when polymerizing acrylic polymers and solvents added to the polymerization reaction solution after polymerization. Examples of the solvent include ethyl acetate and toluene.

黏著劑層30之霧度較佳為3%以下,更佳為2%以下,進而較佳為1%以下。黏著劑層30之霧度可依據JIS K7136(2000年),使用霧度計進行測定。作為霧度計,例如可例舉:日本電色工業公司製造之「NDH2000」、及村上色彩技術研究所公司製造之「HM-150型」。The haze of the adhesive layer 30 is preferably 3% or less, more preferably 2% or less, and further preferably 1% or less. The haze of the adhesive layer 30 can be measured using a mist meter in accordance with JIS K7136 (2000). Examples of the mist meter include "NDH2000" manufactured by Nippon Denshoku Industries and "HM-150" manufactured by Murakami Color Technology Research Institute.

附覆蓋膜之黏著劑層X例如可如下述般進行製造。The adhesive layer X with a cover film can be manufactured, for example, as follows.

首先,如圖5A所示,製作長條之積層片材Z(積層片材製作步驟)。積層片材Z在厚度方向H上依序具備長條之覆蓋膜102、黏著劑層103、及長條之覆蓋膜101。積層片材Z例如可如下述般進行製造,即,將上述黏著劑組合物塗佈於覆蓋膜102上而形成塗膜,將覆蓋膜101貼合於該塗膜之上,使該塗膜乾燥,並視需要進行光照射。作為黏著劑組合物之塗佈方法,例如可例舉:輥塗、接觸輥式塗佈、凹版塗佈、反向塗佈、輥刷、噴塗、浸漬輥塗佈、棒式塗佈、刮塗、氣刀塗佈、淋幕式塗佈、模唇塗佈、及模嘴塗佈。塗膜之乾燥溫度例如為50℃~200℃。乾燥時間例如為5秒~20分鐘。First, as shown in FIG5A, a long laminated sheet Z is prepared (laminated sheet preparation step). The laminated sheet Z has a long covering film 102, an adhesive layer 103, and a long covering film 101 in order in the thickness direction H. The laminated sheet Z can be prepared, for example, as follows: the adhesive composition is applied on the covering film 102 to form a coating film, the covering film 101 is attached to the coating film, the coating film is dried, and light irradiation is performed as needed. Examples of the coating method of the adhesive composition include roller coating, contact roller coating, gravure coating, reverse coating, roller brushing, spray coating, dip roller coating, rod coating, scraper coating, air knife coating, curtain coating, die lip coating, and die nozzle coating. The drying temperature of the coating film is, for example, 50° C. to 200° C. The drying time is, for example, 5 seconds to 20 minutes.

繼而,如圖5B所示,藉由對覆蓋膜102上之黏著劑層103進行雷射加工,從而形成規定俯視形狀之黏著劑層30(第1外形加工步驟)。具體而言,對積層片材Z,藉由沿著積層片材Z之預切斷線,自覆蓋膜101側向厚度方向H照射雷射光,從而切斷覆蓋膜102上之黏著劑層103及覆蓋膜101。由此於黏著劑層103中形成規定俯視形狀之黏著劑層30,且圍繞黏著劑層30產生周圍部103a(第1周圍部),覆蓋膜101中,形成覆蓋膜10,且圍繞覆蓋膜10形成周圍部101a(第2周圍部)。Next, as shown in FIG. 5B , the adhesive layer 103 on the cover film 102 is laser processed to form an adhesive layer 30 of a predetermined top view shape (first outer shape processing step). Specifically, the laminated sheet Z is irradiated with laser light from the side of the cover film 101 in the thickness direction H along the pre-cut line of the laminated sheet Z, thereby cutting the adhesive layer 103 on the cover film 102 and the cover film 101. Thus, an adhesive layer 30 having a predetermined shape in a plan view is formed in the adhesive layer 103, and a peripheral portion 103a (first peripheral portion) is generated around the adhesive layer 30. A covering film 10 is formed in the covering film 101, and a peripheral portion 101a (second peripheral portion) is formed around the covering film 10.

作為雷射加工用雷射光,例如可例舉:氣體雷射、固體雷射、及半導體雷射。作為氣體雷射,例如可例舉:準分子雷射及CO 2雷射(9.4 μm)(括號內之數值表示雷射光之波長。以下,有關雷射均如此)。作為準分子雷射,例如可例舉:F 2準分子雷射(157 nm)、ArF準分子雷射(193 nm)、KrF準分子雷射(248 nm)、及XeCl準分子雷射(308 nm)。作為固體雷射,例如可例舉:Nd:YAG(Neodymium-doped Yttrium Aluminium Garnet,摻釹釔鋁石榴石)雷射(1064 nm)、Nd:YAG雷射之二次諧波(532 nm)、Nd:YAG雷射之三次諧波(355 nm)、及Nd:YAG雷射之四次諧波(266 nm)。作為半導體雷射,例如可例舉波長405 nm之半導體雷射。雷射加工中,照射雷射光之脈衝寬度例如為0.5~50 μ秒,脈衝之頻率例如為1~200 kHz,雷射輸出例如為2~250 W,雷射光之光束點直徑例如為50~500 μm。 Examples of laser light for laser processing include gas lasers, solid lasers, and semiconductor lasers. Examples of gas lasers include excimer lasers and CO2 lasers (9.4 μm) (the numbers in parentheses represent the wavelength of the laser light. This applies to all lasers hereinafter). Examples of excimer lasers include F2 excimer lasers (157 nm), ArF excimer lasers (193 nm), KrF excimer lasers (248 nm), and XeCl excimer lasers (308 nm). Examples of solid-state lasers include Nd:YAG (Neodymium-doped Yttrium Aluminum Garnet) lasers (1064 nm), second harmonics of Nd:YAG lasers (532 nm), third harmonics of Nd:YAG lasers (355 nm), and fourth harmonics of Nd:YAG lasers (266 nm). Examples of semiconductor lasers include semiconductor lasers with a wavelength of 405 nm. In laser processing, the pulse width of the irradiated laser light is, for example, 0.5 to 50 μs, the pulse frequency is, for example, 1 to 200 kHz, the laser output is, for example, 2 to 250 W, and the beam spot diameter of the laser light is, for example, 50 to 500 μm.

如上所述,本步驟中所形成之覆蓋膜10之第1面11與膜端面12形成之上述角度α較佳為40°以上,更佳為45°以上,進而較佳為48°以上;又,較佳為85°以下,更佳為80°以下,進而較佳為75°以下。作為角度α之調整方法,例如可例舉雷射加工中之雷射照射條件之調整。作為雷射照射條件,例如可例舉:雷射光之脈衝寬度、脈衝之頻率、雷射輸出、及雷射光之光束點直徑。As described above, the angle α formed by the first surface 11 of the cover film 10 and the film end surface 12 formed in this step is preferably 40° or more, more preferably 45° or more, and further preferably 48° or more; and preferably 85° or less, more preferably 80° or less, and further preferably 75° or less. As a method for adjusting the angle α, for example, the adjustment of the laser irradiation conditions in laser processing can be cited. As laser irradiation conditions, for example, the pulse width of the laser light, the pulse frequency, the laser output, and the beam spot diameter of the laser light can be cited.

繼而,如圖5C所示,自覆蓋膜102上去除周圍部101a、103a(圖5B)(去除步驟)。Next, as shown in FIG. 5C , the peripheral portions 101a and 103a ( FIG. 5B ) are removed from the cover film 102 (removal step).

繼而,如圖5D所示,將長條之覆蓋膜102切斷成單片狀之覆蓋膜20(第2外形加工步驟)。作為切斷方法,例如可例舉:藉由照射雷射光之切斷、及藉由沖壓加工之切斷。Next, as shown in Fig. 5D, the strip of cover film 102 is cut into individual sheets of cover film 20 (second outer shape processing step). Examples of the cutting method include cutting by irradiation with laser light and cutting by punching.

如此可製造附覆蓋膜之黏著劑層X。In this way, an adhesive layer X with a covering film can be produced.

附覆蓋膜之黏著劑層X亦可為兩面附剝離襯墊之黏著片材。具體而言,附覆蓋膜之黏著劑層X亦可為黏著劑層30係長條之黏著片材,且覆蓋膜10以能夠剝離之方式與該黏著片材相接之剝離襯墊。於該情形時,覆蓋膜10之第1面11較佳為被施以剝離處理之剝離面。此類附覆蓋膜之黏著劑層X中,覆蓋膜10、20在使用作為黏著片材之黏著劑層30時自黏著劑層30剝落。 [實施例] The adhesive layer X with a covering film may also be an adhesive sheet with peel-off pads on both sides. Specifically, the adhesive layer X with a covering film may also be an adhesive sheet in which the adhesive layer 30 is a long strip, and the covering film 10 is connected to the peel-off pad in a peelable manner. In this case, the first surface 11 of the covering film 10 is preferably a peel-off surface subjected to a peeling treatment. In this type of adhesive layer X with a covering film, the covering films 10 and 20 are peeled off from the adhesive layer 30 when used as the adhesive layer 30 of the adhesive sheet. [Example]

以下,示出實施例,對本發明具體地進行說明。但,本發明並不限定於實施例。又,以下所記載之調配量(含量)、物性值、參數等具體之數值可代替為上述「實施方式」中所記載之與該等對應之調配量(含量)、物性值、參數等之上限(定義為「以下」或「未達」之數值)或下限(定義為「以上」或「超過」之數值)。The following examples are shown to specifically explain the present invention. However, the present invention is not limited to the examples. In addition, the specific numerical values of the blending amounts (contents), physical property values, parameters, etc. described below can be replaced by the upper limit (defined as a value "below" or "less than") or lower limit (defined as a value "above" or "exceeding") of the corresponding blending amounts (contents), physical property values, parameters, etc. described in the above "Implementation Methods".

[實施例1] <黏著劑組合物之製備> 首先,對包含丙烯酸2-乙基己酯(2EHA)50質量份、丙烯酸月桂酯(LA)40質量份、丙烯酸正丁酯(BA)2質量份、丙烯酸4-羥基丁酯(4HBA)6質量份、N-乙烯基-2-吡咯啶酮(NVP)2質量份、及光聚合起始劑(製品名「Omnirad 184」,IGM Resins公司製造)0.015質量份之混合物照射紫外線(聚合反應),獲得預聚物組合物(聚合率約為10%)(預聚物組合物含有未經過聚合反應之單體成分)。繼而,使預聚物組合物100質量份、作為多官能丙烯酸酯單體之二季戊四醇六丙烯酸酯(DPHA)0.08質量份、及矽烷偶合劑(製品名「KBM-403」,3-縮水甘油氧基丙基三甲氧基矽烷,信越化學工業公司製造)0.3質量份加以混合,獲得黏著劑組合物C1。 [Example 1] <Preparation of adhesive composition> First, a mixture containing 50 parts by mass of 2-ethylhexyl acrylate (2EHA), 40 parts by mass of lauryl acrylate (LA), 2 parts by mass of n-butyl acrylate (BA), 6 parts by mass of 4-hydroxybutyl acrylate (4HBA), 2 parts by mass of N-vinyl-2-pyrrolidone (NVP), and 0.015 parts by mass of a photopolymerization initiator (product name "Omnirad 184", manufactured by IGM Resins) was irradiated with ultraviolet light (polymerization reaction) to obtain a prepolymer composition (polymerization rate of about 10%) (the prepolymer composition contains monomer components that have not undergone polymerization reaction). Next, 100 parts by mass of the prepolymer composition, 0.08 parts by mass of dipentaerythritol hexaacrylate (DPHA) as a multifunctional acrylate monomer, and 0.3 parts by mass of a silane coupling agent (product name "KBM-403", 3-glycidyloxypropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.) were mixed to obtain an adhesive composition C1.

<剝離襯墊之製作> 首先,使矽酮系剝離處理劑(製品名「KE-3703」,含有分子中具有己烯基之聚有機矽氧烷、及分子中具有氫矽烷基之聚有機矽氧烷交聯劑之加成型矽酮系剝離處理劑之28.5質量%甲苯溶液,信越化學工業公司製造)90質量份、矽酮系剝離控制劑(製品名「KS-3800」,信越工業化學公司製造)0.9質量份、矽酮硬化用鉑觸媒(製品名「CAT-PL-50T」,信越工業化學公司製造)0.3質量份、及溶劑加以混合,製備矽酮固形物成分濃度0.7質量%之剝離處理劑溶液。溶劑係甲苯與己烷之體積比為1:1之混合溶劑。繼而,對雙軸延伸聚酯膜(製品名「Lumirror XD500P」,厚度75 μm,Toray Advanced Materials Korea製造)施以剝離處理。具體而言,首先,將上述剝離處理劑溶液塗佈於該聚酯膜之單面而形成塗膜。塗佈係使用線棒塗佈器#9。繼而,藉由熱風乾燥機,於130℃下對膜上之塗膜進行1分鐘加熱,使其乾燥。藉此,於聚酯膜上形成厚度0.1 μm之矽酮剝離層(剝離處理)。如此製得於單面具有剝離處理面之剝離襯墊。 <Preparation of peeling pad> First, 90 parts by weight of silicone peeling agent (product name "KE-3703", a 28.5% by weight toluene solution of an addition-type silicone peeling agent containing a polyorganosiloxane having a hexene group in the molecule and a polyorganosiloxane crosslinking agent having a hydrosilyl group in the molecule, manufactured by Shin-Etsu Chemical Co., Ltd.) and silicone peeling agent. 0.9 parts by mass of a control agent (product name "KS-3800", manufactured by Shin-Etsu Chemical Co., Ltd.), 0.3 parts by mass of a platinum catalyst for silicone curing (product name "CAT-PL-50T", manufactured by Shin-Etsu Chemical Co., Ltd.), and a solvent are mixed to prepare a stripping agent solution having a silicone solid content concentration of 0.7% by mass. The solvent is a mixed solvent of toluene and hexane in a volume ratio of 1:1. Next, a stripping treatment is applied to a biaxially stretched polyester film (product name "Lumirror XD500P", thickness 75 μm, manufactured by Toray Advanced Materials Korea). Specifically, first, the above-mentioned stripping agent solution is applied to one side of the polyester film to form a coating film. The coating was performed using a wire bar coater #9. The coating on the film was then heated at 130°C for 1 minute in a hot air dryer to dry it. Thus, a silicone release layer (release treatment) with a thickness of 0.1 μm was formed on the polyester film. In this way, a release pad having a release treatment surface on one side was produced.

<積層片材之製作> 首先,將黏著劑組合物C1塗佈於上述剝離襯墊(第2覆蓋膜)之剝離處理面上而形成塗膜。繼而,將單面被施以電漿處理之表面保護膜(第1覆蓋膜)之電漿處理面貼合於剝離襯墊上之塗膜上。表面保護膜係厚度49 μm之透明聚醯亞胺(PI)膜。電漿處理中,使用電漿照射裝置(製品名「AP-TO5」,積水工業公司製造),將電壓設為160 V,頻率設為10 kHz,處理速度設為5000 mm/分鐘。繼而,對塗膜自表面保護膜側照射紫外線使塗膜紫外線硬化,形成厚度25 μm之黏著劑層(黏著劑A1)。由此獲得作為附覆蓋膜之黏著劑層之原材片材之積層片材(剝離襯墊/黏著劑層/表面保護膜)。紫外線照射中,使用黑光燈作為照射光源,將照射強度設為5 mW/cm 2(後述紫外線照射中亦如此)。 <Production of laminated sheets> First, the adhesive composition C1 is applied to the peeling treated surface of the above-mentioned peeling pad (second covering film) to form a coating. Then, the plasma-treated surface of the surface protection film (first covering film) that has been plasma-treated on one side is attached to the coating on the peeling pad. The surface protection film is a transparent polyimide (PI) film with a thickness of 49 μm. During the plasma treatment, a plasma irradiation device (product name "AP-TO5", manufactured by Sekisui Industries) is used, and the voltage is set to 160 V, the frequency is set to 10 kHz, and the treatment speed is set to 5000 mm/min. Then, the coating film was irradiated with ultraviolet rays from the surface protective film side to cure the coating film by ultraviolet rays, thereby forming an adhesive layer (adhesive A1) with a thickness of 25 μm. Thus, a laminated sheet (peel-off liner/adhesive layer/surface protective film) as a raw sheet of an adhesive layer with a covering film was obtained. During the ultraviolet irradiation, a black light was used as the irradiation light source, and the irradiation intensity was set to 5 mW/cm 2 (the same applies to the ultraviolet irradiation described later).

<第1外形加工> 繼而,對積層片材之黏著劑層進行外形加工(第1外形加工步驟)。具體而言,對積層片材,藉由沿著積層片材之第1預切斷線,自表面保護膜側向厚度方向照射CO 2雷射光(波長9.4 μm),從而在厚度方向上切斷剝離襯墊上之黏著劑層及表面保護膜(雷射加工)。雷射照射中,使用第1雷射加工裝置(製品名「LC500」,武井電機工業製造),將照射雷射光之脈衝寬度設為3.3 μ秒,雷射輸出設為23 W,脈衝之頻率設為15 kHz。本步驟中,黏著劑層中,形成規定俯視形狀之黏著劑層及圍繞其之第1周圍部,表面保護膜中,於第1周圍部上形成第2周圍部。 <First contour processing> Next, the adhesive layer of the laminated sheet is contour processed (first contour processing step). Specifically, the laminated sheet is irradiated with CO2 laser light (wavelength 9.4 μm) from the surface protection film side in the thickness direction along the first pre-cut line of the laminated sheet, thereby cutting the adhesive layer and the surface protection film on the peeling pad in the thickness direction (laser processing). During the laser irradiation, the first laser processing device (product name "LC500", manufactured by Takei Electric Industry) was used, and the pulse width of the irradiated laser light was set to 3.3 μs, the laser output was set to 23 W, and the pulse frequency was set to 15 kHz. In this step, an adhesive layer having a predetermined top view shape and a first peripheral portion surrounding the adhesive layer are formed in the adhesive layer, and a second peripheral portion is formed on the first peripheral portion in the surface protection film.

<周圍部之去除,第2外形加工> 第1外形加工步驟之後,自剝離襯墊上去除第1周圍部及第2周圍部。其後,對剝離襯墊進行外形加工(第2外形加工步驟)。具體而言,藉由沿著剝離襯墊之第2預切斷線,於厚度方向對剝離襯墊照射CO 2雷射,從而將剝離襯墊切斷成規定俯視形狀。第2預切斷線較上述第1預切斷線更遠離面方向外側3 mm。又,本步驟之雷射照射中,使用第1雷射加工裝置(製品名「LC500」,武井電機工業製造),將照射雷射光之脈衝寬度設為3.3 μ秒,雷射輸出設為40 W,脈衝之頻率設為15 kHz。 <Removal of peripheral portion, second contour processing> After the first contour processing step, the first peripheral portion and the second peripheral portion are removed from the peel-off pad. Thereafter, the peel-off pad is contour processed (second contour processing step). Specifically, the peel-off pad is irradiated with CO2 laser in the thickness direction along the second pre-cut line of the peel-off pad, thereby cutting the peel-off pad into a predetermined top view shape. The second pre-cut line is 3 mm further outward in the surface direction than the first pre-cut line mentioned above. In the laser irradiation of this step, the first laser processing device (product name "LC500", manufactured by Takei Electric Industry) was used, and the pulse width of the irradiated laser light was set to 3.3 μs, the laser output was set to 40 W, and the pulse frequency was set to 15 kHz.

如此製得實施例1之附覆蓋膜之黏著劑層(表面保護膜/黏著劑層/剝離襯墊)。實施例1之附覆蓋膜之黏著劑層具備附黏著劑層(厚度25 μm)之表面保護膜、及被覆該膜之黏著劑層側之剝離襯墊。Thus, the adhesive layer with covering film (surface protection film/adhesive layer/peel-off liner) of Example 1 was prepared. The adhesive layer with covering film of Example 1 comprises a surface protection film with an adhesive layer (thickness 25 μm) and a peel-off liner covering the adhesive layer side of the film.

[實施例2] 首先,對包含丙烯酸2-乙基己酯(2EHA)45質量份、丙烯酸月桂酯(LA)42質量份、丙烯酸正丁酯(BA)2質量份、丙烯酸4-羥基丁酯(4HBA)4質量份、N-乙烯基-2-吡咯啶酮(NVP)7質量份、及光聚合起始劑(Omnirad 184)0.015質量份之混合物照射紫外線(聚合反應),獲得預聚物組合物(聚合率約為10%)。繼而,使預聚物組合物100質量份、作為多官能丙烯酸酯單體之二季戊四醇六丙烯酸酯(DPHA)0.08質量份、及矽烷偶合劑(製品名「KBM-403」,3-縮水甘油氧基丙基三甲氧基矽烷,信越化學工業公司製造)0.3質量份加以混合,獲得黏著劑組合物C2。使用該黏著劑組合物C2來代替黏著劑組合物C1,形成厚度15 μm之黏著劑層(黏著劑A2),除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式操作,製得實施例2之附覆蓋膜之黏著劑層(表面保護膜/黏著劑層/剝離襯墊)。 [Example 2] First, a mixture containing 45 parts by mass of 2-ethylhexyl acrylate (2EHA), 42 parts by mass of lauryl acrylate (LA), 2 parts by mass of n-butyl acrylate (BA), 4 parts by mass of 4-hydroxybutyl acrylate (4HBA), 7 parts by mass of N-vinyl-2-pyrrolidone (NVP), and 0.015 parts by mass of a photopolymerization initiator (Omnirad 184) was irradiated with ultraviolet light (polymerization reaction) to obtain a prepolymer composition (polymerization rate of about 10%). Next, 100 parts by mass of the prepolymer composition, 0.08 parts by mass of dipentaerythritol hexaacrylate (DPHA) as a multifunctional acrylate monomer, and 0.3 parts by mass of a silane coupling agent (product name "KBM-403", 3-glycidyloxypropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Co., Ltd.) were mixed to obtain an adhesive composition C2. The adhesive composition C2 was used to replace the adhesive composition C1 to form an adhesive layer (adhesive A2) with a thickness of 15 μm. Otherwise, the adhesive layer with a covering film of Example 1 was operated in the same manner to obtain the adhesive layer with a covering film of Example 2 (surface protection film/adhesive layer/peeling pad).

[實施例3] 積層片材製作步驟中,使形成之黏著劑層之厚度為15 μm。第1外形加工步驟中,將照射雷射光之脈衝之頻率設為30 kHz。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得實施例3之附覆蓋膜之黏著劑層。 [Example 3] In the lamination sheet manufacturing step, the thickness of the formed adhesive layer is set to 15 μm. In the first shape processing step, the pulse frequency of the irradiated laser light is set to 30 kHz. In addition, the adhesive layer with a covering film of Example 3 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

[實施例4] 第1外形加工步驟中,使用第2雷射加工裝置(製品名「LC750」,武井電機工業製造)來代替第1雷射加工裝置,將照射雷射光之脈衝寬度設為0.83 μ秒,脈衝之頻率設為30 kHz,雷射輸出設為23 W。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得實施例4之附覆蓋膜之黏著劑層。 [Example 4] In the first outer shape processing step, the second laser processing device (product name "LC750", manufactured by Takei Electric Industry) is used instead of the first laser processing device, and the pulse width of the irradiated laser light is set to 0.83 μs, the pulse frequency is set to 30 kHz, and the laser output is set to 23 W. In addition, the adhesive layer with a covering film of Example 4 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

[實施例5] 第1外形加工步驟中,將照射雷射光之脈衝之頻率設為30 kHz。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得實施例5之附覆蓋膜之黏著劑層。 [Example 5] In the first shape processing step, the pulse frequency of the irradiated laser light is set to 30 kHz. In addition, the adhesive layer with a covering film of Example 5 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

[實施例6] 第1外形加工步驟中,將照射雷射光之脈衝之頻率設為5 kHz。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得實施例6之附覆蓋膜之黏著劑層。 [Example 6] In the first shape processing step, the pulse frequency of the irradiated laser light is set to 5 kHz. In addition, the adhesive layer with a covering film of Example 6 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

[比較例1] 積層片材製作步驟中,使形成之黏著劑層之厚度為15 μm。第1外形加工步驟中,實施沖壓加工來代替雷射加工。具體而言,對剝離襯墊上之黏著劑層,使第1沖壓加工刀在厚度方向上自表面保護膜側插入至剝離襯墊為止,藉此形成規定俯視形狀之黏著劑層。第1沖壓加工刀具有刀刃角80度之刀尖。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得比較例1之附覆蓋膜之黏著劑層。 [Comparative Example 1] In the lamination sheet manufacturing step, the thickness of the formed adhesive layer is 15 μm. In the first outer shape processing step, stamping is performed instead of laser processing. Specifically, the adhesive layer on the peeling pad is inserted from the surface protection film side to the peeling pad in the thickness direction to form an adhesive layer of a predetermined top view shape. The first stamping knife has a blade tip with a blade angle of 80 degrees. In addition, the adhesive layer with a covering film of Comparative Example 1 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

[比較例2] 第1外形加工步驟中,實施沖壓加工來代替雷射加工。具體而言,對剝離襯墊上之黏著劑層,使第2沖壓加工刀在厚度方向上自表面保護膜側插入至剝離襯墊為止,藉此形成規定俯視形狀之黏著劑層。第2沖壓加工刀具有刀刃角30度之刀尖。除此以外,與實施例2之附覆蓋膜之黏著劑層採相同之方式,製得比較例2之附覆蓋膜之黏著劑層。 [Comparative Example 2] In the first outer shape processing step, punching is performed instead of laser processing. Specifically, for the adhesive layer on the peeling pad, the second punching tool is inserted from the surface protective film side to the peeling pad in the thickness direction, thereby forming an adhesive layer of a predetermined top view shape. The second punching tool has a blade tip with a blade angle of 30 degrees. In addition, the adhesive layer with a covering film of Comparative Example 2 is prepared in the same manner as the adhesive layer with a covering film of Example 2.

[比較例3] 積層片材製作步驟中,使形成之黏著劑層之厚度為15 μm。第1外形加工步驟中,實施沖壓加工來代替雷射加工。具體而言,對剝離襯墊上之黏著劑層,使第2沖壓加工刀(具有刀刃角30度之刀尖)在厚度方向上自表面保護膜側插入至剝離襯墊為止,藉此形成規定俯視形狀之黏著劑層。除此以外,與實施例1之附覆蓋膜之黏著劑層採相同之方式,製得比較例3之附覆蓋膜之黏著劑層。 [Comparative Example 3] In the lamination sheet manufacturing step, the thickness of the formed adhesive layer is 15 μm. In the first outer shape processing step, punching processing is performed instead of laser processing. Specifically, for the adhesive layer on the peeling pad, the second punching processing knife (with a blade tip of 30 degrees) is inserted from the surface protection film side to the peeling pad in the thickness direction to form an adhesive layer of a predetermined top view shape. In addition, the adhesive layer with a covering film of Comparative Example 3 is prepared in the same manner as the adhesive layer with a covering film of Example 1.

<凝膠分率> 對實施例1~6及比較例1~3中之各黏著劑層之凝膠分率進行測定。具體而言如下所述。 <Gel fraction> The gel fraction of each adhesive layer in Examples 1 to 6 and Comparative Examples 1 to 3 was measured. Specifically, it is as follows.

首先,自黏著劑層採集約0.1 g(質量:W 1mg)之黏著劑樣品。繼而,將黏著劑樣品利用平均孔徑0.2 μm之四氟乙烯樹脂製多孔膜(質量:W 2mg)包裹成束口袋狀,並利用風箏線(質量:W 3mg)綁住開口,獲得包裹。四氟乙烯樹脂製多孔膜係使用日東電工股份有限公司製造之多孔膜(製品名「NITOFLON NTF1122」)。繼而,將裝有黏著劑樣品之包裹放入至容積50 mL之容器中後,使該容器充滿乙酸乙酯(每個包裹使用一個容器)。使其於23℃下靜置7天後,自容器中取出包裹,使包裹於130℃下乾燥2小時。其後測定該包裹之質量(W 4mg)。然後,藉由將W 1~W 4之值代入至下述式中,從而算出黏著劑層之凝膠分率。將其值示於表1、2中。 First, collect about 0.1 g (mass: W 1 mg) of adhesive sample from the adhesive layer. Then, wrap the adhesive sample into a drawstring bag using a tetrafluoroethylene resin porous membrane (mass: W 2 mg) with an average pore size of 0.2 μm, and tie the opening with a kite line (mass: W 3 mg) to obtain a package. The tetrafluoroethylene resin porous membrane is a porous membrane manufactured by Nitto Denko Co., Ltd. (product name "NITOFLON NTF1122"). Then, put the package containing the adhesive sample into a 50 mL container, and fill the container with ethyl acetate (one container for each package). After leaving it at 23°C for 7 days, take out the package from the container and dry it at 130°C for 2 hours. The mass of the package was then measured (W 4 mg). The gel fraction of the adhesive layer was calculated by substituting the values of W 1 to W 4 into the following formula. The values are shown in Tables 1 and 2.

凝膠分率(%)=[(W 4-W 2-W 3)/W 1]×100 Gel fraction (%) = [(W 4 -W 2 -W 3 )/W 1 ] × 100

<剪切儲存模數> 對實施例1~6及比較例1~3之各黏著劑層之動態黏彈性進行測定。 <Shear storage modulus> The dynamic viscoelasticity of each adhesive layer of Examples 1 to 6 and Comparative Examples 1 to 3 was measured.

首先,為每個黏著劑層製作所需數量之測定用樣品。具體而言,首先,使自黏著劑層切出之複數片黏著劑層片貼合而製作厚度約1.5 mm之樣品片材。繼而,對該片材進行沖壓,獲得作為測定用樣品之圓柱狀顆粒物(直徑7.9 mm)。First, the required number of samples for each adhesive layer is prepared. Specifically, first, a plurality of adhesive layer sheets cut from the adhesive layer are laminated to prepare a sample sheet with a thickness of about 1.5 mm. Then, the sheet is punched to obtain cylindrical particles (diameter 7.9 mm) as the sample for measurement.

然後,藉由動態黏彈性測定裝置(製品名「高級流變擴展系統(ARES,Advanced Rheometric Expansion System)」,Rheometric Scientific公司製造),對測定用樣品實施動態黏彈性測定。具體而言,將測定用樣品固定於該裝置之直徑7.9 mm之平行板之治具後,實施測定。本測定中,將測定模式設為剪切模式,測定溫度範圍設為-40℃~100℃,升溫速度設為5℃/分鐘,頻率設為1 Hz。根據測定結果讀取於25℃下之剪切儲存模數、測定溫度範圍內之最大剪切儲存模數。將其值示於表1、2中。Then, a dynamic viscoelasticity measurement is performed on the sample for measurement using a dynamic viscoelasticity measuring device (product name: "Advanced Rheometric Expansion System (ARES)", manufactured by Rheometric Scientific). Specifically, the sample for measurement is fixed to the parallel plate fixture of the device with a diameter of 7.9 mm, and then the measurement is performed. In this measurement, the measurement mode is set to the shear mode, the measurement temperature range is set to -40°C to 100°C, the heating rate is set to 5°C/min, and the frequency is set to 1 Hz. Based on the measurement results, the shear storage modulus at 25°C and the maximum shear storage modulus within the measurement temperature range are read. The values are shown in Tables 1 and 2.

<形狀解析> 藉由形狀解析雷射顯微鏡(製品名「VK-X1000」,基恩士製造)對實施例1~6及比較例1~3中之各黏著劑層進行形狀解析。具體而言,藉由該顯微鏡,測定黏著劑層之端部之位置偏移長度d(圖2~圖4)、表面保護膜(第1覆蓋膜)端部之角度α(圖2~圖4)、黏著劑層端部之角度β(圖2、圖4)、及表面保護膜之邊緣寬度W(圖2~圖4)之最大值與最小值之差。將其結果示於表1、2中。亦將角度β相對於角度α之比率(β/α)示於表1、2中。位置偏移長度d係相對於膜端面(圖2~圖4中係膜端面12)及該膜端面之延長面(圖2~圖4中係延長面12')正交之方向上之長度。又,邊緣寬度W之最大值與最小值之差係表面保護膜之俯視下之周端緣之周向之1 mm長度(切斷長度)之範圍內之邊緣寬度W之最大值與最小值的差。 <Shape analysis> The shape analysis of each adhesive layer in Examples 1 to 6 and Comparative Examples 1 to 3 was performed using a shape analysis laser microscope (product name "VK-X1000", manufactured by KEYENCE). Specifically, the microscope was used to measure the maximum and minimum values of the positional deviation length d of the end of the adhesive layer (Figures 2 to 4), the angle α of the end of the surface protective film (first covering film) (Figures 2 to 4), the angle β of the end of the adhesive layer (Figures 2 and 4), and the edge width W of the surface protective film (Figures 2 to 4). The results are shown in Tables 1 and 2. The ratio of angle β to angle α (β/α) is also shown in Tables 1 and 2. The positional offset length d is the length in the direction orthogonal to the film end surface (film end surface 12 in Figures 2 to 4) and the extension surface of the film end surface (extension surface 12' in Figures 2 to 4). In addition, the difference between the maximum and minimum values of the edge width W is the difference between the maximum and minimum values of the edge width W within the range of 1 mm length (cut length) of the peripheral edge of the surface protection film in the top view.

<端部黏連> 對實施例1~6及比較例1~3之各附覆蓋膜之黏著劑層,調查不易端部黏連之程度。具體而言,首先,為每個附覆蓋膜之黏著劑層製作實質上相同尺寸之10片評價樣品,使10片評價樣品堆疊而形成膜束(第1步驟)。繼而,將前端具有黏著面之圓柱桿(直徑10 mm)之前端黏著面,自上方壓抵於膜束中之位於最上方之附覆蓋膜之黏著劑層後,向上方拉拽該桿,數出隨著桿被提起之附覆蓋膜之黏著劑層之片數(第2步驟)。對每個膜束,進行10次由第1步驟及其後之第2步驟所組成之試驗。10次試驗中,將隨著桿被提起之附覆蓋膜之黏著劑層僅為1片之試驗之數量為10之情形評價為“優”,將該試驗之數量為6~9之情形評價為“良”,將該試驗之數量為5以下之情形評價為“不良”。將其評價結果示於表1中。 <End adhesion> The degree of end adhesion resistance of each adhesive layer with a covering film in Examples 1 to 6 and Comparative Examples 1 to 3 was investigated. Specifically, first, 10 evaluation samples of substantially the same size were prepared for each adhesive layer with a covering film, and the 10 evaluation samples were stacked to form a film bundle (Step 1). Then, the front end adhesive surface of a cylindrical rod (diameter 10 mm) having an adhesive surface at the front end was pressed from above against the adhesive layer with a covering film at the top of the film bundle, and the rod was pulled upward to count the number of adhesive layers with a covering film that were lifted as the rod was lifted (Step 2). For each membrane bundle, the test consisting of step 1 and the subsequent step 2 was performed 10 times. Among the 10 tests, the case where the number of tests where only one adhesive layer of the covering film was lifted up with the rod was 10 was evaluated as "excellent", the case where the number of tests was 6 to 9 was evaluated as "good", and the case where the number of tests was 5 or less was evaluated as "poor". The evaluation results are shown in Table 1.

<糊劑污染> 如下述般,對實施例1~6及比較例1~3之各附覆蓋膜之黏著劑層,調查糊劑污染之有無及程度。 <Paste contamination> As described below, the presence and degree of paste contamination were investigated for the adhesive layers with covering films in Examples 1 to 6 and Comparative Examples 1 to 3.

首先,藉由裁斷機,自附覆蓋膜之黏著劑層切出50片樣品膜(100 mm×50 mm)。繼而,藉由目視及光學顯微鏡對各樣品膜之切斷端面進行觀察。然後,算出切斷端面內產生糊劑污染之樣品膜(糊劑污染膜)之數目相對於樣品膜之總數50之比率(%)。糊劑污染係指自黏著劑層溢出之黏著劑附著於覆蓋膜(表面保護膜、剝離襯墊)之外表面之狀態。然後,針對糊劑污染之抑制,將糊劑污染膜之比率未達10%之情形評價為“優”,將糊劑污染膜之比率為10%以上且未達20%之情形評價為“良”,將糊劑污染膜之比率為20%以上之情形評價為“不良”。將其等結果示於表1、2中。First, 50 sample films (100 mm × 50 mm) were cut from the adhesive layer attached to the cover film by a cutter. Then, the cut end faces of each sample film were observed visually and under an optical microscope. Then, the ratio (%) of the number of sample films with paste contamination in the cut end faces (paste-contaminated films) relative to the total number of sample films (50) was calculated. Paste contamination refers to the state in which the adhesive overflowing from the adhesive layer adheres to the outer surface of the cover film (surface protection film, peeling pad). Then, regarding the suppression of paste contamination, the case where the ratio of paste contamination to the film was less than 10% was evaluated as "excellent", the case where the ratio of paste contamination to the film was 10% or more and less than 20% was evaluated as "good", and the case where the ratio of paste contamination to the film was 20% or more was evaluated as "poor". The results are shown in Tables 1 and 2.

[表1] 表1    實施例1 實施例2 實施例3 實施例4 黏著劑層 黏著劑之種類 A1 A2 A1 A1 厚度(μm) 25 15 15 25 凝膠分率(%) 70 70 70 70 於25℃下之剪切儲存模數(kPa) 27 30 27 27 最大剪切儲存模數(kPa) 600 4700 600 600 第1外形加工 加工方法 雷射加工(LC500) 雷射加工(LC500) 雷射加工(LC500) 雷射加工(LC750) 雷射輸出(W) 23 23 23 23 脈衝頻率(kHz) 15 15 30 30 位置偏移長度d(μm) 0 0 0 0 第1覆蓋膜中之角度α(°) 46.8 44.4 44.9 53.9 黏著劑層中之角度β(°) 58.4 54.7 52.9 54.7 β/α 1.25 1.23 1.18 1.01 邊緣寬度W之最大值與最小值之差(μm) 2.2 1.8 1.7 2.2 端部黏連之抑制 糊劑污染之抑制 [Table 1] Table 1 Embodiment 1 Embodiment 2 Embodiment 3 Embodiment 4 Adhesive layer Types of Adhesives A1 A2 A1 A1 Thickness(μm) 25 15 15 25 Gel fraction (%) 70 70 70 70 Shear storage modulus at 25℃(kPa) 27 30 27 27 Maximum shear storage modulus (kPa) 600 4700 600 600 1st shape processing processing method Laser Processing (LC500) Laser Processing (LC500) Laser Processing (LC500) Laser Processing (LC750) Laser output(W) twenty three twenty three twenty three twenty three Pulse frequency(kHz) 15 15 30 30 Position deviation length d(μm) 0 0 0 0 Angle α in the first covering film (°) 46.8 44.4 44.9 53.9 Angle β in adhesive layer (°) 58.4 54.7 52.9 54.7 β/α 1.25 1.23 1.18 1.01 Difference between the maximum and minimum values of edge width W (μm) 2.2 1.8 1.7 2.2 Inhibition of end adhesion Excellent Excellent Excellent Excellent Suppression of paste pollution Excellent Excellent Excellent Excellent

[表2] 表2    實施例5 實施例6 比較例1 比較例2 比較例3 黏著劑層 黏著劑之種類 A1 A1 A1 A2 A1 厚度(μm) 25 25 15 15 15 凝膠分率(%) 70 70 70 70 70 於25℃下之剪切儲存模數(kPa) 27 30 27 27 27 最大剪切儲存模數(kPa) 600 600 600 4700 600 第1外形加工 加工方法 雷射加工(LC500) 雷射加工(LC500) 沖壓加工(刀刃角80°) 沖壓加工(刀刃角30°) 沖壓加工(刀刃角30°) 雷射輸出(W) 23 23 - - - 脈衝頻率(kHz) 30 5 - - - 位置偏移長度d(μm) 0 1 10 6 15 第1覆蓋膜中之角度α(°) 49.1 56.1 88.2 87.6 87.6 黏著劑層中之角度β(°) 49.2 67.3 88.2 87.6 87.6 β/α 1.00 1.20 1.00 1.00 1.00 邊緣寬度W之最大值與最小值之差(μm) 2.2 3.4 14.2 17.6 23.9 端部黏連之抑制 不良 不良 不良 糊劑污染之抑制 不良 不良 不良 [Table 2] Table 2 Embodiment 5 Embodiment 6 Comparison Example 1 Comparison Example 2 Comparison Example 3 Adhesive layer Types of Adhesives A1 A1 A1 A2 A1 Thickness(μm) 25 25 15 15 15 Gel fraction (%) 70 70 70 70 70 Shear storage modulus at 25℃(kPa) 27 30 27 27 27 Maximum shear storage modulus (kPa) 600 600 600 4700 600 1st shape processing processing method Laser Processing (LC500) Laser Processing (LC500) Punching (blade angle 80°) Punching (blade angle 30°) Punching (blade angle 30°) Laser output(W) twenty three twenty three - - - Pulse frequency(kHz) 30 5 - - - Position deviation length d(μm) 0 1 10 6 15 Angle α in the first covering film (°) 49.1 56.1 88.2 87.6 87.6 Angle β in adhesive layer (°) 49.2 67.3 88.2 87.6 87.6 β/α 1.00 1.20 1.00 1.00 1.00 Difference between the maximum and minimum values of edge width W (μm) 2.2 3.4 14.2 17.6 23.9 Inhibition of end adhesion Excellent good bad bad bad Suppression of paste pollution Excellent good bad bad bad

10:覆蓋膜(第1覆蓋膜) 11:第1面 12:膜端面 12':延長面 20:覆蓋膜(第2覆蓋膜) 20A:延出端部 21:剝離面 22:半切溝 22a:內壁面 22b:內壁面 22c:圓底 30:黏著劑層 30A:端部 31:黏著面 32:端面 60:積層片材 60':附覆蓋膜之黏著劑層 61:剝離襯墊 61A:剝離襯墊 62:黏著劑層 62a:周圍部 62A:黏著劑層 62e:端部 62E:突出部 63:剝離襯墊 63a:周圍部 63A:剝離襯墊 63e:端部 65:切斷部位 101:覆蓋膜 101a:周圍部 102:覆蓋膜 103:黏著劑層 103a:周圍部 D:面方向 d:位置偏移長度 d':延出長度 H:厚度方向 L:緣端長度 W:邊緣寬度 X:附覆蓋膜之黏著劑層 Y:附黏著劑層之表面保護膜 Z:積層片材 α:角度 β:角度 10: Covering film (first covering film) 11: First surface 12: Film end surface 12': Extension surface 20: Covering film (second covering film) 20A: Extension end 21: Peeling surface 22: Half-cut groove 22a: Inner wall surface 22b: Inner wall surface 22c: Round bottom 30: Adhesive layer 30A: End surface 31: Adhesive surface 32: End surface 60: Laminated sheet 60': Adhesive layer with covering film 61: Peeling pad 61A: Peeling pad 62: Adhesive layer 62a: Peripheral part 62A: Adhesive layer 62e: End 62E: Protrusion 63: Peel-off pad 63a: Peripheral 63A: Peel-off pad 63e: End 65: Cutting site 101: Covering film 101a: Peripheral 102: Covering film 103: Adhesive layer 103a: Peripheral D: Surface direction d: Position offset length d': Extension length H: Thickness direction L: Edge length W: Edge width X: Adhesive layer with covering film Y: Surface protection film with adhesive layer Z: Laminated sheet α: Angle β: Angle

圖1係本發明之附覆蓋膜之黏著劑層之一實施方式之剖面模式圖。 圖2係圖1所示之附覆蓋膜之黏著劑層之端部之局部放大剖視圖。 圖3係圖1所示之附覆蓋膜之黏著劑層之一變化例中之端部之局部放大剖視圖。 圖4係圖1所示之附覆蓋膜之黏著劑層之另一變化例中之端部之局部放大剖視圖。 圖5A~圖5D係表示圖1所示之附覆蓋膜之黏著劑層之製造方法。圖5A係表示積層片材製作步驟,圖5B係表示第1外形加工步驟,圖5C係表示去除步驟,圖5D係表示第2外形加工步驟。 圖6A~圖6D係表示先前之附覆蓋膜之黏著劑層之製造方法之一例。圖6A係表示積層片材製作步驟,圖6B係表示沖壓加工步驟,圖6C係表示去除步驟,圖6D係表示切斷步驟。 圖7係先前之附覆蓋膜之黏著劑層之端部之局部放大剖視圖。 FIG. 1 is a cross-sectional schematic diagram of an embodiment of the adhesive layer with a covering film of the present invention. FIG. 2 is a partially enlarged cross-sectional diagram of an end portion of the adhesive layer with a covering film shown in FIG. 1. FIG. 3 is a partially enlarged cross-sectional diagram of an end portion of a variation of the adhesive layer with a covering film shown in FIG. 1. FIG. 4 is a partially enlarged cross-sectional diagram of an end portion of another variation of the adhesive layer with a covering film shown in FIG. 1. FIG. 5A to FIG. 5D show a method for manufacturing the adhesive layer with a covering film shown in FIG. 1. FIG. 5A shows a laminate sheet manufacturing step, FIG. 5B shows a first shape processing step, FIG. 5C shows a removal step, and FIG. 5D shows a second shape processing step. Fig. 6A to Fig. 6D show an example of a manufacturing method of a previous adhesive layer with a covering film. Fig. 6A shows a laminated sheet manufacturing step, Fig. 6B shows a stamping step, Fig. 6C shows a removal step, and Fig. 6D shows a cutting step. Fig. 7 is a partially enlarged cross-sectional view of an end portion of a previous adhesive layer with a covering film.

10:覆蓋膜(第1覆蓋膜) 10: Covering film (1st covering film)

11:第1面 11: Page 1

12:膜端面 12: Membrane end face

20:覆蓋膜(第2覆蓋膜) 20: Covering film (second covering film)

20A:延出端部 20A: Extended end

21:剝離面 21: Peel off the surface

22:半切溝 22: Hemisection groove

30:黏著劑層 30: Adhesive layer

30A:端部 30A: End

31:黏著面 31: Adhesive surface

32:端面 32: End face

D:面方向 D: Face direction

H:厚度方向 H: thickness direction

X:附覆蓋膜之黏著劑層 X: Adhesive layer with covering film

Y:附黏著劑層之表面保護膜 Y: Surface protective film with adhesive layer

Claims (6)

一種附覆蓋膜之黏著劑層,其係在厚度方向上依序具備第1覆蓋膜、黏著劑層、及第2覆蓋膜者,且 上述第1覆蓋膜具有位於黏著劑層側之第1面11,且具有與該第1面形成銳角之膜端面, 上述第2覆蓋膜具有延出端部,該延出端部在與上述厚度方向正交之面方向上延出至較上述黏著劑層之端部更靠外方, 上述黏著劑層之端部距離上述膜端面、及該膜端面之延長面之位置偏移長度為5 μm以下。 An adhesive layer with a covering film, which has a first covering film, an adhesive layer, and a second covering film in order in the thickness direction, and the first covering film has a first surface 11 located on the side of the adhesive layer and has a film end surface forming an acute angle with the first surface, the second covering film has an extended end portion, and the extended end portion extends to the outside of the end portion of the adhesive layer in a surface direction orthogonal to the thickness direction, and the positional offset length of the end portion of the adhesive layer from the film end surface and the extended surface of the film end surface is less than 5 μm. 如請求項1之附覆蓋膜之黏著劑層,其中上述黏著劑層之凝膠分率為80%以下。The adhesive layer with a covering film as claimed in claim 1, wherein the gel fraction of the adhesive layer is less than 80%. 如請求項1之附覆蓋膜之黏著劑層,其中上述黏著劑層具有5 μm以上50 μm以下之厚度。The adhesive layer with a covering film as claimed in claim 1, wherein the adhesive layer has a thickness of not less than 5 μm and not more than 50 μm. 如請求項1之附覆蓋膜之黏著劑層,其中上述第1覆蓋膜中之上述銳角之角度為40°以上85°以下。As in claim 1, the adhesive layer with a covering film, wherein the angle of the sharp angle in the first covering film is greater than 40° and less than 85°. 如請求項4之附覆蓋膜之黏著劑層,其中上述黏著劑層具有位於上述第2覆蓋膜側之黏著面,且具有與該黏著面形成銳角之黏著劑層端面,該黏著劑層之上述銳角之角度相對於上述第1覆蓋膜之上述銳角之角度之比率為0.9以上1.5以下。An adhesive layer with a covering film as in claim 4, wherein the adhesive layer has an adhesive surface located on the side of the second covering film and has an adhesive layer end face forming an acute angle with the adhesive surface, and the ratio of the acute angle of the adhesive layer to the acute angle of the first covering film is greater than 0.9 and less than 1.5. 如請求項1至5中任一項之附覆蓋膜之黏著劑層,其中於俯視下,表示上述第1覆蓋膜之緣端的邊緣之邊緣寬度之最大值與最小值的差為10 μm以下。The adhesive layer with a cover film as claimed in any one of claims 1 to 5, wherein the difference between the maximum and minimum values of the edge width of the edge representing the edge of the first cover film in a plan view is less than 10 μm.
TW112124526A 2022-07-13 2023-06-30 Cover film-attached pressure-sensitive adhesive layer TW202411070A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022112539A JP2024010933A (en) 2022-07-13 2022-07-13 Adhesive layer having cover film
JP2022-112539 2022-07-13

Publications (1)

Publication Number Publication Date
TW202411070A true TW202411070A (en) 2024-03-16

Family

ID=89485949

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112124526A TW202411070A (en) 2022-07-13 2023-06-30 Cover film-attached pressure-sensitive adhesive layer

Country Status (4)

Country Link
JP (1) JP2024010933A (en)
KR (1) KR20240009359A (en)
CN (1) CN117402566A (en)
TW (1) TW202411070A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6807234B2 (en) 2017-01-10 2021-01-06 日東電工株式会社 Adhesive sheet

Also Published As

Publication number Publication date
JP2024010933A (en) 2024-01-25
CN117402566A (en) 2024-01-16
KR20240009359A (en) 2024-01-22

Similar Documents

Publication Publication Date Title
US20190071589A1 (en) Pressure-sensitive adhesive sheet
US20220380636A1 (en) Laminate sheet and release film
WO2018158857A1 (en) Adhesive sheet
JP2020083996A (en) Pressure-sensitive adhesive sheet and production method of the same, and production method of image display device
CN111527594A (en) Adhesive sheet and method for manufacturing semiconductor device
TW202411070A (en) Cover film-attached pressure-sensitive adhesive layer
JP6713471B2 (en) Adhesive sheet
JP2005023114A (en) Pressure-sensitive type double-sided adhesive tape or sheet
JP2023128155A (en) Optical adhesive sheet with release liner
WO2023276653A1 (en) Optical film with release film
WO2023276655A1 (en) Optical layered body
KR20230067515A (en) Optical pressure-sensitive adhesive sheet with release liner
WO2017038919A1 (en) Adhesive sheet
TW202419598A (en) Optical adhesive sheet and pressure-sensitive adhesive layer-attached optical film
WO2023276654A1 (en) Optical film with cover film
JP2023095055A (en) Optical film with cover film
JP2023095056A (en) Optical laminate and covered optical film
JP2023069650A (en) Optical adhesive sheet having release liners
JP2024051402A (en) Optical adhesive sheet and optical film with adhesive layer
KR20200109320A (en) Double-sided adhesive sheet with double-sided adhesive sheet and release sheet attached