TW202407276A - Heat treatment furnace capable of rapidly lowering the temperature inside the furnace although it has a simple structure - Google Patents

Heat treatment furnace capable of rapidly lowering the temperature inside the furnace although it has a simple structure Download PDF

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Publication number
TW202407276A
TW202407276A TW112120657A TW112120657A TW202407276A TW 202407276 A TW202407276 A TW 202407276A TW 112120657 A TW112120657 A TW 112120657A TW 112120657 A TW112120657 A TW 112120657A TW 202407276 A TW202407276 A TW 202407276A
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processing chamber
temperature
aforementioned
heat treatment
flow path
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TW112120657A
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Chinese (zh)
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城野洋
馬郡義弘
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日商中外爐工業股份有限公司
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3005—Details, accessories, or equipment peculiar to furnaces of these types arrangements for circulating gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00—Cooling of furnaces or of charges therein
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D17/00—Arrangements for using waste heat; Arrangements for using, or disposing of, waste gases
    • F27D17/001—Extraction of waste gases, collection of fumes and hoods used therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04—Circulating atmospheres by mechanical means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B9/3005—Details, accessories, or equipment peculiar to furnaces of these types arrangements for circulating gases
    • F27B9/3011—Details, accessories, or equipment peculiar to furnaces of these types arrangements for circulating gases arrangements for circulating gases transversally
    • F27B2009/3016—Details, accessories, or equipment peculiar to furnaces of these types arrangements for circulating gases arrangements for circulating gases transversally with arrangements to circulate gases through the charge
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00—Forming, maintaining, or circulating atmospheres in heating chambers
    • F27D7/04—Circulating atmospheres by mechanical means
    • F27D2007/045—Fans
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00—Cooling of furnaces or of charges therein
    • F27D2009/0002—Cooling of furnaces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D9/00—Cooling of furnaces or of charges therein
    • F27D2009/0002—Cooling of furnaces
    • F27D2009/0005—Cooling of furnaces the cooling medium being a gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F27D2019/0003—Monitoring the temperature or a characteristic of the charge and using it as a controlling value

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Furnace Details (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)

Abstract

In a heat treatment furnace that treats to-be-processed objects by forced convection in an atmospheric air, an object of the invention is to provide a heat treatment furnace that can rapidly lower the temperature inside the furnace although it has a simple structure. To achieve the object, a heat treatment furnace 10 for treating a to-be-processed object S by forced convection in an atmospheric gas is provided, which comprises a treatment chamber 1 for treating the to-be-processed object S; an introduction passage 2 for introducing outside air into the treatment chamber 1; a discharge passage 3 for discharging the atmosphere in the treatment chamber 1; an introduction valve 21 for opening and closing the introduction passage 2; an discharge valve 31 for opening and closing the discharge passage 3; and a control unit 4 for controlling the heat treatment furnace 10. When rapidly cooling the temperature in the treatment chamber 1, the control unit 4 opens the discharge valve 31 to discharge the atmosphere in the treatment chamber 1, and opens the introduction valve 21 to introduce outside air into the treatment chamber 1.

Description

熱處理爐heat treatment furnace

發明領域Field of invention

本發明是有關於一種利用大氣環境氣體之強制對流處理被處理物的熱處理爐。The present invention relates to a heat treatment furnace that utilizes forced convection of atmospheric gases to process objects to be processed.

發明背景Background of the invention

至今，作為利用大氣環境氣體之強制對流處理被處理物的熱處理爐，於專利文獻1或專利文獻2揭示了連續地加熱工件的連續式熱處理爐。 先行技術文獻 專利文獻 Hitherto, as a heat treatment furnace that processes a workpiece using forced convection of atmospheric gas, Patent Document 1 or Patent Document 2 discloses a continuous heat treatment furnace that continuously heats the workpiece. Advanced technical documents patent documents

[專利文獻1]日本特開2004-143565號公報 [專利文獻2]日本特開平10-176886號公報 [專利文獻3]日本特開2002-129242號公報 [Patent Document 1] Japanese Patent Application Publication No. 2004-143565 [Patent Document 2] Japanese Patent Application Publication No. 10-176886 [Patent Document 3] Japanese Patent Application Publication No. 2002-129242

發明概要 發明欲解決之課題 Summary of the invention The problem to be solved by the invention

其中，若熱處理爐中對被處理物的處理條件變更，必須使爐內溫度降低，則藉由降低爐內之熱源即電加熱器或感應加熱線圈、輻射管等的輸出來對應，但由於蓄熱於爐內的壁面或零件、熱源本身的熱會被放出，因此要使爐內溫度降低很費時。因此，在已蓄熱之熱放熱的期間，存在於爐內的被處理物會被加熱，如此被加熱後的被處理物無法作為製品使用而導致浪費。Among them, if the processing conditions of the object to be processed in the heat treatment furnace are changed and the temperature in the furnace must be lowered, the output of the heat source in the furnace, that is, electric heaters, induction heating coils, radiant tubes, etc., will be reduced. However, due to heat storage Heat is released from the walls, parts, and heat sources in the furnace, so it is time-consuming to lower the temperature in the furnace. Therefore, during the period when the accumulated heat is released, the object to be processed existing in the furnace is heated, and the heated object to be processed cannot be used as a product, resulting in waste.

又，由於強制使爐內溫度降低，因此專利文獻3揭示了利用冷卻器使爐內環境氣體在每個區域循環的構成，但爐內環境氣體的容量大，要使爐內溫度下降還需要很久的時間，至今期望更快速使爐內溫度降低。In addition, since the temperature in the furnace is forcibly lowered, Patent Document 3 discloses a structure in which a cooler is used to circulate ambient gas in the furnace in each area. However, the volume of ambient gas in the furnace is large, and it takes a long time to lower the temperature in the furnace. time, so far it is expected to reduce the temperature in the furnace more quickly.

因此在本發明中，其目的在於在利用大氣環境氣體之強制對流處理被處理物的熱處理爐中，提供一種具有簡單構造且可使爐內溫度急速降低的熱處理爐。 解決課題之手段 Therefore, an object of the present invention is to provide a heat treatment furnace that has a simple structure and can rapidly lower the temperature in the furnace in a heat treatment furnace that processes an object to be processed using forced convection of atmospheric gas. means of solving problems

本發明是利用大氣環境氣體的強制對流處理被處理物的熱處理爐，具備有： 處理室，處理被處理物； 導入流路，往前述處理室內導入外部氣體； 排出流路，排出前述處理室內的環境氣體； 導入閥，開閉前述導入流路； 排出閥，開閉前述排出流路；及 控制部，控制前述熱處理爐， 前述控制部在將前述處理室內的溫度快速冷卻時，開放前述排出閥，排出前述處理室內的環境氣體，並且開放前述導入閥，往前述處理室內導入外部氣體。 The present invention is a heat treatment furnace that utilizes forced convection of atmospheric gas to process objects to be processed. It is equipped with: The processing room handles the objects to be processed; Introduce the flow path and introduce external gas into the aforementioned processing chamber; The discharge flow path discharges the ambient gas in the aforementioned processing chamber; The introduction valve opens and closes the aforementioned introduction flow path; A discharge valve opens and closes the aforementioned discharge flow path; and The control unit controls the aforementioned heat treatment furnace, When rapidly cooling the temperature in the processing chamber, the control unit opens the discharge valve to discharge the ambient air in the processing chamber, and opens the introduction valve to introduce outside air into the processing chamber.

根據前述構成，由於排出處理室內之高溫的環境氣體，往處理室內導入低溫(例如60~150℃)的外部氣體，因此可使處理室內的溫度急速地降低。 發明效果 According to the above structure, high-temperature ambient air in the processing chamber is discharged and low-temperature (for example, 60 to 150° C.) external air is introduced into the processing chamber, so that the temperature in the processing chamber can be rapidly lowered. Invention effect

根據本發明，在利用大氣環境氣體的強制對流處理被處理物的熱處理爐中，可提供不僅構造簡單且可使爐內溫度急速地降低的熱處理爐。According to the present invention, in a heat treatment furnace that processes an object to be processed using forced convection of atmospheric gas, it is possible to provide a heat treatment furnace that not only has a simple structure but also can rapidly lower the temperature in the furnace.

較佳實施例之詳細說明 圖1是本發明之實施形態之熱處理爐10的概念圖。如圖1所示，熱處理爐10為利用大氣環境氣體之強制對流處理被處理物的熱處理爐。熱處理爐10具備：處理被處理物S的處理室1；往處理室1內導入外部氣體的導入流路2；及排出處理室1內之環境氣體(空氣)的排出流路3。而且，於導入流路2，設置有開閉導入流路2的導入閥21，於排出流路3，設置有開閉排出流路3的排出閥31。又，熱處理爐10具備有控制熱處理爐10之作動的控制部4。 Detailed description of preferred embodiments FIG. 1 is a conceptual diagram of the heat treatment furnace 10 according to the embodiment of the present invention. As shown in FIG. 1 , the heat treatment furnace 10 is a heat treatment furnace that processes an object to be processed using forced convection of atmospheric gas. The heat treatment furnace 10 includes a processing chamber 1 for processing an object S; an introduction flow path 2 for introducing external air into the processing chamber 1 ; and a discharge flow path 3 for discharging ambient gas (air) in the processing chamber 1 . Furthermore, the introduction valve 21 that opens and closes the introduction flow path 2 is provided in the introduction flow path 2 , and the discharge flow path 3 is provided with a discharge valve 31 that opens and closes the discharge flow path 3 . Moreover, the heat treatment furnace 10 is provided with the control part 4 which controls the operation|movement of the heat treatment furnace 10.

於處理室1，設置有計測處理室1內之環境氣體之壓力的壓力計11。又，排出流路3中，在排出閥31的上游側，設置有計測處理室1內之環境氣體之露點溫度的露點溫度計13。The processing chamber 1 is provided with a pressure gauge 11 that measures the pressure of the ambient gas in the processing chamber 1 . In addition, the dew point thermometer 13 for measuring the dew point temperature of the ambient gas in the processing chamber 1 is provided in the discharge flow path 3 on the upstream side of the discharge valve 31 .

導入閥21及排出閥31分別是電氣式、空氣式或者油壓式等之操作器驅動式的閥，且可調整開度。The inlet valve 21 and the discharge valve 31 are respectively electric, air, or hydraulic operator-driven valves, and their openings can be adjusted.

於導入流路2，設置有將外部氣體往處理室1內供氣的供氣扇22，於排出流路3，設置有將處理室1內的環境氣體朝外部排氣的排氣扇32。導入流路2中，於供氣扇22之下游側之其中一配管2a設置有熱交換器23，藉由供氣扇22供氣的外部氣體在熱交換器23中藉由來自排氣扇32的排氣而熱交換(加熱)。又，於供氣扇22之下游側之另一配管2b未設置有熱交換器。在排出流路3中，於排氣扇32的下游側，設置有計測環境氣體之排出量的流量計33。控制部4根據流量計33的值，控制排氣扇32的流量。又，控制部4根據壓力計11的值及流量計33的值，調整導入閥21及排出閥31的開度，又，控制供氣扇22及排氣扇32的流量。The inlet flow path 2 is provided with an air supply fan 22 for supplying external air into the processing chamber 1 , and the discharge flow path 3 is provided with an exhaust fan 32 for exhausting ambient air in the processing chamber 1 to the outside. In the introduction flow path 2 , a heat exchanger 23 is provided in one of the pipes 2 a on the downstream side of the air supply fan 22 , and the external air supplied by the air supply fan 22 passes through the heat exchanger 23 from the exhaust fan 32 The exhaust heat exchanges (heats). In addition, a heat exchanger is not provided on the other pipe 2b on the downstream side of the air supply fan 22. In the discharge flow path 3, a flow meter 33 for measuring the discharge amount of ambient gas is provided on the downstream side of the exhaust fan 32. The control unit 4 controls the flow rate of the exhaust fan 32 based on the value of the flow meter 33 . Furthermore, the control unit 4 adjusts the openings of the inlet valve 21 and the discharge valve 31 based on the value of the pressure gauge 11 and the flow meter 33 , and controls the flow rates of the air supply fan 22 and the exhaust fan 32 .

於配管2a，在熱交換器23的下游側設置有混合閥24，於配管2b設置有混合閥25。混合閥24及混合閥25分別為電氣式、空氣式或者油壓式等之操作器驅動式的閥，且可調整開度。The pipe 2a is provided with a mixing valve 24 on the downstream side of the heat exchanger 23, and the pipe 2b is provided with a mixing valve 25. The mixing valve 24 and the mixing valve 25 are respectively electric, air, or hydraulic operator-driven valves, and their openings can be adjusted.

在混合閥24及混合閥25的下游側，配管2a與配管2b合流，於合流點2c的下游側配置有導入閥21。利用混合閥24的開度及混合閥25的開度，調整藉由熱交換器23熱交換後之高溫的外部氣體、與不通過熱交換器23之常溫的外部氣體的混合比例，在調整要導入之外部氣體的溫度後，混合的外部氣體經由導入閥21而導入至處理室1內。On the downstream side of the mixing valve 24 and the mixing valve 25, the pipe 2a and the pipe 2b merge, and the introduction valve 21 is arranged on the downstream side of the merging point 2c. The opening of the mixing valve 24 and the opening of the mixing valve 25 are used to adjust the mixing ratio of the high-temperature external air heat-exchanged by the heat exchanger 23 and the normal-temperature external air that does not pass through the heat exchanger 23. After adjusting the temperature of the external air, the mixed external air is introduced into the processing chamber 1 through the introduction valve 21 .

在合流點2c與導入閥21之間，設置有測定被導入至處理室1內之外部氣體之溫度的溫度計26。控制部4根據露點溫度計13的值及溫度計26的值，調整混合閥24及混合閥25的開度。A thermometer 26 for measuring the temperature of the external air introduced into the processing chamber 1 is provided between the merging point 2 c and the introduction valve 21 . The control unit 4 adjusts the opening degrees of the mixing valve 24 and the mixing valve 25 based on the value of the dew point thermometer 13 and the value of the thermometer 26 .

熱處理爐10還具備使處理室1內之環境氣體循環的循環單元5。循環單元5具備有：循環流路51，與處理室1內連通；循環扇52，設置於循環流路51內，使處理室1內的環境氣體經由循環流路51而循環；及加熱器53，設置於循環流路51內，將在循環流路51內流通的環境氣體加熱。循環流路51中，於加熱器53的下游側且於循環扇52的上游側，設置有計測處理室1內之溫度的溫度計12。控制部4根據溫度計12的值，調整導入閥21及排出閥31的開度，又，控制供氣扇22及排氣扇32的流量。控制部4更進一步根據溫度計12的值，調整加熱器53的輸出。The heat treatment furnace 10 further includes a circulation unit 5 for circulating ambient gas in the treatment chamber 1 . The circulation unit 5 is provided with: a circulation flow path 51 that communicates with the inside of the processing chamber 1; a circulation fan 52 that is installed in the circulation flow path 51 to circulate the ambient gas in the processing chamber 1 through the circulation flow path 51; and a heater 53. , is installed in the circulation flow path 51 and heats the ambient gas flowing in the circulation flow path 51 . In the circulation flow path 51 , a thermometer 12 for measuring the temperature in the processing chamber 1 is provided on the downstream side of the heater 53 and on the upstream side of the circulation fan 52 . The control unit 4 adjusts the openings of the inlet valve 21 and the discharge valve 31 based on the value of the thermometer 12 , and controls the flow rates of the air supply fan 22 and the exhaust fan 32 . The control unit 4 further adjusts the output of the heater 53 based on the value of the thermometer 12 .

熱處理爐10會如下進行作動。The heat treatment furnace 10 operates as follows.

當被處理物S的處理條件變更，必須將處理室1內的溫度快速冷卻時，控制部4會開放排出閥31，將處理室1內的環境氣體朝外部排出，並且開放導入閥21，往處理室1內導入外部氣體。再者，導入閥21的開放亦可與排出閥31的開放同時進行，又，亦可自排出閥31開放經過一定時間後才進行。在此，供氣扇22及排氣扇32預先作動。When the processing conditions of the object S change and the temperature in the processing chamber 1 must be quickly cooled, the control unit 4 will open the discharge valve 31 to discharge the ambient gas in the processing chamber 1 to the outside, and open the inlet valve 21 to discharge the ambient gas to the outside. External air is introduced into the processing chamber 1 . Furthermore, the opening of the introduction valve 21 may be performed simultaneously with the opening of the discharge valve 31, or may be performed after a certain period of time has elapsed since the discharge valve 31 was opened. Here, the air supply fan 22 and the exhaust fan 32 are activated in advance.

此時，控制部4為了抑制處理室1內之壓力的變動，根據壓力計11的計測結果，調整導入閥21及／或排出閥31的開度、或是供氣扇22及／或排氣扇32的流量。At this time, the control unit 4 adjusts the opening of the inlet valve 21 and/or the discharge valve 31, or the air supply fan 22 and/or the exhaust in order to suppress the pressure variation in the processing chamber 1 based on the measurement results of the pressure gauge 11. fan 32 flow.

又，控制部4以被處理物S之處理條件之一的處理溫度為目標溫度，根據溫度計12的計測結果，調整導入閥21及／或排出閥31的開度、或是供氣扇22及／或排氣扇32的流量。In addition, the control unit 4 uses the processing temperature as one of the processing conditions of the object S as the target temperature, and adjusts the opening of the inlet valve 21 and/or the discharge valve 31, or the air supply fan 22 and /or the flow rate of the exhaust fan 32.

控制部4還在將處理室1內的溫度快速冷卻時，根據露點溫度計13的計測結果，藉由熱交換器23將導入至處理室1內的外部氣體加熱到預定溫度後，往處理室1內導入，以免處理室1內發生結露。When the temperature in the processing chamber 1 is rapidly cooled, the control unit 4 heats the external air introduced into the processing chamber 1 to a predetermined temperature through the heat exchanger 23 based on the measurement results of the dew point thermometer 13 and then flows it into the processing chamber 1 Introduce it inside to avoid condensation in the treatment chamber 1.

在此，導入至處理室1內之外部氣體的溫度控制是藉由調整混合閥24及混合閥25的開度，變更通過熱交換器23之外部氣體的流量與不通過熱交換器23之外部氣體的流量的混合比例來進行。Here, the temperature of the outside air introduced into the processing chamber 1 is controlled by adjusting the opening degrees of the mixing valve 24 and the mixing valve 25, and changing the flow rate of the outside air passing through the heat exchanger 23 and the outside air not passing through the heat exchanger 23. The mixing ratio of the flow rate is carried out.

如此，藉由將處理室1內的環境氣體朝外部放出，並且將低溫的外部氣體導入至處理室1內，以將處理室1內的溫度快速冷卻，調整到目標溫度。再者，本實施形態的熱處理爐10是在爐內中利用大氣環境氣體將被處理物S熱處理的爐，因此即使將外部氣體(大氣)直接導入至爐內也不會有問題。In this way, by releasing the ambient air in the processing chamber 1 to the outside and introducing low-temperature external air into the processing chamber 1 , the temperature in the processing chamber 1 is quickly cooled and adjusted to the target temperature. Furthermore, the heat treatment furnace 10 of this embodiment heat-processes the object S using atmospheric gas in the furnace. Therefore, there is no problem even if external air (atmosphere) is directly introduced into the furnace.

根據前述構成的熱處理爐10，可發揮如下的效果。According to the heat treatment furnace 10 configured as described above, the following effects can be exerted.

(1)控制部4在將處理室1內的溫度快速冷卻時，開放排出閥31，將處理室1內之高溫的環境氣體排出，進而開放導入閥21，並往處理室1內導入低溫的外部氣體，因此可使處理室1內的溫度急速降低。(1) When rapidly cooling the temperature in the processing chamber 1 , the control unit 4 opens the discharge valve 31 to discharge the high-temperature ambient gas in the processing chamber 1 , and then opens the introduction valve 21 to introduce low-temperature ambient gas into the processing chamber 1 . Therefore, the temperature in the processing chamber 1 can be rapidly lowered due to the external air.

(2)於導入流路2設置有供氣扇22，於排出流路3設置有排氣扇32，因此可藉由供氣扇22、排氣扇32，強制抽換處理室1內的環境氣體，並使處理室1內之溫度更為急速下降。(2) The air supply fan 22 is provided in the inlet flow path 2 and the exhaust fan 32 is provided in the discharge flow path 3. Therefore, the environment in the processing chamber 1 can be forcibly ventilated by the air supply fan 22 and the exhaust fan 32. gas, causing the temperature in the treatment chamber 1 to drop more rapidly.

(3)控制部4在將處理室1內之溫度快速冷卻時，根據藉由壓力計11所計測到的處理室1內的壓力，調整導入閥21及／或排出閥31的開度，因此可一面抑制處理室1內之壓力的變動，一面抽換處理室1內的環境氣體，使處理室1內的溫度急速地降低。(3) When rapidly cooling the temperature in the processing chamber 1, the control unit 4 adjusts the opening of the inlet valve 21 and/or the discharge valve 31 based on the pressure in the processing chamber 1 measured by the pressure gauge 11. Therefore, While suppressing the pressure fluctuation in the processing chamber 1, the ambient gas in the processing chamber 1 can be pumped out, so that the temperature in the processing chamber 1 can be rapidly lowered.

(4)控制部4在將處理室1內之溫度快速冷卻時，根據由壓力計11所計測出之處理室1內的壓力，調整供氣扇22及／或排氣扇32的流量，因此可一面抑制處理室1內之壓力的變動，一面抽換處理室1內的環境氣體，使處理室1內的溫度急速地降低。(4) When rapidly cooling the temperature in the processing chamber 1, the control unit 4 adjusts the flow rate of the air supply fan 22 and/or the exhaust fan 32 based on the pressure in the processing chamber 1 measured by the pressure gauge 11. Therefore, While suppressing the pressure fluctuation in the processing chamber 1, the ambient gas in the processing chamber 1 can be pumped out, so that the temperature in the processing chamber 1 can be rapidly lowered.

(5)控制部4在將處理室1內之溫度快速冷卻時，根據由溫度計12所計測出之處理室1內的溫度，調整導入閥21及／或排出閥31的開度，因此可使處理室1內的溫度快速地穩定在目的溫度。(5) When rapidly cooling the temperature in the processing chamber 1, the control unit 4 adjusts the opening of the inlet valve 21 and/or the discharge valve 31 based on the temperature in the processing chamber 1 measured by the thermometer 12, so that the control unit 4 can The temperature in the treatment chamber 1 quickly stabilizes at the target temperature.

(6)控制部4在將處理室1內之溫度快速冷卻時，根據由溫度計12所計測出之處理室1內的溫度，調整供氣扇22及／或排氣扇32的流量，因此可使處理室1內的溫度快速地穩定在目的溫度。(6) When rapidly cooling the temperature in the processing chamber 1, the control unit 4 adjusts the flow rate of the air supply fan 22 and/or the exhaust fan 32 based on the temperature in the processing chamber 1 measured by the thermometer 12, so that The temperature in the processing chamber 1 is quickly stabilized at the target temperature.

(7)控制部4在將處理室1內之溫度快速冷卻時，根據由露點溫度計13所計測出之露點溫度，控制要導入之外部氣體的溫度，以免在處理室1內產生結露，因此可藉由要導入之外部氣體，防止在處理室1內產生結露。(7) When rapidly cooling the temperature in the processing chamber 1, the control unit 4 controls the temperature of the external air to be introduced based on the dew point temperature measured by the dew point thermometer 13 to avoid condensation in the processing chamber 1. Therefore, it is possible to By introducing external air, condensation in the processing chamber 1 is prevented.

(8)利用從處理室1內排出之高溫的環境氣體，將導入至處理室1內的外部氣體加熱，藉此可容易得到高溫的外部氣體。又，藉由變更經由熱交換器23熱交換後之高溫的外部氣體與常溫的外部氣體的混合比例，可容易控制要導入之外部氣體的溫度。(8) The high-temperature ambient air discharged from the processing chamber 1 is used to heat the external air introduced into the processing chamber 1 , whereby high-temperature external air can be easily obtained. Furthermore, by changing the mixing ratio of the high-temperature outside air and the normal-temperature outside air after heat exchange through the heat exchanger 23, the temperature of the outside air to be introduced can be easily controlled.

在上述實施形態中，藉由循環單元5使處理室1內的環境氣體循環，計測循環流路51中的溫度、即往處理室1導入之處理氣體的溫度作為處理室1內的溫度，但亦可於處理室1設置溫度計，直接測定處理室1內的環境氣體，將其值設定為處理室1內的溫度。In the above embodiment, the ambient gas in the processing chamber 1 is circulated by the circulation unit 5, and the temperature in the circulation flow path 51, that is, the temperature of the processing gas introduced into the processing chamber 1 is measured as the temperature in the processing chamber 1. However, A thermometer can also be installed in the processing chamber 1 to directly measure the ambient gas in the processing chamber 1 and set the value as the temperature in the processing chamber 1 .

在上述實施形態中，露點溫度計13宜設置於容易結露之環境氣體的低溫部，在排出流路3中配置於排出閥31的上游側，但亦可配置於排出閥31的下游側，又，亦可配置於排氣扇32的下游側。In the above embodiment, the dew point thermometer 13 is preferably installed in a low-temperature part of the ambient air where dew condensation is likely to occur, and is disposed on the upstream side of the discharge valve 31 in the discharge flow path 3. However, it may also be disposed on the downstream side of the discharge valve 31. In addition, It may also be arranged on the downstream side of the exhaust fan 32 .

在上述實施形態中，流量計33在排出流路3中設置於排氣扇32的下游側，亦可配置於排氣扇32的上游側，又，亦可配置於排出閥31的上游側。In the above-mentioned embodiment, the flow meter 33 is provided on the downstream side of the exhaust fan 32 in the discharge flow path 3 , but may be disposed on the upstream side of the exhaust fan 32 , or may be disposed on the upstream side of the discharge valve 31 .

在上述實施形態中，溫度計26配置於導入流路2中導入閥21的上游側且是合流點2c的下游側，但亦可配置於導入閥21的下游側。In the above-mentioned embodiment, the thermometer 26 is arranged on the upstream side of the introduction valve 21 in the introduction flow path 2 and on the downstream side of the merging point 2 c. However, the thermometer 26 may be arranged on the downstream side of the introduction valve 21 .

在上述實施形態中，於排出流路3設置流量計33，根據流量計33的值，控制排氣扇32的流量，並依據處理室1的壓力與排出流路3中的排出量，控制供氣扇22的流量。可是，亦可於導入流路2設置流量計，根據其流量計的值，控制供氣扇22的流量，並依據處理室1的壓力與導入流路2中的導入量，控制排氣扇32的流量。在此種情況下，設置於導入流路2的流量計配置於導入閥21的下游側。In the above embodiment, the flow meter 33 is provided in the discharge flow path 3 , the flow rate of the exhaust fan 32 is controlled based on the value of the flow meter 33 , and the supply voltage is controlled based on the pressure of the processing chamber 1 and the discharge amount in the discharge flow path 3 . The flow rate of fan 22. However, a flow meter can also be provided in the introduction flow path 2, and the flow rate of the air supply fan 22 can be controlled based on the value of the flow meter, and the exhaust fan 32 can be controlled based on the pressure of the processing chamber 1 and the amount introduced into the introduction flow path 2. of traffic. In this case, the flow meter provided in the introduction flow path 2 is arranged on the downstream side of the introduction valve 21 .

本發明不限定於上述實施形態的熱處理爐，可應用於利用大氣環境氣體的強制對流處理被處理物的一般熱處理爐。The present invention is not limited to the heat treatment furnace of the above embodiment, but can be applied to a general heat treatment furnace that processes an object to be processed using forced convection of atmospheric gas.

將本發明及實施形態彙整如下。The present invention and embodiments are summarized below.

(1)本發明之一實施形態是利用大氣環境氣體的強制對流處理被處理物的熱處理爐，具備有： 處理室，處理被處理物； 導入流路，往前述處理室內導入外部氣體； 排出流路，排出前述處理室內的環境氣體； 導入閥，開閉前述導入流路； 排出閥，開閉前述排出流路；及 控制部，控制前述熱處理爐， 前述控制部在將前述處理室內的溫度快速冷卻時，開放前述排出閥，排出前述處理室內的環境氣體，並且開放前述導入閥，往前述處理室內導入外部氣體。 (1) One embodiment of the present invention is a heat treatment furnace for processing an object to be processed using forced convection of atmospheric gas, and is provided with: The processing room handles the objects to be processed; Introduce the flow path and introduce external gas into the aforementioned processing chamber; The discharge flow path discharges the ambient gas in the aforementioned processing chamber; The introduction valve opens and closes the aforementioned introduction flow path; A discharge valve opens and closes the aforementioned discharge flow path; and The control unit controls the aforementioned heat treatment furnace, When rapidly cooling the temperature in the processing chamber, the control unit opens the discharge valve to discharge the ambient air in the processing chamber, and opens the introduction valve to introduce outside air into the processing chamber.

根據前述構成(1)，由於排出處理室內之高溫的環境氣體，往處理室內導入低溫的外部氣體，因此可使處理室內的溫度急速地降低。According to the above configuration (1), high-temperature ambient air in the processing chamber is discharged and low-temperature external air is introduced into the processing chamber, so that the temperature in the processing chamber can be rapidly lowered.

(2)前述構成(1)中，於前述導入流路及／或前述排出流路設置有風扇。(2) In the above-described configuration (1), a fan is provided in the inlet flow path and/or the discharge flow path.

根據前述構成(2)，由於可藉由風扇而強制抽換處理室內的環境氣體，因此可使處理室內的溫度更急速地降低。According to the above-mentioned structure (2), since the ambient air in the processing chamber can be forcibly exhausted by the fan, the temperature in the processing chamber can be lowered more rapidly.

(3)前述構成(1)或(2)中，於前述處理室設置有計測前述處理室內之壓力的壓力計， 前述導入閥可調整開度， 前述排出閥可調整開度， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述壓力計所計測出之前述處理室內的壓力，調整前述導入閥及／或前述排出閥的開度。 (3) In the above-described configuration (1) or (2), a pressure gauge for measuring the pressure in the processing chamber is provided in the processing chamber, The opening of the aforementioned introduction valve can be adjusted. The opening of the aforementioned discharge valve can be adjusted. When rapidly cooling the temperature in the processing chamber, the control unit adjusts the opening of the introduction valve and/or the discharge valve based on the pressure in the processing chamber measured by the pressure gauge.

根據前述構成(3)，可藉由根據由壓力計所計測出之處理室內的壓力，調整導入閥及／或排出閥的開度，一面抑制處理室內之壓力的變動，一面抽換處理室內的環境氣體，使處理室內的溫度急速地降低。According to the above-described configuration (3), by adjusting the opening of the inlet valve and/or the discharge valve based on the pressure in the processing chamber measured by the pressure gauge, it is possible to exchange the pressure in the processing chamber while suppressing changes in the pressure in the processing chamber. Ambient gas causes the temperature in the processing chamber to drop rapidly.

(4)前述構成(2)中，於前述處理室設置有計測前述處理室內之壓力的壓力計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述壓力計所計測出之前述處理室內的壓力，控制前述導入流路及／或前述排出流路中之前述風扇的流量。 (4) In the above-described configuration (2), a pressure gauge for measuring the pressure in the processing chamber is provided in the processing chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the flow rate of the fan in the introduction flow path and/or the discharge flow path based on the pressure in the processing chamber measured by the pressure gauge.

根據前述構成(4)，可根據由壓力計所計測出之處理室內的壓力，調整風扇的流量，藉此一面抑制處理室內之壓力的變動，一面抽換處理室內的環境氣體，可使處理室內的溫度急速地降低。According to the above-mentioned structure (4), the flow rate of the fan can be adjusted based on the pressure in the processing chamber measured by the pressure gauge, thereby suppressing the pressure change in the processing chamber and exchanging the ambient gas in the processing chamber, so that the processing chamber can be The temperature dropped rapidly.

(5)前述構成(1)~(4)之任一者中，於前述處理室設置有計測前述處理室內之溫度的溫度計， 前述導入閥可調整開度， 前述排出閥可調整開度， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述溫度計所計測出之前述處理室內的溫度，調整前述導入閥及／或前述排出閥的開度。 (5) In any one of the above-described configurations (1) to (4), a thermometer for measuring the temperature in the processing chamber is provided in the processing chamber, The opening of the aforementioned introduction valve can be adjusted. The opening of the aforementioned discharge valve can be adjusted. When rapidly cooling the temperature in the processing chamber, the control unit adjusts the opening of the introduction valve and/or the discharge valve based on the temperature in the processing chamber measured by the thermometer.

根據前述構成(5)，可藉由調整導入閥及／或排出閥的開度，使處理室內的溫度快速地穩定在目的溫度。According to the aforementioned structure (5), the temperature in the processing chamber can be quickly stabilized at the target temperature by adjusting the opening of the inlet valve and/or the discharge valve.

6)前述構成(2)中，於前述處理室設置有計測前述處理室內之溫度的溫度計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述溫度計所計測出之前述處理室內的溫度，控制前述導入流路及／或前述排出流路中之前述風扇的流量。 6) In the above-described configuration (2), a thermometer for measuring the temperature in the processing chamber is provided in the processing chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the flow rate of the fan in the introduction flow path and/or the discharge flow path based on the temperature in the processing chamber measured by the thermometer.

根據前述構成(6)，可藉由調整風扇的流量，使處理室內的溫度快速地穩定在目的溫度。According to the aforementioned structure (6), the temperature in the processing chamber can be quickly stabilized at the target temperature by adjusting the flow rate of the fan.

(7)前述構成(1)~(6)的任一者中，於前述處理室設置有計測前述處理室內之露點溫度的露點溫度計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述露點溫度計所計測出的露點溫度，控制要導入之外部氣體的溫度，以免在前述處理室內產生結露。 (7) In any one of the above structures (1) to (6), a dew point thermometer for measuring the dew point temperature in the processing chamber is provided in the processing chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the temperature of the external air to be introduced based on the dew point temperature measured by the dew point thermometer to avoid condensation in the processing chamber.

根據前述構成(7)，在將處理室內的溫度快速冷卻時，可藉由要導入的外部氣體，防止在處理室內產生結露。According to the above-mentioned structure (7), when the temperature in the processing chamber is quickly cooled, the outside air to be introduced can prevent condensation from occurring in the processing chamber.

(8)前述構成(7)中，具備有熱交換器，前述熱交換器在由前述處理室內排出的環境氣體與導入至前述處理室內的外部氣體之間進行熱交換， 前述控制部藉由變更通過前述熱交換器之外部氣體的流量與不通過前述熱交換器之外部氣體的流量的混合比例，控制要導入之外部氣體的溫度。 (8) The above-described configuration (7) includes a heat exchanger that performs heat exchange between the ambient air discharged from the processing chamber and the external air introduced into the processing chamber, The control unit controls the temperature of the outside air to be introduced by changing a mixing ratio of the flow rate of the outside air passing through the heat exchanger and the flow rate of the outside air not passing through the heat exchanger.

根據前述構成(8)，可藉由從處理室內排出之高溫的環境氣體，將導入至處理室內的外部氣體加熱，從而可容易地得到高溫的外部氣體。又，藉由變更由熱交換器所熱交換後之高溫的外部氣體與常溫的外部氣體的混合比例，可容易地控制要導入之外部氣體的溫度。According to the above-described configuration (8), the high-temperature ambient air discharged from the processing chamber can heat the outside air introduced into the processing chamber, so that high-temperature outside air can be easily obtained. Furthermore, by changing the mixing ratio of the high-temperature outside air heat-exchanged by the heat exchanger and the normal-temperature outside air, the temperature of the outside air to be introduced can be easily controlled.

亦可在不脫離申請專利範圍所記載之本發明的精神及範圍，進行各種變形及變更。 產業上之可利用性 Various modifications and changes can also be made without departing from the spirit and scope of the invention described in the patent application. industrial availability

在本發明中，在利用大氣環境氣體的強制對流處理被處理物的熱處理爐中，可提供不僅構造簡單且可使爐內溫度急速地降低的熱處理爐，故產業上的利用價值很大。In the present invention, a heat treatment furnace that processes an object to be processed using forced convection of atmospheric gas can provide a heat treatment furnace that not only has a simple structure but can rapidly lower the temperature in the furnace, and therefore has great industrial application value.

1:處理室 2:導入流路 3:排出流路 4:控制部 5:循環單元 10:熱處理爐 11/P:壓力計 12/T:溫度計 13/DT:露點溫度計 21:導入閥 22:供氣扇 23:熱交換器 24:混合閥 25:混合閥 26/T:溫度計 2a:配管 2b:配管 2c:合流點 31:排出閥 32:排氣扇 33/F:流量計 51:循環流路 52:循環扇 53:加熱器 S:被處理物 1: Processing room 2: Import flow path 3: Discharge flow path 4:Control Department 5:Cycle unit 10:Heat treatment furnace 11/P: Pressure gauge 12/T: Thermometer 13/DT: Dew point thermometer 21:Inlet valve 22:Air supply fan 23:Heat exchanger 24:Mixing valve 25:Mixing valve 26/T: Thermometer 2a:Piping 2b:Piping 2c:Confluence point 31: Discharge valve 32:Exhaust fan 33/F: flow meter 51: Circulation flow path 52: Circulation fan 53:Heater S: object to be processed

圖1是本發明之實施形態之熱處理爐的概念圖。Fig. 1 is a conceptual diagram of a heat treatment furnace according to an embodiment of the present invention.

1:處理室 1: Processing room

2:導入流路 2: Import flow path

3:排出流路 3: Discharge flow path

4:控制部 4:Control Department

5:循環單元 5:Cycle unit

10:熱處理爐 10:Heat treatment furnace

11/P:壓力計 11/P: Pressure gauge

12/T:溫度計 12/T: Thermometer

13/DT:露點溫度計 13/DT: Dew point thermometer

21:導入閥 21:Inlet valve

22:供氣扇 22:Air supply fan

23:熱交換器 23:Heat exchanger

24:混合閥 24:Mixing valve

25:混合閥 25:Mixing valve

26/T:溫度計 26/T: Thermometer

2a:配管 2a:Piping

2b:配管 2b:Piping

2c:合流點 2c:Confluence point

31:排出閥 31: Discharge valve

32:排氣扇 32:Exhaust fan

33/F:流量計 33/F: flow meter

51:循環流路 51: Circulation flow path

52:循環扇 52: Circulation fan

53:加熱器 53:Heater

S:被處理物 S: object to be processed

Claims (8)

一種熱處理爐，是利用大氣環境氣體的強制對流處理被處理物的熱處理爐，具備有： 處理室，處理被處理物； 導入流路，往前述處理室內導入外部氣體； 排出流路，排出前述處理室內的環境氣體； 導入閥，開閉前述導入流路； 排出閥，開閉前述排出流路；及 控制部，控制前述熱處理爐， 前述控制部在將前述處理室內的溫度快速冷卻時，開放前述排出閥，排出前述處理室內的環境氣體，並且開放前述導入閥，往前述處理室內導入外部氣體。 A heat treatment furnace is a heat treatment furnace that uses forced convection of atmospheric ambient gas to process objects to be processed. It has: The processing room handles the objects to be processed; Introduce the flow path and introduce external gas into the aforementioned processing chamber; The discharge flow path discharges the ambient gas in the aforementioned processing chamber; The introduction valve opens and closes the aforementioned introduction flow path; A discharge valve opens and closes the aforementioned discharge flow path; and The control unit controls the aforementioned heat treatment furnace, When rapidly cooling the temperature in the processing chamber, the control unit opens the discharge valve to discharge the ambient air in the processing chamber, and opens the introduction valve to introduce outside air into the processing chamber. 如請求項1之熱處理爐，其中於前述導入流路及／或前述排出流路設置有風扇。The heat treatment furnace of claim 1, wherein a fan is provided in the introduction flow path and/or the discharge flow path. 如請求項1或2之熱處理爐，其中於前述處理室設置有計測前述處理室內之壓力的壓力計， 前述導入閥可調整開度， 前述排出閥可調整開度， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述壓力計所計測出之前述處理室內的壓力，調整前述導入閥及／或前述排出閥的開度。 The heat treatment furnace of claim 1 or 2, wherein the aforementioned treatment chamber is provided with a pressure gauge for measuring the pressure in the aforementioned treatment chamber, The opening of the aforementioned introduction valve can be adjusted. The opening of the aforementioned discharge valve can be adjusted. When rapidly cooling the temperature in the processing chamber, the control unit adjusts the opening of the introduction valve and/or the discharge valve based on the pressure in the processing chamber measured by the pressure gauge. 如請求項2之熱處理爐，其中於前述處理室設置有計測前述處理室內之壓力的壓力計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述壓力計所計測出之前述處理室內的壓力，控制前述導入流路及／或前述排出流路中之前述風扇的流量。 The heat treatment furnace of claim 2, wherein the treatment chamber is provided with a pressure gauge for measuring the pressure in the treatment chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the flow rate of the fan in the introduction flow path and/or the discharge flow path based on the pressure in the processing chamber measured by the pressure gauge. 如請求項1或2之熱處理爐，其中於前述處理室設置有計測前述處理室內之溫度的溫度計， 前述導入閥可調整開度， 前述排出閥可調整開度， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述溫度計所計測出之前述處理室內的溫度，調整前述導入閥及／或前述排出閥的開度。 The heat treatment furnace of claim 1 or 2, wherein a thermometer for measuring the temperature in the aforementioned treatment chamber is provided in the aforementioned treatment chamber, The opening of the aforementioned introduction valve can be adjusted. The opening of the aforementioned discharge valve can be adjusted. When rapidly cooling the temperature in the processing chamber, the control unit adjusts the opening of the introduction valve and/or the discharge valve based on the temperature in the processing chamber measured by the thermometer. 如請求項2之熱處理爐，其中於前述處理室設置有計測前述處理室內之溫度的溫度計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述溫度計所計測出之前述處理室內的溫度，控制前述導入流路及／或前述排出流路中之前述風扇的流量。 The heat treatment furnace of claim 2, wherein the aforementioned treatment chamber is provided with a thermometer for measuring the temperature in the aforementioned treatment chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the flow rate of the fan in the introduction flow path and/or the discharge flow path based on the temperature in the processing chamber measured by the thermometer. 如請求項1之熱處理爐，其中於前述處理室設置有計測前述處理室內之露點溫度的露點溫度計， 前述控制部在將前述處理室內的溫度快速冷卻時，根據由前述露點溫度計所計測出的露點溫度，控制要導入之外部氣體的溫度，以免在前述處理室內產生結露。 The heat treatment furnace of claim 1, wherein a dew point thermometer for measuring the dew point temperature in the processing chamber is provided in the processing chamber, When rapidly cooling the temperature in the processing chamber, the control unit controls the temperature of the external air to be introduced based on the dew point temperature measured by the dew point thermometer to avoid condensation in the processing chamber. 如請求項7之熱處理爐，其具備有熱交換器，前述熱交換器在由前述處理室內排出的環境氣體與導入至前述處理室內的外部氣體之間進行熱交換， 前述控制部藉由變更通過前述熱交換器之外部氣體的流量與不通過前述熱交換器之外部氣體的流量的混合比例，控制要導入之外部氣體的溫度。 The heat treatment furnace of claim 7 is provided with a heat exchanger that performs heat exchange between the ambient air discharged from the processing chamber and the external air introduced into the processing chamber, The control unit controls the temperature of the outside air to be introduced by changing a mixing ratio of the flow rate of the outside air passing through the heat exchanger and the flow rate of the outside air not passing through the heat exchanger.
TW112120657A 2022-08-08 2023-06-02 Heat treatment furnace capable of rapidly lowering the temperature inside the furnace although it has a simple structure TW202407276A (en)

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