TW202401195A - Temperature compensation system, semiconductor equipment and emperature compensation method - Google Patents

Temperature compensation system, semiconductor equipment and emperature compensation method Download PDF

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TW202401195A
TW202401195A TW111131374A TW111131374A TW202401195A TW 202401195 A TW202401195 A TW 202401195A TW 111131374 A TW111131374 A TW 111131374A TW 111131374 A TW111131374 A TW 111131374A TW 202401195 A TW202401195 A TW 202401195A
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temperature
temperature control
compensation
module
control module
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TW111131374A
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Chinese (zh)
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孫元斌
陳興隆
姜雲鶴
韓禹
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大陸商瀋陽芯源微電子設備股份有限公司
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Publication of TW202401195A publication Critical patent/TW202401195A/en

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    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00Control of temperature
    • G05D23/19Control of temperature characterised by the use of electric means
    • G05D23/20Control of temperature characterised by the use of electric means with sensing elements having variation of electric or magnetic properties with change of temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67248Temperature monitoring

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Temperature (AREA)

Abstract

The present disclosure provides a temperature compensation system, comprising a cavity, a temperature feedback module, a heating plate, a main heating module, a multi-zone temperature control module, a distributed temperature control module and an auxiliary temperature control module; at least one temperature control compensation area is arranged on the bottom surface of the heating plate, and the auxiliary temperature control module is arranged corresponding to the temperature control compensation area; A temperature feedback module detects the temperature of the heating plate to obtain a first temperature value and a second temperature value; the multi-zone temperature control module controls the main heating module to perform temperature adjustment on the heating plate according to the first temperature value, and the distributed temperature control module controls the auxiliary temperature control module to perform temperature compensation adjustment on the temperature control compensation zone according to the second temperature value. The complicated outlet design is avoided, the volume space is small, the cost is saved, and the temperature control accuracy is high. The present disclosure also provides a semiconductor equipment and an emperature compensation method.

Description

溫度補償系統、半導體設備和溫度補償方法Temperature compensation system, semiconductor device and temperature compensation method

本發明涉及半導體製造領域,尤其涉及溫度補償系統、半導體設備和溫度補償方法。The present invention relates to the field of semiconductor manufacturing, and in particular to a temperature compensation system, a semiconductor device and a temperature compensation method.

目前,在半導體製造過程中的晶圓烘烤制程中,需頻繁使用基板烘烤單元。而加熱烘烤工藝制程中,基板的溫度均勻性對其工藝指標能否達到至關重要。因此可以有效調節基板溫度均勻性也就同樣重要。Currently, in the wafer baking process in the semiconductor manufacturing process, substrate baking units need to be frequently used. In the heating and baking process, the temperature uniformity of the substrate is crucial to whether the process indicators can be achieved. Therefore, it is equally important to effectively adjust the temperature uniformity of the substrate.

目前業界常規調節基板溫度的方案為:優化加熱器的加熱線路,並適當增加加熱器的分區數量以提高熱板的溫度均勻性。但這種方案是有其局限性的,首先單純優化加熱器線路佈局,優化加熱器周邊硬體結構,甚至進行一些必要的熱場分析都沒辦法大幅度改善晶圓烘烤過程中的溫度均勻性。如果想大幅度提升晶圓烘烤過程中的溫度均勻性,採用的方案是增加加熱器的分區數量,這樣可以通過多分區溫控系統分別控制不同加熱器分區,但這種傳統方案將大幅度增大加熱器的開發週期,增加加熱器研發的成本支出,且對加熱器製造過程管控更為嚴格,進而造成加熱器成品率下降,而且多分區高精度加熱器的價格會更加昂貴;另一方面,通過增加分區優化加熱線路這種方案,會使電源線及測溫感測器出線更多,走線更為複雜,增加加熱器周邊結構設計難度;當增加加熱器分區後,會大幅度增加溫控部分的成本,同時佔用較大安裝硬體的空間。At present, the industry's conventional solution for adjusting substrate temperature is to optimize the heating circuit of the heater and appropriately increase the number of heater zones to improve the temperature uniformity of the hot plate. However, this solution has its limitations. First of all, simply optimizing the heater circuit layout, optimizing the hardware structure around the heater, or even performing some necessary thermal field analysis cannot significantly improve the temperature uniformity during the wafer baking process. sex. If you want to greatly improve the temperature uniformity during the wafer baking process, the solution adopted is to increase the number of heater partitions, so that different heater partitions can be controlled separately through a multi-zone temperature control system. However, this traditional solution will significantly Increasing the development cycle of the heater will increase the cost of heater research and development, and the heater manufacturing process will be more strictly controlled, resulting in a decrease in the heater yield, and the price of multi-zone high-precision heaters will be more expensive; another On the other hand, the solution of optimizing the heating circuit by adding partitions will lead to more power lines and temperature sensors, and the wiring will be more complicated, which will increase the difficulty of designing the structure around the heater. When the heater partitions are added, the problem will be greatly increased. This greatly increases the cost of the temperature control part and takes up a larger space for installation hardware.

因此,有必要提供一種溫度補償系統、半導體設備和溫度補償方法以解決上述的現有技術中存在的問題。Therefore, it is necessary to provide a temperature compensation system, a semiconductor device and a temperature compensation method to solve the above-mentioned problems existing in the prior art.

本發明的目的在於一種溫度補償系統、半導體設備和溫度補償方法,以解決的現有技術中調節基板溫度成本高、佔用硬體安裝空間大的問題。The object of the present invention is to provide a temperature compensation system, a semiconductor device and a temperature compensation method to solve the problems in the prior art of high cost of adjusting the substrate temperature and occupying a large space for hardware installation.

為實現上述目的,包括腔體、溫度回饋模組、加熱盤、多分區溫控模組、分散式溫控模組、用於對所述加熱盤進行加熱的主加熱模組和至少一個輔助調溫模組,所述腔體與所述加熱盤的底面形成安裝腔,所述安裝腔內設置所述主加熱模組、所述輔助調溫模組和所述分散式溫控模組,所述分散式溫控模組通信連接所述溫度回饋模組和所述輔助調溫模組,所述多分區溫控模組通信連接所述溫度回饋模組和所述主加熱模組; 所述加熱盤的底面設置至少一個控溫補償區,所述輔助調溫模組與所述控溫補償區對應設置; 所述溫度回饋模組對所述加熱盤進行溫度檢測以得到第一溫度值和第二溫度值; 所述多分區溫控模組根據所述第一溫度值控制所述主加熱模組對所述加熱盤進行溫度調節; 所述分散式溫控模組根據所述第二溫度值控制所述輔助調溫模組對所述控溫補償區進行溫度補償調節。 In order to achieve the above purpose, it includes a cavity, a temperature feedback module, a heating plate, a multi-zone temperature control module, a distributed temperature control module, a main heating module for heating the heating plate and at least one auxiliary regulator. Temperature module, the cavity and the bottom surface of the heating plate form an installation cavity, and the main heating module, the auxiliary temperature control module and the distributed temperature control module are arranged in the installation cavity, so The distributed temperature control module is communicatively connected to the temperature feedback module and the auxiliary temperature control module, and the multi-zone temperature control module is communicatively connected to the temperature feedback module and the main heating module; At least one temperature control compensation area is provided on the bottom surface of the heating plate, and the auxiliary temperature control module is provided corresponding to the temperature control compensation area; The temperature feedback module performs temperature detection on the heating plate to obtain a first temperature value and a second temperature value; The multi-zone temperature control module controls the main heating module to adjust the temperature of the heating plate according to the first temperature value; The distributed temperature control module controls the auxiliary temperature control module to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value.

本發明的溫度補償系統的有益效果在於: 通過在控溫補償區對應設置輔助調溫模組從而對加熱盤進行溫度補償調節,避免了複雜的出線設計,佔用體積空間較小,解決的現有技術中調節基板溫度成本高、佔用硬體安裝空間大的問題。通過溫度回饋模組檢測加熱盤以得到第一溫度值和第二溫度值,所述多分區溫控模組根據所述第一溫度值控制所述主加熱模組對所述加熱盤進行溫度調節,所述分散式溫控模組根據第二溫度值來控制所述輔助調溫模組對所述控溫補償區進行溫度補償調節;通過溫度調節和溫度補償調節使得加熱盤的溫度更加均勻,在盡可能小的製造和維護成本下有效控制半導體基板的溫度均勻性,溫度控制精度高。 The beneficial effects of the temperature compensation system of the present invention are: By setting the auxiliary temperature adjustment module correspondingly in the temperature control compensation area to perform temperature compensation and adjustment on the heating plate, complex outlet design is avoided, and the volume space is small. In the existing technology, the cost of adjusting the substrate temperature is high and the hardware is occupied. The problem of large installation space. The heating plate is detected by the temperature feedback module to obtain the first temperature value and the second temperature value. The multi-zone temperature control module controls the main heating module to adjust the temperature of the heating plate according to the first temperature value. , the distributed temperature control module controls the auxiliary temperature control module to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value; through temperature adjustment and temperature compensation adjustment, the temperature of the heating plate is made more uniform, The temperature uniformity of the semiconductor substrate is effectively controlled with the lowest possible manufacturing and maintenance costs, and the temperature control accuracy is high.

所述溫度回饋模組在所述主加熱模組的加熱功率穩定後,對所述加熱盤進行第一輪溫度檢測以得到所述第一溫度值,並將所述第一溫度值回饋至所述多分區溫控模組; 所述溫度回饋模組在所述溫度調節完畢後對所述加熱盤進行第二輪溫度檢測以得到所述第二溫度值,並將所述第二溫度值回饋至所述分散式溫控模組。 After the heating power of the main heating module stabilizes, the temperature feedback module performs a first round of temperature detection on the heating plate to obtain the first temperature value, and feeds the first temperature value back to the heating plate. Described multi-zone temperature control module; After the temperature adjustment is completed, the temperature feedback module performs a second round of temperature detection on the heating plate to obtain the second temperature value, and feeds the second temperature value back to the distributed temperature control module. group.

可選地,還包括設置於所述主加熱模組和所述分散式溫控模組之間的隔板,所述輔助調溫模組設置於所述隔板。Optionally, a partition is provided between the main heating module and the distributed temperature control module, and the auxiliary temperature control module is provided on the partition.

可選地,所述隔板上設置有允許引線通過的引線孔。Optionally, the partition plate is provided with lead holes that allow lead wires to pass through.

可選地,所述輔助調溫模組包括溫度補償單元,所述溫度補償單元通信連接所述分散式溫控模組,所述溫度補償單元與對應的所述控溫補償區之間的距離大於或等於0。Optionally, the auxiliary temperature control module includes a temperature compensation unit, the temperature compensation unit is communicatively connected to the distributed temperature control module, and the distance between the temperature compensation unit and the corresponding temperature control compensation area is Greater than or equal to 0.

可選地,所述輔助調溫模組還包括固定組件,所述固定組件用於將所述溫度補償單元固定於對應的所述控溫補償區。Optionally, the auxiliary temperature control module further includes a fixing component used to fix the temperature compensation unit to the corresponding temperature control compensation area.

可選地,所述輔助調溫模組還包括設置於所述隔板上的支撐件、設置於所述支撐件內部的彈性件和設置於所述彈性件頂端的安裝部,所述溫度補償單元設置於安裝部朝向所述加熱盤的一面; 所述彈性件在所述支撐件的作用下對所述溫度補償單元施加朝向對應所述控溫補償區方向的作用力來調節所述溫度補償單元與對應的所述控溫補償區之間的距離。 Optionally, the auxiliary temperature control module further includes a support member provided on the partition, an elastic member provided inside the support member, and an installation portion provided on the top of the elastic member. The temperature compensation The unit is arranged on a side of the mounting part facing the heating plate; The elastic member exerts an acting force on the temperature compensation unit in a direction corresponding to the temperature control compensation area under the action of the support member to adjust the distance between the temperature compensation unit and the corresponding temperature control compensation area. distance.

可選地,所述支撐件內設置有允許引線通過的引線孔。Optionally, the support member is provided with lead holes allowing lead wires to pass through.

可選地,所述溫度補償單元包括升溫單元和降溫單元,所述升溫單元與所述降溫單元間隔設置。Optionally, the temperature compensation unit includes a heating unit and a cooling unit, and the heating unit is spaced apart from the cooling unit.

可選地,當所述第二溫度值小於預設的第二目標溫度,所述分散式溫控模組控制所述升溫單元對所述第二溫度值對應的所述控溫補償區進行溫度補償調節。Optionally, when the second temperature value is less than a preset second target temperature, the distributed temperature control module controls the heating unit to perform temperature adjustment on the temperature control compensation area corresponding to the second temperature value. Compensation adjustment.

可選地,當所述第二溫度值大於預設的第二目標溫度,所述分散式溫控模組控制所述降溫單元對所述第二溫度值對應的所述控溫補償區進行溫度補償調。Optionally, when the second temperature value is greater than the preset second target temperature, the distributed temperature control module controls the cooling unit to perform temperature control on the temperature control compensation area corresponding to the second temperature value. Compensation adjustment.

可選地,所述溫度補償系統還包括設置於所述安裝腔內的溫控封板,所述溫控封板位於所述加熱盤的底端,所述溫控封板與所述加熱盤和所述安裝腔內側壁之間形成保溫空間,所述分散式溫控模組和所述輔助調溫模組均設置於所述保溫空間。Optionally, the temperature compensation system further includes a temperature control sealing plate disposed in the installation cavity, the temperature control sealing plate is located at the bottom end of the heating plate, and the temperature control sealing plate is in contact with the heating plate. A heat preservation space is formed between the heat preservation space and the inner wall of the installation cavity, and the distributed temperature control module and the auxiliary temperature control module are both arranged in the heat preservation space.

可選地,所述加熱盤的頂面包括基板接觸區域,所述加熱盤的底面包括與所述基板接觸區域相對應的底面控制區域,所述控溫補償區為所述底面控制區域內的任一區域。Optionally, the top surface of the heating plate includes a substrate contact area, the bottom surface of the heating plate includes a bottom control area corresponding to the substrate contact area, and the temperature control compensation area is within the bottom control area. any area.

本發明還提供一種半導體設備,包括所述溫度補償系統。The invention also provides a semiconductor device, including the temperature compensation system.

本發明還提供一種溫度補償方法,包括以下步驟: S1:對所述加熱盤進行溫度檢測以得到第一溫度值和第二溫度值; S2:根據所述第一溫度值控制所述主加熱模組對所述加熱盤進行溫度調節; S3:根據所述第二溫度值控制所述輔助調溫模組對所述控溫補償區進行溫度補償調節。 The invention also provides a temperature compensation method, which includes the following steps: S1: Perform temperature detection on the heating plate to obtain the first temperature value and the second temperature value; S2: Control the main heating module to adjust the temperature of the heating plate according to the first temperature value; S3: Control the auxiliary temperature adjustment module to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value.

為使本發明實施例的目的、技術方案和優點更加清楚,下面將對本發明實施例中的技術方案進行清楚、完整地描述,顯然,所描述的實施例是本發明一部分實施例,而不是全部的實施例。基於本發明中的實施例,本領域通常知識者在沒有作出進步性的前提下所獲得的所有其他實施例,都屬於本發明保護的範圍。除非另外定義,此處使用的技術術語或者科學術語應當為本發明所屬領域內具有通常知識者所理解的通常意義。本文中使用的「包括」等類似的詞語意指出現該詞前面的元件或者物件涵蓋出現在該詞後面列舉的元件或者物件及其等同,而不排除其他元件或者物件。In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, not all of them. Embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making any progress fall within the scope of protection of the present invention. Unless otherwise defined, technical or scientific terms used herein shall have their ordinary meaning understood by one of ordinary skill in the art to which this invention belongs. The use of "comprising" and similar words herein means that the elements or things appearing before the word include the elements or things listed after the word and their equivalents, without excluding other elements or things.

針對現有技術存在的問題,本發明實施例提供了一種溫度補償系統,圖1為本發明實施例溫度補償系統的剖視結構示意圖,圖2為本發明實施例溫度補償系統的電路連接框架示意圖。In order to solve the problems existing in the prior art, embodiments of the present invention provide a temperature compensation system. Figure 1 is a schematic cross-sectional structural diagram of the temperature compensation system according to the embodiment of the present invention. Figure 2 is a schematic diagram of the circuit connection frame of the temperature compensation system according to the embodiment of the present invention.

參照圖1和圖2,本發明的所述溫度補償系統包括腔體1、溫度回饋模組4、加熱盤2、分散式溫控模組5、多分區溫控模組90、用於對所述加熱盤2進行加熱的主加熱模組9和至少一個輔助調溫模組6; 所述腔體1與所述加熱盤2的底面形成安裝腔11,所述安裝腔11內設置所述主加熱模組9、所述輔助調溫模組6和所述分散式溫控模組5; 參照圖2,所述分散式溫控模組5通信連接所述溫度回饋模組4、所述輔助調溫模組6,所述多分區溫控模組90與所述溫度回饋模組4和所述主加熱模組9通信連接。 Referring to Figures 1 and 2, the temperature compensation system of the present invention includes a cavity 1, a temperature feedback module 4, a heating plate 2, a distributed temperature control module 5, and a multi-zone temperature control module 90. The main heating module 9 and at least one auxiliary temperature adjustment module 6 used for heating by the heating plate 2; The bottom surface of the cavity 1 and the heating plate 2 forms an installation cavity 11, and the main heating module 9, the auxiliary temperature control module 6 and the distributed temperature control module are arranged in the installation cavity 11. 5; Referring to Figure 2, the distributed temperature control module 5 is communicatively connected to the temperature feedback module 4 and the auxiliary temperature regulation module 6. The multi-zone temperature control module 90 is connected to the temperature feedback module 4 and The main heating module 9 is connected through communication.

在一些實施例中,所述加熱盤2採用導熱材料製作,便於所述主加熱模組9對所述加熱盤2進行溫度調節。In some embodiments, the heating plate 2 is made of thermally conductive material to facilitate the main heating module 9 to adjust the temperature of the heating plate 2 .

在一些具體的實施方式中,所述主加熱模組9的形狀與所述加熱盤2形狀一致,所述加熱盤2與主加熱模組無縫連接,以提高溫度調節效率。In some specific embodiments, the shape of the main heating module 9 is consistent with the shape of the heating plate 2, and the heating plate 2 is seamlessly connected to the main heating module to improve temperature regulation efficiency.

在一些實施例中,所述主加熱模組與所述加熱盤2通過燒結工藝完成兩者的連接。In some embodiments, the main heating module and the heating plate 2 are connected through a sintering process.

在一種具體實施方式中,所述主加熱模組9通過燒結工藝嵌入所述加熱盤2內部,即所述主加熱模組9嵌在所述加熱盤2中間層中。In a specific implementation, the main heating module 9 is embedded inside the heating plate 2 through a sintering process, that is, the main heating module 9 is embedded in the middle layer of the heating plate 2 .

在另一種具體實施方式中,通過燒結工藝使主加熱模組燒結於加熱盤2背面,從而使所述主加熱模組9與所述加熱盤2無縫連接。In another specific implementation, the main heating module 9 is sintered on the back of the heating plate 2 through a sintering process, so that the main heating module 9 and the heating plate 2 are seamlessly connected.

在另一些實施例中,所述主加熱模組9與所述加熱盤2通過黏貼或焊接方式連接。In other embodiments, the main heating module 9 and the heating plate 2 are connected by adhesion or welding.

參照圖1和圖2,所述加熱盤2的底面設置至少一個控溫補償區(圖中未標示),所述輔助調溫模組6與所述控溫補償區對應設置。Referring to Figures 1 and 2, at least one temperature control compensation area (not labeled in the figure) is provided on the bottom surface of the heating plate 2, and the auxiliary temperature control module 6 is provided corresponding to the temperature control compensation area.

一些具體的實施例中,所述控溫補償區具體所在的範圍以及相鄰控溫補償區之間的距離由所述加熱盤2自身的結構性能、工藝需求和安裝條件共同決定。In some specific embodiments, the specific range of the temperature control compensation area and the distance between adjacent temperature control compensation areas are determined by the structural performance, process requirements and installation conditions of the heating plate 2 itself.

所述溫度回饋模組4對所述加熱盤2進行溫度檢測以得到第一溫度值和第二溫度值; 所述多分區溫控模組90根據所述第一溫度值控制所述主加熱模組9對所述加熱盤2進行溫度調節; 所述分散式溫控模組5根據所述第二溫度值控制所述輔助調溫模組6對所述控溫補償區進行溫度補償調節。 The temperature feedback module 4 detects the temperature of the heating plate 2 to obtain the first temperature value and the second temperature value; The multi-zone temperature control module 90 controls the main heating module 9 to adjust the temperature of the heating plate 2 according to the first temperature value; The distributed temperature control module 5 controls the auxiliary temperature control module 6 to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value.

一些實施例中,所述分散式溫控模組5包括由印刷電路板(Printed Circuit Board,PCB)以及設置於PCB板的功能器件組成的控制板。In some embodiments, the distributed temperature control module 5 includes a control board composed of a printed circuit board (PCB) and functional devices provided on the PCB board.

本發明的溫度補償系統的優點為:通過在控溫補償區對應設置輔助調溫模組6從而對加熱盤2進行溫度補償調節,避免了複雜的出線設計,佔用體積空間較小,解決的現有技術中調節基板溫度成本高、佔用硬體安裝空間大的問題。所述溫度回饋模組4檢測加熱盤2以得到第一溫度值和第二溫度值,所述多分區溫控模組90根據所述第一溫度值控制所述主加熱模組9對所述加熱盤2進行溫度調節,所述分散式溫控模組5根據第二溫度值控制所述輔助調溫模組6對所述控溫補償區進行溫度補償調節,使得加熱盤2的溫度更加均勻,在盡可能小的製造和維護成本下有效控制半導體基板的溫度均勻性,溫度控制精度高。可以有效降低因採用傳統技術方案而增加的分區數量,降低溫控部分的成本。The advantages of the temperature compensation system of the present invention are: by setting the auxiliary temperature adjustment module 6 correspondingly in the temperature control compensation area to perform temperature compensation and adjustment on the heating plate 2, complex outlet design is avoided, and it occupies less space and solves the problem of In the existing technology, the cost of adjusting the substrate temperature is high and the hardware installation space is occupied. The temperature feedback module 4 detects the heating plate 2 to obtain a first temperature value and a second temperature value, and the multi-zone temperature control module 90 controls the main heating module 9 to control the temperature of the heating plate 2 according to the first temperature value. The heating plate 2 performs temperature adjustment, and the distributed temperature control module 5 controls the auxiliary temperature adjustment module 6 to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value, so that the temperature of the heating plate 2 is more uniform. , effectively controlling the temperature uniformity of the semiconductor substrate with high temperature control accuracy at the lowest possible manufacturing and maintenance costs. It can effectively reduce the number of partitions increased by using traditional technical solutions and reduce the cost of the temperature control part.

作為本發明一種可選的實施方式,所述加熱盤2的頂面包括基板接觸區域,所述加熱盤2的底面包括與所述基板接觸區域相對應的底面控制區域,所述控溫補償區為所述底面控制區域內的任一區域。As an optional embodiment of the present invention, the top surface of the heating plate 2 includes a substrate contact area, the bottom surface of the heating plate 2 includes a bottom surface control area corresponding to the substrate contact area, and the temperature control compensation area Any area within the bottom surface control area.

一些實施例中,所述加熱盤2上設置多個加熱分區,所述主加熱模組9具備多分區加熱回路,便於對多個所述加熱分區進行加熱。In some embodiments, the heating plate 2 is provided with multiple heating zones, and the main heating module 9 is equipped with a multi-zone heating circuit to facilitate heating of multiple heating zones.

圖3為本發明實施例溫度回饋模組和分散式溫控模組結構示意圖。Figure 3 is a schematic structural diagram of a temperature feedback module and a distributed temperature control module according to an embodiment of the present invention.

一些實施例中,參照圖3,所述溫度補償系統還包括蓋體13,所述蓋體13與所述腔體1之間形成加熱空腔10,所述加熱空腔10用於放置需要進行晶圓烘烤制程的晶圓或用於檢測溫度的測溫晶圓,所述蓋體13用於蓋在所述加熱空腔10頂部,以減少熱量流失,所述加熱盤2設置於加熱空腔10的底部,分散式溫控模組5位於加熱盤2的底部,且所述分散式溫控模組5與所述加熱盤2不接觸。In some embodiments, referring to Figure 3, the temperature compensation system also includes a cover 13. A heating cavity 10 is formed between the cover 13 and the cavity 1. The heating cavity 10 is used to place the components that need to be processed. For wafers in the wafer baking process or temperature measurement wafers used to detect temperature, the cover 13 is used to cover the top of the heating cavity 10 to reduce heat loss. The heating plate 2 is arranged in the heating cavity. At the bottom of the cavity 10, the decentralized temperature control module 5 is located at the bottom of the heating plate 2, and the decentralized temperature control module 5 is not in contact with the heating plate 2.

作為本發明一種可選的實施方式,參照圖1和圖2,所述溫度回饋模組4在所述主加熱模組9的加熱功率穩定後,對所述加熱盤2進行第一輪溫度檢測以得到所述第一溫度值,並將所述第一溫度值回饋至所述多分區溫控模組90; 所述溫度回饋模組4在所述溫度調節完畢後對所述加熱盤2進行第二輪溫度檢測以得到所述第二溫度值,並將所述第二溫度值回饋至所述分散式溫控模組5。 As an optional embodiment of the present invention, with reference to Figures 1 and 2, the temperature feedback module 4 performs a first round of temperature detection on the heating plate 2 after the heating power of the main heating module 9 is stabilized. To obtain the first temperature value, and feed the first temperature value back to the multi-zone temperature control module 90; After the temperature adjustment is completed, the temperature feedback module 4 performs a second round of temperature detection on the heating plate 2 to obtain the second temperature value, and feeds the second temperature value back to the distributed temperature controller. Control module 5.

一些實施例中,所述溫度回饋模組4包括測溫晶圓41和測溫感測器42,所述測溫晶圓41和所述測溫感測器42連接,所述測溫感測器42與所述分散式溫控模組5通信連接。In some embodiments, the temperature feedback module 4 includes a temperature measurement wafer 41 and a temperature measurement sensor 42. The temperature measurement wafer 41 and the temperature measurement sensor 42 are connected. The temperature measurement sensor The controller 42 is communicatively connected with the distributed temperature control module 5 .

一些實施例中,所述溫度回饋模組4進行第一輪溫度檢測的步驟為: 在所述主加熱模組9的加熱功率穩定後,將所述測溫晶圓41放置於所述加熱盤2頂面的所述加熱空腔10,通過所述測溫感測器42測量所述測溫晶圓41以對所述加熱盤2進行第一輪溫度檢測以得到所述第一溫度值,並將所述第一溫度值回饋至所述多分區溫控模組90。 In some embodiments, the steps for the temperature feedback module 4 to perform the first round of temperature detection are: After the heating power of the main heating module 9 is stabilized, the temperature measurement wafer 41 is placed in the heating cavity 10 on the top surface of the heating plate 2, and the temperature measurement sensor 42 is used to measure the temperature. The temperature measurement wafer 41 performs a first round of temperature detection on the heating plate 2 to obtain the first temperature value, and feeds the first temperature value back to the multi-zone temperature control module 90 .

一些實施例中,所述多分區溫控模組90根據所述第一溫度值控制所述主加熱模組9以對所述加熱盤2進行溫度調節的具體調節步驟為: 當所述第一溫度值小於預設的第一目標溫度時,所述多分區溫控模組90控制所述主加熱模組9提高其加熱功率,以提高加熱盤2的溫度,直至將所述第一溫度值調整至所述第一目標溫度,保持所述主加熱模組9的輸出功率穩定不變; 當所述第一溫度值大於預設的第一目標溫度時,所述多分區溫控模組90控制所述主加熱模組9降低其加熱功率,以降低所述加熱盤2的溫度,直至將所述第一溫度值調整至所述第一目標溫度,保持所述主加熱模組9的輸出功率穩定不變。 In some embodiments, the specific adjustment steps for the multi-zone temperature control module 90 to control the main heating module 9 to adjust the temperature of the heating plate 2 according to the first temperature value are: When the first temperature value is less than the preset first target temperature, the multi-zone temperature control module 90 controls the main heating module 9 to increase its heating power to increase the temperature of the heating plate 2 until the The first temperature value is adjusted to the first target temperature to keep the output power of the main heating module 9 stable; When the first temperature value is greater than the preset first target temperature, the multi-zone temperature control module 90 controls the main heating module 9 to reduce its heating power to reduce the temperature of the heating plate 2 until Adjust the first temperature value to the first target temperature to keep the output power of the main heating module 9 stable.

一些實施例中,參照圖2和圖3,所述溫度回饋模組4進行第二輪溫度檢測的步驟為: 在所述溫度調節完畢後,將所述測溫晶圓41放置於所述加熱盤2頂部的所述加熱空腔10,通過所述測溫感測器42檢測所述測溫晶圓41的溫度以實現對所述加熱盤2的溫度檢測; 所述測溫感測器42得到所述第二溫度值後,將所述第二溫度值回饋至所述分散式溫控模組5。 In some embodiments, referring to Figures 2 and 3, the steps for the temperature feedback module 4 to perform the second round of temperature detection are: After the temperature adjustment is completed, the temperature measurement wafer 41 is placed in the heating cavity 10 on the top of the heating plate 2, and the temperature measurement sensor 42 is used to detect the temperature of the temperature measurement wafer 41. temperature to achieve temperature detection of the heating plate 2; After obtaining the second temperature value, the temperature sensor 42 feeds back the second temperature value to the distributed temperature control module 5 .

一些實施例中,在所述測溫晶圓41上設置多個測溫點,每個所述測溫點至少連接一個所述測溫感測器42,所述溫控補償區與所述測溫點對應,以檢測所述加熱盤2各個區域是否需要進行溫度補償調節,從而分別對每個所述溫控補償區進行溫度檢測,並分別對需要進行溫度補償的所述溫度補償區進行溫度補償調節,從而方便對所述加熱盤2進行有次序的溫度補償調節。In some embodiments, multiple temperature measurement points are provided on the temperature measurement wafer 41 , each temperature measurement point is connected to at least one temperature measurement sensor 42 , and the temperature control compensation area is connected to the temperature measurement sensor 42 . Corresponding temperature points are used to detect whether each area of the heating plate 2 needs temperature compensation adjustment, so as to perform temperature detection on each temperature control compensation area, and perform temperature detection on the temperature compensation area that needs temperature compensation. Compensation adjustment facilitates orderly temperature compensation adjustment of the heating plate 2.

一些具體的實施例中,多個所述控溫補償區相對所述底面控制區域中心呈陣列分佈。具體的陣列分佈類型包括但不限於環形陣列和矩形陣列。In some specific embodiments, a plurality of the temperature control compensation areas are distributed in an array relative to the center of the bottom surface control area. Specific array distribution types include, but are not limited to, circular arrays and rectangular arrays.

作為本發明一種可選的實施方式,參照圖1,所述溫度補償系統還包括設置於所述主加熱模組和所述分散式溫控模組5之間的隔板7,所述輔助調溫模組6設置於所述隔板7。As an optional embodiment of the present invention, referring to Figure 1, the temperature compensation system also includes a partition 7 disposed between the main heating module and the distributed temperature control module 5. The temperature module group 6 is arranged on the partition 7 .

在一些實施例中,所述隔板7採用隔熱材料製作,所述隔板7的外側邊與所述加熱盤2的下側壁密封連接,以起到隔熱保溫的作用,降低所述加熱空腔10內的熱量損失的同時,也避免了所述加熱空腔10內的熱量影響所述分散式溫控模組5的工作,提高所述分散式溫控模組5的使用壽命。In some embodiments, the partition 7 is made of heat-insulating material, and the outer edge of the partition 7 is sealingly connected to the lower side wall of the heating plate 2 to play the role of heat insulation and reduce the While the heat in the heating cavity 10 is lost, it also prevents the heat in the heating cavity 10 from affecting the operation of the decentralized temperature control module 5 and increases the service life of the decentralized temperature control module 5 .

作為本發明一種可選的實施方式,所述隔板7上設置有允許引線通過的引線孔。As an optional embodiment of the present invention, the partition 7 is provided with lead holes that allow lead wires to pass through.

圖4為本發明實施例輔助調溫模組的正視圖,圖5為本發明實施例輔助調溫模組的剖視圖,圖6為圖1中A的放大結構示意圖。Figure 4 is a front view of the auxiliary temperature control module according to the embodiment of the present invention. Figure 5 is a cross-sectional view of the auxiliary temperature control module according to the embodiment of the present invention. Figure 6 is an enlarged structural diagram of A in Figure 1.

作為本發明一種可選的實施方式,參照圖1、圖4、圖5和圖6,所述輔助調溫模組6包括溫度補償單元60,所述溫度補償單元60通信連接所述分散式溫控模組5,所述溫度補償單元60與對應的所述控溫補償區之間的距離大於或等於0。As an optional implementation mode of the present invention, referring to Figures 1, 4, 5 and 6, the auxiliary temperature control module 6 includes a temperature compensation unit 60, and the temperature compensation unit 60 is communicatively connected to the distributed temperature control module. Control module 5, the distance between the temperature compensation unit 60 and the corresponding temperature control compensation area is greater than or equal to 0.

作為本發明一種可選的實施方式,所述輔助調溫模組6還包括固定組件(圖中未示出),所述固定組件用於將所述溫度補償單元60固定於對應的所述控溫補償區。As an optional embodiment of the present invention, the auxiliary temperature control module 6 also includes a fixing component (not shown in the figure), which is used to fix the temperature compensation unit 60 to the corresponding control unit. Temperature compensation zone.

作為本發明一種可選的實施方式,參照圖4,所述溫度補償單元60包括升溫單元601和降溫單元602,所述升溫單元601與所述降溫單元602間隔設置。As an optional implementation manner of the present invention, referring to FIG. 4 , the temperature compensation unit 60 includes a heating unit 601 and a cooling unit 602. The heating unit 601 is spaced apart from the cooling unit 602.

在一些實施例中,所述溫度補償單元60與所述加熱盤2之間為接觸式相互作用,即所述溫度補償單元60的頂端與對應的所述控溫補償區(圖中未標示)之間的距離等於0,使得所述溫度補償單元60頂端與所述控溫補償區(圖中未標示)貼合。In some embodiments, there is a contact interaction between the temperature compensation unit 60 and the heating plate 2 , that is, the top of the temperature compensation unit 60 and the corresponding temperature control compensation area (not labeled in the figure) The distance between them is equal to 0, so that the top of the temperature compensation unit 60 is in contact with the temperature control compensation area (not marked in the figure).

一些具體的實施例中,所述固定組件為耐高溫黏膠,通過所述耐高溫黏膠將所述溫度補償單元60黏貼於所述加熱盤2的底面對應的控溫補償區。耐高溫黏膠能在高溫環境下保持良好的黏性,保證所述溫度補償單元60黏貼於所述加熱盤2的底面,溫度補償調節效果更好。In some specific embodiments, the fixing component is a high-temperature resistant adhesive, and the temperature compensation unit 60 is adhered to the corresponding temperature control compensation area on the bottom surface of the heating plate 2 through the high-temperature resistant adhesive. The high-temperature-resistant adhesive can maintain good viscosity in a high-temperature environment, ensuring that the temperature compensation unit 60 is adhered to the bottom surface of the heating plate 2, and the temperature compensation adjustment effect is better.

一些具體實施例中,所述溫度補償單元60的升溫單元601為陶瓷加熱片。In some specific embodiments, the temperature increasing unit 601 of the temperature compensation unit 60 is a ceramic heating plate.

一些具體實施例中,所述溫度補償單元60的降溫單元602為半導體製冷片。In some specific embodiments, the cooling unit 602 of the temperature compensation unit 60 is a semiconductor refrigeration chip.

在另一些實施例中,所述溫度補償單元60通過所述固定組件懸設於所述加熱盤2和所述分散式溫控模組5之間,使得所述溫度補償單元60的頂端與對應的所述控溫補償區之間的距離大於0。所述溫度補償單元60與所述加熱盤2之間為非接觸式相互作用。In other embodiments, the temperature compensation unit 60 is suspended between the heating plate 2 and the distributed temperature control module 5 through the fixing component, so that the top end of the temperature compensation unit 60 is aligned with the corresponding The distance between the temperature control compensation areas is greater than 0. There is a non-contact interaction between the temperature compensation unit 60 and the heating plate 2 .

一些具體實施例中,所述溫度補償單元60的升溫單元601為LED燈或鹵素燈。In some specific embodiments, the temperature increasing unit 601 of the temperature compensation unit 60 is an LED lamp or a halogen lamp.

作為本發明一種可選的實施方式,當所述第二溫度值小於預設的第二目標溫度,所述分散式溫控模組5控制所述升溫單元601對所述加熱分區進行溫度補償調節,直至將所述第二溫度值調整至所述第二目標溫度; 當所述第二溫度值大於預設的第二目標溫度,所述分散式溫控模組5控制所述降溫單元602對所述加熱分區進行溫度補償調節,直至將所述第二溫度值調整至所述第二目標溫度。 As an optional implementation manner of the present invention, when the second temperature value is less than the preset second target temperature, the distributed temperature control module 5 controls the heating unit 601 to perform temperature compensation adjustment on the heating zone. , until the second temperature value is adjusted to the second target temperature; When the second temperature value is greater than the preset second target temperature, the distributed temperature control module 5 controls the cooling unit 602 to perform temperature compensation adjustment on the heating zone until the second temperature value is adjusted. to the second target temperature.

一些實施例中,所述溫度補償單元60的降溫單元602為小型供氣組件。In some embodiments, the cooling unit 602 of the temperature compensation unit 60 is a small air supply component.

一些實施例中,所述小型供氣組件設置為在所述分散式溫控模組5的控制下向對應的所述控溫補償區噴射潔淨的製冷氣體。In some embodiments, the small air supply component is configured to inject clean refrigerant gas into the corresponding temperature control compensation area under the control of the distributed temperature control module 5 .

在一些具體實施方式中,所述小型供氣組件包括與每個所述控溫補償區對應設置的氣體循環管路,所述小型供氣組件設置為在所述分散式溫控模組5的控制下通過所述氣體循環管路使潔淨的製冷氣體在所述氣體循環管路中流通,以使對應的所述控溫補償區降溫;所述氣體循環管路靠近或貼著所述加熱盤2的背面,以提高降溫效果。In some specific embodiments, the small air supply component includes a gas circulation pipeline provided corresponding to each temperature control compensation zone, and the small air supply component is disposed at the end of the distributed temperature control module 5 Clean refrigeration gas is circulated through the gas circulation pipeline under control to cool the corresponding temperature control compensation area; the gas circulation pipeline is close to or against the heating plate 2 on the back to improve the cooling effect.

另一些實施例中,所述溫度補償單元60的降溫單元602為小型供液組件。In other embodiments, the cooling unit 602 of the temperature compensation unit 60 is a small liquid supply component.

在一些具體的實施方式中,所述小型供液組件包括與每個所述控溫補償區對應設置的液體循環管路,所述小型供液組件設置為在所述分散式溫控模組5的控制下使製冷液體在所述液體循環管路中流通迴圈,以使對應的所述控溫補償區降溫;所述液體循環管路靠近或貼著所述加熱盤2的背面,以提高降溫效果。In some specific embodiments, the small liquid supply component includes a liquid circulation pipeline corresponding to each of the temperature control compensation zones, and the small liquid supply component is configured to be in the distributed temperature control module 5 The refrigeration liquid is circulated in the liquid circulation pipeline under the control to cool down the corresponding temperature control compensation area; the liquid circulation pipeline is close to or against the back of the heating plate 2 to improve Cooling effect.

作為本發明一種可選的實施方式,參照圖5,所述輔助調溫模組6還包括設置於所述隔板7上的支撐件61、設置於所述支撐件61內部的彈性件62和設置於所述彈性件62頂端的安裝部63,所述溫度補償單元60設置於所述安裝部63朝向所述加熱盤2的一面; 所述彈性件62在所述支撐件61的作用下對所述溫度補償單元60施加朝向對應所述控溫補償區方向的作用力來調節所述溫度補償單元60與對應的所述控溫補償區之間的距離。 As an optional embodiment of the present invention, referring to Figure 5, the auxiliary temperature control module 6 also includes a support member 61 provided on the partition 7, an elastic member 62 provided inside the support member 61 and The installation part 63 is provided at the top of the elastic member 62, and the temperature compensation unit 60 is provided on the side of the installation part 63 facing the heating plate 2; The elastic member 62 exerts an acting force on the temperature compensation unit 60 in the direction corresponding to the temperature control compensation area under the action of the support member 61 to adjust the temperature compensation unit 60 and the corresponding temperature control compensation area. distance between zones.

一些實施例中,支撐件61內部設置有允許安裝部63在內部沿朝著遠離或靠近所述加熱盤2底面方向滑動的凹槽64,所述彈性件62設置於所述凹槽64內。所述凹槽64限定了所述安裝部63的徑向運動範圍,以根據需求調整所述溫度補償單元60與溫控補償區之間的距離,以使所述溫度補償單元60能有效作用於對應的所述控溫補償區。In some embodiments, the support member 61 is provided with a groove 64 inside that allows the mounting portion 63 to slide in a direction away from or close to the bottom surface of the heating plate 2 , and the elastic member 62 is disposed in the groove 64 . The groove 64 defines the radial movement range of the mounting portion 63 to adjust the distance between the temperature compensation unit 60 and the temperature control compensation area according to needs, so that the temperature compensation unit 60 can effectively act on Corresponding to the temperature control compensation area.

一些實施例中,所述彈性件62為壓縮工作狀態,以對所述溫度補償單元60施加朝向對應所述控溫補償區(圖中未標示)方向的作用力使所述溫度補償單元60的頂端與對應的所述控溫補償區(圖中未標示)貼合。In some embodiments, the elastic member 62 is in a compressed working state to exert a force on the temperature compensation unit 60 in a direction corresponding to the temperature control compensation area (not shown in the figure) to make the temperature compensation unit 60 The top end is fitted with the corresponding temperature control compensation area (not marked in the figure).

一些具體的實施例中,所述彈性件62為彈簧。In some specific embodiments, the elastic member 62 is a spring.

作為本發明一種可選的實施方式,所述支撐件61內設置有允許引線通過的引線孔,所述安裝部63內也設置有允許引線通過的引線孔。As an optional embodiment of the present invention, the support member 61 is provided with lead holes that allow lead wires to pass through, and the mounting portion 63 is also provided with lead wire holes that allow lead wires to pass through.

在一些實施例中,參照圖5,在所述隔板7上設置有允許引線穿過的第一引線孔(圖中未標示),在所述支撐件61內設置有允許引線通過的第二引線孔610,在所述安裝部63的內部設置有允許引線通過的第三引線孔630,使得所述溫度補償單元60能通過引線分別穿過第三引線孔630、凹槽64、第二引線孔610和第一引線孔連接所述分散式溫控模組5,實現所述溫度補償單元60與所述分散式溫控模組5的通信連接。In some embodiments, referring to FIG. 5 , the partition 7 is provided with a first lead hole (not labeled in the figure) that allows the lead to pass through, and a second lead hole that allows the lead to pass through is provided in the support member 61 . The lead hole 610 is provided with a third lead hole 630 inside the mounting part 63 that allows the lead to pass through, so that the temperature compensation unit 60 can pass the lead through the third lead hole 630, the groove 64, and the second lead respectively. The hole 610 and the first lead hole are connected to the distributed temperature control module 5 to realize the communication connection between the temperature compensation unit 60 and the distributed temperature control module 5 .

作為本發明一種可選的實施方式,參照圖1,還包括溫控封板3,所述溫控封板3設置於所述安裝腔11,所述溫控封板3位於所述加熱盤2的底端,所述溫控封板3與所述加熱盤2和所述加熱空腔10內壁之間形成保溫空間,所述分散式溫控模組5和所述輔助調溫模組6均設置於所述保溫空間。As an optional embodiment of the present invention, with reference to Figure 1, a temperature control sealing plate 3 is also included. The temperature control sealing plate 3 is provided in the installation cavity 11. The temperature control sealing plate 3 is located on the heating plate 2. At the bottom end, a heat preservation space is formed between the temperature control sealing plate 3, the heating plate 2 and the inner wall of the heating cavity 10, the decentralized temperature control module 5 and the auxiliary temperature regulation module 6 All are installed in the thermal insulation space.

在一些實施例中,所述溫控封板3採用隔熱材料製作,溫控封板3的外側面與所述加熱空腔10的內側壁密封連接,能與加熱盤2和加熱空腔10內壁間形成保溫空間從而更易於保持加熱空腔10內的溫度,從而保證半導體基板加工過程中的溫度的穩定性,具有達到省電節能的作用;溫控封板3還起到密封保護的作用,保護位於加熱盤2和溫控封板3之間分散式溫控模組5和輔助調溫模組6等電路元器件。In some embodiments, the temperature control sealing plate 3 is made of heat-insulating material. The outer surface of the temperature control sealing plate 3 is sealingly connected to the inner wall of the heating cavity 10 and can be connected with the heating plate 2 and the heating cavity 10 . A thermal insulation space is formed between the inner walls, which makes it easier to maintain the temperature in the heating cavity 10, thereby ensuring the temperature stability during the processing of the semiconductor substrate, and has the effect of saving power and energy; the temperature control sealing plate 3 also serves as a sealing protection It functions to protect circuit components such as the distributed temperature control module 5 and the auxiliary temperature regulation module 6 located between the heating plate 2 and the temperature control sealing plate 3.

本發明還提供一種半導體設備,包括所述溫度補償系統。The invention also provides a semiconductor device, including the temperature compensation system.

圖7為本發明實施例溫度補償方法的流程圖。Figure 7 is a flow chart of a temperature compensation method according to an embodiment of the present invention.

參照圖7,本發明還提供一種溫度補償方法,包括以下步驟: S0:提供加熱盤、主加熱模組和輔助調溫模組,所述加熱盤的底面設置至少一個控溫補償區,所述輔助調溫模組與所述控溫補償區對應設置; S1:對所述加熱盤進行溫度檢測以得到第一溫度值和第二溫度值; S2:根據所述第一溫度值控制所述主加熱模組對所述加熱盤進行溫度調節; S3:根據所述第二溫度值控制所述輔助調溫模組對所述控溫補償區進行溫度補償調節。 Referring to Figure 7, the present invention also provides a temperature compensation method, including the following steps: S0: Provide a heating plate, a main heating module and an auxiliary temperature control module. The bottom surface of the heating plate is provided with at least one temperature control compensation area, and the auxiliary temperature control module is set corresponding to the temperature control compensation area; S1: Perform temperature detection on the heating plate to obtain the first temperature value and the second temperature value; S2: Control the main heating module to adjust the temperature of the heating plate according to the first temperature value; S3: Control the auxiliary temperature adjustment module to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value.

一些具體實施方式中,參照圖1至圖7,結合本發明的所述溫度補償系統,本發明的溫度補償方法的具體操作步驟如下: (1) 在所述主加熱模組9的加熱功率穩定後,將所述測溫晶圓41放置於所述加熱盤2頂面的加熱面上,通過所述測溫感測器42測量所述測溫晶圓41以對所述加熱盤2進行第一輪溫度檢測以得到所述第一溫度值,並將所述第一溫度值回饋至所述多分區溫控模組90; (2) 所述多分區溫控模組90根據所述第一溫度值控制所述主加熱模組9以對所述加熱盤2進行溫度調節,具體地: 當所述第一溫度值小於預設的第一目標溫度,所述多分區溫控模組控制所述主加熱模組提高其加熱功率,以提高加熱盤的溫度,直至將所述第一溫度值調整至所述第一目標溫度,保持所述主加熱模組的輸出功率穩定不變; 當所述第一溫度值大於預設的第一目標溫度,所述多分區溫控模組控制所述主加熱模組降低其加熱功率,以降低加熱盤的溫度,直至將所述第一溫度值調整至所述第一目標溫度,保持所述主加熱模組的輸出功率穩定不變。 (3) 在加熱盤2的溫度補償調節階段,即在所述溫度調節完畢後,通過多個測溫感測器42分別測量所述測溫晶圓41上多個測溫點以得到多個所述第二溫度值,並將所述測第二溫度值回饋至所述測分散式溫控模組5,以實現對溫控補償區的溫度的線上監測; (4) 所述分散式溫控模組5根據所述第二溫度值控制所述輔助調溫模組6對所述控溫補償區進行溫度補償調節,具體地: 當所述第二溫度值小於第二目標溫度,所述分散式溫控模組5控制該測溫感測器42對應的控溫補償區的升溫單元601對控溫補償區進行升溫,直至該控溫補償區對應的第二溫度值在所述第二目標溫度; 當所述測第二溫度值大於第二目標溫度,所述分散式溫控模組5控制該測溫感測器42對應的控溫補償區的降溫單元602對控溫補償區進行降溫,直至該控溫補償區對應的第二溫度值在所述第二目標溫度。 In some specific implementations, referring to Figures 1 to 7, combined with the temperature compensation system of the present invention, the specific operating steps of the temperature compensation method of the present invention are as follows: (1) After the heating power of the main heating module 9 is stabilized, place the temperature measuring wafer 41 on the heating surface on the top surface of the heating plate 2, and measure the temperature through the temperature measuring sensor 42. The temperature measurement wafer 41 performs a first round of temperature detection on the heating plate 2 to obtain the first temperature value, and feeds the first temperature value back to the multi-zone temperature control module 90; (2) The multi-zone temperature control module 90 controls the main heating module 9 according to the first temperature value to adjust the temperature of the heating plate 2, specifically: When the first temperature value is less than the preset first target temperature, the multi-zone temperature control module controls the main heating module to increase its heating power to increase the temperature of the heating plate until the first temperature is The value is adjusted to the first target temperature to keep the output power of the main heating module stable; When the first temperature value is greater than the preset first target temperature, the multi-zone temperature control module controls the main heating module to reduce its heating power to reduce the temperature of the heating plate until the first temperature reaches The value is adjusted to the first target temperature to keep the output power of the main heating module stable. (3) In the temperature compensation adjustment stage of the heating plate 2, that is, after the temperature adjustment is completed, multiple temperature measurement points on the temperature measurement wafer 41 are measured by multiple temperature measurement sensors 42 to obtain multiple The second temperature value is fed back to the distributed temperature control module 5 to realize online monitoring of the temperature of the temperature control compensation area; (4) The distributed temperature control module 5 controls the auxiliary temperature control module 6 to perform temperature compensation adjustment on the temperature control compensation area according to the second temperature value, specifically: When the second temperature value is less than the second target temperature, the distributed temperature control module 5 controls the heating unit 601 of the temperature control compensation area corresponding to the temperature measurement sensor 42 to increase the temperature of the temperature control compensation area until the The second temperature value corresponding to the temperature control compensation area is at the second target temperature; When the measured second temperature value is greater than the second target temperature, the distributed temperature control module 5 controls the cooling unit 602 of the temperature control compensation area corresponding to the temperature measurement sensor 42 to cool the temperature control compensation area until The second temperature value corresponding to the temperature control compensation area is at the second target temperature.

現有技術通常採用對加熱盤進行分區控制的方式調節加熱盤的溫度均勻性。例如將加熱盤分為七分區、十三分區、十五分區等。考慮到功能器件的佈局要求以及佈線安裝的限制,對加熱盤的分區不可能無限大,每個分區都包括了測溫晶圓上的多個測溫採樣點。當通過測溫晶圓顯示某個分區,若第一分區的溫度均勻性不滿足工藝要求,則需要進行升溫調整後,主控制單元會控制第一分區進行升溫。但是這種調整會帶來如下問題:第一分區內所包含的多個測溫採樣點中部分測溫採樣點的平均溫度會低於目標溫度,但是這些測溫採樣點中的一部分測溫採樣點的溫度會高於目標溫度,而且和目標溫度之間的溫度差極有可能是互有區別的。即使是溫度低於目標溫度的各個控溫區域,和目標溫度之間的溫度差也極有可能是互有區別的。可見對單個分區進行的溫度調整很容易在加熱盤的整體範圍內再次引起溫度不均勻的問題。In the prior art, the temperature uniformity of the heating plate is usually adjusted by zoning control of the heating plate. For example, the heating plate is divided into seven zones, thirteen zones, fifteen zones, etc. Considering the layout requirements of functional devices and the limitations of wiring installation, the partitions of the heating plate cannot be infinitely large. Each partition includes multiple temperature measurement sampling points on the temperature measurement wafer. When a certain partition is displayed through the temperature measurement wafer, if the temperature uniformity of the first partition does not meet the process requirements, the temperature rise adjustment needs to be made, and the main control unit will control the first partition to raise the temperature. However, this adjustment will bring about the following problems: the average temperature of some of the multiple temperature measurement sampling points included in the first partition will be lower than the target temperature, but some of the temperature measurement sampling points The temperature of the spot will be higher than the target temperature, and the temperature difference between it and the target temperature is most likely to be different from each other. Even for each temperature control area where the temperature is lower than the target temperature, the temperature difference between the temperature and the target temperature is very likely to be different from each other. It can be seen that temperature adjustment of a single zone can easily cause temperature unevenness across the entire heating plate again.

另外,上述分區控制的方式使得每個分區都需要獨立的溫度控制,顯著增加了溫控部分的成本,且分區越多需要的加熱裝置越多,明顯增加了溫控成本。In addition, the above-mentioned partition control method requires independent temperature control for each partition, which significantly increases the cost of the temperature control part. The more partitions, the more heating devices are required, which significantly increases the cost of temperature control.

本發明實施例技術方案中,在所述主加熱模組9的加熱功率穩定後,通過所述溫度回饋模組4對所述加熱盤2進行第一輪溫度檢測以得到所述第一溫度值,並將所述第一溫度值回饋至所述多分區溫控模組90,所述多分區溫控模組90根據所述第一溫度值控制所述主加熱模組9以對所述加熱盤2進行溫度調節,直至所述第一溫度值保持在所述第一溫度範圍內; 在所述溫度調節完畢後,通過所述測溫感測器42獲取所述測溫晶圓41溫度訊息以得到第二溫度值,根據第二溫度值判斷所述加熱盤2底面需要進行溫度補償調節的多個控溫補償區;最後通過所述分散式溫控模組5控制對應的所述溫度補償單元60對所述控溫補償區進行升溫或降溫,以達到溫度補償調節的目的,直至所述第二溫度值保持在第二目標溫度。實現了對加熱盤的兩輪溫度檢測和兩輪溫度調節,實現了對多個所述溫度補償單元60進行的獨立測量溫度、獨立進行溫度補償調節的功能,從而使得各個溫控補償區的溫度達到預設的溫度範圍,從而保證了所述加熱盤2上溫度的均勻性,保證所述加熱盤2上每個分區的溫度均勻性。 In the technical solution of the embodiment of the present invention, after the heating power of the main heating module 9 is stabilized, the temperature feedback module 4 performs a first round of temperature detection on the heating plate 2 to obtain the first temperature value. , and feeds back the first temperature value to the multi-zone temperature control module 90. The multi-zone temperature control module 90 controls the main heating module 9 according to the first temperature value to heat the Disk 2 performs temperature adjustment until the first temperature value remains within the first temperature range; After the temperature adjustment is completed, the temperature information of the temperature measurement wafer 41 is obtained through the temperature measurement sensor 42 to obtain a second temperature value. According to the second temperature value, it is determined that the bottom surface of the heating plate 2 needs to be temperature compensated. A plurality of temperature control compensation areas are adjusted; finally, the corresponding temperature compensation unit 60 is controlled by the distributed temperature control module 5 to heat or cool down the temperature control compensation area to achieve the purpose of temperature compensation adjustment until The second temperature value is maintained at the second target temperature. Two rounds of temperature detection and two rounds of temperature adjustment of the heating plate are realized, and the functions of independent temperature measurement and independent temperature compensation adjustment of multiple temperature compensation units 60 are realized, thereby making the temperature of each temperature control compensation zone The preset temperature range is reached, thereby ensuring the temperature uniformity on the heating plate 2 and ensuring the temperature uniformity of each zone on the heating plate 2 .

雖然在上文中詳細說明了本發明的實施方式,但是對於本領域的通常知識者來說顯而易見的是,能夠對這些實施方式進行各種修改和變化。但是,應理解,這種修改和變化都屬於說明書中所述的本發明的範圍和精神之內。而且,在此說明的本發明可有其它的實施方式,並且可通過多種方式實施或實現。Although the embodiments of the present invention have been described in detail above, it will be obvious to those of ordinary skill in the art that various modifications and changes can be made to these embodiments. However, it should be understood that such modifications and changes are within the scope and spirit of the invention described in the specification. Furthermore, the invention described herein is capable of other embodiments and of being practiced or carried out in various ways.

1:腔體 10:加熱空腔 11:安裝腔 13:蓋體 2:加熱盤 3:溫控封板 4:溫度回饋模組 41:測溫晶圓 42:測溫感測器 5:分散式溫控模組 6:輔助調溫模組 60:溫度補償單元 601:升溫單元 602:降溫單元 61:支撐件 610:第二引線孔 62:彈性件 63:安裝部 630:第三引線孔 64:凹槽 7:隔板 9:主加熱模組 90:多分區溫控模組 1:Cavity 10: Heating cavity 11:Installation cavity 13: cover 2:Heating plate 3: Temperature control sealing plate 4:Temperature feedback module 41: Temperature measurement wafer 42:Temperature sensor 5: Distributed temperature control module 6: Auxiliary temperature control module 60: Temperature compensation unit 601: Heating unit 602: Cooling unit 61:Support 610: Second lead hole 62: Elastic parts 63:Installation Department 630:Third lead hole 64: Groove 7:Partition 9: Main heating module 90:Multi-zone temperature control module

圖1為本發明實施例溫度補償系統的剖視結構示意圖; 圖2為本發明實施例溫度補償系統的電路連接框架示意圖; 圖3為本發明實施例溫度回饋模組和分散式溫控模組結構示意圖; 圖4為本發明實施例輔助調溫模組的正視圖; 圖5為本發明實施例輔助調溫模組的剖視圖; 圖6為圖1中A的放大結構示意圖; 圖7為本發明實施例溫度補償方法的流程圖。 Figure 1 is a schematic cross-sectional structural diagram of a temperature compensation system according to an embodiment of the present invention; Figure 2 is a schematic diagram of the circuit connection framework of the temperature compensation system according to the embodiment of the present invention; Figure 3 is a schematic structural diagram of a temperature feedback module and a distributed temperature control module according to an embodiment of the present invention; Figure 4 is a front view of the auxiliary temperature control module according to the embodiment of the present invention; Figure 5 is a cross-sectional view of the auxiliary temperature control module according to the embodiment of the present invention; Figure 6 is an enlarged structural diagram of A in Figure 1; Figure 7 is a flow chart of a temperature compensation method according to an embodiment of the present invention.

1:腔體 1:Cavity

10:加熱空腔 10: Heating cavity

11:安裝腔 11:Installation cavity

13:蓋體 13: Cover

2:加熱盤 2:Heating plate

3:溫控封板 3: Temperature control sealing plate

41:測溫晶圓 41: Temperature measurement wafer

5:分散式溫控模組 5: Distributed temperature control module

6:輔助調溫模組 6: Auxiliary temperature control module

7:隔板 7:Partition

Claims (14)

一種溫度補償系統,包括:一腔體、一溫度回饋模組、一加熱盤、一多分區溫控模組、一分散式溫控模組、一主加熱模組和至少一輔助調溫模組,其中, 該主加熱模組和該輔助調溫模組用於對該加熱盤進行加熱; 該腔體與該加熱盤的底面形成一安裝腔,該安裝腔內設置該主加熱模組、該輔助調溫模組和該分散式溫控模組,該分散式溫控模組通信連接該溫度回饋模組和該輔助調溫模組,該多分區溫控模組通信連接該溫度回饋模組和該主加熱模組; 該加熱盤的底面設置至少一控溫補償區,該輔助調溫模組與該控溫補償區對應設置; 該溫度回饋模組對該加熱盤進行一溫度檢測以得到一第一溫度值和一第二溫度值; 該多分區溫控模組根據該第一溫度值控制該主加熱模組對該加熱盤進行一溫度調節;以及 該分散式溫控模組根據該第二溫度值控制該輔助調溫模組對該控溫補償區進行一溫度補償調節。 A temperature compensation system, including: a cavity, a temperature feedback module, a heating plate, a multi-zone temperature control module, a decentralized temperature control module, a main heating module and at least one auxiliary temperature control module ,in, The main heating module and the auxiliary temperature regulating module are used to heat the heating plate; The cavity and the bottom surface of the heating plate form an installation cavity. The main heating module, the auxiliary temperature control module and the distributed temperature control module are arranged in the installation cavity. The distributed temperature control module is communicatively connected to the The temperature feedback module and the auxiliary temperature control module, the multi-zone temperature control module are communicatively connected to the temperature feedback module and the main heating module; The bottom surface of the heating plate is provided with at least one temperature control compensation area, and the auxiliary temperature control module is provided corresponding to the temperature control compensation area; The temperature feedback module performs a temperature detection on the heating plate to obtain a first temperature value and a second temperature value; The multi-zone temperature control module controls the main heating module to perform a temperature adjustment on the heating plate according to the first temperature value; and The distributed temperature control module controls the auxiliary temperature control module to perform a temperature compensation adjustment on the temperature control compensation area according to the second temperature value. 如請求項1所述的溫度補償系統,其中, 該溫度回饋模組在該主加熱模組的加熱功率穩定後,對該加熱盤進行一第一輪溫度檢測以得到該第一溫度值,並將該第一溫度值回饋至該多分區溫控模組;以及 該溫度回饋模組在該溫度調節完畢後對該加熱盤進行一第二輪溫度檢測以得到該第二溫度值,並將該第二溫度值回饋至該分散式溫控模組。 The temperature compensation system as claimed in claim 1, wherein, After the heating power of the main heating module stabilizes, the temperature feedback module performs a first round of temperature detection on the heating plate to obtain the first temperature value, and feeds the first temperature value back to the multi-zone temperature control Modules; and After the temperature adjustment is completed, the temperature feedback module performs a second round of temperature detection on the heating plate to obtain the second temperature value, and feeds the second temperature value back to the distributed temperature control module. 如請求項1所述的溫度補償系統,還包括設置於該主加熱模組和該分散式溫控模組之間的一隔板,該輔助調溫模組設置於該隔板。The temperature compensation system according to claim 1 further includes a partition provided between the main heating module and the distributed temperature control module, and the auxiliary temperature control module is provided on the partition. 如請求項3所述的溫度補償系統,其中該隔板上設置有允許引線通過的一引線孔。The temperature compensation system as claimed in claim 3, wherein the partition plate is provided with a lead hole allowing lead wires to pass through. 如請求項3所述的溫度補償系統,其中該輔助調溫模組包括一溫度補償單元,該溫度補償單元通信連接該分散式溫控模組,該溫度補償單元與對應的該控溫補償區之間的距離大於或等於0。The temperature compensation system according to claim 3, wherein the auxiliary temperature control module includes a temperature compensation unit, the temperature compensation unit is communicatively connected to the distributed temperature control module, and the temperature compensation unit is connected to the corresponding temperature control compensation area. The distance between them is greater than or equal to 0. 如請求項5所述的溫度補償系統,其中該輔助調溫模組還包括一固定組件,該固定組件用於將該溫度補償單元固定於對應的該控溫補償區。The temperature compensation system according to claim 5, wherein the auxiliary temperature control module further includes a fixing component used to fix the temperature compensation unit to the corresponding temperature control compensation area. 如請求項5所述的溫度補償系統,其中, 該輔助調溫模組還包括設置於該隔板上的一支撐件、設置於該支撐件內部的一彈性件和設置於該彈性件頂端的一安裝部,該溫度補償單元設置於該安裝部朝向該加熱盤的一面;以及 該彈性件在該支撐件的作用下對該溫度補償單元施加朝向對應該控溫補償區方向的作用力,來調節該溫度補償單元與對應的該控溫補償區之間的距離。 The temperature compensation system of claim 5, wherein, The auxiliary temperature control module also includes a support member disposed on the partition, an elastic member disposed inside the support member, and a mounting portion disposed on the top of the elastic member. The temperature compensation unit is disposed on the mounting portion. The side facing the heating plate; and The elastic member exerts a force on the temperature compensation unit in a direction corresponding to the temperature control compensation area under the action of the support member to adjust the distance between the temperature compensation unit and the corresponding temperature control compensation area. 如請求項7所述的溫度補償系統,其中該支撐件內設置有允許引線通過的一引線孔。The temperature compensation system as claimed in claim 7, wherein a lead hole is provided in the support member to allow lead wires to pass through. 如請求項7所述的溫度補償系統,其中該溫度補償單元包括一升溫單元和一降溫單元,該升溫單元與該降溫單元為間隔設置。The temperature compensation system as claimed in claim 7, wherein the temperature compensation unit includes a temperature increasing unit and a temperature decreasing unit, and the temperature increasing unit and the temperature decreasing unit are arranged at intervals. 如請求項9所述的溫度補償系統,其中, 當該第二溫度值小於預設的第二目標溫度,該分散式溫控模組控制該升溫單元對該第二溫度值對應的該控溫補償區進行該溫度補償調節。 The temperature compensation system of claim 9, wherein, When the second temperature value is less than the preset second target temperature, the distributed temperature control module controls the temperature rising unit to perform the temperature compensation adjustment in the temperature control compensation zone corresponding to the second temperature value. 如請求項9所述的溫度補償系統,其中, 當該第二溫度值大於預設的第二目標溫度,該分散式溫控模組控制該降溫單元對該第二溫度值對應的該控溫補償區進行該溫度補償調節。 The temperature compensation system of claim 9, wherein, When the second temperature value is greater than the preset second target temperature, the distributed temperature control module controls the cooling unit to perform the temperature compensation adjustment in the temperature control compensation zone corresponding to the second temperature value. 如請求項1或9所述的溫度補償系統,還包括設置於該安裝腔內的一溫控封板,該溫控封板位於該加熱盤的底端,該溫控封板與該加熱盤和該安裝腔內側壁之間形成一保溫空間,該分散式溫控模組和該輔助調溫模組均設置於該保溫空間。The temperature compensation system as described in claim 1 or 9, further includes a temperature control sealing plate disposed in the installation cavity, the temperature control sealing plate is located at the bottom of the heating plate, the temperature control sealing plate and the heating plate A thermal insulation space is formed between the installation cavity and the inner wall of the installation cavity. The distributed temperature control module and the auxiliary temperature regulation module are both arranged in the thermal insulation space. 一種半導體設備,包括如請求項1所述的溫度補償系統。A semiconductor device including the temperature compensation system according to claim 1. 一種溫度補償方法,包括以下步驟: S0:提供一加熱盤、一主加熱模組和至少一輔助調溫模組,該加熱盤的底面設置至少一控溫補償區,該輔助調溫模組與該控溫補償區對應設置; S1:對該加熱盤進行一溫度檢測以得到一第一溫度值和一第二溫度值; S2:根據該第一溫度值控制該主加熱模組對該加熱盤進行一溫度調節;以及 S3:根據該第二溫度值控制該輔助調溫模組對該控溫補償區進行一溫度補償調節。 A temperature compensation method includes the following steps: S0: Provide a heating plate, a main heating module and at least one auxiliary temperature control module. The bottom surface of the heating plate is provided with at least one temperature control compensation area, and the auxiliary temperature control module is set corresponding to the temperature control compensation area; S1: Perform a temperature detection on the heating plate to obtain a first temperature value and a second temperature value; S2: Control the main heating module to perform a temperature adjustment on the heating plate according to the first temperature value; and S3: Control the auxiliary temperature adjustment module to perform a temperature compensation adjustment on the temperature control compensation area according to the second temperature value.
TW111131374A 2022-06-29 2022-08-19 Temperature compensation system, semiconductor equipment and emperature compensation method TW202401195A (en)

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