TW202346205A - Nano silicon, nano silicon slurry, method for producing nano silicon, active material for secondary batteries, and secondary battery - Google Patents

Nano silicon, nano silicon slurry, method for producing nano silicon, active material for secondary batteries, and secondary battery Download PDF

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TW202346205A
TW202346205A TW112105563A TW112105563A TW202346205A TW 202346205 A TW202346205 A TW 202346205A TW 112105563 A TW112105563 A TW 112105563A TW 112105563 A TW112105563 A TW 112105563A TW 202346205 A TW202346205 A TW 202346205A
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silicon
active material
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negative electrode
carbon
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高橋要
川瀬賢一
武久敢
片野聡
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日商Dic股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/38Selection of substances as active materials, active masses, active liquids of elements or alloys
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y02E60/10Energy storage using batteries

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Abstract

The present invention relates to: an active material for secondary batteries, the active material being used for lithium ion secondary batteries; and a secondary battery which comprises the active material for secondary batteries as a negative electrode active material. The present invention provides a negative electrode active material for secondary batteries, the negative electrode active material enabling the achievement of a secondary battery which has excellent cycle characteristics, initial coulombic efficiency and capacity retention rate. The present invention provides a nano silicon which has a specific surface area of 100 to 400 m2/g, while containing 5 to 45 atom% of oxygen atoms if the sum of oxygen atoms and silicon atoms is taken as 100 atom%. It is preferable that the nano silicon has a crystallite diameter of 5 to 14 nm. It is also preferable that the nano silicon has a volume average particle diameter of 10 to 200 nm. The present invention provides: an active material for secondary batteries, the active material comprising this nano silicon; and a secondary battery which contains the active material for secondary batteries in the negative electrode.

Description

奈米矽、奈米矽漿料、奈米矽之製造方法、二次電池用活性物質及二次電池Nanosilicon, nanosilicon slurry, nanosilicon manufacturing method, secondary battery active material and secondary battery

本發明係關於一種奈米矽、奈米矽漿料及上述奈米矽之製造方法。又,本發明係關於一種包含上述奈米矽之二次電池用活性物質、包含上述二次電池用活性物質之負極、及包含上述負極之二次電池。The present invention relates to a kind of nano-silicon, nano-silicon slurry and a manufacturing method of the above-mentioned nano-silicon. Furthermore, the present invention relates to a secondary battery active material containing the above-mentioned nanosilica, a negative electrode containing the above-mentioned secondary battery active material, and a secondary battery including the above-mentioned negative electrode.

非水電解質二次電池用於行動裝置、油電混合車或電動汽車、家用蓄電池等,需要均衡地具有電容、安全性、作動穩定性等多種特性。  進而,近年來,伴隨各種電子機器與通訊機器之小型化及油電混合車等之迅速普及,作為該等機器等之驅動電源,強烈需要開發一種容量更高,且循環特性或放電率特性等各種電池特性進一步提高之鋰離子二次電池。Non-aqueous electrolyte secondary batteries are used in mobile devices, hybrid and electric vehicles, household batteries, etc., and they need to have a balance of various characteristics such as capacitance, safety, and operational stability. Furthermore, in recent years, with the miniaturization of various electronic equipment and communication equipment and the rapid spread of gasoline-electric hybrid vehicles, there is a strong need to develop a power supply with higher capacity and better cycle characteristics or discharge rate characteristics as a driving power supply for these equipment. Lithium-ion secondary battery with further improved various battery characteristics.

由於矽之理論電容較大,故而正在研究使用矽作為負極活性物質以使鋰離子二次電池高容量化。然而,矽於反覆進行充放電時體積膨脹與收縮之差較大,在反覆進行充放電期間矽粒子會破裂。其結果為,使用矽作為負極活性物質之二次電池之循環特性較差。Since silicon has a large theoretical capacitance, research is underway to use silicon as a negative electrode active material to increase the capacity of lithium-ion secondary batteries. However, the difference between the volume expansion and contraction of silicon is large when repeated charging and discharging are performed, and the silicon particles will break during repeated charging and discharging. As a result, secondary batteries using silicon as the negative electrode active material have poor cycle characteristics.

於非專利文獻1中記載有在具有150 nm以下之粒徑之矽粒子中可抑制此種矽粒子之破裂。  又,於專利文獻1中記載有使用奈米級粒徑之矽粒子之二次電池用負極活性物質。  先前技術文獻  專利文獻Non-Patent Document 1 describes that cracking of silicon particles having a particle diameter of 150 nm or less can be suppressed. Furthermore, Patent Document 1 describes a negative electrode active material for secondary batteries using silicon particles with nanometer-sized particles. Prior art documents Patent documents

專利文獻1:日本特開2021-180124號公報  非專利文獻Patent document 1: Japanese Patent Application Publication No. 2021-180124 Non-patent document

非專利文獻:Xiao et al., ACS Nano, 6, 1522-1531(2012)Non-patent literature: Xiao et al., ACS Nano, 6, 1522-1531(2012)

[發明所欲解決之課題][Problem to be solved by the invention]

然而,即便是使用上述非專利文獻1或專利文獻1中記載之粒徑之矽粒子之二次電池用活性物質,當反覆進行充放電時,亦會發生粒子之破裂,導致循環特性不充分。又,於使用粒徑較小之矽粒子之二次電池用活性物質之情形時,電容及初始庫侖效率不充分。  因此,需要開發一種循環特性、電容及初始庫侖效率得到改良之使用矽粒子之鋰二次電池用活性物質。However, even if the secondary battery active material uses silicon particles with the particle size described in Non-Patent Document 1 or Patent Document 1, when charge and discharge are repeatedly performed, the particles may break, resulting in insufficient cycle characteristics. Furthermore, when an active material for secondary batteries using silicon particles with a small particle size is used, the capacitance and initial Coulomb efficiency are insufficient. Therefore, there is a need to develop an active material for lithium secondary batteries using silicon particles with improved cycle characteristics, capacitance, and initial Coulombic efficiency.

本發明人等在著眼於矽粒子之粒徑之同時著眼於矽粒子之表面氧化程度,研究出循環特性與電容及初始庫侖效率優異之二次電池用活性物質。其結果為,發現一種鋰二次電池之循環性、電容及初始庫侖效率優異之二次電池用活性物質。  即,本發明係關於一種用於鋰離子二次電池之二次電池用活性物質及包含上述二次電池用活性物質作為負極活性物質之二次電池,其目的在於提供一種矽粒子,該矽粒子用於提供循環性、初始庫侖效率及容量保持率優異之二次電池之二次電池用活性物質。  進而,本發明之目的在於提供一種用於上述二次電池用活性物質之矽粒子之製造方法。  [解決課題之技術手段]The inventors of the present invention paid attention to the particle size of the silicon particles and the degree of surface oxidation of the silicon particles, and developed an active material for secondary batteries that is excellent in cycle characteristics, capacitance, and initial Coulombic efficiency. As a result, an active material for secondary batteries that is excellent in cyclability, capacitance, and initial coulombic efficiency of lithium secondary batteries was discovered. That is, the present invention relates to a secondary battery active material used in a lithium ion secondary battery and a secondary battery including the above-mentioned secondary battery active material as a negative electrode active material, and its object is to provide silicon particles. Active material for secondary batteries used to provide secondary batteries with excellent cycleability, initial Coulombic efficiency, and capacity retention. Furthermore, an object of the present invention is to provide a method for manufacturing silicon particles used in the above-mentioned active material for secondary batteries. [Technical means to solve the problem]

本發明具有下述態樣。  [1]一種奈米矽,其比表面積為100至400 m 2/g,且氧原子相對於矽原子為5至45 atom%。  [2]如上述[1]中記載之奈米矽,其微晶直徑為5至14 nm。  [3]如上述[1]或[2]中記載之奈米矽,其體積平均粒徑為10至200 nm。 The present invention has the following aspects. [1] Nano-silicon with a specific surface area of 100 to 400 m 2 /g and an oxygen atom ratio of 5 to 45 atom% relative to the silicon atom. [2] Nano-silicon as described in [1] above has a crystallite diameter of 5 to 14 nm. [3] The silicon nanoparticles described in [1] or [2] above have a volume average particle size of 10 to 200 nm.

又,本發明具有下述態樣。  [4]一種奈米矽漿料,其包含上述[1]至[3]中任一項記載之奈米矽、分散劑及溶劑。Furthermore, the present invention has the following aspects. [4] A nanosilicon slurry, which contains the nanosilicon described in any one of the above [1] to [3], a dispersant and a solvent.

進而,本發明具有下述態樣。  [5]一種奈米矽之製造方法,其係於露點溫度為-60℃以下之氣體環境下,在溫度為60℃以下且水分濃度為10000 ppm以下之非水溶劑中對矽粉末進行濕式粉碎。  [6]如上述[5]中記載之奈米矽之製造方法,其於包含選自由陽離子性界面活性劑、陰離子性界面活性劑及兩性界面活性劑所組成之群中之至少1種界面活性劑之非水溶劑中進行上述濕式粉碎。  [7]如上述[5]或[6]中記載之奈米矽之製造方法,其於上述濕式粉碎中,在非水溶劑中對體積平均粒徑為1至20 μm且氧原子相對於矽原子為10 atom%以下之矽粉末進行濕式粉碎。  [8]如上述[5]至[7]中任一項記載之奈米矽之製造方法,其中,於上述濕式粉碎中,矽粉末之純度為99質量%以上。Furthermore, the present invention has the following aspects. [5] A method for manufacturing nano-silicon, which involves wet-processing silicon powder in a non-aqueous solvent with a temperature of 60°C or less and a moisture concentration of 10,000 ppm or less in a gas environment with a dew point temperature of -60°C or less. Crush. [6] The method for producing silicon nanoparticles as described in the above [5], which contains at least one kind of interface active agent selected from the group consisting of cationic surfactants, anionic surfactants, and amphoteric surfactants. The above-mentioned wet grinding is carried out in a non-aqueous solvent. [7] The method for producing silicon nanoparticles as described in the above [5] or [6], wherein in the wet grinding, the volume average particle diameter is 1 to 20 μm in a non-aqueous solvent and the oxygen atoms are Silicon powder with a silicon atom content of less than 10 atom% is wet-pulverized. [8] The manufacturing method of silicon nanoparticles as described in any one of [5] to [7] above, wherein the purity of the silicon powder in the above-mentioned wet grinding is 99 mass% or more.

並且,本發明具有下述態樣。  [9]一種二次電池用活性物質之製造方法,其係將藉由上述[5]至[8]中任一項記載之奈米矽之製造方法獲得之奈米矽與樹脂混合,乾燥後於非活性氣體環境下進行焙燒。  [10]一種二次電池用活性物質,其含有上述[1]至[3]中任一項記載之奈米矽。  [11]一種二次電池用負極,其包含上述[10]中記載之二次電池用活性物質。  [12]一種二次電池,其包含上述[11]中記載之二次電池用負極。  [發明之效果]Furthermore, the present invention has the following aspects. [9] A method for manufacturing an active material for secondary batteries, which involves mixing nanosilicon obtained by the method for manufacturing nanosilicon according to any one of the above [5] to [8] and resin, and drying Calcined in an inert gas environment. [10] An active material for secondary batteries containing the silicon nanoparticles described in any one of the above [1] to [3]. [11] A negative electrode for secondary batteries, which contains the active material for secondary batteries described in [10] above. [12] A secondary battery including the negative electrode for secondary batteries described in [11] above. [The effect of the invention]

根據本發明,係關於一種用於鋰離子二次電池之二次電池用活性物質及包含上述二次電池用活性物質作為負極活性物質之二次電池,提供一種可提供循環性、初始庫侖效率及容量保持率優異之二次電池之二次電池用活性物質。  進而,本發明提供一種用於上述二次電池用活性物質之矽粒子之製造方法。According to the present invention, a secondary battery active material for a lithium ion secondary battery and a secondary battery including the above-mentioned secondary battery active material as a negative electrode active material are provided. Active material for secondary batteries with excellent capacity retention rate. Furthermore, the present invention provides a method for manufacturing silicon particles used in the above-mentioned active material for secondary batteries.

本發明之奈米矽(以下,亦記為「本奈米矽」)之比表面積為100至400 m 2/g,且氧原子相對於矽原子為5至45 atom%。此處,「氧原子相對於矽原子為5至45 atom%」之含義為本奈米矽中氧原子數除以矽原子數所得之值以atom%表示時之值為5至45,以下亦同樣如此。  如上所述,認為粒徑較小之矽粒子即便因反覆充放電而導致體積變化,亦可抑制矽粒子之破裂。另一方面,認為粒徑較小之矽粒子之表面積變大,矽粒子之表面氧化率變大。認為其結果為,含有粒徑較小之矽粒子之二次電池用活性物質雖抑制了因反覆充放電所導致之循環特性下降,但電容及初始庫侖效率較差。 The specific surface area of the nanosilicon of the present invention (hereinafter also referred to as "this nanosilicon") is 100 to 400 m 2 /g, and the oxygen atoms are 5 to 45 atom% relative to the silicon atoms. Here, "oxygen atoms are 5 to 45 atom% relative to silicon atoms" means that the number of oxygen atoms in this nanosilicon divided by the number of silicon atoms is 5 to 45 when expressed in atom%, and the following is also Same thing. As mentioned above, it is considered that silicon particles with a smaller particle size can suppress breakage of the silicon particles even if the volume changes due to repeated charging and discharging. On the other hand, it is considered that the surface area of silicon particles with a smaller particle size becomes larger and the surface oxidation rate of the silicon particles becomes larger. The result is considered to be that the secondary battery active material containing silicon particles with a small particle size suppresses deterioration in cycle characteristics due to repeated charge and discharge, but has poor capacitance and initial Coulomb efficiency.

本奈米矽係體積平均粒徑為奈米級之粒子,由於粒徑較小,故而循環特性得到改良。又,認為表面積與習知之矽粒子相當或更大,但氧原子之含有率被抑制得較低,故而實現了電容及初始庫侖效率之改良。The nano-silicon particles have a volume average particle size of nanometer level. Due to the smaller particle size, the cycle characteristics are improved. In addition, it is believed that the surface area is equivalent to or larger than that of conventional silicon particles, but the oxygen atom content rate is suppressed to a low level, thereby achieving improvements in capacitance and initial Coulomb efficiency.

體積平均粒徑為奈米級係指體積平均粒徑以奈米為單位,體積平均粒徑通常為1至999 nm。當矽粒子超過1000 nm時,有可能於製成矽漿料時分散性變差,攪拌時壓力上升,生產性下降。就該等觀點而言,本奈米矽之體積平均粒徑較佳為10至200 nm,更佳為10至100 nm,進而較佳為20至70 nm。  再者,體積平均粒徑係可使用雷射繞射式粒度分析計等進行測定之D50之值。D50可使用雷射粒度分析計等藉由動態光散射法進行測定。關於本奈米矽之體積平均粒徑,於粒徑分佈中自小徑側起描繪體積累積分佈曲線之情形時累積50%時之粒徑為上述平均粒徑。The volume average particle size is nanometer level means that the volume average particle size is in nanometers, and the volume average particle size is usually 1 to 999 nm. When the silicon particles exceed 1000 nm, the dispersibility may become poor when the silicon slurry is made, the pressure may increase during stirring, and the productivity may decrease. From these viewpoints, the volume average particle size of the silicon nanoparticles is preferably 10 to 200 nm, more preferably 10 to 100 nm, and further preferably 20 to 70 nm. Furthermore, the volume average particle size is the D50 value that can be measured using a laser diffraction particle size analyzer. D50 can be measured by dynamic light scattering using a laser particle size analyzer or the like. Regarding the volume average particle size of the present silicon nanoparticles, when a volume cumulative distribution curve is drawn from the small diameter side in the particle size distribution, the particle size at 50% accumulation is the above average particle size.

本奈米矽之比表面積為100至400 m 2/g。  上述比表面積係利用BET法求出之值,可藉由氮氣吸附測定來求出,例如可使用比表面積測定裝置進行測定。  就電容及初始庫侖效率之觀點而言,本奈米矽之比表面積更佳為100至300 m 2/g,進而較佳為100至230 m 2/g。 The specific surface area of this nanosilicon is 100 to 400 m 2 /g. The above-mentioned specific surface area is a value determined by the BET method, and can be determined by nitrogen adsorption measurement. For example, the specific surface area can be measured using a specific surface area measuring device. From the viewpoint of capacitance and initial Coulomb efficiency, the specific surface area of the silicon nanoparticles is preferably 100 to 300 m 2 /g, and further preferably 100 to 230 m 2 /g.

如上所述,本奈米矽中之氧原子量相對於矽原子為5至45 atm%。認為藉由將本奈米矽之平均粒徑小至上述範圍,但氧原子量處於上述範圍內之本奈米矽用於二次電池之負極活性物質,能夠獲得循環性、初始庫侖效率及容量保持率優異之二次電池。  就初始庫侖效率及容量保持率之觀點而言,本奈米矽中之氧原子量較佳為5至30 atm%,更佳為5至25 atm%,進而較佳為5至15%。關於氧原子量,於300~800℃之溫度下對奈米矽進行焙燒而使添加劑揮發後,藉由利用SEM-EDS(JEOL製造之JSM-7900F)進行之組成分析來獲取氧原子量。  本奈米矽除包含矽原子及氧原子以外,亦可包含碳原子、氮原子。於包含氮原子之情形時,就生成氮化矽而導致容量下降之觀點而言,較佳為5質量%以下。As mentioned above, the oxygen atomic weight in the present nano-silicon is 5 to 45 atm% relative to the silicon atoms. It is believed that by using the present nanosilicon with an average particle size as small as the above range and an oxygen atomic weight within the above range as the negative active material of a secondary battery, cyclability, initial Coulombic efficiency and capacity retention can be achieved Secondary battery with excellent efficiency. From the perspective of initial Coulombic efficiency and capacity retention, the oxygen atomic weight in the present nanosilicon is preferably 5 to 30 atm%, more preferably 5 to 25 atm%, and further preferably 5 to 15%. Regarding the oxygen atomic weight, after baking the silicon nanoparticles at a temperature of 300 to 800°C to volatilize the additives, the oxygen atomic weight was obtained by composition analysis using SEM-EDS (JSM-7900F manufactured by JEOL). In addition to silicon atoms and oxygen atoms, this nanosilicon can also contain carbon atoms and nitrogen atoms. When nitrogen atoms are included, from the viewpoint of generating silicon nitride and causing a decrease in capacity, the content is preferably 5 mass % or less.

本奈米矽之形狀可為粒狀、針狀、片狀中之任一種,只要本奈米矽滿足上述比表面積及氧原子量即可,較佳為結晶質。於本奈米矽為結晶質之情形時,就初始庫侖效率及容量保持率之觀點而言,較佳為自X射線繞射中歸屬於Si(111)之繞射峰獲得之微晶直徑(以下,亦記為「微晶直徑」)處於5至14 nm之範圍內。微晶直徑更佳為12 nm以下,進而較佳為10 nm以下。The shape of the silicon nanoparticles can be any of granular, needle-shaped, and flake-like, as long as the silicon nanoparticles satisfy the above specific surface area and oxygen atomic weight, preferably crystalline. In the case where the silicon nanoparticles are crystalline, from the viewpoint of initial Coulomb efficiency and capacity retention rate, it is preferable to be the crystallite diameter obtained from the diffraction peak attributed to Si (111) in X-ray diffraction ( Hereinafter, also referred to as "crystalline diameter") is in the range of 5 to 14 nm. The crystallite diameter is more preferably 12 nm or less, further preferably 10 nm or less.

就作為負極活性物質時之充放電性能之觀點而言,本奈米矽之長軸方向之長度較佳為30至300 nm,厚度較佳為1至60 nm。就作為負極活性物質時之充放電性能之觀點而言,較佳為厚度相對於長度之比即所謂縱橫比為0.5以下之針狀或片狀之形狀。  關於本奈米矽之形態,可藉由動態光散射法測定平均粒徑,但藉由使用穿透式電子顯微鏡(TEM)或場發射型掃描電子顯微鏡(FE-SEM)之解析手段,能夠更加容易且精密地鑑定出上述縱橫比之樣品。於含有本發明之二次電池用材料之負極活性物質之情形時,可利用聚焦離子束(FIB)切割樣品並對截面進行FE-SEM觀察,或者可對樣品進行切片加工並藉由TEM觀察來鑑定本奈米矽之狀態。  再者,上述本奈米矽之縱橫比係基於TEM圖像所示之視野內的樣品之主要部分之50個粒子計算出之結果。From the perspective of charge and discharge performance when used as a negative electrode active material, the length of the long axis direction of the silicon nanoparticles is preferably 30 to 300 nm, and the thickness is preferably 1 to 60 nm. From the viewpoint of charge and discharge performance when used as a negative electrode active material, a needle-like or sheet-like shape in which the ratio of thickness to length, that is, the so-called aspect ratio, is 0.5 or less is preferred. Regarding the morphology of this nanosilicon, the average particle size can be measured by dynamic light scattering, but it can be further determined by analysis using a transmission electron microscope (TEM) or a field emission scanning electron microscope (FE-SEM). Samples with the above aspect ratios can be identified easily and precisely. When the negative electrode active material of the secondary battery material of the present invention is included, the sample can be cut using a focused ion beam (FIB) and the cross section can be observed by FE-SEM, or the sample can be sliced and observed by TEM. Identify the status of this nanosilicon. Furthermore, the aspect ratio of the above-mentioned nano-silicon is calculated based on 50 particles in the main part of the sample within the field of view shown in the TEM image.

在將上述本奈米矽用於二次電池用活性物質之情形時,可直接使用本奈米矽作為活性物質,亦可用作基質相含有本奈米矽之二次電池用活性物質。  就二次電池用活性物質之穩定性之觀點而言,較佳為使用基質相含有本奈米矽之活性物質作為二次電池用活性物質。When the present nanosilica is used as an active material for a secondary battery, the present nanosilica can be directly used as the active material, or can be used as an active material for a secondary battery containing the present nanosilica in the matrix phase. From the viewpoint of the stability of the active material for secondary batteries, it is preferable to use an active material whose matrix phase contains the present nanosilica as the active material for secondary batteries.

於使用含有本奈米矽之活性物質作為二次電池用活性物質之情形時,上述基質相係可吸藏釋放鋰離子之物質。可吸藏釋放之物質係能夠於電池充電時將鋰離子吸藏於基質相內,放電時自基質相內釋放鋰離子之物質。於鋰二次電池中,反覆進行上述吸藏釋放之循環。  作為可吸藏釋放鋰離子之物質,可例舉:石墨、二氧化矽、氧化鈦、及包含矽、氧、碳之化合物,上述基質相較佳為由該等物質構成,就提高初次效率及容量保持率之觀點而言,更佳為由包含矽、氧、碳之化合物構成。  作為包含矽、氧、碳之化合物,可例舉碳氧化矽。When an active material containing the present nanosilica is used as an active material for a secondary battery, the above-mentioned matrix phase can absorb and release substances that release lithium ions. Substances that can absorb and release are substances that can store lithium ions in the matrix phase when the battery is charged and release lithium ions from the matrix phase when the battery is discharged. In lithium secondary batteries, the above cycle of storage and release is repeated. Examples of substances that can absorb and release lithium ions include graphite, silicon dioxide, titanium oxide, and compounds containing silicon, oxygen, and carbon. The above-mentioned matrix phase is preferably composed of these substances to improve the primary efficiency and From the viewpoint of capacity retention, it is more preferably composed of a compound containing silicon, oxygen, and carbon. As a compound containing silicon, oxygen, and carbon, silicon oxycarbonate can be exemplified.

碳氧化矽係由包含矽、氧、碳之化合物構成,其中,較佳為包含矽-氧-碳骨架之三維網狀結構及游離碳之結構。此處,游離碳係不包含於矽-氧-碳之三維骨架中之碳。游離碳包括以碳相之形式存在之碳、鍵結於碳相之碳間之碳、以及與矽-氧-碳骨架及碳相鍵結之碳。Silicon oxycarbide is composed of a compound containing silicon, oxygen, and carbon. Among them, a structure containing a three-dimensional network structure of silicon-oxygen-carbon skeleton and free carbon is preferred. Here, free carbon is carbon not included in the three-dimensional skeleton of silicon-oxygen-carbon. Free carbon includes carbon existing in the form of a carbon phase, carbon bonded between carbons in the carbon phase, and carbon bonded to the silicon-oxygen-carbon skeleton and the carbon phase.

碳氧化矽較佳為由下述式(1)表示。  SiOxCy             (1)  式(1)中,x表示氧相對於矽之莫耳比,y表示碳相對於矽之莫耳比。  於將包含本奈米矽及基質相之活性物質用於二次電池之情形時,就充放電性能與容量保持率之平衡優異之觀點而言,較佳為1≦x<2,更佳為1≦x≦1.9,進而較佳為1≦x≦1.8。  又,於將包含本奈米矽及基質相之活性物質用於二次電池之情形時,就充放電性能與初次庫侖效率之平衡之觀點而言,較佳為1≦y≦20,更佳為1.2≦y≦15。Silicon oxycarbide is preferably represented by the following formula (1). SiOxCy (1) In formula (1), x represents the molar ratio of oxygen relative to silicon, and y represents the molar ratio of carbon relative to silicon. When an active material containing the present nanosilica and a matrix phase is used in a secondary battery, from the viewpoint of excellent balance between charge and discharge performance and capacity retention rate, 1≦x<2 is preferred, and 1≦x<2 is more preferred. 1≦x≦1.9, and more preferably 1≦x≦1.8. In addition, when the active material containing the present nanosilica and the matrix phase is used in a secondary battery, from the viewpoint of the balance between charge and discharge performance and primary Coulomb efficiency, 1≦y≦20 is preferred, and more preferred is 1.2≦y≦15.

上述x及y可藉由測定各個元素之質量含量後換算成莫耳比(原子數比)來求出。此時,氧及碳可藉由使用無機元素分析裝置對其含量進行定量,矽之含量可藉由使用ICP發光分析裝置(ICP-OES)進行定量。  再者,上述x及y之測定較佳為藉由上述記載方法實施,但亦可進行活性物質之局部分析,獲取大量的由此得到之含有比資料之測定筆數,類推出活性物質整體之含有比。作為局部分析,例如可例舉能量色散X射線光譜法(SEM-EDX)或電子探針微量分析法(EPMA)。The above x and y can be found by measuring the mass content of each element and converting it into molar ratio (atomic number ratio). At this time, the content of oxygen and carbon can be quantified by using an inorganic element analysis device, and the content of silicon can be quantified by using an ICP luminescence analysis device (ICP-OES). Furthermore, the measurement of the above-mentioned x and y is preferably carried out by the above-mentioned method, but it is also possible to perform partial analysis of the active material, obtain a large number of measurements of the content ratio data obtained thereby, and similarly deduce the overall active material. Contains ratio. Examples of local analysis include energy dispersive X-ray spectroscopy (SEM-EDX) or electron probe microanalysis (EPMA).

基質相係由碳氧化矽構成之碳氧化矽相,於包含矽-氧-碳骨架之三維網狀結構及游離碳之結構之情形時,碳氧化矽相中之矽-氧-碳骨架之化學穩定性較高,得到與游離碳之複合結構,對於鋰之吸藏與釋放體積變化較小。藉由將本奈米矽緊密地包裹於矽-氧-碳骨架與游離碳之複合結構體中,可進一步抑制本奈米矽對於鋰之吸藏與釋放之體積變化。其結果為,於將包含本奈米矽及基質相之活性物質作為負極活性物質之情形時,負極中之本奈米矽發揮了作為展現充放電性能之主要成分之作用,同時碳氧化矽相進一步抑制了充放電時伴隨本奈米矽之體積變化而發生之粒子破裂,鋰二次電池之循環性得到進一步改良。The matrix phase is a silicon oxycarbon phase composed of silicon oxycarbon. In the case of a three-dimensional network structure containing a silicon-oxygen-carbon skeleton and a structure of free carbon, the chemistry of the silicon-oxygen-carbon skeleton in the silicon oxycarbon phase It has high stability, obtains a composite structure with free carbon, and has small volume changes in the storage and release of lithium. By tightly wrapping the present nanosilicon in the composite structure of silicon-oxygen-carbon skeleton and free carbon, the volume change of the present nanosilicon in absorbing and releasing lithium can be further suppressed. As a result, when the active material containing the present nanosilica and the matrix phase is used as the negative electrode active material, the present nanosilica in the negative electrode plays a role as a main component that exhibits charge and discharge performance, and at the same time, the silicon oxycarbide phase The particle breakage caused by the volume change of the silicon nanoparticles during charging and discharging is further suppressed, and the cycleability of the lithium secondary battery is further improved.

又,若構成碳氧化矽相之化合物具有包含矽-氧-碳骨架之三維網狀結構及游離碳之結構,則矽-氧-碳骨架中,由於鋰離子之靠近,矽-氧-碳骨架之內部之電子分佈發生變動,於矽-氧-碳骨架與鋰離子之間形成靜電鍵或配位鍵等。藉由該靜電鍵或配位鍵使鋰離子儲存於矽-氧-碳骨架中。另一方面,由於配位鍵能量相對低,故而容易發生鋰離子之脫嵌反應。即,認為矽-氧-碳骨架於充放電時能夠可逆地引起鋰離子之嵌入及脫嵌反應。Furthermore, if the compound constituting the silicon carbon oxide phase has a three-dimensional network structure including a silicon-oxygen-carbon skeleton and free carbon, then in the silicon-oxygen-carbon skeleton, due to the proximity of lithium ions, the silicon-oxygen-carbon skeleton The internal electron distribution changes, forming electrostatic bonds or coordination bonds between the silicon-oxygen-carbon skeleton and lithium ions. Lithium ions are stored in the silicon-oxygen-carbon skeleton through this electrostatic bond or coordination bond. On the other hand, since the coordination bond energy is relatively low, the deintercalation reaction of lithium ions easily occurs. That is, it is believed that the silicon-oxygen-carbon skeleton can reversibly cause the intercalation and deintercalation reactions of lithium ions during charge and discharge.

上述碳氧化矽除包含矽、氧、碳以外,亦可包含氮。於下述包含本奈米矽及基質相之活性物質之製造方法中,可以原子團之形式將氮原子導入至碳氧化矽相中,上述原子團於分子內包含使用之原料中所含之氮原子作為官能基,所使用之原料例如為酚系樹脂或聚矽氧烷化合物、其他分散劑等氮化合物、及焙燒製程中使用之氮氣等。藉由碳氧化矽相包含氮,將包含本奈米矽及基質相之活性物質作為負極活性物質時充放電性能或容量保持率趨於優異。  於構成碳氧化矽相之化合物為包含矽、氧、碳及氮之化合物之情形時,碳氧化矽相較佳為含有由下述式(2)所表示之化合物。  SiOaCbNc         (2)  式(2)中,a及b之含義與上述相同,c表示氮相對於矽之莫耳比。  於碳氧化矽相包含由上述式(2)所表示之化合物之情形時,就將包含本奈米矽之活性物質用於二次電池時之充放電性能或容量保持率之觀點而言,較佳為1≦a≦2、1≦b≦20、0<c≦0.5,更佳為1≦a≦1.9、1.2≦b≦15、0<c≦0.4。The silicon oxycarbide may also contain nitrogen in addition to silicon, oxygen, and carbon. In the following method for manufacturing an active material including the present nanosilica and a matrix phase, nitrogen atoms can be introduced into the silicon oxycarbide phase in the form of atomic groups, and the above atomic groups include in the molecule the nitrogen atoms contained in the raw materials used as The raw materials used for functional groups include, for example, phenolic resins or polysiloxane compounds, nitrogen compounds such as other dispersants, and nitrogen used in the baking process. Since the silicon oxycarbide phase contains nitrogen, the charge-discharge performance or capacity retention rate tends to be excellent when the active material containing the nano-silicon and the matrix phase is used as the negative electrode active material. When the compound constituting the silicon oxycarb phase is a compound containing silicon, oxygen, carbon, and nitrogen, the silicon oxycarb phase preferably contains a compound represented by the following formula (2). SiOaCbNc (2) In formula (2), a and b have the same meaning as above, and c represents the molar ratio of nitrogen to silicon. In the case where the silicon oxycarbide phase contains the compound represented by the above formula (2), from the viewpoint of the charge-discharge performance or capacity retention rate when the active material containing nano-silicon is used in a secondary battery, it is better than Preferably, 1≦a≦2, 1≦b≦20, 0<c≦0.5, more preferably 1≦a≦1.9, 1.2≦b≦15, 0<c≦0.4.

上述a、b及c與上述x及y同樣地,可藉由測定元素之質量含量後換算成莫耳比(原子數比)來求出。  a、b及c之測定與上述x及y同樣地,較佳為藉由上述記載方法實施,但亦可進行本活性物質之局部分析,獲取大量的由此得到之含有比資料之測定筆數,類推出本活性物質整體之含有比。作為局部分析,例如可例舉能量色散X射線光譜法(SEM-EDX)或電子探針微量分析法(EPMA)。The above a, b and c can be obtained by measuring the mass content of the element and converting it into a molar ratio (atomic number ratio) in the same manner as the above x and y. The measurement of a, b and c is the same as the above-mentioned x and y. It is preferably carried out by the method described above. However, it is also possible to perform local analysis of the active substance and obtain a large number of measurements of the content ratio data obtained thereby. , the overall content ratio of the active material can be derived by analogy. Examples of local analysis include energy dispersive X-ray spectroscopy (SEM-EDX) or electron probe microanalysis (EPMA).

若包含本奈米矽及基質相之活性物質之平均粒徑過小,則隨著比表面積之大幅增加,製成將活性物質作為負極活性物質之二次電池時,當充放電時固相界面電解質分解物(以下,亦記為「SEI」)之生成量可能會增加,由此導致每單位體積之可逆充放電容量下降。若平均粒徑過大,則有製作電極膜時自集電體剝離之虞。  因此,於基質相含有本奈米矽之活性物質之情形時,其體積平均粒徑較佳為2 μm以上15 μm以下。基質相含有本奈米矽之活性物質之體積平均粒徑更佳為2.5 μm以上,尤佳為3.0 μm以上。又,活性物質之體積平均粒徑更佳為12 μm以下,尤佳為10 μm以下。體積平均粒徑為上述D50之值。If the average particle size of the active material containing the present nanosilica and the matrix phase is too small, as the specific surface area increases significantly, when a secondary battery using the active material as the negative active material is made, the solid-phase interface electrolyte will be charged and discharged during charging and discharging. The amount of decomposition products (hereinafter also referred to as "SEI") may increase, resulting in a decrease in the reversible charge and discharge capacity per unit volume. If the average particle diameter is too large, there is a risk of peeling off from the current collector when the electrode film is produced. Therefore, when the matrix phase contains the active material of nanosilica, its volume average particle size is preferably between 2 μm and 15 μm. The volume average particle size of the active material containing nanosilica in the matrix phase is preferably 2.5 μm or more, especially 3.0 μm or more. Furthermore, the volume average particle diameter of the active material is more preferably 12 μm or less, particularly preferably 10 μm or less. The volume average particle diameter is the value of D50 mentioned above.

基質相含有本奈米矽之活性物質之比表面積較佳為0.3 m 2/g以上10 m 2/g以下。基質相含有本奈米矽之活性物質之比表面積更佳為0.5 m 2/g以上,尤佳為1.0 m 2/g以上。又,活性物質之比表面積更佳為9.0 m 2/g以下,尤佳為8.0 m 2/g以下。若比表面積處於上述範圍內,則能夠適當地保持製作電極時溶劑之吸收量,亦能適當地保持用以維持黏結性之黏結劑之使用量。再者,上述比表面積係與上述同樣地利用BET法求出之值,可藉由氮氣吸附測定來求出,例如可使用比表面積測定裝置進行測定。 The specific surface area of the active material containing nanosilica in the matrix phase is preferably 0.3 m 2 /g or more and 10 m 2 /g or less. The specific surface area of the active material containing nanosilica in the matrix phase is preferably more than 0.5 m 2 /g, particularly preferably more than 1.0 m 2 /g. Furthermore, the specific surface area of the active material is more preferably 9.0 m 2 /g or less, even more preferably 8.0 m 2 /g or less. If the specific surface area is within the above range, the amount of solvent absorbed during electrode production can be appropriately maintained, and the amount of binder used to maintain adhesiveness can also be appropriately maintained. In addition, the above-mentioned specific surface area is a value obtained by the BET method in the same manner as above, and can be obtained by nitrogen adsorption measurement. For example, it can be measured using a specific surface area measuring device.

於基質相包含碳氧化矽之活性物質之情形時,碳氧化矽較佳為具有矽-氧-碳骨架結構及僅由碳元素構成之游離碳。於碳氧化矽具有游離碳之情形時,在活性物質之拉曼光譜中,觀測到歸屬於石墨長週期碳晶格結構之G帶之1590 cm -1、及歸屬於無序或有缺陷之石墨短週期碳晶格結構之D帶之1330 cm -1附近之散射峰。D帶之散射峰強度I(D帶)相對於G帶之散射峰強度I(G帶)之強度比I(G帶)/I(D帶)較佳為0.7以上2以下。上述散射峰強度比I(G帶)/I(D帶)更佳為0.7以上1.8以下。上述散射峰強度比I(G帶)/I(D帶)處於上述範圍內於基質中之游離碳中意味著以下內容。 When the matrix phase contains the active material of silicon oxycarb, the silicon oxycarb is preferably free carbon with a silicon-oxygen-carbon skeleton structure and composed only of carbon elements. When silicon oxycarbide contains free carbon, in the Raman spectrum of the active material, a G band of 1590 cm -1 belonging to the long period carbon lattice structure of graphite and disordered or defective graphite are observed The scattering peak near 1330 cm -1 of the D band of the short-period carbon lattice structure. The intensity ratio I (G band)/I (D band) of the scattering peak intensity I (D band) of the D band relative to the scattering peak intensity I (G band) of the G band is preferably 0.7 or more and 2 or less. The above-mentioned scattering peak intensity ratio I (G band)/I (D band) is more preferably 0.7 or more and 1.8 or less. The fact that the above scattering peak intensity ratio I (G band)/I (D band) is within the above range means the following for free carbon in the matrix.

游離碳中之一部分碳原子與矽-氧-碳骨架中之一部分矽原子鍵結。該游離碳係對充放電特性產生影響之重要成分。游離碳主要形成於由SiO 2C 2、SiO 3C及SiO 4構成之矽-氧-碳骨架中,與矽-氧-碳骨架中之一部分矽原子鍵結,故而矽-氧-碳骨架內部、及表面之矽原子與游離碳間更容易發生電子轉移。因此認為,將基質相含有本奈米矽之活性物質作為負極活性物質而用於二次電池時,充放電時之鋰離子之嵌入及脫嵌反應快速進行,充放電特性提高。又,認為鋰離子之嵌入及脫嵌反應可能導致活性物質膨脹及收縮,但藉由游離碳存在於其附近,而使活性物質整體之膨脹及收縮得到緩和,有大幅提高容量保持率之效果。 Some of the carbon atoms in the free carbon are bonded to some of the silicon atoms in the silicon-oxygen-carbon skeleton. This free carbon is an important component that affects charge and discharge characteristics. Free carbon is mainly formed in the silicon-oxygen-carbon skeleton composed of SiO 2 C 2 , SiO 3 C and SiO 4 , and is bonded with part of the silicon atoms in the silicon-oxygen-carbon skeleton, so inside the silicon-oxygen-carbon skeleton , and electron transfer is more likely to occur between silicon atoms and free carbon on the surface. Therefore, it is believed that when an active material containing nanosilica in the matrix phase is used as a negative electrode active material in a secondary battery, the intercalation and deintercalation reaction of lithium ions during charge and discharge proceeds rapidly, and the charge and discharge characteristics are improved. In addition, it is believed that the intercalation and deintercalation reactions of lithium ions may cause expansion and contraction of the active material, but the presence of free carbon in its vicinity alleviates the expansion and contraction of the entire active material, which has the effect of greatly improving the capacity retention rate.

游離碳係於製造碳氧化矽相時伴隨含矽化合物及碳源樹脂於非活性氣體環境中之熱分解而形成。具體而言,含矽化合物及碳源樹脂之分子結構中可碳化之部位於非活性環境中藉由高溫熱分解而成為碳成分,該等一部分碳與矽-氧-碳骨架之一部分鍵結。可碳化之成分較佳為烴,更佳為烷基類、伸烷基類、烯烴類、炔烴類、芳香族類,其中進而較佳為芳香族類。Free carbon is formed along with the thermal decomposition of silicon-containing compounds and carbon source resin in an inert gas environment during the production of silicon carbonate phase. Specifically, the carbonizable part in the molecular structure of the silicon-containing compound and the carbon source resin is thermally decomposed at high temperature in an inactive environment and becomes a carbon component. This part of the carbon is bonded to part of the silicon-oxygen-carbon skeleton. . The carbonizable component is preferably a hydrocarbon, more preferably an alkyl group, an alkylene group, an olefin group, an alkyne group, or an aromatic group, and among these, an aromatic group is even more preferable.

又,認為藉由存在游離碳,有望獲得活性物質之減小電阻之效果,於使用活性物質製成二次電池之負極之情形時,活性物質內部之反應均勻且順利地發生,獲得充放電性能與容量保持率之平衡優異之二次電池用活性物質。游離碳之導入可僅來源於含矽化合物,但藉由併用碳源樹脂,有望增加游離碳之存在量及效果。碳源樹脂之種類並無特別限定,較佳為包含碳之六元環之碳化合物。In addition, it is believed that the presence of free carbon can lead to the resistance-reducing effect of the active material. When the active material is used to form the negative electrode of a secondary battery, the reaction inside the active material occurs uniformly and smoothly, thereby achieving charge and discharge performance. Active material for secondary batteries with excellent balance between capacity retention and capacity retention. The introduction of free carbon can only come from silicon-containing compounds, but by using a carbon source resin together, it is expected to increase the amount and effect of free carbon. The type of carbon source resin is not particularly limited, but a carbon compound containing a six-membered ring of carbon is preferred.

上述游離碳之存在狀態除了利用拉曼光譜以外,亦可利用熱重量示差熱分析裝置(TG-DTA)進行鑑定。與矽-氧-碳骨架中之碳原子不同,游離碳於大氣中易發生熱分解,可根據在空氣存在下測得之熱重量減少量求出碳之存在量。即,碳量可藉由使用TG-DTA進行定量。  又,根據熱重量減少行為,亦容易掌握分解反應起始溫度、分解反應結束溫度、熱分解反應物種之數量、各熱分解反應物種中之最大重量減少量之溫度等熱分解溫度行為之變化。可使用該等行為之溫度值判斷碳之狀態。另一方面,認為矽-氧-碳骨架中之碳原子,即與構成上述SiO 2C 2、SiO 3C及SiO 4之矽原子鍵結之碳原子由於具有極強之化學鍵,故而熱穩定性較高,於熱分析裝置測定之溫度範圍內不會在大氣中發生熱分解。又,活性物質之碳氧化矽相中之碳由於具有與非晶碳類似之特性,故而於大氣中在約550℃至900℃之溫度範圍內會發生熱分解。其結果為,重量急遽減少。TG-DTA之測定條件之最高溫度並無特別限定,但為使碳之熱分解反應完全結束,較佳為於大氣中,約25℃至約1000℃以上之條件下進行TG-DTA測定。 In addition to using Raman spectroscopy, the existence state of the above-mentioned free carbon can also be identified using a thermogravimetric differential thermal analysis device (TG-DTA). Unlike the carbon atoms in the silicon-oxygen-carbon skeleton, free carbon is prone to thermal decomposition in the atmosphere. The amount of carbon present can be determined based on the thermal weight reduction measured in the presence of air. That is, the carbon amount can be quantified by using TG-DTA. In addition, based on the thermal weight reduction behavior, it is easy to grasp changes in thermal decomposition temperature behavior such as the decomposition reaction starting temperature, the decomposition reaction end temperature, the number of thermal decomposition reaction species, and the temperature of the maximum weight loss among each thermal decomposition reaction species. The temperature values of these behaviors can be used to determine the state of the carbon. On the other hand, it is believed that the carbon atoms in the silicon-oxygen-carbon skeleton, that is, the carbon atoms bonded to the silicon atoms constituting the above-mentioned SiO 2 C 2 , SiO 3 C and SiO 4 , have extremely strong chemical bonds, so they are thermally stable. It is relatively high and will not thermally decompose in the atmosphere within the temperature range measured by the thermal analysis device. In addition, since the carbon in the carbon oxide silicon phase of the active material has characteristics similar to amorphous carbon, it will thermally decompose in the atmosphere in the temperature range of about 550°C to 900°C. As a result, weight is drastically reduced. The maximum temperature of the TG-DTA measurement conditions is not particularly limited. However, in order to completely complete the thermal decomposition reaction of carbon, it is better to conduct the TG-DTA measurement in the atmosphere at a temperature of about 25°C to about 1000°C or above.

又,上述活性物質亦可由被覆材被覆表面。作為被覆材,較佳為有望獲得電子導電性、鋰離子導電性、抑制電解液分解之效果之物質。  作為上述被覆材,可例舉碳、鈦、鎳等電子導電性物質。其中,就改善負極活性物質之化學穩定性或熱穩定性之觀點而言,較佳為碳,更佳為低結晶性碳。In addition, the surface of the above-mentioned active material may be coated with a coating material. As the coating material, a material that is expected to achieve electronic conductivity, lithium ion conductivity, and the effect of suppressing the decomposition of the electrolyte solution is preferred. Examples of the above-mentioned coating materials include electronically conductive materials such as carbon, titanium, and nickel. Among them, from the viewpoint of improving the chemical stability or thermal stability of the negative electrode active material, carbon is preferred, and low crystallinity carbon is more preferred.

於被覆材為低結晶性碳之情形時,被覆層之平均厚度較佳為10 nm以上300 nm以下。又,將活性物質之總量設為100質量%時,低結晶性碳之含量較佳為1至30質量%。  於被覆材為碳之情形時,碳之被膜較佳為藉由氣相沈積法形成於活性物質表面。就改善活性物質之化學穩定性或熱穩定性之觀點而言,將活性物質之質量與碳之被膜之質量的合計量設為100質量%時,碳之被膜之量較佳為1質量%以上10質量%以下。  再者,所謂活性物質之質量,於活性物質僅由本奈米矽構成之情形時,係本奈米矽之質量,於活性物質由本奈米矽及基質相構成之情形時,係兩者之合計量。例如,於基質相由碳氧化矽構成之情形時,係本奈米矽與碳氧化矽之合計量。於碳氧化矽包含氮之情形時,係亦包含氮在內之合計量。於活性物質包含下述其他第三成分之情形時,係亦包含第三成分在內之合計量。When the coating material is low crystalline carbon, the average thickness of the coating layer is preferably from 10 nm to 300 nm. Moreover, when the total amount of active materials is 100 mass %, the content of low crystalline carbon is preferably 1 to 30 mass %. When the coating material is carbon, the carbon coating is preferably formed on the surface of the active material by a vapor deposition method. From the viewpoint of improving the chemical stability or thermal stability of the active material, when the total amount of the mass of the active material and the mass of the carbon coating is 100 mass %, the amount of the carbon coating is preferably 1 mass % or more. 10% by mass or less. Furthermore, the so-called mass of the active material refers to the mass of the present nanosilicon when the active material is composed only of the present nanosilicon, and when the active material consists of the present nanosilicon and the matrix phase, it is the total of the two. quantity. For example, when the matrix phase is composed of silicon oxycarbide, it is the total amount of silicon nanoparticles and silicon oxycarbide. When the silicon oxycarbide contains nitrogen, the total amount also includes nitrogen. When the active material contains other third components described below, the total amount also includes the third component.

活性物質除了包含上述成分以外,亦可包含所需之其他第三成分。  作為第三成分,可例舉選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬之矽酸鹽化合物(以下,亦記為「金屬矽酸鹽化合物」)。  矽酸鹽化合物通常為包含如下陰離子之化合物,該陰離子具有以1個或多個矽原子為中心,由電負性之配位基將其包圍之結構,而金屬矽酸鹽化合物係選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬與包含上述陰離子之化合物的鹽。  作為包含上述陰離子之化合物,已知有原矽酸根離子(SiO 4 4-)、偏矽酸根離子(SiO 3 2-)、焦矽酸根離子(Si 2O 7 6-)、環狀矽酸根離子(Si 3O 9 6-或Si 6O 18 12-)等矽酸根離子。本矽酸鹽化合物較佳為偏矽酸根離子與選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬的鹽即矽酸鹽化合物。上述金屬中,較佳為Li或Mg。 In addition to the above-mentioned components, the active material may also contain other required third components. Examples of the third component include silicate compounds of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al (hereinafter also referred to as "metal silicate compounds") . Silicate compounds are usually compounds containing the following anions, which have a structure centered on one or more silicon atoms and surrounded by electronegative ligands, and the metal silicate compounds are selected from Li A salt of at least one metal from the group consisting of , K, Na, Ca, Mg and Al and a compound containing the above anion. As compounds containing the above-mentioned anions, orthosilicate ions (SiO 4 4- ), metasilicate ions (SiO 3 2- ), pyrosilicate ions (Si 2 O 7 6- ), and cyclic silicate ions are known. (Si 3 O 9 6- or Si 6 O 18 12- ) and other silicate ions. This silicate compound is preferably a silicate compound that is a salt of a metasilicate ion and at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al. Among the above metals, Li or Mg is preferred.

金屬矽酸鹽化合物具有選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬,亦可具有2種以上該等金屬。於具有2種以上金屬之情形時,可為一個矽酸根離子具有多種金屬,亦可為具有不同金屬之矽酸鹽化合物之混合物。又,金屬矽酸鹽化合物亦可具有其他金屬,只要具有選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬即可。  金屬矽酸鹽化合物較佳為矽酸鋰化合物或矽酸鎂化合物,更佳為偏矽酸鋰(Li 2SiO 3)或偏矽酸鎂(MgSiO 3),尤佳為偏矽酸鎂(MgSiO 3)。 The metal silicate compound contains at least one type of metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al, and may contain two or more types of these metals. When there are two or more metals, one silicate ion may contain multiple metals, or it may be a mixture of silicate compounds containing different metals. Moreover, the metal silicate compound may contain other metals, as long as it contains at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al. The metal silicate compound is preferably a lithium silicate compound or a magnesium silicate compound, more preferably lithium metasilicate (Li 2 SiO 3 ) or magnesium metasilicate (MgSiO 3 ), particularly preferably magnesium metasilicate (MgSiO 3 ).

本奈米矽之製造方法可例舉以下製造方法(以下,亦記為「本製造方法」),即,於露點溫度為-60℃以下之氣體環境下,在溫度為60℃以下且水分濃度為10000 ppm以下之非水溶劑中對矽粉末進行濕式粉碎。  露點溫度係冷卻氣體時發生冷凝之溫度,成為表示氣體中之濕度之指標。「露點溫度為-60℃以下之氣體環境下」係冷卻至-60℃時開始發生冷凝之氣體環境,表示氣體中之水分量較低之狀態。若露點溫度超過-60℃,則濕式粉碎過程中大量水分會混入溶劑中導致分散不良,矽粒子凝膠化使生產性下降。Examples of the manufacturing method of this nanosilicon include the following manufacturing method (hereinafter also referred to as "this manufacturing method"), that is, in a gas environment with a dew point temperature of -60°C or lower, at a temperature of 60°C or lower and a moisture concentration The silicon powder is wet-pulverized in a non-aqueous solvent with a concentration of less than 10,000 ppm. The dew point temperature is the temperature at which condensation occurs when cooling a gas, and becomes an indicator of the humidity in the gas. "In a gas environment with a dew point temperature of -60°C or lower" is a gas environment in which condensation begins to occur when cooled to -60°C, indicating a state in which the moisture content in the gas is low. If the dew point temperature exceeds -60°C, a large amount of water will be mixed into the solvent during the wet grinding process, resulting in poor dispersion and gelation of the silicon particles, which will reduce productivity.

至於露點溫度之算出,例如可使用JIS Z 8806「濕度-測定方法」之飽和水蒸氣壓表等近似地算出。  氣體環境通常為非活性氣體環境,就操作之觀點而言,較佳為氮氣環境。於氮氣之情形時,露點溫度為-60℃以下意味著氮氣中之水分量為10.67 ppm。  本製造方法係於上述氣體環境下在溫度為60℃以下且水分濃度為10000 ppm以下之非水溶劑中對矽粉末進行濕式粉碎。就抑制溶劑蒸發及矽粒子凝膠化之觀點而言,溫度較佳為40℃以下。The dew point temperature can be calculated approximately using the saturated water vapor pressure table of JIS Z 8806 "Humidity - Measurement Method". The gas environment is usually an inert gas environment, and from an operational point of view, a nitrogen environment is preferred. In the case of nitrogen, a dew point temperature below -60°C means that the moisture content in the nitrogen is 10.67 ppm. This manufacturing method involves wet grinding of silicon powder in a non-aqueous solvent with a temperature below 60°C and a moisture concentration below 10,000 ppm in the above gas environment. From the viewpoint of suppressing solvent evaporation and gelation of silicon particles, the temperature is preferably 40° C. or lower.

就抑制溶劑揮發及矽氧化之觀點而言,非水溶劑之溫度較佳為40℃以下。  作為非水溶劑,例如可例舉:酮類中之丙酮、甲基乙基酮、甲基異丁基酮、二異丁酮;醇類中之乙醇、甲醇、正丙醇、異丙醇;芳香族中之苯、甲苯、二甲苯等。  就矽氧化導致初次效率下降之觀點而言,非水溶劑之水分濃度較佳為10000 ppm以下,更佳為5000 ppm以下,進而較佳為1000 ppm以下,最佳為600 ppm以下。  非水溶劑之水分濃度例如可藉由以下等方法控制在上述範圍內,即,使用前向非水溶劑中添加脫水劑,經過一定時間後將脫水劑過濾分離;或者使用前對非水溶劑進行蒸餾;管理環境之露點。  非水溶劑中,矽粒子之濃度較佳為5至50質量%。From the viewpoint of suppressing solvent volatilization and silicon oxidation, the temperature of the non-aqueous solvent is preferably 40°C or lower. Examples of non-aqueous solvents include: acetone, methyl ethyl ketone, methyl isobutyl ketone, and diisobutyl ketone among ketones; ethanol, methanol, n-propanol, and isopropanol among alcohols; Aromatic benzene, toluene, xylene, etc. From the viewpoint of a decrease in initial efficiency caused by silicon oxidation, the moisture concentration of the non-aqueous solvent is preferably 10,000 ppm or less, more preferably 5,000 ppm or less, further preferably 1,000 ppm or less, and most preferably 600 ppm or less. The moisture concentration of the non-aqueous solvent can be controlled within the above range by, for example, the following methods: adding a dehydrating agent to the non-aqueous solvent before use, and filtering and separating the dehydrating agent after a certain period of time; or performing a dehydration treatment on the non-aqueous solvent before use. Distillation; managing the dew point of the environment. In non-aqueous solvents, the concentration of silicon particles is preferably 5 to 50 mass%.

於上述溫度及水分濃度之非水溶劑中對矽粒子進行濕式粉碎。  所使用之矽粒子係由零價矽構成。若矽粒子之體積平均粒徑過小,則分散性可能會變差,導致生產性下降,因此,矽粒子之體積平均粒徑較佳為1 μm以上,更佳為3 μm以上。矽粒子之體積平均粒徑過大時,生產性亦可能會下降,因此,體積平均粒徑較佳為20 μm以下,較佳為10 μm以下,進而較佳為5 μm以下。體積平均粒徑與上述D50相同,測定方法亦與上述相同。  就減少所獲得之本奈米矽之氧原子量之觀點而言,所使用之矽粒子之氧原子相對於矽原子之原子較佳為10 atm%以下,更佳為5 atm%以下,進而較佳為2 atm%以下。The silicon particles are wet-pulverized in a non-aqueous solvent at the above-mentioned temperature and moisture concentration. The silicon particles used are composed of zero-valent silicon. If the volume average particle diameter of the silicon particles is too small, the dispersibility may become poor, resulting in decreased productivity. Therefore, the volume average particle diameter of the silicon particles is preferably 1 μm or more, and more preferably 3 μm or more. When the volume average particle diameter of the silicon particles is too large, productivity may also decrease. Therefore, the volume average particle diameter is preferably 20 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. The volume average particle diameter is the same as the above-mentioned D50, and the measurement method is also the same as the above-mentioned. From the viewpoint of reducing the oxygen atomic weight of the obtained nano-silicon, the oxygen atoms of the silicon particles used relative to the silicon atoms are preferably 10 atm% or less, more preferably 5 atm% or less, and still more preferably is less than 2 atm%.

於所使用之矽粒子之純度未達99質量%之情形時,將本奈米矽作為負極活性物質時金屬易溶出,可能難以作為電池來處理。因此,所使用之矽粒子之純度較佳為99質量%以上,更佳為99.9質量%,進而較佳為99.99質量%。When the purity of the silicon particles used does not reach 99% by mass, the metal is easily eluted when the present nanosilica is used as the negative electrode active material, and it may be difficult to handle as a battery. Therefore, the purity of the silicon particles used is preferably 99 mass% or more, more preferably 99.9 mass%, and still more preferably 99.99 mass%.

作為用於濕式粉碎之粉碎機,可例示:球磨機、珠磨機、噴射磨機等粉碎機。  藉由控制以下等粉碎條件進行分級等來獲得具有奈米級平均粒徑之上述本奈米矽,即,上述粉碎機之珠粒粒徑為0.5 mm以下,珠粒填充率為50至95 vоl%,轉子之周速為2至14 m/s或粉碎時間為0.5至24 h。珠粒粒徑較佳為0.2 mm以下。珠磨機之轉子之周速較佳為4至12 m/s,更佳為6至12 m/s。Examples of grinders used for wet grinding include grinders such as ball mills, bead mills, and jet mills. The above-mentioned nanosilica with a nanoscale average particle size is obtained by controlling the following crushing conditions for classification, that is, the bead size of the above-mentioned crusher is 0.5 mm or less, and the bead filling rate is 50 to 95 vоl %, the peripheral speed of the rotor is 2 to 14 m/s or the crushing time is 0.5 to 24 h. The preferred particle size of beads is 0.2 mm or less. The peripheral speed of the rotor of the bead mill is preferably 4 to 12 m/s, more preferably 6 to 12 m/s.

於上述濕式粉碎中,亦可添加分散劑以促進矽粒子之粉碎。分散劑之種類可例舉水系或非水系分散劑,較佳為非水系分散劑。非水系分散劑之種類可例示:聚醚系、醇系、聚伸烷基多胺系、聚羧酸部分烷基酯系等高分子型、多元醇酯系、烷基多胺系等低分子型、聚磷酸鹽系等無機型。  於添加上述分散劑之情形時,相對於矽粒子之質量較佳為5質量%至60質量%之範圍,更佳為5質量%至30質量%。In the above-mentioned wet grinding, a dispersant can also be added to promote the grinding of silicon particles. Types of dispersants include aqueous or non-aqueous dispersants, and non-aqueous dispersants are preferred. Examples of types of non-aqueous dispersants include polymer types such as polyether type, alcohol type, polyalkylene polyamine type, polycarboxylic acid partial alkyl ester type, etc., and low molecular weight types such as polyol ester type, alkyl polyamine type, etc. type, polyphosphate series and other inorganic types. When the above-mentioned dispersant is added, the mass of the silicon particles is preferably in the range of 5 mass % to 60 mass %, and more preferably 5 mass % to 30 mass %.

進而,於上述濕式粉碎中,亦可添加選自由陽離子性界面活性劑、陰離子性界面活性劑及兩性界面活性劑所組成之群中之至少1種界面活性劑,以提高所使用之矽粒子之分散性,促進矽粒子之粉碎。  作為陽離子性界面活性劑,可例舉:脂肪族胺鹽、脂肪族四級銨鹽、芳香族四級銨鹽及雜環四級銨鹽。陽離子性界面活性劑之胺值例如為1至100 mgKOH/g,較佳為5至80 mgKOH/g,更佳為10至48 mgKOH/g,尤佳為35至48 mgKOH/g。若胺值處於上述範圍內,則藉由粉碎而奈米化之矽粒子彼此之再凝集得到抑制,能夠抑制漿料之增黏,其結果為,電池之循環特性、充放電容量、初始庫侖效率優異。作為陽離子性界面活性劑,具體而言,可使用DISPERBYK9077(BYK Additives&Instruments製造,DISPERBYK為註冊商標)。Furthermore, in the above-mentioned wet grinding, at least one surfactant selected from the group consisting of cationic surfactants, anionic surfactants and amphoteric surfactants can also be added to improve the silicon particles used. The dispersibility promotes the crushing of silicon particles. Examples of cationic surfactants include aliphatic amine salts, aliphatic quaternary ammonium salts, aromatic quaternary ammonium salts and heterocyclic quaternary ammonium salts. The amine value of the cationic surfactant is, for example, 1 to 100 mgKOH/g, preferably 5 to 80 mgKOH/g, more preferably 10 to 48 mgKOH/g, especially 35 to 48 mgKOH/g. If the amine value is within the above range, the re-aggregation of the pulverized and nanonized silicon particles is suppressed, and the thickening of the slurry can be suppressed. As a result, the cycle characteristics, charge and discharge capacity, and initial Coulomb efficiency of the battery can be improved. Excellent. As the cationic surfactant, specifically, DISPERBYK9077 (manufactured by BYK Additives & Instruments, DISPERBYK is a registered trademark) can be used.

作為陰離子性界面活性劑,可例舉:羧酸鹽、磺酸鹽、硫酸酯鹽及磷酸酯鹽。陰離子性界面活性劑之酸值例如為1至200 mgKOH/g,較佳為10至180 mgKOH/g,更佳為50至150 mgKOH/g。若酸值處於上述範圍內,則矽粒子於分散介質中之潤濕性提高,故而能夠抑制漿料之增黏,其結果為,電池之循環特性、充放電容量、初始庫侖效率優異。作為陰離子性界面活性劑,具體而言,可使用DISPERBYK111(BYK Additives&Instruments製造)。Examples of the anionic surfactant include carboxylates, sulfonates, sulfate ester salts, and phosphate ester salts. The acid value of the anionic surfactant is, for example, 1 to 200 mgKOH/g, preferably 10 to 180 mgKOH/g, and more preferably 50 to 150 mgKOH/g. If the acid value is within the above range, the wettability of the silicon particles in the dispersion medium is improved, so the viscosity increase of the slurry can be suppressed. As a result, the battery has excellent cycle characteristics, charge and discharge capacity, and initial Coulombic efficiency. As the anionic surfactant, specifically, DISPERBYK111 (manufactured by BYK Additives & Instruments) can be used.

界面活性劑可為具有上述胺值及酸值之兩性界面活性劑,亦可併用具有上述胺值及酸值之陽離子性及陰離子性之界面活性劑。兩性界面活性劑係於鹼性範圍內表現出陰離子界面活性劑之性質,於酸性範圍內表現出陽離子界面活性劑之性質之界面活性劑,例如可例舉包括羧酸鹽、胺基酸及甜菜鹼之化合物。作為兩性界面活性劑,具體而言,可使用ANTI-TERRA(註冊商標)-U100(BYK Additives&Instruments製造)。  於添加上述界面活性劑之情形時,其添加量相對於矽粒子之質量較佳為5至60質量%,更佳為5至40質量%,進而較佳為5至20質量%。The surfactant may be an amphoteric surfactant having the above-described amine value and acid value, or a cationic and anionic surfactant having the above-described amine value and acid value may be used in combination. Amphoteric surfactants are surfactants that exhibit the properties of anionic surfactants in the alkaline range and exhibit the properties of cationic surfactants in the acidic range. Examples include carboxylates, amino acids, and beets. Alkaline compounds. As the amphoteric surfactant, specifically, ANTI-TERRA (registered trademark)-U100 (manufactured by BYK Additives & Instruments) can be used. When the above-mentioned surfactant is added, the addition amount is preferably 5 to 60 mass%, more preferably 5 to 40 mass%, and further preferably 5 to 20 mass% relative to the mass of the silicon particles.

於製作基質相含有本奈米矽之二次電池用活性物質(以下,亦記為「本活性物質」)之情形時,本活性物質例如可藉由將上述本奈米矽與樹脂混合,乾燥後於非活性氣體環境下進行焙燒來製造。  如上所述,基質相係由可吸藏釋放鋰離子之物質構成,故而與本奈米矽混合之樹脂只要是藉由焙燒而成為可吸藏釋放鋰離子之物質之樹脂即可。如上所述,作為可吸藏釋放鋰離子之物質,可例舉:石墨、二氧化矽、氧化鈦、及包含矽、氧、碳之化合物,因此,作為與本奈米矽混合之樹脂,可例舉聚矽氧烷系樹脂或碳源樹脂。When producing an active material for secondary batteries containing the present nanosilica in the matrix phase (hereinafter, also referred to as "the present active material"), the present active material can be, for example, mixed with the present nanosilica and resin, and dried. It is then produced by roasting in an inert gas environment. As mentioned above, the matrix phase is composed of a substance that can absorb and release lithium ions. Therefore, the resin mixed with the nano-silicon only needs to be a resin that can absorb and release lithium ions by roasting. As mentioned above, as a material that can absorb and release lithium ions, graphite, silicon dioxide, titanium oxide, and compounds containing silicon, oxygen, and carbon can be exemplified. Therefore, as a resin mixed with the present nanosilica, it can be Examples include polysiloxane-based resin and carbon source resin.

於將本奈米矽與樹脂混合之情形時,就將兩者混合均勻之觀點而言,較佳為製成使本奈米矽分散於溶劑中之奈米矽漿料來使用。  就分散性之觀點而言,奈米矽漿料較佳為包含上述本奈米矽、分散劑及溶劑之奈米矽漿料(以下,亦記為「本奈米矽漿料」)。  本奈米矽漿料所含之分散劑與上述相同,溶劑係水或與上述非水溶劑相同之非水溶劑。較佳之分散劑及非水溶劑亦與上述相同。又,本奈米矽漿料亦可含有界面活性劑。界面活性劑可例舉選自由與上述相同之陽離子界面活性劑、陰離子界面活性劑及兩性界面活性劑所組成之群中之至少一種。  本奈米矽漿料較佳為包含本奈米矽、分散劑及非水溶劑。  本奈米矽漿料更佳為於上述本製造方法中使用上述分散劑,不分離出所獲得之本奈米矽而使本奈米矽分散於上述非水溶劑中而成之漿料。此時,於包含上述非水溶劑及視需要而添加之分散劑之情形時,將分散劑與本奈米矽之合計量設為100質量%時,本奈米矽之量較佳為5質量%至40質量%之範圍,更佳為10質量%至30質量%。When mixing the present nanosilicon and resin, from the viewpoint of mixing the two uniformly, it is preferable to prepare a nanosilicon slurry in which the present nanosilicon is dispersed in a solvent. From the perspective of dispersibility, the silicon nanoslurry is preferably a silicon nanoslurry containing the above-mentioned nanosilicon, a dispersant and a solvent (hereinafter, also referred to as "the present nanosilicon slurry"). The dispersant contained in this nano silicon slurry is the same as above, and the solvent is water or the same non-aqueous solvent as the above-mentioned non-aqueous solvent. Preferred dispersants and non-aqueous solvents are also the same as above. In addition, the present nanosilica slurry may also contain a surfactant. Examples of the surfactant include at least one selected from the group consisting of the same cationic surfactants, anionic surfactants and amphoteric surfactants as described above. The present nanosilica slurry preferably contains the present nanosilica, a dispersant and a non-aqueous solvent. The present nanosilicon slurry is more preferably a slurry obtained by using the above-mentioned dispersant in the above-mentioned production method, and dispersing the present nanosilicon in the above-mentioned non-aqueous solvent without separating the obtained nanosilicon. At this time, when the above-mentioned non-aqueous solvent and a dispersant added as necessary are included, when the total amount of the dispersant and the present nanosilica is 100 mass %, the amount of the present nanosilica is preferably 5 mass % % to 40 mass%, more preferably 10 mass% to 30 mass%.

於本活性物質之基質相含有上述碳氧化矽之情形時,使用聚矽氧烷化合物與碳源樹脂之混合物作為樹脂為宜。於將聚矽氧烷化合物和碳源樹脂之混合物與本奈米矽混合之情形時,使用本奈米矽漿料為宜。  將本奈米矽漿料與聚矽氧烷化合物和碳源樹脂之混合物混合,去除溶劑而獲得前驅物,對所獲得之前驅物進行焙燒而獲得焙燒物,視需要進行粉碎,藉此獲得具有所期望之平均粒徑或比表面積之本活性物質。When the matrix phase of the present active material contains the above-mentioned silicon oxycarbide, it is appropriate to use a mixture of a polysiloxane compound and a carbon source resin as the resin. When the mixture of polysiloxane compound and carbon source resin is mixed with the present nanosilicon, it is appropriate to use the present nanosilicon slurry. Mix the present nanosilica slurry with a mixture of polysiloxane compound and carbon source resin, remove the solvent to obtain a precursor, roast the obtained precursor to obtain a roasted product, and pulverize it if necessary, thereby obtaining The desired average particle size or specific surface area of the active material.

作為上述聚矽氧烷化合物,可例舉包含聚碳矽烷結構、聚矽氮烷結構、聚矽烷結構及聚矽氧烷結構中之至少1個結構之樹脂。可為僅包含該等結構之樹脂,亦可為具有該等結構中之至少一個作為鏈段且與其他聚合物鏈段化學鍵結之複合型樹脂。複合化之形態有接枝共聚、嵌段共聚、無規共聚、交替共聚等。例如可例舉:具有聚矽氧烷鏈段化學鍵結於聚合物鏈段之側鏈之接枝結構之複合樹脂、具有聚矽氧烷鏈段化學鍵結於聚合物鏈段之末端之嵌段結構之複合樹脂等。Examples of the polysiloxane compound include a resin containing at least one of a polycarbosilane structure, a polysilazane structure, a polysilane structure, and a polysiloxane structure. It may be a resin containing only these structures, or it may be a composite resin having at least one of these structures as a segment and chemically bonded with other polymer segments. Composite forms include graft copolymerization, block copolymerization, random copolymerization, alternating copolymerization, etc. Examples include: a composite resin having a graft structure in which a polysiloxane segment is chemically bonded to the side chain of a polymer segment; a block structure having a polysiloxane segment chemically bonded to the end of a polymer segment; Composite resin, etc.

較佳為聚矽氧烷鏈段具有由下述通式(S-1)及/或下述通式(S-2)所表示之結構單元之聚矽氧烷化合物。其中,聚矽氧烷化合物更佳為於矽氧烷鍵(Si-O-Si)主骨架之側鏈或末端具有羧基、環氧基、胺基或聚醚基。A polysiloxane compound in which the polysiloxane segment has a structural unit represented by the following general formula (S-1) and/or the following general formula (S-2) is preferred. Among them, the polysiloxane compound preferably has a carboxyl group, an epoxy group, an amine group or a polyether group on the side chain or terminal of the main skeleton of the siloxane bond (Si-O-Si).

再者,上述通式(S-1)及(S-2)中,R 1表示可具有取代基之芳香族烴基或烷基、環氧基、羧基等。R 2及R 3分別表示烷基、環烷基、芳基或芳烷基、環氧基、羧基等。 In addition, in the above-mentioned general formulas (S-1) and (S-2), R 1 represents an aromatic hydrocarbon group or an alkyl group, an epoxy group, a carboxyl group, etc. which may have a substituent. R 2 and R 3 respectively represent an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, an epoxy group, a carboxyl group, etc.

作為烷基,例如可例舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、異戊基、新戊基、第三戊基、1-甲基丁基、2-甲基丁基、1,2-二甲基丙基、1-乙基丙基、己基、異己基、1-甲基戊基、2-甲基戊基、3-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、2,2-二甲基丁基、1-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-2-甲基丙基、1-乙基-1-甲基丙基等。作為上述環烷基,例如可例舉:環丙基、環丁基、環戊基、環己基等。Examples of the alkyl group include: methyl, ethyl, propyl, isopropyl, butyl, isobutyl, second butyl, third butyl, pentyl, isopentyl, neopentyl, Third pentyl, 1-methylbutyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2- Methylpentyl, 3-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1 ,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, 1-ethyl-1-methylpropyl, etc. Examples of the cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and the like.

作為芳基,例如可例舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基等。Examples of the aryl group include phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, and 3-isopropylphenyl. wait.

作為芳烷基,例如可例舉:苄基、二苯基甲基、萘基甲基等。Examples of the aralkyl group include benzyl group, diphenylmethyl, naphthylmethyl, and the like.

作為聚矽氧烷化合物所具有之除聚矽氧烷鏈段以外之聚合物鏈段,例如可例舉:丙烯酸聚合物、氟烯烴聚合物、乙烯酯聚合物、芳香族系乙烯聚合物、聚烯烴聚合物等之乙烯聚合物鏈段、或聚胺酯(polyurethane)聚合物鏈段、聚酯聚合物鏈段、聚醚聚合物鏈段等聚合物鏈段等。其中,較佳為乙烯聚合物鏈段。Examples of the polymer segment other than the polysiloxane segment that the polysiloxane compound has include acrylic polymers, fluoroolefin polymers, vinyl ester polymers, aromatic vinyl polymers, and polysiloxane polymers. Ethylene polymer segments such as olefin polymers, or polymer segments such as polyurethane polymer segments, polyester polymer segments, polyether polymer segments, etc. Among them, an ethylene polymer segment is preferred.

聚矽氧烷化合物可為聚矽氧烷鏈段與聚合物鏈段藉由下述結構式(S-3)所表示之結構鍵結而成之複合樹脂,亦可為立體網狀之聚矽氧烷結構。The polysiloxane compound can be a composite resin in which polysiloxane segments and polymer segments are bonded through a structure represented by the following structural formula (S-3), or it can be a three-dimensional network of polysiloxane. Oxane structure.

再者,式中,碳原子係構成聚合物鏈段之碳原子,2個矽原子係構成聚矽氧烷鏈段之矽原子。 Furthermore, in the formula, the carbon atom is the carbon atom constituting the polymer chain segment, and the two silicon atoms are the silicon atoms constituting the polysiloxane chain segment.

聚矽氧烷化合物所具有之聚矽氧烷鏈段亦可於聚矽氧烷鏈段中具有聚合性雙鍵等可藉由加熱而進行反應之官能基。藉由在熱分解前對聚矽氧烷化合物進行加熱處理,而進行交聯反應,成為固體狀,藉此能夠容易地進行熱分解處理。The polysiloxane segment of the polysiloxane compound may have functional groups that can react by heating, such as polymerizable double bonds, in the polysiloxane segment. By heat-treating the polysiloxane compound before thermal decomposition, a cross-linking reaction proceeds and the polysiloxane compound becomes a solid state, whereby the thermal decomposition treatment can be easily performed.

作為聚合性雙鍵,例如可例舉乙烯基或(甲基)丙烯醯基等。聚合性雙鍵較佳為於聚矽氧烷鏈段中存在2個以上,更佳為存在3至200個,進而較佳為存在3至50個。又,藉由使用存在2個以上聚合性雙鍵之複合樹脂作為聚矽氧烷化合物,能夠容易地進行交聯反應。Examples of polymerizable double bonds include vinyl groups, (meth)acrylyl groups, and the like. It is preferable that there are 2 or more polymerizable double bonds in the polysiloxane segment, more preferably 3 to 200 are present, and still more preferably 3 to 50 are present. Furthermore, by using a composite resin having two or more polymerizable double bonds as the polysiloxane compound, the crosslinking reaction can be easily performed.

聚矽氧烷鏈段亦可具有矽烷醇基及/或水解性矽基。作為水解性矽基中之水解性基,例如可例舉:鹵素原子、烷氧基、取代烷氧基、醯氧基、苯氧基、巰基、胺基、醯胺基、胺氧基、亞胺氧基、烯氧基等,藉由將該等基水解而使水解性矽基成為矽烷醇基。藉由與上述熱硬化反應並行地於矽烷醇基中之羥基或水解性矽基中之上述水解性基之間進行水解縮合反應,能夠獲得固體狀之聚矽氧烷化合物。The polysiloxane segment may also have a silanol group and/or a hydrolyzable silicon group. Examples of the hydrolyzable group in the hydrolyzable silicon group include: halogen atom, alkoxy group, substituted alkoxy group, acyloxy group, phenoxy group, mercapto group, amino group, amide group, amineoxy group, amide group, An amineoxy group, an alkenyloxy group, etc. can be converted into a silanol group by hydrolyzing these groups. A solid polysiloxane compound can be obtained by performing a hydrolysis condensation reaction between the hydroxyl group in the silanol group or the hydrolyzable group in the hydrolyzable silicon group in parallel with the thermal hardening reaction.

本發明所述之矽烷醇基係具有與矽原子直接鍵結之羥基之含矽基。本發明所述之水解性矽基係具有與矽原子直接鍵結之水解性基之含矽基,具體而言,例如可例舉由下述通式(S-4)所表示之基。The silanol group described in the present invention is a silicon-containing group having a hydroxyl group directly bonded to silicon atoms. The hydrolyzable silicon group according to the present invention is a silicon-containing group having a hydrolyzable group directly bonded to a silicon atom. Specific examples thereof include a group represented by the following general formula (S-4).

再者,式中,R 4係烷基、芳基或芳烷基等一價有機基,R 5係鹵素原子、烷氧基、醯氧基、烯丙氧基、巰基、胺基、醯胺基、胺氧基、亞胺氧基或烯氧基。又,b為0至2之整數。 Furthermore, in the formula, R 4 is a monovalent organic group such as an alkyl group, an aryl group or an aralkyl group, and R 5 is a halogen atom, an alkoxy group, an acyloxy group, an allyloxy group, a mercapto group, an amine group, or an amide group. group, amineoxy group, iminoxy group or alkenyloxy group. In addition, b is an integer from 0 to 2.

作為烷基,例如可例舉:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、異戊基、新戊基、第三戊基、1-甲基丁基、2-甲基丁基、1,2-二甲基丙基、1-乙基丙基、己基、異己基、1-甲基戊基、2-甲基戊基、3-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、2,2-二甲基丁基、1-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-2-甲基丙基、1-乙基-1-甲基丙基等。Examples of the alkyl group include: methyl, ethyl, propyl, isopropyl, butyl, isobutyl, second butyl, third butyl, pentyl, isopentyl, neopentyl, Third pentyl, 1-methylbutyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2- Methylpentyl, 3-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1 ,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, 1-ethyl-1-methylpropyl, etc.

作為芳基,例如可例舉:苯基、萘基、2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙烯基苯基、3-異丙基苯基等。Examples of the aryl group include phenyl, naphthyl, 2-methylphenyl, 3-methylphenyl, 4-methylphenyl, 4-vinylphenyl, and 3-isopropylphenyl. wait.

作為芳烷基,例如可例舉:苄基、二苯基甲基、萘基甲基等。Examples of the aralkyl group include benzyl group, diphenylmethyl, naphthylmethyl, and the like.

作為鹵素原子,例如可例舉:氟原子、氯原子、溴原子、碘原子等。Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, and the like.

作為烷氧基,例如可例舉:甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、第二丁氧基、第三丁氧基等。Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a second butoxy group, a third butoxy group, and the like.

作為醯氧基,例如可例舉:甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、特戊醯氧基、戊醯氧基、苯基乙醯氧基、乙醯乙醯氧基、苯甲醯氧基、萘甲醯氧基等。Examples of the acyloxy group include a formyloxy group, an acetyloxy group, a propionyloxy group, a butyloxy group, a pivalyloxy group, a pentyloxy group, a phenylethyloxy group, and an acetyloxy group. Acetyloxy, benzyloxy, naphthyloxy, etc.

作為烯丙氧基,例如可例舉:苯氧基、萘氧基等。Examples of the allyloxy group include phenoxy group, naphthyloxy group, and the like.

作為烯氧基,例如可例舉:乙烯氧基、烯丙氧基、1-丙烯氧基、異丙烯氧基、2-丁烯氧基、3-丁烯氧基、2-戊烯氧基、3-甲基-3-丁烯氧基、2-己烯氧基等。Examples of the alkenyloxy group include vinyloxy group, allyloxy group, 1-propenyloxy group, isopropenyloxy group, 2-butenyloxy group, 3-butenyloxy group, and 2-pentenyloxy group. , 3-methyl-3-butenyloxy, 2-hexenyloxy, etc.

作為具有由上述通式(S-1)及/或上述通式(S-2)所表示之結構單元之聚矽氧烷鏈段,例如可例舉具有以下結構者等。Examples of the polysiloxane segment having a structural unit represented by the general formula (S-1) and/or the general formula (S-2) include those having the following structures.

聚合物鏈段亦可於不損害本發明之效果之範圍內視需要具有各種官能基。作為該官能基,例如可使用羧基、被封端之羧基、羧酸酐基、三級胺基、羥基、被封端之羥基、環碳酸酯基、環氧基、羰基、一級醯胺基、二級醯胺基、胺甲酸酯基、由下述結構式(S-5)所表示之官能基等。The polymer segment may also have various functional groups as necessary within the scope that does not impair the effects of the present invention. As the functional group, for example, carboxyl group, blocked carboxyl group, carboxylic anhydride group, tertiary amine group, hydroxyl group, blocked hydroxyl group, cyclic carbonate group, epoxy group, carbonyl group, primary amide group, diamine group, amide group, urethane group, functional group represented by the following structural formula (S-5), etc.

又,上述聚合物鏈段亦可具有乙烯基、(甲基)丙烯醯基等聚合性雙鍵。Moreover, the said polymer segment may have polymerizable double bonds, such as a vinyl group and a (meth)acrylyl group.

上述聚矽氧烷化合物例如較佳為藉由下述(1)至(3)所示之方法進行製造。The polysiloxane compound is preferably produced by, for example, the methods shown in the following (1) to (3).

方法(1)預先製備含有矽烷醇基及/或水解性矽基之聚合物鏈段作為上述聚合物鏈段之原料,將該聚合物鏈段與同時具有矽烷醇基及/或水解性矽基和聚合性雙鍵之矽烷化合物混合,進行水解縮合反應。Method (1) Prepare in advance a polymer segment containing a silanol group and/or a hydrolyzable silicon group as the raw material for the above-mentioned polymer segment, and combine the polymer segment with a silanol group and/or a hydrolyzable silicon group. Mix with the polymerizable double bond silane compound to carry out hydrolysis and condensation reaction.

方法(2)預先製備含有矽烷醇基及/或水解性矽基之聚合物鏈段作為上述聚合物鏈段之原料。又,使同時具有矽烷醇基及/或水解性矽基和聚合性雙鍵之矽烷化合物進行水解縮合反應,從而亦預先製備聚矽氧烷。然後,將聚合物鏈段與聚矽氧烷混合進行水解縮合反應。Method (2) Prepare in advance a polymer segment containing a silanol group and/or a hydrolyzable silicon group as the raw material of the above polymer segment. Furthermore, polysiloxane is also prepared in advance by subjecting a silane compound having both a silanol group and/or a hydrolyzable silicon group and a polymerizable double bond to a hydrolysis condensation reaction. Then, the polymer segments are mixed with polysiloxane for hydrolysis and condensation reaction.

方法(3)將上述聚合物鏈段、同時具有矽烷醇基及/或水解性矽基和聚合性雙鍵之矽烷化合物、及聚矽氧烷混合,進行水解縮合反應。  藉由上述方法獲得聚矽氧烷化合物。  作為聚矽氧烷化合物,例如可例舉:Ceranate(註冊商標)系列(有機-無機混合型塗料樹脂;DIC股份有限公司製造)或Compoceran SQ系列(倍半矽氧烷型混合物;荒川化學工業股份有限公司製造)。Method (3) Mix the above-mentioned polymer segment, a silane compound having both a silanol group and/or a hydrolyzable silicon group and a polymerizable double bond, and polysiloxane to perform a hydrolysis condensation reaction. Polysiloxane compounds are obtained by the above method. Examples of the polysiloxane compound include Ceranate (registered trademark) series (organic-inorganic hybrid coating resin; manufactured by DIC Co., Ltd.) or Compoceran SQ series (sesquioxane type mixture; Arakawa Chemical Industry Co., Ltd. Ltd.).

上述碳源樹脂較佳為與聚矽氧烷化合物之溶混性良好,又,於非活性環境中藉由高溫焙燒而碳化,且具有芳香族官能基之合成樹脂或天然化學原料。The above-mentioned carbon source resin is preferably a synthetic resin or a natural chemical raw material that has good miscibility with the polysiloxane compound, is carbonized by high-temperature baking in an inactive environment, and has an aromatic functional group.

作為合成樹脂,可例舉:聚乙烯醇、聚丙烯酸等熱塑性樹脂、酚系樹脂、呋喃樹脂等熱固性樹脂。作為天然化學原料,可例舉重油,尤其是作為焦油瀝青類,可例舉:煤焦油、焦油輕油、焦油中油、焦油重油、萘油、蒽油、煤焦油瀝青、瀝青油、中間相瀝青、氧交聯石油瀝青、重油等,就低價獲得或去除雜質之觀點而言,使用酚系樹脂更佳。Examples of synthetic resins include thermoplastic resins such as polyvinyl alcohol and polyacrylic acid, and thermosetting resins such as phenolic resins and furan resins. Examples of natural chemical raw materials include heavy oils, and particularly examples of tar pitch include coal tar, tar light oil, tar medium oil, tar heavy oil, naphthalene oil, anthracene oil, coal tar pitch, asphalt oil, and mesophase pitch. , oxygen cross-linked petroleum asphalt, heavy oil, etc., from the perspective of obtaining or removing impurities at a low price, it is better to use phenolic resin.

尤其是碳源樹脂較佳為包含芳香族烴部分之樹脂,包含芳香族烴部分之樹脂較佳為酚系樹脂、環氧樹脂、或熱固性樹脂,酚系樹脂較佳為可溶酚醛型。  作為酚系樹脂,例如可例舉SUMILITERESIN系列(可溶酚醛樹脂;住友電木股份有限公司製造)。In particular, the carbon source resin is preferably a resin containing an aromatic hydrocarbon moiety. The resin containing an aromatic hydrocarbon moiety is preferably a phenolic resin, an epoxy resin, or a thermosetting resin. The phenolic resin is preferably a soluble phenolic resin. Examples of the phenolic resin include the SUMILITERESIN series (soluble phenolic resin; manufactured by Sumitomo Bakelite Co., Ltd.).

將本奈米矽之漿料、較佳為上述本奈米矽漿料與上述聚矽氧烷化合物和碳源樹脂之混合物混合,去除溶劑而獲得前驅物。  包含聚矽氧烷化合物與碳源樹脂之混合物較佳為聚矽氧烷化合物與碳源樹脂混合均勻之狀態。上述混合係使用具有分散及混合功能之裝置進行。作為具有分散及混合功能之裝置,例如可例舉:攪拌機、超音波攪拌器、預混分散機等。於為了蒸餾去除有機溶劑而進行之去除溶劑及乾燥之作業中,可使用乾燥機、減壓乾燥機、噴霧乾燥機等。The present nanosilicon slurry, preferably the above-mentioned present nanosilicon slurry, is mixed with the mixture of the above-mentioned polysiloxane compound and carbon source resin, and the solvent is removed to obtain a precursor. The mixture containing the polysiloxane compound and the carbon source resin is preferably in a state where the polysiloxane compound and the carbon source resin are evenly mixed. The above mixing is carried out using devices with dispersing and mixing functions. Examples of devices with dispersing and mixing functions include mixers, ultrasonic mixers, premix dispersers, etc. In the solvent removal and drying operations for distilling and removing organic solvents, dryers, vacuum dryers, spray dryers, etc. can be used.

前驅物較佳為含有3質量%至50質量%之本奈米矽、15質量%至85質量%之聚矽氧烷化合物之固形物成分、3質量%至70質量%之碳源樹脂之固形物成分,更佳為含有8質量%至40質量%之本氧化矽粒子之固形物成分含量、20至70質量%之聚矽氧烷化合物之固形物成分、3質量%至60質量%之碳源樹脂之固形物成分。The precursor is preferably a solid component containing 3% to 50% by mass of the present nanosilica, 15% to 85% by mass of the polysiloxane compound, and 3% to 70% by mass of the carbon source resin. It is more preferable that the solid content of the silicon oxide particles is 8 to 40 mass%, the solid content of the polysiloxane compound is 20 to 70 mass%, and the carbon content is 3 to 60 mass%. The solid content of the source resin.

於非活性氣體環境中對上述獲得之前驅物進行焙燒使可熱分解之有機成分完全分解而獲得焙燒物。關於焙燒溫度,例如藉由在最高極限溫度處於900℃至1200℃之範圍內之溫度下進行焙燒,能夠使可熱分解之有機成分完全分解。又,聚矽氧烷化合物及碳源樹脂藉由高溫處理之能量而轉化成具有矽-氧-碳骨架及游離碳之碳氧化矽相。The precursor obtained above is roasted in an inert gas environment to completely decompose the thermally decomposable organic components to obtain a roasted product. Regarding the calcination temperature, for example, the thermally decomposable organic component can be completely decomposed by calcination at a temperature in which the maximum limit temperature is in the range of 900°C to 1200°C. In addition, the polysiloxane compound and the carbon source resin are converted into a silicon carbonate phase having a silicon-oxygen-carbon skeleton and free carbon by the energy of high-temperature treatment.

焙燒係按照由升溫速度、一定溫度下之保持時間等規定之焙燒程式來進行。再者,最高極限溫度係設定之最高溫度,會強烈影響焙燒物之結構或性能。藉由最高極限溫度,能夠精密地控制保有碳氧化矽相之矽與碳之化學鍵結狀態之本活性物質的微細結構,從而獲得更優異之充放電特性。The roasting is carried out according to the roasting program specified by the heating rate, the holding time at a certain temperature, etc. Furthermore, the maximum limit temperature is the maximum temperature set, which will strongly affect the structure or performance of the roasted product. Through the maximum extreme temperature, the fine structure of the active material, which maintains the chemical bonding state of silicon and carbon in the silicon carbonate phase, can be precisely controlled, thereby obtaining better charge and discharge characteristics.

焙燒方法並無特別限定,於非活性氣體環境中使用具有加熱功能之反應裝置即可,且可藉由連續法、批次法進行處理。針對焙燒用裝置,可視其目的適當選擇流動層反應爐、旋轉爐、立式移動層反應爐、隧道窯、分批加熱爐、旋轉窯等。The roasting method is not particularly limited, as long as a reaction device with a heating function is used in an inert gas environment, and the process can be carried out by a continuous method or a batch method. For roasting equipment, fluidized bed reactors, rotary furnaces, vertical moving bed reactors, tunnel kilns, batch heating furnaces, rotary kilns, etc. can be appropriately selected depending on the purpose.

藉由對所獲得之焙燒物進行粉碎,視需要進行分級而獲得本活性物質。粉碎可一步進行至所期望之粒徑,亦可分數步進行。例如,於將10 mm以上之塊或凝集粒子之焙燒物製作成10 μm左右之活性物質之情形時,利用顎式破碎機、輥碎機等進行粗粉碎而成為1 mm左右之粒子,之後利用石臼式粉碎機(grow mill)、球磨機等成為100 μm左右,再利用珠磨機、噴射磨機等粉碎至10 μm左右。藉由粉碎製作之粒子中有時包含粗大粒子,為了將其去除,又,於去除微粉以調整粒度分佈之情形時,進行分級。所使用之分級機視目的而分開使用風力分級機、濕式分級機等,於去除粗大粒子之情形時,過篩之分級方式能夠確實地達到目的,故而較佳。再者,於焙燒前藉由噴霧乾燥等將前驅物混合物控制為接近目標粒徑之形狀,且以該形狀進行焙燒之情形時,亦可省去粉碎步驟。The present active material is obtained by pulverizing the obtained roasted product and classifying it if necessary. Grinding can be carried out in one step to the desired particle size, or in divided steps. For example, when producing an active material of about 10 μm from the roasted product of lumps or aggregated particles of 10 mm or more, coarse crushing is performed using a jaw crusher, a roller crusher, etc. into particles of about 1 mm, and then used Grow mills, ball mills, etc. can be used to reduce the particle size to about 100 μm, and then bead mills, jet mills, etc. can be used to grind the particles to about 10 μm. Particles produced by grinding may contain coarse particles, and classification is performed in order to remove them and to remove fine powder to adjust the particle size distribution. The classifiers used are divided into wind classifiers, wet classifiers, etc. depending on the purpose. When removing coarse particles, the sieving classification method can achieve the purpose reliably, so it is better. Furthermore, when the precursor mixture is controlled to a shape close to the target particle size by spray drying or the like before calcination, and the calcination is performed in this shape, the grinding step can also be omitted.

於本活性物質具有選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬之矽酸鹽化合物之情形時,向將本氧化矽粒子之漿料與聚矽氧烷化合物和碳源樹脂之混合物混合而獲得之懸濁液中添加選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬之鹽,其後,藉由與上述相同之操作獲得具有上述矽酸鹽化合物之本活性物質。  作為選自由Li、K、Na、Ca、Mg及Al所組成之群中之至少1種金屬之鹽,可例舉該等金屬之氟化物、氯化物、溴化物等鹵化物、氫氧化物、碳酸鹽等。When the active material contains a silicate compound of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al, the slurry of the present oxidized silicon particles and polysiloxane are A salt of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al is added to a suspension obtained by mixing a mixture of an alkane compound and a carbon source resin, and then, by mixing with the above The same operation is carried out to obtain the active material having the above silicate compound. Examples of the salt of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al include halides, hydroxides, such as fluorides, chlorides, and bromides of these metals. Carbonate etc.

上述金屬之鹽可為2種以上金屬之鹽,可為一種鹽具有多種金屬,亦可為具有不同金屬之鹽之混合物。  將上述金屬之鹽添加至懸濁液時金屬之鹽之添加量相對於氧化矽粒子之莫耳數,以莫耳比計較佳為0.01至0.4。  於上述金屬之鹽可溶於有機溶劑之情形時,可將上述金屬之鹽溶於有機溶劑而加入至懸濁液中進行混合。於上述金屬之鹽不溶於有機溶劑之情形時,可使金屬之鹽之粒子分散於有機溶劑中之後再加入至上述懸濁液中進行混合。就提高分散效果之觀點而言,上述金屬之鹽較佳為平均粒徑為100 nm以下之奈米粒子。上述有機溶劑可適當使用醇類、酮類等,亦可使用甲苯、二甲苯、萘、甲基萘等芳香族烴系溶劑。The above-mentioned metal salt may be a salt of two or more metals, one salt may contain multiple metals, or it may be a mixture of salts containing different metals. When the above-mentioned metal salt is added to the suspension, the amount of the metal salt added relative to the molar number of the silicon oxide particles is preferably 0.01 to 0.4 in terms of molar ratio. When the salt of the above metal is soluble in an organic solvent, the salt of the above metal can be dissolved in the organic solvent and added to the suspension for mixing. When the above-mentioned metal salt is insoluble in the organic solvent, the particles of the metal salt can be dispersed in the organic solvent and then added to the above-mentioned suspension for mixing. From the viewpoint of improving the dispersion effect, the salt of the above metal is preferably nanoparticles with an average particle diameter of 100 nm or less. As the above-mentioned organic solvent, alcohols, ketones, etc. can be appropriately used, and aromatic hydrocarbon solvents such as toluene, xylene, naphthalene, and methylnaphthalene can also be used.

藉由使上述金屬之鹽均勻分散於上述懸濁液中,能夠使金屬之鹽之分子與本奈米矽充分接觸。在氧化矽存在於本奈米矽之表面或周邊之情形時,藉由在上述金屬之鹽之分子與本奈米矽發生固相反應之條件下使金屬之鹽之分子與本奈米矽充分接觸,能夠使上述矽酸鹽化合物存在於本奈米矽之表面附近。為使本奈米矽之表面附近之上述矽酸鹽化合物之濃度高於碳氧化矽之濃度,重要的是提高上述金屬之鹽與本氧化矽粒子之接觸狀態。  又,藉由使用有機添加物對上述金屬之鹽之分子進行表面修飾,能夠使其附著於本奈米矽表面附近。有機添加物之分子結構並無特別限制,較佳為能夠與本奈米矽之表面上存在之分散劑進行物理或化學鍵結之分子結構。上述物理或化學鍵結可例舉:靜電作用、氫鍵結、分子間凡得瓦爾力、離子鍵結、共價鍵結等。高溫焙燒時,藉由上述金屬之鹽之分子與本奈米矽表面之氧化矽進行固相反應,能夠由上述矽酸鹽化合物被覆本奈米矽之表面。By uniformly dispersing the metal salt in the suspension, the molecules of the metal salt can be fully contacted with the present nanosilica. When silicon oxide exists on the surface or periphery of the present nanosilicon, the molecules of the metal salt and the present nanosilicon are fully reacted with each other by allowing the molecules of the metal salt to react in a solid phase with the present nanosilicon. Contact allows the above-mentioned silicate compound to exist near the surface of the nano-silicon. In order to make the concentration of the above-mentioned silicate compound near the surface of the present nano-silicon higher than the concentration of the silicon oxycarbide, it is important to increase the contact state between the above-mentioned metal salt and the present silicon oxide particles. Furthermore, by using organic additives to surface-modify the molecules of the above-mentioned metal salts, they can be attached near the surface of the silicon nanoparticles. The molecular structure of the organic additive is not particularly limited, and is preferably a molecular structure that can physically or chemically bond with the dispersant present on the surface of the nano-silicon. Examples of the above physical or chemical bonding include: electrostatic interaction, hydrogen bonding, intermolecular van der Waals force, ionic bonding, covalent bonding, etc. During high-temperature baking, the surface of the nano-silicon can be coated with the above-mentioned silicate compound through a solid-phase reaction between the molecules of the metal salt and the silicon oxide on the surface of the nano-silicon.

本活性物質之循環性、初始庫侖效率及容量保持率優異,用作包含本活性物質之負極之二次電池發揮良好之特性。  具體而言,可將包含本活性物質、有機黏結劑、及視需要而添加之其他導電助劑等成分構成之漿料呈薄膜狀塗佈於集電體銅箔上製成負極。又,亦可向上述漿料中加入石墨等碳材料來製作負極。  作為碳材料,可例舉天然石墨、人工石墨、硬碳或軟碳之類的非晶碳等。This active material has excellent cyclability, initial Coulombic efficiency and capacity retention rate, and exhibits good characteristics in secondary batteries used as negative electrodes containing this active material. Specifically, a slurry composed of the active material, an organic binder, and other conductive additives added as needed can be coated in a thin film on the current collector copper foil to form a negative electrode. Alternatively, carbon materials such as graphite may be added to the above slurry to produce a negative electrode. Examples of carbon materials include natural graphite, artificial graphite, amorphous carbon such as hard carbon and soft carbon, and the like.

例如,可藉由如下操作來獲得,即,利用攪拌機、球磨機、高速砂磨機、加壓捏合機等分散裝置將本活性物質、及作為有機黏結材之黏合劑與溶劑一同混練,製備負極材漿料,並將其塗佈於集電體而形成負極層。又,亦可藉由使糊狀之負極材漿料成形為片狀、顆粒狀等形狀,將其與集電體一體化而獲得。For example, it can be obtained by kneading the active material, a binder as an organic binder, and a solvent using a mixer, a ball mill, a high-speed sand mill, a pressure kneader, and other dispersing devices to prepare the negative electrode material. slurry and apply it to the current collector to form a negative electrode layer. In addition, it can also be obtained by molding the pasty negative electrode material slurry into a shape such as sheet or granular form and integrating it with a current collector.

作為上述有機黏結劑,例如可例舉:苯乙烯-丁二烯橡膠共聚物(以下,亦記為「SBR」);由(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯腈、及(甲基)丙烯酸羥基乙酯等乙烯性不飽和羧酸酯與丙烯酸、甲基丙烯酸、伊康酸、富馬酸、馬來酸等乙烯性不飽和羧酸構成之(甲基)丙烯酸系共聚物等不飽和羧酸共聚物;聚偏二氟乙烯、聚環氧乙烷、聚表氯醇、聚磷腈、聚丙烯腈、聚醯亞胺、聚醯胺醯亞胺、羧甲基纖維素(以下,亦記為「CMC」)等高分子化合物。Examples of the organic binder include styrene-butadiene rubber copolymer (hereinafter also referred to as "SBR"); methyl (meth)acrylate, ethyl (meth)acrylate, (methyl) Ethylenically unsaturated carboxylic acid esters such as butyl acrylate, (meth)acrylonitrile, and hydroxyethyl (meth)acrylate, and ethylene such as acrylic acid, methacrylic acid, itaconic acid, fumaric acid, and maleic acid Unsaturated carboxylic acid copolymers such as (meth)acrylic acid copolymers composed of unsaturated carboxylic acids; polyvinylidene fluoride, polyethylene oxide, polyepichlorohydrin, polyphosphazene, polyacrylonitrile, polyvinyl chloride Polymer compounds such as imine, polyamide imine, and carboxymethylcellulose (hereinafter also referred to as "CMC").

該等有機黏結劑根據各自之物性,有些分散或溶解於水中,又,有些溶解於N-甲基-2-吡咯啶酮(NMP)等有機溶劑中。鋰離子二次電池負極之負極層中之有機黏結劑之含有比率較佳為1質量%至30質量%,更佳為2質量%至20質量%,進而較佳為3質量%至15質量%。Depending on their physical properties, some of these organic binders are dispersed or dissolved in water, and some are dissolved in organic solvents such as N-methyl-2-pyrrolidone (NMP). The content ratio of the organic binder in the negative electrode layer of the negative electrode of the lithium ion secondary battery is preferably 1 mass% to 30 mass%, more preferably 2 mass% to 20 mass%, and further preferably 3 mass% to 15 mass% .

藉由有機黏結劑之含有比率為1質量%以上,密接性更加良好,從而進一步抑制因充放電時之膨脹及收縮而導致負極構造破裂。另一方面,藉由為30質量%以下,而進一步抑制電極電阻之上升。  於該範圍內,本活性物質之化學穩定性較高,亦可採用水性黏合劑,因此於實用化方面亦容易操作。When the content ratio of the organic binder is 1% by mass or more, the adhesion becomes better, thereby further suppressing the cracking of the negative electrode structure due to expansion and contraction during charging and discharging. On the other hand, when the content is 30% by mass or less, the increase in electrode resistance is further suppressed. Within this range, the chemical stability of this active material is relatively high, and water-based adhesives can also be used, so it is easy to operate in practical terms.

又,於上述負極材漿料中,亦可視需要混合導電助材。作為導電助材,例如可例舉:碳黑、石墨、乙炔黑、或展現出導電性之氧化物或氮化物等。導電助劑之使用量相對於本發明之負極活性物質可設為1質量%至15質量%左右。In addition, conductive auxiliary materials may also be mixed into the above-mentioned negative electrode material slurry if necessary. Examples of conductive auxiliary materials include carbon black, graphite, acetylene black, or oxides or nitrides exhibiting conductivity. The usage amount of the conductive additive can be set to about 1 mass % to 15 mass % relative to the negative electrode active material of the present invention.

又,針對上述集電體之材質及形狀,例如可使用使銅、鎳、鈦、不鏽鋼等成為箔狀、穿孔箔狀、網狀等之帶狀者。又,亦可使用多孔性材料,例如多孔金屬(發泡金屬)或碳紙等。In addition, as the material and shape of the above-mentioned current collector, for example, those made of copper, nickel, titanium, stainless steel, etc. into a foil shape, a perforated foil shape, a mesh shape, or the like can be used. In addition, porous materials such as porous metal (foamed metal) or carbon paper can also be used.

作為將上述負極材漿料塗佈於集電體之方法,例如可例舉:金屬遮罩印刷法、靜電塗裝法、浸漬塗佈法、噴塗法、輥塗法、刮刀法、凹版塗佈法、網版印刷法等。塗佈後,視需要利用平板壓機、壓延輥等進行壓延處理為宜。Examples of methods for applying the negative electrode material slurry to the current collector include metal mask printing, electrostatic coating, dip coating, spray coating, roll coating, doctor blade, and gravure coating. method, screen printing method, etc. After coating, it is advisable to use a flat press, a calender roller, etc. for calendering if necessary.

又,使上述負極材漿料成為片狀或顆粒狀等,其與集電體之一體化例如可利用輥、壓機或該等之組合等進行。In addition, the above-mentioned negative electrode material slurry is made into a sheet shape or a granular shape, and the integration with the current collector can be performed using, for example, a roller, a press, or a combination thereof.

形成於上述集電體上之負極層或與集電體一體化之負極層較佳為根據所使用之有機黏結劑進行熱處理。例如,於使用水系苯乙烯-丁二烯橡膠共聚物(SBR)等之情形時,可在100至130℃進行熱處理,於使用以聚醯亞胺、聚醯胺醯亞胺為主骨架之有機黏結劑之情形時,較佳為於150至450℃進行熱處理。The negative electrode layer formed on the above-mentioned current collector or the negative electrode layer integrated with the current collector is preferably heat-treated according to the organic binder used. For example, when using water-based styrene-butadiene rubber copolymer (SBR), etc., heat treatment can be performed at 100 to 130°C. In the case of adhesives, it is preferable to perform heat treatment at 150 to 450°C.

藉由該熱處理,去除了溶劑,使黏合劑硬化而提昇強度,能夠提高粒子間及粒子與集電體間之密接性。再者,該等熱處理較佳為於氦氣、氬氣、氮氣等非活性環境、真空環境下進行,以防止處理過程中集電體發生氧化。Through this heat treatment, the solvent is removed, the binder is hardened to increase the strength, and the adhesion between particles and between the particles and the current collector can be improved. Furthermore, the heat treatment is preferably performed in an inactive environment such as helium, argon, nitrogen, or a vacuum environment to prevent oxidation of the current collector during the treatment process.

又,進行熱處理後,對負極進行加壓處理為宜。於使用本活性物質之負極中,電極密度較佳為1 g/cm 3至1.8 g/cm 3,更佳為1.1 g/cm 3至1.7 g/cm 3,進而較佳為1.2 g/cm 3至1.6 g/cm 3。電極密度越高,則密接性及電極之體積容量密度越趨於提昇。另一方面,若電極密度過高,則電極中之空隙減少,可能導致抑制矽等體積膨脹之效果減弱,容量保持率下降。因此,選擇電極密度之最佳範圍。 In addition, after heat treatment, it is preferable to perform pressure treatment on the negative electrode. In the negative electrode using this active material, the electrode density is preferably 1 g/cm 3 to 1.8 g/cm 3 , more preferably 1.1 g/cm 3 to 1.7 g/cm 3 , and further preferably 1.2 g/cm 3 to 1.6 g/cm 3 . The higher the electrode density, the more the adhesion and the volumetric capacity density of the electrode tend to increase. On the other hand, if the electrode density is too high, the voids in the electrode will be reduced, which may lead to a weakening of the effect of suppressing the volume expansion of silicon and a decrease in the capacity retention rate. Therefore, the optimal range of electrode density is selected.

本發明之二次電池於負極中包含上述本活性物質。作為具有包含本活性物質之負極之二次電池,較佳為非水電解質二次電池及固體電解質二次電池,尤其是用作非水電解質二次電池之負極時發揮優異之性能。The secondary battery of the present invention contains the above-mentioned active material in the negative electrode. As a secondary battery having a negative electrode containing the present active material, a non-aqueous electrolyte secondary battery and a solid electrolyte secondary battery are preferred. In particular, it exhibits excellent performance when used as a negative electrode of a non-aqueous electrolyte secondary battery.

上述本發明之二次電池例如在用於濕式電解質二次電池之情形時,可藉由將正極與包含本發明之負極活性物質之負極介隔分隔件對向配置,並注入電解液而構成。For example, when the secondary battery of the present invention is used in a wet electrolyte secondary battery, the positive electrode and the negative electrode separator containing the negative electrode active material of the present invention are arranged to face each other, and the electrolyte is injected into the secondary battery. .

正極與負極同樣,可藉由在集電體表面上形成正極層而獲得。此情形時之集電體可使用使鋁、鈦、不鏽鋼等金屬或合金成為箔狀、穿孔箔狀、網狀等之帶狀者。Like the negative electrode, the positive electrode can be obtained by forming a positive electrode layer on the surface of a current collector. In this case, a strip made of a metal or alloy such as aluminum, titanium, stainless steel, etc. can be used as the current collector, such as a foil, a perforated foil, a mesh, or the like.

作為用於正極層之正極材料,並無特別限制。於非水電解質二次電池中,在製作鋰離子二次電池之情形時,例如可以使用可摻雜或嵌入鋰離子之金屬化合物、金屬氧化物、金屬硫化物、或導電性高分子材料。例如可單獨使用以下材料或將該等材料混合使用:鈷酸鋰(LiCoO 2)、鎳酸鋰(LiNiO 2)、錳酸鋰(LiMnO 2)、及該等之複合氧化物(LiCoxNiyMnzO 2、x+y+z=1)、鋰錳尖晶石(LiMn 2O 4)、鋰釩化合物、V 2O 5、V 6O 13、VO 2、MnO 2、TiO 2、MoV 2O 8、TiS 2、V 2S 5、VS 2、MoS 2、MoS 3、Cr 3O 8、Cr 2O 5、橄欖石型LiMPO 4(其中,M為Co、Ni、Mn或Fe)、聚乙炔、聚苯胺、聚吡咯、聚噻吩、多并苯等導電性聚合物、多孔質碳等。 The positive electrode material used for the positive electrode layer is not particularly limited. In non-aqueous electrolyte secondary batteries, when producing lithium ion secondary batteries, for example, metal compounds, metal oxides, metal sulfides, or conductive polymer materials that can be doped or embedded with lithium ions can be used. For example, the following materials can be used alone or in combination: lithium cobalt oxide (LiCoO 2 ), lithium nickel oxide (LiNiO 2 ), lithium manganate (LiMnO 2 ), and their composite oxides (LiCoxNiyMnzO 2 , x+y+z =1), lithium manganese spinel (LiMn 2 O 4 ), lithium vanadium compound, V 2 O 5 , V 6 O 13 , VO 2 , MnO 2 , TiO 2 , MoV 2 O 8 , TiS 2 , V 2 S 5. VS 2 , MoS 2 , MoS 3 , Cr 3 O 8 , Cr 2 O 5 , olivine LiMPO 4 (where M is Co, Ni, Mn or Fe), polyacetylene, polyaniline, polypyrrole, poly Conductive polymers such as thiophene and polyacene, porous carbon, etc.

作為分隔件,例如可使用以聚乙烯、聚丙烯等聚烯烴為主成分之不織布、布、微孔膜或該等之組合。再者,於要製作之非水電解質二次電池之正極與負極為不直接接觸之構造的情形時,無須使用分隔件。As the separator, for example, nonwoven fabrics, cloths, microporous films, or combinations thereof containing polyolefins such as polyethylene and polypropylene as the main component can be used. Furthermore, when the positive electrode and the negative electrode of the non-aqueous electrolyte secondary battery to be produced are not in direct contact with each other, there is no need to use a separator.

作為電解液,例如可使用將LiClO 4、LiPF 6、LiAsF 6、LiBF 4、LiSO 3CF 3等鋰鹽溶解於以下單一成分或2種成分以上之混合物之非水系溶劑中而得的所謂有機電解液,即,碳酸伸乙酯、碳酸丙烯酯、碳酸伸丁酯、碳酸伸乙烯酯、碳酸氟伸乙酯、環戊酮、環丁碸、3-甲基環丁碸、2,4-二甲基環丁碸、3-甲基-1,3-唑啶-2-酮、γ-丁內酯、碳酸二甲酯、碳酸二乙酯、碳酸甲酯乙酯、碳酸甲基丙酯、碳酸丁基甲酯、碳酸乙基丙酯、碳酸丁基乙酯、碳酸二丙酯、1,2-二甲氧基乙烷、四氫呋喃、2-甲基四氫呋喃、1,3-二氧雜環戊烷、乙酸甲酯、乙酸乙酯等。 As the electrolyte, for example, so-called organic electrolysis can be used, in which lithium salts such as LiClO 4 , LiPF 6 , LiAsF 6 , LiBF 4 , and LiSO 3 CF 3 are dissolved in the following non-aqueous solvent as a single component or a mixture of two or more components. liquid, namely, ethyl carbonate, propylene carbonate, butyl carbonate, vinyl carbonate, ethyl fluoride carbonate, cyclopentanone, cyclobutane, 3-methylcyclobutane, 2,4-di Methylcycloterine, 3-methyl-1,3- Azolidin-2-one, γ-butyrolactone, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, methyl propyl carbonate, butyl methyl carbonate, ethyl propyl carbonate, butyl ethyl carbonate , dipropyl carbonate, 1,2-dimethoxyethane, tetrahydrofuran, 2-methyltetrahydrofuran, 1,3-dioxolane, methyl acetate, ethyl acetate, etc.

本發明之二次電池之構造並無特別限定,通常設為以如下方式獲得之構造:將正極與負極、及視需要設置之分隔件捲繞成扁平螺旋狀而製成捲繞式極板群,或將該等積層成平板狀而製成積層式極板群,並將該等極板群封入外裝體中。再者,本發明之實施例中使用之半電池設為負極中以本活性物質為主體之構成,進行相對電極使用金屬鋰之簡易評價,其係為了更明確地比較活性物質本身之循環特性。The structure of the secondary battery of the present invention is not particularly limited, but is usually a structure obtained by winding the positive electrode, the negative electrode, and an optional separator into a flat spiral shape to form a wound electrode plate group. , or these are laminated into flat plates to form a laminated plate group, and the electrode group is sealed in an outer casing. Furthermore, the half-cell used in the examples of the present invention was configured to have the active material as the main component of the negative electrode, and a simple evaluation using metallic lithium as the counter electrode was conducted in order to more clearly compare the cycle characteristics of the active material itself.

使用本活性物質之二次電池並無特別限定,可用作紙型電池、紐扣型電池、硬幣型電池、積層型電池、圓筒型電池、方型電池等。上述本發明之負極活性物質亦可應用於以嵌入脫嵌鋰離子為充放電機制之所有電化學裝置,例如混合電容器、固體鋰二次電池等。Secondary batteries using this active material are not particularly limited and can be used as paper batteries, button batteries, coin batteries, laminated batteries, cylindrical batteries, square batteries, etc. The above-mentioned negative active material of the present invention can also be applied to all electrochemical devices that use intercalation and deintercalation of lithium ions as a charging and discharging mechanism, such as hybrid capacitors, solid lithium secondary batteries, etc.

如上所述,將本活性物質作為二次電池之負極活性物質時,可提供循環性、初始庫侖效率及容量保持率優異之二次電池。  本活性物質可藉由上述方法用作負極,並製成具有上述負極之二次電池。As described above, when the present active material is used as a negative electrode active material of a secondary battery, a secondary battery excellent in cycleability, initial Coulombic efficiency, and capacity retention rate can be provided. The active material can be used as a negative electrode by the above method, and a secondary battery with the above negative electrode can be made.

以上,已針對本奈米矽、包含本奈米矽之本奈米矽漿料、本奈米矽之製造方法、包含本奈米矽之本活性物質、負極中包含本活性物質之二次電池進行了說明,但本發明並不限定於上述實施形態之構成。  本奈米矽、本奈米矽漿料及本活性物質、負極中包含本活性物質之二次電池可於上述實施形態之構成中追加其他任意構成,亦可替換成發揮相同功能之任意構成。  又,本奈米矽之製造方法及本活性物質之製造方法可於上述實施形態之構成中追加其他任意步驟,亦可替換成發揮相同功能之任意步驟。  實施例The above has been directed to the present nanosilicon, the present nanosilicon slurry containing the present nanosilicon, the present nanosilicon manufacturing method, the present active material containing the present nanosilicon, and the secondary battery containing the present active material in the negative electrode. Although the description has been made, the present invention is not limited to the configuration of the above-mentioned embodiment. The present nanosilicon, the present nanosilicon slurry, the present active material, and the secondary battery containing the present active material in the negative electrode can add other arbitrary structures to the structures of the above embodiments, and can also be replaced with any structures that perform the same function. Furthermore, in the present method of manufacturing silicon nanoparticles and the present method of manufacturing active material, other arbitrary steps can be added to the structure of the above-mentioned embodiments, or any steps that perform the same function can be replaced. Example

以下,藉由實施例對本發明詳細地進行說明,但本發明並不限定於該等實施例。  再者,本發明之實施例中使用之半電池設為負極中以本活性物質為主體之構成,進行相對電極使用金屬鋰之簡易評價,其係為了更明確地比較活性物質本身之循環特性。Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to these examples. Furthermore, the half-cell used in the examples of the present invention was configured to have this active material as the main component of the negative electrode, and a simple evaluation using metallic lithium as the counter electrode was conducted in order to more clearly compare the cycle characteristics of the active material itself.

合成例1:聚矽氧烷化合物之製作  (甲基三甲氧基矽烷之縮合物(a1)之合成)  向具備攪拌機、溫度計、滴液漏斗、冷凝管及氮氣導入口之反應容器中加入1,421質量份之甲基三甲氧基矽烷(以下,記為「MTMS」),並升溫至60℃。然後,歷時5分鐘向上述反應容器中滴加0.17質量份之酸式磷酸異丙酯(SC有機化學股份有限公司製造之「Phoslex A-3」)與207質量份之去離子水之混合物,之後於80℃之溫度下攪拌4小時以進行MTMS之水解縮合反應。  於40至60℃之溫度及40至1.3 kPa之減壓下對藉由上述水解縮合反應而獲得之縮合物進行蒸餾。再者,「40至1.3 kPa之減壓下」意指開始蒸餾去除甲醇時之減壓條件為40 kPa,最終減壓至1.3 kPa。以下記載中亦同樣如此。藉由去除上述反應過程中生成之甲醇及水,而獲得1,000質量份之含有數量平均分子量為1,000至5,000之MTMS之縮合物(以下,亦記為「a1」)之液體。所獲得之液體之有效成分為70質量%。 再者,上述有效成分係根據MTMS等矽烷單體之甲氧基全部進行縮合反應之情形時之理論產量(質量份)除以縮合反應後之實際產量(質量份)所得之值〔矽烷單體之甲氧基全部進行縮合反應之情形時之理論產量(質量份)/縮合反應後之實際產量(質量份)〕來算出。 Synthesis Example 1: Preparation of polysiloxane compound (Synthesis of the condensate of methyltrimethoxysilane (a1)) Add 1,421 mass to a reaction vessel equipped with a stirrer, thermometer, dropping funnel, condenser tube and nitrogen inlet of methyltrimethoxysilane (hereinafter, referred to as "MTMS"), and heat it to 60°C. Then, a mixture of 0.17 parts by mass of isopropyl acid phosphate ("Phoslex A-3" manufactured by SC Organic Chemicals Co., Ltd.) and 207 parts by mass of deionized water was added dropwise to the reaction vessel over 5 minutes. Stir at a temperature of 80°C for 4 hours to proceed with the hydrolysis and condensation reaction of MTMS. The condensate obtained by the above hydrolysis condensation reaction is distilled at a temperature of 40 to 60°C and a reduced pressure of 40 to 1.3 kPa. Furthermore, "under reduced pressure of 40 to 1.3 kPa" means that the reduced pressure condition is 40 kPa when the distillation of methanol is started, and the pressure is finally reduced to 1.3 kPa. The same is true in the following records. By removing the methanol and water generated during the above reaction, 1,000 parts by mass of a liquid containing a condensate of MTMS with a number average molecular weight of 1,000 to 5,000 (hereinafter also referred to as "a1") is obtained. The active ingredient of the obtained liquid was 70% by mass. In addition, the above-mentioned active ingredient is a value obtained by dividing the theoretical yield (parts by mass) by the actual yield (parts by mass) after the condensation reaction when all the methoxy groups of the silane monomer such as MTMS undergo a condensation reaction [silane monomer] Calculate the theoretical yield (mass parts)/actual yield after the condensation reaction (mass parts) when all the methoxy groups undergo the condensation reaction.

(硬化性樹脂組成物之製造)  向具備攪拌機、溫度計、滴液漏斗、冷凝管及氮氣導入口之反應容器中加入150質量份之丁醇(以下,亦記為「BuOH」)、105質量份之苯基三甲氧基矽烷(以下,亦記為「PTMS」)、277質量份之二甲基二甲氧基矽烷(以下,亦記為「DMDMS」),並升溫至80℃。  然後,於該溫度下,歷時6小時向上述反應容器中滴加含有以下成分之混合物:21質量份之甲基丙烯酸甲酯(以下,亦記為「MMA」)、4質量份之甲基丙烯酸丁酯(以下,亦記為「BMA」)、3質量份之丁酸(以下,亦記為「BA」)、2質量份之甲基丙烯醯氧基丙基三甲氧基矽烷(以下,亦記為「MPTS」)、3質量份之BuOH及0.6質量份之過氧化-2-乙基己酸丁酯(以下,亦記為「TBPEH」)。滴加結束後,進而於該溫度下反應20小時,獲得具有水解性矽基之數量平均分子量為10,000之乙烯聚合物(a2)之有機溶劑溶液。(Manufacture of curable resin composition) Into a reaction vessel equipped with a stirrer, thermometer, dropping funnel, condenser tube and nitrogen inlet, 150 parts by mass of butanol (hereinafter also referred to as "BuOH") and 105 parts by mass of phenyltrimethoxysilane (hereinafter, also referred to as "PTMS") and 277 parts by mass of dimethyldimethoxysilane (hereinafter, also referred to as "DMDMS"), and heated to 80°C. Then, a mixture containing the following components: 21 parts by mass of methyl methacrylate (hereinafter, also referred to as "MMA") and 4 parts by mass of methacrylic acid was added dropwise to the reaction vessel at this temperature over 6 hours. Butyl ester (hereinafter, also referred to as "BMA"), 3 parts by mass of butyric acid (hereinafter, also referred to as "BA"), 2 parts by mass of methacryloxypropyltrimethoxysilane (hereinafter, also referred to as "BA") (denoted as "MPTS"), 3 parts by mass of BuOH and 0.6 parts by mass of butyl peroxy-2-ethylhexanoate (hereinafter, also denoted as "TBPEH"). After completion of the dropwise addition, the reaction was continued at the same temperature for 20 hours to obtain an organic solvent solution of the ethylene polymer (a2) having a hydrolyzable silicon group and a number average molecular weight of 10,000.

然後,歷時5分鐘滴加0.04質量份之酸式磷酸異丙酯(SC有機化學股份有限公司製造之「Phoslex A-3」)與112質量份之去離子水之混合物,進而於該溫度下攪拌10小時以進行水解縮合反應,藉此獲得含有複合樹脂之液體,該複合樹脂係乙烯聚合物(a2)所具有之水解性矽基與具有來源於上述PTMS及DMDMS之聚矽氧烷之水解性矽基及矽烷醇基鍵結而成。  然後,向該液體中添加472質量份之合成例1中獲得之MTMS之縮合物(a1)、80質量份之去離子水,於該溫度下攪拌10小時以進行水解縮合反應,藉由在與合成例1相同之條件下進行蒸餾來去除生成之甲醇及水。然後,添加250質量份之BuOH,獲得1,000質量份之不揮發分為60.1質量%之硬化性樹脂組成物。Then, a mixture of 0.04 parts by mass of isopropyl acid phosphate ("Phoslex A-3" manufactured by SC Organic Chemical Co., Ltd.) and 112 parts by mass of deionized water was added dropwise over 5 minutes, and further stirred at this temperature. The hydrolysis condensation reaction is carried out for 10 hours, thereby obtaining a liquid containing a composite resin, which is a hydrolyzable silicon group of the ethylene polymer (a2) and a polysiloxane derived from the above-mentioned PTMS and DMDMS. It is formed by bonding silicon group and silanol group. Then, 472 parts by mass of the condensate (a1) of MTMS obtained in Synthesis Example 1 and 80 parts by mass of deionized water were added to the liquid, and the liquid was stirred for 10 hours to perform a hydrolysis condensation reaction. Distillation was performed under the same conditions as in Synthesis Example 1 to remove the generated methanol and water. Then, 250 parts by mass of BuOH was added to obtain 1,000 parts by mass of a curable resin composition having a non-volatile content of 60.1% by mass.

實施例1  將矽純度為99.9質量%,體積平均粒徑為3.2 μm,氧相對於矽為3.5 atom%之市售品之矽粉末(高純度化學製造)設為70 g,DISPERBYK9077(BYK Additives&Instruments製造、DISPERBYK為註冊商標)設為28 g,甲基乙基酮(以下,亦記為「MEK」)設為280 g於攪拌槽內混合,並充分攪拌。對攪拌槽加蓋並供給露點-70℃之氮氣,使槽內成為非活性氣體環境。水分初始濃度成為0.058質量%。使用珠磨機(廣島金屬&機械股份有限公司製造之Ultra Apex Mill UAM-015)對該混合液進行1.5小時之濕式粉碎,獲得均勻分散於分散介質中之奈米矽。珠磨機內之珠粒之直徑設為0.2 mm,濕式粉碎過程中之混合液溫度設為40℃以下。獲得比表面積為105 m 2/g,微晶直徑為13.5 nm,氧相對於矽為12.5 atom%,體積平均粒徑為180 nm之奈米矽。 Example 1 70 g of commercially available silicon powder (manufactured by High Purity Chemicals) with a silicon purity of 99.9 mass %, a volume average particle diameter of 3.2 μm, and an oxygen content of 3.5 atom% relative to silicon, DISPERBYK9077 (manufactured by BYK Additives & Instruments) , DISPERBYK is a registered trademark) is set to 28 g, and methyl ethyl ketone (hereinafter, also referred to as "MEK") is set to 280 g. Mix in a stirring tank and stir thoroughly. Cover the stirring tank and supply nitrogen with a dew point of -70°C to make the tank an inert gas environment. The initial concentration of water was 0.058% by mass. The mixed solution was wet-pulverized using a bead mill (Ultra Apex Mill UAM-015 manufactured by Hiroshima Metal & Machinery Co., Ltd.) for 1.5 hours to obtain silicon nanoparticles uniformly dispersed in the dispersion medium. The diameter of the beads in the bead mill is set to 0.2 mm, and the temperature of the mixed liquid during the wet grinding process is set to below 40°C. Nano-silicon with a specific surface area of 105 m 2 /g, a crystallite diameter of 13.5 nm, an oxygen ratio of 12.5 atom% to silicon, and a volume average particle size of 180 nm was obtained.

將包含上述奈米矽之漿料、合成例1之硬化性樹脂組成物及酚系樹脂(住友電木製造之SUMILITERESIN PR-53570)以按焙燒後之組成計算而成為SiOC/C/Si=10/40/50之方式混合,並加入至三口可分離式燒瓶中。對一個口加蓋,於其餘兩個口上連接氮氣導入管、溶劑捕集裝置。向燒瓶內導入氮氣,利用磁攪拌器攪拌混合液,同時利用油浴將燒瓶加熱至120℃,蒸餾去除溶劑直至攪拌子無法移動。其後,冷卻至室溫,獲得焙燒前驅物即樹脂乾燥物。其後,於氮氣環境中在1050℃之溫度下對焙燒前驅物即樹脂乾燥物進行6小時焙燒,獲得黑色固形物。利用行星式球磨機粉碎所獲得之黑色固形物,獲得負極活性物質粉末。The slurry containing the above-mentioned nanosilicon, the curable resin composition of Synthesis Example 1, and the phenolic resin (SUMILITERESIN PR-53570 manufactured by Sumitomo Bakelite) were calculated as SiOC/C/Si=10 based on the composition after baking. Mix in a /40/50 ratio and add to a three-neck detachable flask. Cap one port, and connect the nitrogen inlet pipe and solvent capture device to the other two ports. Nitrogen gas was introduced into the flask, and the mixture was stirred using a magnetic stirrer. At the same time, the flask was heated to 120°C using an oil bath, and the solvent was distilled off until the stirring bar could no longer move. Thereafter, the mixture was cooled to room temperature to obtain a dried resin which is a calcined precursor. Thereafter, the calcined precursor, that is, the dried resin, was calcined in a nitrogen atmosphere at a temperature of 1050° C. for 6 hours to obtain a black solid. The obtained black solid matter is pulverized using a planetary ball mill to obtain negative active material powder.

針對所獲得之負極活性物質粉末,根據利用Cu-Kα射線之粉末X射線繞射(XRD)之測定結果,未檢測出歸屬於Si(111)結晶面之2θ=28.4°之繞射峰。根據能量色散X射線分析(Energy dispersive X-ray spectroscopy、EDS)結果,氮元素之含量為0.2質量%。又,拉曼散射分析測定結果為,顯示出歸屬於碳之G帶之1590 cm -1附近之峰及歸屬於D帶之1330 cm -1附近之峰,強度比I(G帶)/I(D帶)為1.4。 According to the measurement results of powder X-ray diffraction (XRD) using Cu-Kα rays for the obtained negative electrode active material powder, no diffraction peak at 2θ=28.4° attributed to the Si (111) crystal plane was detected. According to the results of energy dispersive X-ray spectroscopy (EDS), the nitrogen content is 0.2 mass%. Furthermore, the Raman scattering analysis measurement results showed a peak near 1590 cm -1 belonging to the G band of carbon and a peak near 1330 cm -1 belonging to the D band, with an intensity ratio of I(G band)/I( D band) is 1.4.

製備包含80質量%之上述負極活性物質粉末、10質量%之作為導電助劑之乙炔黑、及10質量%之作為黏合劑之CMC與SBR之混合物之混合漿料,並於銅箔上製膜。其後,於110℃進行減壓乾燥,將Li金屬箔作為相對電極來製作半電池。針對該半電池,使用二次電池充放電測定裝置(北斗公司製造),將截止電壓範圍設為0.005至1.5 V進行充放電特性之評價。充放電特性之測定結果為,初次放電容量為1630 mAh/g,初次效率為86%,5次循環後之保持率為91%。A mixed slurry containing 80% by mass of the above-mentioned negative active material powder, 10% by mass of acetylene black as a conductive additive, and 10% by mass of a mixture of CMC and SBR as a binder was prepared, and a film was formed on the copper foil. Thereafter, it was dried under reduced pressure at 110° C., and a half cell was produced using Li metal foil as a counter electrode. For this half cell, a secondary battery charge and discharge measuring device (manufactured by Beidou Corporation) was used to evaluate the charge and discharge characteristics by setting the cutoff voltage range to 0.005 to 1.5 V. The measurement results of the charge and discharge characteristics showed that the initial discharge capacity was 1630 mAh/g, the initial efficiency was 86%, and the retention rate after 5 cycles was 91%.

關於全電池之評價,使用將LiCoO 2用作正極活性物質,將鋁箔用作集電體之單層片材作為正極材料,製作正極膜,以450 mAh/g之放電容量設計值將石墨粉體與活性物質粉末混合,製作負極膜。作為非水電解質,使用將六氟化磷酸鋰以1 mol/L之濃度溶解於碳酸伸乙酯(以下,亦記為「EC」)與碳酸二乙酯(以下,亦記為「DEC」)之體積比為1/1之混合液中獲得之非水電解質溶液,作為分隔件,使用厚度30 μm之聚乙烯製微多孔質膜,以此製作層壓型鋰離子二次電池。於25℃,以1.2 mA(以正極為基準為0.25 c)之定電流對層壓型鋰離子二次電池進行充電直至測試電池之電壓達到4.2 V為止,達到4.2 V後,以將電池電壓保持於4.2 V之方式減小電流進行充電,求出放電容量。以2.5 V至4.2 V電壓範圍內之充放電為1次循環,300次循環後之容量保持率為90%。充放電後,於手套箱內之氬氣環境中拆解層壓電池,取出負極,利用EC/DEC混合液洗淨後,再靜置乾燥,之後測定電極膜之厚度。將充放電前後負極膜之厚度之變化率作為負極膨脹率。負極膨脹率為19%。將結果示於表1。 For the evaluation of the full battery, a single-layer sheet using LiCoO 2 as the cathode active material and aluminum foil as the current collector was used as the cathode material to produce a cathode film, and graphite powder was used to produce a cathode film with a discharge capacity design value of 450 mAh/g. Mix it with active material powder to make a negative electrode film. As a nonaqueous electrolyte, lithium hexafluorophosphate dissolved in ethyl carbonate (hereinafter, also referred to as "EC") and diethyl carbonate (hereinafter, also referred to as "DEC") at a concentration of 1 mol/L was used. A non-aqueous electrolyte solution obtained from a mixed liquid with a volume ratio of 1/1 was used as a separator, and a polyethylene microporous film with a thickness of 30 μm was used to produce a laminated lithium ion secondary battery. At 25°C, charge the laminated lithium-ion secondary battery at a constant current of 1.2 mA (0.25 c based on the positive electrode) until the voltage of the test battery reaches 4.2 V. After reaching 4.2 V, the battery voltage is maintained Charge by reducing the current to 4.2 V and find the discharge capacity. Taking charge and discharge in the voltage range of 2.5 V to 4.2 V as one cycle, the capacity retention rate after 300 cycles is 90%. After charging and discharging, disassemble the laminated battery in an argon atmosphere in the glove box, take out the negative electrode, wash it with EC/DEC mixture, then let it stand to dry, and then measure the thickness of the electrode film. The rate of change in the thickness of the negative electrode film before and after charging and discharging was taken as the negative electrode expansion rate. The negative electrode expansion rate is 19%. The results are shown in Table 1.

實施例2至12  除了將利用珠磨機進行濕式粉碎時混合液之添加劑之重量%及濕式粉碎之粉碎時間設為表1記載的條件以外,以與實施例1相同之方式利用珠磨機進行濕式粉碎,使用所製作之奈米矽來製作負極活性物質。藉由與實施例1相同之方法使用該負極活性物質製作半電池,並評價充放電特性。將結果示於表1。Examples 2 to 12 Except that the weight % of the additives of the mixed liquid and the grinding time of wet grinding when wet grinding using a bead mill were set to the conditions described in Table 1, the beads were used in the same manner as in Example 1. The machine is used for wet grinding, and the produced nano-silicon is used to produce negative active materials. The negative active material was used to prepare a half-cell in the same manner as in Example 1, and the charge and discharge characteristics were evaluated. The results are shown in Table 1.

實施例13  除了利用珠磨機進行濕式粉碎時混合液之水分初始濃度設為0.49質量%以外,以與實施例1相同之方式利用珠磨機進行濕式粉碎,使用所製作之奈米矽來製作負極活性物質。藉由與實施例1相同之方法使用該負極活性物質製作半電池,並評價充放電特性。將結果示於表1。Example 13 Except that the initial moisture concentration of the mixed liquid was set to 0.49% by mass when the bead mill was used for wet pulverization, the bead mill was used for wet pulverization in the same manner as in Example 1, and the prepared nanosilica was used. to make negative active materials. The negative active material was used to prepare a half-cell in the same manner as in Example 1, and the charge and discharge characteristics were evaluated. The results are shown in Table 1.

實施例14至18  除了利用珠磨機進行濕式粉碎時原料矽粉末之體積平均粒徑、及原料矽粉末中相對於矽之氧之量不同以外,以與實施例1相同之方式利用珠磨機進行濕式粉碎,使用所製作之奈米矽來製作負極活性物質。藉由與實施例1相同之方法使用該負極活性物質製作半電池,並評價充放電特性。將結果示於表1。Examples 14 to 18 Except for the volume average particle size of the raw silicon powder and the amount of oxygen relative to silicon in the raw silicon powder during wet grinding using a bead mill, a bead mill was used in the same manner as in Example 1. The machine is used for wet grinding, and the produced nano-silicon is used to produce negative active materials. The negative active material was used to prepare a half-cell in the same manner as in Example 1, and the charge and discharge characteristics were evaluated. The results are shown in Table 1.

實施例19  除了利用珠磨機進行濕式粉碎時原料矽粉末之矽純度為99重量%,體積平均粒徑為4.6 μm,且相對於矽之氧之量為1.5 atom%以外,以與實施例1相同之方式利用珠磨機進行濕式粉碎,使用所製作之奈米矽來製作負極活性物質。藉由與實施例1相同之方法使用該負極活性物質製作半電池,並評價充放電特性。將結果示於表1。Example 19 Except that the silicon purity of the raw silicon powder when wet-pulverized using a bead mill is 99% by weight, the volume average particle diameter is 4.6 μm, and the amount of oxygen relative to silicon is 1.5 atom%, it is the same as in Examples. 1 In the same way, use a bead mill for wet grinding, and use the prepared silicon nanoparticles to make negative electrode active materials. The negative active material was used to prepare a half-cell in the same manner as in Example 1, and the charge and discharge characteristics were evaluated. The results are shown in Table 1.

比較例1  除了不加入添加劑以外,以與實施例1相同之方式利用珠磨機實施濕式粉碎。增黏劇烈,粉碎中途發生凝膠化,珠磨機停止運轉。因含有奈米矽之漿料凝膠化,而不適用於下一步驟,無法繼續進行。Comparative Example 1 Except that no additives were added, wet grinding was carried out using a bead mill in the same manner as Example 1. The viscosity increase is severe, gelation occurs during crushing, and the bead mill stops running. Because the slurry containing nanosilica has gelled, it is not suitable for the next step and cannot be continued.

比較例2  除了使水分初始濃度為2.51質量%,液體溫度為60℃以上進行濕式粉碎以外,以與實施例1相同之方式利用珠磨機實施濕式粉碎。增黏劇烈,粉碎中途發生凝膠化,珠磨機停止運轉。因含有奈米矽之漿料凝膠化,而不適用於下一步驟,無法繼續進行。Comparative Example 2 Wet pulverization was carried out using a bead mill in the same manner as in Example 1, except that the initial moisture concentration was 2.51% by mass and the liquid temperature was 60°C or above for wet pulverization. The viscosity increase is severe, gelation occurs during crushing, and the bead mill stops running. Because the slurry containing nanosilica has gelled, it is not suitable for the next step and cannot be continued.

比較例3  除了向攪拌槽供給之氮氣之露點為-40℃以上以外,以與實施例1相同之方式利用珠磨機實施濕式粉碎。增黏劇烈,粉碎中途發生凝膠化,珠磨機停止運轉。因含有奈米矽之漿料凝膠化,而不適用於下一步驟,無法繼續進行。Comparative Example 3 Wet grinding was carried out using a bead mill in the same manner as in Example 1, except that the dew point of the nitrogen supplied to the stirring tank was -40°C or above. The viscosity increase is severe, gelation occurs during crushing, and the bead mill stops running. Because the slurry containing nanosilica has gelled, it is not suitable for the next step and cannot be continued.

比較例4  除了於空氣中焙燒負極活性物質之前驅物以外,以與實施例1相同之方式製作負極活性物質後,製作半電池。充放電特性之測定結果為,初次放電容量為1090 mAh/g,初次效率為61.2%。將結果示於表1。Comparative Example 4 Except for calcining the precursor of the negative active material in air, the negative active material was prepared in the same manner as in Example 1, and then a half-cell was produced. The measurement results of the charge and discharge characteristics showed that the initial discharge capacity was 1090 mAh/g and the initial efficiency was 61.2%. The results are shown in Table 1.

比較例5  除了使用體積平均粒徑為0.5 μm且相對於矽之氧之量為16 atom%之矽粉末作為原料以外,以與實施例1相同之方式進行濕式粉碎、負極活性物質之製作、及半電池之製作。結塊不鬆散,分離器(篩網)堵塞,珠磨機內之壓力上升,導致珠磨機停止運轉。無法繼續進行進一步之粉碎。Comparative Example 5 Except for using silicon powder with a volume average particle diameter of 0.5 μm and an oxygen content of 16 atom% relative to silicon as a raw material, wet grinding and preparation of negative electrode active materials were carried out in the same manner as in Example 1. and the production of half cells. The agglomerates are not loose, the separator (screen) is clogged, and the pressure in the bead mill rises, causing the bead mill to stop running. No further crushing can be carried out.

比較例6  除了使用體積平均粒徑為30 μm且相對於矽之氧之量為0.3 atom%之矽粉末作為原料以外,以與實施例1相同之方式實施濕式粉碎。無法粉碎粗大粒子,珠磨機之分離器堵塞,篩網阻塞。珠磨機內之壓力上升,導致珠磨機停止運轉。無法進一步繼續進行。Comparative Example 6 Wet pulverization was carried out in the same manner as in Example 1, except that silicon powder with a volume average particle diameter of 30 μm and an oxygen content of 0.3 atom% relative to silicon was used as a raw material. Unable to crush coarse particles, the separator of the bead mill is blocked and the screen is clogged. The pressure inside the bead mill increases, causing the bead mill to stop running. Unable to proceed further.

[評價方法]  各評價方法如下。  體積平均粒徑:使用雷射繞射式粒度分佈測定裝置(Malvern Panalytical公司製造之Mastersizer3000)進行測定。  比表面積:使用比表面積測定裝置(BELJAPAN公司製造之BELSORP-mini),利用BET法藉由氮吸附測定進行測定。 29Si-NMR:使用JEOL RESONANCE公司製造之JNM-ECA600。 [Evaluation Method] Each evaluation method is as follows. Volume average particle size: Measured using a laser diffraction particle size distribution measuring device (Mastersizer 3000 manufactured by Malvern Panalytical). Specific surface area: Measured by nitrogen adsorption measurement using the BET method using a specific surface area measuring device (BELSORP-mini manufactured by BELJAPAN Corporation). 29 Si-NMR: JNM-ECA600 manufactured by JEOL RESONANCE Co., Ltd. was used.

電池特性評價:使用二次電池充放電試驗裝置(北斗電工股份有限公司製造)測定電池特性,於室溫25℃,使截止電壓範圍為0.005至1.5 V,充放電率為0.1 C(1至3次循環)及0.2 C(4次循環以後),在定電流-定電壓式充電/定電流式放電這一設定條件下進行充放電特性之評價試驗。每次切換充放電時,以開路狀態放置30分鐘。放電容量、充電容量、初次庫侖效率與循環性(於本案中,係指於25℃對全電池進行5次循環充放電後之容量保持率)、負極膨脹率係以如下方式求出。活性物質之充電容量與放電容量:藉由半電池之充放電測定來求出。活性物質之初次庫侖效率(%)=初次放電容量(mAh/g)/初次充電容量(mAh/g)容量保持率(%@第5次)=第5次負極放電容量(mAh/g)/負極初次放電容量(mAh/g),藉由全電池(層壓電池)之測定來求出。Evaluation of battery characteristics: Use a secondary battery charge and discharge test device (manufactured by Beidou Electric Co., Ltd.) to measure the battery characteristics. At room temperature 25°C, the cut-off voltage range is 0.005 to 1.5 V, and the charge and discharge rate is 0.1 C (1 to 3 cycles) and 0.2 C (after 4 cycles), conduct an evaluation test of charge and discharge characteristics under the set conditions of constant current-constant voltage charging/constant current discharge. Each time you switch between charging and discharging, leave it in an open circuit state for 30 minutes. The discharge capacity, charging capacity, initial Coulombic efficiency and cyclability (in this case, refers to the capacity retention rate of the full battery after 5 cycles of charge and discharge at 25°C), and the negative electrode expansion rate are calculated as follows. The charge capacity and discharge capacity of the active material: determined by charge and discharge measurements of the half cell. Initial Coulombic efficiency of active material (%) = Initial discharge capacity (mAh/g)/Initial charge capacity (mAh/g) Capacity retention rate (%@5th time) = 5th negative electrode discharge capacity (mAh/g)/ The initial discharge capacity of the negative electrode (mAh/g) is determined by measuring the full battery (laminated battery).

[表1]    製造條件 結果 原料矽粉末之物性 製程條件 製程特性 奈米矽(nano-Si)物性 電池物性 體積平 均粒徑 [μm] 相對於矽 之氧之量 [atom%] 矽純度 [質量%] 水分初始濃度 [質量%] 液體 溫度 [℃] 環境氣 體露點 [℃] 添加劑量 [質量%] 粉碎 時間 [h] 焙燒 環境 能否進 行濕式 粉碎 篩網堵塞 相對於矽之氧之量[atom%] 比表 面積 [m 2/g] 微晶 直徑 [nm] 體積平 均粒徑 [nm] 放電 容量 [mAh/g] 初次 效率 [%] 5次循環後之維持率 [%] 實施例1 3.2 3.5 99.9 0.058 <40 -70 40 1.5 氮氣 12.5 105 13.5 180 1630 86 91 實施例2 3.2 3.5 99.9 0.058 <40 -70 40 2.0 氮氣 17.0 122 12.2 62 1600 84 93 實施例3 3.2 3.5 99.9 0.058 <40 -70 40 3.0 氮氣 22.0 198 10.4 42 1490 82 95 實施例4 3.2 3.5 99.9 0.058 <40 -70 40 9.0 氮氣 40.9 395 5.6 29 1265 75 96 實施例5 3.2 3.5 99.9 0.055 <40 -70 5 1.5 氮氣 6.4 102 13.3 190 1780 89 91 實施例6 3.2 3.5 99.9 0.055 <40 -70 5 2.0 氮氣 10.9 130 12.0 60 1700 87 93 實施例7 3.2 3.5 99.9 0.055 <40 -70 5 3.0 氮氣 15.9 204 10.2 41 1630 84 94 實施例8 3.2 3.5 99.9 0.055 <40 -70 5 9.0 氮氣 31.5 380 6.0 30 1280 78 96 實施例9 3.2 3.5 99.9 0.086 <40 -65 40 2.5 氮氣 21.2 143 12 58 1490 83 93 實施例10 3.2 3.5 99.9 0.059 <40 -70 40 1 氮氣 15.8 117 12.6 98.6 1580 83 92 實施例11 3.2 3.5 99.9 0.059 <40 -70 40 1.5 氮氣 19.1 - - 60.1 1510 82.5 93.2 實施例12 3.2 3.5 99.9 0.059 <40 -70 40 5 氮氣 - - - 31.2 1320 77 96 實施例13 3.2 3.5 99.9 0.49 <40 -70 - - 氮氣 21.1 - - - 1490 82 93 實施例14 1.2 8 99.9 0.089 <40 -70 - - 氮氣 24 - - - 1400 81.1 - 實施例15 4.6 1.5 99.9 0.059 <40 -70 - - 氮氣 17 122 - 62 1600 84 92.5 實施列16 9.5 0.7 99.9 0.091 <40 -70 - - 氮氣 16.7 - - - 1620 84.4 - 實施例17 18.9 0.4 99.9 0.073 <40 -70 - - 氮氣 16 - - - 1660 85 - 實施例18 1.1 1.5 99.9 0.69 <40 -70 - - 氮氣 17.1 - - - 1590 83.8 92.8 實施例19 4.6 1.5 99 0.073 <40 -70 - - 氮氣 17.5 - - - 1580 84.1 - 比較例1 3.2 3.5 99.9 0.066 <40 -70 0 5 氮氣 × 4.5 50 - >1000 - - - 比較例2 3.2 3.5 93.9 2.51 >60 -70 - - 氮氣 × - - - - - - - 比較例3 3.2 3.5 99.9 0.075 <60 >-40 - - 氮氣 × - - - - - - - 比較例4 3.2 3.5 99.9 0.059 <40 -70 40 - 空氣 20.7 138 12.1 60 1090 61.2 - 比較例5 0.5 16 99.9 0.057 <40 -70 - - 氮氣 × - - - - - - - 比較例6 30 0.3 99.9 0.33 <40 -70 - - 氮氣 × - - - - - - - [Table 1] manufacturing conditions result Physical properties of raw material silicon powder Process conditions Process characteristics Nano-Si physical properties Battery properties Volume average particle size [μm] Amount of oxygen relative to silicon [atom%] Silicon purity [mass %] Initial concentration of moisture [mass %] Liquid temperature [℃] Ambient gas dew point [℃] Additive dosage [mass %] Crushing time[h] roasting environment Can wet crushing be performed? Screen clogged Amount of oxygen relative to silicon [atom%] Specific surface area [m 2 /g] Crystallite diameter [nm] Volume average particle size [nm] Discharge capacity [mAh/g] Initial efficiency[%] Maintenance rate after 5 cycles [%] Example 1 3.2 3.5 99.9 0.058 <40 -70 40 1.5 Nitrogen without 12.5 105 13.5 180 1630 86 91 Example 2 3.2 3.5 99.9 0.058 <40 -70 40 2.0 Nitrogen without 17.0 122 12.2 62 1600 84 93 Example 3 3.2 3.5 99.9 0.058 <40 -70 40 3.0 Nitrogen without 22.0 198 10.4 42 1490 82 95 Example 4 3.2 3.5 99.9 0.058 <40 -70 40 9.0 Nitrogen without 40.9 395 5.6 29 1265 75 96 Example 5 3.2 3.5 99.9 0.055 <40 -70 5 1.5 Nitrogen without 6.4 102 13.3 190 1780 89 91 Example 6 3.2 3.5 99.9 0.055 <40 -70 5 2.0 Nitrogen without 10.9 130 12.0 60 1700 87 93 Example 7 3.2 3.5 99.9 0.055 <40 -70 5 3.0 Nitrogen without 15.9 204 10.2 41 1630 84 94 Example 8 3.2 3.5 99.9 0.055 <40 -70 5 9.0 Nitrogen without 31.5 380 6.0 30 1280 78 96 Example 9 3.2 3.5 99.9 0.086 <40 -65 40 2.5 Nitrogen without 21.2 143 12 58 1490 83 93 Example 10 3.2 3.5 99.9 0.059 <40 -70 40 1 Nitrogen without 15.8 117 12.6 98.6 1580 83 92 Example 11 3.2 3.5 99.9 0.059 <40 -70 40 1.5 Nitrogen without 19.1 - - 60.1 1510 82.5 93.2 Example 12 3.2 3.5 99.9 0.059 <40 -70 40 5 Nitrogen without - - - 31.2 1320 77 96 Example 13 3.2 3.5 99.9 0.49 <40 -70 - - Nitrogen without 21.1 - - - 1490 82 93 Example 14 1.2 8 99.9 0.089 <40 -70 - - Nitrogen without twenty four - - - 1400 81.1 - Example 15 4.6 1.5 99.9 0.059 <40 -70 - - Nitrogen without 17 122 - 62 1600 84 92.5 Implement column 16 9.5 0.7 99.9 0.091 <40 -70 - - Nitrogen without 16.7 - - - 1620 84.4 - Example 17 18.9 0.4 99.9 0.073 <40 -70 - - Nitrogen without 16 - - - 1660 85 - Example 18 1.1 1.5 99.9 0.69 <40 -70 - - Nitrogen without 17.1 - - - 1590 83.8 92.8 Example 19 4.6 1.5 99 0.073 <40 -70 - - Nitrogen without 17.5 - - - 1580 84.1 - Comparative example 1 3.2 3.5 99.9 0.066 <40 -70 0 5 Nitrogen × have 4.5 50 - >1000 - - - Comparative example 2 3.2 3.5 93.9 2.51 >60 -70 - - Nitrogen × have - - - - - - - Comparative example 3 3.2 3.5 99.9 0.075 <60 >-40 - - Nitrogen × have - - - - - - - Comparative example 4 3.2 3.5 99.9 0.059 <40 -70 40 - air without 20.7 138 12.1 60 1090 61.2 - Comparative example 5 0.5 16 99.9 0.057 <40 -70 - - Nitrogen × have - - - - - - - Comparative example 6 30 0.3 99.9 0.33 <40 -70 - - Nitrogen × have - - - - - - -

根據上述結果可知,於使用本奈米矽作為負極活性物質之情形時,循環性、初始庫侖效率及容量保持率均較高,又,該等二次電池之特性之平衡優異。又,包含本活性物質作為負極活性物質之二次電池之電池特性優異。According to the above results, it can be seen that when the present nanosilica is used as the negative electrode active material, the cyclability, initial Coulombic efficiency and capacity retention rate are all high, and the balance of the characteristics of these secondary batteries is excellent. Furthermore, a secondary battery containing the present active material as a negative electrode active material has excellent battery characteristics.

without

without

Claims (12)

一種奈米矽,其比表面積為100至400 m 2/g,且氧原子相對於矽原子為5至45 atom%。 A kind of nano silicon has a specific surface area of 100 to 400 m 2 /g, and oxygen atoms are 5 to 45 atom% relative to silicon atoms. 如請求項1之奈米矽,其微晶直徑為5至14 nm。For example, the nano-silicon of claim 1 has a crystallite diameter of 5 to 14 nm. 如請求項1或2之奈米矽,其體積平均粒徑為10至200 nm。For example, the volume average particle size of silicon nanoparticles in claim 1 or 2 is 10 to 200 nm. 一種奈米矽漿料,其包含請求項1或2之奈米矽、分散劑及溶劑。A nanosilicon slurry comprising the nanosilicon of claim 1 or 2, a dispersant and a solvent. 一種奈米矽之製造方法,其係於露點溫度為-60℃以下之氣體環境下,在溫度為60℃以下且水分濃度為10000 ppm以下之非水溶劑中對矽粉末進行濕式粉碎。A method for manufacturing nano-silicon, which involves wet-pulverizing silicon powder in a non-aqueous solvent with a temperature below 60°C and a moisture concentration below 10,000 ppm in a gas environment with a dew point temperature of -60°C or below. 如請求項5之奈米矽之製造方法,其於包含選自由陽離子性界面活性劑、陰離子性界面活性劑及兩性界面活性劑所組成之群中之至少1種界面活性劑之非水溶劑中進行上述濕式粉碎。As claimed in claim 5, the method for producing nanosilica is in a non-aqueous solvent containing at least one surfactant selected from the group consisting of cationic surfactants, anionic surfactants and amphoteric surfactants. The above-mentioned wet grinding is carried out. 如請求項5或6之奈米矽之製造方法,其於上述濕式粉碎中,在非水溶劑中對體積平均粒徑為1至20 μm且氧原子相對於矽原子為10 atom%以下之矽粉末進行濕式粉碎。For example, the manufacturing method of nano-silica according to claim 5 or 6, wherein in the above-mentioned wet grinding, the volume average particle diameter is 1 to 20 μm in a non-aqueous solvent and the oxygen atom is 10 atom% or less relative to the silicon atom. Silicon powder is wet-pulverized. 如請求項5或6之奈米矽之製造方法,其中,於上述濕式粉碎中,矽粉末之純度為99質量%以上。The method for producing nano-silicon according to claim 5 or 6, wherein in the above-mentioned wet grinding, the purity of the silicon powder is 99 mass% or more. 一種二次電池用活性物質之製造方法,其係將藉由請求項5或6之奈米矽之製造方法獲得之奈米矽與樹脂混合,乾燥後於非活性氣體環境下進行焙燒。A method for manufacturing an active material for secondary batteries, which includes mixing nano-silicon obtained by the method for manufacturing nano-silicon according to claim 5 or 6 with resin, drying and then baking in an inactive gas environment. 一種二次電池用活性物質,其含有請求項1或2之奈米矽。An active material for secondary batteries, which contains silicon nanoparticles according to claim 1 or 2. 一種二次電池用負極,其包含請求項10之二次電池用活性物質。A negative electrode for secondary batteries, which contains the active material for secondary batteries of claim 10. 一種二次電池,其包含請求項11之二次電池用負極。A secondary battery including the negative electrode for the secondary battery of claim 11.
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