JP7491482B2 - Active material for secondary battery, method for producing active material for secondary battery, and secondary battery - Google Patents
Active material for secondary battery, method for producing active material for secondary battery, and secondary battery Download PDFInfo
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- JP7491482B2 JP7491482B2 JP2023543159A JP2023543159A JP7491482B2 JP 7491482 B2 JP7491482 B2 JP 7491482B2 JP 2023543159 A JP2023543159 A JP 2023543159A JP 2023543159 A JP2023543159 A JP 2023543159A JP 7491482 B2 JP7491482 B2 JP 7491482B2
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- active material
- carbon
- secondary battery
- silicon
- silicon oxide
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- 239000011149 active material Substances 0.000 title claims description 153
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000002245 particle Substances 0.000 claims description 150
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 115
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 114
- -1 silicate compound Chemical class 0.000 claims description 107
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 106
- 229910052799 carbon Inorganic materials 0.000 claims description 104
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 81
- 229910052710 silicon Inorganic materials 0.000 claims description 74
- 239000010703 silicon Substances 0.000 claims description 71
- 238000000576 coating method Methods 0.000 claims description 43
- 239000011248 coating agent Substances 0.000 claims description 42
- 229910052751 metal Inorganic materials 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 39
- 239000002243 precursor Substances 0.000 claims description 38
- 239000007773 negative electrode material Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 32
- 239000002131 composite material Substances 0.000 claims description 27
- 229910052744 lithium Inorganic materials 0.000 claims description 27
- 239000011258 core-shell material Substances 0.000 claims description 21
- 238000001035 drying Methods 0.000 claims description 13
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- 239000012298 atmosphere Substances 0.000 claims description 11
- 239000007789 gas Substances 0.000 claims description 10
- 229910052749 magnesium Inorganic materials 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 10
- 238000002441 X-ray diffraction Methods 0.000 claims description 9
- 229910052791 calcium Inorganic materials 0.000 claims description 9
- 239000011261 inert gas Substances 0.000 claims description 9
- 229910052700 potassium Inorganic materials 0.000 claims description 9
- 229910052708 sodium Inorganic materials 0.000 claims description 9
- 238000001354 calcination Methods 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 239000002296 pyrolytic carbon Substances 0.000 claims description 4
- 238000001237 Raman spectrum Methods 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 description 57
- 229920001296 polysiloxane Polymers 0.000 description 49
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 43
- 239000002002 slurry Substances 0.000 description 41
- 229920005989 resin Polymers 0.000 description 39
- 239000011347 resin Substances 0.000 description 39
- 239000012071 phase Substances 0.000 description 36
- 239000000203 mixture Substances 0.000 description 29
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 25
- 239000010410 layer Substances 0.000 description 25
- 239000007787 solid Substances 0.000 description 24
- 229910001416 lithium ion Inorganic materials 0.000 description 23
- 229920000642 polymer Polymers 0.000 description 22
- 239000000843 powder Substances 0.000 description 22
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 21
- 238000005259 measurement Methods 0.000 description 21
- 239000002904 solvent Substances 0.000 description 21
- ADKPKEZZYOUGBZ-UHFFFAOYSA-N [C].[O].[Si] Chemical class [C].[O].[Si] ADKPKEZZYOUGBZ-UHFFFAOYSA-N 0.000 description 20
- 238000010304 firing Methods 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 229910052757 nitrogen Inorganic materials 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 150000003839 salts Chemical class 0.000 description 18
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 17
- 239000002270 dispersing agent Substances 0.000 description 16
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 16
- 230000014759 maintenance of location Effects 0.000 description 15
- 239000003960 organic solvent Substances 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 14
- 238000006482 condensation reaction Methods 0.000 description 14
- 238000011156 evaluation Methods 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 14
- 229910052914 metal silicate Inorganic materials 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 239000011230 binding agent Substances 0.000 description 12
- 239000005011 phenolic resin Substances 0.000 description 12
- 238000011282 treatment Methods 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 125000005372 silanol group Chemical group 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 10
- 230000007062 hydrolysis Effects 0.000 description 10
- 238000006460 hydrolysis reaction Methods 0.000 description 10
- 150000002739 metals Chemical class 0.000 description 10
- 239000011259 mixed solution Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229920001568 phenolic resin Polymers 0.000 description 10
- 239000011342 resin composition Substances 0.000 description 10
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 10
- 238000007599 discharging Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 239000011777 magnesium Substances 0.000 description 9
- 238000002156 mixing Methods 0.000 description 9
- 230000002829 reductive effect Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- 239000011255 nonaqueous electrolyte Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 238000005979 thermal decomposition reaction Methods 0.000 description 8
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 239000000805 composite resin Substances 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 238000010298 pulverizing process Methods 0.000 description 7
- 229920002554 vinyl polymer Polymers 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 6
- 239000010439 graphite Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 229910003481 amorphous carbon Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 239000011324 bead Substances 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 5
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- 238000000634 powder X-ray diffraction Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 229910000077 silane Inorganic materials 0.000 description 5
- 229920003048 styrene butadiene rubber Polymers 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 4
- LTPSRQRIPCVMKQ-UHFFFAOYSA-N 2-amino-5-methylbenzenesulfonic acid Chemical compound CC1=CC=C(N)C(S(O)(=O)=O)=C1 LTPSRQRIPCVMKQ-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 102100027370 Parathymosin Human genes 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000003795 desorption Methods 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 238000003780 insertion Methods 0.000 description 4
- 230000037431 insertion Effects 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 229920000570 polyether Chemical group 0.000 description 4
- 239000002210 silicon-based material Substances 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- 229910004283 SiO 4 Inorganic materials 0.000 description 3
- 239000002174 Styrene-butadiene Substances 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- 125000003302 alkenyloxy group Chemical group 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000005336 allyloxy group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000006399 behavior Effects 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 3
- 239000002482 conductive additive Substances 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000007323 disproportionation reaction Methods 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- QPPQHRDVPBTVEV-UHFFFAOYSA-N isopropyl dihydrogen phosphate Chemical compound CC(C)OP(O)(O)=O QPPQHRDVPBTVEV-UHFFFAOYSA-N 0.000 description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 3
- 229910001947 lithium oxide Inorganic materials 0.000 description 3
- 229910052912 lithium silicate Inorganic materials 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000011856 silicon-based particle Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000001694 spray drying Methods 0.000 description 3
- 239000002641 tar oil Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910001887 tin oxide Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 125000005919 1,2,2-trimethylpropyl group Chemical group 0.000 description 2
- 125000005918 1,2-dimethylbutyl group Chemical group 0.000 description 2
- 125000006218 1-ethylbutyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 2
- 125000005916 2-methylpentyl group Chemical group 0.000 description 2
- 125000003542 3-methylbutan-2-yl group Chemical group [H]C([H])([H])C([H])(*)C([H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000005917 3-methylpentyl group Chemical group 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 229910032387 LiCoO2 Inorganic materials 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229920000388 Polyphosphate Polymers 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000006230 acetylene black Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 125000002344 aminooxy group Chemical group [H]N([H])O[*] 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 229920006184 cellulose methylcellulose Polymers 0.000 description 2
- 239000011362 coarse particle Substances 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 229910052634 enstatite Inorganic materials 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229910052839 forsterite Inorganic materials 0.000 description 2
- 239000000295 fuel oil Substances 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 2
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 2
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000011295 pitch Substances 0.000 description 2
- 229920001281 polyalkylene Polymers 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000001205 polyphosphate Substances 0.000 description 2
- 235000011176 polyphosphates Nutrition 0.000 description 2
- 239000007774 positive electrode material Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229920003987 resole Polymers 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- GUGNSJAORJLKGP-UHFFFAOYSA-K sodium 8-methoxypyrene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].C1=C2C(OC)=CC(S([O-])(=O)=O)=C(C=C3)C2=C2C3=C(S([O-])(=O)=O)C=C(S([O-])(=O)=O)C2=C1 GUGNSJAORJLKGP-UHFFFAOYSA-K 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- FKHIFSZMMVMEQY-UHFFFAOYSA-N talc Chemical compound [Mg+2].[O-][Si]([O-])=O FKHIFSZMMVMEQY-UHFFFAOYSA-N 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 238000002076 thermal analysis method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 1
- VAYTZRYEBVHVLE-UHFFFAOYSA-N 1,3-dioxol-2-one Chemical compound O=C1OC=CO1 VAYTZRYEBVHVLE-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- WKFQMDFSDQFAIC-UHFFFAOYSA-N 2,4-dimethylthiolane 1,1-dioxide Chemical compound CC1CC(C)S(=O)(=O)C1 WKFQMDFSDQFAIC-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- AFSSYGZIYMAAOC-UHFFFAOYSA-N 2-butylperoxy-2-ethylhexanoic acid Chemical compound CCCCOOC(CC)(C(O)=O)CCCC AFSSYGZIYMAAOC-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- VWIIJDNADIEEDB-UHFFFAOYSA-N 3-methyl-1,3-oxazolidin-2-one Chemical compound CN1CCOC1=O VWIIJDNADIEEDB-UHFFFAOYSA-N 0.000 description 1
- CMJLMPKFQPJDKP-UHFFFAOYSA-N 3-methylthiolane 1,1-dioxide Chemical compound CC1CCS(=O)(=O)C1 CMJLMPKFQPJDKP-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- SBLRHMKNNHXPHG-UHFFFAOYSA-N 4-fluoro-1,3-dioxolan-2-one Chemical compound FC1COC(=O)O1 SBLRHMKNNHXPHG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical group NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- 229910001556 Li2Si2O5 Inorganic materials 0.000 description 1
- 229910007562 Li2SiO3 Inorganic materials 0.000 description 1
- 229910015015 LiAsF 6 Inorganic materials 0.000 description 1
- 229910013063 LiBF 4 Inorganic materials 0.000 description 1
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- 229910011396 LiCoxNiyMnzO2 Inorganic materials 0.000 description 1
- 229910001305 LiMPO4 Inorganic materials 0.000 description 1
- 229910002993 LiMnO2 Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- 229910012424 LiSO 3 Inorganic materials 0.000 description 1
- 229910002097 Lithium manganese(III,IV) oxide Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229910016003 MoS3 Inorganic materials 0.000 description 1
- 229910016040 MoV2O8 Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Chemical group 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 229910003092 TiS2 Inorganic materials 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- KLARSDUHONHPRF-UHFFFAOYSA-N [Li].[Mn] Chemical compound [Li].[Mn] KLARSDUHONHPRF-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000012648 alternating copolymerization Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 229910021383 artificial graphite Inorganic materials 0.000 description 1
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- DISYGAAFCMVRKW-UHFFFAOYSA-N butyl ethyl carbonate Chemical compound CCCCOC(=O)OCC DISYGAAFCMVRKW-UHFFFAOYSA-N 0.000 description 1
- FWBMVXOCTXTBAD-UHFFFAOYSA-N butyl methyl carbonate Chemical compound CCCCOC(=O)OC FWBMVXOCTXTBAD-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000013064 chemical raw material Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 239000011294 coal tar pitch Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007771 core particle Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- VUPKGFBOKBGHFZ-UHFFFAOYSA-N dipropyl carbonate Chemical compound CCCOC(=O)OCCC VUPKGFBOKBGHFZ-UHFFFAOYSA-N 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- CYEDOLFRAIXARV-UHFFFAOYSA-N ethyl propyl carbonate Chemical compound CCCOC(=O)OCC CYEDOLFRAIXARV-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000007849 furan resin Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium oxide Inorganic materials O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910000625 lithium cobalt oxide Inorganic materials 0.000 description 1
- 229910002102 lithium manganese oxide Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- DMEJJWCBIYKVSB-UHFFFAOYSA-N lithium vanadium Chemical class [Li].[V] DMEJJWCBIYKVSB-UHFFFAOYSA-N 0.000 description 1
- BFZPBUKRYWOWDV-UHFFFAOYSA-N lithium;oxido(oxo)cobalt Chemical compound [Li+].[O-][Co]=O BFZPBUKRYWOWDV-UHFFFAOYSA-N 0.000 description 1
- VROAXDSNYPAOBJ-UHFFFAOYSA-N lithium;oxido(oxo)nickel Chemical compound [Li+].[O-][Ni]=O VROAXDSNYPAOBJ-UHFFFAOYSA-N 0.000 description 1
- VLXXBCXTUVRROQ-UHFFFAOYSA-N lithium;oxido-oxo-(oxomanganiooxy)manganese Chemical compound [Li+].[O-][Mn](=O)O[Mn]=O VLXXBCXTUVRROQ-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011302 mesophase pitch Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- KKQAVHGECIBFRQ-UHFFFAOYSA-N methyl propyl carbonate Chemical compound CCCOC(=O)OC KKQAVHGECIBFRQ-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000011268 mixed slurry Substances 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- TVWWSIKTCILRBF-UHFFFAOYSA-N molybdenum trisulfide Chemical compound S=[Mo](=S)=S TVWWSIKTCILRBF-UHFFFAOYSA-N 0.000 description 1
- 239000005543 nano-size silicon particle Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 1
- 229910021382 natural graphite Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 238000002429 nitrogen sorption measurement Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229910052609 olivine Inorganic materials 0.000 description 1
- 239000010450 olivine Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000005486 organic electrolyte Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000011301 petroleum pitch Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002755 poly(epichlorohydrin) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920003257 polycarbosilane Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001709 polysilazane Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910021426 porous silicon Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000001749 primary amide group Chemical group 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000005920 sec-butoxy group Chemical group 0.000 description 1
- 150000003334 secondary amides Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910021384 soft carbon Inorganic materials 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000005415 substituted alkoxy group Chemical group 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 239000011269 tar Substances 0.000 description 1
- 125000004213 tert-butoxy group Chemical group [H]C([H])([H])C(O*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000001238 wet grinding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
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- H—ELECTRICITY
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- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
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Description
本発明は、二次電池用活物質およびその製造方法に関する。また本発明は前記二次電池用活物質を負極に含む二次電池に関する。The present invention relates to an active material for a secondary battery and a method for producing the same. The present invention also relates to a secondary battery containing the active material for a secondary battery in the negative electrode.
非水電解質二次電池は、携帯機器を始め、ハイブリッド自動車や電気自動車、家庭用蓄電池などに用いられており、電気容量、安全性、作動安定性など複数の特性をバランスよく有することが要求されている。
さらに近年、各種電子機器および通信機器の小型化およびハイブリッド自動車等の急速な普及に伴い、これら機器等の駆動電源として、より高容量であり、かつサイクル特性や放電レート特性等の各種電池特性が更に向上したリチウムイオン二次電池の開発が強く求められている。
Non-aqueous electrolyte secondary batteries are used in portable devices, hybrid and electric vehicles, home storage batteries, and the like, and are required to have a good balance of multiple characteristics such as electric capacity, safety, and operational stability.
Furthermore, in recent years, with the miniaturization of various electronic devices and communication devices and the rapid spread of hybrid automobiles and the like, there has been a strong demand for the development of lithium ion secondary batteries that have higher capacity and further improved various battery characteristics, such as cycle characteristics and discharge rate characteristics, as a driving power source for these devices and the like.
リチウムイオン二次電池用の負極活物質として、ケイ素や無定形である酸化ケイ素はその容量が大きいということで大きな関心を持たれているが、繰り返し充放電をしたときの体積膨張が大きく、サイクル性に劣っている。また、酸化ケイ素を用いたリチウム二次電池は初期効率が低いことから、酸化ケイ素を負極活物質に用いるための様々な改良が試みられている。
例えば特許文献1には金属ケイ素またはケイ素含有化合物、および軟化点もしくは融点を有するケイ素を含まない有機化合物を共に不活性ガス中または真空中にて、特定の温度で炭化させて得られる多孔性ケイ素含有炭素系複合材料が提案されている。
Silicon and amorphous silicon oxide have attracted much attention as negative electrode active materials for lithium ion secondary batteries because of their large capacity, but they have poor cycle performance due to their large volume expansion during repeated charging and discharging. In addition, lithium secondary batteries using silicon oxide have low initial efficiency, so various improvements have been attempted to use silicon oxide as a negative electrode active material.
For example, Patent Document 1 proposes a porous silicon-containing carbon-based composite material obtained by carbonizing metallic silicon or a silicon-containing compound and a silicon-free organic compound having a softening point or melting point together in an inert gas or in vacuum at a specific temperature.
しかしながら、酸化珪素は、充電時に不可逆な珪酸リチウムを生成させる酸素原子を多く含んでおり、初回効率が低いという課題がある。そのため、実際に電池を作製した場合に、正極の電池容量を過剰に必要とし、活物質の容量増加分に見合うだけの電池容量の増加が認められなかった。However, silicon oxide contains many oxygen atoms that generate irreversible lithium silicate during charging, which poses the problem of low initial efficiency. As a result, when a battery was actually fabricated, an excessive battery capacity was required for the positive electrode, and an increase in battery capacity commensurate with the increase in active material capacity was not observed.
特許文献2には前記の課題を解決するために、珪素微結晶がシロキサン結合を介して分散し、珪素微結晶間に微細な空間を有する構造を有する、非水電解質二次電池負極材用珪素酸化物が提案されている。
しかしながら酸化珪素をリチウムイオン二次電池用負極活物質として使用した時に、多回数の充放電後の急激な充放電容量低下の原因については、リチウムを大量に吸蔵および放出することによって大きな体積変化が起こり、これに伴い粒子の破壊が起こるためと考えられている。
In order to solve the above problems, Patent Document 2 proposes a silicon oxide for use as a negative electrode material for non-aqueous electrolyte secondary batteries, in which silicon crystallites are dispersed via siloxane bonds and have a structure having minute spaces between the silicon crystallites.
However, when silicon oxide is used as a negative electrode active material for lithium ion secondary batteries, a rapid decrease in charge/discharge capacity after repeated charge/discharge cycles is thought to be due to a large volume change caused by the absorption and release of a large amount of lithium, which leads to particle destruction.
この体積変化に伴う粒子の破壊を抑制するために、特許文献3ではシリコンナノ粒子がなくともケイ素、酸素および炭素を含有するコート層を有し、特定のBET比表面積と粒径が特定の条件を満たす構造体が開示されている。In order to suppress particle destruction due to this volume change, Patent Document 3 discloses a structure that has a coating layer containing silicon, oxygen, and carbon, even without silicon nanoparticles, and has a specific BET specific surface area and particle size that satisfy specific conditions.
しかしながら前記文献に開示されている物質を二次電池用の負極として用いた場合でも、サイクル性は未だ十分ではなかった。したがって電気容量の大きい酸化ケイ素を用いたリチウム二次電池のサイクル性および初期効率のさらなる改良が求められている。However, even when the material disclosed in the above document is used as the negative electrode for a secondary battery, the cycleability is still insufficient. Therefore, there is a need for further improvement in the cycleability and initial efficiency of lithium secondary batteries using silicon oxide, which has a large electric capacity.
本発明者らは酸化ケイ素の体積変化に伴う粒子の破壊を抑制し、リチウム二次電池のサイクル性を改良し、高電気容量である酸化ケイ素を用いた二次電池用活物質を検討した。その結果、リチウム二次電池のサイクル性、初期のクーロン効率および容量維持率が改良される二次電池用複合活物質を見出した。
即ち本発明は、リチウムイオン二次電池に用いられる二次電池用活物質および前記二次電池用活物質を負極活物質として含む二次電池に関し、サイクル性、初期のクーロン効率および容量維持率に優れた二次電池を与える二次電池用活物質を提供することを目的とする。
The present inventors have investigated a secondary battery active material using silicon oxide that suppresses particle destruction due to volume change of silicon oxide, improves the cycle performance of lithium secondary batteries, and has a high electric capacity, and as a result, have found a secondary battery composite active material that improves the cycle performance, initial coulombic efficiency, and capacity retention rate of lithium secondary batteries.
That is, the present invention relates to an active material for a secondary battery used in a lithium ion secondary battery and a secondary battery containing the active material for a secondary battery as a negative electrode active material, and aims to provide an active material for a secondary battery that provides a secondary battery excellent in cycle performance, initial coulombic efficiency, and capacity retention rate.
本発明は、下記の態様を有する。
[1] 酸化ケイ素含有粒子をコアとし、シリコンオキシカーバイド含有相をシェル層とするコアシェル複合構造体を有する二次電池用活物質。
[2] 前記シェル層は、平均厚みが5nmから500nmである前記[1]に記載の二次電池用活物質。
[3] 前記酸化ケイ素含有粒子の平均粒径が1μm以上20μm以下である前記[1]または[2]のいずれかに記載の二次電池用活物質。
[4] X線回折において2θが28.4°付近のSi(111)に帰属されるピークを有する前記[1]から[3]のいずれかに記載の二次電池用活物質。
[5] 比表面積が0.3m2/g以上10m2/g以下である前記[1]から[4]のいずれかに記載の二次電池用活物質。
[6] 前記シリコンオキシカーバイド含有相は更に窒素原子を含む前記[1]から[5]のいずれかに記載の二次電池用活物質。
[7] ラマンスペクトルにおいて、炭素構造のGバンドとDバンドに帰属する1590cm-1と1330cm-1付近の散乱ピークを有し、それらの散乱ピークの強度比I(Gバンド)/I(Dバンド)が、0.7から2である前記[1]から[6]のいずれかに記載の二次電池用活物質。
[8] 前記コアシェル複合構造体の表面に炭素の被膜を有し、前記コアシェル複合構造体の全体質量を100質量%として、炭素被膜量が1質量%以上10質量%以下である前記[1]から[7]のいずれかに記載の二次電池用活物質。
[9] Li、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属のシリケート化合物を有する前記[1]から[8]のいずれかに記載の二次電池用活物質。
The present invention has the following aspects.
[1] An active material for a secondary battery having a core-shell composite structure with a silicon oxide-containing particle as a core and a silicon oxycarbide-containing phase as a shell layer.
[2] The active material for a secondary battery according to [1], wherein the shell layer has an average thickness of 5 nm to 500 nm.
[3] The active material for a secondary battery according to either [1] or [2], wherein the silicon oxide-containing particles have an average particle size of 1 μm or more and 20 μm or less.
[4] The active material for a secondary battery according to any one of [1] to [3] above, which has a peak at 2θ of about 28.4° in X-ray diffraction, which is attributed to Si(111).
[5] The active material for a secondary battery according to any one of [1] to [4] above, which has a specific surface area of 0.3 m 2 /g or more and 10 m 2 /g or less.
[6] The active material for a secondary battery according to any one of [1] to [5], wherein the silicon oxycarbide-containing phase further contains nitrogen atoms.
[7] The active material for a secondary battery according to any one of [1] to [6], which has scattering peaks at about 1590 cm −1 and 1330 cm −1 which belong to the G band and D band of a carbon structure in a Raman spectrum, and the intensity ratio I (G band)/I (D band) of these scattering peaks is 0.7 to 2.
[8] The active material for a secondary battery according to any one of [1] to [7], wherein a carbon coating is provided on a surface of the core-shell composite structure, and the amount of the carbon coating is 1 mass % or more and 10 mass % or less, with the total mass of the core-shell composite structure being 100 mass %.
[9] The active material for a secondary battery according to any one of [1] to [8] above, which contains a silicate compound of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al.
また本発明は、下記の態様を有する。
[10] 下記(1)から(3)の工程を含む前記[1]から[9]のいずれかに記載の二次電池用活物質の製造方法。
(1)前記シェル層作製用前駆体を得る工程
(2)前記酸化ケイ素含有粒子の表面に前記シェル層作製用前駆体を塗布および乾燥する工程
(3)不活性ガス雰囲気中、焼成温度900℃から1300℃で高温焼成して負極活物質を得る工程
[11] さらに下記(4)の工程を含む前記[10]に記載の二次電池用活物質の製造方法。
(4)化学気相蒸着装置内で、熱分解性炭素源ガスとキャリア不活性ガスフローの中、700℃から1000℃の温度範囲にて炭素被膜で被覆して負極活物質を得る工程。
[12] 前記[1]から[9]のいずれかに記載の二次電池用活物質を負極に含む二次電池。
The present invention also has the following aspects.
[10] A method for producing an active material for a secondary battery according to any one of [1] to [9] above, comprising the following steps (1) to (3):
(1) a step of obtaining a precursor for preparing the shell layer, (2) a step of applying the precursor for preparing the shell layer to the surface of the silicon oxide-containing particle and drying the precursor, and (3) a step of calcining at a high temperature in an inert gas atmosphere at a calcination temperature of 900° C. to 1300° C. to obtain a negative electrode active material. [11] The method for producing an active material for a secondary battery according to the above [10], further comprising the following step (4):
(4) A step of coating the negative electrode active material with a carbon film in a chemical vapor deposition apparatus at a temperature range of 700° C. to 1000° C. in a flow of a pyrolytic carbon source gas and a carrier inert gas to obtain a negative electrode active material.
[12] A secondary battery comprising the active material for secondary batteries according to any one of [1] to [9] in a negative electrode.
本発明によれば、リチウムイオン二次電池に用いられる二次電池用活物質および前記二次電池用活物質を負極活物質として含む二次電池に関し、サイクル性、体積膨張および初期のクーロン効率に優れた二次電池を与える二次電池用活物質が提供される。According to the present invention, there is provided an active material for a secondary battery used in a lithium ion secondary battery, and a secondary battery containing the active material for a secondary battery as a negative electrode active material, which provides a secondary battery excellent in cycleability, volume expansion, and initial coulombic efficiency.
本発明の二次電池用活物質(以下、「本活物質」とも記す。)は酸化ケイ素含有粒子をコア(以下、「本コア」とも記す。)とし、シリコンオキシカーバイド含有相をシェル層(以下、「本シェル層」とも記す。)とするコアシェル複合構造を有する。
前記のとおり、酸化ケイ素は、高容量であるがリチウムを大量に吸蔵および放出することによって大きな体積変化が起こり、その結果、サイクル性に劣ると考えられる。一方、シリコンオキシカーバイド相は比較的低容量ではあるが、リチウムの吸蔵および放出に対して体積変化が小さく、サイクル特性に優れる。本活物質は前者をコアとし、後者をシェル層とすることで、高容量維持の上に体積膨張やサイクル特性に優れた二次電池を与える二次電池用活物質が得られたと考えられる。
The active material for secondary batteries of the present invention (hereinafter also referred to as "the active material") has a core-shell composite structure in which a silicon oxide-containing particle serves as a core (hereinafter also referred to as "the core") and a silicon oxycarbide-containing phase serves as a shell layer (hereinafter also referred to as "the shell layer").
As mentioned above, silicon oxide has a high capacity, but a large volume change occurs when a large amount of lithium is absorbed and released, which is thought to result in poor cycle performance. On the other hand, silicon oxycarbide phase has a relatively low capacity, but the volume change is small when lithium is absorbed and released, and it has excellent cycle characteristics. By using the former as the core and the latter as the shell layer, it is thought that a secondary battery active material has been obtained that provides a secondary battery that maintains high capacity and has excellent volume expansion and cycle characteristics.
酸化ケイ素とは、通常、二酸化珪素と金属珪素との混合物を加熱して生成した一酸化珪素ガスを冷却し析出して得られた非晶質の珪素酸化物の総称であり、下記一般式(1)で表される。
SiOn (1)
ただし、前記式(1)において、nは0.4以上1.8以下であり、0.5以上1.6以下が好ましい。
Silicon oxide is a general term for amorphous silicon oxide obtained by heating a mixture of silicon dioxide and metallic silicon to produce silicon monoxide gas, which is then cooled and precipitated, and is represented by the following general formula (1).
SiON (1)
In the formula (1), n is from 0.4 to 1.8, and preferably from 0.5 to 1.6.
酸化ケイ素含有粒子は前記酸化ケイ素以外に他の成分を含んでいてもよく、例えば金属スズ、酸化スズ、ゲルマニウム、酸化ゲルマニウムなどを含んでもよい。
また酸化ケイ素は不均化反応により0価のケイ素を生成する場合があるが、酸化ケイ素含有粒子は得られる本活物質の高容量化、高初回効率の観点から、不均化によって生成した0価のケイ素を含んでいてもよい。酸化ケイ素含有粒子が0価のケイ素を含む場合、本活物質をX線回折分析した場合、X線回折パターンにおいて2θが28.4°付近のSi(111)面に帰属されるピークが検出される。
酸化ケイ素含有粒子に別途、0価のケイ素を添加してもよいが、酸化ケイ素含有粒子が含む0価のケイ素は前記不均化反応により生成した0価のケイ素であるのが、0価ケイ素の結晶子が比較的に小さいので好ましい。
The silicon oxide-containing particles may contain other components in addition to the silicon oxide, such as metal tin, tin oxide, germanium, germanium oxide, and the like.
In addition, silicon oxide may generate zero-valent silicon by disproportionation reaction, and the silicon oxide-containing particles may contain zero-valent silicon generated by disproportionation from the viewpoint of increasing the capacity and initial efficiency of the present active material obtained. When the silicon oxide-containing particles contain zero-valent silicon, when the present active material is subjected to X-ray diffraction analysis, a peak at 2θ of about 28.4°, which is assigned to the Si(111) plane, is detected in the X-ray diffraction pattern.
Although zero-valent silicon may be added separately to the silicon oxide-containing particles, it is preferable that the zero-valent silicon contained in the silicon oxide-containing particles is zero-valent silicon produced by the disproportionation reaction, since the crystallites of zero-valent silicon are relatively small.
酸化ケイ素含有粒子の平均粒径が大きすぎる場合、酸化ケイ素含有粒子は大きな塊となり、本活物質を負極活物質とした時、充放電時に酸化ケイ素含有粒子による負極活物質の大きな膨張収縮が起こる。その結果、マトリクス内の一部に応力が集中するため活物質の構造崩壊が起きやすく、負極活物質の容量維持率が低下する傾向がある。一方、酸化ケイ素含有粒子の平均粒径が小さすぎると、酸化ケイ素含有粒子同士が凝集しやすくなる。そのため、負極活物質中への酸化ケイ素含有粒子の分散性が低下する可能性がある。また、酸化ケイ素含有粒子が細かすぎると、その比表面積が高くなり、負極活物質の高温焼成で酸化ケイ素含有粒子の表面上に副生成物などが多くなる傾向もある。これらが充放電性能の低下に繋がるおそれがある。If the average particle size of the silicon oxide-containing particles is too large, the silicon oxide-containing particles will become large lumps, and when this active material is used as a negative electrode active material, the silicon oxide-containing particles will cause large expansion and contraction of the negative electrode active material during charging and discharging. As a result, stress will be concentrated in a part of the matrix, which will easily cause the structure of the active material to collapse, and the capacity retention rate of the negative electrode active material will tend to decrease. On the other hand, if the average particle size of the silicon oxide-containing particles is too small, the silicon oxide-containing particles will easily aggregate with each other. This may reduce the dispersibility of the silicon oxide-containing particles in the negative electrode active material. In addition, if the silicon oxide-containing particles are too fine, their specific surface area will be high, and there will be a tendency for by-products and the like to increase on the surface of the silicon oxide-containing particles during high-temperature sintering of the negative electrode active material. These may lead to a decrease in charge and discharge performance.
したがって、本コアとなる酸化ケイ素含有粒子の平均粒径は前記の観点から、20μm以下が好ましく、15μm以下がより好ましい。また酸化ケイ素含有粒子の平均粒径は粒子分散性と比表面積の観点から、1μm以上が好ましく、2μm以上がより好ましい。
ここで平均粒径はレーザー回折式粒度分析計などを用いて測定することができるD50の値である。D50は、レーザー粒度分析計などを用い動的光散乱法により測定することができる。本酸化ケイ素粒子の平均粒径は、粒子径分布において、小径側から体積累積分布曲線を描いた場合に、累積50%となるときの粒子径である。
From the above viewpoints, the average particle size of the silicon oxide-containing particles serving as the core is preferably 20 μm or less, more preferably 15 μm or less, and from the viewpoints of particle dispersibility and specific surface area, the average particle size of the silicon oxide-containing particles is preferably 1 μm or more, more preferably 2 μm or more.
Here, the average particle size is the value of D50, which can be measured using a laser diffraction particle size analyzer, etc. D50 can be measured by a dynamic light scattering method using a laser particle size analyzer, etc. The average particle size of the present silicon oxide particles is the particle size at which the cumulative volume distribution curve reaches 50% in the particle size distribution, when the cumulative volume distribution curve is drawn from the small diameter side.
酸化ケイ素含有粒子は、例えば平均粒径が前記範囲となるように酸化ケイ素を粉砕などで粒子化し得ることができる。
粉砕に用いる粉砕機としては、ボールミル、ビーズミル、ジェットミルなどの粉砕機が例示できる。また、粉砕は有機溶剤を用いた湿式粉砕であってもよく、有機溶剤としては、例えば、アルコール類、ケトン類などを好適に用いることができるが、トルエン、キシレン、ナフタレン、メチルナフタレンなどの芳香族炭化水素系溶剤も用いることができる。
得られた酸化ケイ素含有粒子を、ビーズ粒径、配合率、回転数または粉砕時間などのビーズミルの条件を制御し、分級等することで本酸化ケイ素含有粒子の平均粒径を前記範囲することができる。
The silicon oxide-containing particles can be prepared, for example, by pulverizing silicon oxide so as to have an average particle size within the above range.
Examples of the mill used for the pulverization include a ball mill, a bead mill, a jet mill, etc. The pulverization may be wet pulverization using an organic solvent, and as the organic solvent, for example, alcohols, ketones, etc. can be suitably used, but aromatic hydrocarbon solvents such as toluene, xylene, naphthalene, and methylnaphthalene can also be used.
The obtained silicon oxide-containing particles can be classified or the like by controlling the bead mill conditions such as bead particle size, blending ratio, rotation speed, or grinding time, thereby making it possible to make the average particle size of the present silicon oxide-containing particles fall within the above range.
酸化ケイ素含有粒子の形状は、粒状、針状、フレーク状のいずれでもよい。
酸化ケイ素含有粒子の形態は、動的光散乱法で平均粒径の測定が可能であるが、透過型電子顕微鏡(TEM)や電界放出型走査電子顕微鏡(FE-SEM)の解析手段を用いることで、サンプルのアスペクト比をより容易かつ精密に同定することができる。本発明の二次電池用材料を含有する負極活物質の場合は、サンプルを集束イオンビーム(FIB)で切断して断面をFE-SEM観察することができ、またはサンプルをスライス加工してTEM観察により本酸化ケイ素粒子の状態を同定することができる。
なお前記本酸化ケイ素粒子のアスペクト比は、TEM画像に映る視野内のサンプルの主要部分50粒子から計算により求めることができる。
The shape of the silicon oxide-containing particles may be any of granular, acicular, and flake-like.
The morphology of the silicon oxide-containing particles can be determined by measuring the average particle size using a dynamic light scattering method, but the aspect ratio of a sample can be more easily and precisely identified by using an analytical means such as a transmission electron microscope (TEM) or a field emission scanning electron microscope (FE-SEM). In the case of a negative electrode active material containing the secondary battery material of the present invention, a sample can be cut with a focused ion beam (FIB) and the cross section can be observed with an FE-SEM, or the sample can be sliced and the state of the silicon oxide particles can be identified by TEM observation.
The aspect ratio of the silicon oxide particles can be calculated from 50 particles in the main part of the sample within the field of view of the TEM image.
本シェル層はシリコンオキシカーバイド含有相からなる。シリコンオキシカーバイドはケイ素、酸素、炭素を含む化合物から構成されており、ケイ素-酸素-炭素骨格の三次元ネットワーク構造とフリー炭素を含む構造が好ましい。ここでフリー炭素とは、ケイ素-酸素-炭素の三次元骨格に含まれていない炭素である。フリー炭素は炭素相として存在する炭素、炭素相の炭素同士で結合している炭素、およびケイ素-酸素-炭素骨格と炭素相が結合している炭素を含む。
シリコンオキシカーバイド含有相は前記シリコンオキシカーバイド以外に酸化チタン、チタン酸リチウム、酸化アルミニウム、及び遷移金属系酸化物等を含んでもよい。
The shell layer is made of a silicon oxycarbide-containing phase. Silicon oxycarbide is composed of a compound containing silicon, oxygen, and carbon, and preferably has a three-dimensional network structure of a silicon-oxygen-carbon skeleton and a structure containing free carbon. Here, free carbon is carbon that is not contained in the three-dimensional silicon-oxygen-carbon skeleton. Free carbon includes carbon that exists as a carbon phase, carbon that is bonded to carbon in the carbon phase, and carbon that is bonded to the silicon-oxygen-carbon skeleton and the carbon phase.
The silicon oxycarbide-containing phase may contain titanium oxide, lithium titanate, aluminum oxide, transition metal oxides, and the like in addition to silicon oxycarbide.
シリコンオキシカーバイドは下記式(2)で表されるのが好ましい。
SiOxCy (2)
式(2)中、xはケイ素に対する酸素のモル比、yはケイ素に対する炭素のモル比を表す。
本活物質を二次電池に用いた場合、充放電性能と容量維持率とのバランスが優位になるという観点から、1≦x<2が好ましく、1≦x≦1.9がより好ましく、1≦x≦1.8がさらに好ましい。
また、本活物質を二次電池に用いた場合、充放電性能と初回クーロン効率のバランスとの観点から、1≦y≦20が好ましく、1.2≦y≦15がより好ましい。
The silicon oxycarbide is preferably represented by the following formula (2):
SiOxCy (2)
In formula (2), x represents the molar ratio of oxygen to silicon, and y represents the molar ratio of carbon to silicon.
When the present active material is used in a secondary battery, from the viewpoint of obtaining an advantageous balance between charge/discharge performance and capacity retention rate, 1≦x<2 is preferable, 1≦x≦1.9 is more preferable, and 1≦x≦1.8 is even more preferable.
When the present active material is used in a secondary battery, from the viewpoint of the balance between the charge/discharge performance and the initial coulombic efficiency, 1≦y≦20 is preferable, and 1.2≦y≦15 is more preferable.
前記xおよびyはそれぞれの元素の含有質量を測定した後、モル比(原子数比)に換算することにより求めることができる。この際、酸素と炭素は無機元素分析装置を使用することによって、その含有量を定量でき、ケイ素の含有量はICP発光分析装置(ICP-OES)を使用することによって定量できる。
なお、前記xおよびyの測定は前記記載方法によって実施することが好ましいが、本活物質の局所的な分析を行い、それにより得られた含有比データの測定点数を多く取得して、本活物質全体の含有比を類推することでも可能である。局所的な分析としては、例えばエネルギー分散型X線分光法(SEM-EDX)や電子線プローブマイクロアナライザ(EPMA)が挙げられる。
The x and y can be determined by measuring the mass content of each element and then converting it into a molar ratio (atomic ratio). In this case, the oxygen and carbon contents can be quantified using an inorganic elemental analyzer, and the silicon content can be quantified using an inductively coupled plasma optical emission spectrometer (ICP-OES).
Although it is preferable to measure x and y by the above-described method, it is also possible to perform a local analysis of the active material, obtain a large number of measurement points for the content ratio data obtained thereby, and infer the content ratio of the entire active material. Examples of local analysis include energy dispersive X-ray spectroscopy (SEM-EDX) and electron probe microanalyzer (EPMA).
シリコンオキシカーバイド含有相がケイ素-酸素-炭素骨格の三次元ネットワークとフリー炭素を含む構造の場合、シリコンオキシカーバイド相中のケイ素-酸素-炭素骨格は化学安定性が高く、フリー炭素を含む構造により、リチウムの吸蔵および放出に対して体積変化が小さい。酸化ケイ素含有粒子がケイ素-酸素-炭素骨格とフリー炭素とを含む造体に少なくとも一部が被覆されることで、リチウムの吸蔵および放出に対する酸化ケイ素含有粒子の体積変化が抑制される。その結果、本活物質を負極とした場合、負極中の酸化ケイ素含有粒子が充放電性能発現の主要成分とする役割を果たしながら、シリコンオキシカーバイド含有相が充放電時に酸化ケイ素含有粒子の体積変化に伴う粒子の破壊を抑制し、リチウム二次電池のサイクル性が改良される。When the silicon oxycarbide-containing phase has a structure containing a three-dimensional network of silicon-oxygen-carbon skeleton and free carbon, the silicon-oxygen-carbon skeleton in the silicon oxycarbide phase has high chemical stability, and the structure containing free carbon results in small volume changes with respect to the absorption and release of lithium. When the silicon oxide-containing particles are at least partially coated with a structure containing a silicon-oxygen-carbon skeleton and free carbon, volume changes of the silicon oxide-containing particles with respect to the absorption and release of lithium are suppressed. As a result, when this active material is used as a negative electrode, the silicon oxide-containing particles in the negative electrode play a role as a main component for the expression of charge and discharge performance, while the silicon oxycarbide-containing phase suppresses particle destruction associated with volume changes of the silicon oxide-containing particles during charge and discharge, improving the cycleability of the lithium secondary battery.
またシリコンオキシカーバイド含有相を構成する化合物がケイ素-酸素-炭素骨格の三次元ネットワーク構造とフリー炭素を含む構造を有していると、ケイ素-酸素-炭素骨格は、リチウムイオンの接近によりケイ素-酸素-炭素骨格の内部の電子分布に変動が生じ、ケイ素-酸素-炭素骨格とリチウムイオンの間に静電的な結合や配位結合などが形成される。この静電的な結合や配位結合によりリチウムイオンがケイ素-酸素-炭素骨格中に貯蔵される。一方、配位結合エネルギーは比較的低いため、リチウムイオンの脱離反応が容易に行われる。つまりケイ素-酸素-炭素骨格が充放電の際にリチウムイオンの挿入と脱離反応を可逆的に起こすことができると考えられる。Furthermore, when the compound that constitutes the silicon oxycarbide-containing phase has a three-dimensional network structure of a silicon-oxygen-carbon skeleton and a structure that contains free carbon, the approach of lithium ions causes a change in the internal electron distribution of the silicon-oxygen-carbon skeleton, and electrostatic bonds and coordinate bonds are formed between the silicon-oxygen-carbon skeleton and the lithium ions. These electrostatic bonds and coordinate bonds allow lithium ions to be stored in the silicon-oxygen-carbon skeleton. Meanwhile, because the coordinate bond energy is relatively low, lithium ion desorption reactions occur easily. In other words, it is believed that the silicon-oxygen-carbon skeleton can reversibly cause lithium ion insertion and desorption reactions during charging and discharging.
前記シリコンオキシカーバイドはケイ素、酸素、炭素以外に窒素を含んでもよい。窒素は後述する本活物質の製造方法において、使用する原料、例えばフェノール樹脂、分散剤、ポリシロキサン化合物、その他の窒素化合物、および焼成プロセスで用いる窒素ガス等を分子内に官能基として窒素を含む原子団とすることで、シリコンオキシカーバイドに導入することができる。シリコンオキシカーバイド含有相が窒素を含むことで、本活物質を負極活物質とした時の充放電性能や容量維持率に優れる傾向にある。
シリコンオキシカーバイド含有相を構成する化合物がケイ素、酸素、炭素および窒素を含む化合物の場合、シリコンオキシカーバイド含有相は下記式(3)で表される化合物を含有するのが好ましい。
SiOxCyNz (3)
式(3)中、xおよびyは前記と同じ意味であり、zはケイ素に対する窒素のモル比を表す。
シリコンオキシカーバイド含有相が前記式(3)で表される化合物を含む場合、本活物質を二次電池に用いた際の充放電性能や容量維持率の観点から、1≦x≦2、1≦y≦20、0<z≦0.5が好ましく、1≦x≦1.9、1.2≦y≦15、0<z≦0.4がより好ましい。
The silicon oxycarbide may contain nitrogen in addition to silicon, oxygen, and carbon. Nitrogen can be introduced into silicon oxycarbide by forming the raw materials used in the manufacturing method of the present active material described below, such as phenolic resins, dispersants, polysiloxane compounds, other nitrogen compounds, and nitrogen gas used in the firing process into atomic groups containing nitrogen as functional groups in the molecules. When the silicon oxycarbide-containing phase contains nitrogen, the present active material tends to have excellent charge/discharge performance and capacity retention when used as a negative electrode active material.
When the compound constituting the silicon oxycarbide-containing phase is a compound containing silicon, oxygen, carbon and nitrogen, the silicon oxycarbide-containing phase preferably contains a compound represented by the following formula (3).
SiOxCyNz (3)
In formula (3), x and y are as defined above, and z represents the molar ratio of nitrogen to silicon.
When the silicon oxycarbide-containing phase contains the compound represented by formula (3), from the viewpoint of charge/discharge performance and capacity retention rate when the active material is used in a secondary battery, it is preferable that 1≦x≦2, 1≦y≦20, and 0<z≦0.5, and it is more preferable that 1≦x≦1.9, 1.2≦y≦15, and 0<z≦0.4.
前記zは前記xおよびyと同様、元素の含有質量を測定した後、モル比(原子数比)に換算することにより求めることができる。
前記xおよびyと同様、zの測定は前記記載方法によって実施することが好ましいが、本活物質の局所的な分析を行い、それにより得られた含有比データの測定点数を多く取得して、本活物質全体の含有比を類推することでも可能である。局所的な分析としては、例えばエネルギー分散型X線分光法(SEM-EDX)や電子線プローブマイクロアナライザ(EPMA)が挙げられる。
Similarly to x and y, z can be determined by measuring the mass content of the elements and then converting it into a molar ratio (atomic number ratio).
As with x and y, z is preferably measured by the method described above, but it is also possible to perform local analysis of the active material, obtain a large number of measurement points for content ratio data obtained thereby, and infer the content ratio of the entire active material. Examples of local analysis include energy dispersive X-ray spectroscopy (SEM-EDX) and electron probe microanalyzer (EPMA).
本活物質は前記本コアと本シェル層を有するコアシェル複合構造を有する。コアシェル複合構造とは本コアの表面を本シェルが被覆した構造である。本シェル層は本コアの表面を全て被覆する必要はなく、本コアの少なくとも一部を被覆すればよい。本シェル層の被覆率は70%以上が好ましく、80%以上がより好ましく、100%が特に好ましい。被覆率はSEM観察とEDS元素マッピングにより求められる。
本シェル層の厚みは、充放電容量・初回クーロン効率とサイクル特性とのバランス観点から、5nmから500nmが好ましく、10nmから400nmがより好ましい。
The active material has a core-shell composite structure having the core and the shell layer. The core-shell composite structure is a structure in which the surface of the core is covered with the shell. The shell layer does not need to cover the entire surface of the core, but only needs to cover at least a part of the core. The coverage of the shell layer is preferably 70% or more, more preferably 80% or more, and particularly preferably 100%. The coverage is determined by SEM observation and EDS element mapping.
The thickness of the shell layer is preferably from 5 nm to 500 nm, and more preferably from 10 nm to 400 nm, from the viewpoint of the balance between the charge/discharge capacity, the initial coulombic efficiency, and the cycle characteristics.
活物質の平均粒径が小さすぎると、比表面積の大幅な上昇につれ、本活物質を二次電池とした時、充放電時に固相界面電解質分解物(以下、「SEI」とも記す。)の生成量が増えることで単位体積当たりの可逆充放電容量が低下することがある。平均粒径が大きすぎると、電極膜作製時に集電体から剥離するおそれがある。
したがって本活物質の平均粒径は1μm以上30μm以下が好ましい。本活物質の平均粒径は2μm以上がより好ましく、3μm以上が特に好ましい。また、本活物質の平均粒径は25μm以下がより好ましく、20μm以下が特に好ましい。平均粒径は前記D50の値である。
If the average particle size of the active material is too small, the specific surface area increases significantly, and when the active material is used in a secondary battery, the amount of solid-phase interface electrolyte decomposition products (hereinafter, also referred to as "SEI") produced during charging and discharging increases, which may reduce the reversible charge/discharge capacity per unit volume. If the average particle size is too large, there is a risk of the active material peeling off from the current collector during the preparation of the electrode film.
Therefore, the average particle size of the present active material is preferably 1 μm or more and 30 μm or less. The average particle size of the present active material is more preferably 2 μm or more, and particularly preferably 3 μm or more. The average particle size of the present active material is more preferably 25 μm or less, and particularly preferably 20 μm or less. The average particle size is the value of D50.
本活物質の比表面積は0.3m2/g以上10m2/g以下が好ましい。本活物質の比表面積は0.5m2/g以上がより好ましく、1.0m2/g以上が特に好ましい。また、本活物質の比表面積は9.0m2/g以下がより好ましく、8.0m2/g以下が特に好ましい。比表面積が前記範囲であると、電極作製時における溶媒の吸収量を適切に保つことができ、結着性を維持するための結着剤の使用量も適切に保つことができる。なお前記比表面積はBET法により求めた値であり、窒素ガス吸着測定により求めることができ、例えば比表面積測定装置を用いて測定することができる。 The specific surface area of the active material is preferably 0.3 m 2 /g or more and 10 m 2 /g or less. The specific surface area of the active material is more preferably 0.5 m 2 /g or more, and particularly preferably 1.0 m 2 /g or more. The specific surface area of the active material is more preferably 9.0 m 2 /g or less, and particularly preferably 8.0 m 2 /g or less. When the specific surface area is within the above range, the amount of solvent absorbed during electrode preparation can be appropriately maintained, and the amount of binder used to maintain binding properties can also be appropriately maintained. The specific surface area is a value determined by the BET method, and can be determined by nitrogen gas adsorption measurement, for example, using a specific surface area measurement device.
本活物質は、シリコンオキシカーバイド含有相中にケイ素-酸素-炭素骨格構造とともに炭素元素のみで構成されるフリー炭素を有しているのが好ましい。本活物質がシリコンオキシカーバイド含有相中にフリー炭素を有する場合、本活物質のラマンスペクトルにおいて、グラファイト長周期炭素格子構造のGバンドに帰属される1590cm-1と、乱れや欠陥のあるグラファイト短周期炭素格子構造のDバンドに帰属される1330cm-1付近の散乱ピークが観測される。Dバンドの散乱ピーク強度、I(Gバンド)、に対するDバンドの散乱強度、I(Dバンド)、の強度比、I(Gバンド)/I(Dバンド)、は0.7から2が好ましい。前記散乱ピーク強度比、I(Gバンド)/I(Dバンド)、は0.7以上1.8以下がより好ましい。前記散乱ピーク強度比、I(Gバンド)/I(Dバンド)、が前記の範囲であるということは、マトリクス中のフリー炭素において以下のことが言える。 The active material preferably has free carbon composed of only carbon element together with silicon-oxygen-carbon skeletal structure in the silicon oxycarbide-containing phase. When the active material has free carbon in the silicon oxycarbide-containing phase, a scattering peak at 1590 cm −1 attributed to the G band of the graphite long-period carbon lattice structure and a scattering peak at about 1330 cm −1 attributed to the D band of the graphite short-period carbon lattice structure having disorder or defects are observed in the Raman spectrum of the active material. The intensity ratio of the scattering peak intensity of the D band, I (G band), to the scattering peak intensity of the D band, I (D band), I (G band) / I (D band), is preferably 0.7 to 2. The scattering peak intensity ratio, I (G band) / I (D band), is more preferably 0.7 to 1.8. The fact that the scattering peak intensity ratio, I (G band) / I (D band), is in the above range means that the following can be said about the free carbon in the matrix.
フリー炭素の一部の炭素原子は、ケイ素-酸素-炭素骨格中の一部のケイ素原子と結合している。このフリー炭素は、充放電特性に影響を与える重要な成分である。フリー炭素は主に、SiO2C2,SiO3C、およびSiO4で構成されるケイ素-酸素-炭素骨格中に形成しているものであり、ケイ素-酸素-炭素骨格の一部のケイ素原子と結合しているため、ケイ素-酸素-炭素骨格内部、および表面のケイ素原子とフリー炭素間の電子伝達がより容易となる。このため本活物質を二次電池に用いた時の充放電時のリチウムイオンの挿入および離脱反応が速やかに進行し、充放電特性が向上すると考えられる。また、リチウムイオンの挿入および脱離反応によって、負極活物質は僅かではあるが膨張および収縮することがあるが、フリー炭素がその近傍に存在することで活物質全体の膨張および収縮が緩和され、容量維持率を大きく向上させる効果があると考えられる。 Some carbon atoms of the free carbon are bonded to some silicon atoms in the silicon-oxygen-carbon skeleton. This free carbon is an important component that affects the charge-discharge characteristics. The free carbon is mainly formed in the silicon-oxygen-carbon skeleton composed of SiO 2 C 2 , SiO 3 C, and SiO 4 , and is bonded to some silicon atoms of the silicon-oxygen-carbon skeleton, so that electron transfer between the silicon atoms inside the silicon-oxygen-carbon skeleton and on the surface and the free carbon becomes easier. Therefore, when this active material is used in a secondary battery, the insertion and desorption reaction of lithium ions during charging and discharging proceeds quickly, and it is considered that the charge-discharge characteristics are improved. In addition, the insertion and desorption reaction of lithium ions may cause the negative electrode active material to expand and contract slightly, but the presence of free carbon in its vicinity is thought to have the effect of mitigating the expansion and contraction of the entire active material, greatly improving the capacity retention rate.
フリー炭素は、シリコンオキシカーバイド含有相を製造する際にケイ素含有化合物および炭素源樹脂の不活性ガス雰囲気中の熱分解に伴い形成する。具体的にはケイ素含有化合物および炭素源樹脂の分子構造中にある炭化可能な部位が不活性化する雰囲気中で高温熱分解によって炭素成分となり、これらの一部の炭素がケイ素-酸素-炭素骨格の一部と結合する。炭化可能な成分は、炭化水素が好ましく、アルキル類、アルキレン類、アルケン類、アルキン類、芳香族類がより好ましく、その中でも芳香族類であることがさらに好ましい。 Free carbon is formed by thermal decomposition of the silicon-containing compound and the carbon source resin in an inert gas atmosphere when producing the silicon oxycarbide-containing phase. Specifically, carbonizable sites in the molecular structures of the silicon-containing compound and the carbon source resin become carbon components through high-temperature thermal decomposition in an inactive atmosphere, and some of these carbons bond to part of the silicon-oxygen-carbon skeleton. The carbonizable components are preferably hydrocarbons, more preferably alkyls, alkylenes, alkenes, alkynes, and aromatics, and even more preferably aromatics.
また、フリー炭素が存在することにより、本活物質の抵抗低減効果が期待され、二次電池の負極として本活物質を使用した場合、本活物質内部の反応が均一かつスムーズに起こり、充放電性能と容量維持率のバランスに優れた二次電池用活物質が得られると考えられる。フリー炭素の導入はケイ素含有化合物由来だけでも可能であるが、炭素源樹脂を併用することにより、フリー炭素の存在量とその効果の増大が期待される。炭素源樹脂の種類は、特に限定されないが、炭素の六員環を含む炭素化合物が好ましい。 In addition, the presence of free carbon is expected to reduce the resistance of this active material, and when this active material is used as the negative electrode of a secondary battery, it is believed that the reaction inside the active material will occur uniformly and smoothly, resulting in an active material for secondary batteries with an excellent balance between charge/discharge performance and capacity retention rate. Although free carbon can be introduced only from silicon-containing compounds, the use of a carbon source resin in combination is expected to increase the amount of free carbon present and its effect. There are no particular limitations on the type of carbon source resin, but a carbon compound containing a six-membered carbon ring is preferred.
前記フリー炭素の存在状態は、ラマンスペクトル以外に熱重量示差熱分析装置(TG-DTA)でも同定することが可能である。ケイ素-酸素-炭素骨格中の炭素原子と異なり、フリー炭素は、大気中で熱分解されやすく、空気存在下で測定した熱重量減少量により炭素の存在量を求めることができる。つまり炭素量は、TG-DTAを用いることで定量できる。
また、熱重量減少挙動より、分解反応開始温度、分解反応終了温度、熱分解反応種の数、各熱分解反応種における最大重量減少量の温度などの熱分解温度挙動の変化も容易に把握できる。これら挙動の温度値を用いて炭素の状態を判断することができる。一方、ケイ素-酸素-炭素骨格中の炭素原子、すなわち前記SiO2C2、SiO3C、およびSiO4を構成するケイ素原子と結合している炭素原子は、非常に強い化学結合を有するために熱安定性が高く、熱分析装置測定の温度範囲内では大気中で熱分解されることがないと考えられる。また、本活物質のシリコンオキシカーバイド含有相中の炭素は、非晶質炭素と類似する特性を有しているため、大気中において約550℃から900℃の温度範囲に熱分解される。その結果、急激な重量減少が発生する。TG-DTAの測定条件の最高温度は特に限定されないが、炭素の熱分解反応を完全に終了させるために、大気中、約25℃から約1000℃以上までの条件下でTG-DTA測定を行うのが好ましい。
The state of the free carbon can be identified by a thermogravimetric differential thermal analyzer (TG-DTA) in addition to Raman spectroscopy. Unlike carbon atoms in a silicon-oxygen-carbon skeleton, free carbon is easily thermally decomposed in the atmosphere, and the amount of carbon present can be determined from the amount of thermal weight loss measured in the presence of air. In other words, the amount of carbon can be quantified using TG-DTA.
In addition, from the thermal weight loss behavior, the changes in the thermal decomposition temperature behavior, such as the decomposition reaction start temperature, the decomposition reaction end temperature, the number of thermal decomposition reaction species, and the temperature of the maximum weight loss amount in each thermal decomposition reaction species, can be easily understood. The state of carbon can be determined using the temperature values of these behaviors. On the other hand, the carbon atoms in the silicon-oxygen-carbon skeleton, that is, the carbon atoms bonded to the silicon atoms constituting the SiO 2 C 2 , SiO 3 C, and SiO 4 , have a very strong chemical bond and are therefore highly thermally stable, and are not considered to be thermally decomposed in the air within the temperature range of the thermal analysis device measurement. In addition, the carbon in the silicon oxycarbide-containing phase of the active material has properties similar to those of amorphous carbon, so it is thermally decomposed in the air at a temperature range of about 550°C to 900°C. As a result, a rapid weight loss occurs. The maximum temperature of the measurement conditions for TG-DTA is not particularly limited, but in order to completely terminate the thermal decomposition reaction of carbon, it is preferable to perform the TG-DTA measurement in the air under conditions of about 25°C to about 1000°C or higher.
また本活物質は前記コアシェル複合構造体の表面に被膜を有しているのが好ましい。被膜としては、電子伝導性、リチウムイオン伝導性、電解液の分解抑制効果が期待出来る物質の被膜が好ましい。
前記被膜としては、炭素、チタン、ニッケル等の電子伝導性物質の被膜が挙げられる。これらの中でも、負極活物質の化学安定性や熱安定性改善の観点から、炭素の被膜が好ましく、非晶質炭素の被膜がより好ましい。
The active material preferably has a coating on the surface of the core-shell composite structure, the coating being preferably made of a material that is expected to have electron conductivity, lithium ion conductivity, and the effect of inhibiting decomposition of the electrolyte.
Examples of the coating include coatings of electron conductive materials such as carbon, titanium, nickel, etc. Among these, from the viewpoint of improving the chemical stability and thermal stability of the negative electrode active material, a carbon coating is preferred, and an amorphous carbon coating is more preferred.
炭素の被膜の場合、本活物質の化学安定性や熱安定性の改善の観点から、被膜の平均厚みは10nm以上300nm以下、または、炭素の被膜量はコアシェル複合構造体の全体質量を100質量%として、1から10質量%が好ましい。
炭素の被膜は気相沈積法によりコアシェル複合構造体の表面に作成するのが好ましい。
なおコアシェル複合構造体の全体質量とは、本活物質を構成する本コアと本シェル層の合計量である。前記シリコンオキシカーバイド含有層相が窒素を含む本シェル層の場合は、窒素も含む合計量であり、コアシェル複合構造体が後述する第三成分を含む場合、第三成分も含む合計量である。
In the case of a carbon coating, from the viewpoint of improving the chemical stability and thermal stability of the present active material, it is preferable that the average thickness of the coating is 10 nm or more and 300 nm or less, or that the amount of the carbon coating is 1 to 10 mass % with the total mass of the core-shell composite structure being 100 mass %.
The carbon coating is preferably formed on the surface of the core-shell composite structure by vapor deposition.
The total mass of the core-shell composite structure is the total mass of the core and shell layer constituting the active material. In the case where the silicon oxycarbide-containing layer phase is the shell layer containing nitrogen, the total mass includes nitrogen. In the case where the core-shell composite structure contains a third component described below, the total mass includes the third component.
ケイ素含有活物質を負極活物質として用いた場合、初期充電時にリチウムとケイ素含有活物質に存在する酸化ケイ素が反応してリチウム酸化物が生成される。生成されたリチウム酸化物は放電時に可逆的に正極に戻られなくなる。このような不可逆反応によりリチウムが損失され、初期の充放電効率が低下すると考えられている。
このようなリチウム酸化物の生成を抑制するために、本活物質は前記酸化ケイ素含有粒子およびシリコンオキシカーバイド含有相以外の第三成分を含有してもよい。
When a silicon-containing active material is used as a negative electrode active material, lithium reacts with silicon oxide present in the silicon-containing active material during initial charging to produce lithium oxide. The lithium oxide produced cannot be reversibly returned to the positive electrode during discharge. It is believed that this irreversible reaction results in the loss of lithium, resulting in a decrease in the initial charge/discharge efficiency.
In order to inhibit the production of such lithium oxides, the present active material may contain a third component other than the silicon oxide-containing particles and the silicon oxycarbide-containing phase.
このような第三成分としては、Li、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属のシリケート化合物(以下、「金属シリケート化合物」とも記す。)が挙げられる。
シリケート化合物は一般に1個または数個のケイ素原子を中心とし、電気陰性な配位子がこれを取り囲んだ構造を持つアニオンを含む化合物であるが、金属シリケート化合物はLi、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属と前記アニオンを含む化合物とのABO型酸化物である。
前記アニオンを含む化合物としてはオルトケイ酸イオン(SiO4
4-)、メタケイ酸イオン(SiO3
2-)、ピロケイ酸イオン(Si2O7
6-)、環状ケイ酸イオン(Si3O9
6-またはSi6O18
12-)等のケイ酸イオンが知られている。本シリケート化合物はメタケイ酸イオンとLi、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属とのABO型酸化物であるシリケート化合物が好ましい。前記金属の中ではLiまたはMgが好ましい。
Such a third component includes a silicate compound of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al (hereinafter, also referred to as a "metal silicate compound").
A silicate compound is generally a compound containing an anion having a structure in which one or several silicon atoms are at the center and electronegative ligands surround the silicon atom, and a metal silicate compound is an ABO type oxide of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al and a compound containing the above anion.
Known compounds containing the anion include silicate ions such as orthosilicate ion (SiO 4 4- ), metasilicate ion (SiO 3 2- ), pyrosilicate ion (Si 2 O 7 6- ), and cyclic silicate ion (Si 3 O 9 6- or Si 6 O 18 12- ). The silicate compound is preferably an ABO type oxide of metasilicate ion and at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al. Of the metals, Li or Mg is preferred.
金属シリケート化合物はLi、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属を有しており、これら金属の2種以上を有していてもよい。2種以上の金属を有する場合、一つのケイ酸イオンが複数種の金属を有していてもよいし、異なる金属を有するシリケート化合物の混合物であってもよい。また金属シリケート化合物はLi、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属を有する限り、他の金属を有してもよい。
金属シリケート化合物はリチウムシリケート化合物またはマグネシウムシリケート化合物が好ましく、メタケイ酸リチウム(Li2SiO3、Li2Si2O5、Li4SiO4)またはメタケイ酸マグネシウム(MgSiO3、Mg2SiO4)がより好ましく、メタケイ酸マグネシウム(MgSiO3、Mg2SiO4)が特に好ましい。
The metal silicate compound has at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al, and may have two or more of these metals. When having two or more metals, one silicate ion may have multiple metals, or may be a mixture of silicate compounds having different metals. In addition, the metal silicate compound may have other metals as long as it has at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al.
The metal silicate compound is preferably a lithium silicate compound or a magnesium silicate compound, more preferably lithium metasilicate ( Li2SiO3 , Li2Si2O5 , Li4SiO4 ) or magnesium metasilicate (MgSiO3 , Mg2SiO4 ), and particularly preferably magnesium metasilicate ( MgSiO3 , Mg2SiO4 ).
本活物質が前記金属シリケート化合物を含有する場合、金属シリケート化合物は前記コアシェル構造体の全体に分布しているのが好ましく、均一に分布しているのがより好ましい。
前記コアシェル構造体に金属シリケート化合物が存在していることの確認は高分解能透過型電子顕微鏡(以下、「HR-TEM」とも記す。)にて確認することができる。詳しくは本活物質を集束イオンビーム(FIB)でスライス加工してHR-TEM観察により確認することができる。
金属シリケート化合物は、結晶状態の場合、粉末X線回折測定(XRD)で検出することができ、非晶質の場合は、固体29Si-NMR測定で確認することができる。
When the present active material contains the metal silicate compound, the metal silicate compound is preferably distributed throughout the core-shell structure, and more preferably distributed uniformly.
The presence of the metal silicate compound in the core-shell structure can be confirmed by a high-resolution transmission electron microscope (hereinafter, also referred to as "HR-TEM"). In detail, the active material can be sliced by a focused ion beam (FIB) and observed with an HR-TEM.
If the metal silicate compound is in a crystalline state, it can be detected by powder X-ray diffraction measurement (XRD), and if it is amorphous, it can be confirmed by solid-state 29 Si-NMR measurement.
本活物質が前記金属シリケート化合物を有し、表面被膜を有している場合、本活物質は内部から酸化ケイ素と金属シリケート化合物からなる本コア、本シェル層、表面被膜の順となっている多層複合構造が好ましい。
表面被膜は非晶質炭素の被膜が好ましい。
When the present active material has the metal silicate compound and a surface coating, the present active material preferably has a multilayer composite structure in which, from the inside, the present core made of silicon oxide and the metal silicate compound, the present shell layer, and the surface coating are arranged in this order.
The surface coating is preferably an amorphous carbon coating.
本活物質は例えば以下の(1)から(3)の工程を含む製造方法(以下、「本製造方法」とも記す。)により得られる。(1)前記シェル層作製用前駆体(以下、「本前駆体」とも記す。)を得る工程(以下、「本前駆体作成工程」とも記す。)(2)前記酸化ケイ素含有粒子の表面に前記本前駆体を塗布および乾燥する工程(以下、「本塗布乾燥工程」とも記す。)(3)不活性雰囲気中、焼成温度900℃から1300℃で高温焼成して本活物質を得る工程(以下、「本焼成工程」とも記す。)The active material can be obtained, for example, by a manufacturing method (hereinafter also referred to as the "manufacturing method") including the following steps (1) to (3): (1) a step of obtaining a precursor for producing the shell layer (hereinafter also referred to as the "precursor") (hereinafter also referred to as the "precursor preparation step"); (2) a step of applying the precursor to the surface of the silicon oxide-containing particles and drying it (hereinafter also referred to as the "application and drying step"); and (3) a step of obtaining the active material by high-temperature firing at a firing temperature of 900°C to 1300°C in an inert atmosphere (hereinafter also referred to as the "firing step").
本前駆体とは、酸化ケイ素含有粒子の表面に塗付、乾燥し、その後、焼成することで前記本シェル層となる化合物であり、前記シリコンオキシカーバイドを含有する化合物である。
本前駆体としては、例えば、ポリシロキサン化合物と炭素源樹脂の混合物が挙げられる。本前駆体は必要に応じて、ポリシロキサン化合物と炭素源樹脂以外のシリコンオキシカーバイド含有相に含まれる成分を含んでもよい。
The present precursor is a compound that is applied to the surface of a silicon oxide-containing particle, dried, and then fired to become the present shell layer, and is a compound that contains the above-mentioned silicon oxycarbide.
The precursor may be, for example, a mixture of a polysiloxane compound and a carbon source resin. The precursor may contain components contained in the silicon oxycarbide-containing phase other than the polysiloxane compound and the carbon source resin, as necessary.
前記ポリシロキサン化合物としては、ポリカルボシラン構造、ポリシラザン構造、ポリシラン構造およびポリシロキサン構造を少なくとも1つ含む樹脂が挙げられる。これらの構造のみを含む樹脂であっても良く、これら構造の少なくとも一つをセグメントとして有し、他の重合体セグメントと化学的に結合した複合型樹脂でも良い。複合化の形態はグラフト共重合、ブロック共重合、ランダム共重合、交互共重合などがある。例えば、ポリシロキサンセグメントと重合体セグメントの側鎖に化学的に結合したグラフト構造を有する複合樹脂があり、重合体セグメントの末端にポリシロキサンセグメントが化学的に結合したブロック構造を有する複合樹脂等が挙げられる。 The polysiloxane compound may be a resin containing at least one of a polycarbosilane structure, a polysilazane structure, a polysilane structure, and a polysiloxane structure. It may be a resin containing only these structures, or a composite resin having at least one of these structures as a segment and chemically bonded to other polymer segments. The form of the composite may be graft copolymerization, block copolymerization, random copolymerization, alternating copolymerization, etc. For example, there is a composite resin having a graft structure in which a polysiloxane segment is chemically bonded to the side chain of a polymer segment, and a composite resin having a block structure in which a polysiloxane segment is chemically bonded to the end of a polymer segment.
ポリシロキサンセグメントが、下記一般式(S-1)および/または下記一般式(S-2)で表される構造単位を有するポリシロキサン化合物が好ましい。なかでもポリシロキサン化合物が、シロキサン結合(Si-O-Si)主骨格の側鎖または末端に、カルボキシ基、エポキシ基、アミノ基、またはポリエーテル基を有することがより好ましい。 Polysiloxane compounds in which the polysiloxane segment has a structural unit represented by the following general formula (S-1) and/or the following general formula (S-2) are preferred. In particular, it is more preferred that the polysiloxane compound has a carboxy group, an epoxy group, an amino group, or a polyether group on the side chain or end of the siloxane bond (Si-O-Si) main skeleton.
アルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、イソペンチル基、ネオペンチル基、tert-ペンチル基、1-メチルブチル基、2-メチルブチル基、1,2-ジメチルプロピル基、1-エチルプロピル基、ヘキシル基、イソヘシル基、1-メチルペンチル基、2-メチルペンチル基、3-メチルペンチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、2,2-ジメチルブチル基、1-エチルブチル基、1,1,2-トリメチルプロピル基、1,2,2-トリメチルプロピル基、1-エチル-2-メチルプロピル基、1-エチル-1-メチルプロピル基等が挙げられる。前記のシクロアルキル基としては、例えば、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられる。Examples of the alkyl group include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, tert-pentyl, 1-methylbutyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, and 1-ethyl-1-methylpropyl. Examples of the cycloalkyl group include cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.
アリール基としては、例えば、フェニル基、ナフチル基、2-メチルフェニル基、3-メチルフェニル基、4-メチルフェニル基、4-ビニルフェニル基、3-イソプロピルフェニル基等が挙げられる。Examples of aryl groups include phenyl groups, naphthyl groups, 2-methylphenyl groups, 3-methylphenyl groups, 4-methylphenyl groups, 4-vinylphenyl groups, and 3-isopropylphenyl groups.
アラルキル基としては、例えば、ベンジル基、ジフェニルメチル基、ナフチルメチル基等が挙げられる。 Examples of aralkyl groups include benzyl groups, diphenylmethyl groups, and naphthylmethyl groups.
ポリシロキサン化合物が有するポリシロキサンセグメント以外の重合体セグメントとしては、例えば、アクリル重合体、フルオロオレフィン重合体、ビニルエステル重合体、芳香族系ビニル重合体、ポリオレフィン重合体等のビニル重合体セグメントや、ポリウレタン重合体セグメント、ポリエステル重合体セグメント、ポリエーテル重合体セグメント等の重合体セグメント等が挙げられる。中でも、ビニル重合体セグメントが好ましい。Examples of polymer segments other than the polysiloxane segment contained in the polysiloxane compound include vinyl polymer segments such as acrylic polymers, fluoroolefin polymers, vinyl ester polymers, aromatic vinyl polymers, and polyolefin polymers, as well as polymer segments such as polyurethane polymer segments, polyester polymer segments, and polyether polymer segments. Among these, vinyl polymer segments are preferred.
ポリシロキサン化合物が、ポリシロキサンセグメントと重合体セグメントとが下記の構造式(S-3)で示される構造で結合した複合樹脂でもよく、三次元網目状のポリシロキサン構造を有してもよい。The polysiloxane compound may be a composite resin in which polysiloxane segments and polymer segments are bonded in a structure shown in the following structural formula (S-3), or may have a three-dimensional mesh-like polysiloxane structure.
ポリシロキサン化合物が有するポリシロキサンセグメントは、ポリシロキサンセグメント中に重合性二重結合など加熱により反応が可能な官能基を有していてもよい。熱分解前にポリシロキサン化合物を加熱処理することにより、架橋反応が進行し、固体状とすることにより、熱分解処理を容易に行うことができる。The polysiloxane segment of the polysiloxane compound may have a functional group capable of reacting by heating, such as a polymerizable double bond, in the polysiloxane segment. By subjecting the polysiloxane compound to heat treatment before thermal decomposition, the crosslinking reaction proceeds and the compound becomes solid, making it easier to carry out the thermal decomposition treatment.
重合性二重結合としては、例えば、ビニル基や(メタ)アクリロイル基等が挙げられる。重合性二重結合は、ポリシロキサンセグメント中に2つ以上存在することが好ましく3から200個存在することがより好ましく、3から50個存在することが更に好ましい。また、ポリシロキサン化合物として重合性二重結合が2個以上存在する複合樹脂を使用することによって、架橋反応が容易に進行させることができる。Examples of polymerizable double bonds include vinyl groups and (meth)acryloyl groups. Preferably, there are two or more polymerizable double bonds in the polysiloxane segment, more preferably 3 to 200, and even more preferably 3 to 50. In addition, by using a composite resin having two or more polymerizable double bonds as the polysiloxane compound, the crosslinking reaction can be easily carried out.
ポリシロキサンセグメントは、シラノール基および/または加水分解性シリル基を有してもよい。加水分解性シリル基中の加水分解性基としては、例えば、ハロゲン原子、アルコキシ基、置換アルコキシ基、アシロキシ基、フェノキシ基、メルカプト基、アミノ基、アミド基、アミノオキシ基、イミノオキシ基、アルケニルオキシ基等が挙げられ、これらの基が加水分解されることにより加水分解性シリル基はシラノール基となる。前記熱硬化反応と並行して、シラノール基中の水酸基や加水分解性シリル基中の前記加水分解性基の間で加水分解縮合反応が進行することで、固体状のポリシロキサン化合物を得ることができる。The polysiloxane segment may have a silanol group and/or a hydrolyzable silyl group. Examples of the hydrolyzable group in the hydrolyzable silyl group include a halogen atom, an alkoxy group, a substituted alkoxy group, an acyloxy group, a phenoxy group, a mercapto group, an amino group, an amide group, an aminooxy group, an iminoxy group, and an alkenyloxy group. When these groups are hydrolyzed, the hydrolyzable silyl group becomes a silanol group. In parallel with the thermosetting reaction, a hydrolysis condensation reaction proceeds between the hydroxyl group in the silanol group and the hydrolyzable group in the hydrolyzable silyl group, thereby obtaining a solid polysiloxane compound.
本発明でいうシラノール基とはケイ素原子に直接結合した水酸基を有するケイ素含有基である。本発明で言う加水分解性シリル基とはケイ素原子に直接結合した加水分解性基を有するケイ素含有基であり、具体的には、例えば、下記の一般式(S-4)で表される基が挙げられる。In the present invention, the silanol group refers to a silicon-containing group having a hydroxyl group directly bonded to a silicon atom. In the present invention, the hydrolyzable silyl group refers to a silicon-containing group having a hydrolyzable group directly bonded to a silicon atom, and specific examples thereof include groups represented by the following general formula (S-4).
アルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、イソペンチル基、ネオペンチル基、tert-ペンチル基、1-メチルブチル基、2-メチルブチル基、1,2-ジメチルプロピル基、1-エチルプロピル基、ヘキシル基、イソヘシル基、1-メチルペンチル基、2-メチルペンチル基、3-メチルペンチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、2,2-ジメチルブチル基、1-エチルブチル基、1,1,2-トリメチルプロピル基、1,2,2-トリメチルプロピル基、1-エチル-2-メチルプロピル基、1-エチル-1-メチルプロピル基等が挙げられる。Examples of alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, tert-pentyl, 1-methylbutyl, 2-methylbutyl, 1,2-dimethylpropyl, 1-ethylpropyl, hexyl, isohexyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 2,2-dimethylbutyl, 1-ethylbutyl, 1,1,2-trimethylpropyl, 1,2,2-trimethylpropyl, 1-ethyl-2-methylpropyl, and 1-ethyl-1-methylpropyl.
アリール基としては、例えば、フェニル基、ナフチル基、2-メチルフェニル基、3-メチルフェニル基、4-メチルフェニル基、4-ビニルフェニル基、3-イソプロピルフェニル基等が挙げられる。Examples of aryl groups include phenyl groups, naphthyl groups, 2-methylphenyl groups, 3-methylphenyl groups, 4-methylphenyl groups, 4-vinylphenyl groups, and 3-isopropylphenyl groups.
アラルキル基としては、例えば、ベンジル基、ジフェニルメチル基、ナフチルメチル基等が挙げられる。 Examples of aralkyl groups include benzyl groups, diphenylmethyl groups, and naphthylmethyl groups.
ハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 Examples of halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc.
アルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基、第二ブトキシ基、第三ブトキシ基等が挙げられる。Examples of alkoxy groups include methoxy groups, ethoxy groups, propoxy groups, isopropoxy groups, butoxy groups, sec-butoxy groups, and tert-butoxy groups.
アシロキシ基としては、例えば、ホルミルオキシ基、アセトキシ基、プロパノイルオキシ基、ブタノイルオキシ基、ピバロイルオキシ基、ペンタノイルオキシ基、フェニルアセトキシ基、アセトアセトキシ基、ベンゾイルオキシ基、ナフトイルオキシ基等が挙げられる。Examples of acyloxy groups include formyloxy groups, acetoxy groups, propanoyloxy groups, butanoyloxy groups, pivaloyloxy groups, pentanoyloxy groups, phenylacetoxy groups, acetoacetoxy groups, benzoyloxy groups, and naphthoyloxy groups.
アリルオキシ基としては、例えば、フェニルオキシ基、ナフチルオキシ基等が挙げられる。 Examples of allyloxy groups include phenyloxy groups and naphthyloxy groups.
アルケニルオキシ基としては、例えば、ビニルオキシ基、アリルオキシ基、1-プロペニルオキシ基、イソプロペニルオキシ基、2-ブテニルオキシ基、3-ブテニルオキシ基、2-ペテニルオキシ基、3-メチル-3-ブテニルオキシ基、2-ヘキセニルオキシ基等が挙げられる。Examples of alkenyloxy groups include vinyloxy groups, allyloxy groups, 1-propenyloxy groups, isopropenyloxy groups, 2-butenyloxy groups, 3-butenyloxy groups, 2-pentenyloxy groups, 3-methyl-3-butenyloxy groups, and 2-hexenyloxy groups.
前記一般式(S-1)および/または前記一般式(S-2)で示される構造単位を有するポリシロキサンセグメントとしては、例えば以下の構造を有するもの等が挙げられる。Examples of polysiloxane segments having structural units represented by the general formula (S-1) and/or the general formula (S-2) include those having the following structures:
重合体セグメントは、本発明の効果を阻害しない範囲で、必要に応じて各種官能基を有していても良い。かかる官能基としては、例えばカルボキシル基、ブロックされたカルボキシル基、カルボン酸無水基、3級アミノ基、水酸基、ブロックされた水酸基、シクロカーボネート基、エポキシ基、カルボニル基、1級アミド基、2級アミド、カーバメート基、下記の構造式(S-5)で表される官能基等を使用することができる。The polymer segment may have various functional groups as necessary, as long as they do not impair the effects of the present invention. Examples of such functional groups include a carboxyl group, a blocked carboxyl group, a carboxylic anhydride group, a tertiary amino group, a hydroxyl group, a blocked hydroxyl group, a cyclocarbonate group, an epoxy group, a carbonyl group, a primary amide group, a secondary amide, a carbamate group, and a functional group represented by the following structural formula (S-5).
また、前記重合体セグメントは、ビニル基、(メタ)アクリロイル基等の重合性二重結合を有していてもよい。The polymer segment may also have a polymerizable double bond such as a vinyl group or a (meth)acryloyl group.
前記ポリシロキサン化合物は、例えば、下記(a)から(c)に示す方法で製造することが好ましい。The polysiloxane compound is preferably produced, for example, by the methods shown in (a) to (c) below.
(a)前記重合体セグメントの原料として、シラノール基および/または加水分解性シリル基を含有する重合体セグメントを予め調製しておき、この重合体セグメントと、シラノール基および/または加水分解性シリル基、並びに重合性二重結合を併有するシラン化合物とを混合し、加水分解縮合反応を行う方法。(a) A method in which a polymer segment containing a silanol group and/or a hydrolyzable silyl group is prepared in advance as a raw material for the polymer segment, and this polymer segment is mixed with a silane compound having both a silanol group and/or a hydrolyzable silyl group and a polymerizable double bond to carry out a hydrolysis condensation reaction.
(b)前記重合体セグメントの原料として、シラノール基および/または加水分解性シリル基を含有する重合体セグメントを予め調製する。また、シラノール基および/または加水分解性シリル基、並びに重合性二重結合を併有するシラン化合物を加水分解縮合反応してポリシロキサンも予め調製しておく。そして、重合体セグメントとポリシロキサンとを混合し、加水分解縮合反応を行う方法。(b) A polymer segment containing a silanol group and/or a hydrolyzable silyl group is prepared in advance as a raw material for the polymer segment. A polysiloxane is also prepared in advance by subjecting a silane compound having both a silanol group and/or a hydrolyzable silyl group and a polymerizable double bond to a hydrolysis condensation reaction. The polymer segment and the polysiloxane are then mixed together to carry out a hydrolysis condensation reaction.
(c)前記重合体セグメントと、シラノール基および/または加水分解性シリル基、並びに重合性二重結合を併有するシラン化合物と、ポリシロキサンとを混合し、加水分解縮合反応を行う方法。
上述方法によりポリシロキサン化合物が得られる。
ポリシロキサン化合物としては、例えば、セラネート(登録商標)シリーズ(有機・無機ハイブリッド型コーティング樹脂;DIC株式会社製)やコンポセランSQシリーズ(シルセスキオキサン型ハイブリッド;荒川化学工業株式会社製)が挙げられる。
(c) A method in which the polymer segment, a silane compound having a silanol group and/or a hydrolyzable silyl group, and a polymerizable double bond, and a polysiloxane are mixed together, and a hydrolysis condensation reaction is carried out.
A polysiloxane compound can be obtained by the above method.
Examples of polysiloxane compounds include the Ceranate (registered trademark) series (organic-inorganic hybrid coating resin; manufactured by DIC Corporation) and the CompoCerane SQ series (silsesquioxane hybrid; manufactured by Arakawa Chemical Industries, Ltd.).
前記炭素源樹脂は、ポリシロキサン化合物との混和性が良く、また、不活性雰囲気中、高温焼成により炭化され、芳香族官能基を有する合成樹脂や天然化学原料が好ましい。The carbon source resin is preferably a synthetic resin or natural chemical raw material having aromatic functional groups, which has good miscibility with polysiloxane compounds and can be carbonized by high-temperature baking in an inert atmosphere.
合成樹脂としては、ポリビニルアルコール、ポリアクリル酸などの熱可塑性樹脂、フェノール樹脂、フラン樹脂などの熱硬化性樹脂が挙げられる。天然化学原料としては、重質油、特にはタールピッチ類としては、コールタール、タール軽油、タール中油、タール重油、ナフタリン油、アントラセン油、コールタールピッチ、ピッチ油、メソフェーズピッチ、酸素架橋石油ピッチ、ヘビーオイルなどが挙げられるが、安価入手や不純物排除の観点からフェノール樹脂の使用がより好ましい。 Examples of synthetic resins include thermoplastic resins such as polyvinyl alcohol and polyacrylic acid, and thermosetting resins such as phenolic resins and furan resins. Natural chemical raw materials include heavy oils, particularly tar pitches, such as coal tar, light tar oil, medium tar oil, heavy tar oil, naphthalene oil, anthracene oil, coal tar pitch, pitch oil, mesophase pitch, oxygen-crosslinked petroleum pitch, and heavy oil, but the use of phenolic resins is more preferable from the standpoint of cheap availability and the elimination of impurities.
特に、炭素源樹脂が芳香族炭化水素部位を含む樹脂であることが好ましく、芳香族炭化水素部位を含む樹脂がフェノール樹脂、エポキシ樹脂、または熱硬化性樹脂が好ましく、フェノール樹脂はレゾール型が好ましい。
フェノール樹脂としては、例えばスミライトレジンシリーズ(レゾール型フェノール樹脂,住友ベークライト株式会社製)が挙げられる。
In particular, the carbon source resin is preferably a resin containing an aromatic hydrocarbon moiety, and the resin containing an aromatic hydrocarbon moiety is preferably a phenol resin, an epoxy resin, or a thermosetting resin, and the phenol resin is preferably a resol type.
The phenolic resin may be, for example, SUMILITE RESIN series (resole type phenolic resin, manufactured by Sumitomo Bakelite Co., Ltd.).
本前駆体作成工程では前記ポリシロキサン化合物と炭素源樹脂とを混合し本前駆体とする。混合には撹拌機、超音波ミキサー、プリミックス分散機等が使用される。また本前駆体は前記ポリシロキサン化合物と炭素源樹脂の混合物を溶媒に分散させたスラリーまたは溶解させた溶液としてもよい。溶媒は水または有機溶媒が用いられる。In this precursor preparation process, the polysiloxane compound and the carbon source resin are mixed to produce the precursor. A stirrer, ultrasonic mixer, premix disperser, etc. are used for mixing. The precursor may also be a slurry in which the mixture of the polysiloxane compound and the carbon source resin is dispersed in a solvent, or a solution in which the mixture is dissolved. The solvent used may be water or an organic solvent.
有機溶媒は、例えば、ケトン類のアセトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトン;アルコール類のエタノール、メタノール、ノルマルプロピルアルコール、イソプロピルアルコール;芳香族のベンゼン、トルエン、キシレンなどが挙げられる。 Examples of organic solvents include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and diisobutyl ketone; alcohols such as ethanol, methanol, normal propyl alcohol, and isopropyl alcohol; and aromatics such as benzene, toluene, and xylene.
前記ポリシロキサン化合物と炭素源樹脂の混合物のスラリーとする場合、分散剤をスラリーに添加してもよい。分散剤の種類は、水系や非水系の分散剤が挙げられ、非水系分散剤が好ましい。
非水系分散剤の種類は、ポリエーテル系、アルコール系、ポリアルキレンポリアミン系、ポリカルボン酸部分アルキルエステル系などの高分子型、多価アルコールエステル系、アルキルポリアミン系などの低分子型、ポリリン酸塩系などの無機型が例示される。
When the mixture of the polysiloxane compound and the carbon source resin is made into a slurry, a dispersant may be added to the slurry. The type of dispersant includes aqueous and non-aqueous dispersants, and non-aqueous dispersants are preferred.
Examples of the types of non-aqueous dispersants include polymeric types such as polyethers, alcohols, polyalkylene polyamines, and polycarboxylic acid partial alkyl esters; low molecular types such as polyhydric alcohol esters and alkyl polyamines; and inorganic types such as polyphosphates.
本前駆体がスラリーまたは溶液の場合、ポリシロキサン化合物と炭素源樹脂とが均一に混合した状態であることが好ましい。前記混合は分散および混合の機能を有する装置を用いて行われる。分散および混合の機能を有する装置としては、例えば、攪拌機、超音波ミキサー、プリミックス分散機などが挙げられる。
ポリシロキサン化合物と炭素源樹脂の混合物のスラリーまたは溶液におけるポリシロキサン化合物と炭素源樹脂の混合物の濃度は特に限定されないが、前記溶媒および、必要に応じて分散剤を含む場合は分散剤とポリシロキサン化合物と炭素源樹脂の混合物との合計量を100質量%として、ポリシロキサン化合物と炭素源樹脂の混合物の量は70質量%から99質量%の範囲が好ましく、80質量%から95質量%がより好ましい。
When the precursor is a slurry or a solution, it is preferable that the polysiloxane compound and the carbon source resin are in a uniformly mixed state. The mixing is performed using a device having the functions of dispersion and mixing. Examples of the device having the functions of dispersion and mixing include a stirrer, an ultrasonic mixer, and a premix disperser.
The concentration of the mixture of the polysiloxane compound and the carbon source resin in the slurry or solution of the mixture of the polysiloxane compound and the carbon source resin is not particularly limited, but the amount of the mixture of the polysiloxane compound and the carbon source resin is preferably in the range of 70% by mass to 99% by mass, and more preferably 80% by mass to 95% by mass, where the total amount of the solvent and, if necessary, a dispersant, and the mixture of the polysiloxane compound and the carbon source resin is 100% by mass.
本塗布乾燥工程では、本前駆体作成工程で得られた本前駆体を酸化ケイ素含有粒子の表面にまず塗布する。
酸化ケイ素含有粒子は、前記のとおり、二酸化珪素と金属珪素との混合物を加熱して生成した一酸化珪素ガスを冷却し析出により製造することができる。また市販の酸化ケイ素を用いてもよい。
酸化ケイ素を粉砕、分級等により所望の平均粒径として酸化ケイ素含有粒子としてもよい。粉砕、分級の方法は前記のとおりである。
In the present coating and drying step, the present precursor obtained in the present precursor preparation step is first coated on the surface of silicon oxide-containing particles.
As described above, the silicon oxide-containing particles can be produced by heating a mixture of silicon dioxide and metallic silicon to produce silicon monoxide gas, which is then cooled and precipitated. Commercially available silicon oxide may also be used.
Silicon oxide may be crushed, classified, etc. to obtain silicon oxide-containing particles having a desired average particle size. The crushing and classification methods are as described above.
塗布の方法は、例えば、本前駆体がスラリーまたは溶液の場合は、本前駆体と酸化ケイ素含有粒子に噴霧して塗布する方法、ロール、刷毛等により塗布する方法、または本前駆体に浸漬する方法等の方法が挙げられる。
また本前駆体が前記溶媒を含まない場合は、酸ケイ素含有粒子のスラリーまたは溶液に本前駆体を浸漬する方法、または本前駆体を酸化ケイ素含有粒子に蒸着する方法等による塗布する方法が挙げられる。
Examples of the application method include, when the precursor is a slurry or solution, spraying the precursor and silicon oxide-containing particles, applying the precursor with a roll or brush, or immersing the precursor in the solution.
When the present precursor does not contain the solvent, examples of the method include a method of immersing the present precursor in a slurry or solution of silicon oxide-containing particles, or a method of applying the present precursor onto silicon oxide-containing particles by vapor deposition.
前記方法のなかでも、本前駆体としてスラリーを用い、スラリー状の本前駆体に酸化ケイ素含有粒子を浸漬し混合する方法、または酸化ケイ素含有粒子のスラリーとスラリー状の本前駆体とを混合するのが好ましい。
これら混合は分散および混合の機能を有する装置を用いて行うのが好ましい。分散および混合の機能を有する装置としては、例えば、攪拌機、超音波ミキサー、プリミックス分散機などが挙げられる。
Among the above methods, it is preferable to use a slurry as the present precursor and to immerse and mix silicon oxide-containing particles in the slurry of the present precursor, or to mix a slurry of silicon oxide-containing particles with the present precursor in slurry form.
The mixing is preferably carried out using a device having the functions of dispersion and mixing, such as a stirrer, ultrasonic mixer, premix disperser, etc.
酸化ケイ素含有粒子のスラリーは、有機溶媒を用い、酸化ケイ素粒子を湿式粉末粉砕装置にて粉砕しながら調整することができる。酸化ケイ素含有粒子の粉砕を促進させるために有機溶媒に分散剤を添加して用いても良い。湿式粉砕装置としてはローラーミル、高速回転粉砕機、容器駆動型ミル、ビーズミルなどが挙げられる。The silicon oxide-containing particle slurry can be prepared by grinding the silicon oxide particles in a wet powder grinding device using an organic solvent. A dispersant may be added to the organic solvent to promote grinding of the silicon oxide-containing particles. Examples of wet grinding devices include roller mills, high-speed rotary grinders, container-driven mills, and bead mills.
前記有機溶媒は、例えば、前記溶媒と同様、ケトン類のアセトン、メチルエチルケトン、メチルイソブチルケトン、ジイソブチルケトン;アルコール類のエタノール、メタノール、ノルマルプロピルアルコール、イソプロピルアルコール;芳香族のベンゼン、トルエン、キシレンなどが挙げられる。 The organic solvent may be, for example, the same as the solvent described above, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and diisobutyl ketone; alcohols such as ethanol, methanol, normal propyl alcohol, and isopropyl alcohol; and aromatics such as benzene, toluene, and xylene.
また酸化ケイ素含有粒子をスラリーとする場合、分散剤を添加してもよい。分散剤の種類は、前期と同様、水系や非水系の分散剤が挙げられ、非水系分散剤が好ましい。非水系分散剤の種類は、ポリエーテル系、アルコール系、ポリアルキレンポリアミン系、ポリカルボン酸部分アルキルエステル系などの高分子型、多価アルコールエステル系、アルキルポリアミン系などの低分子型、ポリリン酸塩系などの無機型が例示される。
酸化ケイ素含有粒子のスラリーにおける酸化ケイ素含有粒子の固形分の濃度は特に限定されないが、前記溶媒および、必要に応じて分散剤を含む場合は分散剤と酸化ケイ素の合計量を100質量%として、酸化ケイ素の量は5質量%から40質量%の範囲が好ましく、10質量%から30質量%がより好ましい。
In addition, when the silicon oxide-containing particles are made into a slurry, a dispersant may be added. As with the above, the type of dispersant may be an aqueous or non-aqueous dispersant, with non-aqueous dispersants being preferred. Examples of the type of non-aqueous dispersant include polymeric types such as polyethers, alcohols, polyalkylene polyamines, and polycarboxylic acid partial alkyl esters, low molecular types such as polyhydric alcohol esters and alkyl polyamines, and inorganic types such as polyphosphates.
The concentration of the solid content of the silicon oxide-containing particles in the slurry of silicon oxide-containing particles is not particularly limited, but when the above-mentioned solvent and, if necessary, a dispersant are contained, the amount of silicon oxide is preferably in the range of 5 mass% to 40 mass%, and more preferably 10 mass% to 30 mass%, where the total amount of the dispersant and silicon oxide is 100 mass%.
前記方法により酸化ケイ素含有粒子の表面に本前駆体を塗布し、本前駆体が塗布された酸化ケイ素含有粒子を乾燥する。
塗布にスラリー状の酸化ケイ素含有粒子またはスラリー状の本前駆体を用いた場合、用いた前記溶媒が除去されるまで乾燥するのが好ましい。
前記溶媒を除去することを目的とする乾燥は、乾燥機、減圧乾燥機、噴霧乾燥機などを用いることができる。
乾燥により溶媒を除去する場合、溶媒を完全に除去してもよく、少量の溶媒が残った状態で後述する本焼成工程に供してもよい。
The precursor is applied to the surface of silicon oxide-containing particles by the above-mentioned method, and the silicon oxide-containing particles to which the precursor is applied are dried.
When a slurry of silicon oxide-containing particles or a slurry of the present precursor is used for coating, it is preferable to dry the material until the solvent used is removed.
For the drying to remove the solvent, a dryer, a reduced pressure dryer, a spray dryer, or the like can be used.
When the solvent is removed by drying, the solvent may be completely removed, or the product may be subjected to the firing step described below with a small amount of the solvent remaining.
前記本塗布乾燥工程で得られた乾燥物は前記酸化ケイ素含有粒子を20質量%から90質量%、ポリシロキサン化合物の固形分を5質量%から30質量%、炭素源樹脂の固形分を0質量%から20質量%含有するのが好ましく、酸化ケイ素含有粒子の固形分含有量を30質量%から85質量%、ポリシロキサン化合物の固形分を10から25質量%、炭素源樹脂の固形分を0質量%から10質量%含有するのがより好ましい。The dried product obtained in the coating and drying process preferably contains 20% to 90% by mass of the silicon oxide-containing particles, 5% to 30% by mass of the solid content of the polysiloxane compound, and 0% to 20% by mass of the solid content of the carbon source resin, and more preferably contains 30% to 85% by mass of the solid content of the silicon oxide-containing particles, 10 to 25% by mass of the solid content of the polysiloxane compound, and 0% to 10% by mass of the solid content of the carbon source resin.
本焼成工程では、前記本塗布乾燥工程で得られた乾燥物を不活性雰囲気中、焼成温度900℃から1300℃で高温焼成する。本焼成工程では熱分解可能な有機成分が完全分解さされ、前記本活物質が得られる。焼成温度を900℃から1300℃とすることで、熱分解可能な有機成分を完全分解することができる。またポリシロキサン化合物および炭素源樹脂が高温処理のエネルギーによってケイ素-酸素-炭素骨格とフリー炭素を有するシリコンオキシカーバイド含有相に転化される。In the firing process, the dried material obtained in the coating and drying process is fired at a high temperature of 900°C to 1300°C in an inert atmosphere. In the firing process, the thermally decomposable organic components are completely decomposed, and the active material is obtained. By setting the firing temperature at 900°C to 1300°C, the thermally decomposable organic components can be completely decomposed. In addition, the polysiloxane compound and the carbon source resin are converted by the energy of the high-temperature treatment into a silicon oxycarbide-containing phase having a silicon-oxygen-carbon skeleton and free carbon.
焼成は昇温速度、一定温度での保持時間等により規定される焼成のプログラムに沿って行われる。なお焼成温度は、本焼成工程において設定する最高温度であり、焼成物の構造や性能に強く影響を与えるものである。焼成温度により、シリコンオキシカーバイド含有相のケイ素と炭素の化学結合状態を保有する本活物質の微細構造が精密に制御でき、より優れた充放電特性が得られる。 Firing is carried out according to a firing program that specifies factors such as the heating rate and holding time at a constant temperature. The firing temperature is the maximum temperature set in the firing process, and it has a strong influence on the structure and performance of the fired product. The firing temperature allows precise control of the microstructure of this active material, which retains the chemically bonded state of silicon and carbon in the silicon oxycarbide-containing phase, resulting in better charge/discharge characteristics.
焼成方法は、特に限定されないが、不活性雰囲気中にて加熱機能を有する反応装置を用いればよく、連続法、回分法での処理が可能である。焼成用装置については、流動層反応炉、回転炉、竪型移動層反応炉、トンネル炉、バッチ炉、ロータリーキルン等をその目的に応じ適宜選択することができる。
不活性ガスは窒素、ヘリウム、アルゴン等のガスが挙げられる。
The calcination method is not particularly limited, but it is sufficient to use a reaction device having a heating function in an inert atmosphere, and treatment can be performed by a continuous method or a batch method. The calcination device can be appropriately selected from a fluidized bed reaction furnace, a rotary furnace, a vertical moving bed reaction furnace, a tunnel furnace, a batch furnace, a rotary kiln, etc. depending on the purpose.
The inert gas may be nitrogen, helium, argon, or the like.
本焼成工程で得られた本活物質は、必要に応じて粉砕し、分級してもよい。粉砕は所望の粒径まで一段で行っても良いし、数段に分けて行っても良い。例えば10mm以上の塊または凝集粒子を10μm程度とする場合は、ジョークラッシャー、ロールクラッシャー等で粗粉砕を行い1mm程度の粒子にした後、グローミル、ボールミル等で100μm程度とし、ビーズミル、ジェットミル等で10μm程度まで粉砕する。粉砕で作製した粒子には粗大粒子が含まれる場合がありそれを取り除くため、また、微粉を取り除いて粒度分布を調整する場合は分級を行う。使用する分級機は風力分級機、湿式分級機等目的に応じて使い分けるが、粗大粒子を取り除く場合、篩を通す分級方式が確実に目的を達成できるために好ましい。なお、本焼成工程前に前記本塗布乾燥工程で得られた乾燥物を噴霧乾燥等により目標粒子径付近の形状に制御し、その形状で本焼成工程に供した場合は、粉砕の工程を省くことも可能である。The active material obtained in the firing process may be pulverized and classified as necessary. The pulverization may be performed in one step to the desired particle size, or may be performed in several steps. For example, when lumps or aggregates of 10 mm or more are to be made into particles of about 10 μm, the particles are coarsely pulverized with a jaw crusher, roll crusher, etc. to about 1 mm, then crushed to about 100 μm with a glow mill, ball mill, etc., and crushed to about 10 μm with a bead mill, jet mill, etc. The particles produced by pulverization may contain coarse particles, and classification is performed to remove them, or to remove fine powder and adjust the particle size distribution. The classifier used is a wind classifier, a wet classifier, etc., depending on the purpose, but when removing coarse particles, a classification method that passes through a sieve is preferable because it can reliably achieve the purpose. In addition, if the dried product obtained in the coating and drying process is controlled to a shape close to the target particle size by spray drying, etc. before the firing process, and is subjected to the firing process in that shape, it is possible to omit the pulverization process.
本活物質が前記金属シリケート化合物を有する場合、酸化ケイ素粒子のスラリーと本前駆体と混合して得られたスラリーに、Li、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属の塩を添加し、乾燥後、本焼成工程にて前記シリケート化合物を有する本活物質が得られる。
Li、K、Na、Ca、MgおよびAlからなる群から選ばれる少なくとも1種の金属の塩としては、これら金属のフッ化物、塩化物、臭化物等のハロゲン化物、水酸化物、炭酸塩等が挙げられる。
When the present active material has the metal silicate compound, a salt of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg and Al is added to a slurry obtained by mixing a slurry of silicon oxide particles with the present precursor, and after drying, the present active material having the silicate compound is obtained in a main firing process.
Examples of the salt of at least one metal selected from the group consisting of Li, K, Na, Ca, Mg, and Al include halides such as fluorides, chlorides, and bromides, hydroxides, and carbonates of these metals.
前記金属の塩は2種以上の金属の塩でもよく、一つの塩が複数種の金属を有していてもよいし、異なる金属を有する塩の混合物であってもよい。
前記金属の塩を酸化ケイ素含有粒子と本前駆体のスラリーに添加する際の金属の塩の添加量は、酸化ケイ素含有粒子中の酸化ケイ素のモル数に対してモル比で0.01から0.5までが好ましい。
前記金属の塩が有機溶媒に可溶の場合、前記金属の塩を有機溶媒に溶かして酸化ケイ素含有粒子と本前駆体のスラリーに加えて混合すればよい。前記金属の塩が有機溶媒に不溶の場合、金属の塩の粒子を有機溶媒に分散してから、酸化ケイ素含有粒子と本前駆体のスラリーに加え、混合すればよい。前記金属の塩は、分散効果向上の観点から平均粒径が100nm以下のナノ粒子が好ましい。前記有機溶媒は、アルコール類、ケトン類などを好適に用いることができるが、トルエン、キシレン、ナフタレン、メチルナフタレンなどの芳香族炭化水素系溶剤も用いることができる。
The salt of the metal may be a salt of two or more metals, one salt may have a plurality of metals, or a mixture of salts having different metals.
The amount of the metal salt added when the metal salt is added to the slurry of the silicon oxide-containing particles and the present precursor is preferably 0.01 to 0.5 in terms of molar ratio to the number of moles of silicon oxide in the silicon oxide-containing particles.
When the metal salt is soluble in an organic solvent, the metal salt may be dissolved in an organic solvent and added to the slurry of the silicon oxide-containing particles and the precursor, and then mixed. When the metal salt is insoluble in an organic solvent, the metal salt particles may be dispersed in an organic solvent, and then added to the slurry of the silicon oxide-containing particles and the precursor, and then mixed. From the viewpoint of improving the dispersion effect, the metal salt is preferably nanoparticles having an average particle size of 100 nm or less. As the organic solvent, alcohols, ketones, etc. can be suitably used, but aromatic hydrocarbon solvents such as toluene, xylene, naphthalene, and methylnaphthalene can also be used.
前記コアシェル複合体が本シリケート化合物を有する場合、前記酸化ケイ素含有粒子と本前駆体のスラリーに前記金属の塩を均一に分散させることで、本シリケート化合物を有するコアシェル複合体を得ることができる。前記本前駆体のスラリーおよび酸化ケイ素含有粒子のスラリーと前記金属の塩とが固相反応する条件で、金属の塩の分子と本酸化ケイ素粒子および前記シリコンオキシカーバイドとを十分に接触させることで複合構造体中に本シリケート化合物を存在させることができる。
また、有機添加物を用いて前記金属の塩の分子を表面修飾することで、酸化ケイ素含有粒子表面付近に付着することができる。有機添加物の分子構造は、特に制限はないが、酸化ケイ素含有粒子の表面上に存在している分散剤との物理的または化学的結合ができるような分子構造が好ましい。前記の物理的または化学的結合は、静電作用、水素結合、分子間ファンデルワールス力、イオン結合、共有結合などが挙げられる。高温焼成の時、前記金属の塩の分子が酸化ケイ素中のSiO2相と固相反応することにより、酸化ケイ素含有粒子中に金属シリケート化合物を形成させることができる。
When the core-shell composite has the silicate compound, the metal salt can be uniformly dispersed in the slurry of the silicon oxide-containing particles and the precursor to obtain the core-shell composite having the silicate compound. Under the condition that the slurry of the precursor and the slurry of the silicon oxide-containing particles react with the metal salt in a solid phase, the metal salt molecules are sufficiently contacted with the silicon oxide particles and the silicon oxycarbide to make the silicate compound exist in the composite structure.
In addition, the metal salt molecules can be surface-modified using an organic additive, and can be attached near the surface of silicon oxide-containing particles. The molecular structure of the organic additive is not particularly limited, but it is preferable that the molecular structure can be physically or chemically bonded with the dispersant present on the surface of the silicon oxide-containing particles. The physical or chemical bond can be electrostatic action, hydrogen bond, intermolecular van der Waals force, ionic bond, covalent bond, etc. During high-temperature firing, the metal salt molecules can undergo solid-phase reaction with the SiO2 phase in silicon oxide to form a metal silicate compound in the silicon oxide-containing particles.
本活物質が、前記コアシェル複合構造体の表面に前記非晶質炭素の被膜を有している場合、本製造方法は前記本焼成工程の後に、(4)化学気相蒸着装置内で、熱分解性炭素源ガスとキャリア不活性ガスフローの中、700℃から1000℃の温度範囲にて炭素被膜で被覆して負極活物質を得る工程を含んでもよい。
熱分解性炭素源ガスはプロパン、アセチレン、エチレン、アセトンなどが挙げられる。不活性ガスとしては、窒素、ヘリウム、アルゴン等が挙げられ、通常、窒素が用いられる。
When the active material has a coating of amorphous carbon on the surface of the core-shell composite structure, the production method may include, after the main firing step, (4) a step of coating with a carbon coating in a chemical vapor deposition apparatus at a temperature range of 700° C. to 1000° C. in a flow of a pyrolytic carbon source gas and a carrier inert gas to obtain a negative electrode active material.
Examples of the pyrolytic carbon source gas include propane, acetylene, ethylene, acetone, etc. Examples of the inert gas include nitrogen, helium, argon, etc., and nitrogen is usually used.
本活物質は、サイクル性、初期のクーロン効率および容量維持率に優れており、本活物質を含む負極として用いた二次電池は良好な特性を発揮する。
本活物質を負極活物質として用いる場合、本活物質を単独で用いてもよいし、本活物質と他の活物質との混合活物質を用いてもよいし、本活物質をマトリクス相に分散させた複合活物質と用いてもよい。
The present active material is excellent in cycle property, initial coulombic efficiency and capacity retention rate, and a secondary battery using the present active material as a negative electrode exhibits excellent characteristics.
When the present active material is used as a negative electrode active material, the present active material may be used alone, or a mixed active material of the present active material with another active material may be used, or the present active material may be used as a composite active material in which the present active material is dispersed in a matrix phase.
他の活物質としては、例えば、酸化ケイ素粒子、黒鉛、ケイ素粒子、金属スズ粒子、酸化スズ等が挙げられる。
マトリクス相はリチウムイオンを吸蔵放出が可能な物質である。吸蔵放出が可能な物質とは、電池の充電時にリチウムイオンをマトリクス相内に吸蔵し、放電時にリチウムイオンをマトリクス相内から放出することができる物質である。リチウム二次電池では前記吸蔵放出のサイクルが繰り返される。
リチウムイオンを吸蔵放出が可能な物質としては黒鉛、酸化ケイ素、酸化チタン、酸化スズ、およびケイ素、酸素、炭素を含む化合物が挙げられ、前記マトリクス相はこれら物質から構成されるのが好ましく、ケイ素、酸素、炭素を含む化合物から構成されるのが好ましい。
ケイ素、酸素、炭素を含む化合物としてはシリコンオキシカーバイド含有相に含まれる前記シリコンオキシカーバイドが挙げられ、好ましいシリコンオキシカーバイドも前記と同じである。またシリコンオキシカーバイドは窒素原子を含んでもよく、窒素を含場合の好ましい化合物は前記と同じである。
Examples of other active materials include silicon oxide particles, graphite, silicon particles, metal tin particles, and tin oxide.
The matrix phase is a material capable of absorbing and releasing lithium ions. The material capable of absorbing and releasing lithium ions is a material that can absorb lithium ions into the matrix phase when the battery is charged and release lithium ions from the matrix phase when the battery is discharged. The above-mentioned cycle of absorption and release is repeated in the lithium secondary battery.
Examples of materials capable of absorbing and releasing lithium ions include graphite, silicon oxide, titanium oxide, tin oxide, and compounds containing silicon, oxygen, and carbon. The matrix phase is preferably composed of these materials, and more preferably composed of compounds containing silicon, oxygen, and carbon.
The silicon, oxygen and carbon-containing compound may be the silicon oxycarbide contained in the silicon oxycarbide-containing phase, and the preferred silicon oxycarbide is the same as that described above. The silicon oxycarbide may contain a nitrogen atom, and the preferred compound when it contains nitrogen is the same as that described above.
本活物質、本活物質を含む混合活物質または複合活物質と有機結着剤と、必要に応じてその他の導電助剤などの成分を含んで構成されるスラリーを集電体銅箔上へ薄膜状に塗付して負極とすることができる。また、本活物質を含むスラリーに黒鉛など炭素材料を加えて負極を作製することもできる。
炭素材料としては、天然黒鉛、人工黒鉛、ハードカーボンまたはソフトカーボンのような非晶質炭素などが挙げられる。
A slurry containing the present active material, a mixed active material or a composite active material containing the present active material, an organic binder, and other components such as a conductive assistant as required can be applied to a copper foil collector in the form of a thin film to form a negative electrode. A carbon material such as graphite can also be added to the slurry containing the present active material to form a negative electrode.
Examples of the carbon material include natural graphite, artificial graphite, and amorphous carbon such as hard carbon or soft carbon.
例えば、本活物質と、有機結着材であるバインダーとを、溶媒とともに撹拌機、ボールミル、スーパーサンドミル、加圧ニーダ等の分散装置により混練して、負極材スラリーを調製し、これを集電体に塗布して負極層を形成することで得ることができる。また、ペースト状の負極材スラリーをシート状、ペレット状等の形状に成形し、これを集電体と一体化することでも得ることができる。For example, the active material and the organic binder are mixed together with a solvent using a dispersing device such as a mixer, ball mill, super sand mill, or pressure kneader to prepare a negative electrode material slurry, which is then applied to a current collector to form a negative electrode layer. Alternatively, the negative electrode material can be obtained by forming the paste-like negative electrode material slurry into a sheet, pellet, or other shape and integrating it with a current collector.
前記有機結着剤としては、例えば、スチレン-ブタジエンゴム共重合体(以下、「SBR」とも記す。);メチル(メタ)アクリレート、エチル(メタ)アクリレート、ブチル(メタ)アクリレート、(メタ)アクリロニトリル、およびヒドロキシエチル(メタ)アクリレート等のエチレン性不飽和カルボン酸エステル、および、アクリル酸、メタクリル酸、イタコン酸、フマル酸、マレイン酸等のエチレン性不飽和カルボン酸からなる(メタ)アクリル共重合体等の不飽和カルボン酸共重合体;ポリ弗化ビニリデン、ポリエチレンオキサイド、ポリエピクロヒドリン、ポリホスファゼン、ポリアクリロニトリル、ポリイミド、ポリアミドイミド、カルボキシメチルセルロース(以下、「CMC」とも記す。)などの高分子化合物が挙げられる。Examples of the organic binder include styrene-butadiene rubber copolymers (hereinafter also referred to as "SBR"); ethylenically unsaturated carboxylic acid esters such as methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, (meth)acrylonitrile, and hydroxyethyl (meth)acrylate, and unsaturated carboxylic acid copolymers such as (meth)acrylic copolymers consisting of ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, fumaric acid, and maleic acid; and polymeric compounds such as polyvinylidene fluoride, polyethylene oxide, polyepichlorohydrin, polyphosphazene, polyacrylonitrile, polyimide, polyamideimide, and carboxymethylcellulose (hereinafter also referred to as "CMC").
これらの有機結着剤は、それぞれの物性によって、水に分散、あるいは溶解したもの、また、N-メチル-2-ピロリドン(NMP)などの有機溶剤に溶解したものがある。リチウムイオン二次電池負極の負極層中の有機結着剤の含有比率は、1質量%から30質量%であることが好ましく、2質量%から20質量%であることがより好ましく、3質量%から15質量%であることがさらに好ましい。Depending on their physical properties, these organic binders may be dispersed or dissolved in water, or dissolved in an organic solvent such as N-methyl-2-pyrrolidone (NMP). The content of the organic binder in the negative electrode layer of the lithium ion secondary battery negative electrode is preferably 1% to 30% by mass, more preferably 2% to 20% by mass, and even more preferably 3% to 15% by mass.
有機結着剤の含有比率が1質量%以上であることで密着性がより良好で、充放電時の膨張および収縮によって負極構造の破壊がより抑制される。一方、30質量%以下であることで、電極抵抗の上昇がより抑えられる。
かかる範囲において、本活物質は、化学安定性が高く、水性バインダーも採用することができる点で、実用化面においても取り扱い容易である。
When the content of the organic binder is 1% by mass or more, the adhesion is better and the destruction of the negative electrode structure due to the expansion and contraction during charging and discharging is more suppressed, whereas when the content is 30% by mass or less, the increase in the electrode resistance is more suppressed.
Within this range, the present active material has high chemical stability and can employ an aqueous binder, making it easy to handle in practical applications.
また、前記負極材スラリーには、必要に応じて、導電助材を混合してもよい。導電助材としては、例えば、カーボンブラック、グラファイト、アセチレンブラック、あるいは導電性を示す酸化物や窒化物等が挙げられる。導電助剤の使用量は、本発明の負極活物質に対して1質量%から15質量%程度とすればよい。In addition, the negative electrode material slurry may be mixed with a conductive additive as necessary. Examples of conductive additives include carbon black, graphite, acetylene black, and oxides and nitrides that exhibit electrical conductivity. The amount of conductive additive used may be about 1% by mass to 15% by mass relative to the negative electrode active material of the present invention.
また前記集電体の材質および形状については、例えば、銅、ニッケル、チタン、ステンレス鋼等を、箔状、穴開け箔状、メッシュ状等にした帯状のものを用いればよい。また、多孔性材料、たとえばポーラスメタル(発泡メタル)やカーボンペーパーなども使用できる。The material and shape of the current collector may be, for example, a strip of copper, nickel, titanium, stainless steel, or the like in the form of foil, perforated foil, mesh, or the like. Porous materials such as porous metal (foamed metal) and carbon paper may also be used.
前記負極材スラリーを集電体に塗布する方法としては、例えば、メタルマスク印刷法、静電塗装法、ディップコート法、スプレーコート法、ロールコート法、ドクターブレード法、グラビアコート法、スクリーン印刷法などが挙げられる。塗布後は、必要に応じて平板プレス、カレンダーロール等による圧延処理を行うことが好ましい。 Methods for applying the negative electrode material slurry to the current collector include, for example, metal mask printing, electrostatic painting, dip coating, spray coating, roll coating, doctor blade, gravure coating, screen printing, etc. After application, it is preferable to perform a rolling process using a flat plate press, calendar roll, etc. as necessary.
また、前記負極材スラリーをシート状またはペレット状等として、これと集電体との一体化は、例えば、ロール、プレス、もしくはこれらの組み合わせ等により行うことができる。In addition, the negative electrode material slurry can be made into a sheet or pellet form, and integrated with the current collector by, for example, rolling, pressing, or a combination of these.
前記集電体上に形成された負極層または集電体と一体化した負極層は、用いた有機結着剤に応じて熱処理することが好ましい。例えば、水系のスチレン-ブタジエンゴム共重合体(SBR)などを用いた場合には100から130℃で熱処理すればよく、ポリイミド、ポリアミドイミドを主骨格とした有機結着剤を用いた場合には150から450℃で熱処理することが好ましい。The negative electrode layer formed on the current collector or the negative electrode layer integrated with the current collector is preferably heat-treated according to the organic binder used. For example, when using a water-based styrene-butadiene rubber copolymer (SBR), heat treatment at 100 to 130°C is sufficient, and when using an organic binder with a polyimide or polyamideimide as the main skeleton, heat treatment at 150 to 450°C is preferable.
この熱処理により溶媒の除去、バインダーの硬化による高強度化が進み、粒子間および粒子と集電体間の密着性が向上できる。なお、これらの熱処理は、処理中の集電体の酸化を防ぐため、ヘリウム、アルゴン、窒素等の不活性雰囲気、真空雰囲気で行うことが好ましい。This heat treatment removes the solvent and hardens the binder, increasing strength and improving adhesion between particles and between the particles and the current collector. It is preferable to carry out these heat treatments in an inert atmosphere such as helium, argon, or nitrogen, or in a vacuum atmosphere, to prevent oxidation of the current collector during treatment.
また、熱処理した後に、負極は加圧処理しておくことが好ましい。本活物質を用いた負極では、電極密度が1g/cm3から1.8g/cm3であることが好ましく、1.1g/cm3から1.7g/cm3であることがより好ましく、1.2g/cm3から1.6g/cm3であることがさらに好ましい。電極密度については、高いほど密着性および電極の体積容量密度が向上する傾向がある。一方、電極密度が高すぎると、電極中の空隙が減少することでケイ素など体積膨張の抑制効果が弱くなり、容量維持率が低下することがある。そのため電極密度の最適な範囲が選択される。 In addition, after the heat treatment, the negative electrode is preferably subjected to pressure treatment. In the negative electrode using the present active material, the electrode density is preferably 1 g/cm 3 to 1.8 g/cm 3 , more preferably 1.1 g/cm 3 to 1.7 g/cm 3 , and even more preferably 1.2 g/cm 3 to 1.6 g/cm 3. The higher the electrode density, the more the adhesion and the volume capacity density of the electrode tend to improve. On the other hand, if the electrode density is too high, the voids in the electrode are reduced, which weakens the effect of suppressing the volume expansion of silicon, etc., and the capacity retention rate may decrease. Therefore, the optimal range of the electrode density is selected.
本発明の二次電池は前記本活物質を負極に含む。本活物質を含む負極を有する二次電池としては、非水電解質二次電池と固体型電解質二次電池が好ましく、特に非水電解質二次電池の負極として用いた際に優れた性能を発揮するものである。The secondary battery of the present invention contains the active material in the negative electrode. As secondary batteries having a negative electrode containing the active material, non-aqueous electrolyte secondary batteries and solid electrolyte secondary batteries are preferred, and the active material exhibits excellent performance particularly when used as the negative electrode of a non-aqueous electrolyte secondary battery.
前記本発明の二次電池は、例えば、湿式電解質二次電池に用いる場合、正極と、本発明の負極活物質を含む負極とを、セパレータを介して対向して配置し、電解液を注入することにより構成することができる。When the secondary battery of the present invention is used, for example, as a wet electrolyte secondary battery, it can be constructed by arranging a positive electrode and a negative electrode containing the negative electrode active material of the present invention opposite each other via a separator and injecting an electrolyte.
正極は、負極と同様にして、集電体表面上に正極層を形成することで得ることができる。この場合の集電体はアルミニウム、チタン、ステンレス鋼等の金属や合金を、箔状、穴開け箔状、メッシュ状等にした帯状のものを用いることができる。The positive electrode can be obtained by forming a positive electrode layer on the surface of a current collector in the same manner as the negative electrode. In this case, the current collector can be a strip of metal or alloy such as aluminum, titanium, or stainless steel in the form of foil, perforated foil, mesh, or the like.
正極層に用いる正極材料としては、特に制限されない。非水電解質二次電池の中でも、リチウムイオン二次電池を作製する場合には、例えば、リチウムイオンをドーピングまたはインターカレーション可能な金属化合物、金属酸化物、金属硫化物、または導電性高分子材料を用いればよい。例えば、コバルト酸リチウム(LiCoO2)、ニッケル酸リチウム(LiNiO2)、マンガン酸リチウム(LiMnO2)、およびこれらの複合酸化物(LiCoxNiyMnzO2、x+y+z=1)、リチウムマンガンスピネル(LiMn2O4)、リチウムバナジウム化合物、V2O5、V6O13、VO2、MnO2、TiO2、MoV2O8、TiS2、V2S5、VS2、MoS2、MoS3、Cr3O8、Cr2O5、オリビン型LiMPO4(ただし、MはCo、Ni、MnまたはFe)、ポリアセチレン、ポリアニリン、ポリピロール、ポリチオフェン、ポリアセン等の導電性ポリマー、多孔質炭素等などを単独或いは混合して使用することができる。 The positive electrode material used in the positive electrode layer is not particularly limited. When a lithium ion secondary battery is produced among nonaqueous electrolyte secondary batteries, for example, a metal compound, a metal oxide, a metal sulfide, or a conductive polymer material capable of doping or intercalating lithium ions may be used. For example, lithium cobalt oxide ( LiCoO2 ), lithium nickel oxide ( LiNiO2 ), lithium manganese oxide ( LiMnO2 ), and composite oxides thereof ( LiCoxNiyMnzO2 , x+y+z= 1 ), lithium manganese spinel ( LiMn2O4 ), lithium vanadium compounds, V2O5 , V6O13 , VO2 , MnO2 , TiO2 , MoV2O8 , TiS2 , V2S5 , VS2 , MoS2 , MoS3 , Cr3O8 , Cr2O5 , olivine type LiMPO4 (wherein M is Co, Ni, Mn or Fe), conductive polymers such as polyacetylene, polyaniline, polypyrrole, polythiophene and polyacene, porous carbon, etc. can be used alone or in combination.
セパレータとしては、例えば、ポリエチレン、ポリプロピレン等のポリオレフィンを主成分とした不織布、クロス、微孔フィルムまたはそれらを組み合わせたものを使用することができる。なお、作製する非水電解質二次電池の正極と負極が直接接触しない構造にした場合は、セパレータを使用する必要はない。The separator may be, for example, a nonwoven fabric, cloth, microporous film, or a combination of these, whose main component is a polyolefin such as polyethylene or polypropylene. If the positive and negative electrodes of the nonaqueous electrolyte secondary battery are not in direct contact with each other, there is no need to use a separator.
電解液としては、例えば、LiClO4、LiPF6、LiAsF6、LiBF4、LiSO3CF3等のリチウム塩を、エチレンカーボネート、プロピレンカーボネート、ブチレンカーボネート、ビニレンカーボネート、フルオロエチレンカーボネート、シクロペンタノン、スルホラン、3-メチルスルホラン、2,4-ジメチルスルホラン、3-メチル-1,3-オキサゾリジン-2-オン、γ-ブチロラクトン、ジメチルカーボネート、ジエチルカーボネート、エチルメチルカーボネート、メチルプロピルカーボネート、ブチルメチルカーボネート、エチルプロピルカーボネート、ブチルエチルカーボネート、ジプロピルカーボネート、1,2-ジメトキシエタン、テトラヒドロフラン、2-メチルテトラヒドロフラン、1,3-ジオキソラン、酢酸メチル、酢酸エチル等の単体もしくは2成分以上の混合物の非水系溶剤に溶解した、いわゆる有機電解液を使用することができる。 As the electrolyte, for example, a so-called organic electrolyte can be used in which a lithium salt such as LiClO 4 , LiPF 6 , LiAsF 6 , LiBF 4 , or LiSO 3 CF 3 is dissolved in a non-aqueous solvent such as ethylene carbonate, propylene carbonate, butylene carbonate, vinylene carbonate, fluoroethylene carbonate, cyclopentanone, sulfolane, 3-methylsulfolane, 2,4-dimethylsulfolane, 3-methyl-1,3-oxazolidin-2-one, γ-butyrolactone, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, methyl propyl carbonate, butyl methyl carbonate, ethyl propyl carbonate, butyl ethyl carbonate, dipropyl carbonate, 1,2-dimethoxyethane, tetrahydrofuran, 2-methyltetrahydrofuran, 1,3-dioxolane, methyl acetate, or ethyl acetate, or a mixture of two or more components.
本発明の二次電池の構造は、特に限定されないが、通常、正極および負極と、必要に応じて設けられるセパレータとを、扁平渦巻状に巻回して巻回式極板群としたり、これらを平板状として積層して積層式極板群としたりし、これら極板群を外装体中に封入した構造とするのが一般的である。なお、本発明の実施例で用いるハーフセルは、負極に本活物質を主体とする構成とし、対極に金属リチウムを用いた簡易評価を行っているが、これはより活物質自体のサイクル特性を明確に比較するためである。The structure of the secondary battery of the present invention is not particularly limited, but typically, the positive and negative electrodes and a separator, which is provided as necessary, are wound into a flat spiral shape to form a wound electrode assembly, or are stacked as flat plates to form a stacked electrode assembly, and these electrode assembly are enclosed in an exterior body. Note that the half cells used in the examples of the present invention are mainly composed of the active material in the negative electrode, and a simple evaluation was performed using metallic lithium in the counter electrode, in order to more clearly compare the cycle characteristics of the active material itself.
本活物質を用いた二次電池は、特に限定されないが、ペーパー型電池、ボタン型電池、コイン型電池、積層型電池、円筒型電池、角型電池などとして使用される。上述した本発明の負極活物質は、リチウムイオンを挿入脱離することを充放電機構とする電気化学装置全般、例えば、ハイブリッドキャパシタ、固体リチウム二次電池などにも適用することが可能である。 Secondary batteries using this active material are used as, but are not limited to, paper-type batteries, button-type batteries, coin-type batteries, laminated batteries, cylindrical batteries, square batteries, etc. The above-mentioned negative electrode active material of the present invention can also be applied to general electrochemical devices that use the insertion and removal of lithium ions as a charging and discharging mechanism, such as hybrid capacitors and solid lithium secondary batteries.
前記のとおり、本活物質を二次電池の負極活物質とした時、サイクル性、初期のクーロン効率および容量維持率に優れた二次電池を与える。
本活物質は前記方法により負極として用い、前記負極を有する二次電池とすることができる。
As described above, when the present active material is used as the negative electrode active material of a secondary battery, it gives a secondary battery excellent in cycle performance, initial coulombic efficiency and capacity retention rate.
The present active material can be used as a negative electrode by the above-mentioned method to produce a secondary battery having the negative electrode.
以上、本活物質、本活物質を負極に含む二次電池、および本活物質の製造方法に関して説明したが、本発明は前記の実施形態の構成に限定されない。
本活物質および本活物質を負極に含む二次電池は前記実施形態の構成において、他の任意の構成を追加してもよいし、同様の機能を発揮する任意の構成と置換されていてもよい。
また本活物質の製造方法において、他の任意の工程を追加してもよいし、同様の機能を発揮する任意の工程と置換されていてもよい。
Although the present active material, the secondary battery containing the present active material in the negative electrode, and the method for producing the present active material have been described above, the present invention is not limited to the configurations of the above-mentioned embodiments.
In the present active material and the secondary battery containing the present active material in the negative electrode, any other configuration may be added to the configuration of the above embodiment, or any other configuration that exerts the same function may be substituted.
In the method for producing the active material of the present invention, any other step may be added or may be replaced with any other step that exhibits a similar function.
以下、実施例によって本発明を詳細に説明するが、本発明はこれらに限定されない。
なお、本発明の実施例で用いるハーフセルは、負極に本発明のケイ素含有活物質を主体とする構成とし、対極に金属リチウムを用いた簡易評価を行っているが、これはより活物質自体のサイクル特性を明確に比較するためである。
The present invention will be described in detail below with reference to examples, but the present invention is not limited to these.
In addition, the half-cell used in the examples of the present invention has a negative electrode mainly made of the silicon-containing active material of the present invention, and a simple evaluation is performed using metallic lithium as the counter electrode, in order to more clearly compare the cycle characteristics of the active material itself.
合成例:ポリシロキサン化合物の作製
合成例1(メチルトリメトキシシランの縮合物(a1)の合成)
攪拌機、温度計、滴下ロート、冷却管および窒素ガス導入口を備えた反応容器に、1、421質量部のメチルトリメトキシシラン(以下、「MTMS」と略記する。)を仕込んで、60℃まで昇温した。次いで、前記反応容器中に0.17質量部のiso-プロピルアシッドホスフェート(SC有機化学株式会社製「Phoslex A-3」)と207質量部の脱イオン水との混合物を5分間で滴下した後、80℃の温度で4時間撹拌してMTMSの加水分解縮合反応をさせた。
前記の加水分解縮合反応によって得られた縮合物を、温度40から60℃および40から1.3kPaの減圧下で蒸留した。なお、「40から1.3kPaの減圧下」とは、メタノールの留去開始時の減圧条件が40kPaであり、最終的に1.3kPaとなるまで減圧することを意味する。以下の記載においても同様である。前記反応過程で生成したメタノールおよび水を除去することによって、数平均分子量が1、000から5、000のMTMSの縮合物(以下、「a1」とも記す。)を含有する液を1、000質量部得た。得られた液の有効成分は70質量%であった。
なお、前記有効成分とは、MTMS等のシランモノマーのメトキシ基が全て縮合反応した場合の理論収量(質量部)を、縮合反応後の実収量(質量部)で除した値、〔シランモノマーのメトキシ基が全て縮合反応した場合の理論収量(質量部)/縮合反応後の実収量(質量部)〕、により算出したものである。
Synthesis Example: Preparation of Polysiloxane Compound Synthesis Example 1 (Synthesis of Methyltrimethoxysilane Condensate (a1))
A reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, a cooling tube, and a nitrogen gas inlet was charged with 1,421 parts by mass of methyltrimethoxysilane (hereinafter abbreviated as "MTMS") and heated to 60° C. Next, a mixture of 0.17 parts by mass of iso-propyl acid phosphate ("Phoslex A-3" manufactured by SC Organic Chemical Co., Ltd.) and 207 parts by mass of deionized water was dropped into the reaction vessel over 5 minutes, and the mixture was stirred at a temperature of 80° C. for 4 hours to carry out a hydrolysis and condensation reaction of MTMS.
The condensate obtained by the hydrolysis-condensation reaction was distilled at a temperature of 40 to 60° C. and under a reduced pressure of 40 to 1.3 kPa. The phrase "under a reduced pressure of 40 to 1.3 kPa" means that the reduced pressure condition at the start of distillation of methanol is 40 kPa, and the pressure is finally reduced to 1.3 kPa. The same applies to the following description. By removing the methanol and water produced during the reaction, 1,000 parts by mass of a liquid containing a condensate of MTMS having a number average molecular weight of 1,000 to 5,000 (hereinafter also referred to as "a1"). The content of the active ingredient in the obtained liquid was 70% by mass.
The effective component is calculated by dividing the theoretical yield (parts by mass) when all methoxy groups of a silane monomer such as MTMS undergo a condensation reaction by the actual yield (parts by mass) after the condensation reaction, i.e., [theoretical yield (parts by mass) when all methoxy groups of a silane monomer undergo a condensation reaction/actual yield (parts by mass)].
合成例2(硬化性樹脂組成物(1)の製造)
撹拌機、温度計、滴下ロート、冷却管および窒素ガス導入口を備えた反応容器に、150質量部のブタノール(以下、「BuOH」とも記す。)、105質量部のフェニルトリメトキシシラン(以下、「PTMS」とも記す。)、277質量部のジメチルジメトキシシラン(以下、「DMDMS」とも記す。)を仕込んで80℃まで昇温した。
次いで、同温度で21質量部のメチルメタアクリレート(以下、「MMA」とも記す。)、4質量部のブチルメタアクリレート(以下、「BMA」とも記す。)、3質量部の酪酸(以下、「BA」とも記す。)、2質量部のメタクリロイルオキシプロピルトリメトキシシラン(以下、「MPTS」とも記す。)、3質量部のBuOHおよび0.6質量部のブチルペルオキシ-2-エチルヘキサノエート(以下、「TBPEH」とも記す。)を含有する混合物を、前記反応容器中へ6時間で滴下した。滴下終了後、更に同温度で20時間反応させて加水分解性シリル基を有する数平均分子量が10、000のビニル重合体(a2-1)の有機溶剤溶液を得た。
Synthesis Example 2 (Production of Curable Resin Composition (1))
A reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, a cooling tube, and a nitrogen gas inlet was charged with 150 parts by mass of butanol (hereinafter also referred to as "BuOH"), 105 parts by mass of phenyltrimethoxysilane (hereinafter also referred to as "PTMS"), and 277 parts by mass of dimethyldimethoxysilane (hereinafter also referred to as "DMDMS"), and the temperature was raised to 80°C.
Next, at the same temperature, a mixture containing 21 parts by mass of methyl methacrylate (hereinafter also referred to as "MMA"), 4 parts by mass of butyl methacrylate (hereinafter also referred to as "BMA"), 3 parts by mass of butyric acid (hereinafter also referred to as "BA"), 2 parts by mass of methacryloyloxypropyltrimethoxysilane (hereinafter also referred to as "MPTS"), 3 parts by mass of BuOH, and 0.6 parts by mass of butylperoxy-2-ethylhexanoate (hereinafter also referred to as "TBPEH") was dropped into the reaction vessel over 6 hours. After the dropwise addition was completed, the mixture was further reacted at the same temperature for 20 hours to obtain an organic solvent solution of a vinyl polymer (a2-1) having a number average molecular weight of 10,000 and having a hydrolyzable silyl group.
次いで、0.04質量部のiso-プロピルアシッドホスフェート(SC有機化学株式会社製「Phoslex A-3」)と112質量部の脱イオン水との混合物を、5分間で滴下し、更に同温度で10時間撹拌して加水分解縮合反応させることで、ビニル重合体(a2-1)が有する加水分解性シリル基と、前記PTMSおよびDMDMS由来のポリシロキサンを有する加水分解性シリル基およびシラノール基とが結合した複合樹脂を含有する液を得た。
次いで、この液に472質量部の合成例1で得られたMTMSの縮合物(a1)、80質量部の脱イオン水を添加し、同温度で10時間撹拌して加水分解縮合反応させ、合成例1と同様の条件で蒸留することによって生成したメタノールおよび水を除去した。次いで、250質量部のBuOHを添加し、不揮発分が60.1質量%の硬化性樹脂組成物(1)を1、000質量部得た。
Next, a mixture of 0.04 parts by mass of iso-propyl acid phosphate ("Phoslex A-3" manufactured by SC Organic Chemical Co., Ltd.) and 112 parts by mass of deionized water was added dropwise over a period of 5 minutes, and the mixture was further stirred at the same temperature for 10 hours to cause a hydrolysis condensation reaction, thereby obtaining a liquid containing a composite resin in which the hydrolyzable silyl group of the vinyl polymer (a2-1) and the hydrolyzable silyl group and silanol group having the polysiloxane derived from the PTMS and DMDMS were bonded together.
Next, 472 parts by mass of the MTMS condensate (a1) obtained in Synthesis Example 1 and 80 parts by mass of deionized water were added to this liquid, and the mixture was stirred at the same temperature for 10 hours to cause a hydrolysis condensation reaction, and the produced methanol and water were removed by distillation under the same conditions as in Synthesis Example 1. Next, 250 parts by mass of BuOH was added to obtain 1,000 parts by mass of a curable resin composition (1) having a nonvolatile content of 60.1% by mass.
合成例3(硬化性樹脂組成物(2)の製造)
撹拌機、温度計、滴下ロート、冷却管および窒素ガス導入口を備えた反応容器に、150質量部のBuOH、249質量部のPTMS、263質量部のDMDMSを仕込んで80℃まで昇温した。
次いで、同温度で18質量部のMMA、14質量部のBMA、7質量部のBA、1質量部のアクリル酸(以下、「AA」とも記す。)、2質量部のMPTS、6質量部のBuOHおよび0.9質量部のTBPEHを含有する混合物を、前記反応容器中へ5時間で滴下した。滴下終了後、更に同温度で10時間反応させて加水分解性シリル基を有する数平均分子量が20、100のビニル重合体(a2-2)の有機溶剤溶液を得た。
Synthesis Example 3 (Production of Curable Resin Composition (2))
A reaction vessel equipped with a stirrer, a thermometer, a dropping funnel, a cooling tube and a nitrogen gas inlet was charged with 150 parts by mass of BuOH, 249 parts by mass of PTMS and 263 parts by mass of DMDMS, and the temperature was raised to 80°C.
Next, at the same temperature, a mixture containing 18 parts by mass of MMA, 14 parts by mass of BMA, 7 parts by mass of BA, 1 part by mass of acrylic acid (hereinafter also referred to as "AA"), 2 parts by mass of MPTS, 6 parts by mass of BuOH, and 0.9 parts by mass of TBPEH was added dropwise into the reaction vessel over 5 hours. After completion of the addition, the mixture was further reacted at the same temperature for 10 hours to obtain an organic solvent solution of a vinyl polymer (a2-2) having a hydrolyzable silyl group and a number average molecular weight of 20 and 100.
次いで、0.05質量部のiso-プロピルアシッドホスフェート(SC有機化学株式会社製「Phoslex A-3」)と147質量部の脱イオン水との混合物を、5分間で滴下し、更に同温度で10時間撹拌して加水分解縮合反応させることで、ビニル重合体(a2-2)が有する加水分解性シリル基と、前記PTMSおよびDMDMS由来のポリシロキサンが有する加水分解性シリル基およびシラノール基とが結合した複合樹脂を含有する液を得た。
次いで、この液に76質量部の3-グリシドキシプロピルトリメトキシシラン、231質量部の合成例1で得られたMTMSの縮合物(a1)、56質量部の脱イオン水を添加し、同温度で15時間撹拌して加水分解縮合反応させ、合成例1と同様の条件で蒸留することによって生成したメタノールおよび水を除去した。次いで、250質量部のBuOHを添加し、不揮発分が60.0質量%の硬化性樹脂組成物(2)を1、000質量部得た。
Next, a mixture of 0.05 parts by mass of iso-propyl acid phosphate ("Phoslex A-3" manufactured by SC Organic Chemical Industry Co., Ltd.) and 147 parts by mass of deionized water was added dropwise over a period of 5 minutes, and the mixture was further stirred at the same temperature for 10 hours to cause a hydrolysis condensation reaction, thereby obtaining a liquid containing a composite resin in which the hydrolyzable silyl group of the vinyl polymer (a2-2) and the hydrolyzable silyl group and silanol group of the polysiloxane derived from the PTMS and DMDMS were bonded to each other.
Next, 76 parts by mass of 3-glycidoxypropyltrimethoxysilane, 231 parts by mass of the MTMS condensate (a1) obtained in Synthesis Example 1, and 56 parts by mass of deionized water were added to this liquid, and the mixture was stirred at the same temperature for 15 hours to cause a hydrolysis and condensation reaction, and the produced methanol and water were removed by distillation under the same conditions as in Synthesis Example 1. Next, 250 parts by mass of BuOH was added to obtain 1,000 parts by mass of a curable resin composition (2) having a nonvolatile content of 60.0% by mass.
実施例1
前記合成例2で作製した平均分子量3500のポリシロキサン樹脂(硬化性樹脂組成物(1))と平均分子量3000のフェノール樹脂を樹脂固形物の重量比が90/10となるように、イソプロピルアルコール溶媒へ混合、撹拌して固形物濃度3質量%の混合液を100部に調製した。調製後、平均粒径が3μmの酸化ケイ素粒子(市販品)を100部添加し、撹拌機中にて十分に混合した。得られた酸化ケイ素粒子を含有する樹脂混合のスラリーを小型スプレードライヤー(窒素循環)で噴霧乾燥した。窒素雰囲気中950℃で4時間にて高温焼成することで黒色固形物を得、遊星型ボールミルで解砕して黒色粉体を調製した。
20部の得られた黒色粉体をCVD装置(デスクトップロータリキルン:高砂工業株式会社製)に投入し、エチレンガス0.2L/分および窒素ガス0.8L/分の混合ガスを導入しながら、850℃で1時間、化学的気相成長法により、黒色粉体表面への炭素被膜処理を行い、活物質粒子を作製した。
Example 1
The polysiloxane resin (curable resin composition (1)) having an average molecular weight of 3500 prepared in the above Synthesis Example 2 and the phenolic resin having an average molecular weight of 3000 were mixed in an isopropyl alcohol solvent so that the weight ratio of the resin solids was 90/10, and stirred to prepare 100 parts of a mixed solution with a solid concentration of 3 mass%. After preparation, 100 parts of silicon oxide particles (commercially available product) having an average particle size of 3 μm were added and thoroughly mixed in a stirrer. The obtained resin mixture slurry containing silicon oxide particles was spray-dried with a small spray dryer (nitrogen circulation). A black solid was obtained by high-temperature firing at 950 ° C. for 4 hours in a nitrogen atmosphere, and a black powder was prepared by crushing with a planetary ball mill.
20 parts of the obtained black powder were placed in a CVD apparatus (desktop rotary kiln: manufactured by Takasago Industrial Co., Ltd.), and while introducing a mixed gas of ethylene gas at 0.2 L/min and nitrogen gas at 0.8 L/min, a carbon coating treatment was performed on the surface of the black powder by chemical vapor deposition at 850°C for 1 hour to produce active material particles.
炭素被膜処理前の黒色粉体の粒子断面をFE-SEMで観察したところ、コアである酸化ケイ素粒子の表面上に、シェル層として厚さが約25nmのシリコンオキシカバード相薄膜が形成したことを確認した。炭素被膜処理後の活物質粒子は、平均粒径が3.0μm、比表面積が3.4m2/gでり、炭素熱分析の測定によると炭素被膜量が2.1%であった。
Cu-Kα線による粉末X線回折(XRD)の測定結果によりSi(111)結晶面に帰属される2θ=28.4°の回折ピークは検出されなかった。エネルギー分散型X線分析(Energy dispersive X―ray spectroscopy、EDS)結果から窒素元素の含有量は0.2質量%であった。また、ラマン散乱分析測定結果、炭素のGバンドに帰属される1590cm-1付近のピークとDバンドに帰属される1330cm-1付近のピークを示し、強度比I(Gバンド)/I(Dバンド)は1.4であった。
When the cross section of the black powder before the carbon coating treatment was observed with an FE-SEM, it was confirmed that a thin film of silicon oxy-covered phase with a thickness of about 25 nm was formed as a shell layer on the surface of the silicon oxide core particle. The active material particles after the carbon coating treatment had an average particle size of 3.0 μm, a specific surface area of 3.4 m 2 /g, and a carbon coating amount of 2.1% according to carbon thermal analysis.
The powder X-ray diffraction (XRD) measurement using Cu-Kα radiation did not detect a diffraction peak at 2θ=28.4° attributed to the Si(111) crystal plane. The energy dispersive X-ray spectroscopy (EDS) measurement showed that the nitrogen content was 0.2% by mass. In addition, the Raman scattering analysis measurement showed a peak at about 1590 cm −1 attributed to the G band of carbon and a peak at about 1330 cm −1 attributed to the D band, and the intensity ratio I (G band)/I (D band) was 1.4.
80質量部の前記で得られた活物質粒子と導電助剤として10質量部のアセチレンブラックおよびバインダーとして10質量部のCMCとSBRとの混合物とを混合してスラリーを調製した。得られたスラリーを銅箔上に製膜した。110℃で減圧乾燥後、Li金属箔を対極としてハーフセルとしてコイン型リチウムイオン電池を作製した。二次電池充放電試験装置(北斗(株)製)を用い、作製したハーフセルの充放電特性の評価を25℃にて行った。カットオフ電圧範囲は0.005から1.5Vとした。充放電の測定結果は、初回放電容量が1587mAh/g、初回クーロン効率が74.9%であった。 80 parts by mass of the active material particles obtained above were mixed with 10 parts by mass of acetylene black as a conductive assistant and 10 parts by mass of a mixture of CMC and SBR as a binder to prepare a slurry. The obtained slurry was formed into a film on a copper foil. After drying under reduced pressure at 110°C, a coin-type lithium ion battery was produced as a half cell with Li metal foil as the counter electrode. The charge and discharge characteristics of the produced half cell were evaluated at 25°C using a secondary battery charge and discharge tester (manufactured by Hokuto Co., Ltd.). The cutoff voltage range was 0.005 to 1.5 V. The charge and discharge measurement results showed an initial discharge capacity of 1587 mAh/g and an initial coulombic efficiency of 74.9%.
フルセルの評価は、正極材料としてLiCoO2を正極活物質、集電体としてアルミ箔を用いた単層シートを用いて、正極膜を作製し、450mAh/gの放電容量設計値にて黒鉛粉体と活物質粉末を混合して負極膜を作製した。非水電解質には六フッ化リン酸リチウムをエチレンカーボネート(以下、「EC」とも記す。)とジエチルカーボネート(以下、「DEC」とも記す。)を体積比で1/1の混合液に1mol/Lの濃度で溶解した非水電解質溶液を用い、セパレータに厚さ30μmのポリエチレン製微多孔質フィルムを用いたラミネート型リチウムイオン二次電池を作製した。ラミネート型リチウムイオン二次電池を45℃、テストセルの電圧が4.2Vに達するまで1.2mA(正極基準で0.25c)の定電流で充電を行い、4.2Vに達した後は、セル電圧を4.2Vに保つように電流を減少させて充電を行い、放電容量を求めた。2.5Vから4.2V電圧範囲内の充放電を1サイクルとして、300サイクル後の容量維持率は91%であった。この結果を表1に示した。 For the evaluation of the full cell, a positive electrode film was prepared using a single-layer sheet using LiCoO2 as the positive electrode active material and aluminum foil as the current collector, and a negative electrode film was prepared by mixing graphite powder and active material powder with a discharge capacity design value of 450 mAh / g. A non-aqueous electrolyte solution in which lithium hexafluorophosphate was dissolved at a concentration of 1 mol / L in a mixture of ethylene carbonate (hereinafter also referred to as "EC") and diethyl carbonate (hereinafter also referred to as "DEC") at a volume ratio of 1 / 1 was used as the non-aqueous electrolyte, and a laminated lithium ion secondary battery was prepared using a polyethylene microporous film with a thickness of 30 μm as the separator. The laminated lithium ion secondary battery was charged at a constant current of 1.2 mA (0.25c based on the positive electrode) at 45 ° C. until the voltage of the test cell reached 4.2 V, and after reaching 4.2 V, the current was reduced to keep the cell voltage at 4.2 V and charging was performed, and the discharge capacity was obtained. The capacity retention rate after 300 cycles was 91%, with one cycle being charge and discharge within a voltage range of 2.5 V to 4.2 V. The results are shown in Table 1.
実施例2から5
実施例1と同様に合成例2で作成した平均分子量3500のポリシロキサン樹脂(硬化性樹脂組成物(1))と平均分子量3000のフェノール樹脂を樹脂固形物の重量比が90/10となるように、イソプロピルアルコール溶媒へ混合、撹拌して、固形物濃度を、実施例2では6質量%、実施例3では12質量%、実施例4では30質量%および実施例5では50質量%にそれぞれ変更した混合液とした。混合液を100部に調製後、平均粒径3μmの酸化ケイ素(市販品)を100部加え、スラリーを調製して噴霧乾燥した。その他は実施例1と同様条件にて炭素被膜を有する活物質粉末を得た。粒径および比表面積を測定し、得られた活物質粉末を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Examples 2 to 5
Similarly to Example 1, the polysiloxane resin (curable resin composition (1)) having an average molecular weight of 3500 prepared in Synthesis Example 2 and the phenolic resin having an average molecular weight of 3000 were mixed and stirred in an isopropyl alcohol solvent so that the weight ratio of the resin solids was 90/10, and the solid concentration was changed to 6% by mass in Example 2, 12% by mass in Example 3, 30% by mass in Example 4, and 50% by mass in Example 5 to obtain a mixed solution. After preparing 100 parts of the mixed solution, 100 parts of silicon oxide (commercially available product) having an average particle size of 3 μm was added, and a slurry was prepared and spray-dried. An active material powder having a carbon coating was obtained under the same conditions as in Example 1. The particle size and specific surface area were measured, and the charge/discharge performance in a half cell and a full cell was evaluated using the obtained active material powder. Various evaluation results are shown in Table 1.
実施例6から9
高温焼成後に酸化ケイ素粒子表面上にシリコンオキシカバード相の厚みが103nmとなるように、実施例1に示すポリシロキサン樹脂(硬化性樹脂組成物(1))とフェノール樹脂を樹脂固形物の重量比90/10となるように、イソプロピルアルコール溶媒へ混合、撹拌して混合液を調製した。調製した混合液100部に、平均粒径がそれぞれ実施例6では1.5μm、実施例7では5μm、実施例8では11μm、実施例9では16μmの酸化ケイ素粒子を100部入れてスラリーを調整した。噴霧乾燥後、実施例1と同様条件にて炭素被膜を有する活物質粉末を得た。粒径および比表面積を測定し、得られた活物質粉末を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Examples 6 to 9
The polysiloxane resin (curable resin composition (1)) and the phenolic resin shown in Example 1 were mixed and stirred in an isopropyl alcohol solvent so that the weight ratio of the resin solid was 90/10, so that the thickness of the silicon oxy-covered phase on the silicon oxide particle surface after high-temperature baking was 103 nm. A mixed solution was prepared. 100 parts of the prepared mixed solution were added to 100 parts of silicon oxide particles having an average particle size of 1.5 μm in Example 6, 5 μm in Example 7, 11 μm in Example 8, and 16 μm in Example 9 to prepare a slurry. After spray drying, an active material powder having a carbon coating was obtained under the same conditions as in Example 1. The particle size and specific surface area were measured, and the charge/discharge performance in half cells and full cells was evaluated using the obtained active material powder. Various evaluation results are shown in Table 1.
実施例9から12
前記実施例3と同様に、合成例2で作製した平均分子量3500のポリシロキサン樹脂(硬化性樹脂組成物(1))と平均分子量3000のフェノール樹脂を樹脂固形物の重量比が実施例10では100/0、実施例11では50/50、実施例12では30/70となるように、イソプロピルアルコール溶媒へ混合、撹拌して固形物濃度12質量%の混合液を調整した。調製した混合液100部に、平均粒径3μmの酸化ケイ素(市販品)を100部加え、スラリーを調製して噴霧乾燥した。その他は、実施例1と同じ操作で炭素被膜を有する活物質粉末を得た。粒径および比表面積を測定し、得られた活物質粉末を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Examples 9 to 12
As in Example 3, the polysiloxane resin (curable resin composition (1)) having an average molecular weight of 3500 prepared in Synthesis Example 2 and the phenolic resin having an average molecular weight of 3000 were mixed and stirred in an isopropyl alcohol solvent so that the weight ratio of the resin solids was 100/0 in Example 10, 50/50 in Example 11, and 30/70 in Example 12. A mixed solution with a solid concentration of 12% by mass was prepared. 100 parts of silicon oxide (commercial product) having an average particle size of 3 μm was added to 100 parts of the prepared mixed solution, and a slurry was prepared and spray-dried. The remaining operations were the same as in Example 1 to obtain an active material powder having a carbon coating. The particle size and specific surface area were measured, and the charge/discharge performance in a half cell and a full cell was evaluated using the obtained active material powder. Various evaluation results are shown in Table 1.
実施例13および14
前記合成例3で作製した平均分子量3500のポリシロキサン樹脂(硬化性樹脂組成物(2))および平均分子量3000のフェノール樹脂を樹脂固形物の重量比90/10となるように、イソプロピルアルコール溶媒へ混合、撹拌して固形物濃度12質量%の混合液を調整した。調製した混合液100部に平均粒径が3μmの酸化ケイ素粒子(市販品)を100部添加し、撹拌機中にて十分に混合した。得られた酸化ケイ素粒子を含有する樹脂混合スラリーを小型スプレードライヤー(窒素循環)で噴霧乾燥した。窒素雰囲気中、実施例13では1050℃で4時間、実施例14では1100℃で4時間の条件下にて高温焼成することで黒色固形物を得た。得られた黒色固形物を遊星型ボールミルで解砕して黒色粉体を調製した。その他は、実施例1と同様操作で炭素被膜を有する活物質粉末を得た。粒径および比表面積を測定し、得られた活物質粉末を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Examples 13 and 14
The polysiloxane resin (curable resin composition (2)) having an average molecular weight of 3500 prepared in the synthesis example 3 and the phenolic resin having an average molecular weight of 3000 were mixed with an isopropyl alcohol solvent and stirred so that the weight ratio of the resin solid was 90/10, to prepare a mixed solution having a solid concentration of 12% by mass. 100 parts of silicon oxide particles (commercially available product) having an average particle size of 3 μm were added to 100 parts of the prepared mixed solution, and thoroughly mixed in a stirrer. The resin mixed slurry containing the obtained silicon oxide particles was spray-dried with a small spray dryer (nitrogen circulation). In a nitrogen atmosphere, a black solid was obtained by high-temperature firing under conditions of 1050 ° C. for 4 hours in Example 13 and 1100 ° C. for 4 hours in Example 14. The obtained black solid was crushed with a planetary ball mill to prepare a black powder. The remaining operations were the same as those in Example 1 to obtain an active material powder having a carbon coating. The particle size and specific surface area were measured, and the charge/discharge performance in a half cell and a full cell was evaluated using the obtained active material powder. The results of various evaluations are shown in Table 1.
実施例15および16
実施例3と同様に酸化ケイ素粒子を含有するスラリーを調製した後、酸化ケイ素粒子の量に対してLi+/酸化ケイ素をモル比で実施例15は30/100、実施例16は50/100となるようにLiClを原料として酸化ケイ素粒子を含有するスラリーに添加し、噴霧乾燥を行った。それ以降の条件は実施例1と同様にして、炭素被膜を有する活物質粉末を作製した。得られた活物質粒子中のLi元素の含有量は実施例15が2.5質量%、実施例16は5.1質量%であった。得られた活物質粒子の粒径および比表面積を測定し、得られた活物質粒子を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Examples 15 and 16
A slurry containing silicon oxide particles was prepared in the same manner as in Example 3, and then LiCl was added as a raw material to the slurry containing silicon oxide particles so that the molar ratio of Li + /silicon oxide relative to the amount of silicon oxide particles was 30/100 in Example 15 and 50/100 in Example 16, and spray drying was performed. The subsequent conditions were the same as in Example 1, and an active material powder having a carbon coating was produced. The content of Li element in the obtained active material particles was 2.5 mass% in Example 15 and 5.1 mass% in Example 16. The particle size and specific surface area of the obtained active material particles were measured, and the charge/discharge performance in half cells and full cells was evaluated using the obtained active material particles. Various evaluation results are shown in Table 1.
比較例1
20gの平均粒径が5μmの酸化ケイ素粉体をCVD装置(デスクトップロータリキルン:高砂工業株式会社製)に投入し、エチレンガス0.2L/分および窒素ガス0.8L/分の混合ガスを導入しながら、850℃で1時間、化学的気相成長法により、黒色粉体表面への炭素被覆処理を行い、活物質粒子を作製した。処理後の炭素被覆量を熱分析装置によって測定したところ、処理前重量より2.0%増加したことが分かった。得られた活物質粒子をCu-Kα線による粉末X線回折(XRD)の測定を行った結果、Si(111)結晶面に帰属される2θ=28.4°の回折ピークが検出されなかった。得られた活物質粒子の粒径および比表面積を測定し、得られた活物質粒子を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Comparative Example 1
20 g of silicon oxide powder with an average particle size of 5 μm was put into a CVD apparatus (desktop rotary kiln: manufactured by Takasago Kogyo Co., Ltd.), and while introducing a mixed gas of ethylene gas 0.2 L/min and nitrogen gas 0.8 L/min, a carbon coating treatment was performed on the surface of the black powder by chemical vapor deposition at 850 ° C for 1 hour to prepare active material particles. When the amount of carbon coating after the treatment was measured by a thermal analyzer, it was found to have increased by 2.0% from the weight before the treatment. As a result of measuring the powder X-ray diffraction (XRD) of the obtained active material particles using Cu-Kα rays, a diffraction peak at 2θ = 28.4 ° assigned to the Si (111) crystal plane was not detected. The particle size and specific surface area of the obtained active material particles were measured, and the charge and discharge performance in half cells and full cells was evaluated using the obtained active material particles. Various evaluation results are shown in Table 1.
比較例2
合成例1で作成した硬化性樹脂組成物(1)を110℃にて減圧乾燥後、窒素雰囲気中、1100℃で4時間、高温焼成することで黒色固形物を得た。得られた黒色固形物を遊星型ボールミルで粉砕後に黒色粉体を作製後、比較例1と同様なCVD条件下にて炭素被膜処理を行った。
得られた炭素被膜処理後の黒色粉体の粒径および比表面積を測定し、炭素被膜処理後の黒色粉体を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Comparative Example 2
The curable resin composition (1) prepared in Synthesis Example 1 was dried under reduced pressure at 110° C., and then baked at a high temperature of 1,100° C. for 4 hours in a nitrogen atmosphere to obtain a black solid. The obtained black solid was pulverized in a planetary ball mill to produce a black powder, which was then subjected to a carbon coating treatment under the same CVD conditions as in Comparative Example 1.
The particle size and specific surface area of the obtained carbon-coated black powder were measured, and the charge-discharge performance in a half cell and a full cell was evaluated using the carbon-coated black powder. The various evaluation results are shown in Table 1.
比較例3
酸化ケイ素粒子の代わりにケイ素粒子(市販品)を平均粒径3μmに分級して用い、実施例3と同様な条件にてケイ素粒子を含有するスラリーを調製して、噴霧乾燥した。乾燥後、窒素雰囲気中1000℃で4時間、高温焼成することで黒色固形物を得た。得られた活物質粒子をCu-Kα線による粉末X線回折(XRD)の測定を行った結果、Si(111)結晶面に帰属される2θ=28.4°の回折ピークが強く検出された。得られた活物質粒子の粒径および比表面積を測定し、得られた活物質粒子を用いてハーフセルおよびフルセルでの充放電性能を評価した。各種評価結果を表1に示した。
Comparative Example 3
Instead of silicon oxide particles, silicon particles (commercially available) were classified to an average particle size of 3 μm, and a slurry containing silicon particles was prepared under the same conditions as in Example 3, and spray-dried. After drying, the slurry was fired at a high temperature of 1000° C. for 4 hours in a nitrogen atmosphere to obtain a black solid. The obtained active material particles were subjected to powder X-ray diffraction (XRD) measurement using Cu-Kα radiation, and a diffraction peak at 2θ=28.4°, which is attributed to the Si (111) crystal plane, was strongly detected. The particle size and specific surface area of the obtained active material particles were measured, and the charge/discharge performance in half cells and full cells was evaluated using the obtained active material particles. Various evaluation results are shown in Table 1.
[評価方法]
表1中、各評価方法は以下のとおりである。
D50:レーザー回折式粒度分布測定装置(マルバーン・パナリティカル社製、マスターサイザー3000)を用いて測定した。
比表面積:比表面積測定装置(BELJAPAN社製、BELSORP-mini)を用いて窒素吸着測定より、BET法で測定した。29Si-NMR:JEOL RESONANCE社製、JNM-ECA600を用いた。
[Evaluation method]
In Table 1, the evaluation methods are as follows.
D50: Measured using a laser diffraction particle size distribution measuring device (Malvern Panalytical, Mastersizer 3000).
Specific surface area: Measured by the BET method using a specific surface area measuring device (BELSORP-mini, manufactured by BELJAPAN) by nitrogen adsorption measurement. 29 Si-NMR: JNM-ECA600, manufactured by JEOL RESONANCE, was used.
ラマン散乱スペクトル測定:測定機器としてNRS-5500(日本分光株式会社製)を用いた。測定条件は励起レーザーの波長は532nm、対物レンズの倍率は100倍、測定波数範囲は3500から100cm-1とした。
粉末X線回折(XRD):X線回折装置(リガク社製、SmartLab)を用いて室温の大気中で測定した。
Raman scattering spectrum measurement: The measurement device used was an NRS-5500 (manufactured by JASCO Corporation). The measurement conditions were as follows: excitation laser wavelength 532 nm, objective lens magnification 100 times, and measurement wave number range 3500 to 100 cm −1 .
Powder X-ray diffraction (XRD): Measurements were performed in air at room temperature using an X-ray diffractometer (Rigaku Corporation, SmartLab).
窒素含有量の測定:酸素・窒素分析装置(EMGA-920)を用いた。
シリコンオキシカーバイド含有相の厚み測定:クロスセクションポリッシャ(CP法)で粒子の断面構造を加工し、FE-SEM観察で測定した。
炭素被膜量の測定:熱分析装置(リガク社製、Thermo Plus EVO2)を用いて大気中にて重量損失を測って計算した。
Measurement of nitrogen content: An oxygen/nitrogen analyzer (EMGA-920) was used.
Measurement of thickness of silicon oxycarbide-containing phase: The cross-sectional structure of the grain was processed using a cross-section polisher (CP method) and was measured by FE-SEM observation.
Measurement of carbon coating amount: The weight loss was measured in air using a thermal analyzer (Thermo Plus EVO2, manufactured by Rigaku Corporation) and calculated.
電池特性評価:二次電池充放電試験装置(北斗電工株式会社製)を用いて電池特性を測定し、室温25℃、カットオフ電圧範囲が0.005から1.5Vに、充放電レートが0.1C(1から3回)と0.2C(4サイクル以後)にし、定電流・定電圧式充電/定電流式放電の設定条件下で充放電特性の評価試験を行った。各充放電時の切り替え時には、30分間、開回路で放置した。放電容量、充電容量、初回クーロン効率とサイクル性(本願では、25℃でフルセルを300サイクル充放電後の容量維持率を指す)、負極膨張率は以下のようにして求めた。活物質の充電容量と放電容量:ハーフセルの充放電測定で求めた。活物質の初回クーロン効率(%)=初回放電容量(mAh/g)/初回充電容量(mAh/g)容量維持率(%@300回目)=300回目の負極放電容量(mAh/g)/負極初回放電容量(mAh/g)、フルセル(ラミネートセル)の測定で求めた。負極膨張率:フルセルを300サイクルでの充放電後、負極を取り出し、EC/DEC混合液で洗浄してから静置乾燥後、電極膜の厚みを測定した。充放電前後に負極膜の厚さの変化率を負極膨張率した。Battery characteristic evaluation: Battery characteristics were measured using a secondary battery charge/discharge tester (manufactured by Hokuto Denko Corporation). The charge/discharge characteristics were evaluated under the set conditions of constant current/constant voltage charge/constant current discharge, with room temperature at 25°C, cutoff voltage range of 0.005 to 1.5V, and charge/discharge rate of 0.1C (1st to 3rd times) and 0.2C (after 4th cycle). When switching between charge and discharge, the battery was left in an open circuit for 30 minutes. Discharge capacity, charge capacity, initial coulombic efficiency and cyclability (in this application, this refers to the capacity retention rate after 300 cycles of charge/discharge of a full cell at 25°C), and negative electrode expansion rate were determined as follows. Charge capacity and discharge capacity of active material: Calculated by charge/discharge measurement of half cell. Initial Coulombic efficiency (%) of active material = initial discharge capacity (mAh/g) / initial charge capacity (mAh/g) Capacity retention rate (% @ 300th) = 300th negative electrode discharge capacity (mAh/g) / negative electrode initial discharge capacity (mAh/g), measured by full cell (laminated cell). Negative electrode expansion rate: After 300 cycles of charging and discharging the full cell, the negative electrode was removed, washed with EC/DEC mixed solution, and then left to dry, and the thickness of the electrode film was measured. The rate of change in the thickness of the negative electrode film before and after charging and discharging was the negative electrode expansion rate.
前記結果から明らかなように、本活物質を負極活物質として用いた場合、高容量維持の上、負極の膨張率が低く、サイクル性(あるいは容量維持率)および初回クーロン効率はいずれも高く、またこれら二次電池の特性のバランスに優れる。また本活物質を負極活物質として含む二次電池はその電池特性に優れている。As is clear from the above results, when this active material is used as a negative electrode active material, in addition to maintaining a high capacity, the expansion rate of the negative electrode is low, and both the cycleability (or capacity retention rate) and the initial coulombic efficiency are high, and the balance of these secondary battery properties is excellent. Furthermore, secondary batteries containing this active material as a negative electrode active material have excellent battery properties.
Claims (10)
(1)前記シェル層作製用前駆体を得る工程
(2)前記酸化ケイ素含有粒子の表面に前記シェル層作製用前駆体を塗布および乾燥する工程
(3)不活性ガス雰囲気中、焼成温度900℃から1300℃で高温焼成して二次電池用活物質を得る工程 1. A method for producing an active material for a secondary battery, the active material having a core-shell composite structure having a silicon oxide-containing particle as a core and a silicon oxycarbide-containing phase as a shell layer, the shell layer having an average thickness of 5 nm to 500 nm, the method comprising the steps of:
(1) a step of obtaining a precursor for preparing the shell layer; (2) a step of applying the precursor for preparing the shell layer to the surface of the silicon oxide-containing particles and drying the same; and (3) a step of calcining the precursor at a high temperature in an inert gas atmosphere at a calcination temperature of 900° C. to 1300° C. to obtain an active material for a secondary battery.
(4)化学気相蒸着装置内で、熱分解性炭素源ガスとキャリア不活性ガスフローの中、
700℃から1000℃の温度範囲にて炭素被膜で被覆して負極活物質を得る工程 The method for producing an active material for a secondary battery according to claim 8, further comprising the following step (4):
(4) In a chemical vapor deposition apparatus, in a flow of a pyrolytic carbon source gas and a carrier inert gas,
A process of obtaining a negative electrode active material by coating with a carbon film at a temperature range of 700°C to 1000°C.
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