TW202345333A - Semiconductor device with substrate for electrical connection - Google Patents

Semiconductor device with substrate for electrical connection Download PDF

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TW202345333A
TW202345333A TW111125206A TW111125206A TW202345333A TW 202345333 A TW202345333 A TW 202345333A TW 111125206 A TW111125206 A TW 111125206A TW 111125206 A TW111125206 A TW 111125206A TW 202345333 A TW202345333 A TW 202345333A
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Taiwan
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electronic component
substrate
component
semiconductor
conductive pillars
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TW111125206A
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Chinese (zh)
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楊吳德
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南亞科技股份有限公司
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Priority claimed from US17/742,549 external-priority patent/US20230369280A1/en
Priority claimed from US17/743,044 external-priority patent/US20230369306A1/en
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Publication of TW202345333A publication Critical patent/TW202345333A/en

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Abstract

A semiconductor device is provided. The semiconductor device includes a substrate, a first electronic component, a second electronic component, a bonding wire, and an encapsulant. The substrate has a lower surface and an upper surface opposite to the lower surface. The first electronic component is disposed on the upper surface of the substrate. The bonding wire electrically connects the first electronic component and the substrate and extends within the substrate. The second electronic component is disposed on the upper surface of the substrate. The second electronic component has an active surface facing the substrate. The encapsulant is disposed on the upper surface of the substrate. The encapsulant extends within the substrate and encapsulates the bonding wire.

Description

具有電氣連接基底的半導體元件Semiconductor component with electrical connection base

本申請案主張美國第17/742,549及17/743,044號專利申請案之優先權(即優先權日為「2022年5月12日」),其內容以全文引用之方式併入本文中。This application claims priority to U.S. Patent Application Nos. 17/742,549 and 17/743,044 (that is, the priority date is "May 12, 2022"), the contents of which are incorporated herein by reference in their entirety.

本揭露關於一種半導體元件,特別是有關於一種包括基底的半導體元件,其基底具有一鍵合線穿過。The present disclosure relates to a semiconductor device, and in particular to a semiconductor device including a substrate having a bonding wire passing therethrough.

隨著電子工業的迅速發展,積體電路(IC)已經實現高性能與小型化。積體電路材料及設計方面的技術進步產生一代又一代的積體電路,其中每一代都具有更小、更複雜的電路。With the rapid development of the electronics industry, integrated circuits (ICs) have achieved high performance and miniaturization. Technological advances in integrated circuit materials and design have produced successive generations of integrated circuits, each of which has smaller, more complex circuits.

許多技術已經被開發出來用於整合兩個電子元件。例如,電子元件可以垂直堆疊,以縮小半導體元件的規模。目前堆疊的電子元件可以利用具有不同長度的導電柱,每個導電柱將相應的電子元件連接到基底上。這種結構可能需要多種半導體製備過程,因此增加了生產成本。因此,需要一種新的半導體元件及製備方法來改善此類問題。Many techniques have been developed for integrating two electronic components. For example, electronic components can be stacked vertically to reduce the size of semiconductor components. Current stacks of electronic components can utilize conductive posts of varying lengths, with each conductive post connecting a corresponding electronic component to a substrate. This structure may require multiple semiconductor fabrication processes, thus increasing production costs. Therefore, a new semiconductor component and preparation method are needed to improve such problems.

上文之「先前技術」說明僅係提供背景技術,並未承認上文之「先前技術」說明揭示本揭露之標的,不構成本揭露之先前技術,且上文之「先前技術」之任何說明均不應作為本案之任一部分。The above description of "prior art" is only to provide background technology, and does not admit that the above description of "prior art" reveals the subject matter of the present disclosure. It does not constitute prior art of the present disclosure, and any description of the above "prior art" None should form any part of this case.

本揭露的一個方面提供一種半導體元件。該半導體元件包括一基底、一第一電子元件、一第二電子元件、一鍵合線及一封裝物。該基底具有一下表面及與該下表面相對的一上表面。該第一電子元件設置於該基底的該上表面上。該鍵合線將該第一電子元件與該基底電連接,並在該基底內延伸。該第二電子元件設置於該基底的該上表面上。該第二電子元件具有面向該基底的一主動表面(active surface)。該封裝物設置於該基底的該上表面上。該封裝物在該基底內延伸,並封裝該鍵合線。One aspect of the present disclosure provides a semiconductor device. The semiconductor component includes a substrate, a first electronic component, a second electronic component, a bonding wire and a package. The base has a lower surface and an upper surface opposite to the lower surface. The first electronic component is disposed on the upper surface of the substrate. The bonding wire electrically connects the first electronic component to the substrate and extends within the substrate. The second electronic component is disposed on the upper surface of the substrate. The second electronic component has an active surface facing the substrate. The package is disposed on the upper surface of the substrate. The encapsulant extends within the substrate and encapsulates the bond wire.

本揭露的另一個方面提供另一種半導體元件。該半導體元件包括一基底、一第一電子元件、一第二電子元件、一鍵合線及複數個導電柱。該基底具有一下表面、與該下表面相對的一上表面、以及在該上表面與該下表面之間延伸的一內側表面。該第一電子元件設置於該基底的該上表面上。該鍵合線將該第一電子元件與該基底電連接,並面向該基底的該內側表面。該鍵合線在該基底內延伸。該第二電子元件設置於該基底的該上表面上。每個導電柱都設置於該基底的該上表面上,並將該第二電子元件與該基底電連接。Another aspect of the present disclosure provides another semiconductor device. The semiconductor component includes a substrate, a first electronic component, a second electronic component, a bonding wire and a plurality of conductive pillars. The base has a lower surface, an upper surface opposite to the lower surface, and an inner surface extending between the upper surface and the lower surface. The first electronic component is disposed on the upper surface of the substrate. The bonding wire electrically connects the first electronic component to the substrate and faces the inner surface of the substrate. The bonding wire extends within the substrate. The second electronic component is disposed on the upper surface of the substrate. Each conductive pillar is disposed on the upper surface of the substrate and electrically connects the second electronic component to the substrate.

本揭露的另一個方面提供一種半導體元件的製備方法。該製備方法包括提供一基底,具有一下表面及與該下表面相對的一上表面。該製備方法還包括形成一開口,在該基底的該上表面與該下表面之間延伸。該製備方法還包括將一第一電子元件附著到該基底的該上表面。該第一電子元件的一主動表面面對該基底的該上表面。此外,該製備方法還包括將一第二電子元件附著到該第一電子元件上。該第二電子元件的一主動表面面向該基底的該上表面。該製備方法還包括在該基底上形成一鍵合線。該鍵合線穿過該基底的該開口,並將該基底與該第一電子元件或該第二電子元件中的一個電連接。Another aspect of the present disclosure provides a method of manufacturing a semiconductor device. The preparation method includes providing a substrate with a lower surface and an upper surface opposite to the lower surface. The preparation method also includes forming an opening extending between the upper surface and the lower surface of the substrate. The preparation method also includes attaching a first electronic component to the upper surface of the substrate. An active surface of the first electronic component faces the upper surface of the substrate. In addition, the preparation method further includes attaching a second electronic component to the first electronic component. An active surface of the second electronic component faces the upper surface of the substrate. The preparation method also includes forming a bonding wire on the substrate. The bonding wire passes through the opening of the substrate and electrically connects the substrate to one of the first electronic component or the second electronic component.

在本揭露的實施例中,基底具有一開口,鍵合線穿過該開口。所述鍵合線將下層電子元件與基底電連接(或將上層電子元件與基底連接)。因此,可以省略用於形成導電柱的半導體製備過程,因此降低成本,提高元件產量。In an embodiment of the present disclosure, the substrate has an opening, and the bonding wire passes through the opening. The bonding wire electrically connects the lower electronic component to the substrate (or connects the upper electronic component to the substrate). Therefore, the semiconductor preparation process for forming the conductive pillars can be omitted, thereby reducing costs and increasing device yield.

上文已相當廣泛地概述本揭露之技術特徵及優點,俾使下文之本揭露詳細描述得以獲得較佳瞭解。構成本揭露之申請專利範圍標的之其它技術特徵及優點將描述於下文。本揭露所屬技術領域中具有通常知識者應瞭解,可相當容易地利用下文揭示之概念與特定實施例可作為修改或設計其它結構或過程而實現與本揭露相同之目的。本揭露所屬技術領域中具有通常知識者亦應瞭解,這類等效建構無法脫離後附之申請專利範圍所界定之本揭露的精神和範圍。The technical features and advantages of the present disclosure have been summarized rather broadly above so that the detailed description of the present disclosure below may be better understood. Other technical features and advantages that constitute the subject matter of the patentable scope of the present disclosure will be described below. It should be understood by those of ordinary skill in the art that the concepts and specific embodiments disclosed below can be readily used to modify or design other structures or processes to achieve the same purposes of the present disclosure. Those with ordinary knowledge in the technical field to which the present disclosure belongs should also understand that such equivalent constructions cannot depart from the spirit and scope of the present disclosure as defined in the appended patent application scope.

現在用具體的語言來描述附圖中說明的本揭露的實施例,或實例。應理解的是,在此不打算限制本揭露的範圍。對所描述的實施例的任何改變或修改,以及對本文所描述的原理的任何進一步應用,都應被認為是與本揭露內容有關的技術領域的普通技術人員通常會做的。參考數字可以在整個實施例中重複,但這並不一定表示一實施例的特徵適用於另一實施例,即使它們共用相同的參考數字。Specific language will now be used to describe the embodiments, or examples, of the present disclosure illustrated in the drawings. It should be understood that there is no intention to limit the scope of the present disclosure. Any changes or modifications to the described embodiments, and any further applications of the principles described herein, are deemed to be commonly made by one of ordinary skill in the art to which this disclosure relates. Reference numbers may be repeated throughout the embodiments, but this does not necessarily mean that features of one embodiment apply to another embodiment, even if they share the same reference number.

應理解的是,儘管用語第一、第二、第三等可用於描述各種元素、元件、區域、層或部分,但這些元素、元件、區域、層或部分不受這些用語的限制。相反,這些用語只是用來區分一元素、元件、區域、層或部分與另一元素、元件、區域、層或部分。因此,下面討論的第一元素、元件、區域、層或部分可以稱為第二元素、元件、區域、層或部分而不偏離本發明概念的教導。It will be understood that, although the terms first, second, third, etc. may be used to describe various elements, components, regions, layers or sections, these elements, elements, regions, layers or sections are not limited by these terms. Rather, these terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the inventive concept.

本文使用的用語僅用於描述特定的實施例,並不打算局限於本發明的概念。正如本文所使用的,單數形式的”一"、"一個”及”該”也包括複數形式,除非上下文明確指出。應進一步理解,用語”包含”及”包括",當在本說明書中使用時,指出了所述特徵、整數、步驟、操作、元素或元件的存在,但不排除存在或增加一個或多個其他特徵、整數、步驟、操作、元素、元件或其組。The terminology used herein is for describing particular embodiments only and is not intended to limit the concepts of the invention. As used herein, the singular forms "a", "an" and "the" also include the plural forms unless the context clearly dictates otherwise. It will be further understood that the terms "comprises" and "includes", when used in this specification, indicate the presence of stated features, integers, steps, operations, elements or components, but do not exclude the presence or addition of one or more other Characteristic, integer, step, operation, element, component, or group thereof.

圖1A及圖1B例示本揭露一些實施例之半導體元件100a,其中圖1A是俯視圖,圖1B是沿圖1A所示A-A’線的橫截面圖。1A and 1B illustrate a semiconductor device 100a according to some embodiments of the present disclosure, wherein FIG. 1A is a top view, and FIG. 1B is a cross-sectional view along line A-A’ shown in FIG. 1A.

在一些實施例中,半導體元件100a可以包括基底10。在一些實施例中,基底10可以是或包括,例如,印刷電路板,如紙基銅箔疊層板、複合銅箔疊層板或聚合物浸漬的玻璃纖維基銅箔疊層板。In some embodiments, semiconductor element 100a may include substrate 10. In some embodiments, the substrate 10 may be or include, for example, a printed circuit board such as a paper-based copper foil laminate, a composite copper foil laminate, or a polymer-impregnated fiberglass-based copper foil laminate.

在一些實施例中,基底10可以包括表面10s1及與表面10s1相對的表面10s2。在一些實施例中,表面10s1也可以被稱為下表面。在一些實施例中,表面10s2也可以被稱為上表面。In some embodiments, substrate 10 may include surface 10s1 and surface 10s2 opposite surface 10s1. In some embodiments, surface 10s1 may also be referred to as the lower surface. In some embodiments, surface 10s2 may also be referred to as the upper surface.

在一些實施例中,基底10可以包括導電墊、線路、通孔、層或其他互連。例如,基底10可以包括一條或多條傳輸線(例如,通信電線)及一條或多條接地線及/或接地平面。例如,基底10可以包括一個或多個導電墊(未顯示),靠近、鄰近或嵌入並曝露在基底10的表面10s1及/或表面10s2處。也就是說,基底10的表面10s1及10s2都可以用來與其他電子元件進行電連接。In some embodiments, substrate 10 may include conductive pads, lines, vias, layers, or other interconnections. For example, substrate 10 may include one or more transmission lines (eg, communication wires) and one or more ground lines and/or ground planes. For example, substrate 10 may include one or more conductive pads (not shown) proximate, adjacent, or embedded and exposed at surface 10s1 and/or surface 10s2 of substrate 10 . That is to say, both the surfaces 10s1 and 10s2 of the substrate 10 can be used to electrically connect with other electronic components.

在一些實施例中,基底10可以界定開口10r1。開口10r1可以在基底10的表面10s1與10s2之間延伸。開口10r1可以穿透基底10。儘管圖1A的例示開口10r1具有矩形輪廓,但10r1可以具有其他輪廓,例如圓形輪廓、橢圓形輪廓、梯形輪廓或基於設計要求的其他適合的輪廓。基底10可以具有表面10s3以界定開口10r1。表面10s3可以在基底10的表面10s1與10s2之間延伸。在一些實施例中,表面10s3也可以被稱為內側表面。在一些實施例中,內側表面可被基底10的外側表面(圖中未標注)所包圍。In some embodiments, substrate 10 may define opening 10r1. The opening 10r1 may extend between the surfaces 10s1 and 10s2 of the substrate 10 . The opening 10r1 can penetrate the substrate 10. Although the example opening 10r1 of FIG. 1A has a rectangular profile, 10r1 may have other profiles, such as a circular profile, an elliptical profile, a trapezoidal profile, or other suitable profiles based on design requirements. Substrate 10 may have surface 10s3 defining opening 10r1. Surface 10s3 may extend between surfaces 10s1 and 10s2 of substrate 10 . In some embodiments, surface 10s3 may also be referred to as the medial surface. In some embodiments, the inner surface may be surrounded by an outer surface (not labeled in the figure) of the substrate 10 .

在一些實施例中,半導體元件100a可包括電子元件20。在一些實施例中,電子元件20可以設置於基底10的表面10s2上。在一些實施例中,電子元件20可包括記憶體元件,例如動態隨機存取記憶體(DRAM)元件、一次性程式設計(OTP)記憶體元件、靜態隨機存取記憶體(SRAM)元件或其他適合的記憶體元件。在一些實施例中,電子元件20可以包括邏輯元件(例如,系統單晶片(SoC)、中央處理單元(CPU)、圖形處理單元(GPU)、應用處理器(AP)、微控制器等)、射頻(RF)元件、感測器元件、微機電系統(MEMS)元件、信號處理元件(例如,數位信號處理(DSP)元件)、前端元件(例如,類比前端(AFE)元件)或其他元件。In some embodiments, semiconductor component 100a may include electronic component 20. In some embodiments, the electronic component 20 may be disposed on the surface 10s2 of the substrate 10. In some embodiments, electronic device 20 may include memory devices, such as dynamic random access memory (DRAM) devices, one-time programming (OTP) memory devices, static random access memory (SRAM) devices, or other Suitable memory components. In some embodiments, electronic components 20 may include logic components (e.g., system on a chip (SoC), central processing unit (CPU), graphics processing unit (GPU), application processor (AP), microcontroller, etc.), Radio frequency (RF) components, sensor components, microelectromechanical systems (MEMS) components, signal processing components (eg, digital signal processing (DSP) components), front-end components (eg, analog front-end (AFE) components), or other components.

電子元件20可具有表面20s1及與表面20s1相對的表面20s2。在一些實施例中,表面20s1也可以被稱為主動表面(active surface)。在一些實施例中,表面20s2也可以被稱為背面表面。在一些實施例中,電子元件20的表面20s1可以面對基底10的表面10s2。如本文所使用的,用語"主動表面"可指設置終端以傳輸及/或接收信號的表面。在一些實施例中,電子元件20的表面20s1可以面對基底10的表面10s2。電子元件20可包括表面20s3及與表面20s3相對的表面20s4。表面20s3可以在表面20s1與20s2之間延伸。表面20s4可以在表面20s1與20s2之間延伸。在一些實施例中,表面20s3及20s4中的每一個也可以被稱為電子元件20的一個側面。The electronic component 20 may have a surface 20s1 and a surface 20s2 opposite the surface 20s1. In some embodiments, surface 20s1 may also be referred to as an active surface. In some embodiments, surface 20s2 may also be referred to as the back surface. In some embodiments, surface 20s1 of electronic component 20 may face surface 10s2 of substrate 10 . As used herein, the term "active surface" may refer to a surface on which terminals are positioned to transmit and/or receive signals. In some embodiments, surface 20s1 of electronic component 20 may face surface 10s2 of substrate 10 . The electronic component 20 may include a surface 20s3 and a surface 20s4 opposite the surface 20s3. Surface 20s3 may extend between surfaces 20s1 and 20s2. Surface 20s4 may extend between surfaces 20s1 and 20s2. In some embodiments, each of surfaces 20s3 and 20s4 may also be referred to as a side of electronic component 20 .

在一些實施例中,電子元件20可以包括終端21。終端21可以設置於電子元件20的表面20s1上。終端21可以是,例如,導電墊。在一些實施例中,終端21可以包括金屬,例如銅(Cu)、鎢(W)、銀(Ag)、金(Au)、釕(Ru)、銥(Ir)、鎳(Ni)、鋨(Os)、釕(Rh)、鋁(Al)、鉬(Mo)、鈷(Co)、其合金、其組合或其他適合的材料。In some embodiments, electronic component 20 may include terminal 21. The terminal 21 may be provided on the surface 20s1 of the electronic component 20. The terminal 21 may be, for example, a conductive pad. In some embodiments, terminal 21 may include a metal such as copper (Cu), tungsten (W), silver (Ag), gold (Au), ruthenium (Ru), iridium (Ir), nickel (Ni), osmium ( Os), ruthenium (Rh), aluminum (Al), molybdenum (Mo), cobalt (Co), alloys thereof, combinations thereof or other suitable materials.

在一些實施例中,半導體元件100a可包括鍵合線22。在一些實施例中,鍵合線22具有與基底10的表面10s1鍵合的一第一端(圖中未注釋)及與電子元件20的表面20s1鍵合的一第二端(圖中未注釋)。在一些實施例中,鍵合線22可以鍵合到電子元件20的終端21。在一些實施例中,鍵合線22可以穿過基底10的開口10r1。在一些實施例中,鍵合線22可以面對基底10的表面10s3。在一些實施例中,鍵合線22可以穿透基底10。在一些實施例中,鍵合線22可包括金屬,如銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、鋁(Al)、其合金、其組合或其他適合的材料。In some embodiments, semiconductor element 100a may include bond wires 22. In some embodiments, the bonding wire 22 has a first end (not annotated in the figure) bonded to the surface 10s1 of the substrate 10 and a second end (not annotated in the figure) bonded to the surface 20s1 of the electronic component 20 ). In some embodiments, bond wire 22 may be bonded to terminal 21 of electronic component 20 . In some embodiments, the bonding wire 22 may pass through the opening 10r1 of the substrate 10 . In some embodiments, bond wire 22 may face surface 10s3 of substrate 10. In some embodiments, bond wire 22 may penetrate substrate 10 . In some embodiments, bonding wire 22 may include a metal such as copper (Cu), silver (Ag), gold (Au), nickel (Ni), aluminum (Al), alloys thereof, combinations thereof, or other suitable materials. .

在一些實施例中,半導體元件100a可包括電子元件30。在一些實施例中,電子元件30可以設置於基底10的表面10s2上。在一些實施例中,電子元件30可以位於電子元件20上。在一些實施例中,電子元件30可以堆疊在電子元件20上。在一些實施例中,電子元件30可以設置於電子元件20的表面20s2上。在一些實施例中,電子元件30可以包括記憶體元件,例如動態隨機存取記憶體(DRAM)元件、一次性程式設計(OTP)記憶體元件、靜態隨機存取記憶體(SRAM)元件或其他適合的記憶體元件。在一些實施例中,電子元件30可以包括邏輯元件(例如,系統單晶片(SoC)、中央處理單元(CPU)、圖形處理單元(GPU)、應用處理器(AP)、微控制器等)、射頻(RF)元件、感測器元件、微機電系統(MEMS)元件、信號處理元件(例如。數位信號處理(DSP)元件)、前端元件(例如,類比前端(AFE)元件)或其他元件。In some embodiments, semiconductor component 100a may include electronic component 30. In some embodiments, the electronic component 30 may be disposed on the surface 10s2 of the substrate 10. In some embodiments, electronic component 30 may be located on electronic component 20 . In some embodiments, electronic component 30 may be stacked on electronic component 20 . In some embodiments, the electronic component 30 may be disposed on the surface 20s2 of the electronic component 20. In some embodiments, the electronic device 30 may include a memory device such as a dynamic random access memory (DRAM) device, a one-time programming (OTP) memory device, a static random access memory (SRAM) device, or other Suitable memory components. In some embodiments, electronic components 30 may include logic components (e.g., system on a chip (SoC), central processing unit (CPU), graphics processing unit (GPU), application processor (AP), microcontroller, etc.), Radio frequency (RF) components, sensor components, microelectromechanical systems (MEMS) components, signal processing components (eg, digital signal processing (DSP) components), front-end components (eg, analog front-end (AFE) components), or other components.

電子元件30可以具有表面30s1及與表面30s1相對的表面30s2。在一些實施例中,表面30s1也可以被稱為主動表面。在一些實施例中,表面30s2也可以被稱為背面表面。在一些實施例中,電子元件30的表面30s1可以面對基底10的表面10s2。在一些實施例中,電子元件30的表面30s1可以面對電子元件20的表面20s2。電子元件30可以具有表面30s3及與表面30s3相對的表面30s4。表面30s3可以在表面30s1與30s2之間延伸。表面30s4可以在表面30s1與30s2之間延伸。在一些實施例中,表面30s3及30s4中的每一個也可以被稱為電子元件30的一個側面。The electronic component 30 may have a surface 30s1 and a surface 30s2 opposite the surface 30s1. In some embodiments, surface 30s1 may also be referred to as an active surface. In some embodiments, surface 30s2 may also be referred to as the back surface. In some embodiments, surface 30s1 of electronic component 30 may face surface 10s2 of substrate 10 . In some embodiments, surface 30s1 of electronic component 30 may face surface 20s2 of electronic component 20 . The electronic component 30 may have a surface 30s3 and a surface 30s4 opposite the surface 30s3. Surface 30s3 may extend between surfaces 30s1 and 30s2. Surface 30s4 may extend between surfaces 30s1 and 30s2. In some embodiments, each of surfaces 30s3 and 30s4 may also be referred to as a side of electronic component 30 .

如圖1A所示,電子元件20可以具有表面區域R1,而電子元件30可以具有表面區域R2。在一些實施例中,表面區域R1可以實質上等於表面區域R2。在一些實施例中,電子元件20的幾何中心(圖中未注釋)與電子元件30的幾何中心錯位。在一些實施例中,電子元件20的表面20s2的一部分可以從電子元件30中曝露。在一些實施例中,電子元件30可以與基底10的開口10r1垂直重疊。在一些實施例中,電子元件30可以覆蓋基底10的開口10r1。As shown in FIG. 1A, electronic component 20 may have surface area R1, and electronic component 30 may have surface area R2. In some embodiments, surface area R1 may be substantially equal to surface area R2. In some embodiments, the geometric center of electronic component 20 (not annotated in the figure) is offset from the geometric center of electronic component 30 . In some embodiments, a portion of surface 20s2 of electronic component 20 may be exposed from electronic component 30. In some embodiments, the electronic component 30 may vertically overlap the opening 10r1 of the substrate 10 . In some embodiments, the electronic component 30 may cover the opening 10r1 of the substrate 10 .

在一些實施例中,電子元件30可以包括電路層31。電路層31可以設置於電子元件30的表面30s1上。電路層31可以包括,例如,重新分佈層,它在一個或多個介電層內具有線路及導電通孔。In some embodiments, electronic component 30 may include circuit layer 31 . The circuit layer 31 may be disposed on the surface 30s1 of the electronic component 30. Circuit layer 31 may include, for example, a redistribution layer having lines and conductive vias within one or more dielectric layers.

在一些實施例中,半導體元件100a可包括導電柱32。在一些實施例中,導電柱32可以設置於電子元件30的表面30s1上。在一些實施例中,電子元件30的導電柱可經配置以將電子元件30與基底10電連接。在一些實施例中,導電柱32可以包括金屬,如銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、鋁(Al)、其合金、其組合或其他適合的材料。In some embodiments, semiconductor element 100a may include conductive pillars 32. In some embodiments, the conductive pillars 32 may be disposed on the surface 30s1 of the electronic component 30 . In some embodiments, the conductive pillars of electronic component 30 may be configured to electrically connect electronic component 30 to substrate 10 . In some embodiments, conductive pillars 32 may include metals such as copper (Cu), silver (Ag), gold (Au), nickel (Ni), aluminum (Al), alloys thereof, combinations thereof, or other suitable materials.

如圖1A所示,導電柱32可以面對電子元件20的表面20s3。在一些實施例中,電子元件20的表面20s4可以面向導電柱32遠離。As shown in FIG. 1A , the conductive pillar 32 may face the surface 20s3 of the electronic component 20 . In some embodiments, surface 20s4 of electronic component 20 may face away from conductive posts 32.

在一些實施例中,半導體元件100a可包括電氣連接33。電氣連接33可以設置於導電柱32與基底10之間。電氣連接33可包括焊接材料,如金及錫焊料的合金或銀及錫焊料的合金。In some embodiments, semiconductor element 100a may include electrical connections 33. Electrical connections 33 may be provided between conductive posts 32 and substrate 10 . The electrical connection 33 may include a soldering material, such as an alloy of gold and tin solder or an alloy of silver and tin solder.

在一些實施例中,半導體元件100a可包括封裝物40。在一些實施例中,封裝物40可以設置於基底10的表面10s2上。在一些實施例中,封裝物40可以覆蓋基底10的表面10s2。在一些實施例中,封裝物40可以覆蓋基底10的表面10s1的一部分。在一些實施例中,基底10的表面10s1的一部分可以從封裝物40中曝露。封裝物40可以包括絕緣或介電材料。在一些實施例中,封裝物40包含成型材料,該材料可包括,例如,Novolac基樹脂、環氧基樹脂、矽基樹脂或其他適合的封裝物。也可以包括適合的填料,如粉末狀的SiO2。In some embodiments, semiconductor component 100a may include package 40. In some embodiments, the encapsulation 40 may be disposed on the surface 10s2 of the substrate 10. In some embodiments, encapsulant 40 may cover surface 10s2 of substrate 10. In some embodiments, encapsulant 40 may cover a portion of surface 10s1 of substrate 10 . In some embodiments, a portion of surface 10s1 of substrate 10 may be exposed from encapsulation 40 . Encapsulation 40 may include insulating or dielectric materials. In some embodiments, the encapsulant 40 includes a molding material, which may include, for example, Novolac-based resin, epoxy-based resin, silicone-based resin, or other suitable encapsulants. Suitable fillers such as powdered SiO2 may also be included.

在一些實施例中,封裝物40可以封裝電子元件20。在一些實施例中,封裝物40可以封裝電子元件30。在一些實施例中,封裝物40可以封裝鍵合線22。在一些實施例中,封裝物40可以封裝導電柱32。在一些實施例中,封裝物40可以封裝電氣連接33。在一些實施例中,封裝物40可以填充基底10的開口10r1。在一些實施例中,封裝物40可以突出到基底10中。在一些實施例中,封裝物40可在基底10的開口10r1內具有部分40p1。在一些實施例中,封裝物40的部分40p1可以被基底10包圍。在一些實施例中,封裝物40的部分40p1可被基底10的表面10s3包圍。在一些實施例中,封裝物40的部分40p1可以與基底10的表面10s3接觸。在一些實施例中,封裝物40的部分40p1可以與電子元件20垂直重疊。在一些實施例中,封裝物40的部分40p1可以與電子元件30垂直重疊。In some embodiments, encapsulation 40 may encapsulate electronic component 20 . In some embodiments, enclosure 40 may encapsulate electronic component 30 . In some embodiments, encapsulant 40 may encapsulate bond wire 22 . In some embodiments, encapsulant 40 may encapsulate conductive posts 32 . In some embodiments, enclosure 40 may encapsulate electrical connection 33 . In some embodiments, the encapsulant 40 may fill the opening 10r1 of the substrate 10 . In some embodiments, encapsulation 40 may protrude into substrate 10 . In some embodiments, the package 40 may have a portion 40p1 within the opening 10r1 of the substrate 10 . In some embodiments, portion 40p1 of encapsulation 40 may be surrounded by substrate 10. In some embodiments, portion 40p1 of encapsulation 40 may be surrounded by surface 10s3 of substrate 10. In some embodiments, portion 40p1 of encapsulation 40 may be in contact with surface 10s3 of substrate 10. In some embodiments, portion 40p1 of package 40 may vertically overlap electronic component 20. In some embodiments, portion 40p1 of package 40 may vertically overlap electronic component 30.

在一些實施例中,半導體元件100a可包括黏合劑41及42。在一些實施例中,黏合劑41可經配置以將電子元件20附著到基底10的表面10s2。在一些實施例中,黏合劑41可以設置於電子元件20的表面20s1與基底10的表面10s2之間。In some embodiments, the semiconductor device 100a may include adhesives 41 and 42. In some embodiments, adhesive 41 may be configured to attach electronic component 20 to surface 10s2 of substrate 10. In some embodiments, the adhesive 41 may be disposed between the surface 20s1 of the electronic component 20 and the surface 10s2 of the substrate 10 .

在一些實施例中,黏合劑42可經配置以將電子元件30附著到電子元件20的表面20s2。在一些實施例中,黏合劑42可以設置於電子元件20的表面20s2與電子元件30的表面30s2之間。在一些實施例中,電路層31的一部分可被黏合劑42覆蓋。在一些實施例中,電路層32的一部分可以從黏合劑42中曝露。In some embodiments, adhesive 42 may be configured to attach electronic component 30 to surface 20s2 of electronic component 20. In some embodiments, the adhesive 42 may be disposed between the surface 20s2 of the electronic component 20 and the surface 30s2 of the electronic component 30. In some embodiments, a portion of circuit layer 31 may be covered by adhesive 42 . In some embodiments, a portion of circuit layer 32 may be exposed from adhesive 42 .

在一些實施例中,半導體元件100a可包括電氣連接50。電氣連接50可以設置於基底10的表面10s1上。在一些實施例中,電氣連接50可經配置以將半導體元件100a與外部元件(未顯示)電連接。在一些實施例中,電氣連接50可包括焊接材料,例如金及錫焊料的合金或銀及錫焊料的合金。In some embodiments, semiconductor component 100a may include electrical connections 50. Electrical connections 50 may be provided on surface 10s1 of substrate 10 . In some embodiments, electrical connection 50 may be configured to electrically connect semiconductor component 100a with external components (not shown). In some embodiments, the electrical connection 50 may include a soldering material, such as an alloy of gold and tin solder or an alloy of silver and tin solder.

在一個比較的例子中,下層及上層的電子元件都是通過導電柱與基底電連接。所述導電柱具有不同的長度。例如,較短的導電柱將下層電子元件附著到基底上,而較長的導電柱將上層電子元件附著到基底上。電子元件上的導電柱的形成可能需要更多的半導體製備過程,這可能導致成本更為增加,而產量相對較低。In a comparative example, the electronic components in the lower layer and the upper layer are electrically connected to the substrate through conductive pillars. The conductive pillars have different lengths. For example, shorter conductive posts attach lower-level electronic components to the substrate, while longer conductive posts attach upper-level electronic components to the substrate. The formation of conductive pillars on electronic components may require more semiconductor preparation processes, which may result in higher costs and relatively lower yields.

在本揭露的實施例中,基底具有一開口(例如10r1),鍵合線(例如22)穿過該開口。所述鍵合線將下層電子元件(如20)與基底電連接。上層電子元件(如30)通過導電柱(如32)與基底電連接。與比較例相比,只有上層電子元件需要導電柱。因此,可以省略形成較短導電柱的半導體製備過程,因此降低成本,提高元件的產量。In the embodiment of the present disclosure, the substrate has an opening (eg 10r1), and the bonding wire (eg 22) passes through the opening. The bonding wire electrically connects the underlying electronic component (such as 20) to the substrate. The upper electronic component (such as 30) is electrically connected to the substrate through the conductive pillar (such as 32). Compared with the comparative example, only the upper electronic components require conductive pillars. Therefore, the semiconductor fabrication process of forming shorter conductive pillars can be omitted, thereby reducing costs and increasing device yield.

圖2是俯視圖,例示本揭露一些實施例之半導體元件100b。半導體元件100b與圖1A中所示的半導體元件100a相似,其間的差異將在下文中描述。FIG. 2 is a top view illustrating a semiconductor device 100b according to some embodiments of the present disclosure. The semiconductor element 100b is similar to the semiconductor element 100a shown in FIG. 1A, and the differences therebetween will be described below.

如圖2所示,電子元件20可以具有在表面20s3與20s4之間延伸的表面20s5。表面20s5也可以被稱為電子元件20的一個側面。As shown in Figure 2, electronic component 20 may have surface 20s5 extending between surfaces 20s3 and 20s4. Surface 20 s 5 may also be referred to as a side surface of electronic component 20 .

在一些實施例中,導電柱32可包括部分32p1及32p2。在一些實施例中,導電柱32的部分32p1可設置於電子元件20的表面20s3上。在一些實施例中,導電柱32的部分32p1可以面對電子元件20的表面20s3。在一些實施例中,導電柱32的部分32p2可設置於電子元件20的表面20s5上。在一些實施例中,導電柱32的部分32p2可以面對電子元件20的表面20s5。In some embodiments, conductive pillar 32 may include portions 32p1 and 32p2. In some embodiments, the portion 32p1 of the conductive pillar 32 may be disposed on the surface 20s3 of the electronic component 20. In some embodiments, portion 32p1 of conductive post 32 may face surface 20s3 of electronic component 20. In some embodiments, portion 32p2 of conductive post 32 may be disposed on surface 20s5 of electronic component 20. In some embodiments, portion 32p2 of conductive post 32 may face surface 20s5 of electronic component 20.

電子元件20的表面20s5的一部分可以不與導電柱32重疊。在一些實施例中,導電柱32可以排列成L形輪廓、反轉L形輪廓或其他適合的輪廓。A portion of the surface 20 s5 of the electronic component 20 may not overlap the conductive pillars 32 . In some embodiments, conductive pillars 32 may be arranged in an L-shaped profile, an inverted L-shaped profile, or other suitable profile.

由於有更多的導電柱(例如,部分32p2)連接電子元件30與基底10,可以利用更多的輸入及/或輸出終端來傳輸或接收信號,因此提高半導體元件100b的性能。Since there are more conductive pillars (eg, portion 32p2) connecting the electronic component 30 to the substrate 10, more input and/or output terminals can be utilized to transmit or receive signals, thus improving the performance of the semiconductor device 100b.

圖3是橫截面圖,例示本揭露一些實施例之半導體元件100c。半導體元件100c與圖1B所示的半導體元件100a相似,其間的差異將在下面描述。FIG. 3 is a cross-sectional view illustrating a semiconductor device 100c according to some embodiments of the present disclosure. The semiconductor element 100c is similar to the semiconductor element 100a shown in FIG. 1B, and the differences therebetween will be described below.

在一些實施例中,電子元件30的表面區域R3可以與電子元件20的表面區域R1不同。在一些實施例中,電子元件30的表面區域R3可以大於電子元件20的表面區域R1。In some embodiments, surface area R3 of electronic component 30 may be different than surface area R1 of electronic component 20 . In some embodiments, surface area R3 of electronic component 30 may be larger than surface area R1 of electronic component 20 .

在一些實施例中,導電柱32可包括部分32p3。在一些實施例中,導電柱32的部分32p1及32p3可以設置於電子元件20的相對側。在一些實施例中,導電柱32的部分32p3可以設置於電子元件20的表面20s4上。在一些實施例中,導電柱32的部分32p3可以面對電子元件20的表面20s4。In some embodiments, conductive post 32 may include portion 32p3. In some embodiments, portions 32p1 and 32p3 of conductive pillars 32 may be disposed on opposite sides of electronic component 20 . In some embodiments, portion 32p3 of conductive post 32 may be disposed on surface 20s4 of electronic component 20. In some embodiments, portion 32p3 of conductive post 32 may face surface 20s4 of electronic component 20.

由於有更多的導電柱(例如,部分32p3)連接電子元件30與基底10,可以利用更多的輸入及/或輸出終端來傳輸或接收信號,因此提高半導體元件100c的性能。Since there are more conductive pillars (eg, portion 32p3) connecting the electronic component 30 to the substrate 10, more input and/or output terminals can be utilized to transmit or receive signals, thus improving the performance of the semiconductor device 100c.

圖4是橫截面圖,例示本揭露一些實施例之半導體元件100d。半導體元件100d與圖1B所示的半導體元件100a相似,其間的差異將在下面描述。FIG. 4 is a cross-sectional view illustrating a semiconductor device 100d according to some embodiments of the present disclosure. The semiconductor element 100d is similar to the semiconductor element 100a shown in FIG. 1B, and the differences therebetween will be described below.

在一些實施例中,基底10可以具有開口10r2。開口10r2可以在基底10的表面10s1與10s2之間延伸。在一些實施例中,開口10r2可以不與電子元件20垂直重疊。In some embodiments, the substrate 10 may have an opening 10r2. The opening 10r2 may extend between the surfaces 10s1 and 10s2 of the substrate 10. In some embodiments, opening 10r2 may not vertically overlap electronic component 20.

在一些實施例中,電子元件20可以通過導電柱23與基底10電連接。在一些實施例中,導電柱23可以設置於電子元件20的表面20s1與基底10的表面10s2之間。在一些實施例中,導電柱23可包括金屬,如銅(Cu)、銀(Ag)、金(Au)、鎳(Ni)、鋁(Al)、其合金、其組合或其他適合的材料。In some embodiments, the electronic component 20 may be electrically connected to the substrate 10 through the conductive pillars 23 . In some embodiments, the conductive pillar 23 may be disposed between the surface 20s1 of the electronic component 20 and the surface 10s2 of the substrate 10 . In some embodiments, the conductive pillar 23 may include metal, such as copper (Cu), silver (Ag), gold (Au), nickel (Ni), aluminum (Al), alloys thereof, combinations thereof, or other suitable materials.

在一些實施例中,封裝物40可以在基底10的開口10r2內具有部分40p1。在一些實施例中,封裝物40的部分40p1可不與電子元件20垂直重疊。在一些實施例中,封裝物40的部分40p1可以與電子元件30垂直重疊。In some embodiments, the encapsulation 40 may have a portion 40p1 within the opening 10r2 of the substrate 10. In some embodiments, portion 40p1 of package 40 may not vertically overlap electronic component 20. In some embodiments, portion 40p1 of package 40 may vertically overlap electronic component 30.

在一些實施例中,半導體元件100d可包括電氣連接24。電氣連接24可以設置於導電柱23與基底10之間。電氣連接24可包括焊接材料,如金及錫焊料的合金或銀及錫焊料的合金。In some embodiments, semiconductor element 100d may include electrical connections 24. Electrical connections 24 may be provided between conductive pillars 23 and substrate 10 . The electrical connection 24 may include a soldering material, such as an alloy of gold and tin solder or an alloy of silver and tin solder.

在一些實施例中,電子元件30可包括終端34。終端34可以設置於電子元件30的表面30s1上。終端34的材料可以與終端21的材料相同或相似。In some embodiments, electronic component 30 may include terminal 34. The terminal 34 may be provided on the surface 30s1 of the electronic component 30. The material of terminal 34 may be the same as or similar to the material of terminal 21 .

在一些實施例中,半導體元件100d可包括鍵合線35。在一些實施例中,鍵合線35具有與基底10的表面10s1鍵合的一第一端(圖中未注釋)及與電子元件30的表面30s1鍵合的一第二端(圖中未注釋)。在一些實施例中,鍵合線35可以鍵合到電子元件30的終端34上。在一些實施例中,鍵合線35可以穿過基底10的開口10r2。在一些實施例中,鍵合線35可以面對基底10的表面10s3。在一些實施例中,鍵合線35的材料可以與鍵合線22的材料相同或相似。在一些實施例中,鍵合線35可以面對電子元件20的表面20s3。在一些實施例中,電子元件20的表面20s4可以面對鍵合線35遠離。In some embodiments, semiconductor element 100d may include bond wires 35. In some embodiments, the bonding wire 35 has a first end (not annotated in the figure) bonded to the surface 10s1 of the substrate 10 and a second end (not annotated in the figure) bonded to the surface 30s1 of the electronic component 30 ). In some embodiments, bond wire 35 may be bonded to terminal 34 of electronic component 30 . In some embodiments, the bonding wire 35 may pass through the opening 10r2 of the substrate 10 . In some embodiments, bond wire 35 may face surface 10s3 of substrate 10. In some embodiments, the material of bond wire 35 may be the same as or similar to the material of bond wire 22 . In some embodiments, bond wire 35 may face surface 20s3 of electronic component 20. In some embodiments, surface 20s4 of electronic component 20 may face away from bond wire 35.

在本揭露的實施例中,基底具有一開口(例如10r2),鍵合線(例如鍵合線35)穿過該開口。所述鍵合線將上層電子元件(例如30)與基底電連接。下層電子元件(如20)通過導電柱(如23)與基底電連接。與比較例相比,只有下層電子元件需要導電柱。因此,可以省略形成較長導電柱的半導體製造過程,因此降低成本,提高元件產量。In the embodiment of the present disclosure, the substrate has an opening (eg, 10r2), and the bonding wire (eg, bonding wire 35) passes through the opening. The bonding wires electrically connect the upper electronic components (eg 30) to the substrate. The lower electronic components (such as 20) are electrically connected to the substrate through conductive pillars (such as 23). Compared with the comparative example, only the lower electronic components require conductive pillars. Therefore, the semiconductor manufacturing process of forming longer conductive pillars can be omitted, thereby reducing costs and increasing device yield.

圖5是流程圖,例示本揭露一些實施例之半導體元件的製備方法200。FIG. 5 is a flowchart illustrating a method 200 for manufacturing a semiconductor device according to some embodiments of the present disclosure.

製備方法200從操作202開始,其中可以提供一基底。該基底可以具有一下表面及與該下表面相對的一上表面。該基底可包括一個或多個導電墊(未顯示),靠近、鄰近或嵌入並曝露在該基底的該下表面及/或該上表面處。The preparation method 200 begins with operation 202, where a substrate may be provided. The base may have a lower surface and an upper surface opposite to the lower surface. The substrate may include one or more conductive pads (not shown) proximate, adjacent, or embedded and exposed at the lower surface and/or the upper surface of the substrate.

製備方法200繼續進行操作204,其中可以形成一開口。在一些實施例中,可以執行一蝕刻製程以形成該開口。該開口可以在該基底的該下表面與該上表面之間延伸。該蝕刻製程可以包括,例如,乾蝕刻、濕蝕刻,或其他適合的製程。The method 200 continues with operation 204 where an opening may be formed. In some embodiments, an etching process may be performed to form the opening. The opening may extend between the lower surface and the upper surface of the substrate. The etching process may include, for example, dry etching, wet etching, or other suitable processes.

製備方法200繼續進行操作206,在該操作中,一第一電子元件可被附著到該基底的該上表面。在一些實施例中,該第一電子元件可通過一黏合劑附著到該基底的該上表面。在一些實施例中,該第一電子元件可直接位於該基底該開口的正上方。該第一電子元件可以具有一主動表面及與該主動表面相對的一背面表面。在一些實施例中,該第一電子元件可以具有面向該基底該上表面的一終端。The method 200 continues with operation 206 in which a first electronic component may be attached to the upper surface of the substrate. In some embodiments, the first electronic component may be attached to the upper surface of the substrate via an adhesive. In some embodiments, the first electronic component may be located directly above the opening in the substrate. The first electronic component may have an active surface and a back surface opposite to the active surface. In some embodiments, the first electronic component may have a terminal facing the upper surface of the substrate.

製備方法200繼續進行操作208,其中可形成一鍵合線以將該基底與該第一電子元件電連接。在一些實施例中,該鍵合線可以具有與該第一電子元件該主動表面鍵合的一第一端及與該基底該下表面鍵合的一第二端。在一些實施例中,該鍵合線可以穿過該基底的該開口。在一些實施例中,該鍵合線可被鍵合到該第一電子元件的該終端。The method 200 continues with operation 208 , where a bonding wire may be formed to electrically connect the substrate to the first electronic component. In some embodiments, the bonding wire may have a first end bonded to the active surface of the first electronic component and a second end bonded to the lower surface of the substrate. In some embodiments, the bonding wire can pass through the opening of the substrate. In some embodiments, the bond wire can be bonded to the terminal of the first electronic component.

製備方法200繼續進行操作210,其中一第二電子元件可被附著到該第一電子元件的該背面表面。在一些實施例中,該第二電子元件可通過一黏合劑附著到該第一電子元件的該背面表面。在一些實施例中,該第二電子元件可以直接位於該基底該開口的正上方。The method 200 continues with operation 210 where a second electronic component may be attached to the back surface of the first electronic component. In some embodiments, the second electronic component may be attached to the back surface of the first electronic component via an adhesive. In some embodiments, the second electronic component may be located directly above the opening in the substrate.

該第二電子元件可以具有一主動表面及與該主動表面相對的一背面表面。在一些實施例中,在該第二電子元件的該主動表面上可以形成複數個導電柱。該導電柱可將該第二電子元件與該基底電連接。在一些實施例中,該導電柱可在將該第二電子元件附著到該第一電子元件之前形成在該第二電子元件的該主動表面上。The second electronic component may have an active surface and a back surface opposite to the active surface. In some embodiments, a plurality of conductive pillars may be formed on the active surface of the second electronic component. The conductive pillar can electrically connect the second electronic component to the substrate. In some embodiments, the conductive pillars may be formed on the active surface of the second electronic component prior to attaching the second electronic component to the first electronic component.

製備方法200繼續進行操作212,其中可在該基底的該上表面形成一封裝物,並在該基底的該下表面形成電氣連接,因此產生一半導體元件。在一些實施例中,該封裝物可以封裝該第一電子元件、該第二電子元件及該導電柱。The method 200 continues with operation 212, where a package may be formed on the upper surface of the substrate and electrical connections may be formed on the lower surface of the substrate, thereby creating a semiconductor device. In some embodiments, the encapsulant may encapsulate the first electronic component, the second electronic component and the conductive pillar.

在本揭露的實施例中,基底具有一開口,鍵合線穿過該開口。所述鍵合線將下層電子元件與基底電連接。上層電子元件通過導電柱與基底電連接。與比較例相比,只有上層電子元件需要導電柱。因此,可以省略在下層電子元件上形成較短的導電柱的半導體製造過程,因此降低成本並提高元件的產量。In an embodiment of the present disclosure, the substrate has an opening, and the bonding wire passes through the opening. The bonding wires electrically connect the underlying electronic components to the substrate. The upper electronic components are electrically connected to the substrate through conductive pillars. Compared with the comparative example, only the upper electronic components require conductive pillars. As a result, the semiconductor manufacturing process of forming shorter conductive pillars on underlying electronic components can be eliminated, thus reducing costs and increasing component yield.

製備方法200僅僅是一個例子,並不打算將本揭露的內容限制在申請專利範圍中明確敘述的範圍之外。可以在製備方法200的每個操作之前、期間或之後提供額外的操作,並且所述的一些操作可以被替換、消除或重新排序,以用於該製備方法的其他實施例。在一些實施例中,製備方法200可以包括圖5中未描繪的進一步操作。在一些實施例中,製備方法200可以包括圖5中描述的一個或多個操作。The preparation method 200 is only an example, and is not intended to limit the content of the present disclosure beyond what is explicitly stated in the patent application. Additional operations may be provided before, during, or after each operation of the preparation method 200, and some of the operations described may be replaced, eliminated, or reordered for other embodiments of the preparation method. In some embodiments, preparation method 200 may include further operations not depicted in Figure 5. In some embodiments, preparation method 200 may include one or more operations described in FIG. 5 .

圖6A、圖6B、圖7A、圖7B、圖8A、圖8B、圖9A、圖9B、圖10A、圖10B、圖11A及圖11B是例示本揭露一些實施例之半導體元件製備方法的一個或多個製備階段,其中圖6A、圖7A、圖8A、圖9A、圖10A及圖11A是俯視圖,而圖6B、圖7B、圖8B、圖9B、圖10B及圖11B分別是沿圖6A、圖7A、圖8A、圖9A、圖10A及圖11A所示A-A’線的橫截面圖。在一些實施例中,半導體元件100a可以通過關於圖6A至圖11A及圖6B至圖11B所述的操作來製備。6A, 6B, 7A, 7B, 8A, 8B, 9A, 9B, 10A, 10B, 11A and 11B illustrate one or more methods of manufacturing semiconductor devices according to some embodiments of the present disclosure. Multiple preparation stages, of which Figures 6A, 7A, 8A, 9A, 10A and 11A are top views, while Figures 6B, 7B, 8B, 9B, 10B and 11B are along the lines of Figure 6A and Figure 11B respectively. Cross-sectional views along line AA′ shown in FIGS. 7A, 8A, 9A, 10A and 11A. In some embodiments, the semiconductor device 100a may be prepared by the operations described with respect to FIGS. 6A-11A and 6B-11B.

參照圖6A及圖6B,可以提供基底10。基底10可以具有表面10s1及與表面10s1相對的表面10s2。基底10可以包括一個或多個導電墊(未顯示),靠近、鄰近或嵌入並曝露在基底10的表面10s1及/或表面10s2處。Referring to FIGS. 6A and 6B , a substrate 10 may be provided. The substrate 10 may have a surface 10s1 and a surface 10s2 opposite the surface 10s1. The substrate 10 may include one or more conductive pads (not shown) proximate to, adjacent to, or embedded and exposed at the surface 10s1 and/or the surface 10s2 of the substrate 10 .

參照圖7A及圖7B,可以形成開口10r1。在一些實施例中,可以執行蝕刻製程以形成開口10r1。開口10r1可以在基底10的表面10s1與10s2之間延伸。蝕刻製程可以包括,例如,乾蝕刻、濕蝕刻、或其他適合的製程。Referring to FIGS. 7A and 7B , the opening 10r1 can be formed. In some embodiments, an etching process may be performed to form the opening 10r1. The opening 10r1 may extend between the surfaces 10s1 and 10s2 of the substrate 10 . The etching process may include, for example, dry etching, wet etching, or other suitable processes.

參照圖8A及圖8B,電子元件20可以被附著到基底10的表面10s2上。在一些實施例中,電子元件20可以通過黏合劑41附著到基底10的表面10s2上。在一些實施例中,電子元件20可以位於基底10的開口10r1的正上方。電子元件20可以具有表面20s1及與表面20s1相對的表面20s2。在一些實施例中,電子元件20可以具有終端21,面向基底10的表面10s2。Referring to FIGS. 8A and 8B , the electronic component 20 may be attached to the surface 10s2 of the substrate 10 . In some embodiments, electronic component 20 may be attached to surface 10s2 of substrate 10 via adhesive 41. In some embodiments, the electronic component 20 may be located directly above the opening 10r1 of the substrate 10 . The electronic component 20 may have a surface 20s1 and a surface 20s2 opposite the surface 20s1. In some embodiments, electronic component 20 may have terminals 21 facing surface 10s2 of substrate 10.

參照圖9A及圖9B,可形成鍵合線22,以將基底10與電子元件20電連接。在一些實施例中,鍵合線22可以具有與電子元件20的表面20s1鍵合的一第一端及與基底10的表面10s1鍵合的一第二端。在一些實施例中,鍵合線22可以穿過基底10的開口10r1。在一些實施例中,鍵合線22可以鍵合到電子元件20的終端21。Referring to FIGS. 9A and 9B , bonding wires 22 may be formed to electrically connect the substrate 10 and the electronic component 20 . In some embodiments, the bonding wire 22 may have a first end bonded to the surface 20s1 of the electronic component 20 and a second end bonded to the surface 10s1 of the substrate 10 . In some embodiments, the bonding wire 22 may pass through the opening 10r1 of the substrate 10 . In some embodiments, bond wire 22 may be bonded to terminal 21 of electronic component 20 .

參照圖10A及圖10B,電子元件30可以被附著到電子元件20的表面20s2。在一些實施例中,電子元件30可以通過黏合劑42附著到電子元件20的表面20s2上。在一些實施例中,電子元件30可以直接位於基底10的開口10r1的正上方。Referring to FIGS. 10A and 10B , the electronic component 30 may be attached to the surface 20s2 of the electronic component 20 . In some embodiments, electronic component 30 may be attached to surface 20s2 of electronic component 20 via adhesive 42. In some embodiments, the electronic component 30 may be located directly above the opening 10r1 of the substrate 10 .

電子元件30可以具有表面30s1及與表面30s1相對的表面30s2。在一些實施例中,在電子元件30的表面30s1上可以形成複數個導電柱32。導電柱32可將電子元件30與基底10電連接。在一些實施例中,導電柱32可以在將電子元件30附著到電子元件20之前形成在電子元件30的表面30s1上。The electronic component 30 may have a surface 30s1 and a surface 30s2 opposite the surface 30s1. In some embodiments, a plurality of conductive pillars 32 may be formed on the surface 30s1 of the electronic component 30 . The conductive pillars 32 can electrically connect the electronic component 30 to the substrate 10 . In some embodiments, conductive pillars 32 may be formed on surface 30s1 of electronic component 30 before attaching electronic component 30 to electronic component 20.

導電柱32的製作技術可以包含濺鍍操作、電鍍操作及微影操作。例如,導電柱32的製作技術可以包含在電子元件30的表面30s1上形成定圖形(patterned)的光感層(未顯示)的微影操作、在定圖形的光感層的開口上形成種子層的濺鍍操作、在種子層上形成導電層的電鍍操作、以及去除定圖形的光感層。The manufacturing technology of the conductive pillar 32 may include sputtering operation, electroplating operation and photolithography operation. For example, the manufacturing technology of the conductive pillar 32 may include a photolithography operation to form a patterned photosensitive layer (not shown) on the surface 30s1 of the electronic component 30, and forming a seed layer on the opening of the patterned photosensitive layer. The sputtering operation, the electroplating operation to form the conductive layer on the seed layer, and the removal of the patterned photosensitive layer.

參照圖11A及圖11B,可在基底10的表面10s2上形成封裝物40,並在基底10的表面10s1上形成電氣連接50,因此產生半導體元件100a。封裝物40的製作技術可以包含成型操作。成型流可以從基底10的表面10s2,通過開口10r1,並進入基底10的表面10s1。因此,封裝物40可以封裝電子元件20、30及導電柱32。Referring to FIGS. 11A and 11B , a package 40 may be formed on the surface 10s2 of the substrate 10, and an electrical connection 50 may be formed on the surface 10s1 of the substrate 10, thereby producing a semiconductor device 100a. Fabrication techniques for the package 40 may include molding operations. The molding flow may pass from the surface 10s2 of the substrate 10, through the opening 10r1, and into the surface 10s1 of the substrate 10. Therefore, the encapsulation 40 can encapsulate the electronic components 20 , 30 and the conductive pillars 32 .

在本揭露的實施例中,可利用鍵合線22將電子元件20與基底10電連接。電子元件30通過導電柱32與基底10電連接。與比較例相比,只有電子元件30需要導電柱。因此,可以省略在電子元件20上形成導電柱的半導體製備過程,因此降低成本並提高元件的產量。In the embodiment of the present disclosure, the electronic component 20 and the substrate 10 can be electrically connected by using the bonding wire 22 . The electronic component 30 is electrically connected to the substrate 10 through the conductive pillars 32 . Compared with the comparative example, only the electronic component 30 requires conductive pillars. Therefore, the semiconductor preparation process of forming the conductive pillars on the electronic component 20 can be omitted, thereby reducing costs and increasing component yield.

圖12是流程圖,例示本揭露一些實施例之半導體元件的製備方法300。FIG. 12 is a flowchart illustrating a method 300 for manufacturing a semiconductor device according to some embodiments of the present disclosure.

製備方法300從操作302開始,該操作可在操作202之後進行。可以形成由該基底界定的一開口。該開口可在該基底的該下表面與該上表面之間延伸。The preparation method 300 begins with operation 302, which may be performed after operation 202. An opening defined by the base may be formed. The opening may extend between the lower surface and the upper surface of the substrate.

製備方法300繼續進行操作304,其中一第一電子元件可被附著到該基底的該上表面。在一些實施例中,該第一電子元件可通過一黏合劑附著到該基底的該上表面。在一些實施例中,該第一電子元件不與該基底該開口垂直重疊。在一些實施例中,在該第一電子元件該主動表面上可形成複數個導電柱。該導電柱可將該第一電子元件與該基底電連接。在一些實施例中,該導電柱可在將該第一電子元件附著到該基底之前形成在該第一電子元件的該主動表面上。The method 300 continues with operation 304 where a first electronic component may be attached to the upper surface of the substrate. In some embodiments, the first electronic component may be attached to the upper surface of the substrate via an adhesive. In some embodiments, the first electronic component does not vertically overlap the opening of the substrate. In some embodiments, a plurality of conductive pillars may be formed on the active surface of the first electronic component. The conductive pillar can electrically connect the first electronic component to the substrate. In some embodiments, the conductive pillars may be formed on the active surface of the first electronic component prior to attaching the first electronic component to the substrate.

製備方法300繼續進行操作306,其中一第二電子元件可被附著到該第一電子元件的該背面表面。在一些實施例中,該第二電子元件可通過一黏合劑附著到該第一電子元件的該背面表面。在一些實施例中,該第二電子元件可直接位於該基底該開口的正上方。該第二電子元件可以在該第二電子元件的該主動表面上具有一終端。The method 300 continues with operation 306 where a second electronic component may be attached to the back surface of the first electronic component. In some embodiments, the second electronic component may be attached to the back surface of the first electronic component via an adhesive. In some embodiments, the second electronic component can be located directly above the opening in the substrate. The second electronic component may have a terminal on the active surface of the second electronic component.

製備方法300繼續進行操作308,其中可形成一鍵合線以將該基底及該第二電子元件電連接。在一些實施例中,該鍵合線可以具有與該第二電子元件該主動表面鍵合的一第一端及與該基底該下表面鍵合的一第二端。在一些實施例中,該鍵合線可以穿過該基底的該開口。在一些實施例中,該鍵合線可被鍵合到該第二電子元件的該終端。The manufacturing method 300 continues with operation 308, where a bonding wire may be formed to electrically connect the substrate and the second electronic component. In some embodiments, the bonding wire may have a first end bonded to the active surface of the second electronic component and a second end bonded to the lower surface of the substrate. In some embodiments, the bonding wire can pass through the opening of the substrate. In some embodiments, the bond wire can be bonded to the terminal of the second electronic component.

製備方法300繼續進行操作310,其中可在該基底的該上表面形成一封裝物,並在該基底的該下表面形成電氣連接,因此產生一半導體元件。The method 300 continues with operation 310, where a package may be formed on the upper surface of the substrate and electrical connections may be formed on the lower surface of the substrate, thereby creating a semiconductor device.

在本揭露的實施例中,可以利用鍵合線將第二電子元件與基底電連接。第一電子元件通過導電柱與基底電連接。與比較例相比,只有第一電子元件需要導電柱。因此,可以省略在第二電子元件上形成導電柱的半導體製備過程,因此降低成本並提高元件產量。In embodiments of the present disclosure, bonding wires may be used to electrically connect the second electronic component to the substrate. The first electronic component is electrically connected to the substrate through the conductive pillar. Compared with the comparative example, only the first electronic component requires conductive pillars. Therefore, the semiconductor preparation process of forming the conductive pillars on the second electronic component can be omitted, thereby reducing costs and increasing component yield.

製備方法300僅僅是一個例子,並不打算將本揭露內容限制在申請專利範圍中明確提到的範圍之外。可以在製備方法300的每個操作之前、期間或之後提供額外的操作,所描述的一些操作可以被替換、消除或重新排序,用於該製備方法的其他實施例。在一些實施例中,製備方法300可以包括圖12中未描繪的進一步操作。在一些實施例中,製備方法300可以包括圖12中描繪的一個或多個操作。The preparation method 300 is merely an example and is not intended to limit the disclosure beyond what is expressly mentioned in the patent application. Additional operations may be provided before, during, or after each operation of the preparation method 300, and some of the operations described may be replaced, eliminated, or reordered for other embodiments of the preparation method. In some embodiments, preparation method 300 may include further operations not depicted in Figure 12. In some embodiments, preparation method 300 may include one or more operations depicted in Figure 12.

圖13、圖14、圖15、圖16及圖17例示本揭露一些實施例之半導體元件的製備方法的一個或多個製備階段。在一些實施例中,半導體元件100d可以通過關於圖13至圖17描述的操作來製備。FIGS. 13 , 14 , 15 , 16 and 17 illustrate one or more manufacturing stages of a method of manufacturing a semiconductor device according to some embodiments of the present disclosure. In some embodiments, semiconductor element 100d may be prepared by the operations described with respect to FIGS. 13-17.

參照圖13,其操作可在圖6A及圖6B的操作之後進行。可以形成開口10r2。開口10r2可以在基底10的表面10s1與10s2之間延伸。Referring to FIG. 13 , the operation may be performed after the operations of FIG. 6A and FIG. 6B . An opening 10r2 may be formed. The opening 10r2 may extend between the surfaces 10s1 and 10s2 of the substrate 10.

參照圖14,電子元件20可以附著到基底10的表面10s2。在一些實施例中,電子元件20可以通過黏合劑41附著到基底10的表面10s2上。在一些實施例中,電子元件20可以不與基底10的開口10r2垂直重疊。在一些實施例中,在電子元件20的表面20s1上可以形成複數個導電柱23。導電柱23可將電子元件20與基底10電連接。在一些實施例中,導電柱23可以在將電子元件20附著到基底10之前形成在電子元件20的表面20s1上。導電柱23的製備過程可以與導電柱32的製備過程相同或相似。Referring to FIG. 14 , the electronic component 20 may be attached to the surface 10s2 of the substrate 10 . In some embodiments, electronic component 20 may be attached to surface 10s2 of substrate 10 via adhesive 41. In some embodiments, the electronic component 20 may not vertically overlap the opening 10r2 of the substrate 10. In some embodiments, a plurality of conductive pillars 23 may be formed on the surface 20s1 of the electronic component 20 . The conductive pillars 23 can electrically connect the electronic component 20 to the substrate 10 . In some embodiments, conductive pillars 23 may be formed on surface 20s1 of electronic component 20 before attaching electronic component 20 to substrate 10 . The preparation process of the conductive pillar 23 may be the same or similar to the preparation process of the conductive pillar 32 .

參照圖15,電子元件30可以被附著到電子元件20的表面20s2。在一些實施例中,電子元件30可以通過黏合劑42附著到電子元件20的表面20s2上。在一些實施例中,電子元件30可以直接位於基底10的開口10r2的正上方。電子元件30可以在電子元件30的表面30s1上具有終端34。Referring to FIG. 15 , the electronic component 30 may be attached to the surface 20 s2 of the electronic component 20 . In some embodiments, electronic component 30 may be attached to surface 20s2 of electronic component 20 via adhesive 42. In some embodiments, the electronic component 30 may be located directly above the opening 10r2 of the substrate 10. The electronic component 30 may have terminals 34 on the surface 30s1 of the electronic component 30 .

參照圖16,可形成鍵合線35,以將基底10與電子元件30電連接。在一些實施例中,鍵合線35可以具有與電子元件30的表面30s1鍵合的一第一端及與基底10的表面10s1鍵合的一第二端。在一些實施例中,鍵合線35可以穿過基底10的開口10r2。在一些實施例中,鍵合線35可與電子元件30的終端34鍵合。Referring to FIG. 16 , bonding wires 35 may be formed to electrically connect the substrate 10 and the electronic component 30 . In some embodiments, the bonding wire 35 may have a first end bonded to the surface 30s1 of the electronic component 30 and a second end bonded to the surface 10s1 of the substrate 10 . In some embodiments, the bonding wire 35 may pass through the opening 10r2 of the substrate 10 . In some embodiments, bond wire 35 may be bonded to terminal 34 of electronic component 30 .

參照圖17,可在基底10的表面10s2上形成封裝物40,並在基底10的表面10s1上形成電氣連接50,因此產生半導體元件100d。Referring to FIG. 17, a package 40 may be formed on the surface 10s2 of the substrate 10, and an electrical connection 50 may be formed on the surface 10s1 of the substrate 10, thereby producing a semiconductor element 100d.

在本揭露的實施例中,基底具有一開口(例如10r2),鍵合線(例如,例如35)穿過該開口。所述鍵合線將上層電子元件(例如30)與基底電連接。下層電子元件(如20)通過導電柱(如23)與基底電連接。與比較例相比,只有下層電子元件需要導電柱。因此,可以省略在上層電子元件上形成較長導電柱的半導體製備過程,因此降低成本,提高元件的產量。In the embodiment of the present disclosure, the substrate has an opening (eg, 10r2), and the bonding wire (eg, eg, 35) passes through the opening. The bonding wires electrically connect the upper electronic components (eg 30) to the substrate. The lower electronic components (such as 20) are electrically connected to the substrate through conductive pillars (such as 23). Compared with the comparative example, only the lower electronic components require conductive pillars. Therefore, the semiconductor preparation process of forming longer conductive pillars on the upper electronic components can be omitted, thereby reducing costs and increasing component yield.

本揭露的一個方面提供一種半導體元件。該半導體元件包括一基底、一第一電子元件、一第二電子元件、一鍵合線及一封裝物。該基底具有一下表面及與該下表面相對的一上表面。該第一電子元件設置於該基底的該上表面上。該鍵合線將該第一電子元件與該基底電連接,並在該基底內延伸。該第二電子元件設置於該基底的該上表面上。該第二電子元件具有面向該基底的一主動表面(active surface)。該封裝物設置於該基底的該上表面上。該封裝物在該基底內延伸,並封裝該鍵合線。One aspect of the present disclosure provides a semiconductor device. The semiconductor component includes a substrate, a first electronic component, a second electronic component, a bonding wire and a package. The base has a lower surface and an upper surface opposite to the lower surface. The first electronic component is disposed on the upper surface of the substrate. The bonding wire electrically connects the first electronic component to the substrate and extends within the substrate. The second electronic component is disposed on the upper surface of the substrate. The second electronic component has an active surface facing the substrate. The package is disposed on the upper surface of the substrate. The encapsulant extends within the substrate and encapsulates the bond wire.

本揭露的另一個方面提供另一種半導體元件。該半導體元件包括一基底、一第一電子元件、一第二電子元件、一鍵合線及複數個導電柱。該基底具有一下表面、與該下表面相對的一上表面、以及在該上表面與該下表面之間延伸的一內側表面。該第一電子元件設置於該基底的該上表面上。該鍵合線將該第一電子元件與該基底電連接,並面向該基底的該內側表面。該鍵合線在該基底內延伸。該第二電子元件設置於該基底的該上表面上。每個導電柱都設置於該基底的該上表面上,並將該第二電子元件與該基底電連接。Another aspect of the present disclosure provides another semiconductor device. The semiconductor component includes a substrate, a first electronic component, a second electronic component, a bonding wire and a plurality of conductive pillars. The base has a lower surface, an upper surface opposite to the lower surface, and an inner surface extending between the upper surface and the lower surface. The first electronic component is disposed on the upper surface of the substrate. The bonding wire electrically connects the first electronic component to the substrate and faces the inner surface of the substrate. The bonding wire extends within the substrate. The second electronic component is disposed on the upper surface of the substrate. Each conductive pillar is disposed on the upper surface of the substrate and electrically connects the second electronic component to the substrate.

本揭露的另一個方面提供一種半導體元件的製備方法。該製備方法包括提供一基底,具有一下表面及與該下表面相對的一上表面。該製備方法還包括形成一開口,在該基底的該上表面與該下表面之間延伸。該製備方法還包括將一第一電子元件附著到該基底的該上表面。該第一電子元件的一主動表面面對該基底的該上表面。此外,該製備方法還包括將一第二電子元件附著到該第一電子元件上。該第二電子元件的一主動表面面向該基底的該上表面。該製備方法還包括在該基底上形成一鍵合線。該鍵合線穿過該基底的該開口,並將該基底與該第一電子元件或該第二電子元件中的一個電連接。Another aspect of the present disclosure provides a method of manufacturing a semiconductor device. The preparation method includes providing a substrate with a lower surface and an upper surface opposite to the lower surface. The preparation method also includes forming an opening extending between the upper surface and the lower surface of the substrate. The preparation method also includes attaching a first electronic component to the upper surface of the substrate. An active surface of the first electronic component faces the upper surface of the substrate. In addition, the preparation method further includes attaching a second electronic component to the first electronic component. An active surface of the second electronic component faces the upper surface of the substrate. The preparation method also includes forming a bonding wire on the substrate. The bonding wire passes through the opening of the substrate and electrically connects the substrate to one of the first electronic component or the second electronic component.

在本揭露的實施例中,基底具有一開口,鍵合線穿過該開口。所述鍵合線將下層(或上層)電子元件與基底電連接。上層(或下層)電子元件通過導電柱與基底電連接,導電柱是通過執行多個半導體製備過程形成的。因此,可以省略在下層電子元件上形成導電柱的半導體製備過程,因此降低成本,提高元件產量。In an embodiment of the present disclosure, the substrate has an opening, and the bonding wire passes through the opening. The bonding wire electrically connects the lower (or upper) electronic component to the substrate. The upper (or lower) electronic component is electrically connected to the substrate through conductive pillars, which are formed by performing multiple semiconductor preparation processes. Therefore, the semiconductor preparation process of forming conductive pillars on the underlying electronic components can be omitted, thereby reducing costs and increasing component yield.

雖然已詳述本揭露及其優點,然而應理解可進行各種變化、取代與替代而不脫離申請專利範圍所界定之本揭露的精神與範圍。例如,可用不同的方法實施上述的許多過程,並且以其他過程或其組合替代上述的許多過程。Although the disclosure and its advantages have been described in detail, it should be understood that various changes, substitutions and substitutions can be made without departing from the spirit and scope of the disclosure as claimed. For example, many of the processes described above may be implemented in different ways and may be substituted for many of the processes described above with other processes or combinations thereof.

再者,本申請案的範圍並不受限於說明書中所述之過程、機械、製造、物質組成物、手段、方法與步驟之特定實施例。該技藝之技術人士可自本揭露的揭示內容理解可根據本揭露而使用與本文所述之對應實施例具有相同功能或是達到實質上相同結果之現存或是未來發展之過程、機械、製造、物質組成物、手段、方法、或步驟。據此,此等過程、機械、製造、物質組成物、手段、方法、或步驟係包括於本申請案之申請專利範圍內。Furthermore, the scope of the present application is not limited to the specific embodiments of the process, machinery, manufacture, material compositions, means, methods and steps described in the specification. Those skilled in the art will understand from the disclosure of this disclosure that existing or future developed processes, machines, manufacturing, etc. can be used in accordance with the disclosure to have the same function or achieve substantially the same results as the corresponding embodiments described herein. A material composition, means, method, or step. Accordingly, such processes, machines, manufacturing, material compositions, means, methods, or steps are included in the patentable scope of this application.

10:基底 10r1:開口 10r2:開口 10s1:表面 10s2:表面 10s3:表面 20:電子元件 20s1:表面 20s2:表面 20s3:表面 20s4:表面 20s5:表面 21:終端 22:鍵合線 24:電氣連接 30:電子元件 30s1:表面 30s2:表面 30s3:表面 30s4:表面 31:電路層 32:導電柱 32p1:部分 32p2:部分 32p3:部分 33:電氣連接 34:終端 35:鍵合線 40:封裝物 40p1:部分 41:黏合劑 42:黏合劑 50:電氣連接 100a:半導體元件 100b:半導體元件 100c:半導體元件 100d:半導體元件 100d:半導體元件 200:製備方法 202:操作 204:操作 206:操作 208:操作 210:操作 212:操作 300:製備方法 302:操作 304:操作 306:操作 308:操作 310:操作 R1:表面區域 R2:表面區域 R3:表面區域 10: Base 10r1:Open your mouth 10r2:Open your mouth 10s1: Surface 10s2: Surface 10s3: Surface 20: Electronic components 20s1: Surface 20s2: Surface 20s3: Surface 20s4: Surface 20s5: Surface 21:Terminal 22: Bonding wire 24: Electrical connection 30: Electronic components 30s1: Surface 30s2: Surface 30s3: Surface 30s4: Surface 31:Circuit layer 32:Conductive pillar 32p1: part 32p2: part 32p3: part 33: Electrical connection 34:Terminal 35: Bonding wire 40: Encapsulation 40p1: part 41: Adhesive 42: Adhesive 50: Electrical connection 100a: Semiconductor components 100b: Semiconductor components 100c: Semiconductor components 100d: Semiconductor components 100d: Semiconductor components 200:Preparation method 202:Operation 204:Operation 206:Operation 208:Operation 210:Operation 212:Operation 300:Preparation method 302: Operation 304: Operation 306: Operation 308: Operation 310: Operation R1: surface area R2: surface area R3: surface area

參閱實施方式與申請專利範圍合併考量圖式時,可得以更全面了解本申請案之揭示內容,圖式中相同的元件符號係指相同的元件。 圖1A是俯視圖,例示本揭露一些實施例之半導體元件。 圖1B是橫截面圖,例示本揭露一些實施例之沿圖1A所示的半導體元件A-A'線的橫截面。 圖2是俯視圖,例示本揭露一些實施例之半導體元件。 圖3是橫截面圖,例示本揭露一些實施例之半導體元件。 圖4是橫截面圖,例示本揭露一些實施例之半導體元件。 圖5是流程圖,例示本揭露一些實施例之半導體元件的製備方法。 圖6A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖6B是橫截面圖,例示本揭露一些實施例之沿圖6A所示的半導體元件A-A'線的橫截面。 圖7A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖7B是橫截面圖,例示本揭露一些實施例之沿圖7A所示的半導體元件A-A'線的橫截面。 圖8A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖8B是橫截面圖,例示本揭露一些實施例之沿圖8A所示的半導體元件A-A'線的橫截面。 圖9A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖9B是橫截面圖,例示本揭露一些實施例之沿圖9A所示的半導體元件A-A'線的橫截面。 圖10A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖10B是橫截面圖,例示本揭露一些實施例之沿圖10A所示的半導體元件A-A'線的橫截面。 圖11A是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖11B是橫截面圖,例示本揭露一些實施例之沿圖11A所示的半導體元件A-A'線的橫截面。 圖12是流程圖,例示本揭露一些實施例之半導體元件的製備方法。 圖13是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖14是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖15是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖16是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 圖17是一個或多個製備階段,例示本揭露一些實施例之半導體元件的製備方法。 The disclosure content of this application can be more fully understood by referring to the embodiments and the patent scope combined with the drawings. The same element symbols in the drawings refer to the same elements. FIG. 1A is a top view illustrating a semiconductor device according to some embodiments of the present disclosure. FIG. 1B is a cross-sectional view illustrating a cross-section along line AA' of the semiconductor device shown in FIG. 1A according to some embodiments of the present disclosure. FIG. 2 is a top view illustrating a semiconductor device according to some embodiments of the present disclosure. 3 is a cross-sectional view illustrating a semiconductor device according to some embodiments of the present disclosure. 4 is a cross-sectional view illustrating a semiconductor device according to some embodiments of the present disclosure. FIG. 5 is a flow chart illustrating a method of manufacturing a semiconductor device according to some embodiments of the present disclosure. FIG. 6A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 6B is a cross-sectional view illustrating a cross-section along line AA′ of the semiconductor device shown in FIG. 6A according to some embodiments of the present disclosure. FIG. 7A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 7B is a cross-sectional view illustrating a cross-section along line AA' of the semiconductor device shown in FIG. 7A according to some embodiments of the present disclosure. FIG. 8A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. 8B is a cross-sectional view illustrating a cross-section along line AA' of the semiconductor device shown in FIG. 8A according to some embodiments of the present disclosure. FIG. 9A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 9B is a cross-sectional view illustrating a cross-section along line AA' of the semiconductor device shown in FIG. 9A according to some embodiments of the present disclosure. FIG. 10A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 10B is a cross-sectional view illustrating a cross-section along line AA' of the semiconductor device shown in FIG. 10A according to some embodiments of the present disclosure. FIG. 11A illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 11B is a cross-sectional view illustrating a cross-section along line AA′ of the semiconductor device shown in FIG. 11A according to some embodiments of the present disclosure. FIG. 12 is a flow chart illustrating a method of manufacturing a semiconductor device according to some embodiments of the present disclosure. FIG. 13 illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 14 illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 15 illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 16 illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure. FIG. 17 illustrates one or more fabrication stages illustrating a method of fabricating a semiconductor device according to some embodiments of the present disclosure.

10:基底 10: Base

10r1:開口 10r1:Open your mouth

10s1:表面 10s1: Surface

10s2:表面 10s2: Surface

10s3:表面 10s3: Surface

20:電子元件 20: Electronic components

20s1:表面 20s1: surface

20s2:表面 20s2: surface

20s3:表面 20s3: surface

20s4:表面 20s4: Surface

21:終端 21:Terminal

22:鍵合線 22: Bonding wire

30:電子元件 30: Electronic components

30s1:表面 30s1: Surface

30s2:表面 30s2: Surface

30s3:表面 30s3: Surface

30s4:表面 30s4: Surface

31:電路層 31:Circuit layer

32:導電柱 32:Conductive pillar

33:電氣連接 33: Electrical connection

40:封裝物 40: Encapsulation

40p1:部分 40p1: part

41:黏合劑 41: Adhesive

42:黏合劑 42: Adhesive

50:電氣連接 50: Electrical connection

100a:半導體元件 100a: Semiconductor components

Claims (20)

一種半導體元件,包括: 一基底,具有一下表面及與該下表面相對的一上表面; 一第一電子元件,設置於該基底該上表面上; 一鍵合線,將該第一電子元件與該基底電連接,其中該鍵合線在該基底內延伸; 一第二電子元件,設置於該基底的該上表面上,其中該第二電子元件具有面向該基底的一主動表面(active surface);以及 一封裝物,設置於該基底該上表面上,其中該封裝物在該基底內延伸並封裝該鍵合線。 A semiconductor component including: A base having a lower surface and an upper surface opposite to the lower surface; a first electronic component disposed on the upper surface of the substrate; a bonding wire electrically connecting the first electronic component to the substrate, wherein the bonding wire extends within the substrate; a second electronic component disposed on the upper surface of the substrate, wherein the second electronic component has an active surface facing the substrate; and An encapsulation is disposed on the upper surface of the base, wherein the encapsulation extends within the base and encapsulates the bonding wire. 如請求項1所述的半導體元件,其中該第二電子元件位於該第一電子元件上方,該封裝物的一部分被該基底所包圍,該封裝物的一部分與該第二電子元件垂直重疊。The semiconductor component of claim 1, wherein the second electronic component is located above the first electronic component, a portion of the package is surrounded by the substrate, and a portion of the package vertically overlaps the second electronic component. 如請求項1所述的半導體元件,其中該第一電子元件位於該第二電子元件上方,該封裝物的一部分被該基底所包圍,該封裝物的一部分不與該第二電子元件垂直重疊。The semiconductor component of claim 1, wherein the first electronic component is located above the second electronic component, a portion of the package is surrounded by the substrate, and a portion of the package does not vertically overlap the second electronic component. 如請求項1所述的半導體元件,更包括: 複數個導電柱,在該第二電子元件該主動表面與該基底該上表面之間延伸。 The semiconductor component as described in claim 1 further includes: A plurality of conductive pillars extend between the active surface of the second electronic component and the upper surface of the substrate. 如請求項4所述的半導體元件,其中該第一電子元件具有一第一側面及與該第一側面相對的一第二側面,並且該複數個導電柱設置於該第一電子元件的該第一側面上。The semiconductor component of claim 4, wherein the first electronic component has a first side and a second side opposite to the first side, and the plurality of conductive pillars are disposed on the third side of the first electronic component. On one side. 如請求項5所述的半導體元件,其中該第一電子元件該第二側面不面對該複數個導電柱。The semiconductor component of claim 5, wherein the second side of the first electronic component does not face the plurality of conductive pillars. 如請求項6所述的半導體元件,其中該第一電子元件的一第一表面區域與該第二電子元件的一第二表面區域實質上相同。The semiconductor device of claim 6, wherein a first surface area of the first electronic component and a second surface area of the second electronic component are substantially the same. 如請求項5所述的半導體元件,其中該第一電子元件具有在該第一側面與該第二側面之間延伸的一第三側面,並且該複數個導電柱的一部分面對該第一電子元件的該第三側面。The semiconductor component of claim 5, wherein the first electronic component has a third side extending between the first side and the second side, and a portion of the plurality of conductive pillars faces the first electron This third side of the component. 如請求項5所述的半導體元件,其中該複數導電柱的一部分面向該第一電子元件的該第二側面,並且該第一電子元件的一第一表面區域小於該第二電子元件的一第二表面區域。The semiconductor component of claim 5, wherein a portion of the plurality of conductive pillars faces the second side of the first electronic component, and a first surface area of the first electronic component is smaller than a first surface area of the second electronic component. Two surface areas. 如請求項4所述的半導體元件,其中該封裝物封裝該複數個導電柱,並且該封裝物與該基底的該下表面接觸。The semiconductor device of claim 4, wherein the package encapsulates the plurality of conductive pillars, and the package is in contact with the lower surface of the substrate. 一種半導體元件,包括: 一基底,具有一下表面、與該下表面相對的一上表面以及在該上表面與該下表面之間延伸的一內側表面; 一第一電子元件,設置於該基底的該上表面上; 一鍵合線,將該第一電子元件與該基底電連接,其中該鍵合線面向該基底的該內側表面。 一第二電子元件,設置於該基底的該上表面上;以及 複數個導電柱,設置於該基底該上表面上,每個導電柱都將該第二電子元件與該基底電連接。 A semiconductor component including: A base having a lower surface, an upper surface opposite to the lower surface, and an inner surface extending between the upper surface and the lower surface; a first electronic component disposed on the upper surface of the substrate; A bonding wire electrically connects the first electronic component to the substrate, wherein the bonding wire faces the inner surface of the substrate. a second electronic component disposed on the upper surface of the substrate; and A plurality of conductive pillars are disposed on the upper surface of the substrate, and each conductive pillar electrically connects the second electronic component to the substrate. 如請求項11所述的半導體元件,其中該第二電子元件位於該第一電子元件上方The semiconductor component of claim 11, wherein the second electronic component is located above the first electronic component 如請求項11所述的半導體元件,其中該第一電子元件位於該第二電子元件上方。The semiconductor component of claim 11, wherein the first electronic component is located above the second electronic component. 如請求項11所述的半導體元件,其中該第一電子元件具有一第一側面及與該第一側面相對的一第二側面,並且該複數個導電柱設置於該第一電子元件的該第一側面上。The semiconductor component of claim 11, wherein the first electronic component has a first side and a second side opposite to the first side, and the plurality of conductive pillars are disposed on the first side of the first electronic component. On one side. 如請求項14所述的半導體元件,其中該第一電子元件該第二側面不面對該複數個導電柱,並且該第一電子元件的一第一表面區域與該第二電子元件的一第二表面區域實質上相同。The semiconductor component of claim 14, wherein the second side of the first electronic component does not face the plurality of conductive pillars, and a first surface area of the first electronic component is in contact with a first surface area of the second electronic component. The two surface areas are essentially the same. 如請求項14所述的半導體元件,其中該第一電子元件具有在該第一側面與該第二側面之間延伸的一第三側面,並且該複數個導電柱的一部分面對該第一電子元件的該第三側面。The semiconductor component of claim 14, wherein the first electronic component has a third side extending between the first side and the second side, and a portion of the plurality of conductive pillars faces the first electron This third side of the component. 如請求項14所述的半導體元件,其中該複數個導電柱的一部分面向該第一電子元件的該第二側面,並且該第一電子元件的一第一表面區域小於該第二電子元件的一第二表面區域。The semiconductor component of claim 14, wherein a portion of the plurality of conductive pillars faces the second side of the first electronic component, and a first surface area of the first electronic component is smaller than a first surface area of the second electronic component. Second surface area. 如請求項11所述的半導體元件,更包括: 一封裝物,設置於該基底該上表面上,其中該封裝物封裝該複數個導電柱。 The semiconductor component as described in claim 11 further includes: A package is disposed on the upper surface of the substrate, wherein the package packages the plurality of conductive pillars. 如請求項18所述的半導體元件,其中該封裝物與該基底的該下表面接觸。The semiconductor device of claim 18, wherein the package is in contact with the lower surface of the substrate. 如請求項18所述的半導體元件,其中該封裝物具有被該基底該內側表面所包圍的一部分,並且該封裝物的該部分不與該第二電子元件垂直重疊。The semiconductor component of claim 18, wherein the package has a portion surrounded by the inner surface of the substrate, and the portion of the package does not vertically overlap the second electronic component.
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