TW202337961A - Polymer compound and resin composition containing the polymer compound - Google Patents

Polymer compound and resin composition containing the polymer compound Download PDF

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TW202337961A
TW202337961A TW111148273A TW111148273A TW202337961A TW 202337961 A TW202337961 A TW 202337961A TW 111148273 A TW111148273 A TW 111148273A TW 111148273 A TW111148273 A TW 111148273A TW 202337961 A TW202337961 A TW 202337961A
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赤泰昌
林本成生
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日商日本化藥股份有限公司
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14Polymers provided for in subclass C08G
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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    • C09J179/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09J161/00 - C09J177/00
    • C09J179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors

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Abstract

The present invention provides a polymer compound represented by the following formula (1), which has excellent solubility towards solvents with low boiling point such as toluene. A cured product can be provided by using the polymer compound represented by formula (1), and such cured product has sufficient flexibility for film formation, high adhesiveness to copper foils with low-roughness, low dielectric constant and dielectric loss tangent, and low linear expansion rate;
Figure 111148273-A0202-11-0002-4
In formula (1), R1, R2, R3 and R4 each independently represent a methyl group, an ethyl group, an isopropyl group or a tertiary butyl group. X each independently represents an acetyl group or a partial structure represented by the following formula (2), where 5% or more of the multiple Xs are a structure represented by formula (2). Y represents a residue obtained by removing two amino groups from a diamino compound. n is the average value of the number of repeating units and ranges from 1 to 100;
Figure 111148273-A0202-11-0002-5
(In formula (2), R5 represents a hydrogen atom or a methyl group)

Description

高分子化合物及含有該高分子化合物的樹脂組成物 Polymer compound and resin composition containing the same

本發明係有關一種高分子化合物,其係可藉由將溶液澆鑄於基材中的方法而容易地成形為薄膜(flim)狀,能夠藉由與自由基起始劑併用而進行熱或光硬化反應,而且其硬化物的介電特性、接著性、耐熱性為優異。 The present invention relates to a polymer compound that can be easily formed into a thin film (flim) by casting a solution into a base material, and can be cured by heat or light by using it together with a free radical initiator. reaction, and the cured product has excellent dielectric properties, adhesion, and heat resistance.

苯氧樹脂為藉由使二官能的環氧樹脂與二官能的酚化合物聚合而得之分子量非常大的高分子化合物。藉由添加該苯氧樹脂,可將一般的環氧樹脂組成物或自由基聚合性組成物作成薄膜形狀,故作為薄膜狀接著劑的重要成分而被使用在廣泛的領域,尤其是在電力/電子領域中被使用於印刷電路基板的層間絕緣層和附樹脂的銅箔等。 Phenoxy resin is a polymer compound with a very large molecular weight obtained by polymerizing a bifunctional epoxy resin and a bifunctional phenolic compound. By adding this phenoxy resin, general epoxy resin compositions or radically polymerizable compositions can be formed into a film shape, so it is used as an important component of film-like adhesives in a wide range of fields, especially in electric power/ In the electronic field, it is used in interlayer insulating layers of printed circuit boards and resin-coated copper foil.

添加有苯氧樹脂的樹脂組成物的硬化物雖然接著性優異且具有膜形成能力,但是耐熱性低,而且介電常數及介電損耗正切為高(在頻率1GHz為介電常數3.5、介電損耗正切0.03左右),因此實際上並無法使用於近年來訊號回應速度高速化的電子裝置用途。介電特性優異的樹脂一般 已知有聚四氟乙烯(PTFE)等高分子氟化合物(專利文獻1)或液晶聚合物(專利文獻2),惟此等樹脂與其他樹脂的相溶性極低,接著性亦不充分。 Although the cured product of the resin composition containing phenoxy resin has excellent adhesion and film-forming ability, it has low heat resistance and high dielectric constant and dielectric loss tangent (dielectric constant 3.5 and dielectric loss tangent at a frequency of 1 GHz). Loss tangent is about 0.03), so it cannot actually be used in electronic devices where signal response speeds have become faster in recent years. Resins with excellent dielectric properties are generally High-molecular fluorine compounds such as polytetrafluoroethylene (PTFE) (Patent Document 1) and liquid crystal polymers (Patent Document 2) are known. However, the compatibility of these resins with other resins is extremely low, and the adhesion is insufficient.

已知芳香族雙馬來醯亞胺雖然為耐熱性及介電特性優異的化合物,但普遍對於溶劑的溶解性差,只溶解於如NMP或DMF之高沸點的非質子性極性溶劑,因此難以使用於利用如甲苯或甲基乙基酮之低沸點溶劑的電子材料領域。又,其硬化物一般為剛直且缺乏柔韌性,而難以使用於薄膜用途。專利文獻3中雖然揭示使芳香族雙馬來醯亞胺與脂肪族的二胺進行麥可加成反應(Michael Addition)以進行高分子量化,藉此提升溶劑溶解性之方法,但由該雙馬來醯亞胺化合物與二胺化合物所構成之高分子化合物,由於其結構中殘留的二級胺具有與分子末端的馬來醯亞胺基的反應性,因此穩定性差,有容易凝膠化的問題。專利文獻4和5揭示使雙馬來醯亞胺與二胺的加成反應物所具有之二級胺與乙酸酐反應以進行乙醯基化,藉此提升穩定性之方法。然而,如此之手法所得之樹脂,其硬化物的線性膨脹率極高,並不適合要求可靠性的電子裝置等的用途。 Although aromatic bismaleimide is known to be a compound with excellent heat resistance and dielectric properties, it generally has poor solubility in solvents and is only soluble in high-boiling aprotic polar solvents such as NMP or DMF, making it difficult to use. In the field of electronic materials using low boiling point solvents such as toluene or methyl ethyl ketone. In addition, the hardened product is generally rigid and lacks flexibility, making it difficult to use it for film applications. Patent Document 3 discloses a method of performing a Michael Addition reaction (Michael Addition) between an aromatic bismaleimide and an aliphatic diamine to increase the molecular weight and thereby improve the solvent solubility. However, this method The polymer compound composed of a maleimine compound and a diamine compound has poor stability and is prone to gelation because the secondary amine remaining in its structure has reactivity with the maleimine group at the end of the molecule. problem. Patent Documents 4 and 5 disclose a method of improving stability by reacting a secondary amine contained in the addition reaction product of bismaleimide and diamine with acetic anhydride to perform acetylation. However, the resin obtained by this method has an extremely high linear expansion rate of the cured product and is not suitable for applications such as electronic devices that require reliability.

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Document]

[專利文獻1]日本特開2005-001274號公報 [Patent Document 1] Japanese Patent Application Publication No. 2005-001274

[專利文獻2]日本特開2014-060449號公報 [Patent Document 2] Japanese Patent Application Publication No. 2014-060449

[專利文獻3]日本特開2006-241300號公報 [Patent Document 3] Japanese Patent Application Publication No. 2006-241300

[專利文獻4]日本特許6948907號公報 [Patent Document 4] Japanese Patent No. 6948907

[專利文獻5]美國US8,637,611號公報 [Patent Document 5] United States Publication No. 8,637,611

本發明係有鑑於上述問題點而研創者,其目的係提供一種對於甲苯等低沸點溶劑的溶解性為優異的高分子化合物、及該高分子化合物的硬化物,該高分子化合物的硬化物係具有可進行薄膜化之充足的柔韌性,對於低粗糙度銅箔的接著性高,介電常數及介電損耗正切低,且線性膨脹率低。 The present invention was developed in view of the above problems, and its object is to provide a polymer compound having excellent solubility in a low-boiling point solvent such as toluene, and a cured product of the polymer compound. The cured product of the polymer compound is It has sufficient flexibility for thin film formation, high adhesion to low-roughness copper foil, low dielectric constant and dielectric loss tangent, and low linear expansion rate.

本發明人等進行了深入探討,結果發現:藉由使用包含特定結構的高分子化合物之樹脂組成物係解決上述課題,遂完成本發明。 The present inventors conducted in-depth studies and found that the above-mentioned problems can be solved by using a resin composition containing a polymer compound with a specific structure, and thus completed the present invention.

亦即,本發明係有關於下列內容: That is, the present invention relates to the following:

(1)一種高分子化合物,係如下述式(1)所示者; (1) A polymer compound represented by the following formula (1);

Figure 111148273-A0202-12-0003-7
Figure 111148273-A0202-12-0003-7

式(1)中,R1、R2、R3及R4分別獨立地表示甲基、乙基、異丙基或第三丁基。X分別獨立地表示乙醯基或下述式(2)所示之部分結構,惟存在複數個的X之至少一者為乙醯基,且存在複數個的X的5%以上為式(2)所示之結構。Y表示由二胺化合物中移除2個胺基後的殘基;n為重複單元數的平均值且於1至100的範圍; In formula (1), R 1 , R 2 , R 3 and R 4 each independently represent a methyl group, an ethyl group, an isopropyl group or a tert-butyl group. X each independently represents an acetyl group or a partial structure represented by the following formula (2), provided that at least one of the plurality of ) shows the structure. Y represents the residue after removing 2 amine groups from the diamine compound; n is the average number of repeating units and ranges from 1 to 100;

Figure 111148273-A0202-12-0004-8
Figure 111148273-A0202-12-0004-8

(式(2)中,R5表示氫原子或甲基)。 (In formula (2), R 5 represents a hydrogen atom or a methyl group).

(2)一種樹脂組成物,係包含前項(1)所記載之高分子化合物及自由基起始劑。 (2) A resin composition containing the polymer compound described in the preceding paragraph (1) and a free radical initiator.

(3)如前項(2)所記載之樹脂組成物,其更含有自由基反應性單體,該自由基反應性單體係具有自由基反應性官能基。 (3) The resin composition as described in the preceding item (2), which further contains a radical reactive monomer, and the radical reactive monomer system has a radical reactive functional group.

(4)如前項(2)所記載之樹脂組成物,其更含有自由基反應性聚合物,該自由基反應性聚合物係於一分子中具有2個以上之自由基反應性官能基。 (4) The resin composition as described in the preceding paragraph (2), which further contains a radical reactive polymer having two or more radical reactive functional groups in one molecule.

(5)一種薄膜狀接著劑,係由前項(2)至(4)中任一項所記載之樹脂組成物所構成者。 (5) A film-like adhesive composed of the resin composition described in any one of the preceding paragraphs (2) to (4).

(6)一種硬化物,係前項(2)至(4)中任一項所記載之樹脂組成物的硬化物。 (6) A cured product of the resin composition described in any one of the preceding paragraphs (2) to (4).

(7)一種硬化物,係前項(5)所記載之薄膜狀接著劑的硬化物。 (7) A cured product of the film-like adhesive described in the preceding paragraph (5).

藉由本發明,可提供一種高分子化合物及含有該高分子化合物之樹脂組成物,該高分子化合物及含有該高分子化合物之樹脂組成物可藉由併用自由基起始劑並施加熱或光能而形成硬化物,且該樹脂組成物的硬化物係介電特性、接著性、耐熱性優異者。 According to the present invention, a polymer compound and a resin composition containing the polymer compound can be provided. The polymer compound and the resin composition containing the polymer compound can be produced by combining a radical initiator and applying heat or light energy. A cured product is formed, and the cured product of the resin composition is excellent in dielectric properties, adhesion, and heat resistance.

以下說明本發明之實施形態。 Embodiments of the present invention will be described below.

本發明之式(1)所示之高分子化合物為經由下述方式得到之反應物: The polymer compound represented by formula (1) of the present invention is a reactant obtained by the following method:

(1)合成出二胺化合物(A)(以下僅記載為「化合物(A)」)、與莫耳數相較於化合物(A)為過量之特定結構的雙馬來醯亞胺化合物(B)(以下僅記載為「化合物(B)」)之共聚物(C), (1) A diamine compound (A) (hereinafter simply referred to as "compound (A)") and a bismaleimide compound (B) with a specific structure in excess molar relative to compound (A) are synthesized. ) (hereinafter simply referred to as "compound (B)") copolymer (C),

(2)使共聚物(C)中之二級胺基的5%以上且未達100%與具有異氰酸酯基及(甲基)丙烯酸基的化合物(D)(以下僅記載為「化合物(D)」)中之異氰酸酯基進行反應, (2) The compound (D) having an isocyanate group and a (meth)acrylic acid group (hereinafter simply referred to as "compound (D)") accounts for more than 5% but less than 100% of the secondary amine groups in the copolymer (C). ") react with the isocyanate group,

(3)使共聚物(C)與化合物(D)之反應物中殘留的二級胺基與乙酸酐進行反應。 (3) React the secondary amine group remaining in the reactant of the copolymer (C) and the compound (D) with acetic anhydride.

首先,說明本發明之高分子化合物的中間原料之共聚物(C)。 First, the copolymer (C) which is an intermediate raw material of the polymer compound of the present invention will be described.

共聚物(C)為化合物(A)、與莫耳數相較於化合物(A)為過量的化合物(B)之共聚反應物(麥可加成反應物)。 Copolymer (C) is a copolymerization reaction product (Michael addition reaction product) of compound (A) and compound (B) in molar excess relative to compound (A).

作為共聚物(C)的原料之化合物(A)只要是於一分子中具有2個胺基的化合物就無特別限定,其具體例可列舉:1,2-二胺基乙烷、1,3-二胺基丙烷、1,4-二胺基丁烷、己二胺(hexamethylenediamine)、1,8-二胺基辛烷、1,10-二胺基癸烷、1,12-二胺基十二烷、4,4’-亞甲基雙環己二胺、1,2-環己二胺、1,3-環己二胺、1,4-環己二胺、1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、異佛爾酮二胺、降冰片烯二胺、二聚物二胺(dimer diamine)、3,3’-二胺基-N-甲基二丙基胺、二胺順丁烯二腈(diaminomaleonitrile)、1,3-二胺基戊烷、9,10-二胺基菲、4,4’-二胺基八氟聯苯、3,5-二胺基苯甲酸、3,7-二胺基-2-甲氧基茀、4,4’-二胺基二苯基酮、3,4-二胺基二苯基酮、3,4-二胺基甲苯、2,6-二胺基蒽醌、2,6-二胺基甲苯、2,3-二胺基甲苯、1,8-二胺基萘、 2,4-二胺基甲苯、2,5-二胺基甲苯、1,4-二胺基蒽醌、1,5-二胺基蒽醌、1,5-二胺基萘、1,2-二胺基蒽醌、2,4-異丙苯二胺、1,3-雙胺基甲基苯、1,3-雙胺基甲基環己烷、2-氯-1,4-二胺基苯、1,4-二胺基-2,5-二氯苯、1,4-二胺基-2,5-二甲基苯、4,4’-二胺基-2,2’-雙三氟甲基聯苯、雙(胺基-3-氯苯基)乙烷、雙(4-胺基-3,5-二甲基苯基)甲烷、雙(4-胺基-3,5-二乙基苯基)甲烷、2,3-二胺基萘、雙(4-胺基-3-甲基苯基)甲烷、雙(4-胺基-3-乙基苯基)甲烷、4,4’-二胺基苯基碸、3,3’-二胺基苯基碸、2,2-雙(4,(4胺基苯氧基)苯基)碸、2,2-雙(4-(3-胺基苯氧基)苯基)碸、4,4’-二胺基二苯醚(4,4'-oxydianiline)、4,4’-二胺基二苯基硫醚、3,4’-二胺基二苯醚、2,2-雙(4-(4-胺基苯氧基)苯基)丙烷、1,3-雙(4-胺基苯氧基)苯、4,4’-雙(4-胺基苯氧基)聯苯、4,4’-二胺基-3,3’-二甲基聯苯、4,4’-二胺基-3,3’-二甲氧基聯苯、9,9-雙(4-胺基苯基)茀、1,3-雙(4-胺基苯氧基)-2,2-二甲基丙烷、1,3-雙(4-胺基苯氧基)丙烷、1,4-雙(4-胺基苯氧基)丁烷、1,5-雙(4-胺基苯氧基)丁烷、2,3,5,6-四甲基-1,4-苯二胺;3,3’,5,5’-四甲基聯苯胺(3,3’,5,5’-tetramethyl benzidine)、2,2-雙(4-胺基苯基)六氟丙烷、間苯二甲胺(m-xylylendiamin)、對苯二甲胺、雙(4-胺基-3-甲基環己基)甲烷、1,2-雙(2-胺基乙氧基)乙烷等。 The compound (A) as the raw material of the copolymer (C) is not particularly limited as long as it has two amine groups in one molecule. Specific examples thereof include: 1,2-diaminoethane, 1,3 -Diaminopropane, 1,4-diaminobutane, hexamethylenediamine, 1,8-diaminooctane, 1,10-diaminodecane, 1,12-diaminodecane Dodecane, 4,4'-methylenedicyclohexanediamine, 1,2-cyclohexanediamine, 1,3-cyclohexanediamine, 1,4-cyclohexanediamine, 1,3-bis( Aminomethyl)cyclohexane, 1,4-bis(aminomethyl)cyclohexane, isophorone diamine, norbornene diamine, dimer diamine, 3,3 '-Diamino-N-methyldipropylamine, diamine maleonitrile (diaminomaleonitrile), 1,3-diaminopentane, 9,10-diaminophenanthrene, 4,4'- Diaminooctafluorobiphenyl, 3,5-diaminobenzoic acid, 3,7-diamino-2-methoxyfluorobenzene, 4,4'-diaminodiphenylketone, 3,4- Diaminodiphenyl ketone, 3,4-diaminotoluene, 2,6-diaminoanthraquinone, 2,6-diaminotoluene, 2,3-diaminotoluene, 1,8-diamine Aminonaphthalene, 2,4-diaminotoluene, 2,5-diaminotoluene, 1,4-diaminoanthraquinone, 1,5-diaminoanthraquinone, 1,5-diaminonaphthalene, 1,2 -Diaminoanthraquinone, 2,4-isopropylphenylenediamine, 1,3-bisaminomethylbenzene, 1,3-bisaminomethylcyclohexane, 2-chloro-1,4-bis Aminobenzene, 1,4-diamino-2,5-dichlorobenzene, 1,4-diamino-2,5-dimethylbenzene, 4,4'-diamino-2,2' -Bistrifluoromethylbiphenyl, bis(amino-3-chlorophenyl)ethane, bis(4-amino-3,5-dimethylphenyl)methane, bis(4-amino-3) ,5-diethylphenyl)methane, 2,3-diaminonaphthalene, bis(4-amino-3-methylphenyl)methane, bis(4-amino-3-ethylphenyl) Methane, 4,4'-diaminophenyl terine, 3,3'-diaminophenyl terine, 2,2-bis(4,(4aminophenoxy)phenyl) terine, 2,2 -Bis(4-(3-aminophenoxy)phenyl)terine, 4,4'-diaminodiphenyl ether (4,4'-oxydianiline), 4,4'-diaminodiphenyl Sulfide, 3,4'-diaminodiphenyl ether, 2,2-bis(4-(4-aminophenoxy)phenyl)propane, 1,3-bis(4-aminophenoxy) )benzene, 4,4'-bis(4-aminophenoxy)biphenyl, 4,4'-diamino-3,3'-dimethylbiphenyl, 4,4'-diamino- 3,3'-dimethoxybiphenyl, 9,9-bis(4-aminophenyl)quinone, 1,3-bis(4-aminophenoxy)-2,2-dimethylpropane , 1,3-bis(4-aminophenoxy)propane, 1,4-bis(4-aminophenoxy)butane, 1,5-bis(4-aminophenoxy)butane , 2,3,5,6-tetramethyl-1,4-phenylenediamine; 3,3',5,5'-tetramethyl benzidine (3,3',5,5'-tetramethyl benzidine) , 2,2-bis(4-aminophenyl)hexafluoropropane, m-xylylendiamin, p-phenylenediamine, bis(4-amino-3-methylcyclohexyl)methane , 1,2-bis(2-aminoethoxy)ethane, etc.

此外,將化合物(A)之2個胺基移除後的殘基(二價連結基)係相當於式(1)中之Y。 In addition, the residue (bivalent linking group) after removing the two amine groups of compound (A) is equivalent to Y in formula (1).

化合物(A)較佳為碳數2以上的脂肪族二胺化合物,其具體例可列舉:1,2-二胺基乙烷、1,3-二胺基丙烷、1,4-二胺基丁烷、己二胺、1,8-二胺基辛烷、1,10-二胺基癸烷、1,12-二胺基十二烷、4,4’-亞甲基雙環己二胺、1,2-環己二胺、1,3-環己二胺、1,4-環己二胺、1,3-雙(胺基甲基)環己烷、1,4-雙(胺基甲基)環己烷、異佛爾酮二胺、降冰片烯二胺及二聚物二胺等。 Compound (A) is preferably an aliphatic diamine compound having 2 or more carbon atoms. Specific examples thereof include: 1,2-diaminoethane, 1,3-diaminopropane, and 1,4-diaminopropane. Butane, hexamethylenediamine, 1,8-diaminooctane, 1,10-diaminodecane, 1,12-diaminododecane, 4,4'-methylenebiscyclohexanediamine , 1,2-cyclohexanediamine, 1,3-cyclohexanediamine, 1,4-cyclohexanediamine, 1,3-bis(aminomethyl)cyclohexane, 1,4-bis(amine Methyl) cyclohexane, isophorone diamine, norbornene diamine and dimer diamine, etc.

式(1)中之Y較佳為由上述碳數2以上的脂肪族二胺化合物中移除2個胺基後的殘基(二價連結基)。 Y in the formula (1) is preferably a residue (bivalent linking group) obtained by removing two amine groups from the aliphatic diamine compound having 2 or more carbon atoms.

化合物(B)係使用雙馬來醯亞胺化合物,該雙馬來醯亞胺化合物係藉由雙-3,5-二烷基-4-胺基苯基甲烷化合物與馬來酸的縮合閉環反應而得到者,且該化合物中之四個烷基係分別獨立地為甲基、乙基、異丙基或第三丁基。 Compound (B) uses a bismaleimide compound, which is ring-closed by condensation of a bis-3,5-dialkyl-4-aminophenylmethane compound and maleic acid. Obtained from the reaction, and the four alkyl groups in the compound are independently methyl, ethyl, isopropyl or tertiary butyl.

化合物(B)的具體例可列舉:3,3’-二甲基-5,5’-二乙基-4,4’-二苯基甲烷雙馬來醯亞胺、3,3’,5,5’-四甲基-4,4’-二苯基甲烷雙馬來醯亞胺、3,3’,5,5’-四異丙基-4,4’-二苯基甲烷雙馬來醯亞胺等。 Specific examples of compound (B) include: 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 3,3',5 ,5'-tetramethyl-4,4'-diphenylmethane bismaleimide, 3,3',5,5'-tetraisopropyl-4,4'-diphenylmethane bismaleimide Leimide, etc.

上述化合物(B)具有之烷基係相當於後述說明之式(1)中之R1至R4。化合物(B)的烷基較佳為甲基或乙基。 The alkyl group possessed by the above-mentioned compound (B) corresponds to R 1 to R 4 in the formula (1) described below. The alkyl group of compound (B) is preferably methyl or ethyl.

化合物(B)中,由於「與馬來醯亞胺基鍵結的苯環上之碳原子的鄰位為氫原子之雙馬來醯亞胺化合物」與二級胺基的反應性高,故在用以合成共聚物(C)之共聚反應時,容易因為鄰位的氫原子與化合物(A)的胺基之反應而凝膠化,惟藉由使用鄰位皆為烷基的化合物(B),可防止與化合物(A)共聚反應時的凝膠化。 In compound (B), the "bismaleimide compound in which the ortho-position of the carbon atom on the benzene ring bonded to the maleimide group is a hydrogen atom" has high reactivity with the secondary amine group. In the copolymerization reaction used to synthesize copolymer (C), it is easy to gel due to the reaction between the hydrogen atoms in the ortho position and the amine group of the compound (A). However, by using the compound (B) in which the ortho positions are all alkyl groups, it is easy to gel. ), can prevent gelation during copolymerization reaction with compound (A).

合成共聚物(C)時之化合物(A)與化合物(B)的使用量,通常相較於化合物(B),化合物(A)為較少的莫耳量,相對於化合物(B)1莫耳,化合物(A)較佳為0.4至0.98莫耳,更佳為0.5至0.96莫耳。 When synthesizing copolymer (C), the usage amounts of compound (A) and compound (B) are usually smaller molar amounts compared to compound (B), and 1 molar amount relative to compound (B). Ear, the compound (A) is preferably 0.4 to 0.98 mol, more preferably 0.5 to 0.96 mol.

合成時之反應溫度通常為50至150℃,較佳為60至140℃,反應時間通常為0.5至30小時,較佳為1至20小時,亦可使用反應觸媒。反應只要將藉由GPC(凝膠滲透層析儀)得到的分子量無法從一定之值增加的時 間點設為終點即可。反應所使用的溶劑可在加熱減壓下予以餾除,亦可直接以包含溶劑的狀態用於樹脂組成物。 The reaction temperature during synthesis is usually 50 to 150°C, preferably 60 to 140°C, and the reaction time is usually 0.5 to 30 hours, preferably 1 to 20 hours. A reaction catalyst can also be used. The reaction only requires that the molecular weight obtained by GPC (gel permeation chromatography) cannot be increased from a certain value. Just set the intermediate point as the end point. The solvent used in the reaction may be distilled off under heating and reduced pressure, or may be directly used in the resin composition in a state containing the solvent.

化合物(A)與化合物(B)的共聚反應中較佳係使用溶劑,可使用的溶劑係可列舉:甲苯、二甲苯、甲基乙基酮、甲基異丁基酮、環戊酮、環己酮及丙二醇單甲基醚乙酸酯等。相對於用於共聚反應的原料之固形物,溶劑的使用量較佳為10至300質量%,更佳為20至200質量%。 It is preferable to use a solvent in the copolymerization reaction of compound (A) and compound (B). Examples of solvents that can be used include: toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, and cyclopentanone. Hexanone and propylene glycol monomethyl ether acetate, etc. The usage amount of the solvent is preferably 10 to 300% by mass, more preferably 20 to 200% by mass relative to the solid content of the raw material used for the copolymerization reaction.

共聚物(C)的數量平均分子量通常為1,000至10萬,較佳為1,500至8萬。為了得到數量平均分子量在前述範圍內的共聚物(C),只要將原料成分以上述比率添加即可。藉由測定該數量平均分子量,可算出式(1)之n的值。n為重複單元數的平均值,於1至100的範圍內,若在範圍內,則可發揮本發明之高分子化合物所得的效果。 The number average molecular weight of the copolymer (C) is usually 1,000 to 100,000, preferably 1,500 to 80,000. In order to obtain a copolymer (C) with a number average molecular weight within the aforementioned range, the raw material components may be added at the aforementioned ratio. By measuring the number average molecular weight, the value of n in the formula (1) can be calculated. n is the average number of repeating units and is in the range of 1 to 100. If it is within the range, the effect obtained by the polymer compound of the present invention can be exerted.

此外,本說明書中之分子量係意指根據GPC的測定結果而經聚苯乙烯換算所算出的值。 In addition, the molecular weight in this specification means the value calculated in polystyrene conversion based on the measurement result of GPC.

其次,說明本發明之高分子化合物。 Next, the polymer compound of the present invention will be described.

本發明之高分子化合物係使前述共聚物(C)中所存在的二級胺基的5%以上且未達100%與下述式(3)所示之化合物(D)中之異氰酸酯基進行反應後,以使前述所得之反應物中殘留的二級胺基與乙酸酐進行反應,藉此進行乙醯基化而得到。 The polymer compound of the present invention is a polymer compound in which 5% or more but less than 100% of the secondary amine groups present in the copolymer (C) react with the isocyanate group in the compound (D) represented by the following formula (3). After the reaction, the residual secondary amine group in the reactant obtained above is reacted with acetic anhydride to obtain acetylation.

此外,式(3)中之R5表示與式(2)中之R5相同的意義。亦即,式(2)中之R5係源自化合物(D)所具有的氫原子或甲基。 In addition, R 5 in the formula (3) has the same meaning as R 5 in the formula (2). That is, R 5 in formula (2) is derived from a hydrogen atom or a methyl group possessed by compound (D).

Figure 111148273-A0202-12-0009-9
Figure 111148273-A0202-12-0009-9

化合物(D)的具體例可列舉:甲基丙烯酸2-異氰酸基乙酯(製品名Karenz MOI昭和電工股份有限公司製)、丙烯酸2-異氰酸基乙酯(製品名Karenz AOI昭和電工股份有限公司製)等。 Specific examples of the compound (D) include: 2-isocyanatoethyl methacrylate (product name: Karenz MOI, manufactured by Showa Denko Co., Ltd.), 2-isocyanatoethyl acrylate (product name: Karenz AOI, Showa Denko Co., Ltd.) joint stock limited company), etc.

就合成本發明之高分子化合物時之共聚物(C)與化合物(D)的使用量而言,相對於共聚物(C)中之二級胺基1莫耳當量,化合物(D)較佳為0.05至0.9莫耳,更佳為0.1至0.8莫耳。反應溫度較佳為10至90℃,反應時間較佳為30分鐘至5小時。 Regarding the usage amounts of copolymer (C) and compound (D) when synthesizing the polymer compound of the present invention, compound (D) is preferred relative to 1 mole equivalent of the secondary amine group in copolymer (C). It is 0.05 to 0.9 mol, more preferably 0.1 to 0.8 mol. The reaction temperature is preferably 10 to 90°C, and the reaction time is preferably 30 minutes to 5 hours.

藉由於上述所得之共聚物(C)與化合物(D)之反應物中添加乙酸酐,可使殘留的二級胺基進行乙醯基化。本發明之高分子化合物的合成方法之較佳的態樣為:在溶劑中進行化合物(A)與化合物(B)之共聚反應,於所得之共聚物(C)溶液添加化合物(D)以進行反應,再於所得之反應溶液進一步添加乙酸酐以進行乙醯基化。。 By adding acetic anhydride to the reaction product of the copolymer (C) and the compound (D) obtained above, the remaining secondary amine groups can be acetylated. A preferred aspect of the synthesis method of the polymer compound of the present invention is as follows: performing a copolymerization reaction of compound (A) and compound (B) in a solvent, and adding compound (D) to the obtained copolymer (C) solution. reaction, and then acetic anhydride is further added to the obtained reaction solution to perform acetylation. .

合成本發明之高分子化合物時之乙酸酐的使用量,只要是與共聚物(C)與化合物(D)之反應物中殘留的二級胺的莫耳數相同的量或其以上的量即可。反應溫度較佳為10至90℃,反應時間較佳為30分鐘至5小時。反應結束後所生成的乙酸及過量使用的乙酸酐可藉由水洗分離而除去。 The amount of acetic anhydride used when synthesizing the polymer compound of the present invention is as long as it is the same or more than the molar number of the secondary amine remaining in the reaction product of the copolymer (C) and the compound (D). Can. The reaction temperature is preferably 10 to 90°C, and the reaction time is preferably 30 minutes to 5 hours. The acetic acid and excess acetic anhydride generated after the reaction can be removed by separation by washing with water.

本發明之樹脂組成物係含有本發明之高分子化合物及自由基起始劑。 The resin composition of the present invention contains the polymer compound of the present invention and a free radical initiator.

較佳的熱自由基起始劑可列舉例如:過氧化苯甲醯、異丙苯過氧化氫、2,5-二甲基己烷-2,5-二氫過氧化物、2,5-二甲基-2,5-二(第三丁基過氧基)- 3-己炔、二-第三丁基過氧化物、第三丁基過氧化異丙苯、α,α-雙(第三丁基過氧基-間異丙基)苯、2,5-二甲基-2,5-二(第三丁基過氧基)己烷、過氧化二異丙苯、二(第三丁基過氧基)間苯二甲酸酯、過氧化苯甲酸第三丁酯、2,2-雙(第三丁基過氧基)丁烷、2,2-雙(第三丁基過氧基)辛烷、2,5-二甲基-2,5-二(苯甲醯基過氧基)己烷、二(三甲基矽基)過氧化物及三甲基矽基三苯基矽基過氧化物等過氧化物。 Preferred thermal radical initiators include, for example: benzyl peroxide, cumene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 2,5- Dimethyl-2,5-bis(tert-butylperoxy)- 3-hexyne, di-tert-butylperoxide, tert-butylperoxycumyl peroxide, α,α-bis(tert-butylperoxy-m-isopropyl)benzene, 2,5- Dimethyl-2,5-di(tert-butylperoxy)hexane, dicumyl peroxide, di(tert-butylperoxy)isophthalate, benzoic acid peroxide Tributyl ester, 2,2-bis(tert-butylperoxy)butane, 2,2-bis(tert-butylperoxy)octane, 2,5-dimethyl-2,5- Peroxides such as bis(benzoylperoxy)hexane, bis(trimethylsilyl)peroxide and trimethylsilyltriphenylsilyl peroxide.

較佳的光自由基起始劑之例可列舉:安息香、安息香甲基醚、安息香乙基醚等安息香與其烷基醚類;苯乙酮、2,2-二甲氧基-2-苯基苯乙酮、1,1-二氯苯乙酮等苯乙酮類;2-甲基蒽醌、2-戊基蒽醌、2-第三丁基蒽醌、1-氯蒽醌等蒽醌類;2,4-二甲基硫雜蒽酮、2,4-二異丙基硫雜蒽酮、2-氯硫雜蒽酮等硫雜蒽酮類;苯乙酮二甲基縮酮、苯甲基二甲基縮酮等縮酮類;二苯基酮等二苯基酮類;2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基-丙烷-1-酮或2-苯甲基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1;醯基氧化膦(acylphosphine oxide)類及氧雜蒽酮(xanthone)類等。 Examples of preferred photoradical initiators include: benzoin, benzoin methyl ether, benzoin ethyl ether and other benzoin and its alkyl ethers; acetophenone, 2,2-dimethoxy-2-phenyl Acetophenones such as acetophenone and 1,1-dichloroacetophenone; anthraquinones such as 2-methylanthraquinone, 2-pentylanthraquinone, 2-tert-butylanthraquinone, and 1-chloroanthraquinone Class; Thiaxantrones such as 2,4-dimethylthiaxantrone, 2,4-diisopropylthiaxanthone, and 2-chlorothiaxanthone; acetophenone dimethyl ketal, Ketals such as benzyldimethyl ketal; diphenyl ketones such as diphenyl ketone; 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinyl-propane -1-one or 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1; acylphosphine oxides and xanthones (xanthone) class, etc.

相對於高分子化合物及後述作為任意成分的自由基反應性單體等樹脂成分之合計100質量份,本發明之樹脂組成物中之自由基起始劑的含量通常為0.1至10質量份,較佳為0.1至8質量份。 The content of the radical initiator in the resin composition of the present invention is usually 0.1 to 10 parts by mass relative to 100 parts by mass of the total resin components such as the polymer compound and the radical reactive monomer described below as an optional component. Preferably, it is 0.1 to 8 parts by mass.

本發明之樹脂組成物可更含有自由基反應性單體。藉由更含有自由基反應性單體,可提升本發明之樹脂組成物的反應性和硬化物的耐熱性等。此外,本發明中之自由基反應性單體係意指於一分子中具有1個以上的自由基反應性官能基,且其數量平均分子量為500以下(數量平均分子量的下限大約為100左右)之化合物。 The resin composition of the present invention may further contain free radical reactive monomers. By further containing a radical reactive monomer, the reactivity of the resin composition of the present invention and the heat resistance of the cured product can be improved. In addition, the radical reactive monosystem in the present invention means having more than one radical reactive functional group in one molecule, and its number average molecular weight is 500 or less (the lower limit of the number average molecular weight is approximately 100) of compounds.

自由基反應性單體的具體例可列舉:苊烯(acenaphthylene)、乙二醇二甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、三乙二醇二甲基丙烯酸酯、1,4-丁二醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、1,6-己二醇二甲基丙烯酸酯、1,9-壬二醇二甲基丙烯酸酯、甘油二甲基丙烯酸酯、2-羥基-3-丙烯醯氧基丙基甲基丙烯酸酯、雙酚A的環氧烷加成物甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、三環癸烷二甲醇二甲基丙烯酸酯、甘油二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、乙氧化三聚異氰酸三丙烯酸酯、ε-己內酯改性參-(2-丙烯醯氧基乙基)三聚異氰酸酯、新戊四醇三丙烯酸酯、二(三羥甲基丙烷)四丙烯酸酯、乙氧化新戊四醇四丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇聚丙烯酸酯、二新戊四醇六丙烯酸酯、三烯丙基三聚異氰酸酯、三烯丙基三聚氰酸酯、二乙烯基苯、間苯二甲酸二乙烯酯、N-苯基-馬來醯亞胺、N-苯基-甲基馬來醯亞胺、N-苯基-氯馬來醯亞胺、N-對氯苯基-馬來醯亞胺、N-對甲氧基苯基-馬來醯亞胺、N-對甲基苯基-馬來醯亞胺、N-對硝基苯基-馬來醯亞胺、N-對苯氧基苯基-馬來醯亞胺、N-對苯基胺基苯基-馬來醯亞胺、N-對苯氧基羰基苯基-馬來醯亞胺、1-馬來醯亞胺-4-乙醯氧基琥珀醯亞胺-苯(1-maleimide-4-acetoxysuccinimide-benzene)、4-馬來醯亞胺-4’-乙醯氧基琥珀醯亞胺-二苯基甲烷、4-馬來醯亞胺-4’-乙醯氧基琥珀醯亞胺-二苯基醚、4-馬來醯亞胺-4’-乙醯胺-二苯基醚、2-馬來醯亞胺-6-乙醯胺-吡啶、4-馬來醯亞胺-4’-乙醯胺-二苯基甲烷及N-對苯基羰基苯基-馬來醯亞胺N-乙基馬來醯亞胺、N-2.6-二甲苯基馬來醯亞胺、N-環己基馬來醯亞胺、N-2,3-二甲苯基馬來醯亞胺、二甲苯基馬 來醯亞胺、2,6-二甲苯馬來醯亞胺及4,4’-雙馬來醯亞胺二苯基甲烷等,但以具有馬來醯亞胺基作為官能基者為較佳。 Specific examples of the radical reactive monomer include: acenaphthylene, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, 1,4 -Butanediol dimethacrylate, neopentyl glycol dimethacrylate, 1,6-hexanediol dimethacrylate, 1,9-nonanediol dimethacrylate, glyceryl dimethyl Acrylate, 2-hydroxy-3-propenyloxypropyl methacrylate, alkylene oxide adduct of bisphenol A methacrylate, trimethylolpropane trimethacrylate, tricyclodecane Dimethanol dimethacrylate, glycerol dimethacrylate, trimethylolpropane trimethacrylate, ethoxylated tripolysocyanate triacrylate, ε-caprolactone modified ginseng-(2-propene Ethyloxyethyl)tripolyisocyanate, neopentylerythritol triacrylate, di(trimethylolpropane)tetraacrylate, ethoxylated neopentylerythritol tetraacrylate, neopentylerythritol tetraacrylate, dioxin Pentaerythritol polyacrylate, dipenterythritol hexaacrylate, triallyl isocyanate, triallyl cyanurate, divinylbenzene, divinyl isophthalate, N-benzene Base-maleimide, N-phenyl-methylmaleimide, N-phenyl-chloromaleimide, N-p-chlorophenyl-maleimide, N-p-methyl Oxyphenyl-maleimide, N-p-methylphenyl-maleimide, N-p-nitrophenyl-maleimide, N-p-phenoxyphenyl-maleimide Imide, N-p-phenylaminophenyl-maleimide, N-p-phenoxycarbonylphenyl-maleimide, 1-maleimide-4-ethyloxy Succinimide-benzene (1-maleimide-4-acetoxysuccinimide-benzene), 4-maleimide-4'-acetoxysuccinimide-diphenylmethane, 4-maleimide -4'-acetyloxysuccinimide-diphenyl ether, 4-maleimide-4'-acetylamine-diphenyl ether, 2-maleimide-6-acetyl ether Amine-pyridine, 4-maleimide-4'-acetamide-diphenylmethane and N-p-phenylcarbonylphenyl-maleimide N-ethylmaleimide, N- 2.6-Dimethylphenylmaleimide, N-cyclohexylmaleimide, N-2,3-dimethylphenylmaleimide, xylmethane Leimide, 2,6-xylenemaleimide, 4,4'-bismaleimide, diphenylmethane, etc., but those having a maleimide group as a functional group are preferred. .

該等自由基反應性單體可只使用一種,亦可混合二種以上使用。 Only one type of these radical reactive monomers may be used, or two or more types may be mixed and used.

本發明之樹脂組成物可更含有自由基反應性聚合物。藉由更含有自由基反應性聚合物,可提升本發明之樹脂組成物的接著性及硬化物的耐熱性等。此外,本發明中之自由基反應性聚合物係意指於於一分子中具有1個以上的自由基反應性官能基(較佳為具有2個以上),且其數量平均分子量為500以上之化合物。 The resin composition of the present invention may further contain a free radical reactive polymer. By further containing a radical reactive polymer, the adhesiveness of the resin composition of the present invention and the heat resistance of the cured product can be improved. In addition, the free radical reactive polymer in the present invention means one having more than one free radical reactive functional group (preferably more than two) in one molecule, and its number average molecular weight is more than 500. compound.

自由基反應性聚合物的具體例可列舉:苯乙烯與丁二烯的共聚物、改性聚伸苯醚樹脂、經醯亞胺延長的雙馬來醯亞胺、或下述式(4)所示之高分子化合物等。此外,式(4)中之m為重複單元數的平均值且表示於1至20的範圍之實數。 Specific examples of the radical reactive polymer include a copolymer of styrene and butadiene, modified polyphenylene ether resin, bismaleimide extended with amide imide, or the following formula (4) The indicated polymer compounds, etc. In addition, m in the formula (4) is the average value of the number of repeating units and is a real number expressed in the range of 1 to 20.

Figure 111148273-A0202-12-0012-10
Figure 111148273-A0202-12-0012-10

屬於自由基反應性聚合物之苯乙烯與丁二烯之共聚物可為無規共聚物(通稱SBR)、亦可為嵌段共聚物。又,亦可為藉由氫化而使嵌段共聚物中之源自丁二烯的雙鍵形成飽和烴者(通稱SEBS樹脂)。聚合物中苯乙烯與丁二烯的比例通常為10:90至90:10,其數量平均分子量通常 為1,000至100,000。SBR之具體的製品例可列舉:CRAY VALLEY公司的Ricon100、Ricon181、Ricon184,SEBS樹脂之具體的製品例可列舉:旭化成股份有限公司的Tuftec系列、Kraton公司G聚合物系列等。 The copolymer of styrene and butadiene, which is a free radical reactive polymer, can be a random copolymer (commonly known as SBR) or a block copolymer. Alternatively, a double bond derived from butadiene in the block copolymer can be hydrogenated to form a saturated hydrocarbon (commonly known as SEBS resin). The ratio of styrene to butadiene in the polymer is usually 10:90 to 90:10, and its number average molecular weight is usually is 1,000 to 100,000. Specific product examples of SBR include CRAY VALLEY's Ricon100, Ricon181, and Ricon184. Specific product examples of SEBS resin include Asahi Kasei Co., Ltd.'s Tuftec series, Kraton's G polymer series, etc.

屬於自由基反應性聚合物之改性聚伸苯醚樹脂係以於分子的兩末端具有甲基丙烯醯基、丙烯醯基或乙烯基,且數量平均分子量為1,000至10,000之化合物為較佳。其具體例可列舉於兩末端具有甲基丙烯醯基且數量平均分子量約為1,700之下述式(5)所示之化合物(製品名SA9000 SABIC Japan合同公司製)、或於兩末端具有乙烯基且數量平均分子量約為1,200或2,200之下述式(6)所示之化合物(製品名OPE-2St 1200或OPE-2St 2200三菱瓦斯化學股份有限公司製)。 The modified polyphenylene ether resin, which is a free radical reactive polymer, is preferably a compound having methacrylyl groups, acrylyl groups or vinyl groups at both ends of the molecule and a number average molecular weight of 1,000 to 10,000. Specific examples thereof include a compound represented by the following formula (5) (product name: SA9000 manufactured by SABIC Japan Contract Co., Ltd.) having a methacryl group at both ends and a number average molecular weight of approximately 1,700, or a compound having a vinyl group at both ends. And a compound represented by the following formula (6) with a number average molecular weight of approximately 1,200 or 2,200 (product name: OPE-2St 1200 or OPE-2St 2200, manufactured by Mitsubishi Gas Chemical Co., Ltd.).

Figure 111148273-A0202-12-0013-11
Figure 111148273-A0202-12-0013-11

Figure 111148273-A0202-12-0013-12
Figure 111148273-A0202-12-0013-12

屬於自由基反應性聚合物之經醯亞胺延長的雙馬來醯亞胺樹脂係可藉由日本專利公報5,328,006號等所記載之公知的方法而得到。具體而言,係可在有機溶劑中,將脂肪族二胺與芳香族或脂肪族的四羧酸二酐以脂肪族二胺成為過量之莫耳比地使用酸觸媒進行脫水縮合反應後,使於高分子末端存在的胺基與馬來酸酐進行脫水縮合,並將觸媒藉由水洗除去而得到。 The imine-extended bismaleimide resin, which is a radical reactive polymer, can be obtained by a known method described in Japanese Patent Publication No. 5,328,006 and the like. Specifically, an aliphatic diamine and an aromatic or aliphatic tetracarboxylic dianhydride can be dehydrated and condensed in an organic solvent using an acid catalyst so that the aliphatic diamine becomes an excess molar ratio. It is obtained by subjecting the amine group present at the end of the polymer to dehydration condensation with maleic anhydride, and then removing the catalyst by washing with water.

脂肪族二胺的具體例可列舉:1,10-二胺基癸烷;1,12-二胺基十二烷;二聚物二胺;1,2-二胺基-2-甲基丙烷;1,2-二胺基環己烷;1,2-二胺基丙烷;1,3-二胺基丙烷;1,4-二胺基丁烷;1,5-二胺基戊;1,7-二胺基庚烷;1,8-二胺基薄荷烷;1,8-二胺基辛烷;1,9-二胺基壬烷;3,3’-二胺基-N-甲基二丙基胺;二胺基順丁烯二腈(diaminomaleonitrile);1,3-二胺基戊烷;9,10-二胺基菲等,但特佳為二聚物二胺。 Specific examples of aliphatic diamines include: 1,10-diaminodecane; 1,12-diaminododecane; dimer diamine; 1,2-diamino-2-methylpropane ;1,2-diaminocyclohexane;1,2-diaminopropane;1,3-diaminopropane;1,4-diaminobutane;1,5-diaminopentane;1 ,7-diaminoheptane; 1,8-diaminomenthane; 1,8-diaminooctane; 1,9-diaminononane; 3,3'-diamino-N- Methyldipropylamine; diaminomaleonitrile; 1,3-diaminopentane; 9,10-diaminophenanthrene, etc., but dimer diamine is particularly preferred.

芳香族或脂肪族的四羧酸二酐之具體例可列舉:均苯四甲酸酐、1,2,3,4-環丁烷四羧酸二酐、1,4,5,8-萘四羧酸二酐、3,4,9,10-苝四羧酸二酐、雙環(2.2.2)辛-7-烯-2,3,5,6-四羧酸二酐、二伸乙三胺五乙酸二酐、伸乙二胺四乙酸二酐、3,3’,4,4’-二苯基酮四羧酸二酐、3,3’,4,4’-聯苯基四羧酸二酐、4,4’-氧代二鄰苯二甲酸酐(4,4'-oxydiphthalic anhydride)、3,3’,4,4’-二苯基碸四羧酸二酐、2,2’-雙(3,4-二羧基苯基)六氟丙烷二酐、4,4’-雙酚A二鄰苯二甲酸酐、5-(2,5-二氧基四氫)-3-甲基-3-環己烯-1,2-二羧酸酐、乙二醇雙(偏苯三甲酸酐)、氫醌二鄰苯二甲酸酐、1,2,3,4-環丁烷四羧酸二酐(CBDA)、1,2-二甲基-1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-四甲基-1,2,3,4-環丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐、1,2,4,5-環己烷四羧酸二酐、1,1’-雙環己烷-3,3’,4,4’-四羧酸-3,4:3’,4’-二酐、4-(2,5-二側氧基四氫呋喃-3-基)-1,2,3,4-四氫萘-1,2-二羧酸酐、5-(2,5-二側氧基四氫呋喃)-3-甲基-3-環己烯-1,2-二羧酸二酐、雙環[2.2.2]辛-7-烯-2,3,5,6-四羧酸二酐、2,3,4,5-四氫呋喃四羧酸二酐、3,5,6-三羧基-2-降莰烷乙酸二酐等,惟特佳為均苯四甲酸酐、1,2,4,5-環己烷四羧酸二酐。具體的製品名可列舉Designer Molecules Inc.公司的BMI-3000。 Specific examples of aromatic or aliphatic tetracarboxylic dianhydride include: pyromellitic anhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1,4,5,8-naphthalenetetracarboxylic dianhydride. Carboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, bicyclo(2.2.2)oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, diethylene trianhydride Aminopentaacetic dianhydride, ethylenediaminetetraacetic dianhydride, 3,3',4,4'-diphenylketonetetracarboxylic dianhydride, 3,3',4,4'-biphenyltetracarboxylic Acid dianhydride, 4,4'-oxydiphthalic anhydride (4,4'-oxydiphthalic anhydride), 3,3',4,4'-diphenyltetracarboxylic dianhydride, 2,2 '-Bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, 4,4'-bisphenol A diphthalic anhydride, 5-(2,5-dioxytetrahydro)-3- Methyl-3-cyclohexene-1,2-dicarboxylic anhydride, ethylene glycol bis(trimellitic anhydride), hydroquinone diphthalic anhydride, 1,2,3,4-cyclobutanetetracarboxylic Acid dianhydride (CBDA), 1,2-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-tetramethyl-1,2,3, 4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 1,1'- Bicyclohexane-3,3',4,4'-tetracarboxylic acid-3,4: 3',4'-dianhydride, 4-(2,5-dilateral oxytetrahydrofuran-3-yl)-1 ,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic anhydride, 5-(2,5-bis-oxytetrahydrofuran)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid Acid dianhydride, bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 2,3,4,5-tetrahydrofuran tetracarboxylic dianhydride, 3,5,6 -Tricarboxy-2-norbornane acetic dianhydride, etc., but particularly preferred ones are pyromellitic anhydride and 1,2,4,5-cyclohexanetetracarboxylic dianhydride. Specific product names include Designer Molecules Inc.'s BMI-3000.

本發明之樹脂組成物可更含有有機溶劑。有機溶劑的具體例可列舉:甲苯及二甲苯等芳香族系溶劑、二乙二醇二甲基醚、二乙二醇二乙基醚、丙二醇、丙二醇單甲基醚、丙二醇單甲基醚單乙酸酯及丙二醇單丁基醚等醚系溶劑;甲基乙基酮、甲基異丁基酮、環戊酮及環己酮等酮系溶劑;γ-丁內酯及γ-戊內酯等內酯類;N-甲基吡咯烷酮(NMP)、N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺及N,N-二甲基咪唑啶酮等醯胺系溶劑;四亞甲基碸等碸類;等。就本發明之樹脂組成物中之有機溶劑的含量而言,於樹脂組成物中通常為90質量%以下,較佳為30至80質量%。 The resin composition of the present invention may further contain an organic solvent. Specific examples of organic solvents include aromatic solvents such as toluene and xylene, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol, propylene glycol monomethyl ether, and propylene glycol monomethyl ether mono. Ether solvents such as acetate and propylene glycol monobutyl ether; ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone and cyclohexanone; γ-butyrolactone and γ-valerolactone Lactones such as N-methylpyrrolidone (NMP), N,N-dimethylformamide (DMF), N,N-dimethylacetamide and N,N-dimethylimidazolidone, etc. Amide solvents; tetramethylene and other solvents; etc. The content of the organic solvent in the resin composition of the present invention is usually 90 mass% or less in the resin composition, preferably 30 to 80 mass%.

本發明之樹脂組成物可更含有聚合抑制劑以提升保存穩定性。可併用之聚合抑制劑若為一般公知者即無特別限定,例如可列舉:氫醌、甲基氫醌、對苯醌、四氯苯醌(chloranil)及三甲基苯醌等苯醌類;或芳香族二醇類、二第三丁基羥基甲苯等。 The resin composition of the present invention may further contain a polymerization inhibitor to improve storage stability. The polymerization inhibitor that can be used together is not particularly limited as long as it is generally known, and examples thereof include benzoquinones such as hydroquinone, methylhydroquinone, p-benzoquinone, chloranil, and trimethylbenzoquinone; Or aromatic diols, di-tert-butylhydroxytoluene, etc.

本發明之樹脂組成物係可因應其用途而以賦予所期望的性能為目的,來調配不損及原本的性能之範圍的量的填充劑或添加劑而使用。填充劑可為纖維狀或粉末狀,可列舉:氧化矽、碳黑、氧化鋁、滑石、雲母、玻璃珠、玻璃中空球等。 The resin composition of the present invention can be used by blending an amount of fillers or additives within a range that does not impair the original performance for the purpose of imparting desired performance according to its intended use. The filler can be in fiber or powder form, and can include: silicon oxide, carbon black, alumina, talc, mica, glass beads, glass hollow spheres, etc.

本發明之樹脂組成物亦可更含有阻燃性化合物、添加劑等。該等若為一般所使用者即無特別限定。例如就阻燃性的化合物而言,可列舉:4,4-二溴聯苯等溴化合物;磷酸酯、磷酸三聚氰胺、含磷的環氧樹脂、三聚氰胺和苯并胍胺等氮化合物;含噁嗪環的化合物、矽系化合物等。作為添加劑,亦可因應期望將紫外線吸收劑、抗氧化劑、光聚合起始劑、螢 光增白劑、光敏化劑、染料、顏料、增黏劑、潤滑劑、消泡劑、分散劑、調平劑、光澤劑等適當組合而使用。 The resin composition of the present invention may further contain flame retardant compounds, additives, etc. There are no special restrictions if these are generally used. For example, flame retardant compounds include: bromine compounds such as 4,4-dibromobiphenyl; nitrogen compounds such as phosphate esters, melamine phosphate, phosphorus-containing epoxy resins, melamine, and benzoguanamine; Azine ring compounds, silicon compounds, etc. As additives, ultraviolet absorbers, antioxidants, photopolymerization initiators, fluorescent Optical whitening agents, photosensitizers, dyes, pigments, tackifiers, lubricants, defoaming agents, dispersants, leveling agents, gloss agents, etc. are used in appropriate combinations.

本發明之樹脂組成物可塗佈或含浸於各種基材上而使用。例如使用熱自由基起始劑時,係可藉由塗佈於PET膜上而作為多層印刷基板的層間絕緣層使用,可藉由塗佈於聚醯亞胺膜上而作為覆蓋層使用,可藉由塗佈於銅箔上並乾燥而作為附樹脂的銅箔使用。又,藉由含浸於玻璃布或玻璃紙、碳纖維、各種不織布等,可作為印刷電路基板或CFRP的預浸物使用。更進一步,亦可藉由使用光自由基起始劑而作為各種阻劑使用。 The resin composition of the present invention can be coated or impregnated on various substrates and used. For example, when a thermal radical initiator is used, it can be used as an interlayer insulating layer of a multilayer printed circuit board by coating on a PET film, and can be used as a cover layer by coating on a polyimide film. It is used as a resin-attached copper foil by coating it on copper foil and drying it. In addition, by impregnating glass cloth, cellophane, carbon fiber, various non-woven fabrics, etc., it can be used as a prepreg for printed circuit boards or CFRP. Furthermore, it can also be used as various resistors by using photoradical initiators.

本發明之層間絕緣層或覆蓋層、附樹脂的銅箔、預浸物等,係可藉由熱加壓機等進行加溫加壓成形而形成硬化物。 The interlayer insulating layer or covering layer, resin-coated copper foil, prepreg, etc. of the present invention can be heated and pressed by a hot press or the like to form a hardened product.

(實施例) (Example)

以下藉由實施例、比較例來更詳細地說明本發明。此外,本發明並不限定於此等實施例。 The present invention will be described in more detail below through Examples and Comparative Examples. In addition, the present invention is not limited to these examples.

實施例1(本發明之高分子化合物的合成) Example 1 (Synthesis of polymer compound of the present invention)

於安裝有溫度計、冷卻管、氮氣導入管、攪拌器的燒瓶內添加3,3’-二甲基-5,5’-二乙基-4,4’-二苯基甲烷雙馬來醯亞胺(製品名:BMI-70,K.I Chemical Industry股份有限公司製)22.10份(0.05莫耳)、二聚物二胺(製品名Priamine 074,Croda公司製)20.18份(0.0375莫耳)、甲苯20份,使其在氮環境下以100℃反應8小時,藉此得到下述式(7)所示之共聚物1(相當於本發明之高分子化合物的中間原料之共聚物(C)的共聚物,式(7)中之Y表示由二聚物二胺移除2個胺基後的殘基)的甲苯溶液。該共聚物1之數量平均分子量為2,700,重量平均分子量為15,100。從數量平均分子量算出 式(7)中之n的值為2.5。於該共聚物的甲苯溶液中添加Karenz MOI(昭和電工股份有限公司製)1.16份(0.0075莫耳),使其在60℃反應1小時後,添加乙酸酐6.12份(0.0675莫耳),進一步使其在60℃反應1小時。於反應液中添加甲苯100份進行稀釋後,添加純水50份,藉由攪拌水洗,除去副生成的乙酸。反複進行水洗直到水層成為中性後,將甲苯溶液濃縮,藉此得到本發明之高分子化合物之25質量%甲苯溶液。據推測,所得之高分子化合物中,式(1)之X的10%為源自Karenz MOI的部分,剩餘為乙醯基。 Add 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleamide into a flask equipped with a thermometer, cooling tube, nitrogen introduction tube, and stirrer. Amine (product name: BMI-70, manufactured by K.I Chemical Industry Co., Ltd.) 22.10 parts (0.05 mol), dimer diamine (product name: Priamine 074, manufactured by Croda Co., Ltd.) 20.18 parts (0.0375 mol), 20 parts of toluene was reacted at 100°C for 8 hours in a nitrogen environment to obtain copolymer 1 (copolymer (C) corresponding to the intermediate raw material of the polymer compound of the present invention) represented by the following formula (7) copolymer, Y in formula (7) represents the toluene solution of the residue after removing two amine groups from the dimer diamine). The number average molecular weight of Copolymer 1 is 2,700 and the weight average molecular weight is 15,100. Calculated from number average molecular weight The value of n in formula (7) is 2.5. 1.16 parts (0.0075 moles) of Karenz MOI (manufactured by Showa Denko Co., Ltd.) was added to the toluene solution of the copolymer, and the reaction was carried out at 60° C. for 1 hour. Then, 6.12 parts (0.0675 moles) of acetic anhydride was added, and the reaction was continued. It reacted at 60°C for 1 hour. After adding 100 parts of toluene to the reaction solution for dilution, 50 parts of pure water was added, and the by-produced acetic acid was removed by stirring and washing with water. After washing with water repeatedly until the water layer becomes neutral, the toluene solution is concentrated to obtain a 25 mass % toluene solution of the polymer compound of the present invention. It is speculated that in the obtained polymer compound, 10% of X in the formula (1) is a part derived from Karenz MOI, and the remainder is an acetyl group.

Figure 111148273-A0202-12-0017-13
Figure 111148273-A0202-12-0017-13

比較例1(比較用之高分子化合物的合成) Comparative Example 1 (Synthesis of Comparative Polymer Compound)

除了不進行添加Karenz MOI並在60℃反應1小時之步驟,且將乙酸酐的添加量變更為7.65份(0.075莫耳)以外,其餘以依照實施例1的方法來得到比較用之高分子化合物之25質量%甲苯溶液。據推測,所得之高分子化合物中,式(1)之X全部為乙醯基。 The polymer compound for comparison was obtained according to the method of Example 1, except that the step of adding Karenz MOI and reacting at 60°C for 1 hour was not performed, and the amount of acetic anhydride was changed to 7.65 parts (0.075 mol). 25 mass% toluene solution. It is speculated that in the obtained polymer compound, all X's in the formula (1) are acetyl groups.

實施例2、比較例2(樹脂組成物的調製) Example 2, Comparative Example 2 (Preparation of Resin Composition)

於實施例1及比較例1所得之高分子化合物溶液10份中添加作為自由基起始劑之過氧化二異丙苯0.05份,並均勻地混合,藉此分別得到本發明之樹脂組成物及比較用之樹脂組成物。 Add 0.05 part of dicumyl peroxide as a free radical initiator to 10 parts of the polymer compound solution obtained in Example 1 and Comparative Example 1, and mix them uniformly to obtain the resin composition and resin composition of the present invention respectively. Resin compositions used for comparison.

(樹脂組成物的硬化物之介電特性、玻璃轉移溫度及線性膨脹率(α1)的評估) (Evaluation of dielectric properties, glass transition temperature, and linear expansion coefficient (α1) of cured resin compositions)

使用塗敷器(applicator),將實施例2及比較例2所得之樹脂組成物分別以280μm的厚度塗佈於厚度18μm的銅箔之鏡面上,在90℃加熱10分鐘使溶劑乾燥,得到薄膜狀接著劑。使用真空烘箱將前述所得之銅箔上的薄膜狀接著劑以180℃加熱硬化1小時後,浸漬於蝕刻液以除去銅箔。由於從本發明之薄膜狀接著劑及比較用之薄膜狀接著劑之任一者均得到可作為薄膜使用之厚度70μm的硬化物,故就前述所得之硬化物的介電特性進行評估。介電特性係使用網路分析儀8719ET(Agilent Technologies製),以空腔共振法測定在10GHz之介電常數與介電損耗正切。又,使用TMA(熱機械測定裝置)求出薄膜狀接著劑的硬化物之玻璃轉移溫度及線性膨脹率(α1)。將結果表示於表1。 Using an applicator, apply the resin compositions obtained in Example 2 and Comparative Example 2 to a thickness of 280 μm on the mirror surface of a copper foil with a thickness of 18 μm, and heat at 90°C for 10 minutes to dry the solvent to obtain a film. Adhesive. The film-like adhesive on the copper foil obtained above was heated and hardened at 180° C. for 1 hour using a vacuum oven, and then immersed in an etching liquid to remove the copper foil. Since both the film-like adhesive of the present invention and the comparative film-like adhesive were used to obtain cured products with a thickness of 70 μm that could be used as films, the dielectric properties of the cured products obtained were evaluated. The dielectric properties were measured using a network analyzer 8719ET (manufactured by Agilent Technologies) using the cavity resonance method to measure the dielectric constant and dielectric loss tangent at 10 GHz. Furthermore, the glass transition temperature and the linear expansion coefficient (α1) of the cured product of the film-like adhesive were determined using a TMA (thermomechanical measuring device). The results are shown in Table 1.

(樹脂組成物的硬化物之接著強度及耐熱性的評估) (Evaluation of bonding strength and heat resistance of cured resin compositions)

使用塗敷器,將實施例2及比較例2所得之樹脂組成物分別以50μm的厚度塗佈於厚度12μm的高頻用低粗糙度銅箔(CF-T4X-SV:福田金屬箔粉股份有限公司製)的消光面上,在90℃加熱10分鐘而使溶劑乾燥,藉此得到具有由本發明之樹脂組成物所構成的薄膜狀接著劑之銅箔。於前述所得之銅箔的接著劑面上重疊其他銅箔(所使用的銅箔為相同種類的銅箔)的消光面,並在真空加壓中以3MPa的壓力使其加熱硬化1小時後,使用萬能試驗機AGX-50(股份有限公司島津製作所製)測定銅箔間之90°剝離強度(接著強度)。又,將貼合後的銅箔裁切成3cm見方,並浮於288℃的銲料浴,測定在銅箔上產生膨脹、剝落等異常為止的時間。將結果表示於表1。 Using an applicator, the resin compositions obtained in Example 2 and Comparative Example 2 were each coated to a thickness of 50 μm on a low-roughness copper foil for high frequency with a thickness of 12 μm (CF-T4X-SV: Fukuda Metal Foil Powder Co., Ltd. Co., Ltd.), the solvent was dried by heating at 90° C. for 10 minutes, thereby obtaining a copper foil having a film-like adhesive composed of the resin composition of the present invention. The matte surface of another copper foil (the copper foil used is the same type of copper foil) is overlapped on the adhesive surface of the copper foil obtained above, and heated and hardened under vacuum pressure at a pressure of 3MPa for 1 hour. The 90° peel strength (adhesion strength) between copper foils was measured using a universal testing machine AGX-50 (manufactured by Shimadzu Corporation). Furthermore, the bonded copper foil was cut into 3 cm squares, floated in a 288° C. solder bath, and the time until abnormalities such as expansion and peeling occurred on the copper foil was measured. The results are shown in Table 1.

[表1]樹脂組成物的硬化物的評估結果

Figure 111148273-A0202-12-0019-18
[Table 1] Evaluation results of cured products of resin compositions
Figure 111148273-A0202-12-0019-18

實施例3(本發明之樹脂組成物的調製) Example 3 (Preparation of the resin composition of the present invention)

於實施例1所得之本發明之高分子化合物溶液10份中添加作為自由基起始劑之過氧化二異丙苯0.05份及丁二烯與苯乙烯的共聚物Ricon 100(CRAY VALLEY公司製)0.5份並均勻地混合,藉此得到本發明之樹脂組成物。 To 10 parts of the polymer compound solution of the present invention obtained in Example 1, 0.05 part of dicumyl peroxide as a free radical initiator and Ricon 100 (manufactured by CRAY VALLEY Co., Ltd., a copolymer of butadiene and styrene) were added. 0.5 parts and mix uniformly to obtain the resin composition of the present invention.

實施例4(本發明之樹脂組成物的調製) Example 4 (Preparation of the resin composition of the present invention)

於實施例1所得之本發明之高分子化合物溶液10份中添加作為自由基起始劑之過氧化二異丙苯0.05份及改性聚伸苯醚樹脂SA-9000(SABIC合同公司製)0.5份並均勻地混合,藉此得到本發明之樹脂組成物。 To 10 parts of the polymer compound solution of the present invention obtained in Example 1, 0.05 part of dicumyl peroxide as a free radical initiator and 0.5 part of modified polyphenylene ether resin SA-9000 (manufactured by SABIC Contract Company) were added. parts and mix them uniformly to obtain the resin composition of the present invention.

實施例5(本發明之樹脂組成物的調製) Example 5 (Preparation of the resin composition of the present invention)

於實施例1所得之本發明之高分子化合物溶液10份中添加作為自由基起始劑之過氧化二異丙苯0.05份及經醯亞胺延長的雙馬來醯亞胺樹脂BMI-3000(Designer Molecules Inc.公司製)0.5份並均勻地混合,藉此得到本發明之樹脂組成物。 To 10 parts of the polymer compound solution of the present invention obtained in Example 1, 0.05 part of dicumyl peroxide as a free radical initiator and bismaleimide resin BMI-3000 ( Designer Molecules Inc.) and mix them uniformly to obtain the resin composition of the present invention.

(樹脂組成物的硬化物的評估) (Evaluation of hardened products of resin compositions)

以與上述「樹脂組成物的硬化物之介電特性、玻璃轉移溫度及線性膨脹率(α1)的評估」及「樹脂組成物的硬化物之接著強度及耐熱性的評估」相同的方法,評估實施例3至5所得之樹脂組成物的各項特性。將結果表示於表2。 Evaluation was carried out in the same manner as the above "Evaluation of dielectric properties, glass transition temperature and linear expansion coefficient (α1) of cured products of resin compositions" and "Evaluation of bonding strength and heat resistance of cured products of resin compositions" Various characteristics of the resin compositions obtained in Examples 3 to 5. The results are shown in Table 2.

[表2]樹脂組成物的硬化物的評估結果

Figure 111148273-A0202-12-0021-15
[Table 2] Evaluation results of cured products of resin compositions
Figure 111148273-A0202-12-0021-15

如上所述,本發明之高分子化合物可藉由併用自由基起始劑進行硬化而形成可撓性的薄膜,且該硬化物顯示優異的介電特性、接著性及耐熱性。 As described above, the polymer compound of the present invention can be cured by using a radical initiator together to form a flexible film, and the cured product exhibits excellent dielectric properties, adhesion and heat resistance.

Figure 111148273-A0202-11-0003-6
Figure 111148273-A0202-11-0003-6

Claims (7)

一種高分子化合物,係如下述式(1)所示, A polymer compound represented by the following formula (1),
Figure 111148273-A0202-13-0001-16
Figure 111148273-A0202-13-0001-16
式(1)中,R1、R2、R3及R4分別獨立地表示甲基、乙基、異丙基或第三丁基;X分別獨立地表示乙醯基或下述式(2)所示之部分結構,惟存在複數個的X之至少一者為乙醯基,且存在複數個的X的5%以上為式(2)所示之結構;Y表示由二胺化合物中移除2個胺基後的殘基;n為重複單元數的平均值且於1至100的範圍 In formula (1), R 1 , R 2 , R 3 and R 4 each independently represent a methyl group, an ethyl group, an isopropyl group or a tert-butyl group; X each independently represents an acetyl group or the following formula (2 ), only one of the plurality of Xs present is an acetyl group, and more than 5% of the plurality of Xs present is a structure represented by formula (2); The residue after excluding 2 amine groups; n is the average number of repeating units and ranges from 1 to 100
Figure 111148273-A0202-13-0001-17
Figure 111148273-A0202-13-0001-17
式(2)中,R5表示氫原子或甲基。 In formula (2), R 5 represents a hydrogen atom or a methyl group.
一種樹脂組成物,係包含請求項1所述之高分子化合物及自由基起始劑。 A resin composition comprising the polymer compound described in claim 1 and a free radical initiator. 如請求項2所述之樹脂組成物,其更含有自由基反應性單體,該自由基反應性單體係具有自由基反應性官能基。 The resin composition according to claim 2 further contains a free radical reactive monomer, and the free radical reactive monomer system has a free radical reactive functional group. 如請求項2所述之樹脂組成物,其更含有自由基反應性聚合物,該自由基反應性聚合物係於一分子中具有2個以上之自由基反應性官能基。 The resin composition as described in claim 2 further contains a free radical reactive polymer, and the free radical reactive polymer has two or more free radical reactive functional groups in one molecule. 一種薄膜狀接著劑,係由請求項2至4中任一項所述之樹脂組成物所構成者。 A film-like adhesive composed of the resin composition described in any one of claims 2 to 4. 一種硬化物,係請求項2至4中任一項所述之樹脂組成物的硬化物。 A cured product is a cured product of the resin composition described in any one of claims 2 to 4. 一種硬化物,係請求項5所述之薄膜狀接著劑的硬化物。 A cured product is a cured product of the film-like adhesive according to claim 5.
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