TW202326310A - Grinding apparatus, program, non-transient recording medium, and grinding apparatus control method capable of preventing an operator from forgetting to perform self-grinding - Google Patents
Grinding apparatus, program, non-transient recording medium, and grinding apparatus control method capable of preventing an operator from forgetting to perform self-grinding Download PDFInfo
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- TW202326310A TW202326310A TW111148489A TW111148489A TW202326310A TW 202326310 A TW202326310 A TW 202326310A TW 111148489 A TW111148489 A TW 111148489A TW 111148489 A TW111148489 A TW 111148489A TW 202326310 A TW202326310 A TW 202326310A
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- grinding
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- chuck table
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- 238000000034 method Methods 0.000 title claims description 52
- 230000001052 transient effect Effects 0.000 title 1
- 230000007246 mechanism Effects 0.000 claims abstract description 46
- 238000005498 polishing Methods 0.000 description 17
- 238000004140 cleaning Methods 0.000 description 10
- 239000004575 stone Substances 0.000 description 9
- 235000012431 wafers Nutrition 0.000 description 9
- 239000012530 fluid Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000006061 abrasive grain Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000007723 transport mechanism Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000004308 accommodation Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
- B24B41/068—Table-like supports for panels, sheets or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
Description
本發明係關於一種在研削如晶圓般的被加工物之際所使用之研削裝置、使用於控制研削裝置之程式、已記憶程式之非暫時性的記錄媒體以及研削裝置的控制方法。The present invention relates to a grinding device used when grinding a workpiece such as a wafer, a program used to control the grinding device, a non-transitory recording medium with the program memorized, and a control method of the grinding device.
為了實現小型且輕量的元件晶片,將在正面側設有積體電路等元件之晶圓進行薄化加工之機會正在增加。例如,以卡盤台的保持面保持晶圓的正面側,使固定有包含磨粒之研削磨石之研削輪與卡盤台互相旋轉,並一邊供給純水等液體(研削液)一邊將研削磨石按壓於晶圓的背面側,藉此將此晶圓進行研削而變薄。In order to realize small and lightweight element wafers, opportunities for thinning wafers with elements such as integrated circuits on the front side are increasing. For example, the front side of the wafer is held on the holding surface of the chuck table, the grinding wheel on which the grinding stone containing abrasive grains is fixed is rotated with the chuck table, and the grinding wheel is ground while supplying liquid (grinding fluid) such as pure water. The grindstone is pressed against the back side of the wafer, whereby the wafer is ground and thinned.
然而,在以如上述般的方法研削晶圓等被加工物之際,會進行研削卡盤台的保持面之被稱為自體研磨之處理(例如,參照專利文獻1)。在此自體研磨中,與被加工物同樣地以研削輪(研削磨石)研削保持面。因此,若以自體研磨後的保持面保持被加工物,則在被加工物與研削輪接觸之區域的整體中,研削輪與保持面的間隔成為大致固定,且被加工物被研削成整體的厚度成為大致固定。 [習知技術文獻] [專利文獻] However, when a workpiece such as a wafer is ground by the method described above, a process called self-polishing is performed to grind the holding surface of the chuck table (for example, refer to Patent Document 1). In this autogenous grinding, the holding surface is ground with a grinding wheel (grinding stone) in the same manner as the workpiece. Therefore, if the workpiece is held by the holding surface after self-grinding, the distance between the grinding wheel and the holding surface becomes substantially constant in the entire region where the workpiece contacts the grinding wheel, and the workpiece is ground as a whole. The thickness becomes approximately constant. [Prior art literature] [Patent Document]
[專利文獻1]日本特開2008-87104號公報[Patent Document 1] Japanese Unexamined Patent Publication No. 2008-87104
[發明所欲解決的課題] 然而,在使用於被加工物的研削之卡盤台中,一般而言,由吸引源產生之負壓所導致之吸引力係通過保持面的細微的空孔而作用於被加工物,藉此保持被加工物。另一方面,若進行被加工物的研削,則有時保持面的空孔會被由被加工物等所產生之屑堵塞,保持被加工物之力會降低。於是,在保持面的空孔被屑堵塞之前,在任意的時間點進行上述之自體研磨,而將附著於保持面之屑去除。 [Problems to be Solved by the Invention] However, in a chuck table used for grinding workpieces, generally speaking, the suction force caused by the negative pressure generated by the suction source acts on the workpiece through the fine holes in the holding surface, thereby holding the workpiece. Processed objects. On the other hand, when the workpiece is ground, the pores of the holding surface may be clogged with chips generated from the workpiece, and the force for holding the workpiece may decrease. Then, before the pores of the holding surface are clogged with chips, the above-mentioned self-polishing is performed at an arbitrary point of time to remove the chips adhering to the holding surface.
然而,此自體研磨係基於操作員的指示而執行,不一定總是在適當的時間點執行。例如,若操作員忘記執行自體研磨而保持面的空孔被屑堵塞,則由卡盤台所進行之被加工物的保持變得不穩定,會對被加工物的研削造成不良影響。However, this autogenous grinding is performed based on an operator's instruction, and may not always be performed at an appropriate point of time. For example, if the operator forgets to perform self-grinding and the holes on the holding surface are clogged with chips, the holding of the workpiece by the chuck table becomes unstable, which adversely affects the grinding of the workpiece.
因此,本發明之目的在於提供一種可防止操作員忘記執行自體研磨之研削裝置等。Therefore, an object of the present invention is to provide a grinding device and the like which can prevent an operator from forgetting to perform self-grinding.
[解決課題的技術手段] 根據本發明的一態樣,提供一種研削裝置,其具備:卡盤台,其具有保持被加工物之保持面,且可繞著相對於該保持面呈交叉之旋轉軸旋轉;研削單元,其具有可在研削輪裝設於前端部之狀態下繞著軸心旋轉之主軸;移動機構,其使該卡盤台與該研削單元在相對於該保持面呈交叉之方向相對地移動;控制單元,其具有處理裝置與記憶裝置,且遵循記憶於該記憶裝置之程式而控制該卡盤台、該研削單元及該移動機構;以及輸入裝置,其將指令輸入該控制單元,並且,所述程式使該控制單元執行:在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後,使該研削裝置的運行停止之程序;以及在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後且使該研削裝置的運行停止之程序結束之前,在該卡盤台與該主軸旋轉之狀態下,藉由該移動機構而使該研削單元與該卡盤台相對地移動,並藉由該研削輪而研削該保持面之程序。 [Technical means to solve the problem] According to one aspect of the present invention, there is provided a grinding device including: a chuck table having a holding surface for holding a workpiece and being rotatable around a rotation axis intersecting with the holding surface; a grinding unit having It has a main shaft that can rotate around the axis when the grinding wheel is installed on the front end; a moving mechanism that makes the chuck table and the grinding unit relatively move in a direction that crosses the holding surface; a control unit , which has a processing device and a memory device, and controls the chuck table, the grinding unit and the moving mechanism according to the program stored in the memory device; and an input device, which inputs instructions into the control unit, and the program causing the control unit to execute: a program for stopping the operation of the grinding device after an instruction to stop the operation of the grinding device is input from the input device into the control unit; After the instruction of operation is input to the control unit and before the program of stopping the operation of the grinding device is completed, the grinding unit and the chuck are moved by the moving mechanism while the chuck table and the main shaft are rotating. The table moves relatively, and the process of grinding the retaining surface by the grinding wheel.
根據本發明的另一態樣,提供一種程式,其使用於控制研削裝置,所述研削裝置具備:卡盤台,其具有保持被加工物之保持面,且可繞著相對於該保持面呈交叉之旋轉軸旋轉;研削單元,其具有可在研削輪裝設於前端部之狀態下繞著軸心旋轉之主軸;移動機構,其使該卡盤台與該研削單元在相對於該保持面呈交叉之方向相對地移動;控制單元,其具有處理裝置與記憶裝置,且遵循記憶於該記憶裝置之程式而控制該卡盤台、該研削單元及該移動機構;以及輸入裝置,其將指令輸入該控制單元,並且,所述程式使該控制單元執行:在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後,使該研削裝置的運行停止之程序;以及在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後且使該研削裝置的運行停止之程序結束之前,在該卡盤台與該主軸旋轉之狀態下,藉由該移動機構而使該研削單元與該卡盤台相對地移動,並藉由該研削輪而研削該保持面之程序。According to another aspect of the present invention, there is provided a program for controlling a grinding device. The grinding device is provided with: a chuck table having a holding surface for holding a workpiece and being able to rotate around the holding surface relative to the holding surface. The intersecting rotating shaft rotates; the grinding unit has a main shaft that can rotate around the axis when the grinding wheel is installed on the front end; the moving mechanism makes the chuck table and the grinding unit relatively to the holding surface Relatively moving in a crossing direction; a control unit, which has a processing device and a memory device, and controls the chuck table, the grinding unit and the moving mechanism according to the program stored in the memory device; and an input device, which will command input to the control unit, and the program causes the control unit to execute: a program for stopping the operation of the grinding device after an instruction to stop the operation of the grinding device is input from the input device to the control unit; and After the command to stop the operation of the grinding device is input into the control unit from the input device and before the process of stopping the operation of the grinding device is completed, in the state where the chuck table and the spindle are rotating, by the movement The grinding unit and the chuck table are relatively moved by a mechanism, and the grinding wheel is used to grind the holding surface.
較佳為,該程式使該控制單元執行在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後且藉由該研削輪而研削該保持面之程序開始之前,調整該卡盤台的該旋轉軸與該主軸的該軸心所形成之角度之程序。並且,較佳為,該程式在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後,不使該控制單元執行更換裝設於該主軸之該研削輪之程序,而使該控制單元執行藉由該研削輪而研削該保持面之程序。並且,較佳為,該程式以在使該研削裝置的運行停止之程序結束之前,藉由該研削輪而研削該保持面之程序會結束之方式,使該控制單元執行使該研削裝置的運行停止之程序與藉由該研削輪而研削該保持面之程序。Preferably, the program causes the control unit to adjust the grinding device after a command to stop the operation of the grinding device is input to the control unit from the input device and before the process of grinding the holding surface by the grinding wheel starts. The program of the angle formed by the rotation axis of the chuck table and the axis of the spindle. Furthermore, it is preferable that the program does not cause the control unit to execute the program of replacing the grinding wheel mounted on the main shaft after an instruction to stop the operation of the grinding device is input into the control unit from the input device, And make the control unit execute the program of grinding the retaining surface by the grinding wheel. Furthermore, it is preferable that the program causes the control unit to execute the operation of the grinding device in such a manner that the program of grinding the holding surface with the grinding wheel ends before the program of stopping the operation of the grinding device ends. The procedure of stopping and the procedure of grinding the retaining surface by the grinding wheel.
根據本發明又一態樣,提供一種非暫時性的記憶媒體,其已記憶該程式。According to yet another aspect of the present invention, a non-transitory memory medium is provided, which stores the program.
根據本發明又一態樣,提供一種研削裝置的控制方法,其用於控制研削裝置,所述研削裝置具備:卡盤台,其具有保持被加工物之保持面,且可繞著相對於該保持面呈交叉之旋轉軸旋轉;研削單元,其具有可在研削輪裝設於前端部之狀態下繞著軸心旋轉之主軸;移動機構,其使該卡盤台與該研削單元在相對於該保持面呈交叉之方向相對地移動;控制單元,其具有處理裝置與記憶裝置,且遵循記憶於該記憶裝置之程式而控制該卡盤台、該研削單元及該移動機構;以及輸入裝置,其將指令輸入該控制單元,並且,所述研削裝置的控制方法包含:該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之步驟;在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後,使該研削裝置的運行停止之步驟;在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後且使該研削裝置的運行停止之步驟結束之前,在該卡盤台與該主軸旋轉之狀態下,藉由該移動機構而使該研削單元與該卡盤台相對地移動,並藉由該研削輪而研削該保持面之步驟。According to still another aspect of the present invention, there is provided a method for controlling a grinding device, which is used for controlling the grinding device. The grinding device is provided with: a chuck table having a holding surface for holding a workpiece and being able to rotate around the The holding surface rotates on a crossing axis of rotation; the grinding unit has a main shaft that can rotate around the axis when the grinding wheel is installed on the front end; the moving mechanism makes the chuck table and the grinding unit relatively The holding surface relatively moves in a crossing direction; a control unit, which has a processing device and a memory device, and controls the chuck table, the grinding unit and the moving mechanism according to the program stored in the memory device; and an input device, It inputs instructions into the control unit, and the control method of the grinding device includes: the input device inputs an instruction to stop the operation of the grinding device into the control unit; after the input device stops the grinding device After inputting the command of the operation of the grinding device into the control unit, the step of stopping the operation of the grinding device; after inputting the command of stopping the operation of the grinding device from the input device into the control unit and making the operation of the grinding device Before the stop step ends, in the state where the chuck table and the spindle rotate, the grinding unit and the chuck table are relatively moved by the moving mechanism, and the holding surface is ground by the grinding wheel step.
較佳為,進一步包含在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後且藉由該研削輪而研削該保持面之步驟開始之前,調整該卡盤台的該旋轉軸與該主軸的該軸心所形成之角度之步驟。並且,較佳為,在從該輸入裝置將停止該研削裝置的運行之主旨的指令輸入該控制單元之後,不進行更換裝設於該主軸之該研削輪之步驟,而進行藉由該研削輪而研削該保持面之步驟。並且,較佳為,在使該研削裝置的運行停止之步驟結束之前,使藉由該研削輪而研削該保持面之步驟結束。Preferably, it further includes adjusting the chuck table after the input device inputs a command to stop the operation of the grinding device into the control unit and before the step of grinding the holding surface with the grinding wheel starts. The step of the angle formed by the axis of rotation and the axis of the main shaft. And, it is preferable that after the command to stop the operation of the grinding device is input into the control unit from the input device, the step of replacing the grinding wheel mounted on the main shaft is not performed, and the grinding is performed by the grinding device. The step of grinding the retaining surface by the wheel. Furthermore, preferably, the step of grinding the holding surface with the grinding wheel is completed before the step of stopping the operation of the grinding device is completed.
[發明功效] 在本發明的各態樣之研削裝置、程式以及研削裝置的控制方法中,係藉由控制單元而執行:在從輸入裝置將停止研削裝置的運行之主旨的指令輸入控制單元之後,使研削裝置的運行停止之程序;以及在從輸入裝置將停止研削裝置的運行之主旨的指令輸入控制單元之後且使研削裝置的運行停止之程序結束之前,藉由研削輪而研削保持面之程序。 [Efficacy of the invention] In the grinding device, the program, and the control method of the grinding device in various aspects of the present invention, it is executed by the control unit: after the command to stop the operation of the grinding device is input into the control unit from the input device, the grinding device A program for stopping the operation of the grinding device; and a program for grinding the holding surface by the grinding wheel after the command to stop the operation of the grinding device is input into the control unit from the input device and before the program of stopping the operation of the grinding device ends.
亦即,在使研削裝置的運行停止之停機之際,必須藉由研削輪而執行研削保持面之自體研磨。因此,根據本發明的各態樣之研削裝置、程式以及研削裝置的控制方法,而防止操作員忘記執行自體研磨。That is, when the grinding device is shut down to stop the operation, self-grinding of the grinding holding surface must be performed by the grinding wheel. Therefore, according to the grinding device, the program, and the control method of the grinding device according to various aspects of the present invention, the operator is prevented from forgetting to perform self-grinding.
以下,一邊參照隨附圖式,一邊針對本發明的實施方式進行說明。圖1係示意性地表示本實施方式的研削裝置2之立體圖。此外,在圖1中,以功能方塊表現構成研削裝置2之一部分的要素。並且,在以下的說明中所使用之X軸方向(前後方向)、Y軸方向(左右方向)及Z軸方向(鉛直方向)為互相垂直。Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view schematically showing a grinding device 2 according to this embodiment. In addition, in FIG. 1 , elements constituting a part of the grinding apparatus 2 are represented by functional blocks. In addition, the X-axis direction (front-rear direction), the Y-axis direction (left-right direction), and the Z-axis direction (vertical direction) used in the following description are perpendicular to each other.
如圖1所示,研削裝置2具備基台4,所述基台4支撐構成此研削裝置2之各種要素。在基台4的上表面前端側設有上端在基台4的上表面開口之凹狀的容納部4a,在此容納部4a內容納有使用於搬送板狀的被加工物11之第一搬送機構6。第一搬送機構6典型而言為具有多個關節之機械臂,且不僅可搬送被加工物11,亦可使被加工物11的上下反轉。As shown in FIG. 1 , the grinding device 2 includes a base 4 that supports various elements constituting the grinding device 2 . On the front end side of the upper surface of the base 4, a concave accommodation portion 4a whose upper end is opened on the upper surface of the base 4 is provided, and the first conveyance portion 4a for conveying a plate-shaped workpiece 11 is accommodated in the accommodation portion 4a. Institution 6. The first conveyance mechanism 6 is typically a robot arm having a plurality of joints, and not only conveys the workpiece 11 but also reverses the workpiece 11 up and down.
被加工物11例如為以矽等半導體材料所構成之圓盤狀的晶圓。亦即,此被加工物11具有圓形狀的正面11a以及與正面11a為相反側的圓形狀的背面11b。被加工物11的正面11a側係藉由互相交叉之多條切割道(分割預定線)而被劃分成多個小區域,且在各小區域形成有積體電路(IC,Integrated Circuit)等元件。The workpiece 11 is, for example, a disk-shaped wafer made of semiconductor materials such as silicon. That is, this workpiece 11 has a circular front surface 11a and a circular rear surface 11b opposite to the front surface 11a. The front side 11a side of the workpiece 11 is divided into a plurality of small areas by a plurality of dicing lines (planned dividing lines) intersecting each other, and components such as integrated circuits (IC, Integrated Circuit) are formed in each small area .
本實施方式的研削裝置2例如係在研削此被加工物11的背面11b側之際使用。此外,在研削被加工物11的背面11b側之際,期望將以樹脂等材料所構成之保護構件貼附於被加工物11的正面11a側。藉由將保護構件貼附於被加工物11的正面11a側,而緩和在研削背面11b側之際對正面11a側施加之衝撃,而保護被加工物11的元件等。The grinding device 2 of the present embodiment is used, for example, when grinding the back surface 11 b side of the workpiece 11 . In addition, when grinding the back surface 11b side of the workpiece 11, it is desirable to attach a protective member made of a material such as resin to the front surface 11a side of the workpiece 11. By attaching the protection member to the front surface 11a side of the workpiece 11, the shock applied to the front surface 11a side when the rear surface 11b side is ground is alleviated, thereby protecting components of the workpiece 11 and the like.
並且,在本實施方式中,雖使用以矽等半導體材料所構成之圓盤狀的晶圓作為被加工物11,但被加工物11的材質、形狀、構造、大小等並不受限於此態樣。例如,能使用以其他的半導體、陶瓷、樹脂、金屬等材料所構成之基板等作為被加工物11。同樣地,元件的種類、數量、形狀、構造、大小、配置等亦不受限於上述的態樣。被加工物11亦可未形成有元件。In addition, in this embodiment, although a disk-shaped wafer made of a semiconductor material such as silicon is used as the workpiece 11, the material, shape, structure, size, etc. of the workpiece 11 are not limited thereto. appearance. For example, a substrate or the like made of other materials such as semiconductors, ceramics, resins, and metals can be used as the workpiece 11 . Likewise, the type, number, shape, structure, size, arrangement, etc. of elements are not limited to the above-mentioned aspects. The workpiece 11 may not have elements formed therein.
如圖1所示,在容納部4a的前方設有載置卡匣8a、8b之卡匣台10a、10b,所述卡匣8a、8b可容納多個被加工物11。在容納部4a的斜後方設有用於調整被加工物11的位置的位置調整機構12。位置調整機構12包含圓盤狀的位置調整用工作台與配置於位置調整用工作台的周圍之多個銷。As shown in FIG. 1 , cassette tables 10 a , 10 b on which cassettes 8 a , 8 b capable of accommodating a plurality of workpieces 11 are placed are provided in front of the housing portion 4 a. A position adjustment mechanism 12 for adjusting the position of the workpiece 11 is provided obliquely behind the housing portion 4a. The position adjustment mechanism 12 includes a disk-shaped position adjustment table and a plurality of pins arranged around the position adjustment table.
藉由使多個銷沿著位置調整用工作台的徑向移動,而例如使藉由第一搬送機構6而被從卡匣8a搬出且載置於位置調整用工作台之被加工物11的中心在X軸方向及Y軸方向對準預定的位置。此外,被加工物11係以其被研削面(在本實施方式中為背面11b)在上方露出之方式載置於位置調整用工作台。By moving a plurality of pins in the radial direction of the position adjustment table, for example, the workpiece 11 carried out from the cassette 8a by the first transport mechanism 6 and placed on the position adjustment table The center is aligned with a predetermined position in the X-axis direction and the Y-axis direction. In addition, the workpiece 11 is placed on the table for position adjustment so that the surface to be ground (in this embodiment, the back surface 11 b ) is exposed upward.
在位置調整機構12的側邊設有第二搬送機構14,所述第二搬送機構14保持被加工物11並將被加工物11搬送至後方。第二搬送機構14例如包含:臂;以及保持墊,其與臂的前端部連接且可吸引並保持被加工物11的上表面(被研削面)側,並且,第二搬送機構14藉由臂而使保持墊回旋,藉此將已被位置調整機構12調整位置之被加工物11搬送至後方。On the side of the position adjustment mechanism 12 is provided a second conveyance mechanism 14 that holds the workpiece 11 and conveys the workpiece 11 to the rear. The second conveying mechanism 14 includes, for example: an arm; Then, the holding pad is rotated, whereby the workpiece 11 whose position has been adjusted by the position adjustment mechanism 12 is conveyed to the rear.
在第二搬送機構14的後方設有旋轉台16。旋轉台16係與馬達(未圖示)等連接,且藉由此馬達等的動力而繞著相對於Z軸方向大致平行的旋轉軸旋轉。在旋轉台16的上表面,沿著旋轉台16的圓周方向以大致相等的角度的間隔設有圓柱狀(圓盤狀)的三組工作台基座18。但是,工作台基座18的數量並不受限於此態樣。A turntable 16 is provided behind the second transport mechanism 14 . The turntable 16 is connected to a motor (not shown), and is powered by the motor or the like to rotate around a rotation axis substantially parallel to the Z-axis direction. On the upper surface of the turntable 16 , three sets of columnar (disk-shaped) table bases 18 are provided at substantially equal angular intervals along the circumferential direction of the turntable 16 . However, the number of table bases 18 is not limited to this aspect.
各工作台基座18係與馬達(未圖示)等連接,且藉由此馬達等的動力而繞著相對於Z軸方向大致平行的旋轉軸或相對於Z軸方向稍微傾斜的旋轉軸旋轉。此外,各工作台基座18係透過角度調整機構(未圖示)而被旋轉台16支撐,藉由此角度調整機構而調整各工作台基座18的旋轉軸的角度。Each table base 18 is connected to a motor (not shown) or the like, and is powered by the motor or the like to rotate around a rotation axis approximately parallel to the Z-axis direction or a rotation axis slightly inclined to the Z-axis direction. . In addition, each table base 18 is supported by the rotary table 16 through an angle adjustment mechanism (not shown), and the angle of the rotation axis of each table base 18 is adjusted by the angle adjustment mechanism.
在各工作台基座18的上端部係以螺栓等而固定有使用於保持被加工物11之圓盤狀的卡盤台20。各卡盤台20例如包含藉由陶瓷等材料所構成之圓盤狀的框體20a(參照圖4)。在框體20a的上部設有上端在框體20a的上表面開口成圓形狀之凹部。在此凹部固定有以陶瓷等材料而被構成為多孔質的圓盤狀之保持板20b(參照圖4)。A disc-shaped chuck table 20 for holding the workpiece 11 is fixed to the upper end of each table base 18 with bolts or the like. Each chuck table 20 includes, for example, a disk-shaped frame body 20a (see FIG. 4 ) made of ceramics or the like. On the upper part of the frame body 20a, a concave portion whose upper end opens in a circular shape on the upper surface of the frame body 20a is provided. A porous disk-shaped holding plate 20b is fixed to this concave portion (see FIG. 4 ) made of a material such as ceramics.
保持板20b的上表面例如被構成為相當於圓錐的側面之形狀,且發揮作為保持被加工物11之保持面的功能。此外,相當於圓錐的頂點之保持板20b的上表面的中心與保持板20b的上表面的外周緣之高度的差(高低差)為10μm~30μm左右。The upper surface of the holding plate 20 b is configured in a shape corresponding to, for example, a side surface of a cone, and functions as a holding surface for holding the workpiece 11 . In addition, the height difference (height difference) between the center of the upper surface of the holding plate 20 b corresponding to the vertex of the cone and the outer peripheral edge of the upper surface of the holding plate 20 b is about 10 μm to 30 μm.
保持板20b的下表面側係透過設於框體20a的內部之流路、配置於框體20a的外部之閥(未圖示)等,而與噴射器等吸引源(未圖示)連接。因此,若在被加工物11等與保持板20b的上表面接觸之狀態下開啟閥而吸引源的負壓起作用,則藉由此卡盤台20而吸引被加工物11。亦即,被加工物11被卡盤台20的保持面保持。The lower surface side of the holding plate 20b is connected to a suction source (not shown) such as an injector through a flow path provided inside the frame 20a, a valve (not shown) arranged outside the frame 20a, and the like. Therefore, when the valve is opened while the workpiece 11 and the like are in contact with the upper surface of the holding plate 20 b and the negative pressure of the suction source acts, the workpiece 11 is sucked by the chuck table 20 . That is, the workpiece 11 is held by the holding surface of the chuck table 20 .
在將卡盤台20固定於工作台基座18之狀態下,旋轉台16例如往圖1的箭頭的方向以及與箭頭為相反的方向旋轉。然後,伴隨此旋轉台16的旋轉,工作台基座18及卡盤台20沿著旋轉台16的圓周方向移動。In a state where the chuck table 20 is fixed to the table base 18, the rotary table 16 rotates, for example, in the direction of the arrow in FIG. 1 and in the direction opposite to the arrow. Then, with the rotation of the turntable 16 , the table base 18 and the chuck table 20 move along the circumferential direction of the turntable 16 .
旋轉台16使工作台基座18及卡盤台20例如依序移動至與第二搬送機構14相鄰之搬入搬出區域、搬入搬出區域的後方的粗研削區域、粗研削區域的側邊的精研削區域以及搬入搬出區域。第二搬送機構14將以保持墊保持之被加工物11從位置調整機構12的位置調整用工作台搬送往配置於搬入搬出區域之卡盤台20。The rotary table 16 moves the table base 18 and the chuck table 20, for example, to the loading and unloading area adjacent to the second conveying mechanism 14, the rough grinding area behind the loading and unloading area, and the finishing area on the side of the rough grinding area. Grinding area and loading and unloading area. The second transport mechanism 14 transports the workpiece 11 held by the holding pad from the position adjustment table of the position adjustment mechanism 12 to the chuck table 20 arranged in the loading and unloading area.
如圖1所示,在粗研削區域及精研削區域的後方(亦即,旋轉台16的後方)分別設有柱狀的支撐構造30。在各支撐構造30的前表面側設有Z軸移動機構32。各Z軸移動機構32具備相對於Z軸方向大致平行的一對導軌34,且在導軌34以可滑動之態樣安裝有移動板36。As shown in FIG. 1 , columnar support structures 30 are respectively provided behind the rough grinding area and the finish grinding area (that is, behind the turntable 16 ). A Z-axis moving mechanism 32 is provided on the front side of each support structure 30 . Each Z-axis moving mechanism 32 includes a pair of guide rails 34 substantially parallel to the Z-axis direction, and a moving plate 36 is slidably attached to the guide rails 34 .
在各移動板36的後表面側(背面側)設有構成滾珠螺桿之螺帽部(未圖示),相對於導軌34大致平行的螺桿軸38係以可旋轉之態樣與此螺帽部連結。在螺桿軸38的一端部連接有馬達40等。藉由馬達40等而使螺桿軸38旋轉,藉此移動板36沿著導軌34(Z軸方向)移動。A nut part (not shown) constituting a ball screw is provided on the rear surface side (back side) of each moving plate 36, and the screw shaft 38 substantially parallel to the guide rail 34 is rotatably connected to the nut part. link. A motor 40 and the like are connected to one end of the screw shaft 38 . The screw shaft 38 is rotated by the motor 40 or the like, whereby the moving plate 36 moves along the guide rail 34 (Z-axis direction).
在各移動板36的前表面(正面)設有固定具42。可研削被加工物11之研削單元44係被各固定具42支撐。各研削單元44具備固定於固定具42之主軸外殼46。主軸48係以可繞著其軸心旋轉之態樣容納於各主軸外殼46,所述主軸48成為相對於Z軸方向平行的旋轉軸、或相對於Z軸方向稍微傾斜的旋轉軸。A fixture 42 is provided on the front surface (front surface) of each movable plate 36 . The grinding unit 44 capable of grinding the workpiece 11 is supported by each fixture 42 . Each grinding unit 44 includes a spindle housing 46 fixed to the fixture 42 . The main shaft 48 is housed in each main shaft housing 46 so as to be rotatable about its axis, and the main shaft 48 is a rotation shaft parallel to the Z-axis direction or a rotation shaft slightly inclined to the Z-axis direction.
各主軸48的下端部係從主軸外殼46的下端面露出,且在此下端部固定有圓盤狀的安裝件50。例如,在各安裝件50的外緣部設有在厚度的方向貫通安裝件50之多個孔(未圖示),且螺栓52等插入各孔。The lower end of each spindle 48 is exposed from the lower end surface of the spindle housing 46 , and a disc-shaped attachment 50 is fixed to the lower end. For example, a plurality of holes (not shown) penetrating through the attachment 50 in the thickness direction are provided on the outer edge of each attachment 50 , and bolts 52 and the like are inserted into the holes.
在粗研削區域側的研削單元44的安裝件50的下表面係以螺栓52而安裝有粗研削用的研削輪54。亦即,在粗研削區域側的主軸48裝設有粗研削用的研削輪54。並且,在粗研削區域側的研削單元44的主軸外殼46容納有與主軸48的上端側連接之馬達(未圖示)等。藉由此馬達等的動力,而粗研削用的研削輪54與主軸48一起進行旋轉。A grinding wheel 54 for rough grinding is attached to the lower surface of the attachment 50 of the grinding unit 44 on the side of the rough grinding area with bolts 52 . That is, a grinding wheel 54 for rough grinding is mounted on the main shaft 48 on the side of the rough grinding area. In addition, a motor (not shown) and the like connected to the upper end side of the main shaft 48 are housed in the main shaft case 46 of the grinding unit 44 on the side of the rough grinding area. The grinding wheel 54 for rough grinding is rotated together with the main shaft 48 by the power of the motor or the like.
另一方面,在精研削區域側的研削單元44的安裝件50的下表面係以螺栓52而安裝有精研削用的研削輪54。亦即,在精研削區域側的主軸48裝設有精研削用的研削輪54。並且,在精研削區域側的研削單元44的主軸外殼46容納有與主軸48的上端側連接之馬達(未圖示)等。藉由此馬達等的動力,而精研削用的研削輪54與主軸48一起進行旋轉。On the other hand, a grinding wheel 54 for finishing grinding is attached by bolts 52 to the lower surface of the attachment 50 of the grinding unit 44 on the finishing grinding area side. That is, the grinding wheel 54 for finishing grinding is mounted on the main shaft 48 on the side of the finishing grinding area. In addition, a motor (not shown) and the like connected to the upper end side of the main shaft 48 are accommodated in the main shaft housing 46 of the grinding unit 44 on the finish grinding area side. The grinding wheel 54 for finishing grinding is rotated together with the main shaft 48 by the power of the motor or the like.
各研削輪54包含使用不銹鋼、鋁等金屬所形成之環狀的輪基台54a(參照圖4)。在輪基台54a的下表面,沿著輪基台54a的圓周方向固定有多個研削磨石54b(參照圖4),所述研削磨石54b係將金剛石等磨粒分散於陶瓷(vitrified)或類樹脂(resinoid)等結合劑而成。Each grinding wheel 54 includes an annular wheel base 54 a (see FIG. 4 ) formed using metal such as stainless steel or aluminum. On the lower surface of the wheel base 54a, a plurality of grinding stones 54b (see FIG. 4 ) are fixed along the circumferential direction of the wheel base 54a. The grinding stones 54b are abrasive grains such as diamond dispersed in ceramics (vitrified). Or resin (resinoid) and other binders.
此外,精研削用的研削輪54所具備之研削磨石54b所含之磨粒的平均粒徑小於粗研削用的研削輪54所具備之研削磨石54b所含之磨粒的平均粒徑。藉此,實現適於粗研削之研削輪54與適於精研削之研削輪54。具體的磨粒的大小係因應研削後的被加工物11所要求之品質等而適當地設定。In addition, the average particle diameter of the abrasive grains contained in the grinding stone 54b included in the grinding wheel 54 for finishing grinding is smaller than the average particle diameter of the abrasive grains contained in the grinding stone 54b included in the grinding wheel 54 for rough grinding. Thereby, the grinding wheel 54 suitable for rough grinding and the grinding wheel 54 suitable for finish grinding are realized. The specific size of the abrasive grains is appropriately set in accordance with the quality required of the workpiece 11 after grinding, and the like.
在研削輪54的旁邊配置有噴嘴56,所述噴嘴56可將純水等液體(研削液)21(參照圖4)供給至被加工物11與研削磨石54b接觸之部分。此外,亦可代替此噴嘴56,或者與噴嘴56一起而在研削輪54等設有使用於供給液體之液體供給口。Next to the grinding wheel 54 is arranged a nozzle 56 capable of supplying a liquid (grinding fluid) 21 (see FIG. 4 ) such as pure water to a portion of the workpiece 11 in contact with the grinding stone 54 b. In addition, instead of the nozzle 56, or together with the nozzle 56, a liquid supply port for supplying the liquid may be provided in the grinding wheel 54 or the like.
以上述之粗研削區域側的研削單元44研削保持於粗研削區域的卡盤台20之被加工物11的上表面側。並且,以上述之精研削區域側的研削單元44研削保持於精研削區域的卡盤台20之被加工物11的上表面側。The upper surface side of the workpiece 11 of the chuck table 20 held in the rough grinding area is ground by the above-mentioned grinding unit 44 on the side of the rough grinding area. Then, the upper surface side of the workpiece 11 of the chuck table 20 held in the finishing grinding area is ground by the above-mentioned grinding unit 44 on the finishing grinding area side.
亦即,藉由已保持被加工物11之卡盤台20依序移動至搬入搬出區域、粗研削區域及精研削區域,而連續地進行被加工物11的粗研削與粗研削的後的精研削。若被加工物11的精研削結束,則精研削區域的卡盤台20再次被定位於搬入搬出區域。That is, by sequentially moving the chuck table 20 holding the workpiece 11 to the loading and unloading area, the rough grinding area, and the finishing grinding area, the rough grinding and finishing of the workpiece 11 are continuously performed. grind. When the finish grinding of the workpiece 11 is completed, the chuck table 20 in the finish grinding area is positioned again in the loading and unloading area.
在搬入搬出區域的前方且第二搬送機構14的側邊的位置設有第三搬送機構58,所述第三搬送機構58保持研削後的被加工物11並將研削後的被加工物11搬送至前方。第三搬送機構58包含:保持墊,其吸引並保持被加工物11的上表面側;以及臂,其與此保持墊連接,並且,所述第三搬送機構58係藉由臂而使保持墊回旋,藉此將研削後的被加工物11從搬入搬出區域的卡盤台20搬送至前方。In front of the loading and unloading area and on the side of the second transporting mechanism 14 is provided a third transporting mechanism 58 that holds the ground workpiece 11 and transports the ground workpiece 11 to the front. The third transport mechanism 58 includes: a holding pad that attracts and holds the upper surface side of the workpiece 11; By turning, the ground workpiece 11 is transported forward from the chuck table 20 in the loading and unloading area.
在第三搬送機構58的側邊設有清洗單元60,所述清洗單元60清洗被第三搬送機構58搬出之被加工物11。清洗單元60例如包含:旋轉台,其在保持被加工物11的下表面側之狀態下進行旋轉;以及清洗用噴嘴,其將清洗用的流體噴射至被旋轉台保持之被加工物11的上表面側。A cleaning unit 60 is provided on the side of the third conveying mechanism 58 , and the cleaning unit 60 cleans the workpiece 11 carried out by the third conveying mechanism 58 . The cleaning unit 60 includes, for example: a rotary table that rotates while holding the lower surface side of the workpiece 11; and a cleaning nozzle that sprays a cleaning fluid onto the workpiece 11 held by the rotary table. surface side.
在清洗單元60所使用之清洗用的流體典型而言為水與空氣混合而成之混合流體(雙流體)。當然,亦可使用不與空氣混合之水等作為清洗用的流體。已被清洗單元60清洗之被加工物11係被第一搬送機構6搬送,並例如被容納於卡匣8b。The cleaning fluid used in the cleaning unit 60 is typically a mixed fluid (two-fluid) in which water and air are mixed. Of course, water or the like that does not mix with air may also be used as the fluid for cleaning. The workpiece 11 cleaned by the cleaning unit 60 is conveyed by the first conveyance mechanism 6 and accommodated, for example, in the cassette 8b.
在研削裝置2的各要素連接有控制單元62。此控制單元62例如藉由包含處理裝置62a與記憶裝置62b之電腦所構成,且以適當地研削被加工物11之方式,控制包含卡盤台20、Z軸移動機構32及研削單元44之上述之研削裝置2的各要素的運作等。A control unit 62 is connected to each element of the grinding device 2 . This control unit 62 is constituted by, for example, a computer including a processing device 62a and a memory device 62b, and controls the above-mentioned components including the chuck table 20, the Z-axis moving mechanism 32, and the grinding unit 44 in such a manner as to properly grind the workpiece 11. The operation of each element of the grinding device 2, etc.
處理裝置62a典型而言為CPU(Central Processing Unit,中央處理單元),且進行為了控制上述之要素所需的各種處理。記憶裝置62b例如包含DRAM(Dynamic Random Access Memory,隨機存取記憶體)等主記憶裝置與硬式磁碟機、快閃記憶體等輔助記憶裝置。此控制單元62的功能例如遵循記憶於記憶裝置62b之程式等軟體且藉由處理裝置62a運作而實現。The processing device 62 a is typically a CPU (Central Processing Unit, Central Processing Unit), and performs various processes necessary for controlling the above-mentioned elements. The memory device 62 b includes, for example, a main memory device such as DRAM (Dynamic Random Access Memory, random access memory), and an auxiliary memory device such as a hard disk drive and a flash memory. The functions of the control unit 62 are implemented by following software such as programs stored in the memory device 62b and operated by the processing device 62a.
在控制單元62連接有輸入裝置64。輸入裝置64例如為觸控面板,且將來自操作員的指令輸入控制單元62。此觸控面板兼作為顯示從控制單元62輸出之資訊之顯示裝置。此外,亦可採用鍵盤、滑鼠等作為輸入裝置64。An input device 64 is connected to the control unit 62 . The input device 64 is, for example, a touch panel, and inputs instructions from an operator into the control unit 62 . This touch panel also serves as a display device for displaying information output from the control unit 62 . In addition, a keyboard, mouse, etc. can also be used as the input device 64 .
在如此般所構成之研削裝置2中,在停止其運行之停機之際,執行以研削輪54研削卡盤台20的保持面之自體研磨。例如,在記憶裝置62b的一部分記錄用於使控制單元62執行必需程序的程式,所述記憶裝置62b亦為能藉由電腦等而進行讀取之非暫時性的記錄媒體,並且,控制單元62遵循此程式而進行停機的控制。In the grinding device 2 thus constituted, self-grinding for grinding the holding surface of the chuck table 20 with the grinding wheel 54 is performed when the operation is stopped. For example, a program for causing the control unit 62 to execute a necessary program is recorded in a part of the memory device 62b, which is also a non-transitory recording medium that can be read by a computer or the like, and the control unit 62 Shutdown control follows this program.
圖2係示意性地表示本實施方式的藉由程式所實現之控制單元62的功能性構造之功能方塊圖。此外,在圖2中,為了便於說明,而合併表示與控制單元62連接之輸入裝置64。如圖2所示,控制單元62包含判定來自輸入裝置64的輸入之輸入判定部66。FIG. 2 is a functional block diagram schematically showing the functional structure of the control unit 62 implemented by programs in this embodiment. In addition, in FIG. 2, the input device 64 connected to the control unit 62 is collectively shown for convenience of description. As shown in FIG. 2 , the control unit 62 includes an input judging unit 66 that judges an input from an input device 64 .
例如,若由操作員從輸入裝置64輸入停機的指令(停止研削裝置2的運行之主旨的指令),則輸入判定部66對停機控制部68通知開始停機的程序。停機控制部68遵循來自輸入判定部66的通知而執行停機的程序。For example, when an operator inputs a shutdown command (command to stop the operation of the grinding device 2 ) from the input device 64 , the input determination unit 66 notifies the shutdown control unit 68 of a program to start the shutdown. The shutdown control unit 68 executes a shutdown program in accordance with the notification from the input determination unit 66 .
例如,在停機之際的運作模式被設定成進行自體研磨之「結束時自體研磨」之情形中,停機控制部68在開始停機的程序之際,對自體研磨控制部70通知開始自體研磨的程序。自體研磨控制部70遵循來自停機控制部68的通知而執行自體研磨的程序。For example, when the operation mode at the time of shutdown is set to "self-polishing at the end" for self-polishing, the shutdown control unit 68 notifies the self-polishing control unit 70 of starting the self-polishing control unit 70 when starting the shutdown procedure. body grinding procedure. The self-polishing control unit 70 follows the notification from the shutdown control unit 68 to execute the self-polishing procedure.
控制單元62進一步包含運作模式設定部72,所述運作模式設定部72設定停機之際的運作模式。例如,若將藉由操作員所選擇之運作模式從輸入裝置64輸入輸入判定部66,則輸入判定部66對運作模式設定部72通知已從輸入裝置64輸入之運作模式,運作模式設定部72將從輸入判定部66通知之運作模式設定成停機之際的運作模式。在停機之際的運作模式中,除了上述之「結束時自體研磨」以外,亦有在停機之際不進行自體研磨之「通常結束」等。The control unit 62 further includes an operation mode setting part 72 which sets the operation mode at the time of shutdown. For example, if the operation mode selected by the operator is input to the input determination part 66 from the input device 64, the input determination part 66 notifies the operation mode setting part 72 of the operation mode input from the input device 64, and the operation mode setting part 72 The operation mode notified from the input determination unit 66 is set as the operation mode at the time of shutdown. In the operation mode at the time of shutdown, in addition to the above-mentioned "self-polishing at the end", there is also "normal end" in which self-polishing is not performed at the time of shutdown.
停機控制部68例如具有:電力控制部68a,其控制電力的供給;以及記憶控制部68b,其控制資訊的記憶。若從輸入判定部66對停機控制部68通知開始停機的程序,則記憶控制部68b執行使記憶裝置62b記憶停機之際需要保存的資訊之程序。例如,若使記憶裝置62b記憶需要的資訊之程序及其他的停機所需的程序結束,則電力控制部68a執行斷開往各要素供給電力之程序。The shutdown control unit 68 includes, for example, an electric power control unit 68a that controls supply of electric power, and a memory control unit 68b that controls storage of information. When the shutdown control unit 68 is notified of a program to start the shutdown from the input determination unit 66, the memory control unit 68b executes a program for causing the memory device 62b to memorize information to be stored at the time of shutdown. For example, when a program for storing required information in the memory device 62b and other programs required for shutdown are completed, the power control unit 68a executes a program for shutting off power supply to each element.
自體研磨控制部70例如包含:輪更換控制部70a,其控制研削輪54的更換;以及角度調整部70b,其調整卡盤台20的旋轉軸(工作台基座18的旋轉軸)的角度。輪更換控制部70a在開始自體研磨的程序之際,因應需要而執行從適於被加工物11的研削之研削輪54更換成適於自體研磨之研削輪54的程序(更換研削輪54的程序)。具體而言,例如,輪更換控制部70a為了對操作員告知需要更換研削輪54而使顯示裝置顯示必需的資訊等。The self-grinding control unit 70 includes, for example, a wheel replacement control unit 70a that controls the replacement of the grinding wheel 54, and an angle adjustment unit 70b that adjusts the angle of the rotation axis of the chuck table 20 (the rotation axis of the table base 18). . When starting the self-grinding procedure, the wheel replacement control unit 70a executes a procedure of changing from the grinding wheel 54 suitable for grinding the workpiece 11 to the grinding wheel 54 suitable for self-grinding (replacing the grinding wheel 54) as needed. program of). Specifically, for example, the wheel replacement control unit 70a displays necessary information on the display device in order to notify the operator that the grinding wheel 54 needs to be replaced.
角度調整部70b在開始自體研磨的程序之際,執行將卡盤台20的旋轉軸的角度調整成適於自體研磨之預定的角度之程序。具體而言,例如,角度調整部70b係以上述之角度調整機構調整工作台基座18的旋轉軸的角度。此外,角度調整部70b亦可執行:代替卡盤台20的旋轉軸的角度,或與卡盤台20的旋轉軸的角度一起而調整主軸48的軸心的角度之程序。The angle adjustment unit 70b executes a process of adjusting the angle of the rotation axis of the chuck table 20 to a predetermined angle suitable for the self-polishing when the self-polishing process is started. Specifically, for example, the angle adjustment part 70b adjusts the angle of the rotation axis of the table base 18 by the above-mentioned angle adjustment mechanism. In addition, the angle adjustment unit 70 b may also execute a program of adjusting the angle of the axis of the spindle 48 instead of the angle of the rotation axis of the chuck table 20 or together with the angle of the rotation axis of the chuck table 20 .
圖3係表示將研削裝置2進行停機之際的處理的流程之流程圖。首先,若輸入裝置64將停機的指令輸入控制單元62(步驟ST11),則控制單元62的輸入判定部66對停機控制部68通知開始停機。FIG. 3 is a flowchart showing the flow of processing when the grinding device 2 is stopped. First, when the input device 64 inputs a shutdown command to the control unit 62 (step ST11 ), the input determination unit 66 of the control unit 62 notifies the shutdown control unit 68 of the shutdown start.
從輸入判定部66受理到開始停機的程序的通知之停機控制部68會開始停機的程序(步驟ST12)。具體而言,例如,記憶控制部68b開始使記憶裝置62b記憶停機之際需要保存的資訊之程序。此外,在此段階中,電力控制部68a不會開始斷開往各要素供給電力之程序。The shutdown control unit 68 that has received the notification of starting the shutdown program from the input judging unit 66 starts the shutdown program (step ST12 ). Specifically, for example, the memory control unit 68b starts a program for causing the memory device 62b to memorize information that needs to be saved at the time of shutdown. In addition, at this stage, the power control unit 68a does not start the process of shutting off the power supply to each element.
並且,從輸入判定部66受理到開始停機的程序的通知之停機控制部68會判定藉由運作模式設定部72所設定之運作模式是否為在停機之際進行自體研磨之「結束時自體研磨」(步驟ST13)。此外,在圖3中,雖表示在開始停機的程序之後進行運作模式的判定之流程,但亦可與運作模式的判定同時或在進行運作模式的判定之後開始停機的程序。And, the stop control unit 68 which receives the notification of the start-stop program from the input judging unit 66 will determine whether the operation mode set by the operation mode setting unit 72 is “self body grinding at the end” when the machine is stopped. Grinding" (step ST13). In addition, in FIG. 3 , although the flow of determining the operation mode is shown after starting the shutdown process, the shutdown process may be started simultaneously with the determination of the operation mode or after the determination of the operation mode.
在運作模式中設定有「結束時自體研磨」之情形中(步驟ST13中為是),停機控制部68對自體研磨控制部70通知開始自體研磨的程序。從停機控制部68受理到開始自體研磨的程序的通知之自體研磨控制部70例如會開始以精研削用的研削輪54研削卡盤台20的保持面之自體研磨的程序。When "self-polishing at the end" is set in the operation mode (YES in step ST13 ), the shutdown control unit 68 notifies the self-polishing control unit 70 of the procedure to start the self-polishing. The self-grinding control unit 70 , having received the notification to start the self-grinding process from the shutdown control unit 68 , starts the self-polishing process of grinding the holding surface of the chuck table 20 with the grinding wheel 54 for finishing grinding, for example.
具體而言,例如,角度調整部70b開始將各卡盤台20的旋轉軸的角度調整成適於自體研磨之預定的角度之程序(步驟ST14)。亦即,角度調整部70b在已將各卡盤台20定位於精研削區域之際,將其卡盤台20的旋轉軸與已裝設精研削用的研削輪54之主軸48的軸心所形成之角度調整成適於自體研磨之預定的角度。Specifically, for example, the angle adjustment unit 70 b starts a process of adjusting the angle of the rotation axis of each chuck table 20 to a predetermined angle suitable for self-polishing (step ST14 ). That is, when the angle adjustment unit 70b has positioned each chuck table 20 in the finish grinding area, the rotation axis of the chuck table 20 and the axis center of the main shaft 48 on which the grinding wheel 54 for finish grinding has been installed are aligned. The formed angle is adjusted to a predetermined angle suitable for self-grinding.
會需要此種調整係因一般而言在研削被加工物11之情形與研削卡盤台20的保持面之情形中,使卡盤台20及研削輪54旋轉之際所施加之負載的大小不同。此外,在旋轉時的負載的大小沒有實質的差異之情形等中,亦可省略此角度的調整。This adjustment is required because generally, the magnitude of the load applied when the chuck table 20 and the grinding wheel 54 are rotated is different between the case of grinding the workpiece 11 and the case of grinding the holding surface of the chuck table 20. . In addition, in the case where there is no substantial difference in the magnitude of the load at the time of rotation, etc., adjustment of this angle may be omitted.
若各卡盤台20的旋轉軸與主軸48的軸心所形成之角度的調整結束,則自體研磨控制部70開始以研削輪54研削卡盤台20的保持面之程序(步驟ST15)。圖4係示意性地表示研削卡盤台20的保持面之狀況之剖面圖。具體而言,首先,自體研磨控制部70使各卡盤台20繞著相對於其保持面呈交叉之旋轉軸旋轉,且使已裝設精研削用的研削輪54之主軸48繞著其軸心旋轉。When the adjustment of the angle formed by the rotation axis of each chuck table 20 and the axis center of the spindle 48 is completed, the self-grinding control unit 70 starts the process of grinding the holding surface of the chuck table 20 with the grinding wheel 54 (step ST15 ). FIG. 4 is a cross-sectional view schematically showing the state of the holding surface of the grinding chuck table 20 . Specifically, first, the self-grinding control unit 70 rotates each chuck table 20 around a rotation axis intersecting with its holding surface, and rotates the main shaft 48 on which the grinding wheel 54 for finishing grinding is mounted. Axis rotation.
接著,自體研磨控制部70在卡盤台20與主軸48進行旋轉之狀態下,一邊從噴嘴56供給液體21,一邊以Z軸移動機構32使精研削用的研削輪54下降。亦即,自體研磨控制部70藉由Z軸移動機構32而使精研削區域的卡盤台20與精研削用的研削單元44沿著相對於卡盤台20的保持面呈交叉之Z軸方向相對地移動。Next, the autogenous grinding control unit 70 lowers the grinding wheel 54 for finish grinding by the Z-axis moving mechanism 32 while supplying the liquid 21 from the nozzle 56 while the chuck table 20 and the spindle 48 are rotating. That is, the self-polishing control unit 70 uses the Z-axis moving mechanism 32 to move the chuck table 20 in the finishing area and the grinding unit 44 for finishing grinding along the Z-axis that intersects with the holding surface of the chuck table 20 The direction moves relative to each other.
藉此,精研削用的研削輪54的研削磨石54b與精研削區域的卡盤台20的保持面接觸,研削此卡盤台20的保持面。保持面的研削量(研削厚度)例如在10μm~50μm的範圍內被任意地設定。但是,保持面的研削量並不受限於此範圍。Thereby, the grinding stone 54b of the grinding wheel 54 for finish grinding contacts the holding surface of the chuck table 20 in the finishing grinding area, and grinds the holding surface of the chuck table 20 . The amount of grinding (grinding thickness) of the holding surface is set arbitrarily, for example, within a range of 10 μm to 50 μm. However, the grinding amount of the retaining surface is not limited to this range.
若精研削區域的卡盤台20的保持面的研削結束,則自體研磨控制部70使旋轉台16旋轉而使另一個卡盤台20移動至精研削區域,同樣地研削此另一個卡盤台20的保持面。若交互地進行旋轉旋轉台16與研削卡盤台20的保持面,且研削全部的卡盤台20的保持面,則自體研磨的程序結束。When the grinding of the holding surface of the chuck table 20 in the finish grinding area is completed, the self-polishing control unit 70 rotates the rotary table 16 to move the other chuck table 20 to the finish grinding area, and grinds the other chuck in the same manner. The holding surface of the stage 20. When the rotating table 16 is alternately rotated and the holding surfaces of the chuck tables 20 are ground, and all the holding surfaces of the chuck tables 20 are ground, the self-polishing process ends.
此外,在此停機之際所進行之自體研磨的程序中,輪更換控制部70a期望不執行研削輪54的更換的程序。藉由不執行需要由操作員所進行之作業之研削輪54的更換的程序,而可更確實地防止操作員忘記執行自體研磨。但是,在所述情形中,研削輪54需要被構成為可研削被加工物11與卡盤台20雙方。In addition, it is desirable that the wheel replacement control unit 70a does not execute the routine of exchanging the grinding wheel 54 in the self-grinding routine performed at the time of this shutdown. By not performing the procedure of exchanging the grinding wheel 54 which requires work by the operator, it is possible to more surely prevent the operator from forgetting to perform self-grinding. However, in this case, the grinding wheel 54 needs to be configured to be able to grind both the workpiece 11 and the chuck table 20 .
當然,在停機之際所進行之自體研磨的程序中,輪更換控制部70a亦可執行研削輪54的更換的程序。並且,在停機之際所進行之自體研磨以外的一般性的自體研磨的程序中,輪更換控制部70a可執行研削輪54的更換的程序。Of course, the wheel replacement control unit 70a may also execute the routine of exchanging the grinding wheel 54 in the self-grinding routine performed at the time of shutdown. In addition, the wheel replacement control unit 70 a may execute a routine of exchanging the grinding wheel 54 in a general self-grinding routine other than the self-grinding performed at the time of shutdown.
若包含自體研磨的程序之停機所需的全部的程序結束,則停機控制部68的電力控制部68a為了結束停機的程序而開始斷開往各要素供給電力之程序(步驟ST16)。若斷開往各要素供給電力,則使研削裝置2的運行停止之程序會全部結束,研削裝置2成為停機之狀態。When all the programs necessary for the shutdown including the self-polishing program are completed, the power control unit 68 a of the shutdown control unit 68 starts a program of shutting off power supply to each element to end the shutdown program (step ST16 ). When the power supply to each element is turned off, all the procedures for stopping the operation of the grinding device 2 are completed, and the grinding device 2 is in a stopped state.
如以上,根據本實施方式之研削裝置2、程式以及研削裝置的控制方法,若設定預定的運作模式,則藉由控制單元62執行:從輸入裝置64將停止研削裝置2的運行之主旨的指令輸入控制單元62之後,使研削裝置2的運行停止之程序;以及在從輸入裝置64將停止研削裝置2的運行之主旨的指令輸入控制單元62之後且使研削裝置2的運行停止之程序結束之前,藉由研削輪54而研削保持面之程序。As above, according to the grinding device 2, the program, and the control method of the grinding device according to the present embodiment, if a predetermined operation mode is set, the control unit 62 executes an instruction to stop the operation of the grinding device 2 from the input device 64. After the control unit 62 is input, the program of stopping the operation of the grinding device 2; and after the command to stop the operation of the grinding device 2 is input from the input device 64 to the control unit 62 and before the program of stopping the operation of the grinding device 2 is completed , the procedure of grinding the retaining surface by the grinding wheel 54 .
亦即,在使研削裝置2的運行停止之停機之際,變得一定要執行藉由研削輪54而研削保持面之自體研磨。因此,若根據本實施方式之研削裝置2、程式以及研削裝置的控制方法,則防止操作員忘記執行自體研磨。並且,若根據本實施方式之研削裝置2、程式以及研削裝置的控制方法,則因在無助於研削被加工物11之停機之際執行自體研磨,故亦不會有起因於自體研磨而生產性降低之情況。That is, when the grinding device 2 is shut down to stop the operation, self-grinding of grinding the holding surface by the grinding wheel 54 must be performed. Therefore, according to the grinding device 2, the program, and the control method of the grinding device according to the present embodiment, it is prevented that the operator forgets to perform self-grinding. And, according to the grinding device 2, the program, and the control method of the grinding device of the present embodiment, self-grinding is performed when the stoppage of the workpiece 11 is not conducive to grinding, so there will be no self-grinding caused by self-grinding. and lowered productivity.
此外,本發明並不受限於上述之實施方式的記載,而能進行各種變更並實施。例如,在上述之實施方式中,雖執行以精研削用的研削輪54研削卡盤台20的保持面之自體研磨的程序,但亦可執行以粗研削用的研削輪54研削卡盤台20的保持面之自體研磨的程序。In addition, this invention is not limited to description of said embodiment, Various changes can be added and implemented. For example, in the above-mentioned embodiment, although the self-grinding procedure of grinding the holding surface of the chuck table 20 with the grinding wheel 54 for finishing grinding is performed, it is also possible to perform grinding of the chuck table with the grinding wheel 54 for rough grinding. 20. The self-grinding procedure of the retaining surface.
並且,在上述之實施方式中,雖將使研削裝置的控制方法執行之程式記錄於控制單元62內的記憶裝置62b,但此程式例如亦可記錄於能藉由電腦等而進行讀取之任意的非暫時性的記錄媒體。例如,有時會將此程式記錄於能低成本分銷的CD(Compact Disc,光碟)等光碟。In addition, in the above-mentioned embodiment, although the program for executing the control method of the grinding device is recorded in the memory device 62b in the control unit 62, the program may be recorded in any program that can be read by a computer or the like, for example. non-transitory recording media. For example, this program is sometimes recorded on an optical disc such as a CD (Compact Disc) that can be distributed at low cost.
另外,上述的實施方式及變形例之構造、方法等,只要在不背離本發明目的之範圍內,即能進行適當變更並實施。In addition, the structures, methods, and the like of the above-described embodiments and modified examples can be appropriately changed and implemented within a range that does not deviate from the purpose of the present invention.
2:研削裝置 4:基台 4a:容納部 6:第一搬送機構 8a:卡匣 8b:卡匣 10a:卡匣台 10b:卡匣台 12:位置調整機構 14:第二搬送機構 16:旋轉台 18:工作台基座 20:卡盤台 20a:框體 20b:保持板 30:支撐構造 32:Z軸移動機構 34:導軌 36:移動板 38:螺桿軸 40:馬達 42:固定具 44:研削單元 46:主軸外殼 48:主軸 50:安裝件 52:螺栓 54:研削輪 54a:輪基台 54b:研削磨石 56:噴嘴 58:第三搬送機構 60:清洗單元 62:控制單元 62a:處理裝置 62b:記憶裝置 64:輸入裝置 66:輸入判定部 68:停機控制部 68a:電力控制部 68b:記憶控制部 70:自體研磨控制部 70a:輪更換控制部 70b:角度調整部 72:運作模式設定部 11:被加工物 11a:正面 11b:背面 21:液體(研削液) 2: Grinding device 4: Abutment 4a:Accommodating part 6: The first transfer mechanism 8a: Cassette 8b: Cassette 10a: Cassette table 10b: Cassette table 12: Position adjustment mechanism 14: The second conveying mechanism 16:Rotary table 18:Workbench base 20: chuck table 20a: frame 20b: Holding plate 30: Support structure 32: Z-axis moving mechanism 34: guide rail 36: Mobile board 38: screw shaft 40: motor 42:fixture 44: Grinding unit 46:Spindle housing 48:Spindle 50: Mounting parts 52: Bolt 54: Grinding wheel 54a: wheel abutment 54b: grinding stone 56: Nozzle 58: The third transfer mechanism 60: cleaning unit 62: Control unit 62a: Processing device 62b: memory device 64: Input device 66: input judging part 68: Shutdown control department 68a: Power Control Department 68b: Memory Control Department 70: Autogenous Grinding Control Department 70a: wheel replacement control unit 70b: Angle adjustment part 72: Operation Mode Setting Department 11: Processed object 11a: front 11b: back 21: liquid (grinding fluid)
圖1係示意性地表示研削裝置之立體圖。 圖2係示意性地表示控制單元的功能性的構造之功能方塊圖。 圖3係表示將研削裝置進行停機之際的處理的流程之流程圖。 圖4係示意性地表示研削卡盤台的保持面之狀況之剖面圖。 Fig. 1 is a perspective view schematically showing a grinding device. FIG. 2 is a functional block diagram schematically showing the functional structure of the control unit. FIG. 3 is a flowchart showing the flow of processing when the grinding device is stopped. Fig. 4 is a cross-sectional view schematically showing the state of the holding surface of the grinding chuck table.
62:控制單元 62: Control unit
64:輸入裝置 64: Input device
66:輸入判定部 66: input judging part
68:停機控制部 68: Shutdown control department
68a:電力控制部 68a: Power Control Department
68b:記憶控制部 68b: Memory Control Department
70:自體研磨控制部 70: Autogenous Grinding Control Department
70a:輪更換控制部 70a: wheel replacement control unit
70b角度調整部 70b angle adjustment part
72:運作模式設定部 72: Operation Mode Setting Department
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JP2021206751A JP2023091897A (en) | 2021-12-21 | 2021-12-21 | Griding device, program, non-transitory recording medium, and control method of grinding device |
JP2021-206751 | 2021-12-21 |
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