TW202324583A - Robot hand capable of depositing and removing wafers without causing breaking - Google Patents

Robot hand capable of depositing and removing wafers without causing breaking Download PDF

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Publication number
TW202324583A
TW202324583A TW111145040A TW111145040A TW202324583A TW 202324583 A TW202324583 A TW 202324583A TW 111145040 A TW111145040 A TW 111145040A TW 111145040 A TW111145040 A TW 111145040A TW 202324583 A TW202324583 A TW 202324583A
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Taiwan
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wafer
suction
manipulator
robot
suction part
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TW111145040A
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Chinese (zh)
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中塚敦
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00Manipulators not otherwise provided for
    • B25J11/0095Manipulators transporting wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/0014Gripping heads and other end effectors having fork, comb or plate shaped means for engaging the lower surface on a object to be transported
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00Gripping heads and other end effectors
    • B25J15/06Gripping heads and other end effectors with vacuum or magnetic holding means
    • B25J15/0616Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

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  • Engineering & Computer Science (AREA)
  • Robotics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)

Abstract

An objective is that even if a distance between shelves of cassettes is relatively small, a robot hand can suck and hold wafers for depositing and removing without causing breaking . The solution is a robot arm 6, which is a plate-like robot hand 6 attached to a robot 1 and having a suction face 60 having a suction port 62. The suction port 62 sucks and hold a convex spherical surface of a wafer 90 that is curved into a dome shape. The robot hand 6 has: an installment port 61 arranged at a rear end and mounted to the robot 1, and a first suction portion 64 and a second suction portion 65 which form a front end side of the robot hand 6 and are formed to be bifurcated, and are provided with the suction port 62 for sucking the wafer 90. The first suction part 64 and the second suction part 65 are alternately formed with a plurality of slits 640 (slits 650) so as to be bendable, like fingers, along the convex spherical surface of the wafer 90.

Description

機械手manipulator

本發明是有關於一種保持晶圓的板狀之機械手。The invention relates to a plate-shaped manipulator for holding wafers.

在以機械手吸引保持已翹曲成圓頂狀之晶圓而從片匣搬出時,使用的是如專利文獻1所揭示之具備有吸盤的機械手。為了以這種包含吸盤之整體厚度較厚的機械手來將收納在片匣之晶圓搬出,而將片匣之載置晶圓的層架與層架之距離設得較大。因此,導致可以收納在片匣之晶圓的片數變少,而有更換片匣的頻率變多的問題。When the warped dome-shaped wafer is sucked and held by a robot to be carried out from the cassette, a robot equipped with a suction cup as disclosed in Patent Document 1 is used. In order to carry out the wafers stored in the cassette with such a manipulator with a thicker overall thickness including the suction cup, the distance between the shelf on which the wafer is placed in the cassette and the shelf is set to be large. Therefore, the number of wafers that can be accommodated in the cassette decreases, and the frequency of changing the cassette increases.

為了解決這種問題,為了可以將收納在層架與層架之距離較小的片匣之晶圓搬出,而如例如專利文獻2所揭示,使用的是具備有將晶圓的外周部分吸引保持之吸盤的機械手。 先前技術文獻 專利文獻 In order to solve this problem, in order to be able to carry out the wafers stored in the cassettes with a small distance between the shelf and the shelf, as disclosed in Patent Document 2, for example, a device that sucks and holds the outer peripheral portion of the wafer is used. The manipulator of the suction cup. prior art literature patent documents

專利文獻1:日本專利特開2020-202324號公報 專利文獻2:日本專利特開2017-045784號公報 Patent Document 1: Japanese Patent Laid-Open No. 2020-202324 Patent Document 2: Japanese Patent Laid-Open No. 2017-045784

發明欲解決之課題 但是,在如專利文獻2所揭示之機械手中,在晶圓較薄的情況下,會有保持住的晶圓破裂的問題。 從而,所要求的是一種即使片匣的層架與層架之距離較小,仍可將晶圓以不造成破裂的方式進行取出放入的機械手。 The problem to be solved by the invention However, in the manipulator disclosed in Patent Document 2, when the wafer is thin, there is a problem of cracking the held wafer. Therefore, what is required is a manipulator that can take out and put wafers in without causing breakage even if the distance between the shelves of the cassette is small.

用以解決課題之手段 用以解決上述課題之本發明是一種機械手,為板狀之機械手,安裝於機器人,且在吸附面具備有吸引口,前述吸引口吸引保持已彎曲成圓頂狀之晶圓的凸球面,前述機械手具備:安裝部,配置於後端,且安裝於該機器人;及第1吸引部與第2吸引部,成為機械手的前端側,且形成為呈分叉,並配置有吸引該晶圓的該吸引口,該第1吸引部與該第2吸引部交互地形成有複數個狹縫而可沿著該晶圓的該凸球面像手指一樣地屈曲。 means to solve problems The present invention to solve the above-mentioned problems is a manipulator, which is a plate-shaped manipulator, installed on a robot, and has a suction port on the suction surface, and the suction port sucks and holds the convex spherical surface of the wafer that has been bent into a dome shape. , the above-mentioned manipulator has: a mounting part, arranged at the rear end, and installed on the robot; The suction port of the wafer, the first suction part and the second suction part are alternately formed with a plurality of slits so as to bend like fingers along the convex spherical surface of the wafer.

發明效果 由於本發明之機械手是不具備吸盤等之厚度薄的板狀之機械手,因此可以進入層架與層架之距離較小的片匣之該層架所載置的晶圓的上方,且藉由使已進入片匣內的機械手例如下降,便能夠讓機械手交互地形成的複數個狹縫的寬度擴大,而使吸附面以沿著晶圓的圓頂狀之凸球面順應的方式接觸於晶圓。並且,例如,當配置於機械手的晶圓辨識感測器起反應,且晶圓辨識感測器成為開啟(ON)後,使機械手的吸引口連通於吸引源,便能夠在沒有真空漏氣的情形下適當地吸引保持已彎曲成圓頂狀之晶圓。又,在例如磨削已彎曲成圓頂狀之晶圓後,已變薄之晶圓便不再彎曲。機械手也可吸引保持此不再彎曲且已變薄之晶圓,而且可以將加工後的晶圓以不造成破裂的方式搬入收納未彎曲之晶圓的片匣。 Invention effect Since the manipulator of the present invention is a thin plate-shaped manipulator that does not have a suction cup, etc., it can enter above the wafers placed on the shelf of the cassette with a relatively small distance between the shelf and the shelf, and For example, by lowering the manipulator that has entered the cassette, the width of the plurality of slits formed alternately by the manipulator can be expanded, and the suction surface can be conformed along the dome-shaped convex spherical surface of the wafer. contact with the wafer. And, for example, when the wafer recognition sensor disposed on the manipulator reacts and the wafer recognition sensor is turned on (ON), the suction port of the manipulator is connected to the suction source, so that there is no vacuum leak. Appropriate suction and retention of dome-shaped wafers in the presence of air. Also, the thinned wafer is no longer bent after, for example, grinding a dome-shaped wafer. The manipulator can also attract and hold the unbent and thinned wafers, and can move the processed wafers into the cassettes for unbent wafers without causing breakage.

用以實施發明之形態 圖1所示之機器人1是用於將例如容置於片匣4之已彎曲成圓頂狀之晶圓90從片匣4搬出,或是載置於未圖示之工作夾台或定心工作台,或搬是入片匣4之機器人,且是具備有本發明之機械手6,例如配設於未圖示之磨削裝置、研磨裝置或刀具切削裝置上之機器人。 form for carrying out the invention The robot 1 shown in FIG. 1 is used to carry out, for example, the dome-shaped wafer 90 accommodated in the cassette 4 from the cassette 4, or to place it on a not-shown work clamp or center it. The workbench, or the robot that carries the film cassette 4, is equipped with the manipulator 6 of the present invention, such as a robot that is arranged on a grinding device, a grinding device or a tool cutting device not shown in the figure.

圖1所示之片匣4例如具有底板40、頂板41、後壁42、左右的2片側壁43及前方側(+Y方向側)的開口44,且成為可以將晶圓90從開口44搬出搬入的構成。在片匣4的內部,在上下方向上隔著預定的間隔而形成有複數個層架部45,且可以在層架部45中一片一片地容置晶圓90。另外,片匣4的構成並不限定於本例。The cassette 4 shown in FIG. 1 has, for example, a bottom plate 40, a top plate 41, a rear wall 42, two left and right side walls 43, and an opening 44 on the front side (+Y direction side), and the wafer 90 can be carried out from the opening 44. Imported composition. Inside the cassette 4 , a plurality of shelf parts 45 are formed at predetermined intervals in the vertical direction, and the wafers 90 can be accommodated one by one in the shelf parts 45 . In addition, the configuration of the cassette 4 is not limited to this example.

圖1、圖2所示之平面視角下呈圓形狀之晶圓90是例如矽晶圓等,且因為從晶圓90的中心朝向外周緣903逐漸地翹曲而彎曲成圓頂狀。亦即,此圓頂狀之彎曲是指例如像是以下之彎曲:在將正面900朝向下側來將晶圓90載置於片匣4的層架部45時,晶圓90的正面900從其中央側的區域朝向外周側的區域逐漸地變低。並且,晶圓90的外周緣903接觸於片匣4的層架部45,且晶圓90是以凸球面即背面906朝向上側之狀態載置於層架部45。 作為已彎曲成圓頂狀之晶圓90之一例,形成有未圖示之器件等的正面900有被樹脂密封,且該圓頂狀之彎曲是以例如樹脂密封時變硬之樹脂的收縮力等為主要原因。 The circular wafer 90 shown in FIG. 1 and FIG. 2 is, for example, a silicon wafer, and is curved into a dome shape because it is gradually warped from the center of the wafer 90 toward the outer periphery 903 . That is, the dome-shaped curvature refers to, for example, a curvature such that when the wafer 90 is placed on the shelf portion 45 of the cassette 4 with the front surface 900 facing downward, the front surface 900 of the wafer 90 is lifted from the The area on the central side gradually becomes lower toward the area on the outer peripheral side. In addition, the outer peripheral edge 903 of the wafer 90 is in contact with the shelf portion 45 of the cassette 4 , and the wafer 90 is placed on the shelf portion 45 with the convex spherical surface, that is, the rear surface 906 facing upward. As an example of a dome-shaped wafer 90, the front surface 900 on which unillustrated devices and the like are formed is sealed with a resin, and the dome-shaped curvature is due to, for example, the contraction force of the resin that hardens when the resin is sealed. etc. as the main reason.

圖1所示之機器人1是多關節型機器人,且具備有使機械手6移動到預定的位置的驅動部3。驅動部3例如具備有:長條板狀之第1臂31;長條板狀之第2臂32;機械手連結柱30,在Z軸方向上延伸;機械手水平移動機構34,使機械手6在水平方向上移動;及簡化顯示的升降機構35。A robot 1 shown in FIG. 1 is an articulated robot, and includes a driving unit 3 for moving a manipulator 6 to a predetermined position. The driving part 3 is equipped with, for example: a strip-shaped first arm 31; a strip-shaped second arm 32; a manipulator connecting column 30 extending in the Z-axis direction; a manipulator horizontal movement mechanism 34 that makes the manipulator 6 to move in the horizontal direction; and a lifting mechanism 35 for simplified display.

在機械手連結柱30的下端連結有第1臂31的一端的上表面。在第1臂31的另一端的下表面透過未圖示之旋繞軸等而連結有第2臂32的一端的上表面。第2臂32的另一端側的下表面側是透過臂驅動馬達340而連結於升降機構35。The upper surface of one end of the first arm 31 is connected to the lower end of the manipulator connecting column 30 . The upper surface of one end of the second arm 32 is connected to the lower surface of the other end of the first arm 31 via a not-shown winding shaft or the like. The lower surface side of the other end side of the second arm 32 is connected to the lift mechanism 35 through the arm drive motor 340 .

升降機構35是例如電動汽缸等,使機械手6在Z軸方向上升降。機械手水平移動機構34是由配設於第1臂31及第2臂32內的未圖示之無端皮帶、未圖示之皮帶輪及臂驅動馬達340等所構成的皮帶輪機構等。又,機器人1整體可以藉由未圖示之馬達所產生的旋轉力,以Z軸為軸而在水平面內(X軸Y軸平面內)旋繞。又,藉由臂驅動馬達340所產生的旋轉力,可以一面使第1臂31及第2臂32在水平面內移動成相互交叉或直線狀地排列,一面使機械手6在水平面內直線運動。The lifting mechanism 35 is, for example, an electric cylinder or the like, and moves the manipulator 6 up and down in the Z-axis direction. The manipulator horizontal movement mechanism 34 is a pulley mechanism composed of an unshown endless belt, an unshown pulley, an arm drive motor 340 and the like arranged in the first arm 31 and the second arm 32 . In addition, the robot 1 as a whole can rotate in a horizontal plane (X-axis Y-axis plane) with the Z-axis as an axis by the rotational force generated by a motor not shown. Furthermore, the rotational force generated by the arm drive motor 340 can move the first arm 31 and the second arm 32 in a horizontal plane to cross each other or arrange them in a straight line, and at the same time make the manipulator 6 linearly move in the horizontal plane.

在機械手連結柱30的上端側固定有殼體37,前述殼體37將主軸36支撐成可旋轉,前述主軸36具有在圖1中與鉛直方向(Z軸方向)正交的X軸方向的軸心。例如,在殼體37的內部容置有旋轉驅動主軸36之未圖示的馬達。On the upper end side of the manipulator connecting column 30, a housing 37 is fixed, and the housing 37 rotatably supports a main shaft 36 having an X-axis direction perpendicular to the vertical direction (Z-axis direction) in FIG. 1 . axis. For example, a motor (not shown) that rotatably drives the main shaft 36 is accommodated inside the casing 37 .

主軸36的前端側是從殼體37朝-X方向突出,且在此前端側配設有供機械手6的後端側裝設的支持器38。隨著未圖示之馬達使主軸36旋轉,透過支持器38連接於主軸36的機械手6便會旋轉,而使機械手6的吸附面60與機械手6的吸附面60的相反面上下翻轉。The front end side of the main shaft 36 protrudes from the housing 37 in the −X direction, and a holder 38 on which the rear end side of the manipulator 6 is mounted is disposed on the front end side. As the main shaft 36 is rotated by a motor not shown, the manipulator 6 connected to the main shaft 36 through the supporter 38 will rotate, and the suction surface 60 of the manipulator 6 and the opposite side of the suction surface 60 of the manipulator 6 will be turned upside down. .

圖1、圖3所示之本發明之板狀之機械手6具備有:安裝部61,配置於成為支持器38側的後端,且安裝於機器人1;及第1吸引部64與第2吸引部65,成為機械手6的前端側,且形成為在平面視角下呈分叉,並配置有吸引晶圓90的吸引口62。並且,第1吸引部64與第2吸引部65的正面成為具有吸引口62的吸附面60,前述吸引口62吸引保持已彎曲成圓頂狀之晶圓90(參照圖2)的凸球面即背面906。在第1吸引部64與第2吸引部65沒有被施加外力而未屈曲之狀態下,各自的吸附面60成為平坦面。The plate-shaped manipulator 6 of the present invention shown in Fig. 1 and Fig. 3 is equipped with: the mounting part 61 is disposed at the rear end of the supporter 38 side, and is installed on the robot 1; and the first suction part 64 and the second The suction unit 65 is formed on the front end side of the robot arm 6 , is formed to fork in a planar view, and is provided with a suction port 62 for sucking the wafer 90 . And, the fronts of the first suction part 64 and the second suction part 65 become the suction surface 60 having the suction port 62, and the above-mentioned suction port 62 sucks and holds the convex spherical surface of the wafer 90 (refer to FIG. 2 ) that has been bent into a dome shape. 906 on the back. In the state where the first suction part 64 and the second suction part 65 are not buckled by external force, each suction surface 60 becomes a flat surface.

整體以樹脂板等所構成之機械手6是讓要吸引保持的晶圓90的圓頂狀之頂部分即中央區域進入第1吸引部64與第2吸引部65之間的U字開口600。圖3所示之成為機械手6的後端之安裝部61是例如形成為平面視角下呈矩形狀。從安裝部61朝向機械手6的前端側一體地延伸有寬度比安裝部61更寬之平面視角下呈大致矩形狀之剛性部66。安裝部61在厚度方向上貫通形成有未圖示之螺絲貫通孔,且被螺栓固定於支持器38。The manipulator 6 made of a resin plate as a whole allows the dome-shaped top portion of the wafer 90 to be sucked and held, that is, the central region, to enter the U-shaped opening 600 between the first suction part 64 and the second suction part 65 . The mounting portion 61 serving as the rear end of the manipulator 6 shown in FIG. 3 is, for example, formed in a rectangular shape in plan view. A rigid portion 66 having a substantially rectangular shape in plan view wider than the mounting portion 61 integrally extends from the mounting portion 61 toward the front end side of the manipulator 6 . The attachment portion 61 is formed with a screw through hole (not shown) penetrating in the thickness direction, and is fixed to the holder 38 by bolts.

在圖3所示之剛性部66中,用於安裝感測器罩殼673的安裝用凹陷660是切割成配合感測器罩殼673的形狀延伸至安裝部61附近而形成,前述感測器罩殼673是用於供機械手6偵測晶圓90的晶圓偵測感測器67的一部分。In the rigid part 66 shown in FIG. 3 , the installation recess 660 for installing the sensor cover 673 is cut to match the shape of the sensor cover 673 and extends to the vicinity of the installation part 61 to form. The housing 673 is a part of the wafer detection sensor 67 for the robot 6 to detect the wafer 90 .

晶圓偵測感測器67例如具備有:投光部671,射出偵測光;受光部672,接收從投光部671射出的偵測光在晶圓90反射的反射光;及感測器罩殼673,容置投光部671、受光部672及連接於投光部671或受光部672的配線674等。投光部671與受光部672是橫向排列,且定位在成為U字開口600的附近之剛性部66的前端的中央區域。另外,晶圓偵測感測器67並不限定於如上述之復歸反射型的光電感測器,亦可為例如感壓感測器、電容感測器等。The wafer detection sensor 67 is provided with, for example: a light projecting part 671, which emits detection light; a light receiving part 672, which receives the reflected light reflected from the wafer 90 by the detection light emitted from the light projecting part 671; and a sensor The case 673 accommodates the light projecting unit 671 , the light receiving unit 672 , the wiring 674 connected to the light projecting unit 671 or the light receiving unit 672 , and the like. The light projecting part 671 and the light receiving part 672 are arranged laterally and positioned at the central area of the front end of the rigid part 66 near the U-shaped opening 600 . In addition, the wafer detection sensor 67 is not limited to the above-mentioned retro-reflective photoelectric sensor, and may also be, for example, a pressure sensor, a capacitive sensor, and the like.

與剛性部66一體地形成為在平面視角下呈分叉之第1吸引部64與第2吸引部65是例如以機械手6的中心線602為軸而成為線對稱。第1吸引部64(第2吸引部65)交互地形成有複數個狹縫640(狹縫650)而為可沿著所接觸的晶圓90的凸球面即背面906像手指一樣地屈曲。亦即,整體形成為長條狀之第1吸引部64(第2吸引部65)是在與其延伸方向正交的方向上,從U字開口600側(內側)及外側交互且彼此平行地切割出預定長度的直線狀之狹縫640(狹縫650),藉此,第1吸引部64(第2吸引部65)具有可主要朝厚度方向撓曲的柔軟性。另外,複數個直線狀之狹縫640(狹縫650)並不限定於彼此平行地切割而形成的形態,亦可配合晶圓90的圓頂狀之凸球面的曲率等,來改變其缺口方向的角度而設定。The first suction part 64 and the second suction part 65 formed integrally with the rigid part 66 so as to diverge in a planar view are line-symmetrical about the center line 602 of the manipulator 6 as an axis, for example. The first suction part 64 (the second suction part 65 ) is alternately formed with a plurality of slits 640 (slits 650 ) so as to be bendable like a finger along the back surface 906 which is the convex spherical surface of the wafer 90 that it contacts. That is, the first suction part 64 (second suction part 65 ) formed in an overall elongated shape is cut alternately and parallel to each other from the side (inside) and outside of the U-shaped opening 600 in a direction perpendicular to the direction in which it extends. A linear slit 640 (slit 650 ) having a predetermined length is provided, whereby the first suction portion 64 (second suction portion 65 ) has flexibility that can be flexed mainly in the thickness direction. In addition, the plurality of linear slits 640 (slits 650 ) are not limited to being cut in parallel to each other, and the direction of the notch can also be changed according to the curvature of the dome-shaped convex spherical surface of the wafer 90 . set at an angle.

如圖3所示,例如大致圓形之吸引口62是在第1吸引部64及第2吸引部65的前端側與根部側各1個,在機械手6整體中例如合計4個開口於吸附面60。另外,吸引口62的數量或配設處並不限定於圖3所示之例。在各吸引口62各自連通有內部吸引路623。內部吸引路623在第1吸引部64(第2吸引部65)的內部形成為鋸齒狀,此外,通過剛性部66及安裝部61的內部,其另一端作為吸引力傳達口而開口於安裝部61的正面。並且,在該吸引力傳達口透過外部配管692而連通有真空產生裝置等之吸引源69,前述外部配管692具備可撓性而不會妨礙接頭及機械手6的旋繞動作等。例如,在外部配管692中配設有未圖示之電磁閥,前述電磁閥可切換為將吸引口62連通於吸引源69之狀態與非連通之狀態。As shown in FIG. 3 , for example, a substantially circular suction port 62 is one on the front end side and the root side of the first suction part 64 and the second suction part 65, and in the whole manipulator 6, for example, a total of four openings are opened for suction. Face 60. In addition, the number and arrangement|positioning places of the suction opening 62 are not limited to the example shown in FIG. 3. FIG. Each of the suction ports 62 communicates with an internal suction path 623 . The internal suction path 623 is formed in a zigzag shape inside the first suction part 64 (second suction part 65), and passes through the inside of the rigid part 66 and the mounting part 61, and its other end is opened to the mounting part as a suction transmission port. 61 front. In addition, a suction source 69 such as a vacuum generating device is communicated with the suction force transmission port through an external pipe 692 that is flexible so as not to hinder the joint and the swirling operation of the manipulator 6 . For example, a solenoid valve (not shown) is disposed in the external piping 692, and the solenoid valve can be switched between a state in which the suction port 62 is connected to the suction source 69 and a state in which it is not connected.

例如,第1吸引部64及第2吸引部65的吸附面60、剛性部66的正面以及埋設於安裝用凹陷660的晶圓偵測感測器67的露出面成為面齊平的平坦面。又,亦可在第1吸引部64及第2吸引部65的端部(稜線)施行倒角,以免在接觸於晶圓90的情況下傷到晶圓90。For example, the suction surface 60 of the first suction part 64 and the second suction part 65 , the front surface of the rigid part 66 , and the exposed surface of the wafer detection sensor 67 embedded in the mounting recess 660 are flush flat surfaces. In addition, the end portions (ridge lines) of the first suction portion 64 and the second suction portion 65 may be chamfered so as not to damage the wafer 90 when they come into contact with the wafer 90 .

以下,針對藉由圖1、圖3所示之機械手6來吸引保持晶圓90,並且藉由機器人1來搬送晶圓90的情況下之機械手6的動作及機器人1的動作進行說明。Next, the operation of the robot 6 and the operation of the robot 1 in the case where the wafer 90 is sucked and held by the robot 6 shown in FIGS. 1 and 3 and the wafer 90 is transported by the robot 1 will be described.

首先,未圖示之馬達使圖1所示之主軸36旋轉,將機械手6設定成第1吸引部64及第2吸引部65的吸附面60朝向下側之狀態。接著,驅動部3的機械手水平移動機構34使機械手6水平移動,機械手6從開口44進入至片匣4的內部之預定的位置。亦即,將機械手6定位在圖4所示之晶圓90的上方,且定位成使已彎曲成圓頂狀之晶圓90的凸球面即背面906的中心位於機械手6的U字開口600內。又,將晶圓90的背面906的中心定位在圖1所示之機械手6的中心線602上。First, a motor (not shown) rotates the main shaft 36 shown in FIG. 1 to set the manipulator 6 so that the suction surfaces 60 of the first suction part 64 and the second suction part 65 face downward. Next, the manipulator horizontal movement mechanism 34 of the drive unit 3 moves the manipulator 6 horizontally, and the manipulator 6 enters a predetermined position inside the cassette 4 from the opening 44 . That is, the manipulator 6 is positioned above the wafer 90 shown in FIG. Within 600. Also, the center of the backside 906 of the wafer 90 is positioned on the centerline 602 of the manipulator 6 shown in FIG. 1 .

接著,圖5、圖6所示之機械手6下降,晶圓90的中央的圓頂狀之頂部分進入圖6所示之U字開口600內,並且使第1吸引部64及第2吸引部65接觸於晶圓90的背面906。此外,隨著機械手6下降,第1吸引部64(第2吸引部65)的複數個狹縫640(狹縫650)的寬度例如逐漸擴寬,藉此如圖5、圖6所示,第1吸引部64(第2吸引部65)沿著晶圓90的圓頂狀之凸球面即背面906像手指一樣地逐漸屈曲,因此背面906與朝向下方的吸附面60之接觸面積逐漸最大化,並且藉由第1吸引部64(第2吸引部65),晶圓90的已彎曲成圓頂狀之背面906的主要是中間區域從晶圓90的徑方向外側朝向中心側被逐漸按壓。Then, the manipulator 6 shown in FIG. 5 and FIG. 6 descends, and the dome-shaped top part of the center of the wafer 90 enters in the U-shaped opening 600 shown in FIG. 6, and the first suction part 64 and the second suction Portion 65 is in contact with backside 906 of wafer 90 . In addition, as the manipulator 6 descends, the widths of the plurality of slits 640 (slits 650) of the first suction part 64 (second suction part 65) gradually widen, for example, as shown in FIGS. 5 and 6 , The first suction part 64 (second suction part 65) gradually bends along the dome-shaped convex spherical surface of the wafer 90, that is, the back surface 906, like a finger, so that the contact area between the back surface 906 and the suction surface 60 facing downward is gradually maximized. , and by the first suction part 64 (the second suction part 65), the main middle area of the dome-shaped back surface 906 of the wafer 90 is gradually pressed from the radially outer side of the wafer 90 toward the center side.

此外,第1吸引部64(第2吸引部65)如圖5、圖6所示地逐漸屈曲,而讓背面906的+X方向側的外周區域接觸於剛性部66,因此不會有第1吸引部64(第2吸引部65)過度地屈曲到無法適當地進行晶圓90的吸引保持之情形。In addition, the first suction part 64 (second suction part 65) is gradually bent as shown in FIGS. The suction portion 64 (second suction portion 65 ) is so bent that the wafer 90 cannot be properly suctioned and held.

又,如圖5、圖6所示,當機械手6朝向晶圓90開始下降時,圖5、圖6所示之晶圓偵測感測器67的投光部671會將偵測光朝向下方,且按每單位時間開始射出。並且,和第1吸引部64(第2吸引部65)接觸於晶圓90而開始屈曲並行地,晶圓90的背面906的外周區域定位在剛性部66的前端側的區域所配置的投光部671的下方,且投光部671射出的偵測光將會藉由背面906而反射。並且,當來自於在高度方向上逐漸接近受光部672之背面906的反射光的由受光部672所接收之受光時間(從投光部671射出偵測光到接收反射光為止的時間)成為預先設定的預定時間以下後,即可辨識出背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化。或者,當受光部672的來自於在高度方向中逐漸接近之背面906的反射光的受光量成為預先設定的受光量以上後,即可辨識出背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化。 另外,晶圓90的背面906與屈曲的第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化一事的辨識,可藉由例如使圖1所示之機械手6升降的電動汽缸等之升降機構35的馬達控制等,從機械手6的高度位置來辨識。 Also, as shown in FIGS. 5 and 6, when the manipulator 6 begins to descend toward the wafer 90, the light projection part 671 of the wafer detection sensor 67 shown in FIGS. 5 and 6 will direct the detection light toward below, and starts shooting per unit of time. And, in parallel with the first suction part 64 (second suction part 65 ) coming into contact with the wafer 90 and starting to buckle, the light emitting device arranged in which the outer peripheral region of the back surface 906 of the wafer 90 is positioned in the region on the front end side of the rigid part 66 Below the part 671 , and the detection light emitted by the light projecting part 671 will be reflected by the back surface 906 . And, when the light receiving time (the time from emitting the detection light from the light projecting part 671 to receiving the reflected light) received by the light receiving part 672 from the reflected light gradually approaching the back surface 906 of the light receiving part 672 in the height direction becomes predetermined. After the set predetermined time or less, it can be recognized that the contact area between the back surface 906 and the suction surface 60 of the first suction part 64 and the second suction part 65 has been maximized. Alternatively, when the amount of light received by the light receiving portion 672 from the reflected light from the back surface 906 approaching gradually in the height direction becomes more than a preset light amount, the back surface 906 and the first suction portion 64 and the second suction portion can be recognized. The contact area of the adsorption surface 60 of 65 has been maximized. In addition, the recognition that the contact area between the back surface 906 of the wafer 90 and the suction surface 60 of the bent first suction part 64 and the second suction part 65 has been maximized can be obtained by, for example, raising and lowering the manipulator 6 shown in FIG. The motor control of the elevating mechanism 35, such as the electric cylinder, etc., is identified from the height position of the manipulator 6.

一旦進行上述辨識後,配設於圖5、圖6所示之外部配管692的未圖示之電磁閥會使吸引源69與機械手6的吸引口62連通,吸引源69所產生的吸引力便透過外部配管692及內部吸引路623從各吸引口62傳達到吸附面60。藉此,成為以下之狀態:在已屈曲的第1吸引部64及第2吸引部65的吸附面60與晶圓90的背面906之接觸面積已最大化之狀態下,機械手6在沒有真空漏氣的情形下吸引保持晶圓90。Once the above-mentioned identification is performed, the electromagnetic valve not shown in the external piping 692 shown in Figs. It is transmitted from each suction port 62 to the suction surface 60 through the external piping 692 and the internal suction passage 623 . Thereby, become following state: Under the state that the contact area of the suction surface 60 of the bent first suction part 64 and the second suction part 65 and the back surface 906 of the wafer 90 has been maximized, the manipulator 6 will be in the absence of vacuum. The wafer 90 is sucked and held in the event of an air leak.

接著,以圖1所示之升降機構35使機械手6上升,在吸引保持於機械手6的晶圓90的外周緣903從層架部45上分開的高度使升降機構35停止,且吸引保持住晶圓90的機械手6藉由機械手水平移動機構34朝+Y方向移動,晶圓90便藉由機械手6從片匣4搬出。Then, the manipulator 6 is raised with the elevating mechanism 35 shown in FIG. The manipulator 6 holding the wafer 90 is moved in the +Y direction by the manipulator horizontal movement mechanism 34 , and the wafer 90 is carried out from the cassette 4 by the manipulator 6 .

之後,例如,晶圓90藉由機器人1來搬送,讓未形成有器件等之背面906露出於上側,並以未圖示之磨削裝置的工作夾台來吸引保持,且使旋轉的磨削輪從晶圓90的上方下降,一邊使磨削磨石抵接於晶圓90之朝向上側的背面906一邊磨削,來薄化至預定的厚度。Afterwards, for example, the wafer 90 is transported by the robot 1, and the back surface 906 on which no devices are formed is exposed to the upper side, and is sucked and held by a chuck of a grinding device not shown in the figure, and the rotary grinding is carried out. The wheel descends from above the wafer 90 and grinds the wafer 90 to a predetermined thickness while bringing the grinding stone into contact with the upper surface 906 of the wafer 90 .

以下,針對以機械手6吸引保持已磨削且已薄化之圖7所示之晶圓90的情況進行說明。已薄化之晶圓90因為已被磨削而消除掉圓頂狀之彎曲,成為平坦的晶圓。 首先,將機械手6設定成第1吸引部64及第2吸引部65的吸附面60朝向下側之狀態,並且將機械手6定位成使晶圓90的背面906的中心位於機械手6的U字開口600(參照圖3)內。又,將晶圓90的背面906的中心定位在機械手6的中心線602上,並且定位成晶圓90的背面906的外周側的區域與剛性部66的下表面重疊預定面積。 Hereinafter, the case where the wafer 90 shown in FIG. 7 that has been ground and thinned is sucked and held by the robot arm 6 will be described. The thinned wafer 90 is flat because it has been ground to remove the domed bow. First, the manipulator 6 is set so that the suction surfaces 60 of the first suction part 64 and the second suction part 65 face downward, and the manipulator 6 is positioned so that the center of the back surface 906 of the wafer 90 is positioned at the center of the manipulator 6. Inside the U-shaped opening 600 (refer to FIG. 3 ). Also, the center of the back surface 906 of the wafer 90 is positioned on the center line 602 of the robot 6 , and the outer peripheral area of the back surface 906 of the wafer 90 overlaps the lower surface of the rigid portion 66 by a predetermined area.

接著,圖7所示之機械手6下降,並接觸於晶圓90的背面906。保持於例如未圖示之工作台的磨削後的晶圓90由於成為平坦的晶圓,因此第1吸引部64(第2吸引部65)不屈曲,直接使平坦的吸附面60接觸於晶圓90的平坦的背面906。又,晶圓偵測感測器67偵測出平坦的吸附面60已接觸於晶圓90的平坦的背面906,吸引源69所產生的吸引力便從各吸引口62傳達到吸附面60。藉此,成為機械手6以第1吸引部64及第2吸引部65各自的吸附面60吸引保持晶圓90之狀態。Then, the manipulator 6 shown in FIG. 7 descends and contacts the back surface 906 of the wafer 90 . Since the ground wafer 90 held on, for example, a table not shown is a flat wafer, the first suction part 64 (second suction part 65) does not bend, and the flat suction surface 60 directly contacts the wafer. The flat back 906 of the circle 90 . Moreover, the wafer detection sensor 67 detects that the flat suction surface 60 has been in contact with the flat back surface 906 of the wafer 90 , and the suction force generated by the suction source 69 is transmitted from each suction port 62 to the suction surface 60 . Thereby, the robot 6 becomes a state where the wafer 90 is sucked and held by the respective suction surfaces 60 of the first suction unit 64 and the second suction unit 65 .

以圖1所示之升降機構35使機械手6上升,將吸引保持於機械手6的晶圓90從未圖示之工作台搬出。在此,雖然因為圖7所示之施加於晶圓90的重力G1使得第1吸引部64(第2吸引部65)撓曲而與吸引保持的晶圓90一起下垂,但由於晶圓90的背面906的外周側的區域與剛性部66的下表面接觸預定面積,因此晶圓90會朝向剛性部66的該接觸部分施加將該接觸部分朝上方按壓的力G2,所以由第1吸引部64(第2吸引部65)的撓曲所造成之下垂不會變得過度而是落在適當的範圍,而可繼續進行由機械手6所進行之既薄且平坦的晶圓90的適當的吸引保持。另外,圖5所示之已彎曲的晶圓90以機械手6吸引保持的情況下,也因為與上述同樣的理由,由第1吸引部64(第2吸引部65)的撓曲所造成之下垂不會變得過度。The manipulator 6 is raised by the elevating mechanism 35 shown in FIG. 1, and the wafer 90 sucked and held by the manipulator 6 is carried out from a table not shown. Here, although the gravity G1 applied to the wafer 90 shown in FIG. The area on the outer peripheral side of the back surface 906 is in contact with the lower surface of the rigid part 66 by a predetermined area, and therefore the wafer 90 applies a force G2 that presses the contact part upward toward the contact part of the rigid part 66 , so the first suction part 64 The sagging caused by the deflection of (the second suction part 65) does not become excessive but falls within an appropriate range, and the appropriate suction of the thin and flat wafer 90 by the robot arm 6 can be continued. Keep. In addition, in the case where the bent wafer 90 shown in FIG. 5 is suctioned and held by the robot arm 6, it is caused by the deflection of the first suction part 64 (second suction part 65) for the same reason as above. Sagginess does not become excessive.

如上述,由於本發明之機械手6是不具備吸盤等之厚度薄的板狀之機械手,因此可以進入層架部45與層架部45之距離較小的片匣4之層架部45所載置的晶圓90的上方,且藉由使已進入片匣4內的機械手6下降,便能夠讓機械手6交互地形成的複數個狹縫640(狹縫650)的寬度變化,而使吸附面60以順應於晶圓90的圓頂狀之凸球面即背面906的方式進行接觸。並且,例如,當配置於機械手6的晶圓偵測感測器67起反應,晶圓偵測感測器67偵測到晶圓90,並辨識出晶圓90的背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化之後,使機械手6的吸引口62連通於吸引源69,便能夠在沒有真空漏氣的情形下適當地吸引保持已翹曲成圓頂狀之晶圓90。又,在例如磨削已彎曲成圓頂狀之晶圓90後,已變薄之晶圓90便不再彎曲。機械手6也可吸引保持此不再彎曲且已變薄之晶圓90,而且可以將加工後的晶圓90以不造成破裂的方式搬入收納未彎曲之晶圓90的片匣4。 另外,亦可構成為將荷重感測器配置在用以安裝機械手6的機器人1的支持器38,偵測將機械手6按壓於晶圓90的力。亦即,亦可由荷重感測器的值,辨識出吸附面60已順應於晶圓90的圓頂狀之凸球面即背面906,而使吸引口62連通於吸引源69。 As mentioned above, since the manipulator 6 of the present invention is a plate-shaped manipulator that does not have a thickness such as a suction cup, it can enter the shelf part 45 of the cassette 4 whose distance between the shelf part 45 and the shelf part 45 is small. Wafer 90 placed above, and by lowering the manipulator 6 that has entered the cassette 4, the widths of the plurality of slits 640 (slits 650 ) alternately formed by the manipulator 6 can be changed, And make the suction surface 60 contact in a manner conforming to the dome-shaped convex spherical surface of the wafer 90 , that is, the back surface 906 . And, for example, when the wafer detection sensor 67 configured on the manipulator 6 reacts, the wafer detection sensor 67 detects the wafer 90, and recognizes the back surface 906 of the wafer 90 and the first suction After the contact area of the suction surface 60 of the second suction part 64 and the second suction part 65 has been maximized, the suction port 62 of the manipulator 6 is connected to the suction source 69, so that it can be properly sucked and kept warped without vacuum leakage. Wafer 90 curved into a dome shape. Also, the thinned wafer 90 is no longer bent after, for example, grinding the dome-shaped wafer 90 . The manipulator 6 can also attract and hold the wafer 90 that is no longer bent and has become thinner, and can carry the processed wafer 90 into the cassette 4 that accommodates the unbent wafer 90 without causing breakage. In addition, a load sensor may be arranged on the supporter 38 of the robot 1 for mounting the robot 6 to detect the force pressing the robot 6 against the wafer 90 . That is, it can also be recognized from the value of the load sensor that the suction surface 60 has conformed to the dome-shaped convex spherical surface of the wafer 90 , that is, the back surface 906 , so that the suction port 62 is connected to the suction source 69 .

本發明之機械手6並不限定於上述實施形態,且當然可在其技術思想的範圍內以各種不同的形態來實施。又,關於在附加圖式中所圖示之機器人1或片匣4的各構成之形狀等、以及藉由機械手6吸引保持晶圓90並搬出的各步驟,也不限定於此,並可在可以發揮本發明之機械手6的效果的範圍內作適當變更。 例如,亦可在機械手6的第1吸引部64與第2吸引部65的上下兩表面各自形成吸引口62,使上表面及下表面各自成為吸附面。又,在本實施形態中,雖然機械手6是一面下降一面進行晶圓90的吸引保持,但亦可使圖2所示之晶圓90上下翻轉,從已將彎曲成圓頂狀之頂部分朝向下方來載置於片匣4的層架部45上之晶圓90的下方,使機械手6朝向晶圓90的凸球面且成為下表面的背面906上升接近,來使已接觸於晶圓90之第1吸引部64與第2吸引部65沿著晶圓90的凸球面像手指一樣地屈曲來進行吸引保持。 The manipulator 6 of the present invention is not limited to the above-mentioned embodiment, and it is of course possible to implement it in various forms within the scope of its technical idea. In addition, the shape of each structure of the robot 1 or the cassette 4 shown in the attached drawings, and each step of sucking and holding the wafer 90 by the robot 6 and carrying it out are not limited thereto, and may be Appropriate changes are made within the range in which the effects of the manipulator 6 of the present invention can be exhibited. For example, the suction openings 62 may be formed on the upper and lower surfaces of the first suction part 64 and the second suction part 65 of the manipulator 6, respectively, so that the upper surface and the lower surface each serve as a suction surface. Also, in the present embodiment, although the manipulator 6 is to carry out the suction and holding of the wafer 90 while descending, it is also possible to turn the wafer 90 shown in FIG. Facing downward, below the wafer 90 placed on the shelf portion 45 of the cassette 4, the manipulator 6 is raised towards the convex spherical surface of the wafer 90 and the back surface 906 which becomes the lower surface, so as to make the contact with the wafer The first suction part 64 and the second suction part 65 of the wafer 90 bend like fingers along the convex spherical surface of the wafer 90 to suction and hold the wafer 90 .

1:機器人 3:驅動部 4:片匣 6:機械手 30:機械手連結柱 31:第1臂 32:第2臂 34:機械手水平移動機構 35:升降機構 36:主軸 37:殼體 38:支持器 40:底板 41:頂板 42:後壁 43:側壁 44:開口 45:層架部 60:吸附面 61:安裝部 62:吸引口 64:第1吸引部 65:第2吸引部 66:剛性部 67:晶圓偵測感測器 69:吸引源 90:晶圓 340:臂驅動馬達 600:U字開口 602:中心線 623:內部吸引路 640,650:狹縫 660:安裝用凹陷 671:投光部 672:受光部 673:感測器罩殼 674:配線 692:外部配管 900:正面 903:外周緣 906:背面 G1:重力 G2:力 X,Y,Z:軸 +X,-X,+Y,-Y,+Z,-Z:方向 1: Robot 3: drive unit 4: Cassette 6: Manipulator 30: Manipulator connecting column 31: 1st arm 32: 2nd arm 34: Manipulator horizontal movement mechanism 35: Lifting mechanism 36:Spindle 37: Shell 38: Supporter 40: Bottom plate 41: top plate 42: rear wall 43: side wall 44: opening 45:shelves 60: adsorption surface 61: Installation department 62: suction port 64: Part 1 Attraction 65: Part 2 Attraction 66: Rigid part 67: Wafer detection sensor 69: Source of Attraction 90: Wafer 340: Arm drive motor 600:U opening 602: Centerline 623: Internal attraction road 640,650: Slits 660: Recess for installation 671: Projector 672: Light receiving part 673: Sensor housing 674: Wiring 692: External piping 900: front 903: outer periphery 906: back G1: Gravity G2: force X, Y, Z: axes +X,-X,+Y,-Y,+Z,-Z: direction

圖1是顯示容置晶圓的片匣及具備本發明之機械手的機器人之一例的立體圖。 圖2是說明已容置於片匣之具備圓頂狀之彎曲之晶圓的剖面圖。 圖3是顯示將吸附面朝向上側之狀態的機械手之一例的立體圖。 圖4是顯示機械手為了接觸於已彎曲成圓頂狀之晶圓的凸球面即上表面(背面)而下降之狀態的側面圖。 圖5是顯示機械手對已彎曲成圓頂狀之晶圓的凸球面即上表面一邊沿著晶圓的凸球面像手指一樣地屈曲而順應一邊接觸之狀態的側面圖。 圖6是顯示機械手對已彎曲成圓頂狀之晶圓的凸球面即上表面一邊沿著晶圓的凸球面像手指一樣地屈曲而順應一邊接觸之狀態的平面圖。 圖7是說明機械手吸引保持磨削後的平坦的晶圓之狀態的側面圖。 FIG. 1 is a perspective view showing an example of a cassette for accommodating wafers and a robot including a robot arm of the present invention. FIG. 2 is a cross-sectional view illustrating a dome-shaped curved wafer accommodated in a cassette. Fig. 3 is a perspective view showing an example of the manipulator with the suction surface directed upward. 4 is a side view showing a state in which the manipulator is lowered to touch the convex spherical surface of the dome-shaped wafer, that is, the upper surface (back surface). FIG. 5 is a side view showing a state in which a manipulator touches the convex spherical surface of a wafer bent into a dome shape, that is, the upper surface while bending along the convex spherical surface of the wafer like a finger and conforming. 6 is a plan view showing a state where a manipulator touches the convex spherical surface of a wafer bent into a dome shape, that is, the upper surface while flexing and conforming along the convex spherical surface of the wafer like a finger. 7 is a side view illustrating a state in which a robot arm sucks and holds a ground flat wafer.

1:機器人 1: Robot

3:驅動部 3: drive unit

4:片匣 4: Cassette

6:機械手 6: Manipulator

30:機械手連結柱 30: Manipulator connecting column

31:第1臂 31: 1st arm

32:第2臂 32: 2nd arm

34:機械手水平移動機構 34: Manipulator horizontal movement mechanism

35:升降機構 35: Lifting mechanism

36:主軸 36:Spindle

37:殼體 37: Shell

38:支持器 38: Supporter

40:底板 40: Bottom plate

41:頂板 41: top plate

42:後壁 42: rear wall

43:側壁 43: side wall

44:開口 44: opening

45:層架部 45:shelves

60:吸附面 60: adsorption surface

61:安裝部 61: Installation department

62:吸引口 62: suction port

64:第1吸引部 64: Part 1 Attraction

65:第2吸引部 65: Part 2 Attraction

66:剛性部 66: Rigid part

67:晶圓偵測感測器 67: Wafer detection sensor

69:吸引源 69: Source of Attraction

90:晶圓 90: Wafer

340:臂驅動馬達 340: Arm drive motor

600:U字開口 600:U opening

602:中心線 602: Centerline

623:內部吸引路 623: Internal attraction road

640,650:狹縫 640,650: Slits

671:投光部 671: Projector

672:受光部 672: Light receiving part

692:外部配管 692: External piping

900:正面 900: front

903:外周緣 903: outer periphery

906:背面 906: back

+X,-X,+Y,-Y,+Z,-Z:方向 +X,-X,+Y,-Y,+Z,-Z: direction

Claims (1)

一種機械手,為板狀之機械手,安裝於機器人,且在吸附面具備有吸引口,前述吸引口吸引保持已彎曲成圓頂狀之晶圓的凸球面,前述機械手具備: 安裝部,配置於後端,且安裝於該機器人;及 第1吸引部與第2吸引部,成為機械手的前端側,且形成為呈分叉,並配置有吸引該晶圓的該吸引口, 該第1吸引部與該第2吸引部交互地形成有複數個狹縫而可沿著該晶圓的該凸球面像手指一樣地屈曲。 A manipulator is a plate-shaped manipulator installed on a robot, and has a suction port on the adsorption surface. The suction port attracts and holds the convex spherical surface of the wafer that has been bent into a dome shape. The manipulator has: the installation part is arranged at the rear end and is installed on the robot; and The first suction part and the second suction part become the front end side of the manipulator, and are formed to be bifurcated, and the suction port for sucking the wafer is arranged, A plurality of slits are alternately formed in the first suction part and the second suction part so as to bend like fingers along the convex spherical surface of the wafer.
TW111145040A 2021-12-09 2022-11-24 Robot hand capable of depositing and removing wafers without causing breaking TW202324583A (en)

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