TW202324583A - Robot hand capable of depositing and removing wafers without causing breaking - Google Patents
Robot hand capable of depositing and removing wafers without causing breaking Download PDFInfo
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- TW202324583A TW202324583A TW111145040A TW111145040A TW202324583A TW 202324583 A TW202324583 A TW 202324583A TW 111145040 A TW111145040 A TW 111145040A TW 111145040 A TW111145040 A TW 111145040A TW 202324583 A TW202324583 A TW 202324583A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/0014—Gripping heads and other end effectors having fork, comb or plate shaped means for engaging the lower surface on a object to be transported
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J15/00—Gripping heads and other end effectors
- B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means
- B25J15/0616—Gripping heads and other end effectors with vacuum or magnetic holding means with vacuum
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Description
本發明是有關於一種保持晶圓的板狀之機械手。The invention relates to a plate-shaped manipulator for holding wafers.
在以機械手吸引保持已翹曲成圓頂狀之晶圓而從片匣搬出時,使用的是如專利文獻1所揭示之具備有吸盤的機械手。為了以這種包含吸盤之整體厚度較厚的機械手來將收納在片匣之晶圓搬出,而將片匣之載置晶圓的層架與層架之距離設得較大。因此,導致可以收納在片匣之晶圓的片數變少,而有更換片匣的頻率變多的問題。When the warped dome-shaped wafer is sucked and held by a robot to be carried out from the cassette, a robot equipped with a suction cup as disclosed in
為了解決這種問題,為了可以將收納在層架與層架之距離較小的片匣之晶圓搬出,而如例如專利文獻2所揭示,使用的是具備有將晶圓的外周部分吸引保持之吸盤的機械手。 先前技術文獻 專利文獻 In order to solve this problem, in order to be able to carry out the wafers stored in the cassettes with a small distance between the shelf and the shelf, as disclosed in Patent Document 2, for example, a device that sucks and holds the outer peripheral portion of the wafer is used. The manipulator of the suction cup. prior art literature patent documents
專利文獻1:日本專利特開2020-202324號公報 專利文獻2:日本專利特開2017-045784號公報 Patent Document 1: Japanese Patent Laid-Open No. 2020-202324 Patent Document 2: Japanese Patent Laid-Open No. 2017-045784
發明欲解決之課題 但是,在如專利文獻2所揭示之機械手中,在晶圓較薄的情況下,會有保持住的晶圓破裂的問題。 從而,所要求的是一種即使片匣的層架與層架之距離較小,仍可將晶圓以不造成破裂的方式進行取出放入的機械手。 The problem to be solved by the invention However, in the manipulator disclosed in Patent Document 2, when the wafer is thin, there is a problem of cracking the held wafer. Therefore, what is required is a manipulator that can take out and put wafers in without causing breakage even if the distance between the shelves of the cassette is small.
用以解決課題之手段 用以解決上述課題之本發明是一種機械手,為板狀之機械手,安裝於機器人,且在吸附面具備有吸引口,前述吸引口吸引保持已彎曲成圓頂狀之晶圓的凸球面,前述機械手具備:安裝部,配置於後端,且安裝於該機器人;及第1吸引部與第2吸引部,成為機械手的前端側,且形成為呈分叉,並配置有吸引該晶圓的該吸引口,該第1吸引部與該第2吸引部交互地形成有複數個狹縫而可沿著該晶圓的該凸球面像手指一樣地屈曲。 means to solve problems The present invention to solve the above-mentioned problems is a manipulator, which is a plate-shaped manipulator, installed on a robot, and has a suction port on the suction surface, and the suction port sucks and holds the convex spherical surface of the wafer that has been bent into a dome shape. , the above-mentioned manipulator has: a mounting part, arranged at the rear end, and installed on the robot; The suction port of the wafer, the first suction part and the second suction part are alternately formed with a plurality of slits so as to bend like fingers along the convex spherical surface of the wafer.
發明效果 由於本發明之機械手是不具備吸盤等之厚度薄的板狀之機械手,因此可以進入層架與層架之距離較小的片匣之該層架所載置的晶圓的上方,且藉由使已進入片匣內的機械手例如下降,便能夠讓機械手交互地形成的複數個狹縫的寬度擴大,而使吸附面以沿著晶圓的圓頂狀之凸球面順應的方式接觸於晶圓。並且,例如,當配置於機械手的晶圓辨識感測器起反應,且晶圓辨識感測器成為開啟(ON)後,使機械手的吸引口連通於吸引源,便能夠在沒有真空漏氣的情形下適當地吸引保持已彎曲成圓頂狀之晶圓。又,在例如磨削已彎曲成圓頂狀之晶圓後,已變薄之晶圓便不再彎曲。機械手也可吸引保持此不再彎曲且已變薄之晶圓,而且可以將加工後的晶圓以不造成破裂的方式搬入收納未彎曲之晶圓的片匣。 Invention effect Since the manipulator of the present invention is a thin plate-shaped manipulator that does not have a suction cup, etc., it can enter above the wafers placed on the shelf of the cassette with a relatively small distance between the shelf and the shelf, and For example, by lowering the manipulator that has entered the cassette, the width of the plurality of slits formed alternately by the manipulator can be expanded, and the suction surface can be conformed along the dome-shaped convex spherical surface of the wafer. contact with the wafer. And, for example, when the wafer recognition sensor disposed on the manipulator reacts and the wafer recognition sensor is turned on (ON), the suction port of the manipulator is connected to the suction source, so that there is no vacuum leak. Appropriate suction and retention of dome-shaped wafers in the presence of air. Also, the thinned wafer is no longer bent after, for example, grinding a dome-shaped wafer. The manipulator can also attract and hold the unbent and thinned wafers, and can move the processed wafers into the cassettes for unbent wafers without causing breakage.
用以實施發明之形態
圖1所示之機器人1是用於將例如容置於片匣4之已彎曲成圓頂狀之晶圓90從片匣4搬出,或是載置於未圖示之工作夾台或定心工作台,或搬是入片匣4之機器人,且是具備有本發明之機械手6,例如配設於未圖示之磨削裝置、研磨裝置或刀具切削裝置上之機器人。
form for carrying out the invention
The
圖1所示之片匣4例如具有底板40、頂板41、後壁42、左右的2片側壁43及前方側(+Y方向側)的開口44,且成為可以將晶圓90從開口44搬出搬入的構成。在片匣4的內部,在上下方向上隔著預定的間隔而形成有複數個層架部45,且可以在層架部45中一片一片地容置晶圓90。另外,片匣4的構成並不限定於本例。The
圖1、圖2所示之平面視角下呈圓形狀之晶圓90是例如矽晶圓等,且因為從晶圓90的中心朝向外周緣903逐漸地翹曲而彎曲成圓頂狀。亦即,此圓頂狀之彎曲是指例如像是以下之彎曲:在將正面900朝向下側來將晶圓90載置於片匣4的層架部45時,晶圓90的正面900從其中央側的區域朝向外周側的區域逐漸地變低。並且,晶圓90的外周緣903接觸於片匣4的層架部45,且晶圓90是以凸球面即背面906朝向上側之狀態載置於層架部45。
作為已彎曲成圓頂狀之晶圓90之一例,形成有未圖示之器件等的正面900有被樹脂密封,且該圓頂狀之彎曲是以例如樹脂密封時變硬之樹脂的收縮力等為主要原因。
The
圖1所示之機器人1是多關節型機器人,且具備有使機械手6移動到預定的位置的驅動部3。驅動部3例如具備有:長條板狀之第1臂31;長條板狀之第2臂32;機械手連結柱30,在Z軸方向上延伸;機械手水平移動機構34,使機械手6在水平方向上移動;及簡化顯示的升降機構35。A
在機械手連結柱30的下端連結有第1臂31的一端的上表面。在第1臂31的另一端的下表面透過未圖示之旋繞軸等而連結有第2臂32的一端的上表面。第2臂32的另一端側的下表面側是透過臂驅動馬達340而連結於升降機構35。The upper surface of one end of the
升降機構35是例如電動汽缸等,使機械手6在Z軸方向上升降。機械手水平移動機構34是由配設於第1臂31及第2臂32內的未圖示之無端皮帶、未圖示之皮帶輪及臂驅動馬達340等所構成的皮帶輪機構等。又,機器人1整體可以藉由未圖示之馬達所產生的旋轉力,以Z軸為軸而在水平面內(X軸Y軸平面內)旋繞。又,藉由臂驅動馬達340所產生的旋轉力,可以一面使第1臂31及第2臂32在水平面內移動成相互交叉或直線狀地排列,一面使機械手6在水平面內直線運動。The
在機械手連結柱30的上端側固定有殼體37,前述殼體37將主軸36支撐成可旋轉,前述主軸36具有在圖1中與鉛直方向(Z軸方向)正交的X軸方向的軸心。例如,在殼體37的內部容置有旋轉驅動主軸36之未圖示的馬達。On the upper end side of the
主軸36的前端側是從殼體37朝-X方向突出,且在此前端側配設有供機械手6的後端側裝設的支持器38。隨著未圖示之馬達使主軸36旋轉,透過支持器38連接於主軸36的機械手6便會旋轉,而使機械手6的吸附面60與機械手6的吸附面60的相反面上下翻轉。The front end side of the
圖1、圖3所示之本發明之板狀之機械手6具備有:安裝部61,配置於成為支持器38側的後端,且安裝於機器人1;及第1吸引部64與第2吸引部65,成為機械手6的前端側,且形成為在平面視角下呈分叉,並配置有吸引晶圓90的吸引口62。並且,第1吸引部64與第2吸引部65的正面成為具有吸引口62的吸附面60,前述吸引口62吸引保持已彎曲成圓頂狀之晶圓90(參照圖2)的凸球面即背面906。在第1吸引部64與第2吸引部65沒有被施加外力而未屈曲之狀態下,各自的吸附面60成為平坦面。The plate-
整體以樹脂板等所構成之機械手6是讓要吸引保持的晶圓90的圓頂狀之頂部分即中央區域進入第1吸引部64與第2吸引部65之間的U字開口600。圖3所示之成為機械手6的後端之安裝部61是例如形成為平面視角下呈矩形狀。從安裝部61朝向機械手6的前端側一體地延伸有寬度比安裝部61更寬之平面視角下呈大致矩形狀之剛性部66。安裝部61在厚度方向上貫通形成有未圖示之螺絲貫通孔,且被螺栓固定於支持器38。The
在圖3所示之剛性部66中,用於安裝感測器罩殼673的安裝用凹陷660是切割成配合感測器罩殼673的形狀延伸至安裝部61附近而形成,前述感測器罩殼673是用於供機械手6偵測晶圓90的晶圓偵測感測器67的一部分。In the
晶圓偵測感測器67例如具備有:投光部671,射出偵測光;受光部672,接收從投光部671射出的偵測光在晶圓90反射的反射光;及感測器罩殼673,容置投光部671、受光部672及連接於投光部671或受光部672的配線674等。投光部671與受光部672是橫向排列,且定位在成為U字開口600的附近之剛性部66的前端的中央區域。另外,晶圓偵測感測器67並不限定於如上述之復歸反射型的光電感測器,亦可為例如感壓感測器、電容感測器等。The
與剛性部66一體地形成為在平面視角下呈分叉之第1吸引部64與第2吸引部65是例如以機械手6的中心線602為軸而成為線對稱。第1吸引部64(第2吸引部65)交互地形成有複數個狹縫640(狹縫650)而為可沿著所接觸的晶圓90的凸球面即背面906像手指一樣地屈曲。亦即,整體形成為長條狀之第1吸引部64(第2吸引部65)是在與其延伸方向正交的方向上,從U字開口600側(內側)及外側交互且彼此平行地切割出預定長度的直線狀之狹縫640(狹縫650),藉此,第1吸引部64(第2吸引部65)具有可主要朝厚度方向撓曲的柔軟性。另外,複數個直線狀之狹縫640(狹縫650)並不限定於彼此平行地切割而形成的形態,亦可配合晶圓90的圓頂狀之凸球面的曲率等,來改變其缺口方向的角度而設定。The
如圖3所示,例如大致圓形之吸引口62是在第1吸引部64及第2吸引部65的前端側與根部側各1個,在機械手6整體中例如合計4個開口於吸附面60。另外,吸引口62的數量或配設處並不限定於圖3所示之例。在各吸引口62各自連通有內部吸引路623。內部吸引路623在第1吸引部64(第2吸引部65)的內部形成為鋸齒狀,此外,通過剛性部66及安裝部61的內部,其另一端作為吸引力傳達口而開口於安裝部61的正面。並且,在該吸引力傳達口透過外部配管692而連通有真空產生裝置等之吸引源69,前述外部配管692具備可撓性而不會妨礙接頭及機械手6的旋繞動作等。例如,在外部配管692中配設有未圖示之電磁閥,前述電磁閥可切換為將吸引口62連通於吸引源69之狀態與非連通之狀態。As shown in FIG. 3 , for example, a substantially
例如,第1吸引部64及第2吸引部65的吸附面60、剛性部66的正面以及埋設於安裝用凹陷660的晶圓偵測感測器67的露出面成為面齊平的平坦面。又,亦可在第1吸引部64及第2吸引部65的端部(稜線)施行倒角,以免在接觸於晶圓90的情況下傷到晶圓90。For example, the
以下,針對藉由圖1、圖3所示之機械手6來吸引保持晶圓90,並且藉由機器人1來搬送晶圓90的情況下之機械手6的動作及機器人1的動作進行說明。Next, the operation of the
首先,未圖示之馬達使圖1所示之主軸36旋轉,將機械手6設定成第1吸引部64及第2吸引部65的吸附面60朝向下側之狀態。接著,驅動部3的機械手水平移動機構34使機械手6水平移動,機械手6從開口44進入至片匣4的內部之預定的位置。亦即,將機械手6定位在圖4所示之晶圓90的上方,且定位成使已彎曲成圓頂狀之晶圓90的凸球面即背面906的中心位於機械手6的U字開口600內。又,將晶圓90的背面906的中心定位在圖1所示之機械手6的中心線602上。First, a motor (not shown) rotates the
接著,圖5、圖6所示之機械手6下降,晶圓90的中央的圓頂狀之頂部分進入圖6所示之U字開口600內,並且使第1吸引部64及第2吸引部65接觸於晶圓90的背面906。此外,隨著機械手6下降,第1吸引部64(第2吸引部65)的複數個狹縫640(狹縫650)的寬度例如逐漸擴寬,藉此如圖5、圖6所示,第1吸引部64(第2吸引部65)沿著晶圓90的圓頂狀之凸球面即背面906像手指一樣地逐漸屈曲,因此背面906與朝向下方的吸附面60之接觸面積逐漸最大化,並且藉由第1吸引部64(第2吸引部65),晶圓90的已彎曲成圓頂狀之背面906的主要是中間區域從晶圓90的徑方向外側朝向中心側被逐漸按壓。Then, the
此外,第1吸引部64(第2吸引部65)如圖5、圖6所示地逐漸屈曲,而讓背面906的+X方向側的外周區域接觸於剛性部66,因此不會有第1吸引部64(第2吸引部65)過度地屈曲到無法適當地進行晶圓90的吸引保持之情形。In addition, the first suction part 64 (second suction part 65) is gradually bent as shown in FIGS. The suction portion 64 (second suction portion 65 ) is so bent that the
又,如圖5、圖6所示,當機械手6朝向晶圓90開始下降時,圖5、圖6所示之晶圓偵測感測器67的投光部671會將偵測光朝向下方,且按每單位時間開始射出。並且,和第1吸引部64(第2吸引部65)接觸於晶圓90而開始屈曲並行地,晶圓90的背面906的外周區域定位在剛性部66的前端側的區域所配置的投光部671的下方,且投光部671射出的偵測光將會藉由背面906而反射。並且,當來自於在高度方向上逐漸接近受光部672之背面906的反射光的由受光部672所接收之受光時間(從投光部671射出偵測光到接收反射光為止的時間)成為預先設定的預定時間以下後,即可辨識出背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化。或者,當受光部672的來自於在高度方向中逐漸接近之背面906的反射光的受光量成為預先設定的受光量以上後,即可辨識出背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化。
另外,晶圓90的背面906與屈曲的第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化一事的辨識,可藉由例如使圖1所示之機械手6升降的電動汽缸等之升降機構35的馬達控制等,從機械手6的高度位置來辨識。
Also, as shown in FIGS. 5 and 6, when the
一旦進行上述辨識後,配設於圖5、圖6所示之外部配管692的未圖示之電磁閥會使吸引源69與機械手6的吸引口62連通,吸引源69所產生的吸引力便透過外部配管692及內部吸引路623從各吸引口62傳達到吸附面60。藉此,成為以下之狀態:在已屈曲的第1吸引部64及第2吸引部65的吸附面60與晶圓90的背面906之接觸面積已最大化之狀態下,機械手6在沒有真空漏氣的情形下吸引保持晶圓90。Once the above-mentioned identification is performed, the electromagnetic valve not shown in the
接著,以圖1所示之升降機構35使機械手6上升,在吸引保持於機械手6的晶圓90的外周緣903從層架部45上分開的高度使升降機構35停止,且吸引保持住晶圓90的機械手6藉由機械手水平移動機構34朝+Y方向移動,晶圓90便藉由機械手6從片匣4搬出。Then, the
之後,例如,晶圓90藉由機器人1來搬送,讓未形成有器件等之背面906露出於上側,並以未圖示之磨削裝置的工作夾台來吸引保持,且使旋轉的磨削輪從晶圓90的上方下降,一邊使磨削磨石抵接於晶圓90之朝向上側的背面906一邊磨削,來薄化至預定的厚度。Afterwards, for example, the
以下,針對以機械手6吸引保持已磨削且已薄化之圖7所示之晶圓90的情況進行說明。已薄化之晶圓90因為已被磨削而消除掉圓頂狀之彎曲,成為平坦的晶圓。
首先,將機械手6設定成第1吸引部64及第2吸引部65的吸附面60朝向下側之狀態,並且將機械手6定位成使晶圓90的背面906的中心位於機械手6的U字開口600(參照圖3)內。又,將晶圓90的背面906的中心定位在機械手6的中心線602上,並且定位成晶圓90的背面906的外周側的區域與剛性部66的下表面重疊預定面積。
Hereinafter, the case where the
接著,圖7所示之機械手6下降,並接觸於晶圓90的背面906。保持於例如未圖示之工作台的磨削後的晶圓90由於成為平坦的晶圓,因此第1吸引部64(第2吸引部65)不屈曲,直接使平坦的吸附面60接觸於晶圓90的平坦的背面906。又,晶圓偵測感測器67偵測出平坦的吸附面60已接觸於晶圓90的平坦的背面906,吸引源69所產生的吸引力便從各吸引口62傳達到吸附面60。藉此,成為機械手6以第1吸引部64及第2吸引部65各自的吸附面60吸引保持晶圓90之狀態。Then, the
以圖1所示之升降機構35使機械手6上升,將吸引保持於機械手6的晶圓90從未圖示之工作台搬出。在此,雖然因為圖7所示之施加於晶圓90的重力G1使得第1吸引部64(第2吸引部65)撓曲而與吸引保持的晶圓90一起下垂,但由於晶圓90的背面906的外周側的區域與剛性部66的下表面接觸預定面積,因此晶圓90會朝向剛性部66的該接觸部分施加將該接觸部分朝上方按壓的力G2,所以由第1吸引部64(第2吸引部65)的撓曲所造成之下垂不會變得過度而是落在適當的範圍,而可繼續進行由機械手6所進行之既薄且平坦的晶圓90的適當的吸引保持。另外,圖5所示之已彎曲的晶圓90以機械手6吸引保持的情況下,也因為與上述同樣的理由,由第1吸引部64(第2吸引部65)的撓曲所造成之下垂不會變得過度。The
如上述,由於本發明之機械手6是不具備吸盤等之厚度薄的板狀之機械手,因此可以進入層架部45與層架部45之距離較小的片匣4之層架部45所載置的晶圓90的上方,且藉由使已進入片匣4內的機械手6下降,便能夠讓機械手6交互地形成的複數個狹縫640(狹縫650)的寬度變化,而使吸附面60以順應於晶圓90的圓頂狀之凸球面即背面906的方式進行接觸。並且,例如,當配置於機械手6的晶圓偵測感測器67起反應,晶圓偵測感測器67偵測到晶圓90,並辨識出晶圓90的背面906與第1吸引部64及第2吸引部65的吸附面60之接觸面積已最大化之後,使機械手6的吸引口62連通於吸引源69,便能夠在沒有真空漏氣的情形下適當地吸引保持已翹曲成圓頂狀之晶圓90。又,在例如磨削已彎曲成圓頂狀之晶圓90後,已變薄之晶圓90便不再彎曲。機械手6也可吸引保持此不再彎曲且已變薄之晶圓90,而且可以將加工後的晶圓90以不造成破裂的方式搬入收納未彎曲之晶圓90的片匣4。
另外,亦可構成為將荷重感測器配置在用以安裝機械手6的機器人1的支持器38,偵測將機械手6按壓於晶圓90的力。亦即,亦可由荷重感測器的值,辨識出吸附面60已順應於晶圓90的圓頂狀之凸球面即背面906,而使吸引口62連通於吸引源69。
As mentioned above, since the
本發明之機械手6並不限定於上述實施形態,且當然可在其技術思想的範圍內以各種不同的形態來實施。又,關於在附加圖式中所圖示之機器人1或片匣4的各構成之形狀等、以及藉由機械手6吸引保持晶圓90並搬出的各步驟,也不限定於此,並可在可以發揮本發明之機械手6的效果的範圍內作適當變更。
例如,亦可在機械手6的第1吸引部64與第2吸引部65的上下兩表面各自形成吸引口62,使上表面及下表面各自成為吸附面。又,在本實施形態中,雖然機械手6是一面下降一面進行晶圓90的吸引保持,但亦可使圖2所示之晶圓90上下翻轉,從已將彎曲成圓頂狀之頂部分朝向下方來載置於片匣4的層架部45上之晶圓90的下方,使機械手6朝向晶圓90的凸球面且成為下表面的背面906上升接近,來使已接觸於晶圓90之第1吸引部64與第2吸引部65沿著晶圓90的凸球面像手指一樣地屈曲來進行吸引保持。
The
1:機器人
3:驅動部
4:片匣
6:機械手
30:機械手連結柱
31:第1臂
32:第2臂
34:機械手水平移動機構
35:升降機構
36:主軸
37:殼體
38:支持器
40:底板
41:頂板
42:後壁
43:側壁
44:開口
45:層架部
60:吸附面
61:安裝部
62:吸引口
64:第1吸引部
65:第2吸引部
66:剛性部
67:晶圓偵測感測器
69:吸引源
90:晶圓
340:臂驅動馬達
600:U字開口
602:中心線
623:內部吸引路
640,650:狹縫
660:安裝用凹陷
671:投光部
672:受光部
673:感測器罩殼
674:配線
692:外部配管
900:正面
903:外周緣
906:背面
G1:重力
G2:力
X,Y,Z:軸
+X,-X,+Y,-Y,+Z,-Z:方向
1: Robot
3: drive unit
4: Cassette
6: Manipulator
30: Manipulator connecting column
31: 1st arm
32: 2nd arm
34: Manipulator horizontal movement mechanism
35: Lifting mechanism
36:Spindle
37: Shell
38: Supporter
40: Bottom plate
41: top plate
42: rear wall
43: side wall
44: opening
45:shelves
60: adsorption surface
61: Installation department
62: suction port
64:
圖1是顯示容置晶圓的片匣及具備本發明之機械手的機器人之一例的立體圖。 圖2是說明已容置於片匣之具備圓頂狀之彎曲之晶圓的剖面圖。 圖3是顯示將吸附面朝向上側之狀態的機械手之一例的立體圖。 圖4是顯示機械手為了接觸於已彎曲成圓頂狀之晶圓的凸球面即上表面(背面)而下降之狀態的側面圖。 圖5是顯示機械手對已彎曲成圓頂狀之晶圓的凸球面即上表面一邊沿著晶圓的凸球面像手指一樣地屈曲而順應一邊接觸之狀態的側面圖。 圖6是顯示機械手對已彎曲成圓頂狀之晶圓的凸球面即上表面一邊沿著晶圓的凸球面像手指一樣地屈曲而順應一邊接觸之狀態的平面圖。 圖7是說明機械手吸引保持磨削後的平坦的晶圓之狀態的側面圖。 FIG. 1 is a perspective view showing an example of a cassette for accommodating wafers and a robot including a robot arm of the present invention. FIG. 2 is a cross-sectional view illustrating a dome-shaped curved wafer accommodated in a cassette. Fig. 3 is a perspective view showing an example of the manipulator with the suction surface directed upward. 4 is a side view showing a state in which the manipulator is lowered to touch the convex spherical surface of the dome-shaped wafer, that is, the upper surface (back surface). FIG. 5 is a side view showing a state in which a manipulator touches the convex spherical surface of a wafer bent into a dome shape, that is, the upper surface while bending along the convex spherical surface of the wafer like a finger and conforming. 6 is a plan view showing a state where a manipulator touches the convex spherical surface of a wafer bent into a dome shape, that is, the upper surface while flexing and conforming along the convex spherical surface of the wafer like a finger. 7 is a side view illustrating a state in which a robot arm sucks and holds a ground flat wafer.
1:機器人 1: Robot
3:驅動部 3: drive unit
4:片匣 4: Cassette
6:機械手 6: Manipulator
30:機械手連結柱 30: Manipulator connecting column
31:第1臂 31: 1st arm
32:第2臂 32: 2nd arm
34:機械手水平移動機構 34: Manipulator horizontal movement mechanism
35:升降機構 35: Lifting mechanism
36:主軸 36:Spindle
37:殼體 37: Shell
38:支持器 38: Supporter
40:底板 40: Bottom plate
41:頂板 41: top plate
42:後壁 42: rear wall
43:側壁 43: side wall
44:開口 44: opening
45:層架部 45:shelves
60:吸附面 60: adsorption surface
61:安裝部 61: Installation department
62:吸引口 62: suction port
64:第1吸引部
64:
65:第2吸引部 65: Part 2 Attraction
66:剛性部 66: Rigid part
67:晶圓偵測感測器 67: Wafer detection sensor
69:吸引源 69: Source of Attraction
90:晶圓 90: Wafer
340:臂驅動馬達 340: Arm drive motor
600:U字開口 600:U opening
602:中心線 602: Centerline
623:內部吸引路 623: Internal attraction road
640,650:狹縫 640,650: Slits
671:投光部 671: Projector
672:受光部 672: Light receiving part
692:外部配管 692: External piping
900:正面 900: front
903:外周緣 903: outer periphery
906:背面 906: back
+X,-X,+Y,-Y,+Z,-Z:方向 +X,-X,+Y,-Y,+Z,-Z: direction
Claims (1)
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Application Number | Priority Date | Filing Date | Title |
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JP2021-200040 | 2021-12-09 | ||
JP2021200040A JP2023085799A (en) | 2021-12-09 | 2021-12-09 | robot hand |
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Publication Number | Publication Date |
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TW202324583A true TW202324583A (en) | 2023-06-16 |
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TW111145040A TW202324583A (en) | 2021-12-09 | 2022-11-24 | Robot hand capable of depositing and removing wafers without causing breaking |
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KR (1) | KR20230087386A (en) |
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- 2021-12-09 JP JP2021200040A patent/JP2023085799A/en active Pending
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