TW202324574A - Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck - Google Patents

Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck Download PDF

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Publication number
TW202324574A
TW202324574A TW111145288A TW111145288A TW202324574A TW 202324574 A TW202324574 A TW 202324574A TW 111145288 A TW111145288 A TW 111145288A TW 111145288 A TW111145288 A TW 111145288A TW 202324574 A TW202324574 A TW 202324574A
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Taiwan
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workpiece
holding
suction table
adhesive film
holding surface
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TW111145288A
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Chinese (zh)
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陳曄
増田洋平
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

An object of the present invention is to suppress deviation of a workpiece without using an electrostatic chuck. A holding mechanism 2 is a mechanism for holding a workpiece, and includes: a suction table 10 having a holding surface 141 for holding the workpiece by suction; a vacuum chamber 40 that accommodates the suction table 10 and is capable of reducing a pressure in the interior; and a deviation prevention means 70 for preventing deviation of the workpiece when the pressure inside the vacuum chamber 40 is reduced while the workpiece is sucked and held by the suction table 10 . At least part of the holding surface 141 of the suction table 10 is formed of a tack layer 14 having adhesion, and the suction table 10 also serves as the deviation prevention means 70.

Description

保持機構及黏貼裝置Holding mechanism and pasting device

本發明係關於一種保持工件之保持機構及黏貼裝置。The invention relates to a holding mechanism and a pasting device for holding workpieces.

例如在半導體元件的製造步驟中,將各種膠膜黏貼於半導體晶圓之膠膜黏貼裝置(例如,參照專利文獻1及專利文獻2)被廣泛利用。For example, in the manufacturing process of a semiconductor element, the adhesive film sticking apparatus which sticks various adhesive films to a semiconductor wafer (for example, refer patent document 1 and patent document 2) is widely used.

另一方面,被稱為真空黏貼機之在減壓環境內將膠膜黏貼於晶圓之膠膜黏貼裝置(例如,參照專利文獻3)亦被廣泛利用。此種膠膜黏貼裝置在減壓環境內將膠膜黏貼於晶圓之後,以與大氣的差壓而使膠膜與晶圓密接,防止在晶圓與膠膜之間形成氣泡。 [習知技術文獻] [專利文獻] On the other hand, an adhesive film attaching device called a vacuum attacher that attaches an adhesive film to a wafer in a reduced pressure environment (for example, refer to Patent Document 3) is also widely used. This kind of adhesive film sticking device sticks the adhesive film to the wafer in a decompressed environment, and uses the differential pressure from the atmosphere to make the adhesive film and the wafer tightly bonded, preventing the formation of air bubbles between the wafer and the adhesive film. [Prior art literature] [Patent Document]

[專利文獻1]日本特開2020-047899號公報 [專利文獻2]日本特開2020-047699號公報 [專利文獻3]日本特開2021-034605號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2020-047899 [Patent Document 2] Japanese Patent Laid-Open No. 2020-047699 [Patent Document 3] Japanese Patent Laid-Open No. 2021-034605

[發明所欲解決的課題] 通常為了在真空腔室(減壓腔室)內保持晶圓,而會利用靜電卡盤台。但是,靜電卡盤台的價格昂貴,而切盼利用吸引保持被加工物的吸引台。然而,若腔室內減壓,則存在於吸引台無法將工件持續吸附於吸引台表面,且在吸引力消失之際工件會移動並從吸引保持之位置偏移之問題。 [Problems to be Solved by the Invention] Generally, an electrostatic chuck table is used to hold wafers in a vacuum chamber (decompression chamber). However, the electrostatic chuck table is expensive, and a suction table that uses suction to hold a workpiece has been desired. However, if the chamber is depressurized, there is a problem that the suction table cannot continuously absorb the workpiece on the surface of the suction table, and when the suction force disappears, the workpiece will move and deviate from the position held by suction.

尤其在工件被薄化而產生翹曲之情形中,若從以吸引台吸引保持之狀態下吸引力消失,則工件會大幅移動,因而成為問題。In particular, when the workpiece is thinned and warped, if the suction force disappears from the state of suction and holding by the suction table, the workpiece will move greatly, which is a problem.

本發明之目的為提供一種保持機構及黏貼裝置,其不利用靜電卡盤而可抑制工件的位置偏移。An object of the present invention is to provide a holding mechanism and an adhering device which can suppress positional deviation of workpieces without using an electrostatic chuck.

[解決課題的技術手段] 為了解決上述之課題並達成目的,本發明的保持機構為保持工件之保持機構,其特徵在於具備:吸引台,其具有吸引保持工件之保持面;真空腔室,其容納該吸引台且內部能減壓;以及偏移防止手段,其在以該吸引台吸引保持工件之狀態下將該真空腔室內進行減壓之際,防止工件的偏移。 [Technical means to solve the problem] In order to solve the above-mentioned problems and achieve the purpose, the holding mechanism of the present invention is a holding mechanism for holding a workpiece, which is characterized in that it includes: a suction table, which has a holding surface for attracting and holding the workpiece; a vacuum chamber, which houses the suction table and has an internal capacity decompression; and means for preventing deviation of the workpiece when decompression is performed in the vacuum chamber in a state where the workpiece is sucked and held by the suction table.

在所述保持機構中,該吸引台的該保持面的至少一部分可由具有黏性力之構件所構成,且該吸引台可兼用作該偏移防止手段。In the holding mechanism, at least a part of the holding surface of the suction table may be constituted by a member having an adhesive force, and the suction table may also serve as the displacement preventing means.

在所述保持機構中,該偏移防止手段可具有多個工件固定構件,所述多個工件固定構件被構成為從被該吸引台保持之工件的外周緣的外側朝向該保持面的中心移動自如。In the holding mechanism, the displacement preventing means may have a plurality of workpiece fixing members configured to move from the outer side of the outer periphery of the workpiece held by the suction table toward the center of the holding surface. freely.

在所述保持機構中,該偏移防止手段可具有推壓構件,所述推壓構件推壓該吸引台上的工件的上表面側。In the holding mechanism, the displacement preventing means may have a pressing member that presses an upper surface side of the workpiece on the suction table.

本發明的黏貼裝置為將膠膜黏貼於工件之黏貼裝置,其特徵在於具備:吸引台,其具有吸引保持工件之保持面;膠膜保持單元,其在使膠膜面對該吸引台上的工件之狀態下保持該膠膜;黏貼輥,其將被該膠膜保持單元保持之膠膜黏貼於該吸引台上的工件;真空腔室,其容納該吸引台與該黏貼輥且內部能減壓;以及偏移防止手段,其在以該吸引台吸引保持工件之狀態下將該真空腔室內進行減壓之際,防止工件的偏移。The sticking device of the present invention is a sticking device for sticking an adhesive film to a workpiece, and is characterized in that it has: a suction table, which has a holding surface for attracting and holding the workpiece; an adhesive film holding unit, which makes the adhesive film face the suction table. The adhesive film is held in the state of the workpiece; the adhesive roller, which sticks the adhesive film held by the adhesive film holding unit to the workpiece on the suction table; the vacuum chamber, which accommodates the suction table and the adhesive roller and can reduce the pressure inside and an offset preventing means for preventing the offset of the workpiece when the vacuum chamber is depressurized in a state where the workpiece is sucked and held by the suction table.

[發明功效] 本發明發揮可不利用靜電卡盤而抑制工件的位置偏移之功效。 [Efficacy of the invention] The present invention exerts the effect of suppressing positional deviation of workpieces without using an electrostatic chuck.

針對用於實施本發明的方式(實施方式),一邊參照圖式一邊詳細地進行說明。本發明並不受限於以下的實施方式所記載之內容。並且,在以下所記載之構成要素中,包含本發明所屬技術領域中具有通常知識者可容易思及者、實質上相同者。再者,以下所記載之構成能適當組合。並且,在不脫離本發明的主旨之範圍內,可進行構成的各種省略、取代或變更。Modes (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. In addition, the components described below include those that can be easily conceived by a person having ordinary knowledge in the technical field to which the present invention pertains, and those that are substantially the same. In addition, the structure described below can be combined suitably. In addition, various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the present invention.

[實施方式1] 基於圖式說明本發明的實施方式1之黏貼裝置。圖1係示意性地表示實施方式1之黏貼裝置的構成例之剖面圖。圖2係示意性地表示藉由圖1所示之黏貼裝置而被黏貼於膠膜之工件之立體圖。 [Embodiment 1] The bonding apparatus according to Embodiment 1 of the present invention will be described based on the drawings. Fig. 1 is a cross-sectional view schematically showing a configuration example of an adhering device according to Embodiment 1. Fig. 2 is a perspective view schematically showing a workpiece pasted on an adhesive film by the pasting device shown in Fig. 1 .

實施方式1之圖1所示之黏貼裝置1為將膠膜210黏貼於圖2所示之工件200的背面205之裝置。藉由實施方式1之黏貼裝置1而黏貼有膠膜210之工件200係以矽(Si)、藍寶石(Al 2O 3)、砷化鎵(GaAs)或碳化矽(SiC)等作為基板201之圓板狀的半導體晶圓、光元件晶圓等晶圓。 The sticking device 1 shown in FIG. 1 of Embodiment 1 is a device for sticking an adhesive film 210 on the back surface 205 of the workpiece 200 shown in FIG. 2 . The workpiece 200 pasted with the adhesive film 210 by the pasting device 1 of Embodiment 1 uses silicon (Si), sapphire (Al 2 O 3 ), gallium arsenide (GaAs), or silicon carbide (SiC) as the substrate 201 Disc-shaped semiconductor wafers, optical element wafers and other wafers.

如圖2所示,工件200係在以交叉之多條分割預定線202所劃分之正面203的各區域中分別形成有元件204。元件204例如為IC(Integrated Circuit,積體電路)或LSI(Large Scale Integration,大型積體電路)等積體電路、CCD(Charge Coupled Device,電荷耦合元件)或CMOS(Complementary Metal Oxide Semiconductor,互補金屬氧化半導體)等影像感測器、MEMS(Micro Electro Mechanical Systems,微機電系統)或者記憶體(半導體記憶裝置)等。工件200係在正面203與正面203的背側的背面205涵蓋整個圓周而形成往外周方向凸狀地彎曲之倒角部206。As shown in FIG. 2 , the workpiece 200 is formed with elements 204 in each region of the front 203 divided by a plurality of intersecting dividing lines 202 . The element 204 is, for example, an integrated circuit such as IC (Integrated Circuit) or LSI (Large Scale Integration, large scale integrated circuit), CCD (Charge Coupled Device, charge coupled device) or CMOS (Complementary Metal Oxide Semiconductor, complementary metal Oxide semiconductor) and other image sensors, MEMS (Micro Electro Mechanical Systems, micro-electromechanical systems) or memory (semiconductor memory device), etc. In the workpiece 200, the front surface 203 and the back surface 205 on the back side of the front surface 203 cover the entire circumference to form a chamfered portion 206 convexly curved toward the outer peripheral direction.

在實施方式1中,工件200在背面205側黏貼有圓板狀的膠膜210,且被支撐於環狀框架211的內側的開口內,所述圓板狀的膠膜210係直徑大於工件200且在外緣部黏貼環狀框架211。工件200係沿著分割預定線202而被分割成一個個元件204。在實施方式1中,膠膜210具備:基材層,其具有可撓性且藉由非黏著性的樹脂所構成;以及黏著層,其層積於基材層且藉由具有可撓性與黏著性之樹脂所構成。In Embodiment 1, the workpiece 200 is pasted with a disc-shaped adhesive film 210 on the back side 205, and is supported in the inner opening of the ring frame 211, and the diameter of the disc-shaped adhesive film 210 is larger than that of the workpiece 200. And the ring frame 211 is pasted on the outer edge. The workpiece 200 is divided into individual elements 204 along planned dividing lines 202 . In Embodiment 1, the adhesive film 210 includes: a base material layer, which is flexible and made of a non-adhesive resin; and an adhesive layer, which is laminated on the base layer and has flexibility and Made of adhesive resin.

實施方式1之黏貼裝置1為將圓板狀的膠膜210黏貼於工件200的背面205之裝置,所述圓板狀的膠膜210係直徑大於工件200且在外緣部黏貼有環狀框架211。如圖1所示,黏貼裝置1具備保持機構2及控制單元100。The pasting device 1 of Embodiment 1 is a device for sticking a disc-shaped adhesive film 210 to the back surface 205 of a workpiece 200. The disc-shaped adhesive film 210 is larger in diameter than the workpiece 200 and has a ring-shaped frame 211 attached to its outer edge. . As shown in FIG. 1 , the bonding device 1 includes a holding mechanism 2 and a control unit 100 .

保持機構2為保持工件200之機構。保持機構2具備:吸引台10、黏貼輥20、輥移動單元30、真空腔室40以及使吸引台10升降之升降單元60。The holding mechanism 2 is a mechanism for holding the workpiece 200 . The holding mechanism 2 includes: a suction table 10 , an adhesive roller 20 , a roller moving unit 30 , a vacuum chamber 40 , and a lifting unit 60 for raising and lowering the suction table 10 .

吸引台10具備:框架保持部11,其具有吸引保持環狀框架211之框架保持面111;以及工件保持部12,其具有吸引保持工件200之保持面141。框架保持部11一體地具備:圓盤狀的圓盤部112,其外徑大於工件200的外徑;以及圓環部113,其從圓盤部112的外緣立設且內外徑與環狀框架211的內外徑相等。圓環部113的上表面為吸引保持環狀框架211之框架保持面111。框架保持面111係沿著水平方向平坦地形成。框架用吸引孔114在框架保持面111開口。The suction table 10 is provided with: the frame holding part 11 which has the frame holding surface 111 which suction-holds the annular frame 211, and the workpiece|work holding part 12 which has the holding surface 141 which suction-holds the workpiece|work 200. As shown in FIG. The frame holding part 11 is integrally provided with: a disk-shaped disk part 112 whose outer diameter is larger than that of the workpiece 200; The inner and outer diameters of the frame 211 are equal. The upper surface of the ring portion 113 is the frame holding surface 111 for attracting and holding the ring frame 211 . The frame holding surface 111 is formed flat along the horizontal direction. The frame suction hole 114 opens on the frame holding surface 111 .

工件保持部12被形成為外徑些許小於工件200的外徑的圓板狀,且被配置成在框架保持部11的圓盤部112上與框架保持部11同軸。工件保持部12的上表面121係沿著水平方向平坦地形成。在上表面121層積有藉由矽系樹脂、矽系橡膠或氟系橡膠所構成之黏性層14(相當於具有黏性力之構件)。黏性層14例如可藉由UMI股份有限公司製的「flex carrier(註冊商標)」或EXSEAL股份有限公司製的「GEL BASE(註冊商標)」等所構成。The workpiece holding portion 12 is formed in a disk shape with an outer diameter slightly smaller than that of the workpiece 200 , and is arranged coaxially with the frame holding portion 11 on the disk portion 112 of the frame holding portion 11 . The upper surface 121 of the workpiece holding portion 12 is formed flat along the horizontal direction. The adhesive layer 14 (corresponding to an adhesive member) made of silicon-based resin, silicon-based rubber, or fluorine-based rubber is laminated on the upper surface 121 . The adhesive layer 14 can be comprised by "flex carrier (trademark)" manufactured by UMI Co., Ltd., "GEL BASE (trademark)" manufactured by EXSEAL Co., Ltd., etc., for example.

若黏性層14載置工件200的正面203側,則會以黏性力黏貼並以黏性力固定工件200的正面203。此外,所謂黏性力,係弱黏著力或強黏著力,所謂弱黏著力,係將球狀的珠粒作為物品而載置於黏性層14,並將黏性層14持續傾斜且球狀的珠粒開始滾動時的黏性層14相對於水平方向之角度為3.5度時的黏著力,所謂強黏著力,係球狀的珠粒開始滾動時的黏性層14相對於水平方向之角度即使為10度亦不會在黏性層14上滾動並保持球狀的珠粒時的黏著力。If the adhesive layer 14 is placed on the front side 203 of the workpiece 200 , it will adhere to and fix the front side 203 of the workpiece 200 by the adhesive force. In addition, the so-called viscous force refers to weak or strong cohesive force. The so-called weak cohesive force means that spherical beads are placed on the viscous layer 14 as articles, and the viscous layer 14 is continuously inclined and spherical. The adhesive force when the angle of the viscous layer 14 relative to the horizontal direction when the beads start to roll is 3.5 degrees, the so-called strong adhesive force refers to the angle of the viscous layer 14 relative to the horizontal direction when the spherical beads start to roll Even if it is 10 degrees, it will not roll on the adhesive layer 14 and maintain the adhesive force when the spherical beads are maintained.

在實施方式1中,黏性層14的表面為吸引保持工件200之保持面141。在實施方式1中,雖保持面141整體係藉由黏性層14的表面亦即黏性層14所構成,但在本發明中並不受限於此,只要保持面141的至少一部分係藉由黏性層14所構成即可。並且,在實施方式1中,保持面141被配置在低於框架保持面111之位置。In Embodiment 1, the surface of the adhesive layer 14 is the holding surface 141 for attracting and holding the workpiece 200 . In Embodiment 1, although the entire holding surface 141 is constituted by the surface of the adhesive layer 14, that is, the adhesive layer 14, the present invention is not limited thereto as long as at least a part of the holding surface 141 is formed by It only needs to be composed of the adhesive layer 14 . Furthermore, in Embodiment 1, the holding surface 141 is arranged at a position lower than the frame holding surface 111 .

在保持面141開口有多個吸引孔142,所述吸引孔142貫通黏性層14且在工件保持部12的上表面121開口。框架用吸引孔114及吸引孔142係與設置於框架保持部11及工件保持部12內之吸引路徑15連接。吸引路徑15係與吸引源16連接。在吸引路徑15的框架保持部11與吸引源16之間設置有開關閥17。A plurality of suction holes 142 are opened on the holding surface 141 , and the suction holes 142 pass through the adhesive layer 14 and open on the upper surface 121 of the workpiece holding portion 12 . The frame suction hole 114 and the suction hole 142 are connected to the suction path 15 provided in the frame holding portion 11 and the workpiece holding portion 12 . The suction path 15 is connected to a suction source 16 . An on-off valve 17 is provided between the frame holding portion 11 of the suction path 15 and the suction source 16 .

吸引台10係在保持面141載置工件200的正面203側並在框架保持面111載置黏貼膠膜210的外緣部之環狀框架211,且開啟開關閥17而吸引孔114、142被吸引源16吸引,藉此將工件200吸引保持於保持面141並將環狀框架211吸引保持於框架保持面111。如此,在實施方式1中,框架保持部11為膠膜保持單元,所述膠膜保持單元係藉由在使膠膜210面對吸引台10的工件保持部12的保持面141上的工件200之狀態下吸引保持環狀框架211而保持膠膜210。The suction table 10 is placed on the holding surface 141 on the front side 203 of the workpiece 200 and on the frame holding surface 111 is placed the ring-shaped frame 211 pasted with the outer edge of the adhesive film 210, and the on-off valve 17 is opened to activate the suction holes 114 and 142. The suction source 16 sucks, whereby the workpiece 200 is sucked and held on the holding surface 141 and the annular frame 211 is sucked and held on the frame holding surface 111 . Thus, in Embodiment 1, the frame holding portion 11 is an adhesive film holding unit, and the adhesive film holding unit is formed by placing the workpiece 200 on the holding surface 141 of the workpiece holding portion 12 so that the adhesive film 210 faces the suction table 10 . In this state, the ring frame 211 is sucked and held to hold the adhesive film 210 .

黏貼輥20將黏貼於被框架保持部11保持之環狀框架211之膠膜210黏貼於吸引台10的保持面141上的工件200。黏貼輥20係隔著黏貼於被吸引保持在吸引台10之環狀框架211之膠膜210而沿著鉛直方向面對被吸引保持於吸引台10之工件200。黏貼輥20被設置成能藉由輥移動單元30而沿著工件200的背面205且沿著與水平方向平行的方向移動。The sticking roller 20 sticks the adhesive film 210 stuck to the annular frame 211 held by the frame holding unit 11 to the workpiece 200 on the holding surface 141 of the suction table 10 . The sticking roller 20 faces the workpiece 200 sucked and held on the suction table 10 along the vertical direction through the adhesive film 210 stuck to the annular frame 211 sucked and held on the suction table 10 . The bonding roller 20 is provided to be movable along the back surface 205 of the workpiece 200 and in a direction parallel to the horizontal direction by the roller moving unit 30 .

黏貼輥20係藉由支撐構件21而被繞著與水平方向平行的軸心旋轉自如地支撐,配置於被保持於吸引台10之工件200的上方,且隔著黏貼於被吸引保持於吸引台10之環狀框架211之膠膜210而沿著鉛直方向面對被保持於吸引台10之工件200。黏貼輥20的軸心係與水平方向平行且與藉由輥移動單元30所致之移動方向呈正交。The pasting roller 20 is rotatably supported around an axis parallel to the horizontal direction by the supporting member 21, and is disposed above the workpiece 200 held on the suction table 10, and is held on the suction table by being sucked through the adhesive. The adhesive film 210 of the annular frame 211 of 10 faces the workpiece 200 held on the suction table 10 along the vertical direction. The axis of the pasting roller 20 is parallel to the horizontal direction and perpendicular to the moving direction caused by the roller moving unit 30 .

支撐構件21係藉由輥移動單元30而沿著水平方向移動,藉此黏貼輥20沿著工件200的背面205移動。若吸引台10藉由升降單元60而上升,則黏貼輥20將黏貼於被吸引保持於吸引台10之環狀框架211之膠膜210朝向工件200推壓,將膠膜210往工件200推抵且將工件200壓緊於吸引台10。The supporting member 21 is moved in the horizontal direction by the roller moving unit 30 , whereby the bonding roller 20 moves along the back surface 205 of the workpiece 200 . If the suction table 10 is raised by the lifting unit 60, the adhesive roller 20 will push the adhesive film 210 attached to the annular frame 211 held on the suction table 10 toward the workpiece 200, pushing the adhesive film 210 toward the workpiece 200. And the workpiece 200 is pressed against the suction table 10 .

如此,黏貼輥20被配置於下述位置:若吸引台10藉由升降單元60而上升,則將膠膜210往工件200推抵且將工件200壓緊於吸引台10。並且,若黏貼輥20在吸引台10藉由升降單元60而上升之狀態下藉由輥移動單元30而沿著工件200的背面205移動,則將膠膜210往工件200推抵且將工件200壓緊於吸引台10,並在膠膜210上轉動而將膠膜210黏貼於工件200的背面205。In this way, the sticking roller 20 is arranged at the following position: when the suction table 10 is raised by the lifting unit 60 , the adhesive film 210 is pushed against the workpiece 200 and the workpiece 200 is pressed against the suction table 10 . And, if the sticking roller 20 moves along the back surface 205 of the workpiece 200 by the roller moving unit 30 in the state where the suction table 10 is raised by the lifting unit 60, the adhesive film 210 is pushed against the workpiece 200 and the workpiece 200 is moved. Press on the suction table 10 and rotate on the adhesive film 210 to stick the adhesive film 210 on the back surface 205 of the workpiece 200 .

輥移動單元30使黏貼輥20在水平方向移動。輥移動單元30使支撐構件21在水平方向移動,所述支撐構件21將黏貼輥21支撐成繞著軸心旋轉自如。The roller moving unit 30 moves the pasting roller 20 in the horizontal direction. The roller moving unit 30 moves the support member 21 which supports the bonding roller 21 so as to be rotatable around the axis, in the horizontal direction.

升降單元60使吸引台10沿著鉛直方向升降。升降單元60使吸引台10的框架保持部11在鉛直方向升降。The elevating unit 60 elevates the suction table 10 in the vertical direction. The lifting unit 60 vertically lifts the frame holder 11 of the suction table 10 .

真空腔室40為容納吸引台10、黏貼輥20、輥移動單元30及升降單元60且內部能減壓的容器。真空腔室40具備:上部框體41與下部框體42,其能在彼此的外緣接觸之狀態與彼此的外緣分離之狀態之間移動;真空源47,其透過排氣路徑45、開關閥46而與下部框體42連接;以及空氣供給源50,其透過供給路徑48、開關閥49而與上部框體41連接。The vacuum chamber 40 is a container for accommodating the suction table 10, the bonding roller 20, the roller moving unit 30, and the lifting unit 60, and the inside thereof can be decompressed. The vacuum chamber 40 is equipped with: an upper frame body 41 and a lower frame body 42, which can move between a state where their outer edges are in contact with each other and a state where their outer edges are separated from each other; a vacuum source 47, which passes through an exhaust path 45, a switch The valve 46 is connected to the lower housing 42 , and the air supply source 50 is connected to the upper housing 41 through the supply path 48 and the switching valve 49 .

框體41、42一體地具備:圓板部43,其外徑大於環狀框架211;以及圓筒部44,其從圓板部43的外緣立設。框體41、42的圓板部43的外徑相等。框體41、42被配置成圓筒部44的內側的開口沿著Z軸方向面對。上部框體41與下部框體42係藉由未圖示之升降單元而相對地升降移動。上部框體41中,將輥移動單元30安裝於圓板部43。下部框體42中,將升降單元60安裝於圓板部43。The frames 41 and 42 integrally include a disk portion 43 whose outer diameter is larger than that of the annular frame 211 , and a cylindrical portion 44 erected from the outer edge of the disk portion 43 . The outer diameters of the disk portions 43 of the frames 41 and 42 are equal. The frames 41 and 42 are arranged such that the inner opening of the cylindrical portion 44 faces along the Z-axis direction. The upper frame body 41 and the lower frame body 42 are relatively moved up and down by a lifting unit not shown. In the upper housing 41 , the roller moving unit 30 is attached to the disc portion 43 . In the lower housing 42 , the elevating unit 60 is attached to the disc portion 43 .

真空腔室40中,上部框體41與下部框體42藉由升降單元而往互相靠近之方向升降,藉此框體41、42的圓筒部44的外緣彼此以氣密的狀態互相接觸,而將內部與外部隔絕,且內部被密閉。真空腔室40中,上部框體41與下部框體42藉由升降單元而往互相分離之方向升降,藉此框體41、42的圓筒部44的外緣彼此互相分離,而能將工件200及環狀框架211搬入、搬出。In the vacuum chamber 40, the upper frame body 41 and the lower frame body 42 are raised and lowered toward each other by the lifting unit, whereby the outer edges of the cylindrical parts 44 of the frames 41, 42 are in airtight contact with each other. , and the interior is isolated from the exterior, and the interior is hermetically sealed. In the vacuum chamber 40, the upper frame body 41 and the lower frame body 42 are lifted up and down in a direction separated from each other by the lifting unit, whereby the outer edges of the cylindrical parts 44 of the frames 41, 42 are separated from each other, and the workpiece can be moved 200 and the ring frame 211 are carried in and out.

控制單元100控制構成黏貼裝置1之各構成要素而使黏貼裝置1執行黏貼動作,所述黏貼動作係將膠膜210黏貼於工件200的背面205。控制單元100為能執行電腦程式的電腦,且具有:運算處理裝置,其具有如CPU(Central Processing Unit,中央處理單元)般的微處理器;記憶裝置,其具有如ROM(Read Only Memory,唯讀記憶體)或RAM(Random Access Memory,隨機存取記憶體)的記憶體;以及輸入輸出介面裝置。The control unit 100 controls each component constituting the pasting device 1 to make the pasting device 1 perform a pasting action, and the pasting action is to stick the adhesive film 210 to the back surface 205 of the workpiece 200 . The control unit 100 is a computer capable of executing computer programs, and has: an arithmetic processing device, which has a microprocessor such as a CPU (Central Processing Unit, central processing unit); a memory device, which has a ROM (Read Only Memory, only Read memory) or RAM (Random Access Memory, random access memory) memory; and input and output interface devices.

控制單元100的運算處理裝置在RAM上執行記憶於ROM之電腦程式,生成用於控制黏貼裝置1的控制信號。控制單元100的運算處理裝置將所生成之控制訊號透過輸入輸出介面裝置而輸出至黏貼裝置1的各構成要素。The arithmetic processing device of the control unit 100 executes the computer program stored in the ROM on the RAM, and generates a control signal for controlling the pasting device 1 . The arithmetic processing device of the control unit 100 outputs the generated control signal to each constituent element of the pasting device 1 through the input-output interface device.

並且,控制單元100係與顯示單元及輸入單元連接,所述顯示單元係藉由顯示加工動作的狀態或圖像等之液晶顯示裝置等所構成,所述輸入單元係在操作員登錄加工條件等之際使用。輸入單元係藉由設置於顯示單元之觸控面板及鍵盤等的其中至少一者所構成。In addition, the control unit 100 is connected to a display unit which is constituted by a liquid crystal display device or the like for displaying the state of processing operations or images, etc., and an input unit which registers processing conditions, etc. occasional use. The input unit is constituted by at least one of a touch panel, a keyboard and the like arranged on the display unit.

接著,基於圖式說明所述構成的黏貼裝置1的將膠膜210黏貼於工件200的背面205之黏貼動作。圖3係示意性地表示將工件及環狀框架吸引保持於圖1所示之黏貼裝置的吸引台之狀態之剖面圖。圖4係示意性地表示將膠膜壓緊於圖3所示之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。Next, the sticking operation of sticking the adhesive film 210 to the back surface 205 of the workpiece 200 by the sticking apparatus 1 having the above-mentioned configuration will be described based on the drawings. Fig. 3 is a cross-sectional view schematically showing a state in which a workpiece and a ring frame are sucked and held on the suction table of the bonding apparatus shown in Fig. 1 . Fig. 4 is a cross-sectional view schematically showing the state of the workpiece being sucked and held by the adhesive film pressed against the suction table of the pasting device shown in Fig. 3 .

黏貼裝置1中,控制單元100受理並記憶從輸入單元等所輸入之加工條件,且若接收從輸入單元等所輸入之黏貼動作的開始指示,則開始黏貼動作。在黏貼動作中,黏貼裝置1的控制單元100控制未圖示之升降單元而使框體41、42相互分離。在黏貼動作中,若黏貼裝置1中將工件200的正面203側載置於保持面141,且將膠膜210的外緣部所黏貼之環狀框架211載置於框架保持面111,則控制升降單元,使框體41、42彼此靠近並使框體41、42的圓筒部44的外緣彼此以氣密的狀態相互接觸,而將真空腔室40的內部密閉。In the pasting device 1, the control unit 100 receives and stores the processing conditions input from the input unit, etc., and starts the pasting operation upon receiving an instruction to start the pasting operation input from the input unit or the like. In the pasting operation, the control unit 100 of the pasting device 1 controls the lifting unit (not shown) to separate the frames 41 and 42 from each other. In the pasting operation, if the front side 203 of the workpiece 200 is placed on the holding surface 141 in the pasting device 1, and the ring-shaped frame 211 pasted by the outer edge of the adhesive film 210 is placed on the frame holding surface 111, the control The elevating unit brings the frames 41 and 42 close to each other and makes the outer edges of the cylindrical parts 44 of the frames 41 and 42 contact each other in an airtight state, thereby sealing the inside of the vacuum chamber 40 .

在黏貼動作中,如圖3所示,黏貼裝置1中控制單元100開啟開關閥17,藉由吸引源16通過吸引路徑15吸引吸引孔114、142,而將工件200的正面203側吸引保持於保持面141,且將環狀框架211吸引保持於框架保持面111。此時,黏性層14係藉由黏性力而將工件200固定於保持面141。在黏貼動作中,黏貼裝置1中控制單元100開啟開關閥46,藉由真空源47通過排氣路徑45將真空腔室40內的空氣往真空腔室40外排氣,而將真空腔室40內減壓。此時,被吸引保持於保持面141之工件200與膠膜210之間也被減壓。In the pasting operation, as shown in FIG. 3 , the control unit 100 in the pasting device 1 opens the switch valve 17, and the suction hole 114, 142 is sucked by the suction source 16 through the suction path 15, so that the front side 203 of the workpiece 200 is sucked and held on the holding surface 141 , and attract and hold the ring-shaped frame 211 on the frame holding surface 111 . At this time, the viscous layer 14 fixes the workpiece 200 to the holding surface 141 by viscous force. In the sticking action, the control unit 100 in the sticking device 1 opens the switch valve 46, and the air in the vacuum chamber 40 is exhausted to the outside of the vacuum chamber 40 by the vacuum source 47 through the exhaust path 45, and the vacuum chamber 40 is exhausted. Internal decompression. At this time, the pressure is also reduced between the workpiece 200 sucked and held on the holding surface 141 and the adhesive film 210 .

在黏貼動作中,黏貼裝置1在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖4所示,控制輥移動單元30而將黏貼輥20隔著膠膜210定位於工件200的上方,藉由升降單元60而使吸引台10上升,以黏貼輥20將膠膜210往工件200推抵,且透過膠膜210將工件200往保持面141推抵,而抑制工件200的位置偏移。此外,所謂預定的氣壓係下述情況之真空腔室40內的氣壓:若保持面141的工件200吸引保持之吸引力下降,且不以某種力將工件200壓緊於保持面141,則工件200相對於保持面141會位置偏移。In the pasting action, before the air pressure in the vacuum chamber 40 is lower than the predetermined air pressure (absolute air pressure), the pasting device 1 controls the roller moving unit 30 to position the pasting roller 20 across the adhesive film 210 as shown in FIG. Above the workpiece 200, the suction table 10 is raised by the lifting unit 60, the adhesive film 210 is pushed against the workpiece 200 by the adhesive roller 20, and the workpiece 200 is pushed against the holding surface 141 through the adhesive film 210, thereby restraining the workpiece 200. position offset. In addition, the so-called predetermined air pressure refers to the air pressure in the vacuum chamber 40 under the following conditions: if the suction force for sucking and holding the workpiece 200 on the holding surface 141 decreases, and the workpiece 200 is not pressed against the holding surface 141 with a certain force, then The workpiece 200 is displaced relative to the holding surface 141 .

如此進行,在實施方式1中,黏貼裝置1的黏性層14與黏貼輥20構成偏移防止手段70,所述偏移防止手段70在以吸引台10吸引保持工件200之狀態下將真空腔室40內減壓之際,防止工件200的偏移。如此,黏貼裝置1的保持機構2具備偏移防止手段70。並且,在實施方式1中,因保持面141為黏性層14的表面,故吸引台10亦構成偏移防止手段70,亦即,吸引台10亦兼用作偏移防止手段70。在實施方式1中,黏貼裝置1為了抑制在已壓緊之區域中於膠膜210與工件200之間形成氣泡,較佳為在即將到達所述預定的氣壓之前以黏貼輥20壓緊膠膜210。並且,在本發明中,黏貼裝置1以黏貼輥20壓緊膠膜210之時間點為即將達到預定的氣壓之前以外,亦可為以保持面141保持工件200之後且開始減壓之前。並且,在本發明中,黏貼裝置1亦可不以黏貼輥20壓緊膠膜,而僅以黏性層14的黏性力抑制工件200的位置偏移。In this way, in Embodiment 1, the adhesive layer 14 of the pasting device 1 and the pasting roller 20 constitute the displacement preventing means 70, and the displacement preventing means 70 draws the vacuum chamber in the state where the workpiece 200 is sucked and held by the suction table 10. When the chamber 40 is depressurized, the workpiece 200 is prevented from shifting. In this manner, the holding mechanism 2 of the bonding apparatus 1 is provided with the displacement preventing means 70 . Furthermore, in Embodiment 1, since the holding surface 141 is the surface of the adhesive layer 14 , the suction table 10 also constitutes the displacement preventing means 70 , that is, the suction table 10 also serves as the displacement preventing means 70 . In Embodiment 1, in order to suppress the formation of air bubbles between the adhesive film 210 and the workpiece 200 in the compressed area, the adhesive device 1 preferably uses the adhesive roller 20 to compress the adhesive film immediately before reaching the predetermined air pressure. 210. Moreover, in the present invention, the sticking device 1 presses the adhesive film 210 with the sticking roller 20 immediately before reaching the predetermined air pressure, or it may be after the workpiece 200 is held by the holding surface 141 and before the decompression starts. Moreover, in the present invention, the pasting device 1 may not use the pasting roller 20 to press the adhesive film, but only use the viscous force of the viscous layer 14 to restrain the positional deviation of the workpiece 200 .

在黏貼動作中,黏貼裝置1中,在真空腔室40內的氣壓低於預定的氣壓並被減壓直至真空狀態之後,控制單元100控制輥移動單元30使黏貼輥20沿著水平方向移動,而將膠膜210黏貼於工件200的背面205。在黏貼動作中,黏貼裝置1在將膠膜210黏貼於工件200的背面205之後,關閉開關閥46,並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內,使真空腔室40內的氣壓上升直至大氣壓,並使膠膜210與工件200的背面205密接。如此進行,黏貼裝置1在黏貼動作中將膠膜210黏貼於工件200的背面205。並且,在本發明中,黏貼裝置1中除了吸引源16之外還透過開關閥17將未圖示之空氣供給源與保持面141連接,而透過開關閥17將空氣供給源及吸引源16選擇自如地與保持面141連接,則在從保持面141剝離工件200時,亦可將來自空氣供給源的空氣從保持面141進行吹氣,使工件200從具有黏性力之黏性層14剝離變得容易。In the pasting operation, in the pasting device 1, after the air pressure in the vacuum chamber 40 is lower than the predetermined air pressure and is decompressed to a vacuum state, the control unit 100 controls the roller moving unit 30 to move the pasting roller 20 in the horizontal direction, And stick the adhesive film 210 on the back surface 205 of the workpiece 200 . In the sticking operation, the sticking device 1 closes the on-off valve 46 after sticking the adhesive film 210 on the back surface 205 of the workpiece 200, and opens the on-off valve 49 to supply air from the air supply source 50 to the vacuum chamber 40 through the supply path 48. Inside, the air pressure in the vacuum chamber 40 is raised to the atmospheric pressure, and the adhesive film 210 is brought into close contact with the back surface 205 of the workpiece 200 . In this way, the sticking device 1 sticks the adhesive film 210 to the back surface 205 of the workpiece 200 during the sticking action. Furthermore, in the present invention, in addition to the suction source 16, in the pasting device 1, an air supply source (not shown) is connected to the holding surface 141 through the switch valve 17, and the air supply source and the suction source 16 are selected through the switch valve 17. If it is freely connected to the holding surface 141, when peeling the workpiece 200 from the holding surface 141, the air from the air supply source can also be blown from the holding surface 141, so that the workpiece 200 can be peeled off from the adhesive layer 14 with viscous force. made easy.

以上說明之實施方式1之保持機構2及黏貼機構1具備偏移防止手段70,所述偏移防止手段70係以構成保持面141之黏性層14以及將工件200往黏性層14推抵之黏貼輥20所構成,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦可將工件200不會位置偏移地保持於保持面141。The holding mechanism 2 and the sticking mechanism 1 of Embodiment 1 described above are equipped with the displacement preventing means 70, and the displacement preventing means 70 is made of the adhesive layer 14 constituting the holding surface 141 and pushes the workpiece 200 against the adhesive layer 14. Therefore, even if the vacuum chamber 40 is depressurized and the suction force of the suction table 10 decreases, the workpiece 200 can be held on the holding surface 141 without positional displacement.

其結果,實施方式1之保持機構2及黏貼裝置1發揮可不利用靜電卡盤而抑制工件200的位置偏移之功效。As a result, the holding mechanism 2 and the bonding apparatus 1 according to Embodiment 1 exhibit an effect of suppressing positional displacement of the workpiece 200 without using an electrostatic chuck.

[變形例] 基於圖式說明本發明的實施方式1的變形例之黏貼裝置。圖5係示意性地表示實施方式1的變形例之黏貼裝置的構成例之剖面圖。此外,圖5中,對與實施方式1相同的部分標記相同的符號並省略說明。 [modified example] A sticking device according to a modified example of Embodiment 1 of the present invention will be described based on the drawings. Fig. 5 is a cross-sectional view schematically showing a configuration example of a sticking device according to a modified example of the first embodiment. In addition, in FIG. 5, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.

如圖5所示,實施方式1的變形例之黏貼裝置1-1中,在工件保持部12的外緣部涵蓋整個圓周而設置往上方凸出的凸部122,將黏性層14層積於凸部122上,且將吸引孔142所貫通之黏性層14的表面即保持面141形成為環狀,除此之外則與實施方式1相同。此外,變形例之黏貼裝置1-1的環狀的保持面141係與工件200的未形成元件204之外周剩餘區域對應,且被設定成未支撐形成有元件204之元件區域而支撐外周剩餘區域之大小。變形例之黏貼裝置1-1係藉由未在與形成有元件204之元件區域對應之區域形成黏性層14,而元件204不與黏性層14抵接且降低使元件204汙染之風險以外,從保持面141剝離工件200變得容易。As shown in FIG. 5 , in the pasting device 1-1 according to the modified example of Embodiment 1, the convex portion 122 protruding upward is provided on the outer edge portion of the workpiece holding portion 12 covering the entire circumference, and the adhesive layer 14 is laminated. It is the same as that of the first embodiment except that the holding surface 141 , which is the surface of the adhesive layer 14 through which the suction hole 142 penetrates, is formed in a ring shape on the convex portion 122 . In addition, the ring-shaped holding surface 141 of the sticking device 1-1 of the modified example corresponds to the remaining area of the outer periphery of the workpiece 200 where the element 204 is not formed, and is set to support the remaining area of the outer periphery without supporting the element area where the element 204 is formed. size. The pasting device 1-1 of the modified example does not form the adhesive layer 14 in the area corresponding to the area where the element 204 is formed, and the element 204 does not contact the adhesive layer 14 and reduces the risk of contamination of the element 204 , it becomes easy to peel off the workpiece 200 from the holding surface 141 .

變形例之保持機構2-1及黏貼裝置1-1係與實施方式1同樣地具備偏移防止手段70,所述偏移防止手段70係以構成保持面141之黏性層14以及將工件200往黏性層14推抵之黏貼輥20所構成,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦發揮可將工件200不會位置偏移地保持於保持面141,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-1 and the sticking device 1-1 of the modified example are equipped with the displacement preventing means 70 similarly to the first embodiment. Composed of the adhesive roller 20 that pushes against the adhesive layer 14, even if the vacuum chamber 40 is depressurized and the suction force of the suction table 10 decreases, the workpiece 200 can be held on the holding surface without positional deviation. 141, and the effect of suppressing the positional deviation of the workpiece 200 can be suppressed without using the electrostatic chuck.

[實施方式2] 基於圖式說明本發明的實施方式2之黏貼裝置。圖6係示意性地表示實施方式2之黏貼裝置的構成例之剖面圖。圖7係示意性地表示以工件固定構件固定實施方式2之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。此外,圖6及圖7中,對與實施方式1相同的部分標記相同的符號並省略說明。 [Embodiment 2] A sticking device according to Embodiment 2 of the present invention will be described based on the drawings. Fig. 6 is a cross-sectional view schematically showing a configuration example of a sticking device according to Embodiment 2. Fig. 7 is a cross-sectional view schematically showing a state in which the workpiece is sucked and held by the suction table of the bonding apparatus according to the second embodiment by the workpiece fixing member. In addition, in FIG. 6 and FIG. 7, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.

如圖6所示,實施方式2之黏貼裝置1-2的保持機構2-2中,偏移防止手段70-2具有多個工件固定構件71以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除此之外則與實施方式1相同。工件固定構件71被構成為從被吸引台10保持之工件200的外周緣的外側朝向保持面131的中心移動自如。As shown in FIG. 6, in the holding mechanism 2-2 of the sticking device 1-2 of Embodiment 2, the displacement prevention means 70-2 has a plurality of workpiece fixing members 71 instead of the adhesive layer 14, and in the workpiece holding part 12 The disc-shaped porous material 13 such as porous ceramics is attached to the center of the upper surface 121 , and the surface of the porous material 13 is a holding surface 131 for attracting and holding the workpiece 200 . The workpiece fixing member 71 is configured to be movable from the outside of the outer peripheral edge of the workpiece 200 held by the suction table 10 toward the center of the holding surface 131 .

工件固定構件71被配置於吸引台10的框架保持部11的圓盤部112上且於工件保持部12亦即保持面131的外側。工件固定構件71被設置成藉由移動手段72而沿著工件保持部12亦即保持面131的徑向移動自如。工件固定構件71具備:柱部73,其從框架保持部11的圓盤部112立設;以及固定部74,其設置於柱部73的上端且與被吸引保持於工件保持部12的保持面131之工件200的倒角部206面對。在實施方式2中,固定部74係以厚度方向的中央最位於保持面131的外周側之方式,沿著被吸引保持於保持面131之工件200的倒角部206而被形成為剖面圓弧狀。在實施方式2中,固定部74的上端被配置於比被吸引保持於工件保持部12的保持面131之工件200的背面205更下方。The workpiece fixing member 71 is disposed on the disc portion 112 of the frame holding portion 11 of the suction table 10 and outside the workpiece holding portion 12 , that is, the holding surface 131 . The workpiece fixing member 71 is provided so as to be able to move freely along the radial direction of the workpiece holding portion 12 , that is, the holding surface 131 , by the moving means 72 . The workpiece fixing member 71 includes: a column portion 73 standing upright from the disc portion 112 of the frame holding portion 11; The chamfer 206 of the workpiece 200 at 131 faces. In Embodiment 2, the fixing portion 74 is formed in a cross-sectional arc along the chamfered portion 206 of the workpiece 200 sucked and held on the holding surface 131 so that the center in the thickness direction is located most on the outer peripheral side of the holding surface 131 shape. In Embodiment 2, the upper end of the fixing portion 74 is disposed below the back surface 205 of the workpiece 200 sucked and held by the holding surface 131 of the workpiece holding portion 12 .

實施方式2之黏貼裝置1-2中,在將工件200載置於保持面131且將環狀框架211載置於框架保持面111之後,控制單元100控制移動手段72,使工件固定構件71沿著保持面131的徑向而朝向工件200移動。實施方式2之黏貼裝置1-2係以多個工件固定構件71的固定部74夾著保持面131上的工件200的倒角部206,將工件200固定於保持面131上。In the pasting device 1-2 of Embodiment 2, after the workpiece 200 is placed on the holding surface 131 and the annular frame 211 is placed on the frame holding surface 111, the control unit 100 controls the moving means 72 so that the workpiece fixing member 71 moves along the It moves toward the workpiece 200 along the radial direction of the holding surface 131 . The pasting device 1-2 of Embodiment 2 clamps the chamfered portion 206 of the workpiece 200 on the holding surface 131 with the fixing portions 74 of the plurality of workpiece fixing members 71 to fix the workpiece 200 on the holding surface 131 .

之後,實施方式2之黏貼裝置1-2中,控制單元100在控制升降單元而使真空腔室40的內部密閉之後,如圖7所示,開啟開關閥17而將工件200的正面203側吸引保持於保持面131,且將環狀框架211吸引保持於框架保持面111,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205。Afterwards, in the pasting device 1-2 of Embodiment 2, after the control unit 100 controls the elevating unit to seal the inside of the vacuum chamber 40, as shown in FIG. It is held on the holding surface 131 , and the ring-shaped frame 211 is sucked and held on the frame holding surface 111 , and the adhesive film 210 is stuck to the back surface 205 of the workpiece 200 in the same manner as in the first embodiment.

實施方式2之保持機構2-2及黏貼裝置1-2具備具有多個工件固定構件71之偏移防止手段70-2,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-2 and the sticking device 1-2 of Embodiment 2 are provided with the displacement prevention means 70-2 having a plurality of workpiece fixing members 71, so even if the inside of the vacuum chamber 40 is depressurized and the suction force of the stage 10 is sucked The lowering also functions to hold the workpiece 200 on the holding surface 131 without positional displacement as in the first embodiment, and to suppress the positional displacement of the workpiece 200 without using an electrostatic chuck.

[實施方式3] 基於圖式說明本發明的實施方式3之黏貼裝置。圖8係示意性地表示將膠膜壓緊於實施方式3之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。圖9係示意性地表示圖8所示之黏貼裝置的黏貼輥將膠膜黏貼於工件的背面之狀態之剖面圖。此外,圖8及圖9中,對與實施方式1相同的部分標記相同的符號並省略說明。 [Embodiment 3] A sticking device according to Embodiment 3 of the present invention will be described based on the drawings. Fig. 8 is a cross-sectional view schematically showing a state in which the adhesive film is pressed against the suction table of the sticking device of the third embodiment and the workpiece is sucked and held. Fig. 9 is a cross-sectional view schematically showing the state where the adhesive roller of the pasting device shown in Fig. 8 sticks the adhesive film to the back of the workpiece. In addition, in FIG.8 and FIG.9, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.

如圖8所示,實施方式3之黏貼裝置1-3的保持機構2-3中,偏移防止手段70-3具有膠膜推壓構件75以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除以之外則與實施方式1相同。膠膜推壓構件75被配置於真空腔室40的上部框體41的圓板部43的與保持面131的中央面對之位置。膠膜推壓構件75被配置成藉由升降單元76而升降自如。As shown in FIG. 8 , in the holding mechanism 2-3 of the sticking device 1-3 of Embodiment 3, the offset prevention means 70-3 has an adhesive film pushing member 75 instead of the adhesive layer 14, and the workpiece holding part 12 The disc-shaped porous material 13 such as porous ceramics is attached to the center of the upper surface 121 , and the surface of the porous material 13 is a holding surface 131 for attracting and holding the workpiece 200 . The adhesive film pressing member 75 is disposed at a position facing the center of the holding surface 131 of the disc portion 43 of the upper housing 41 of the vacuum chamber 40 . The adhesive film pressing member 75 is configured to be freely raised and lowered by a lifting unit 76 .

實施方式3之黏貼裝置1-3中,控制單元100在控制升降單元而將真空腔室40的內部密閉之後,開啟開關閥17而將工件200及環狀框架211吸引保持於保持面131、111,並開啟開關閥46而將真空腔室40的內部減壓。實施方式3之黏貼裝置1-3中,控制單元100在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖8所示,控制升降單元76而使膠膜推壓構件75下降,以膠膜推壓構件75將膠膜210往工件200推抵,且透過膠膜210而將工件200往保持面131推抵,抑制工件200的位置偏移。此外,在本發明中,黏貼裝置1-3較佳為在真空腔室40內的氣壓即將低於預定的氣壓之前使膠膜推壓構件75下降。並且,在本發明中,黏貼裝置1-3亦可在吸引保持工件200之後且開始減壓之前使膠膜推壓構件75下降,以膠膜推壓構件75透過膠膜210而將工件200往保持面131推抵。In the pasting device 1-3 of the third embodiment, the control unit 100 controls the lifting unit to seal the inside of the vacuum chamber 40, and then opens the on-off valve 17 to attract and hold the workpiece 200 and the ring frame 211 on the holding surfaces 131, 111. , and open the on-off valve 46 to decompress the inside of the vacuum chamber 40 . In the sticking device 1-3 of Embodiment 3, before the air pressure in the vacuum chamber 40 is lower than the predetermined air pressure (absolute air pressure), as shown in FIG. 75 is lowered, the adhesive film 210 is pushed against the workpiece 200 by the adhesive film pushing member 75 , and the workpiece 200 is pushed against the holding surface 131 through the adhesive film 210 to suppress the positional deviation of the workpiece 200 . In addition, in the present invention, the sticking device 1-3 preferably lowers the adhesive film pressing member 75 immediately before the air pressure in the vacuum chamber 40 falls below a predetermined air pressure. Moreover, in the present invention, the pasting device 1-3 can also lower the adhesive film pressing member 75 after sucking and holding the workpiece 200 and before starting to depressurize, so that the adhesive film pressing member 75 penetrates the adhesive film 210 to move the workpiece 200 to the other side. The retaining surface 131 is pushed against.

實施方式3之黏貼裝置1-3中,控制單元100控制升降單元60而使吸引台10上升,並控制輥移動單元30使黏貼輥20沿著水平方向移動,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205,且關閉開關閥46並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內。此外,實施方式3之黏貼裝置1-3中,若黏貼輥20如圖9所示地開始將膠膜210黏貼於工件200的背面205的外緣部,則控制單元100控制升降單元76,使膠膜推壓構件75上升並從膠膜210撤離。In the gluing device 1-3 of Embodiment 3, the control unit 100 controls the lifting unit 60 to raise the suction table 10, and controls the roller moving unit 30 to move the gluing roller 20 in the horizontal direction, and the same as Embodiment 1. The film 210 is attached to the back surface 205 of the workpiece 200 , and the on-off valve 46 is closed and the on-off valve 49 is opened to supply air from the air supply source 50 through the supply path 48 into the vacuum chamber 40 . In addition, in the sticking device 1-3 of Embodiment 3, if the sticking roller 20 starts sticking the adhesive film 210 to the outer edge of the back surface 205 of the workpiece 200 as shown in FIG. The glue film pressing member 75 rises and withdraws from the glue film 210 .

實施方式3之保持機構2-3及黏貼裝置1-3具備具有膠膜推壓構件75之偏移防止手段70-3,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-3 and the sticking device 1-3 of Embodiment 3 are provided with the offset prevention means 70-3 having the adhesive film pressing member 75, so even if the inside of the vacuum chamber 40 is decompressed and the suction force of the table 10 is sucked The lowering also functions to hold the workpiece 200 on the holding surface 131 without positional displacement as in the first embodiment, and to suppress the positional displacement of the workpiece 200 without using an electrostatic chuck.

[實施方式4] 基於圖式說明本發明的實施方式4之黏貼裝置。圖10係示意性地表示將實施方式4之黏貼裝置的吸引台所吸引保持之工件壓緊於保持面之狀態之剖面圖。此外,在圖10中,對與實施方式1相同的部分標記相同的符號並省略說明。 [Embodiment 4] A sticking device according to Embodiment 4 of the present invention will be described based on the drawings. 10 is a cross-sectional view schematically showing a state in which a workpiece sucked and held by the suction table of the bonding apparatus according to Embodiment 4 is pressed against the holding surface. In addition, in FIG. 10, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.

如圖10所示,實施方式4之黏貼裝置1-4的保持機構2-4中,偏移防止手段70-4具有推壓構件77以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除此之外則與實施方式1相同。推壓構件77係推壓吸引台10的保持面131上的工件200的上表面亦即背面205的構件。As shown in FIG. 10 , in the holding mechanism 2-4 of the pasting device 1-4 of Embodiment 4, the displacement prevention means 70-4 has a pushing member 77 instead of the adhesive layer 14, and is placed on the upper surface of the workpiece holding part 12. The disc-shaped porous material 13 such as porous ceramics is attached to the center of 121 , and the surface of the porous material 13 is a holding surface 131 for attracting and holding the workpiece 200 . The pressing member 77 is a member that presses the back surface 205 that is the upper surface of the workpiece 200 on the holding surface 131 of the suction table 10 .

實施方式4之黏貼裝置1-4的推壓構件77被形成為能侵入黏貼膠膜210之前的保持面131上的工件200的背面205與膠膜210之間的板狀,且被配置成藉由移動手段78而在水平方向移動自如。在實施方式4中,推壓構件77的移動方向相對於黏貼輥20的移動方向呈交叉(正交)。較佳為,若推壓構件77位於保持面131上,則至少一部份位於保持面131的中心上。但是,在本發明中,推壓構件77的位置並不受限於此,並可推壓工件200上的任何位置。The pressing member 77 of the pasting device 1-4 of Embodiment 4 is formed in a plate shape capable of intruding between the back surface 205 of the workpiece 200 and the adhesive film 210 on the holding surface 131 before the adhesive film 210 is pasted, and is arranged so as to It can move freely in the horizontal direction by the moving means 78 . In Embodiment 4, the moving direction of the pressing member 77 intersects (orthogonally) with respect to the moving direction of the bonding roller 20 . Preferably, if the pushing member 77 is located on the holding surface 131 , at least a part thereof is located on the center of the holding surface 131 . However, in the present invention, the position of the pressing member 77 is not limited thereto, and any position on the workpiece 200 may be pressed.

實施方式4之黏貼裝置1-4中,控制單元100在控制升降單元而將真空腔室40的內部密閉之後,開啟開關閥17而將工件200及環狀框架211吸引保持於保持面131、111,並開啟開關閥46而使真空腔室40的內部減壓。實施方式4之黏貼裝置1-4中,控制單元100在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖10所示,控制移動手段78而使推壓構件77侵入保持面131上的工件200的背面205與膠膜210之間,並以推壓構件77將工件200往保持面131推抵,而抑制工件200的位置偏移。並且,在本發明中,黏貼裝置1-4亦可在以吸引台10吸引保持工件200之後且開始真空腔室40的減壓之前,以推壓構件77將工件200往保持面131推抵。In the pasting device 1-4 of the fourth embodiment, the control unit 100 controls the lifting unit to seal the inside of the vacuum chamber 40, and then opens the on-off valve 17 to attract and hold the workpiece 200 and the ring frame 211 on the holding surfaces 131, 111. , and open the on-off valve 46 to depressurize the inside of the vacuum chamber 40 . In the sticking device 1-4 of Embodiment 4, the control unit 100 controls the moving means 78 to cause the pressing member 77 to penetrate as shown in FIG. Between the back surface 205 of the workpiece 200 on the holding surface 131 and the adhesive film 210 , the workpiece 200 is pushed against the holding surface 131 by the pushing member 77 , thereby suppressing the positional deviation of the workpiece 200 . Furthermore, in the present invention, the sticking device 1 - 4 may push the workpiece 200 against the holding surface 131 with the pushing member 77 after the workpiece 200 is sucked and held by the suction table 10 and before the vacuum chamber 40 is depressurized.

實施方式4之黏貼裝置1-4中,控制單元100控制升降單元60而使吸引台10上升,並控制輥移動單元30而使黏貼輥20沿著水平方向移動,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205。黏貼裝置1-4係與實施方式1同樣地在將膠膜210黏貼於工件200的背面205之後,關閉開關閥46,並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內。此外,實施方式4之黏貼裝置1-4中,若黏貼輥20開始將膠膜210黏貼於工件200的背面205的外緣部,則控制單元100控制移動手段78,使推壓構件77在水平方向移動,而使推壓構件77從工件200的背面205與膠膜210之間撤離。In the pasting device 1-4 of the fourth embodiment, the control unit 100 controls the lifting unit 60 to raise the suction table 10, and controls the roller moving unit 30 to move the pasting roller 20 in the horizontal direction, and the same as the first embodiment. The adhesive film 210 is pasted on the back surface 205 of the workpiece 200 . After sticking the adhesive film 210 to the back surface 205 of the workpiece 200 in the same manner as in Embodiment 1, the sticking device 1-4 closes the on-off valve 46 and opens the on-off valve 49 to supply air from the air supply source 50 through the supply path 48 to the Inside the vacuum chamber 40. In addition, in the pasting device 1-4 of Embodiment 4, when the pasting roller 20 starts pasting the adhesive film 210 on the outer edge of the back surface 205 of the workpiece 200, the control unit 100 controls the moving means 78 so that the pressing member 77 is positioned horizontally. direction, so that the pushing member 77 is withdrawn from between the back surface 205 of the workpiece 200 and the adhesive film 210 .

實施方式4之保持機構2-4及黏貼裝置1-4具備具有推壓構件77之偏移防止手段70-4,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地,發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-4 and the sticking device 1-4 of Embodiment 4 are equipped with the displacement prevention means 70-4 having the pressing member 77, so even if the vacuum chamber 40 is decompressed and the suction force of the suction table 10 is reduced, Also like the first embodiment, the workpiece 200 can be held on the holding surface 131 without positional displacement, and the positional displacement of the workpiece 200 can be suppressed without using an electrostatic chuck.

此外,本發明並不受限於上述實施方式。亦即,可在不脫離本發明的主旨之範圍內可進行各種變形並實施。In addition, the present invention is not limited to the above-mentioned embodiments. That is, various modifications and implementations are possible without departing from the gist of the present invention.

1,1-1,1-2,1-3,1-4:黏貼裝置 2,2-1,2-2,2-3,2-4:保持機構 10:吸引台 11:框架保持部(膠膜保持單元) 14:黏性層(具有黏性力之構件) 20:黏貼輥 40:真空腔室 70,70-2,70-3,70-4:偏移防止手段 71:工件固定構件 77:推壓構件 131,141:保持面 200:工件 205:背面(上表面) 210:膠膜 1,1-1,1-2,1-3,1-4: pasting device 2,2-1,2-2,2-3,2-4: holding mechanism 10: Attraction Desk 11:Frame holding part (film holding unit) 14: Viscous layer (components with viscous force) 20: pasting roller 40: Vacuum chamber 70,70-2,70-3,70-4: prevention of shifting means 71: Workpiece fixing member 77: push components 131,141: keep the surface 200: workpiece 205: back (upper surface) 210: film

圖1係示意性地表示實施方式1之黏貼裝置的構成例之剖面圖。 圖2係示意性地表示藉由圖1所示之黏貼裝置而被黏貼於膠膜之工件之立體圖。 圖3係示意性地表示將工件及環狀框架吸引保持於圖1所示之黏貼裝置的吸引台之狀態之剖面圖。 圖4係示意性地表示將膠膜壓緊於圖3所示之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。 圖5係示意性地表示實施方式1的變形例之黏貼裝置的構成例之剖面圖。 圖6係示意性地表示實施方式2之黏貼裝置的構成例之剖面圖。 圖7係示意性地表示以工件固定構件固定實施方式2之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。 圖8係示意性地表示將膠膜壓緊於實施方式3之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。 圖9係示意性地表示圖8所示之黏貼裝置的黏貼輥將膠膜黏貼於工件的背面之狀態之剖面圖。 圖10係示意性地表示將實施方式4之黏貼裝置的吸引台所吸引保持之工件壓緊於保持面之狀態之剖面圖。 Fig. 1 is a cross-sectional view schematically showing a configuration example of an adhering device according to Embodiment 1. Fig. 2 is a perspective view schematically showing a workpiece pasted on an adhesive film by the pasting device shown in Fig. 1 . Fig. 3 is a cross-sectional view schematically showing a state in which a workpiece and a ring frame are sucked and held on the suction table of the bonding apparatus shown in Fig. 1 . Fig. 4 is a cross-sectional view schematically showing the state of the workpiece being sucked and held by the adhesive film pressed against the suction table of the pasting device shown in Fig. 3 . Fig. 5 is a cross-sectional view schematically showing a configuration example of a sticking device according to a modified example of the first embodiment. Fig. 6 is a cross-sectional view schematically showing a configuration example of a sticking device according to Embodiment 2. Fig. 7 is a cross-sectional view schematically showing a state in which the workpiece is sucked and held by the suction table of the bonding apparatus according to the second embodiment by the workpiece fixing member. Fig. 8 is a cross-sectional view schematically showing a state in which the adhesive film is pressed against the suction table of the sticking device of the third embodiment and the workpiece is sucked and held. Fig. 9 is a cross-sectional view schematically showing the state where the adhesive roller of the pasting device shown in Fig. 8 sticks the adhesive film to the back of the workpiece. 10 is a cross-sectional view schematically showing a state in which a workpiece sucked and held by the suction table of the bonding apparatus according to Embodiment 4 is pressed against the holding surface.

1:黏貼裝置 1: pasting device

2:保持機構 2: Keep the body

10:吸引台 10: Attraction Desk

11:框架保持部(膠膜保持單元) 11: Frame holding part (film holding unit)

111:框架保持面 111: Frame holding surface

112:圓盤部 112: Disc Department

113:圓環部 113: ring part

114:框架用吸引孔 114: Attraction hole for frame

12:工件保持部 12: Workpiece holding part

121:上表面 121: upper surface

14:黏性層(具有黏性力的構件) 14: Viscous layer (component with viscous force)

141:保持面 141: keep surface

142:吸引孔 142: suction hole

15:吸引路徑 15: Attraction path

16:吸引源 16: Source of Attraction

17:開關閥 17: switch valve

20:黏貼輥 20: pasting roller

21:支撐構件 21: Support member

30:輥移動單元 30: Roller moving unit

40:真空腔室 40: Vacuum chamber

41:上部框體 41: Upper frame

42:下部框體 42: Lower frame

43:圓板部 43: Circular plate part

44:圓筒部 44: Cylindrical part

45:排氣路徑 45: exhaust path

46:開關閥 46: switch valve

47:真空源 47: Vacuum source

48:供給路徑 48: Supply path

49:開關閥 49: switch valve

50:空氣供給源 50: Air supply source

60:升降單元 60: Lifting unit

70:偏移防止手段 70: Offset prevention means

100:控制單元 100: control unit

Claims (5)

一種保持機構,其保持工件,且具備: 吸引台,其具有吸引保持該工件之保持面; 真空腔室,其容納該吸引台且內部能減壓;以及 偏移防止手段,其在以該吸引台吸引保持該工件之狀態下將該真空腔室內進行減壓之際,防止該工件的偏移。 A holding mechanism that holds a workpiece and has: a suction table having a holding surface for attracting and holding the workpiece; a vacuum chamber that accommodates the suction table and can depressurize inside; and The offset preventing means prevents the offset of the workpiece when the pressure in the vacuum chamber is reduced while the workpiece is sucked and held by the suction table. 如請求項1之保持機構,其中, 該吸引台的該保持面的至少一部分係由具有黏性力之構件所構成,且該吸引台兼用作該偏移防止手段。 The maintenance organization as claimed in item 1, wherein, At least a part of the holding surface of the suction table is constituted by a member having an adhesive force, and the suction table is also used as the displacement preventing means. 如請求項1之保持機構,其中, 該偏移防止手段具有多個工件固定構件,該多個工件固定構件被構成為從被該吸引台保持之該工件的外周緣的外側朝向該保持面的中心移動自如。 The maintenance organization as claimed in item 1, wherein, The displacement preventing means has a plurality of workpiece fixing members configured to be movable from the outside of the outer peripheral edge of the workpiece held by the suction table toward the center of the holding surface. 如請求項1之保持機構,其中, 該偏移防止手段具有推壓構件,該推壓構件推壓該吸引台上的該工件的上表面側。 The maintenance organization as claimed in item 1, wherein, The displacement preventing means has a pressing member that presses the upper surface side of the workpiece on the suction table. 一種黏貼裝置,其將膠膜黏貼於工件,且具備: 吸引台,其具有吸引保持該工件之保持面; 膠膜保持單元,其在使該膠膜面對該吸引台上的該工件之狀態下保持該膠膜; 黏貼輥,其將被該膠膜保持單元保持之該膠膜黏貼於該吸引台上的該工件; 真空腔室,其容納該吸引台與該黏貼輥且內部能減壓;以及 偏移防止手段,其在以該吸引台吸引保持該工件之狀態下將該真空腔室內進行減壓之際,防止該工件的偏移。 A sticking device, which sticks an adhesive film to a workpiece, and has: a suction table having a holding surface for attracting and holding the workpiece; an adhesive film holding unit that holds the adhesive film in a state where the adhesive film faces the workpiece on the suction table; a pasting roller, which sticks the adhesive film held by the adhesive film holding unit to the workpiece on the suction table; a vacuum chamber, which accommodates the suction table and the bonding roller and can be decompressed inside; and The offset preventing means prevents the offset of the workpiece when the pressure in the vacuum chamber is reduced while the workpiece is sucked and held by the suction table.
TW111145288A 2021-11-30 2022-11-25 Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck TW202324574A (en)

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