TW202324574A - Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck - Google Patents
Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck Download PDFInfo
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- TW202324574A TW202324574A TW111145288A TW111145288A TW202324574A TW 202324574 A TW202324574 A TW 202324574A TW 111145288 A TW111145288 A TW 111145288A TW 111145288 A TW111145288 A TW 111145288A TW 202324574 A TW202324574 A TW 202324574A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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Abstract
Description
本發明係關於一種保持工件之保持機構及黏貼裝置。The invention relates to a holding mechanism and a pasting device for holding workpieces.
例如在半導體元件的製造步驟中,將各種膠膜黏貼於半導體晶圓之膠膜黏貼裝置(例如,參照專利文獻1及專利文獻2)被廣泛利用。For example, in the manufacturing process of a semiconductor element, the adhesive film sticking apparatus which sticks various adhesive films to a semiconductor wafer (for example, refer patent document 1 and patent document 2) is widely used.
另一方面,被稱為真空黏貼機之在減壓環境內將膠膜黏貼於晶圓之膠膜黏貼裝置(例如,參照專利文獻3)亦被廣泛利用。此種膠膜黏貼裝置在減壓環境內將膠膜黏貼於晶圓之後,以與大氣的差壓而使膠膜與晶圓密接,防止在晶圓與膠膜之間形成氣泡。 [習知技術文獻] [專利文獻] On the other hand, an adhesive film attaching device called a vacuum attacher that attaches an adhesive film to a wafer in a reduced pressure environment (for example, refer to Patent Document 3) is also widely used. This kind of adhesive film sticking device sticks the adhesive film to the wafer in a decompressed environment, and uses the differential pressure from the atmosphere to make the adhesive film and the wafer tightly bonded, preventing the formation of air bubbles between the wafer and the adhesive film. [Prior art literature] [Patent Document]
[專利文獻1]日本特開2020-047899號公報 [專利文獻2]日本特開2020-047699號公報 [專利文獻3]日本特開2021-034605號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2020-047899 [Patent Document 2] Japanese Patent Laid-Open No. 2020-047699 [Patent Document 3] Japanese Patent Laid-Open No. 2021-034605
[發明所欲解決的課題] 通常為了在真空腔室(減壓腔室)內保持晶圓,而會利用靜電卡盤台。但是,靜電卡盤台的價格昂貴,而切盼利用吸引保持被加工物的吸引台。然而,若腔室內減壓,則存在於吸引台無法將工件持續吸附於吸引台表面,且在吸引力消失之際工件會移動並從吸引保持之位置偏移之問題。 [Problems to be Solved by the Invention] Generally, an electrostatic chuck table is used to hold wafers in a vacuum chamber (decompression chamber). However, the electrostatic chuck table is expensive, and a suction table that uses suction to hold a workpiece has been desired. However, if the chamber is depressurized, there is a problem that the suction table cannot continuously absorb the workpiece on the surface of the suction table, and when the suction force disappears, the workpiece will move and deviate from the position held by suction.
尤其在工件被薄化而產生翹曲之情形中,若從以吸引台吸引保持之狀態下吸引力消失,則工件會大幅移動,因而成為問題。In particular, when the workpiece is thinned and warped, if the suction force disappears from the state of suction and holding by the suction table, the workpiece will move greatly, which is a problem.
本發明之目的為提供一種保持機構及黏貼裝置,其不利用靜電卡盤而可抑制工件的位置偏移。An object of the present invention is to provide a holding mechanism and an adhering device which can suppress positional deviation of workpieces without using an electrostatic chuck.
[解決課題的技術手段] 為了解決上述之課題並達成目的,本發明的保持機構為保持工件之保持機構,其特徵在於具備:吸引台,其具有吸引保持工件之保持面;真空腔室,其容納該吸引台且內部能減壓;以及偏移防止手段,其在以該吸引台吸引保持工件之狀態下將該真空腔室內進行減壓之際,防止工件的偏移。 [Technical means to solve the problem] In order to solve the above-mentioned problems and achieve the purpose, the holding mechanism of the present invention is a holding mechanism for holding a workpiece, which is characterized in that it includes: a suction table, which has a holding surface for attracting and holding the workpiece; a vacuum chamber, which houses the suction table and has an internal capacity decompression; and means for preventing deviation of the workpiece when decompression is performed in the vacuum chamber in a state where the workpiece is sucked and held by the suction table.
在所述保持機構中,該吸引台的該保持面的至少一部分可由具有黏性力之構件所構成,且該吸引台可兼用作該偏移防止手段。In the holding mechanism, at least a part of the holding surface of the suction table may be constituted by a member having an adhesive force, and the suction table may also serve as the displacement preventing means.
在所述保持機構中,該偏移防止手段可具有多個工件固定構件,所述多個工件固定構件被構成為從被該吸引台保持之工件的外周緣的外側朝向該保持面的中心移動自如。In the holding mechanism, the displacement preventing means may have a plurality of workpiece fixing members configured to move from the outer side of the outer periphery of the workpiece held by the suction table toward the center of the holding surface. freely.
在所述保持機構中,該偏移防止手段可具有推壓構件,所述推壓構件推壓該吸引台上的工件的上表面側。In the holding mechanism, the displacement preventing means may have a pressing member that presses an upper surface side of the workpiece on the suction table.
本發明的黏貼裝置為將膠膜黏貼於工件之黏貼裝置,其特徵在於具備:吸引台,其具有吸引保持工件之保持面;膠膜保持單元,其在使膠膜面對該吸引台上的工件之狀態下保持該膠膜;黏貼輥,其將被該膠膜保持單元保持之膠膜黏貼於該吸引台上的工件;真空腔室,其容納該吸引台與該黏貼輥且內部能減壓;以及偏移防止手段,其在以該吸引台吸引保持工件之狀態下將該真空腔室內進行減壓之際,防止工件的偏移。The sticking device of the present invention is a sticking device for sticking an adhesive film to a workpiece, and is characterized in that it has: a suction table, which has a holding surface for attracting and holding the workpiece; an adhesive film holding unit, which makes the adhesive film face the suction table. The adhesive film is held in the state of the workpiece; the adhesive roller, which sticks the adhesive film held by the adhesive film holding unit to the workpiece on the suction table; the vacuum chamber, which accommodates the suction table and the adhesive roller and can reduce the pressure inside and an offset preventing means for preventing the offset of the workpiece when the vacuum chamber is depressurized in a state where the workpiece is sucked and held by the suction table.
[發明功效] 本發明發揮可不利用靜電卡盤而抑制工件的位置偏移之功效。 [Efficacy of the invention] The present invention exerts the effect of suppressing positional deviation of workpieces without using an electrostatic chuck.
針對用於實施本發明的方式(實施方式),一邊參照圖式一邊詳細地進行說明。本發明並不受限於以下的實施方式所記載之內容。並且,在以下所記載之構成要素中,包含本發明所屬技術領域中具有通常知識者可容易思及者、實質上相同者。再者,以下所記載之構成能適當組合。並且,在不脫離本發明的主旨之範圍內,可進行構成的各種省略、取代或變更。Modes (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. In addition, the components described below include those that can be easily conceived by a person having ordinary knowledge in the technical field to which the present invention pertains, and those that are substantially the same. In addition, the structure described below can be combined suitably. In addition, various omissions, substitutions, or changes in the configuration can be made without departing from the scope of the present invention.
[實施方式1] 基於圖式說明本發明的實施方式1之黏貼裝置。圖1係示意性地表示實施方式1之黏貼裝置的構成例之剖面圖。圖2係示意性地表示藉由圖1所示之黏貼裝置而被黏貼於膠膜之工件之立體圖。 [Embodiment 1] The bonding apparatus according to Embodiment 1 of the present invention will be described based on the drawings. Fig. 1 is a cross-sectional view schematically showing a configuration example of an adhering device according to Embodiment 1. Fig. 2 is a perspective view schematically showing a workpiece pasted on an adhesive film by the pasting device shown in Fig. 1 .
實施方式1之圖1所示之黏貼裝置1為將膠膜210黏貼於圖2所示之工件200的背面205之裝置。藉由實施方式1之黏貼裝置1而黏貼有膠膜210之工件200係以矽(Si)、藍寶石(Al
2O
3)、砷化鎵(GaAs)或碳化矽(SiC)等作為基板201之圓板狀的半導體晶圓、光元件晶圓等晶圓。
The sticking device 1 shown in FIG. 1 of Embodiment 1 is a device for sticking an
如圖2所示,工件200係在以交叉之多條分割預定線202所劃分之正面203的各區域中分別形成有元件204。元件204例如為IC(Integrated Circuit,積體電路)或LSI(Large Scale Integration,大型積體電路)等積體電路、CCD(Charge Coupled Device,電荷耦合元件)或CMOS(Complementary Metal Oxide Semiconductor,互補金屬氧化半導體)等影像感測器、MEMS(Micro Electro Mechanical Systems,微機電系統)或者記憶體(半導體記憶裝置)等。工件200係在正面203與正面203的背側的背面205涵蓋整個圓周而形成往外周方向凸狀地彎曲之倒角部206。As shown in FIG. 2 , the
在實施方式1中,工件200在背面205側黏貼有圓板狀的膠膜210,且被支撐於環狀框架211的內側的開口內,所述圓板狀的膠膜210係直徑大於工件200且在外緣部黏貼環狀框架211。工件200係沿著分割預定線202而被分割成一個個元件204。在實施方式1中,膠膜210具備:基材層,其具有可撓性且藉由非黏著性的樹脂所構成;以及黏著層,其層積於基材層且藉由具有可撓性與黏著性之樹脂所構成。In Embodiment 1, the
實施方式1之黏貼裝置1為將圓板狀的膠膜210黏貼於工件200的背面205之裝置,所述圓板狀的膠膜210係直徑大於工件200且在外緣部黏貼有環狀框架211。如圖1所示,黏貼裝置1具備保持機構2及控制單元100。The pasting device 1 of Embodiment 1 is a device for sticking a disc-shaped
保持機構2為保持工件200之機構。保持機構2具備:吸引台10、黏貼輥20、輥移動單元30、真空腔室40以及使吸引台10升降之升降單元60。The
吸引台10具備:框架保持部11,其具有吸引保持環狀框架211之框架保持面111;以及工件保持部12,其具有吸引保持工件200之保持面141。框架保持部11一體地具備:圓盤狀的圓盤部112,其外徑大於工件200的外徑;以及圓環部113,其從圓盤部112的外緣立設且內外徑與環狀框架211的內外徑相等。圓環部113的上表面為吸引保持環狀框架211之框架保持面111。框架保持面111係沿著水平方向平坦地形成。框架用吸引孔114在框架保持面111開口。The suction table 10 is provided with: the
工件保持部12被形成為外徑些許小於工件200的外徑的圓板狀,且被配置成在框架保持部11的圓盤部112上與框架保持部11同軸。工件保持部12的上表面121係沿著水平方向平坦地形成。在上表面121層積有藉由矽系樹脂、矽系橡膠或氟系橡膠所構成之黏性層14(相當於具有黏性力之構件)。黏性層14例如可藉由UMI股份有限公司製的「flex carrier(註冊商標)」或EXSEAL股份有限公司製的「GEL BASE(註冊商標)」等所構成。The
若黏性層14載置工件200的正面203側,則會以黏性力黏貼並以黏性力固定工件200的正面203。此外,所謂黏性力,係弱黏著力或強黏著力,所謂弱黏著力,係將球狀的珠粒作為物品而載置於黏性層14,並將黏性層14持續傾斜且球狀的珠粒開始滾動時的黏性層14相對於水平方向之角度為3.5度時的黏著力,所謂強黏著力,係球狀的珠粒開始滾動時的黏性層14相對於水平方向之角度即使為10度亦不會在黏性層14上滾動並保持球狀的珠粒時的黏著力。If the
在實施方式1中,黏性層14的表面為吸引保持工件200之保持面141。在實施方式1中,雖保持面141整體係藉由黏性層14的表面亦即黏性層14所構成,但在本發明中並不受限於此,只要保持面141的至少一部分係藉由黏性層14所構成即可。並且,在實施方式1中,保持面141被配置在低於框架保持面111之位置。In Embodiment 1, the surface of the
在保持面141開口有多個吸引孔142,所述吸引孔142貫通黏性層14且在工件保持部12的上表面121開口。框架用吸引孔114及吸引孔142係與設置於框架保持部11及工件保持部12內之吸引路徑15連接。吸引路徑15係與吸引源16連接。在吸引路徑15的框架保持部11與吸引源16之間設置有開關閥17。A plurality of
吸引台10係在保持面141載置工件200的正面203側並在框架保持面111載置黏貼膠膜210的外緣部之環狀框架211,且開啟開關閥17而吸引孔114、142被吸引源16吸引,藉此將工件200吸引保持於保持面141並將環狀框架211吸引保持於框架保持面111。如此,在實施方式1中,框架保持部11為膠膜保持單元,所述膠膜保持單元係藉由在使膠膜210面對吸引台10的工件保持部12的保持面141上的工件200之狀態下吸引保持環狀框架211而保持膠膜210。The suction table 10 is placed on the
黏貼輥20將黏貼於被框架保持部11保持之環狀框架211之膠膜210黏貼於吸引台10的保持面141上的工件200。黏貼輥20係隔著黏貼於被吸引保持在吸引台10之環狀框架211之膠膜210而沿著鉛直方向面對被吸引保持於吸引台10之工件200。黏貼輥20被設置成能藉由輥移動單元30而沿著工件200的背面205且沿著與水平方向平行的方向移動。The sticking
黏貼輥20係藉由支撐構件21而被繞著與水平方向平行的軸心旋轉自如地支撐,配置於被保持於吸引台10之工件200的上方,且隔著黏貼於被吸引保持於吸引台10之環狀框架211之膠膜210而沿著鉛直方向面對被保持於吸引台10之工件200。黏貼輥20的軸心係與水平方向平行且與藉由輥移動單元30所致之移動方向呈正交。The
支撐構件21係藉由輥移動單元30而沿著水平方向移動,藉此黏貼輥20沿著工件200的背面205移動。若吸引台10藉由升降單元60而上升,則黏貼輥20將黏貼於被吸引保持於吸引台10之環狀框架211之膠膜210朝向工件200推壓,將膠膜210往工件200推抵且將工件200壓緊於吸引台10。The supporting
如此,黏貼輥20被配置於下述位置:若吸引台10藉由升降單元60而上升,則將膠膜210往工件200推抵且將工件200壓緊於吸引台10。並且,若黏貼輥20在吸引台10藉由升降單元60而上升之狀態下藉由輥移動單元30而沿著工件200的背面205移動,則將膠膜210往工件200推抵且將工件200壓緊於吸引台10,並在膠膜210上轉動而將膠膜210黏貼於工件200的背面205。In this way, the sticking
輥移動單元30使黏貼輥20在水平方向移動。輥移動單元30使支撐構件21在水平方向移動,所述支撐構件21將黏貼輥21支撐成繞著軸心旋轉自如。The
升降單元60使吸引台10沿著鉛直方向升降。升降單元60使吸引台10的框架保持部11在鉛直方向升降。The elevating
真空腔室40為容納吸引台10、黏貼輥20、輥移動單元30及升降單元60且內部能減壓的容器。真空腔室40具備:上部框體41與下部框體42,其能在彼此的外緣接觸之狀態與彼此的外緣分離之狀態之間移動;真空源47,其透過排氣路徑45、開關閥46而與下部框體42連接;以及空氣供給源50,其透過供給路徑48、開關閥49而與上部框體41連接。The
框體41、42一體地具備:圓板部43,其外徑大於環狀框架211;以及圓筒部44,其從圓板部43的外緣立設。框體41、42的圓板部43的外徑相等。框體41、42被配置成圓筒部44的內側的開口沿著Z軸方向面對。上部框體41與下部框體42係藉由未圖示之升降單元而相對地升降移動。上部框體41中,將輥移動單元30安裝於圓板部43。下部框體42中,將升降單元60安裝於圓板部43。The
真空腔室40中,上部框體41與下部框體42藉由升降單元而往互相靠近之方向升降,藉此框體41、42的圓筒部44的外緣彼此以氣密的狀態互相接觸,而將內部與外部隔絕,且內部被密閉。真空腔室40中,上部框體41與下部框體42藉由升降單元而往互相分離之方向升降,藉此框體41、42的圓筒部44的外緣彼此互相分離,而能將工件200及環狀框架211搬入、搬出。In the
控制單元100控制構成黏貼裝置1之各構成要素而使黏貼裝置1執行黏貼動作,所述黏貼動作係將膠膜210黏貼於工件200的背面205。控制單元100為能執行電腦程式的電腦,且具有:運算處理裝置,其具有如CPU(Central Processing Unit,中央處理單元)般的微處理器;記憶裝置,其具有如ROM(Read Only Memory,唯讀記憶體)或RAM(Random Access Memory,隨機存取記憶體)的記憶體;以及輸入輸出介面裝置。The
控制單元100的運算處理裝置在RAM上執行記憶於ROM之電腦程式,生成用於控制黏貼裝置1的控制信號。控制單元100的運算處理裝置將所生成之控制訊號透過輸入輸出介面裝置而輸出至黏貼裝置1的各構成要素。The arithmetic processing device of the
並且,控制單元100係與顯示單元及輸入單元連接,所述顯示單元係藉由顯示加工動作的狀態或圖像等之液晶顯示裝置等所構成,所述輸入單元係在操作員登錄加工條件等之際使用。輸入單元係藉由設置於顯示單元之觸控面板及鍵盤等的其中至少一者所構成。In addition, the
接著,基於圖式說明所述構成的黏貼裝置1的將膠膜210黏貼於工件200的背面205之黏貼動作。圖3係示意性地表示將工件及環狀框架吸引保持於圖1所示之黏貼裝置的吸引台之狀態之剖面圖。圖4係示意性地表示將膠膜壓緊於圖3所示之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。Next, the sticking operation of sticking the
黏貼裝置1中,控制單元100受理並記憶從輸入單元等所輸入之加工條件,且若接收從輸入單元等所輸入之黏貼動作的開始指示,則開始黏貼動作。在黏貼動作中,黏貼裝置1的控制單元100控制未圖示之升降單元而使框體41、42相互分離。在黏貼動作中,若黏貼裝置1中將工件200的正面203側載置於保持面141,且將膠膜210的外緣部所黏貼之環狀框架211載置於框架保持面111,則控制升降單元,使框體41、42彼此靠近並使框體41、42的圓筒部44的外緣彼此以氣密的狀態相互接觸,而將真空腔室40的內部密閉。In the pasting device 1, the
在黏貼動作中,如圖3所示,黏貼裝置1中控制單元100開啟開關閥17,藉由吸引源16通過吸引路徑15吸引吸引孔114、142,而將工件200的正面203側吸引保持於保持面141,且將環狀框架211吸引保持於框架保持面111。此時,黏性層14係藉由黏性力而將工件200固定於保持面141。在黏貼動作中,黏貼裝置1中控制單元100開啟開關閥46,藉由真空源47通過排氣路徑45將真空腔室40內的空氣往真空腔室40外排氣,而將真空腔室40內減壓。此時,被吸引保持於保持面141之工件200與膠膜210之間也被減壓。In the pasting operation, as shown in FIG. 3 , the
在黏貼動作中,黏貼裝置1在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖4所示,控制輥移動單元30而將黏貼輥20隔著膠膜210定位於工件200的上方,藉由升降單元60而使吸引台10上升,以黏貼輥20將膠膜210往工件200推抵,且透過膠膜210將工件200往保持面141推抵,而抑制工件200的位置偏移。此外,所謂預定的氣壓係下述情況之真空腔室40內的氣壓:若保持面141的工件200吸引保持之吸引力下降,且不以某種力將工件200壓緊於保持面141,則工件200相對於保持面141會位置偏移。In the pasting action, before the air pressure in the
如此進行,在實施方式1中,黏貼裝置1的黏性層14與黏貼輥20構成偏移防止手段70,所述偏移防止手段70在以吸引台10吸引保持工件200之狀態下將真空腔室40內減壓之際,防止工件200的偏移。如此,黏貼裝置1的保持機構2具備偏移防止手段70。並且,在實施方式1中,因保持面141為黏性層14的表面,故吸引台10亦構成偏移防止手段70,亦即,吸引台10亦兼用作偏移防止手段70。在實施方式1中,黏貼裝置1為了抑制在已壓緊之區域中於膠膜210與工件200之間形成氣泡,較佳為在即將到達所述預定的氣壓之前以黏貼輥20壓緊膠膜210。並且,在本發明中,黏貼裝置1以黏貼輥20壓緊膠膜210之時間點為即將達到預定的氣壓之前以外,亦可為以保持面141保持工件200之後且開始減壓之前。並且,在本發明中,黏貼裝置1亦可不以黏貼輥20壓緊膠膜,而僅以黏性層14的黏性力抑制工件200的位置偏移。In this way, in Embodiment 1, the
在黏貼動作中,黏貼裝置1中,在真空腔室40內的氣壓低於預定的氣壓並被減壓直至真空狀態之後,控制單元100控制輥移動單元30使黏貼輥20沿著水平方向移動,而將膠膜210黏貼於工件200的背面205。在黏貼動作中,黏貼裝置1在將膠膜210黏貼於工件200的背面205之後,關閉開關閥46,並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內,使真空腔室40內的氣壓上升直至大氣壓,並使膠膜210與工件200的背面205密接。如此進行,黏貼裝置1在黏貼動作中將膠膜210黏貼於工件200的背面205。並且,在本發明中,黏貼裝置1中除了吸引源16之外還透過開關閥17將未圖示之空氣供給源與保持面141連接,而透過開關閥17將空氣供給源及吸引源16選擇自如地與保持面141連接,則在從保持面141剝離工件200時,亦可將來自空氣供給源的空氣從保持面141進行吹氣,使工件200從具有黏性力之黏性層14剝離變得容易。In the pasting operation, in the pasting device 1, after the air pressure in the
以上說明之實施方式1之保持機構2及黏貼機構1具備偏移防止手段70,所述偏移防止手段70係以構成保持面141之黏性層14以及將工件200往黏性層14推抵之黏貼輥20所構成,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦可將工件200不會位置偏移地保持於保持面141。The
其結果,實施方式1之保持機構2及黏貼裝置1發揮可不利用靜電卡盤而抑制工件200的位置偏移之功效。As a result, the
[變形例] 基於圖式說明本發明的實施方式1的變形例之黏貼裝置。圖5係示意性地表示實施方式1的變形例之黏貼裝置的構成例之剖面圖。此外,圖5中,對與實施方式1相同的部分標記相同的符號並省略說明。 [modified example] A sticking device according to a modified example of Embodiment 1 of the present invention will be described based on the drawings. Fig. 5 is a cross-sectional view schematically showing a configuration example of a sticking device according to a modified example of the first embodiment. In addition, in FIG. 5, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.
如圖5所示,實施方式1的變形例之黏貼裝置1-1中,在工件保持部12的外緣部涵蓋整個圓周而設置往上方凸出的凸部122,將黏性層14層積於凸部122上,且將吸引孔142所貫通之黏性層14的表面即保持面141形成為環狀,除此之外則與實施方式1相同。此外,變形例之黏貼裝置1-1的環狀的保持面141係與工件200的未形成元件204之外周剩餘區域對應,且被設定成未支撐形成有元件204之元件區域而支撐外周剩餘區域之大小。變形例之黏貼裝置1-1係藉由未在與形成有元件204之元件區域對應之區域形成黏性層14,而元件204不與黏性層14抵接且降低使元件204汙染之風險以外,從保持面141剝離工件200變得容易。As shown in FIG. 5 , in the pasting device 1-1 according to the modified example of Embodiment 1, the
變形例之保持機構2-1及黏貼裝置1-1係與實施方式1同樣地具備偏移防止手段70,所述偏移防止手段70係以構成保持面141之黏性層14以及將工件200往黏性層14推抵之黏貼輥20所構成,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦發揮可將工件200不會位置偏移地保持於保持面141,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-1 and the sticking device 1-1 of the modified example are equipped with the
[實施方式2]
基於圖式說明本發明的實施方式2之黏貼裝置。圖6係示意性地表示實施方式2之黏貼裝置的構成例之剖面圖。圖7係示意性地表示以工件固定構件固定實施方式2之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。此外,圖6及圖7中,對與實施方式1相同的部分標記相同的符號並省略說明。
[Embodiment 2]
A sticking device according to
如圖6所示,實施方式2之黏貼裝置1-2的保持機構2-2中,偏移防止手段70-2具有多個工件固定構件71以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除此之外則與實施方式1相同。工件固定構件71被構成為從被吸引台10保持之工件200的外周緣的外側朝向保持面131的中心移動自如。As shown in FIG. 6, in the holding mechanism 2-2 of the sticking device 1-2 of
工件固定構件71被配置於吸引台10的框架保持部11的圓盤部112上且於工件保持部12亦即保持面131的外側。工件固定構件71被設置成藉由移動手段72而沿著工件保持部12亦即保持面131的徑向移動自如。工件固定構件71具備:柱部73,其從框架保持部11的圓盤部112立設;以及固定部74,其設置於柱部73的上端且與被吸引保持於工件保持部12的保持面131之工件200的倒角部206面對。在實施方式2中,固定部74係以厚度方向的中央最位於保持面131的外周側之方式,沿著被吸引保持於保持面131之工件200的倒角部206而被形成為剖面圓弧狀。在實施方式2中,固定部74的上端被配置於比被吸引保持於工件保持部12的保持面131之工件200的背面205更下方。The
實施方式2之黏貼裝置1-2中,在將工件200載置於保持面131且將環狀框架211載置於框架保持面111之後,控制單元100控制移動手段72,使工件固定構件71沿著保持面131的徑向而朝向工件200移動。實施方式2之黏貼裝置1-2係以多個工件固定構件71的固定部74夾著保持面131上的工件200的倒角部206,將工件200固定於保持面131上。In the pasting device 1-2 of
之後,實施方式2之黏貼裝置1-2中,控制單元100在控制升降單元而使真空腔室40的內部密閉之後,如圖7所示,開啟開關閥17而將工件200的正面203側吸引保持於保持面131,且將環狀框架211吸引保持於框架保持面111,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205。Afterwards, in the pasting device 1-2 of
實施方式2之保持機構2-2及黏貼裝置1-2具備具有多個工件固定構件71之偏移防止手段70-2,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-2 and the sticking device 1-2 of
[實施方式3] 基於圖式說明本發明的實施方式3之黏貼裝置。圖8係示意性地表示將膠膜壓緊於實施方式3之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。圖9係示意性地表示圖8所示之黏貼裝置的黏貼輥將膠膜黏貼於工件的背面之狀態之剖面圖。此外,圖8及圖9中,對與實施方式1相同的部分標記相同的符號並省略說明。 [Embodiment 3] A sticking device according to Embodiment 3 of the present invention will be described based on the drawings. Fig. 8 is a cross-sectional view schematically showing a state in which the adhesive film is pressed against the suction table of the sticking device of the third embodiment and the workpiece is sucked and held. Fig. 9 is a cross-sectional view schematically showing the state where the adhesive roller of the pasting device shown in Fig. 8 sticks the adhesive film to the back of the workpiece. In addition, in FIG.8 and FIG.9, the same code|symbol is attached|subjected to the same part as Embodiment 1, and description is abbreviate|omitted.
如圖8所示,實施方式3之黏貼裝置1-3的保持機構2-3中,偏移防止手段70-3具有膠膜推壓構件75以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除以之外則與實施方式1相同。膠膜推壓構件75被配置於真空腔室40的上部框體41的圓板部43的與保持面131的中央面對之位置。膠膜推壓構件75被配置成藉由升降單元76而升降自如。As shown in FIG. 8 , in the holding mechanism 2-3 of the sticking device 1-3 of Embodiment 3, the offset prevention means 70-3 has an adhesive
實施方式3之黏貼裝置1-3中,控制單元100在控制升降單元而將真空腔室40的內部密閉之後,開啟開關閥17而將工件200及環狀框架211吸引保持於保持面131、111,並開啟開關閥46而將真空腔室40的內部減壓。實施方式3之黏貼裝置1-3中,控制單元100在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖8所示,控制升降單元76而使膠膜推壓構件75下降,以膠膜推壓構件75將膠膜210往工件200推抵,且透過膠膜210而將工件200往保持面131推抵,抑制工件200的位置偏移。此外,在本發明中,黏貼裝置1-3較佳為在真空腔室40內的氣壓即將低於預定的氣壓之前使膠膜推壓構件75下降。並且,在本發明中,黏貼裝置1-3亦可在吸引保持工件200之後且開始減壓之前使膠膜推壓構件75下降,以膠膜推壓構件75透過膠膜210而將工件200往保持面131推抵。In the pasting device 1-3 of the third embodiment, the
實施方式3之黏貼裝置1-3中,控制單元100控制升降單元60而使吸引台10上升,並控制輥移動單元30使黏貼輥20沿著水平方向移動,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205,且關閉開關閥46並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內。此外,實施方式3之黏貼裝置1-3中,若黏貼輥20如圖9所示地開始將膠膜210黏貼於工件200的背面205的外緣部,則控制單元100控制升降單元76,使膠膜推壓構件75上升並從膠膜210撤離。In the gluing device 1-3 of Embodiment 3, the
實施方式3之保持機構2-3及黏貼裝置1-3具備具有膠膜推壓構件75之偏移防止手段70-3,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-3 and the sticking device 1-3 of Embodiment 3 are provided with the offset prevention means 70-3 having the adhesive
[實施方式4]
基於圖式說明本發明的實施方式4之黏貼裝置。圖10係示意性地表示將實施方式4之黏貼裝置的吸引台所吸引保持之工件壓緊於保持面之狀態之剖面圖。此外,在圖10中,對與實施方式1相同的部分標記相同的符號並省略說明。
[Embodiment 4]
A sticking device according to
如圖10所示,實施方式4之黏貼裝置1-4的保持機構2-4中,偏移防止手段70-4具有推壓構件77以代替黏性層14,在工件保持部12的上表面121的中央安裝有多孔陶瓷等圓板狀的多孔材13,且多孔材13的表面為吸引保持工件200的保持面131,除此之外則與實施方式1相同。推壓構件77係推壓吸引台10的保持面131上的工件200的上表面亦即背面205的構件。As shown in FIG. 10 , in the holding mechanism 2-4 of the pasting device 1-4 of
實施方式4之黏貼裝置1-4的推壓構件77被形成為能侵入黏貼膠膜210之前的保持面131上的工件200的背面205與膠膜210之間的板狀,且被配置成藉由移動手段78而在水平方向移動自如。在實施方式4中,推壓構件77的移動方向相對於黏貼輥20的移動方向呈交叉(正交)。較佳為,若推壓構件77位於保持面131上,則至少一部份位於保持面131的中心上。但是,在本發明中,推壓構件77的位置並不受限於此,並可推壓工件200上的任何位置。The pressing
實施方式4之黏貼裝置1-4中,控制單元100在控制升降單元而將真空腔室40的內部密閉之後,開啟開關閥17而將工件200及環狀框架211吸引保持於保持面131、111,並開啟開關閥46而使真空腔室40的內部減壓。實施方式4之黏貼裝置1-4中,控制單元100在真空腔室40內的氣壓低於預定的氣壓(絕對氣壓)之前,如圖10所示,控制移動手段78而使推壓構件77侵入保持面131上的工件200的背面205與膠膜210之間,並以推壓構件77將工件200往保持面131推抵,而抑制工件200的位置偏移。並且,在本發明中,黏貼裝置1-4亦可在以吸引台10吸引保持工件200之後且開始真空腔室40的減壓之前,以推壓構件77將工件200往保持面131推抵。In the pasting device 1-4 of the fourth embodiment, the
實施方式4之黏貼裝置1-4中,控制單元100控制升降單元60而使吸引台10上升,並控制輥移動單元30而使黏貼輥20沿著水平方向移動,而與實施方式1同樣地將膠膜210黏貼於工件200的背面205。黏貼裝置1-4係與實施方式1同樣地在將膠膜210黏貼於工件200的背面205之後,關閉開關閥46,並開啟開關閥49而從空氣供給源50通過供給路徑48將空氣供給至真空腔室40內。此外,實施方式4之黏貼裝置1-4中,若黏貼輥20開始將膠膜210黏貼於工件200的背面205的外緣部,則控制單元100控制移動手段78,使推壓構件77在水平方向移動,而使推壓構件77從工件200的背面205與膠膜210之間撤離。In the pasting device 1-4 of the fourth embodiment, the
實施方式4之保持機構2-4及黏貼裝置1-4具備具有推壓構件77之偏移防止手段70-4,因此,即使將真空腔室40內減壓且吸引台10的吸引力下降,亦與實施方式1同樣地,發揮可將工件200不會位置偏移地保持於保持面131,且可不利用靜電卡盤而抑制工件200的位置偏移之功效。The holding mechanism 2-4 and the sticking device 1-4 of
此外,本發明並不受限於上述實施方式。亦即,可在不脫離本發明的主旨之範圍內可進行各種變形並實施。In addition, the present invention is not limited to the above-mentioned embodiments. That is, various modifications and implementations are possible without departing from the gist of the present invention.
1,1-1,1-2,1-3,1-4:黏貼裝置
2,2-1,2-2,2-3,2-4:保持機構
10:吸引台
11:框架保持部(膠膜保持單元)
14:黏性層(具有黏性力之構件)
20:黏貼輥
40:真空腔室
70,70-2,70-3,70-4:偏移防止手段
71:工件固定構件
77:推壓構件
131,141:保持面
200:工件
205:背面(上表面)
210:膠膜
1,1-1,1-2,1-3,1-4:
圖1係示意性地表示實施方式1之黏貼裝置的構成例之剖面圖。
圖2係示意性地表示藉由圖1所示之黏貼裝置而被黏貼於膠膜之工件之立體圖。
圖3係示意性地表示將工件及環狀框架吸引保持於圖1所示之黏貼裝置的吸引台之狀態之剖面圖。
圖4係示意性地表示將膠膜壓緊於圖3所示之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。
圖5係示意性地表示實施方式1的變形例之黏貼裝置的構成例之剖面圖。
圖6係示意性地表示實施方式2之黏貼裝置的構成例之剖面圖。
圖7係示意性地表示以工件固定構件固定實施方式2之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。
圖8係示意性地表示將膠膜壓緊於實施方式3之黏貼裝置的吸引台所吸引保持之工件之狀態之剖面圖。
圖9係示意性地表示圖8所示之黏貼裝置的黏貼輥將膠膜黏貼於工件的背面之狀態之剖面圖。
圖10係示意性地表示將實施方式4之黏貼裝置的吸引台所吸引保持之工件壓緊於保持面之狀態之剖面圖。
Fig. 1 is a cross-sectional view schematically showing a configuration example of an adhering device according to Embodiment 1.
Fig. 2 is a perspective view schematically showing a workpiece pasted on an adhesive film by the pasting device shown in Fig. 1 .
Fig. 3 is a cross-sectional view schematically showing a state in which a workpiece and a ring frame are sucked and held on the suction table of the bonding apparatus shown in Fig. 1 .
Fig. 4 is a cross-sectional view schematically showing the state of the workpiece being sucked and held by the adhesive film pressed against the suction table of the pasting device shown in Fig. 3 .
Fig. 5 is a cross-sectional view schematically showing a configuration example of a sticking device according to a modified example of the first embodiment.
Fig. 6 is a cross-sectional view schematically showing a configuration example of a sticking device according to
1:黏貼裝置 1: pasting device
2:保持機構 2: Keep the body
10:吸引台 10: Attraction Desk
11:框架保持部(膠膜保持單元) 11: Frame holding part (film holding unit)
111:框架保持面 111: Frame holding surface
112:圓盤部 112: Disc Department
113:圓環部 113: ring part
114:框架用吸引孔 114: Attraction hole for frame
12:工件保持部 12: Workpiece holding part
121:上表面 121: upper surface
14:黏性層(具有黏性力的構件) 14: Viscous layer (component with viscous force)
141:保持面 141: keep surface
142:吸引孔 142: suction hole
15:吸引路徑 15: Attraction path
16:吸引源 16: Source of Attraction
17:開關閥 17: switch valve
20:黏貼輥 20: pasting roller
21:支撐構件 21: Support member
30:輥移動單元 30: Roller moving unit
40:真空腔室 40: Vacuum chamber
41:上部框體 41: Upper frame
42:下部框體 42: Lower frame
43:圓板部 43: Circular plate part
44:圓筒部 44: Cylindrical part
45:排氣路徑 45: exhaust path
46:開關閥 46: switch valve
47:真空源 47: Vacuum source
48:供給路徑 48: Supply path
49:開關閥 49: switch valve
50:空氣供給源 50: Air supply source
60:升降單元 60: Lifting unit
70:偏移防止手段 70: Offset prevention means
100:控制單元 100: control unit
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021194781A JP2023081084A (en) | 2021-11-30 | 2021-11-30 | Holding mechanism and sticking device |
JP2021-194781 | 2021-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202324574A true TW202324574A (en) | 2023-06-16 |
Family
ID=86508341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111145288A TW202324574A (en) | 2021-11-30 | 2022-11-25 | Holding mechanism and adhesion apparatus capable of suppressing deviation of a workpiece without using an electrostatic chuck |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2023081084A (en) |
KR (1) | KR20230081605A (en) |
CN (1) | CN116207028A (en) |
TW (1) | TW202324574A (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7204389B2 (en) | 2018-09-18 | 2023-01-16 | 株式会社ディスコ | Tape sticking device |
JP2020047899A (en) | 2018-09-21 | 2020-03-26 | 株式会社ディスコ | Tape sticking apparatus |
JP7303704B2 (en) | 2019-08-27 | 2023-07-05 | 株式会社ディスコ | Wafer division method |
-
2021
- 2021-11-30 JP JP2021194781A patent/JP2023081084A/en active Pending
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2022
- 2022-10-18 KR KR1020220133943A patent/KR20230081605A/en unknown
- 2022-11-24 CN CN202211480891.6A patent/CN116207028A/en active Pending
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KR20230081605A (en) | 2023-06-07 |
CN116207028A (en) | 2023-06-02 |
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