TW202322417A - Wafer thinning and transfer method for light-emitting diode and product thereof capable of avoiding wafer warping or breakage due to thinning - Google Patents

Wafer thinning and transfer method for light-emitting diode and product thereof capable of avoiding wafer warping or breakage due to thinning Download PDF

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TW202322417A
TW202322417A TW110144418A TW110144418A TW202322417A TW 202322417 A TW202322417 A TW 202322417A TW 110144418 A TW110144418 A TW 110144418A TW 110144418 A TW110144418 A TW 110144418A TW 202322417 A TW202322417 A TW 202322417A
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wafer
thinning
light
transfer method
emitting diodes
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TW110144418A
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Chinese (zh)
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鄭凱文
鄭盛銘
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凱勒斯科技有限公司
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Abstract

A wafer thinning and transfer method for light-emitting diodes includes the following steps: bonding a wafer to a first supporting sheet with solid wax, and then performing thinning operation on a first surface of the wafer; applying a high-temperature adhesive onto the first surface of the thinned wafer and covering and bpnding a second supporting sheet thereon to allow the wafer to be placed between the two supporting sheets; and separating the first supporting sheet at high temperature, keeping the wafer on the second supporting sheet, and supporting the thinned wafer through the second supporting sheet to avoid breakage.

Description

發光二極體之晶圓減薄轉貼方法及其製品Wafer thinning and transfer method for light-emitting diodes and products thereof

本發明係有關一種發光二極體之晶圓減薄轉貼方法及其製品,尤指一種透過支撐片之設置加以支撐晶圓,可有效避免晶圓因減薄後翹曲或其原因而發生破片,而無法使晶圓完整進入後段,提升減薄後晶圓之良率。 The invention relates to a wafer thinning and transfer method for light-emitting diodes and its products, especially to a wafer that is supported through the setting of a support sheet, which can effectively prevent wafers from being broken due to warping after thinning or other reasons , but it is impossible to make the wafer completely enter the back-end, so as to improve the yield of the wafer after thinning.

現今許多電子產品中都有使用到積體電路元件,其具有體積小、功能強大等優點。製作積體電路元件用之晶圓,於製程中需經過一研磨減薄工序,以使晶圓之表面厚度減薄並使其平坦化,減薄後之晶圓則還要進行後續下蠟、切割、封裝等作業。 Nowadays, integrated circuit components are used in many electronic products, which have the advantages of small size and powerful functions. Wafers used to make integrated circuit components need to go through a grinding and thinning process in the manufacturing process to reduce the surface thickness of the wafer and make it flat. Cutting, packaging and other operations.

但是,現在習用的研磨方法,一直存在著碎片率高、良率低、成本高、效率低等問題。而在傳統的加熱台上,使用丙酮、酒精進行去蠟的方法也一直存在裂片率高、良率低的問題。 However, the commonly used grinding methods have always had problems such as high fragmentation rate, low yield, high cost, and low efficiency. On the traditional heating table, the method of using acetone and alcohol to remove wax has always had the problems of high fragmentation rate and low yield.

而影響良率最主要的程序則是發生在研磨、下蠟時產生的裂片,因此,如何能提高在研磨、下蠟過程中,降低裂片率、提高良率及生產效率,實為一亟需克服之問題。 The most important process affecting the yield rate is the cracks that occur during grinding and waxing. Therefore, how to improve the process of grinding and waxing to reduce the cracking rate, improve the yield rate and production efficiency is an urgent need. problem to overcome.

須知,廠商獲利之一大關鍵就是要提升效率與產量,如此才能降低成本,創造利潤。 It should be noted that one of the key points for manufacturers to make profits is to improve efficiency and output, so as to reduce costs and create profits.

由此可見,上述習用發光二極體之晶圓減薄方法有諸多缺失,實非一良善之設計者,而亟待加以改良。 It can be seen that the above-mentioned wafer thinning method for conventional light-emitting diodes has many deficiencies, is not a good designer, and needs to be improved urgently.

本案發明人鑑於上述習用發光二極體之晶圓減薄方法所衍生的各項缺點,乃亟思加以改良創新,並經多年苦心孤詣潛心研究後,終於成功研發完成本件發光二極體之晶圓減薄轉貼方法及其製品。 In view of the shortcomings derived from the above-mentioned methods of wafer thinning for light-emitting diodes, the inventor of this case wanted to improve and innovate. After years of painstaking research, he finally successfully developed and completed the light-emitting diode wafer. Thinning and reposting method and products thereof.

本發明實施例在於提供一種發光二極體之晶圓減薄轉貼方法及其製品,其能使晶圓固定於支撐片上,避免減薄後之晶圓翹曲破片,可提高良率。 Embodiments of the present invention provide a wafer thinning and transfer method for light-emitting diodes and its products, which can fix the wafer on the support sheet, avoid warping and fragmentation of the wafer after thinning, and improve the yield rate.

為了達到上述目的,本發明之發光二極體之晶圓減薄轉貼方法,其步驟包含:將單片晶圓以固態蠟貼合於一第一支撐片上,接著晶圓之第一面進行減薄作業;於減薄後之晶圓第一面上塗上高溫膠,並覆蓋貼合一第二支撐片,使晶圓設置於兩支撐片間;以高溫分離第一支撐片,使晶圓保留於第二支撐片上,透過第二支撐片支撐減薄後之晶圓來避免破片。 In order to achieve the above object, the wafer thinning and transfer method of the light-emitting diode of the present invention, its steps include: sticking a single wafer on a first supporting sheet with solid wax, and then performing thinning on the first surface of the wafer. Thin operation: apply high-temperature glue on the first surface of the wafer after thinning, and cover and paste a second support sheet, so that the wafer is placed between the two support sheets; separate the first support sheet at high temperature, and keep the wafer On the second supporting sheet, the thinned wafer is supported by the second supporting sheet to avoid fragmentation.

其中該第一支撐片材質為藍寶石、而第二支撐片材質則為藍寶石或膠帶貼片,又分離第一支撐片之較佳方法係利用高溫膠與低溫蠟的分離溫度差來進行分離。 Wherein the material of the first supporting sheet is sapphire, and the material of the second supporting sheet is sapphire or adhesive tape, and the better method of separating the first supporting sheet is to use the separation temperature difference between high-temperature glue and low-temperature wax to separate.

本發明另提供一種如上所述之發光二極體之晶圓減薄轉貼方法所得的製品,該製品之特徵在於:。 The present invention also provides a product obtained by the wafer thinning and transfer method for light-emitting diodes as described above, and the product is characterized by: .

綜上所述,本發明實施例所提供之發光二極體之晶圓減薄轉貼方法所得的製品,其係使晶圓於減薄前至減薄後,均透過一支撐片加以支撐,可確保晶圓不因外力而發生翹曲破片之情況發生。 To sum up, the products obtained by the wafer thinning and transfer method for light-emitting diodes provided by the embodiments of the present invention are such that the wafer is supported by a support sheet before and after thinning, which can Ensure that the wafer does not warp and break due to external force.

以下在實施方式中詳細敘述本發明之詳細特徵以及優點,其內容足以使任何熟習相關技藝者瞭解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明之目的及優點。 The detailed features and advantages of the present invention are described in detail below in the implementation mode, and its content is enough to make any person familiar with the related art understand the technical content of the present invention and implement it accordingly, and according to the content disclosed in this specification, the scope of the patent application and the drawings , anyone skilled in the relevant arts can easily understand the purpose and advantages of the present invention.

1:晶圓 1: Wafer

2:固態蠟 2: solid wax

3:第一支撐片 3: The first support piece

4:高溫膠 4: High temperature glue

5:第二支撐片 5: The second support piece

第一圖為本發明發光二極體之晶圓減薄轉貼方法之步驟流程示意圖。 The first figure is a schematic flow chart of the steps of the wafer thinning and transfer method for light-emitting diodes of the present invention.

第二圖為本發明發光二極體之晶圓減薄轉貼方法之第一作業流程示意圖。 The second figure is a schematic diagram of the first operation flow of the light-emitting diode wafer thinning and transfer method of the present invention.

第三圖為本發明發光二極體之晶圓減薄轉貼方法之第二作業流程示意圖。 The third figure is a schematic diagram of the second operation flow of the light-emitting diode wafer thinning transfer method of the present invention.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下。 In order to make the above and other objects, features and advantages of the present invention more comprehensible, preferred embodiments are listed below and described in detail in conjunction with the accompanying drawings.

請參閱第一圖及第二圖所示,為本發明之發光二極體之晶圓減薄轉貼方法之步驟流程示意圖及第一作業流程示意圖,其實施步驟大致如下所述。 Please refer to Figure 1 and Figure 2, which are schematic flow charts of steps and a schematic flow chart of the method for thinning and pasting wafers of light-emitting diodes of the present invention and a schematic flow chart of the first operation. The implementation steps are roughly as follows.

需先說明的是,以下步驟為本實施例的主要實施精神所在,但實際的實施方法並不侷限下述之具體實施態樣。換言之,本領域具有通常知識者在本實施例的基礎上,亦能以其他等效之實施態樣替換下述各步驟之實施態樣。 It should be noted that the following steps are the main implementation spirit of this embodiment, but the actual implementation method is not limited to the following specific implementation forms. In other words, on the basis of this embodiment, those skilled in the art can also replace the implementation of the following steps with other equivalent implementations.

步驟S01:將單片晶圓1以固態蠟2貼合於一第一支撐片3 上,接著晶圓1之第一面進行減薄作業。 Step S01: Attaching the single wafer 1 to a first supporting sheet 3 with solid wax 2 Next, the first surface of the wafer 1 is thinned.

更詳細的說,於本實施例中,該第一支撐片3則為藍寶石材質,且總厚度變異值(TTV)≦3um。而晶圓1之減薄厚度大致上為減薄至小於80um。 More specifically, in this embodiment, the first supporting sheet 3 is made of sapphire, and the total thickness variation (TTV)≦3um. The thinned thickness of the wafer 1 is generally reduced to less than 80um.

在本步驟S01中,晶圓1減薄方法可為研磨、銅拋或軟拋,唯不以上述方法為限,而減薄作業中,該晶圓係設置於承載盤上,且與承載盤間為假性真空方式吸附固定進行加工。 In this step S01, the thinning method of the wafer 1 can be grinding, copper polishing or soft polishing, but not limited to the above methods, and in the thinning operation, the wafer is set on the carrier plate, and the wafer is connected to the carrier plate The room is processed by adsorption and fixation in a pseudo-vacuum mode.

步驟S02:於減薄後之晶圓1第一面上塗上高溫膠4,並覆蓋貼合一第二支撐片5,使晶圓1設置於兩支撐片間。 Step S02: Apply high-temperature glue 4 on the first surface of the thinned wafer 1, and cover and attach a second supporting sheet 5, so that the wafer 1 is placed between the two supporting sheets.

更詳細的說,於本實施例中,該第二支撐片5則為藍寶石材質,且總厚度變異值(TTV)≦3um。而第二支撐片貼合於晶圓1上時,可輕壓第二支撐片5,確保第二支撐片5固定於晶圓1上。 More specifically, in this embodiment, the second supporting sheet 5 is made of sapphire, and the total thickness variation (TTV)≦3um. When the second supporting piece is attached to the wafer 1 , the second supporting piece 5 can be lightly pressed to ensure that the second supporting piece 5 is fixed on the wafer 1 .

步驟S03:以高溫分離第一支撐片3,使晶圓1保留於第二支撐片5上,透過第二支撐片5支撐減薄後之晶圓1來避免破片。 Step S03 : separating the first supporting sheet 3 at high temperature, keeping the wafer 1 on the second supporting sheet 5 , and supporting the thinned wafer 1 through the second supporting sheet 5 to avoid fragmentation.

在本步驟S03中,所述之分離高溫係利用高溫膠與低溫蠟的分離溫度差來進行分離,使一方分離而另一方仍黏固。 In this step S03 , the separation high temperature system utilizes the separation temperature difference between the high-temperature glue and the low-temperature wax to separate one side while the other side is still sticky.

經過上述步驟可知,晶圓1從減薄作業前至後,接透過支撐片加以支撐,可避免晶圓1因各種外力因素而發生翹曲破片,大幅改善現有晶圓在沒有任何支撐下,進行下蠟作業處理而產生之高不良率。 Through the above steps, it can be seen that the wafer 1 is supported by the supporting sheet from before to after the thinning operation, which can prevent the warping and fragmentation of the wafer 1 due to various external factors, and greatly improve the existing wafer without any support. High defect rate caused by waxing process.

請參閱第三圖所示,為本發明發光二極體之晶圓減薄轉貼方法之第二作業流程示意圖,於此實施例中,其大致步驟與上述實施步驟相同,唯一不同之處在於,該第二支撐片5之材質為膠帶貼片,透過膠帶直 接貼合於晶圓1之第一面上,達到固定支撐晶圓之效。後續流程則與上述實施步驟相同,係透過高溫分離第一支撐片3,使晶圓1保留於第二支撐片5上,用以支撐晶圓1,避免晶圓翹曲破片。 Please refer to the third figure, which is a schematic diagram of the second operation flow of the wafer thinning and transfer method for light-emitting diodes of the present invention. In this embodiment, the general steps are the same as the above-mentioned implementation steps. The only difference is that The material of this second support piece 5 is adhesive tape paster, through adhesive tape straight It is bonded to the first surface of the wafer 1 to achieve the effect of fixing and supporting the wafer. The follow-up process is the same as the above-mentioned implementation steps. The first support sheet 3 is separated through high temperature, so that the wafer 1 is retained on the second support sheet 5 to support the wafer 1 and avoid warping and fragmentation of the wafer.

附帶一提,透過上述發光二極體之晶圓減薄轉貼方法所製得的製品,其就結構上來說具有以下技術特徵。該晶圓1於減薄前、減薄後,其至少一側表面係貼合一支撐片加以支撐,可有效避免晶圓1翹曲破片。 Incidentally, the products manufactured through the wafer thinning and transfer method of light-emitting diodes have the following technical features in terms of structure. Before and after the wafer 1 is thinned, at least one surface of the wafer 1 is attached with a supporting sheet for support, which can effectively prevent the wafer 1 from warping and breaking.

上列詳細說明係針對本發明之一可行實施例之具體說明,惟該實施例並非用以限制本發明之專利範圍,凡未脫離本發明技藝精神所為之等效實施或變更,均應包含於本案之專利範圍中。本發明之權利保護範圍應如後述之申請專利範圍所述。 The above detailed description is a specific description of a feasible embodiment of the present invention, but this embodiment is not used to limit the patent scope of the present invention, and any equivalent implementation or change that does not depart from the technical spirit of the present invention shall be included in In the patent scope of this case. The scope of protection of the rights of the present invention should be described in the scope of patent application described later.

Claims (9)

一種發光二極體之晶圓減薄轉貼方法,其步驟包含: A wafer thinning and transfer method for light-emitting diodes, the steps of which include: 將單片晶圓以固態蠟貼合於一第一支撐片上,接著晶圓之第一面進行減薄作業;於減薄後之晶圓第一面上塗上高溫膠,並覆蓋貼合一第二支撐片,使晶圓設置於兩支撐片間;以高溫分離第一支撐片,使晶圓保留於第二支撐片上,透過第二支撐片支撐減薄後之晶圓來避免破片。 Attach a single wafer to a first supporting sheet with solid wax, and then perform thinning operations on the first side of the wafer; apply high-temperature glue on the first side of the thinned wafer, and cover and paste a first Two supporting sheets, so that the wafer is placed between the two supporting sheets; the first supporting sheet is separated by high temperature, so that the wafer remains on the second supporting sheet, and the thinned wafer is supported by the second supporting sheet to avoid fragmentation. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該第一支撐片為藍寶石材質,且總厚度變異值(TTV)≦3um。 The wafer thinning and transfer method for light-emitting diodes described in item 1 of the scope of the patent application, wherein the first supporting sheet is made of sapphire, and the total thickness variation value (TTV)≦3um. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該晶圓之減薄厚度大致上為減薄至小於80um。 The wafer thinning and transfer method for light-emitting diodes described in item 1 of the scope of the patent application, wherein the thinning thickness of the wafer is generally reduced to less than 80um. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該第二支撐片為藍寶石材質,且總厚度變異值(TTV)≦3um。 The wafer thinning and transfer method for light-emitting diodes described in item 1 of the scope of the patent application, wherein the second support sheet is made of sapphire, and the total thickness variation value (TTV)≦3um. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該第二支撐片為膠帶材質。 According to the wafer thinning and transfer method for light-emitting diodes described in item 1 of the scope of the patent application, the second supporting sheet is made of adhesive tape. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中所述之高溫分離係利用高溫膠與固態蠟的分離溫度差來進行分離,使一方分離而另一方仍黏固 The wafer thinning and transfer method for light-emitting diodes as described in item 1 of the scope of patent application, wherein the high-temperature separation uses the temperature difference between the high-temperature glue and the solid wax to separate, so that one side is separated while the other side remains sticky 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該晶圓減薄方法為研磨或銅拋或軟拋。 Wafer thinning and transfer method for light-emitting diodes as described in item 1 of the scope of the patent application, wherein the wafer thinning method is grinding or copper polishing or soft polishing. 如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法,其中該減薄作業中,係將該晶圓係設置於承載盤上,且與承載盤間為假性真空方式吸附固定進行加工。 Wafer thinning and transfer method for light-emitting diodes as described in item 1 of the scope of patent application, wherein in the thinning operation, the wafer is placed on the carrier plate, and there is a false vacuum between the carrier plate and the wafer The method is adsorbed and fixed for processing. 一種如申請專利範圍第1項所述之發光二極體之晶圓減薄轉貼方法所製得的製品。 A product manufactured by the light-emitting diode wafer thinning and transfer method described in item 1 of the scope of the patent application.
TW110144418A 2021-11-29 2021-11-29 Wafer thinning and transfer method for light-emitting diode and product thereof capable of avoiding wafer warping or breakage due to thinning TW202322417A (en)

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