TW202320970A - Inspection system, control method, manufacturing method for electronic component, and cutting device - Google Patents
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
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- G01N21/84—Systems specially adapted for particular applications
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- G01N21/8806—Specially adapted optical and illumination features
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Abstract
Description
本發明係關於檢查系統、控制方法、電子部件的製造方法及切斷裝置。The present invention relates to an inspection system, a control method, a manufacturing method of an electronic component, and a cutting device.
日本特開2021-115668(專利文獻1)揭示一種包含相機單元的加工裝置。相機單元包括向被加工物照射光的照明器。在該加工裝置中,在向被加工物照射光的狀態下,拍攝被加工物(參照專利文獻1)。 [先前技術文獻] [專利文獻] Japanese Patent Laid-Open No. 2021-115668 (Patent Document 1) discloses a processing device including a camera unit. The camera unit includes an illuminator that irradiates light onto a workpiece. In this processing device, the workpiece is imaged while the workpiece is being irradiated with light (see Patent Document 1). [Prior Art Literature] [Patent Document]
專利文獻1:日本特開2021-115668號公報Patent Document 1: Japanese Patent Laid-Open No. 2021-115668
[發明所欲解決的問題][Problem to be solved by the invention]
例如,在專利文獻1所揭示的加工裝置中,可以手動進行照明器的調整。在這種情況下,根據操作者的判斷來決定照射到被加工物上的光的亮度(以下亦稱為「光的照射狀態」)。然而,這個判斷並非總是容易的。For example, in the processing apparatus disclosed in
本發明是為了解決此種問題而完成,其目的為提供一種可以自動調整在進行檢查對象物的檢查時向檢查對象物照射的光的照射狀態的檢查系統、控制方法、電子部件的製造方法及切斷裝置。 [解決問題的技術手段] The present invention has been made to solve such problems, and its object is to provide an inspection system, a control method, a manufacturing method of electronic components, and an Cut off device. [Technical means to solve the problem]
依據本發明的一態樣的檢查系統基於檢查對象物的拍攝圖像來進行檢查對象物的檢查。檢查系統包括照明部、相機、控制部、及記憶部。照明部可以改變光的照射狀態,而將光照射到檢查對象物。在將光照射到檢查對象物的狀態下,相機生成拍攝圖像。控制部控制照明部及相機中的每一個,以生成分別在不同的照射狀態下生成的複數個拍攝圖像。記憶部記憶基準直方圖。控制部將基於複數個拍攝圖像中的每一個所生成的每個直方圖與基準直方圖進行比較,並且基於比較的結果來決定在檢查中使用的照射狀態。An inspection system according to one aspect of the present invention inspects an inspection object based on a captured image of the inspection object. The inspection system includes an illumination unit, a camera, a control unit, and a memory unit. The illuminating unit can change the light irradiation state to irradiate the inspection object with light. The camera generates a captured image while irradiating light onto the inspection object. The control unit controls each of the lighting unit and the camera so as to generate a plurality of captured images respectively generated in different irradiation states. Histogram of memory benchmarks. The control section compares each histogram generated based on each of the plurality of captured images with a reference histogram, and determines an irradiation state used in the inspection based on a result of the comparison.
又,根據本發明的另一態樣的控制方法是一種用於上述檢查系統的控制方法。控制方法包含控制步驟與決定步驟,該控制步驟控制照明部及相機中的每一個,以生成分別在不同的照射狀態下生成的複數個拍攝圖像,而該決定步驟將基於複數個拍攝圖像中的每一個所生成的每個直方圖與基準直方圖進行比較,並且基於比較的結果來決定在檢查中使用的照射狀態。Also, a control method according to another aspect of the present invention is a control method used in the above-mentioned inspection system. The control method includes a control step of controlling each of the lighting unit and the camera to generate a plurality of captured images respectively generated under different illumination states, and a determination step based on the plurality of captured images Each histogram generated by each is compared with a reference histogram, and based on the result of the comparison, the illumination state used in the inspection is decided.
又,根據本發明的另一態樣的電子部件的製造方法是一種使用上述檢查系統的電子部件的製造方法。電子部件的製造方法包含決定步驟與製造步驟,該決定步驟決定在上述檢查中使用的照射狀態的步驟,而該製造步驟藉用切斷機構來切斷樹脂密封完成的基板來製造複數個電子部件。複數個電子部件中的每一個都是檢查對象物。電子部件的製造方法還包含在所決定的照射狀態下向檢查對象物照射光的狀態下生成拍攝圖像並進行上述檢查的步驟。Moreover, the manufacturing method of the electronic component according to another aspect of this invention is the manufacturing method of the electronic component using the said inspection system. The manufacturing method of an electronic component includes a determination step of determining the irradiation state used in the above-mentioned inspection and a manufacturing step of cutting a resin-sealed substrate using a cutting mechanism to manufacture a plurality of electronic components . Each of the plurality of electronic components is an inspection target. The method of manufacturing an electronic component further includes the step of generating a captured image while irradiating the inspection object with light in the determined irradiation state, and performing the above-mentioned inspection.
又,根據本發明的另一態樣的切斷裝置包括切斷機構與上述檢查系統。切斷機構切斷樹脂密封完成的基板。 [發明的效果] Also, a cutting device according to another aspect of the present invention includes a cutting mechanism and the above-mentioned inspection system. The cutting mechanism cuts the resin-sealed substrate. [Effect of the invention]
根據本發明,能夠提供一種可以自動調整在進行檢查對象物的檢查時向檢查對象物照射的光的照射狀態的檢查系統、控制方法、電子部件的製造方法及切斷裝置。According to the present invention, it is possible to provide an inspection system, a control method, a manufacturing method of an electronic component, and a cutting device capable of automatically adjusting the irradiation state of light irradiated on an inspection object when inspecting the inspection object.
以下,針對關於本發明的一側面之實施形態(以下,也稱為「本實施形態」),使用圖式進行詳細說明。另外,在圖中相同或相當的部分賦予相同符號且不重複其說明。又,為了容易理解,在每個圖面針對適當對象加以省略或誇張且示意地描繪。 [1.構成] <1-1.切斷裝置的整體構成> Hereinafter, an embodiment (hereinafter also referred to as "the present embodiment") related to one aspect of the present invention will be described in detail using the drawings. In addition, the same or corresponding part is given the same code|symbol in a figure, and the description is not repeated. In addition, for easy understanding, appropriate objects are omitted or exaggerated and schematically drawn in each drawing. [1. Composition] <1-1. Overall configuration of cutting device>
第1圖是示意地表示依據本實施形態的切斷裝置1的平面圖。切斷裝置1構成為藉由切斷封裝基板(切斷對象物)來將該封裝基板加以單片化成複數個電子部件(封裝部件)。在封裝基板中,安裝了半導體晶片的基板或導線架被樹脂密封。Fig. 1 is a plan view schematically showing a
作為封裝基板的一例,舉例有BGA(球柵陣列,Ball Grid Array)封裝基板、LGA(柵格陣列,Land Grid Array)封裝基板、CSP(晶片尺寸封裝,Chip Size Package)封裝基板、LED(發光二極體,Light Emitting Diode)封裝基板、QFN(四方平面無引腳,Quad Flat No-leaded)封裝基板。Examples of package substrates include BGA (Ball Grid Array) package substrates, LGA (Land Grid Array) package substrates, CSP (Chip Size Package) package substrates, LED (light emitting Diode, Light Emitting Diode) package substrate, QFN (Quad Flat No-leaded) package substrate.
又,切斷裝置1構成為檢查已單片化成複數個電子部件中的每一個。在切斷裝置1中,拍攝每個電子部件的圖像,並基於該圖像來實行每個電子部件的檢查。經由該檢查來生成檢查資料,以將每個電子部件分類為「良品」或「不良品」。Furthermore, the
在此例中,使用封裝基板P1來作為切斷對象物,藉由切斷裝置1來將封裝基板P1加以單片化成複數個電子部件S1。以下,將封裝基板P1的兩面之中的被樹脂密封的一面稱為封膠面,並將與封膠面相反的一面稱為焊球/導線面。In this example, the package substrate P1 is used as a cutting object, and the package substrate P1 is singulated into a plurality of electronic components S1 by the
如第1圖所示,切斷裝置1包含切斷模組A1與檢查和收納模組B1,來作為構成要素。切斷模組A1構成為藉由切斷封裝基板P1來製造複數個電子部件S1。檢查和收納模組B1構成為檢查已製造的複數個電子部件S1中的每一個,其後將電子部件S1收納於托盤。在切斷裝置1中,可以將各構成要素對於其他構成要素進行安裝和拆下且進行交換。As shown in FIG. 1 , the
切斷模組A1主要包含基板供給部3、定位部4、切斷台5、芯軸部6、及搬送部7。The cutting module A1 mainly includes a substrate supply unit 3 , a
基板供給部3從收容複數個封裝基板P1的卡匣M1來將封裝基板P1一次一個地推出,藉此將封裝基板P1一次一個地朝向定位部4供給。此時,將封裝基板P1配置成焊球/導線面朝向上面。The substrate supply unit 3 pushes out the package substrates P1 one at a time from the cassette M1 accommodating a plurality of package substrates P1 , thereby supplying the package substrates P1 one at a time toward the
定位部4將從基板供給部3推出的封裝基板P1配置在軌道部4a上,藉此實行封裝基板P1的定位。其後,定位部4將已定位的封裝基板P1朝向切斷台5搬送。The
切斷台5保持要切斷的封裝基板P。在此例中,例示為具有2個切斷台5的雙切斷台構成的切斷裝置1。切斷台5包含保持構件5a、旋轉機構5b、及移動機構5c。保持構件5a從下方吸附藉由定位部4搬送的封裝基板P1,以保持封裝基板P1。旋轉機構5b可以使保持構件5a在圖的θ1方向上旋轉。移動機構5c可以使保持構件5a沿著圖的Y軸移動。The cutting table 5 holds the package substrate P to be cut. In this example, a
芯軸部6藉由切斷封裝基板P1來將封裝基板P1加以單片化成複數個電子部件S1。在此例中,例示為具有2個芯軸部6的雙芯軸部構成的切斷裝置1。芯軸部6可以沿著圖的X軸和Z軸移動。另外,切斷裝置1也可以是具有1個芯軸部6的單芯軸部構成。The
第2圖是示意地表示芯軸部6的側面圖。如第2圖所示,芯軸部6包含葉片6a、旋轉軸6c、第一凸緣6d、第二凸緣6e、及緊固構件6f。FIG. 2 is a side view schematically showing the
葉片6a藉由高速旋轉來切斷封裝基板P1,以將封裝基板P1加以單片化成複數個電子部件S1。葉片6a在受到一方的凸緣(第一凸緣)6d和另一方的凸緣(第二凸緣)6e挾持的狀態下,被安裝於旋轉軸6c。第一凸緣6d和第二凸緣6e藉由螺帽等的緊固構件6f而被固定於旋轉軸6c。第一凸緣6d被稱為內凸緣,而第二凸緣6e被稱為外凸緣。The
在芯軸部6中,設置切削水用噴嘴、冷卻水用噴嘴、及洗淨水用噴嘴(任一者都未圖示)等。切削水用噴嘴朝向高速旋轉的葉片6a噴射切削水。冷卻水用噴嘴噴射冷卻水。洗淨水用噴嘴噴射用於洗淨切斷屑等的洗淨水。In the
再次參照第1圖,在切斷台5吸附了封裝基板P1之後,藉由第一位置確認相機5d來對封裝基板P1進行拍攝,以確認封裝基板P1的位置。使用第一位置確認相機5d進行的確認例如是對設置在封裝基板P1上的標記的位置進行的確認。該標記例如表示封裝基板P1的切斷位置。Referring again to FIG. 1 , after the cutting table 5 absorbs the package substrate P1 , the package substrate P1 is photographed by the first
其後,切斷台5是沿著圖的Y軸並朝向芯軸部6移動。在切斷台5移動到芯軸部6的下方之後,藉由使切斷台5與芯軸部6相對地移動來切斷封裝基板P1。其後,根據需要,藉由芯軸部6所包括的第二位置確認相機6b來對封裝基板P1進行拍攝,以確認封裝基板P1的位置等。使用第二位置確認相機6b進行的確認例如是對封裝基板P1的切斷位置和切斷寬度進行的確認。Thereafter, the cutting table 5 moves toward the
在完成了封裝基板P1的切斷之後,在吸附了單片化而成的複數個電子部件S1的狀態下,切斷台5沿著圖的Y軸並往從芯軸部6遠離的方向移動。在此移動過程中,藉由第一洗淨器5e來實行電子部件S1的上面(焊球/導線面)的洗淨和乾燥。After the cutting of the package substrate P1 is completed, the cutting stage 5 moves in a direction away from the
搬送部7從上方吸附被保持於切斷台5的電子部件S1,並將電子部件S1朝向檢查和收納模組B1的檢查台11搬送。在此搬送過程中,藉由第二洗淨器7a來實行電子部件S1的下面(封膠面)的洗淨和乾燥。The transport unit 7 suctions the electronic component S1 held on the cutting table 5 from above, and transports the electronic component S1 toward the inspection table 11 of the inspection and storage module B1. During this transfer process, the lower surface (sealant surface) of the electronic component S1 is cleaned and dried by the
檢查和收納模組B1主要包含檢查台11、第一光學檢查相機12、第二光學檢查相機13、照明部16、17、配置部14、及抽出部15。另外,第一光學檢查相機12也可以設置於切斷模組A1。The inspection and storage module B1 mainly includes an inspection table 11 , a first
為了對電子部件S1進行光學檢查,檢查台11保持電子部件S1。檢查台11可以沿著圖的X軸移動。又,檢查台11能夠上下倒轉。在檢查台11中,設置保持構件,該保持構件藉由吸附電子部件S1來保持電子部件S1。又,在檢查台11中,用於保持電子部件S1的面例如由黑色橡膠構成。另外,橡膠的顏色也可以不是黑色,例如也可以是白色等。The inspection table 11 holds the electronic component S1 for optical inspection of the electronic component S1. The inspection table 11 is movable along the X-axis of the figure. In addition, the inspection table 11 can be turned upside down. In the inspection table 11 , a holding member that holds the electronic component S1 by sucking the electronic component S1 is provided. In addition, in the inspection table 11, the surface for holding the electronic component S1 is made of black rubber, for example. In addition, the color of the rubber may not be black, for example, may be white or the like.
第一光學檢查相機12和第二光學檢查相機13對電子部件S1的兩面(焊球/導線面及封膠面)進行拍攝。基於藉由第一光學檢查相機12和第二光學檢查相機13生成的拍攝圖像(圖像資料)來實行電子部件S1的各種檢查。第一光學檢查相機12和第二光學檢查相機13中的每一個被配置在檢查台11的附近,並對上方進行拍攝。藉由第一光學檢查相機12和第二光學檢查相機13中的每一個生成的拍攝圖像例如是灰階(256階度)圖像。The first
第一光學檢查相機12拍攝藉由搬送部7搬送到檢查台11的電子部件S1的封膠面。其後,搬送部7將電子部件S1放置在檢查台11的保持構件上。在保持構件吸附電子部件S1之後,將檢查台11上下反轉。檢查台11在第二光學檢查相機13的上方移動,並藉由第二光學檢查相機13拍攝電子部件S1的焊球/導線面。The first
照明部16設置在第一光學檢查相機12的上方,而照明部17設置在第二光學檢查相機13的上方。照明部16和17中的每一個例如由所謂的同軸照明構成。照明部16構成為在由第一光學檢查相機12進行檢查時,將光照射到檢查台11上的電子部件S1。照明部17構成為在由第二光學檢查相機13進行檢查時,將光照射到檢查台11上的電子部件S1。由於照明部16和17具有例如相同的配置,因此以下將代表性地描述照明部17的構成。The illuminating
第3圖是包含示意地表示照明部17的斷面的圖。如第3圖所示,在第二光學檢查相機13的檢查中,電子部件S1被照明部17發出的光所照射。在將光照射到電子部件S1的狀態下,藉由第二光學檢查相機13生成電子部件S1的拍攝圖像。基於該拍攝圖像,進行電子部件S1的檢查。FIG. 3 is a diagram schematically showing a cross section of the
照明部17由圓頂狀的照明所構成,並且包含圓頂17a及複數個LED 17b。另外,圓頂狀的照明可以由所謂的圓頂照明構成,但也可以不是必須由圓頂照明構成,而可以包括圓頂狀(傘狀)構件和配置在該構件內的複數個發光構件(例如,LED)。圓頂17a具有圓頂形狀,而在俯視時的圓頂17a的形狀為圓形。又,複數個LED17b配置在圓頂17a的內側的面上。在照明部17中,從圓頂17a的徑向的內側向外側形成複數個區段(Ch01~Ch08)。在複數個區段的每一個中,複數個LED 17b沿著圓頂17a的圓周方向以預定間隔配置。The
照明部17是所謂的多通道照明。在照明部17中,能夠個別進行每個區段的調光。也就是說,在照明部17中,能夠針對每一個區段調整照度(光的亮度)。例如,在每個區段中,可以在0-100的範圍內調整照度等級。在這種情況下,例如,照度等級越接近100,則照度越高,而照度等級越接近0,則照度越低。例如,藉由調整每個區段中的照度,而調整照明部17中的光的照射狀態(照明條件)。例如,每個區段中的照度的調整可以藉由操作者手動進行,也可以自動進行。稍後將詳細描述每個區段中的照度的自動調整。The
再次參照第1圖,在配置部14配置檢查完成的電子部件S1。配置部14可以沿著圖的Y軸移動。檢查台11將檢查完成的電子部件S1配置在配置部14上。Referring again to FIG. 1 , the inspected electronic component S1 is arranged in the
抽出部15將已配置於配置部14的電子部件S1往托盤移送。基於使用了第一光學檢查相機12和第二光學檢查相機13的檢查結果,電子部件S1被區別為「良品」或「不良品」。基於區別結果,抽出部15將每個電子部件S1移送到良品用托盤15a或不良品用托盤15b。也就是說,將良品收納在良品用托盤15a,將不良品收納在不良品用托盤15b。若各良品用托盤15a和不良品用托盤15b裝滿了電子部件S1,則交換為新的托盤。The
切斷裝置1進一步包含電腦50和監視器20。監視器20構成為顯示圖像。監視器20以例如液晶監視器、有機EL(電致發光,Electro Luminescence )監視器等的顯示裝置來構成。The
電腦50控制例如切斷模組A1及檢查和收納模組B1的各部的動作。藉由電腦50來控制例如基板供給部3、定位部4、切斷台5、芯軸部6、搬送部7、檢查台11、第一光學檢查相機12、第二光學檢查相機13、照明部16、17、配置部14、抽出部15、及監視器20的動作。The
又,電腦50基於例如藉由第一光學檢查相機12和第二光學檢查相機13生成的圖像資料來實行電子部件S1的各種檢查。接著,詳細說明電腦50。
<1-2.電腦的硬體構成>
Moreover, the
第4圖是示意地表示電腦50的硬體構成的圖。如第4圖所示,電腦50包含運算部70、輸入輸出I/F(介面,interface)90、接收部95、記憶部80,並經由匯流排來電性連接各構成。FIG. 4 is a diagram schematically showing the hardware configuration of the
運算部70包含CPU(中央處理單元,Central Processing Unit)72、RAM(隨機存取記憶體,Random Access Memory)74及ROM(唯讀記憶體,Read Only Memory)76等。運算部70構成為對應於資訊處理來控制電腦50內的各構成要素及切斷裝置1內的各構成要素。The
輸入輸出I/F90構成為經由信號線來與包含在切斷裝置1中的各構成要素通信。輸入輸出I/F90用於從電腦50朝向切斷裝置1內的各構成要素的資料的傳送以及從切斷裝置1內的各構成要素朝向電腦50的傳送資料的接收。接收部95構成為接收使用者的指示。接收部95由例如觸控面板、鍵盤、滑鼠、及麥克風的一部分或全部構成。The input/output I/
記憶部80是例如硬碟驅動器、固態硬碟等的輔助記憶裝置。記憶部80構成為例如記憶控制程式81。藉由控制部70執行控制程式81來實現切斷裝置1中的各種動作。在控制部70執行控制程式81的情況下,控制程式81在RAM 74中展開。並且,控制部70藉由使CPU72解釋及執行在RAM 74中展開的控制程式81來控制各構成要素。
[2.光的照射狀態的自動調整]
The
如上所述,例如基於由第一光學檢查相機12生成的拍攝圖像和由第二光學檢查相機13生成的拍攝圖像來進行電子部件S1的檢查。因此,電子部件S1的檢查的品質受到各拍攝圖像的品質的影響。各拍攝圖像的品質受到電子部件S1的拍攝時的從照明部16和17向電子部件S1發射的光的照射狀態的影響。由於照明部16和17可以說成是相同的,所以下面注重於描述照明部17。As described above, the inspection of the electronic component S1 is performed based on, for example, the captured image generated by the first
作為一例,考慮電子部件S1是BGA的情況。例如,藉由利用第二光學檢查相機13針對電子部件S1的焊球/導線面進行拍攝來進行電子部件S1的焊球/導線面的檢查。在這種情況下,第二光學檢查相機13拍攝藉由切斷封裝基板P1而被單片化的複數個電子部件S1。因此,拍攝圖像顯示複數個電子部件S1和位於相鄰電子部件S1之間的邊界部分處的橡膠(檢查台11)。As an example, consider a case where the electronic component S1 is a BGA. For example, the solder ball/wire surface of the electronic component S1 is inspected by using the second
第5圖是表示較佳的拍攝圖像的一例的圖。如第5圖所示,拍攝圖像IM1包括複數個電子部件部100、位於各電子部件部100上的複數個焊珠部120、及位於相鄰電子部件部100之間的黑溝部110。黑溝部110是檢查台11上的橡膠。Fig. 5 is a diagram showing an example of a preferable captured image. As shown in FIG. 5 , the captured image IM1 includes a plurality of
拍攝圖像IM1的特徵在於(1)電子部件部100和黑溝部110呈現明確的對比,以及(2)圖像整體不會太亮。在從照明部17朝向電子部件S1發射的光的照明狀態適當的情況下,生成這樣的較佳的拍攝圖像。基於這樣的較佳的拍攝圖像進行的檢查的品質較高。The captured image IM1 is characterized by (1) a clear contrast between the
第6圖是表示第5圖所示的拍攝圖像的直方圖的圖。參照第6圖,橫軸表示階度,縱軸表示像素數。直方圖HG1包含組成C1、C2、C3。組成C1對應於電子部件部100(圖5),組成C2對應於黑溝部110。組成C3對應於焊珠部120。在直方圖HG1中,組成C1與組成C2明顯分離。又,像素數最多的組成C1的峰值出現在階度的中心附近。對應於較佳的拍攝圖像的直方圖具有這樣的特徵。Fig. 6 is a diagram showing a histogram of the captured image shown in Fig. 5 . Referring to FIG. 6, the horizontal axis represents the gradation, and the vertical axis represents the number of pixels. Histogram HG1 contains components C1, C2, C3. The composition C1 corresponds to the electronic component part 100 ( FIG. 5 ), and the composition C2 corresponds to the
第7圖是表示較不佳的拍攝圖像的一例的圖。如第7圖所示,拍攝圖像IM2包括複數個電子部件部200、位於各電子部件部200上的複數個焊珠部220、及位於相鄰電子部件部200之間的黑溝部210。在拍攝圖像IM2中,電子部件部200和黑溝部210未呈現明確的對比。在從照明部17朝向電子部件S1發射的光的照明狀態不適當的情況下,是生成這樣的較不佳的拍攝圖像的情況。基於這樣的較不佳的拍攝圖像進行的檢查的品質較低。Fig. 7 is a diagram showing an example of a poor captured image. As shown in FIG. 7 , the captured image IM2 includes a plurality of
第8圖是表示第7圖所示的拍攝圖像的直方圖的圖。參照第8圖,橫軸表示階度,縱軸表示像素數。直方圖HG2包含組成C4、C5、C6。組成C4對應於電子部件部200(圖7),組成C5對應於黑溝部210。組成C6對應於焊珠部220。在直方圖HG2中,組成C4與組成C5沒有明顯分離,而是組成C4與組成C5混合。對應於較不佳的拍攝圖像的一例的直方圖具有這樣的特徵。Fig. 8 is a diagram showing a histogram of the captured image shown in Fig. 7 . Referring to FIG. 8, the horizontal axis represents the gradation, and the vertical axis represents the number of pixels. Histogram HG2 contains components C4, C5, C6. Composition C4 corresponds to the electronic component part 200 ( FIG. 7 ), and composition C5 corresponds to the
如上所述,藉由從照明部17朝向電子部件S1發射的光的照射狀態是否適當,而影響由第二光學檢查相機13生成的拍攝圖像的品質,而因此影響電子部件S1的檢查。假設只能手動進行照明部17的各區段的照度的調整。在這種情況下,根據操作者的判斷來決定照明部17的光的照射狀態。然而,這個判斷並非總是容易的。因此,至少部分地存在照明部17的光的照射狀態不適當而導致低品質的檢查的問題以及照明部17的各區段的照度的調整需要很長時間的問題。As mentioned above, the quality of the captured image generated by the second
在本實施形態的切斷裝置1中,電腦50能夠將照明部17的光的照射狀態自動調整成適當的狀態。也就是說,電腦50能夠將照明部17的各區段的照度等級自動調整成適當的值。藉此,能夠降低發生上述問題的可能性。也就是說,根據本實施形態的切斷裝置1,能夠不受操作者的熟練度等的影響,將照明部17的各區段的照度調整成適當的值,而能夠進行高品質的檢查。In the
為了實現這樣的功能,電腦50的記憶部80預先記憶表示理想的拍攝圖像的直方圖(以下也稱為「基準直方圖」)的資訊。基準直方圖是基於作為基準的拍攝圖像所生成的直方圖。例如,基於理想的拍攝圖像來生成基準直方圖。理想的拍攝圖像的一例是包括作為檢查對象物的電子部件S1的圖像,並且是如第5圖所示的具有(1)電子部件部100與黑溝部110呈現明確的對比以及(2)圖像整體不會太亮的特徵的拍攝圖像。In order to realize such a function, the
第9圖是表示生成基準直方圖的順序的流程圖。該流程圖中示的各步驟是藉由操作者進行,例如,在切斷裝置1的製造期間(當基準直方圖未記憶在記憶部80時)。在該流程圖所示的步驟中,在改變照明部17的各區段的照度等級的組合圖案時,生成複數個拍攝圖像,並且基於最理想的拍攝圖像來生成基準直方圖。生成的基準直方圖記憶在記憶部80中。以下將進行詳細說明。Fig. 9 is a flowchart showing the procedure for generating a reference histogram. Each step shown in this flowchart is performed by an operator, for example, during the manufacture of the cutting device 1 (when the reference histogram is not stored in the memory unit 80 ). In the steps shown in this flowchart, when changing the combination pattern of the illuminance level of each segment of the
參照第9圖,操作者調整照明部17的各區段的照度等級(步驟S100)。操作者操作切斷裝置1,而在將光從照明部17照射到電子部件S1的狀態下,藉由第二光學檢查相機13拍攝電子部件S1(步驟S110)。操作者基於過去的經驗來判斷由第二光學檢查相機13生成的拍攝圖像是否是理想的拍攝圖像(步驟S120)。Referring to FIG. 9 , the operator adjusts the illuminance level of each segment of the lighting unit 17 (step S100 ). The operator operates the
如果判斷由第二光學檢查相機13所生成的拍攝圖像不是理想的拍攝圖像(步驟S120中的否),則操作者改變成與照明部17的各區段的照度等級的組合圖案不同的圖案(步驟S100)。另一方面,如果判斷由第二光學檢查相機13所生成的拍攝圖像是理想的拍攝圖像(步驟S120中的是),則操作者操作切斷裝置1,以基於該理想的拍攝圖像來生成基準直方圖(步驟S130)。If it is judged that the captured image generated by the second
又,作為基於拍攝圖像生成直方圖的方法,可以使用各種習知方法。例如,也可以藉由修改理想的拍攝圖像的直方圖來生成基準直方圖。例如,也可以藉由抽象化理想的拍攝圖像的直方圖來進行理想的拍攝圖像的直方圖的修改。Also, as a method of generating a histogram based on a captured image, various known methods can be used. For example, it is also possible to generate a reference histogram by modifying the histogram of an ideal captured image. For example, the histogram of the ideal captured image may be modified by abstracting the histogram of the ideal captured image.
另外,在從過去的檢查結果中預先知道檢查對象物的峰值處的階度的值的情況下,可以基於操作者的經驗來作成理想的直方圖,而不需要另外拍攝。Also, when the value of the gradation at the peak of the inspection object is known in advance from past inspection results, an ideal histogram can be created based on the operator's experience without requiring separate imaging.
然後,操作者操作切斷裝置1,以將生成的基準直方圖記憶在記憶部80中(步驟S140)。在切斷裝置1中,藉由使用基於理想的拍攝圖像所生成的基準直方圖,進行照明部17中的光的照射狀態的自動調整。以下,詳細說明照明部17中的光的照射狀態的自動調整的順序。
[3.動作]
Then, the operator operates the
如上所述,在照明部17的各區段中,可以例如在0到100的範圍內調整照度等級。例如,在藉由切斷封裝基板P1(密封完成的基板)而被單片化的電子部件S1的狀態的檢查中,較佳為從接近垂直電子部件S1的表面(檢查面)的方向照射光。在本實施形態中,僅使用照明部17的複數個區段(Ch01至Ch08)中的Ch01至Ch03。也就是說,Ch04至Ch08的照度等級被設定為0。在根據本實施形態的切斷裝置1中,自動搜尋最佳組合,以作為Ch01至Ch03的每一個照度等級的組合。As described above, in each section of the
第10圖是表示照明部17中的光的照明狀態的自動調整順序的流程圖。在切斷裝置1的正式的電子部件S1的製造開始前的階段中,藉由電腦50的控制部70執行該流程圖所示的處理。例如,在該流程圖的開始時,Ch01至Ch03中的每一個的照度等級被設置為0。FIG. 10 is a flowchart showing the automatic adjustment procedure of the lighting state of the light in the
參照第10圖,針對Ch01至Ch03中的每一個,控制部70執行用於決定0至100的照度等級的範圍(照度等級的寬度是100的範圍)之中的精查範圍(例如,照度等級的寬度是10的範圍)的處理(步驟S200)。Referring to FIG. 10, for each of Ch01 to Ch03, the
第11圖是表示第10圖的步驟S200中執行的處理的流程圖。藉由電腦50的控制部70執行該流程圖所示的處理。Fig. 11 is a flowchart showing the processing executed in step S200 of Fig. 10 . The processing shown in this flowchart is executed by the
參照第11圖,針對照明部17的Ch01,控制部70以第一單位(例如,5)改變照度等級(步驟S300)。控制部70控制第二光學檢查相機13,以在將光從照明部17朝向電子部件S1照射的狀態下,拍攝電子部件S1(步驟S305)。控制部70基於由第二光學檢查相機13生成的拍攝圖像來生成直方圖(步驟S310)。Referring to FIG. 11 , for Ch01 of the
控制部70計算所生成的直方圖與記憶部80所記憶的基準直方圖之間的偏差量(步驟S315)。具體而言,控制部70計算所生成的直方圖與基準直方圖之間的各階度的像素數的差,並計算所計算的各差的絕對值的和。該絕對值的和是「偏差量」的一例。The
控制部70判定所計算的偏差量是否小於記憶部80所記憶的偏差量(步驟S320)。另外,在偏差量並未記憶在記憶部80中的情況下,則步驟S320中判定為是。如果判定所計算的偏差量小於記憶部80所記憶的偏差量(步驟S320中的是),則控制部70控制當前的Ch01、Ch02、Ch03中的每一個的照度等級,並且控制記憶部80,以記憶在步驟S315中所計算的偏差量(步驟S325)。也就是說,更新記憶在記憶部80中的Ch01、Ch02、Ch03中的每一個的照度等級和偏差量。The
在判定所計算的偏差量是在記憶部80所記憶的偏差量以上的情況下(步驟S320中的否),或者在步驟S325的處理完成的情況下,控制部70判定在當前的Ch02和Ch03的照度等級的組合中是否已經完成Ch01的照度等級的所有模式(步驟S330)。另外,在第一單位是5的情況下,Ch01的照度等級的所有模式是0、5、10、15、20、...、90、95、100。When it is determined that the calculated deviation amount is greater than or equal to the deviation amount stored in the storage unit 80 (No in step S320), or when the processing in step S325 is completed, the
如果判定在當前的Ch02和Ch03的照度等級的組合中尚未完成Ch01的照度等級的所有模式(步驟S330中的否),則再次進行步驟S300至步驟S330的處理。另一方面,如果判定在當前的Ch02和Ch03的照度等級的組合中已經完成Ch01的照度等級的所有模式(步驟S330中的是),則控制部70判定在當前的Ch03的照度等級中是否已經完成Ch02的照度等級的所有模式(步驟S335)。If it is determined that all modes of the illuminance level of Ch01 have not been completed in the current combination of illuminance levels of Ch02 and Ch03 (NO in step S330 ), the processes of steps S300 to S330 are performed again. On the other hand, if it is determined that all modes of the illuminance level of Ch01 have been completed in the combination of the current illuminance levels of Ch02 and Ch03 (Yes in step S330 ), the
如果判定在當前的Ch03的照度等級中尚未完成Ch02的照度等級的所有模式(步驟S335中的否),則控制部70針對Ch02以第一單位改變照度等級(步驟S340)。其後,再次進行步驟S300至步驟S335的處理。另一方面,如果判定在當前的Ch03的照度等級中已經完成Ch02的照度等級的所有模式(步驟S335中的是),則控制部70判定是否已經完成Ch03的照度等級的所有模式(步驟S345)。If it is determined that all modes of the illuminance level of Ch02 have not been completed in the current illuminance level of Ch03 (NO in step S335 ), the
如果判定尚未完成Ch03的照度等級的所有模式(步驟S345中的否),則控制部70針對Ch03以第一單位改變照度等級(步驟S350)。其後,再次進行步驟S300至步驟S345的處理。另一方面,如果判定已經完成Ch03的照度等級的所有模式(步驟S345中的是),則控制部70基於記憶部80所記憶的Ch01、Ch02、Ch03中的每一個的照度等級來決定精查範圍(步驟S355)。If it is determined that all modes of the illuminance level of Ch03 have not been completed (NO in step S345 ), the
關於Ch01的精查範圍是例如記憶部80所記憶的Ch01的照度等級的前後5的範圍。關於CH02的精查範圍是例如記憶部80所記憶的CH02的照度等級的前後5的範圍。關於CH03的精查範圍是例如記憶部80所記憶的CH03的照度等級的前後5的範圍。例如,假設記憶部80所記憶的的Ch01、Ch02、Ch03分別為40、50、55。在這種情況下,Ch01、Ch02、Ch03的精查範圍分別是例如35-45、45-55、50-60。The precise search range for Ch01 is, for example, a range of five before and after the illuminance level of Ch01 stored in the
再次參照第10圖,如果在步驟S200中決定精查範圍,則控制部70執行用於決定檢查用的照射狀態的處理(步驟S210)。Referring again to FIG. 10 , when the precise examination range is determined in step S200 , the
第12圖是表示第10圖的步驟S210中執行的處理的流程圖。藉由電腦50的控制部70執行該流程圖所示的處理。Fig. 12 is a flowchart showing the processing executed in step S210 of Fig. 10 . The processing shown in this flowchart is executed by the
參照第12圖,針對照明部17的Ch01,控制部70在精查範圍內以第二單位(例如,1)改變照度等級(步驟S400)。第二單位是比上述第一單位更小的單位。由於步驟S405至S425的處理分別與第11圖中的步驟S305至S325的處理相同,因此將不再重複說明。Referring to FIG. 12 , with respect to Ch01 of the
在步驟S420中判定所計算的偏差量是在記憶部80所記憶的偏差量以上的情況下(步驟S420中的否),或者在步驟S425的處理完成的情況下,控制部70判定在當前的Ch02和Ch03的照度等級的組合中是否已經完成精查範圍內的Ch01的照度等級的所有模式(步驟S430)。另外,在第二單位是1且Ch01的精查範圍是例如35-45的情況下,Ch01的照度等級的所有模式是35、36、37、38、39、…、43、44、45。When it is determined in step S420 that the calculated deviation amount is greater than or equal to the deviation amount stored in the storage unit 80 (No in step S420), or when the processing in step S425 is completed, the
如果判定在當前的Ch02和Ch03的照度等級的組合中尚未完成精查範圍內的Ch01的照度等級的所有模式(步驟S430中的否),則再次進行步驟S400至步驟S430的處理。另一方面,如果判定在當前的Ch02和Ch03的照度等級的組合中已經完成精查範圍內的Ch01的照度等級的所有模式(步驟S430中的是),則控制部70判定在當前的Ch03的照度等級中是否已經完成精查範圍內的Ch02的照度等級的所有模式(步驟S435)。If it is determined that all modes of the illuminance levels of Ch01 within the fine-search range have not been completed in the current combination of illuminance levels of Ch02 and Ch03 (No in step S430 ), the processes of steps S400 to S430 are performed again. On the other hand, if it is determined that all modes of the illuminance levels of Ch01 within the range of fine-tuning have been completed in the combination of the current illuminance levels of Ch02 and Ch03 (Yes in step S430), the
如果判定在當前的Ch03的照度等級中尚未完成精查範圍內的Ch02的照度等級的所有模式(步驟S435中的否),則控制部70針對Ch02在精查範圍內以第二單位改變照度等級(步驟S440)。其後,再次進行步驟S400至步驟S435的處理。另一方面,如果判定在當前的Ch03的照度等級中已經完成精查範圍內的Ch02的照度等級的所有模式(步驟S435中的是),則控制部70判定是否已經完成精查範圍內的Ch03的照度等級的所有模式(步驟S445)。If it is determined that all the patterns of the illuminance levels of Ch02 within the fine-examination range have not been completed at the current illuminance level of Ch03 (NO in step S435), the
如果判定尚未完成精查範圍內的Ch03的照度等級的所有模式(步驟S445中的否),則控制部70針對Ch03在精查範圍內以第二單位改變照度等級(步驟S450)。其後,再次進行步驟S400至步驟S445的處理。另一方面,如果判定已經完成精查範圍內的Ch03的照度等級的所有模式(步驟S445中的是),則控制部70將記憶部80所記憶的Ch01、Ch02、Ch03中的每一個的照度等級決定成檢查用的照度等級(步驟S455)。也就是說,控制部70將記憶部80所記憶的光的照射狀態決定成檢查用的光的照射狀態。
[4. 特徵]
If it is determined that all patterns of the illuminance levels of Ch03 within the precise examination range have not been completed (NO in step S445 ), the
如上所述,在根據本實施形態的切斷裝置1中,第2光學檢查相機13生成分別在不同的光的照射狀態下生成的複數個拍攝圖像,控制部70將基於複數個拍攝圖像中的每一個所生成的每個直方圖與基準直方圖進行比較,並且基於比較的結果來決定在電子部件S1的檢查中使用的光的照射狀態。根據切斷裝置1,可以根據基於複數個拍攝圖像中的每一個所生成的每個直方圖與基準直方圖的比較結果來自動決定照明部17中的光的照射狀態。其結果是,根據本實施形態的切斷裝置1,能夠不受操作者的熟練度等的影響,將照明部17的各區段的照度調整成適當的值,而能夠進行高品質的檢查。As described above, in the
又,在根據本實施形態的切斷裝置1中,控制部70計算基於複數個拍攝圖像中的每一個所生成的每個直方圖與基準直方圖之間的偏差量,並且將生成具有最小的偏差量的直方圖所對應的拍攝圖像時的照射狀態決定為檢查所使用的照射狀態。根據切斷裝置1,由於將生成與接近基準直方圖的直方圖所對應的拍攝圖像時的光的照射狀態採用為檢查用的照射狀態,所以能夠抑制第二光學檢查相機13的拍攝圖像的品質的劣化。其結果是,能夠抑制電子部件S1的檢查品質的劣化。Also, in the
又,在根據本實施形態的切斷裝置1中,控制部70為了決定照明部17的照射狀態,以第一單位改變照度等級來決定精查範圍,其後,在精查範圍內以比第一單位更小的第二單位改變照度等級來進行最佳照射狀態的搜尋。根據切斷裝置1,由於沒有針對照明部17的每個區段詳細搜尋照度等級的可設定範圍的全部範圍,所以能夠有效進行最佳照射狀態的搜尋。In addition, in the
另外,電子部件S1是本發明中的「檢查對象物」的一例。第一光學檢查相機12和第二光學檢查相機13中的每一個是本發明中的「相機」的一例。照明部16和17中的每一個是本發明中的「照明部」的一例。控制部70是本發明中的「控制部」的一例。記憶部80是本發明中的「記憶部」的一例。LED17b是本發明中的「照明」的一例。照度等級的可設定範圍的全部範圍是本發明中的「第一範圍」的一例,而精查範圍是本發明中的「第二範圍」的一例。
[5.變化例]
In addition, the electronic component S1 is an example of the "inspection object" in this invention. Each of the first
上述實施形態的概念並不限定於以上所說明的實施形態。以下,說明關於能夠適用上述實施形態的概念的其他實施形態的一例。 <5-1> The concepts of the above-mentioned embodiments are not limited to the above-described embodiments. Hereinafter, an example of other embodiments to which the concepts of the above-mentioned embodiments can be applied will be described. <5-1>
在上述實施形態中,控制部70以第一單位改變照度等級,以決定精查範圍,其後,在精查範圍內以第二單位(第二單位<第一單位)改變照度等級,以進行最佳的光的照射狀態的搜尋。然而,也不是一定需要以兩階段進行照射狀態的搜尋。例如,控制部70也可以不決定精查範圍,而在照度等級的全部可設定範圍內以第二單位改變照度等級,以進行最佳照射狀態的搜尋。在這種情況下,由於進行更詳細的搜尋,所以能夠更確實地指定最佳的光的照射狀態。In the above embodiment, the
又,也可以藉由三階段以上的搜尋來進行光的照射狀態的搜尋。例如,控制部70也可以以第一單位改變照度等級,以決定第一精查範圍,其後,在第一精查範圍內以第二單位(第二單位<第一單位)改變照度等級,以決定第二精查範圍,並且在第二精查範圍內以第三單位(第三單位<第二單位)改變照度等級,以進行最佳的光的照射狀態的搜尋(三階段的搜尋)。如果搜尋的階段數增加,則由於進行更詳細的搜尋,所以能夠使照明部17中的光的照射狀態更接近理想照射狀態。
<5-2>
In addition, the search for the irradiation state of light may be performed by searching in three or more stages. For example, the
在上述實施形態中,照明部16和17中的每一個是由複數個區段構成。然而,照明部16和17中的每一個也可以不一定必須由複數個區段構成。例如,只要該區段可調光,照明部16和17中的每一個也可以由一個區段構成。又,照明部16和17中的每一個的區段的數量不一定必須是8個,可以是8個以下,也可以是9個以上。又,在上述實施形態中,將Ch04至Ch08的照度等級設定為0,但是Ch04至Ch08的照度等級也可以不一定必須是0。又,例如,也可以在所有Ch01至Ch08中自動調整照度等級。
<5-3>
In the above-described embodiment, each of the
在上述實施形態中,將在整個焊球/導線面上形成焊珠的BGA例示為電子部件S1。然而,電子部件S1並不限定於此。例如,電子部件S1可以是沒有在焊球/導線面的一部的區域上形成焊珠的BGA,或者也可以是如前所述的LGA、QFN等。In the above-mentioned embodiment, the BGA in which solder balls are formed on the entire solder ball/lead surface is exemplified as the electronic component S1. However, electronic component S1 is not limited to this. For example, the electronic component S1 may be a BGA in which no solder balls are formed on a part of the solder ball/wire surface, or may be an LGA, QFN, etc. as described above.
第13圖是表示變形例中的電子部件S1的拍攝圖像的一例的圖。如第13圖所示,拍攝圖像IM3表示複數個電子部件S1。在每個電子部件S1中,設置沒有形成焊珠的區域T1。這種電子部件S1也可以作為檢查對象物。FIG. 13 is a diagram showing an example of a captured image of electronic component S1 in a modified example. As shown in FIG. 13, the captured image IM3 shows a plurality of electronic components S1. In each electronic component S1, a region T1 in which no solder beads are formed is provided. Such an electronic component S1 can also be used as an inspection object.
另外,關於基準直方圖,相較於峰值中的階度的值的精度,峰值中的像素數的值的精度也可以較低。也就是說,如果峰值中的階度值的的精度高到某種程度,則峰值中的像素數的值不需要這樣的精度。這是因為,在偏差量的演算中,進行用於取得關於每個階度中的每個像素的值的差的演算,並且進行比較。與第5圖的拍攝圖像的直方圖一樣(參照第6圖),第13圖的拍攝圖像的直方圖包含對應於電子部件部100的組成C1、對應於黑溝部110的組成C2、對應於焊珠部120的組成C3(也就是說,峰值中的階度一致,但是像素數不同)。因此,能夠使用第5圖的拍攝圖像的基準直方圖,來作為第13圖的拍攝圖像的基準直方圖。Also, regarding the reference histogram, the precision of the value of the number of pixels in the peak may be lower than the precision of the value of the gradation in the peak. That is, if the precision of the gradation value in the peak is high to some extent, the value of the number of pixels in the peak does not need such precision. This is because, in the calculation of the deviation amount, a calculation for obtaining a difference in the value of each pixel in each gradation is performed, and a comparison is performed. Like the histogram of the captured image in FIG. 5 (see FIG. 6), the histogram of the captured image in FIG. 13 includes composition C1 corresponding to the
在上述實施形態中,將每個階度中的拍攝圖像的直方圖與基準直方圖的像素數(直方圖的值)的差的絕對值的和定義為「偏差量」。然而,「偏差量」並不限定於此。拍攝圖像的直方圖和基準直方圖中的每一個的形狀由函數表示,並且「偏移量」可以是例如這些函數的相關性。 <5-4> In the above-mentioned embodiment, the sum of the absolute values of the differences between the histogram of the captured image and the number of pixels of the reference histogram (value of the histogram) for each level is defined as the “difference amount”. However, the "deviation amount" is not limited to this. The shape of each of the histogram of the captured image and the reference histogram is represented by a function, and the "offset" may be, for example, the correlation of these functions. <5-4>
在上述實施形態中,利用第9圖的流程圖所示的順序來生成基準直方圖。然而,基準直方圖也可以不一定由這樣的順序生成。例如,也可以根據電子部件S1的特徵自動生成基準直方圖。又,例如,可以準備與複數種類的電子部件S1中的每一個對應的基準直方圖,並且可以將複數個基準直方圖記憶在記憶部80中。在這種情況下,也可以根據檢查對象物是哪個種類的電子部件S1,而改變所使用的基準直方圖。In the above embodiment, the reference histogram is generated by the procedure shown in the flowchart of FIG. 9 . However, the reference histogram may not necessarily be generated in this order. For example, a reference histogram may be automatically generated based on the characteristics of the electronic component S1. Also, for example, a reference histogram corresponding to a plurality of types of electronic components S1 may be prepared, and the plurality of reference histograms may be stored in the
以上,例示說明了本發明的實施形態。也就是說,為了例示說明,揭露了詳細說明和附加圖式。因此,在記載於詳細說明和附加圖式之構成要素中,會包含有對解決問題為非必要的構成要素。所以,雖然在詳細說明和附加圖式中記載了這些非必要的構成要素,也不應該將這些非必要的構成要素,直接地認定為是必要的。As mentioned above, the embodiment of this invention was illustrated and described. That is, the detailed description and the attached drawings are disclosed for the purpose of illustration. Therefore, among the constituent elements described in the detailed description and the attached drawings, constituent elements not necessary for solving the problem may be included. Therefore, although these non-essential constituent elements are described in the detailed description and the attached drawings, these non-essential constituent elements should not be directly regarded as essential.
又,上述實施形態,在各種觀點中僅是本發明的例示。上述實施形態,在本發明的範圍中可進行各種改良和變更。對本發明的實施,能夠對應於實施形態來適當地採用具體構成。In addition, the above-mentioned embodiments are merely illustrations of the present invention from various viewpoints. Various improvements and changes can be made to the above-described embodiments within the scope of the present invention. For implementation of the present invention, specific configurations can be appropriately adopted in accordance with the embodiments.
1:切斷裝置
3:基板供給部
4:定位部
4a:軌道部
5:切斷台
5a:保持構件
5b:旋轉機構
5c:移動機構
5d:第一位置確認相機
5e:第一洗淨器
6:芯軸部
6a:葉片
6b:第二位置確認相機
6c:旋轉軸
6d:第一凸緣
6e:第二凸緣
6f:緊固部件
7:搬送部
7a:第二洗淨器
11:檢查台
12:第一光學檢查相機
13:第二光學檢查相機
14:配置部
15:抽出部
15a:良品用托盤
15b:不良品用托盤
16、17:照明部
17a:圓頂
17b:LED
20:監視器
50:電腦
70:控制部
72:CPU
74:RAM
76:ROM
80:記憶部
81:控制程式
90:輸入輸出I/F
100、200:電子部件部
110、210:黑溝部
120、220:焊珠部
A1:切斷模組
B1:檢查和收納模組
C1、C2、C3、C4、C5、C6:組成
HG1、HG2:直方圖
IM1、IM2、IM3:拍攝圖像
M1:卡匣
P1:封裝基板
S1:電子部件
T1:區域
1: cutting device
3: Substrate supply part
4:
第1圖是示意地表示切斷裝置的平面圖。 第2圖是示意地表示芯軸部的側面圖。 第3圖是包含示意地表示照明部的斷面的圖。 第4圖是示意地表示電腦的硬體構成的圖。 第5圖是表示較佳的拍攝圖像的一例的圖。 第6圖是表示第5圖所示的拍攝圖像的直方圖的圖。 第7圖是表示較不佳的拍攝圖像的一例的圖。 第8圖是表示第7圖所示的拍攝圖像的直方圖的圖。 第9圖是表示生成基準直方圖的順序的流程圖。 第10圖是表示照明部中的光的照明狀態的自動調整順序的流程圖。 第11圖是表示第10圖的步驟S200中執行的處理的流程圖。 第12圖是表示第10圖的步驟S210中執行的處理的流程圖。 第13圖是表示變形例中的電子部件的拍攝圖像的一例的圖。 Fig. 1 is a plan view schematically showing a cutting device. Fig. 2 is a side view schematically showing a mandrel portion. Fig. 3 is a diagram schematically showing a section of an illumination unit. Fig. 4 is a diagram schematically showing a hardware configuration of a computer. Fig. 5 is a diagram showing an example of a preferable captured image. Fig. 6 is a diagram showing a histogram of the captured image shown in Fig. 5 . Fig. 7 is a diagram showing an example of a poor captured image. Fig. 8 is a diagram showing a histogram of the captured image shown in Fig. 7 . Fig. 9 is a flowchart showing the procedure for generating a reference histogram. Fig. 10 is a flowchart showing the automatic adjustment procedure of the lighting state of the light in the lighting unit. Fig. 11 is a flowchart showing the processing executed in step S200 of Fig. 10 . Fig. 12 is a flowchart showing the processing executed in step S210 of Fig. 10 . Fig. 13 is a diagram showing an example of a captured image of an electronic component in a modified example.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic deposit information (please note in order of depositor, date, and number) none Overseas storage information (please note in order of storage country, institution, date, and number) none
1:切斷裝置 1: cutting device
3:基板供給部 3: Substrate supply part
4:定位部 4: Positioning Department
4a:軌道部 4a: track part
5:切斷台 5: Cutting table
5a:保持構件 5a: Holding member
5b:旋轉機構 5b: Rotary mechanism
5c:移動機構 5c: Mobile Mechanism
5d:第一位置確認相機 5d: First position confirmation camera
5e:第一洗淨器 5e: First Scrubber
6:芯軸部 6: mandrel part
6a:葉片 6a: blade
6b:第二位置確認相機 6b:Second position confirmation camera
7:搬送部 7:Transportation department
7a:第二洗淨器 7a: Second scrubber
11:檢查台 11: Examination table
12:第一光學檢查相機 12: The first optical inspection camera
13:第二光學檢查相機 13: Second optical inspection camera
14:配置部 14:Configuration Department
15:抽出部 15: Extraction part
15a:良品用托盤 15a: Trays for good products
15b:不良品用托盤 15b: Tray for defective products
16、17:照明部 16, 17: Lighting department
20:監視器 20: Monitor
50:電腦 50: computer
M1:卡匣 M1: Cassette
P1:封裝基板 P1: Package substrate
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JP2021-189566 | 2021-11-22 | ||
JP2021189566A JP7291766B2 (en) | 2021-11-22 | 2021-11-22 | Inspection system, control method, electronic component manufacturing method and cutting device |
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JP (1) | JP7291766B2 (en) |
KR (1) | KR20240039194A (en) |
CN (1) | CN117859052A (en) |
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US6207946B1 (en) * | 1998-09-03 | 2001-03-27 | Semiconductor Technologies & Instruments, Inc. | Adaptive lighting system and method for machine vision apparatus |
JP3471262B2 (en) | 1999-07-30 | 2003-12-02 | 日本電信電話株式会社 | 3D image processing device |
JP4287090B2 (en) | 2002-01-15 | 2009-07-01 | Towa株式会社 | Jig for cutting resin-sealed substrates |
JP3903890B2 (en) | 2002-08-15 | 2007-04-11 | ソニー株式会社 | Image processing apparatus and image processing method |
JP5071282B2 (en) | 2008-07-15 | 2012-11-14 | ソニー株式会社 | Bit selection circuit |
JP2019176229A (en) | 2018-03-27 | 2019-10-10 | ヤマハ株式会社 | Signal synchronization method |
KR102117675B1 (en) * | 2018-07-05 | 2020-06-01 | 주식회사 디딤센서 | Illumination system and control method of the illumination system |
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JP7291766B2 (en) | 2023-06-15 |
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