TW202317669A - Resin composition for encapsulation, redistribution wafer, semiconductor package and method of producing semiconductor package - Google Patents

Abstract

A resin composition for encapsulation that satisfies at least one of the following (1) to (4): (1) comprises a curable resin component, an elastomer component and a filler, and has an elasticity at 260 DEG C of 1.0 GPa or less in a cured state; (2) comprises a curable resin component, an elastomer component and a filler, and a content of the elastomer component is from 1.0% by mass to 8.0% by mass of the total resin composition; (3) comprises a curable resin composition, a compound having a siloxane bond and a filler, and a content of the compound having a siloxane bond in a total of the curable resin component and the compound having a siloxane bond is 20% by mass or more; (4) comprises a curable resin composition, a compound having a siloxane bond and a filler, and is used for wafer level packaging.

Description

Resin composition for sealing, reconfigured wafer, semiconductor package, and manufacturing method of semiconductor package

The invention relates to a resin composition for sealing, a reconfiguration wafer, a semiconductor package and a manufacturing method of the semiconductor package.

In recent years, a method called wafer level packaging (Wafer Level Package, WLP) has been studied as a semiconductor mounting technology using a resin sealing material. In this method, unlike the flip-chip type method in which a semiconductor chip and a wiring board are packaged in a state where a semiconductor chip and a wiring board are connected, since a wiring board is not required, the package can be reduced in thickness. Moreover, since a plurality of semiconductor wafers are arranged on a support body, sealed collectively, and then singulated into packages, it is attracting attention as a mounting technique excellent in productivity.

In WLP, a sealing material is used to seal one side of a large-area support, so warping easily occurs due to differences in thermal expansion coefficient, elastic coefficient, shrinkage, etc. between the sealing material and the support. As a method of suppressing the warpage of the support after sealing, increasing the filling amount of the filler has been studied (for example, refer to Patent Document 1). [Prior art literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2013-10940

[Problem to be Solved by the Invention] If the amount of the filler in the sealing material is increased, the thermal expansion coefficient of the sealing material decreases and the difference between the thermal expansion coefficients of the sealing material and the support body becomes smaller, and the warping of the support body is suppressed, but if the support body has a larger area, it may not be possible. The effect of suppressing warpage is sufficiently obtained.

In recent years, the use of 12-inch wafers instead of the conventional 8-inch size has led to an increase in the size of the support in WLP. Therefore, it is desired to provide a resin composition for sealing that suppresses the warping of the support after sealing a large area, a reconfigured wafer and a semiconductor package obtained using the resin composition for sealing, and a package after sealing. A method of manufacturing a semiconductor package in which warping of a support is suppressed.

In view of the above circumstances, the present invention has an object to provide a resin composition for sealing in which warpage of a support after sealing is suppressed, a reconfigured wafer and a semiconductor package obtained by using the resin composition for sealing, and a sealed support. A method of manufacturing a semiconductor package in which warping of a support is suppressed. [Means to solve the problem]

<1> A resin composition for sealing, comprising a curable resin component, an elastomer component, and a filler, and having a modulus of elasticity at 260° C. of 1.0 GPa or less as a cured product. <2> A sealing resin composition comprising a curable resin component, an elastomer component, and a filler, wherein the content of the elastomer component is 1.0% by mass to 8.0% by mass of the whole. <3> The resin composition for sealing according to <1> or <2>, wherein the elastomer component contains a compound having a siloxane bond. <4> A sealing resin composition comprising a curable resin component, a compound having a siloxane bond, and a filler. The proportion of the total amount of compounds having an alkyl bond is 20% by mass or more. <5> A resin composition for sealing, which includes a curable resin component, a compound having a siloxane bond, and a filler, and can be used for wafer-level packaging. <6> The sealing resin composition according to any one of <3> to <5>, wherein the compound having a siloxane bond includes a compound having a structural unit represented by the following formula (1).

[chemical 1]

[In formula (1), R ¹ and R ² are independently selected from alkyl groups with 1 to 10 carbons, aryl groups with 6 to 10 carbons, alkoxy groups with 1 to 10 carbons, epoxy groups A group consisting of a monovalent organic group, a monovalent organic group having a carboxyl group, and a polyalkylene ether group having 3 to 500 carbon atoms] <7> The resin composition for sealing according to <6>, which has the The compound of the structural unit represented by the said formula (1) further has the structural unit represented by the following formula (2).

[Chem 2]

[In formula (2), R ³ is an alkylene group having 1 to 10 carbon atoms] <8> The resin composition for sealing according to <6> or <7>, which has the formula (1) The compound of the structural unit is a compound having a structure represented by the following formula (3).

[Chem 3]

[In formula (3), n is an integer of 1 to 200, m ₁ and m ₂ are each independently an integer of 1 to 200, R ¹ and R ² are each independently selected from an alkyl group having 1 to 10 carbons, carbon Composed of aryl groups with 6 to 10 carbons, alkoxy groups with 1 to 10 carbons, monovalent organic groups with epoxy groups, monovalent organic groups with carboxyl groups and polyalkylene ether groups with 3 to 500 carbons group, R ³ are each independently an alkylene group with 1 to 10 carbons, and R ⁴ are each independently a divalent hydrocarbon group with 1 to 10 carbons] <9> such as any of <1> to <8> The resin composition for sealing according to item 1, wherein the curable resin component includes an epoxy resin and a hardener. <10> The resin composition for sealing according to <9>, wherein the curing agent includes a phenol curing agent. <11> The sealing resin composition according to any one of <1> to <4>, which can be used for wafer-level packaging. <12> The resin composition for sealing according to any one of <1> to <11>, which can be used for fan-out wafer level packaging (Fan Out Wafer Level Package, FO-WLP). <13> The resin composition for sealing according to any one of <1> to <12>, which can be used for sealing by compression molding. <14> The resin composition for sealing according to any one of <1> to <13>, which is in powder form.

<15> A reconfigured wafer comprising: a support, a plurality of semiconductor wafers arranged on the support, and any one of <1> to <14> obtained by sealing the semiconductor wafers. A cured product of the sealing resin composition. <16> A semiconductor package comprising: a support, a semiconductor wafer disposed on the support, and the seal according to any one of <1> to <14>, wherein the semiconductor wafer is sealed. A cured product made of a resin composition. <17> A method of manufacturing a semiconductor package, comprising: a step of disposing a plurality of semiconductor wafers on a support; disposing any one of <1> to <14> on the support on which the semiconductor wafers are disposed. the step of sealing the resin composition for sealing described in the item; the step of curing the resin composition for sealing disposed on the support to seal the semiconductor wafer; and the step of singulating the semiconductor wafer. [Effect of the invention]

According to the present invention, there can be provided a resin composition for sealing in which warpage of a support after sealing is suppressed, a relocated wafer and a semiconductor package obtained using the resin composition for sealing, and warpage of a support after sealing. A method of manufacturing a semiconductor package in which warpage is suppressed.

Hereinafter, the form for carrying out this invention is demonstrated in detail. However, the present invention is not limited to the following embodiments. In the following embodiments, the constituent elements (including element steps, etc.) are not essential unless otherwise specified. The same applies to numerical values and their ranges, and do not limit the present invention.

In this disclosure, the term "step" includes a step that is independent from other steps, and even when it cannot be clearly distinguished from other steps, as long as the purpose of the step is achieved. In the present disclosure, the numerical ranges represented by "-" include the numerical values described before and after "-" as the minimum value and the maximum value, respectively. In the numerical ranges described step by step in this disclosure, the upper limit or lower limit described in one numerical range may also be replaced by the upper limit or lower limit of other numerical ranges described step by step. In addition, in the numerical range described in this indication, the upper limit or the lower limit of the numerical range may be replaced with the value shown in an Example. In this disclosure, a plurality of substances corresponding to each component may also be contained. When a plurality of substances corresponding to each component exist in the composition, unless otherwise specified, the content or content of each component refers to the total content or content of the plurality of substances present in the composition. In this disclosure, a plurality of particles corresponding to each component may be contained. When there are multiple types of particles corresponding to each component in the composition, unless otherwise specified, the particle size of each component refers to a value for a mixture of the plurality of types of particles present in the composition.

<Resin composition for sealing (first embodiment)> The sealing resin composition of the present embodiment includes a curable resin component, an elastomer component, and a filler, and has an elastic coefficient at 260° C. of 1.0 GPa or less when it is made into a cured product.

According to studies by the inventors of the present invention, it has been found that the warping of the support after sealing is suppressed in the resin composition for sealing having the above-mentioned constitution. The reason for this is not necessarily clear, but it is speculated that by including the elastomer component, the thermal expansion coefficient when it is made into a cured product is lowered, and the difference in thermal expansion coefficient with the support becomes smaller. In addition, the elasticity at 260°C when made into a cured product A reduction in the coefficient will result in a reduction in warpage. The cause of the decrease in the modulus of elasticity at 260° C. is thought to be that, for example, the phase-separated elastomer component exists in islands in the resin matrix in which the curable resin component is formed. Furthermore, since the resin composition for sealing contains an elastomer component, the ratio of a curable resin component falls relatively. As a result, it is considered that an increase in the thermal expansion coefficient is suppressed, a low elasticity is achieved, and a sealing resin composition having an excellent effect of suppressing warpage can be obtained.

In this disclosure, the elastic coefficient at 260° C. when the resin composition for sealing is made into a cured product is a value measured by the method described in Examples. From the viewpoint of suppressing warpage of the support, the elastic coefficient is preferably 1.0 GPa or less, more preferably 0.5 GPa or less.

The sealing resin composition may be solid or liquid. As a shape when the resin composition for sealing is solid, a powder form, a sheet form, etc. are mentioned. From the viewpoint of handling, the sealing resin composition is preferably solid when used, and more preferably powdery.

(elastomer component) The type of the elastomer component is not particularly limited. Specific examples of the elastomer component include compounds having a siloxane bond (Si-O-Si) in the molecule (hereinafter also referred to as siloxane compounds), acrylic resin block copolymers, acrylonitrile- Butadiene rubber (acrylonitrile butadiene rubber, NBR), butadiene rubber, core-shell particles, indene·styrene·coumarone copolymer, etc. The elastomer component may be used alone or in combination of two or more.

In this disclosure, when the elastomer component is a compound corresponding to a curable resin component (for example, the elastomer component has a functional group that undergoes a curing reaction such as an epoxy group), the compound is classified as an elastomer component.

From the viewpoint of suppressing warping of the support, the elastomer component preferably contains a silicone compound. When the elastomer component contains a silicone compound, the ratio of the silicone compound to the total of the curable resin component and the elastomer component is preferably 20% by mass or more, more preferably 30% by mass or more, More preferably, it is 40 mass % or more.

The molecular weight of the siloxane compound is not particularly limited. From the viewpoint of suppressing warping of the support, the siloxane compound has a number average molecular weight of preferably 10,000 or more, more preferably 15,000 or more. The upper limit of the number average molecular weight is not particularly limited, but is preferably 30,000 or less, more preferably 20,000 or less, from the viewpoint of handleability.

In the present disclosure, the number average molecular weight (Mn) of the siloxane compound is a value measured by gel permeation chromatography (GPC) using a calibration curve of standard polystyrene. Specifically, for example, the following values are used: pump for GPC (manufactured by Hitachi, Ltd., model L-6200), column (TSKgel-G5000HXL and TSKgel-G2000HXL, both manufactured by Tosoh Co., Ltd., trade name) and A detector (manufactured by Hitachi, Ltd., L-3300RI type) was used, and tetrahydrofuran was used as an eluent, and measured under conditions of a temperature of 30° C. and a flow rate of 1.0 ml/min.

From the viewpoint of suppressing warping of the support, the siloxane compound is preferably a siloxane compound having a structural unit represented by the following formula (1).

[chemical 4]

In formula (1), R ¹ and R ² are independently selected from an alkyl group having 1 to 10 carbons, an aryl group having 6 to 10 carbons, an alkoxy group having 1 to 10 carbons, and a group having an epoxy group. A group consisting of a valent organic group, a monovalent organic group having a carboxyl group, and a polyalkylene ether group having 3 to 500 carbon atoms.

From the viewpoint of the effect of suppressing the warpage of the support, ^R1 and ^R2 are each independently preferably an alkyl group having 1 to 10 carbons or an aryl group having 6 to 10 carbons, more preferably methyl or Phenyl, more preferably methyl. When there are a plurality of structural units represented by formula (1), the plurality of R ¹ and the plurality of R ² may be the same or different.

Regarding the siloxane compound, at least one of the groups represented by R ¹ and R ² in formula (1) may also be selected from monovalent organic groups having epoxy groups and polyalkylene ethers with 3 to 500 carbon atoms. At least one of the groups of bases.

Examples of the monovalent organic group having an epoxy group represented by R ¹ and R ² include an alkyl group having 1 to 10 carbon atoms having an epoxy group. Examples of the polyalkylene ether group having 3 to 500 carbon atoms include a monovalent group having a structure in which a plurality of alkylene groups having 1 to 10 carbon atoms are linked by ether bonds. For example, a monovalent group including an ethylene oxide (Ethylene Oxide) structure (EO structure), a Propylene Oxide (Propylene Oxide) structure (PO structure), and a combination thereof may be mentioned.

In the siloxane compound having the structural unit represented by the formula (1), the number of the structural unit represented by the formula (1) is not particularly limited. For example, it can be selected from 1 to 200, more preferably from 5 to 150.

The siloxane compound having the structural unit represented by formula (1) preferably has a C 1-10 alkylene group forming a main chain together with the structural unit represented by formula (1). Examples of the siloxane compound include a siloxane compound having a structural unit represented by formula (1) and a structural unit represented by the following formula (2).

[chemical 5]

In formula (2), R ³ is an alkylene group having 1 to 10 carbon atoms, preferably an alkylene group having 1 to 5 carbon atoms. When there are a plurality of structural units represented by formula (2), the plurality of R ³ may be the same or different.

According to the studies of the inventors of the present invention, it has been found that the sealing resin composition comprising a siloxane compound having a structural unit represented by formula (1) and a structural unit represented by formula (2) not only suppresses warpage of the support In addition to the effect, there is a tendency that appearance defects such as whitening of the surface of the cured product are less likely to occur. The reason for this is considered to be that the siloxane compound having the structural unit represented by the formula (1) and the structural unit represented by the formula (2) compared with the siloxane compound having only the structural unit represented by the formula (1) The compatibility with the curable resin component is more excellent, and the bleed-out of the silicone compound from the sealing resin composition is further suppressed.

In the siloxane compound having the structural unit represented by formula (1) and the structural unit represented by formula (2), the number of structural units represented by formula (2) is not particularly limited. For example, it can be selected from 2 to 400, more preferably from 3 to 300.

In the siloxane compound having the structural unit represented by formula (1) and the structural unit represented by formula (2), the mass ratio of the structural unit represented by formula (1) to the structural unit represented by formula (2) (Formula (1)/Formula (2)) is not particularly limited.

In the siloxane compound having the structural unit represented by the formula (1) and the structural unit represented by the formula (2), the configuration of the structural unit represented by the formula (1) and the structural unit represented by the formula (2) The state is not particularly limited, and may be block or random. From the viewpoint of the effect of suppressing the warpage of the support, it is preferably in a block shape, more preferably a block including a structural unit represented by formula (2), and a structure including a structure represented by formula (1) are sequentially arranged A block of units and a block including a structural unit represented by formula (2).

Examples of the siloxane compound having a structural unit represented by formula (1) and a structural unit represented by formula (2) include compounds having a structural unit represented by the following formula (3) (hereinafter also referred to as specific silicone compounds).

[chemical 6]

In formula (3), n is an integer of 1 to 200, m ₁ and m ₂ are each independently an integer of 1 to 200, and R ¹ and R ² are each independently selected from an alkyl group having 1 to 10 carbon atoms, a carbon number Aryl groups with 6 to 10 carbons, alkoxy groups with 1 to 10 carbons, monovalent organic groups with epoxy groups, monovalent organic groups with carboxyl groups and polyalkylene ether groups with 3 to 500 carbons In the group, R ³ is each independently an alkylene group with 1 to 10 carbons, and R ⁴ is each independently a divalent hydrocarbon group with 1 to 10 carbons.

In formula (3), n is preferably an integer of 5-200, and m ₁ and m ₂ are preferably integers of 3-200 each independently. Preferred examples of R ¹ to R ³ are the same as those of R ¹ to R ³ in formula (1) and formula (2). R ⁴ is preferably an alkylene group each independently having 1 to 10 carbon atoms.

The specific silicone compound can be produced by a known method. For example, by combining a polysiloxane compound corresponding to a structural unit represented by formula (1) with a compound corresponding to a structural unit represented by formula (2) (for example, a cyclic ester compound such as ε-caprolactone, etc. or its polymer) to be produced by reacting.

In the case of producing a specific siloxane compound by the above method, by appropriately selecting the ratio of each compound, a specific siloxane compound of a desired structure can be obtained.

The specific siloxane compound is solid (powder) at normal temperature (25°C). Therefore, when preparing a solid resin composition for sealing, there is an advantage that the compounding amount can be increased compared with a liquid siloxane compound.

The resin composition for sealing may contain a specific siloxane compound and a siloxane compound different from the specific siloxane compound as the siloxane compound. In this case, the ratio of both is not particularly limited.

When a specific silicone compound and a silicone compound different from the specific silicone compound are used together as the silicone compound, the type of the silicone compound different from the specific silicone compound is not particularly limited. For example, it can also be selected from the siloxane compound which has the structural unit represented by formula (1).

(hardening resin component) The type of curable resin component contained in the sealing resin composition is not particularly limited. From the viewpoint of the balance of various properties as a sealing material, a combination of an epoxy resin and a hardener is preferable.

The type of epoxy resin is not particularly limited, and can be selected according to the required properties of the sealing resin composition and the like. Specific examples of the epoxy resin include phenolic compounds selected from phenol, cresol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F, α-naphthol, β- - At least one phenolic compound in the group consisting of naphthol, dihydroxynaphthalene and other aliphatic aldehyde compounds such as formaldehyde, acetaldehyde and propionaldehyde is condensed or co-condensed under an acidic catalyst to obtain a novolac resin And the novolak type epoxy resin (phenol novolac type epoxy resin, o-cresol novolac type epoxy resin etc.) obtained by epoxidizing the novolac resin; A triphenylmethane-type epoxy resin obtained by condensing or co-condensing aromatic aldehyde compounds such as salicylic aldehyde under an acidic catalyst to obtain a triphenylmethane-type phenolic resin and epoxidizing the triphenylmethane-type phenolic resin; Co-condensation of the phenolic compound and naphthol compound with an aldehyde compound under an acid catalyst to obtain a novolac resin and a copolymerized epoxy resin obtained by epoxidizing the novolak resin; as bisphenol A, bisphenol F Diphenylmethane-type epoxy resins such as diglycidyl ethers of diphenylmethane; biphenyl-type epoxy resins as diglycidyl ethers of alkyl-substituted or unsubstituted biphenols; diglycidyl ethers of stilbene phenolic compounds Stilbene-type epoxy resins; epoxy resins containing sulfur atoms as diglycidyl ethers such as bisphenol S; epoxy resins as glycidyl ethers of alcohols such as butanediol, polyethylene glycol, and polypropylene glycol; Glycidyl ester type epoxy resin as glycidyl ester of polycarboxylic acid compounds such as phthalic acid, isophthalic acid, tetrahydrophthalic acid, etc.; aniline, diaminodiphenylmethane, isocyanuric acid Glycidylamine-type epoxy resin obtained by substituting the active hydrogen bonded to the nitrogen atom of acid or the like with glycidyl group; dicyclopentadiene obtained by epoxidizing the co-condensation resin of dicyclopentadiene and phenol Olefin-type epoxy resin; diepoxidized vinyl cyclohexene, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate obtained by epoxidizing the olefin bond in the molecule , 2-(3,4-epoxy)cyclohexyl-5,5-spirocyclo(3,4-epoxy)cyclohexane-m-dioxane and other alicyclic epoxy resins; as p-xylene p-xylene-modified epoxy resins as glycidyl ethers of modified phenolic resins; m-xylene-modified epoxy resins as glycidyl ethers of m-xylene-modified phenolic resins; glycidol as terpene-modified phenolic resins Terpene-modified epoxy resin of ether; Dicyclopentadiene-modified epoxy resin as glycidyl ether of dicyclopentadiene-modified phenolic resin; As glycidyl ether of cyclopentadiene-modified phenolic resin Cyclopentadiene modified epoxy resin; polycyclic aromatic ring modified epoxy resin as glycidyl ether of polycyclic aromatic ring modified phenol resin; naphthalene type epoxy as glycidyl ether of phenol resin containing naphthalene ring Resins; Halogenated phenol novolac type epoxy resins; Hydroquinone type epoxy resins; Trimethylolpropane type epoxy resins; Linear aliphatic epoxy resins obtained by oxidizing olefin bonds with peracids such as peracetic acid ; Aralkyl-type epoxy resins obtained by epoxidizing aralkyl-type phenol resins such as phenol aralkyl resins and naphthol aralkyl resins. These epoxy resins may be used alone or in combination of two or more.

The epoxy equivalent (molecular weight/number of epoxy groups) of the epoxy resin is not particularly limited. From the viewpoint of the balance of various properties such as formability, reflow resistance, and electrical reliability, it is preferably from 100 g/eq to 1000 g/eq, and more preferably from 150 g/eq to 500 g/eq.

The epoxy equivalent of an epoxy resin may be the value measured by the method based on Japanese Industrial Standards (Japanese Industrial Standards, JIS) K7236:2009, for example.

When the epoxy resin is solid, its softening point or melting point is not particularly limited. From the viewpoint of workability at the time of preparation of the resin composition for sealing, it is preferably 50°C to 130°C.

The melting point or softening point of the epoxy resin is set to a value measured by a method (ring and ball method) based on differential scanning calorimetry (Differential scanning calorimetry, DSC) or JIS K 7234:1986.

(hardener) The type of curing agent is not particularly limited, and can be selected according to the required properties of the sealing resin composition and the like. When the resin used in combination is an epoxy resin, examples of the curing agent include phenol curing agents, amine curing agents, acid anhydride curing agents, polythiol curing agents, polyaminoamide curing agents, isocyanate curing agents, and blocked isocyanates. Hardener etc. From the viewpoint of heat resistance, the curing agent is preferably a curing agent (phenolic curing agent) having a phenolic hydroxyl group in the molecule.

As the phenol hardener, specifically, polyphenol compounds such as resorcinol, catechol, bisphenol A, bisphenol F, substituted or unsubstituted biphenol, etc.; Phenol compounds such as phenol, xylenol, resorcinol, catechol, bisphenol A, bisphenol F, phenylphenol, aminophenol, and naphthalene such as α-naphthol, β-naphthol, and dihydroxynaphthalene A novolac type phenol resin obtained by condensation or co-condensation of at least one phenolic compound in the group consisting of phenolic compounds and aliphatic aldehyde compounds such as formaldehyde, acetaldehyde, and propionaldehyde under an acidic catalyst; Aralkyl type phenolic resins such as phenol aralkyl resins, naphthol aralkyl resins, etc. synthesized with dimethoxy-p-xylene, bis(methoxymethyl)biphenyl, etc.; use p-xylene or m-diphenyl A phenolic resin modified by at least one of toluene; a melamine-modified phenolic resin; a terpene-modified phenolic resin; Phenol resin and dicyclopentadiene type naphthol resin; cyclopentadiene modified phenol resin; polycyclic aromatic ring modified phenol resin; biphenyl type phenol resin; A triphenylmethane-type phenol resin obtained by condensing or co-condensing aromatic aldehyde compounds under an acidic catalyst; a phenol resin obtained by copolymerizing two or more of these, and the like. These phenol hardeners may be used alone or in combination of two or more.

The functional group equivalent (hydroxyl equivalent in the case of a phenolic curing agent) of the hardener is not particularly limited. From the viewpoint of the balance of various properties such as formability, reflow resistance, and electrical reliability, it is preferably 70 g/eq to 1000 g/eq, and more preferably 80 g/eq to 500 g/eq.

The functional group equivalent (hydroxyl equivalent in the case of a phenolic curing agent) of the curing agent may be a value measured by a method based on JIS K 0070:1992, for example.

When the hardener is solid, its softening point or melting point is not particularly limited. From the viewpoint of formability and reflow resistance, it is preferably from 40°C to 180°C, and from the viewpoint of workability during production of the sealing resin composition, it is more preferably from 50°C to 130°C.

The melting point or softening point of the curing agent is set to a value measured in the same manner as the melting point or softening point of the epoxy resin.

The equivalent ratio of the curable resin to the curing agent, that is, the ratio of the functional groups in the curing agent to the functional groups in the curable resin (functional groups in the curing agent/functional groups in the curable resin) is not particularly limited. It is preferable to set it as the range of 0.5-2.0 from a viewpoint of suppressing each unreacted component little, and it is more preferable to set it as the range of 0.6-1.3. From the viewpoint of formability and reflow resistance, it is more preferable to set it within the range of 0.8 to 1.2.

(Filler) The type of filler is not particularly limited. Specifically, silica (fused silica, crystalline silica, etc.), glass, alumina, calcium carbonate, zirconium silicate, calcium silicate, silicon nitride, aluminum nitride, boron nitride , beryllium oxide, zirconia, zircon, forsterite (fosterite), steatite, spinel, mullite, titanium dioxide, talc, clay, mica and other inorganic materials. Fillers with flame retardant effects can also be used. Examples of the filler having a flame-retardant effect include composite metal hydroxides such as aluminum hydroxide, magnesium hydroxide, and composite hydroxides of magnesium and zinc, and zinc borate.

Among the above-mentioned fillers, silicon dioxide is preferable from the viewpoint of reducing the coefficient of linear expansion, and alumina is preferable from the viewpoint of high thermal conductivity. One type of filler may be used alone, or two or more types may be used in combination. Examples of the state of the filler include powder, spheroidized particles, fibers, and the like.

The content of the filler contained in the sealing resin composition is not particularly limited. From the viewpoint of fluidity and strength, it is preferably 30 vol % to 90 vol % of the entire sealing resin composition, more preferably 35 vol % to 80 vol %, and still more preferably 40 vol % to 70 vol %. When the content of the filler is 30% by volume or more based on the entire sealing resin composition, properties such as thermal expansion coefficient, thermal conductivity, and modulus of elasticity of the cured product tend to be further improved. When the content of the filler is 90% by volume or less of the entire sealing resin composition, the increase in viscosity of the sealing resin composition is suppressed, the fluidity is further improved, and the formability tends to be better.

When the filler is in the form of particles, the average particle diameter is not particularly limited. For example, the volume average particle diameter is preferably from 0.2 μm to 20 μm, more preferably from 0.5 μm to 15 μm. When the volume average particle diameter is 0.2 μm or more, the increase in the viscosity of the sealing resin composition tends to be further suppressed. When the volume average particle diameter is 20 μm or less, the filling property to narrow gaps tends to be further improved. The volume average particle diameter of the filler can be regarded as the particle diameter (D50) at which the cumulative volume from the small particle diameter side becomes 50% in the volume-based particle size distribution obtained by the laser scattering diffraction particle size distribution measuring device To measure.

(hardening accelerator) The resin composition for sealing may also contain a hardening accelerator. The type of curing accelerator is not particularly limited, and can be selected according to the type of curable resin, the required properties of the sealing resin composition, and the like. Examples of hardening accelerators include: 1,5-diazabicyclo[4.3.0]nonene-5 (1,5-Diazabicyclo[4.3.0]nonene-5, DBN), 1,8-diazabicyclo[4.3.0]nonene-5, Bicyclo[5.4.0]undecene-7 (1,8-Diazabicyclo[5.4.0]undecene-7, DBU) and other diazabicycloalkenes, 2-methylimidazole, 2-phenylimidazole, 2- Cyclic amidine compounds such as phenyl-4-methylimidazole and 2-heptadecylimidazole; derivatives of the cyclic amidine compound; phenol novolak salts of the cyclic amidine compound or its derivative; and in Add maleic anhydride, 1,4-benzoquinone, 2,5-tolylquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone to these compounds , 2,3-dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone and other quinone compounds Compounds with intramolecular polarization formed from compounds with π bonds such as diazophenylmethane, tetraphenylboron salt of DBU, tetraphenylboron salt of DBN, and 2-ethyl-4-methylimidazole Cyclic amidinium compounds such as tetraphenyl boron salt and tetraphenyl boron salt of N-methylmorpholine; pyridine, triethylamine, triethylenediamine, benzyldimethylamine, triethanolamine, dimethylamine Tertiary amine compounds such as ethanol, tri(dimethylaminomethyl)phenol; derivatives of said tertiary amine compounds; tetra-n-butylammonium acetate, tetra-n-butylammonium phosphate, tetraethyl acetate Ammonium, tetra-n-hexylammonium benzoate, tetrapropylammonium hydroxide and other ammonium salt compounds; triphenylphosphine, diphenyl(p-toluene)phosphine, tri(alkylphenyl)phosphine, tri(alkoxybenzene) base) phosphine, tri(alkyl·alkoxyphenyl)phosphine, tri(dialkylphenyl)phosphine, tri(trialkylphenyl)phosphine, tri(tetraalkylphenyl)phosphine, tri(dialkylphenyl)phosphine Alkoxyphenyl)phosphine, tri(trialkoxyphenyl)phosphine, tri(tetraalkoxyphenyl)phosphine, trialkylphosphine, dialkylarylphosphine, alkyldiarylphosphine, etc. Class phosphine; Phosphine compounds such as complexes of the third class phosphine and organoboron compounds; 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3-dimethoxy-5-methyl-1,4-benzoquinone, 2, Compounds with intramolecular polarization formed by the addition of quinone compounds such as 3-dimethoxy-1,4-benzoquinone and phenyl-1,4-benzoquinone, and compounds with π bonds such as diazophenylmethane ; in making described tertiary phosphine or described phosphine compound and 4-bromophenol, 3-bromophenol, 2-bromophenol, 4-chlorophenol, 3-chlorophenol, 2-chlorophenol, 4-iodophenol, 3 -Iodophenol, 2-iodophenol, 4-bromo-2-methylphenol, 4-bromo-3-methylphenol, 4-bromo-2,6-dimethylphenol, 4-bromo-3,5- Dimethylphenol, 4-bromo-2,6-di-tert-butylphenol, 4-chloro-1-naphthol, 1-bromo-2-naphthol, 6-bromo-2-naphthol, 4- Bromo-4'-hydroxybiphenyl and other halogenated phenol compounds are reacted with dehydrohalogenated compounds with intramolecular polarization; four-substituted phosphonium such as tetraphenylphosphonium, tetra-p-toluene borate, etc. do not exist with Tetrasubstituted phosphonium and tetrasubstituted borates of boron-bonded phenyl groups; salts of tetraphenylphosphonium and phenolic compounds, etc.

When the sealing resin composition contains a curing accelerator, the amount of the curing accelerator is preferably 0.1 to 30 parts by mass, more preferably 1 to 15 parts by mass, relative to 100 parts by mass of the curable resin component. share.

[Various additives] The resin composition for sealing may contain various additives such as coupling agents, mold release agents, and colorants exemplified below in addition to the above-mentioned components. The resin composition for sealing may optionally contain various additives known in the art in addition to the additives exemplified below.

(coupling agent) In order to improve the adhesiveness between the resin component and the filler, the resin composition for sealing may also contain a coupling agent. Examples of the coupling agent include silane compounds such as epoxy silane, mercapto silane, amino silane, alkyl silane, ureido silane, and vinyl silane, known coupling agents such as titanium compounds, aluminum chelate compounds, and aluminum/zirconium compounds. mixture. Among these, silane compounds are preferred from the viewpoint of handleability. One type of coupling agent may be used alone, or two or more types may be used in combination.

When the sealing resin composition contains a coupling agent, the amount of the coupling agent is preferably 0.05 to 5 parts by mass, more preferably 0.1 to 2.5 parts by mass relative to 100 parts by mass of the filler.

(release agent) From the viewpoint of obtaining good releasability from the mold during molding, the sealing resin composition may contain a mold release agent. The release agent is not particularly limited, and a previously known one can be used. Specifically, carnauba wax, higher fatty acids such as behenic acid and stearic acid, higher fatty acid metal salts, ester waxes such as behenic acid esters, oxidized polyethylene, non-oxidized polyethylene, etc. Polyolefin-based waxes, etc. One type of release agent may be used alone, or two or more types may be used in combination.

When the resin composition for sealing contains a release agent, the amount of the release agent is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 5 parts by mass.

(Colorant) The sealing resin composition may further contain a colorant. Examples of the colorant include known colorants such as carbon black, organic dyes, organic pigments, titanium oxide, red lead, and iron oxide. The content of the colorant can be appropriately selected according to the purpose and the like. A coloring agent may be used individually by 1 type, and may use it in combination of 2 or more types.

When the sealing resin composition contains a colorant, the amount of the colorant is preferably 0.01 to 10 parts by mass, more preferably 0.1 parts by mass, based on 100 parts by mass of the total of the curable resin component and the elastomer component. parts to 5 parts by mass.

<Resin Composition for Sealing (Second Embodiment)> The sealing resin composition of the present embodiment includes a curable resin component, an elastomer component, and a filler, and the content of the elastomer component is 1.0% by mass to 8.0% by mass of the whole (the entire sealing resin composition).

According to studies by the inventors of the present invention, it has been found that the sealing resin composition having the above configuration suppresses the warping of the support after sealing and has excellent strength. The reason why the warping of the support is suppressed is not necessarily clear, but it is speculated that by including a specific amount of the elastomer component, the coefficient of thermal expansion when it is made into a cured product decreases and the difference between the coefficient of thermal expansion and the support becomes smaller. A reduction in the coefficient will result in a reduction in warpage. The cause of the decrease in the modulus of elasticity is considered to be that, for example, the phase-separated elastomer component exists in the form of islands in the resin matrix in which the curable resin component is formed. Furthermore, since the resin composition for sealing contains an elastomer component, the ratio of a curable resin component falls relatively. As a result, it is considered that an increase in the thermal expansion coefficient is suppressed, a low elasticity is achieved, and a sealing resin composition having an excellent effect of suppressing warpage can be obtained.

From the viewpoint of effectively suppressing the warping of the support, the content of the elastomer component is preferably at least 1.5% by mass of the entire sealing resin composition, more preferably at least 1.7% by mass, and still more preferably at least 2.0% by mass. .

From the viewpoint of handleability and strength after sealing, the content of the elastomer component is preferably at most 7.0% by mass, more preferably at most 6.0% by mass, and still more preferably at most 5.0% by mass of the entire sealing resin composition.

Preferred examples of the elastomer component include those described as the elastomer component contained in the sealing resin composition of the first embodiment.

<Resin composition for sealing (third embodiment)> The sealing resin composition of this embodiment includes a curable resin component, a compound having a siloxane bond (siloxane compound) and a filler, and the siloxane compound is contained in the total of the curable resin component and the siloxane compound. The proportion is 20% by mass or more.

According to studies by the inventors of the present invention, it has been found that the warpage of the support after sealing is reduced in the sealing resin composition containing 20% by mass or more of the siloxane compound in the total of the curable resin component and the siloxane compound. inhibition. The reason is not necessarily clear, but it is speculated that by including the siloxane compound, the coefficient of thermal expansion when it is made into a hardened product decreases and the difference between the coefficient of thermal expansion and the support body becomes smaller. In addition, the decrease in the modulus of elasticity leads to a reduction in warpage . The cause of the decrease in the modulus of elasticity is considered to be that, for example, the siloxane compound phase-separated in the resin matrix forming the curable resin component exists in the form of islands. Furthermore, when the resin composition for sealing contains a siloxane compound, the ratio of a curable resin component falls relatively. As a result, it is considered that an increase in the thermal expansion coefficient is suppressed, a low elasticity is achieved, and a sealing resin composition having an excellent effect of suppressing warpage can be obtained.

From the viewpoint of suppressing warping of the support, the ratio of the silicone compound to the total of the curable resin component and the silicone compound is more preferably 30% by mass or more, and more preferably 40% by mass or more.

The upper limit of the ratio of the siloxane compound to the total of the curable resin component and the siloxane compound is not particularly limited. From the viewpoint of operability, it is preferably at most 70% by mass, more preferably at most 60% by mass, and still more preferably at most 50% by mass.

The siloxane compound contained in the sealing resin composition is not particularly limited as long as it is a compound having a siloxane bond (Si—O—Si), and may be only one kind or two or more kinds. In the case where the siloxane compound also corresponds to a curable resin component (for example, the siloxane compound has a functional group that undergoes a hardening reaction such as an epoxy group), the compound is classified as a siloxane compound.

As a preferable example of a siloxane compound, what was described as the siloxane compound contained in the sealing resin composition of 1st Embodiment is mentioned.

<Resin composition for sealing (fourth embodiment)> The sealing resin composition of this embodiment is a sealing resin composition including a curable resin component, a siloxane compound, and a filler, and can be used for wafer-level packaging. The resin composition for sealing according to this embodiment is excellent in the effect of suppressing warping of the support after sealing.

The siloxane compound contained in the sealing resin composition is not particularly limited as long as it is a compound having a siloxane bond (Si—O—Si), and may be only one kind or two or more kinds. In the case where the siloxane compound also corresponds to a curable resin component (for example, the siloxane compound has a functional group that undergoes a hardening reaction such as an epoxy group), the compound is classified as a siloxane compound.

As a preferable example of a siloxane compound, what was described as the siloxane compound contained in the sealing resin composition of 1st Embodiment is mentioned.

Details and preferred aspects of the resin composition for sealing described in each of the first to fourth embodiments are also common to all the embodiments.

(Use of resin composition for sealing) The resin composition for sealing of the above-described embodiments can be used in various mounting techniques. The resin composition for sealing according to this embodiment is excellent in suppressing the warping of the support body, so it can also be preferably used in mounting technology for sealing a large area (for example, performing a sealing step before singulating a package). . Examples of the mounting technique include wafer level packages such as FO-WLP (Fan Out Wafer Level Package) and fan-in wafer level package (Fan In Wafer Level Package, FI-WLP).

As a method of sealing a semiconductor wafer using a resin composition for sealing, compression molding, transfer molding, spray molding, etc. are mentioned, and any of these can be used.

The material of the support when sealing is performed using the sealing resin composition is not particularly limited. Examples thereof include semiconductors such as silicon, glass, and ceramics. The shape of the support is not particularly limited, and may be a disc (wafer) or other shapes. The area of the support is not particularly limited, but the resin composition for sealing according to this embodiment is excellent in the effect of suppressing the warping of the support, so the area may be large. For example, it can also be a wafer with a diameter of 12 inches or more.

The sealing thickness when sealing is performed using the sealing resin composition is not particularly limited, and can be selected according to the size of the semiconductor wafer to be sealed. The resin composition for sealing according to this embodiment is excellent in the effect of suppressing the warping of the support body, so it can be preferably used even when the sealing thickness is large (for example, 200 μm to 1000 μm).

＜Reconfiguration wafer and semiconductor package＞ The relocated wafer according to this embodiment includes a support, a plurality of semiconductor wafers arranged on the support, and a cured product of the sealing resin composition that seals the semiconductor wafers. The semiconductor package according to this embodiment includes a support, a semiconductor wafer disposed on the support, and a cured product of the sealing resin composition that seals the semiconductor wafer. A semiconductor package can be obtained, for example, by singulating the reconfigured wafer.

In the relocated wafer of this embodiment, the warpage of the support is suppressed. Therefore, even if the support has a relatively large area, it can be preferably used for manufacturing semiconductor packages. For example, the support can also be a wafer with a diameter of 12 inches or more.

The thickness of the cured product of the sealing resin composition that seals the semiconductor wafer is not particularly limited, and can be selected according to the size of the semiconductor wafer to be sealed. The resin composition for sealing according to this embodiment is excellent in the effect of suppressing the warping of the support body, so it can be preferably used even when the sealing thickness is large (for example, 200 μm to 1000 μm).

The types of the support and the semiconductor wafer used in the reconfiguration wafer and semiconductor package are not particularly limited, and can be selected from those commonly used by users.

＜Manufacturing method of semiconductor package＞ The method for manufacturing a semiconductor package according to this embodiment includes: a step of arranging a plurality of semiconductor wafers on a support; a step of arranging the sealing resin composition on the support on which the semiconductor wafers are arranged; a step of curing the sealing resin composition on the support to seal the semiconductor wafer; and a step of singulating the support.

In the method for manufacturing a semiconductor package according to the present embodiment, warping of the support after curing the sealing resin composition to seal the semiconductor wafer is suppressed. Therefore, there is little occurrence of misalignment or the like in the step after sealing, and the product yield is high.

The method of disposing the sealing resin composition on the support on which the semiconductor wafer is disposed is not particularly limited. For example, when the resin composition for sealing is a powder form, you may carry out by dispersing|distributing the resin composition for sealing on a support body.

The method of curing the sealing resin composition disposed on the support to seal the semiconductor wafer is not particularly limited. For example, it is preferably performed by compression molding. Compression molding can be performed, for example, using a compression molding machine under conditions of predetermined pressure (eg, 2 MPa to 10 MPa), temperature (eg, 120° C. to 150° C.), and time (200 seconds to 600 seconds). [Example]

Hereinafter, although the said embodiment is demonstrated concretely using an Example, the range of the said embodiment is not limited to these Examples.

<Example 1> (Preparation of resin composition for sealing) The components shown in Table 1 were mixed in the amounts (parts by mass) shown in Table 1 to prepare a sealing resin composition. The preparation may preferably use a kneader, planetary mixer, three-roll mill, twin-screw extruder, or the like. In the present invention, after mixing the materials, they are kneaded by a twin-screw extruder whose internal temperature is adjusted to 70° C. to 100° C., and then pulverized after cooling to obtain a resin composition for sealing. The details of each component are as follows.

Epoxy resin 1...Extended biphenyl aralkyl type epoxy resin, brand name "NC-3000", Nippon Kayaku Co., Ltd. Epoxy Resin 2···Multifunctional epoxy resin, brand name "EPPN-501HY", Nippon Kayaku Co., Ltd.

Hardener 1...Extended biphenyl aralkyl type phenolic resin, trade name "MEHC-7851SS", Meiwa Chemical Co., Ltd. Hardener 2... Multifunctional phenolic resin, trade name "HE910-10", Airwater Co., Ltd. Hardener 3...Phenol Novolak Resin, brand name "HP850N", Hitachi Chemical Co., Ltd. Hardening Accelerator 1...Reaction product of tetrabutylphosphonium salt and cyclohexane-di-carboxylic acid

Elastomer component 1 (silicone compound)... Dimethicone modified with caprolactone at both ends, trade name "DBL-C32", Gelest Elastomer component 1 is the following compound: Formula In (3), R ¹ is methyl, R ² is methyl, R ³ is pentylene, R ⁴ is not disclosed, n is 63-78, m ₁ and m ₂ are 7-10, respectively. Elastomer component 2 (silicone compound)...Dimethicone modified with epoxy groups on the side chain, trade name "KF-1001", Shin-Etsu Chemical Co., Ltd. elastomer component 3·・Indene-styrene-coumarone copolymer, trade name "NH-100S", Nikto Chemical Co., Ltd.

Coupling agent 1...N-phenyl-3-aminopropyltrimethoxysilane, trade name "KBM-573", Shin-Etsu Chemical Co., Ltd. Coupling agent 2···3-Glycidoxypropyltrimethoxysilane, trade name "KBM-403", Shin-Etsu Chemical Co., Ltd. Coupling agent 3···3-Methacryloxypropyltrimethoxysilane, trade name "KBM-503", Shin-Etsu Chemical Co., Ltd. Coupling agent 4...Diphenyldimethoxysilane, trade name "KBM-202SS", Shin-Etsu Chemical Co., Ltd.

Colorant 1...Carbon black, trade name "MA600", Mitsubishi Chemical Corporation Release agent 1 Hoechst wax, trade name "HW-E", Clariant Chemicals Co., Ltd. Filler 1... Spherical fused silica with an average particle size of 11 μm, trade name "ST7010-2", Micron Co., Ltd. Filler 2...Spherical fused silica with an average particle size of 0.6 μm, trade name "SO-25R", Admatechs Co., Ltd.

(production of hardened objects) Using the prepared resin composition for sealing, a cured product was produced in the following manner. Forming uses a mold including an upper mold, a middle mold, and a lower mold. As the middle mold, use a mold cut to a size of 10 mm x 60 mm x 5 mm or 3 mm x 3 mm x 15 mm, and arrange an amount suitable for the volume of the cutout part of the middle mold placed on the lower mold The resin composition for sealing was clamped by the upper die, and molded in a vacuum at 130°C for 10 minutes and under the conditions of 5 MPa using a manual hydraulic vacuum heating press. The obtained molded product was cured at 175° C. for 6 hours to obtain a cured product.

(Evaluation of thermal expansion coefficient) The coefficient of thermal expansion of the cured product having a size of 3 mm×3 mm×10 mm was measured using “TMA2940” from TA Instruments. The measurement was performed at a temperature increase rate of 5°C/min at 0°C to 260°C. Let the coefficient of thermal expansion (ppm/°C) between 10°C and 30°C be CTE1, and let the coefficient of thermal expansion (ppm/°C) between 200°C and 220°C be CTE2. The results are shown in Table 1.

(evaluation of elastic coefficient) The modulus of elasticity of a cured product having a size of 10 mm×50 mm×3 mm was measured using “RSAIII” from TA Instruments. The measurement was performed at a temperature increase rate of 10°C/min at 30°C to 300°C. The elastic coefficients (GPa) measured at 40° C. and 260° C. are shown in Table 1 as the 40° C. elastic modulus and the 260° C. elastic modulus.

(Evaluation of warpage amount) Form a layer of a sealing resin composition with a thickness of 250 μm or 500 μm on a silicon wafer with a thickness of 750 μm and a diameter of 300 mm, and heat and harden at 130° C. for 10 minutes to prepare a sample. The prepared cured product was cured at 175° C. for 6 hours to obtain a sealing material sample with a silicon wafer. The amount of warping (μm) of the sample at 30° C. was evaluated using a 3D heating surface profile measurement device “AXP” manufactured by Akrometrix. Table 1 shows the maximum value of the amount of warping.

[Table 1] project Example 1-1 Example 1-2 Example 1-3 Example 1-4 Example 1-5 Examples 1-6 Example 1-7 Comparative example 1-1 Comparative example 1-2 Comparative example 1-3 epoxy resin 1 100 100 100 100 2 100 100 100 100 100 100 hardener 1 73 72 73 72 2 64 64 63 64 62 62 3 hardening accelerator 1 3 3 3 3 3 3 3 3 3 3 Elastomer component 1 44 115 258 30 60 87 264 2 100 100 100 100 3 20 20 25 40 20 40 Coupler 1 15 20 31 11 2 3 3 4 6 2 2 3 7 7 9 14 4 4 4 6 6 8 12 3 3 Colorant 1 3 4 7 6 6 6 10 3 4 Release agent 1 2 2 2 2 2 2 2 2 2 2 filler 1 1,224 1,632 2,445 2,216 2,406 2,642 3,964 975 1,273 1,406 2 136 182 270 246 268 295 440 108 142 156 Silicone/(curable resin component + silicone) (mass%) 20 40 60 44 49 53 69 0 0 0 Filling material ratio (volume%) 75 75 75 79 79 79 79 75 79 79 Filling material ratio (mass%) 85 85 85 88 88 88 88 85 88 88 Coefficient of thermal expansion (ppm/℃) CTE1 9.6 17.0 32.4 12.4 5.7 5.8 5.8 10.0 8.2 8.0 CTE2 43.0 47.0 26.0 27.0 26.0 27.0 27.0 34.0 34.0 32.0 Elastic coefficient at 40°C (GPa) - 12.9 8.2 1.9 12.9 11.7 10.5 7.9 15.3 18.6 17.5 Elastic coefficient at 260°C (GPa) - 0.3 0.2 0.0 1.0 0.9 0.7 0.6 0.6 2.8 1.9 Warpage amount (seal thickness 250 μm, after hardening) 1000 930 470 - - - - 3900 - - Warpage amount (seal thickness 500 μm, after hardening) - - - 850 830 600 390 - 8500 8400

As shown in Table 1, the amount of warping of the substrate was suppressed in the samples formed using the sealing resin composition of the example compared with the sample formed using the sealing resin composition of the comparative example, and the sealing of the example The resin composition contains a curable resin component, an elastomer component, and a filler, and the elastic coefficient at 260°C when it is made into a hardened product is 1.0 GPa or less, or contains a silicone compound as an elastomer component, and the silicone compound is in When the proportion of the curable resin component and the siloxane compound in the total is 20% by mass or more, and the sealing resin composition of the comparative example does not contain an elastomer component, or contains an elastomer component but is made into a cured product The modulus of elasticity at 260°C exceeds 1.0 GPa.

<Example 2> The components shown in Table 2 were mixed in the amounts (g) shown in Table 2, and a sealing resin composition was prepared in the same manner as in Example 1. The details of the components used in the preparation of the sealing resin composition are as follows.

Epoxy Resin 1···Multifunctional epoxy resin, brand name "EPPN-501HY", Nippon Kayaku Co., Ltd. Hardener 1... Multifunctional phenolic resin, trade name "HE910-10", Airwater Co., Ltd. Hardening Accelerator 1···2-Phenyl-4-methyl-5-hydroxymethylimidazole, Shikoku Chemical Industry Co., Ltd.

Elastomer Component 1... Dimethicone modified with caprolactone at both ends, trade name "DBL-C32", Gelest Elastomer Component 1 is the following compound: In formula (3), R ¹ is methyl, R ² is methyl, R ³ is pentylene, R ⁴ is not disclosed, n is 63-78, m ₁ and m ₂ are 7-10, respectively. Elastomer component 2···Dimethicone modified by epoxy group and polyether group to modify the side chain, trade name "Y-19268", Momentive Performance Materials Co., Ltd. Elastomer component 3...Indene-styrene-coumarone copolymer, trade name "NH-100S", Nikto Chemical Co., Ltd.

Coupling agent 1···3-glycidyloxypropyltrimethoxysilane, trade name "KBM-403", Shin-Etsu Chemical Co., Ltd. Coupling agent 2···3-Methacryloxypropyltrimethoxysilane, trade name "KBM-503", Shin-Etsu Chemical Co., Ltd. Coupling agent 3...Diphenyldimethoxysilane, trade name "KBM-202SS", Shin-Etsu Chemical Co., Ltd.

Colorant 1...Carbon black, trade name "MA600", Mitsubishi Chemical Corporation Release agent 1 Hoechst wax, trade name "HW-E", Clariant Chemicals Co., Ltd. Filler 1... Spherical fused silica with an average particle size of 11 μm, trade name "ST7010-2", Micron Co., Ltd. Filler 2...Spherical fused silica with an average particle size of 0.6 μm, trade name "SO-25R", Admatechs Co., Ltd.

Regarding the prepared resin composition for sealing, the modulus of elasticity, the coefficient of thermal expansion, and the amount of warping were evaluated in the same manner as in Example 1. Furthermore, by visually observing the sealing surfaces of the sealing material samples with silicon wafers produced in the same manner as in Example 1, those with streaks or unevenness and those with surface whitening were regarded as defective, and those without unevenness were regarded as defective. Those with a uniform surface were rated as good. The results are shown in Table 2.

[Table 2] project unit Example 2-1 Example 2-2 Example 2-3 Comparative example 2-1 Comparative example 2-2 Comparative example 2-3 epoxy resin 1 g 100 100 100 100 100 100 Hardener 1 g 62 62 62 62 62 62 hardening accelerator 1 g 1.3 1.3 1.3 1.3 1.3 1.3 Elastomer Component 1 g 17.5 35 70 - - - Elastomer Component 2 g 7.5 15 30 - - 15 Elastomer Component 3 g 40 40 40 - 15 - Coupler 1 g 3.9 4.3 5.2 2.8 3.4 3.4 Coupler 2 g 8.9 10.1 12 6.4 7.9 7.9 Coupler 3 g 7.6 8.6 10.3 5.5 6.8 6.8 Release agent 1 g 4 4 4 4 4 4 Colorant 1 g 4.2 4.6 5.6 3.2 3.7 3.7 filler 1 g 1661 1839 2198 1197 1481 1481 Filler 2 g 184 204 244 133 165 165 Filling ratio volume% 79 79 79 79 79 79 Elastomer content quality% 3.1 3.9 5.0 0 0.6 0.6 Elastic coefficient at 40°C GPa 13 12 9 twenty four twenty two 19 Coefficient of thermal expansion CTE1 ppm/°C 9 7 5 8 8 8 Coefficient of thermal expansion CTE2 ppm/°C 27 twenty four 20 39 38 34 Warpage μm 1100 800 600 3800 4000 2800 Appearance - good good good bad good bad

As shown in Table 2, the amount of warpage of the substrates of the samples formed using the sealing resin compositions of Examples was lower than that of the samples formed using the sealing resin compositions of Comparative Examples 2-1 to 2-3. is suppressed, the resin composition for sealing of the above-mentioned example contains an elastomer component, and its content rate is 1.0% by mass to 8.0% by mass of the entire resin composition for sealing, and the comparative example 2-1 to comparative example 2- The sealing resin composition of 3 does not contain an elastomer component, or the content of the elastomer component is less than 1.0% by mass.

The disclosures of Japanese Patent Application Nos. 2017-127852, 2017-127855, and 2017-127856 are hereby incorporated by reference in their entirety. All documents, patent applications, and technical specifications described in this specification are cited and incorporated into this specification to the same extent as if each document, patent application, and technical specification were specifically and individually stated to be incorporated by reference. middle.

Claims (12)

A resin composition for sealing, which comprises a curable resin component, a compound having a siloxane bond, and a filler, wherein the modulus of elasticity at 260° C. is 1.0 GPa or less when made into a hardened product, and the compound having a siloxane bond The compound has a structure including 5 to 150 structural units represented by the following formula (1), and two structures respectively including 3 to 300 structural units represented by the following formula (2),

In formula (1), R ¹ and R ² are each independently a methyl group, and in formula (2), R ³ is a pentylene group. A resin composition for sealing, which includes a curable resin component, a compound having a siloxane bond, and a filler, and the compound having a siloxane bond is a combination of the curable resin component and the compound having a siloxane bond The proportion of the total of the compounds is 20% by mass or more, and the compound having a siloxane bond has a structure including 5 to 150 structural units represented by the following formula (1), and two of them each include 3 to 150 structural units. The structure of 300 structural units represented by the following formula (2),

In formula (1), R ¹ and R ² are each independently a methyl group, and in formula (2), R ³ is a pentylene group. The resin composition for sealing according to claim 1 or 2, which can be used for wafer-level packaging. A resin composition for sealing, which includes a curable resin component, a compound with a siloxane bond, and a filler, and can be used for wafer-level packaging. The compound with a siloxane bond has 5 to 150 compounds of the following formula The structure of the structural unit represented by (1), and two structures respectively including 3 to 300 structural units represented by the following formula (2),

In formula (1), R ¹ and R ² are each independently a methyl group, and in formula (2), R ³ is a pentylene group. The sealing resin composition according to claim 1, 2 or 4, wherein the curable resin component includes an epoxy resin and a hardener. The resin composition for sealing according to claim 5, wherein the hardener includes a phenolic hardener. The resin composition for sealing according to claim 1, 2 or 4, which can be used for fan-out wafer level packaging. The sealing resin composition according to claim 1, 2 or 4, which can be used for sealing by compression molding. The resin composition for sealing according to claim 1, 2 or 4, which is in powder form. A reconfigured wafer having: support body; a plurality of semiconductor wafers disposed on the support; and A cured product of the sealing resin composition according to any one of claims 1 to 9 obtained by sealing the semiconductor wafer. A semiconductor package having: support body; a semiconductor wafer disposed on the support; and A cured product of the sealing resin composition according to any one of claims 1 to 9 obtained by sealing the semiconductor wafer. A method of manufacturing a semiconductor package, comprising: a step of disposing a plurality of semiconductor wafers on a support; a step of disposing the sealing resin composition according to any one of claims 1 to 9 on the support on which the semiconductor wafer is disposed; a step of curing the sealing resin composition disposed on the support to seal the semiconductor wafer; and A step of singulating the semiconductor wafer.