TW202308843A - Multilayer optical film - Google Patents

Multilayer optical film Download PDF

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TW202308843A
TW202308843A TW111116385A TW111116385A TW202308843A TW 202308843 A TW202308843 A TW 202308843A TW 111116385 A TW111116385 A TW 111116385A TW 111116385 A TW111116385 A TW 111116385A TW 202308843 A TW202308843 A TW 202308843A
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optical film
meth
adhesive layer
film
acrylate
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笹川泰介
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/022Mechanical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/42Polarizing, birefringent, filtering

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)

Abstract

A multilayer optical film (X) according to the present invention is sequentially provided with an optical film (10), an adhesive layer (20) and an optical film (30) in the thickness direction (H). The adhesive layer (20) is bonded to the optical film (10), while also being bonded to the optical film (30). The optical film (30) has a boundary region (31) on the adhesive layer (20) side, the boundary region (31) containing an adhesive material component that is derived from the adhesive layer (20). The ratio of the thickness T2 of an adhesive material component-containing part (40), which consists of the adhesive layer (20) and the boundary region (31), to the thickness T1 of the adhesive layer (20) is 1.01 or more.

Description

積層光學薄膜Laminated Optical Film

本發明涉及一種積層光學薄膜。The invention relates to a laminated optical film.

顯示面板具有例如包含像素面板、觸控面板、表面保護覆蓋件等之積層結構。顯示面板之積層結構中還包含具有預定光學機能之各種機能性光學薄膜。機能性光學薄膜可舉例如偏光件薄膜及相位差薄膜。機能性光學薄膜例如係在透過接著劑而與保護薄膜等其他光學薄膜接合之狀態下、亦即在積層光學薄膜之形態下組入積層結構中。關於所述積層光學薄膜,例如記載於下述專利文獻1中。 先前技術文獻 專利文獻 The display panel has, for example, a laminated structure including a pixel panel, a touch panel, a surface protection cover, and the like. The laminated structure of the display panel also includes various functional optical films with predetermined optical functions. Examples of functional optical films include polarizer films and retardation films. A functional optical film is, for example, incorporated into a laminated structure in a state where it is bonded to another optical film such as a protective film through an adhesive, that is, in the form of a laminated optical film. Such a laminated optical film is described, for example, in Patent Document 1 below. prior art literature patent documents

專利文獻1:日本專利特開2019-147865號公報Patent Document 1: Japanese Patent Laid-Open No. 2019-147865

發明欲解決之課題 隨著顯示面板之薄型化,機能性光學薄膜之薄膜化不斷進展。對於積層光學薄膜中之光學薄膜間的接著劑層亦要求薄型。但光學薄膜間之接著劑層愈薄,光學薄膜間之接合力便愈容易降低。由光學薄膜間之接合可靠性之觀點來看,該接合力低並不理想。以可反覆彎折(折疊式)之顯示面板用之積層光學薄膜來說,係強烈要求確保光學薄膜間之接合力。以在汽車車內等高溫高濕環境下使用之折疊式顯示面板用之積層光學薄膜來說,因高溫高濕會於光學薄膜產生過度的應力,導致應力集中於接著界面,故容易發生光學薄膜間之剝落,因此特別要求利用接著劑層確保光學薄膜間之接合力。 The problem to be solved by the invention With the thinning of display panels, the thinning of functional optical films continues to progress. The adhesive layer between the optical films in the laminated optical film is also required to be thin. However, the thinner the adhesive layer between the optical films, the easier it is to reduce the bonding force between the optical films. From the viewpoint of bonding reliability between optical films, the low bonding force is not preferable. For laminated optical films for display panels that can be repeatedly bent (folded), it is strongly required to ensure the bonding force between optical films. For laminated optical films used in foldable display panels used in high-temperature and high-humidity environments such as automobiles, excessive stress will be generated on the optical film due to high temperature and high humidity, resulting in stress concentration on the bonding interface, so optical film is prone to occur. Therefore, it is especially required to use the adhesive layer to ensure the bonding force between the optical films.

本發明提供一種積層光學薄膜,其在光學薄膜間即便利用薄的接著劑層仍適於確保接合力。The present invention provides a laminated optical film which is suitable for securing bonding force between optical films even with a thin adhesive layer.

用以解決課題之手段 本發明[1]包含一種積層光學薄膜,係於厚度方向上依序具備第1光學薄膜、接著劑層及第2光學薄膜者;前述接著劑層係與前述第1光學薄膜接合,且與前述第2光學薄膜接合;前述第2光學薄膜於前述接著劑層側具有邊界區域,該邊界區域含有源自前述接著劑層之接著劑原料成分;並且接著劑原料成分含有部之厚度T2相對於前述接著劑層之厚度T1的比率為1.01以上,該接著劑原料成分含有部係前述接著劑層與前述邊界區域合併而成之部分。 means to solve problems The present invention [1] includes a laminated optical film comprising a first optical film, an adhesive layer, and a second optical film sequentially in the thickness direction; the adhesive layer is joined to the first optical film, and is bonded to the aforementioned Bonding of the second optical film; the second optical film has a border area on the side of the adhesive layer, and the border area contains the adhesive raw material component derived from the adhesive layer; and the thickness T2 of the adhesive raw material component containing part is relative to the aforementioned The thickness T1 ratio of the adhesive layer is 1.01 or more, and the adhesive raw material component containing portion is a portion formed by combining the adhesive layer and the boundary region.

本發明[2]包含如上述[1]之積層光學薄膜,其中前述厚度T1為5µm以下。The present invention [2] includes the laminated optical film according to the above [1], wherein the aforementioned thickness T1 is 5 µm or less.

本發明[3]包含如上述[1]或[2]之積層光學薄膜,其中前述第2光學薄膜在25℃下對前述第1光學薄膜之90°剝離強度為0.8N/15mm以上。The present invention [3] includes the laminated optical film according to the above [1] or [2], wherein the 90° peel strength of the second optical film against the first optical film at 25°C is 0.8 N/15mm or more.

本發明[4]包含如上述[1]~[3]中任一項之積層光學薄膜,其中前述第1光學薄膜為偏光件薄膜。The present invention [4] includes the laminated optical film according to any one of the above-mentioned [1] to [3], wherein the first optical film is a polarizer film.

發明效果 本發明積層光學薄膜中,如上述,第2光學薄膜於接合第1及第2光學薄膜間之接著劑層側具有邊界區域,該邊界區域含有源自接著劑層之接著劑原料成分。亦即,第2光學薄膜於接著劑層側具有滲透有來自接著劑層之接著劑原料成分之區域(前述邊界區域)。邊界區域中,混合存在有第2光學薄膜之構成成分與接著劑原料成分。而且,本積層光學薄膜中,如上述,接著劑原料成分含有部之厚度T2相對於接著劑層之厚度T1的比率為1.01以上。亦即,本積層光學薄膜中,含有接著劑原料成分且參與接著機能之部分(接著劑層與邊界區域)之厚度T2大於接著劑層厚度T1。關於第2光學薄膜與接著劑層之邊界及其附近之該等構成,能在第2光學薄膜與接著劑層之間實現強大的相互作用而適於確保高接合力。而且,確保第2光學薄膜與接著劑層之間的接合力有助於利用接著劑層確保第1及第2光學薄膜間之接合力。因此,本積層光學薄膜在光學薄膜間即便利用薄的接著劑層仍適於確保接合力。確保光學薄膜間之接合力適於抑制該光學薄膜間之剝落。且,所述本積層光學薄膜即便在高溫高濕環境下,在光學薄膜間利用薄的接著劑層仍能確保接合力,而適於抑制光學薄膜間之剝落。 Invention effect In the laminated optical film of the present invention, as described above, the second optical film has a boundary region on the side of the adhesive layer joining the first and second optical films, and the boundary region contains adhesive raw material components derived from the adhesive layer. That is, the second optical film has a region (the aforementioned boundary region) in which the adhesive raw material component from the adhesive layer permeates on the adhesive layer side. In the boundary region, the constituent components of the second optical film and the adhesive raw material components are mixed. Furthermore, in this laminated optical film, as described above, the ratio of the thickness T2 of the adhesive material component containing portion to the thickness T1 of the adhesive layer is 1.01 or more. That is to say, in this laminated optical film, the thickness T2 of the portion (adhesive layer and boundary region) that contains the raw material components of the adhesive and participates in the adhesive function is greater than the thickness T1 of the adhesive layer. Such configurations of the boundary between the second optical film and the adhesive layer and the vicinity thereof are suitable for achieving a strong interaction between the second optical film and the adhesive layer and ensuring high bonding force. Furthermore, securing the bonding force between the second optical film and the adhesive layer contributes to securing the bonding force between the first and second optical films by the adhesive layer. Therefore, this laminated optical film is suitable for ensuring bonding force between optical films even if a thin adhesive layer is used. Ensuring that the bonding force between the optical films is suitable for suppressing peeling of the optical films. In addition, the above-mentioned laminated optical film is suitable for suppressing peeling of the optical films because the thin adhesive layer between the optical films can secure bonding force even under high-temperature and high-humidity environments.

作為本發明積層光學薄膜之一實施形態的積層光學薄膜X,如圖1所示,於厚度方向H上依序具備光學薄膜10(第1光學薄膜)、接著劑層20及光學薄膜30(第2光學薄膜)。接著劑層20係接合光學薄膜10、30間。積層光學薄膜X具有預定厚度之薄片形狀,且於與厚度方向H正交之方向(面方向)上擴展。積層光學薄膜X係一組入顯示面板之積層結構中的複合薄膜。The laminated optical film X which is one embodiment of the laminated optical film of the present invention, as shown in FIG. 2 optical films). The adhesive layer 20 is used to bond between the optical films 10 and 30 . The laminated optical film X has a sheet shape with a predetermined thickness, and expands in a direction (surface direction) perpendicular to the thickness direction H. Laminated optical film X is a composite film incorporated into the laminated structure of the display panel.

光學薄膜10在本實施形態中為機能性光學薄膜。機能性光學薄膜可舉例如偏光件薄膜及相位差薄膜。The optical film 10 is a functional optical film in this embodiment. Examples of functional optical films include polarizer films and retardation films.

偏光件薄膜可舉例如經過利用二色性物質進行染色處理與其後之延伸處理的親水性高分子薄膜。二色性物質可舉例如碘及二色性染料。親水性高分子薄膜可舉例如聚乙烯醇(PVA)薄膜、部分縮甲醛化PVA薄膜及乙烯-乙酸乙烯酯共聚物之部分皂化薄膜。偏光件薄膜還可舉多烯定向薄膜。多烯定向薄膜之材料可舉例如PVA之脫水處理物及聚氯乙烯之脫鹽酸處理物。由偏光特性等光學特性優異來看,偏光件薄膜宜為經過利用碘進行染色處理與其後之單軸延伸處理的PVA薄膜。The polarizer film can be, for example, a hydrophilic polymer film that has been dyed with a dichroic substance and then stretched. Examples of dichroic substances include iodine and dichroic dyes. Examples of the hydrophilic polymer film include polyvinyl alcohol (PVA) film, partially formalized PVA film, and partially saponified film of ethylene-vinyl acetate copolymer. The polarizer film may also be a polyene oriented film. The material of the polyene oriented film can be, for example, dehydrated PVA and dehydrochloridized polyvinyl chloride. In view of excellent optical properties such as polarizing properties, the polarizer film is preferably a PVA film that has been dyed with iodine and then uniaxially stretched.

由薄型化之觀點來看,作為偏光件薄膜之光學薄膜10之厚度宜為15µm以下,較宜為12µm以下,更宜為10µm以下,尤宜為8µm以下。薄型偏光件薄膜因厚度參差少,故視辨性優異,且溫度變化所致之尺寸變化小,故對熱衝擊之耐久性優異。由強度之觀點來看,作為偏光件薄膜之光學薄膜10之厚度宜為3µm以上,較宜為5µm以上。From the viewpoint of thinning, the thickness of the optical film 10 as a polarizer film is preferably not more than 15 µm, more preferably not more than 12 µm, more preferably not more than 10 µm, and especially preferably not more than 8 µm. Thin polarizer film has excellent visibility due to less variation in thickness, and has excellent durability against thermal shock due to small dimensional changes due to temperature changes. From the viewpoint of strength, the thickness of the optical film 10 as a polarizer film is preferably 3 µm or more, more preferably 5 µm or more.

作為相位差薄膜,可舉例如λ/2波長薄膜及λ/4波長薄膜、以及視角補償薄膜。相位差薄膜之材料可舉例如藉由延伸處理而雙折射化之高分子薄膜。高分子薄膜之可舉例如纖維素薄膜及聚酯薄膜。纖維素薄膜可舉例如三醋酸纖維素薄膜。聚酯薄膜可舉例如聚對苯二甲酸乙二酯薄膜及聚萘二甲酸乙二酯薄膜。作為相位差薄膜之光學薄膜10之厚度例如為20µm以上,且例如為150µm以下。又,相位差薄膜亦可適宜使用具備纖維素薄膜等之基材與該基材上之液晶性聚合物等液晶化合物之定向層的薄膜。As a retardation film, a λ/2 wavelength film, a λ/4 wavelength film, and a viewing angle compensation film are mentioned, for example. The material of the retardation film can be, for example, a polymer film that is birefringent by stretching. Examples of polymer films include cellulose films and polyester films. The cellulose film may, for example, be a cellulose triacetate film. Examples of polyester films include polyethylene terephthalate films and polyethylene naphthalate films. The thickness of the optical film 10 as a retardation film is, for example, 20 µm or more and, for example, 150 µm or less. In addition, as the retardation film, a film including a substrate such as a cellulose film and an alignment layer of a liquid crystal compound such as a liquid crystal polymer on the substrate can also be suitably used.

接著劑層20係接著劑組成物之硬化物。接著劑層20係對光學薄膜10直接接合,且對光學薄膜30直接接合。接著劑組成物含有硬化性樹脂。接著劑組成物之成分具體上如後所述。The adhesive layer 20 is a cured product of the adhesive composition. The adhesive layer 20 is directly bonded to the optical film 10 and directly bonded to the optical film 30 . The adhesive composition contains a curable resin. The components of the adhesive composition are specifically described below.

由光學薄膜10、30間之接合力之觀點來看,接著劑層20之厚度T1宜為0.1µm以上,較宜為0.4µm以上,更宜為0.7µm以上,尤宜為0.8µm以上。由積層光學薄膜X之薄型化之觀點來看,接著劑層20之厚度T1宜為5µm以下,較宜為3µm以下,更宜為1.5µm以下,尤宜為1µm以下。接著劑層20之厚度T1係具有接著劑組成物之硬化後組織(由硬化後之構成成分形成)之區域的厚度方向H的長度。該長度可在藉由SEM觀察等之觀察而得之影像中測定。接著劑層20之厚度T1具體上可藉由於後針對實施例所述之方法來測定。From the viewpoint of bonding force between the optical films 10 and 30, the thickness T1 of the adhesive layer 20 is preferably not less than 0.1 µm, more preferably not less than 0.4 µm, more preferably not less than 0.7 µm, particularly preferably not less than 0.8 µm. From the viewpoint of thinning the laminated optical film X, the thickness T1 of the adhesive layer 20 is preferably not more than 5 µm, more preferably not more than 3 µm, more preferably not more than 1.5 µm, and most preferably not more than 1 µm. The thickness T1 of the adhesive layer 20 is the length in the thickness direction H of the region having the hardened structure of the adhesive composition (formed by hardened components). This length can be measured in an image obtained by observation such as SEM observation. The thickness T1 of the adhesive layer 20 can be specifically measured by the method described later in the embodiments.

接著劑層20利用奈米壓痕法測定之25℃下之第1壓痕彈性模數宜為0.01GPa以上,較宜為0.03GPa以上,更宜為0.05GPa以上,尤宜為0.07GPa以上(第1壓痕彈性模數係設為在第1測定條件下之壓痕彈性模數;第1測定條件如於後針對實施例所述,在第1測定條件中,在荷重施加過程中壓頭對測定試料之最大壓痕深度為200nm)。所述構成由確保光學薄膜10、30間之接合力之觀點看來為佳。又,第1壓痕彈性模數宜為5GPa以下,較宜為3GPa以下,更宜為1GPa以下。所述構成適宜確保接著劑層20之撓曲性,因此適宜確保積層光學薄膜X之撓曲性。調整接著劑層20之壓痕彈性模數的方法,可舉例如調整接著劑組成物之組成。具體上,接著劑層20之壓痕彈性模數調整方法有效的是調整形成接著劑層20之接著劑組成物中之後述聚合性化合物之官能基數、即調整聚合性化合物之丙烯醯基當量或環氧當量。The first indentation elastic modulus of the adhesive layer 20 measured by the nanoindentation method at 25°C is preferably not less than 0.01GPa, more preferably not less than 0.03GPa, more preferably not less than 0.05GPa, especially preferably not less than 0.07GPa ( The first indentation elastic modulus is set as the indentation elastic modulus under the first measurement condition; the first measurement condition is as described later for the examples, in the first measurement condition, the indenter is The maximum indentation depth of the test sample is 200nm). Such a configuration is preferable from the viewpoint of ensuring bonding force between the optical films 10 and 30 . Also, the first indentation elastic modulus is preferably 5 GPa or less, more preferably 3 GPa or less, more preferably 1 GPa or less. Such a configuration is suitable for securing the flexibility of the adhesive layer 20, and thus is suitable for securing the flexibility of the laminated optical film X. The method of adjusting the indentation elastic modulus of the adhesive layer 20 may, for example, adjust the composition of the adhesive composition. Specifically, the effective method for adjusting the indentation elastic modulus of the adhesive layer 20 is to adjust the number of functional groups of the polymerizable compound described later in the adhesive composition forming the adhesive layer 20, that is, to adjust the acryl group equivalent of the polymerizable compound or epoxy equivalent.

奈米壓痕法係指以奈米尺度測定試料之各物性的方法。本實施形態中,奈米壓痕法係依據ISO14577實施。奈米壓痕法係實施將壓頭壓入安裝於載台上之試料的過程(荷重施加過程)、與在此之後將壓頭從試料拉出之過程(卸重過程),測定一連串過程中在壓頭-試料間作用之荷重與壓頭對試料之相對位移(荷重-位移測定)。藉此,可獲得荷重-位移曲線。從該荷重-位移曲線,可針對測定試樣基於奈米尺度測定求出各物性。利用奈米壓痕法進行之接著劑層截面的荷重-位移測定,例如可使用奈米壓痕儀(商品名「Triboindenter」,Hysitron公司製)。具體上,如於後針對實施例所述。The nanoindentation method refers to the method of measuring various physical properties of the sample at the nanometer scale. In this embodiment, the nanoindentation method is carried out in accordance with ISO14577. The nanoindentation method is to implement the process of pressing the indenter into the sample installed on the stage (load application process), and then pull the indenter out of the sample (unloading process), and measure a series of processes The load acting between the indenter and the sample and the relative displacement of the indenter to the sample (load-displacement measurement). From this, a load-displacement curve can be obtained. From this load-displacement curve, various physical properties of the measurement sample can be determined based on nanoscale measurement. The load-displacement measurement of the cross section of the adhesive layer by the nanoindentation method can use, for example, a nanoindenter (trade name "Triboindenter", manufactured by Hysitron Corporation). Specifically, it is as described in the examples below.

接著劑層20利用奈米壓痕法測定之25℃下之第2壓痕彈性模數宜為0.5GPa以上,較宜為1GPa以上,更宜為1.5GPa以上,尤宜為2GPa以上(第2壓痕彈性模數係設為在第2測定條件下之壓痕彈性模數;第2測定條件如於後針對實施例所述,在第2測定條件中,在荷重施加過程中壓頭對測定試料之最大壓痕深度為50nm)。所述構成由確保光學薄膜10、30間之接合力之觀點看來為佳。又,第2壓痕彈性模數宜為7GPa以下,較宜為5GPa以下,更宜為3GPa以下。所述構成適宜確保接著劑層20之撓曲性,因此適宜確保積層光學薄膜X之撓曲性。The second indentation elastic modulus of the adhesive layer 20 measured by nanoindentation method at 25°C is preferably 0.5 GPa or more, more preferably 1 GPa or more, more preferably 1.5 GPa or more, especially 2 GPa or more (the second The indentation elastic modulus is set as the indentation elastic modulus under the second measurement condition; the second measurement condition is as described later for the examples. In the second measurement condition, the indenter measures the The maximum indentation depth of the sample is 50nm). Such a configuration is preferable from the viewpoint of ensuring bonding force between the optical films 10 and 30 . Also, the second indentation elastic modulus is preferably 7 GPa or less, more preferably 5 GPa or less, more preferably 3 GPa or less. Such a configuration is suitable for securing the flexibility of the adhesive layer 20, and thus is suitable for securing the flexibility of the laminated optical film X.

光學薄膜30在本實施形態中為透明保護薄膜。透明保護薄膜例如為具有可撓性之透明樹脂薄膜。透明保護薄膜之材料可列舉例如聚烯烴、聚酯、聚醯胺、聚醯亞胺、聚氯乙烯、聚二氯亞乙烯、纖維素、改質纖維素、聚苯乙烯及聚碳酸酯。聚烯烴可舉例如環烯烴聚合物(COP)、聚乙烯、聚丙烯、乙烯・丙烯共聚物、乙烯・乙酸乙烯酯共聚物及乙烯・乙烯醇共聚物。聚酯可舉例如聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯及聚對苯二甲酸丁二酯。聚醯胺可舉例如聚醯胺6、聚醯胺6,6及部分芳香族聚醯胺。改質纖維素可舉例如三醋酸纖維素。該等材料可單獨使用,亦可併用二種以上。由潔淨度之觀點來看,透明保護薄膜之材料宜可使用聚烯烴,較宜可使用COP。The optical film 30 is a transparent protective film in this embodiment. The transparent protective film is, for example, a flexible transparent resin film. The material of the transparent protective film includes, for example, polyolefin, polyester, polyamide, polyimide, polyvinyl chloride, polyvinyl chloride, cellulose, modified cellulose, polystyrene and polycarbonate. Examples of polyolefins include cycloolefin polymers (COP), polyethylene, polypropylene, ethylene-propylene copolymers, ethylene-vinyl acetate copolymers, and ethylene-vinyl alcohol copolymers. Examples of polyester include polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate. The polyamide can be, for example, polyamide 6, polyamide 6,6 and partially aromatic polyamide. Modified cellulose may, for example, be cellulose triacetate. These materials may be used alone or in combination of two or more. From the viewpoint of cleanliness, it is preferable to use polyolefin as the material of the transparent protective film, and it is more preferable to use COP.

由積層光學薄膜X之強度之觀點來看,光學薄膜30之厚度宜為5µm以上,較宜為10µm以上,更宜為20µm以上。由積層光學薄膜X之薄型化之觀點來看,光學薄膜30之厚度宜為100µm以下,較宜為70µm以下,更宜為50µm以下。From the viewpoint of the strength of the laminated optical film X, the thickness of the optical film 30 is preferably at least 5 µm, more preferably at least 10 µm, and more preferably at least 20 µm. From the viewpoint of thinning the laminated optical film X, the thickness of the optical film 30 is preferably 100 µm or less, more preferably 70 µm or less, more preferably 50 µm or less.

光學薄膜30如圖2所示,具有接著劑層20側之邊界區域31及與接著劑層20相反之側的非邊界區域32。邊界區域31含有源自接著劑層20之接著劑原料成分。邊界區域31中,混合存在有光學薄膜30之構成成分與接著劑原料成分。接著劑原料成分之檢測方法例如可舉飛行時間型二次離子質譜法(TOF-SIMS:Time-of-Flight Secondary Ion Mass Spectrometry)。另一方面,非邊界區域32不含源自接著劑層20之接著劑原料成分。非邊界區域32係由光學薄膜30之構成成分構成。光學薄膜30中,檢測出在上述檢測方法中之檢測極限值(正、負2次離子強度0.1counts/秒)以上之接著劑原料成分的區域為邊界區域31,而未檢測出前述檢測極限值以上之接著劑原料成分的區域為非邊界區域32。邊界區域31之厚度相對於非邊界區域32之厚度的比率例如為0.01%以上,宜為0.05%以上,又例如為50%以下,宜為20%以下。As shown in FIG. 2 , the optical film 30 has a border region 31 on the side of the adhesive layer 20 and a non-border region 32 on the side opposite to the adhesive layer 20 . The boundary region 31 contains adhesive raw material components derived from the adhesive layer 20 . In the boundary region 31, the constituent components of the optical film 30 and the adhesive raw material components are mixed. The detection method of the raw material components of the adhesive can be, for example, Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS: Time-of-Flight Secondary Ion Mass Spectrometry). On the other hand, the non-boundary region 32 does not contain adhesive raw material components derived from the adhesive layer 20 . The non-border region 32 is composed of components of the optical film 30 . In the optical film 30, the area where the adhesive raw material components above the detection limit value (positive and negative secondary ion intensity 0.1 counts/second) is detected in the above-mentioned detection method is the boundary area 31, and the above-mentioned detection limit value is not detected The area of the above adhesive raw material components is the non-boundary area 32 . The ratio of the thickness of the boundary region 31 to the thickness of the non-border region 32 is, for example, 0.01% or more, preferably 0.05% or more, and for example, 50% or less, preferably 20% or less.

邊界區域31之厚度例如為0.01µm以上,宜為0.05µm以上。邊界區域31之厚度例如為10µm以下,宜為5µm以下。邊界區域31之厚度的調整方法可舉例如調整接著劑組成物之組成。邊界區域31之厚度的調整方法還可舉積層光學薄膜X之製造過程中從後述塗佈步驟至硬化步驟為止之時間的調整。該時間越長,邊界區域31越有較厚之傾向。The thickness of the boundary region 31 is, for example, not less than 0.01 µm, preferably not less than 0.05 µm. The thickness of the boundary region 31 is, for example, 10 µm or less, preferably 5 µm or less. The method of adjusting the thickness of the boundary region 31 may be, for example, adjusting the composition of the adhesive composition. The method of adjusting the thickness of the boundary region 31 also includes adjusting the time from the coating step described later to the hardening step in the production process of the laminated optical film X. The longer this time is, the thicker the boundary region 31 tends to be.

積層光學薄膜X中,邊界區域31與上述接著劑層20係形成接著劑原料成分含有部40。為了防止邊界區域31過少(過薄)時之密著性不足,接著劑原料成分含有部40之厚度T2相對於接著劑層20之厚度T1的比率(T2/T1)為1.01以上,宜為1.05以上,較宜為1.1以上,更宜為1.2以上。由兼顧接著劑層20與光學薄膜30之間的密著性與積層光學薄膜X之生產穩定性之觀點來看,比率(T2/T1)宜為1.3以下,較宜為1.25以下,更宜為1.2以下。接著劑層20與光學薄膜30之間的前述密著性例如可藉由以下方式來確保:確保接著劑層20之厚度後,在彎折積層光學薄膜X時,抑制因接著劑層20與光學薄膜30之界面的負荷而發生之剝落。接著劑原料成分含有部40之厚度T2大於接著劑層20之厚度,且小於接著劑層20與光學薄膜30之合計厚度。接著劑原料成分含有部40之厚度T2因應接著劑層20之厚度及組成、以及光學薄膜30之材料,例如為0.101µm以上,且例如為6.5µm以下。接著劑原料成分含有部40之厚度T2與上述邊界區域31之厚度可藉由於後針對實施例所述之方法來測定。In the laminated optical film X, the boundary region 31 and the above-mentioned adhesive layer 20 form an adhesive raw material component containing portion 40 . In order to prevent insufficient adhesion when the boundary region 31 is too small (too thin), the ratio (T2/T1) of the thickness T2 of the adhesive material component containing portion 40 to the thickness T1 of the adhesive layer 20 is 1.01 or more, preferably 1.05. More preferably, it is more than 1.1, and more preferably it is more than 1.2. From the point of view of both the adhesiveness between the adhesive layer 20 and the optical film 30 and the production stability of the laminated optical film X, the ratio (T2/T1) is preferably 1.3 or less, more preferably 1.25 or less, and more preferably 1.25 or less. Below 1.2. The aforementioned adhesion between the adhesive layer 20 and the optical film 30 can be ensured, for example, by the following method: after ensuring the thickness of the adhesive layer 20, when the laminated optical film X is bent, the The peeling occurs due to the load on the interface of the film 30. The thickness T2 of the adhesive raw material component containing portion 40 is larger than the thickness of the adhesive layer 20 and smaller than the total thickness of the adhesive layer 20 and the optical film 30 . The thickness T2 of the adhesive raw material component containing portion 40 depends on the thickness and composition of the adhesive layer 20 and the material of the optical film 30, and is, for example, not less than 0.101 µm and not more than 6.5 µm. The thickness T2 of the adhesive raw material component containing portion 40 and the thickness of the above-mentioned boundary region 31 can be measured by the method described later for the examples.

積層光學薄膜X如上述,光學薄膜30於該薄膜之接著劑層20側具有邊界區域31。邊界區域31中,混合存在有光學薄膜30之構成成分與接著劑原料成分。而且,在積層光學薄膜X中,接著劑原料成分含部40(接著劑層20、邊界區域31)之厚度T2相對於接著劑層20之厚度T1的比率為1.01以上,宜為1.05以上,較宜為1.1以上,更宜為1.2以上。亦即,積層光學薄膜X中,含有接著劑原料成分且參與接著機能之部分(接著劑層20與邊界區域31)之厚度T2大於接著劑層20之厚度T1。關於光學薄膜30與接著劑層20之邊界及其附近之該等構成,能在光學薄膜30與接著劑層20之間實現強大的相互作用而適於確保高接合力。而且,確保光學薄膜30與接著劑層20之間的接合力有助於利用接著劑層20確保第光學薄膜10、30間之接合力。因此,積層光學薄膜X在光學薄膜10、30間即便利用薄的接著劑層20仍適於確保接合力。確保光學薄膜10、30間之接合力適於抑制光學薄膜10、30間之剝落。且,所述積層光學薄膜X即便在高溫高濕環境下,在光學薄膜間10、30利用薄的接著劑層20仍能確保接合力,而適於抑制光學薄膜10、30間之剝落。具體上,如後述之實施例及比較例中所示。The laminated optical film X is as described above, and the optical film 30 has the boundary region 31 on the adhesive layer 20 side of the film. In the boundary region 31, the constituent components of the optical film 30 and the adhesive raw material components are mixed. Furthermore, in the laminated optical film X, the ratio of the thickness T2 of the adhesive raw material component containing portion 40 (adhesive layer 20, boundary region 31) to the thickness T1 of the adhesive layer 20 is 1.01 or more, preferably 1.05 or more, which is relatively low. It is preferably 1.1 or more, more preferably 1.2 or more. That is, in the laminated optical film X, the thickness T2 of the portion (the adhesive layer 20 and the boundary region 31 ) that contains the adhesive raw material components and participates in the adhesive function is greater than the thickness T1 of the adhesive layer 20 . The configurations of the boundary between the optical film 30 and the adhesive layer 20 and the vicinity thereof are suitable for achieving a strong interaction between the optical film 30 and the adhesive layer 20 and ensuring high bonding force. Furthermore, ensuring the bonding force between the optical film 30 and the adhesive layer 20 helps to ensure the bonding force between the first optical films 10 and 30 by using the adhesive layer 20 . Therefore, the laminated optical film X is suitable for securing bonding force between the optical films 10 and 30 even with a thin adhesive layer 20 . The bonding force between the optical films 10 and 30 is ensured to be suitable for suppressing peeling of the optical films 10 and 30 . Furthermore, the laminated optical film X is suitable for suppressing peeling of the optical films 10 and 30 because the thin adhesive layer 20 between the optical films 10 and 30 can secure bonding force even under high temperature and high humidity environment. Specifically, it is as shown in the Examples and Comparative Examples described later.

積層光學薄膜X中,光學薄膜30在25℃下對光學薄膜10之90°剝離強度宜為0.8N/15mm以上,較宜為1N/15mm以上,更宜為1.2N/15mm以上,尤宜為1.5N/15mm以上。所述構成適宜實現光學薄膜10、30間之良好的接合力,尤其適宜確保折疊式顯示面板用之光學薄膜10、30之間的接合力。90°剝離強度例如為10N/15mm以下。90°剝離強度可藉由於後針對實施例所述之方法來測定。又,該90°剝離強度之調整方法可舉例如調整上述比率(T2/T1)、調整接著劑組成物之組成。In the laminated optical film X, the 90° peel strength of the optical film 30 against the optical film 10 at 25°C is preferably 0.8N/15mm or more, more preferably 1N/15mm or more, more preferably 1.2N/15mm or more, and especially preferably Above 1.5N/15mm. The above configuration is suitable for achieving good bonding force between the optical films 10 and 30 , and is particularly suitable for securing the bonding force between the optical films 10 and 30 for foldable display panels. The 90° peel strength is, for example, 10 N/15 mm or less. The 90° peel strength can be measured by the method described later in the examples. In addition, the method of adjusting the 90° peel strength may, for example, adjust the ratio (T2/T1) and adjust the composition of the adhesive composition.

上述90°剝離強度(N/15mm)相對於第1壓痕彈性模數(GPa)之比率宜為5以上,較宜為10以上,更宜為15以上,且宜為30以下,較宜為25以下。所述構成有利於下述方面:將積層光學薄膜X(尤其是薄的積層光學薄膜X)反覆彎折時,可抑制光學薄膜10、30間之剝離。The ratio of the aforementioned 90° peel strength (N/15mm) to the first indentation elastic modulus (GPa) is preferably 5 or more, more preferably 10 or more, more preferably 15 or more, and preferably 30 or less, more preferably 25 or less. Such a configuration is advantageous in that peeling between the optical films 10 and 30 can be suppressed when the laminated optical film X (in particular, a thin laminated optical film X) is repeatedly bent.

上述90°剝離強度(N/15mm)相對於第2壓痕彈性模數(GPa)之比率宜為0.2以上,較宜為0.3以上,更宜為0.4以上,且宜為5以下,較宜為3以下,更宜為2以下。所述構成有利於下述方面:將積層光學薄膜X(尤其是薄的積層光學薄膜X)反覆彎折時,可抑制光學薄膜10、30間之剝離。The ratio of the aforementioned 90° peel strength (N/15mm) to the second indentation elastic modulus (GPa) is preferably at least 0.2, more preferably at least 0.3, more preferably at least 0.4, and preferably at most 5, more preferably at least 0.2. 3 or less, more preferably 2 or less. Such a configuration is advantageous in that peeling between the optical films 10 and 30 can be suppressed when the laminated optical film X (in particular, a thin laminated optical film X) is repeatedly bent.

接著劑層20例如為含有活性能量線硬化型硬化性樹脂之接著劑組成物(活性能量線硬化型組成物)的硬化物。活性能量線硬化型組成物可舉例如電子束硬化型組成物、紫外線硬化型組成物及可見光線硬化型組成物。活性能量線硬化型組成物在本實施形態中為自由基聚合型組成物及陽離子聚合型組成物中之任一者或兩者。The adhesive layer 20 is, for example, a cured product of an adhesive composition (active energy ray-curable composition) containing an active energy ray-curable curable resin. The active energy ray curable composition includes, for example, an electron beam curable composition, an ultraviolet ray curable composition, and a visible ray curable composition. The active energy ray-curable composition is either or both of a radical polymerizable composition and a cationic polymerizable composition in this embodiment.

自由基聚合型組成物含有自由基聚合性化合物作為單體。自由基聚合性化合物係具有自由基聚合性官能基之化合物。自由基聚合性官能基可舉例如含乙烯性不飽和鍵之基。含乙烯性不飽和鍵之基可舉例如(甲基)丙烯醯基、乙烯基及烯丙基。(甲基)丙烯醯基意指丙烯醯基及/或甲基丙烯醯基。由活性能量線硬化型組成物之硬化性之觀點來看,活性能量線硬化型組成物宜含有具有(甲基)丙烯醯基之自由基聚合性化合物作為主成分。主成分意指以質量比率計最多的成分。活性能量線硬化型組成物中之含(甲基)丙烯醯基之自由基聚合性化合物之比率例如為50質量%以上,宜為70質量%以上,較宜為80質量%以上。又,自由基聚合性化合物可舉單官能自由基聚合性化合物及二官能以上之多官能自由基聚合性化合物。The radically polymerizable composition contains a radically polymerizable compound as a monomer. The radically polymerizable compound is a compound having a radically polymerizable functional group. As a radical polymerizable functional group, the group containing an ethylenic unsaturated bond is mentioned, for example. The ethylenically unsaturated bond-containing group includes, for example, a (meth)acryl group, a vinyl group, and an allyl group. (Meth)acryl means acryl and/or methacryl. From the viewpoint of the curability of the active energy ray-curable composition, the active energy ray-curable composition preferably contains a radically polymerizable compound having a (meth)acryl group as a main component. The principal component means the most numerous component in terms of mass ratio. The ratio of the (meth)acryl group-containing radically polymerizable compound in the active energy ray-curable composition is, for example, 50% by mass or more, preferably 70% by mass or more, more preferably 80% by mass or more. Moreover, examples of the radical polymerizable compound include monofunctional radical polymerizable compounds and polyfunctional radical polymerizable compounds having more than two functions.

單官能自由基聚合性化合物可舉例如具有(甲基)丙烯醯胺基之(甲基)丙烯醯胺衍生物。(甲基)丙烯醯胺衍生物可列舉:含N-烷基之(甲基)丙烯醯胺衍生物、含N-羥烷基之(甲基)丙烯醯胺衍生物、含N-胺烷基之(甲基)丙烯醯胺衍生物、含N-烷氧基之(甲基)丙烯醯胺衍生物及含N-巰基烷基之(甲基)丙烯醯胺衍生物。含N-烷基之(甲基)丙烯醯胺衍生物可列舉例如:N-甲基(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N,N-二乙基(甲基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺及N-己基(甲基)丙烯醯胺,宜使用N,N-二乙基丙烯醯胺。含N-羥烷基之(甲基)丙烯醯胺衍生物可列舉例如:N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺及N-羥甲基-N-丙烷(甲基)丙烯醯胺,宜可使用N-羥乙基丙烯醯胺。(甲基)丙烯醯胺衍生物可單獨使用,亦可併用二種以上。As a monofunctional radically polymerizable compound, the (meth)acrylamide derivative which has a (meth)acrylamide group is mentioned, for example. Examples of (meth)acrylamide derivatives include N-alkyl-containing (meth)acrylamide derivatives, N-hydroxyalkyl-containing (meth)acrylamide derivatives, N-aminoalkyl-containing (meth)acrylamide derivatives containing N-alkoxy groups, (meth)acrylamide derivatives containing N-alkoxy groups, and (meth)acrylamide derivatives containing N-mercaptoalkyl groups. N-alkyl-containing (meth)acrylamide derivatives include, for example: N-methyl(meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N- Diethyl (meth)acrylamide, N-isopropyl (meth)acrylamide, N-butyl (meth)acrylamide and N-hexyl (meth)acrylamide, preferably N , N-Diethylacrylamide. Examples of (meth)acrylamide derivatives containing N-hydroxyalkyl include: N-methylol (meth)acrylamide, N-hydroxyethyl (meth)acrylamide and N-methylol (meth)acrylamide N-propane (meth)acrylamide, preferably N-hydroxyethylacrylamide. The (meth)acrylamide derivatives may be used alone or in combination of two or more.

單官能自由基聚合性化合物可舉例如具有(甲基)丙烯醯氧基之(甲基)丙烯酸衍生物。該(甲基)丙烯酸衍生物可舉例如(甲基)丙烯酸烷基酯及(甲基)丙烯酸烷基酯以外之(甲基)丙烯酸衍生物。(甲基)丙烯酸衍生物可單獨使用,亦可併用二種以上。As a monofunctional radically polymerizable compound, the (meth)acrylic acid derivative which has a (meth)acryloxy group is mentioned, for example. Examples of the (meth)acrylic acid derivative include (meth)acrylic acid derivatives other than alkyl (meth)acrylate and alkyl (meth)acrylate. The (meth)acrylic acid derivatives may be used alone or in combination of two or more.

(甲基)丙烯酸烷基酯類可列舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸2,2-二甲基丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸2-乙基己酯、4-甲-2-丙基戊基(甲基)丙烯酸酯及(甲基)丙烯酸正十八烷基酯。Alkyl (meth)acrylates include, for example: methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, (meth)acrylate ) n-butyl acrylate, isobutyl (meth) acrylate, n-pentyl (meth) acrylate, 2,2-dimethyl butyl (meth) acrylate, n-hexyl (meth) acrylate, (meth) ) n-octyl acrylate, 2-ethylhexyl (meth)acrylate, 4-methyl-2-propylpentyl (meth)acrylate and n-octadecyl (meth)acrylate.

(甲基)丙烯酸烷基酯以外之(甲基)丙烯酸衍生物可舉例如(甲基)丙烯酸環烷基酯、(甲基)丙烯酸芳烷基酯、含羥基之(甲基)丙烯酸衍生物、含烷氧基之(甲基)丙烯酸衍生物及含苯氧基之(甲基)丙烯酸衍生物。(甲基)丙烯酸環烷基酯可舉例如(甲基)丙烯酸環己酯及(甲基)丙烯酸環戊酯。(甲基)丙烯酸芳烷基酯可舉例如(甲基)丙烯酸苄酯及3-苯氧基苄基(甲基)丙烯酸酯。含羥基之(甲基)丙烯酸衍生物可列舉例如:(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸4-羥丁酯、[4-(羥甲基)環己基]甲基丙烯酸酯及2-羥-3-苯氧基丙基(甲基)丙烯酸酯。含烷氧基之(甲基)丙烯酸衍生物可舉例如2-甲氧基乙基(甲基)丙烯酸酯、2-乙氧基乙基(甲基)丙烯酸酯及3-甲氧基丁基(甲基)丙烯酸酯。含苯氧基之(甲基)丙烯酸衍生物可舉例如(甲基)丙烯酸苯氧乙酯及苯氧基二乙二醇(甲基)丙烯酸酯。(甲基)丙烯酸烷基酯以外之(甲基)丙烯酸衍生物宜可使用選自於由3-苯氧基苄基丙烯酸酯、2-羥-3-苯氧基丙基丙烯酸酯及苯氧基二乙二醇丙烯酸酯所構成群組中之至少一者。Examples of (meth)acrylic acid derivatives other than alkyl (meth)acrylates include cycloalkyl (meth)acrylates, aralkyl (meth)acrylates, and hydroxyl-containing (meth)acrylic acid derivatives. , Alkoxy-containing (meth)acrylic acid derivatives and phenoxy-containing (meth)acrylic acid derivatives. As cycloalkyl (meth)acrylate, cyclohexyl (meth)acrylate and cyclopentyl (meth)acrylate are mentioned, for example. Examples of aralkyl (meth)acrylate include benzyl (meth)acrylate and 3-phenoxybenzyl (meth)acrylate. Examples of hydroxyl-containing (meth)acrylic acid derivatives include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, (meth)acrylate ) 2-hydroxybutyl acrylate, 4-hydroxybutyl (meth)acrylate, [4-(hydroxymethyl)cyclohexyl]methacrylate and 2-hydroxy-3-phenoxypropyl (methyl) Acrylate. Alkoxy-containing (meth)acrylic acid derivatives include, for example, 2-methoxyethyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate and 3-methoxybutyl (meth)acrylates. Examples of phenoxy-containing (meth)acrylic acid derivatives include phenoxyethyl (meth)acrylate and phenoxydiethylene glycol (meth)acrylate. (Meth)acrylic acid derivatives other than alkyl (meth)acrylates are preferably selected from 3-phenoxybenzyl acrylate, 2-hydroxy-3-phenoxypropyl acrylate and phenoxy At least one of the group consisting of diethylene glycol acrylate.

單官能自由基聚合性化合物還可舉含羧基單體。含羧基單體例如可舉例如(甲基)丙烯酸、丙烯酸羧乙酯、丙烯酸羧戊酯、伊康酸、馬來酸、延胡索酸、巴豆酸及異巴豆酸。Carboxyl group-containing monomers are also mentioned as a monofunctional radically polymerizable compound. Examples of carboxyl group-containing monomers include (meth)acrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, and isocrotonic acid.

單官能自由基聚合性化合物還可舉內醯胺系乙烯基單體。內醯胺系乙烯基單體可舉例如N-乙烯基-2-吡咯啶酮、N-乙烯基-ε-己內醯胺及甲基乙烯基吡咯啶酮。Examples of the monofunctional radically polymerizable compound include lactamide-based vinyl monomers. Examples of lactam-based vinyl monomers include N-vinyl-2-pyrrolidone, N-vinyl-ε-caprolactam, and methylvinylpyrrolidone.

單官能自由基聚合性化合物還可舉具有含氮雜環之乙烯基系單體。該單體可列舉例如:乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑及乙烯基嗎福林。As the monofunctional radically polymerizable compound, a vinyl-based monomer having a nitrogen-containing heterocycle can also be mentioned. Examples of such monomers include vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperidone, vinylpyridine, vinylpyrrole, vinylimidazole, vinyloxazole, and vinylmorphine.

多官能自由基聚合性化合物可使用例如:三丙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二丙烯酸酯、2-乙-2-丁基丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、環狀三羥甲丙烷縮甲醛(甲基)丙烯酸酯、二㗁烷二醇二(甲基)丙烯酸酯、三羥甲丙烷三(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯及二新戊四醇六(甲基)丙烯酸酯,宜可使用三丙二醇二丙烯酸酯。多官能自由基聚合性化合物可單獨使用,亦可併用二種以上。多官能自由基聚合性化合物可作為交聯劑發揮功能。As the polyfunctional radically polymerizable compound, for example, tripropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1, 9-nonanediol di(meth)acrylate, 1,10-decanediol diacrylate, 2-Eth-2-butylpropanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate Acrylates, tricyclodecane dimethanol di(meth)acrylate, cyclic trimethylolpropane formal (meth)acrylate, dioxanediol di(meth)acrylate, trimethylolpropane trimethylolpropane (Meth)acrylate, neopentylthritol tri(meth)acrylate, neopentylthritol tetra(meth)acrylate, diperythritol penta(meth)acrylate and diperythritol hexa(meth)acrylate As (meth)acrylate, tripropylene glycol diacrylate is preferably used. The polyfunctional radically polymerizable compound may be used alone or in combination of two or more. A polyfunctional radically polymerizable compound can function as a crosslinking agent.

活性能量線硬化型組成物為紫外線硬化型組成物或可見光線硬化型組成物時,活性能量線硬化型組成物含有光聚合引發劑。光聚合引發劑可舉例如二苯基酮化合物、苯偶姻醚化合物及9-氧硫𠮿

Figure 111116385-001
化合物。二苯基酮化合物可舉例如苄基、二苯基酮、苯甲醯苯甲酸及3,3'-二甲基-4-甲氧基二苯基酮。苯偶姻醚化合物可舉例如苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚及苯偶姻異丁醚。9-氧硫𠮿
Figure 111116385-001
化合物可列舉例如:9-氧硫𠮿
Figure 111116385-001
、2-氯9-氧硫𠮿
Figure 111116385-001
、2-甲基9-氧硫𠮿
Figure 111116385-001
、2,4-二甲基9-氧硫𠮿
Figure 111116385-001
、異丙基9-氧硫𠮿
Figure 111116385-001
、2,4-二氯9-氧硫𠮿
Figure 111116385-001
、2,4-二乙基9-氧硫𠮿
Figure 111116385-001
、2,4-二異丙基9-氧硫𠮿
Figure 111116385-001
及十二基9-氧硫𠮿
Figure 111116385-001
。When the active energy ray-curable composition is an ultraviolet ray-curable composition or a visible ray-curable composition, the active energy ray-curable composition contains a photopolymerization initiator. Photopolymerization initiators can be, for example, benzophenone compounds, benzoin ether compounds and 9-oxothiophene
Figure 111116385-001
compound. Examples of the diphenyl ketone compound include benzyl, diphenyl ketone, benzoylbenzoic acid and 3,3'-dimethyl-4-methoxy diphenyl ketone. Examples of benzoin ether compounds include benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether and benzoin isobutyl ether. 9-oxosulfur
Figure 111116385-001
Compounds can be listed for example: 9-oxosulfur
Figure 111116385-001
, 2-Chloro9-oxosulfur 𠮿
Figure 111116385-001
, 2-methyl 9-oxosulfur 𠮿
Figure 111116385-001
, 2,4-Dimethyl 9-oxosulfur 𠮿
Figure 111116385-001
, Isopropyl 9-oxosulfur
Figure 111116385-001
, 2,4-dichloro-9-oxosulfur 𠮿
Figure 111116385-001
, 2,4-Diethyl 9-oxosulfur 𠮿
Figure 111116385-001
, 2,4-Diisopropyl 9-oxosulfur 𠮿
Figure 111116385-001
and dodecyl 9-oxosulfur
Figure 111116385-001
.

活性能量線硬化型組成物為可見光線硬化型組成物時,宜可使用對380nm以上之光有高感度之光聚合引發劑。所述光聚合引發劑可列舉例如:2-甲-1-(4-甲硫基苯基)-2-嗎福林基丙-1-酮、2-苄-2-二甲胺基-1-(4-嗎福林基苯基)-丁-1-酮、2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎福林基)苯基]-1-丁酮、2,4,6-三甲基苯甲醯基-二苯基-膦氧化物、雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物及雙(η5-2,4-環戊二烯-1-基)-雙(2,6-二氟-3-(1H-吡咯-1-基)-苯基)鈦。When the active energy ray curable composition is a visible ray curable composition, it is preferable to use a photopolymerization initiator having high sensitivity to light of 380 nm or more. The photopolymerization initiator can be exemplified, for example: 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1 -(4-morpholinylphenyl)-butan-1-one, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4- Morpholinyl)phenyl]-1-butanone, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, bis(2,4,6-trimethylbenzoyl base)-phenylphosphine oxide and bis(η5-2,4-cyclopentadien-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl )titanium.

光聚合引發劑宜使用2,4-二乙基9-氧硫𠮿

Figure 111116385-001
、及/或2-甲基-1-(4-甲硫基苯基)-2-嗎福林基丙-1-酮。The photopolymerization initiator should use 2,4-diethyl 9-oxosulfur
Figure 111116385-001
, and/or 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one.

相對於硬化性成分(自由基聚合性化合物)100質量份,活性能量線硬化型組成物中之光聚合引發劑之含量宜為0.1質量份以上,較宜為0.05質量份以上,更宜為0.1質量份以上,且宜為20質量份以下,較宜為10質量份以下,更宜為5質量份以下。The content of the photopolymerization initiator in the active energy ray-curable composition is preferably at least 0.1 parts by mass, more preferably at least 0.05 parts by mass, more preferably 0.1 parts by mass relative to 100 parts by mass of the curable component (radical polymerizable compound). More than 20 parts by mass, preferably less than 10 parts by mass, more preferably less than 5 parts by mass.

活性能量線硬化型組成物為陽離子聚合物型組成物時,該組成物含有陽離子聚合性化合物作為單體。陽離子聚合性化合物係具有陽離子聚合性官能基之化合物,其包含具有一個陽離子聚合性官能基之單官能陽離子聚合性化合物與具有二個以上陽離子聚合性官能基之多官能陽離子聚合性化合物。單官能陽離子聚合性化合物之液體黏度相對較低。藉由將所述單官能陽離子聚合性化合物摻混於樹脂組成物中,可降低該樹脂組成物之黏度。又,單官能陽離子聚合性化合物大多具有能展現各種功能之官能基。藉由將所述單官能陽離子聚合性化合物摻混於樹脂組成物中,可使該樹脂組成物及/或樹脂組成物的硬化物展現各種功能。另一方面,藉由摻合有多官能陽離子聚合性化合物之樹脂組成物的硬化,可獲得具有3維交聯部之硬化物(多官能陽離子聚合性化合物係作為交聯劑發揮功能)。由所述觀點來看,宜利用多官能陽離子聚合性化合物。併用單官能陽離子聚合性化合物與多官能陽離子聚合性化合物時,相對於單官能陽離子聚合性化合物100質量份,多官能陽離子聚合性化合物之量例如為10質量份以上,且例如為1000質量份以下。陽離子聚合性官能基可舉例如環氧基、氧雜環丁烷基及乙烯基醚基。具有環氧基之化合物可舉例如脂肪族環氧化合物、脂環式環氧化合物及芳香族環氧化合物。由陽離子聚合型組成物之硬化性及接著性之觀點來看,具環氧基之化合物宜可使用脂環式環氧化合物。脂環式環氧化合物可舉例如:3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯、或3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯的己內酯改質物、三甲基己內酯改質物及戊內酯改質物。脂環式環氧化合物之市售物可舉例如CELLOXIDE 2021、CELLOXIDE 2021A、CELLOXIDE 2021P、CELLOXIDE 2081、CELLOXIDE 2083及CELLOXIDE 2085(以上為DAICEL化學工業公司製),且可舉Cyracure UVR-6105、Cyracure UVR-6107、Cyracure 30及R-6110(以上為DOW CHEMICAL日本公司製)。由陽離子聚合型組成物之硬化性改善及黏度降低之觀點來看,宜使用具有氧雜環丁烷基之化合物、及/或具有乙烯基醚基之化合物。具有氧雜環丁烷基之化合物可列舉例如:3-乙-3-羥甲基氧雜環丁烷、1,4-雙[(3-乙-3-氧雜環丁烷基)甲氧基甲基]苯、3-乙-3-(苯氧基甲基)氧雜環丁烷、二[(3-乙-3-氧雜環丁烷基)甲基]醚、3-乙-3-(2-乙基己氧基甲基)氧雜環丁烷、苯酚酚醛清漆氧雜環丁烷等。具有氧雜環丁烷基之化合物之市售物可舉例如:ARON OXETANE OXT-101、ARON OXETANE OXT-121、ARON OXETANE OXT-211、ARON OXETANE OXT-221、ARON OXETANE OXT-212(以上,東亞合成公司製)。具有乙烯基醚基之化合物可列舉例如:2-羥乙基乙烯基醚、二乙二醇單乙烯基醚、4-羥丁基乙烯基醚、二乙二醇單乙烯基醚、三乙二醇二乙烯基醚、環己烷二甲醇二乙烯基醚、環己烷二甲醇單乙烯基醚、三環癸烷乙烯基醚、環己基乙烯基醚、甲氧基乙基乙烯基醚、乙氧基乙基乙烯基醚及新戊四醇型四乙烯基醚。When the active energy ray-curable composition is a cationic polymer composition, the composition contains a cationic polymerizable compound as a monomer. The cationic polymerizable compound is a compound having a cationic polymerizable functional group, which includes a monofunctional cationic polymerizable compound with one cationic polymerizable functional group and a multifunctional cationic polymerizable compound with two or more cationic polymerizable functional groups. The liquid viscosity of the monofunctional cationic polymerizable compound is relatively low. By blending the monofunctional cationic polymerizable compound into the resin composition, the viscosity of the resin composition can be reduced. Moreover, many monofunctional cationically polymerizable compounds have functional groups capable of exhibiting various functions. By blending the monofunctional cationic polymerizable compound into the resin composition, the resin composition and/or the cured product of the resin composition can exhibit various functions. On the other hand, a cured product having a three-dimensional crosslinked portion can be obtained by curing a resin composition blended with a polyfunctional cationic polymerizable compound (the polyfunctional cationic polymerizable compound functions as a crosslinking agent). From such a viewpoint, it is preferable to use a polyfunctional cation polymerizable compound. When a monofunctional cation polymerizable compound and a polyfunctional cation polymerizable compound are used together, the amount of the polyfunctional cation polymerizable compound is, for example, 10 parts by mass or more and, for example, 1000 parts by mass or less with respect to 100 parts by mass of the monofunctional cation polymerizable compound . The cationic polymerizable functional group may, for example, be an epoxy group, an oxetanyl group or a vinyl ether group. The compound having an epoxy group includes, for example, aliphatic epoxy compounds, alicyclic epoxy compounds, and aromatic epoxy compounds. From the viewpoint of hardening and adhesiveness of the cationic polymer composition, it is preferable to use an alicyclic epoxy compound as the compound having an epoxy group. Alicyclic epoxy compounds can be, for example: 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, or 3,4-epoxycyclohexylmethyl-3,4- Caprolactone-modified, trimethylcaprolactone-modified, and valerolactone-modified substances of epoxycyclohexane carboxylate. Commercially available alicyclic epoxy compounds include, for example, CELLOXIDE 2021, CELLOXIDE 2021A, CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, and CELLOXIDE 2085 (manufactured by DAICEL Chemical Industry Co., Ltd.), and Cyracure UVR-6105, Cyracure UVR -6107, Cyracure 30 and R-6110 (the above are manufactured by DOW CHEMICAL Japan Co., Ltd.). From the standpoint of improving the curability and reducing the viscosity of the cationic polymer composition, it is preferable to use a compound having an oxetanyl group and/or a compound having a vinyl ether group. Compounds with an oxetane group include, for example: 3-E-3-hydroxymethyl oxetane, 1,4-bis[(3-E-3-oxetane)methoxy Methyl]benzene, 3-Eth-3-(phenoxymethyl)oxetane, bis[(3-Eth-3-oxetanyl)methyl]ether, 3-Eth- 3-(2-Ethylhexyloxymethyl)oxetane, phenol novolac oxetane, etc. Commercially available compounds having an oxetane group include, for example: ARON OXETANE OXT-101, ARON OXETANE OXT-121, ARON OXETANE OXT-211, ARON OXETANE OXT-221, ARON OXETANE OXT-212 (above, East Asia synthetic company). Compounds having a vinyl ether group include, for example: 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, 4-hydroxybutyl vinyl ether, diethylene glycol monovinyl ether, triethylene glycol Alcohol divinyl ether, cyclohexanedimethanol divinyl ether, cyclohexanedimethanol monovinyl ether, tricyclodecane vinyl ether, cyclohexyl vinyl ether, methoxyethyl vinyl ether, ethyl Oxyethyl vinyl ether and neopentylthritol tetravinyl ether.

活性能量線硬化型組成物為紫外線硬化型組成物或可見光線硬化型組成物時,活性能量線硬化型組成物含有光陽離子聚合引發劑。光陽離子聚合引發劑受到活性能量線(可見光線、紫外線、X射線、電子束等)之照射,會產生陽離子種或路易斯酸,引發陽離子聚合性官能基之聚合反應。光陽離子聚合引發劑可舉光酸產生劑及光鹼產生劑,宜可使用光酸產生劑。活性能量線硬化型組成物採用可見光線硬化型組成物時,尤宜使用對380nm以上的光有高感度之光陽離子聚合引發劑。又,使用光陽離子聚合引發劑時,宜併用對波長較380nm更長之光顯示極大吸收之光敏劑。光陽離子聚合引發劑一般而言係一在300nm附近或較其更短之波長區域顯示極大吸收之化合物,故藉由併用在波長較380nm更長之光顯示極大吸收之光敏劑,可有效利用波長較380nm更長之光,來促進來自光陽離子聚合引發劑之陽離子種或路易斯酸的產生。光敏劑可列舉例如蒽化合物、芘化合物、羰基化合物、有機硫化合物、過硫化物、氧化還原系化合物、偶氮化合物、雙偶氮化合物、鹵素化合物及光還原性色素。該等可單獨使用,亦可併用二種以上。尤其蒽化合物因光敏化效果優異,故理想。作為光敏劑之蒽化合物之市售物可舉例如ANTHRACURE UVS-1331及ANTHRACURE UVS-1221(川崎化成公司製)。組成物中之光敏劑之含量例如為0.1~5重量%。When the active energy ray-curable composition is an ultraviolet ray-curable composition or a visible ray-curable composition, the active energy ray-curable composition contains a photocationic polymerization initiator. When the photocationic polymerization initiator is irradiated by active energy rays (visible light, ultraviolet rays, X-rays, electron beams, etc.), it will generate cationic species or Lewis acid, and initiate the polymerization reaction of cationic polymerizable functional groups. Examples of photocationic polymerization initiators include photoacid generators and photobase generators, preferably photoacid generators. Active energy ray curable composition When a visible ray curable composition is used, it is particularly preferable to use a photocationic polymerization initiator that is highly sensitive to light above 380 nm. Moreover, when using a photocationic polymerization initiator, it is preferable to use together the photosensitizer which shows the maximum absorption with respect to the light of wavelength longer than 380 nm. A photocationic polymerization initiator is generally a compound that exhibits maximum absorption in a wavelength region near 300nm or shorter, so by using a photosensitizer that exhibits maximum absorption at a wavelength longer than 380nm, the wavelength can be effectively used Light longer than 380nm is used to promote the generation of cationic species or Lewis acids from photocationic polymerization initiators. Examples of photosensitizers include anthracene compounds, pyrene compounds, carbonyl compounds, organosulfur compounds, persulfide compounds, redox compounds, azo compounds, disazo compounds, halogen compounds, and photoreducible dyes. These may be used alone or in combination of two or more. In particular, an anthracene compound is preferable because of its excellent photosensitization effect. Commercially available products of an anthracene compound as a photosensitizer include, for example, ANTHRACURE UVS-1331 and ANTHRACURE UVS-1221 (manufactured by Kawasaki Chemical Co., Ltd.). The content of the photosensitizer in the composition is, for example, 0.1 to 5% by weight.

活性能量線硬化型組成物亦可含有寡聚物。寡聚物可舉丙烯酸寡聚物、氟寡聚物及聚矽氧寡聚物,宜可使用丙烯酸寡聚物。寡聚物對活性能量線硬化型組成物之摻混有助於調整該組成物之黏度,且有助於抑制該組成物在硬化時收縮。活性能量線硬化型組成物的硬化收縮之抑制適宜降低所形成之接著劑層20與光學薄膜10、30之間的界面應力。界面應力之抑制有助於確保光學薄膜10、30間之接合力。The active energy ray curable composition may also contain an oligomer. Examples of oligomers include acrylic oligomers, fluorine oligomers, and polysiloxane oligomers, preferably acrylic oligomers. The blending of the oligomer into the active energy ray-curable composition helps to adjust the viscosity of the composition, and helps to suppress the shrinkage of the composition when it is cured. Suppression of curing shrinkage of the active energy ray-curable composition is suitable for reducing the interface stress between the formed adhesive layer 20 and the optical films 10 and 30 . Suppression of interfacial stress helps to secure the bonding force between the optical films 10 and 30 .

形成丙烯酸寡聚物之(甲基)丙烯酸單體可列舉例如:碳數1~20之(甲基)丙烯酸烷基酯、(甲基)丙烯酸環烷基酯、(甲基)丙烯酸芳烷基酯、多環式(甲基)丙烯酸酯、含羥基之(甲基)丙烯酸酯及含鹵素之(甲基)丙烯酸酯。(甲基)丙烯酸烷基酯可列舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、2-甲-2-硝丙基(甲基)丙烯酸酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸S-丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸三級戊酯、(甲基)丙烯酸3-戊酯、2,2-二甲基丁基(甲基)丙烯酸酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸2-乙基己酯、4-甲-2-丙基戊基(甲基)丙烯酸酯及N-十八基(甲基)丙烯酸酯。(甲基)丙烯酸環烷基酯可舉例如(甲基)丙烯酸環己酯及(甲基)丙烯酸環戊酯。(甲基)丙烯酸芳烷基酯可舉例如(甲基)丙烯酸苄酯。多環式(甲基)丙烯酸酯可舉例如(甲基)丙烯酸2-異莰酯、(甲基)丙烯酸2-降莰基甲酯、5-降莰烯-2-基-甲基(甲基)丙烯酸酯及3-甲-2-降莰基甲基(甲基)丙烯酸酯。含羥基之(甲基)丙烯酸酯可舉例如(甲基)丙烯酸羥乙酯、(甲基)丙烯酸2-羥丙酯、2,3-二羥丙基甲基-丁基(甲基)甲基丙烯酸酯。含鹵素之(甲基)丙烯酸酯可列舉例如:2,2,2-三氟乙基(甲基)丙烯酸酯、2,2,2-三氟乙基乙基(甲基)丙烯酸酯、四氟丙基(甲基)丙烯酸酯、六氟丙基(甲基)丙烯酸酯、八氟戊基(甲基)丙烯酸酯、十七氟癸基(甲基)丙烯酸酯。該等(甲基)丙烯酸酯可單獨使用,亦可併用二種以上。Examples of (meth)acrylic monomers that form acrylic acid oligomers include alkyl (meth)acrylates with 1 to 20 carbon atoms, cycloalkyl (meth)acrylates, and aralkyl (meth)acrylates. esters, polycyclic (meth)acrylates, hydroxyl-containing (meth)acrylates and halogen-containing (meth)acrylates. Alkyl (meth)acrylates include, for example: methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, 2-methyl- 2-Nitropropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, S-butyl (meth)acrylate, tertiary butyl (meth)acrylate, n-pentyl (meth)acrylate, tertiary pentyl (meth)acrylate, 3-pentyl (meth)acrylate, 2,2-dimethylbutyl (meth)acrylate, (meth)acrylic acid n-hexyl ester, cetyl (meth)acrylate, n-octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 4-methyl-2-propylpentyl (meth)acrylate and N-octadecyl(meth)acrylate. As cycloalkyl (meth)acrylate, cyclohexyl (meth)acrylate and cyclopentyl (meth)acrylate are mentioned, for example. As for aralkyl (meth)acrylate, benzyl (meth)acrylate is mentioned, for example. Polycyclic (meth)acrylates can be exemplified by 2-isobornyl (meth)acrylate, 2-norbornyl methyl (meth)acrylate, 5-norbornen-2-yl-methyl (meth)acrylate base) acrylate and 3-methyl-2-norbornyl methyl (meth)acrylate. Hydroxyl-containing (meth)acrylates include, for example, hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2,3-dihydroxypropylmethyl-butyl (meth)methacrylate base acrylate. Halogen-containing (meth)acrylates include, for example: 2,2,2-trifluoroethyl (meth)acrylate, 2,2,2-trifluoroethylethyl (meth)acrylate, tetrafluoroethyl (meth)acrylate, Fluoropropyl (meth)acrylate, hexafluoropropyl (meth)acrylate, octafluoropentyl (meth)acrylate, heptadecylfluorodecyl (meth)acrylate. These (meth)acrylates may be used alone or in combination of two or more.

丙烯酸寡聚物之重量平均分子量(Mw)宜為15000以下,較宜為10000以下,更宜為5000以下。丙烯酸寡聚物之Mw宜為500以上,較宜為1000以上,更宜為1500以上。The weight average molecular weight (Mw) of the acrylic acid oligomer is preferably 15,000 or less, more preferably 10,000 or less, more preferably 5,000 or less. The Mw of the acrylic acid oligomer is preferably not less than 500, more preferably not less than 1000, more preferably not less than 1500.

活性能量線硬化型組成物中之丙烯酸寡聚物之含量宜為2質量%以上,較宜為4質量%以上,且宜為20質量%以下,較宜為15質量%以下。The content of the acrylic acid oligomer in the active energy ray curable composition is preferably at least 2% by mass, more preferably at least 4% by mass, and is preferably at most 20% by mass, more preferably at most 15% by mass.

活性能量線硬化型組成物亦可含有其他成分。其他成分可舉矽烷耦合劑、調平劑、界面活性劑、塑化劑及紫外線吸收劑。相對於硬化性成分100質量份,該其他成分之摻混量宜為10質量份以下,較宜為5質量份以下,更宜為3質量份以下,且例如為0.01質量份以上。The active energy ray curing composition may contain other components. Other components include silane coupling agent, leveling agent, surfactant, plasticizer and ultraviolet absorber. The blending amount of the other components is preferably not more than 10 parts by mass, more preferably not more than 5 parts by mass, more preferably not more than 3 parts by mass, and for example, not less than 0.01 parts by mass relative to 100 parts by mass of the hardening component.

由在後述塗佈步驟中之塗敷性之觀點來看,活性能量線硬化型組成物之25℃下之黏度宜為3mPa・s以上,較宜為5mPa・s以上,更宜為10mPa・s以上,且宜為100mPa・s以下,較宜為50mPa・s以下,更宜為30mPa・s以下。組成物之黏度係以E型黏度計(錐板型黏度計)測定之測定值。From the viewpoint of coatability in the coating step described later, the viscosity of the active energy ray-curable composition at 25°C is preferably 3 mPa·s or higher, more preferably 5 mPa·s or higher, more preferably 10 mPa·s Above, and preferably below 100mPa·s, more preferably below 50mPa·s, more preferably below 30mPa·s. The viscosity of the composition is the measured value measured with an E-type viscometer (cone-plate viscometer).

積層光學薄膜X例如可依以下方式製造。The laminated optical film X can be produced, for example, as follows.

首先,於其中一光學薄膜(光學薄膜10或光學薄膜30)之單面(接合預定面)塗佈活性能量線硬化型組成物,而形成該組成物之塗膜(塗佈步驟)。在該塗佈步驟之前,光學薄膜之接合預定面亦可進行表面改質處理。表面改質處理可舉電暈處理、電漿處理、準分子處理及火焰處理。本步驟中之塗佈方法可舉例如反向塗佈機、凹版塗佈機、棒式反向塗佈機、輥塗機、模塗機、棒塗機及桿塗機。First, an active energy ray-curable composition is coated on one side (surface to be joined) of one of the optical films (optical film 10 or optical film 30 ) to form a coating film of the composition (coating step). Before this coating step, the surface to be joined of the optical film may also be subjected to surface modification treatment. Surface modifying treatments include corona treatment, plasma treatment, excimer treatment and flame treatment. The coating method in this step may be, for example, a reverse coater, a gravure coater, a rod reverse coater, a roll coater, a die coater, a rod coater, and a rod coater.

接著,對其中一光學薄膜隔著組成物塗膜貼合另一光學薄膜(光學薄膜30或光學薄膜10)。貼合可使用例如輥壓層合機。Next, the other optical film (the optical film 30 or the optical film 10 ) is bonded to one of the optical films via the composition coating film. For bonding, a roll laminator can be used, for example.

在形成充分厚度之邊界區域31方面來看,活性能量線硬化型組成物宜含有具有與光學薄膜30中之樹脂之SP值接近之SP值的單體。活性能量線硬化型組成物含有所述單體時,在該活性能量線硬化型組成物之塗佈及硬化過程中,與光學薄膜30表面相接之前述單體會與該表面相溶,而容易形成邊界區域31。From the viewpoint of forming the boundary region 31 with a sufficient thickness, the active energy ray-curable composition preferably contains a monomer having an SP value close to that of the resin in the optical film 30 . When the active energy ray-curable composition contains the above-mentioned monomer, the above-mentioned monomer in contact with the surface of the optical film 30 is compatible with the surface during the coating and curing process of the active energy ray-curable composition, and The boundary area 31 is easily formed.

積層光學薄膜X之製造過程中,接著對光學薄膜10、30間之組成物塗膜照射活性能量線,使該塗膜(活性能量線硬化型組成物)硬化(硬化步驟)。藉此,於光學薄膜10、30間形成接著劑層20,而透過接著劑層20接合光學薄膜10、30(接著劑層20並非壓敏接著劑層)。由抑制作為機能性光學薄膜之光學薄膜10劣化之觀點來看,在本步驟中宜從光學薄膜30側照射活性能量線。活性能量線可使用電子束、紫外線及可見光線。電子束照射機構可舉例如電子束加速器。紫外線及可見光線之光源可列舉例如:LED LIGHT、充有鎵之金屬鹵素燈、低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、氙燈、鹵素燈及鎵燈。在本步驟中,亦可視需求使用波長截止濾波器,以截止從光源射出之紫外線及/或可見光線之一部分的波長區域。In the manufacturing process of the laminated optical film X, active energy rays are then irradiated to the composition coating film between the optical films 10 and 30 to harden the coating film (active energy ray-curable composition) (curing step). Thereby, the adhesive layer 20 is formed between the optical films 10 and 30, and the optical films 10 and 30 are bonded through the adhesive layer 20 (the adhesive layer 20 is not a pressure-sensitive adhesive layer). From the viewpoint of suppressing deterioration of the optical film 10 which is a functional optical film, it is preferable to irradiate active energy rays from the optical film 30 side in this step. Active energy rays can use electron beams, ultraviolet rays, and visible rays. The electron beam irradiation mechanism may, for example, be an electron beam accelerator. Examples of light sources for ultraviolet and visible light include: LED LIGHT, gallium-filled metal halide lamps, low-pressure mercury lamps, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, xenon lamps, halogen lamps, and gallium lamps. In this step, a wavelength cutoff filter may also be used as required to cut off the wavelength region of a part of the ultraviolet and/or visible light emitted from the light source.

積層光學薄膜X如圖3所示,亦可於光學薄膜10之厚度方向H之兩面透過接著劑層20接合有光學薄膜30。圖3所示之積層光學薄膜X(積層光學薄膜X')於厚度方向H上依序具備光學薄膜30、接著劑層20、光學薄膜10、接著劑層20及光學薄膜30。形成二個接著劑層20之活性能量線硬化型組成物之組成可相同亦可互異。二個光學薄膜30之材料可相同亦可互異。積層光學薄膜X'例如可藉由透過接著劑層20對圖1之積層光學薄膜X更進一步接合光學薄膜30來製造。As shown in FIG. 3 , the laminated optical film X can also be bonded with the optical film 30 on both sides of the optical film 10 in the thickness direction H through the adhesive layer 20 . The laminated optical film X (laminated optical film X′) shown in FIG. 3 includes an optical film 30 , an adhesive layer 20 , an optical film 10 , an adhesive layer 20 , and an optical film 30 sequentially in the thickness direction H. The composition of the active energy ray-curable composition forming the two adhesive layers 20 may be the same or different. The materials of the two optical films 30 can be the same or different from each other. The laminated optical film X' can be manufactured, for example, by further bonding the optical film 30 to the laminated optical film X in FIG. 1 through the adhesive layer 20 .

積層光學薄膜X'中,至少一光學薄膜30具有上述邊界區域31,宜二個光學薄膜30具有邊界區域31。積層光學薄膜X'中,以由各接著劑層20及光學薄膜30之與該接著劑層20相接之邊界區域31形成的各接著劑原料成分含有部40來說,接著劑原料成分含有部40之厚度T2相對於接著劑層20之厚度T1的比率(T2/T1)為1.01以上,宜為1.05以上,較宜為1.1以上,更宜為1.2以上。In the laminated optical film X′, at least one optical film 30 has the aforementioned boundary region 31 , preferably two optical films 30 have the boundary region 31 . In the laminated optical film X', each adhesive material component containing portion 40 formed by the boundary region 31 of each adhesive layer 20 and the optical film 30 in contact with the adhesive layer 20 is an adhesive material component containing portion. The ratio (T2/T1) of the thickness T2 of 40 to the thickness T1 of the adhesive layer 20 is at least 1.01, preferably at least 1.05, more preferably at least 1.1, and more preferably at least 1.2.

實施例 以下顯示實施例來具體說明本發明。本發明不受實施例所限。又,以下記載之摻混量(含量)、物性值、參數等具體數值,可替代成上述「用以實施發明之形態」中記載之與其等對應之摻混量(含量)、物性值、參數等之上限(「以下」或「小於」所定義之數值)或下限(「以上」或「大於」所定義之數值)。 Example Examples are shown below to specifically illustrate the present invention. The present invention is not limited by the Examples. In addition, specific values such as the blending amount (content), physical property values, and parameters described below can be replaced by the corresponding blending amount (content), physical property values, and parameters described in the above "Forms for Implementing the Invention" The upper limit (the value defined as "below" or "less than") or the lower limit (the value defined as "above" or "greater than").

[實施例1] 將下述成分按表1所示之摻混量(以固體成分計之摻混量)在25℃下混合1小時,調製出接著劑組成物(調製步驟)。表1中所示之摻混量之單位為相對的"質量份"。 [Example 1] The following components were mixed at 25° C. for 1 hour at the blending amounts shown in Table 1 (blending amounts in terms of solid content) to prepare an adhesive composition (preparation step). The unit of the blending amount shown in Table 1 is relative "parts by mass".

LIGHT ACRYLATE POB-A(單體):3-苯氧基苄基丙烯酸酯,共榮社化學公司製 LIGHT ACRYLATE P2H-A(單體):苯氧基二乙二醇丙烯酸酯,共榮社化學公司製 ARONIX M-5700(單體):2-羥-3-苯氧丙基丙烯酸酯,東亞合成公司製 ARONIX M-220(單體):三丙二醇二丙烯酸酯,東亞合成公司製 HEAA(單體):羥乙基丙烯醯胺,KJ Chemicals Corporation製 DEAA(單體):二乙基丙烯醯胺,KJ Chemicals Corporation製 OMINIRAD907(光聚合引發劑):2-甲-1-(4-甲硫基苯基)-2-嗎福林基丙-1-酮,IGM Resins公司製 KAYACURE DETX-S(光聚合引發劑):2,4-二乙基9-氧硫

Figure 111116385-001
,日本化藥公司製 ARUFON 1190(丙烯酸寡聚物):黏度6000mPa・s(25℃),Mw1700,Tg-50℃,東亞合成公司製 BYK-UV3505(調平劑):具有丙烯醯基之改質聚二甲基矽氧烷,BYK公司製 LIGHT ACRYLATE POB-A (monomer): 3-phenoxybenzyl acrylate, manufactured by Kyoeisha Chemical Co., Ltd. LIGHT ACRYLATE P2H-A (monomer): phenoxydiethylene glycol acrylate, manufactured by Kyoeisha Chemical ARONIX M-5700 (monomer) manufactured by the company: 2-hydroxy-3-phenoxypropyl acrylate, ARONIX M-220 (monomer) manufactured by Toagosei Co., Ltd.: tripropylene glycol diacrylate, HEAA (monomer) manufactured by Toagosei Corporation Body): hydroxyethylacrylamide, DEAA manufactured by KJ Chemicals Corporation (monomer): diethylacrylamide, OMINIRAD907 manufactured by KJ Chemicals Corporation (photopolymerization initiator): 2-methyl-1-(4-methylthio phenyl)-2-morpholinopropan-1-one, KAYACURE DETX-S (photopolymerization initiator) manufactured by IGM Resins Co., Ltd.: 2,4-diethyl 9-oxosulfur
Figure 111116385-001
, ARUFON 1190 (acrylic acid oligomer) manufactured by Nippon Kayaku Corporation: viscosity 6000mPa·s (25°C), Mw1700, Tg-50°C, BYK-UV3505 (leveling agent) manufactured by Toagosei Corporation: modified with acrylyl group Quality polydimethylsiloxane, manufactured by BYK

然後,在捲對捲方式中,一邊以預定生產線速度使長條透明保護薄膜行進,一邊依序實施塗佈步驟、貼合步驟及硬化步驟。塗佈步驟中,係於作為透明保護薄膜之厚度23µm之長條COP薄膜(品名「ZeonorFilm ZF14」,日本ZEON公司製)上塗敷接著劑組成物,而形成厚度0.9µm之接著劑塗膜。塗敷係使用富士機械公司製之MCD塗佈機(凹槽形狀:蜂巢狀,凹版輥筒線數1000條/inch,旋轉速度140%/對線速)。接續之貼合步驟中,係對透明保護薄膜透過該薄膜上之接著劑塗膜貼合偏光件薄膜(厚度5µm)。接續之硬化步驟中,係藉由對接著劑塗膜隔著透明保護薄膜照射紫外線,使薄膜間之接著劑塗膜硬化。紫外線照射係使用鎵燈。藉此,接合透明保護薄膜與偏光件薄膜而獲得積層光學薄膜。Then, in the roll-to-roll system, a coating step, a bonding step, and a curing step are sequentially performed while running the elongated transparent protective film at a predetermined line speed. In the coating step, the adhesive composition was applied on a long COP film (product name "ZeonorFilm ZF14", manufactured by ZEON Corporation, Japan) with a thickness of 23 µm as a transparent protective film to form an adhesive coating film with a thickness of 0.9 µm. The MCD coating machine manufactured by Fuji Machinery Co., Ltd. (groove shape: honeycomb shape, gravure roll line number 1000/inch, rotation speed 140%/line speed) was used for coating. In the subsequent bonding step, the polarizer film (thickness 5 µm) is bonded to the transparent protective film through the adhesive coating film on the film. In the subsequent hardening step, the adhesive coating film between the films is hardened by irradiating ultraviolet rays through the transparent protective film to the adhesive coating film. Gallium lamps were used for ultraviolet irradiation. Thereby, a laminated optical film is obtained by joining the transparent protective film and the polarizer film.

依以上方式,製作出實施例1之積層光學薄膜。實施例1之積層光學薄膜係於厚度方向上依序具備偏光件薄膜(厚度5µm)、接著劑層及透明保護薄膜(厚度23µm)。In the above manner, the laminated optical film of Example 1 was produced. The laminated optical film of Example 1 is sequentially provided with a polarizer film (5 µm in thickness), an adhesive layer, and a transparent protective film (23 µm in thickness) in the thickness direction.

[實施例2] 除了以下事項外,依與實施例1之積層光學薄膜相同方式而製作出實施例2之積層光學薄膜。將上述生產線速度提高預定程度,縮短從塗佈步驟至硬化步驟為止之時間。將塗佈步驟中要形成於透明保護薄膜(COP薄膜)上之塗膜厚度設為厚度2.6µm。 [Example 2] The laminated optical film of Example 2 was produced in the same manner as the laminated optical film of Example 1 except for the following matters. The above-mentioned production line speed is increased by a predetermined level, and the time from the coating step to the hardening step is shortened. The thickness of the coating film to be formed on the transparent protective film (COP film) in the coating step was set to a thickness of 2.6 µm.

實施例2之積層光學薄膜係於厚度方向上依序具備偏光件薄膜(厚度5µm)、接著劑層及透明保護薄膜(厚度23µm)。The laminated optical film of Example 2 is sequentially provided with a polarizer film (5 µm in thickness), an adhesive layer, and a transparent protective film (23 µm in thickness) in the thickness direction.

[實施例3] 除了以下事項外,依與實施例1之積層光學薄膜相同方式而製作出實施例3之積層光學薄膜。將上述生產線速度降低預定程度,增長從塗佈步驟至硬化步驟為止之時間。將塗佈步驟中要形成於透明保護薄膜(COP薄膜)上之塗膜厚度設為1.2µm。 [Example 3] The laminated optical film of Example 3 was produced in the same manner as the laminated optical film of Example 1 except for the following matters. The above-mentioned line speed is reduced by a predetermined degree, and the time from the coating step to the hardening step is increased. The thickness of the coating film to be formed on the transparent protective film (COP film) in the coating step was set to 1.2 µm.

實施例3之積層光學薄膜係於厚度方向上依序具備偏光件薄膜(厚度5µm)、接著劑層及透明保護薄膜(厚度23µm)。The laminated optical film of Example 3 is sequentially provided with a polarizer film (5 µm in thickness), an adhesive layer, and a transparent protective film (23 µm in thickness) in the thickness direction.

[比較例1] 除了以下事項外,依與實施例1之積層光學薄膜相同方式而製作出比較例1之積層光學薄膜(塗佈步驟至硬化步驟之間的生產線速度係與實施例1相同)。 [Comparative example 1] Except for the following matters, the laminated optical film of Comparative Example 1 was produced in the same manner as the laminated optical film of Example 1 (the production line speed between the coating step and the hardening step was the same as that of Example 1).

調製步驟中,調製出表1所示之組成(成分、摻混量)之接著劑組成物。單體中,使用共榮社化學公司製之「LIGHT ACRYLATE 1.9ND-A」(1,9-壬二醇二丙烯酸酯)36質量份與共榮社化學公司製之「LIGHT ACRYLATE HPP-A」(羥基三甲基乙酸新戊二醇丙烯酸酯加成物)12.5質量份,來取代「LIGHT ACRYLATE POB-A」與「LIGHT ACRYLATE P2H-A」。In the preparation step, an adhesive composition having the composition (ingredients, compounding amount) shown in Table 1 was prepared. As the monomer, 36 parts by mass of "LIGHT ACRYLATE 1.9ND-A" (1,9-nonanediol diacrylate) manufactured by Kyoeisha Chemical Co., Ltd. and "LIGHT ACRYLATE HPP-A" manufactured by Kyoeisha Chemical Co., Ltd. were used (Hydroxytrimethylacetic acid neopentyl glycol acrylate adduct) 12.5 parts by mass to replace "LIGHT ACRYLATE POB-A" and "LIGHT ACRYLATE P2H-A".

將塗佈步驟中要形成於透明保護薄膜(COP薄膜)上之塗膜厚度設為0.93µm。The thickness of the coating film to be formed on the transparent protective film (COP film) in the coating step was set to 0.93 µm.

比較例1之積層光學薄膜係於厚度方向上依序具備偏光件薄膜(厚度5µm)、接著劑層及透明保護薄膜(厚度23µm)。The laminated optical film of Comparative Example 1 has a polarizer film (thickness 5 µm), an adhesive layer, and a transparent protective film (thickness 23 µm) sequentially in the thickness direction.

<接著劑層之厚度> 依以下方式測定實施例1~3及比較例1之各積層光學薄膜中之接著劑層之厚度T1。首先,從積層光學薄膜裁切出5mm×10mm之薄膜片(積層光學薄膜)。接著,利用凍結切片法切削積層光學薄膜。具體而言,係在將積層光學薄膜冷卻至-30℃後,以硬質切刀沿該薄膜之厚度方向上削,然後恢復至室溫。藉此獲得形成有切削面之積層光學薄膜,然後再對該切削面施行5nm厚度以下之導電處理。藉此,獲得觀察用試料。接著,藉由觀察用試料之SEM觀察來測定接著劑層之厚度。具體而言,係使用掃描電子顯微鏡(品名「REGULUS8220」,HITACHI公司製),觀察及拍攝觀察用試料之前述切削面的二次電子影像,並測定接著劑層之厚度。該觀察中,加速電壓設為3.0kV,電流量設為10µA,工作距離設為8mm,倍率設為10萬倍,檢測模式設為Upper+Lower模式。將接著劑層之厚度T1(µm)顯示於表1。 <Thickness of Adhesive Layer> The thickness T1 of the adhesive layer in each laminated optical film of Examples 1-3 and Comparative Example 1 was measured in the following manner. First, a 5 mm x 10 mm film sheet (laminated optical film) is cut out from the laminated optical film. Next, the laminated optical film was cut by the frozen section method. Specifically, after cooling the laminated optical film to -30°C, use a hard cutter to cut upward along the thickness direction of the film, and then return to room temperature. In this way, a laminated optical film with a cut surface is obtained, and then the cut surface is subjected to a conductive treatment with a thickness of less than 5nm. Thereby, a sample for observation was obtained. Next, the thickness of the adhesive layer was measured by SEM observation of the sample for observation. Specifically, a scanning electron microscope (product name "REGULUS8220", manufactured by HITACHI Corporation) was used to observe and photograph the secondary electron image of the cut surface of the sample for observation, and measure the thickness of the adhesive layer. In this observation, the acceleration voltage was set to 3.0 kV, the current amount was set to 10 µA, the working distance was set to 8 mm, the magnification was set to 100,000 times, and the detection mode was set to Upper+Lower mode. Table 1 shows the thickness T1 (µm) of the adhesive layer.

<接著劑原料成分含有部之厚度> 依以下方式測定實施例1~3及比較例1之各積層光學薄膜中之接著劑原料成分含有部之厚度T2。首先,藉由切片機,將從積層光學薄膜裁切出之薄膜片的透明保護薄膜從該透明保護薄膜之表面側削除至預定深度使其薄化。藉此,獲得測定試料。接下來,針對測定試料,藉由飛行時間型二次離子質譜法(TOF-SIMS)從透明保護薄膜側進行分析。分析係使用飛行時間型二次離子質譜裝置(品名「TRIFT-V nanoTOF,ULVAC-PHI公司製)。本分析中,係交替反覆照射蝕刻用離子束與其後之測定用離子束(1次離子束)。蝕刻用離子束之照射中,係使用Ar氣簇離子(團簇尺寸(中央值)為2500),加速電壓設為20kV,離子束電流值設為10nA,照射範圍設為1000µm×1000µm,照射時間設為5秒。測定用離子束之照射中,係使用鉍團簇之雙電荷離子(Bi 3 ++)作為照射1次離子,加速電壓設為30kV,照射範圍設為蝕刻用離子束照射區域之中央部200µm×200µm,且使用用以校正分析中之試料之電荷的中和槍。又,本分析係在室溫下進行。藉由本分析,取得了二次離子(正離子、負離子)強度之質量光譜之深度方向剖面圖(深度剖面圖)。關於二次離子強度,以正離子來說係換算成以C 3H 5 +之值為基準值1時之值,而以負離子來說係換算成以C 2H -之值為基準值1時之值。接著,根據取得之深度方向剖面圖,特定出檢測出透明保護薄膜中檢測極限值(正、負2次離子強度0.1counts/秒)以上之接著劑原料成分的區域(邊界區域)。然後,從該邊界區域之厚度與接著劑層之上述厚度T1求出接著劑原料成分含有部之厚度T2。將其厚度T2(µm)顯示於表1。又,亦將厚度T2相對於厚度T1之比率顯示於表1。 <Thickness of Adhesive Raw Material Component Containing Portion> The thickness T2 of the adhesive raw material component containing portion in each of the laminated optical films of Examples 1 to 3 and Comparative Example 1 was measured in the following manner. First, the transparent protective film of the film sheet cut out from the laminated optical film is cut to a predetermined depth from the surface side of the transparent protective film by a microtome to make it thinner. Thereby, a measurement sample is obtained. Next, the measurement sample was analyzed from the side of the transparent protective film by time-of-flight secondary ion mass spectrometry (TOF-SIMS). The analysis system used a time-of-flight secondary ion mass spectrometer (product name "TRIFT-V nanoTOF, manufactured by ULVAC-PHI Co., Ltd.). In this analysis, the ion beam for etching and the ion beam for measurement (primary ion beam) were irradiated alternately and repeatedly. ). For the irradiation of ion beams for etching, Ar gas cluster ions were used (cluster size (median value) was 2500), the acceleration voltage was set to 20kV, the ion beam current value was set to 10nA, and the irradiation range was set to 1000µm×1000µm. The irradiation time was set to 5 seconds. In the irradiation of the ion beam for measurement, double-charged ions (Bi 3 ++ ) of bismuth clusters were used as primary irradiation ions, the accelerating voltage was set to 30 kV, and the irradiation range was set to the ion beam for etching The central portion of the irradiation area is 200µm×200µm, and a neutralization gun used to correct the charge of the sample in the analysis is used. In addition, this analysis is carried out at room temperature. Through this analysis, secondary ions (positive ions, negative ions ) intensity of the mass spectrum of the depth profile (depth profile). Regarding the secondary ion intensity, it is converted to the value when the value of C 3 H 5 + is the reference value 1 for positive ions, and for negative ions It is said to be converted into the value when the value of C 2 H - is the reference value of 1. Then, according to the obtained depth direction profile, the detection limit value of the transparent protective film (positive and negative secondary ion strength 0.1counts) is specified The region (boundary region) of the adhesive raw material component) above the adhesive material component. Then, the thickness T2 of the adhesive raw material component containing part is obtained from the thickness of the boundary region and the above-mentioned thickness T1 of the adhesive layer. The thickness T2 (µm ) are shown in Table 1. In addition, the ratio of thickness T2 to thickness T1 is also shown in Table 1.

<剝離強度> 調查實施例1~3及比較例1之各積層光學薄膜中透明保護薄膜與偏光件薄膜之間的剝離強度。首先,從積層光學薄膜裁切出第1邊200mm×第2邊15mm之尺寸的試樣薄膜。第1邊係沿偏光件薄膜之延伸方向延伸的邊。第2邊係沿與前述延伸方向正交之方向延伸的邊。接著,將試樣薄膜的偏光件薄膜側透過強黏著劑貼合於玻璃板。接著,藉由TENSILON萬能試驗機(品名「RTC」,A&D Company,Limited製),測定透明保護薄膜從偏光件薄膜剝離之90°剝離強度(N/15mm)。本測定中,將測定溫度設為25℃,剝離角度設為90°,剝離速度設為1000mm/分鐘。將測得之90°剝離強度作為剝離強度F 1顯示於表1。 <Peel Strength> The peel strength between the transparent protective film and the polarizer film in each of the laminated optical films of Examples 1 to 3 and Comparative Example 1 was investigated. First, a sample film having a size of 200 mm on the first side x 15 mm on the second side was cut out from the laminated optical film. The first side is a side extending along the extending direction of the polarizer film. The second side is a side extending in a direction perpendicular to the aforementioned extending direction. Next, the polarizer film side of the sample film was bonded to a glass plate through a strong adhesive. Next, the 90° peel strength (N/15mm) of the transparent protective film peeled from the polarizer film was measured with a TENSILON universal testing machine (product name "RTC", manufactured by A&D Company, Limited). In this measurement, the measurement temperature was 25° C., the peeling angle was 90°, and the peeling speed was 1000 mm/min. The measured 90° peel strength is shown in Table 1 as peel strength F 1 .

<壓痕彈性模數> 藉由奈米壓痕法調查實施例1~3及比較例1之各積層光學薄膜中之接著劑層之彈性模數。具體而言,首先從積層光學薄膜裁切出5mm×10mm尺寸之薄膜片(積層光學薄膜)。接著,利用凍結切片法切削積層光學薄膜。具體而言,係在將積層光學薄膜冷卻至-30℃後,以硬質切刀沿該薄膜之厚度方向上削,然後恢復至室溫。藉此,獲得測定用試料。接著,使用奈米壓痕試驗機(品名「TI950 Triboindenter」,Hysitron公司製),依循JIS Z 2255:2003對測定試料中之接著劑層之露出表面實施荷重-位移測定,而獲得荷重-位移曲線。本測定中,測定模式設為單一壓入測定,測定溫度設為25℃,使用壓頭係採用Berkovich(三角錐)型鑽石壓頭,荷重施加過程中壓頭對測定試料之最大壓痕深度(最大位移hmax)設為200nm,該壓頭之壓入速度設為10nm/秒,卸重過程中壓頭從測定試料拉出之拉出速度設為10nm/秒(第1測定條件)。然後,利用「TI950 Triboindenter」之專用解析軟體(Ver. 9.4.0.1)處理所得之測定數據。具體而言,依據所得之荷重(f)-位移(h)曲線獲得了:最大荷重fmax(以最大位移hmax作用於壓頭之荷重)、接觸投影面積S(在最大荷重時壓頭與試料之間的接觸區域的投影面積)、及在卸重開始時荷重-位移曲線之切線的斜率D。然後,從斜率D與接觸投影面積S算出接著劑層之壓痕彈性模數(=(π 1/2D)/(2S 1/2))。將該值作為壓痕彈性模數M 1(GPa)顯示於表1(壓痕彈性模數M 1係上述第1壓痕彈性模數)。又,亦將剝離強度F 1相對於壓痕彈性模數M 1之比率(F 1/M 1)顯示於表1。 <Indentation Elastic Modulus> The elastic modulus of the adhesive layer in each laminated optical film of Examples 1 to 3 and Comparative Example 1 was investigated by the nanoindentation method. Specifically, first, a film sheet (laminated optical film) with a size of 5 mm×10 mm is cut out from the laminated optical film. Next, the laminated optical film was cut by the frozen section method. Specifically, after cooling the laminated optical film to -30°C, use a hard cutter to cut upward along the thickness direction of the film, and then return to room temperature. Thereby, a sample for measurement is obtained. Next, use a nanoindentation tester (product name "TI950 Triboindenter", manufactured by Hysitron Corporation) to perform a load-displacement measurement on the exposed surface of the adhesive layer in the test sample in accordance with JIS Z 2255:2003, and obtain a load-displacement curve . In this measurement, the measurement mode is set to single indentation measurement, the measurement temperature is set to 25°C, the indenter used is a Berkovich (triangular pyramid) diamond indenter, and the maximum indentation depth of the indenter on the test sample during the load application process ( The maximum displacement (hmax) was set to 200 nm, the indenter's indentation speed was set to 10 nm/sec, and the indenter's pull-out speed from the measurement sample during unloading was set to 10 nm/sec (first measurement condition). Then, use the dedicated analysis software (Ver. 9.4.0.1) of "TI950 Triboindenter" to process the obtained measurement data. Specifically, according to the load (f)-displacement (h) curve obtained: the maximum load fmax (the load acting on the indenter with the maximum displacement hmax), the contact projected area S (the distance between the indenter and the sample at the maximum load) The projected area of the contact area between them), and the slope D of the tangent to the load-displacement curve at the beginning of unloading. Then, the indentation elastic modulus (=(π 1/2 D)/(2S 1/2 )) of the adhesive layer was calculated from the slope D and the contact projected area S. This value is shown in Table 1 as the indentation modulus M 1 (GPa) (the indentation modulus M 1 is the above-mentioned first indentation modulus). Also, Table 1 shows the ratio (F 1 /M 1 ) of the peel strength F 1 to the indentation elastic modulus M 1 .

另一方面,除了將最大壓痕深度從200nm變更成50nm外,依與第1測定條件相同之測定條件(第2測定條件)利用奈米壓痕儀實施荷重-位移測定。然後,利用「TI950 Triboindenter」之專用解析軟體(Ver. 9.4.0.1)處理所得之測定數據,算出接著劑層之壓痕彈性模數。將該值作為壓痕彈性模數M 2(GPa)顯示於表1(壓痕彈性模數M 2係上述第2壓痕彈性模數)。又,亦將剝離強度F 1相對於壓痕彈性模數M 2之比率(F 1/M 2)顯示於表1。 On the other hand, the load-displacement measurement was performed with a nanoindenter under the same measurement conditions (second measurement conditions) as the first measurement conditions except that the maximum indentation depth was changed from 200 nm to 50 nm. Then, use the special analysis software (Ver. 9.4.0.1) of "TI950 Triboindenter" to process the measured data to calculate the indentation elastic modulus of the adhesive layer. This value is shown in Table 1 as the indentation modulus M 2 (GPa) (the indentation modulus M 2 is the above-mentioned second indentation modulus). Also, Table 1 shows the ratio (F 1 /M 2 ) of the peel strength F 1 to the indentation elastic modulus M 2 .

<高溫高濕撓曲試驗> 針對實施例1~3及比較例1之各積層光學薄膜,依以下方式實施高溫高濕撓曲試驗。 <High temperature and high humidity flexural test> For each laminated optical film of Examples 1-3 and Comparative Example 1, a high-temperature and high-humidity flexural test was implemented in the following manner.

首先,製出評估用試樣。具體而言,首先貼合積層光學薄膜之偏光件薄膜的露出面與單面附剝離襯墊之黏著劑層的黏著劑表面。該貼合係在23℃之環境下,藉由使2kg滾筒來回1次之操作來壓接積層光學薄膜之偏光件薄膜表面與黏著劑層表面(後述之貼合亦以相同條件來實施)。接著,從黏著劑層剝離剝離襯材後,以獲得露出之黏著片露出面,於該露出面貼合聚對苯二甲酸乙二酯(PET)薄膜(品名「DIAFOIL」,厚度125µm,Mitsubishi Chemical Co.製)。藉此,獲得多層薄膜。上述單面附剝離襯材之黏著劑層係依以下方式製出者。First, samples for evaluation were produced. Specifically, first, the exposed surface of the polarizer film of the laminated optical film and the adhesive surface of the adhesive layer with a release liner attached to one side are bonded together. The lamination was carried out under the environment of 23°C by making a 2kg roller reciprocate once to crimp the surface of the polarizer film and the surface of the adhesive layer of the laminated optical film (the lamination described later was also carried out under the same conditions). Next, after the release liner is peeled off from the adhesive layer, the exposed surface of the adhesive sheet is obtained, and a polyethylene terephthalate (PET) film (product name "DIAFOIL", thickness 125 µm, Mitsubishi Chemical Co., Ltd. Co. Manufactured). Thereby, a multilayer film is obtained. The adhesive layer of the above-mentioned single-sided release liner is produced in the following manner.

首先,在具備回流冷卻管、氮導入管、溫度計及攪拌機之反應容器內,將包含丙烯酸正丁酯100質量份、丙烯酸3質量份、丙烯酸2-羥乙酯0.1質量份、作為熱聚合引發劑之2,2'-偶氮雙異丁腈0.3質量份及作為溶劑之乙酸乙酯的混合物,在55℃下、於氮氣環境下攪拌8小時(聚合反應)。藉此,獲得含有丙烯酸基底聚合物之聚合物溶液。該聚合物溶液中,丙烯酸基底聚合物之重量平均分子量為約220萬。接著,對於聚合物溶液,以丙烯酸基底聚合物每100質量份,加入交聯劑(品名「CORONATE L」,日本Polyurethane製)0.5質量份與矽烷耦合劑(品名「KMB-403」,γ-環氧丙氧基丙基三甲氧基矽烷,信越化學工業製)0.075質量份並混合,而調製出黏著劑溶液。接著,將黏著劑溶液塗佈於剝離襯材之剝離處理面上而形成塗膜(厚度20µm)。該剝離襯材係施行有預定之剝離處理的聚對苯二甲酸乙二酯薄膜(厚度38µm)。接著,將剝離襯材上之塗膜乾燥而形成黏著劑層。First, 100 parts by mass of n-butyl acrylate, 3 parts by mass of acrylic acid, and 0.1 parts by mass of 2-hydroxyethyl acrylate were used as thermal polymerization initiators in a reaction vessel equipped with a reflux cooling pipe, a nitrogen introduction pipe, a thermometer, and a stirrer. A mixture of 0.3 parts by mass of 2,2'-azobisisobutyronitrile and ethyl acetate as a solvent was stirred at 55° C. for 8 hours under a nitrogen atmosphere (polymerization reaction). Thereby, a polymer solution containing an acrylic base polymer was obtained. In the polymer solution, the weight average molecular weight of the acrylic base polymer was about 2.2 million. Next, for the polymer solution, 0.5 parts by mass of a crosslinking agent (product name "CORONATE L", manufactured by Japan Polyurethane) and a silane coupling agent (product name "KMB-403", γ-ring 0.075 parts by mass of oxypropoxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd.) were mixed to prepare an adhesive solution. Next, the adhesive solution was coated on the release-treated surface of the release liner to form a coating film (thickness: 20 µm). The release liner is a polyethylene terephthalate film (thickness 38 µm) with a predetermined release treatment. Next, the coating film on the release liner is dried to form an adhesive layer.

製作評估用試樣時,接著從依上述方式準備之多層薄膜裁切出評估用試樣。具體而言,以使要裁切出之試樣中偏光件薄膜之吸收軸方向與長邊方向平行之方式,從積層薄膜裁切出25mm×100mm之矩形試樣。When producing a sample for evaluation, the sample for evaluation is then cut out from the multilayer film prepared in the above-mentioned manner. Specifically, a rectangular sample of 25 mm×100 mm was cut out from the laminated film so that the absorption axis direction of the polarizer film in the sample to be cut out was parallel to the longitudinal direction.

接著,針對該試樣,藉由面狀體無負荷U字伸縮試驗機(YUASA SYSTEM機器製)實施了撓曲試驗。本試驗中,係分別對試樣之長邊方向的兩端部,於距離試樣端緣20mm之範圍安裝撓曲治具後,將試樣固定於試驗機(試樣之長邊方向的中央60mm之區域呈未固定之狀態)。又,本試驗中,係在溫度60℃及相對濕度90%之條件的恆溫恆濕槽內,以撓曲速度60rpm,使試樣在偏光件薄膜側之面成為內側之撓曲形態與非撓曲形態之間,反覆變形(撓曲)20萬次。本試驗中之撓曲形態具體上係指作用於試樣之彎曲力矩的軸方向與偏光件薄膜之吸收軸方向正交之形態。在該撓曲形態中,試樣之彎曲半徑設為3mm,彎曲角度設為180°。然後,針對所述撓曲試驗中之薄膜(透明保護薄膜、偏光件薄膜)間的剝落抑制性,將撓曲次數達20萬而於薄膜間未發生剝落之情況評估為"優",將撓曲次數8萬以上且少於20萬有發生剝落之情況評估為"佳",且將撓曲次數少於8萬有發生剝落之情況評估為"不佳"。將該評估結果顯示於表1。Next, about this sample, the flexure test was implemented with the planar object no-load U-shaped stretching tester (manufactured by YUASA SYSTEM). In this test, the two ends of the long side direction of the sample are respectively installed with flexure fixtures within 20 mm from the end edge of the sample, and then the sample is fixed on the testing machine (the center of the long side direction of the sample is The 60mm area is not fixed). Also, in this test, in a constant temperature and humidity chamber under the conditions of a temperature of 60°C and a relative humidity of 90%, at a deflection speed of 60 rpm, the surface of the sample on the polarizer film side becomes the inside of the deflected form and the non-flexed form. Between the curved forms, the deformation (deflection) is repeated 200,000 times. The deflection form in this test specifically refers to the form in which the axial direction of the bending moment acting on the sample is perpendicular to the absorption axis direction of the polarizer film. In this flexure form, the bending radius of the sample was set to 3 mm, and the bending angle was set to 180°. Then, with regard to the peeling inhibition between the films (transparent protective film, polarizer film) in the flexure test, the case where the number of flexures reached 200,000 without peeling between the films was evaluated as "excellent", and the flexure was evaluated as "excellent". When the number of flexures was more than 80,000 and less than 200,000, peeling was evaluated as "good", and when the number of flexures was less than 80,000, peeling was evaluated as "poor". Table 1 shows the evaluation results.

[表1]

Figure 02_image001
[Table 1]
Figure 02_image001

X,X':積層光學薄膜 10:光學薄膜(第1光學薄膜) 20:接著劑層 30:光學薄膜(第2光學薄膜) 31:邊界區域 32:非邊界區域 40:接著劑原料成分含有部 H:厚度方向 T1:接著劑層之厚度 T2:接著劑原料成分含有部之厚度 X,X': laminated optical film 10: Optical film (1st optical film) 20: Adhesive layer 30: Optical film (2nd optical film) 31: Boundary area 32: Non-boundary area 40: Adhesive raw material ingredients containing part H: Thickness direction T1: The thickness of the adhesive layer T2: The thickness of the part containing the raw material components of the adhesive

圖1係本發明積層光學薄膜之一實施形態的截面示意圖。 圖2係圖1所示之積層光學薄膜的部分放大截面圖。 圖3係本發明積層光學薄膜之其他實施形態的截面示意圖。本實施形態之積層光學薄膜於厚度方向上依序具備第2光學薄膜、接著劑層、第1光學薄膜、接著劑層及第2光學薄膜。 Fig. 1 is a schematic cross-sectional view of an embodiment of the laminated optical film of the present invention. Fig. 2 is a partially enlarged cross-sectional view of the laminated optical film shown in Fig. 1 . Fig. 3 is a schematic cross-sectional view of another embodiment of the laminated optical film of the present invention. The laminated optical film of this embodiment includes a second optical film, an adhesive layer, a first optical film, an adhesive layer, and a second optical film in order in the thickness direction.

X:積層光學薄膜 X:Laminated optical film

10:光學薄膜(第1光學薄膜) 10: Optical film (1st optical film)

20:接著劑層 20: Adhesive layer

30:光學薄膜(第2光學薄膜) 30: Optical film (2nd optical film)

H:厚度方向 H: Thickness direction

Claims (4)

一種積層光學薄膜,係於厚度方向上依序具備第1光學薄膜、接著劑層及第2光學薄膜者; 前述接著劑層係與前述第1光學薄膜接合,且與前述第2光學薄膜接合; 前述第2光學薄膜於前述接著劑層側具有邊界區域,該邊界區域含有源自前述接著劑層之接著劑原料成分;並且 接著劑原料成分含有部之厚度T2相對於前述接著劑層之厚度T1的比率為1.01以上,該接著劑原料成分含有部係前述接著劑層與前述邊界區域合併而成之部分。 A laminated optical film comprising a first optical film, an adhesive layer and a second optical film sequentially in the thickness direction; The aforementioned adhesive layer is bonded to the aforementioned first optical film and bonded to the aforementioned second optical film; The second optical film has a boundary region on the side of the adhesive layer, and the boundary region contains an adhesive raw material component derived from the adhesive layer; and The ratio of the thickness T2 of the adhesive raw material component containing portion to the thickness T1 of the adhesive layer is 1.01 or more. The adhesive raw material component containing portion is a portion formed by combining the adhesive layer and the boundary region. 如請求項1之積層光學薄膜,其中前述厚度T1為5µm以下。The laminated optical film according to claim 1, wherein the aforementioned thickness T1 is 5 µm or less. 如請求項1之積層光學薄膜,其中前述第2光學薄膜在25℃下對前述第1光學薄膜之90°剝離強度為0.8N/15mm以上。The laminated optical film according to claim 1, wherein the 90° peel strength of the second optical film against the first optical film at 25°C is 0.8 N/15mm or more. 如請求項1至3中任一項之積層光學薄膜,其中前述第1光學薄膜為偏光件薄膜。The laminated optical film according to any one of claims 1 to 3, wherein the first optical film is a polarizer film.
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