TW202306947A - 感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子元件之製造方法及化合物 - Google Patents
感光化射線性或感放射線性樹脂組成物、光阻膜、圖案形成方法、電子元件之製造方法及化合物 Download PDFInfo
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- C07D327/02—Heterocyclic compounds containing rings having oxygen and sulfur atoms as the only ring hetero atoms one oxygen atom and one sulfur atom
- C07D327/06—Six-membered rings
- C07D327/08—[b,e]-condensed with two six-membered carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
- C07D335/02—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
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- Materials For Photolithography (AREA)
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| DE3277036D1 (en) * | 1981-04-22 | 1987-09-24 | Eastman Kodak Co | Condensation polymeric photoconductors containing pendant arylamines, photoconductive compositions and electrophotographic elements containing these photoconductors |
| JP4281410B2 (ja) | 2002-05-21 | 2009-06-17 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| JP2013061648A (ja) | 2011-09-09 | 2013-04-04 | Rohm & Haas Electronic Materials Llc | フォトレジスト上塗り組成物および電子デバイスを形成する方法 |
| JP5740322B2 (ja) | 2012-02-06 | 2015-06-24 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いた感活性光線性又は感放射線性膜及びパターン形成方法、半導体デバイスの製造方法及び半導体デバイス、並びに、化合物 |
| JP6075369B2 (ja) | 2012-03-14 | 2017-02-08 | Jsr株式会社 | フォトレジスト組成物、レジストパターン形成方法及び酸拡散制御剤 |
| JP5830493B2 (ja) * | 2012-06-27 | 2015-12-09 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いた感活性光線性又は感放射線性膜、パターン形成方法及び半導体デバイスの製造方法 |
| JP5850873B2 (ja) | 2012-07-27 | 2016-02-03 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| JP5836299B2 (ja) | 2012-08-20 | 2015-12-24 | 富士フイルム株式会社 | パターン形成方法、感電子線性又は感極紫外線性樹脂組成物、及びレジスト膜、並びに、これらを用いた電子デバイスの製造方法 |
| JP6002705B2 (ja) | 2013-03-01 | 2016-10-05 | 富士フイルム株式会社 | パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、電子デバイスの製造方法 |
| JP6027934B2 (ja) * | 2013-03-29 | 2016-11-16 | 富士フイルム株式会社 | 化合物、感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び、これらを用いた電子デバイスの製造方法 |
| JP5799050B2 (ja) * | 2013-03-29 | 2015-10-21 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、それを用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
| JP5676021B2 (ja) | 2014-01-06 | 2015-02-25 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
| US9644056B2 (en) | 2015-02-18 | 2017-05-09 | Sumitomo Chemical Company, Limited | Compound, resin and photoresist composition |
| JP6518475B2 (ja) | 2015-03-20 | 2019-05-22 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、酸発生剤及び化合物 |
| WO2018019395A1 (en) | 2016-07-27 | 2018-02-01 | Refco Manufacturing Ltd. | Water handling device |
| JP7002537B2 (ja) | 2017-04-21 | 2022-01-20 | 富士フイルム株式会社 | Euv光用感光性組成物、パターン形成方法、電子デバイスの製造方法 |
| KR102537251B1 (ko) | 2018-06-28 | 2023-05-26 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 전자 디바이스의 제조 방법, 수지 |
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| KR102634581B1 (ko) | 2019-01-28 | 2024-02-08 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 레지스트막, 패턴 형성 방법, 전자 디바이스의 제조 방법 |
| JP7378124B2 (ja) | 2019-10-29 | 2023-11-13 | 吉川工業株式会社 | 鋼板の自動ガス切断システム |
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