TW202301304A - Display device and manufacturing method thereof - Google Patents
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本發明是有關於一種顯示裝置及其製造方法,且特別是有關於一種拼接型顯示裝置(tiled display device)及其製造方法。The present invention relates to a display device and a manufacturing method thereof, and in particular to a tiled display device and a manufacturing method thereof.
現有的拼接型顯示裝置是由多個顯示組件拼裝而成,其中這些顯示組件能顯示子影像(sub-image),而拼接型顯示裝置所顯示的影像是由這些子影像拼接而形成。一般而言,相鄰兩個顯示組件之間難免會存有間隙,而大部分的拼接型顯示裝置通常會受到上述間隙的影響,以至於現有的拼接型顯示裝置所顯示的影像會清楚地呈現由間隙所形成的拼接縫(seam),從而降低影像品質。The existing spliced display device is assembled by a plurality of display components, wherein these display components can display sub-images, and the image displayed by the spliced display device is formed by splicing these sub-images. Generally speaking, there is inevitably a gap between two adjacent display components, and most of the spliced display devices are usually affected by the above gap, so that the images displayed by the existing spliced display devices can be clearly presented A seam formed by gaps that degrades image quality.
本發明至少一實施例提供一種顯示裝置,其包括多個顯示組件,其中各個顯示組件能產生子畫面,以使顯示裝置能顯示影像。At least one embodiment of the present invention provides a display device, which includes a plurality of display components, wherein each display component can generate a sub-frame, so that the display device can display images.
本發明至少一實施例提供一種顯示裝置的製造方法,以製造上述顯示裝置。At least one embodiment of the present invention provides a method for manufacturing a display device to manufacture the above-mentioned display device.
本發明至少一實施例所提供的顯示裝置的製造方法包括在支撐基板上形成多個貫孔,其中支撐基板具有第一表面以及相對第一表面的第二表面,而這些貫孔從第一表面延伸至第二表面。在這些貫孔內分別形成多個導電材料。之後,在第一表面上形成線路結構層,其中線路結構層電性連接這些導電材料。之後,在線路結構層上設置多個發光元件,其中這些發光元件電性連接線路結構層。在這些發光元件設置在線路結構層上之後,將支撐基板設置在控制基板上,以形成顯示組件,其中這些導電材料電性連接控制基板,以使控制基板電性連接這些發光元件。之後,將多個顯示組件設置在承載基板上。The method for manufacturing a display device provided by at least one embodiment of the present invention includes forming a plurality of through holes on a support substrate, wherein the support substrate has a first surface and a second surface opposite to the first surface, and the through holes are formed from the first surface extends to the second surface. A plurality of conductive materials are respectively formed in the through holes. Afterwards, a circuit structure layer is formed on the first surface, wherein the circuit structure layer is electrically connected to these conductive materials. Afterwards, a plurality of light-emitting elements are disposed on the circuit structure layer, wherein the light-emitting elements are electrically connected to the circuit structure layer. After the light emitting elements are disposed on the circuit structure layer, the supporting substrate is disposed on the control substrate to form a display assembly, wherein the conductive materials are electrically connected to the control substrate so that the control substrate is electrically connected to the light emitting elements. Afterwards, a plurality of display components are arranged on the carrier substrate.
在本發明至少一實施例中,在支撐基板上形成這些貫孔的步驟包括令雷射光束照射於支撐基板。在雷射光束照射於支撐基板之後,蝕刻支撐基板,以移除被雷射光束所照射的部分支撐基板。In at least one embodiment of the present invention, the step of forming the through holes on the supporting substrate includes irradiating a laser beam on the supporting substrate. After the laser beam is irradiated on the support substrate, the support substrate is etched to remove a portion of the support substrate irradiated by the laser beam.
在本發明至少一實施例中,在這些貫孔內分別形成這些導電材料的方法包括電鍍或印刷填孔。In at least one embodiment of the present invention, the method of forming the conductive materials in the through holes includes electroplating or printing filling holes.
在本發明至少一實施例中,在第一表面上形成線路結構層以前,多個支撐基板整合成支撐聯板。在第一表面上形成線路結構層以後,切割支撐聯板,以分離這些支撐基板。In at least one embodiment of the present invention, before the circuit structure layer is formed on the first surface, a plurality of support substrates are integrated into a support link. After the wiring structure layer is formed on the first surface, the supporting bracket is cut to separate the supporting substrates.
在本發明至少一實施例中,將這些顯示組件設置在承載基板上的步驟包括提供多個固定基板。將至少一個顯示組件設置在其中一塊固定基板上。將這些固定基板設置在承載基板上。In at least one embodiment of the invention, the step of arranging the display components on a carrier substrate includes providing a plurality of fixed substrates. At least one display component is arranged on one of the fixed substrates. These fixed substrates are placed on the carrier substrate.
本發明至少一實施例所提供的顯示裝置包括承載基板與多個顯示組件。這些顯示組件設置在承載基板上,並規則排列在承載基板上。各個顯示組件包括控制基板、支撐基板、多個導電材料、線路結構層以及多個發光元件。控制基板設置在承載基板上。支撐基板具有第一表面、相對第一表面的第二表面以及多個貫孔,其中這些貫孔從第一表面延伸至第二表面。支撐基板設置在控制基板上。這些導電材料分別位在這些貫孔內,並電性連接控制基板。線路結構層設置在第一表面上,並電性連接這些導電材料,其中支撐基板位於線路結構層與控制基板之間。這些發光元件設置在線路結構層上,並電性連接線路結構層。A display device provided by at least one embodiment of the present invention includes a carrier substrate and a plurality of display components. These display components are arranged on the carrier substrate and arranged regularly on the carrier substrate. Each display component includes a control substrate, a supporting substrate, a plurality of conductive materials, a circuit structure layer and a plurality of light emitting elements. The control substrate is arranged on the carrier substrate. The support substrate has a first surface, a second surface opposite to the first surface, and a plurality of through holes, wherein the through holes extend from the first surface to the second surface. The support substrate is provided on the control substrate. The conductive materials are respectively located in the through holes and are electrically connected to the control substrate. The circuit structure layer is arranged on the first surface and is electrically connected to these conductive materials, wherein the supporting substrate is located between the circuit structure layer and the control substrate. These light-emitting elements are arranged on the circuit structure layer and electrically connected to the circuit structure layer.
在本發明至少一實施例中,上述支撐基板的尺寸大於控制基板的尺寸。In at least one embodiment of the present invention, the size of the support substrate is larger than the size of the control substrate.
在本發明至少一實施例中,上述控制基板包括主動元件陣列基板與電路基板。主動元件陣列基板具有上表面、下表面與位於上表面與下表面之間的側面,其中支撐基板設置在上表面上,並完全覆蓋上表面,而支撐基板凸出於側面。電路基板電性連接主動元件陣列基板。In at least one embodiment of the present invention, the control substrate includes an active device array substrate and a circuit substrate. The active element array substrate has an upper surface, a lower surface and a side surface between the upper surface and the lower surface, wherein the support substrate is arranged on the upper surface and completely covers the upper surface, and the support substrate protrudes from the side surface. The circuit substrate is electrically connected to the active device array substrate.
在本發明至少一實施例中,上述電路基板設置於主動元件陣列基板的側面。In at least one embodiment of the present invention, the circuit substrate is disposed on a side surface of the active device array substrate.
在本發明至少一實施例中,上述電路基板設置於主動元件陣列基板的下表面。In at least one embodiment of the present invention, the circuit substrate is disposed on the lower surface of the active device array substrate.
在本發明至少一實施例中,至少一個貫孔具有位於第一表面的第一開口與位於第二表面的第二開口。第一開口具有第一孔徑,而第二開口具有第二孔徑,其中貫孔在第一開口與第二開口之間具有第三孔徑,而第一孔徑與第二孔徑任一者大於第三孔徑。In at least one embodiment of the present invention, at least one through hole has a first opening on the first surface and a second opening on the second surface. The first opening has a first aperture, and the second opening has a second aperture, wherein the through hole has a third aperture between the first opening and the second opening, and either the first aperture or the second aperture is larger than the third aperture .
在本發明至少一實施例中,上述貫孔更具有中央段,而第三孔徑位於中央段。第一孔徑與第二孔徑其中至少一者為貫孔的最大孔徑,而第三孔徑為貫孔的最小孔徑,其中第三孔徑與最大孔徑之間的比值介於0.6與0.9之間。In at least one embodiment of the present invention, the through hole further has a central section, and the third aperture is located in the central section. At least one of the first aperture and the second aperture is the maximum aperture of the through hole, and the third aperture is the minimum aperture of the through hole, wherein the ratio between the third aperture and the maximum aperture is between 0.6 and 0.9.
在本發明至少一實施例中,相鄰兩個支撐基板之間的距離在400微米(μm)以內。In at least one embodiment of the present invention, the distance between two adjacent supporting substrates is within 400 micrometers (μm).
在本發明至少一實施例中,上述顯示裝置還包括多個固定基板。這些固定基板設置在承載基板上,其中這些顯示組件分別設置在這些固定基板上,而這些固定基板位於這些顯示組件與承載基板之間。In at least one embodiment of the present invention, the display device further includes a plurality of fixed substrates. The fixed substrates are arranged on the carrier substrate, wherein the display components are respectively arranged on the fixed substrates, and the fixed substrates are located between the display components and the carrier substrate.
基於上述,各個顯示組件能利用這些發光元件來產生子畫面。如此,顯示裝置得以顯示影像。Based on the above, each display component can utilize these light-emitting elements to generate sprites. In this way, the display device can display images.
在以下的內文中,為了清楚呈現本案的技術特徵,圖式中的元件(例如層、膜、基板以及區域等)的尺寸(例如長度、寬度、厚度與深度)會以不等比例的方式放大。因此,下文實施例的說明與解釋不受限於圖式中的元件所呈現的尺寸與形狀,而應涵蓋如實際製程及/或公差所導致的尺寸、形狀以及兩者的偏差。例如,圖式所示的平坦表面可以具有粗糙及/或非線性的特徵,而圖式所示的銳角可以是圓的。所以,本案圖式所呈示的元件主要是用於示意,並非旨在精準地描繪出元件的實際形狀,也非用於限制本案的申請專利範圍。In the following text, in order to clearly present the technical features of this application, the dimensions (such as length, width, thickness, and depth) of elements (such as layers, films, substrates, and regions) in the drawings will be enlarged in a non-proportional manner . Therefore, the description and explanation of the following embodiments are not limited to the size and shape of the elements in the drawings, but should cover the deviations in size, shape and both caused by actual manufacturing process and/or tolerances. For example, a planar surface shown in the drawings may have rough and/or non-linear features, while acute angles shown in the drawings may be rounded. Therefore, the components shown in the drawings of this case are mainly for illustration, and are not intended to accurately depict the actual shape of the components, nor are they used to limit the scope of the patent application of this case.
其次,本案內容中所出現的「約」、「近似」或「實質上」等這類用字不僅涵蓋明確記載的數值與數值範圍,而且也涵蓋發明所屬技術領域中具有通常知識者所能理解的可允許偏差範圍,其中此偏差範圍可由測量時所產生的誤差來決定,而此誤差例如是起因於測量系統或製程條件兩者的限制。舉例而言,兩物件(例如基板的平面或走線)「實質上平行」或「實質上垂直」,其中「實質上平行」與「實質上垂直」分別代表這兩物件之間的平行與垂直可包括允許偏差範圍所導致的不平行與不垂直。Secondly, words such as "about", "approximately" or "substantially" appearing in the content of this case not only cover the clearly stated values and numerical ranges, but also cover The allowable deviation range, wherein the deviation range can be determined by the error generated during the measurement, and the error is caused by the limitation of the measurement system or process conditions, for example. For example, two objects (such as a plane or trace of a substrate) are "substantially parallel" or "substantially perpendicular", where "substantially parallel" and "substantially perpendicular" represent the parallel and perpendicular between the two objects, respectively. May include non-parallel and non-perpendicular due to tolerance range.
此外,「約」可表示在上述數值的一個或多個標準偏差內,例如±30%、±20%、±10%或±5%內。本案文中所出現的「約」、「近似」或「實質上」等這類用字可依光學性質、蝕刻性質、機械性質或其他性質來選擇可以接受的偏差範圍或標準偏差,並非單以一個標準偏差來套用以上光學性質、蝕刻性質、機械性質以及其他性質等所有性質。Additionally, "about" can mean within one or more standard deviations of the above numerical values, eg, within ±30%, ±20%, ±10%, or ±5%. Words such as "about", "approximately" or "substantially" appearing in this text can choose the acceptable deviation range or standard deviation according to optical properties, etching properties, mechanical properties or other properties, not a single The standard deviation is used to apply all properties such as the above optical properties, etching properties, mechanical properties and other properties.
圖1A是本發明至少一實施例的顯示裝置的剖面示意圖。請參閱圖1A,顯示裝置100包括承載基板110與多個顯示組件120,其中這些顯示組件120設置並且規則排列在承載基板110上。例如,這些顯示組件120可以呈矩陣排列。承載基板110可以是剛性基板,例如金屬板、玻璃板或陶瓷板,並能承載這些顯示組件120。FIG. 1A is a schematic cross-sectional view of a display device according to at least one embodiment of the present invention. Referring to FIG. 1A , the
在本實施例中,這些顯示組件120可以利用膠材130而設置在承載基板110上,以使這些顯示組件120能固定在承載基板110上。此外,除了膠材130以外,顯示組件120也可以採用其他手段而設置在承載基板110上。因此,顯示組件120不限制僅用膠材130設置在承載基板110上。In this embodiment, the
各個顯示組件120包括支撐基板121與控制基板122,其中支撐基板121設置在控制基板122上,而控制基板122設置在承載基板110上。所以,控制基板122位在承載基板110與支撐基板121之間。支撐基板121具有第一表面121a、相對第一表面121a的第二表面121b以及多個貫孔121h,其中這些貫孔121h從第一表面121a延伸至第二表面121b。Each
支撐基板121可以是剛性基板或柔性基板。具體而言,當支撐基板121為剛性基板時,支撐基板121可以是玻璃板或陶瓷板。當支撐基板121為柔性基板時,支撐基板121可以是高分子基板,其材料例如是聚醯亞胺(Polyimide,PI)或聚對苯二甲酸乙二酯(Polyethylene Terephthalate,PET)。The
各個顯示組件120還包括多個導電材料123,其中這些導電材料123分別位在這些貫孔121h內,並連接控制基板122。導電材料123可為金屬材料,例如銅或銀膠,並可填滿貫孔121h。各個顯示組件120還包括設置在第一表面121a上的線路結構層124,所以支撐基板121會位於線路結構層124與控制基板122之間,其中線路結構層124電性連接這些導電材料123。此外,線路結構層124可以用於傳輸汲極電源電壓(Vdd)、源極電源電壓(Vss),並且包括多個接墊124y。Each
線路結構層124可以包括多層膜層。以圖1A為例,線路結構層124可包括多層線路層124w、絕緣層124d以及平坦層124x,其中這些線路層124w、絕緣層124d與平坦層124x彼此堆疊,而絕緣層124d與平坦層124x位於兩層線路層124w之間,以使這些線路層124w能被絕緣層124d與平坦層124x隔開。The
線路結構層124還可以包括多個導電柱124p,其中這些導電柱124p位於絕緣層124d與平坦層124x中,並連接這些線路層124w,以使這些線路層124w能透過導電柱124p而彼此電性連接。其中一層線路層124w,例如圖1A中位於下方的線路層124w,會電性連接導電材料123,以使線路結構層124電性連接這些導電材料123。The
各個顯示組件120還包括多個發光元件125,其中這些發光元件125設置在線路結構層124上,並可呈規則排列,例如矩陣排列。這些發光元件125電性連接線路結構層124,並且是電性連接線路結構層124的其中一層線路層124w。以圖1A為例,位在上方的線路層124w可包括多個接墊124y,而各個發光元件125可以透過焊接(Soldering)或異方向性導電膜(Anisotropic Conductive Film,ACF)而電性連接至少兩個接墊124y。Each
發光元件125可以是發光二極體(Light Emitting Diode,LED),例如微型發光二極體(Micro-LED)、次毫米發光二極體(Mini-LED)或是尺寸大於次毫米發光二極體的發光二極體。此外,發光元件125也可以是水平式發光二極體(如圖1A所示)或垂直式發光二極體。因此,各個發光元件125的電極(未標示,例如陰極與陽極)可以位在發光元件125的同一側或是分別位於相對兩側。The
值得一提的是,在圖1A所示的實施例中,線路結構層124可包括兩層線路層124w,而在其他實施例中,線路結構層124可包括三層以上的線路層124w。因此,線路結構層124可包括至少兩層線路層124w,而線路結構層124所包括的線路層124w的數量不限制為兩層。It is worth mentioning that, in the embodiment shown in FIG. 1A , the
在本實施例中,這些發光元件125能發出多種色光。例如,這些發光元件125可以包括多個紅光發光二極體、多個綠光發光二極體以及多個藍光發光二極體,以使這些發光元件125能發出紅光、綠光以及藍光。利用這些發光元件125所發出的色光(例如紅光、綠光與藍光),各個顯示組件120可以產生子畫面,以使顯示裝置100能顯示影像。此外,顯示組件120還可以包括保護層129,其中保護層129可以設置在線路結構層124上,並且覆蓋這些發光元件125,以保護這些發光元件125。In this embodiment, these
值得一提的是,在其他實施例中,這些發光元件125也可以發出單一種色光,例如藍光,其中此藍光可經由色轉換材料,例如量子點材料或螢光粉材料,轉換成其他種色光,例如紅光或綠光。因此,即使這些發光元件125發出單一種色光(例如藍光),透過上述色轉換材料,也能產生多種色光(例如紅光與綠光),以使顯示裝置100能顯示影像。It is worth mentioning that, in other embodiments, these
由於這些線路層124w能透過導電柱124p而彼此電性連接,而且線路結構層124電性連接這些導電材料123,因此這些發光元件125能透過線路結構層124而電性連接支撐基板121中的這些導電材料123。這些導電材料123連接控制基板122,以使這些發光元件125更能透過這些導電材料123而電性連接控制基板122。Because these
控制基板122可以包括主動元件陣列基板122a與電路基板122c,其中電路基板122c電性連接主動元件陣列基板122a。主動元件陣列基板122a具有上表面S11、下表面S12與側面S13,其中側面S13位於上表面S11與下表面S12之間,而電路基板122c可設置於側面S13(如圖1A所示)或下表面S12。電路基板122c可以是印刷電路板、軟性電路板或軟硬複合電路板,並且已裝設(mounted)至少一個晶片(未繪示)。當電路基板122c為軟性電路板或軟硬複合電路板時,上述晶片可透過覆晶薄膜封裝(Chip On Film,COF)裝設在軟性電路板或軟硬複合電路板上。The
支撐基板121設置在上表面S11上,而支撐基板121內的導電材料123連接主動元件陣列基板122a。從圖1A來看,支撐基板121的尺寸大於控制基板122的尺寸,其中支撐基板121的寬度L21可以大於主動元件陣列基板122a的寬度L22。如此,支撐基板121可以完全覆蓋主動元件陣列基板122a的上表面S11,並且凸出於側面S13,如圖1A所示。The supporting
圖1B是圖1A中其中一個顯示組件的局部放大示意圖。請參閱圖1A與圖1B,主動元件陣列基板122a可包括基板22a與多個控制元件T22,其中這些控制元件T22形成在基板22a上。基板22a可以相似於支撐基板121,且可以是剛性基板或柔性基板,例如玻璃板、陶瓷板或高分子基板,其中高分子基板的材料例如是聚醯亞胺(PI)或聚對苯二甲酸乙二酯(PET)。FIG. 1B is a partially enlarged schematic view of one of the display components in FIG. 1A . Referring to FIG. 1A and FIG. 1B , the active
在本實施例中,控制元件T22可為薄膜電晶體,而各個控制元件T22可包括閘極G22、源極S22、汲極D22與通道層C22,其中閘極G22、源極S22與汲極D22可皆為金屬層,而通道層C22為半導體層。通道層C22形成在基板22a上,而閘極G22位於通道層C22的上方,但不接觸通道層C22。源極S22與汲極D22形成在通道層C22上,並且電性連接通道層C22。In this embodiment, the control element T22 can be a thin film transistor, and each control element T22 can include a gate G22, a source S22, a drain D22 and a channel layer C22, wherein the gate G22, the source S22 and the drain D22 All may be metal layers, and the channel layer C22 is a semiconductor layer. The channel layer C22 is formed on the
主動元件陣列基板122a還可以包括多層絕緣層IN1、IN2、IN3與IN4,其中這些絕緣層IN1、IN2、IN3與IN4皆堆疊在基板22a上。絕緣層IN1可以形成在基板22a上,並且覆蓋通道層C22。閘極G22形成在絕緣層IN1上,並位於通道層C22的正上方,以使閘極G22、通道層C22以及位於閘極G22與通道層C22之間的部分絕緣層IN1能形成電容。The active
絕緣層IN2形成在絕緣層IN1上,並且覆蓋閘極G22,其中源極S22的一部分以及汲極D22的一部分皆位在絕緣層IN2上,而源極S22的另一部分以及汲極D22的另一部分皆穿透絕緣層IN2與IN1,以使源極S22與汲極D22皆能電性連接通道層C22。此外,源極S22與汲極D22皆不電性連接閘極G22,以使源極S22與汲極D22皆與閘極G22電性絕緣。The insulating layer IN2 is formed on the insulating layer IN1 and covers the gate G22, wherein a part of the source S22 and a part of the drain D22 are located on the insulating layer IN2, and another part of the source S22 and another part of the drain D22 Both penetrate the insulating layers IN2 and IN1, so that both the source S22 and the drain D22 can be electrically connected to the channel layer C22. In addition, neither the source S22 nor the drain D22 is electrically connected to the gate G22, so that both the source S22 and the drain D22 are electrically insulated from the gate G22.
絕緣層IN3形成在絕緣層IN2上,並覆蓋源極S22與汲極D22,而絕緣層IN4形成在絕緣層IN3上,其中絕緣層IN4可為平坦層。此外,在其他實施例中,絕緣層IN3與IN4可以是一體成型。例如,絕緣層IN3可被省略,而絕緣層IN4可被保留,並且可以覆蓋源極S22、汲極D22以及絕緣層IN2。The insulating layer IN3 is formed on the insulating layer IN2 and covers the source S22 and the drain D22 , and the insulating layer IN4 is formed on the insulating layer IN3 , wherein the insulating layer IN4 can be a planar layer. In addition, in other embodiments, the insulating layers IN3 and IN4 can be integrally formed. For example, the insulating layer IN3 may be omitted, while the insulating layer IN4 may remain and cover the source S22 , the drain D22 and the insulating layer IN2 .
主動元件陣列基板122a還可包括多個電極E22,其中這些電極E22分別電性連接這些汲極D22。具體而言,各個電極E22的一部分位在絕緣層IN4上,而另一部分則穿透絕緣層IN4與IN3連接於汲極D22,以使電極E22能電性連接汲極D22。如此,這些控制元件T22能控制輸入至這些電極E22的電能。The active
這些電極E22分別電性連接這些導電材料123,所以這些電極E22能透過這些導電材料123而電性連接線路結構層124。因此,這些電極E22能經由這些導電材料123與線路結構層124而電性連接這些發光元件125。如此,這些控制元件T22能分別電性連接這些發光元件125,以控制輸入至發光元件125的電能,進而控制各個發光元件125的亮度,讓顯示裝置100得以顯示影像。由此可知,顯示裝置100所顯示的影像是由這些發光元件125所發出的光線而形成。The electrodes E22 are respectively electrically connected to the
由於支撐基板121的尺寸大於控制基板122的尺寸,而且支撐基板121能完全覆蓋上表面S11,並凸出於側面S13,因此支撐基板121、控制基板122與承載基板110能形成可供電路基板122c容置的空間(未標示),以使這些支撐基板121基本上不受電路基板122c的影響而能彼此緊鄰(close to)或緊靠(abutting),其中控制相鄰兩個支撐基板121之間的距離D1可以控制在400微米以內。Since the size of the
由於顯示裝置100顯示的影像是由這些發光元件125所發出的光線而形成,而在同一個顯示組件120中,支撐基板121位在控制基板122與這些發光元件125之間,因此這些彼此緊鄰或緊靠的支撐基板121能遮住這些控制基板122,並能有效減少或消除呈現在顯示裝置100影像中的拼接縫,進而提升影像品質。Since the image displayed by the
值得一提的是,由於支撐基板121位於線路結構層124與控制基板122之間,因此支撐基板121能拉開線路結構層124與控制基板122之間的距離,以減輕或消除線路結構層124與控制基板122之間所產生的干擾,從而提升影像品質。例如,支撐基板121能幫助降低線路結構層124與控制基板122之間的寄生電容,以降低阻抗。其次,支撐基板121能幫助減輕或消除傳輸在線路結構層124與控制基板122內的電訊號彼此之間的相互干擾,且能增加線路結構層124與控制基板122設計上的彈性。It is worth mentioning that since the supporting
另外,當至少一個發光元件125發生故障時,可利用雷射光束直接照射於線路結構層124,以對故障的發光元件125進行維修。由於支撐基板121位於線路結構層124與控制基板122之間,因此支撐基板121能遮擋雷射光束,以使雷射光束難以或無法入射至控制基板122。如此,在維修故障發光元件125期間,支撐基板121還能保護控制基板122免而被雷射光束損傷。In addition, when at least one
須說明的是,在以上圖1A與圖1B所揭示的顯示裝置100中,主動元件陣列基板122a還可包括多條掃描線S23(圖1B僅繪示一條)與多條資料線,其中這些掃描線S23電性連接這些閘極G22,而這些資料線電性連接這些源極S22。如此,可利用這些掃描線S23與資料線來操作這些控制元件T22,進而控制這些發光元件125發光。此外,本實施例所示的控制元件T22為頂閘極型(top-gate)薄膜電晶體,但在其他實施例中,控制元件T22也可以是底閘極型(bottom-gate)薄膜電晶體,所以控制元件T22的類型不受圖式限制。It should be noted that, in the
圖2A至圖2G是圖1A的顯示裝置的製造方法的剖面示意圖。請參閱圖2A與圖2B,在顯示裝置100的製造方法中,在支撐基板121上形成多個貫孔121h,其中各個貫孔121h從第一表面121a延伸至第二表面121b。此外,在本實施例中,多個支撐基板121可以彼此相連,以整合成一塊大尺寸的支撐聯板121u,其中這些支撐基板121可呈規則排列,例如矩陣排列。換句話說,支撐聯板121u可以劃分出多個支撐基板121。2A to 2G are schematic cross-sectional views of the manufacturing method of the display device shown in FIG. 1A . Referring to FIG. 2A and FIG. 2B , in the manufacturing method of the
這些貫孔121h可以利用蝕刻來形成。請參閱圖2A,具體而言,首先,可以令雷射光束LR1照射於支撐基板121。例如,雷射光束LR1可照射於支撐基板121的第一表面121a與第二表面121b,其中支撐基板121可為玻璃板。在雷射光束LR1照射於支撐基板121之後,支撐基板121被雷射光束LR1照射的部分會發生改質,從而形成多個改質部121m。These through
須說明的是,用於改質部分支撐基板121的雷射光束LR1並不會貫穿支撐基板121,所以這些改質部121m仍是實體而非是貫孔。相較於一般的雷射鑽孔,雷射光束LR1具有偏低的功率,並且可花費較少時間來照射第一表面121a與第二表面121b。It should be noted that the laser beam LR1 used to modify the supporting
請參閱圖2A與圖2B,在雷射光束LR1照射於支撐基板121之後,蝕刻支撐基板121,以移除被雷射光束LR1所照射的部分支撐基板121。也就是說,利用蝕刻來移除這些改質部121m,其中上述蝕刻可以是濕蝕刻。雖然這些改質部121m僅為雷射光束LR1照射支撐基板121而形成,所以改質部121m與原本未改質的支撐基板121兩者構成材料實質相同,但兩者的特性卻不一樣。Referring to FIG. 2A and FIG. 2B , after the laser beam LR1 irradiates the
例如,改質部121m與未改質的部分支撐基板121兩者蝕刻速率會不相同,其中改質部121m的蝕刻速率會明顯大過於未改質的部分支撐基板121的蝕刻速率,以至於改質部121m能被移除,從而形成這些貫孔121h。此外,由於雷射光束LR1具有偏低的功率,並可花費較少時間照射第一表面121a與第二表面121b。相較於一般的雷射鑽孔,以上圖2A與圖2B所揭示的形成貫孔121h的方法具有降低雷射能量、縮短貫孔121h形成時間以及減少或避免貫孔121h內出現裂痕等優點。For example, the etching rate of the modified
請參閱圖2B與圖2C,其中圖2C是圖2B中在貫孔121h處的局部放大示意圖。各個貫孔121h具有位於第一表面121a的第一開口H21以及位於第二表面121b的第二開口H22,其中第一開口H21具有第一孔徑R21,而第二開口H22具有第二孔徑R22。此外,各個貫孔121h在第一開口H21與第二開口H22之間還具有第三孔徑R23。Please refer to FIG. 2B and FIG. 2C , wherein FIG. 2C is a partially enlarged schematic view of the through
請參閱圖2A至圖2C,由於改質部121m是透過雷射光束LR1照射而形成,而蝕刻時是從第一表面121a與第二表面121b開始蝕刻,以至於改質部121m的寬度會從第一表面121a與第二表面121b朝向支撐基板121中間遞減。因此,在至少一個貫孔121h中,第一孔徑R21與第二孔徑R22任一者會大於第三孔徑R23。Please refer to FIG. 2A to FIG. 2C , since the modified
以本實施例為例,在各個貫孔121h中,第一孔徑R21與第二孔徑R22任一者會大於第三孔徑R23,其中第一孔徑R21與第二孔徑R22其中至少一者為貫孔121h的最大孔徑。換句話說,貫孔121h的最大孔徑是位於第一開口H21與第二開口H22其中至少一者。Taking this embodiment as an example, in each of the through
至少一個或各個貫孔121h更具有中央段M12,而第三孔徑R23位於中央段M12,其中第三孔徑R23為貫孔121h的最小孔徑。換句話說,貫孔121h的最小孔徑可位在貫孔121h的中央部位,即中央段M12。此外,第三孔徑R23與最大孔徑(即第一孔徑R21與第二孔徑R22其中至少一者)之間的比值(即R23/R21或R23/R22)可以介於0.6與0.9之間。At least one or each through
請參閱圖2D,在形成這些貫孔121h之後,在這些貫孔121h內分別形成這些導電材料123。形成這些導電材料123的方法有多種,例如物理氣相沉積(Physical Vapor Deposition,PVD)或化學氣相沉積(Chemical Vapor Deposition,CVD)。在本實施例中,這些導電材料123的形成方法可以是電鍍或者印刷填孔。當這些導電材料123是利用印刷填孔而形成時,導電材料123可以是銀膠或銅膏,並能填充於這些貫孔121h內。Referring to FIG. 2D , after the through
請參閱圖2E,之後,在第一表面121a上形成線路結構層124,其電性連接這些導電材料123。在本實施例中,形成線路結構層124的方法可以是在支撐基板121的第一表面121a上依序形成一層線路層124w、一層絕緣層124d、一層平坦層124x、多個導電柱124p以及另一層線路層124w,其中這兩層線路層124w可以是由兩層不共平面的金屬層精微影與蝕刻而形成,而金屬層可用沉積製程而形成,例如物理氣相沉積(PVD)、化學氣相沉積(CVD)或電鍍。Referring to FIG. 2E , afterward, a
上層的線路層124w與這些導電柱124p可由同一道沉積製程所形成,所以上層的線路層124w與其連接的這些導電柱124p可以是一體成型。因此,上層線路層124w與導電柱124p之間不會有明顯的邊界(boundary)。在第一表面121a上形成線路結構層124以後,可以利用刀具29切割支撐聯板121u,以分離這些支撐基板121。The
請參閱圖2F,接著,在線路結構層124上設置多個發光元件125,其中這些發光元件125電性連接線路結構層124。以圖2F為例,各個發光元件125具有多個電極(例如陰極與陽極),其中這些電極電性連接上層線路層124w。此外,在線路結構層124上設置這些發光元件125之後,可以在線路結構層124上形成保護層129,以覆蓋及保護這些發光元件125,並且也可以對這些發光元件125進行檢測與篩選,以維持或提升良率。Referring to FIG. 2F , next, a plurality of
由於線路結構層124中的這些線路層124w能透過這些導電柱124p而彼此電性連接,而且線路結構層124電性連接這些導電材料123,因此各個發光元件125的這些電極可以透過線路結構層124而電性連接導電材料123。雖然各個發光元件125的這些電極(例如陰極與陽極)電性連接上層線路層124w,但這些電極並不會直接電性連接,以避免發生短路。Since the circuit layers 124w in the
請參閱圖2G,在這些發光元件125設置在線路結構層124上之後,將支撐基板121設置在控制基板122上,以形成顯示組件120,其中主動元件陣列基板122a的這些電極E22與這些導電材料123可以利用低溫金屬接合或焊接等方式而彼此電性連接,而前述低溫金屬接合例如是低溫銅對銅接合或者導電材料結合。Please refer to FIG. 2G, after these light-emitting
如此,支撐基板121內的這些導電材料123能電性連接控制基板122。此外,由於這些發光元件125可以透過線路結構層124而電性連接這些導電材料123,因此透過線路結構層124與這些導電材料123,這些發光元件125能電性連接控制基板122,以使控制基板122能控制這些發光元件125發光。In this way, the
值得一提的是,支撐基板121是設置在已完成的控制基板122上,所以支撐基板121與控制基板122是兩個獨立的元件。因此,支撐基板121與控制基板122兩者可以分別在兩個不同的製造場所中製造。It is worth mentioning that the
請參閱圖1A,之後,將至少一個顯示組件120設置在同一塊承載基板110上,其中在圖1A中,是將多個顯示組件120設置在同一塊承載基板110上。至此,顯示裝置100大致上已製造完成。在本實施例中,這些顯示組件120可以利用膠材130設置在承載基板110上。Referring to FIG. 1A , after that, at least one
圖3是本發明另一實施例的顯示裝置的剖面示意圖。請參閱圖3,本實施例的顯示裝置300相似於前述實施例的顯示裝置100,而以下原則上不再敘述顯示裝置100與300的相同特徵。顯示裝置100與300之間的差異在於:顯示裝置300包括多個顯示組件320,其中各個顯示組件320包括不同於前述實施例的控制基板322。FIG. 3 is a schematic cross-sectional view of a display device according to another embodiment of the present invention. Referring to FIG. 3 , the
具體而言,各個控制基板322包括主動元件陣列基板122a與電路基板322c,其中電路基板322c電性連接主動元件陣列基板122a,而電路基板322c可以是軟性電路板或軟硬複合電路板。不同於控制基板122,在同一個控制基板322中,電路基板322c可以撓曲,以使電路基板322c從側面S13延伸至下表面S12。如此,電路基板322c不僅設置於側面S13,而且也設置於下表面S12。Specifically, each
值得一提的是,在本實施例中,電路基板322c是設置於側面S13與下表面S12,即電路基板322c覆蓋側面S13與下表面S12。然而,在其他實施例中,電路基板322c也可以僅設置於下表面S12,不設置也不覆蓋於側面S13。因此,圖3不限制電路基板322c要覆蓋側面S13與下表面S12。此外,在本實施例中,膠材130可以接觸及黏合部分電路基板322c,但在其他實施例中,膠材130可以僅接觸與黏合主動元件陣列基板122a,不接觸也不黏合電路基板322c。所以,圖3也不限制膠材130黏合電路基板322c的方式。It is worth mentioning that, in this embodiment, the
圖4A至圖4B是本發明另一實施例的顯示裝置的製造方法的側視示意圖。請參閱圖4A與圖4B,本實施例的顯示裝置400(請參閱圖4B)與前述實施例的顯示裝置100相似,且兩者製造方法也相似。顯示裝置100與400之間的主要差異在於:顯示裝置400還包括供這些顯示組件120設置的多個固定基板440。以下主要敘述本實施例與前述實施例之間的差異,兩者相同技術特徵原則上不再重複敘述。4A to 4B are schematic side views of a manufacturing method of a display device according to another embodiment of the present invention. Referring to FIG. 4A and FIG. 4B , the
具體而言,在本實施例的顯示裝置400的製造方法中,可以提供多個固定基板440,其中各個固定基板440的尺寸明顯小於承載基板110的尺寸,如圖4B所示。此外,這些固定基板440的材料可相同於承載基板110。例如,固定基板440也可以是金屬板、玻璃板或陶瓷板。Specifically, in the manufacturing method of the
在將支撐基板121設置在控制基板122上,以形成多個顯示組件120之後(請參考圖2G),可將至少一個顯示組件120設置在其中一塊固定基板440上。在本實施例中,這些顯示組件120分別設置在這些固定基板440上,而多個顯示組件120可設置在其中一塊固定基板440上,其中這些顯示組件120可以用膠材130而設置在同一塊固定基板440上。After the supporting
須說明的是,在其他實施例中,可將僅一個顯示組件120設置在其中一塊固定基板440上。因此,設置在一塊固定基板440上的顯示組件120的數量不限制是多個。在顯示組件120設置在固定基板440上之後,將這些固定基板440設置在承載基板110上。至此,一種包括多個固定基板440的顯示裝置400大致上已製造完成。It should be noted that, in other embodiments, only one
圖4C是圖4B中的顯示裝置的局部剖面示意圖,其中圖4C具體呈現其中一種固定基板440與承載基板110之間的設置方式。請參閱圖4B與圖4C,這些固定基板440設置在承載基板110上,並位於這些顯示組件120與承載基板110之間。這些固定基板440可以可拆卸地(detachably)設置在承載基板110上。以圖4C為例,這些固定基板440可利用多個鎖固件490固定在承載基板110上,其中這些鎖固件490可包括螺栓與螺帽(皆未標示),並可貫穿固定基板440與承載基板110。FIG. 4C is a schematic partial cross-sectional view of the display device shown in FIG. 4B , wherein FIG. 4C specifically presents an arrangement between the fixed
在將這些固定基板440設置在承載基板110上的過程中,這些鎖固件490可以調整各個固定基板440相對於承載基板110的傾斜角度,其中固定基板440與承載基板110之間也可設置至少一片墊片(washer),以幫助調整上述傾斜角度。如此,這些顯示組件120能平整地設置在承載基板110上,從而有助於縮小相鄰兩個支撐基板121之間的距離D1,以有效地減少或消除拼接縫,進而維持或提升顯示裝置400的影像品質。During the process of setting these fixed
在其他實施例中,固定基板440也可採用鎖固件490以外的其他方式而設置在承載基板110上。例如,固定基板440與承載基板110其中至少一者可裝設磁鐵,以使固定基板440與承載基板110能透過磁力而彼此吸引,進而讓固定基板440可以被固定在承載基板110上。或者,這些固定基板440也可利用扣合的方式設置在承載基板110上。此外,固定基板440也可以利用膠材(例如膠材130)設置在承載基板110上。因此,固定基板440設置在承載基板110上的方式不以圖4C為限。In other embodiments, the fixing
當顯示組件120發生故障時,透過鎖固件490,可以將故障的顯示組件120所在的固定基板440從承載基板110上拆卸下來,並將已設置多個正常顯示組件120的固定基板440重新設置在承載基板110上,以替換先前被拆卸的故障顯示組件120。由此可知,利用這些固定基板440,顯示裝置400中的故障顯示組件120能被汰換,以使顯示裝置400具有維修便利等優點。When the
值得一提的是,在圖4A至圖4C所示的實施例中,顯示裝置400包括多個顯示組件120。不過,在其他實施例中,顯示裝置400也可包括多個顯示組件320,其中圖4A至圖4C所示的顯示組件120可替換成如圖3所示的顯示組件320。換句話說,這些顯示組件320也可分別設置在這些固定基板440上,而多個顯示組件320可設置在其中一塊固定基板440上,其中這些顯示組件320也能用膠材130而設置在同一塊固定基板440上。由此可知,固定基板440也可使用於前述實施例,而圖3所示的顯示裝置300也可包括多個固定基板440。It is worth mentioning that, in the embodiment shown in FIGS. 4A to 4C , the
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者,在不脫離本發明精神和範圍內,當可作些許更動與潤飾,因此本發明保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above with the embodiments, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field of the present invention can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The protection scope of the invention shall be defined by the scope of the appended patent application.
22a:基板
29:刀具
100、300:顯示裝置
110:承載基板
120、320:顯示組件
121:支撐基板
121a:第一表面
121b:第二表面
121h:貫孔
121m:改質部
121u:支撐聯板
122、322:控制基板
122a:主動元件陣列基板
122c、322c:電路基板
123:導電材料
124:線路結構層
124d、IN1、IN2、IN3、IN4:絕緣層
124p:導電柱
124w:線路層
124x:平坦層
124y:接墊
125:發光元件
129:保護層
130:膠材
440:固定基板
490:鎖固件
C22:通道層
D1:距離
D22:汲極
E22:電極
G22:閘極
H21:第一開口
H22:第二開口
L21、L22:寬度
LR1:雷射光束
M12:中央段
R21:第一孔徑
R22:第二孔徑
R23:第三孔徑
S11:上表面
S12:下表面
S13:側面
S22:源極
S23:掃描線
T22:控制元件
22a: Substrate
29:
圖1A是本發明至少一實施例的顯示裝置的剖面示意圖。 圖1B是圖1A中其中一個顯示組件的局部放大示意圖。 圖2A至圖2G是圖1A的顯示裝置的製造方法的剖面示意圖。 圖3是本發明另一實施例的顯示裝置的剖面示意圖。 圖4A至圖4B是本發明另一實施例的顯示裝置的製造方法的側視示意圖。 圖4C是圖4B中的顯示裝置的局部剖面示意圖。 FIG. 1A is a schematic cross-sectional view of a display device according to at least one embodiment of the present invention. FIG. 1B is a partially enlarged schematic view of one of the display components in FIG. 1A . 2A to 2G are schematic cross-sectional views of the manufacturing method of the display device shown in FIG. 1A . FIG. 3 is a schematic cross-sectional view of a display device according to another embodiment of the present invention. 4A to 4B are schematic side views of a manufacturing method of a display device according to another embodiment of the present invention. FIG. 4C is a schematic partial cross-sectional view of the display device in FIG. 4B .
100:顯示裝置 100: display device
110:承載基板 110: carrying substrate
120:顯示組件 120: Display components
121:支撐基板 121: supporting substrate
121a:第一表面 121a: first surface
121b:第二表面 121b: second surface
121h:貫孔 121h: through hole
122:控制基板 122: Control substrate
122a:主動元件陣列基板 122a: active element array substrate
122c:電路基板 122c: circuit substrate
123:導電材料 123: Conductive material
124:線路結構層 124: Line structure layer
124d:絕緣層 124d: insulating layer
124p:導電柱 124p: Conductive column
124w:線路層 124w: line layer
124x:平坦層 124x: flat layer
124y:接墊 124y: Pad
125:發光元件 125: Light emitting element
129:保護層 129: protective layer
130:膠材 130: Adhesive material
D1:距離 D1: distance
L21、L22:寬度 L21, L22: Width
S11:上表面 S11: Upper surface
S12:下表面 S12: Lower surface
S13:側面 S13: side
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