TW202301304A - Display device and manufacturing method thereof - Google Patents

Display device and manufacturing method thereof Download PDF

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TW202301304A
TW202301304A TW110122477A TW110122477A TW202301304A TW 202301304 A TW202301304 A TW 202301304A TW 110122477 A TW110122477 A TW 110122477A TW 110122477 A TW110122477 A TW 110122477A TW 202301304 A TW202301304 A TW 202301304A
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substrate
display device
aperture
structure layer
circuit structure
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TW110122477A
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TWI800850B (en
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林世雄
蘇松宇
宋文清
吳仰恩
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友達光電股份有限公司
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Priority to CN202111651567.1A priority patent/CN114300597B/en
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Abstract

A display device includes a holding substrate and a plurality of display assemblies. The display assemblies are disposed on the holding substrate. Each of the display assemblies includes a control substrate, a supporting substrate, a plurality of conductive materials, a wiring structure layer and a plurality of light emitting components. The control substrate is disposed on the holding substrate. The supporting substrate has a plurality of through holes and is disposed on the control substrate. The conductive materials are located in the through holes respectively and electrically connected to the control substrate, while the wiring structure layer is electrically connected to the conductive materials. The light emitting components are disposed on the wiring structure layer and electrically connected to the wiring structure layer.

Description

顯示裝置及其製造方法Display device and manufacturing method thereof

本發明是有關於一種顯示裝置及其製造方法,且特別是有關於一種拼接型顯示裝置(tiled display device)及其製造方法。The present invention relates to a display device and a manufacturing method thereof, and in particular to a tiled display device and a manufacturing method thereof.

現有的拼接型顯示裝置是由多個顯示組件拼裝而成,其中這些顯示組件能顯示子影像(sub-image),而拼接型顯示裝置所顯示的影像是由這些子影像拼接而形成。一般而言,相鄰兩個顯示組件之間難免會存有間隙,而大部分的拼接型顯示裝置通常會受到上述間隙的影響,以至於現有的拼接型顯示裝置所顯示的影像會清楚地呈現由間隙所形成的拼接縫(seam),從而降低影像品質。The existing spliced display device is assembled by a plurality of display components, wherein these display components can display sub-images, and the image displayed by the spliced display device is formed by splicing these sub-images. Generally speaking, there is inevitably a gap between two adjacent display components, and most of the spliced display devices are usually affected by the above gap, so that the images displayed by the existing spliced display devices can be clearly presented A seam formed by gaps that degrades image quality.

本發明至少一實施例提供一種顯示裝置,其包括多個顯示組件,其中各個顯示組件能產生子畫面,以使顯示裝置能顯示影像。At least one embodiment of the present invention provides a display device, which includes a plurality of display components, wherein each display component can generate a sub-frame, so that the display device can display images.

本發明至少一實施例提供一種顯示裝置的製造方法,以製造上述顯示裝置。At least one embodiment of the present invention provides a method for manufacturing a display device to manufacture the above-mentioned display device.

本發明至少一實施例所提供的顯示裝置的製造方法包括在支撐基板上形成多個貫孔,其中支撐基板具有第一表面以及相對第一表面的第二表面,而這些貫孔從第一表面延伸至第二表面。在這些貫孔內分別形成多個導電材料。之後,在第一表面上形成線路結構層,其中線路結構層電性連接這些導電材料。之後,在線路結構層上設置多個發光元件,其中這些發光元件電性連接線路結構層。在這些發光元件設置在線路結構層上之後,將支撐基板設置在控制基板上,以形成顯示組件,其中這些導電材料電性連接控制基板,以使控制基板電性連接這些發光元件。之後,將多個顯示組件設置在承載基板上。The method for manufacturing a display device provided by at least one embodiment of the present invention includes forming a plurality of through holes on a support substrate, wherein the support substrate has a first surface and a second surface opposite to the first surface, and the through holes are formed from the first surface extends to the second surface. A plurality of conductive materials are respectively formed in the through holes. Afterwards, a circuit structure layer is formed on the first surface, wherein the circuit structure layer is electrically connected to these conductive materials. Afterwards, a plurality of light-emitting elements are disposed on the circuit structure layer, wherein the light-emitting elements are electrically connected to the circuit structure layer. After the light emitting elements are disposed on the circuit structure layer, the supporting substrate is disposed on the control substrate to form a display assembly, wherein the conductive materials are electrically connected to the control substrate so that the control substrate is electrically connected to the light emitting elements. Afterwards, a plurality of display components are arranged on the carrier substrate.

在本發明至少一實施例中,在支撐基板上形成這些貫孔的步驟包括令雷射光束照射於支撐基板。在雷射光束照射於支撐基板之後,蝕刻支撐基板,以移除被雷射光束所照射的部分支撐基板。In at least one embodiment of the present invention, the step of forming the through holes on the supporting substrate includes irradiating a laser beam on the supporting substrate. After the laser beam is irradiated on the support substrate, the support substrate is etched to remove a portion of the support substrate irradiated by the laser beam.

在本發明至少一實施例中,在這些貫孔內分別形成這些導電材料的方法包括電鍍或印刷填孔。In at least one embodiment of the present invention, the method of forming the conductive materials in the through holes includes electroplating or printing filling holes.

在本發明至少一實施例中,在第一表面上形成線路結構層以前,多個支撐基板整合成支撐聯板。在第一表面上形成線路結構層以後,切割支撐聯板,以分離這些支撐基板。In at least one embodiment of the present invention, before the circuit structure layer is formed on the first surface, a plurality of support substrates are integrated into a support link. After the wiring structure layer is formed on the first surface, the supporting bracket is cut to separate the supporting substrates.

在本發明至少一實施例中,將這些顯示組件設置在承載基板上的步驟包括提供多個固定基板。將至少一個顯示組件設置在其中一塊固定基板上。將這些固定基板設置在承載基板上。In at least one embodiment of the invention, the step of arranging the display components on a carrier substrate includes providing a plurality of fixed substrates. At least one display component is arranged on one of the fixed substrates. These fixed substrates are placed on the carrier substrate.

本發明至少一實施例所提供的顯示裝置包括承載基板與多個顯示組件。這些顯示組件設置在承載基板上,並規則排列在承載基板上。各個顯示組件包括控制基板、支撐基板、多個導電材料、線路結構層以及多個發光元件。控制基板設置在承載基板上。支撐基板具有第一表面、相對第一表面的第二表面以及多個貫孔,其中這些貫孔從第一表面延伸至第二表面。支撐基板設置在控制基板上。這些導電材料分別位在這些貫孔內,並電性連接控制基板。線路結構層設置在第一表面上,並電性連接這些導電材料,其中支撐基板位於線路結構層與控制基板之間。這些發光元件設置在線路結構層上,並電性連接線路結構層。A display device provided by at least one embodiment of the present invention includes a carrier substrate and a plurality of display components. These display components are arranged on the carrier substrate and arranged regularly on the carrier substrate. Each display component includes a control substrate, a supporting substrate, a plurality of conductive materials, a circuit structure layer and a plurality of light emitting elements. The control substrate is arranged on the carrier substrate. The support substrate has a first surface, a second surface opposite to the first surface, and a plurality of through holes, wherein the through holes extend from the first surface to the second surface. The support substrate is provided on the control substrate. The conductive materials are respectively located in the through holes and are electrically connected to the control substrate. The circuit structure layer is arranged on the first surface and is electrically connected to these conductive materials, wherein the supporting substrate is located between the circuit structure layer and the control substrate. These light-emitting elements are arranged on the circuit structure layer and electrically connected to the circuit structure layer.

在本發明至少一實施例中,上述支撐基板的尺寸大於控制基板的尺寸。In at least one embodiment of the present invention, the size of the support substrate is larger than the size of the control substrate.

在本發明至少一實施例中,上述控制基板包括主動元件陣列基板與電路基板。主動元件陣列基板具有上表面、下表面與位於上表面與下表面之間的側面,其中支撐基板設置在上表面上,並完全覆蓋上表面,而支撐基板凸出於側面。電路基板電性連接主動元件陣列基板。In at least one embodiment of the present invention, the control substrate includes an active device array substrate and a circuit substrate. The active element array substrate has an upper surface, a lower surface and a side surface between the upper surface and the lower surface, wherein the support substrate is arranged on the upper surface and completely covers the upper surface, and the support substrate protrudes from the side surface. The circuit substrate is electrically connected to the active device array substrate.

在本發明至少一實施例中,上述電路基板設置於主動元件陣列基板的側面。In at least one embodiment of the present invention, the circuit substrate is disposed on a side surface of the active device array substrate.

在本發明至少一實施例中,上述電路基板設置於主動元件陣列基板的下表面。In at least one embodiment of the present invention, the circuit substrate is disposed on the lower surface of the active device array substrate.

在本發明至少一實施例中,至少一個貫孔具有位於第一表面的第一開口與位於第二表面的第二開口。第一開口具有第一孔徑,而第二開口具有第二孔徑,其中貫孔在第一開口與第二開口之間具有第三孔徑,而第一孔徑與第二孔徑任一者大於第三孔徑。In at least one embodiment of the present invention, at least one through hole has a first opening on the first surface and a second opening on the second surface. The first opening has a first aperture, and the second opening has a second aperture, wherein the through hole has a third aperture between the first opening and the second opening, and either the first aperture or the second aperture is larger than the third aperture .

在本發明至少一實施例中,上述貫孔更具有中央段,而第三孔徑位於中央段。第一孔徑與第二孔徑其中至少一者為貫孔的最大孔徑,而第三孔徑為貫孔的最小孔徑,其中第三孔徑與最大孔徑之間的比值介於0.6與0.9之間。In at least one embodiment of the present invention, the through hole further has a central section, and the third aperture is located in the central section. At least one of the first aperture and the second aperture is the maximum aperture of the through hole, and the third aperture is the minimum aperture of the through hole, wherein the ratio between the third aperture and the maximum aperture is between 0.6 and 0.9.

在本發明至少一實施例中,相鄰兩個支撐基板之間的距離在400微米(μm)以內。In at least one embodiment of the present invention, the distance between two adjacent supporting substrates is within 400 micrometers (μm).

在本發明至少一實施例中,上述顯示裝置還包括多個固定基板。這些固定基板設置在承載基板上,其中這些顯示組件分別設置在這些固定基板上,而這些固定基板位於這些顯示組件與承載基板之間。In at least one embodiment of the present invention, the display device further includes a plurality of fixed substrates. The fixed substrates are arranged on the carrier substrate, wherein the display components are respectively arranged on the fixed substrates, and the fixed substrates are located between the display components and the carrier substrate.

基於上述,各個顯示組件能利用這些發光元件來產生子畫面。如此,顯示裝置得以顯示影像。Based on the above, each display component can utilize these light-emitting elements to generate sprites. In this way, the display device can display images.

在以下的內文中,為了清楚呈現本案的技術特徵,圖式中的元件(例如層、膜、基板以及區域等)的尺寸(例如長度、寬度、厚度與深度)會以不等比例的方式放大。因此,下文實施例的說明與解釋不受限於圖式中的元件所呈現的尺寸與形狀,而應涵蓋如實際製程及/或公差所導致的尺寸、形狀以及兩者的偏差。例如,圖式所示的平坦表面可以具有粗糙及/或非線性的特徵,而圖式所示的銳角可以是圓的。所以,本案圖式所呈示的元件主要是用於示意,並非旨在精準地描繪出元件的實際形狀,也非用於限制本案的申請專利範圍。In the following text, in order to clearly present the technical features of this application, the dimensions (such as length, width, thickness, and depth) of elements (such as layers, films, substrates, and regions) in the drawings will be enlarged in a non-proportional manner . Therefore, the description and explanation of the following embodiments are not limited to the size and shape of the elements in the drawings, but should cover the deviations in size, shape and both caused by actual manufacturing process and/or tolerances. For example, a planar surface shown in the drawings may have rough and/or non-linear features, while acute angles shown in the drawings may be rounded. Therefore, the components shown in the drawings of this case are mainly for illustration, and are not intended to accurately depict the actual shape of the components, nor are they used to limit the scope of the patent application of this case.

其次,本案內容中所出現的「約」、「近似」或「實質上」等這類用字不僅涵蓋明確記載的數值與數值範圍,而且也涵蓋發明所屬技術領域中具有通常知識者所能理解的可允許偏差範圍,其中此偏差範圍可由測量時所產生的誤差來決定,而此誤差例如是起因於測量系統或製程條件兩者的限制。舉例而言,兩物件(例如基板的平面或走線)「實質上平行」或「實質上垂直」,其中「實質上平行」與「實質上垂直」分別代表這兩物件之間的平行與垂直可包括允許偏差範圍所導致的不平行與不垂直。Secondly, words such as "about", "approximately" or "substantially" appearing in the content of this case not only cover the clearly stated values and numerical ranges, but also cover The allowable deviation range, wherein the deviation range can be determined by the error generated during the measurement, and the error is caused by the limitation of the measurement system or process conditions, for example. For example, two objects (such as a plane or trace of a substrate) are "substantially parallel" or "substantially perpendicular", where "substantially parallel" and "substantially perpendicular" represent the parallel and perpendicular between the two objects, respectively. May include non-parallel and non-perpendicular due to tolerance range.

此外,「約」可表示在上述數值的一個或多個標準偏差內,例如±30%、±20%、±10%或±5%內。本案文中所出現的「約」、「近似」或「實質上」等這類用字可依光學性質、蝕刻性質、機械性質或其他性質來選擇可以接受的偏差範圍或標準偏差,並非單以一個標準偏差來套用以上光學性質、蝕刻性質、機械性質以及其他性質等所有性質。Additionally, "about" can mean within one or more standard deviations of the above numerical values, eg, within ±30%, ±20%, ±10%, or ±5%. Words such as "about", "approximately" or "substantially" appearing in this text can choose the acceptable deviation range or standard deviation according to optical properties, etching properties, mechanical properties or other properties, not a single The standard deviation is used to apply all properties such as the above optical properties, etching properties, mechanical properties and other properties.

圖1A是本發明至少一實施例的顯示裝置的剖面示意圖。請參閱圖1A,顯示裝置100包括承載基板110與多個顯示組件120,其中這些顯示組件120設置並且規則排列在承載基板110上。例如,這些顯示組件120可以呈矩陣排列。承載基板110可以是剛性基板,例如金屬板、玻璃板或陶瓷板,並能承載這些顯示組件120。FIG. 1A is a schematic cross-sectional view of a display device according to at least one embodiment of the present invention. Referring to FIG. 1A , the display device 100 includes a carrier substrate 110 and a plurality of display components 120 , wherein the display components 120 are disposed and regularly arranged on the carrier substrate 110 . For example, these display components 120 may be arranged in a matrix. The carrier substrate 110 can be a rigid substrate, such as a metal plate, a glass plate or a ceramic plate, and can carry the display components 120 .

在本實施例中,這些顯示組件120可以利用膠材130而設置在承載基板110上,以使這些顯示組件120能固定在承載基板110上。此外,除了膠材130以外,顯示組件120也可以採用其他手段而設置在承載基板110上。因此,顯示組件120不限制僅用膠材130設置在承載基板110上。In this embodiment, the display components 120 can be disposed on the carrier substrate 110 by using an adhesive material 130 , so that the display components 120 can be fixed on the carrier substrate 110 . In addition, in addition to the adhesive material 130 , the display component 120 can also be disposed on the carrier substrate 110 by other means. Therefore, the display component 120 is not limited to be disposed on the carrier substrate 110 only by the adhesive material 130 .

各個顯示組件120包括支撐基板121與控制基板122,其中支撐基板121設置在控制基板122上,而控制基板122設置在承載基板110上。所以,控制基板122位在承載基板110與支撐基板121之間。支撐基板121具有第一表面121a、相對第一表面121a的第二表面121b以及多個貫孔121h,其中這些貫孔121h從第一表面121a延伸至第二表面121b。Each display assembly 120 includes a support substrate 121 and a control substrate 122 , wherein the support substrate 121 is disposed on the control substrate 122 , and the control substrate 122 is disposed on the carrier substrate 110 . Therefore, the control substrate 122 is located between the carrying substrate 110 and the supporting substrate 121 . The support substrate 121 has a first surface 121a, a second surface 121b opposite to the first surface 121a, and a plurality of through holes 121h, wherein the through holes 121h extend from the first surface 121a to the second surface 121b.

支撐基板121可以是剛性基板或柔性基板。具體而言,當支撐基板121為剛性基板時,支撐基板121可以是玻璃板或陶瓷板。當支撐基板121為柔性基板時,支撐基板121可以是高分子基板,其材料例如是聚醯亞胺(Polyimide,PI)或聚對苯二甲酸乙二酯(Polyethylene Terephthalate,PET)。The support substrate 121 may be a rigid substrate or a flexible substrate. Specifically, when the supporting substrate 121 is a rigid substrate, the supporting substrate 121 may be a glass plate or a ceramic plate. When the supporting substrate 121 is a flexible substrate, the supporting substrate 121 may be a polymer substrate, such as polyimide (PI) or polyethylene terephthalate (PET).

各個顯示組件120還包括多個導電材料123,其中這些導電材料123分別位在這些貫孔121h內,並連接控制基板122。導電材料123可為金屬材料,例如銅或銀膠,並可填滿貫孔121h。各個顯示組件120還包括設置在第一表面121a上的線路結構層124,所以支撐基板121會位於線路結構層124與控制基板122之間,其中線路結構層124電性連接這些導電材料123。此外,線路結構層124可以用於傳輸汲極電源電壓(Vdd)、源極電源電壓(Vss),並且包括多個接墊124y。Each display component 120 further includes a plurality of conductive materials 123 , wherein the conductive materials 123 are located in the through holes 121 h and connected to the control substrate 122 . The conductive material 123 can be a metal material, such as copper or silver glue, and can fill the through hole 121h. Each display component 120 also includes a circuit structure layer 124 disposed on the first surface 121 a, so the support substrate 121 is located between the circuit structure layer 124 and the control substrate 122 , wherein the circuit structure layer 124 is electrically connected to the conductive materials 123 . In addition, the line structure layer 124 can be used to transmit the drain power supply voltage (Vdd) and the source power supply voltage (Vss), and includes a plurality of pads 124y.

線路結構層124可以包括多層膜層。以圖1A為例,線路結構層124可包括多層線路層124w、絕緣層124d以及平坦層124x,其中這些線路層124w、絕緣層124d與平坦層124x彼此堆疊,而絕緣層124d與平坦層124x位於兩層線路層124w之間,以使這些線路層124w能被絕緣層124d與平坦層124x隔開。The circuit structure layer 124 may include multiple film layers. Taking FIG. 1A as an example, the circuit structure layer 124 may include a multilayer circuit layer 124w, an insulating layer 124d and a planar layer 124x, wherein the circuit layer 124w, the insulating layer 124d and the planar layer 124x are stacked on each other, and the insulating layer 124d and the planar layer 124x are located Between the two circuit layers 124w, these circuit layers 124w can be separated from the planar layer 124x by the insulating layer 124d.

線路結構層124還可以包括多個導電柱124p,其中這些導電柱124p位於絕緣層124d與平坦層124x中,並連接這些線路層124w,以使這些線路層124w能透過導電柱124p而彼此電性連接。其中一層線路層124w,例如圖1A中位於下方的線路層124w,會電性連接導電材料123,以使線路結構層124電性連接這些導電材料123。The circuit structure layer 124 can also include a plurality of conductive pillars 124p, wherein these conductive pillars 124p are located in the insulating layer 124d and the planar layer 124x, and connect these circuit layers 124w, so that these circuit layers 124w can be electrically connected to each other through the conductive pillars 124p. connect. One of the wiring layers 124w, such as the lower wiring layer 124w in FIG. 1A , is electrically connected to the conductive materials 123 so that the wiring structure layer 124 is electrically connected to the conductive materials 123 .

各個顯示組件120還包括多個發光元件125,其中這些發光元件125設置在線路結構層124上,並可呈規則排列,例如矩陣排列。這些發光元件125電性連接線路結構層124,並且是電性連接線路結構層124的其中一層線路層124w。以圖1A為例,位在上方的線路層124w可包括多個接墊124y,而各個發光元件125可以透過焊接(Soldering)或異方向性導電膜(Anisotropic Conductive Film,ACF)而電性連接至少兩個接墊124y。Each display component 120 also includes a plurality of light emitting elements 125, wherein these light emitting elements 125 are disposed on the circuit structure layer 124, and can be arranged in a regular manner, such as a matrix arrangement. These light-emitting elements 125 are electrically connected to the circuit structure layer 124 and are one of the circuit layers 124w electrically connected to the circuit structure layer 124 . Taking FIG. 1A as an example, the upper circuit layer 124w may include a plurality of pads 124y, and each light emitting element 125 may be electrically connected to at least Two pads 124y.

發光元件125可以是發光二極體(Light Emitting Diode,LED),例如微型發光二極體(Micro-LED)、次毫米發光二極體(Mini-LED)或是尺寸大於次毫米發光二極體的發光二極體。此外,發光元件125也可以是水平式發光二極體(如圖1A所示)或垂直式發光二極體。因此,各個發光元件125的電極(未標示,例如陰極與陽極)可以位在發光元件125的同一側或是分別位於相對兩側。The light emitting element 125 can be a light emitting diode (Light Emitting Diode, LED), such as a micro light emitting diode (Micro-LED), a sub-millimeter light-emitting diode (Mini-LED), or a light-emitting diode with a size larger than a sub-millimeter of light-emitting diodes. In addition, the light emitting element 125 can also be a horizontal light emitting diode (as shown in FIG. 1A ) or a vertical light emitting diode. Therefore, the electrodes (not shown, such as cathode and anode) of each light emitting element 125 can be located on the same side of the light emitting element 125 or on opposite sides respectively.

值得一提的是,在圖1A所示的實施例中,線路結構層124可包括兩層線路層124w,而在其他實施例中,線路結構層124可包括三層以上的線路層124w。因此,線路結構層124可包括至少兩層線路層124w,而線路結構層124所包括的線路層124w的數量不限制為兩層。It is worth mentioning that, in the embodiment shown in FIG. 1A , the circuit structure layer 124 may include two circuit layers 124w, while in other embodiments, the circuit structure layer 124 may include more than three circuit layers 124w. Therefore, the circuit structure layer 124 may include at least two circuit layers 124w, and the number of circuit layers 124w included in the circuit structure layer 124 is not limited to two layers.

在本實施例中,這些發光元件125能發出多種色光。例如,這些發光元件125可以包括多個紅光發光二極體、多個綠光發光二極體以及多個藍光發光二極體,以使這些發光元件125能發出紅光、綠光以及藍光。利用這些發光元件125所發出的色光(例如紅光、綠光與藍光),各個顯示組件120可以產生子畫面,以使顯示裝置100能顯示影像。此外,顯示組件120還可以包括保護層129,其中保護層129可以設置在線路結構層124上,並且覆蓋這些發光元件125,以保護這些發光元件125。In this embodiment, these light emitting elements 125 can emit light of various colors. For example, the light emitting elements 125 may include a plurality of red light emitting diodes, a plurality of green light emitting diodes and a plurality of blue light emitting diodes, so that the light emitting elements 125 can emit red light, green light and blue light. Using the colored lights (eg, red light, green light, and blue light) emitted by the light emitting elements 125 , each display component 120 can generate sub-pictures so that the display device 100 can display images. In addition, the display component 120 may further include a protection layer 129 , wherein the protection layer 129 may be disposed on the circuit structure layer 124 and cover the light emitting elements 125 to protect the light emitting elements 125 .

值得一提的是,在其他實施例中,這些發光元件125也可以發出單一種色光,例如藍光,其中此藍光可經由色轉換材料,例如量子點材料或螢光粉材料,轉換成其他種色光,例如紅光或綠光。因此,即使這些發光元件125發出單一種色光(例如藍光),透過上述色轉換材料,也能產生多種色光(例如紅光與綠光),以使顯示裝置100能顯示影像。It is worth mentioning that, in other embodiments, these light emitting elements 125 can also emit a single color light, such as blue light, wherein the blue light can be converted into other color light through color conversion materials, such as quantum dot materials or phosphor materials , such as red or green light. Therefore, even if the light-emitting elements 125 emit a single color light (such as blue light), multiple color lights (such as red light and green light) can be generated through the above-mentioned color conversion material, so that the display device 100 can display images.

由於這些線路層124w能透過導電柱124p而彼此電性連接,而且線路結構層124電性連接這些導電材料123,因此這些發光元件125能透過線路結構層124而電性連接支撐基板121中的這些導電材料123。這些導電材料123連接控制基板122,以使這些發光元件125更能透過這些導電材料123而電性連接控制基板122。Because these circuit layers 124w can be electrically connected to each other through the conductive pillars 124p, and the circuit structure layer 124 is electrically connected to these conductive materials 123, so these light-emitting elements 125 can be electrically connected to these in the supporting substrate 121 through the circuit structure layer 124. Conductive material 123. The conductive materials 123 are connected to the control substrate 122 so that the light emitting elements 125 can be electrically connected to the control substrate 122 through the conductive materials 123 .

控制基板122可以包括主動元件陣列基板122a與電路基板122c,其中電路基板122c電性連接主動元件陣列基板122a。主動元件陣列基板122a具有上表面S11、下表面S12與側面S13,其中側面S13位於上表面S11與下表面S12之間,而電路基板122c可設置於側面S13(如圖1A所示)或下表面S12。電路基板122c可以是印刷電路板、軟性電路板或軟硬複合電路板,並且已裝設(mounted)至少一個晶片(未繪示)。當電路基板122c為軟性電路板或軟硬複合電路板時,上述晶片可透過覆晶薄膜封裝(Chip On Film,COF)裝設在軟性電路板或軟硬複合電路板上。The control substrate 122 may include an active device array substrate 122a and a circuit substrate 122c, wherein the circuit substrate 122c is electrically connected to the active device array substrate 122a. The active element array substrate 122a has an upper surface S11, a lower surface S12, and a side surface S13, wherein the side surface S13 is located between the upper surface S11 and the lower surface S12, and the circuit substrate 122c can be disposed on the side surface S13 (as shown in FIG. 1A ) or the lower surface S12. The circuit substrate 122c may be a printed circuit board, a flexible circuit board or a rigid-flex circuit board, and at least one chip (not shown) has been mounted thereon. When the circuit substrate 122c is a flexible circuit board or a rigid-flex circuit board, the chip can be mounted on the flexible circuit board or the rigid-flex circuit board through a chip on film (COF) package.

支撐基板121設置在上表面S11上,而支撐基板121內的導電材料123連接主動元件陣列基板122a。從圖1A來看,支撐基板121的尺寸大於控制基板122的尺寸,其中支撐基板121的寬度L21可以大於主動元件陣列基板122a的寬度L22。如此,支撐基板121可以完全覆蓋主動元件陣列基板122a的上表面S11,並且凸出於側面S13,如圖1A所示。The supporting substrate 121 is disposed on the upper surface S11, and the conductive material 123 in the supporting substrate 121 is connected to the active device array substrate 122a. From FIG. 1A , the size of the support substrate 121 is greater than the size of the control substrate 122 , wherein the width L21 of the support substrate 121 may be greater than the width L22 of the active device array substrate 122 a. In this way, the supporting substrate 121 can completely cover the upper surface S11 of the active device array substrate 122a, and protrude from the side surface S13, as shown in FIG. 1A .

圖1B是圖1A中其中一個顯示組件的局部放大示意圖。請參閱圖1A與圖1B,主動元件陣列基板122a可包括基板22a與多個控制元件T22,其中這些控制元件T22形成在基板22a上。基板22a可以相似於支撐基板121,且可以是剛性基板或柔性基板,例如玻璃板、陶瓷板或高分子基板,其中高分子基板的材料例如是聚醯亞胺(PI)或聚對苯二甲酸乙二酯(PET)。FIG. 1B is a partially enlarged schematic view of one of the display components in FIG. 1A . Referring to FIG. 1A and FIG. 1B , the active device array substrate 122a may include a substrate 22a and a plurality of control elements T22, wherein the control elements T22 are formed on the substrate 22a. The substrate 22a can be similar to the support substrate 121, and can be a rigid substrate or a flexible substrate, such as a glass plate, a ceramic plate or a polymer substrate, wherein the material of the polymer substrate is, for example, polyimide (PI) or polyethylene terephthalic acid Ethylene glycol ester (PET).

在本實施例中,控制元件T22可為薄膜電晶體,而各個控制元件T22可包括閘極G22、源極S22、汲極D22與通道層C22,其中閘極G22、源極S22與汲極D22可皆為金屬層,而通道層C22為半導體層。通道層C22形成在基板22a上,而閘極G22位於通道層C22的上方,但不接觸通道層C22。源極S22與汲極D22形成在通道層C22上,並且電性連接通道層C22。In this embodiment, the control element T22 can be a thin film transistor, and each control element T22 can include a gate G22, a source S22, a drain D22 and a channel layer C22, wherein the gate G22, the source S22 and the drain D22 All may be metal layers, and the channel layer C22 is a semiconductor layer. The channel layer C22 is formed on the substrate 22a, and the gate G22 is located above the channel layer C22 but not in contact with the channel layer C22. The source S22 and the drain D22 are formed on the channel layer C22 and are electrically connected to the channel layer C22.

主動元件陣列基板122a還可以包括多層絕緣層IN1、IN2、IN3與IN4,其中這些絕緣層IN1、IN2、IN3與IN4皆堆疊在基板22a上。絕緣層IN1可以形成在基板22a上,並且覆蓋通道層C22。閘極G22形成在絕緣層IN1上,並位於通道層C22的正上方,以使閘極G22、通道層C22以及位於閘極G22與通道層C22之間的部分絕緣層IN1能形成電容。The active device array substrate 122a may further include multiple insulating layers IN1, IN2, IN3 and IN4, wherein the insulating layers IN1, IN2, IN3 and IN4 are all stacked on the substrate 22a. An insulating layer IN1 may be formed on the substrate 22a and cover the channel layer C22. The gate G22 is formed on the insulating layer IN1 and directly above the channel layer C22, so that the gate G22, the channel layer C22 and a part of the insulating layer IN1 between the gate G22 and the channel layer C22 can form a capacitor.

絕緣層IN2形成在絕緣層IN1上,並且覆蓋閘極G22,其中源極S22的一部分以及汲極D22的一部分皆位在絕緣層IN2上,而源極S22的另一部分以及汲極D22的另一部分皆穿透絕緣層IN2與IN1,以使源極S22與汲極D22皆能電性連接通道層C22。此外,源極S22與汲極D22皆不電性連接閘極G22,以使源極S22與汲極D22皆與閘極G22電性絕緣。The insulating layer IN2 is formed on the insulating layer IN1 and covers the gate G22, wherein a part of the source S22 and a part of the drain D22 are located on the insulating layer IN2, and another part of the source S22 and another part of the drain D22 Both penetrate the insulating layers IN2 and IN1, so that both the source S22 and the drain D22 can be electrically connected to the channel layer C22. In addition, neither the source S22 nor the drain D22 is electrically connected to the gate G22, so that both the source S22 and the drain D22 are electrically insulated from the gate G22.

絕緣層IN3形成在絕緣層IN2上,並覆蓋源極S22與汲極D22,而絕緣層IN4形成在絕緣層IN3上,其中絕緣層IN4可為平坦層。此外,在其他實施例中,絕緣層IN3與IN4可以是一體成型。例如,絕緣層IN3可被省略,而絕緣層IN4可被保留,並且可以覆蓋源極S22、汲極D22以及絕緣層IN2。The insulating layer IN3 is formed on the insulating layer IN2 and covers the source S22 and the drain D22 , and the insulating layer IN4 is formed on the insulating layer IN3 , wherein the insulating layer IN4 can be a planar layer. In addition, in other embodiments, the insulating layers IN3 and IN4 can be integrally formed. For example, the insulating layer IN3 may be omitted, while the insulating layer IN4 may remain and cover the source S22 , the drain D22 and the insulating layer IN2 .

主動元件陣列基板122a還可包括多個電極E22,其中這些電極E22分別電性連接這些汲極D22。具體而言,各個電極E22的一部分位在絕緣層IN4上,而另一部分則穿透絕緣層IN4與IN3連接於汲極D22,以使電極E22能電性連接汲極D22。如此,這些控制元件T22能控制輸入至這些電極E22的電能。The active device array substrate 122a may further include a plurality of electrodes E22, wherein the electrodes E22 are electrically connected to the drains D22 respectively. Specifically, a part of each electrode E22 is located on the insulating layer IN4, while another part penetrates the insulating layers IN4 and IN3 and is connected to the drain D22, so that the electrode E22 can be electrically connected to the drain D22. In this way, the control elements T22 can control the electric energy input to the electrodes E22.

這些電極E22分別電性連接這些導電材料123,所以這些電極E22能透過這些導電材料123而電性連接線路結構層124。因此,這些電極E22能經由這些導電材料123與線路結構層124而電性連接這些發光元件125。如此,這些控制元件T22能分別電性連接這些發光元件125,以控制輸入至發光元件125的電能,進而控制各個發光元件125的亮度,讓顯示裝置100得以顯示影像。由此可知,顯示裝置100所顯示的影像是由這些發光元件125所發出的光線而形成。The electrodes E22 are respectively electrically connected to the conductive materials 123 , so the electrodes E22 can be electrically connected to the circuit structure layer 124 through the conductive materials 123 . Therefore, the electrodes E22 can be electrically connected to the light emitting elements 125 via the conductive materials 123 and the circuit structure layer 124 . In this way, the control elements T22 can be electrically connected to the light emitting elements 125 respectively to control the electric energy input to the light emitting elements 125 , and then control the brightness of each light emitting element 125 so that the display device 100 can display images. It can be known from this that the image displayed by the display device 100 is formed by the light emitted by the light emitting elements 125 .

由於支撐基板121的尺寸大於控制基板122的尺寸,而且支撐基板121能完全覆蓋上表面S11,並凸出於側面S13,因此支撐基板121、控制基板122與承載基板110能形成可供電路基板122c容置的空間(未標示),以使這些支撐基板121基本上不受電路基板122c的影響而能彼此緊鄰(close to)或緊靠(abutting),其中控制相鄰兩個支撐基板121之間的距離D1可以控制在400微米以內。Since the size of the support substrate 121 is greater than the size of the control substrate 122, and the support substrate 121 can completely cover the upper surface S11 and protrude from the side S13, the support substrate 121, the control substrate 122 and the carrier substrate 110 can form an available circuit substrate 122c. Accommodating space (not marked), so that these support substrates 121 are not affected by the circuit substrate 122c and can be close to or abutting each other, wherein the control between two adjacent support substrates 121 The distance D1 can be controlled within 400 microns.

由於顯示裝置100顯示的影像是由這些發光元件125所發出的光線而形成,而在同一個顯示組件120中,支撐基板121位在控制基板122與這些發光元件125之間,因此這些彼此緊鄰或緊靠的支撐基板121能遮住這些控制基板122,並能有效減少或消除呈現在顯示裝置100影像中的拼接縫,進而提升影像品質。Since the image displayed by the display device 100 is formed by the light emitted by these light-emitting elements 125, and in the same display assembly 120, the support substrate 121 is located between the control substrate 122 and these light-emitting elements 125, so these are adjacent to each other or The close support substrate 121 can cover these control substrates 122 and can effectively reduce or eliminate the splicing seam in the image of the display device 100 , thereby improving the image quality.

值得一提的是,由於支撐基板121位於線路結構層124與控制基板122之間,因此支撐基板121能拉開線路結構層124與控制基板122之間的距離,以減輕或消除線路結構層124與控制基板122之間所產生的干擾,從而提升影像品質。例如,支撐基板121能幫助降低線路結構層124與控制基板122之間的寄生電容,以降低阻抗。其次,支撐基板121能幫助減輕或消除傳輸在線路結構層124與控制基板122內的電訊號彼此之間的相互干擾,且能增加線路結構層124與控制基板122設計上的彈性。It is worth mentioning that since the supporting substrate 121 is located between the circuit structure layer 124 and the control substrate 122, the supporting substrate 121 can open the distance between the circuit structure layer 124 and the control substrate 122 to reduce or eliminate the circuit structure layer 124. The interference generated between the substrate and the control substrate 122 improves the image quality. For example, the supporting substrate 121 can help reduce the parasitic capacitance between the circuit structure layer 124 and the control substrate 122 to reduce impedance. Secondly, the supporting substrate 121 can help reduce or eliminate the mutual interference between the electric signals transmitted in the circuit structure layer 124 and the control substrate 122 , and can increase the design flexibility of the circuit structure layer 124 and the control substrate 122 .

另外,當至少一個發光元件125發生故障時,可利用雷射光束直接照射於線路結構層124,以對故障的發光元件125進行維修。由於支撐基板121位於線路結構層124與控制基板122之間,因此支撐基板121能遮擋雷射光束,以使雷射光束難以或無法入射至控制基板122。如此,在維修故障發光元件125期間,支撐基板121還能保護控制基板122免而被雷射光束損傷。In addition, when at least one light emitting element 125 fails, a laser beam can be used to directly irradiate the circuit structure layer 124 to repair the failed light emitting element 125 . Since the supporting substrate 121 is located between the circuit structure layer 124 and the control substrate 122 , the supporting substrate 121 can block the laser beam, so that the laser beam is difficult or impossible to enter the control substrate 122 . In this way, the supporting substrate 121 can also protect the control substrate 122 from being damaged by the laser beam during the maintenance of the faulty light emitting element 125 .

須說明的是,在以上圖1A與圖1B所揭示的顯示裝置100中,主動元件陣列基板122a還可包括多條掃描線S23(圖1B僅繪示一條)與多條資料線,其中這些掃描線S23電性連接這些閘極G22,而這些資料線電性連接這些源極S22。如此,可利用這些掃描線S23與資料線來操作這些控制元件T22,進而控制這些發光元件125發光。此外,本實施例所示的控制元件T22為頂閘極型(top-gate)薄膜電晶體,但在其他實施例中,控制元件T22也可以是底閘極型(bottom-gate)薄膜電晶體,所以控制元件T22的類型不受圖式限制。It should be noted that, in the display device 100 disclosed above in FIG. 1A and FIG. 1B , the active device array substrate 122a may further include a plurality of scanning lines S23 (only one is shown in FIG. 1B ) and a plurality of data lines, wherein these scanning lines S23 The line S23 is electrically connected to the gates G22, and the data lines are electrically connected to the sources S22. In this way, the control elements T22 can be operated by using the scan lines S23 and the data lines, so as to control the light emitting elements 125 to emit light. In addition, the control element T22 shown in this embodiment is a top-gate thin film transistor, but in other embodiments, the control element T22 can also be a bottom-gate thin film transistor , so the type of the control element T22 is not limited by the drawing.

圖2A至圖2G是圖1A的顯示裝置的製造方法的剖面示意圖。請參閱圖2A與圖2B,在顯示裝置100的製造方法中,在支撐基板121上形成多個貫孔121h,其中各個貫孔121h從第一表面121a延伸至第二表面121b。此外,在本實施例中,多個支撐基板121可以彼此相連,以整合成一塊大尺寸的支撐聯板121u,其中這些支撐基板121可呈規則排列,例如矩陣排列。換句話說,支撐聯板121u可以劃分出多個支撐基板121。2A to 2G are schematic cross-sectional views of the manufacturing method of the display device shown in FIG. 1A . Referring to FIG. 2A and FIG. 2B , in the manufacturing method of the display device 100 , a plurality of through holes 121 h are formed on the support substrate 121 , wherein each through hole 121 h extends from the first surface 121 a to the second surface 121 b. In addition, in this embodiment, a plurality of supporting substrates 121 can be connected to each other to form a large-sized supporting connecting plate 121u, wherein these supporting substrates 121 can be arranged in a regular arrangement, such as a matrix arrangement. In other words, the supporting link 121u can divide a plurality of supporting substrates 121 .

這些貫孔121h可以利用蝕刻來形成。請參閱圖2A,具體而言,首先,可以令雷射光束LR1照射於支撐基板121。例如,雷射光束LR1可照射於支撐基板121的第一表面121a與第二表面121b,其中支撐基板121可為玻璃板。在雷射光束LR1照射於支撐基板121之後,支撐基板121被雷射光束LR1照射的部分會發生改質,從而形成多個改質部121m。These through holes 121h can be formed by etching. Please refer to FIG. 2A , specifically, firstly, the laser beam LR1 may be irradiated on the supporting substrate 121 . For example, the laser beam LR1 may irradiate the first surface 121 a and the second surface 121 b of the supporting substrate 121 , wherein the supporting substrate 121 may be a glass plate. After the laser beam LR1 is irradiated on the support substrate 121 , the portion of the support substrate 121 irradiated by the laser beam LR1 will be modified, thereby forming a plurality of modified portions 121 m.

須說明的是,用於改質部分支撐基板121的雷射光束LR1並不會貫穿支撐基板121,所以這些改質部121m仍是實體而非是貫孔。相較於一般的雷射鑽孔,雷射光束LR1具有偏低的功率,並且可花費較少時間來照射第一表面121a與第二表面121b。It should be noted that the laser beam LR1 used to modify the supporting substrate 121 does not penetrate the supporting substrate 121 , so these modified parts 121 m are still entities rather than through holes. Compared with general laser drilling, the laser beam LR1 has lower power, and takes less time to irradiate the first surface 121a and the second surface 121b.

請參閱圖2A與圖2B,在雷射光束LR1照射於支撐基板121之後,蝕刻支撐基板121,以移除被雷射光束LR1所照射的部分支撐基板121。也就是說,利用蝕刻來移除這些改質部121m,其中上述蝕刻可以是濕蝕刻。雖然這些改質部121m僅為雷射光束LR1照射支撐基板121而形成,所以改質部121m與原本未改質的支撐基板121兩者構成材料實質相同,但兩者的特性卻不一樣。Referring to FIG. 2A and FIG. 2B , after the laser beam LR1 irradiates the support substrate 121 , the support substrate 121 is etched to remove part of the support substrate 121 irradiated by the laser beam LR1 . That is, the modified portions 121m are removed by etching, wherein the etching may be wet etching. Although the modified parts 121m are only formed by irradiating the supporting substrate 121 with the laser beam LR1, the modified parts 121m and the original unmodified supporting substrate 121 are composed of substantially the same material, but their properties are different.

例如,改質部121m與未改質的部分支撐基板121兩者蝕刻速率會不相同,其中改質部121m的蝕刻速率會明顯大過於未改質的部分支撐基板121的蝕刻速率,以至於改質部121m能被移除,從而形成這些貫孔121h。此外,由於雷射光束LR1具有偏低的功率,並可花費較少時間照射第一表面121a與第二表面121b。相較於一般的雷射鑽孔,以上圖2A與圖2B所揭示的形成貫孔121h的方法具有降低雷射能量、縮短貫孔121h形成時間以及減少或避免貫孔121h內出現裂痕等優點。For example, the etching rate of the modified part 121m and the unmodified part of the supporting substrate 121 will be different, and the etching rate of the modified part 121m will be significantly higher than the etching rate of the unmodified part of the supporting substrate 121, so that the improved The mass portion 121m can be removed, thereby forming these through holes 121h. In addition, since the laser beam LR1 has relatively low power, it takes less time to irradiate the first surface 121a and the second surface 121b. Compared with general laser drilling, the method for forming the through hole 121h disclosed in FIG. 2A and FIG. 2B has the advantages of reducing laser energy, shortening the forming time of the through hole 121h, and reducing or avoiding cracks in the through hole 121h.

請參閱圖2B與圖2C,其中圖2C是圖2B中在貫孔121h處的局部放大示意圖。各個貫孔121h具有位於第一表面121a的第一開口H21以及位於第二表面121b的第二開口H22,其中第一開口H21具有第一孔徑R21,而第二開口H22具有第二孔徑R22。此外,各個貫孔121h在第一開口H21與第二開口H22之間還具有第三孔徑R23。Please refer to FIG. 2B and FIG. 2C , wherein FIG. 2C is a partially enlarged schematic view of the through hole 121h in FIG. 2B . Each through hole 121h has a first opening H21 on the first surface 121a and a second opening H22 on the second surface 121b, wherein the first opening H21 has a first diameter R21, and the second opening H22 has a second diameter R22. In addition, each through hole 121h also has a third aperture R23 between the first opening H21 and the second opening H22.

請參閱圖2A至圖2C,由於改質部121m是透過雷射光束LR1照射而形成,而蝕刻時是從第一表面121a與第二表面121b開始蝕刻,以至於改質部121m的寬度會從第一表面121a與第二表面121b朝向支撐基板121中間遞減。因此,在至少一個貫孔121h中,第一孔徑R21與第二孔徑R22任一者會大於第三孔徑R23。Please refer to FIG. 2A to FIG. 2C , since the modified portion 121m is formed through the irradiation of the laser beam LR1, and the etching starts from the first surface 121a and the second surface 121b, so that the width of the modified portion 121m will be from The first surface 121 a and the second surface 121 b gradually decrease toward the middle of the supporting substrate 121 . Therefore, in at least one through hole 121h, any one of the first aperture R21 and the second aperture R22 is larger than the third aperture R23.

以本實施例為例,在各個貫孔121h中,第一孔徑R21與第二孔徑R22任一者會大於第三孔徑R23,其中第一孔徑R21與第二孔徑R22其中至少一者為貫孔121h的最大孔徑。換句話說,貫孔121h的最大孔徑是位於第一開口H21與第二開口H22其中至少一者。Taking this embodiment as an example, in each of the through holes 121h, any one of the first hole diameter R21 and the second hole diameter R22 will be larger than the third hole diameter R23, wherein at least one of the first hole diameter R21 and the second hole diameter R22 is a through hole 121h maximum aperture. In other words, the maximum diameter of the through hole 121h is located at at least one of the first opening H21 and the second opening H22.

至少一個或各個貫孔121h更具有中央段M12,而第三孔徑R23位於中央段M12,其中第三孔徑R23為貫孔121h的最小孔徑。換句話說,貫孔121h的最小孔徑可位在貫孔121h的中央部位,即中央段M12。此外,第三孔徑R23與最大孔徑(即第一孔徑R21與第二孔徑R22其中至少一者)之間的比值(即R23/R21或R23/R22)可以介於0.6與0.9之間。At least one or each through hole 121h further has a central section M12, and the third aperture R23 is located in the central section M12, wherein the third aperture R23 is the smallest diameter of the through hole 121h. In other words, the minimum diameter of the through hole 121h may be located at the center of the through hole 121h, that is, the central section M12. In addition, the ratio (ie, R23/R21 or R23/R22 ) between the third aperture R23 and the maximum aperture (ie, at least one of the first aperture R21 and the second aperture R22 ) may be between 0.6 and 0.9.

請參閱圖2D,在形成這些貫孔121h之後,在這些貫孔121h內分別形成這些導電材料123。形成這些導電材料123的方法有多種,例如物理氣相沉積(Physical Vapor Deposition,PVD)或化學氣相沉積(Chemical Vapor Deposition,CVD)。在本實施例中,這些導電材料123的形成方法可以是電鍍或者印刷填孔。當這些導電材料123是利用印刷填孔而形成時,導電材料123可以是銀膠或銅膏,並能填充於這些貫孔121h內。Referring to FIG. 2D , after the through holes 121h are formed, the conductive materials 123 are respectively formed in the through holes 121h. There are many methods for forming these conductive materials 123 , such as physical vapor deposition (Physical Vapor Deposition, PVD) or chemical vapor deposition (Chemical Vapor Deposition, CVD). In this embodiment, these conductive materials 123 may be formed by electroplating or printing to fill holes. When the conductive materials 123 are formed by printing and filling holes, the conductive materials 123 can be silver glue or copper paste, and can be filled in the through holes 121h.

請參閱圖2E,之後,在第一表面121a上形成線路結構層124,其電性連接這些導電材料123。在本實施例中,形成線路結構層124的方法可以是在支撐基板121的第一表面121a上依序形成一層線路層124w、一層絕緣層124d、一層平坦層124x、多個導電柱124p以及另一層線路層124w,其中這兩層線路層124w可以是由兩層不共平面的金屬層精微影與蝕刻而形成,而金屬層可用沉積製程而形成,例如物理氣相沉積(PVD)、化學氣相沉積(CVD)或電鍍。Referring to FIG. 2E , afterward, a circuit structure layer 124 is formed on the first surface 121 a, which electrically connects the conductive materials 123 . In this embodiment, the method for forming the wiring structure layer 124 may be to sequentially form a wiring layer 124w, an insulating layer 124d, a flat layer 124x, a plurality of conductive pillars 124p and another layer on the first surface 121a of the supporting substrate 121. A wiring layer 124w, wherein the two wiring layers 124w can be formed by fine lithography and etching of two non-coplanar metal layers, and the metal layer can be formed by a deposition process, such as physical vapor deposition (PVD), chemical gas phase deposition (CVD) or electroplating.

上層的線路層124w與這些導電柱124p可由同一道沉積製程所形成,所以上層的線路層124w與其連接的這些導電柱124p可以是一體成型。因此,上層線路層124w與導電柱124p之間不會有明顯的邊界(boundary)。在第一表面121a上形成線路結構層124以後,可以利用刀具29切割支撐聯板121u,以分離這些支撐基板121。The upper wiring layer 124w and the conductive pillars 124p can be formed by the same deposition process, so the upper wiring layer 124w and the conductive pillars 124p connected to it can be integrally formed. Therefore, there is no obvious boundary between the upper circuit layer 124w and the conductive pillar 124p. After the circuit structure layer 124 is formed on the first surface 121 a , the supporting board 121 u may be cut with a cutter 29 to separate the supporting substrates 121 .

請參閱圖2F,接著,在線路結構層124上設置多個發光元件125,其中這些發光元件125電性連接線路結構層124。以圖2F為例,各個發光元件125具有多個電極(例如陰極與陽極),其中這些電極電性連接上層線路層124w。此外,在線路結構層124上設置這些發光元件125之後,可以在線路結構層124上形成保護層129,以覆蓋及保護這些發光元件125,並且也可以對這些發光元件125進行檢測與篩選,以維持或提升良率。Referring to FIG. 2F , next, a plurality of light emitting elements 125 are disposed on the circuit structure layer 124 , wherein the light emitting elements 125 are electrically connected to the circuit structure layer 124 . Taking FIG. 2F as an example, each light emitting element 125 has a plurality of electrodes (such as cathode and anode), wherein these electrodes are electrically connected to the upper circuit layer 124w. In addition, after these light-emitting elements 125 are arranged on the circuit structure layer 124, a protective layer 129 can be formed on the line structure layer 124 to cover and protect these light-emitting elements 125, and these light-emitting elements 125 can also be detected and screened to Maintain or improve yield.

由於線路結構層124中的這些線路層124w能透過這些導電柱124p而彼此電性連接,而且線路結構層124電性連接這些導電材料123,因此各個發光元件125的這些電極可以透過線路結構層124而電性連接導電材料123。雖然各個發光元件125的這些電極(例如陰極與陽極)電性連接上層線路層124w,但這些電極並不會直接電性連接,以避免發生短路。Since the circuit layers 124w in the circuit structure layer 124 can be electrically connected to each other through the conductive pillars 124p, and the circuit structure layer 124 is electrically connected to the conductive materials 123, the electrodes of each light emitting element 125 can pass through the circuit structure layer 124 And electrically connected to the conductive material 123 . Although the electrodes (such as cathode and anode) of each light emitting element 125 are electrically connected to the upper circuit layer 124w, these electrodes are not directly electrically connected to avoid short circuit.

請參閱圖2G,在這些發光元件125設置在線路結構層124上之後,將支撐基板121設置在控制基板122上,以形成顯示組件120,其中主動元件陣列基板122a的這些電極E22與這些導電材料123可以利用低溫金屬接合或焊接等方式而彼此電性連接,而前述低溫金屬接合例如是低溫銅對銅接合或者導電材料結合。Please refer to FIG. 2G, after these light-emitting elements 125 are arranged on the circuit structure layer 124, the support substrate 121 is arranged on the control substrate 122 to form the display assembly 120, wherein the electrodes E22 of the active element array substrate 122a and the conductive materials 123 can be electrically connected to each other by means of low-temperature metal bonding or welding, and the aforementioned low-temperature metal bonding is, for example, low-temperature copper-to-copper bonding or conductive material bonding.

如此,支撐基板121內的這些導電材料123能電性連接控制基板122。此外,由於這些發光元件125可以透過線路結構層124而電性連接這些導電材料123,因此透過線路結構層124與這些導電材料123,這些發光元件125能電性連接控制基板122,以使控制基板122能控制這些發光元件125發光。In this way, the conductive materials 123 in the support substrate 121 can be electrically connected to the control substrate 122 . In addition, since the light-emitting elements 125 can be electrically connected to the conductive materials 123 through the circuit structure layer 124, the light-emitting elements 125 can be electrically connected to the control substrate 122 through the circuit structure layer 124 and the conductive materials 123, so that the control substrate 122 can control these light emitting elements 125 to emit light.

值得一提的是,支撐基板121是設置在已完成的控制基板122上,所以支撐基板121與控制基板122是兩個獨立的元件。因此,支撐基板121與控制基板122兩者可以分別在兩個不同的製造場所中製造。It is worth mentioning that the support substrate 121 is disposed on the completed control substrate 122 , so the support substrate 121 and the control substrate 122 are two independent components. Therefore, both the support substrate 121 and the control substrate 122 can be manufactured in two different manufacturing locations.

請參閱圖1A,之後,將至少一個顯示組件120設置在同一塊承載基板110上,其中在圖1A中,是將多個顯示組件120設置在同一塊承載基板110上。至此,顯示裝置100大致上已製造完成。在本實施例中,這些顯示組件120可以利用膠材130設置在承載基板110上。Referring to FIG. 1A , after that, at least one display component 120 is disposed on the same carrier substrate 110 , wherein in FIG. 1A , multiple display components 120 are disposed on the same carrier substrate 110 . So far, the display device 100 has been substantially manufactured. In this embodiment, the display components 120 can be disposed on the carrier substrate 110 by using an adhesive material 130 .

圖3是本發明另一實施例的顯示裝置的剖面示意圖。請參閱圖3,本實施例的顯示裝置300相似於前述實施例的顯示裝置100,而以下原則上不再敘述顯示裝置100與300的相同特徵。顯示裝置100與300之間的差異在於:顯示裝置300包括多個顯示組件320,其中各個顯示組件320包括不同於前述實施例的控制基板322。FIG. 3 is a schematic cross-sectional view of a display device according to another embodiment of the present invention. Referring to FIG. 3 , the display device 300 of this embodiment is similar to the display device 100 of the foregoing embodiment, and the same features of the display devices 100 and 300 will not be described below in principle. The difference between the display devices 100 and 300 is that the display device 300 includes a plurality of display components 320 , wherein each display component 320 includes a control substrate 322 different from the previous embodiments.

具體而言,各個控制基板322包括主動元件陣列基板122a與電路基板322c,其中電路基板322c電性連接主動元件陣列基板122a,而電路基板322c可以是軟性電路板或軟硬複合電路板。不同於控制基板122,在同一個控制基板322中,電路基板322c可以撓曲,以使電路基板322c從側面S13延伸至下表面S12。如此,電路基板322c不僅設置於側面S13,而且也設置於下表面S12。Specifically, each control substrate 322 includes an active device array substrate 122a and a circuit substrate 322c, wherein the circuit substrate 322c is electrically connected to the active device array substrate 122a, and the circuit substrate 322c may be a flexible circuit board or a soft-hard composite circuit board. Different from the control substrate 122, in the same control substrate 322, the circuit substrate 322c can be flexed so that the circuit substrate 322c extends from the side S13 to the lower surface S12. In this way, the circuit board 322c is provided not only on the side surface S13 but also on the lower surface S12.

值得一提的是,在本實施例中,電路基板322c是設置於側面S13與下表面S12,即電路基板322c覆蓋側面S13與下表面S12。然而,在其他實施例中,電路基板322c也可以僅設置於下表面S12,不設置也不覆蓋於側面S13。因此,圖3不限制電路基板322c要覆蓋側面S13與下表面S12。此外,在本實施例中,膠材130可以接觸及黏合部分電路基板322c,但在其他實施例中,膠材130可以僅接觸與黏合主動元件陣列基板122a,不接觸也不黏合電路基板322c。所以,圖3也不限制膠材130黏合電路基板322c的方式。It is worth mentioning that, in this embodiment, the circuit substrate 322c is disposed on the side surface S13 and the lower surface S12, that is, the circuit substrate 322c covers the side surface S13 and the lower surface S12. However, in other embodiments, the circuit substrate 322c may also be only disposed on the lower surface S12, and not disposed nor covered on the side surface S13. Therefore, FIG. 3 does not limit the circuit substrate 322c to cover the side surface S13 and the lower surface S12. In addition, in this embodiment, the adhesive material 130 can contact and bond part of the circuit substrate 322c, but in other embodiments, the adhesive material 130 can only contact and bond the active device array substrate 122a, and not contact or bond the circuit substrate 322c. Therefore, FIG. 3 does not limit the manner in which the adhesive material 130 adheres to the circuit substrate 322c.

圖4A至圖4B是本發明另一實施例的顯示裝置的製造方法的側視示意圖。請參閱圖4A與圖4B,本實施例的顯示裝置400(請參閱圖4B)與前述實施例的顯示裝置100相似,且兩者製造方法也相似。顯示裝置100與400之間的主要差異在於:顯示裝置400還包括供這些顯示組件120設置的多個固定基板440。以下主要敘述本實施例與前述實施例之間的差異,兩者相同技術特徵原則上不再重複敘述。4A to 4B are schematic side views of a manufacturing method of a display device according to another embodiment of the present invention. Referring to FIG. 4A and FIG. 4B , the display device 400 of this embodiment (see FIG. 4B ) is similar to the display device 100 of the previous embodiment, and the manufacturing methods of the two are also similar. The main difference between the display devices 100 and 400 is that the display device 400 further includes a plurality of fixed substrates 440 on which the display components 120 are disposed. The following mainly describes the differences between this embodiment and the foregoing embodiments, and the same technical features of the two will not be repeated in principle.

具體而言,在本實施例的顯示裝置400的製造方法中,可以提供多個固定基板440,其中各個固定基板440的尺寸明顯小於承載基板110的尺寸,如圖4B所示。此外,這些固定基板440的材料可相同於承載基板110。例如,固定基板440也可以是金屬板、玻璃板或陶瓷板。Specifically, in the manufacturing method of the display device 400 of this embodiment, a plurality of fixed substrates 440 may be provided, wherein the size of each fixed substrate 440 is significantly smaller than that of the carrier substrate 110 , as shown in FIG. 4B . In addition, the materials of these fixing substrates 440 can be the same as that of the carrier substrate 110 . For example, the fixed substrate 440 may also be a metal plate, a glass plate or a ceramic plate.

在將支撐基板121設置在控制基板122上,以形成多個顯示組件120之後(請參考圖2G),可將至少一個顯示組件120設置在其中一塊固定基板440上。在本實施例中,這些顯示組件120分別設置在這些固定基板440上,而多個顯示組件120可設置在其中一塊固定基板440上,其中這些顯示組件120可以用膠材130而設置在同一塊固定基板440上。After the supporting substrate 121 is disposed on the control substrate 122 to form a plurality of display components 120 (please refer to FIG. 2G ), at least one display component 120 may be disposed on one of the fixed substrates 440 . In this embodiment, these display components 120 are arranged on these fixed substrates 440 respectively, and a plurality of display components 120 can be arranged on one of the fixed substrates 440, wherein these display components 120 can be arranged on the same block with adhesive material 130 fixed on the substrate 440 .

須說明的是,在其他實施例中,可將僅一個顯示組件120設置在其中一塊固定基板440上。因此,設置在一塊固定基板440上的顯示組件120的數量不限制是多個。在顯示組件120設置在固定基板440上之後,將這些固定基板440設置在承載基板110上。至此,一種包括多個固定基板440的顯示裝置400大致上已製造完成。It should be noted that, in other embodiments, only one display component 120 may be disposed on one of the fixed substrates 440 . Therefore, the number of display components 120 disposed on one fixed substrate 440 is not limited to a plurality. After the display assembly 120 is disposed on the fixed substrates 440 , these fixed substrates 440 are disposed on the carrier substrate 110 . So far, a display device 400 including a plurality of fixed substrates 440 has been substantially manufactured.

圖4C是圖4B中的顯示裝置的局部剖面示意圖,其中圖4C具體呈現其中一種固定基板440與承載基板110之間的設置方式。請參閱圖4B與圖4C,這些固定基板440設置在承載基板110上,並位於這些顯示組件120與承載基板110之間。這些固定基板440可以可拆卸地(detachably)設置在承載基板110上。以圖4C為例,這些固定基板440可利用多個鎖固件490固定在承載基板110上,其中這些鎖固件490可包括螺栓與螺帽(皆未標示),並可貫穿固定基板440與承載基板110。FIG. 4C is a schematic partial cross-sectional view of the display device shown in FIG. 4B , wherein FIG. 4C specifically presents an arrangement between the fixed substrate 440 and the carrier substrate 110 . Referring to FIG. 4B and FIG. 4C , the fixing substrates 440 are disposed on the carrier substrate 110 and located between the display components 120 and the carrier substrate 110 . These fixed substrates 440 may be detachably disposed on the carrier substrate 110 . Taking FIG. 4C as an example, these fixed substrates 440 can be fixed on the carrier substrate 110 by using a plurality of fasteners 490, wherein these fasteners 490 can include bolts and nuts (not shown), and can penetrate the fixed substrate 440 and the carrier substrate. 110.

在將這些固定基板440設置在承載基板110上的過程中,這些鎖固件490可以調整各個固定基板440相對於承載基板110的傾斜角度,其中固定基板440與承載基板110之間也可設置至少一片墊片(washer),以幫助調整上述傾斜角度。如此,這些顯示組件120能平整地設置在承載基板110上,從而有助於縮小相鄰兩個支撐基板121之間的距離D1,以有效地減少或消除拼接縫,進而維持或提升顯示裝置400的影像品質。During the process of setting these fixed substrates 440 on the carrier substrate 110, these locking members 490 can adjust the inclination angle of each fixed substrate 440 relative to the carrier substrate 110, wherein at least one A washer to help adjust the angle of inclination mentioned above. In this way, these display components 120 can be flatly arranged on the carrier substrate 110, thereby helping to reduce the distance D1 between two adjacent support substrates 121, so as to effectively reduce or eliminate the splicing seam, thereby maintaining or improving the display device. 400 image quality.

在其他實施例中,固定基板440也可採用鎖固件490以外的其他方式而設置在承載基板110上。例如,固定基板440與承載基板110其中至少一者可裝設磁鐵,以使固定基板440與承載基板110能透過磁力而彼此吸引,進而讓固定基板440可以被固定在承載基板110上。或者,這些固定基板440也可利用扣合的方式設置在承載基板110上。此外,固定基板440也可以利用膠材(例如膠材130)設置在承載基板110上。因此,固定基板440設置在承載基板110上的方式不以圖4C為限。In other embodiments, the fixing substrate 440 may also be disposed on the carrier substrate 110 by means other than the locking member 490 . For example, at least one of the fixed substrate 440 and the carrier substrate 110 can be equipped with a magnet, so that the fixed substrate 440 and the carrier substrate 110 can attract each other through magnetic force, so that the fixed substrate 440 can be fixed on the carrier substrate 110 . Alternatively, these fixed substrates 440 can also be disposed on the carrier substrate 110 in a buckling manner. In addition, the fixed substrate 440 can also be disposed on the carrier substrate 110 by using an adhesive material (such as the adhesive material 130 ). Therefore, the manner in which the fixed substrate 440 is disposed on the carrier substrate 110 is not limited to that shown in FIG. 4C .

當顯示組件120發生故障時,透過鎖固件490,可以將故障的顯示組件120所在的固定基板440從承載基板110上拆卸下來,並將已設置多個正常顯示組件120的固定基板440重新設置在承載基板110上,以替換先前被拆卸的故障顯示組件120。由此可知,利用這些固定基板440,顯示裝置400中的故障顯示組件120能被汰換,以使顯示裝置400具有維修便利等優點。When the display assembly 120 fails, through the locking member 490, the fixed substrate 440 on which the faulty display assembly 120 is located can be disassembled from the carrier substrate 110, and the fixed substrate 440 on which a plurality of normal display assemblies 120 have been installed can be reset. on the carrier substrate 110 to replace the previously disassembled fault display assembly 120 . It can be seen that, by using these fixed substrates 440 , the failure display assembly 120 in the display device 400 can be replaced, so that the display device 400 has advantages such as convenient maintenance.

值得一提的是,在圖4A至圖4C所示的實施例中,顯示裝置400包括多個顯示組件120。不過,在其他實施例中,顯示裝置400也可包括多個顯示組件320,其中圖4A至圖4C所示的顯示組件120可替換成如圖3所示的顯示組件320。換句話說,這些顯示組件320也可分別設置在這些固定基板440上,而多個顯示組件320可設置在其中一塊固定基板440上,其中這些顯示組件320也能用膠材130而設置在同一塊固定基板440上。由此可知,固定基板440也可使用於前述實施例,而圖3所示的顯示裝置300也可包括多個固定基板440。It is worth mentioning that, in the embodiment shown in FIGS. 4A to 4C , the display device 400 includes a plurality of display components 120 . However, in other embodiments, the display device 400 may also include a plurality of display components 320 , wherein the display components 120 shown in FIGS. 4A to 4C may be replaced with the display components 320 shown in FIG. 3 . In other words, these display components 320 can also be set on these fixed substrates 440 respectively, and multiple display components 320 can be set on one of the fixed substrates 440, wherein these display components 320 can also be set on the same fixed substrate 440 by using the adhesive material 130. on a fixed substrate 440 . It can be seen that the fixed substrate 440 can also be used in the aforementioned embodiments, and the display device 300 shown in FIG. 3 can also include a plurality of fixed substrates 440 .

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者,在不脫離本發明精神和範圍內,當可作些許更動與潤飾,因此本發明保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above with the embodiments, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field of the present invention can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The protection scope of the invention shall be defined by the scope of the appended patent application.

22a:基板 29:刀具 100、300:顯示裝置 110:承載基板 120、320:顯示組件 121:支撐基板 121a:第一表面 121b:第二表面 121h:貫孔 121m:改質部 121u:支撐聯板 122、322:控制基板 122a:主動元件陣列基板 122c、322c:電路基板 123:導電材料 124:線路結構層 124d、IN1、IN2、IN3、IN4:絕緣層 124p:導電柱 124w:線路層 124x:平坦層 124y:接墊 125:發光元件 129:保護層 130:膠材 440:固定基板 490:鎖固件 C22:通道層 D1:距離 D22:汲極 E22:電極 G22:閘極 H21:第一開口 H22:第二開口 L21、L22:寬度 LR1:雷射光束 M12:中央段 R21:第一孔徑 R22:第二孔徑 R23:第三孔徑 S11:上表面 S12:下表面 S13:側面 S22:源極 S23:掃描線 T22:控制元件 22a: Substrate 29: Knife 100, 300: display device 110: carrying substrate 120, 320: display components 121: supporting substrate 121a: first surface 121b: second surface 121h: through hole 121m: Modification department 121u: support connecting plate 122, 322: control substrate 122a: active element array substrate 122c, 322c: circuit substrate 123: Conductive material 124: Line structure layer 124d, IN1, IN2, IN3, IN4: insulating layer 124p: Conductive column 124w: line layer 124x: flat layer 124y: Pad 125: Light emitting element 129: protective layer 130: Adhesive material 440: fixed substrate 490: lock C22: Channel layer D1: distance D22: drain E22: Electrode G22: Gate H21: first opening H22: second opening L21, L22: Width LR1: laser beam M12: central section R21: First aperture R22: second aperture R23: third aperture S11: Upper surface S12: Lower surface S13: side S22: source S23: Scanning line T22: Control element

圖1A是本發明至少一實施例的顯示裝置的剖面示意圖。 圖1B是圖1A中其中一個顯示組件的局部放大示意圖。 圖2A至圖2G是圖1A的顯示裝置的製造方法的剖面示意圖。 圖3是本發明另一實施例的顯示裝置的剖面示意圖。 圖4A至圖4B是本發明另一實施例的顯示裝置的製造方法的側視示意圖。 圖4C是圖4B中的顯示裝置的局部剖面示意圖。 FIG. 1A is a schematic cross-sectional view of a display device according to at least one embodiment of the present invention. FIG. 1B is a partially enlarged schematic view of one of the display components in FIG. 1A . 2A to 2G are schematic cross-sectional views of the manufacturing method of the display device shown in FIG. 1A . FIG. 3 is a schematic cross-sectional view of a display device according to another embodiment of the present invention. 4A to 4B are schematic side views of a manufacturing method of a display device according to another embodiment of the present invention. FIG. 4C is a schematic partial cross-sectional view of the display device in FIG. 4B .

100:顯示裝置 100: display device

110:承載基板 110: carrying substrate

120:顯示組件 120: Display components

121:支撐基板 121: supporting substrate

121a:第一表面 121a: first surface

121b:第二表面 121b: second surface

121h:貫孔 121h: through hole

122:控制基板 122: Control substrate

122a:主動元件陣列基板 122a: active element array substrate

122c:電路基板 122c: circuit substrate

123:導電材料 123: Conductive material

124:線路結構層 124: Line structure layer

124d:絕緣層 124d: insulating layer

124p:導電柱 124p: Conductive column

124w:線路層 124w: line layer

124x:平坦層 124x: flat layer

124y:接墊 124y: Pad

125:發光元件 125: Light emitting element

129:保護層 129: protective layer

130:膠材 130: Adhesive material

D1:距離 D1: distance

L21、L22:寬度 L21, L22: Width

S11:上表面 S11: Upper surface

S12:下表面 S12: Lower surface

S13:側面 S13: side

Claims (14)

一種顯示裝置的製造方法,包括: 在一支撐基板上形成多個貫孔,其中該支撐基板具有一第一表面以及一相對該第一表面的第二表面,而該些貫孔從該第一表面延伸至該第二表面; 在該些貫孔內分別形成多個導電材料; 在該第一表面上形成一線路結構層,其中該線路結構層電性連接該些導電材料; 在該線路結構層上設置多個發光元件,其中該些發光元件電性連接該線路結構層; 在該些發光元件設置在該線路結構層上之後,將該支撐基板設置在一控制基板上,以形成一顯示組件,其中該些導電材料電性連接該控制基板,以使該控制基板電性連接該些發光元件;以及 將多個該顯示組件設置在一承載基板上。 A method of manufacturing a display device, comprising: forming a plurality of through holes on a support substrate, wherein the support substrate has a first surface and a second surface opposite to the first surface, and the through holes extend from the first surface to the second surface; Forming a plurality of conductive materials in the through holes respectively; forming a circuit structure layer on the first surface, wherein the circuit structure layer is electrically connected to the conductive materials; A plurality of light-emitting elements are arranged on the circuit structure layer, wherein the light-emitting elements are electrically connected to the circuit structure layer; After the light-emitting elements are arranged on the circuit structure layer, the supporting substrate is arranged on a control substrate to form a display component, wherein the conductive materials are electrically connected to the control substrate to make the control substrate electrically connecting the light emitting elements; and A plurality of the display components are arranged on a carrier substrate. 如請求項1所述的顯示裝置的製造方法,其中在該支撐基板上形成該些貫孔的步驟包括: 令一雷射光束照射於該支撐基板;以及 在該雷射光束照射於該支撐基板之後,蝕刻該支撐基板,以移除被該雷射光束所照射的部分該支撐基板。 The method for manufacturing a display device according to claim 1, wherein the step of forming the through holes on the supporting substrate comprises: irradiating a laser beam on the support substrate; and After the laser beam is irradiated on the support substrate, the support substrate is etched to remove the part of the support substrate irradiated by the laser beam. 如請求項1所述的顯示裝置的製造方法,其中在該些貫孔內分別形成該些導電材料的方法包括電鍍或印刷填孔。The method for manufacturing a display device according to claim 1, wherein the method of forming the conductive materials in the through holes includes electroplating or printing hole filling. 如請求項1所述的顯示裝置的製造方法,其中在該第一表面上形成該線路結構層以前,多個該支撐基板整合成一支撐聯板; 在該第一表面上形成該線路結構層以後,切割該支撐聯板,以分離該些支撐基板。 The manufacturing method of a display device as claimed in claim 1, wherein before forming the circuit structure layer on the first surface, a plurality of the supporting substrates are integrated into a supporting connecting plate; After the circuit structure layer is formed on the first surface, the supporting connecting plate is cut to separate the supporting substrates. 如請求項1所述的顯示裝置的製造方法,其中將該些顯示組件設置在該承載基板上的步驟包括: 提供多個固定基板; 將至少一該顯示組件設置在其中一該固定基板上;以及 將該些固定基板設置在該承載基板上。 The method for manufacturing a display device as claimed in item 1, wherein the step of arranging the display components on the carrier substrate includes: Provide multiple fixed substrates; disposing at least one of the display components on one of the fixed substrates; and The fixed substrates are arranged on the carrier substrate. 一種顯示裝置,包括: 一承載基板; 多個顯示組件,設置在該承載基板上,其中該些顯示組件規則排列在該承載基板上,各該顯示組件包括: 一控制基板,設置在該承載基板上; 一支撐基板,具有一第一表面、一相對該第一表面的第二表面以及多個貫孔,其中該些貫孔從該第一表面延伸至該第二表面,該支撐基板設置在該控制基板上; 多個導電材料,分別位在該些貫孔內,並電性連接該控制基板; 一線路結構層,設置在該第一表面上,並電性連接該些導電材料,其中該支撐基板位於該線路結構層與該控制基板之間;以及 多個發光元件,設置在該線路結構層上,並電性連接該線路結構層。 A display device comprising: a carrier substrate; A plurality of display components are arranged on the carrier substrate, wherein the display components are regularly arranged on the carrier substrate, and each display component includes: a control substrate, arranged on the carrier substrate; A support substrate has a first surface, a second surface opposite to the first surface and a plurality of through holes, wherein the through holes extend from the first surface to the second surface, the support substrate is arranged on the control on the substrate; A plurality of conductive materials are respectively located in the through holes and electrically connected to the control substrate; a circuit structure layer disposed on the first surface and electrically connected to the conductive materials, wherein the supporting substrate is located between the circuit structure layer and the control substrate; and A plurality of light-emitting elements are arranged on the circuit structure layer and electrically connected to the circuit structure layer. 如請求項6所述的顯示裝置,其中該支撐基板的尺寸大於該控制基板的尺寸。The display device as claimed in claim 6, wherein the size of the support substrate is larger than the size of the control substrate. 如請求項6所述的顯示裝置,其中該控制基板包括: 一主動元件陣列基板,具有一上表面、一下表面與一位於該上表面與該下表面之間的側面,其中該支撐基板設置在該上表面上,並完全覆蓋該上表面,且該支撐基板凸出於該側面;以及 一電路基板,電性連接該主動元件陣列基板。 The display device as claimed in item 6, wherein the control substrate comprises: An active element array substrate has an upper surface, a lower surface and a side surface between the upper surface and the lower surface, wherein the supporting substrate is arranged on the upper surface and completely covers the upper surface, and the supporting substrate protrudes from that side; and A circuit substrate is electrically connected to the active element array substrate. 如請求項8所述的顯示裝置,其中該電路基板設置於該側面。The display device as claimed in claim 8, wherein the circuit substrate is disposed on the side surface. 如請求項8所述的顯示裝置,其中該電路基板設置於該下表面。The display device as claimed in claim 8, wherein the circuit substrate is disposed on the lower surface. 如請求項6所述的顯示裝置,其中至少一該貫孔具有: 一位於該第一表面的第一開口,具有一第一孔徑;以及 一位於該第二表面的第二開口,具有一第二孔徑,其中該貫孔在該第一開口與該第二開口之間具有一第三孔徑,而該第一孔徑與該第二孔徑任一者大於該第三孔徑。 The display device according to claim 6, wherein at least one of the through holes has: a first opening on the first surface having a first aperture; and A second opening on the second surface has a second aperture, wherein the through hole has a third aperture between the first opening and the second opening, and any of the first aperture and the second aperture One is larger than the third aperture. 如請求項11所述的顯示裝置,其中該貫孔更具有一中央段,而該第三孔徑位於該中央段,該第一孔徑與該第二孔徑其中至少一者為該貫孔的一最大孔徑,而該第三孔徑為該貫孔的一最小孔徑,其中該第三孔徑與該最大孔徑之間的比值介於0.6與0.9之間。The display device according to claim 11, wherein the through hole further has a central section, and the third aperture is located in the central section, and at least one of the first aperture and the second aperture is a maximum of the through hole. aperture, and the third aperture is a minimum aperture of the through hole, wherein the ratio between the third aperture and the maximum aperture is between 0.6 and 0.9. 如請求項11所述的顯示裝置,其中相鄰兩該支撐基板之間的距離在400微米以內。The display device according to claim 11, wherein the distance between two adjacent supporting substrates is within 400 microns. 如請求項6所述的顯示裝置,還包括: 多個固定基板,設置在該承載基板上,其中該些顯示組件分別設置在該些固定基板上,而該些固定基板位於該些顯示組件與該承載基板之間。 The display device as described in claim 6, further comprising: A plurality of fixed substrates are arranged on the carrier substrate, wherein the display components are respectively arranged on the fixed substrates, and the fixed substrates are located between the display components and the carrier substrate.
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