TW202225624A - Sintering equipment - Google Patents
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- TW202225624A TW202225624A TW110142677A TW110142677A TW202225624A TW 202225624 A TW202225624 A TW 202225624A TW 110142677 A TW110142677 A TW 110142677A TW 110142677 A TW110142677 A TW 110142677A TW 202225624 A TW202225624 A TW 202225624A
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- 238000005245 sintering Methods 0.000 title claims abstract description 96
- 238000001816 cooling Methods 0.000 claims abstract description 153
- 239000002245 particle Substances 0.000 claims abstract description 22
- 239000000428 dust Substances 0.000 claims abstract description 19
- 238000005192 partition Methods 0.000 claims description 38
- 238000001914 filtration Methods 0.000 claims description 35
- 238000004891 communication Methods 0.000 claims description 26
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 239000002826 coolant Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
- F27B9/028—Multi-chamber type furnaces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
- B01D46/12—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces in multiple arrangements
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/3005—Details, accessories, or equipment peculiar to furnaces of these types arrangements for circulating gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
- F27B2009/124—Cooling
- F27B2009/126—Cooling involving the circulation of cooling gases, e.g. air
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electromagnetism (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Abstract
Description
本案涉及一種燒結設備,尤其是用於太陽能電池光伏裝置製造的燒結設備。This case relates to a sintering equipment, especially a sintering equipment used in the manufacture of solar cell photovoltaic devices.
在晶體矽太陽能電池矽片等光伏裝置的生產中,需要使用燒結設備對光伏裝置進行燒結加工。燒結設備至少包括燒結段和冷卻段。其中光伏裝置經傳送帶輸送依次經過燒結段和冷卻段,再被傳送帶輸送離開燒結設備。光伏裝置在燒結段經高溫燒結以達到一定的性能,接著光伏裝置進入冷卻段降溫,冷卻段能夠將光伏裝置的溫度降低至一定範圍。In the production of photovoltaic devices such as crystalline silicon solar cells and wafers, sintering equipment is required to sinter the photovoltaic devices. The sintering equipment includes at least a sintering section and a cooling section. The photovoltaic device is transported by the conveyor belt through the sintering section and the cooling section in turn, and then is transported by the conveyor belt to leave the sintering equipment. The photovoltaic device is sintered at high temperature in the sintering section to achieve a certain performance, and then the photovoltaic device enters the cooling section to cool down, and the cooling section can reduce the temperature of the photovoltaic device to a certain range.
本案提供一種具有過濾系統的燒結設備,所述燒結設備包括:燒結段,所述燒結段具有燒結空間,所述燒結段被配置為對輸送通過所述燒結空間的光伏裝置進行燒結;冷卻段,所述冷卻段具有冷卻空間,所述冷卻段在光伏裝置的輸送方向上設置在所述燒結段的下游,所述冷卻段被配置為對輸送通過所述冷卻空間的光伏裝置進行冷卻;過濾系統,所述過濾系統包括過濾裝置,所述過濾裝置具有過濾裝置殼體和設置在所述過濾裝置殼體中過濾件,所述過濾裝置殼體具有氣體入口和氣體出口,所述氣體入口和氣體出口均與所述冷卻段的所述冷卻空間連通,所述過濾裝置被配置為對所述冷卻空間中的氣體進行過濾。The present application provides a sintering apparatus with a filtering system, the sintering apparatus comprising: a sintering section, the sintering section has a sintering space, the sintering section is configured to sinter a photovoltaic device conveyed through the sintering space; a cooling section, The cooling section has a cooling space, the cooling section is arranged downstream of the sintering section in the conveying direction of the photovoltaic device, the cooling section is configured to cool the photovoltaic device conveyed through the cooling space; a filter system , the filter system includes a filter device, the filter device has a filter device housing and a filter element arranged in the filter device housing, the filter device housing has a gas inlet and a gas outlet, the gas inlet and the gas The outlets are all in communication with the cooling space of the cooling section, and the filtering device is configured to filter the gas in the cooling space.
如前述的燒結設備,所述冷卻段包括換熱裝置,所述換熱裝置在所述冷卻空間中設置在被冷卻的光伏裝置的下方;所述過濾系統包括風管,所述風管的風管出口與所述過濾裝置的氣體入口連接,所述風管的風管入口位於所述冷卻空間內並位於光伏裝置下方,所述風管被配置為將經所述換熱裝置冷卻後的空氣送入所述過濾裝置。According to the aforementioned sintering equipment, the cooling section includes a heat exchange device, and the heat exchange device is arranged below the photovoltaic device to be cooled in the cooling space; the filter system includes an air duct, and the air of the air duct A duct outlet is connected to a gas inlet of the filter device, the duct inlet of the air duct is located in the cooling space and below the photovoltaic device, the air duct is configured to cool the air after the heat exchange device into the filter unit.
如前述的燒結設備,所述燒結設備還包括空氣動力裝置,所述空氣動力裝置包括至少一個第一風機,所述過濾系統與空氣動力裝置連接,所述空氣動力裝置設置在所述風管的風管入口處,以引導氣體流向所述過濾裝置的氣體入口。Like the aforementioned sintering equipment, the sintering equipment further includes an aerodynamic device, the aerodynamic device includes at least one first fan, the filter system is connected to the aerodynamic device, and the aerodynamic device is arranged on the side of the air duct. at the inlet of the air duct to guide the gas flow to the gas inlet of the filtering device.
如前述的燒結設備,所述燒結設備還包括風箱,所述風箱具有風箱入口和風箱出口,所述風箱入口與所述換熱裝置連接,所述風箱出口與所述風管連通,所述空氣動力裝置設置在所述風箱上,所述空氣動力裝置被配置為引導氣流經換熱裝置後從風箱入口流向風箱出口。Like the aforementioned sintering equipment, the sintering equipment further comprises a bellows, the bellows has a bellows inlet and a bellows outlet, the bellows inlet is connected to the heat exchange device, and the bellows outlet is connected to the air duct communication, the aerodynamic device is provided on the bellows, the aerodynamic device is configured to guide the air flow from the bellows inlet to the bellows outlet after passing through the heat exchange device.
如前述的燒結設備,所述換熱裝置包括換熱管,所述換熱管中流通冷卻媒體,所述換熱裝置中具有氣流通道,所述風箱設置在所述換熱裝置的下方。As in the aforementioned sintering equipment, the heat exchange device includes a heat exchange tube through which a cooling medium flows, an air flow channel is provided in the heat exchange device, and the bellows is arranged below the heat exchange device.
如前述的燒結設備,所述過濾裝置還包括設置在所述過濾裝置殼體中的至少一個第二風機,所述第二風機被配置為提供動力以引導從所述過濾裝置殼體的氣體入口進入的氣流穿過所述過濾件而被過濾。As in the aforementioned sintering apparatus, the filter device further comprises at least one second fan disposed in the filter device housing, the second fan configured to provide power to direct a gas inlet from the filter device housing The incoming air flow is filtered through the filter element.
如前述的燒結設備,所述過濾裝置殼體具有頂壁、底壁、前壁、後壁、左壁和右壁,所述氣體入口和氣體出口均設置在所述過濾裝置殼體的底壁上,所述過濾裝置殼體中具有過濾空間以及氣流輸出通道,所述氣體入口與所述過濾空間的底部連通,所述氣流輸出通道將所述過濾空間的頂部與所述氣體出口連通,所述過濾件設置在所述過濾空間中。As in the aforementioned sintering equipment, the filter housing has a top wall, a bottom wall, a front wall, a rear wall, a left wall and a right wall, and the gas inlet and gas outlet are both provided on the bottom wall of the filter housing Above, the filter device housing has a filter space and an airflow output channel, the gas inlet communicates with the bottom of the filter space, and the airflow output channel connects the top of the filter space with the gas outlet, so The filter element is arranged in the filter space.
如前述的燒結設備,所述過濾裝置中設有橫向隔板和豎向隔板,所述豎向隔板自所述過濾裝置殼體的底壁的位於所述氣體入口和氣體出口之間的位置處向上延伸,並與所述過濾裝置殼體的頂壁之間具有一定間距,所述橫向隔板的一側與所述豎向隔板連接,另一側與所述過濾裝置殼體的左壁連接,所述橫向隔板和豎向隔板均與所述過濾裝置殼體的前壁和後壁連接,從而所述橫向隔板和豎向隔板將所述過濾裝置殼體的內部空間分隔為過濾空間以及氣流輸出通道;As in the aforementioned sintering equipment, the filter device is provided with a transverse partition plate and a vertical partition plate, and the vertical partition plate is located from the bottom wall of the filter device housing between the gas inlet and the gas outlet. It extends upward at the position and has a certain distance from the top wall of the filter housing. One side of the horizontal partition is connected to the vertical partition, and the other side is connected to the filter housing. The left wall is connected, and the horizontal and vertical partitions are both connected to the front and rear walls of the filter housing, so that the horizontal and vertical partitions connect the interior of the filter housing. The space is divided into filter space and airflow output channel;
其中所述橫向隔板上具有至少一個連通孔,所述氣流輸出通道通過所述連通孔與所述過濾空間連通。Wherein at least one communication hole is formed on the transverse partition, and the airflow output channel communicates with the filter space through the communication hole.
如前述的燒結設備,所述過濾件包括第一級濾芯和第二級濾芯,所述第一級濾芯設置在氣流方向上的上游,所述第一級濾芯被配置為過濾氣體中大於5微米的粉塵顆粒,所述第二級濾芯被配置為過濾氣體中大於0.5微米粉塵顆粒。According to the aforementioned sintering equipment, the filter element includes a first-stage filter element and a second-stage filter element, the first-stage filter element is disposed upstream in the direction of airflow, and the first-stage filter element is configured to filter the gas larger than 5 microns of dust particles, the second-stage filter element is configured to filter dust particles larger than 0.5 microns in the gas.
如前述的燒結設備,所述至少一個第二風機安裝在所述至少一個連通孔處,所述至少一個連通孔設置在所述橫向隔板靠近所述過濾裝置殼體的左壁處;According to the aforementioned sintering equipment, the at least one second fan is installed at the at least one communication hole, and the at least one communication hole is arranged at the left wall of the lateral partition plate close to the filter device housing;
所述氣流輸出通道包括位於所述過濾裝置殼體的頂壁與所述橫向隔板之間的橫向通道、以及位於所述豎向隔板與所述右壁之間的豎向通道;The airflow output channel includes a transverse channel located between the top wall of the filter device housing and the transverse partition plate, and a vertical channel located between the vertical partition plate and the right wall;
所述過濾裝置包括第一導流板和第二導流板,所述第一導流板和第二導流板分別自所述過濾裝置殼體的頂部朝向所述左壁和右壁傾斜延伸,所述第一導流板位於所述連通孔的上方,所述第二導流板位於所述豎向通道上方,所述第一導流板被配置為引導從所述第二風機流出的氣流向所述橫向通道,所述第二導流板被配置為引導所述橫向通道中的氣流流向所述豎向通道。The filter device includes a first air guide plate and a second air guide plate, the first air guide plate and the second air guide plate respectively extend obliquely from the top of the filter device housing toward the left wall and the right wall , the first deflector is located above the communication hole, the second deflector is located above the vertical channel, and the first deflector is configured to guide the air flowing out of the second fan The air flow is directed towards the transverse channel, and the second baffle is configured to direct the air flow in the transverse channel toward the vertical channel.
如前述的燒結設備,所述過濾裝置還包括緩衝板,所述緩衝板自所述過濾裝置的底壁向上延伸並朝向所述氣體入口傾斜,以至少部分地阻擋從所述氣體入口進入的氣體。As in the aforementioned sintering apparatus, the filter device further includes a buffer plate extending upward from the bottom wall of the filter device and inclined toward the gas inlet to at least partially block the gas entering from the gas inlet .
如前述的燒結設備,所述冷卻段的頂部設有過濾裝置連介面,所述過濾裝置連介面的形狀與所述過濾裝置殼體的底壁的形狀相匹配,從而當所述過濾裝置連接在所述冷卻段上時,所述過濾裝置覆蓋所述過濾裝置連介面。As in the aforementioned sintering equipment, the top of the cooling section is provided with a filter device connecting interface, and the shape of the filter device connecting interface matches the shape of the bottom wall of the filter device casing, so that when the filter device is connected to the When on the cooling section, the filter device covers the connection interface of the filter device.
本案在燒結設備的冷卻段中增加了過濾裝置,能夠過濾冷卻段中的粉塵顆粒,減少粉塵顆粒對冷卻段中光伏裝置的干擾。In this case, a filter device is added to the cooling section of the sintering equipment, which can filter the dust particles in the cooling section and reduce the interference of the dust particles on the photovoltaic device in the cooling section.
在本案的燒結設備中,過濾裝置將冷卻段中的部分空氣過濾後再次回送到冷卻段中,形成一個相對封閉的系統,大部分空氣在冷卻段和過濾裝置中循環,避免了外界顆粒進入冷卻段內部。In the sintering equipment of this case, the filter device filters part of the air in the cooling section and returns it to the cooling section again to form a relatively closed system. Most of the air circulates in the cooling section and the filter device to prevent external particles from entering the cooling section. inside the segment.
在本案的燒結設備中,被冷卻後的空氣經風機引入過濾裝置,再回到冷卻段中,加強了冷卻段內部的空氣循環,使得冷卻段中的空氣均勻分佈,從而加強了對光伏裝置的冷卻效果。In the sintering equipment of this case, the cooled air is introduced into the filter device through the fan, and then returned to the cooling section, which strengthens the air circulation inside the cooling section, makes the air in the cooling section evenly distributed, and thus strengthens the protection of the photovoltaic device. cooling effect.
在本案的燒結設備中,過濾裝置大致為立方體的形狀,氣流通道以及過濾件均設置在過濾裝置的殼體的內部,從而過濾裝置為一個整體的部件,易於與冷卻段裝置連接。In the sintering equipment of this case, the filter device is roughly in the shape of a cube, and the airflow channel and the filter element are arranged inside the shell of the filter device, so that the filter device is an integral part, which is easy to connect with the cooling section device.
下面將參考構成本說明書一部分的附圖對本發明的各種具體實施方式進行描述。應該理解的是,雖然在本案中使用表示方向的術語,諸如「前」、「後」、「上」、「下」、「左」、「右」等描述本案的各種示例結構部分和元件,但是在此使用這些術語只是為了方便說明的目的,基於附圖中顯示的示例方位而決定的。由於本案所揭示的實施例可以按照不同的方向設置,所以這些表示方向的術語只是作為說明而不應視作為限制。Various embodiments of the invention will be described below with reference to the accompanying drawings which form a part of this specification. It should be understood that although directional terms such as "front," "rear," "upper," "lower," "left," "right," etc. are used in the present case to describe various example structural parts and elements of the present case, However, these terms are used herein for convenience of description only, and are determined based on the example orientations shown in the drawings. Since the embodiments disclosed in this application can be arranged in different orientations, these directional terms are used for illustration only and should not be regarded as limiting.
圖1是本案中燒結設備100的示意圖,圖示燒結設備的基本構造。如圖1所示,燒結設備100包括燒結段101、冷卻段102和過濾系統105。待加工的光伏裝置由傳送帶傳送,沿著如箭頭108所示的方向,依次經過燒結段101和冷卻段102完成燒結加工。燒結段101具有燒結空間,光伏裝置在燒結空間中被加熱至一定溫度範圍,例如700℃-900℃,使得光伏裝置被高溫燒結處理。經燒結處理後的光伏裝置進入冷卻段102,冷卻段102能夠將光伏裝置降溫到一定範圍,例如小於60℃。經冷卻後的光伏裝置由傳送帶傳送離開燒結設備。燒結設備100還包括前段111和後段112,前段111設置在燒結段101的上游,後段112設置在冷卻段102下游,前段111和後段112用於容納傳送帶的動力裝置及其它裝置。燒結設備100具有長度方向L,高度方向H以及寬度方向W(參見圖2A)。FIG. 1 is a schematic diagram of a
圖2A是圖1中燒結設備100的冷卻段及過濾系統105的立體圖,圖2B中圖2A中過濾系統105與冷卻段分離的立體圖,圖示冷卻段與過濾系統的位置關係。FIG. 2A is a perspective view of the cooling section and the
如圖2A和圖2B所示,冷卻段102具有冷卻段殼體201,冷卻段殼體201圍成冷卻空間207。冷卻段殼體201大致為下部具有開口的箱體,冷卻段殼體201包括前板231,後板232,上板233,左板234以及右板235。冷卻段殼體201的左側與燒結段101連接,右側與後段112連接,冷卻段102的下部設有支架(圖中未示出)以及連接在支架上的若干支撐腳260,支撐腳260具有一定高度,以使得下部開口與地面之間有一定間距,從而下部開口能夠和外界連通。支撐腳260的高度較小,從而下部開口與地面之間的間距較小,冷卻空間207中的僅有少量氣體能夠通過該間距與外界氣體進行交換。冷卻段殼體201的左板234以及右板235上設有開口261和262,以允許傳送帶以及經傳送帶傳輸的光伏裝置通過。開口262位於冷卻段102高度方向上的上部,並高於後段112的上表面,則傳送帶以及被傳送的光伏裝置位於冷卻段102的上部。冷卻段殼體201的上板233上設有過濾裝置連介面208,過濾裝置連介面208大致為矩形。As shown in FIGS. 2A and 2B , the
冷卻段102中的一部分氣體能夠進入過濾系統105中進行過濾去除雜質後,再回到冷卻段102中。過濾系統105包括過濾裝置205以及導流裝置215,導流裝置215用於將冷卻段102中的氣體引入過濾裝置205進行過濾。過濾裝置205大致為立方體,過濾裝置205的底部與冷卻段102的上板233連接。過濾裝置205的底部的形狀與過濾裝置連介面208匹配,當過濾系統105與在冷卻段102上安裝到位時,過濾裝置205覆蓋冷卻裝置連介面208,並且過濾裝置205的底部與冷卻段102的上板233之間形成密封。導流裝置215位於冷卻空間207中,以將冷卻空間207的下部的氣體引入過濾裝置205。A part of the gas in the
圖3A是圖2A中的冷卻段和過濾系統沿A-A線剖切的剖視圖,圖3B是圖2A中燒結設備100的冷卻段及過濾系統105隱去冷卻段殼體201以及內部支撐結構的立體圖,圖示過濾系統105與冷卻段102的內部的部件的關係。如圖3A和圖3B所示,冷卻空間207中設有上部冷卻裝置311和下部冷卻裝置312,以及傳送通道315,傳送通道315用於容納傳送帶(圖中未示出)。上部冷卻裝置311和下部冷卻裝置312分別設置在傳送通道315的上下兩側,上部冷卻裝置311和下部冷卻裝置312用於降低冷卻段102內的溫度以對由傳送帶輸送的光伏裝置進行降溫。上部冷卻裝置311包括多個風機360,多個風機360由上部風機支架319承載,並沿著燒結設備100的長度方向以及寬度方向均勻佈置,以向下提供均勻的氣流。下部冷卻裝置312包括多個下部冷卻裝置單元338,每個冷卻裝置單元338的結構相似或相同。多個冷卻裝置單元338沿著燒結設備100的寬度和長度方向並排佈置。每個冷卻裝置單元338包括換熱裝置323以及風機370,風機370通過下部風機支架373連接在換熱裝置323的下部。風機370引導空氣向下流動。換熱裝置323包括翅片管式換熱器339。每個翅片管式換熱器339包括換熱管以及連接在換熱管上的翅片,流體能夠自上而下穿過翅片管式換熱器339。在冷卻段102內,風機360和風機370分別位於傳送帶的上下兩側,並均勻地引導空氣自上而下流動,則傳送帶上的光伏裝置附近的氣流自上而下流動。傳送帶附近的氣流向下流動,可以避免傳送帶上的重量較輕的光伏裝置因為受到側向流動的氣流和向上流動的氣流的影響而移動。在本案中下部冷卻裝置312包括風機370,風機370提供氣流以加強冷卻段內部的氣體對流以提高翅片管式換熱器339的換熱效果。同時,風機370還為過濾系統105提供了空氣動力裝置,以引導氣流進入過濾系統105內部進行過濾。也就是說過濾系統105借助下部冷卻裝置312的風機370為其內部的氣體流動提供動力。3A is a cross-sectional view of the cooling section and the filtering system in FIG. 2A taken along the line A-A, FIG. 3B is a perspective view of the cooling section and the
過濾系統105的導流裝置215的入口端與下部冷卻裝置312的底部連接,出口端與過濾裝置205連接。導流裝置215將經翅片管式換熱器339換熱後的氣流引入過濾裝置205。導流裝置215包括多個導流裝置單元336,每個導流裝置單元336的結構相似或相同。每個下部冷卻裝置單元338與相應的導流裝置單元336連接。The inlet end of the
圖4A是圖3B中一個導流裝置單元336和相應下部冷卻裝置單元338的立體圖,圖4B是導流裝置單元336和相應下部冷卻裝置單元338的分解圖,圖4A和圖4B圖示導流裝置單元336和相應下部冷卻裝置單元338的結構。圖4A和圖4B以一個導流裝置單元336和相應下部冷卻裝置單元338介紹其結構,如圖4A和圖4B所示,下部冷卻裝置單元338包括翅片管式換熱器339和風箱407,風機370與風箱407連接。翅片管式換熱器包括換熱管408以及數個並排排列的翅片418。換熱管408包括彎曲的多段換熱管段,多段換熱管段首尾相接形成換熱管通道。換熱管通道中流通冷卻媒體,以與環境進行換熱。翅片418與換熱管408的外側壁連接,並沿著燒結設備的高度方向延伸,以增大換熱面積。翅片的延伸方向大致垂直於換熱管段的延伸方向。相鄰的翅片之間具有間距,相鄰的換熱管段之間也具有間距,則相鄰的翅片之間形成氣流通道419,以使得氣體能夠通過。風箱407具有底部431以及自底部431的四周向上延伸而形成的側部432。側部432的頂端435圍成上部開口,上部開口形成風箱入口411。底部431設有多個風機安裝孔,風機安裝孔形成風箱出口412。風機370與底部431連接,並與風箱出口412軸向對準,以引導風箱407中的氣流自風箱出口412流出。側部432的頂端435與翅片管式換熱器339的底部連接,從而流經翅片的氣流能夠進入風箱入口411。導流裝置單元336包括風管461以及引流罩462,風管461具有風管入口471和風管出口472,引流罩462包括引流罩入口473和引流罩出口474。引流罩出口474與風管入口471連接,引流罩入口473與風箱407的底部連接,從而引流罩入口473與風箱出口412連通。在本案的一個實施例中,風機370容納在引流罩462內。在其它實施例中,風機370也可以容納在風箱407內。各個導流裝置單元336中的風管的形狀和長度根據與其連接的下部冷卻裝置單元338位置設置。在本案中,多個風箱407形成下部風機支架373。風箱407和引流罩462的形狀設計使得經翅片管式換熱器339換熱後的大部分氣流能夠被收集至過濾裝置105,並通過濾裝置105流入冷卻段102的上部,以進一步降低傳送帶附近的空氣的溫度。FIG. 4A is a perspective view of one of the
圖5A是圖2A中過濾裝置的立體圖,圖5B是圖5A中過濾裝置的分解圖,圖5C是圖5A中過濾裝置沿B-B線的剖視圖。如圖5A,圖5B和圖5C所示,過濾裝置包括殼體510、過濾件508和多個風機509,過濾件508和風機509容納在殼體510中。殼體510大致為立方體的盒狀,並包括上部殼體544和下部殼體545,以便於安裝過濾裝置內部的部件。殼體510包括頂壁534、底壁533、前壁535、後壁536、左壁531和右壁532。底壁533上設有氣體入口501和氣體出口502,其中氣體入口501包括多個,每個氣體入口501分別與相應的風管出口472連接。氣體出口與冷卻空間207連通。過濾裝置205中設有橫向隔板541和豎向隔板542,豎向隔板542自所述過濾裝置殼體510的底壁533向上延伸,並與所述過濾裝置殼體510的頂壁534之間具有一定間距,橫向隔板541的一側與豎向隔板542連接,另一側與過濾裝置殼體510的左壁531連接,橫向隔板541和豎向隔板542均與過濾裝置殼體510的前壁535和後壁536連接,從而橫向隔板541和豎向隔板542將過濾裝置殼體510的內部空間分隔為過濾空間518以及氣流輸出通道519。氣體入口501和氣體出口502分別位於豎向隔板542的兩側,氣體入口501位於過濾空間518的底部並與過濾空間518連通,氣體出口502與氣流輸出通道519連通。過濾件508設置在過濾空間518中,過濾件508沿著燒結設備的寬度方向W和長度方向L延伸,其四側邊緣分別與左壁531、後壁536、豎向隔板542和前壁535連接,則自氣體入口501進入過濾空間518的氣流將經過過濾件508之後從連通孔565流出。5A is a perspective view of the filter device in FIG. 2A , FIG. 5B is an exploded view of the filter device in FIG. 5A , and FIG. 5C is a cross-sectional view of the filter device in FIG. 5A along line B-B. As shown in FIG. 5A , FIG. 5B and FIG. 5C , the filtering device includes a
橫向隔板541上具有多個連通孔565,連通孔565沿著自前壁535向後壁536的方向佈置,並且靠近左壁531。連通孔565位於過濾空間518的頂部。連通孔565形成過濾空間518的氣體出口。氣流輸出通道519通過連通孔565與過濾空間518連通。風機509安裝在橫向隔板541上,並與連通孔565軸向對準。風機509引導進入過濾空間518的氣流經過濾件508過濾後由連通孔565流出,進入氣流輸出通道519。The
過濾件508包括第一級濾芯546和第二級濾芯547,第一級濾芯546相較於第二級濾芯547更靠近氣體入口501,也就是說第一級濾芯546設置在氣流方向上的上游,氣流依次經過第一級濾芯546和第二級濾芯547。其中第一級濾芯546被配置為過濾氣體中大於5微米的粉塵顆粒,第二級濾芯547被配置為過濾氣體中大於0.5微米粉塵顆粒。The
氣流輸出通道519包括位於過濾裝置殼體510的頂壁534與橫向隔板541之間的橫向通道525、以及位於豎向隔板542與右壁532之間的豎向通道524。連通孔565與橫向通道525連通,氣體出口502位於豎向通道524的底部,氣流輸出通道519中的氣流自橫向通道525流向豎向通道524。The
過濾裝置205還包括第一導流板521和第二導流板522,第一導流板521和第二導流板522分別自過濾裝置殼體510的頂部朝向左壁531和右壁532傾斜延伸,第一導流板521和第二導流板522分別與頂壁534形成約45°的夾角。第一導流板521位於連通孔565的上方。自連通孔565流出的氣流沿著豎直方向(即平行於殼體左壁531的方向)流動,並達到第一導流板521,由於第一引流板的角度設置,氣流在第一導流板521處改變流向,沿著橫向通道525的延伸方向流動。其中第一導流板521和連通孔565均靠近左壁531,以使得左壁531和頂壁534和第一導流板521之間的空間較小,大部分氣流不會在此處停留,而是儘快自橫向通道525流出。第二導流板522位於豎向通道524上方,橫向通道525中的氣流在第二導流板522處改變流向,沿著右壁532的延伸方向流動至氣體出口502。第一導流板521和第二導流板522的角度和位置設置使得氣流易於從過濾空間518流到氣體出口502,以減小氣流在殼體510內部無規律流動而引起的能量損失。The
過濾裝置205還包括緩衝板583,緩衝板583自過濾裝置的底壁533的氣體入口501的一側向上延伸並朝向氣體入口501傾斜,以至少部分地阻擋從氣體入口501進入的氣體。緩衝板583使得氣體入口501進入的氣流流向發生改變,並減小了氣流的流速,以避免氣流速度過快而對過濾件508造成損傷。在本案的一個實施例中,緩衝板583包括兩塊,分別自底壁533的中部朝向左壁531和右壁532傾斜延伸,以分別部分遮擋兩排氣體入口501。在其它實施例中,緩衝板583的位置和方向可根據氣體入口501的位置和數量決定。The
參見圖3A以及圖5C,在冷卻段102中,風機360提供向下的氣流,經過傳送帶進入下部冷卻裝置312。在下部冷卻裝置312中,氣流經過翅片管式換熱器339進行換熱,溫度降低並進入風箱407。安裝在風箱407上的風機370引流氣流自風箱出口412流出,經過引流罩462進入風管461。風機370提供動力以使得氣流能夠經風管461流入導流裝置205。氣流自導流裝置205的氣體入口501進入導流裝置205,氣流經緩衝板583緩衝後速度降低,流向過濾件508。氣流經過濾件508過濾後其中的大部分粉塵顆粒留在過濾件508中,潔淨的空氣自連通孔565流出。風機509為過濾裝置中的氣流提供動力,以使得氣流能夠順利通過過濾件508。經過濾後的空氣經過氣流輸出通道519從氣體出口502再次進入冷卻段102中。在燒結設備工作程序中,過濾系統105同時工作,氣流在冷卻裝置205和冷卻空間207間循環,粉塵顆粒被過濾件508截流,冷卻空間207中粉塵顆粒數量維持在較低水平,能夠提高光伏裝置的加工品質。Referring to FIGS. 3A and 5C , in the
在本案中的燒結設備在工作一段時間後,設備內部會產生一定的粉塵顆粒,例如粉塵顆粒的來源之一是傳送帶的摩擦而產生。粉塵顆粒可能會對光伏裝置的加工產生一定影響。在燒結段101內部空氣流動較小,這些粉塵顆粒可以借助重力沉積的燒結段101的底部,對光伏裝置的干擾較小。而在冷卻段102中,佈置有包含風機的冷卻裝置,在風機的作用下,空氣在冷卻段102內部流動,粉塵顆粒相對不容易沉積,而是彌散在整個冷卻段102的冷卻空間207中。這可能會對光伏裝置造成影響。因此本案在燒結設備的冷卻段102中增加了過濾裝置,能夠過濾冷卻段102中的粉塵顆粒,減少粉塵顆粒對冷卻段102中光伏裝置的干擾。本案中的過濾件508可以定期清洗以及更換,以保持良好的過濾效果。After the sintering equipment in this case works for a period of time, certain dust particles will be generated inside the equipment. For example, one of the sources of dust particles is the friction of the conveyor belt. Dust particles may have some impact on the processing of photovoltaic devices. The air flow inside the
在本案中,過濾裝置205將冷卻段102中的部分空氣過濾後再次回送到冷卻段102中,形成一個相對封閉的系統,而沒有將過濾裝置205的出口與環境直接連通。如果將過濾裝置205的出口502與環境直接連通,則有可能使得環境中的顆粒或雜質通過過濾裝置205進入燒結設備內部。本案中,大部分空氣在冷卻段102和過濾系統105中循環,避免了外界顆粒進入冷卻段102內部。In this case, the
在常見的燒結設備冷卻段中,換熱器設置在光伏裝置的下方,並且為了防止光伏裝置受上向上或側向氣流的影響而發生移動,通常冷卻段中的氣流設置為沿著自上而下的方向流動。則被換熱器被冷卻後的空氣大量沉積在冷卻段的下部,而光伏裝置位於冷卻段中的上部,經換熱器冷卻後的空氣不能有效地冷卻光伏裝置。在本案中,被冷卻後的空氣經風機引入過濾系統105,再回到冷卻段102中,加強了冷卻段102內部的空氣循環,使得冷卻段102中的空氣均勻分佈,從而加強了對光伏裝置的冷卻效果。In the cooling section of common sintering equipment, the heat exchanger is arranged below the photovoltaic device, and in order to prevent the photovoltaic device from moving due to the influence of the upward or lateral airflow, the airflow in the cooling section is usually set along the top to the bottom. flow in the downward direction. Then, a large amount of air cooled by the heat exchanger is deposited in the lower part of the cooling section, and the photovoltaic device is located in the upper part of the cooling section, and the air cooled by the heat exchanger cannot effectively cool the photovoltaic device. In this case, the cooled air is introduced into the
在本案中,過濾裝置205大致為立方體的形狀,氣流輸出通道519以及過濾件508均設置在過濾裝置205的殼體510的內部,從而過濾裝置205為一個整體的部件,易於與冷卻段102裝配。過濾裝置205中氣體入口501和氣體出口502均設置在過濾裝置205的底部,過濾裝置205內部通過導流板521和522引導氣流的方向,使得氣流容易從氣體入口501流向氣體出口502。In this case, the
儘管本文中僅對本案的一些特徵進行了圖示和描述,但是對本領域技藝人士來說可以進行多種改進和變化。因此應該理解,所附的請求項旨在覆蓋所有落入本案實質精神範圍內的上述改進和變化。Although only some of the features of the present invention have been illustrated and described herein, many modifications and changes will occur to those skilled in the art. It should therefore be understood that the appended claims are intended to cover all such modifications and variations as fall within the essential spirit of the present case.
100:燒結設備 101:燒結段 102:冷卻段 105:過濾系統 108:箭頭 111:前段 112:後段 201:冷卻段殼體 205:過濾裝置 207:冷卻空間 208:過濾裝置連介面 215:導流裝置 231:前板 232:後板 233:上板 234:左板 235:右板 260:支撐腳 261:開口 262:開口 311:上部冷卻裝置 312:下部冷卻裝置 315:傳送通道 319:上部風機支架 323:換熱裝置 336:導流裝置單元 338:下部冷卻裝置單元 339:翅片管式換熱器 360:風機 370:風機 373:下部風機支架 407:風箱 408:換熱管 411:風箱入口 412:風箱出口 418:翅片 419:氣流通道 431:底部 432:側部 435:頂端 461:風管 462:引流罩 471:風管入口 472:風管出口 473:引流罩入口 474:引流罩出口 501:氣體入口 502:氣體出口 508:過濾件 509:風機 510:殼體 517:過濾空間 518:過濾空間 519:氣流輸出通道 521:第一導流板 522:第二導流板 524:豎向通道 525:橫向通道 531:左壁 532:右壁 533:底壁 534:頂壁 535:前壁 536:後壁 541:橫向隔板 542:豎向隔板 544:上部殼體 545:下部殼體 546:第一級濾芯 547:第二級濾芯 565:連通孔 583:緩衝板 A-A:線 B-B:線 H:高度方向 L:長度方向 W:寬度方向 100: Sintering equipment 101: Sintering section 102: Cooling section 105: Filtration system 108: Arrow 111: The first paragraph 112: Backstage 201: Cooling section shell 205: Filtration device 207: Cooling Space 208: Filter device with interface 215: Diversion device 231: Front panel 232: rear panel 233: Upper Board 234: Left Plate 235: Right Plate 260: Support feet 261: Opening 262: Opening 311: Upper cooling unit 312: Lower cooling device 315: Transmission channel 319: Upper fan bracket 323: Heat Exchanger 336: Diversion device unit 338: Lower cooling unit unit 339: Finned Tube Heat Exchanger 360: Fan 370: Fan 373: Lower fan bracket 407: Bellows 408: heat exchange tube 411: Bellows inlet 412: bellows outlet 418: Fins 419: Airflow channel 431: Bottom 432: Side 435: Top 461: Duct 462: Drainage hood 471: Duct inlet 472: Duct outlet 473: Drainage hood inlet 474: Drainage hood outlet 501: Gas inlet 502: Gas outlet 508: Filters 509: Fan 510: Shell 517: Filter Space 518: Filter Space 519: Airflow output channel 521: First deflector 522: Second deflector 524: Vertical channel 525: Lateral Channel 531: Left Wall 532: Right Wall 533: Bottom Wall 534: Top Wall 535: Front Wall 536: Back Wall 541: Transverse partition 542: Vertical partition 544: Upper shell 545: Lower Housing 546: First-stage filter element 547: Second stage filter element 565: Connecting hole 583: Buffer plate A-A: Line B-B: Line H: height direction L: length direction W: width direction
圖1是本案中燒結設備100的示意圖;FIG. 1 is a schematic diagram of a
圖2A是圖1中燒結設備100的冷卻段及過濾系統105的立體圖;FIG. 2A is a perspective view of the cooling section and the
圖2B中圖2A中過濾系統105與冷卻段分離的立體圖;Figure 2B is a perspective view of the
圖3A是圖2A中的冷卻段和過濾系統沿A-A線剖切的剖視圖;3A is a cross-sectional view of the cooling section and filter system in FIG. 2A taken along line A-A;
圖3B是圖2A中燒結設備100的冷卻段及過濾系統105隱去冷卻段殼體201以及內部支撐結構的立體圖;3B is a perspective view of the cooling section and the
圖4A是圖3B中一個導流裝置單元336和相應下部冷卻裝置單元338的立體圖;FIG. 4A is a perspective view of a
圖4B是導流裝置單元336和相應下部冷卻裝置單元338的分解圖;FIG. 4B is an exploded view of the
圖5A是圖2A中過濾裝置的立體圖;Figure 5A is a perspective view of the filter device in Figure 2A;
圖5B是圖5A中過濾裝置的分解圖;Figure 5B is an exploded view of the filtering device in Figure 5A;
圖5C是圖5A中過濾裝置沿B-B線的剖視圖。Fig. 5C is a cross-sectional view of the filter device of Fig. 5A taken along line B-B.
國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date and number) none Foreign deposit information (please note in the order of deposit country, institution, date and number) none
102:冷卻段 102: Cooling section
105:過濾系統 105: Filtration system
205:過濾裝置 205: Filtration device
207:冷卻空間 207: Cooling Space
208:過濾裝置連介面 208: Filter device with interface
215:導流裝置 215: Diversion device
262:開口 262: Opening
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CN202011446655.3A CN114623683A (en) | 2020-12-11 | 2020-12-11 | Sintering equipment |
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