TW202225557A - Shape memory alloy actuators and methods thereof - Google Patents

Shape memory alloy actuators and methods thereof Download PDF

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TW202225557A
TW202225557A TW110137703A TW110137703A TW202225557A TW 202225557 A TW202225557 A TW 202225557A TW 110137703 A TW110137703 A TW 110137703A TW 110137703 A TW110137703 A TW 110137703A TW 202225557 A TW202225557 A TW 202225557A
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actuator
sma
bimorph
metal base
conductive metal
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TW110137703A
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馬克 A 米勒
納撒尼爾 K 貝寧
狄恩 E 邁爾斯
麥可 W 戴維斯
萊恩 N 魯茲卡
瑞雀立 A 波寇諾斯其
坂本康史
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美商哈欽森技術股份有限公司
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Priority claimed from US17/207,530 external-priority patent/US11333134B2/en
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Publication of TW202225557A publication Critical patent/TW202225557A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B30/00Camera modules comprising integrated lens units and imaging units, specially adapted for being embedded in other devices, e.g. mobile phones or vehicles
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03GSPRING, WEIGHT, INERTIA OR LIKE MOTORS; MECHANICAL-POWER PRODUCING DEVICES OR MECHANISMS, NOT OTHERWISE PROVIDED FOR OR USING ENERGY SOURCES NOT OTHERWISE PROVIDED FOR
    • F03G7/00Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03GSPRING, WEIGHT, INERTIA OR LIKE MOTORS; MECHANICAL-POWER PRODUCING DEVICES OR MECHANISMS, NOT OTHERWISE PROVIDED FOR OR USING ENERGY SOURCES NOT OTHERWISE PROVIDED FOR
    • F03G7/00Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for
    • F03G7/06Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like
    • F03G7/061Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like characterised by the actuating element
    • F03G7/0614Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like characterised by the actuating element using shape memory elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03GSPRING, WEIGHT, INERTIA OR LIKE MOTORS; MECHANICAL-POWER PRODUCING DEVICES OR MECHANISMS, NOT OTHERWISE PROVIDED FOR OR USING ENERGY SOURCES NOT OTHERWISE PROVIDED FOR
    • F03G7/00Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for
    • F03G7/06Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like
    • F03G7/061Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like characterised by the actuating element
    • F03G7/0616Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like characterised by the actuating element characterised by the material or the manufacturing process, e.g. the assembly
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03GSPRING, WEIGHT, INERTIA OR LIKE MOTORS; MECHANICAL-POWER PRODUCING DEVICES OR MECHANISMS, NOT OTHERWISE PROVIDED FOR OR USING ENERGY SOURCES NOT OTHERWISE PROVIDED FOR
    • F03G7/00Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for
    • F03G7/06Mechanical-power-producing mechanisms, not otherwise provided for or using energy sources not otherwise provided for using expansion or contraction of bodies due to heating, cooling, moistening, drying or the like
    • F03G7/066Actuator control or monitoring
    • F03G7/0665Actuator control or monitoring controlled displacement, e.g. by using a lens positioning actuator
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/04Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
    • G02B7/09Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted for automatic focusing or varying magnification
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B13/00Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
    • G03B13/32Means for focusing
    • G03B13/34Power focusing
    • G03B13/36Autofocus systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B3/00Focusing arrangements of general interest for cameras, projectors or printers
    • G03B3/10Power-operated focusing
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05BINDEXING SCHEME RELATING TO WIND, SPRING, WEIGHT, INERTIA OR LIKE MOTORS, TO MACHINES OR ENGINES FOR LIQUIDS COVERED BY SUBCLASSES F03B, F03D AND F03G
    • F05B2280/00Materials; Properties thereof
    • F05B2280/50Intrinsic material properties or characteristics
    • F05B2280/5006Shape memory
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B2205/00Adjustment of optical system relative to image or object surface other than for focusing
    • G03B2205/0053Driving means for the movement of one or more optical element
    • G03B2205/0076Driving means for the movement of one or more optical element using shape memory alloys

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Lens Barrels (AREA)
  • Adjustment Of Camera Lenses (AREA)
  • Studio Devices (AREA)

Abstract

SMA actuators and related methods are described. One embodiment of an actuator includes a base; a plurality of buckle arms; and at least a first shape memory alloy wire coupled with a pair of buckle arms of the plurality of buckle arms. Another embodiment of an actuator includes a base and at least one bimorph actuator including a shape memory alloy material. The bimorph actuator attached to the base.

Description

形狀記憶合金致動器及其方法Shape memory alloy actuator and method therefor

本發明之實施例係關於形狀記憶合金系統之領域。更特定言之,本發明之實施例係關於形狀記憶合金致動器及其相關方法之領域。Embodiments of the present invention relate to the field of shape memory alloy systems. More particularly, embodiments of the present invention relate to the field of shape memory alloy actuators and related methods.

形狀記憶合金(「SMA」)系統具有(例如)可結合一攝影機鏡頭元件用作一自動聚焦驅動之一移動總成或結構。此等系統可由諸如一屏蔽外殼之一結構圍封。移動總成由諸如複數個滾珠之一軸承支撐以在一支撐總成上移動。由諸如磷青銅或不鏽鋼之金屬形成之撓曲元件具有一移動板及撓曲件。撓曲件在移動板與固定支撐總成之間延伸且充當彈簧以使移動總成能夠相對於固定支撐總成移動。滾珠允許移動總成以很小阻力移動。移動總成及支撐總成由在總成之間延伸之四個形狀記憶合金(SMA)線耦合。SMA線之各者具有附接至支撐總成之一端及附接至移動總成之一對置端。懸架藉由將電驅動信號施加至SMA線來致動。然而,此等類型之系統受系統複雜性困擾,其導致需要一大覆蓋區及一大淨空高度之龐大系統。此外,本系統無法提供具有一緊湊、低輪廓覆蓋區之高Z行程範圍。Shape memory alloy ("SMA") systems have, for example, a moving assembly or structure that can be used in conjunction with a camera lens element as an autofocus drive. Such systems may be enclosed by a structure such as a shielded enclosure. The moving assembly is supported by a bearing, such as a plurality of balls, for movement on a support assembly. A flexure element formed of a metal such as phosphor bronze or stainless steel has a moving plate and flexure. A flexure extends between the moving plate and the fixed support assembly and acts as a spring to enable the moving assembly to move relative to the fixed support assembly. The balls allow the moving assembly to move with little resistance. The moving and support assemblies are coupled by four shape memory alloy (SMA) wires extending between the assemblies. Each of the SMA wires has one end attached to the support assembly and an opposite end attached to the moving assembly. The suspension is actuated by applying an electrical drive signal to the SMA wire. However, these types of systems suffer from system complexity, which results in bulky systems requiring a large footprint and a large headroom. Furthermore, the present system cannot provide a high Z travel range with a compact, low profile footprint.

本發明描述SMA致動器及相關方法。一致動器之一個實施例包含:一基底;複數個扣臂;及至少一第一形狀記憶合金線,其與該複數個扣臂之一對扣臂耦合。一致動器之另一實施例包含:一基底;及至少一個雙壓電晶片致動器,其包含一形狀記憶合金材料。該雙壓電晶片致動器附接至該基底。The present disclosure describes SMA actuators and related methods. One embodiment of an actuator includes: a base; a plurality of buckle arms; and at least one first shape memory alloy wire coupled to a pair of buckle arms of the plurality of buckle arms. Another embodiment of an actuator includes: a substrate; and at least one bimorph actuator including a shape memory alloy material. The bimorph actuator is attached to the substrate.

將自附圖及以下詳細描述明白本發明之實施例之其他特徵及優點。Other features and advantages of embodiments of the invention will be apparent from the accompanying drawings and the following detailed description.

相關申請案之交叉參考 本申請案主張2020年10月12日申請之美國臨時申請案第63/090,569號及2021年3月19日申請之美國專利申請案第17/207,530號之權利及優先權,該等案之全文以引用方式併入本文中。 Cross-references to related applications This application claims the rights and priority of US Provisional Application No. 63/090,569, filed on October 12, 2020, and US Patent Application No. 17/207,530, filed on March 19, 2021, in full Incorporated herein by reference.

本文中描述一SMA致動器之實施例,其包含一緊湊覆蓋區且提供一高致動高度,例如在正z軸方向(z方向)上移動,本文中指稱z行程。SMA致動器之實施例包含一SMA扣件致動器及一SMA雙壓電晶片致動器。SMA致動器可用於諸多應用中,其包含(但不限於)作為一自動聚焦致動器之一鏡頭總成、一微流體泵、一感測器移位、光學影像穩定、光學變焦總成、機械撞擊兩個表面以產生常見於觸覺回饋感測器及裝置中之振動感覺及其中使用一致動器之其他系統。例如,本文中所描述之一致動器之實施例可用作一觸覺回饋致動器,其用於經組態以向使用者提供一警報、通知、警示、觸控區域或按鈕回應之手機或可穿戴裝置中。此外,一個以上SMA致動器可在一系統中用於達成一更大行程。Described herein are embodiments of an SMA actuator that include a compact footprint and provide a high actuation height, eg, moving in the positive z-axis direction (z-direction), referred to herein as z-travel. Embodiments of SMA actuators include an SMA fastener actuator and an SMA bimorph actuator. SMA actuators can be used in many applications including (but not limited to) as an autofocus actuator a lens assembly, a microfluidic pump, a sensor shift, optical image stabilization, optical zoom assemblies , Mechanical impact on two surfaces to create the vibratory sensation commonly found in haptic feedback sensors and devices and other systems in which an actuator is used. For example, embodiments of the actuator described herein can be used as a haptic feedback actuator for a cell phone or a cell phone that is configured to provide a user with an alarm, notification, alert, touch area or button response. in wearable devices. Additionally, more than one SMA actuator can be used in a system to achieve a larger stroke.

針對各種實施例,SMA致動器具有大於0.4毫米之一z行程。此外,針對各種實施例,當SMA致動器處於其初始解除致動位置中時,SMA致動器具有2.2毫米或更小之z方向上之一高度。組態為一鏡頭總成中之一自動聚焦致動器之SMA致動器之各種實施例可具有大於鏡頭內徑(「ID」)之小至3毫米之一覆蓋區。根據各種實施例,SMA致動器可具有在一個方向上較寬以容納包含(但不限於)感測器、線、跡線及連接器之組件之一覆蓋區。根據一些實施例,一SMA致動器之覆蓋區在一個方向上更大0.5毫米,例如,SMA致動器之長度比寬度大0.5毫米。For various embodiments, the SMA actuator has a z-travel greater than 0.4 millimeters. Furthermore, for various embodiments, the SMA actuator has a height in the z-direction of 2.2 millimeters or less when the SMA actuator is in its initial de-actuated position. Various embodiments of an SMA actuator configured as an autofocus actuator in a lens assembly can have a footprint as small as 3 mm larger than the inner diameter ("ID") of the lens. According to various embodiments, SMA actuators may have a footprint that is wider in one direction to accommodate components including, but not limited to, sensors, wires, traces, and connectors. According to some embodiments, the footprint of an SMA actuator is 0.5 mm larger in one direction, eg, the length of the SMA actuator is 0.5 mm larger than the width.

圖1a繪示根據一實施例之包含組態為一扣件致動器之一SMA致動器之一鏡頭總成。圖1b繪示根據一實施例之組態為一扣件致動器之一SMA致動器。扣件致動器102與一基底101耦合。如圖1b中所繪示,SMA線100附接至扣件致動器102,使得當SMA線100被致動且收縮時,此引起扣件致動器102扣緊,其導致各扣件致動器102之至少中心部分104在z行程方向(例如正z方向)上移動,如由箭頭108所指示。根據一些實施例,當透過諸如一箝夾結構106之一線保持器將電流供應至SMA線100之一端時致動線。電流流動通過SMA線100以歸因於製成SMA線100之SMA材料固有之電阻而加熱SMA線100。SMA線100之另一側具有諸如一箝夾結構106之一線保持器,其連接SMA線100以完成電路接地。將SMA線100加熱至一足夠溫度引起獨特材料性質自馬氏體變為奧氏體結晶結構,此引起線之一長度變化。改變電流改變溫度且因此改變線之長度,此用於致動及解除致動致動器以控制致動器在至少z方向上移動。熟習技術者應瞭解,其他技術可用於將電流提供至一SMA線。1a illustrates a lens assembly including an SMA actuator configured as a fastener actuator, according to one embodiment. Figure lb illustrates an SMA actuator configured as a fastener actuator according to an embodiment. The fastener actuator 102 is coupled to a base 101 . As depicted in Figure lb, the SMA wire 100 is attached to the fastener actuator 102 such that when the SMA wire 100 is actuated and retracted, this causes the fastener actuator 102 to buckle, which causes each fastener to actuate At least the central portion 104 of the actuator 102 moves in the z travel direction (eg, the positive z direction), as indicated by arrow 108 . According to some embodiments, the wire is actuated when current is supplied to one end of the SMA wire 100 through a wire retainer, such as a jaw structure 106 . Current flows through the SMA wire 100 to heat the SMA wire 100 due to the resistance inherent in the SMA material from which the SMA wire 100 is made. The other side of the SMA wire 100 has a wire retainer, such as a clamp structure 106, which connects the SMA wire 100 to complete the circuit ground. Heating the SMA wire 100 to a sufficient temperature causes the unique material properties to change from a martensite to austenitic crystalline structure, which causes a change in length of the wire. Changing the current changes the temperature and thus the length of the wire, which is used to activate and de-actuate the actuator to control movement of the actuator in at least the z-direction. Those skilled in the art will appreciate that other techniques can be used to provide current to an SMA wire.

圖2繪示根據一實施例之組態為一SMA雙壓電晶片致動器之一SMA致動器。如圖2中所繪示,SMA致動器包含與一基底204耦合之雙壓電晶片致動器202。雙壓電晶片致動器202包含一SMA帶206。雙壓電晶片致動器202經組態以隨著SMA帶206收縮而在z行程方向208上移動雙壓電晶片致動器202之至少未固定端。2 illustrates an SMA actuator configured as an SMA bimorph actuator according to an embodiment. As shown in FIG. 2 , the SMA actuator includes a bimorph actuator 202 coupled to a substrate 204 . The bimorph actuator 202 includes an SMA tape 206 . The bimorph actuator 202 is configured to move at least the unsecured end of the bimorph actuator 202 in the z-travel direction 208 as the SMA tape 206 contracts.

圖3繪示根據一實施例之包含一SMA致動器之一自動聚焦總成之一分解圖。如所繪示,一SMA致動器302經組態為根據本文中所描述之實施例之一扣件致動器302。自動聚焦總成亦包含光學影像穩定器(「OIS」) 304、經組態以使用包含本技術中已知之技術的技術來固持一或多個光學鏡頭之一鏡頭托架306、一復位彈簧308、一垂直滑動軸承310及一導蓋312。當SMA線使用包含本文中所描述之技術的技術來致動且牽引及扣緊扣件致動器302時,鏡頭托架306經組態以隨著扣件致動器302在z行程方向(例如正z方向)上移動而抵著垂直滑動軸承310滑動。復位彈簧308經組態以使用包含本技術中已知之技術的技術在與z行程方向相反之方向上對鏡頭托架306施加一力。根據各種實施例,復位彈簧308經組態以在SMA線之張力隨著SMA線解除致動而降低時在z行程方向之相反方向上移動鏡頭托架306。當SMA線之張力降低至初始值時,鏡頭托架306在z行程方向上移動至最低高度。圖4繪示根據圖3中所繪示之一實施例之包含一SMA線致動器之自動聚焦總成。3 illustrates an exploded view of an autofocus assembly including an SMA actuator, according to one embodiment. As depicted, an SMA actuator 302 is configured as a fastener actuator 302 according to embodiments described herein. The autofocus assembly also includes an optical image stabilizer ("OIS") 304, a lens bracket 306 configured to hold one or more optical lenses using techniques including those known in the art, a return spring 308 , a vertical sliding bearing 310 and a guide cover 312 . When the SMA wire is actuated and pulls and fastens the fastener actuator 302 using techniques including the techniques described herein, the lens holder 306 is configured to follow the fastener actuator 302 in the z-travel direction ( For example, in the positive z direction), it slides against the vertical sliding bearing 310 . Return spring 308 is configured to apply a force to lens carrier 306 in a direction opposite the z-travel direction using techniques including those known in the art. According to various embodiments, the return spring 308 is configured to move the lens holder 306 in the opposite direction of the z-travel direction when the tension of the SMA wire decreases as the SMA wire is de-actuated. When the tension of the SMA wire is reduced to the initial value, the lens holder 306 moves to the lowest height in the z-travel direction. FIG. 4 shows an autofocus assembly including an SMA wire actuator according to one embodiment shown in FIG. 3 .

圖5繪示包含一感測器之根據一實施例之一SMA線致動器。針對各種實施例,感測器502經組態以使用包含本技術中已知之技術的技術來量測SMA致動器在z方向上之移動或SMA致動器移動之一組件之移動。SMA致動器包含經組態以使用類似於本文中所描述之SMA線之一或多個SMA線508來致動之一或多個扣件致動器506。例如,在參考圖4所描述之自動聚焦總成中,感測器經組態以使用包含本技術中已知之技術的技術來判定鏡頭托架306在z方向504上自一初始位置移動之移動量。根據一些實施例,感測器係一穿隧磁阻(「TMR」)感測器。5 illustrates an SMA wire actuator according to an embodiment including a sensor. For various embodiments, sensor 502 is configured to measure movement of the SMA actuator in the z-direction or movement of a component of SMA actuator movement using techniques including those known in the art. The SMA actuators include one or more fastener actuators 506 that are configured to actuate using one or more SMA wires 508 similar to those described herein. For example, in the autofocus assembly described with reference to FIG. 4, the sensor is configured to determine movement of the lens carrier 306 in the z-direction 504 from an initial position using techniques including those known in the art quantity. According to some embodiments, the sensor is a tunneling magnetoresistive ("TMR") sensor.

圖6繪示根據一實施例之組態為一扣件致動器之一SMA致動器602之一俯視圖及一側視圖,SMA致動器602裝配有一鏡頭托架604。圖7繪示根據圖6中所繪示之實施例之SMA致動器602之一區段之一側視圖。根據圖7中所繪示之實施例,SMA致動器602包含一滑動基底702。根據一實施例,滑動基底702使用包含本技術中已知之技術的技術來由諸如不鏽鋼之金屬形成。然而,熟習技術者應瞭解,其他材料可用於形成滑動基底702。此外,根據一些實施例,滑動基底702具有與SMA致動器602耦合之彈簧臂612。根據各種實施例,彈簧臂612經組態以提供兩個功能。第一功能係幫助將一物件(例如一鏡頭托架604)推入至一導蓋之垂直滑動表面中。針對此實例,彈簧臂612抵著此表面向上預載鏡頭托架604以確保鏡頭在致動期間不會傾斜。針對一些實施例,垂直滑動表面708經組態以與導蓋配合。彈簧臂612之第二功能係幫助在SMA線608在z-行程方向(正z方向)上移動SMA致動器602之後(例如)在負z方向上向下回拉SMA致動器602。因此,當致動SMA線608時,其收縮以在z行程方向上移動SMA致動器602,及當解除致動SMA線608時,彈簧臂612經組態以在z行程方向之相反方向上移動SMA致動器602。6 shows a top view and a side view of an SMA actuator 602 configured as a fastener actuator with a lens holder 604 assembled, according to one embodiment. FIG. 7 shows a side view of a section of an SMA actuator 602 according to the embodiment depicted in FIG. 6 . According to the embodiment shown in FIG. 7 , the SMA actuator 602 includes a sliding base 702 . According to one embodiment, the sliding base 702 is formed from a metal such as stainless steel using techniques including those known in the art. However, those skilled in the art will appreciate that other materials may be used to form sliding base 702 . Additionally, the sliding base 702 has a spring arm 612 coupled to the SMA actuator 602 according to some embodiments. According to various embodiments, the spring arm 612 is configured to provide two functions. The first function is to help push an object, such as a lens holder 604, into the vertical sliding surface of a guide cover. For this example, the spring arm 612 preloads the lens holder 604 up against this surface to ensure that the lens does not tilt during actuation. For some embodiments, the vertical sliding surface 708 is configured to mate with the guide cover. A second function of the spring arm 612 is to help pull the SMA actuator 602 back down in the negative z-direction, for example, after the SMA wire 608 has moved the SMA actuator 602 in the z-travel direction (positive z-direction). Thus, when the SMA wire 608 is actuated, it contracts to move the SMA actuator 602 in the z-travel direction, and when the SMA wire 608 is de-actuated, the spring arm 612 is configured to move in the opposite direction of the z-travel direction SMA actuator 602 is moved.

SMA致動器602亦包含一扣件致動器710。針對各種實施例,扣件致動器710由諸如不鏽鋼之金屬形成。此外,扣件致動器710包含扣臂610及一或多個線保持器606。根據圖6及圖7中所繪示之實施例,扣件致動器710包含四個線保持器606。四個線保持器606各經組態以接收一SMA線608之一端且保持SMA線608之端,使得SMA線608附裝至扣件致動器710。針對各種實施例,四個線保持器606係經組態以夾緊SMA線608之一部分以將線附裝至箝夾之箝夾。熟習技術者應瞭解,一SMA線608可使用包含(但不限於)黏著、焊接及機械附裝之本技術中已知之技術來附裝至一線保持器606。智慧記憶合金(「SMA」)線608在一對線保持器606之間延伸,使得扣件致動器710之扣臂610經組態以在致動SMA線608時移動,其導致該對線保持器606被一起拉近。根據各種實施例,當一電流施加至SMA線608時,SMA線608經電致動以移動及控制扣臂610之位置。SMA線608在電流移除或低於一臨限值時解除致動。此使該對線保持器606分開且扣臂610在致動SMA線608時之方向之相反方向上移動。根據各種實施例,當SMA線在其初始位置中解除致動時,扣臂610經組態以相對於滑動基底702具有5度之一初始角。且根據各種實施例,在全行程或當完全致動SMA線時,扣臂610經組態以相對於滑動基底702具有10度至12度之一角度。The SMA actuator 602 also includes a fastener actuator 710 . For various embodiments, the fastener actuator 710 is formed from a metal such as stainless steel. Additionally, the buckle actuator 710 includes a buckle arm 610 and one or more wire retainers 606 . According to the embodiment depicted in FIGS. 6 and 7 , the fastener actuator 710 includes four wire retainers 606 . The four wire retainers 606 are each configured to receive one end of an SMA wire 608 and hold an end of the SMA wire 608 such that the SMA wire 608 is attached to the fastener actuator 710 . For various embodiments, the four wire retainers 606 are configured to grip a portion of the SMA wire 608 to attach the wire to the jaws of the jaws. Those skilled in the art will appreciate that an SMA wire 608 can be attached to the wire retainer 606 using techniques known in the art including, but not limited to, gluing, welding, and mechanical attachment. A smart memory alloy ("SMA") wire 608 extends between a pair of wire retainers 606 such that the buckle arm 610 of the buckle actuator 710 is configured to move when the SMA wire 608 is actuated, which causes the pair of wires The retainers 606 are drawn together. According to various embodiments, when a current is applied to the SMA wire 608, the SMA wire 608 is electrically actuated to move and control the position of the buckle arm 610. The SMA wire 608 is deactivated when the current is removed or below a threshold value. This causes the pair of wire holders 606 to separate and the clasp arms 610 to move in the opposite direction to the direction in which the SMA wire 608 is actuated. According to various embodiments, the buckle arm 610 is configured to have an initial angle of 5 degrees relative to the sliding base 702 when the SMA wire is de-actuated in its initial position. And according to various embodiments, at full stroke or when the SMA wire is fully actuated, the buckle arm 610 is configured to have an angle of 10 degrees to 12 degrees relative to the sliding base 702 .

根據圖6及圖7中所繪示之實施例,SMA致動器602亦包含組態於滑動基底702與線保持器606之間的滑動軸承706。滑動軸承706經組態以最小化滑動基底702與一扣臂610及/或一線保持器606之間的任何摩擦。針對一些實施例,滑動軸承附裝至滑動軸承706。根據各種實施例,滑動軸承由聚甲醛(「POM」)形成。熟習技術者應瞭解,其他結構可用於降低扣件致動器與基底之間的任何摩擦。According to the embodiment depicted in FIGS. 6 and 7 , the SMA actuator 602 also includes a sliding bearing 706 configured between the sliding base 702 and the wire holder 606 . Slide bearing 706 is configured to minimize any friction between slide base 702 and a snap arm 610 and/or wire retainer 606 . For some embodiments, a plain bearing is attached to plain bearing 706 . According to various embodiments, the sliding bearing is formed of polyoxymethylene ("POM"). Those skilled in the art will appreciate that other structures may be used to reduce any friction between the fastener actuator and the substrate.

根據各種實施例,滑動基底702經組態以與一總成基底704 (諸如一自動聚焦總成之一自動聚焦基底)耦合。根據一些實施例,致動器基底704包含一蝕刻墊片。當SMA致動器602係諸如一自動聚焦總成之一總成之部分時,此一蝕刻墊片可用於為線及箝夾提供空隙。According to various embodiments, the sliding base 702 is configured to couple with an assembly base 704, such as an autofocus base of an autofocus assembly. According to some embodiments, the actuator substrate 704 includes an etched spacer. When the SMA actuator 602 is part of an assembly such as an autofocus assembly, this etched spacer can be used to provide clearance for the wire and jaws.

圖8繪示相對於一x軸、一y軸及一z軸之一扣件致動器802之一實施例之多個視圖。如圖8中所定向,扣臂804經組態以在如本文中所描述般致動及解除致動SMA線時在z軸上移動。根據圖8中所繪示之實施例,扣臂804透過諸如一懸吊部分806之一中心部分彼此耦合。根據各項實施例,一懸吊部分806經組態以吊架由扣件致動器施加作用之一物件(例如由扣件致動器使用包含本文中所描述之技術的技術移動之一鏡頭托架)之一部分。根據一些實施例,一懸吊部分806經組態以在致動期間向扣件致動器提供側向勁度。針對其他實施例,一扣件致動器不包含一懸吊部分806。根據此等實施例,扣臂經組態以施加作用於一物件以使其移動。例如,扣臂經組態以直接施加作用於一鏡頭托架之特徵以將其上推。FIG. 8 shows views of one embodiment of a fastener actuator 802 relative to an x-axis, a y-axis, and a z-axis. Oriented in Figure 8, the buckle arm 804 is configured to move in the z-axis when the SMA wire is actuated and de-actuated as described herein. According to the embodiment shown in FIG. 8 , the buckle arms 804 are coupled to each other through a central portion such as a suspension portion 806 . According to various embodiments, a hanger portion 806 is configured to hang an object that is acted upon by the fastener actuator (eg, a lens moved by the fastener actuator using techniques including the techniques described herein) part of the bracket). According to some embodiments, a suspension portion 806 is configured to provide lateral stiffness to the fastener actuator during actuation. For other embodiments, a fastener actuator does not include a suspension portion 806 . According to these embodiments, the buckle arm is configured to apply an action to an object to move it. For example, the snap arm is configured to apply directly to a feature of a lens holder to push it up.

圖9繪示根據一實施例之組態為一SMA雙壓電晶片致動器之一SMA致動器。SMA雙壓電晶片致動器包含雙壓電晶片致動器902,其包含本文中所描述之雙壓電晶片致動器。根據圖9中所繪示之實施例,雙壓電晶片致動器902之各者之一端906附裝至一基底908。根據一些實施例,該一端906焊接至基底908。然而,熟習技術者應瞭解,其他技術可用於將該一端906附裝至基底908。圖9亦繪示一鏡頭托架904,其經配置使得雙壓電晶片致動器902經組態以在致動時在z方向上卷邊且在z軸方向上提升托架904。針對一些實施例,一復位彈簧用於將雙壓電晶片致動器902回推至一初始位置。一復位彈簧可如本文中所描述般組態以輔助將雙壓電晶片致動器下推至其初始解除致動位置。由於雙壓電晶片致動器之小覆蓋區,可製造具有比當前致動器技術減小之一覆蓋區之SMA致動器。9 illustrates an SMA actuator configured as an SMA bimorph actuator according to an embodiment. The SMA bimorph actuator includes bimorph actuator 902, which includes the bimorph actuator described herein. According to the embodiment depicted in FIG. 9 , one end 906 of each of the bimorph actuators 902 is attached to a substrate 908 . According to some embodiments, the one end 906 is welded to the base 908 . However, those skilled in the art will appreciate that other techniques may be used to attach the end 906 to the substrate 908 . 9 also depicts a lens carrier 904 configured such that the bimorph actuator 902 is configured to crimp in the z-direction and lift the carrier 904 in the z-axis direction when actuated. For some embodiments, a return spring is used to push the bimorph actuator 902 back to an initial position. A return spring can be configured as described herein to assist in pushing down the bimorph actuator to its initial de-actuated position. Due to the small footprint of bimorph actuators, SMA actuators can be fabricated with a reduced footprint than current actuator technology.

圖10繪示根據一實施例之包含一SMA致動器之一自動聚焦總成之一剖視圖,SMA致動器包含諸如一TMR感測器之一位置感測器。自動聚焦總成1002包含附接至一移動彈簧1006之一位置感測器1004及附接至包含一SMA致動器(諸如本文中所描述之SMA致動器)之一自動聚焦總成之一鏡頭托架1010之一磁體1008。位置感測器1004經組態以使用包含本技術中已知之技術的技術基於磁體1008距位置感測器1004之一距離來判定鏡頭托架1010在z方向1005上自一初始位置移動之移動量。根據一些實施例,位置感測器1004使用一光學影像穩定總成之一移動彈簧1006之一彈簧臂上之複數個電跡線來與一控制器或一處理器(諸如一中央處理單元)電耦合。10 illustrates a cross-sectional view of an autofocus assembly including an SMA actuator including a position sensor such as a TMR sensor, according to an embodiment. Autofocus assembly 1002 includes a position sensor 1004 attached to a moving spring 1006 and one of an autofocus assembly that includes an SMA actuator, such as the SMA actuator described herein A magnet 1008 of the lens holder 1010. The position sensor 1004 is configured to determine the amount of movement of the lens holder 1010 in the z-direction 1005 from an initial position based on a distance of the magnet 1008 from the position sensor 1004 using techniques including techniques known in the art . According to some embodiments, position sensor 1004 uses electrical traces on a spring arm of a moving spring 1006 of an optical image stabilization assembly to electrically communicate with a controller or a processor (such as a central processing unit) coupling.

圖11a至圖11c繪示根據一些實施例之雙壓電晶片致動器之視圖。根據各種實施例,一雙壓電晶片致動器1102包含一橫桿1104及一或多個SMA材料,諸如一SMA帶1106b (例如,如根據圖11b之實施例之包含一SMA帶之一雙壓電晶片致動器之一透視圖中所繪示)或SMA線1106a (例如,如根據圖11a之實施例之包含一SMA線之一雙壓電晶片致動器之一橫截面中所繪示)。SMA材料1106使用包含本文中所描述之技術的技術來附裝至橫桿1104。根據一些實施例,SMA材料1106使用黏著膜材料1108來附裝至一橫桿1104。針對各種實施例,SMA材料1106之端與接點1110電及機械耦合,接點1110經組態以使用包含本技術中已知之技術的技術來將電流供應至SMA材料1106。根據各種實施例,接點1110 (例如,如圖11a及圖11b中所繪示)係鍍金銅墊。根據實施例,具有約1毫米之一長度之一雙壓電晶片致動器1102經組態以產生一大行程且50毫牛頓(「mN」)之推力用作一鏡頭總成之部分,例如,如圖11c中所繪示。根據一些實施例,具有大於1毫米之一長度之一雙壓電晶片致動器1102之使用將產生比具有1毫米之一長度之雙壓電晶片致動器大之行程但更小力。針對一實施例,一雙壓電晶片致動器1102包含一20微米厚SMA材料1106、一20微米厚絕緣體1112 (諸如聚醯亞胺絕緣體)及一30微米厚不鏽鋼橫桿1104或基底金屬。各種實施例包含安置於包含接點1110之一接觸層與SMA材料1106之間的一第二絕緣體1114。根據一些實施例,第二絕緣體1114經組態以使SMA材料1106與未用作接點1110之接觸層之部分絕緣。針對一些實施例,第二絕緣體1114係一面塗層,諸如聚醯亞胺絕緣體。熟習技術者應瞭解,其他尺寸及材料可用於滿足所要設計特性。11a-11c illustrate views of bimorph actuators according to some embodiments. According to various embodiments, a bimorph actuator 1102 includes a crossbar 1104 and one or more SMA materials, such as an SMA tape 1106b (eg, a bimorph including an SMA tape as in the embodiment according to FIG. 11b ) Piezoelectric actuator as depicted in a perspective view) or SMA wire 1106a (eg, as depicted in a cross-section of a bimorph actuator including an SMA wire according to the embodiment of FIG. 11a ) Show). The SMA material 1106 is attached to the crossbar 1104 using techniques including those described herein. According to some embodiments, the SMA material 1106 is attached to a rail 1104 using an adhesive film material 1108. For various embodiments, the ends of the SMA material 1106 are electrically and mechanically coupled with contacts 1110 that are configured to supply current to the SMA material 1106 using techniques including those known in the art. According to various embodiments, the contacts 1110 (eg, as shown in FIGS. 11a and 11b ) are gold-plated copper pads. According to an embodiment, a bimorph actuator 1102 having a length of about 1 millimeter is configured to generate a large stroke and a thrust of 50 millinewtons ("mN") as part of a lens assembly, such as , as shown in Figure 11c. According to some embodiments, the use of a bimorph actuator 1102 with a length greater than 1 millimeter will result in greater travel but less force than a bimorph actuator with a length of 1 millimeter. For one embodiment, a bimorph actuator 1102 includes a 20 micron thick SMA material 1106, a 20 micron thick insulator 1112 (such as a polyimide insulator) and a 30 micron thick stainless steel rail 1104 or base metal. Various embodiments include a second insulator 1114 disposed between a contact layer including contacts 1110 and the SMA material 1106 . According to some embodiments, the second insulator 1114 is configured to insulate the SMA material 1106 from portions of the contact layer that are not used as contacts 1110 . For some embodiments, the second insulator 1114 is a one-side coating, such as a polyimide insulator. Those skilled in the art will appreciate that other dimensions and materials may be used to meet the desired design characteristics.

圖12繪示根據一實施例之一雙壓電晶片致動器之一實施例之視圖。圖12中所繪示之實施例包含用於施加電力之一中心饋電1204。在SMA材料1202 (線或帶)(諸如本文中所描述之SMA材料)之中心處供應電力。SMA材料1202之端在端墊1203處作為一返回路徑接地至橫桿1206或基底金屬。端墊1203與接觸層1214之剩餘部分電隔離。根據實施例,一橫桿1206或基底金屬沿SMA材料1202之整個長度緊密接近SMA材料1202 (諸如一SMA線)在電流關斷(即,雙壓電晶片致動器解除致動)時提供更快線冷卻。結果係一更快線解除啟動及致動器回應時間。改良SMA線或帶之熱分佈。例如,熱分佈更均勻,使得一更高總電流可可靠地傳遞至線。若無一均勻散熱片,則線之部分(諸如一中心區域)可能過熱及受損,因此需要一減小電流及減少運動來可靠地操作。中心饋電1204提供SMA材料1202在更快回應時間內更快線啟動/致動(加熱更快)及減少功耗(更低電阻路徑長度)之益處。此允許一更快致動器運動及依一更高移動頻率操作之能力。Figure 12 shows a view of an embodiment of a bimorph actuator according to an embodiment. The embodiment shown in Figure 12 includes a center feed 1204 for applying power. Power is supplied at the center of SMA material 1202 (wire or ribbon), such as the SMA material described herein. The end of the SMA material 1202 is grounded at the end pad 1203 as a return path to the rail 1206 or the base metal. The terminal pad 1203 is electrically isolated from the remainder of the contact layer 1214 . According to embodiments, a crossbar 1206 or base metal in close proximity to the SMA material 1202 (such as an SMA wire) along the entire length of the SMA material 1202 provides more power when the current is turned off (ie, the bimorph actuator is de-actuated). Fast line cooling. The result is a faster wire deactivation and actuator response time. Improved heat distribution of SMA wire or tape. For example, the heat distribution is more uniform so that a higher total current can be reliably delivered to the wire. Without a uniform heat sink, portions of the wire, such as a central area, may overheat and be damaged, thus requiring a reduced current and reduced motion for reliable operation. Center feed 1204 provides the benefits of faster wire start/actuation (faster heating) and reduced power consumption (lower resistive path length) of SMA material 1202 with faster response time. This allows for a faster actuator movement and the ability to operate at a higher frequency of movement.

如圖12中所繪示,橫桿1206包含與橫桿1206之剩餘部分隔離以形成中心饋電1204之一中心金屬1208。一絕緣體1210 (諸如本文中所描述之絕緣體)安置於橫桿1206上方。絕緣體1210經組態以具有一或多個開口或通孔1212以提供至橫桿1206之電通路(例如耦合接觸層1214之一接地區段1214b)且提供與中心金屬1208之接觸以形成中心饋電1204。根據一些實施例,一接觸層1214 (諸如本文中所描述之接觸層)包含一電源區段1214a及一接地區段1214b以藉由一電源供應接點1216及一接地接點1218來將致動/控制信號提供至雙壓電晶片致動器。一面塗層1220 (諸如本文中所描述之面塗層)安置於接觸層1214上方以電隔離接觸層,惟其中期望電耦合之接觸層1214之部分(例如一或多個接點)除外。As shown in FIG. 12 , the rail 1206 includes a center metal 1208 that is isolated from the remainder of the rail 1206 to form the center feed 1204 . An insulator 1210 , such as the insulator described herein, is disposed over the rail 1206 . The insulator 1210 is configured to have one or more openings or vias 1212 to provide electrical access to the crossbar 1206 (eg, a ground segment 1214b of the coupling contact layer 1214) and to provide contact with the center metal 1208 to form a center feed Electric 1204. According to some embodiments, a contact layer 1214 (such as those described herein) includes a power segment 1214a and a ground segment 1214b to be actuated by a power supply contact 1216 and a ground contact 1218 /Control signals are provided to the bimorph actuator. A topcoat 1220, such as a topcoat described herein, is disposed over the contact layer 1214 to electrically isolate the contact layer except for the portion of the contact layer 1214 where electrical coupling is desired (eg, one or more contacts).

圖13繪示圖12中所繪示之根據一實施例之一雙壓電晶片致動器之一端墊橫截面。如上文所描述,端墊1203藉由形成於端墊1203與接觸層1214之間的一間隙1222來與接觸層1214之剩餘部分電隔離。根據一些實施例,間隙使用包含本技術中已知之蝕刻技術的蝕刻技術來形成。端墊1203包含經組態以電耦合端墊1203與橫桿1206之一通孔區段1224。通孔區段1224形成於絕緣體1210中形成之一通孔1212中。SMA材料1202電耦合至端墊1203。SMA材料1202可使用包含(但不限於)焊接、電阻焊接、雷射焊接及直接電鍍之技術電耦合至端墊1203。13 shows a cross-section of an end pad of the bimorph actuator shown in FIG. 12 according to an embodiment. As described above, the end pad 1203 is electrically isolated from the remainder of the contact layer 1214 by a gap 1222 formed between the end pad 1203 and the contact layer 1214 . According to some embodiments, the gaps are formed using etching techniques including etching techniques known in the art. The end pad 1203 includes a through hole section 1224 configured to electrically couple the end pad 1203 and the rail 1206 . Via section 1224 is formed in one of vias 1212 formed in insulator 1210 . SMA material 1202 is electrically coupled to end pads 1203 . The SMA material 1202 can be electrically coupled to the end pads 1203 using techniques including, but not limited to, welding, resistance welding, laser welding, and direct plating.

圖14繪示圖12中所繪示之根據一實施例之一雙壓電晶片致動器之一中心饋電橫截面。中心饋電1204透過接觸層1214與一電源供應器電耦合且藉由中心饋電1204中之一通孔區段1224與中心金屬1208電及熱耦合,通孔區段1224形成於絕緣體1210中形成之一通孔1212中。14 illustrates a center feed cross-section of the bimorph actuator illustrated in FIG. 12 according to an embodiment. Center feed 1204 is electrically coupled to a power supply through contact layer 1214 and electrically and thermally coupled to center metal 1208 through a via section 1224 in center feed 1204 formed in insulator 1210 a through hole 1212.

本文中所描述之致動器可用於形成使用多個扣件及/或多個雙壓電晶片致動器之一致動器總成。根據一實施例,致動器可彼此上下堆疊以增大可達成之一行程距離。The actuators described herein can be used to form an actuator assembly using multiple fasteners and/or multiple bimorph actuators. According to an embodiment, the actuators can be stacked on top of each other to increase a travel distance that can be achieved.

圖15繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一分解圖。根據本文中所描述之實施例,兩個扣件致動器1302、1304相對於彼此配置以使用其等運動來彼此對置。針對各種實施例,兩個扣件致動器1302、1304經組態以彼此成一反相關係移動以定位一鏡頭托架1306。例如,第一扣件致動器1302經組態以接收發送至第二扣件致動器1304之電力信號之一反相電力信號。15 shows an exploded view of an SMA actuator including one of two fastener actuators, according to one embodiment. According to the embodiments described herein, the two fastener actuators 1302, 1304 are configured relative to each other to oppose each other using their equal motion. For various embodiments, the two fastener actuators 1302 , 1304 are configured to move in an out-of-phase relationship with each other to position a lens carrier 1306 . For example, the first fastener actuator 1302 is configured to receive an inverse power signal of the power signal sent to the second fastener actuator 1304 .

圖16繪示根據一實施例之包含兩個扣件致動器之一SMA致動器。扣件致動器1302、1304經組態使得各扣件致動器1302、1304之扣臂1310、1312面向彼此且各扣件致動器1302、1304之滑動基底1314、1316係兩個扣件致動器之一外表面。根據各種實施例,各SMA致動器1302、1304之一懸吊部分1308經組態以吊架由一或多個扣件致動器1302、1304施加作用之一物件(例如由扣件致動器使用包含本文中所描述之技術的技術來移動之一鏡頭托架1306)之一部分。16 illustrates an SMA actuator including two fastener actuators, according to one embodiment. The fastener actuators 1302, 1304 are configured such that the fastener arms 1310, 1312 of each fastener actuator 1302, 1304 face each other and the sliding bases 1314, 1316 of each fastener actuator 1302, 1304 are two fasteners an outer surface of one of the actuators. According to various embodiments, a suspension portion 1308 of each SMA actuator 1302, 1304 is configured to hang an item (eg, actuated by a fastener) that is acted upon by one or more fastener actuators 1302, 1304 The camera moves a portion of a lens carrier 1306) using techniques including the techniques described herein.

圖17繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一側視圖,其繪示導致在一正z方向上或在一向上方向上移動諸如一鏡頭托架之一物件之SMA線1318之方向。17 shows a side view of an SMA actuator including one of two fastener actuators, shown causing movement in a positive z-direction or in an upward direction, such as a lens holder, according to an embodiment The orientation of the SMA wire 1318 of an object.

圖18繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一側視圖,其繪示導致在一負z方向上或在一向下方向上移動諸如一鏡頭托架之一物件之SMA線1318之方向。18 shows a side view of an SMA actuator including one of two fastener actuators, shown causing movement in a negative z-direction or in a downward direction, such as a lens holder, according to an embodiment The orientation of the SMA wire 1318 of an object.

圖19繪示根據一實施例之包含一SMA致動器之一總成之一分解圖,SMA致動器包含兩個扣件致動器。扣件致動器1902、1904經組態使得各扣件致動器1902、1904之扣臂1910、1912係兩個扣件致動器之一外表面且各扣件致動器1902、1904之滑動基底1914、1916面向彼此。根據各種實施例,各SMA致動器1902、1904之一懸吊部分1908經組態以吊架由一或多個扣件致動器1902、1904施加作用之一物件(例如由扣件致動器使用包含本文中所描述之技術的技術來移動之一鏡頭托架1906)之一部分。針對一些實施例,SMA致動器包含經組態以接收第二扣件致動器1904之一基底部分1918。SMA致動器亦可包含一蓋部分1920。圖20繪示根據一實施例之包含兩個扣件致動器之一SMA致動器,其包含一基底部分及一蓋部分。19 shows an exploded view of an assembly including an SMA actuator including two fastener actuators, according to an embodiment. The fastener actuators 1902, 1904 are configured such that the fastener arms 1910, 1912 of each fastener actuator 1902, 1904 are an outer surface of one of the two fastener actuators and the fastener actuators 1902, 1904 are The sliding bases 1914, 1916 face each other. According to various embodiments, a suspension portion 1908 of each SMA actuator 1902, 1904 is configured to hang an item (eg, actuated by a fastener) that is acted upon by one or more fastener actuators 1902, 1904 The camera moves a portion of a lens carrier 1906) using techniques including the techniques described herein. For some embodiments, the SMA actuator includes a base portion 1918 configured to receive the second fastener actuator 1904. The SMA actuator may also include a cover portion 1920. 20 illustrates an SMA actuator including two fastener actuators including a base portion and a cover portion, according to an embodiment.

圖21繪示根據一實施例之包含兩個扣件致動器之一SMA致動器。針對一些實施例,扣件致動器1902、1904相對於彼此配置,使得第一扣件致動器1902之懸吊部分1908自第二扣件致動器1904之懸吊部分旋轉約90度。90度組態實現諸如一鏡頭托架1906之一物件之俯仰及翻滾旋轉。此提供對鏡頭托架1906之移動之更好控制。針對各種實施例,將差動電力信號施加至各扣件致動器對之SMA線,此為傾斜OIS運動提供鏡頭托架之俯仰及翻滾旋轉。21 illustrates an SMA actuator including two fastener actuators, according to one embodiment. For some embodiments, the fastener actuators 1902, 1904 are configured relative to each other such that the suspended portion 1908 of the first fastener actuator 1902 is rotated approximately 90 degrees from the suspended portion of the second fastener actuator 1904. The 90 degree configuration enables pitch and roll rotation of an object such as a lens holder 1906. This provides better control over the movement of the lens carrier 1906. For various embodiments, differential power signals are applied to the SMA wires of each pair of fastener actuators, which provide pitch and roll rotation of the lens carrier for tilt OIS motion.

包含兩個扣件致動器之SMA致動器之實施例無需一復位彈簧。當使用SMA線電阻用於位置回饋時,兩個扣件致動器之使用可改良/減少磁滯。包含兩個扣件致動器之SMA致動器之反力歸因於比包含一復位彈簧之SMA致動器低之磁滯而促進更準確位置控制。針對一些實施例,諸如圖22中所繪示之實施例,包含兩個扣件致動器2202、2204之SMA致動器使用差動電力向各扣件致動器2202、2204之左SMA線2218a及右SMA線2218b提供2軸傾斜。例如,一左SMA線2218a以高於一右SMA線2218b之電力致動。此引起鏡頭托架2206之左側下移且右側上移(傾斜)。針對一些實施例,第一扣件致動器2202之SMA線保持處於相等電力以充當差動推動SMA線2218a、2218b引起傾斜運動之一支點。使施加至SMA線之電力信號反轉(例如將相等電力施加至第二扣件致動器2204之SMA線及將差動電力用於第二扣件致動器2204之左SMA線2218a及右SMA線2218b)導致鏡頭托架2206在另一方向上傾斜。此提供使諸如一鏡頭托架之一物件在任一運動軸線上傾斜之能力,或可不理鏡頭與感測器之間的任何傾斜以獲得良好動態傾斜,其導致跨所有像素之更好圖片品質。Embodiments of SMA actuators that include two fastener actuators do not require a return spring. The use of two fastener actuators can improve/reduce hysteresis when using SMA wire resistors for position feedback. The reaction force of an SMA actuator that includes two fastener actuators facilitates more accurate position control due to lower hysteresis than an SMA actuator that includes a return spring. For some embodiments, such as the embodiment depicted in Figure 22, an SMA actuator comprising two fastener actuators 2202, 2204 uses differential power to the left SMA wire of each fastener actuator 2202, 2204 2218a and right SMA wire 2218b provide 2-axis tilt. For example, a left SMA wire 2218a is actuated with a higher power than a right SMA wire 2218b. This causes the left side of the lens holder 2206 to move down and the right side up (tilt). For some embodiments, the SMA wires of the first fastener actuator 2202 are kept at equal power to act as a fulcrum for differentially pushing the SMA wires 2218a, 2218b to cause tilting motion. Inverting the power signal applied to the SMA wires (eg, applying equal power to the SMA wires of the second fastener actuator 2204 and applying differential power to the left SMA wires 2218a and right of the second fastener actuator 2204 SMA wire 2218b) causes lens holder 2206 to tilt in the other direction. This provides the ability to tilt an object such as a lens holder in either axis of motion, or can ignore any tilt between the lens and the sensor for good dynamic tilt, which results in better picture quality across all pixels.

圖23繪示根據一實施例之包含兩個扣件致動器及一耦合器之一SMA致動器。SMA致動器包含兩個扣件致動器,諸如本文中所描述之扣件致動器。一第一扣件致動器2302經組態以使用諸如一耦合器環2305之一耦合器來與一第二扣件致動器2304耦合。扣件致動器2302、2304相對於彼此配置,使得第一扣件致動器2302之懸吊部分2308自第二扣件致動器2304之懸吊部分2309旋轉約90度。用於移動之一有效負載(諸如一鏡頭或鏡頭總成)附接至一鏡頭托架2306,鏡頭托架2306經組態以安置於第一扣件致動器2302之一滑動基底上。23 illustrates an SMA actuator including two fastener actuators and a coupler, according to one embodiment. The SMA actuator includes two fastener actuators, such as the fastener actuators described herein. A first fastener actuator 2302 is configured to couple with a second fastener actuator 2304 using a coupler such as a coupler ring 2305. The buckle actuators 2302, 2304 are arranged relative to each other such that the suspension portion 2308 of the first buckle actuator 2302 is rotated approximately 90 degrees from the suspension portion 2309 of the second buckle actuator 2304. A payload for moving, such as a lens or lens assembly, is attached to a lens carrier 2306 that is configured to rest on a sliding base of the first fastener actuator 2302.

針對各種實施例,可將相等電力施加至第一扣件致動器2302及第二扣件致動器2304之SMA線。此可導致最大化SMA致動器在正z方向上之z行程。針對一些實施例,SMA致動器之行程可具有等於或大於包含兩個扣件致動器之其他SMA致動器之行程之兩倍之一z行程。針對一些實施例,當自SMA致動器移除電力信號時,可新增一額外彈簧用於推動兩個扣件以輔助向下回推致動器總成及有效負載。可將相同且相反電力信號施加至第一扣件致動器2302及第二扣件致動器2304之SMA線。此使SMA致動器能夠藉由一扣件致動器在正z方向上移動及藉由一扣件致動器在負z方向上移動,其實現SMA致動器之位置之準確控制。此外,可將相等且相反電力信號(差動電力信號)施加至第一扣件致動器2302及第二扣件致動器2304之左SMA線及右SMA線以使諸如一鏡頭托架2306之一物件在兩個軸線之至少一者之方向上傾斜。For various embodiments, equal power may be applied to the SMA wires of the first fastener actuator 2302 and the second fastener actuator 2304. This can result in maximizing the z-travel of the SMA actuator in the positive z-direction. For some embodiments, the travel of the SMA actuator may have a z-travel equal to or greater than twice the travel of other SMA actuators including two fastener actuators. For some embodiments, when the power signal is removed from the SMA actuator, an additional spring may be added to push the two catches to assist in pushing the actuator assembly and payload back down. The same and opposite power signals can be applied to the SMA wires of the first fastener actuator 2302 and the second fastener actuator 2304. This enables the SMA actuator to be moved in the positive z-direction by a snap actuator and in the negative z-direction by a snap actuator, which enables accurate control of the position of the SMA actuator. In addition, equal and opposite power signals (differential power signals) can be applied to the left and right SMA wires of the first and second fastener actuators 2302 and 2304 to enable, for example, a lens mount 2306 An object is inclined in the direction of at least one of the two axes.

包含兩個扣件致動器及一耦合器之SMA致動器(諸如圖23中所繪示之SMA致動器)之實施例可與一額外扣件致動器及扣件致動器對耦合以達成大於單一SMA致動器之行程之一所要行程。Embodiments of SMA actuators including two fastener actuators and a coupler, such as the SMA actuator depicted in Figure 23, can be paired with an additional fastener actuator and fastener actuator Coupling to achieve a desired stroke greater than that of a single SMA actuator.

圖24繪示根據一實施例之包含一SMA致動器之一SMA系統之一分解圖,SMA致動器包含具有一層壓懸吊之一扣件致動器。如本文中所描述,針對一些實施例,SMA系統經組態以與一或多個攝影機鏡頭元件一起用作一自動聚焦驅動。如圖24中所繪示,SMA系統包含一復位彈簧2403,其根據各種實施例組態以在SMA線2408之張力隨著SMA線解除致動而降低時在z行程方向之相反方向上移動一鏡頭托架2405。針對一些實施例,SMA系統包含一外殼2409,其經組態以接收復位彈簧2403且施加作用於一滑動軸承以在z行程方向上引導鏡頭托架。外殼2409亦經組態以安置於扣件致動器2402上。扣件致動器2402包含類似於本文中所描述之滑動基底之一滑動基底2401。扣件致動器2402包含與一懸吊部分(諸如由一層壓板形成之一層壓懸吊2406)耦合之扣臂2404。扣件致動器2402亦包含一SMA線附接結構,諸如一層壓成型箝夾連接2412。24 shows an exploded view of an SMA system including an SMA actuator including a fastener actuator with a laminated suspension, according to an embodiment. As described herein, for some embodiments, the SMA system is configured to function as an autofocus drive with one or more camera lens elements. As shown in FIG. 24, the SMA system includes a return spring 2403 configured according to various embodiments to move in the opposite direction of the z-travel direction as the tension of the SMA wire 2408 decreases as the SMA wire is de-actuated Lens Holder 2405. For some embodiments, the SMA system includes a housing 2409 configured to receive return spring 2403 and act on a sliding bearing to guide the lens carrier in the z-travel direction. Housing 2409 is also configured to seat over fastener actuator 2402. The fastener actuator 2402 includes a sliding base 2401 that is similar to the sliding base described herein. Buckle actuator 2402 includes a buckle arm 2404 coupled to a suspension portion, such as a laminate suspension 2406 formed from a laminate. Fastener actuator 2402 also includes an SMA wire attachment structure, such as a laminated jaw connection 2412.

如圖24中所繪示,滑動基底2401安置於一選用適配器板2414上。適配器板經組態以使SMA系統或扣件致動器2402與另一系統(諸如一OIS、額外SMA系統或其他組件)配合。圖25繪示根據一實施例之包含一SMA致動器之一SMA系統2501,SMA致動器包含具有一層壓懸吊之一扣件致動器2402。As shown in FIG. 24 , the sliding base 2401 is disposed on an optional adapter plate 2414 . The adapter plate is configured to mate the SMA system or fastener actuator 2402 with another system, such as an OIS, additional SMA system, or other components. 25 illustrates an SMA system 2501 including an SMA actuator including a fastener actuator 2402 with a laminated suspension, according to one embodiment.

圖26繪示根據一實施例之包含一層壓懸吊之一扣件致動器。扣件致動器2402包含扣臂2404。扣臂2404經組態以在SMA線2408如本文中所描述般致動及解除致動時在z軸上移動。SMA線2408使用層壓成型箝夾連接2412來附接至扣件致動器。根據圖26中所繪示之實施例,扣臂2404透過諸如一層壓懸吊2406之一中心部分彼此耦合。根據各種實施例,一層壓懸吊2406經組態以吊架由扣件致動器施加作用之一物件(例如由扣件致動器使用包含本文中所描述之技術的技術來移動之一鏡頭托架)之一部分。26 illustrates a fastener actuator including a laminate suspension, according to one embodiment. Buckle actuator 2402 includes buckle arms 2404 . Buckle arm 2404 is configured to move in the z-axis when SMA wire 2408 is actuated and de-actuated as described herein. The SMA wire 2408 is attached to the fastener actuator using a laminate-molded jaw connection 2412. According to the embodiment shown in FIG. 26, the buckle arms 2404 are coupled to each other through a central portion such as a laminate suspension 2406. According to various embodiments, a laminate hanger 2406 is configured to hang an item that is acted upon by a fastener actuator (eg, by the fastener actuator to move a lens using techniques including those described herein) part of the bracket).

圖27繪示根據一實施例之一SMA致動器之一層壓懸吊。針對一些實施例,層壓懸吊2406材料係一低勁度材料,因此其無法抵抗致動運動。例如,層壓懸吊2406使用安置於一第一聚醯亞胺層上之一銅層與安置於銅上之一第二聚醯亞胺層來形成。針對一些實施例,層壓懸吊2406使用包含本技術中已知之沈積及蝕刻技術的沈積及蝕刻技術來形成於扣臂2404上。針對其他實施例,層壓懸吊2406與扣臂2404單獨形成且使用包含焊接、黏著及本技術中已知之其他技術的技術來附接至扣臂2404。針對各種實施例,在層壓懸吊2406上使用膠水或其他黏著劑以確保扣臂2404保持於相對於一鏡頭托架之一位置中。27 illustrates a laminated suspension of an SMA actuator according to an embodiment. For some embodiments, the laminate suspension 2406 material is a low stiffness material so it cannot resist actuation motion. For example, the laminate suspension 2406 is formed using a copper layer disposed on a first polyimide layer and a second polyimide layer disposed on the copper. For some embodiments, the laminated suspension 2406 is formed on the buckle arms 2404 using deposition and etching techniques including deposition and etching techniques known in the art. For other embodiments, the laminate suspension 2406 is formed separately from the buckle arms 2404 and attached to the buckle arms 2404 using techniques including welding, adhesives, and other techniques known in the art. For various embodiments, glue or other adhesive is used on the lamination hanger 2406 to ensure that the buckle arms 2404 remain in a position relative to a lens holder.

圖28繪示根據一實施例之一SMA致動器之一層壓成型箝夾連接。層壓成型箝夾連接2412經組態以將一SMA線2408附接至扣件致動器且與SMA線2408產生一電路接頭。針對各種實施例,層壓成型箝夾連接2412包含由一絕緣體之一或多個層及形成於一箝夾上之一導電層之一或多個層形成之一層壓板。Figure 28 illustrates a lamination-molded jaw connection of an SMA actuator according to an embodiment. Laminated jaw connection 2412 is configured to attach an SMA wire 2408 to the fastener actuator and create a circuit joint with the SMA wire 2408. For various embodiments, the lamination-molded jaw connection 2412 includes a laminate formed from one or more layers of an insulator and one or more layers of a conductive layer formed on a jaw.

例如,聚醯亞胺層安置於形成一箝夾2413之不鏽鋼部分之至少一部分上。接著,諸如銅之一導電層安置於聚醯亞胺層上,聚醯亞胺層與安置於扣件致動器上之一或多個信號跡線2415電耦合。使箝夾變形以與其中之SMA線接觸亦使SMA線與導電層電接觸。因此,與一或多個信號跡線耦合之導電層用於使用包含本文中所描述之技術的技術來將電力信號施加至SMA線。針對一些實施例,一第二聚醯亞胺層形成於導電層上方之其中導電層不會與SMA線接觸之區域中。針對一些實施例,層壓成型箝夾連接2412使用包含本技術中已知之沈積及蝕刻技術的沈積及蝕刻技術來形成於一箝夾2413上。針對其他實施例,層壓成型箝夾連接2412及一或多個電跡線與箝夾2413及扣件致動器單獨形成且使用包含焊接、黏著及本技術中已知之其他技術的技術來附接至箝夾2413及扣件致動器。For example, a polyimide layer is disposed over at least a portion of the stainless steel portion forming a jaw 2413. Next, a conductive layer, such as copper, is disposed over the polyimide layer, which is electrically coupled to one or more signal traces 2415 disposed over the fastener actuator. Deforming the jaws to contact the SMA wire therein also brings the SMA wire into electrical contact with the conductive layer. Accordingly, a conductive layer coupled with one or more signal traces is used to apply power signals to the SMA wires using techniques including the techniques described herein. For some embodiments, a second polyimide layer is formed over the conductive layer in areas where the conductive layer does not contact the SMA wires. For some embodiments, lamination-molded jaw connections 2412 are formed on a jaw 2413 using deposition and etching techniques including deposition and etching techniques known in the art. For other embodiments, the laminate-molded jaw connections 2412 and one or more electrical traces are formed separately from the jaws 2413 and fastener actuators and attached using techniques including soldering, gluing, and other techniques known in the art Connected to jaw 2413 and fastener actuator.

圖29繪示包含具有一層壓懸吊之一扣件致動器之一SMA致動器。如圖29中所繪示,當施加一電力信號時,SMA線收縮或縮短以在正z方向上移動扣臂及層壓懸吊。與一物件接觸之層壓懸吊繼而在正z方向上移動該物件,諸如一鏡頭托架。當電力信號減小或移除時,SMA線伸長且在一負z方向上移動扣臂及層壓懸吊。Figure 29 shows an SMA actuator including a fastener actuator with a laminated suspension. As shown in Figure 29, when a power signal is applied, the SMA wire contracts or shortens to move the buckle arms and laminate suspension in the positive z-direction. The laminated suspension in contact with an object, such as a lens holder, then moves the object in the positive z-direction. When the power signal is reduced or removed, the SMA wire stretches and moves the buckle arms and laminate suspension in a negative z-direction.

圖30繪示根據一實施例之包含一SMA致動器之一SMA系統之一分解圖,SMA致動器包含一扣件致動器。如本文中所描述,針對一些實施例,SMA系統經組態以與一或多個攝影機鏡頭元件一起用作一自動聚焦驅動。如圖30中所繪示,SMA系統包含一復位彈簧3003,其根據各種實施例組態以在SMA線3008之張力隨著SMA線解除致動而降低時在z行程方向之相反方向上移動一鏡頭托架3005。針對一些實施例,SMA系統包含安置於復位彈簧3003上之一加強件3000。針對一些實施例,SMA系統包含由兩個部分形成之一外殼3009,其經組態以接收復位彈簧3003且施加作用於一滑動軸承以在z行程方向上引導鏡頭托架。外殼3009亦經組態以安置於扣件致動器3002上。扣件致動器3002包含類似於本文中所描述之滑動基底之一滑動基底3001,由兩個部分形成。滑動基底3001經分裂以電隔離兩側(例如,一側係接地,另一側係電源),因為根據一些實施例,電流透過滑動基底3001部分流動至線。30 illustrates an exploded view of an SMA system including an SMA actuator including a fastener actuator, according to an embodiment. As described herein, for some embodiments, the SMA system is configured to function as an autofocus drive with one or more camera lens elements. As depicted in FIG. 30, the SMA system includes a return spring 3003 configured according to various embodiments to move in the opposite direction of the z-travel direction as the tension of the SMA wire 3008 decreases as the SMA wire is de-actuated Lens holder 3005. For some embodiments, the SMA system includes a stiffener 3000 disposed on return spring 3003. For some embodiments, the SMA system includes a housing 3009 formed of two parts that is configured to receive return spring 3003 and act on a sliding bearing to guide the lens carrier in the z-travel direction. Housing 3009 is also configured to seat over fastener actuator 3002. The fastener actuator 3002 includes a sliding base 3001 similar to the sliding base described herein, formed of two parts. The sliding base 3001 is split to electrically isolate the two sides (eg, ground on one side and power on the other) because, according to some embodiments, current flows partially through the sliding base 3001 to the wires.

扣件致動器3002包含扣臂3004。各對扣件致動器3002形成於扣件致動器3002之一單獨部分上。扣件致動器3002亦包含一SMA線附接結構,諸如一電阻焊線箝夾3012。SMA系統視情況包含用於將SMA線3008電耦合至一或多個控制電路之一撓性電路3020。Buckle actuator 3002 includes buckle arm 3004 . Each pair of fastener actuators 3002 is formed on a separate portion of the fastener actuators 3002 . The fastener actuator 3002 also includes an SMA wire attachment structure, such as a resistance wire clamp 3012. The SMA system optionally includes a flex circuit 3020 for electrically coupling the SMA wire 3008 to one or more control circuits.

如圖30中所繪示,滑動基底3001安置於一選用適配器板3014上。適配器板經組態以使SMA系統或扣件致動器3002與另一系統(諸如一OIS、額外SMA系統或其他組件)配合。圖31繪示根據一實施例之包含一SMA致動器之一SMA系統3101,SMA致動器包含一扣件致動器3002。As shown in FIG. 30 , the sliding base 3001 is disposed on an optional adapter plate 3014 . The adapter plate is configured to mate the SMA system or fastener actuator 3002 with another system, such as an OIS, additional SMA system, or other components. 31 illustrates an SMA system 3101 including an SMA actuator including a fastener actuator 3002, according to one embodiment.

圖32繪示根據一實施例之包含一扣件致動器之一SMA致動器。扣件致動器3002包含扣臂3004。扣臂3004經組態以在SMA線3008如本文中所描述般致動及解除致動時在z軸上移動。SMA線3008附接至電阻焊線箝夾3012。根據圖32中所繪示之實施例,扣臂3004經組態以與諸如一鏡頭托架之一物件配合,無需使用一雙軛捕捉接頭之一中心部分。32 illustrates an SMA actuator including a fastener actuator, according to one embodiment. Buckle actuator 3002 includes buckle arm 3004 . Buckle arm 3004 is configured to move in the z-axis when SMA wire 3008 is actuated and de-actuated as described herein. SMA wire 3008 is attached to resistance wire clamp 3012. According to the embodiment depicted in Figure 32, the buckle arm 3004 is configured to mate with an item such as a lens holder without the use of a double yoke to capture a central portion of the joint.

圖33繪示根據一實施例之一SMA致動器之一對扣臂之一雙軛捕捉接頭。圖33亦繪示用於將選用撓性電路附接至滑動基底之電鍍墊。針對一些實施例,電鍍墊使用金來形成。圖34繪示根據一實施例之一SMA致動器之一電阻焊箝夾,其用於將一SMA線附接至扣件致動器。針對一些實施例,膠水或黏著劑亦可放置於焊接之頂部上以輔助機械強度且在操作及衝擊負載期間用於緩解疲勞應變。33 illustrates a double yoke capture joint of a pair of snap arms of an SMA actuator according to an embodiment. Figure 33 also shows the electroplating pads used to attach the optional flex circuit to the sliding substrate. For some embodiments, the electroplating pads are formed using gold. 34 illustrates a resistance welding jaw of an SMA actuator for attaching an SMA wire to a fastener actuator, according to an embodiment. For some embodiments, glue or adhesive may also be placed on top of the weld to assist with mechanical strength and to relieve fatigue strain during handling and shock loading.

圖35繪示包含具有一雙軛捕捉接頭之一扣件致動器之一SMA致動器。如圖35中所繪示,當施加一電力信號時,SMA線收縮或縮短以在正z方向上移動扣臂。雙軛捕捉接頭與一物件接觸,繼而在正z方向上移動該物件,諸如一鏡頭托架。當電力信號減小或移除時,SMA線伸長且在一負z方向上移動扣臂。軛捕捉特徵確保扣臂保持於相對於鏡頭托架之正確位置中。Figure 35 shows an SMA actuator including a fastener actuator with a double yoke capture tab. As shown in Figure 35, when a power signal is applied, the SMA wire contracts or shortens to move the buckle arm in the positive z-direction. The double yoke capture joint contacts an object, which in turn moves the object in the positive z direction, such as a lens holder. When the power signal is reduced or removed, the SMA wire stretches and moves the buckle arm in a negative z-direction. The yoke capture feature ensures that the clasp arms remain in the correct position relative to the lens holder.

圖36繪示根據一實施例之一SMA雙壓電晶片液體鏡頭。SMA雙壓電晶片液體鏡頭3501包含一液體鏡頭子總成3502、一外殼3504及具有SMA致動器3506之一電路。針對各種實施例,SMA致動器包含4個雙壓電晶片致動器3508,諸如本文中所描述之實施例。雙壓電晶片致動器3508經組態以推動定位於一撓性隔膜3512上之一成形環3510。環使隔膜3512/液體3514翹曲以改變通過隔膜3512/液體3514之光路徑。一液體容納環3516用於容納隔膜3512與鏡頭3518之間的液體3514。來自雙壓電晶片致動器之相等力改變影像在Z方向(法向於鏡頭)上之焦點,此允許其用作一自動聚焦。根據一些實施例,來自雙壓電晶片致動器3508之差動力可使光線在X、Y軸方向上移動,此允許其用作一光學影像穩定器。可使用對各致動器之適當控制同時達成OIS及AF兩種功能。針對一些實施例,使用3個致動器。具有SMA致動器3506之電路包含用於致動SMA致動器之控制信號之一或多個接點3520。根據包含4個SMA致動器之一些實施例,具有SMA致動器3506之電路包含用於各SMA致動器之4個電力電路控制接點及一共同復位接點。36 illustrates an SMA bimorph liquid lens according to an embodiment. The SMA bimorph liquid lens 3501 includes a liquid lens sub-assembly 3502, a housing 3504, and a circuit with an SMA actuator 3506. For various embodiments, the SMA actuator includes 4 bimorph actuators 3508, such as the embodiments described herein. The bimorph actuator 3508 is configured to push a forming ring 3510 positioned on a flexible diaphragm 3512. The ring warps the diaphragm 3512/liquid 3514 to change the light path through the diaphragm 3512/liquid 3514. A liquid containment ring 3516 is used to contain the liquid 3514 between the diaphragm 3512 and the lens 3518. The equal force from the bimorph actuator changes the focus of the image in the Z direction (normal to the lens), which allows it to function as an autofocus. According to some embodiments, the differential force from the bimorph actuator 3508 can move the light in the X, Y axis directions, which allows it to function as an optical image stabilizer. Both OIS and AF functions can be achieved simultaneously using appropriate control of each actuator. For some embodiments, 3 actuators are used. The circuit with the SMA actuator 3506 includes one or more contacts 3520 for control signals to actuate the SMA actuator. According to some embodiments including 4 SMA actuators, the circuit with SMA actuator 3506 includes 4 power circuit control contacts and a common reset contact for each SMA actuator.

圖37繪示根據一實施例之一透視SMA雙壓電晶片液體鏡頭。圖38繪示根據一實施例之SMA雙壓電晶片液體鏡頭之一橫截面及一仰視圖。37 illustrates a see-through SMA bimorph liquid lens according to an embodiment. 38 illustrates a cross-section and a bottom view of an SMA bimorph liquid lens according to an embodiment.

圖39繪示根據一實施例之包含具有雙壓電晶片致動器之一SMA致動器3902之一SMA系統。SMA致動器3902包含使用本文中所描述之技術之4個雙壓電晶片致動器。雙壓電晶片致動器之兩者經組態為正z行程致動器3904且兩者經組態為負z行程致動器3906,如圖40中所繪示,圖40繪示根據一實施例之具有雙壓電晶片致動器之SMA致動器3902。對置致動器3906、3904經組態以在整個行程範圍內控制兩個方向上之運動。此提供調諧控制碼以補償傾斜之能力。針對各種實施例,附接至組件頂部之兩個SMA線3908實現正z行程位移。附接至組件之一底部之兩個SMA線實現負z行程位移。針對一些實施例,各雙壓電晶片致動器使用接合諸如一鏡頭托架3910之一物件之突片來附接至物件。SMA系統包含經組態以提供鏡頭托架3910在垂直於z行程軸線之軸線上(例如,在x軸及y軸之方向上)之穩定性之一頂部彈簧3912。此外,一頂部間隔件3914經組態以配置於頂部彈簧3912與SMA致動器3902之間。一底部間隔件3916配置於SMA致動器3902與一底部彈簧3918之間。底部彈簧3918經組態以提供鏡頭托架3910在垂直於z行程軸線之軸線上(例如,在x軸及y軸之方向上)之穩定性。底部彈簧3918經組態以安置於一基底3920上,諸如本文中所描述之基底。39 illustrates an SMA system including an SMA actuator 3902 with a bimorph actuator, according to an embodiment. SMA actuator 3902 includes 4 bimorph actuators using the techniques described herein. Both of the bimorph actuators are configured as positive z-stroke actuators 3904 and both are configured as negative z-stroke actuators 3906, as depicted in FIG. 40, which depicts according to a SMA actuator 3902 with bimorph actuator of an embodiment. The opposing actuators 3906, 3904 are configured to control movement in both directions over the entire range of travel. This provides the ability to tune the control code to compensate for tilt. For various embodiments, two SMA wires 3908 attached to the top of the assembly achieve a positive z-stroke displacement. Two SMA wires attached to the bottom of one of the components achieve negative z-travel displacement. For some embodiments, each bimorph actuator is attached to an object using a tab that engages an object such as a lens mount 3910. The SMA system includes a top spring 3912 configured to provide stability of the lens holder 3910 on an axis perpendicular to the z-travel axis (eg, in the directions of the x- and y-axes). Additionally, a top spacer 3914 is configured to be disposed between the top spring 3912 and the SMA actuator 3902. A bottom spacer 3916 is disposed between the SMA actuator 3902 and a bottom spring 3918. Bottom spring 3918 is configured to provide stability of lens holder 3910 on an axis perpendicular to the z-travel axis (eg, in the directions of the x- and y-axes). Bottom spring 3918 is configured to be disposed on a substrate 3920, such as the substrate described herein.

圖41繪示一雙壓電晶片致動器4103之長度4102及使一SMA線4106延伸線長度超過雙壓電晶片致動器之一接合墊4104之位置。長於雙壓電晶片致動器之線用於增大行程及力。因此,SMA線4106超過雙壓電晶片致動器4103之延伸長度4108用於設定雙壓電晶片致動器4103之行程及力。Figure 41 shows the length 4102 of a bimorph actuator 4103 and the position where an SMA wire 4106 extends the wire length beyond a bond pad 4104 of the bimorph actuator. Wires longer than bimorph actuators are used to increase stroke and force. Thus, the SMA wire 4106 extends beyond the extension 4108 of the bimorph actuator 4103 for setting the stroke and force of the bimorph actuator 4103.

圖42繪示根據一實施例之包含一SMA雙壓電晶片致動器4202之一SMA系統之一分解圖。根據各種實施例,SMA系統經組態以使用單獨金屬材料及非導電黏著劑來產生一或多個電路以獨立供電給SMA線。一些實施例不具有AF大小影響且包含4個雙壓電晶片致動器,諸如本文中所描述之雙壓電晶片致動器。雙壓電晶片致動器之兩者經組態為正z行程致動器且兩者經組態為負z行程致動器。圖43繪示根據一實施例之SMA致動器之一子區段之一分解圖。子區段包含一負致動器信號連接4302、具有雙壓電晶片致動器4306之一基底4304。負致動器信號連接4302包含用於使用包含本文中所描述之技術的技術連接一雙壓電晶片致動器4306之一SMA線之一線接合墊4308。負致動器信號連接4302使用一黏著層4310來附裝至基底4304。子區段亦包含具有一線接合墊4316之一正致動器信號連接4314,線接合墊4316用於使用包含本文中所描述之技術的技術來連接一雙壓電晶片致動器4306之一SMA線4312。正致動器信號連接4314使用一黏著層4318來附裝至基底4304。基底4304、負致動器信號連接4302及正致動器信號連接4314之各者由金屬(例如不鏽鋼)形成。基底4304、負致動器信號連接4302及正致動器信號連接4314之各者上之連接墊4322經組態以電耦合控制信號及接地以使用包含本文中所描述之技術的技術來致動雙壓電晶片致動器4306。針對一些實施例,連接墊4322係鍍金的。圖44繪示根據一實施例之SMA致動器之一子區段。針對一些實施例,鍍金墊形成於不鏽鋼層上用於焊料接合或其他已知電端接方法。此外,成型線接合墊用於信號接頭以電耦合用於電力信號之SMA線。42 shows an exploded view of an SMA system including an SMA bimorph actuator 4202, according to an embodiment. According to various embodiments, the SMA system is configured to use separate metallic materials and a non-conductive adhesive to create one or more circuits to independently power the SMA wires. Some embodiments have no AF size effect and include 4 bimorph actuators, such as the bimorph actuators described herein. Both of the bimorph actuators are configured as positive z-stroke actuators and both are configured as negative z-stroke actuators. 43 shows an exploded view of a subsection of an SMA actuator according to an embodiment. The subsection includes a negative actuator signal connection 4302, a substrate 4304 with a bimorph actuator 4306. Negative actuator signal connection 4302 includes a wire bond pad 4308 for connecting an SMA wire of a bimorph actuator 4306 using techniques including the techniques described herein. Negative actuator signal connection 4302 is attached to substrate 4304 using an adhesive layer 4310. The subsection also includes a positive actuator signal connection 4314 with wire bond pads 4316 for connecting a bimorph actuator 4306 to an SMA using techniques including those described herein Line 4312. Positive actuator signal connection 4314 is attached to substrate 4304 using an adhesive layer 4318. Each of the base 4304, the negative actuator signal connection 4302, and the positive actuator signal connection 4314 are formed of metal, such as stainless steel. Connection pads 4322 on each of substrate 4304, negative actuator signal connection 4302, and positive actuator signal connection 4314 are configured to electrically couple control signals and ground for actuation using techniques including those described herein Bimorph actuator 4306. For some embodiments, the connection pads 4322 are gold plated. 44 illustrates a subsection of an SMA actuator according to an embodiment. For some embodiments, gold-plated pads are formed on the stainless steel layer for solder bonding or other known electrical termination methods. Additionally, wire bond pads are used for signal contacts to electrically couple SMA wires for power signals.

圖45繪示根據一實施例之一5軸感測器移位系統。5軸感測器移位系統經組態以相對於一或多個鏡頭在5軸上移動一物件,諸如一影像感測器。此包含X/Y/Z軸平移及俯仰/翻滾傾斜。系統視情況經組態以僅使用具有X/Y軸平移及俯仰/翻滾傾斜之4軸連同頂部上之一單獨AF來進行Z運動。其他實施例包含經組態以相對於一影像感測器移動一或多個鏡頭之5軸感測器移位系統。針對一些實施例,靜態鏡頭堆疊安裝於頂蓋上且插入ID內部(不接觸內部之橙色移動托架)。45 illustrates a 5-axis sensor displacement system according to an embodiment. A 5-axis sensor shift system is configured to move an object, such as an image sensor, in 5-axis relative to one or more lenses. This includes X/Y/Z axis translation and pitch/roll tilt. The system is optionally configured to use only 4 axes with X/Y axis translation and pitch/roll tilt for Z motion along with a single AF on top. Other embodiments include a 5-axis sensor shift system configured to move one or more lenses relative to an image sensor. For some embodiments, the still lens stack is mounted on the top cover and inserted inside the ID (without touching the orange moving bracket inside).

圖46繪示根據一實施例之一5軸感測器移位系統之一分解圖。5軸感測器移位系統包含2個電路組件:一撓性感測器電路4602、雙壓電晶片致動器電路4604;及8個至12個雙壓電晶片致動器4606,其等使用包含本文中所描述之技術的技術構建至雙壓電晶片電路組件上。5軸感測器移位系統包含經組態以固持一或多個鏡頭之一移動托架4608及一外殼4610。根據一實施例,雙壓電晶片致動器電路4604包含8個至12個SMA致動器,諸如本文中所描述之SMA致動器。SMA致動器經組態以在類似於本文中所描述之其他5軸系統之5軸上移動移動托架4608,諸如在x方向、y方向、z方向、俯仰及翻滾上。46 shows an exploded view of a 5-axis sensor displacement system according to an embodiment. The 5-axis sensor displacement system includes 2 circuit components: a flex sensor circuit 4602, a bimorph actuator circuit 4604; and 8 to 12 bimorph actuators 4606, etc. used Techniques including the techniques described herein are built onto bimorph circuit components. The 5-axis sensor shift system includes a moving bracket 4608 and a housing 4610 that are configured to hold one or more lenses. According to one embodiment, bimorph actuator circuit 4604 includes 8 to 12 SMA actuators, such as the SMA actuators described herein. The SMA actuators are configured to move the mobile carriage 4608 in 5 axes similar to other 5-axis systems described herein, such as in the x-direction, y-direction, z-direction, pitch, and roll.

圖47繪示根據一實施例之包含整合至此電路中用於所有運動之雙壓電晶片致動器之一SMA致動器。一SMA致動器之實施例可包含8個至12個雙壓電晶片致動器4606。然而,其他實施例可包含更多或更少。圖48繪示根據一實施例之包含整合至此電路中用於所有運動之雙壓電晶片致動器之一SMA致動器4802,其經部分形成以裝配於一對應外殼4804內部。圖49繪示根據一實施例之一5軸感測器移位系統之一橫截面。47 illustrates an SMA actuator including a bimorph actuator integrated into this circuit for all motions, according to one embodiment. Embodiments of an SMA actuator may include 8 to 12 bimorph actuators 4606 . However, other embodiments may contain more or less. 48 shows an SMA actuator 4802 including a bimorph actuator integrated into this circuit for all motions partially formed to fit inside a corresponding housing 4804, according to one embodiment. 49 illustrates a cross-section of a 5-axis sensor displacement system according to an embodiment.

圖50繪示包含雙壓電晶片致動器之根據一實施例之一SMA致動器5002。SMA致動器5002經組態以使用4側安裝之SMA雙壓電晶片致動器5004在x及y方向上移動一影像感測器、鏡頭或其他各種有效負載。圖51繪示包含在不同x及y位置中移動一影像感測器、鏡頭或其他各種有效負載之雙壓電晶片致動器之一SMA致動器之一俯視圖。FIG. 50 illustrates an SMA actuator 5002 according to an embodiment including a bimorph actuator. The SMA actuator 5002 is configured to move an image sensor, lens or other various payloads in the x and y directions using the 4 side mounted SMA bimorph actuator 5004. 51 shows a top view of an SMA actuator including a bimorph actuator that moves an image sensor, lens, or other various payloads in different x and y positions.

圖52繪示經組態為一盒式雙壓電晶片自動聚焦之根據一實施例之包含雙壓電晶片致動器5202之一SMA致動器。四個頂部及底部安裝之SMA雙壓電晶片致動器(諸如本文中所描述之SMA雙壓電晶片致動器)經組態以一起移動以在z行程方向上產生移動用於自動聚焦運動。圖53繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器,且其中兩個頂部安裝之雙壓電晶片致動器5302經組態以下推一或多個鏡頭。圖54繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器,且其中兩個底部安裝之雙壓電晶片致動器5402經組態以上推一或多個鏡頭。圖55繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器以展示四個頂部及底部安裝之SMA雙壓電晶片致動器5502 (諸如本文中所描述之SMA雙壓電晶片致動器)用於移動一或多個鏡頭以產生傾斜運動。Figure 52 illustrates an SMA actuator including a bimorph actuator 5202 according to one embodiment configured as a bimorph autofocus in a cassette. Four top- and bottom-mounted SMA bimorph actuators, such as the SMA bimorph actuators described herein, are configured to move together to produce movement in the z-travel direction for autofocus motion . 53 illustrates an SMA actuator including a bimorph actuator with two top mounted bimorph actuators 5302 configured to push down one or more lenses, according to an embodiment. 54 illustrates an SMA actuator including a bimorph actuator with two bottom mounted bimorph actuators 5402 configured to push one or more lenses above, according to one embodiment. 55 illustrates an SMA actuator including a bimorph actuator to demonstrate four top- and bottom-mounted SMA bimorph actuators 5502 (such as the SMA bimorph actuators described herein, according to one embodiment) Piezoelectric wafer actuators) are used to move one or more lenses to create a tilting motion.

圖56繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含經組態為一2軸鏡頭移位OIS之雙壓電晶片致動器。針對一些實施例,2軸鏡頭移位OIS經組態以在X/Y軸上移動一鏡頭。針對一些實施例,Z軸移動來自一單獨AF,諸如本文中所描述之AF。4個雙壓電晶片致動器推動自動聚焦之側用於OIS運動。圖57繪示根據一實施例之包含一SMA致動器5802之SMA系統之一分解圖,SMA致動器5802包含經組態為一2軸鏡頭移位OIS之雙壓電晶片致動器5806。圖58繪示根據一實施例之包含一SMA致動器5802之SMA系統之一橫截面,SMA致動器5802包含經組態為一2軸鏡頭移位OIS之雙壓電晶片致動器5806。圖59繪示用於一SMA系統中之根據一實施例之盒式雙壓電晶片致動器5802,其經組態為在其經塑形以裝配於系統中之前製造之一2軸鏡頭移位OIS。此一系統可經組態以具有高OIS行程OIS (例如,+/-200 um或更大)。此外,此等實施例經組態以具有使用諸如POM滑動軸承之4個滑動軸承之一寬運動範圍及良好OIS動態傾斜。實施例經組態以易於與AF設計(例如VCM或SMA)整合。56 illustrates an SMA system including an SMA actuator including a bimorph actuator configured as a 2-axis lens shift OIS, according to one embodiment. For some embodiments, the 2-axis lens shift OIS is configured to move a lens in the X/Y axis. For some embodiments, the Z-axis movement is from a separate AF, such as the AF described herein. 4 bimorph actuators push the autofocus side for OIS motion. 57 shows an exploded view of an SMA system including an SMA actuator 5802 including a bimorph actuator 5806 configured as a 2-axis lens shift OIS, according to one embodiment . 58 shows a cross-section of an SMA system including an SMA actuator 5802 including a bimorph actuator 5806 configured as a 2-axis lens shift OIS, according to one embodiment . Figure 59 shows a cassette bimorph actuator 5802 according to an embodiment for use in an SMA system configured to manufacture a 2-axis lens shift before it is shaped for assembly in the system Bit OIS. Such a system can be configured to have a high OIS stroke OIS (eg, +/- 200 um or more). Furthermore, these embodiments are configured to have a wide range of motion and good OIS dynamic tilt using one of 4 plain bearings such as POM plain bearings. Embodiments are configured for easy integration with AF designs such as VCM or SMA.

圖60繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含經組態為一5軸鏡頭移位OIS及自動聚焦之雙壓電晶片致動器。針對一些實施例,5軸鏡頭移位OIS及自動聚焦經組態以在X/Y/Z軸上移動一鏡頭。針對一些實施例,俯仰及偏航軸運動用於動態傾斜調諧能力。8個雙壓電晶片致動器用於使用本文中所描述之技術來提供自動聚焦及OIS之運動。圖61繪示根據一實施例之包含一SMA致動器6202之SMA系統之一分解圖,SMA致動器6202包含組態為一5軸鏡頭移位OIS及自動聚焦之根據一實施例之雙壓電晶片致動器6204。圖62繪示根據一實施例之包含一SMA致動器6202之SMA系統之一橫截面,SMA致動器6202包含經組態為一5軸鏡頭移位OIS及自動聚焦之雙壓電晶片致動器6204。圖63繪示用於一SMA系統中之根據一實施例之盒式雙壓電晶片致動器6202,其經組態為在其經塑形以裝配於系統中之前製造之一5軸鏡頭移位OIS及自動聚焦。此一系統可經組態以具有高OIS行程OIS (例如,+/-200 um或更大)及一高自動聚焦行程(例如,400 um或更大)。此外,此等實施例能夠不理任何傾斜且無需一單獨自動聚焦總成。60 illustrates an SMA system including an SMA actuator including a bimorph actuator configured as a 5-axis lens shift OIS and autofocus, according to one embodiment. For some embodiments, 5-axis lens shift OIS and autofocus are configured to move a lens in the X/Y/Z axis. For some embodiments, pitch and yaw axis motion is used for dynamic tilt tuning capabilities. Eight bimorph actuators were used to provide motion for autofocus and OIS using the techniques described herein. 61 depicts an exploded view of an SMA system including an SMA actuator 6202 including a dual according to an embodiment configured as a 5-axis lens shift OIS and autofocus, according to an embodiment Piezo wafer actuator 6204. 62 illustrates a cross-section of an SMA system including an SMA actuator 6202 including a bimorph actuator configured for a 5-axis lens shift OIS and autofocus, according to one embodiment Actuator 6204. Figure 63 shows a cassette bimorph actuator 6202 according to an embodiment for use in an SMA system configured to manufacture a 5-axis lens shift before it is shaped for assembly in the system Bit OIS and auto focus. Such a system can be configured to have a high OIS travel OIS (eg, +/- 200 um or greater) and a high autofocus travel (eg, 400 um or greater). Furthermore, these embodiments can ignore any tilt and do not require a separate autofocus assembly.

圖64繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含經組態為一外推盒之雙壓電晶片致動器。針對一些實施例,雙壓電晶片致動器總成經組態以纏繞諸如一鏡頭托架之一物件。由於電路總成隨鏡頭托架移動,因此一撓性部分用於低X/Y/Z勁度。電路之尾部墊係靜態的。外推盒可經組態用於4個或8個雙壓電晶片致動器兩者。因此,外推盒可經組態為在側上使OIS在X及Y軸上移動之一4雙壓電晶片致動器。外推盒可經組態為在頂部及底部上使自動聚焦在z軸上移動之一4雙壓電晶片致動器。外推盒可經組態為在頂部、底部及側上使OIS及自動聚焦在x、y及z軸上移動且能夠3軸傾斜(俯仰/翻滾/偏航)之一8雙壓電晶片致動器。圖65繪示根據一實施例之包含一SMA致動器6602之一SMA系統之一分解圖,SMA致動器6602包含經組態為一外推盒之雙壓電晶片致動器6604。因此,SMA致動器經組態使得雙壓電晶片致動器施加作用於外殼6504以使用本文中所描述之技術來移動鏡頭托架6506。圖66繪示根據一實施例之包含一SMA致動器6602之一SMA系統,SMA致動器6602包含組態為經部分塑形以接收一鏡頭托架6603之一外推盒之雙壓電晶片致動器。圖67繪示根據一實施例之包含一SMA致動器6602之一SMA系統,SMA致動器6602包含雙壓電晶片致動器6604,雙壓電晶片致動器6604經組態為在其經塑形以裝配於系統中之前製造之一外推盒。64 illustrates an SMA system including an SMA actuator including a bimorph actuator configured as an outsert box, according to one embodiment. For some embodiments, the bimorph actuator assembly is configured to wrap around an item such as a lens holder. Since the circuit assembly moves with the lens holder, a flexure is used for low X/Y/Z stiffness. The rear pads of the circuit are static. The push-out box can be configured for both 4 or 8 bimorph actuators. Thus, the push-out box can be configured as a 4 bimorph actuator on the side that moves the OIS in the X and Y axes. The push-out box can be configured with one 4 bimorph actuators on the top and bottom to move the autofocus in the z-axis. The push-out box can be configured to move the OIS and autofocus in the x, y, and z axes and be capable of 3-axis tilt (pitch/roll/yaw) on top, bottom, and sides with one of 8 bimorph actuators. actuator. 65 shows an exploded view of an SMA system including an SMA actuator 6602 including a bimorph actuator 6604 configured as an outsert box, according to one embodiment. Accordingly, the SMA actuator is configured such that a bimorph actuator is applied to the housing 6504 to move the lens carrier 6506 using the techniques described herein. 66 illustrates an SMA system including an SMA actuator 6602 that includes a bi-piezo configured to be partially shaped to receive an push-out box of a lens holder 6603, according to one embodiment wafer actuator. 67 illustrates an SMA system including an SMA actuator 6602 including a bimorph actuator 6604 configured to An outsert box that was fabricated prior to being shaped to fit in the system.

圖68繪示根據一實施例之包含一SMA致動器6802之一SMA系統,SMA致動器6802包含經組態為一3軸感測器移位OIS之雙壓電晶片致動器。針對一些實施例,z軸移動來自一單獨自動聚焦系統。4個雙壓電晶片致動器經組態以使用本文中所描述之技術來推動一感測器托架6804之側以提供OIS之運動。圖69繪示根據一實施例之包含一SMA致動器6802之SMA之一分解圖,SMA致動器6802包含經組態為一3軸感測器移位OIS之雙壓電晶片致動器。圖70繪示根據一實施例之包含一SMA致動器6802之SMA系統之一橫截面,SMA致動器6802包含經組態為一3軸感測器移位OIS之雙壓電晶片致動器6806。圖71繪示用於一SMA系統中之根據一實施例之一盒式雙壓電晶片致動器6802組件,其經組態為在其經塑形以裝配於系統中之前製造之一3軸感測器移位OIS。圖72繪示根據一實施例之用於一SMA系統中之一撓性感測器電路,其經組態為一3軸感測器移位OIS。此一系統可經組態以具有高OIS行程OIS (例如,+/-200 um或更大)及一高自動聚焦行程(例如,400 um或更大)。此外,此等實施例經組態以具有使用諸如POM滑動軸承之4個滑動軸承之一寬2軸運動範圍及良好OIS動態傾斜。實施例經組態以易於與AF設計(例如VCM或SMA)整合。68 illustrates an SMA system including an SMA actuator 6802 including a bimorph actuator configured as a 3-axis sensor displacement OIS, according to one embodiment. For some embodiments, the z-axis movement is from a separate autofocus system. Four bimorph actuators are configured to push the sides of a sensor carrier 6804 to provide movement of the OIS using the techniques described herein. 69 shows an exploded view of an SMA including an SMA actuator 6802 including a bimorph actuator configured as a 3-axis sensor displacement OIS, according to one embodiment . 70 depicts a cross-section of an SMA system including an SMA actuator 6802 including a bimorph actuation configured as a 3-axis sensor displacement OIS, according to one embodiment device 6806. Figure 71 shows a cassette bimorph actuator 6802 assembly according to an embodiment for use in an SMA system configured to manufacture a 3-axis before it is shaped for assembly in the system The sensor shifts OIS. 72 illustrates a flex sensor circuit for use in an SMA system configured as a 3-axis sensor shift OIS, according to an embodiment. Such a system can be configured to have a high OIS travel OIS (eg, +/- 200 um or greater) and a high autofocus travel (eg, 400 um or greater). Furthermore, these embodiments are configured to have a wide 2-axis range of motion and good OIS dynamic tilt using one of 4 plain bearings such as POM plain bearings. Embodiments are configured for easy integration with AF designs such as VCM or SMA.

圖73繪示根據一實施例之包含一SMA致動器7302之一SMA系統,SMA致動器7302包含經組態為一6軸感測器移位OIS及自動聚焦之雙壓電晶片致動器7304。針對一些實施例,6軸感測器移位OIS及自動聚焦經組態以在X/Y/Z/俯仰/偏航/翻滾軸上移動一鏡頭。針對一些實施例,俯仰及偏航軸運動用於動態傾斜調諧能力。8個雙壓電晶片致動器用於使用本文中所描述之技術來提供自動聚焦及OIS之運動。圖74繪示根據一實施例之包含一SMA致動器7402之SMA系統之一分解圖,SMA致動器7402包含經組態為一6軸感測器移位OIS及自動聚焦之雙壓電晶片致動器7404。圖75繪示根據一實施例之包含一SMA致動器7402之SMA系統之一橫截面,SMA致動器7402包含經組態為一6軸感測器移位OIS及自動聚焦之雙壓電晶片致動器。圖76繪示用於一SMA系統中之根據一實施例之盒式雙壓電晶片致動器7402,其經組態為在其經塑形以裝配於系統中之前製造之一6軸感測器移位OIS及自動聚焦。圖77繪示根據一實施例之用於一SMA系統中之一撓性感測器電路,其經組態為一3軸感測器移位OIS。此一系統可經組態為具有高OIS行程OIS (例如,+/-200 um或更大)及一高自動聚焦行程(例如,400 um或更大)。此外,此等實施例能夠不理任何傾斜且無需一單獨自動聚焦總成。73 illustrates an SMA system including an SMA actuator 7302 including bimorph actuation configured as a 6-axis sensor shift OIS and autofocus, according to one embodiment device 7304. For some embodiments, the 6-axis sensor shift OIS and autofocus are configured to move a lens in the X/Y/Z/pitch/yaw/roll axes. For some embodiments, pitch and yaw axis motion is used for dynamic tilt tuning capabilities. Eight bimorph actuators were used to provide motion for autofocus and OIS using the techniques described herein. 74 shows an exploded view of an SMA system including an SMA actuator 7402 including bi-piezo configured as a 6-axis sensor displacement OIS and autofocus, according to one embodiment Wafer Actuator 7404. 75 depicts a cross-section of an SMA system including an SMA actuator 7402 including bi-piezo configured as a 6-axis sensor displacement OIS and autofocus, according to one embodiment wafer actuator. Figure 76 shows a cassette bimorph actuator 7402 according to an embodiment for use in an SMA system configured to manufacture a 6-axis sensing before it is shaped for assembly in the system Shifter shift OIS and auto focus. 77 illustrates a flex sensor circuit for use in an SMA system configured as a 3-axis sensor displacement OIS, according to an embodiment. Such a system can be configured with a high OIS travel OIS (eg, +/- 200 um or greater) and a high autofocus travel (eg, 400 um or greater). Furthermore, these embodiments can ignore any tilt and do not require a separate autofocus assembly.

圖78繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含經組態為一2軸攝影機傾斜OIS之雙壓電晶片致動器。針對一些實施例,2軸攝影機傾斜OIS經組態以在俯仰/偏航軸上移動一攝影機。4個雙壓電晶片致動器用於使用本文中所描述之技術來推動自動聚焦之頂部及底部用於OIS俯仰及偏航運動之整個攝影機運動。圖79繪示根據一實施例之包含一SMA致動器7902之SMA系統之一分解圖,SMA致動器7902包含經組態為2軸攝影機傾斜OIS之雙壓電晶片致動器7904。圖80繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含經組態為一2軸攝影機傾斜OIS之雙壓電晶片致動器。圖81繪示用於一SMA系統中之根據一實施例之盒式雙壓電晶片致動器,其經組態為在其經塑形以裝配於系統中之前製造之一2軸攝影機傾斜OIS。圖82繪示根據一實施例之用於一SMA系統中之一撓性感測器電路,其經組態為一2軸攝影機傾斜OIS。此一系統可經組態以具有高OIS行程OIS (例如,+/-3度或更大)。實施例經組態以易於與自動聚焦(「AF」)設計(例如VCM或SMA)整合。78 illustrates an SMA system including an SMA actuator including a bimorph actuator configured as a 2-axis camera tilt OIS, according to one embodiment. For some embodiments, the 2-axis camera tilt OIS is configured to move a camera in the pitch/yaw axis. Four bimorph actuators were used to drive the top and bottom of the autofocus for the entire camera motion of the OIS pitch and yaw motion using the techniques described herein. 79 shows an exploded view of an SMA system including an SMA actuator 7902 including a bimorph actuator 7904 configured as a 2-axis camera tilt OIS, according to one embodiment. 80 illustrates a cross-section of an SMA system including an SMA actuator including a bimorph actuator configured as a 2-axis camera tilt OIS, according to one embodiment. 81 depicts a cassette bimorph actuator according to an embodiment for use in an SMA system configured to manufacture a 2-axis camera tilt OIS before it is shaped for assembly in the system . 82 illustrates a flex sensor circuit for use in an SMA system configured for a 2-axis camera tilt OIS, according to one embodiment. Such a system can be configured to have high OIS travel OIS (eg, +/- 3 degrees or more). Embodiments are configured for easy integration with autofocus ("AF") designs such as VCM or SMA.

圖83繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含經組態為一3軸攝影機傾斜OIS之雙壓電晶片致動器。針對一些實施例,2軸攝影機傾斜OIS經組態以在俯仰/偏航/翻滾軸上移動一攝影機。4個雙壓電晶片致動器用於使用本文中所描述之技術來推動自動聚焦之頂部及底部用於OIS俯仰及偏航運動之整個攝影機運動,且4個雙壓電晶片致動器用於使用本文中所描述之技術來推動自動聚焦之側用於OIS翻滾運動之整個攝影機運動。圖84繪示根據一實施例之包含一SMA致動器8402之SMA系統之一分解圖,SMA致動器8402包含經組態為3軸攝影機傾斜OIS之雙壓電晶片致動器8404。圖85繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含經組態為一3軸攝影機傾斜OIS之雙壓電晶片致動器。圖86繪示根據一實施例之用於一SMA系統中之盒式雙壓電晶片致動器,其經組態為在其經塑形以裝配於系統中之前製造之一3軸攝影機傾斜OIS。圖87繪示根據一實施例之用於一SMA系統中之一撓性感測器電路,其經組態為一3軸攝影機傾斜OIS。此一系統可經組態以具有高OIS行程OIS (例如,+/-3度或更大)。實施例經組態以易於與AF設計(例如VCM或SMA)整合。83 illustrates an SMA system including an SMA actuator including a bimorph actuator configured as a 3-axis camera tilt OIS, according to one embodiment. For some embodiments, the 2-axis camera tilt OIS is configured to move a camera in the pitch/yaw/roll axis. 4 bimorph actuators were used to drive the top and bottom of the autofocus for the entire camera motion of the OIS pitch and yaw motion using the techniques described herein, and 4 bimorph actuators were used to use The techniques described herein drive the entire camera motion on the side of autofocus for the OIS tumbling motion. 84 shows an exploded view of an SMA system including an SMA actuator 8402 including a bimorph actuator 8404 configured as a 3-axis camera tilt OIS, according to one embodiment. 85 illustrates a cross-section of an SMA system including an SMA actuator including a bimorph actuator configured as a 3-axis camera tilt OIS, according to one embodiment. 86 illustrates a cassette bimorph actuator for use in an SMA system configured to manufacture a 3-axis camera tilt OIS before it is shaped for assembly in the system, according to an embodiment . 87 illustrates a flex sensor circuit for use in an SMA system configured for a 3-axis camera tilt OIS, according to an embodiment. Such a system can be configured to have high OIS travel OIS (eg, +/- 3 degrees or more). Embodiments are configured for easy integration with AF designs such as VCM or SMA.

圖88繪示根據實施例之一SMA致動器之一雙壓電晶片致動器之例示性尺寸。尺寸係較佳實施例,但熟習技術者應瞭解,可基於一SMA致動器之所要特性來使用其他尺寸。88 shows exemplary dimensions of a bimorph actuator for an SMA actuator according to an embodiment. Dimensions are the preferred embodiment, but those skilled in the art will appreciate that other dimensions may be used based on the desired characteristics of an SMA actuator.

圖89繪示根據一實施例之一雙壓電晶片致動器8980之一第一視圖。雙壓電晶片致動器8980包含一導電金屬基底層8934 (例如不鏽鋼層)及一介電層8939。所繪示之雙壓電晶片致動器8980實現比傳統設計減少之一層計數組態。此減少層計數提高製造效率且減少原材料之成本。89 shows a first view of a bimorph actuator 8980 according to an embodiment. The bimorph actuator 8980 includes a conductive metal base layer 8934 (eg, a stainless steel layer) and a dielectric layer 8939. The bimorph actuator 8980 shown achieves a layer count configuration that is reduced by one over conventional designs. This reduction in layer count increases manufacturing efficiency and reduces the cost of raw materials.

為了本發明,第一視圖係雙壓電晶片致動器8980之介電側之一視圖。雙壓電晶片致動器8980包含至少一個自由端(本文中亦指稱一「未固定端」);本文中繪示兩個自由端8908、8910。雙壓電晶片致動器8980包含一固定端8930。自由端8910藉由一雙壓電晶片臂8921連接至固定端8930。自由端8908藉由一雙壓電晶片臂8923連接至固定端8930。For the purposes of the present invention, the first view is one of the dielectric side of the bimorph actuator 8980. The bimorph actuator 8980 includes at least one free end (also referred to herein as an "unsecured end"); two free ends 8908, 8910 are depicted herein. The bimorph actuator 8980 includes a fixed end 8930. The free end 8910 is connected to the fixed end 8930 by a bimorph arm 8921. The free end 8908 is connected to the fixed end 8930 by a bimorph arm 8923.

根據一些實施例,自由端8908包含一負載點,其包含自一舌片8907延伸之一接觸構件8912。根據一些實施例,舌片8907主要由不鏽鋼組成。類似地,根據一些實施例,自由端8910包含一負載點,其包含自一舌片8911延伸之一接觸構件8909。接觸構件8912亦可包含諸如不鏽鋼之一接觸材料。接觸構件8912經組態以與任何組件(例如一鏡頭托架或其他物件)接合。在此組態中,雙壓電晶片致動器8980經組態以在被致動時在一z方向上移動且在z方向上提升一物件(諸如一鏡頭托架)。According to some embodiments, the free end 8908 includes a load point including a contact member 8912 extending from a tongue 8907. According to some embodiments, the tongue 8907 consists essentially of stainless steel. Similarly, according to some embodiments, the free end 8910 includes a load point including a contact member 8909 extending from a tongue 8911. Contact member 8912 may also comprise a contact material such as stainless steel. Contact member 8912 is configured to engage with any component, such as a lens mount or other item. In this configuration, the bimorph actuator 8980 is configured to move in a z-direction and lift an object (such as a lens holder) in the z-direction when actuated.

根據一些實施例,雙壓電晶片臂8921包含一或多個SMA材料,諸如一SMA帶或SMA線(例如,如本文中所描述之SMA帶或SMA線)。根據一些實施例,SMA材料使用包含本文中所描述之技術的技術來附裝至雙壓電晶片臂8921。根據一些實施例,SMA材料使用黏著膜材料、環氧樹脂或其他附接技術來附裝至橫桿8921。雙壓電晶片臂8921亦包含一導電金屬基底材料8934且視情況包含一介電層8926。類似地,第二雙壓電晶片臂8923包含一導電金屬基底層且視情況包含一介電層8924。導電金屬基底層8934可由包含(但不限於)不鏽鋼、銅、銅合金、金、鎳、其他導電材料及其等之組合之導電金屬形成。According to some embodiments, the bimorph arm 8921 includes one or more SMA materials, such as an SMA tape or SMA wire (eg, as described herein). According to some embodiments, the SMA material is attached to the bimorph arm 8921 using techniques including those described herein. According to some embodiments, the SMA material is attached to the rail 8921 using an adhesive film material, epoxy, or other attachment techniques. The bimorph arm 8921 also includes a conductive metal base material 8934 and optionally a dielectric layer 8926. Similarly, the second bimorph arm 8923 includes a conductive metal base layer and optionally a dielectric layer 8924. The conductive metal base layer 8934 may be formed of conductive metals including, but not limited to, stainless steel, copper, copper alloys, gold, nickel, other conductive materials, and combinations thereof.

針對一些實施例,雙壓電晶片臂經組態為一橫桿,諸如本文中所描述之橫桿。例如,導電金屬基底層8934採用呈橫桿之形狀之一不鏽鋼基底之形式,其包含本文中所描述之橫桿,自固定端8930延伸以形成自由端8908、8910。介電層8926沿第一雙壓電晶片臂8921之導電金屬基底層8934延伸。根據一些實施例,SMA材料在介電層8926上自一第一SMA接點8987延伸至舌片8907。SMA材料使用包含本文中所描述之技術的技術來附裝至第一SMA接點8987及舌片8911。且SMA材料在介電層8924上自一第二SMA接點8988延伸至舌片8907。SMA材料使用包含本文中所描述之技術的技術來附裝至第二SMA接點8988及舌片8907。針對一些實施例,一介電層亦可安置於SMA材料上。介電層使SMA材料與導電金屬基底層及其他導電組件電隔離。For some embodiments, the bimorph arm is configured as a crossbar, such as the one described herein. For example, the conductive metal base layer 8934 takes the form of a stainless steel base in the shape of a rail, including the rails described herein, extending from the fixed end 8930 to form the free ends 8908, 8910. The dielectric layer 8926 extends along the conductive metal base layer 8934 of the first bimorph arm 8921. According to some embodiments, the SMA material extends over the dielectric layer 8926 from a first SMA contact 8987 to the tongue 8907. The SMA material is attached to the first SMA contact 8987 and tongue 8911 using techniques including those described herein. And the SMA material extends from a second SMA contact 8988 to the tongue 8907 on the dielectric layer 8924. The SMA material is attached to the second SMA contact 8988 and tongue 8907 using techniques including those described herein. For some embodiments, a dielectric layer may also be disposed on the SMA material. The dielectric layer electrically isolates the SMA material from the conductive metal base layer and other conductive components.

固定端8930包含一第一接觸墊8935及一第二接觸墊8932。第一接觸墊8935透過一第一SMA接點8987與第一雙壓電晶片臂8921之SMA材料電及機械耦合。第一接觸墊8935經組態以與SMA材料之一電流供應器耦合以致動第一雙壓電晶片臂8921,如本文中所描述。類似地,第二接觸墊8932透過一第二SMA接點8988與第二雙壓電晶片臂8923之SMA材料電及機械耦合。第二接觸墊8932經組態以與SMA材料之一電流供應器耦合以致動第二雙壓電晶片臂8923,如本文中所描述。根據本發明之各種實例,第一接觸墊8935及第二接觸墊8932係鍍金不鏽鋼墊。固定端8930亦包含經組態以接收一固定元件以將雙壓電晶片致動器8980安裝至一基底之一孔隙8936。雙壓電晶片致動器8980之固定端8930包含介電層8939及導電金屬基底層8934。The fixed end 8930 includes a first contact pad 8935 and a second contact pad 8932 . The first contact pad 8935 is electrically and mechanically coupled to the SMA material of the first bimorph arm 8921 through a first SMA contact 8987. The first contact pad 8935 is configured to couple with a current supply of SMA material to actuate the first bimorph arm 8921, as described herein. Similarly, the second contact pad 8932 is electrically and mechanically coupled to the SMA material of the second bimorph arm 8923 through a second SMA contact 8988. The second contact pad 8932 is configured to couple with a current supply of SMA material to actuate the second bimorph arm 8923, as described herein. According to various examples of the present invention, the first contact pad 8935 and the second contact pad 8932 are gold plated stainless steel pads. The securing end 8930 also includes an aperture 8936 configured to receive a securing element for mounting the bimorph actuator 8980 to a substrate. The fixed end 8930 of the bimorph actuator 8980 includes a dielectric layer 8939 and a conductive metal base layer 8934.

圖90繪示根據實施例之一雙壓電晶片致動器8980之一第二視圖。雙壓電晶片致動器8980包含一導電金屬基底層8934。雙壓電晶片致動器8980包含分別藉由雙壓電晶片臂8921、8923自固定端8930延伸之兩個自由端8910、8908。根據一些實施例,兩個自由端8910、8908、雙壓電晶片臂8921、8923及固定端8930之一部分由一單一導電金屬基底層8906組成。90 illustrates a second view of a bimorph actuator 8980 according to an embodiment. The bimorph actuator 8980 includes a conductive metal base layer 8934. The bimorph actuator 8980 includes two free ends 8910, 8908 extending from the fixed end 8930 by bimorph arms 8921, 8923, respectively. According to some embodiments, the two free ends 8910 , 8908 , the bimorph arms 8921 , 8923 and a portion of the fixed end 8930 are composed of a single conductive metal base layer 8906 .

固定端8930亦包含一第一導電金屬基底元件8931、一第二導電金屬基底元件8933及一共同導電金屬基底層8906。第一導電金屬基底元件8931、第二導電金屬基底元件8933及共同導電金屬基底層8906可在固定端8930上由介電層8939界定之間隙分離。在一些實施例中,間隙可為暴露安裝至第一導電金屬基底元件8931、第二導電金屬基底元件8933及共同導電金屬基底層8906之介電層8939之部分或完全蝕刻間隙。一焊舌或一部分蝕刻特徵可應用於固定端8930或自由端8910、8908。The fixed end 8930 also includes a first conductive metal base element 8931 , a second conductive metal base element 8933 and a common conductive metal base layer 8906 . The first conductive metal base element 8931 , the second conductive metal base element 8933 , and the common conductive metal base layer 8906 may be separated on the fixed end 8930 by a gap defined by the dielectric layer 8939 . In some embodiments, the gap may be a partially or fully etched gap that exposes the dielectric layer 8939 mounted to the first conductive metal base element 8931, the second conductive metal base element 8933, and the common conductive metal base layer 8906. A solder tongue or a portion of the etched feature can be applied to the fixed end 8930 or the free ends 8910, 8908.

第一導電金屬基底元件8931及第二導電金屬基底元件8933經電隔離以產生至SMA材料之電路徑。此將在下文更詳細描述。共同導電金屬基底層8906經組態以實現一雙壓電晶片致動器8980總成及應用之剛性。在一些實例中,第一接觸墊(圖89中展示為參考元件符號8935)可為鍍於第一導電金屬基底元件8931上之一金墊。類似地,第二接觸墊(圖89中展示為參考元件符號8932)可為鍍於第二導電金屬基底元件8933上之一金墊。The first conductive metal base element 8931 and the second conductive metal base element 8933 are electrically isolated to create an electrical path to the SMA material. This will be described in more detail below. Common conductive metal base layer 8906 is configured to achieve rigidity for a bimorph actuator 8980 assembly and application. In some examples, the first contact pad (shown in FIG. 89 as reference element symbol 8935 ) can be a gold pad plated on the first conductive metal base element 8931. Similarly, the second contact pad (shown in FIG. 89 as reference element 8932 ) may be a gold pad plated on the second conductive metal base element 8933 .

圖91繪示根據實施例之一雙壓電晶片致動器8990之一透視圖。第一導電金屬基底元件8931及第二導電金屬基底元件8933由該介電層8939之一介電間隙電分離。91 shows a perspective view of a bimorph actuator 8990 according to an embodiment. The first conductive metal base element 8931 and the second conductive metal base element 8933 are electrically separated by a dielectric gap of the dielectric layer 8939.

第一接觸墊8935經組態以與一電源供應器電耦合。第一接觸墊8935電及機械連接至第一導電金屬基底元件8931。第一導電金屬基底元件8931電及機械連接至一第一接點8937,第一接點8937經組態以連接至第一雙壓電晶片臂8921之SMA材料8925。換言之,第一導電金屬基底元件8931經組態以充當至第一雙壓電晶片臂8921之SMA材料8925之一電通路。The first contact pad 8935 is configured to be electrically coupled with a power supply. The first contact pad 8935 is electrically and mechanically connected to the first conductive metal base element 8931. The first conductive metal base element 8931 is electrically and mechanically connected to a first contact 8937 that is configured to connect to the SMA material 8925 of the first bimorph arm 8921. In other words, the first conductive metal base element 8931 is configured to act as an electrical path to the SMA material 8925 of the first bimorph arm 8921.

SMA材料8925歸因於一電流而升溫且SMA材料8925之一長度因此收縮。SMA材料8925之收縮將自由端8910提升至固定端8930上方之一平面以在程序中有效升高第一雙壓電晶片臂8921。The SMA material 8925 heats up due to an electrical current and a length of the SMA material 8925 shrinks accordingly. The contraction of the SMA material 8925 lifts the free end 8910 to a plane above the fixed end 8930 to effectively lift the first bimorph arm 8921 during the procedure.

類似地,第二接觸墊8932經組態以與一電源供應器電耦合。第二接觸墊8932電及機械連接至第二導電金屬基底元件8933。第二導電金屬基底元件8933亦電及機械連接至一第二接觸元件8938,第二接觸元件8938連接至第二雙壓電晶片臂8923之SMA材料8922。換言之,第二導電金屬基底元件8933經組態以充當至第二雙壓電晶片臂8923之SMA材料8922之一電通路。Similarly, the second contact pad 8932 is configured to be electrically coupled with a power supply. The second contact pad 8932 is electrically and mechanically connected to the second conductive metal base element 8933. The second conductive metal base element 8933 is also electrically and mechanically connected to a second contact element 8938 which is connected to the SMA material 8922 of the second bimorph arm 8923. In other words, the second conductive metal base element 8933 is configured to act as an electrical path to the SMA material 8922 of the second bimorph arm 8923.

SMA材料8922歸因於一電流而升溫且SMA材料8922之一長度因此收縮。SMA材料8922之收縮將自由端8908提升至固定端8930上方之一平面以在程序中有效升高第一雙壓電晶片臂8921。The SMA material 8922 heats up due to an electrical current and a length of the SMA material 8922 shrinks accordingly. The contraction of the SMA material 8922 lifts the free end 8908 to a plane above the fixed end 8930 to effectively lift the first bimorph arm 8921 during the procedure.

圖92繪示根據實施例之例示性雙壓電晶片致動器8990中之SMA材料8925及8922。92 depicts SMA materials 8925 and 8922 in an exemplary bimorph actuator 8990, according to an embodiment.

SMA材料8925電耦合至固定端8930之第一導電金屬基底元件8931。SMA材料8925亦電耦合至自由端8910之舌片8907之導電金屬基底層。根據一些實施例,SMA材料8922及SMA材料8925串聯連接。電流在固定端處流入至共同導電金屬基底層8906中,在方向8995上通過第一雙壓電晶片臂8921而至舌片8911之導電金屬基底。電流在方向8997上經由SMA材料8925流動至第一導電金屬基底元件8931,且在方向8993上朝向第一接觸墊8935。The SMA material 8925 is electrically coupled to the first conductive metal base element 8931 of the fixed end 8930. The SMA material 8925 is also electrically coupled to the conductive metal base layer of the tongue 8907 of the free end 8910. According to some embodiments, the SMA material 8922 and the SMA material 8925 are connected in series. Current flows into the common conductive metal base layer 8906 at the fixed end, through the first bimorph arm 8921 in direction 8995 to the conductive metal base of the tongue 8911. Current flows through the SMA material 8925 to the first conductive metal base element 8931 in direction 8997 and toward the first contact pad 8935 in direction 8993.

SMA材料8922電耦合至固定端8930之第二導電金屬基底元件8933。SMA材料8922亦電耦合至自由端8908之舌片8907之導電金屬基底。電流在固定端處在方向8991上流入至第二接觸墊8932中且透過第二導電金屬基底元件8933而至SMA材料8922。電流流動通過SMA材料8922而至舌片8911之導電金屬基底。電流在方向8994上自舌片8911流動通過第二雙壓電晶片臂8923而至共同導電金屬基底層8906。電流在方向8992上經由SMA材料8922流動至舌片8911之導電金屬基底,且在方向8991上朝向第二接觸墊8932。The SMA material 8922 is electrically coupled to the second conductive metal base element 8933 of the fixed end 8930. The SMA material 8922 is also electrically coupled to the conductive metal base of the tongue 8907 of the free end 8908. Current flows into the second contact pad 8932 at the fixed end in direction 8991 and through the second conductive metal base element 8933 to the SMA material 8922. Current flows through the SMA material 8922 to the conductive metal base of the tongue 8911. Current flows in direction 8994 from tongue 8911 through second bimorph arm 8923 to common conductive metal base layer 8906. Current flows in direction 8992 through SMA material 8922 to the conductive metal base of tongue 8911 and in direction 8991 towards second contact pad 8932.

根據實施例,共同導電金屬基底層8906沿SMA材料之整個長度緊密接近SMA材料8922及8925 (諸如一SMA線)在電流關斷(即,雙壓電晶片致動器解除致動)時提供更快線冷卻。結果係一更快線解除致動及致動器回應時間。改良SMA線或帶之熱分佈。例如,熱分佈更均勻,使得一更高總電流可可靠地傳遞至線。According to an embodiment, the common conductive metal base layer 8906 is in close proximity to the SMA materials 8922 and 8925 (such as an SMA wire) along the entire length of the SMA material to provide greater stability when the current is turned off (ie, the bimorph actuator is deactivated). Fast line cooling. The result is a faster wire deactivation and actuator response time. Improved heat distribution of SMA wire or tape. For example, the heat distribution is more uniform so that a higher total current can be reliably delivered to the wire.

圖93繪示根據實施例之一例示性雙壓電晶片致動器9310之電流流動路徑。雙壓電晶片致動器9310包含一第一雙壓電晶片臂9321,其包含一或多個SMA材料9325,諸如一SMA帶或SMA線。SMA材料9325可附裝至第一雙壓電晶片臂9321之一橫桿。第一雙壓電晶片臂9321亦可包含一導電金屬基底層且視情況包含一介電層。93 depicts the current flow path of an exemplary bimorph actuator 9310 according to an embodiment. The bimorph actuator 9310 includes a first bimorph arm 9321 that includes one or more SMA materials 9325, such as an SMA tape or SMA wire. The SMA material 9325 can be attached to one of the crossbars of the first bimorph arm 9321. The first bimorph arm 9321 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9325電耦合至一固定端9330之一第一導電金屬基底元件9337。SMA材料9325亦電耦合至自由端9312之舌片9311之一導電金屬基底層。電流在方向9301上在固定端處流入至第一導電金屬基底元件9337中。SMA材料9325電耦合至舌片9311之導電金屬基底提供電路在方向9303上之一返回路徑。電流在方向9305上自第一雙壓電晶片臂9321流入單一導電金屬基底層中。The SMA material 9325 is electrically coupled to a first conductive metal base element 9337 at a fixed end 9330. The SMA material 9325 is also electrically coupled to a conductive metal base layer of the tongue 9311 of the free end 9312. Current flows in the direction 9301 into the first conductive metal base element 9337 at the fixed end. The SMA material 9325 is electrically coupled to the conductive metal base of the tongue 9311 to provide a return path for the circuit in direction 9303. Current flows in direction 9305 from the first bimorph arm 9321 into the single conductive metal base layer.

雙壓電晶片致動器9310包含一第二雙壓電晶片臂9323,其包含一或多個SMA材料9327,諸如一SMA帶或SMA線。SMA材料9327可附裝至第二雙壓電晶片臂9323之一橫桿。第二雙壓電晶片臂9323亦可包含一導電金屬基底層且視情況包含一介電層。The bimorph actuator 9310 includes a second bimorph arm 9323 that includes one or more SMA materials 9327, such as an SMA tape or SMA wire. SMA material 9327 can be attached to one of the crossbars of the second bimorph arm 9323. The second bimorph arm 9323 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9327電耦合至固定端9330之一第二導電金屬基底元件9338。SMA材料9327亦電耦合至自由端9312之舌片9313之一導電金屬基底層。電流在方向9307上在固定端處自共同導電金屬基底層9338流入至SMA材料9327中。SMA材料9327電耦合至舌片9313之導電金屬基底提供電路在方向9309上之一返回路徑。當一些實例繪示兩個未固定負載點端時,各點端連接至一各自雙壓電晶片臂。本發明亦提供附接至一個以上雙壓電晶片臂之一單一未固定負載點端。The SMA material 9327 is electrically coupled to a second conductive metal base element 9338 of the fixed end 9330. The SMA material 9327 is also electrically coupled to a conductive metal base layer of the tongue 9313 of the free end 9312. Current flows from the common conductive metal base layer 9338 into the SMA material 9327 at the fixed end in the direction 9307. The SMA material 9327 is electrically coupled to the conductive metal base of the tongue 9313 to provide a return path for the circuit in direction 9309. While some examples show two unfixed load point terminals, each point terminal is connected to a respective bimorph arm. The present invention also provides a single unsecured point-of-load end attached to more than one bimorph arm.

圖94繪示根據實施例之包含一單一未固定負載點端9410之一例示性雙壓電晶片致動器9400。單一未固定負載點端9410可包含自舌片9411之一導電金屬基底層延伸之接觸構件9408及9409。接觸構件9408及9409經組態以與一組件(例如一鏡頭托架)接合。雙壓電晶片致動器9400包含一第一雙壓電晶片臂9421,其包含一或多個SMA材料9425,諸如一SMA帶或SMA線。SMA材料9425可附裝至第一雙壓電晶片臂9421之一橫桿。第一雙壓電晶片臂9421亦可包含一導電金屬基底層且視情況包含一介電層。94 shows an exemplary bimorph actuator 9400 including a single unsecured point-of-load end 9410, according to an embodiment. The single unsecured point-of-load end 9410 may include contact members 9408 and 9409 extending from a conductive metal base layer of the tongue 9411 . Contact members 9408 and 9409 are configured to engage with a component, such as a lens holder. The bimorph actuator 9400 includes a first bimorph arm 9421 that includes one or more SMA materials 9425, such as an SMA tape or SMA wire. SMA material 9425 can be attached to one of the crossbars of the first bimorph arm 9421. The first bimorph arm 9421 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9425可電耦合至一固定端之一導電金屬基底元件,如相對於圖93所討論。SMA材料9425亦電耦合至單一未固定負載點端9410之舌片9411之一導電金屬基底層。雙壓電晶片致動器9400亦可包含一第二雙壓電晶片臂9423,其包含一或多個SMA材料9422,諸如一SMA帶或SMA線。SMA材料9422可附裝至第二雙壓電晶片臂9423之一橫桿。第二雙壓電晶片臂9423亦可包含一導電金屬基底層且視情況包含一介電層。The SMA material 9425 can be electrically coupled to a conductive metal base element at a fixed end, as discussed with respect to FIG. 93 . The SMA material 9425 is also electrically coupled to a conductive metal base layer of the tongue 9411 of the single unsecured point-of-load terminal 9410. The bimorph actuator 9400 may also include a second bimorph arm 9423 that includes one or more SMA materials 9422, such as an SMA tape or SMA wire. The SMA material 9422 can be attached to one of the crossbars of the second bimorph arm 9423. The second bimorph arm 9423 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9425及SMA材料9422可電耦合至單一未固定負載點端9410之導電金屬基底元件9411。電流在方向9401上在固定端處自一共同導電金屬基底層流入至SMA材料9425中。SMA材料9425電耦合至單一未固定負載點端9410之導電金屬基底元件9411提供電路在方向9402上進入SMA材料9422之一返回路徑。電流在方向9403上自導電基底元件9411流動通過SMA材料9422而在固定端處至一共同導電金屬基底層。The SMA material 9425 and the SMA material 9422 can be electrically coupled to the conductive metal base element 9411 of the single unsecured point-of-load terminal 9410. Current flows in direction 9401 into the SMA material 9425 from a common conductive metal base layer at the fixed end. The SMA material 9425 is electrically coupled to the conductive metal base element 9411 of the single unsecured point-of-load terminal 9410 to provide a return path for the circuit in direction 9402 into the SMA material 9422. Current flows in direction 9403 from conductive base element 9411 through SMA material 9422 to a common conductive metal base layer at the fixed end.

在此實例中,單一未固定負載點端9410消除對具有一導電金屬基底元件9411之替代電流流動路徑之顧慮。單一未固定負載點端9410亦實現用於導電金屬基底元件9411之更大覆蓋區以提供更平坦表面後蝕刻。例示性雙壓電晶片致動器9400汲取比先前實例減少之一電力,因為更短電路徑改良電阻路徑。單一未固定負載點端9410亦實現併入不同大小及形狀之一負載點結構之設計。In this example, a single unfixed point-of-load terminal 9410 eliminates concerns about an alternate current flow path with a conductive metal base element 9411. The single unfixed point-of-load terminal 9410 also enables a larger footprint for the conductive metal base element 9411 to provide a flatter surface post-etch. The exemplary bimorph actuator 9400 draws one less power than the previous example because the shorter electrical path improves the resistive path. A single unsecured point-of-load end 9410 also enables designs that incorporate point-of-load structures of different sizes and shapes.

圖95繪示根據實施例之包含一單一未固定負載點端9510之一例示性雙壓電晶片致動器9500。單一未固定負載點端9510可包含自舌片9511之一導電金屬基底層延伸之一負載點元件9512。負載點元件9512經組態以與一組件(例如一鏡頭托架)接合。負載點元件9512可由與舌片9511之導電金屬基底層組合之任何材料組成以在負載點元件9512與一組件之接合有效載荷之間實現一低摩擦界面。在一些實例中,負載點可主要由不鏽鋼組成。95 shows an exemplary bimorph actuator 9500 including a single unsecured point-of-load end 9510, according to an embodiment. The single unsecured point-of-load end 9510 may include a point-of-load element 9512 extending from a conductive metal base layer of the tongue 9511. The point-of-load element 9512 is configured to engage with a component, such as a lens mount. The point of load element 9512 may be composed of any material combined with the conductive metal base layer of the tongue 9511 to achieve a low friction interface between the point of load element 9512 and the engaged payload of a component. In some instances, the load point may consist primarily of stainless steel.

雙壓電晶片致動器9500包含一第一雙壓電晶片臂9521,其包含一或多個SMA材料9525,諸如一SMA帶或SMA線。SMA材料9525可附裝至第一雙壓電晶片臂9521之一橫桿。第一雙壓電晶片臂9521亦可包含一導電金屬基底層且視情況包含一介電層。The bimorph actuator 9500 includes a first bimorph arm 9521 that includes one or more SMA materials 9525, such as an SMA tape or SMA wire. SMA material 9525 can be attached to one of the crossbars of the first bimorph arm 9521. The first bimorph arm 9521 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9525電耦合至一固定端之一導電金屬基底元件,如相對於圖93所討論。SMA材料9525亦電耦合至單一未固定負載點端9510之舌片9511之一導電金屬基底層。雙壓電晶片致動器9500亦可包含一第二雙壓電晶片臂9523,其包含一或多個SMA材料9522,諸如一SMA帶或SMA線。SMA材料9522可附裝至第二雙壓電晶片臂9523之一橫桿。第二雙壓電晶片臂9523亦可包含一導電金屬基底層且視情況包含一介電層。The SMA material 9525 is electrically coupled to a conductive metal base element at a fixed end, as discussed with respect to FIG. 93 . The SMA material 9525 is also electrically coupled to a conductive metal base layer of the tongue 9511 of the single unsecured point-of-load terminal 9510. The bimorph actuator 9500 may also include a second bimorph arm 9523 comprising one or more SMA materials 9522, such as an SMA tape or SMA wire. The SMA material 9522 can be attached to one of the crossbars of the second bimorph arm 9523. The second bimorph arm 9523 may also include a conductive metal base layer and optionally a dielectric layer.

SMA材料9525及SMA材料9522電耦合至單一未固定負載點端9510之一導電金屬基底元件9511。電流在方向9501上在固定端處自一共同導電金屬基底層流入至SMA材料9425中。SMA材料9525電接地至單一未固定負載點端9510之導電金屬基底元件9511提供電路在方向9502上進入SMA材料9522之一返回路徑。電流在方向9503上自導電基底元件9511流動通過SMA材料9522而在固定端處至一共同導電金屬基底層。SMA material 9525 and SMA material 9522 are electrically coupled to a conductive metal base element 9511 of a single unsecured point-of-load terminal 9510. Current flows in direction 9501 into SMA material 9425 from a common conductive metal base layer at the fixed end. The SMA material 9525 is electrically grounded to the conductive metal base element 9511 of the single unsecured point-of-load terminal 9510 to provide a return path for the circuit in direction 9502 into the SMA material 9522. Current flows in direction 9503 from conductive base element 9511 through SMA material 9522 to a common conductive metal base layer at the fixed end.

在本發明之一些實例中,負載點元件9512可由不同大小及形狀製造。在本發明之一些實例中,負載點元件9512可使用包含(但不限於)膠水、焊接、黏著等等之任何方法來附接至未固定負載點端9510。再者,負載點元件9512可為一或多個分離件。負載點元件9512經繪示於一單一未固定負載點端9510上。本發明之額外實例可包含(例如)位於圖88至圖93之各未固定負載點端上之一負載點元件。In some examples of the invention, point-of-load elements 9512 may be fabricated in different sizes and shapes. In some examples of the invention, the point-of-load element 9512 may be attached to the unsecured point-of-load end 9510 using any method including, but not limited to, glue, welding, adhesion, and the like. Again, the point-of-load element 9512 may be one or more separate pieces. Point-of-load element 9512 is shown on a single unsecured point-of-load end 9510. Additional examples of the invention may include, for example, a point-of-load element located on each of the unsecured point-of-load ends of FIGS. 88-93.

應瞭解,本文中為了方便而使用之諸如「頂部」、「底部」、「上方」、「下方」及x方向、y方向及z方向之術語表示部件相對於彼此而非相對於任何特定空間或重力定向之空間關係。因此,術語意欲涵蓋組成部件之一總成,不論總成依圖式中所展示及說明書中所描述之特定定向來定向、與該定向顛倒或任何其他旋轉變動。It should be understood that terms such as "top," "bottom," "above," "below," and the x, y, and z directions are used herein for convenience to denote components relative to each other and not relative to any particular space or The spatial relationship of gravity orientation. Thus, the term is intended to encompass an assembly of components, whether oriented in the particular orientation shown in the drawings and described in the specification, reversed from that orientation, or any other rotational variation.

應瞭解,本文中所使用之術語「本發明」不應被解釋成意謂僅呈現具有一單一基本元件或元件群組之一單一發明。類似地,亦應瞭解,術語「本發明」涵蓋數個單獨創新,其等可各被視為單獨發明。儘管已相對於較佳實施例及其圖式詳細描述本發明,但熟習技術者應明白,可在不背離本發明之精神及範疇之情況下實現本發明之實施例之各種調適及修改。另外,本文中所描述之技術可用於製造具有兩個、三個、四個、五個、六個或更一般而言,n個雙壓電晶片致動器及扣件致動器之一裝置。因此,應瞭解,上文所闡述之詳細描述及附圖不意欲限制本發明之廣度,其應僅自以下申請專利範圍及其適當解釋之合法等效物推斷。It is to be understood that the term "invention" as used herein should not be construed to mean merely presenting a single invention having a single basic element or group of elements. Similarly, it should also be understood that the term "invention" encompasses several separate innovations, which may each be considered separate inventions. Although the present invention has been described in detail with respect to the preferred embodiment and its drawings, it will be apparent to those skilled in the art that various adaptations and modifications of the embodiments of the invention can be made without departing from the spirit and scope of the invention. Additionally, the techniques described herein can be used to fabricate a device having two, three, four, five, six, or more generally, n bimorph actuators and fastener actuators . Therefore, it should be understood that the detailed description and drawings set forth above are not intended to limit the breadth of the invention, which should be inferred only from the following claims and their properly interpreted legal equivalents.

100:形狀記憶合金(SMA)線 101:基底 102:扣件致動器 104:中心部分 106:箝夾結構 108:正z方向 202:雙壓電晶片致動器 204:基底 206:SMA帶 208:z行程方向 302:SMA致動器/扣件致動器 304:光學影像穩定器(OIS) 306:鏡頭托架 308:復位彈簧 310:垂直滑動軸承 312:導蓋 502:感測器 504:z方向 506:扣件致動器 508:SMA線 602:SMA致動器 604:鏡頭托架 606:線保持器 608:SMA線 610:扣臂 612:彈簧臂 702:滑動基底 704:總成基底/致動器基底 706:滑動軸承 708:垂直滑動表面 710:扣件致動器 802:扣件致動器 804:扣臂 806:懸吊部分 902:雙壓電晶片致動器 904:鏡頭托架 906:端 908:基底 1002:自動聚焦總成 1004:位置感測器 1005:z方向 1006:移動彈簧 1008:磁體 1010:鏡頭托架 1102:雙壓電晶片致動器 1104:橫桿 1106:SMA材料 1106a:SMA線 1106b:SMA帶 1108:黏著膜材料 1110:接點 1112:絕緣體 1114:第二絕緣體 1202:SMA材料 1203:端墊 1204:中心饋電 1206:橫桿 1208:中心金屬 1210:絕緣體 1212:通孔 1214:接觸層 1214a:電源區段 1214b:接地區段 1216:電源供應接點 1218:接地接點 1220:面塗層 1222:間隙 1224:通孔區段 1302:扣件致動器 1304:扣件致動器 1306:鏡頭托架 1308:懸吊部分 1310:扣臂 1312:扣臂 1314:滑動基底 1316:滑動基底 1318:SMA線 1902:扣件致動器 1904:扣件致動器 1906:鏡頭托架 1908:懸吊部分 1910:扣臂 1912:扣臂 1914:滑動基底 1916:滑動基底 1918:基底部分 1920:蓋部分 2202:扣件致動器 2204:扣件致動器 2206:鏡頭托架 2218a:左SMA線 2218b:右SMA線 2302:第一扣件致動器 2304:第二扣件致動器 2305:耦合器環 2306:鏡頭托架 2308:懸吊部分 2309:懸吊部分 2401:滑動基底 2402:扣件致動器 2403:復位彈簧 2404:扣臂 2405:鏡頭托架 2406:層壓懸吊 2408:SMA線 2409:外殼 2412:層壓成型箝夾連接 2413:箝夾 2414:適配器板 2415:信號跡線 2501:SMA系統 3000:加強件 3001:滑動基底 3002:扣件致動器 3003:復位彈簧 3004:扣臂 3005:鏡頭托架 3008:SMA線 3009:外殼 3012:電阻焊線箝夾 3014:適配器板 3020:撓性電路 3101:SMA系統 3501:SMA雙壓電晶片液體鏡頭 3502:液體鏡頭子總成 3504:外殼 3506:SMA致動器 3508:雙壓電晶片致動器 3510:成形環 3512:隔膜 3514:液體 3516:液體容納環 3518:鏡頭 3520:接點 3902:SMA致動器 3904:正z行程致動器 3906:負z行程致動器 3908:SMA線 3910:鏡頭托架 3912:頂部彈簧 3914:頂部間隔件 3916:底部間隔件 3918:底部彈簧 3920:基底 4102:長度 4103:雙壓電晶片致動器 4104:接合墊 4108:延伸長度 4202:SMA雙壓電晶片致動器 4206:SMA線 4302:負致動器信號連接 4304:基底 4306:雙壓電晶片致動器 4308:線接合墊 4310:黏著層 4312:SMA線 4314:正致動器信號連接 4316:線接合墊 4318:黏著層 4322:連接墊 4602:撓性感測器電路 4604:雙壓電晶片致動器電路 4606:雙壓電晶片致動器 4608:移動托架 4610:外殼 4802:SMA致動器 4804:對應外殼 5002:SMA致動器 5004:SMA雙壓電晶片致動器 5202:雙壓電晶片致動器 5302:雙壓電晶片致動器 5402:雙壓電晶片致動器 5502:SMA雙壓電晶片致動器 5802:SMA致動器 5806:雙壓電晶片致動器 6202:SMA致動器 6204:雙壓電晶片致動器 6504:外殼 6506:鏡頭托架 6602:SMA致動器 6603:鏡頭托架 6604:雙壓電晶片致動器 6802:SMA致動器 6804:感測器托架 6806:雙壓電晶片致動器 7302:SMA致動器 7304:雙壓電晶片致動器 7402:SMA致動器 7404:雙壓電晶片致動器 7902:SMA致動器 7904:雙壓電晶片致動器 8402:SMA致動器 8404:雙壓電晶片致動器 8906:共同導電金屬基底層 8907:舌片 8908:自由端 8909:接觸構件 8910:自由端 8911:舌片 8912:接觸構件 8921:雙壓電晶片臂/橫桿 8922:SMA材料 8923:雙壓電晶片臂 8924:介電層 8925:SMA材料 8926:介電層 8930:固定端 8931:第一導電金屬基底元件 8932:第二接觸墊 8933:第二導電金屬基底元件 8934:導電金屬基底層 8935:第一接觸墊 8936:孔隙 8937:第一接點 8938:第二接觸元件 8939:介電層 8980:雙壓電晶片致動器 8987:第一SMA接點 8988:第二SMA接點 8990:雙壓電晶片致動器 8991:方向 8992:方向 8993:方向 8994:方向 8995:方向 8997:方向 9301:方向 9303:方向 9305:方向 9307:方向 9309:方向 9310:雙壓電晶片致動器/自由端 9311:舌片 9312:自由端 9313:舌片 9321:第一雙壓電晶片臂 9323:第二雙壓電晶片臂 9325:SMA材料 9327:SMA材料 9330:固定端 9337:第一導電金屬基底元件 9338:第二導電金屬基底元件 9400:雙壓電晶片致動器 9401:方向 9402:方向 9403:方向 9408:接觸構件 9409:接觸構件 9410:單一未固定負載點端 9411:導電金屬基底元件 9421:第一雙壓電晶片臂 9422:SMA材料 9423:第二雙壓電晶片臂 9425:SMA材料 9500:雙壓電晶片致動器 9501:方向 9502:方向 9503:方向 9510:單一未固定負載點端 9511:舌片/導電金屬基底元件 9512:負載點元件 9521:第一雙壓電晶片臂 9522:SMA材料 9523:第二雙壓電晶片臂 9525:SMA材料 100: Shape memory alloy (SMA) wire 101: Substrate 102: Fastener Actuator 104: Center Section 106: Clamp structure 108: positive z direction 202: Bimorph actuators 204: Substrate 206: SMA belt 208: z travel direction 302: SMA Actuator / Fastener Actuator 304: Optical Image Stabilizer (OIS) 306: Lens Holder 308: return spring 310: Vertical sliding bearing 312: Guide cover 502: Sensor 504: z direction 506: Fastener Actuator 508:SMA wire 602: SMA Actuator 604: Lens Holder 606: Wire Holder 608:SMA wire 610: Buckle Arm 612: Spring Arm 702: Sliding base 704: Assembly Base/Actuator Base 706: Plain bearings 708: Vertical sliding surface 710: Fastener Actuator 802: Fastener Actuator 804: Buckle Arm 806: Suspension part 902: Bimorph Actuator 904: Lens Holder 906: End 908: Base 1002: Auto focus assembly 1004: Position Sensor 1005: z direction 1006: Moving Spring 1008: Magnet 1010: Lens Holder 1102: Bimorph Actuator 1104: Crossbar 1106: SMA material 1106a:SMA wire 1106b: SMA tape 1108: Adhesive film material 1110: Contact 1112: Insulator 1114: Second insulator 1202: SMA material 1203: End pad 1204: Center Feed 1206: Crossbar 1208: Center Metal 1210: Insulator 1212: Through hole 1214: Contact Layer 1214a: Power Section 1214b: Ground Section 1216: Power supply contact 1218: Ground Contact 1220: Topcoat 1222: Clearance 1224: Through hole section 1302: Fastener Actuator 1304: Fastener Actuator 1306: Lens Holder 1308: Suspension part 1310: Buckle Arm 1312: Buckle Arm 1314: Sliding base 1316: Sliding base 1318:SMA wire 1902: Fastener Actuator 1904: Fastener Actuator 1906: Lens Holder 1908: Suspension section 1910: Buckle Arm 1912: Buckle Arm 1914: Sliding base 1916: Sliding base 1918: The base part 1920: Cover part 2202: Fastener Actuator 2204: Fastener Actuator 2206: Lens Holder 2218a: Left SMA wire 2218b: Right SMA wire 2302: First Fastener Actuator 2304: Second Fastener Actuator 2305: Coupler Ring 2306: Lens Holder 2308: Suspension part 2309: Suspension part 2401: Sliding base 2402: Fastener Actuator 2403: Return Spring 2404: Buckle Arm 2405: Lens Holder 2406: Laminated Suspension 2408:SMA wire 2409: Shell 2412: Laminated Clamp Connections 2413: Clamp 2414: Adapter Plate 2415: Signal traces 2501: SMA System 3000: Reinforcement 3001: Sliding base 3002: Fastener Actuator 3003: Return Spring 3004: Buckle Arm 3005: Lens Holder 3008:SMA wire 3009: Shell 3012: Resistance Welding Wire Clamps 3014: Adapter Board 3020: Flexible Circuits 3101: SMA System 3501: SMA Bimorph Liquid Lens 3502: Liquid lens sub-assembly 3504: Shell 3506: SMA Actuator 3508: Bimorph Actuator 3510: Forming Ring 3512: Diaphragm 3514: Liquid 3516: Liquid Containment Ring 3518: Lens 3520: Contact 3902: SMA Actuator 3904: Positive z-stroke actuator 3906: Negative z-stroke actuator 3908:SMA wire 3910: Lens Holder 3912: Top Spring 3914: Top Spacer 3916: Bottom Spacer 3918: Bottom Spring 3920: Base 4102:Length 4103: Bimorph Actuator 4104: Bond pads 4108: Extended Length 4202: SMA Bimorph Actuator 4206:SMA wire 4302: Negative Actuator Signal Connection 4304: Base 4306: Bimorph Actuator 4308: Wire bond pads 4310: Adhesive layer 4312: SMA wire 4314: Positive Actuator Signal Connection 4316: Wire bond pads 4318: Adhesive layer 4322: Connection pad 4602: Flex Sensor Circuit 4604: Bimorph Actuator Circuit 4606: Bimorph Actuator 4608: Mobile Bracket 4610: Shell 4802: SMA Actuator 4804: Corresponding shell 5002: SMA Actuator 5004: SMA Bimorph Actuator 5202: Bimorph Actuator 5302: Bimorph Actuator 5402: Bimorph Actuator 5502: SMA Bimorph Actuator 5802: SMA Actuator 5806: Bimorph Actuator 6202: SMA Actuator 6204: Bimorph Actuator 6504: Shell 6506: Lens Holder 6602: SMA Actuator 6603: Lens Holder 6604: Bimorph Actuator 6802: SMA Actuator 6804: Sensor Bracket 6806: Bimorph Actuator 7302: SMA Actuator 7304: Bimorph Actuator 7402: SMA Actuator 7404: Bimorph Actuator 7902: SMA Actuator 7904: Bimorph Actuator 8402: SMA Actuator 8404: Bimorph Actuator 8906: Common Conductive Metal Base Layer 8907: Tongue 8908: Free end 8909: Contact member 8910: Free end 8911: Tongue 8912: Contact member 8921: Bimorph Arm/Bar 8922: SMA material 8923: Bimorph Arm 8924: Dielectric Layer 8925: SMA material 8926: Dielectric Layer 8930: Fixed end 8931: First conductive metal base element 8932: Second Contact Pad 8933: Second Conductive Metal Base Element 8934: Conductive Metal Base Layer 8935: First Contact Pad 8936: Pore 8937: First Contact 8938: Second Contact Element 8939: Dielectric Layer 8980: Bimorph Actuator 8987: First SMA Contact 8988: Second SMA contact 8990: Bimorph Actuator 8991: Direction 8992: Direction 8993: Direction 8994: Direction 8995: Direction 8997: Direction 9301: Direction 9303: Direction 9305: Direction 9307: Direction 9309: Direction 9310: Bimorph Actuator/Free End 9311: Tongue 9312: Free end 9313: Tongue 9321: First bimorph arm 9323: Second Bimorph Arm 9325: SMA material 9327: SMA material 9330: Fixed end 9337: First conductive metal base element 9338: Second Conductive Metal Base Element 9400: Bimorph Actuator 9401: Direction 9402: Direction 9403: Direction 9408: Contact member 9409: Contact member 9410: Single Unfixed Point-of-Load Terminal 9411: Conductive Metal Base Components 9421: First bimorph arm 9422: SMA material 9423: Second Bimorph Arm 9425: SMA material 9500: Bimorph Actuator 9501: Direction 9502: Direction 9503: Direction 9510: Single Unfixed Point-of-Load Terminal 9511: Tongue/Conductive Metal Base Element 9512: Point of Load Components 9521: First bimorph arm 9522: SMA material 9523: Second Bimorph Arm 9525: SMA material

本發明之實施例依舉例而非限制方式繪示於附圖之圖中,其中相同元件符號指示類似元件且其中:Embodiments of the invention are illustrated by way of example and not limitation in the figures of the accompanying drawings, wherein like reference numerals indicate similar elements, and wherein:

圖1a繪示根據一實施例之包含組態為一扣件致動器之一SMA致動器之一鏡頭總成;1a illustrates a lens assembly including an SMA actuator configured as a fastener actuator, according to one embodiment;

圖1b繪示根據一實施例之一SMA致動器;Figure 1b illustrates an SMA actuator according to an embodiment;

圖2繪示根據一實施例之一SMA致動器;2 illustrates an SMA actuator according to an embodiment;

圖3繪示根據一實施例之包含一SMA線致動器之一自動聚焦總成之一分解圖;3 shows an exploded view of an autofocus assembly including an SMA wire actuator, according to one embodiment;

圖4繪示根據一實施例之包含一SMA致動器之自動聚焦總成;4 illustrates an autofocus assembly including an SMA actuator according to one embodiment;

圖5繪示包含一感測器之根據一實施例之一SMA致動器;5 illustrates an SMA actuator according to an embodiment including a sensor;

圖6繪示裝配有一鏡頭托架之根據一實施例之組態為一扣件致動器之一SMA致動器之一俯視圖及一側視圖;6 shows a top view and a side view of an SMA actuator configured as a fastener actuator according to an embodiment equipped with a lens holder;

圖7繪示根據實施例之SMA致動器之一區段之一側視圖;7 depicts a side view of a section of an SMA actuator according to an embodiment;

圖8繪示一扣件致動器之一實施例之多個視圖;Figure 8 depicts various views of one embodiment of a fastener actuator;

圖9繪示具有一鏡頭托架之根據一實施例之一雙壓電晶片致動器;9 illustrates a bimorph actuator according to an embodiment with a lens holder;

圖10繪示根據一實施例之包含一SMA致動器之一自動聚焦總成之一剖視圖;10 illustrates a cross-sectional view of an autofocus assembly including an SMA actuator, according to an embodiment;

圖11a至圖11c繪示根據一些實施例之雙壓電晶片致動器之視圖;11a-11c illustrate views of bimorph actuators according to some embodiments;

圖12繪示根據一實施例之一雙壓電晶片致動器之一實施例之視圖;12 shows a view of an embodiment of a bimorph actuator according to an embodiment;

圖13繪示根據一實施例之一雙壓電晶片致動器之一端墊橫截面;13 illustrates a cross-section of an end pad of a bimorph actuator according to an embodiment;

圖14繪示根據一實施例之一雙壓電晶片致動器之一中心供應墊橫截面;14 illustrates a cross-section of a center supply pad of a bimorph actuator according to an embodiment;

圖15繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一分解圖;15 shows an exploded view of an SMA actuator including one of two fastener actuators, according to one embodiment;

圖16繪示根據一實施例之包含兩個扣件致動器之一SMA致動器;16 illustrates an SMA actuator including two fastener actuators, according to an embodiment;

圖17繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一側視圖;17 shows a side view of an SMA actuator including one of two fastener actuators, according to one embodiment;

圖18繪示根據一實施例之包含兩個扣件致動器之一SMA致動器之一側視圖;18 shows a side view of an SMA actuator including one of two fastener actuators, according to one embodiment;

圖19繪示根據一實施例之包含一SMA致動器之一總成之一分解圖,SMA致動器包含兩個扣件致動器;19 depicts an exploded view of an assembly including an SMA actuator including two fastener actuators, according to an embodiment;

圖20繪示根據一實施例之包含兩個扣件致動器之一SMA致動器;20 illustrates an SMA actuator including two fastener actuators, according to an embodiment;

圖21繪示根據一實施例之包含兩個扣件致動器之一SMA致動器;21 illustrates an SMA actuator including two fastener actuators, according to an embodiment;

圖22繪示根據一實施例之包含兩個扣件致動器之一SMA致動器;22 illustrates an SMA actuator including two fastener actuators, according to an embodiment;

圖23繪示根據一實施例之包含兩個扣件致動器及一耦合器之一SMA致動器;23 illustrates an SMA actuator including two fastener actuators and a coupler, according to an embodiment;

圖24繪示根據一實施例之包含一SMA致動器之一SMA系統之一分解圖,SMA致動器包含具有一層壓懸吊之一扣件致動器;24 depicts an exploded view of an SMA system including an SMA actuator including a fastener actuator with a laminated suspension, according to an embodiment;

圖25繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含具有一層壓懸吊之一扣件致動器2402;25 illustrates an SMA system including an SMA actuator including a fastener actuator 2402 with a laminated suspension, according to one embodiment;

圖26繪示根據一實施例之包含一層壓懸吊之一扣件致動器;Figure 26 illustrates a fastener actuator including a laminated suspension according to one embodiment;

圖27繪示根據一實施例之一SMA致動器之一層壓懸吊;27 illustrates a laminated suspension of an SMA actuator according to an embodiment;

圖28繪示根據一實施例之一SMA致動器之一層壓成型箝夾連接;FIG. 28 illustrates a lamination-molded jaw connection of an SMA actuator according to an embodiment;

圖29繪示包含具有一層壓懸吊之一扣件致動器之一SMA致動器;Figure 29 depicts an SMA actuator including a fastener actuator with a laminated suspension;

圖30繪示根據一實施例之包含一SMA致動器之一SMA系統之一分解圖,SMA致動器包含一扣件致動器;30 depicts an exploded view of an SMA system including an SMA actuator including a fastener actuator, according to an embodiment;

圖31繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含一扣件致動器;31 illustrates an SMA system including an SMA actuator including a fastener actuator, according to an embodiment;

圖32繪示根據一實施例之包含一扣件致動器之一SMA致動器;32 illustrates an SMA actuator including a fastener actuator, according to an embodiment;

圖33繪示根據一實施例之一SMA致動器之一對扣臂之一雙軛捕捉接頭;33 illustrates a double yoke capture joint of a pair of snap arms of an SMA actuator according to an embodiment;

圖34繪示用於將一SMA線附接至扣件致動器之根據一實施例之一SMA致動器之一電阻焊箝夾;FIG. 34 depicts a resistance welding jaw of an SMA actuator according to an embodiment for attaching an SMA wire to the fastener actuator;

圖35繪示包含具有一雙軛捕捉接頭之一扣件致動器之一SMA致動器;Figure 35 depicts an SMA actuator including a fastener actuator with a double yoke capture joint;

圖36繪示根據一實施例之一SMA雙壓電晶片液體鏡頭;36 illustrates an SMA bimorph liquid lens according to an embodiment;

圖37繪示根據一實施例之一透視SMA雙壓電晶片液體鏡頭;37 illustrates a see-through SMA bimorph liquid lens according to an embodiment;

圖38繪示根據一實施例之SMA雙壓電晶片液體鏡頭之一橫截面及一仰視圖;38 illustrates a cross-section and a bottom view of an SMA bimorph liquid lens according to an embodiment;

圖39繪示根據一實施例之包含具有雙壓電晶片致動器之一SMA致動器之一SMA系統;39 illustrates an SMA system including an SMA actuator with a bimorph actuator, according to an embodiment;

圖40繪示根據一實施例之具有雙壓電晶片致動器之SMA致動器;40 illustrates an SMA actuator with a bimorph actuator according to an embodiment;

圖41繪示一雙壓電晶片致動器之長度及使一SMA線將線長延伸超過雙壓電晶片致動器之一接合墊之位置;Figure 41 illustrates the length of a bimorph actuator and the position where an SMA wire extends the wire length beyond a bond pad of the bimorph actuator;

圖42繪示根據一實施例之包含一雙壓電晶片致動器之一SMA系統之一分解圖;42 shows an exploded view of an SMA system including a bimorph actuator according to an embodiment;

圖43繪示根據一實施例之SMA致動器之一子區段之一分解圖;43 depicts an exploded view of a subsection of an SMA actuator according to an embodiment;

圖44繪示根據一實施例之SMA致動器之一子區段;44 depicts a subsection of an SMA actuator according to an embodiment;

圖45繪示根據一實施例之一5軸感測器移位系統;45 illustrates a 5-axis sensor displacement system according to an embodiment;

圖46繪示根據一實施例之一5軸感測器移位系統之一分解圖;46 shows an exploded view of a 5-axis sensor displacement system according to an embodiment;

圖47繪示根據一實施例之包含整合至此電路中用於所有運動之雙壓電晶片致動器之一SMA致動器;47 illustrates an SMA actuator including a bimorph actuator integrated into this circuit for all motions, according to an embodiment;

圖48繪示根據一實施例之包含整合至此電路中用於所有運動之雙壓電晶片致動器之一SMA致動器;48 illustrates an SMA actuator including a bimorph actuator integrated into this circuit for all motions, according to an embodiment;

圖49繪示根據一實施例之一5軸感測器移位系統之一橫截面;49 illustrates a cross-section of a 5-axis sensor displacement system according to an embodiment;

圖50繪示包含雙壓電晶片致動器之根據一實施例之一SMA致動器;50 illustrates an SMA actuator according to an embodiment including a bimorph actuator;

圖51繪示包含移動不同x及y位置中之一影像感測器之雙壓電晶片致動器之根據一實施例之一SMA致動器之一俯視圖;51 illustrates a top view of an SMA actuator according to an embodiment including a bimorph actuator that moves an image sensor in different x and y positions;

圖52繪示組態為一盒式雙壓電晶片自動聚焦之根據一實施例之包含雙壓電晶片致動器之一SMA致動器;52 depicts an SMA actuator including a bimorph actuator configured as a cassette bimorph autofocus according to one embodiment;

圖53繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器;53 illustrates an SMA actuator including a bimorph actuator according to an embodiment;

圖54繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器;54 illustrates an SMA actuator including a bimorph actuator according to an embodiment;

圖55繪示根據一實施例之包含雙壓電晶片致動器之一SMA致動器;55 illustrates an SMA actuator including a bimorph actuator according to an embodiment;

圖56繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;56 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖57繪示根據一實施例之包含一SMA致動器之SMA系統之一分解圖,SMA致動器包含組態為一2軸鏡頭移位OIS之雙壓電晶片致動器;57 depicts an exploded view of an SMA system including an SMA actuator including a bimorph actuator configured as a 2-axis lens shift OIS, according to one embodiment;

圖58繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含組態為一2軸鏡頭移位OIS之雙壓電晶片致動器;58 depicts a cross-section of an SMA system including an SMA actuator including a bimorph actuator configured as a 2-axis lens shift OIS, according to one embodiment;

圖59繪示根據一實施例之一盒式雙壓電晶片致動器;Figure 59 illustrates a cassette bimorph actuator according to an embodiment;

圖60繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;60 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖61繪示根據一實施例之包含一SMA致動器之SMA系統之一分解圖,SMA致動器包含雙壓電晶片致動器;61 depicts an exploded view of an SMA system including an SMA actuator including a bimorph actuator, according to one embodiment;

圖62繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含雙壓電晶片致動器;62 depicts a cross-section of an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖63繪示根據一實施例之盒式雙壓電晶片致動器;Figure 63 illustrates a cassette bimorph actuator according to an embodiment;

圖64繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;64 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖65繪示根據一實施例之包含一SMA致動器之一SMA系統之一分解圖,SMA致動器包含雙壓電晶片致動器;65 depicts an exploded view of an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖66繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;66 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖67繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;67 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖68繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;68 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖69繪示根據一實施例之包含一SMA致動器之SMA之一分解圖,SMA致動器包含雙壓電晶片致動器;69 depicts an exploded view of an SMA including an SMA actuator including a bimorph actuator, according to one embodiment;

圖70繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含組態為一3軸感測器移位OIS之雙壓電晶片致動器;70 depicts a cross-section of an SMA system including an SMA actuator including a bimorph actuator configured as a 3-axis sensor displacement OIS, according to one embodiment;

圖71繪示根據一實施例之一盒式雙壓電晶片致動器組件;Figure 71 illustrates a cassette bimorph actuator assembly according to an embodiment;

圖72繪示根據一實施例之用於一SMA系統中之一撓性感測器電路;72 illustrates a flex sensor circuit for use in an SMA system, according to an embodiment;

圖73繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;73 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖74繪示根據一實施例之包含一SMA致動器之SMA系統之一分解圖,SMA致動器包含雙壓電晶片致動器;74 depicts an exploded view of an SMA system including an SMA actuator including a bimorph actuator, according to one embodiment;

圖75繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面;75 depicts a cross-section of an SMA system including an SMA actuator, according to an embodiment;

圖76繪示根據一實施例之盒式雙壓電晶片致動器;Figure 76 illustrates a cassette bimorph actuator according to an embodiment;

圖77繪示根據一實施例之用於一SMA系統中之一撓性感測器電路;77 illustrates a flex sensor circuit for use in an SMA system, according to an embodiment;

圖78繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;78 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖79繪示根據一實施例之包含一SMA致動器之SMA系統之一分解圖,SMA致動器包含雙壓電晶片致動器;79 depicts an exploded view of an SMA system including an SMA actuator including a bimorph actuator, according to one embodiment;

圖80繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面;80 depicts a cross-section of an SMA system including an SMA actuator, according to an embodiment;

圖81繪示根據一實施例之盒式雙壓電晶片致動器;Figure 81 illustrates a cassette bimorph actuator according to an embodiment;

圖82繪示根據一實施例之用於一SMA系統中之一撓性感測器電路;82 illustrates a flex sensor circuit for use in an SMA system, according to an embodiment;

圖83繪示根據一實施例之包含一SMA致動器之一SMA系統,SMA致動器包含雙壓電晶片致動器;83 illustrates an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖84繪示根據一實施例之包含一SMA致動器之SMA系統之一分解圖;84 depicts an exploded view of an SMA system including an SMA actuator, according to an embodiment;

圖85繪示根據一實施例之包含一SMA致動器之SMA系統之一橫截面,SMA致動器包含雙壓電晶片致動器;85 depicts a cross-section of an SMA system including an SMA actuator including a bimorph actuator, according to an embodiment;

圖86繪示根據一實施例之用於一SMA系統中之盒式雙壓電晶片致動器;Figure 86 illustrates a cassette bimorph actuator for use in an SMA system, according to an embodiment;

圖87繪示根據一實施例之用於一SMA系統中之一撓性感測器電路;87 illustrates a flex sensor circuit for use in an SMA system, according to an embodiment;

圖88繪示根據實施例之一SMA致動器之一雙壓電晶片致動器之例示性尺寸;88 depicts exemplary dimensions of a bimorph actuator of an SMA actuator according to an embodiment;

圖89繪示根據一實施例之一雙壓電晶片致動器之一第一視圖;Figure 89 shows a first view of a bimorph actuator according to an embodiment;

圖90繪示根據實施例之例示性雙壓電晶片致動器之一第二視圖;90 shows a second view of an exemplary bimorph actuator according to an embodiment;

圖91繪示根據實施例之例示性雙壓電晶片致動器之一透視圖;91 depicts a perspective view of an exemplary bimorph actuator according to an embodiment;

圖92繪示根據實施例之例示性雙壓電晶片致動器中之SMA線;92 depicts SMA wires in an exemplary bimorph actuator according to an embodiment;

圖93繪示根據實施例之一例示性雙壓電晶片致動器9310之電流流動路徑;93 depicts the current flow path of an exemplary bimorph actuator 9310 according to an embodiment;

圖94繪示根據實施例之包含一單一未固定負載點端之一例示性雙壓電晶片致動器;及94 depicts an exemplary bimorph actuator including a single unfixed point-of-load end, according to an embodiment; and

圖95繪示根據實施例之包含一單一未固定負載點端之一例示性雙壓電晶片致動器。95 shows an exemplary bimorph actuator including a single unfixed point-of-load end, according to an embodiment.

100:形狀記憶合金(SMA)線 100: Shape memory alloy (SMA) wire

101:基底 101: Substrate

102:扣件致動器 102: Fastener Actuator

104:中心部分 104: Center Section

106:箝夾結構 106: Clamp structure

108:正z方向 108: positive z direction

Claims (20)

一種雙壓電晶片致動器,其包括: 一固定端,其包含一介電層及一導電金屬基底層; 至少一個雙壓電晶片臂,其自該固定端延伸,該至少一個雙壓電晶片臂由該導電金屬基底層組成; 至少一個自由端,該至少一個自由端之各者自該至少一個雙壓電晶片臂延伸;及 一或多個SMA材料,其等延伸於該固定端與該至少一個自由端之間,該一或多個SMA材料與該導電金屬基底層隔離。 A bimorph actuator comprising: a fixed end, which includes a dielectric layer and a conductive metal base layer; at least one bimorph arm extending from the fixed end, the at least one bimorph arm consisting of the conductive metal base layer; at least one free end, each of the at least one free end extending from the at least one bimorph arm; and One or more SMA materials, etc., extend between the fixed end and the at least one free end, the one or more SMA materials being isolated from the conductive metal base layer. 如請求項1之雙壓電晶片致動器,其中該導電金屬基底層由該介電層界定之間隙分離成一第一導電金屬基底元件、一第二導電金屬基底元件及一共同導電金屬基底層。The piezoelectric bimorph actuator of claim 1, wherein the conductive metal base layer is separated into a first conductive metal base element, a second conductive metal base element and a common conductive metal base layer by a gap defined by the dielectric layer . 如請求項2之雙壓電晶片致動器,其中該等間隙係暴露安裝至該第一導電金屬基底元件、該第二導電金屬基底元件及該共同導電金屬基底層之該介電層之部分或完全蝕刻間隙。The piezoelectric bimorph actuator of claim 2, wherein the gaps expose portions of the dielectric layer mounted to the first conductive metal base element, the second conductive metal base element, and the common conductive metal base layer Or fully etch the gap. 如請求項2之雙壓電晶片致動器,其中該至少一個雙壓電晶片臂由該共同導電金屬基底層及該介電層組成。The bimorph actuator of claim 2, wherein the at least one bimorph arm consists of the common conductive metal base layer and the dielectric layer. 如請求項2之雙壓電晶片致動器,其中該第一導電金屬基底元件及該第二導電金屬基底元件經電隔離。The bimorph actuator of claim 2, wherein the first conductive metal base element and the second conductive metal base element are electrically isolated. 如請求項2之雙壓電晶片致動器,其中該一或多個SMA材料之一者電耦合至該固定端之該第一導電金屬基底元件且電耦合至該至少一個自由端之一導電金屬基底層。The bimorph actuator of claim 2, wherein one of the one or more SMA materials is electrically coupled to the first conductive metal base element of the fixed end and to a conductive one of the at least one free end Metal base layer. 如請求項2之雙壓電晶片致動器,其中該一或多個SMA材料之一者電耦合至該固定端之該第二導電金屬基底元件且電耦合至該至少一個自由端之一導電金屬基底層。The bimorph actuator of claim 2, wherein one of the one or more SMA materials is electrically coupled to the second conductive metal base element of the fixed end and to a conductive one of the at least one free end Metal base layer. 如請求項1之雙壓電晶片致動器,其中該至少一個自由端包含由該導電金屬基底層組成之一舌片及自一舌片延伸之一接觸構件。The bimorph actuator of claim 1, wherein the at least one free end includes a tongue composed of the conductive metal base layer and a contact member extending from a tongue. 如請求項1之雙壓電晶片致動器,其中該至少一個自由端包含連接至兩個雙壓電晶片臂之一個單一未固定負載點端。The bimorph actuator of claim 1, wherein the at least one free end comprises a single unsecured point-of-load end connected to the two bimorph arms. 如請求項9之雙壓電晶片致動器,其中該單一未固定負載點包含一負載點元件。The bimorph actuator of claim 9, wherein the single unfixed point of load comprises a point of load element. 如請求項1之雙壓電晶片致動器,其中該一或多個SMA材料包含一SMA帶或一SMA線。The bimorph actuator of claim 1, wherein the one or more SMA materials comprise an SMA tape or an SMA wire. 如請求項1之雙壓電晶片致動器,其中該一或多個SMA材料使用黏著膜材料來附裝至該至少一個雙壓電晶片臂。The bimorph actuator of claim 1, wherein the one or more SMA materials are attached to the at least one bimorph arm using an adhesive film material. 如請求項1之雙壓電晶片致動器,其中該導電金屬基底層由不鏽鋼、銅、銅合金、金及鎳之至少一者組成。The bimorph actuator of claim 1, wherein the conductive metal base layer is composed of at least one of stainless steel, copper, copper alloys, gold and nickel. 如請求項1之雙壓電晶片致動器,其中該固定端包含電及機械耦合至一第一雙壓電晶片臂之該SMA材料之一第一接觸墊,該第一接觸墊係一鍍金不鏽鋼墊。The bimorph actuator of claim 1, wherein the fixed end comprises a first contact pad of the SMA material electrically and mechanically coupled to a first bimorph arm, the first contact pad being a gold plated Stainless steel pad. 如請求項1之雙壓電晶片致動器,其中該固定端包含電及機械耦合至一第二雙壓電晶片臂之該SMA材料之一第二接觸墊,該第二接觸墊係一鍍金不鏽鋼墊。The bimorph actuator of claim 1, wherein the fixed end comprises a second contact pad of the SMA material electrically and mechanically coupled to a second bimorph arm, the second contact pad being a gold plated Stainless steel pad. 一種致動器,其由一介電層及一導電金屬基底層組成;該致動器包括: 一固定端,其中該固定端處之該導電金屬基底層由該介電層界定之間隙分離成一第一導電金屬基底元件、一第二導電金屬基底元件及一共同導電金屬基底層; 至少一個雙壓電晶片臂,其自該固定端延伸,該至少一個雙壓電晶片臂由該共同導電金屬基底層及該介電層組成; 至少一個自由端,該至少一個自由端之各者自該至少一個雙壓電晶片臂延伸;及 一或多個SMA材料,其延伸於該固定端與該至少一個自由端之間,該一或多個SMA材料藉由該介電層與該導電金屬基底層隔離。 An actuator, which is composed of a dielectric layer and a conductive metal base layer; the actuator comprises: a fixed end, wherein the conductive metal base layer at the fixed end is separated into a first conductive metal base element, a second conductive metal base element and a common conductive metal base layer by a gap defined by the dielectric layer; at least one bimorph arm extending from the fixed end, the at least one bimorph arm consisting of the common conductive metal base layer and the dielectric layer; at least one free end, each of the at least one free end extending from the at least one bimorph arm; and One or more SMA materials extending between the fixed end and the at least one free end, the one or more SMA materials being isolated from the conductive metal base layer by the dielectric layer. 如請求項16之致動器,其中該第一導電金屬基底元件及該第二導電金屬基底元件經電隔離。The actuator of claim 16, wherein the first conductive metal base element and the second conductive metal base element are electrically isolated. 如請求項16之致動器,其中該一或多個SMA材料之一者電耦合至該固定端之該第一導電金屬基底元件且電耦合至該至少一個自由端之一導電金屬基底層。The actuator of claim 16, wherein one of the one or more SMA materials is electrically coupled to the first conductive metal base element of the fixed end and to a conductive metal base layer of the at least one free end. 如請求項16之致動器,其中該一或多個SMA材料之一者電耦合至該固定端之該第二導電金屬基底元件且電耦合至該至少一個自由端之一導電金屬基底層。The actuator of claim 16, wherein one of the one or more SMA materials is electrically coupled to the second conductive metal base element of the fixed end and to a conductive metal base layer of the at least one free end. 如請求項16之致動器,其中該至少一個自由端包含由該導電金屬基底層組成之一舌片及自一舌片延伸之一接觸構件。16. The actuator of claim 16, wherein the at least one free end includes a tongue comprised of the conductive metal base layer and a contact member extending from a tongue.
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