TW202212964A - Method of operation of a charged particle beam device - Google Patents

Abstract

A method of operation of a charged particle beam device, where the observed place on a sample moves within the field of view of the charged particle beam device as the sample is tilted or rotated. At least one sample image in a first sample position and at least one auxiliary sample image in a position different from the first sample position are generated. The sample images are compared, wherein the result of the comparison is a determined sample displacement value, by which the sample must be shifted to a third position such that the observed place on the sample is in the same position relative to the charged particle beam device as in the first sample position.

Description

How to operate a charged particle beam device

The present invention relates to the use of sample movement compensation, wherein the observed sample position moves within the field of view of a charged particle beam device, wherein rotation or tilting of the sample results in a shift of the observed sample position from the original position.

When working with devices operating on them using charged particle beams, in particular Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), Scanning Transmission Electron Microscopy (STEM) or Focused Ion Beam (FIB) devices on the sample holder, where it is irradiated with a charged particle beam. Charged particle beams are used to observe samples and obtain information about their internal structure, or to process samples and create surface structures.

Then, work activities require frequent manipulation of the sample, which includes turning, tilting, and moving the sample. For this purpose, the sample holder is adapted to be displaced in three mutually perpendicular axes (x, y, z), to rotate about the vertical axis (z), and to tilt about at least one horizontal axis (x and/or y). Other possible sample stage designs allow for rotation or tilting about at least one axis other than the sample displacement axis.

As far as sample tilt is concerned, there are two methods. In the case of eucentric tilt, the tilt axis passes directly through the location of the charged particle beam observation. Thus, when tilted about this axis, the sample still has the same position relative to the charged particle beam. In the case of a compucentric tilt, the tilt axis passes through another location and the location of observation changes Its position relative to the charged particle beam axis, and over time, the observed sample falls out of view. To compensate for this movement, the sample is moved back into the field of view of the charged particle beam by moving it in the direction of the horizontal x and y axes. Similar movement of the sample also occurs in the case of rotation about a vertical axis, especially when the axis of rotation does not directly intersect the sample area under observation.

A solution to the problem of sample movement correction is described, for example, in US Pat. No. 4,627,009, entitled "Microscope Stage Assembly and Control System". The microscope according to one embodiment described in this patent comprises a processing unit for compensating for movement of the sample, wherein rotation and tilting of the sample result in a deflection of the sample, in particular tilting about a concentric axis. The operator enters the desired sample tilt and/or rotation values, the processing unit calculates theoretical displacement values from these values, and after rotating and/or tilting the sample ensures that the sample is displaced back to its original position relative to the charged particle beam axis. Location.

A similar method appears in European Patent EP 1 071 112 B1, patent titled "Scanning Charged Particle Beam Instrument". The magnitude of the sample displacement is calculated from the position of the axis of rotation, the angle of rotation, and the position of the observation point. After calculating the total displacement and after transferring the sample to the second position by rotation, the observation point is returned to the field of view using the inverse displacement.

Although the machining accuracy of mechanical parts is improving, and thus the accuracy of local displacement is also improving, this accuracy is limited. Another source of inaccuracy lies in the calculation of the compensation displacement itself. The input parameters do not have to be entered exactly and in principle certain errors already exist in the measurement of their values. Likewise, a calculation, or rather its result, has a certain amount of error. Therefore, not all measures provide a completely accurate adjustment of the resulting position, and certain correction procedures must always be performed. It is therefore useful to propose a solution to allow precise and continuous compensation of viewing sites on the sample that move out of the field of view when the sample is rotated or tilted.

The method of operation of the charged particle beam device solves or to some extent eliminates the above-mentioned disadvantages. The charged particle beam device includes at least a charged particle source, at least one lens for shaping the charged particle beam or focusing the electron beam over a selected area, wherein the lens is embodied as an electromagnetic lens. Furthermore, the apparatus comprises: a sample console for positioning the sample, wherein the stage is adapted to translate the sample and rotate it about at least one axis or tilt it; and the sample is positioned on the console. The translation occurs in three non-parallel axes, which may be perpendicular to each other. The charged particle beam device further comprises: a signal particle detector; a control unit for receiving instructions about the operation of the device and transmitting the instructions to the device; a display unit for generating and displaying the charged particles detected by the signal particle detector The image of the sample of particles is signally connected to the signal particle detector; the calibration unit includes at least one memory suitable for storing the image; and the calculation unit is used to calculate the displacement of the sample. Signal particles are primarily charged particles scattered from the sample, or scattered electrons, or other particles emitted by the sample due to interaction with the incident charged particle beam, such as secondary electrons, protons, ions, or uncharged particles, such as atoms ,molecular. The method of operating a charged particle beam apparatus comprises the following series of steps:

moving the sample to the first sample position;

generating at least one initial image of the sample in the first position and storing this image in memory, wherein the image is generated by the display unit;

Move the sample to a second sample position, where this position is different from the first sample position, where moving the sample to the second position is due to rotation or tilting of the sample, where the sample remains in the charged particle beam throughout the position change In the field of view of the device, at least one first auxiliary sample image is generated at a position different from the first sample position, and the image is stored in the memory, wherein the image is The image is generated by the display unit from electrons, secondary electrons scattered from the sample;

determining a sample displacement value by calculating at least a pair of the initial image and the first auxiliary sample image, wherein the value is determined by a calculation unit of the calibration unit; and

The sample is moved to a third sample position different from the first and second sample positions by the determined sample shift value, wherein this movement only includes translation by the determined sample shift value.

The method of operation of the charged particle beam apparatus solves the problem that the observed sample area moves within the field of view of the charged particle beam apparatus, which occurs due to rotation or tilting of the sample. Because the charged particle beam is not permanently focused on the same spot on the sample, this movement can cause the image to be defocused. Using this method, a sample shift value is quickly and precisely obtained, by which the sample is then shifted so that the selected site on the sample is still observed.

In a preferred embodiment, the first auxiliary sample image is generated in the second sample location. This embodiment has the advantage of directly obtaining the determined sample displacement value by which the sample must be displaced to keep the observed sample location in the same relative to the charged particle beam device as in the first position in the location.

In a preferred embodiment, a first auxiliary sample image is generated during a change in sample position, subsequently, at least one second auxiliary sample image is generated during a change in sample position, and then a final sample image is generated in the second sample position, The images are generated by the display unit and stored in the memory. Furthermore, the second intermediate sample displacement value is determined by comparing the first and second auxiliary sample images by the calculation unit of the calibration unit. Furthermore, the third intermediate sample shift value is determined by comparing the second auxiliary sample image and the final sample image by the calculation unit of the calibration unit. The determined sample shift value is then given by the sum of the first, second, and third intermediate sample shift values. The advantage of this embodiment lies in the fact that since the calculation is already continuous during the change of the sample position, the A more accurate decision sample shift value was obtained.

Preferably, the calculation unit may calculate a calculated sample displacement value from the value of the specified sample position change. The sample shift value is determined as the average of the above-specified shift value and the calculated shift value. Specifying a dual methodology for determining sample shift values improves the accuracy of this method.

Preferably, the label is produced on the sample, for example, by means of a focused ion beam. The creation of the mark creates a protruding point on the sample, which is useful for comparing a pair of images to obtain sample displacement values, especially for samples with smooth relief without protruding structures, for example.

Preferably, a cross-correlation function is then used to compare the images, which allows a fast and efficient calculation of the displacement of the two signals, where the signal in the context of this application means the sample image.

1: Charged particle beam device

2: Charged particle source

3: Condenser

4: Objective lens

5: Console

5a: Tilt axis

6: Sample

7: Signal particle detector

8: Control unit

9: Display unit

10: Correction unit

11: Memory

12: Computing unit

13: Observing the sample location

14: Charged particle beam axis

15: Studio

The outline of the invention is further elucidated using exemplary embodiments described with reference to the accompanying drawings, in which:

Figure 1 schematically shows a charged particle beam setup comprising a correction unit that calculates the displacement of the viewing area on the sample after tilting the sample;

Figure 2 is a block diagram of the basic procedure for determining the value of the sample position change;

3 is a block diagram of a procedure for determining a sample position change value by comparing an initial image in a first sample position with an auxiliary image in a second sample position;

4 is a block diagram of a procedure for determining a sample position change value by comparing a sample image in a first sample position, an auxiliary image generated during a sample position change, and a final sample image in a second sample position;

Figure 5a is aided by comparing the initial image in the first sample position with the second sample position A block diagram of the procedure for determining the sample position change value from the image and calculating the sample displacement value from the input sample position change value;

Figure 5b is the determination of the sample position change value by comparing the sample image in the first sample position, the auxiliary image generated during the sample position change and the last sample image in the second sample position, and calculated from the input value of the sample position change Block diagram of the procedure for sample displacement;

Figure 6a schematically shows the sample in the first sample position;

Figure 6b schematically shows the sample in the second sample position; and

Figure 6c schematically shows the sample in the third sample position.

The invention will be further elucidated below using example embodiments with reference to the corresponding figures. Figure 1 shows a charged particle beam apparatus 1 comprising: a charged particle source 2; at least one lens 3, 4 for shaping the charged particle beam or focusing the electron beam over a selected area; and a console 5 for positioning Sample 6, which is suitable for displacement of three mutually perpendicular axes, and rotation or tilting of sample 6 about at least two mutually different axes. For example, the charged particle beam device 1 has at least one condenser lens 3 that shapes the charged particle beam and at least one objective lens 4 that focuses the particle beam on a selected area. The device 1 according to the exemplary embodiment of the present invention further includes a signal particle detector 7 . The signal particles are mainly charged particles scattered from the sample 6, or scattered electrons, or other particles emitted by the sample 6 due to interaction with the incident charged particle beam, for example, secondary electrons, protons or uncharged particles such as atoms, molecules or photon. Based on the detected signal particles, the apparatus 1 is adapted to generate an image of an area of the image sample 6 via a display unit 9 communicatively connected to the signal particle detector 7 . A communicative connection means a connection that enables the transfer of information between the communicatively connected elements, so that it can be realized, for example, by means of a network cable interconnection or a wireless interconnection in the form of WiFi, Bluetooth or the like. The device 1 further includes a control unit 8, For receiving instructions given by the user and suitable for further transmitting these instructions to the device 1, wherein the instructions are carried out by the respective components. In an exemplary embodiment of the invention, these instructions, for example, enter the desired magnification, focus, select the desired area to be imaged, store the processed image, further process the image, and the like. The invention is not limited to these functions mediated by the control unit 8 . An exemplary embodiment of the present invention further includes: a calibration unit 10 : an internal memory 11 communicatively connected to the control unit 8 and including an image of the sample 6 stored therein; and a calculation unit 12 adapted to calculate the displacement of the sample 6 . The control unit 6 gives instructions to move the sample 6 to a new position, and the console 5 moves the sample 6 to the new position. The calculation unit 12 receives information from the control unit 8 on the change of the position of the sample 6, or data on the position of the first sample 6 and the position of the second sample 6, and calculates a calculated sample 6 displacement value based on these data. This calculation of the displacement value of sample 6 is performed according to the following formula:

△Z=WD-Z,

Z _new = Z-△Z. (1/cos(α)-1)

as well as

_Ynew =Y+△Z. tan(α),

where ΔZ represents the calculated value by which the sample 6 must be displaced in the Z-axis direction after tilting the sample 6 by an angle α , WD represents the working distance parameter, or the distance from the observation point on the sample 6 of the objective 4, Y Indicates the current position in the Y-axis, and the calculated sample 6 displacement values in the Z- or Y-axis of _Znew and _Ynew , see Figures 6a and 6b.

Movement of the sample 6 includes translation, tilt and rotation. The translation is generally carried out along at least two axes that are perpendicular to each other, for example. For correct implementation of the present method of operation of the charged particle beam device 1, the possibility of translation along only one axis is sufficient. Alternatively, a console 5 that allows movement in three mutually perpendicular axes can then be selected. The rotor of sample 6 contains rotation about at least one axis Rotation, where this axis can be different from the axis of translational movement of the sample 6, the rotation of the sample can generally be carried out over the entire range of rotational movement, ie 360°. The tilt of the sample 6 is then determined by its tilt about an axis different from the axis of rotation. In the exemplary embodiment of a console, two independent rotational movements of the sample 6 can be performed about two mutually different axes. The rotational and translational movement of the sample 6 is achieved by the console 5 . The functions of the console can also be performed by other manipulators, eg a needle manipulator.

The tilting of the sample 6 can be achieved by two methods. The first method is the concentric tilt method, wherein the tilt axis 5a passes through the observation site on the sample 6, and when the sample 6 is tilted or rotated, the observation sample 6 area within the field of view of the charged particle beam device 1 moves significantly, and the observation sample site 13 Thereby it may be defocused, but more importantly, it may leave the field of view of the charged particle beam device 1 . The second method is the eccentric tilt method, in which the tilt axis passes through the observation sample 6 site.

In the context of the present application, charged particle beam device 1 means an electron microscope, in particular a Scanning Electron Microscope (SEM), Transmission Electron Microscope (TEM), Scanning Transmission Electron Microscope (STEM), Focused Ion Beam (FIB) device or Combined electron beam and focused ion beam device.

In an exemplary embodiment of the method of operation of the charged particle beam device 1 , see FIG. 2 , the sample 6 to be processed, analyzed or observed is positioned at a corresponding location on the console 5 . The working chamber 14 of the charged particle beam apparatus 1 is closed and pumped to the desired pressure below atmospheric pressure, and the sample 6 is adjusted by the console 5 to the first sample 6 position. In the first sample 6 position, the sample 6 is then illuminated by a beam of charged particles, which is focused and shaped by the condenser 3 and the objective 4 . The interaction of the charged particle beam with the sample 6 results in the generation of signal particles, such as backscattered electrons, secondary electrons or photons. These particles are then detected by the signal particle detector 7 . The signals of these particles captured by the signal particle detector 7 are then processed by the display unit 9 . Signal processing by the display unit 9 produces at least a An initial sample 6 image, which is then stored in memory 11. In the next step, the control unit 8 gives instructions to move the sample 6 to a second sample 6 position different from the first sample 6 position. The control unit 8 relays this instruction to the charged particle beam device 1 and the sample 6 is moved from the console 5 to the second sample 6 position. At the same time, the sample 6 is irradiated by the charged particle beam at a position different from the first digit. The particles are scattered from the sample 6 or signal particles are released from the sample 6 due to the interaction of the charged particle beam with the sample 6 . The signal is then captured by the signal particle detector 7 and at least one image of the auxiliary sample 6 in a position different from the position of the first sample 6 is generated from this signal by the display unit 9 and then stored in the memory 11 . In the following steps, a comparison of the primary sample 6 image and the auxiliary sample 6 image for the pair is performed. The comparison of the images of the pair is performed using the calculation unit 12 of the correction unit 10 . The output of this comparison then determines the sample 6 displacement value, or the value of the movement of the observation site 13 of the sample 6 relative to the field of view of the charged particle beam device 1, caused by the rotation and/or tilt of the sample 6, and in During this movement, the observation site 13 on the sample 6 may be partially out of the field of view of the charged particle beam device 1, and further, the height and position of the observation site 13 relative to the device 1 may be changed, thereby defocusing or shifting the image. In an exemplary embodiment of the invention, the comparison of the primary sample 6 image and the auxiliary sample 6 image of the pair is performed by a correlation or cross-correlation method. The sample 6 is then moved to a third sample 6 position different from the first and second sample positions by the determined sample 6 shift value. The exemplary embodiment of the method of operation of the charged particle beam device 1 according to FIG. 3 is identical to the exemplary embodiment of the method of operation of the charged particle beam device 1 according to FIG. 2 , except that the auxiliary sample 6 image is generated in the second sample 6 position .

In signal processing, correlation is a function that describes the similarity in shape of signals. In the case of a pair of signals that are similar in waveform but may be shifted by a phase shift φ by a certain value, the cross-correlation of these signals produces a mutual shift of these signals. In the case of, for example, a two-dimensional signal corresponding to a pair of images shape, the cross-correlation of the signal can also be used. In an exemplary embodiment of the invention, a software module implemented in the calculation unit 12 of the calibration unit 10 allows the cross-correlation function of the signals at different sample 6 locations to be applied to a pair of sample 6 images. The result of this process is the determined sample 6 shift value.

Based on the above obtained displacement value of the sample 6 calculated by the calibration unit 10 using the above method, the sample 6 is moved on the console 5 to a third sample 6 position different from the first and second sample 6 positions. Moving the sample 6 to the third position involves only translational movement, no rotation or tilting of the sample 6 is required.

In another exemplary embodiment of the method of operation of the charged particle beam device 1 , see FIG. 4 , the sample 6 to be processed, analyzed or observed is located in a corresponding position on the console 5 . The working chamber 15 of the charged particle beam apparatus 1 is closed and pumped to the desired pressure below atmospheric pressure. The sample 6 is adjusted to the position of the first sample 6 by the console 5 . In the first sample 6 position, the sample 6 is then illuminated by the charged particle beam focused by the condenser 3 and the objective 4 . The interaction of the charged particle beam with the sample 6 results in the generation of signal particles, eg backscattered electrons, secondary electrons or photons. These particles are then detected by the signal particle detector 7 . The signals of these particles captured by the signal particle detector 7 are then processed by the display unit 9 . Signal processing by the display unit 9 generates at least one initial sample 6 image in the first sample 6 location, which initial sample 6 image is then stored in the memory 11 . In the next step, the control unit 8 gives instructions to move the sample 6 to a second sample 6 position different from the first sample 6 position. The control unit 6 transmits the instruction to the charged particle beam apparatus 1 , and the sample 6 is moved from the console 5 to the second sample 6 position. This exemplary embodiment further comprises the step of generating at least one first auxiliary sample 6 image, the first auxiliary sample 6 image being recorded during the change of the sample 6 position from the first sample 6 position to the second sample 6 position; and At least one second auxiliary sample 6 image is generated, and the second auxiliary sample 6 image is recorded during the change of the position of the sample 6 from the first sample 6 position to the second sample position after the first auxiliary image. record. Furthermore, at least one last sample 6 image is generated at the second sample 6 location. These images are then stored in the memory 11 . Subsequently, the displacement value of the first intermediate sample 6 is determined by comparing the images of the first and second auxiliary samples 6 with the calculation unit 12 of the correction unit 10 . Subsequently, the third intermediate sample 6 displacement value is determined by comparing the second auxiliary image with the final sample 6 image by means of the calculation unit 12 of the correction unit 10 . The determined sample shift value is then given by the sum of the first, second and third intermediate sample 6 shift values. In this exemplary embodiment of the invention, the comparison of the sample 6 images of the pair is performed by a correlation or cross-correlation method. The sample 6 is then moved from the second sample 6 position to a third position different from the first and second sample positions by the determined sample shift value.

The exemplary embodiment of the method of operation of the charged particle beam device 1 according to Figures 5a and 5b is identical to the exemplary embodiment of the method of operation of the charged particle beam device according to Figures 3 and 4, except that the sample 6 is shifted by the sample 6 value determined by Moving from the second sample 6 position to the third sample position, the determined sample 6 shift value is given as the average of the calculated sample 6 shift value and the determined sample 6 shift value.

All exemplary embodiments of the method of operation of the charged particle beam apparatus 1 further comprise the step of generating at least one mark on the sample 6 . In this exemplary embodiment, label generation is accomplished by a focused ion beam (FIB). The ion beam is focused on a specific spot on the sample 6, where the impact of charged particles (ions) on the sample 6 produces so-called sputtering of the sample 6, in which atoms and molecules of the studied sample 6 are ejected due to the impact of the ions. Thus, a label can be produced on sample 6. The creation of this mark facilitates orientation on the sample 6, especially when the surface structure of the sample 6 is homogeneous and free of significant relief. The creation of the marks on the sample 6 leads to an increase in the correctness of the calculation of the displacement of the sample 6 by the cross-correlation method, especially when, for example, the structure of the analyzed sample 6 is smooth and without significant relief. The marks on sample 6 then serve as auxiliary points for the cross-correlation algorithm.

In another example of the method of operation of the charged particle beam apparatus 1 according to the present invention In an embodiment, the operation of the apparatus 1 may be implemented as follows and according to Fig. 3 or 5a. See Figure 6a, the sample 6 is positioned on the console 5 and moved to the first sample 6 position. In the first sample 6 position, the sample 6 is positioned such that the at least one stage 5 tilt axis 5a passes directly through the sample 6 . Subsequently, the observation site 13 of the sample 6 is selected for further observation or processing. Using the condenser 3 and the objective 4, the charged particle beam is focused and directed towards the observation site 13 of the sample 6. Furthermore, the initial sample 6 image in the first position is recorded and stored in the memory 11 . Subsequently, see Fig. 6b, the sample 6 is moved to the second sample 6 position, wherein the sample 6 remains in the field of view of the device 1 throughout the change of position, but the position of the observation site 13 may change. After the sample 6 is positioned in the second sample 6 position, an image of the auxiliary sample 6 in the second position is generated and stored in the memory 11 . The field of view of the charged particle beam device 1 is the area from which an image is generated after the area has been scanned by a charged particle beam or a camera or other device capable of generating an image of the area. In the next stage, a pair of images is selected, wherein the first image of the pair is the original sample 6 image in the first sample 6 position and the second image of the pair is the auxiliary sample 6 image in the second sample 6 position. The pair of images is then processed by the calculation unit 12 of the correction unit 10, wherein the comparison of the pair of images is performed by the method of cross-correlation of the pair of images. This processing of the images results in a determined sample 6 shift value specifying the deflection of the viewing position 13 of the sample 6 at the second position relative to the first position. The calculation unit 12 may further specify a calculated sample 6 shift value, which shift value is specified by calculation according to the above-mentioned relationship from the data about the input sample 6 position change value. Data means eg coordinates of the position of the sample 6 and values describing eg its angular orientation with respect to the axis of the charged particle beam device 1 . The determined sample 6 shift value can then be assigned as the average of the calculated value and the determined value obtained by comparing the original sample 6 image and the auxiliary sample 6 image. Afterwards, the sample 6 is moved by the sample 6 displacement value to a third sample 6 position different from the first and second sample 6 positions, wherein in Fig. 6c, moving the sample 6 to the third sample 6 position includes only translational movement.

In addition, the image of the sample 6 can also be obtained using another recording medium, such as a camera, an infrared camera or an ICCD camera.

Industrial availability

The methods and devices described above may be used in the field of electron microscopy or other devices that use charged particle beams for sample processing and/or observation.

1: Charged particle beam device

2: Charged particle source

3: Condenser

4: Objective lens

5: Console

6: Sample

7: Signal particle detector

8: Control unit

9: Display unit

10: Correction unit

11: Memory

12: Computing unit

15: Studio

Claims (6)

A method of operating a charged particle beam device (1), comprising: a charged particle source (2); at least one lens (3.4) adapted to shape the charged particle beam or focus the particle beam on a selected area; a a console (5) for positioning the sample (6), suitable for changing the position of the sample (6) on which the sample (6) is positioned; a detector (7) for signal particles, the isosignal particles scattered from the sample (6) or emitted from the sample (6); a control unit (8) adapted to receive instructions to operate the device (1) and transmit instructions to the device (1); a display unit (9), communicatively connected to the signal particle detector (7) and adapted to generate a sample (6) image based on the signal particles detected by the signal particle detector (7); a calibration unit (10) , comprising a memory (11) suitable for storing the images and a memory (11) suitable for calculating the displacement of the sample (6), characterized in that the method comprises the following series of steps: moving the sample (6) to a first position; generating at least one initial sample (6) image in the first location and storing the image in the memory (11), wherein the image is generated by the display unit (9); moving the sample (6) to a second position different from the first position, wherein the sample (6) position changes due to rotation or tilting of the sample (6), wherein the sample (6) remains in the sample (6) the entire time generating at least one image of a first auxiliary sample (6) in the field of view of the device (1) and at a position different from the position of the first sample (6), and storing this image in the memory (11), wherein The image is generated by the display unit (9); determining the sample (6) displacement value by comparing at least one pair of the original and the first auxiliary sample (6) images with the calculation unit (12) of the correction unit (10); and moving the sample (6) to a third position different from the first position and the second sample (6) position by the determined sample (6) displacement value, wherein the displacement includes only translation and using the console (5) Carry out. The method of operation of the charged particle beam device (1) as claimed in claim 1, wherein the first auxiliary sample (6) image is generated in the position of the second sample (6). The operation method of the charged particle beam device (1) according to the claim 1, wherein the image of the first auxiliary sample (6) is generated during the change of the position of the sample (6), and subsequently, at least one second auxiliary sample ( 6) An image is generated at the position of the second sample (6), wherein at least a first intermediate sample (6) shift value is compared with the first and the first by the calculation unit (12) of the correction unit (10) The auxiliary sample (6) image is determined and, moreover, a second intermediate sample (6) shift value is determined by comparing the first and second auxiliary samples (6) by using the calculation unit (12) of the calibration unit (10) The image is determined, and a third intermediate sample (6) shift value is determined by comparing the second auxiliary image and the final sample (6) image by the calculation unit (12) of the calibration unit (10), wherein the The determined sample (6) shift value is given by the sum of the first, second and third intermediate sample (6) shift values, wherein the images are generated by the display unit (9) and stored in the memory (11). The method of operation of a charged particle beam apparatus (1) as claimed in any one of claims 1 to 3, wherein the calculation unit (12) calculates a calculated sample (6) from a value specifying a position change of the sample (6) ) shift value, where the determined sample shift value is specified as the average of the calculated shift value and the determined shift value. The method of operation of a charged particle beam apparatus (1) according to any one of claims 1 to 4 of the claimed scope, wherein a mark is produced on the surface of the sample (6) using the charged particle beam. The method of operation of a charged particle beam device (1) according to any one of claims 1 to 5 of the claimed scope, wherein the comparison of the images of the samples (6) is performed by cross-correlation.

Images