TW202205695A - Light emitting device and manufacturing method thereof - Google Patents

Light emitting device and manufacturing method thereof Download PDF

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TW202205695A
TW202205695A TW110136353A TW110136353A TW202205695A TW 202205695 A TW202205695 A TW 202205695A TW 110136353 A TW110136353 A TW 110136353A TW 110136353 A TW110136353 A TW 110136353A TW 202205695 A TW202205695 A TW 202205695A
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light
emitting
electrode
layer
diode
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TW110136353A
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Chinese (zh)
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廖世安
許明祺
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晶元光電股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • H01L25/167Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52Encapsulations
    • H01L33/54Encapsulations having a particular shape

Abstract

The invention discloses a light-emitting device and a manufacturing method thereof. The light-emitting device comprising: a light-emitting unit, the light-emitting unit comprises a non-light-emitting element and a light-emitting diode; a reflective layer covering the non-light-emitting element; a light-transmitting layer covering the reflective layer and the light-emitting diode; a metal connecting layer electrically connecting the non-light-emitting element and the light-emitting diode.

Description

發光裝置及其製造方法Light-emitting device and method of manufacturing the same

本發明涉及一種發光裝置及其製造方法,尤其涉及一種包括穩壓二極體和發光二極體的發光裝置、及該發光裝置的製造方法。The present invention relates to a light-emitting device and a manufacturing method thereof, in particular to a light-emitting device comprising a voltage regulator diode and a light-emitting diode, and a manufacturing method of the light-emitting device.

為了防止EOS(Electrical Over Stress,電過載)與ESD(Electro-Static discharge,靜電釋放)對發光二極體(Light-Emitting Diode,LED)的破壞,在電路中通常會加上一些具有齊納特性的電子元件。這種具有齊納特性的電子元件平時不影響電路運作,在瞬態湧浪時能導引這種非常態的放電電流到接地端,保護線路與發光二極體。常用的電子元件有齊納二極體(Zener Diode)、瞬態抑制二極體 (Transient Voltage Suppressor Diode,TVS Diode),或表面貼裝電阻器(Varistor)。In order to prevent EOS (Electrical Over Stress, electrical overload) and ESD (Electro-Static discharge, electrostatic discharge) from damaging the light-emitting diode (Light-Emitting Diode, LED), some Zener characteristics are usually added to the circuit. of electronic components. This kind of electronic component with Zener characteristic does not affect the operation of the circuit at ordinary times, and can guide this abnormal discharge current to the ground terminal during the transient surge, so as to protect the circuit and the light-emitting diode. Commonly used electronic components are Zener Diode, Transient Voltage Suppressor Diode (TVS Diode), or Surface Mount Resistor (Varistor).

如第1圖所示,一般常見的封裝方法是在發光二極體封裝體中,加入一與發光二極體並聯連接的齊納二極體以保護發光二極體,例如:齊納二極體的p極(陽極或正極)Za電連接至發光二極體的n極(陰極或負極)Bc,齊納二極體的n極(陰極或負極)Zc電連接至發光二極體的p極(陽極或正極)Ba。其製造方法包括將發光二極體和齊納二極體放置於一承載基板上,利用打線方式進行電性連接,但是這種製造方法複雜且封裝結構的體積無法縮小。As shown in Figure 1, a common packaging method is to add a Zener diode connected in parallel with the light-emitting diode in the light-emitting diode package to protect the light-emitting diode, for example: a Zener diode The p-pole (anode or positive) Za of the body is electrically connected to the n-pole (cathode or negative) Bc of the light-emitting diode, and the n-pole (cathode or negative) Zc of the Zener diode is electrically connected to the p-pole of the light-emitting diode pole (anode or positive) Ba. The manufacturing method includes placing the light emitting diode and the zener diode on a carrier substrate, and making electrical connection by wire bonding, but the manufacturing method is complicated and the volume of the package structure cannot be reduced.

針對相關技術中的上述問題,目前尚未提出有效的解決方案。For the above-mentioned problems in the related art, no effective solution has yet been proposed.

為了解決現有技術中存在的問題,根據本發明的實施例,提供了一種發光裝置,包括:發光單元,所述發光單元包括非發光元件和發光二極體;反射層,覆蓋所述非發光元件;透光層,覆蓋所述所述反射層和所述發光二極體;金屬連接層,電連接非發光元件和發光二極體。In order to solve the problems existing in the prior art, according to an embodiment of the present invention, a light-emitting device is provided, comprising: a light-emitting unit, the light-emitting unit includes a non-light-emitting element and a light-emitting diode; a reflective layer covering the non-light-emitting element a light-transmitting layer covering the reflective layer and the light-emitting diode; a metal connection layer electrically connecting the non-light-emitting element and the light-emitting diode.

以下公開內容提供了用於實現本發明的不同特徵的許多不同的實施例或實例。下面描述了元件和佈置的具體實例以簡化本發明。當然,這些僅僅是實例,而不旨在限制本發明。例如,在以下描述中,在第二部件上方或者上形成第一部件可以包括第一部件和第二部件以直接接觸的方式形成的實施例,並且也可以包括在第一部件和第二部件之間可以形成額外的部件,從而使得第一部件和第二部件可以不直接接觸的實施例。The following disclosure provides many different embodiments or examples for implementing different features of the invention. Specific examples of components and arrangements are described below to simplify the disclosure. Of course, these are only examples and are not intended to limit the invention. For example, in the following description, forming the first part over or on the second part may include embodiments in which the first part and the second part are formed in direct contact, and may also include between the first part and the second part Embodiments in which additional components may be formed between, so that the first and second components may not be in direct contact.

另外,為便於描述,在此可以使用諸如“在…下面”、“在…下方”、“下”、“在…之上”、“上”等的空間相對術語,以描述如圖中所示的一個元件或部件與另一個(或另一些)元件或部件的關係。除了圖中所示的方位外,空間相對術語旨在包括器件在使用或操作中的不同方位。裝置可以以其他方式定向(旋轉90度或在其他方位上),並且在此使用的空間相對描述符可以同樣地作相應的解釋。Additionally, for ease of description, spatially relative terms such as "below", "below", "under", "above", "on", etc. may be used herein to describe what is shown in the figures The relationship of one element or part to another (or other) elements or parts. In addition to the orientation shown in the figures, spatially relative terms are intended to encompass different orientations of the device in use or operation. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

第2A圖至第2J圖是根據本發明實施例的發光裝置的製造方法的流程示意圖。如第2A圖、第2B圖所示,提供第一暫時載板102;在第一暫時載板102上設置多個發光單元,各個發光單元均包括穩壓二極體104(非發光元件)和發光二極體106(發光元件)。穩壓二極體104具有電極1041且發光二極體106具有電極1061。實際上,穩壓二極體104及發光二極體106分別具有兩電極(參考第3A圖所示),由於視圖關係,第2A圖至第2J圖僅顯示一電極。2A to 2J are schematic flowcharts of a method for manufacturing a light-emitting device according to an embodiment of the present invention. As shown in FIGS. 2A and 2B, a first temporary carrier board 102 is provided; a plurality of light-emitting units are arranged on the first temporary carrier board 102, and each light-emitting unit includes a zener diode 104 (non-light-emitting element) and Light emitting diode 106 (light emitting element). Zener diode 104 has electrode 1041 and light emitting diode 106 has electrode 1061 . Actually, the zener diode 104 and the light emitting diode 106 respectively have two electrodes (refer to FIG. 3A ). Due to the view, only one electrode is shown in FIGS. 2A to 2J .

如第2A圖所示,可先設置多個穩壓二極體104於第一暫時載板102上且電極1041面向第一暫時載板102。在一些實施例中,穩壓二極體104可為齊納二極體或TVS二極體。在本實施例中,穩壓二極體104為齊納二極體。As shown in FIG. 2A , a plurality of zener diodes 104 may be disposed on the first temporary carrier 102 with the electrodes 1041 facing the first temporary carrier 102 . In some embodiments, the zener diode 104 may be a Zener diode or a TVS diode. In this embodiment, the zener diode 104 is a Zener diode.

如第2B圖所示,設置多個發光二極體106於第一暫時載板102上且分別與多個穩壓二極體104相鄰。多個發光二極體106的電極1061面向第一暫時載板102。在本實施例中,以發光二極體106和穩壓二極體104的數量均為四個進行說明。再者,一發光二極體106及一穩壓二極體104視為一發光單元。然於其他實施例,一發光單元可包含二個以上的發光二極體106及一穩壓二極體104。或者一發光單元可包含一發光二極體106及二個以上的穩壓二極體104。或者一發光單元可包含二個以上的發光二極體106及二個以上的穩壓二極體104。As shown in FIG. 2B , a plurality of light emitting diodes 106 are disposed on the first temporary carrier 102 and adjacent to the plurality of zener diodes 104 respectively. The electrodes 1061 of the plurality of light emitting diodes 106 face the first temporary carrier 102 . In this embodiment, the number of the light-emitting diodes 106 and the voltage-stabilizing diodes 104 is both four for description. Furthermore, a light-emitting diode 106 and a zener diode 104 are regarded as a light-emitting unit. However, in other embodiments, a light-emitting unit may include more than two light-emitting diodes 106 and a zener diode 104 . Alternatively, a light-emitting unit may include a light-emitting diode 106 and two or more voltage-stabilizing diodes 104 . Alternatively, a light-emitting unit may include two or more light-emitting diodes 106 and two or more voltage-stabilizing diodes 104 .

如第2C圖、第2D圖所示,在第一暫時載板102上形成第一絕緣層110,第一絕緣層110覆蓋多個穩壓二極體104和多個發光二極體106。在本實施例中,第一絕緣層110為透光層。可選擇性地將螢光粉粒子混入於透光層中。第一絕緣層110可包括矽膠(silicone)或環氧樹脂(epoxy)其中,第一絕緣層110可以是以點膠 (dispensing)、噴塗(spraying)、或鑄模(molding)的方式形成。在本實施例中,以點膠(dispensing)108方式來做例示。As shown in FIGS. 2C and 2D , a first insulating layer 110 is formed on the first temporary carrier 102 , and the first insulating layer 110 covers the plurality of voltage regulator diodes 104 and the plurality of light emitting diodes 106 . In this embodiment, the first insulating layer 110 is a light-transmitting layer. Optionally, phosphor particles can be mixed into the light-transmitting layer. The first insulating layer 110 may include silicone or epoxy, wherein the first insulating layer 110 may be formed by dispensing, spraying, or molding. In this embodiment, dispensing 108 is used as an example.

如第2D圖所示,對透光層進行一個物理性移除步驟,例如研磨或拋光,以形成在後續製造流程中與第二暫時載板114進行接合的表面112。As shown in FIG. 2D, a physical removal step, such as grinding or polishing, is performed on the light-transmitting layer to form a surface 112 for bonding with the second temporary carrier 114 in a subsequent manufacturing process.

如第2E圖所示,接合第二暫時載板114,以使多個發光二極體106及多個穩壓二極體104位於相對設置的第一暫時載板102與第二暫時載板114之間,即接合第二暫時載板114至透光層的表面112。As shown in FIG. 2E , the second temporary carrier 114 is joined so that the plurality of light emitting diodes 106 and the plurality of zener diodes 104 are located on the first temporary carrier 102 and the second temporary carrier 114 which are opposite to each other. In between, that is, bonding the second temporary carrier 114 to the surface 112 of the light-transmitting layer.

如第2F圖所示,在翻轉如第2E圖的結構並移除第一暫時載板102之後,在任意兩個相鄰的發光單元之間形成溝槽116。換言之,溝槽116形成於一發光單元之穩壓二極體104與另一相鄰之發光單元之發光二極體106之間。As shown in FIG. 2F, after flipping the structure as shown in FIG. 2E and removing the first temporary carrier 102, a trench 116 is formed between any two adjacent light emitting cells. In other words, the trench 116 is formed between the zener diode 104 of one light-emitting unit and the light-emitting diode 106 of another adjacent light-emitting unit.

如第2G圖所示,於溝槽116填充白膠層118。白膠層118由反射粒子混入於基質形成,可反射發光二極體106所發出的光,因此也可視為反射層。白膠層118的顏色可取決於混入的反射粒子,常見的顏色為白色,因此稱為白膠層。基質可為絕緣材料且包括矽膠基質(silicone-based)或環氧基質(epoxy-based);反射粒子可包括二氧化鈦、二氧化矽、硫酸鋇、或氧化鋁。其中,白膠層118可以是以點膠 (dispensing)、噴塗(spraying)、印刷(printing)或鑄模(molding)的方式形成。在本實施例中,以點膠 (dispensing)120方式來做例示。As shown in FIG. 2G , the white glue layer 118 is filled in the trench 116 . The white glue layer 118 is formed by mixing reflective particles into the matrix, and can reflect the light emitted by the light emitting diode 106, so it can also be regarded as a reflective layer. The color of the white glue layer 118 may depend on the reflective particles mixed in, and the common color is white, so it is called the white glue layer. The matrix can be an insulating material and includes silicone-based or epoxy-based; the reflective particles can include titanium dioxide, silicon dioxide, barium sulfate, or aluminum oxide. The white glue layer 118 may be formed by dispensing, spraying, printing or molding. In this embodiment, dispensing 120 is used as an example.

如第2H圖、第2I圖所示,在多個發光單元的遠離第二暫時載板114的一側形成金屬連接層。As shown in FIGS. 2H and 2I , a metal connection layer is formed on the side of the plurality of light emitting units away from the second temporary carrier 114 .

在一個實施例中,如第2H圖所示,分別在各個穩壓二極體104的電極1041和各個發光二極體106的電極1061上覆蓋保護層122;在各個保護層之間填充第二絕緣層124。第二絕緣層124可為前述的白膠層。該保護層122可為光致抗蝕劑(例如:光阻)。In one embodiment, as shown in FIG. 2H, the protective layer 122 is respectively covered on the electrode 1041 of each zener diode 104 and the electrode 1061 of each light-emitting diode 106; a second protective layer is filled between the protective layers. Insulating layer 124 . The second insulating layer 124 may be the aforementioned white glue layer. The protective layer 122 can be a photoresist (eg, photoresist).

在另一實施例中,可利用印刷技術(printing)直接形成第二絕緣層124於白膠層118以及第一絕緣層110上,因此不需要於電極1041、1061上形成保護層122,以簡易製程。於特定選用的製程方式下,第二絕緣層124亦可以被形成於電極1041、1061上,例如,第二絕緣層124覆蓋電極1041、1061之周緣,但不覆蓋其中間部分。In another embodiment, the second insulating layer 124 can be directly formed on the white glue layer 118 and the first insulating layer 110 by using printing technology, so it is not necessary to form the protective layer 122 on the electrodes 1041 and 1061 to simplify the Process. The second insulating layer 124 may also be formed on the electrodes 1041 and 1061 under a specific selected process. For example, the second insulating layer 124 covers the peripheries of the electrodes 1041 and 1061 but does not cover the middle portions thereof.

如第2I圖所示,移除保護層122且暴露出電極1041、1061,在電極1041、1061和第二絕緣層124上形成金屬連接層128,其中金屬連接層128連接於各個穩壓二極體104的電極1041和各個發光二極體106的電極1061(詳細結構可參考第3A圖和第3B圖)。金屬連接層128可通過一印刷技術(printing)或電鍍而形成。金屬連接層128的材料包含鈦、銅、鎳、銀、錫、金、鉑金或其組合。As shown in FIG. 2I, the protective layer 122 is removed and the electrodes 1041, 1061 are exposed, and a metal connection layer 128 is formed on the electrodes 1041, 1061 and the second insulating layer 124, wherein the metal connection layer 128 is connected to each zener diode The electrode 1041 of the body 104 and the electrode 1061 of each light emitting diode 106 (for the detailed structure, please refer to FIG. 3A and FIG. 3B ). The metal connection layer 128 may be formed by a printing technique or electroplating. The material of the metal connection layer 128 includes titanium, copper, nickel, silver, tin, gold, platinum, or a combination thereof.

如第2J圖所示,切割金屬連接層128、第二絕緣層124及白膠層118,最後移除第二暫時載板114以形成多個發光裝置130。其中,形成多個發光裝置130的切割是根據白膠層118的位置來進行切割,即延著直線L進行切割。發光裝置130包括發光單元、第一絕緣層110、白膠層118、第二絕緣層124及金屬連接層128。各個發光單元中的穩壓二極體104和發光二極體106相互電連接。第一絕緣層110覆蓋穩壓二級管104及發光二極體106。As shown in FIG. 2J , the metal connection layer 128 , the second insulating layer 124 and the white glue layer 118 are cut, and finally the second temporary carrier 114 is removed to form a plurality of light emitting devices 130 . The cutting for forming the plurality of light-emitting devices 130 is performed according to the position of the white glue layer 118 , that is, the cutting is performed along the straight line L. The light-emitting device 130 includes a light-emitting unit, a first insulating layer 110 , a white glue layer 118 , a second insulating layer 124 and a metal connection layer 128 . The zener diode 104 and the light emitting diode 106 in each light emitting unit are electrically connected to each other. The first insulating layer 110 covers the zener diode 104 and the light emitting diode 106 .

如第3A圖和第3B圖所示,示例性地示出了一個實施例中,一發光裝置131的仰視圖和剖視圖。第3B圖為第3A圖 X-X線段之剖面圖。為了清楚表示各個元件的相對關係,各個元件系以實線繪製。然,實際產品,於發光裝置131的仰視圖僅能視得第二絕緣層124及金屬連接層128。As shown in FIGS. 3A and 3B , a bottom view and a cross-sectional view of a light-emitting device 131 in one embodiment are exemplarily shown. Fig. 3B is a cross-sectional view of the line X-X of Fig. 3A. In order to clearly show the relative relationship of the various elements, the various elements are drawn with solid lines. However, in an actual product, only the second insulating layer 124 and the metal connection layer 128 can be seen in the bottom view of the light-emitting device 131 .

如第3A圖所示,發光二極體106具有兩電極1061(第一電極1061A和第二電極1061B)。舉例來說,第一電極1061A為p極(陽極或正極),第二電極1061B為n極(陰極或負極)。穩壓二極體104具有兩電極1041(第三電極1041A和第四電極1041B)。第三電極1041A為p極,第四電極1041B為 n極。金屬連接層包含第一連接部128A及第二連接部128B。第一連接部128A直接覆蓋並接觸發光二極體106的第一電極1061A(p極)及穩壓二極體104的第四電極1041B(n極),藉此發光二極體106的第一電極1061A(p極)連接於穩壓二極體104的第四電極1041B(n極)。類似的,第二連接部128B直接覆蓋並接觸發光二極體106的第二電極1061B (n極)及穩壓二極體104的第三電極1041A(p極),藉此發光二極體106的第二電極1061B (n極)連接於穩壓二極體104的第三電極1041A(p極)。因此,發光二極體106與穩壓二極體104為反向並聯連接(等效電路圖可參考第1圖)。此外,於第3A圖之仰視圖中,第一連接部128A完全覆蓋接觸發光二極體106的第一電極1061A(p極)且未完全覆蓋穩壓二極體104的第四電極1041B(n極);第二連接部128B完全覆蓋發光二極體106的第二電極1061B (n極)且未完全覆蓋穩壓二極體104的第三電極1041A(p極)。未被金屬連接層覆蓋的穩壓二極體104的第三電極1041A(p極)及第四電極1041B(n極)系被第二絕緣層124所覆蓋。換言之,穩壓二極體104第三電極1041A(p極)(第四電極1041B(n極))具有一部分被第一連接部128A(第二連接部128B)所覆蓋,而另一部分被絕緣層所覆蓋。再者,白膠層118僅覆蓋第一絕緣層110的相對兩側。As shown in FIG. 3A , the light emitting diode 106 has two electrodes 1061 (a first electrode 1061A and a second electrode 1061B). For example, the first electrode 1061A is a p-pole (anode or anode), and the second electrode 1061B is an n-pole (cathode or anode). The Zener diode 104 has two electrodes 1041 (a third electrode 1041A and a fourth electrode 1041B). The third electrode 1041A is a p-pole, and the fourth electrode 1041B is an n-pole. The metal connection layer includes a first connection portion 128A and a second connection portion 128B. The first connection portion 128A directly covers and contacts the first electrode 1061A (p-pole) of the light-emitting diode 106 and the fourth electrode 1041B (n-pole) of the zener diode 104 , whereby the first electrode 1061A (n-pole) of the light-emitting diode 106 The electrode 1061A (p-pole) is connected to the fourth electrode 1041B (n-pole) of the zener diode 104 . Similarly, the second connection portion 128B directly covers and contacts the second electrode 1061B (n-pole) of the light-emitting diode 106 and the third electrode 1041A (p-pole) of the zener diode 104 , whereby the light-emitting diode 106 The second electrode 1061B (n pole) of the zener diode 104 is connected to the third electrode 1041A (p pole) of the zener diode 104 . Therefore, the light-emitting diodes 106 and the zener diodes 104 are connected in anti-parallel connection (for an equivalent circuit diagram, please refer to FIG. 1 ). In addition, in the bottom view of FIG. 3A , the first connecting portion 128A completely covers the first electrode 1061A (p-pole) contacting the light-emitting diode 106 and does not completely cover the fourth electrode 1041B (n-pole) of the zener diode 104 The second connection portion 128B completely covers the second electrode 1061B (n-pole) of the light-emitting diode 106 and does not completely cover the third electrode 1041A (p-pole) of the zener diode 104 . The third electrode 1041A (p-pole) and the fourth electrode 1041B (n-pole) of the zener diode 104 not covered by the metal connection layer are covered by the second insulating layer 124 . In other words, the third electrode 1041A (p-pole) (the fourth electrode 1041B (n-pole)) of the Zener diode 104 has a part covered by the first connection part 128A (the second connection part 128B), and the other part is covered by the insulating layer covered. Furthermore, the white glue layer 118 only covers two opposite sides of the first insulating layer 110 .

根據本發明實施例的製造方法,利用CSP(晶片級封裝)的製造方法,將具有抗靜電衝擊保護功能的穩壓二極體先排片在第一暫時基板上,再將發光二極體晶片放置旁邊,經過點膠、拋平、翻轉切割、與網印製程,最後將穩壓二極體和發光二極體進行電性連接。本發明提供了一種無基板、製程簡單的發光裝置的製造方法,且由該製造方法製得的發光裝置體積小、並具有相同功能的CSP封裝結構。According to the manufacturing method of the embodiment of the present invention, using the CSP (Chip Level Packaging) manufacturing method, the voltage stabilizing diodes with anti-static shock protection function are firstly arranged on the first temporary substrate, and then the light emitting diode chips are placed Next, after the process of dispensing, polishing, flip cutting, and screen printing, the voltage regulator diode and the light emitting diode are finally electrically connected. The invention provides a manufacturing method of a light-emitting device without a substrate and a simple process, and the light-emitting device obtained by the manufacturing method has a small volume and a CSP package structure with the same function.

第4A圖至第4H圖是根據本發明實施例的發光裝置的製造方法的流程示意圖。如第4A圖、第4B圖所示,提供第一暫時載板102;在第一暫時載板102上設置多個發光單元,各個發光單元均包括穩壓二極體104和發光二極體106。穩壓二極體104具有電極1041且發光二極體106具有電極1061。實際上,穩壓二極體104及發光二極體106分別具有兩電極(參考第5A圖所示),由於視圖關係,第4A圖至第4H圖僅顯示一電極。4A to 4H are schematic flowcharts of a method for manufacturing a light emitting device according to an embodiment of the present invention. As shown in FIG. 4A and FIG. 4B , a first temporary carrier board 102 is provided; a plurality of light emitting units are arranged on the first temporary carrier board 102 , and each light emitting unit includes a voltage regulator diode 104 and a light emitting diode 106 . Zener diode 104 has electrode 1041 and light emitting diode 106 has electrode 1061 . Actually, the zener diode 104 and the light emitting diode 106 respectively have two electrodes (refer to FIG. 5A ). Due to the view, only one electrode is shown in FIGS. 4A to 4H .

如第4A圖所示,可先設置多個穩壓二極體104於第一暫時載板102上且電極1041面向第一暫時載板102。在一些實施例中,穩壓二極體104可為齊納二極體或TVS二極體。在本實施例中,穩壓二極體104為齊納二極體。在本實施例中,以發光二極體106和齊納二極體104的數量均為四個進行說明。類似地,一發光二極體106及一穩壓二極體104視為一發光單元。然於其他實施例,一發光單元可包含二個以上的發光二極體106及一穩壓二極體104。或者一發光單元可包含一發光二極體106及二個以上的穩壓二極體104。或者一發光單元可包含二個以上的發光二極體106及二個以上的穩壓二極體104As shown in FIG. 4A , a plurality of zener diodes 104 may be disposed on the first temporary carrier board 102 with the electrodes 1041 facing the first temporary carrier board 102 . In some embodiments, the zener diode 104 may be a Zener diode or a TVS diode. In this embodiment, the zener diode 104 is a Zener diode. In this embodiment, the number of the light emitting diodes 106 and the Zener diodes 104 is both four for description. Similarly, a light-emitting diode 106 and a zener diode 104 are regarded as a light-emitting unit. However, in other embodiments, a light-emitting unit may include more than two light-emitting diodes 106 and a zener diode 104 . Alternatively, a light-emitting unit may include a light-emitting diode 106 and two or more voltage-stabilizing diodes 104 . Alternatively, a light-emitting unit may include two or more light-emitting diodes 106 and two or more voltage-stabilizing diodes 104

如第4B圖所示,形成分別覆蓋各個發光二極體106的多個透光層210。可選擇性地將螢光粉粒子混入於透光層中。透光層可包括矽膠(silicone)或環氧樹脂(epoxy)。透光層210僅覆蓋發光二極體106且未覆蓋穩壓二極體104。在一實施例中,可先將發光二極體106設置於第一暫時載板102上,再選擇性地塗布透光層210於發光二極體106上而不形成於穩壓二極體104上。或者,將已包覆好透光層210的發光二極體106設置於第一暫時載板102上。As shown in FIG. 4B , a plurality of light-transmitting layers 210 are formed to cover the respective light-emitting diodes 106 . Optionally, phosphor particles can be mixed into the light-transmitting layer. The light-transmitting layer may include silicone or epoxy. The light-transmitting layer 210 only covers the light-emitting diode 106 and does not cover the zener diode 104 . In one embodiment, the light-emitting diodes 106 may be disposed on the first temporary carrier 102 first, and then the light-transmitting layer 210 may be selectively coated on the light-emitting diodes 106 without being formed on the zener diodes 104 . superior. Alternatively, the light emitting diode 106 that has been coated with the light-transmitting layer 210 is disposed on the first temporary carrier 102 .

如第4C圖所示,在第一暫時載板102上形成白膠層118,白膠層118覆蓋多個穩壓二極體104和多個透光層210。白膠層118覆蓋發光二極體106但未直接接觸發光二極體106。白膠層118完全地覆蓋且直接接觸穩壓二極體104。白膠層118的材料可參考前述之相關段落。As shown in FIG. 4C , a white glue layer 118 is formed on the first temporary carrier 102 , and the white glue layer 118 covers the plurality of zener diodes 104 and the plurality of light-transmitting layers 210 . The white glue layer 118 covers the light emitting diode 106 but does not directly contact the light emitting diode 106 . The white glue layer 118 completely covers and directly contacts the zener diode 104 . For the material of the white glue layer 118, reference may be made to the above-mentioned relevant paragraphs.

如第4D圖所示,對白膠層118進行一個物理性移除步驟,例如研磨或拋光,以暴露覆蓋發光二極體106的透光層210,並形成在後續製造流程中與第二暫時載板114進行接合的表面212。如第4E圖所示,接合第二暫時載板114,以使多個發光二極體106及多個穩壓二極體104位於相對設置的第一暫時載板102與第二暫時載板114之間,即接合第二暫時載板114至表面212。As shown in FIG. 4D, a physical removal step, such as grinding or polishing, is performed on the white glue layer 118 to expose the light-transmitting layer 210 covering the light-emitting diode 106, and is formed in the subsequent manufacturing process with the second temporary carrier The surface 212 to which the plate 114 is to be joined. As shown in FIG. 4E , the second temporary carrier 114 is joined so that the plurality of light emitting diodes 106 and the plurality of zener diodes 104 are located on the first temporary carrier 102 and the second temporary carrier 114 which are opposite to each other. In between, that is, bonding the second temporary carrier plate 114 to the surface 212 .

如第4F圖、第4G圖所示,翻轉如第4E圖的結構並移除第一暫時載板102。在多個發光單元的遠離第二暫時載板114的一側形成金屬連接層128。As shown in FIGS. 4F and 4G , the structure shown in FIG. 4E is reversed and the first temporary carrier 102 is removed. A metal connection layer 128 is formed on a side of the plurality of light emitting units away from the second temporary carrier 114 .

具體地,如第4F圖所示,在移除第一暫時載板102之後,分別在各個穩壓二極體104的電極1041和各個發光二極體106的電極1061上覆蓋保護層122;在各個保護層122之間透過印刷製成而填充第二絕緣層124。第二絕緣層124的材料可為白膠。該保護層122可為光致抗蝕劑(例如:光阻)。Specifically, as shown in FIG. 4F, after removing the first temporary carrier plate 102, the protective layer 122 is respectively covered on the electrodes 1041 of the respective zener diodes 104 and the electrodes 1061 of the respective light-emitting diodes 106; The second insulating layer 124 is filled between the protective layers 122 by printing. The material of the second insulating layer 124 may be white glue. The protective layer 122 can be a photoresist (eg, photoresist).

如第4G圖所示,移除保護層122且暴露出電極1041、1061,在電極1041、1061和第二絕緣層124上形成金屬連接層128,其中金屬連接層128連接於各個穩壓二極體104的電極1041和各個發光二極體106的電極1061(詳細結構可參考第5A圖和第5B圖)。金屬連接層128可通過一印刷技術(printing)或電鍍而形成。金屬連接層128的材料包含鈦、銅、鎳、銀、錫、金、鉑金或其組合。As shown in FIG. 4G, the protective layer 122 is removed and the electrodes 1041, 1061 are exposed, and a metal connection layer 128 is formed on the electrodes 1041, 1061 and the second insulating layer 124, wherein the metal connection layer 128 is connected to each zener diode The electrode 1041 of the body 104 and the electrode 1061 of each light-emitting diode 106 (for the detailed structure, please refer to FIG. 5A and FIG. 5B ). The metal connection layer 128 may be formed by a printing technique or electroplating. The material of the metal connection layer 128 includes titanium, copper, nickel, silver, tin, gold, platinum, or a combination thereof.

如第4H圖所示,延著與第二暫時基板114垂直的方向,即延著直線L切割金屬連接層128、第二絕緣層124和白膠層118,最後,移除第二暫時載板114以形成多個發光裝置230。As shown in FIG. 4H, the metal connection layer 128, the second insulating layer 124 and the white glue layer 118 are cut along the direction perpendicular to the second temporary substrate 114, that is, along the line L, and finally, the second temporary carrier is removed 114 to form a plurality of light emitting devices 230 .

發光裝置230包括發光單元、透光層210、白膠層118、第二絕緣層124及金屬連接層128。各個發光單元中的穩壓二極體104和發光二極體106相互電連接。白膠層118圍繞透光層210且未覆蓋透光層210之上表面。The light-emitting device 230 includes a light-emitting unit, a light-transmitting layer 210 , a white glue layer 118 , a second insulating layer 124 and a metal connection layer 128 . The zener diode 104 and the light emitting diode 106 in each light emitting unit are electrically connected to each other. The white glue layer 118 surrounds the transparent layer 210 and does not cover the upper surface of the transparent layer 210 .

如第5A圖和第5B圖所示,示例性地示出了一個實施例中,一發光裝置231的仰視圖和剖視圖。第5B圖為第5A圖 X-X線段之剖面圖。為了清楚表示各個元件的相對關係,各個元件系以實線繪製。然,實際產品,於發光裝置231的仰視圖僅能視得第二絕緣層124及金屬連接層128。As shown in FIGS. 5A and 5B , a bottom view and a cross-sectional view of a light-emitting device 231 in one embodiment are exemplarily shown. Fig. 5B is a cross-sectional view of the line X-X in Fig. 5A. In order to clearly show the relative relationship of the various elements, the various elements are drawn with solid lines. However, in an actual product, only the second insulating layer 124 and the metal connection layer 128 can be seen in the bottom view of the light-emitting device 231 .

如第5A圖所示,發光二極體106具有兩電極1061(第一電極1061A和第二電極1061B)。第一電極1061A為p極(陽極或正極),第二電極1061B為n極(陰極或負極)。穩壓二極體104具有兩電極1041(第三電極1041A和第四電極1041B)。第三電極1041A為p極,第四電極1041B為 n極。金屬連接層包含第一連接部128A及第二連接部128B。第一連接部128A直接覆蓋並接觸發光二極體106的第一電極1061A(p極)及穩壓二極體104的第四電極1041B(n極),藉此發光二極體106的第一電極1061A(p極)連接於穩壓二極體104的第四電極1041B(n極)。類似的,第二連接部128B直接覆蓋並接觸發光二極體106的第二電極1061B (n極)及穩壓二極體104的第三電極1041A(p極),藉此發光二極體106的第二電極1061B (n極)連接於穩壓二極體104的第三電極1041A(p極)。因此,發光二極體106與穩壓二極體104為反向並聯連接(等效電路圖可參考第1圖)。As shown in FIG. 5A , the light emitting diode 106 has two electrodes 1061 (a first electrode 1061A and a second electrode 1061B). The first electrode 1061A is a p-pole (anode or anode), and the second electrode 1061B is an n-pole (cathode or a cathode). The Zener diode 104 has two electrodes 1041 (a third electrode 1041A and a fourth electrode 1041B). The third electrode 1041A is a p-pole, and the fourth electrode 1041B is an n-pole. The metal connection layer includes a first connection portion 128A and a second connection portion 128B. The first connection portion 128A directly covers and contacts the first electrode 1061A (p-pole) of the light-emitting diode 106 and the fourth electrode 1041B (n-pole) of the zener diode 104 , whereby the first electrode 1061A (n-pole) of the light-emitting diode 106 The electrode 1061A (p-pole) is connected to the fourth electrode 1041B (n-pole) of the zener diode 104 . Similarly, the second connection portion 128B directly covers and contacts the second electrode 1061B (n-pole) of the light-emitting diode 106 and the third electrode 1041A (p-pole) of the zener diode 104 , whereby the light-emitting diode 106 The second electrode 1061B (n pole) of the zener diode 104 is connected to the third electrode 1041A (p pole) of the zener diode 104 . Therefore, the light-emitting diodes 106 and the zener diodes 104 are connected in anti-parallel connection (for an equivalent circuit diagram, please refer to FIG. 1 ).

此外,於第5A圖之俯視圖中,第一連接部128A完全覆蓋發光二極體106的第一電極1061A(p極)且未完全覆蓋穩壓二極體104的第四電極1041B(n極);第二連接部128B完全覆蓋發光二極體106的第二電極1061B (n極)且未完全覆蓋穩壓二極體104的第三電極1041A(p極)。未被金屬連接層覆蓋的穩壓二極體104的第三電極1041A(p極)及第四電極1041B(n極)系被第二絕緣層124所覆蓋。換言之,穩壓二極體104的第三電極1041A(p極)(第四電極1041B(n極))具有一部分被第一連接部128A(第二連接部128B)所覆蓋,而另一部分被第二絕緣層124所覆蓋。In addition, in the top view of FIG. 5A , the first connecting portion 128A completely covers the first electrode 1061A (p-pole) of the light-emitting diode 106 and does not completely cover the fourth electrode 1041B (n-pole) of the zener diode 104 ; The second connecting portion 128B completely covers the second electrode 1061B (n-pole) of the light-emitting diode 106 and does not completely cover the third electrode 1041A (p-pole) of the zener diode 104 . The third electrode 1041A (p-pole) and the fourth electrode 1041B (n-pole) of the zener diode 104 not covered by the metal connection layer are covered by the second insulating layer 124 . In other words, the third electrode 1041A (p-pole) (the fourth electrode 1041B (n-pole)) of the zener diode 104 has a part covered by the first connection part 128A (the second connection part 128B), and the other part is covered by the first connection part 128A (the second connection part 128B). covered by two insulating layers 124 .

根據本發明實施例的製造方法,將穩壓二極體(例如齊納二極體)置於包含反射粒子的高反射材料(諸如白膠層)內,以減少穩壓二極體吸收發光二極體所發出的光進而提升發光裝置的發光效率。According to the manufacturing method of the embodiment of the present invention, a Zener diode (eg, a Zener diode) is placed in a highly reflective material (such as a white glue layer) containing reflective particles, so as to reduce the absorption of the light-emitting diode by the Zener diode. The light emitted by the polar body further enhances the luminous efficiency of the light-emitting device.

第6A圖至第6H圖是根據本發明實施例的發光裝置330的製造方法的流程示意圖。6A to 6H are schematic flowcharts of a method for manufacturing the light emitting device 330 according to an embodiment of the present invention.

如第6A圖所示,提供第一暫時載板102;在第一暫時載板102上設置多個發光單元,各個發光單元均包括穩壓二極體104和發光二極體106。在一些實施例中,穩壓二極體104可為齊納二極體或TVS二極體。在本實施例中,示出了兩個發光二極體106和兩個穩壓二極體104來進行說明。類似地,一發光二極體106及一穩壓二極體104視為一發光單元。然於其他實施例,一發光單元可包含二個以上的發光二極體106及一穩壓二極體104。或者一發光單元可包含一發光二極體106及二個以上的穩壓二極體104。或者一發光單元可包含二個以上的發光二極體106及二個以上的穩壓二極體104。As shown in FIG. 6A , a first temporary carrier board 102 is provided; a plurality of light emitting units are arranged on the first temporary carrier board 102 , and each light emitting unit includes a zener diode 104 and a light emitting diode 106 . In some embodiments, the zener diode 104 may be a Zener diode or a TVS diode. In the present embodiment, two light emitting diodes 106 and two zener diodes 104 are shown for illustration. Similarly, a light-emitting diode 106 and a zener diode 104 are regarded as a light-emitting unit. However, in other embodiments, a light-emitting unit may include more than two light-emitting diodes 106 and a zener diode 104 . Alternatively, a light-emitting unit may include a light-emitting diode 106 and two or more voltage-stabilizing diodes 104 . Alternatively, a light-emitting unit may include two or more light-emitting diodes 106 and two or more voltage-stabilizing diodes 104 .

如第6A圖所示,穩壓二極體104具有兩電極1041、發光二極體106具有兩電極1061,電極1041及電極1061面向第一暫時載板102。穩壓二極體104先包覆於白膠層301後,再置於第一暫時載板102上。白膠層301由反射粒子混入於基質形成。基質可為絕緣材料且包括矽膠基質(silicone-based)或環氧基質(epoxy-based);反射粒子可包括二氧化鈦、二氧化矽、硫酸鋇、或氧化鋁。As shown in FIG. 6A , the zener diode 104 has two electrodes 1041 , the light emitting diode 106 has two electrodes 1061 , and the electrodes 1041 and 1061 face the first temporary carrier 102 . The zener diode 104 is firstly coated on the white glue layer 301 and then placed on the first temporary carrier 102 . The white glue layer 301 is formed by mixing reflective particles into a matrix. The matrix can be an insulating material and includes silicone-based or epoxy-based; the reflective particles can include titanium dioxide, silicon dioxide, barium sulfate, or aluminum oxide.

如第6B圖所示,形成透光層310,以包覆發光二極體106和白膠層301。可選擇性地將螢光粉粒子混入於透光層310中。透光層310可包括矽膠(silicone)或環氧樹脂(epoxy)。透光層310可以是以噴塗或模鑄的方式形成。As shown in FIG. 6B , a light-transmitting layer 310 is formed to cover the light-emitting diode 106 and the white glue layer 301 . The phosphor particles can be selectively mixed into the light-transmitting layer 310 . The light-transmitting layer 310 may include silicone or epoxy. The light-transmitting layer 310 may be formed by spraying or molding.

如第6C圖所示,第二暫時載板314接合於透光層310後,翻轉如第6B圖的結構並移除第一暫時載板102。接著,切割透光層310以形成溝槽316,其中溝槽316具有傾斜的側壁。As shown in FIG. 6C , after the second temporary carrier 314 is bonded to the light-transmitting layer 310 , the structure shown in FIG. 6B is reversed and the first temporary carrier 102 is removed. Next, the light-transmitting layer 310 is cut to form trenches 316, wherein the trenches 316 have sloped sidewalls.

如第6D圖所示,在多個發光單元遠離第二暫時載板314的一側形成金屬凸塊323。各個金屬凸塊323分別位於發光二極體的電極1061和穩壓二極體的電極1041上。在一個實施例中,金屬凸塊323為一無鉛焊錫,其包含至少一種選自由錫、銅、銀、鉍、銦、鋅和銻所組成群組中的材料。As shown in FIG. 6D , metal bumps 323 are formed on the side of the plurality of light emitting units away from the second temporary carrier 314 . Each metal bump 323 is located on the electrode 1061 of the light emitting diode and the electrode 1041 of the zener diode, respectively. In one embodiment, the metal bump 323 is a lead-free solder comprising at least one material selected from the group consisting of tin, copper, silver, bismuth, indium, zinc, and antimony.

如第6E圖所示,形成覆蓋發光單元和金屬凸塊323的第三絕緣層318。在本實施例中,第三絕緣層318為白膠層。As shown in FIG. 6E, a third insulating layer 318 covering the light emitting cells and the metal bumps 323 is formed. In this embodiment, the third insulating layer 318 is a white glue layer.

如第6F圖所示,研磨第三絕緣層318以暴露金屬凸塊323。As shown in FIG. 6F , the third insulating layer 318 is ground to expose the metal bumps 323 .

如第6G圖所示,形成連接於金屬凸塊323的金屬連接層128。其中金屬連接層128連接於穩壓二極體104的電極1041和發光二極體106的電極1061。金屬連接層128可通過一印刷技術(printing)或電鍍而形成。金屬連接層128的材料包含鈦、銅、鎳、銀、錫、金、鉑金或其組合。As shown in FIG. 6G, a metal connection layer 128 connected to the metal bumps 323 is formed. The metal connection layer 128 is connected to the electrode 1041 of the zener diode 104 and the electrode 1061 of the light emitting diode 106 . The metal connection layer 128 may be formed by a printing technique or electroplating. The material of the metal connection layer 128 includes titanium, copper, nickel, silver, tin, gold, platinum, or a combination thereof.

如第6H圖所示,還可選擇性地以通過塗布銅膏329而形成金屬連接層。As shown in FIG. 6H, a metal connection layer can also be optionally formed by applying a copper paste 329.

如第6I圖所示,在各個相鄰的發光單元之間切割金屬連接層128和第三絕緣層318,即延著直線L進行切割,以形成多個發光裝置330,發光裝置330包括發光單元、白膠層301、透光層310、第三絕緣層318、金屬凸塊323及金屬連接層128。各個發光單元中的穩壓二極體104和發光二極體106相互電連接。此外,透光層310完全地包覆白膠層301。第三絕緣層318圍繞透光層310以及金屬凸塊323。As shown in FIG. 6I, the metal connection layer 128 and the third insulating layer 318 are cut between adjacent light-emitting units, that is, cutting along the straight line L, to form a plurality of light-emitting devices 330, the light-emitting devices 330 including light-emitting units , the white glue layer 301 , the transparent layer 310 , the third insulating layer 318 , the metal bumps 323 and the metal connection layer 128 . The zener diode 104 and the light emitting diode 106 in each light emitting unit are electrically connected to each other. In addition, the transparent layer 310 completely covers the white glue layer 301 . The third insulating layer 318 surrounds the light-transmitting layer 310 and the metal bumps 323 .

如第6J圖所示,發光裝置330透過一焊錫325將發光單元連接至器件340。在一個實施例中,上述器件340可為具有電性連接線路的基板,例如PCB板,或是金屬線路形成於一絕緣載板上。As shown in FIG. 6J , the light emitting device 330 connects the light emitting unit to the device 340 through a solder 325 . In one embodiment, the above-mentioned device 340 may be a substrate with electrical connection lines, such as a PCB board, or metal lines formed on an insulating carrier board.

根據本發明實施例的製造方法,將穩壓二極體(例如齊納二極體)先包覆高反射材料後,再與發光二極體進行後續的封裝制程。相較於第4F圖之利用印刷製程形成第二絕緣層218,在本實施例中,系先形成金屬凸塊323、第三絕緣層318後再研磨露出金屬凸塊323,藉此可減少因印刷製程中對位誤差所造成的良率損失。According to the manufacturing method of the embodiment of the present invention, the voltage stabilizing diode (eg, a Zener diode) is coated with a high-reflection material first, and then a subsequent packaging process is performed with the light-emitting diode. Compared with forming the second insulating layer 218 by a printing process in FIG. 4F, in this embodiment, the metal bumps 323 and the third insulating layer 318 are formed first, and then the metal bumps 323 are exposed by grinding, thereby reducing the risk of Yield loss caused by misalignment in the printing process.

如第7圖所示,示例性地示出了一個實施例中,發光裝置331的仰視圖。As shown in FIG. 7 , a bottom view of the light-emitting device 331 is exemplarily shown in one embodiment.

如第7圖所示,發光二極體106具有兩電極1061(第一電極1061A和第二電極1061B)。第一電極1061A為p極(陽極或正極),第二電極1061B為n極(陰極或負極)。穩壓二極體104具有兩電極1041(第三電極1041A和第四電極1041B)。第三電極1041A為p極1041A第四電極1041B為 n極1041B。金屬連接層包含第一連接部128A及第二連接部128B。第一連接部128A直接覆蓋並接觸發光二極體106的第一電極1061A(p極)及穩壓二極體104的第四電極1041B(n極),藉此發光二極體106的第一電極1061A(p極)連接於穩壓二極體104的第四電極1041B(n極)。類似的,第二連接部128B直接覆蓋並接觸發光二極體106的第二電極1061B(n極)及穩壓二極體104的第三電極1041A(p極),藉此發光二極體106的第二電極1061B (n極)連接於穩壓二極體104的第三電極1041A(p極)。因此,發光二極體106與穩壓二極體104為反向並聯連接(等效電路圖可參考第1圖)。As shown in FIG. 7 , the light emitting diode 106 has two electrodes 1061 (a first electrode 1061A and a second electrode 1061B). The first electrode 1061A is a p-pole (anode or anode), and the second electrode 1061B is an n-pole (cathode or a cathode). The Zener diode 104 has two electrodes 1041 (a third electrode 1041A and a fourth electrode 1041B). The third electrode 1041A is a p-pole 1041A and the fourth electrode 1041B is an n-pole 1041B. The metal connection layer includes a first connection portion 128A and a second connection portion 128B. The first connection portion 128A directly covers and contacts the first electrode 1061A (p-pole) of the light-emitting diode 106 and the fourth electrode 1041B (n-pole) of the zener diode 104 , whereby the first electrode 1061A (n-pole) of the light-emitting diode 106 The electrode 1061A (p-pole) is connected to the fourth electrode 1041B (n-pole) of the zener diode 104 . Similarly, the second connection portion 128B directly covers and contacts the second electrode 1061B (n-pole) of the light-emitting diode 106 and the third electrode 1041A (p-pole) of the zener diode 104 , whereby the light-emitting diode 106 The second electrode 1061B (n pole) of the zener diode 104 is connected to the third electrode 1041A (p pole) of the zener diode 104 . Therefore, the light-emitting diodes 106 and the zener diodes 104 are connected in anti-parallel connection (for an equivalent circuit diagram, please refer to FIG. 1 ).

此外,於第7圖之仰視圖中,第一連接部128A完全覆蓋發光二極體106的第一電極1061A(p極)及穩壓二極體104的第四電極1041B(n極;第二連接部128B完全覆蓋發光二極體106的第二電極1061B (n極)且及穩壓二極體104的第三電極1041A(p極)。第一連接部128A為於外層且圍繞第二連接部128B。此外,第三絕緣層318圍繞透光層310的四周。In addition, in the bottom view of FIG. 7 , the first connection portion 128A completely covers the first electrode 1061A (p-pole) of the light-emitting diode 106 and the fourth electrode 1041B (n-pole; second electrode) of the zener diode 104 The connection part 128B completely covers the second electrode 1061B (n-pole) of the light-emitting diode 106 and the third electrode 1041A (p-pole) of the zener diode 104. The first connection part 128A is on the outer layer and surrounds the second connection portion 128B. In addition, the third insulating layer 318 surrounds the periphery of the light-transmitting layer 310 .

如第8圖 所示,先將第6D圖之結構移除第二暫時載板314後,再通過金屬凸塊323將發光單元連接至器件340。器件340可為具有電性連接線路的基板,即發光單元可通過金屬凸塊323直接接合固定於基板上,且基板與發光單元間只需塗布助焊劑(flux,圖未示)而不需要再額外塗布焊錫(solder)。As shown in FIG. 8 , after removing the second temporary carrier 314 from the structure shown in FIG. 6D , the light emitting unit is connected to the device 340 through the metal bumps 323 . The device 340 can be a substrate with electrical connection lines, that is, the light-emitting unit can be directly bonded and fixed on the substrate through the metal bumps 323, and only a flux (flux, not shown) needs to be applied between the substrate and the light-emitting unit, and no further maintenance is required. Additional coating of solder (solder).

如第9圖所示,先將第6F圖之結構移除第二暫時載板314後,再通過金屬凸塊323將發光單元連接至器件340。與第8圖類似,發光單元可通過金屬凸塊323直接接合固定於基板上且基板與發光單元間只需塗佈助焊劑(flux,圖未示)而不需要再額外塗佈焊錫(solder)。As shown in FIG. 9 , after removing the second temporary carrier board 314 from the structure shown in FIG. 6F , the light emitting unit is connected to the device 340 through the metal bumps 323 . Similar to Figure 8, the light-emitting unit can be directly bonded and fixed on the substrate through the metal bumps 323, and only a flux (not shown) needs to be applied between the substrate and the light-emitting unit without additional coating of solder (solder). .

表1和表2分別為根據本發明實施例的發光裝置130及發光裝置230的光電資料(每個發光裝置取五個樣品做測試)。由表1和表2可知發光裝置230的發光強度平均值較發光裝置130的發光強度平均值高出約6.5%。 表1 NO. 光通量[lm] 輻射通量[W] 主波長[nm] 峰波長[nm] 半波寬[nm] 電壓 [V] 電流 [A] 消耗功率[W] 發光效率[lm/W] 1 6.8072 0.2584 450.3 444.8158 15.9 2.8631 0.1604 0.4592 14.8 2 7.1461 0.2565 451.3 446.6667 16.3 2.8491 0.1604 0.4569 15.6 3 7.108 0.2548 451.3 446.6667 15.5 2.8507 0.1604 0.4572 15.5 4 7.6123 0.258 452.3 447.0367 15.9 2.8516 0.1604 0.4573 16.6 5 7.1145 0.2586 451 446.2966 15.9 2.8574 0.1604 0.4583 15.5   AVG. 0.25726               表2 NO. 光通量[lm] 輻射通量[W] 主波長[nm] 峰波長[nm] 半波寬[nm] 電壓 [V] 電流 [A] 消耗功率[W] 發光效率[lm/W] 1 7.6161 0.2742 451.2 446.2966 15.9 2.8436 0.1604 0.456 16.7 2 7.7354 0.2741 451.4 446.6667 15.9 2.844 0.1604 0.4561 17 3 7.469 0.2741 450.8 445.5562 15.9 2.8457 0.1603 0.4563 16.4 4 7.5125 0.2742 451 445.5562 15.9 2.8444 0.1603 0.456 16.5 5 7.4547 0.2735 450.8 445.5562 15.9 2.8461 0.1603 0.4563 16.4   AVG. 0.27402               Table 1 and Table 2 respectively show the optoelectronic data of the light-emitting device 130 and the light-emitting device 230 according to the embodiment of the present invention (five samples were taken for each light-emitting device for testing). It can be seen from Tables 1 and 2 that the average luminous intensity of the light-emitting device 230 is higher than that of the light-emitting device 130 by about 6.5%. Table 1 NO. Luminous flux [lm] Radiant flux [W] Dominant wavelength [nm] Peak wavelength [nm] Half-wave width [nm] Voltage [V] Current [A] Power consumption [W] Luminous efficiency [lm/W] 1 6.8072 0.2584 450.3 444.8158 15.9 2.8631 0.1604 0.4592 14.8 2 7.1461 0.2565 451.3 446.6667 16.3 2.8491 0.1604 0.4569 15.6 3 7.108 0.2548 451.3 446.6667 15.5 2.8507 0.1604 0.4572 15.5 4 7.6123 0.258 452.3 447.0367 15.9 2.8516 0.1604 0.4573 16.6 5 7.1145 0.2586 451 446.2966 15.9 2.8574 0.1604 0.4583 15.5 AVG. 0.25726 Table 2 NO. Luminous flux [lm] Radiant flux [W] Dominant wavelength [nm] Peak wavelength [nm] Half-wave width [nm] Voltage [V] Current [A] Power consumption [W] Luminous efficiency [lm/W] 1 7.6161 0.2742 451.2 446.2966 15.9 2.8436 0.1604 0.456 16.7 2 7.7354 0.2741 451.4 446.6667 15.9 2.844 0.1604 0.4561 17 3 7.469 0.2741 450.8 445.5562 15.9 2.8457 0.1603 0.4563 16.4 4 7.5125 0.2742 451 445.5562 15.9 2.8444 0.1603 0.456 16.5 5 7.4547 0.2735 450.8 445.5562 15.9 2.8461 0.1603 0.4563 16.4 AVG. 0.27402

將無穩壓二極體的發光裝置與發光裝置230進行人體放電模式的靜電放電測試(Human Body Mode Electro Static Discharge)後,可知發光裝置230的壓降比例較低。因此,發光裝置230具有較高的抗靜電衝擊能力。After conducting the Human Body Mode Electro Static Discharge test on the light-emitting device without voltage regulator diode and the light-emitting device 230 , it can be seen that the voltage drop ratio of the light-emitting device 230 is relatively low. Therefore, the light emitting device 230 has a high anti-static shock capability.

以上所述僅為本發明的較佳實施例而已,並不用以限制本發明,凡在本發明的精神和原則之內,所作的任何修改、等同替換、改進等,均應包括在本發明的保護範圍之內。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the present invention. within the scope of protection.

102:第一暫時載板 104:穩壓二極體 1041:電極 1041A:第三電極 1041B:第四電極 106:發光二極體 1061:電極 1061A:第一電極 1061B:第二電極 108:點膠 110:第一絕緣層 112:表面 114:第二暫時載板 116:溝槽 118:白膠層 120:點膠 122:保護層 124:第二絕緣層 128:金屬連接層 128A:第一連接部 128B:第二連接部 130、131:發光裝置 210:透光層 212:表面 230、231:發光裝置 301:白膠層 310:透光層 314:第二暫時載板 316:溝槽 318:第三絕緣層 323:金屬凸塊 325:焊錫 329:銅膏 330、331:發光裝置 340:器件 L:直線 Bc、Zc:n極 Ba、Za:p極102: The first temporary carrier board 104: Zener diode 1041: Electrodes 1041A: Third electrode 1041B: Fourth electrode 106: Light Emitting Diodes 1061: Electrodes 1061A: First Electrode 1061B: Second Electrode 108: Dispensing 110: first insulating layer 112: Surface 114: Second temporary carrier board 116: Groove 118: White glue layer 120: Dispensing 122: protective layer 124: Second insulating layer 128: Metal connection layer 128A: The first connecting part 128B: Second connecting part 130, 131: Lighting device 210: Translucent layer 212: Surface 230, 231: Lighting device 301: White glue layer 310: transparent layer 314: Second Temporary Carrier 316: Groove 318: The third insulating layer 323: Metal bumps 325: Solder 329: Copper paste 330, 331: Lighting device 340: Device L: straight line Bc, Zc: n pole Ba, Za: p pole

第1圖是發光二極體和齊納二極體連接的電路示意圖;Figure 1 is a schematic circuit diagram of the connection between the light-emitting diode and the Zener diode;

第2A圖至第2J圖是根據本發明實施例的發光裝置製造方法的製造流程剖面示意圖;2A to 2J are schematic cross-sectional views of a manufacturing process of a method for manufacturing a light-emitting device according to an embodiment of the present invention;

第3A圖是根據本發明實施例的發光裝置的仰視示意圖;3A is a schematic bottom view of a light-emitting device according to an embodiment of the present invention;

第3B圖是第3A圖中X-X處的剖視示意圖;Figure 3B is a schematic cross-sectional view at X-X in Figure 3A;

第4A圖至第4H圖是根據本發明實施例的發光裝置製造方法的製造流程剖面示意圖;4A to 4H are schematic cross-sectional views of a manufacturing process of a method for manufacturing a light-emitting device according to an embodiment of the present invention;

第5A圖是根據本發明實施例的發光裝置的仰視示意圖;5A is a schematic bottom view of a light-emitting device according to an embodiment of the present invention;

第5B圖是第5A圖中X-X處的剖視示意圖;Figure 5B is a schematic cross-sectional view at X-X in Figure 5A;

第6A圖至第6I圖是根據本發明實施例的發光裝置製造方法的製造流程剖面示意圖;6A to 6I are schematic cross-sectional views of a manufacturing process of a method for manufacturing a light-emitting device according to an embodiment of the present invention;

第6J圖是本發明實施例的發光裝置與器件連接的示意圖。FIG. 6J is a schematic diagram of the connection between the light-emitting device and the device according to the embodiment of the present invention.

第7圖是根據本發明實施例的發光裝置的仰視示意圖;FIG. 7 is a schematic bottom view of a light-emitting device according to an embodiment of the present invention;

第8圖是第6D圖的結構與器件連接的示意圖。FIG. 8 is a schematic diagram of the structure of FIG. 6D connected to the device.

第9圖是第6F圖的結構與器件連接的示意圖。FIG. 9 is a schematic diagram of the structure and device connection of FIG. 6F.

104:穩壓二極體 104: Zener diode

106:發光二極體 106: Light Emitting Diodes

1041B:第四電極 1041B: Fourth electrode

1061A:第一電極 1061A: First Electrode

110:第一絕緣層 110: first insulating layer

118:白膠層 118: White glue layer

124:第二絕緣層 124: Second insulating layer

128:金屬連接層 128: Metal connection layer

Claims (10)

一種發光裝置,包括: 一發光元件,具有一發光頂面; 一非發光元件,具有一非發光頂面; 一金屬連接層,完全位於該發光元件以及該非發光元件下方,並使其二者彼此電性連接;以及 一反射層,環繞該發光元件但露出該發光頂面,並掩埋該非發光元件且遮擋該非發光頂面; 其中,該反射層的最外側壁暴露於環境介質之中。A light-emitting device, comprising: a light-emitting element with a light-emitting top surface; a non-light-emitting element having a non-light-emitting top surface; a metal connection layer completely under the light-emitting element and the non-light-emitting element and electrically connecting the two to each other; and a reflective layer surrounding the light-emitting element but exposing the light-emitting top surface, burying the non-light-emitting element and shielding the non-light-emitting top surface; Wherein, the outermost sidewall of the reflective layer is exposed to the ambient medium. 根據申請專利範圍第1項所述的發光裝置,還包括一絕緣層(124)位於該發光元件以及該金屬連接層之間,以及位於該非發光元件及該金屬連接層之間。The light-emitting device according to claim 1, further comprising an insulating layer (124) located between the light-emitting element and the metal connection layer, and between the non-light-emitting element and the metal connection layer. 根據申請專利範圍第1項所述的發光裝置,其中,該發光元件具有一第一電極及一第二電極面向該金屬連接層,該非發光元件具有一第三電極及一第四電極面向該金屬連接層,且該金屬連接層具有一第一連接部連接該第一電極和該第四電極以及一第二連接部連接該第二電極和該第三電極。The light-emitting device according to claim 1, wherein the light-emitting element has a first electrode and a second electrode facing the metal connection layer, and the non-light-emitting element has a third electrode and a fourth electrode facing the metal a connection layer, and the metal connection layer has a first connection part connecting the first electrode and the fourth electrode and a second connection part connecting the second electrode and the third electrode. 根據申請專利範圍第1項所述的發光裝置,更包括一透光層覆蓋該發光頂面。The light-emitting device according to claim 1, further comprising a light-transmitting layer covering the light-emitting top surface. 根據申請專利範圍第4項所述的發光裝置,其中,該透光層圍繞該發光元件且與該反射層接觸。The light-emitting device according to claim 4, wherein the light-transmitting layer surrounds the light-emitting element and is in contact with the reflective layer. 根據申請專利範圍第1項所述的發光裝置,其中,該反射層覆蓋且圍繞該非發光元件。The light-emitting device according to claim 1, wherein the reflective layer covers and surrounds the non-light-emitting element. 根據申請專利範圍第2項所述的發光裝置,其中,該反射層與該絕緣層直接接觸。The light-emitting device according to claim 2, wherein the reflective layer is in direct contact with the insulating layer. 根據申請專利範圍第2項所述的發光裝置,其中該絕緣層(124)包含複數個孔洞,該金屬連接層(128)透過該複數個孔洞與該發光元件(106)及該非發光元件電連接。The light-emitting device according to claim 2, wherein the insulating layer (124) includes a plurality of holes, and the metal connection layer (128) is electrically connected to the light-emitting element (106) and the non-light-emitting element through the plurality of holes . 根據申請專利範圍第1項所述的發光裝置,其中,該反射層高於該發光元件。The light-emitting device according to claim 1, wherein the reflective layer is higher than the light-emitting element. 據申請專利範圍第1項所述的發光裝置,其中,該反射層包括二氧化鈦、二氧化矽、硫酸鋇或氧化鋁。The light-emitting device according to claim 1, wherein the reflective layer comprises titanium dioxide, silicon dioxide, barium sulfate or aluminum oxide.
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