TW202205345A - 線性加速器、離子束控制裝置及方法 - Google Patents

線性加速器、離子束控制裝置及方法 Download PDF

Info

Publication number
TW202205345A
TW202205345A TW110107500A TW110107500A TW202205345A TW 202205345 A TW202205345 A TW 202205345A TW 110107500 A TW110107500 A TW 110107500A TW 110107500 A TW110107500 A TW 110107500A TW 202205345 A TW202205345 A TW 202205345A
Authority
TW
Taiwan
Prior art keywords
resonator
signal
master clock
control module
coupled
Prior art date
Application number
TW110107500A
Other languages
English (en)
Chinese (zh)
Inventor
基斯 Ｅ 卡威爾
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TW202205345A publication Critical patent/TW202205345A/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/22—Details of linear accelerators, e.g. drift tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K5/00—Manipulating of pulses not covered by one of the other main groups of this subclass
    • H03K5/153—Arrangements in which a pulse is delivered at the instant when a predetermined characteristic of an input signal is present or at a fixed time interval after this instant
    • H03K5/1536—Zero-crossing detectors
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03L—AUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00—Automatic control of frequency or phase; Synchronisation
    • H03L7/06—Automatic control of frequency or phase; Synchronisation using a reference signal applied to a frequency- or phase-locked loop
    • H03L7/08—Details of the phase-locked loop
    • H03L7/081—Details of the phase-locked loop provided with an additional controlled phase shifter
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/02—Circuits or systems for supplying or feeding radio-frequency energy
    • H05H2007/025—Radiofrequency systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/22—Details of linear accelerators, e.g. drift tubes
    • H05H2007/225—Details of linear accelerators, e.g. drift tubes coupled cavities arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Accelerators (AREA)
  • Nonlinear Science (AREA)
TW110107500A 2020-03-24 2021-03-03 線性加速器、離子束控制裝置及方法 TW202205345A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/828,899 US11576252B2 (en) 2020-03-24 2020-03-24 Controller and control techniques for linear accelerator and ion implanter having linear accelerator
US16/828,899 2020-03-24

Publications (1)

Publication Number Publication Date
TW202205345A true TW202205345A (zh) 2022-02-01

Family

ID=77856704

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110107500A TW202205345A (zh) 2020-03-24 2021-03-03 線性加速器、離子束控制裝置及方法

Country Status (6)

Country Link
US (2) US11576252B2 (ja)
JP (1) JP2023519205A (ja)
KR (1) KR20220157427A (ja)
CN (1) CN115280904A (ja)
TW (1) TW202205345A (ja)
WO (1) WO2021194655A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11576252B2 (en) * 2020-03-24 2023-02-07 Applied Materials, Inc. Controller and control techniques for linear accelerator and ion implanter having linear accelerator
US11476087B2 (en) * 2020-08-03 2022-10-18 Applied Materials, Inc. Ion implantation system and linear accelerator having novel accelerator stage configuration
US11388810B2 (en) * 2020-09-17 2022-07-12 Applied Materials, Inc. System, apparatus and method for multi-frequency resonator operation in linear accelerator
US11596051B2 (en) * 2020-12-01 2023-02-28 Applied Materials, Inc. Resonator, linear accelerator configuration and ion implantation system having toroidal resonator
US11825590B2 (en) * 2021-09-13 2023-11-21 Applied Materials, Inc. Drift tube, apparatus and ion implanter having variable focus electrode in linear accelerator
US11728133B2 (en) * 2021-10-28 2023-08-15 Applied Materials, Inc. Resonator, linear accelerator, and ion implanter having adjustable pickup loop

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5289183A (en) * 1992-06-19 1994-02-22 At/Comm Incorporated Traffic monitoring and management method and apparatus
US5406275A (en) * 1990-05-17 1995-04-11 At/Comm Incorporated Object location process and apparatus
US5187645A (en) * 1991-06-07 1993-02-16 Ergo Computing, Inc. Portable computer with docking connector for peripheral devices
USD336075S (en) * 1991-06-07 1993-06-01 Ergo Computing, Inc. Portable computer
US5401973A (en) 1992-12-04 1995-03-28 Atomic Energy Of Canada Limited Industrial material processing electron linear accelerator
JP3093553B2 (ja) 1994-01-20 2000-10-03 三菱電機株式会社 エネルギー可変型高周波四重極ライナック
JP2001085198A (ja) 1999-09-16 2001-03-30 Mitsubishi Heavy Ind Ltd 線形加速器、線形加速器の制御方法、及び線形加速器の制御プログラムを記録した記録媒体
US7095348B1 (en) * 2000-05-23 2006-08-22 Marvell International Ltd. Communication driver
US7113121B1 (en) * 2000-05-23 2006-09-26 Marvell International Ltd. Communication driver
US7312739B1 (en) * 2000-05-23 2007-12-25 Marvell International Ltd. Communication driver
US8095813B2 (en) * 2004-03-22 2012-01-10 Integrated Device Technology, Inc Integrated circuit systems having processor-controlled clock signal generators therein that support efficient power management
US7719371B2 (en) * 2004-03-22 2010-05-18 Integrated Device Technology, Inc. Spread spectrum clock and reference signal generator
US7365614B2 (en) * 2004-03-22 2008-04-29 Mobius Microsystems, Inc. Integrated clock generator and timing/frequency reference
JP5046928B2 (ja) * 2004-07-21 2012-10-10 メヴィオン・メディカル・システムズ・インコーポレーテッド シンクロサイクロトロン及び粒子ビームを生成する方法
US7402821B2 (en) * 2006-01-18 2008-07-22 Axcelis Technologies, Inc. Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase
US7978017B2 (en) * 2007-12-05 2011-07-12 Integrated Device Technology, Inc. Control voltage generator for a clock, frequency reference, and other reference signal generator
US20090146748A1 (en) * 2007-12-05 2009-06-11 Mobius Microsystems, Inc. Amplitude Controller for a Clock, Frequency Reference, and Other Reference Signal Generator
US20090146750A1 (en) * 2007-12-05 2009-06-11 Mobius Microsystems, Inc. Common Mode Controller for a Clock, Frequency Reference, and Other Reference Signal Generator
US8093958B2 (en) * 2007-12-05 2012-01-10 Integrated Device Technology, Inc. Clock, frequency reference, and other reference signal generator with a controlled quality factor
US8164159B1 (en) * 2009-07-18 2012-04-24 Intergrated Device Technologies, inc. Semiconductor resonators with electromagnetic and environmental shielding and methods of forming same
AU2010327985B2 (en) * 2009-12-10 2012-12-13 Accenture Global Services Limited Energy facility control system
FR2954666B1 (fr) * 2009-12-22 2012-07-27 Thales Sa Source compacte de generation de particules portant une charge.
US8952765B2 (en) * 2012-03-23 2015-02-10 Mks Instruments, Inc. System and methods of bimodal automatic power and frequency tuning of RF generators
JP6242314B2 (ja) * 2014-09-11 2017-12-06 住友重機械イオンテクノロジー株式会社 イオン注入装置及びイオンビームの調整方法
US10736685B2 (en) * 2015-09-30 2020-08-11 Ethicon Llc Generator for digitally generating combined electrical signal waveforms for ultrasonic surgical instruments
US20170117064A1 (en) * 2015-10-27 2017-04-27 Accenture Global Services Limited Nuclear power plant digital platform
JP6662549B2 (ja) 2016-11-21 2020-03-11 住友重機械イオンテクノロジー株式会社 イオン注入方法およびイオン注入装置
US10367508B1 (en) * 2018-05-18 2019-07-30 Varex Imaging Corporation Configurable linear accelerator trigger distribution system and method
US10707050B2 (en) * 2018-07-26 2020-07-07 Varian Semiconductor Equipment Associates, Inc. System and method to detect glitches
US10991546B1 (en) * 2019-10-25 2021-04-27 Applied Materials, Inc. Isolated LINAC resonator pickup circuit
US10943767B1 (en) * 2020-01-09 2021-03-09 Applied Materials, Inc. Digital sampling to control resonator frequency and phase in a LINAC
US11576252B2 (en) * 2020-03-24 2023-02-07 Applied Materials, Inc. Controller and control techniques for linear accelerator and ion implanter having linear accelerator

Also Published As

Publication number Publication date
US11576252B2 (en) 2023-02-07
KR20220157427A (ko) 2022-11-29
WO2021194655A1 (en) 2021-09-30
US20230125883A1 (en) 2023-04-27
JP2023519205A (ja) 2023-05-10
US20210307152A1 (en) 2021-09-30
CN115280904A (zh) 2022-11-01

Similar Documents

Publication Publication Date Title
TW202205345A (zh) 線性加速器、離子束控制裝置及方法
US7626347B2 (en) Programmable radio frequency waveform generator for a synchrocyclotron
JP4518596B2 (ja) 高周波加速方法及び装置
US11295931B2 (en) Apparatus and techniques for generating bunched ion beam
US10867773B2 (en) Apparatus and techniques for generating bunched ion beam
EP3427553A1 (en) Hybrid standing wave/traveling linear accelerators for providing accelerated charged particles or radiation beams
US10015874B2 (en) Hybrid standing wave linear accelerators providing accelerated charged particles or radiation beams
Marchetti et al. X-band TDS project
JP2023501895A (ja) 絶縁されたライナック共振器ピックアップ回路
Butenko et al. Development of NICA injection complex
US11388810B2 (en) System, apparatus and method for multi-frequency resonator operation in linear accelerator
KR20200050676A (ko) 마그네트론 기반 방사선치료용 선형전자가속기의 공진주파수 매칭을 위한 자동 제어 장치 및 방법
US20240064888A1 (en) Resonator, linear accelerator, and ion implanter having dielectric-free resonator chamber
JPWO2021194655A5 (ja)
TWI787739B (zh) 離子注入系統
Marchetti et al. JACoW: X-Band TDS Project
Vasyuchenko et al. Development, fabrication and test of triple gap split-ring bunchers for the TRIUMF ISAC facility