TW202204644A - Titanium material for metal foil production, method for producing titanium material for metal foil production, and metal foil production roller The plurality of the voltage ratio of two adjacent positions among the positions is 0.95 or more and 1.05 or less - Google Patents

Titanium material for metal foil production, method for producing titanium material for metal foil production, and metal foil production roller The plurality of the voltage ratio of two adjacent positions among the positions is 0.95 or more and 1.05 or less Download PDF

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TW202204644A
TW202204644A TW109125315A TW109125315A TW202204644A TW 202204644 A TW202204644 A TW 202204644A TW 109125315 A TW109125315 A TW 109125315A TW 109125315 A TW109125315 A TW 109125315A TW 202204644 A TW202204644 A TW 202204644A
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metal foil
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TWI750748B (en
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高橋一浩
國枝知德
塚本元氣
三好遼太郎
岳邊秀德
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日商日本製鐵股份有限公司
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Abstract

In the titanium material of the present invention, when a pair of energized electrode probes are brought into contact to supply a constant current, and a pair of potential detection probes are brought into contact with the surface at a fixed probe interval to measure voltages at a plurality of positions on the surface, the plurality of the voltage ratio of two adjacent positions among the positions is 0.95 or more and 1.05 or less.

Description

金屬箔製造用鈦材及金屬箔製造用鈦材之製造方法及金屬箔製造滾筒Titanium material for metal foil production, method for producing titanium material for metal foil production, and metal foil production roller

本發明有關金屬箔製造用鈦材及金屬箔製造用鈦材之製造方法及金屬箔製造滾筒。The present invention relates to a titanium material for metal foil production, a method for producing the titanium material for metal foil production, and a metal foil production roll.

多層配線基板、撓性配線板等配線基板之配線或鋰離子電池之集電體等電子零件的導電部位,多數情況下係利用銅箔作為原料。In many cases, copper foil is used as a raw material for wiring of wiring boards such as multilayer wiring boards and flexible wiring boards, and conductive parts of electronic parts such as current collectors of lithium ion batteries.

利用於所述用途之銅箔可藉由譬如以下方法來製造。在銅原料熔解於硫酸溶液而成之硫酸銅溶液中,配置鉛或鈦等不溶性金屬之作為陽極及陰極的寬1m以上且直徑數m的滾筒,使滾筒旋轉並使銅連續電積於滾筒上。並且將析出的銅連續剝離,捲取成捲狀。藉由以上便可製造銅箔。The copper foil used for the said use can be manufactured by the following method, for example. In a copper sulfate solution obtained by dissolving copper raw materials in a sulfuric acid solution, insoluble metals such as lead or titanium are placed as anodes and cathodes. Rollers with a width of 1 m or more and a diameter of several m are rotated and the copper is continuously deposited on the drum. . And the deposited copper was continuously peeled off, and it was wound up into a roll shape. Copper foil can be manufactured by the above.

滾筒的材料從耐蝕性優異、銅箔之剝離性優異等觀點來看,一般係使用鈦。然而,即便在使用了耐蝕性優異之鈦材時,若長期進行銅箔之製造,則構成滾筒之鈦材表面在硫酸銅溶液中會逐漸受到腐蝕影響。然後,受到腐蝕影響之滾筒表面的狀態會在製造銅箔時被轉印至銅箔。As the material of the roller, titanium is generally used from the viewpoints of excellent corrosion resistance and excellent releasability of copper foil. However, even when a titanium material with excellent corrosion resistance is used, if the copper foil is produced for a long time, the surface of the titanium material constituting the roller will gradually be affected by corrosion in the copper sulfate solution. Then, the state of the roller surface affected by corrosion is transferred to the copper foil when the copper foil is produced.

金屬材料的腐蝕已知係依該金屬材料所具有的結晶組織、結晶方位、缺陷、偏析、加工應變及殘留應變等因金屬組織所致之各種內質因素之不同,而導致腐蝕狀態及腐蝕的程度不同。使用了在部位間金屬組織不均質的金屬材料之滾筒,其在隨著銅箔之製造而受到腐蝕影響時,會變得無法維持滾筒之均質的面狀態,而於滾筒表面產生不均質的面。於滾筒表面產生之不均質的面可辨識為模樣。在因上述不均質的金屬組織所致模樣中,因面積較大的巨觀組織所致且能以肉眼判別之模樣稱為「巨觀模樣」。而且,於滾筒表面產生之巨觀模樣亦會在製造銅箔時轉印至銅箔。Corrosion of metal materials is known to be caused by various internal factors such as the crystal structure, crystal orientation, defects, segregation, processing strain and residual strain of the metal material caused by the metal structure, resulting in the state of corrosion and corrosion. to varying degrees. A roller using a metal material with an inhomogeneous metal structure between parts will become unable to maintain the homogeneous surface state of the roller when it is affected by corrosion along with the manufacture of copper foil, and an uneven surface will be generated on the surface of the roller. . The uneven surface produced on the surface of the drum can be recognized as a pattern. Among the patterns caused by the above-mentioned inhomogeneous metal structures, those caused by macroscopic structures with a large area and which can be identified with the naked eye are called "macroscopic patterns". Moreover, the macroscopic pattern produced on the surface of the drum is also transferred to the copper foil when the copper foil is produced.

因此,為了製造高精度且均質厚度之銅箔,重要的係使構成滾筒之鈦材的金屬組織成為均質來達成滾筒的均質腐蝕,藉此減低因不均質的巨觀組織所致之巨觀模樣。Therefore, in order to manufacture copper foil with high precision and uniform thickness, it is important to make the metal structure of the titanium material constituting the drum homogeneous to achieve homogeneous corrosion of the drum, thereby reducing the macroscopic appearance caused by the inhomogeneous macroscopic structure. .

專利文獻1中為了抑制巨觀模樣而提案有一種製造電解Cu箔的滾筒所用之鈦板,特徵在於:其以質量%計含有Cu:0.15%以上且小於0.5%、氧:大於0.05%且在0.20%以下及Fe:0.04%以下,且剩餘部分由鈦與無法避免之不純物所構成,並且該鈦板係由平均結晶粒徑小於35µm之α相均質微細再結晶組織所構成。In order to suppress the macroscopic appearance, Patent Document 1 proposes a titanium plate for use in a roll for producing electrolytic Cu foil, characterized in that it contains Cu: 0.15% or more and less than 0.5%, and oxygen: more than 0.05% and in the mass %. 0.20% or less and Fe: 0.04% or less, and the rest is composed of titanium and unavoidable impurities, and the titanium plate is composed of α-phase homogeneous and fine recrystallized structure with an average crystal grain size of less than 35µm.

專利文獻2中提案有一種製造電解Cu箔的滾筒所用之鈦板,特徵在於:其以質量%計含有Cu:0.3~1.1%、Fe:0.04%以下、氧:0.1%以下及氫:0.006%以下,平均結晶粒度為8.2以上,且維氏硬度為115以上且在145以下;在該鈦板之平行於板面的部位中,集合組織在令存在於以下橢圓範圍內之晶粒的總面積為A且令在其之外的晶粒的總面積為B時,面積比A/B為3.0以上,該橢圓範圍係在從軋延面且從法線方向(ND軸)之α相的(0001)面極圖中,以(0001)面之法線的傾倒角度係在軋延寬度方向(TD)上±45°為長軸,且以在最終軋延方向(RD)上±25°為短軸之範圍。 先前技術文獻 專利文獻Patent Document 2 proposes a titanium plate for use in a roll for producing electrolytic Cu foil, characterized in that it contains Cu: 0.3 to 1.1%, Fe: 0.04% or less, oxygen: 0.1% or less, and hydrogen: 0.006% in mass % Hereinafter, the average crystal grain size is 8.2 or more, and the Vickers hardness is 115 or more and 145 or less; in the part of the titanium plate parallel to the plate surface, the aggregate structure is such that the total area of the crystal grains existing in the following elliptical range When A is A and the total area of crystal grains outside it is B, the area ratio A/B is 3.0 or more, and the ellipse range is from the rolling plane and from the normal direction (ND axis) of the α phase ( 0001) plane pole diagram, the inclination angle of the normal line of the (0001) plane is ±45° in the rolling width direction (TD) as the long axis, and ±25° in the final rolling direction (RD) is taken as the long axis. The range of the short axis. prior art literature Patent Literature

專利文獻1:日本專利特開2009-41064號公報 專利文獻2:日本專利特開2012-112017號公報Patent Document 1: Japanese Patent Laid-Open No. 2009-41064 Patent Document 2: Japanese Patent Laid-Open No. 2012-112017

發明欲解決之課題 然而,專利文獻1或專利文獻2所記載之製造電解Cu箔的滾筒所用之鈦板含有Fe等元素,該等元素在製造鈦板時之凝固過程中容易分配至液相側。因此,容易產生上述鈦板之化學組成的偏析,亦即容易產生參差。若化學組成產生參差,則在金屬箔製造過程中鈦板會不均勻地腐蝕而在鈦板產生巨觀模樣,巨觀模樣可能會轉印至所製造之金屬箔。The problem to be solved by the invention However, the titanium plate used for the roll for producing the electrolytic Cu foil described in Patent Document 1 or Patent Document 2 contains elements such as Fe, and these elements are easily distributed to the liquid phase side during the solidification process during the production of the titanium plate. Therefore, segregation of the chemical composition of the titanium plate described above is likely to occur, that is, unevenness is likely to occur. If the chemical composition is uneven, the titanium plate will corrode unevenly during the metal foil manufacturing process, resulting in a macroscopic pattern on the titanium plate, and the macroscopic pattern may be transferred to the manufactured metal foil.

本發明係有鑑於上述問題而作成者,本發明目的在於提供一種金屬箔製造用鈦材及金屬箔製造用鈦材之製造方法及金屬箔製造滾筒,該金屬箔製造用鈦材在使用於金屬箔製造用之滾筒時可抑制產生巨觀模樣。The present invention has been made in view of the above-mentioned problems, and an object of the present invention is to provide a titanium material for metal foil production, a method for producing a titanium material for metal foil production, and a metal foil production roll, the titanium material for metal foil production being used for metal foil production The generation of macroscopic patterns can be suppressed in the case of a roll for foil manufacturing.

用以解決課題之手段 本發明人等著眼於以下情事:金屬箔製造滾筒在保持研磨的狀態下存在的巨觀模樣、及隨著使用中的不均質腐蝕而產生的巨觀模樣,係因該金屬材料所具有的化學組成、或結晶組織、結晶方位、缺陷、偏析、加工應變及殘留應變等因金屬組織所致之各種內質因素而受到影響。然後,發現當金屬箔製造用鈦材的表面各部位之電阻滿足預定條件時,可抑制巨觀模樣,終至完成本發明。means of solving problems The inventors of the present invention have focused on the fact that the macroscopic appearance of the metal foil manufacturing roller in the state of being polished and the macroscopic appearance caused by the heterogeneous corrosion during use are caused by the chemical properties of the metal material. The composition, or crystal structure, crystal orientation, defects, segregation, processing strain and residual strain are affected by various endoplasmic factors caused by the metal structure. Then, it was found that the macroscopic pattern can be suppressed when the electrical resistance of each part of the surface of the titanium material for metal foil production satisfies a predetermined condition, and the present invention was finally completed.

基於上述知識見解而完成之本發明,其主旨如下。 (1)本發明之第1態樣係一種金屬箔製造用鈦材,具有以下化學組成: 以質量%計含有: Sn:0%以上且在2.0%以下、 Zr:0%以上且在5.0%以下、 Al:0%以上且在7.0%以下、 N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在1.000%以下、 Fe:0%以上且在0.500%以下、 Cr:0%以上且在0.500%以下、 Ni:0%以上且在0.090%以下、 Cu:0%以上且在1.5%以下及 Mo:0%以上且在0.750%以下,且 剩餘部分包含Ti及不純物;並且 Fe、Cr及Ni之合計含量為0%以上且在0.500%以下; 當使一對通電電極探針接觸鈦材來供給恆定電流,並且使成對的電位檢測探針按固定探針間隔接觸表面來測定前述表面之複數個位置的電壓時,前述複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下。 (2)上述(1)中記載之金屬箔製造用鈦材亦可含有Fe、Cr、Ni及Mo, Ni含量為0質量%以上且在0.090質量%以下,並且 以質量基準計,Mo含量相對於Fe、Cr及Ni之合計含量為0.5倍以上且在1.2倍以下。 (3)上述(1)或(2)中記載之金屬箔製造用鈦材以質量%計亦可含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在0.400%以下、 Fe:0.02%以上且在0.500%以下、 Ni:0%以上且在0.090%以下及 Cu:0%以上且在1.5%以下。 (4)上述(1)中記載之金屬箔製造用鈦材以質量%計亦可含有由以下所構成群組構成之1種或2種以上元素且合計達0.2%以上且在5.0%以下: Sn:0.2%以上且在2.0%以下、 Zr:0.2%以上且在5.0%以下及 Al:0.2%以上且在3.0%以下; 並且亦可含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在1.000%以下及 Fe:0%以上且在0.500%以下。 (5)上述(1)中記載之金屬箔製造用鈦材亦可含有大於1.8質量%且在7.0質量%以下之Al;並且 以質量%計,令Al含量為[Al%]、Zr含量為[Zr%]、Sn含量為[Sn%]且令O含量為[O%]時,下述式(1)所示Al當量Aleq可為7.0質量%以下: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] 式(1)。 (6)上述(1)~(5)中任一項記載之金屬箔製造用鈦材亦可為金屬箔製造滾筒用鈦材。The present invention completed based on the above knowledge has the following gist. (1) The first aspect of the present invention is a titanium material for metal foil manufacturing, which has the following chemical composition: Contains in mass %: Sn: 0% or more and 2.0% or less, Zr: 0% or more and 5.0% or less, Al: 0% or more and 7.0% or less, N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less, Fe: 0% or more and 0.500% or less, Cr: 0% or more and 0.500% or less, Ni: 0% or more and 0.090% or less, Cu: 0% or more and 1.5% or less and Mo: 0% or more and 0.750% or less, and The remainder contains Ti and impurities; and The total content of Fe, Cr and Ni is more than 0% and less than 0.500%; When a pair of energized electrode probes are brought into contact with a titanium material to supply a constant current, and a pair of potential detection probes are brought into contact with the surface at fixed probe intervals to measure the voltages at a plurality of positions on the surface, the voltages at the plurality of positions are The voltage ratio of two adjacent positions is 0.95 or more and 1.05 or less. (2) The titanium material for metal foil production described in the above (1) may contain Fe, Cr, Ni and Mo, The Ni content is 0 mass % or more and 0.090 mass % or less, and The Mo content is 0.5 times or more and 1.2 times or less with respect to the total content of Fe, Cr, and Ni on a mass basis. (3) The titanium material for metal foil production described in the above (1) or (2) may also contain, in mass %: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 0.400% or less, Fe: 0.02% or more and 0.500% or less, Ni: 0% or more and 0.090% or less and Cu: 0% or more and 1.5% or less. (4) The titanium material for metal foil production described in the above (1) may contain, in mass %, one or two or more elements consisting of the following groups in a total amount of 0.2% or more and 5.0% or less: Sn: 0.2% or more and 2.0% or less, Zr: 0.2% or more and 5.0% or less and Al: 0.2% or more and 3.0% or less; and may also contain: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less and Fe: 0% or more and 0.500% or less. (5) The titanium material for metal foil production described in the above (1) may contain more than 1.8 mass % and 7.0 mass % or less of Al; and In terms of mass %, when the Al content is [Al%], the Zr content is [Zr%], the Sn content is [Sn%], and the O content is [O%], the Al equivalent represented by the following formula (1) Aleq can be 7.0 mass % or less: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] Formula (1). (6) The titanium material for metal foil manufacturing described in any one of the above (1) to (5) may be a titanium material for metal foil manufacturing rollers.

(7)本發明之第2態樣係一種金屬箔製造用鈦材之製造方法,具有以下步驟: 利用連續鑄造手段來製造鈦鑄錠之步驟,該連續鑄造手段係將熔融後的鈦注入一上面及下面開口之可冷卻的鑄模內,且加熱前述鑄模內之熔融後的鈦之液面,並透過前述鑄模冷卻前述鈦使其凝固,並且使用夾具將凝固後的前述鈦往下方拉出; 將前述鈦鑄錠加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延來製造軋延板之步驟;及 在600℃以上且750℃以下之溫度下進行20分鐘以上且120分鐘以下時間之熱處理,且以20℃/分鐘以上的平均冷卻速度從熱處理溫度冷卻至500℃,並且以10℃/分鐘以下的平均冷卻速度從熱處理溫度冷卻至300℃以下之溫度之步驟。 (8)上述(7)中記載之金屬箔製造用鈦材之製造方法亦可具有熱加工前述鈦鑄錠來製造扁胚之步驟;並且 在前述製造軋延板之步驟中,以前述扁胚取代前述鈦鑄錠來進行軋延。 (9)上述(7)或(8)中記載之金屬箔製造用鈦材之製造方法中,前述鑄造手段可為電子束熔解法; 前述電子束熔解法中往前述鑄模的內部空間的電子束照射量為150W/cm2 以下,且前述鈦的熔解速度為2.5ton/h以下,對鈦照射前述電子束來熔解該鈦。 (10)上述(9)中記載之金屬箔製造用鈦材之製造方法中,前述鑄模的內部空間的水平截面面積相對於前述鑄模的水平截面的內周周長之比且單位cm之X、與前述電子束熔解法中之前述電子束的照射量且單位W/cm2 之Y亦可滿足下述式(2)之關係, Y=-3.8X+(135±25) ・・・式(2)。 (11)上述(7)或(8)中記載之金屬箔製造用鈦材之製造方法中,前述鑄造手段可為電漿熔解法; 前述電漿熔解法中往前述鑄模內的電漿照射量為380W/cm2 以下,且前述鈦的熔解速度為2.5ton/h以下,對鈦照射前述電漿來熔解該鈦亦可。 (12)上述(7)~(11)中記載之金屬箔製造用鈦材之製造方法中,前述鑄模的內側空間的水平截面中,該水平截面之單位cm2 之面積與單位cm之周長之比可為7.5cm以上且在22.5cm以下。(7) A second aspect of the present invention is a method for producing a titanium material for metal foil production, comprising the following steps: a step of producing a titanium ingot using a continuous casting method in which molten titanium is poured into a In a coolable casting mold with upper and lower openings, and heating the liquid surface of the molten titanium in the casting mold, cooling the titanium through the casting mold to solidify it, and using a clamp to pull the solidified titanium downward; The above-mentioned titanium ingot is heated to a temperature of 750°C or higher and lower than the β transformation point, and rolled so that the reduction ratio is 90% or higher to produce a rolled sheet; and 600°C or higher and 750°C or lower Heat treatment for 20 minutes or more and 120 minutes or less at the same temperature, and cooling from the heat treatment temperature to 500°C at an average cooling rate of 20°C/min or more, and cooling from the heat treatment temperature to 10°C/min or less at an average cooling rate. Steps at temperatures below 300°C. (8) The method for producing a titanium material for metal foil production described in (7) above may further include a step of hot-working the titanium ingot to produce a flat blank; and in the step of producing a rolled sheet, the flat blank is used. Rolling was performed in place of the aforementioned titanium ingot. (9) In the method for producing a titanium material for metal foil production described in the above (7) or (8), the casting means may be an electron beam melting method; in the electron beam melting method, an electron beam is applied to the inner space of the casting mold The irradiation amount is 150 W/cm 2 or less, and the melting rate of the titanium is 2.5 ton/h or less, and the titanium is irradiated with the electron beam to melt the titanium. (10) In the method for producing a titanium material for metal foil production according to (9) above, the ratio of the horizontal cross-sectional area of the inner space of the mold to the inner circumference of the horizontal cross-section of the mold and X in unit cm is the same as the above In the electron beam melting method, the irradiation amount of the electron beam and the Y in unit W/cm 2 can also satisfy the relationship of the following formula (2), Y=-3.8X+(135±25) ・・・ formula (2). (11) In the method for producing a titanium material for metal foil production according to (7) or (8) above, the casting means may be a plasma melting method; the amount of plasma irradiation into the casting mold in the plasma melting method It is 380 W/cm 2 or less, and the melting rate of the titanium is 2.5 ton/h or less, and the titanium may be melted by irradiating the titanium with the plasma. (12) In the method for producing a titanium material for metal foil production described in (7) to (11) above, in the horizontal cross section of the inner space of the casting mold, the ratio of the area per unit cm 2 of the horizontal cross section to the perimeter per cm It can be 7.5cm or more and 22.5cm or less.

(13)本發明之第3態樣係一種金屬箔製造滾筒,具有: 上述(6)中記載之金屬箔製造用鈦材,係沿著圓筒狀內滾筒的外周面被覆;及 熔接部,係配置於前述鈦材的對接部。(13) The third aspect of the present invention is a metal foil manufacturing roll, which has: The titanium material for metal foil manufacturing described in the above (6) is coated along the outer peripheral surface of the cylindrical inner drum; and The welded portion is disposed on the butted portion of the titanium material.

發明效果 如以上所說明,根據本發明上述態樣,可在將金屬箔製造用鈦材使用於金屬箔製造用之滾筒時抑制產生巨觀模樣。Invention effect As described above, according to the above aspect of the present invention, when the titanium material for metal foil production is used in a roll for metal foil production, the occurrence of macroscopic patterns can be suppressed.

用以實施發明之形態 以下,詳細說明本發明之較佳實施形態。 <背景> 首先,在說明本實施形態之金屬箔製造用鈦材之前,先說明本發明人等著眼於金屬箔製造用鈦材表面的電壓之背景。為了藉由使用鈦作為材料之金屬箔製造滾筒來製造高精度且均質厚度之金屬箔、例如銅箔,重要的係使構成金屬箔製造滾筒的鈦材的化學組成及金屬組織成為均質,來防止鈦材表面的巨觀模樣、及藉由達成滾筒的均質腐蝕,來減低因不均質的巨觀組織所致之巨觀模樣。本發明人等發現透過使鈦材表面的導電性變得均一,可明顯抑制巨觀模樣,並且可明顯抑制在銅箔製造過程中因鈦材表面的不均勻腐蝕導致產生巨觀模樣的情形。Form for carrying out the invention Hereinafter, preferred embodiments of the present invention will be described in detail. <Background> First, before describing the titanium material for metal foil production of the present embodiment, the background of the present inventors focusing on the voltage on the surface of the titanium material for metal foil production will be described. In order to manufacture a metal foil with high precision and a uniform thickness, such as copper foil, by using a metal foil manufacturing roller using titanium as a material, it is important to make the chemical composition and metal structure of the titanium material constituting the metal foil manufacturing roller homogeneous to prevent the The macroscopic appearance of the titanium surface and the homogeneous corrosion of the roller can reduce the macroscopic appearance caused by the inhomogeneous macroscopic structure. The present inventors found that by making the conductivity of the titanium material surface uniform, the macroscopic pattern can be significantly suppressed, and the occurrence of the macroscopic pattern caused by uneven corrosion of the titanium material surface during the copper foil manufacturing process can be significantly suppressed.

會使金屬箔製造用鈦材表面的導電性變動的因素,有化學組成之不均質性、及應變、結晶組織、結晶方位分布等金屬組織之不均質性。因此,金屬箔製造用鈦材表面的電阻率可綜合因化學組成、及結晶組織、結晶方位、缺陷、偏析、加工應變及殘留應變等金屬組織所致之各種內質因素來顯示。Factors that will change the conductivity of the surface of titanium materials for metal foil manufacturing include inhomogeneity of chemical composition, and inhomogeneity of metal structure such as strain, crystal structure, and crystal orientation distribution. Therefore, the resistivity of the surface of titanium material for metal foil manufacturing can be comprehensively displayed due to various endoplasmic factors caused by chemical composition, crystal structure, crystal orientation, defects, segregation, processing strain and residual strain.

例如,有關化學組成,可推斷金屬箔製造用鈦材表面的電阻率(µΩ・cm)係與O、N及C的合計濃度、Fe、Cr、Ni及Mo的合計濃度及氫濃度分別具有正的一次相關。有該等元素偏析的部分與沒有偏析的部分相較之下,電阻率變高。本發明人等得知在內質因素中,又尤其以偏析會影響金屬箔製造用鈦材表面的電阻率。For example, regarding the chemical composition, it can be estimated that the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production is positively related to the total concentration of O, N, and C, the total concentration of Fe, Cr, Ni, and Mo, and the hydrogen concentration, respectively. a correlation. The resistivity of the portion with these elements segregated is higher than that of the portion without segregation. The inventors of the present invention have found that among the intrinsic factors, segregation in particular affects the resistivity of the surface of the titanium material for metal foil production.

又,例如關於金屬組織,可推測金屬箔製造用鈦材表面的電阻率(µΩ・cm)係與應變量具有正的一次相關。另外,可推測金屬箔製造用鈦材表面的電阻率(µΩ・cm)係與電流方向及α相結晶結構的c軸所形成的角具有負的一次相關。並且,可推測金屬箔製造用鈦材表面的電阻率(µΩ・cm)亦與金屬組織中的結晶粒徑之倒數成比例(與結晶粒徑成反比)。又,金屬箔製造用鈦材表面的電阻率(µΩ・cm)當然亦與金屬箔製造用鈦材的表面溫度相關。In addition, for example, regarding the metal structure, it is presumed that the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production has a positive first-order correlation with the amount of strain. In addition, it is presumed that the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production has a negative first-order correlation with the current direction and the angle formed by the c-axis of the α-phase crystal structure. In addition, it is presumed that the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production is also proportional to the reciprocal of the crystal grain size in the metal structure (inversely proportional to the crystal grain size). In addition, the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production is of course also related to the surface temperature of the titanium material for metal foil production.

以上,可推測金屬箔製造用鈦材表面的電阻率(µΩ・cm)係與使巨觀模樣等模樣產生之主要內質因素相關。因此,藉由掌握金屬箔製造用鈦材的表面各部位之電阻,便可掌握金屬箔製造用鈦材的表面各部位之內質因素的參差。 以上係本發明人等著眼於金屬箔製造用鈦材表面之電壓的背景。From the above, it can be presumed that the resistivity (µΩ·cm) of the surface of the titanium material for metal foil production is related to the main internal factor that produces the macroscopic pattern. Therefore, by grasping the resistance of each part of the surface of the titanium material for metal foil production, it is possible to grasp the variation of the endoplasmic factor of each part of the surface of the titanium material for metal foil production. The above is the background that the present inventors paid attention to the voltage on the surface of the titanium material for metal foil production.

<金屬箔製造用鈦材> 本發明人等基於上述知識見解而終至發明出一種金屬箔製造用鈦材,該鈦材在使用於金屬箔製造滾筒時可抑制產生巨觀模樣。本實施形態之金屬箔製造用鈦材在使一對通電電極探針接觸來供給恆定電流,並且使成對的電位檢測探針按固定探針間隔接觸表面來測定表面之複數個位置的電壓時,複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下。此種鈦材尤其係抑制了偏析者,且係抑制了產生巨觀模樣者。以下,詳細說明本實施形態之金屬箔製造用鈦材。<Titanium material for metal foil manufacturing> Based on the above knowledge and knowledge, the inventors of the present invention have finally invented a titanium material for metal foil production, which can suppress the occurrence of macroscopic patterns when used in a metal foil production roll. In the titanium material for metal foil production of the present embodiment, a pair of energized electrode probes are brought into contact to supply a constant current, and a pair of potential detection probes are brought into contact with the surface at a fixed probe interval to measure voltages at a plurality of positions on the surface , the voltage ratio of two adjacent positions among the plurality of positions is 0.95 or more and 1.05 or less. In particular, this kind of titanium material suppresses segregation, and suppresses the generation of macroscopic appearance. Hereinafter, the titanium material for metal foil manufacture of this embodiment is demonstrated in detail.

(電壓比) 本實施形態之金屬箔製造用鈦材,其表面的複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下。當複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下時,該相鄰的2個位置彼此為均質。其結果,在相鄰的位置上不存在巨觀模樣,且在製造金屬箔時亦可抑制產生巨觀模樣。另一方面,複數個位置中相鄰的2個位置的電壓比小於0.95或大於1.05時,該2個位置互相不均質,在鈦材的表面存在巨觀模樣。又,複數個位置中相鄰的2個位置的電壓比小於0.95或大於1.05時,因不均質而造成導電性產生參差,在金屬箔製造過程中,於金屬箔製造中不均質的部分與其他部分之間會產生腐蝕速度的差異,而產生巨觀模樣。(voltage ratio) In the titanium material for metal foil production of the present embodiment, the voltage ratio of two adjacent positions among a plurality of positions on the surface is 0.95 or more and 1.05 or less. When the voltage ratio of two adjacent positions among the plurality of positions is 0.95 or more and 1.05 or less, the two adjacent positions are homogeneous with each other. As a result, macroscopic patterns do not exist in adjacent positions, and generation of macroscopic patterns can also be suppressed when metal foil is produced. On the other hand, when the voltage ratio of two adjacent positions among the plurality of positions is less than 0.95 or more than 1.05, the two positions are not homogeneous with each other, and a macroscopic pattern exists on the surface of the titanium material. In addition, when the voltage ratio of two adjacent positions among the plurality of positions is less than 0.95 or greater than 1.05, the conductivity is uneven due to inhomogeneity. There will be differences in the corrosion rate between the parts, resulting in a macroscopic appearance.

本實施形態之金屬箔製造用鈦材理想係複數個位置中相鄰的2個位置的電壓比之95%以上為0.95以上且在1.05以下,更佳係該電壓比之98%以上為0.95以上且在1.05以下。藉此,金屬箔製造用鈦材在廣範圍係呈均質,可更抑制巨觀模樣。In the titanium material for metal foil production of the present embodiment, the voltage ratio of two adjacent positions among the plurality of positions is ideally 95% or more of 0.95 or more and 1.05 or less, and more preferably 98% or more of the voltage ratio is 0.95 or more. and below 1.05. Thereby, the titanium material for metal foil production is homogeneous in a wide range, and the macroscopic pattern can be further suppressed.

本實施形態之金屬箔製造用鈦材更理想係複數個位置中相鄰的2個位置的電壓比皆為0.95以上且在1.05以下。藉由相鄰的2個位置的電壓比皆為0.95以上且在1.05以下,會成為在所有部位中皆不存在巨觀模樣的金屬箔製造用鈦材,並且在使用該金屬箔製造用鈦材來製造金屬箔時,仍可抑制在該金屬箔製造用鈦材表面的廣大區域產生巨觀模樣。In the titanium material for metal foil production of the present embodiment, it is more desirable that the voltages at two adjacent positions among the plurality of positions are 0.95 or more and 1.05 or less. When the voltage ratio of the adjacent two positions is 0.95 or more and 1.05 or less, the titanium material for metal foil manufacturing has no macroscopic pattern in all parts, and this titanium material for metal foil manufacturing is used. In the case of metal foil production, it is still possible to suppress the occurrence of macroscopic patterns in a wide area of the surface of the titanium material for metal foil production.

在此,參照圖1及2,說明本實施形態之金屬箔製造用鈦材中各部位的電壓之測定方法。圖1係概要圖,用以說明本發明一實施形態之金屬箔製造用鈦材或金屬箔製造滾筒的檢查方法。圖2係金屬箔製造用鈦材之表面之概要圖,顯示本實施形態之金屬箔製造用鈦材或金屬箔製造滾筒的檢查方法中,通電電極探針及電位檢測探針之配置之一例。Here, with reference to FIGS. 1 and 2 , a method for measuring the voltage at each location in the titanium material for metal foil production according to the present embodiment will be described. FIG. 1 is a schematic diagram for explaining an inspection method of a titanium material for metal foil manufacturing or a metal foil manufacturing roller according to an embodiment of the present invention. 2 is a schematic view of the surface of the titanium material for metal foil production, showing an example of the arrangement of the energized electrode probe and the potential detection probe in the inspection method of the titanium material for metal foil production or the metal foil production drum of the present embodiment.

首先,如圖1所示,使一對通電電極探針20A、20B接觸金屬箔製造用鈦材10的表面11而供給恆定電流I。藉此,恆定電流I會在表面11之通電電極探針20A、20B所接觸之a-a’之間流動,並且產生預定電位差。First, as shown in FIG. 1 , a pair of energized electrode probes 20A and 20B are brought into contact with the surface 11 of the titanium material 10 for metal foil production, and a constant current I is supplied. Thereby, a constant current I flows between a-a' contacted by the energized electrode probes 20A, 20B of the surface 11, and a predetermined potential difference is generated.

接著,針對供給有恆定電流I之表面11的複數個位置,使成對的電位檢測探針30A、30B按探針間隔L進行接觸,藉此檢測表面11的複數個位置之複數個電壓V1 ~Vn 。成對的電位檢測探針30A、30B可為重複使其一對一對地接觸表面11來檢測複數個電壓V1 ~Vn ,亦可使複數對同時接觸表面11來檢測複數個電壓V1 ~VnNext, the paired potential detection probes 30A and 30B are brought into contact at a probe interval L with respect to a plurality of positions on the surface 11 to which the constant current I is supplied, thereby detecting a plurality of voltages V 1 at the plurality of positions on the surface 11 ~V n . The paired potential detection probes 30A, 30B can be repeatedly made to contact the surface 11 one by one to detect a plurality of voltages V 1 -V n , or a plurality of pairs can be simultaneously contacted with the surface 11 to detect a plurality of voltages V 1 ~V n .

在此,探針間隔L並無特別限定,例如可視巨觀模樣的大小來決定。在本發明人等的經驗上,巨觀模樣係2~3mm左右。並且,本發明人等發現當探針間隔L為巨觀模樣的3%以上時,可充分有意義地檢測出與其他部位的電壓的差異。因此,探針間隔L例如係67mm以下,且宜在33mm以下。Here, the probe interval L is not particularly limited, and can be determined, for example, depending on the size of the macroscopic pattern. In the experience of the present inventors, the macroscopic shape is about 2 to 3 mm. Furthermore, the present inventors found that when the probe interval L is 3% or more of the macroscopic pattern, the difference in voltage from other parts can be detected sufficiently and meaningfully. Therefore, the probe interval L is, for example, 67 mm or less, and preferably 33 mm or less.

又,探針間隔L例如可視金屬箔製造用鈦材10的平均結晶粒徑來決定。亦即,金屬箔製造用鈦材10的表面11的電阻也會被測定部位中金屬箔製造用鈦材10的結晶晶界的數量影響。因此,從使結晶晶界對電阻之影響變平均的觀點來看,在探針間隔L內,表面11宜包含足夠數量之結晶晶界。In addition, the probe interval L can be determined, for example, depending on the average crystal grain size of the titanium material 10 for metal foil production. That is, the electrical resistance of the surface 11 of the titanium material 10 for metal foil manufacture is also influenced by the number of crystal grain boundaries of the titanium material 10 for metal foil manufacture in the measurement site|part. Therefore, the surface 11 preferably includes a sufficient number of crystal grain boundaries within the probe interval L from the viewpoint of averaging the effect of the crystal grain boundaries on the resistance.

例如,當表面11中觀察到之結晶粒徑落在20~40µm之範圍內時,在2mm的巨觀模樣中會存在50~100個左右的結晶晶界。若考慮到分離由巨觀模樣對電阻造成之影響及由結晶晶界數量所致之影響,則在探針間隔L內,於表面11宜存在至少125個左右的結晶晶界。從上述觀點來看,探針間隔L例如係平均結晶粒徑的125倍以上,且宜為140倍以上。For example, when the crystal grain size observed on the surface 11 falls within the range of 20 to 40 µm, about 50 to 100 crystal grain boundaries exist in the macroscopic pattern of 2 mm. Considering the effect of separation on resistance due to the macroscopic pattern and the effect of the number of crystal grain boundaries, it is preferable that at least about 125 crystal grain boundaries exist on the surface 11 within the probe interval L. From the above viewpoint, the probe interval L is, for example, 125 times or more the average crystal grain size, and preferably 140 times or more.

以上,電位檢測探針30A、30B所接觸之bi-bi’(i係選自1~n之整數)之間的探針間隔L,可視金屬箔製造用鈦材10的平均結晶粒徑及/或巨觀模樣的大小來決定。而若同時考慮平均結晶粒徑及巨觀模樣的大小,探針間隔L例如係平均結晶粒徑的125倍以上且係在67mm以下,而且宜為平均結晶粒徑的140倍以上且係在33mm以下。As described above, the probe interval L between bi-bi' (i is an integer selected from 1 to n) contacted by the potential detection probes 30A and 30B can be determined by the average crystal grain size and/or the titanium material 10 for metal foil manufacturing. Or the size of the giant view. When considering both the average grain size and the size of the macroscopic pattern, the probe spacing L is preferably 125 times or more and 67 mm or less of the average grain size, and preferably 140 times or more and 33 mm. the following.

金屬箔製造用鈦材的表面各部位之電阻係對應在供給恆定電流I時產生的各該部位之電壓。因此,藉由在表面11的通電電極探針20A、20B所接觸的a-a’之間,測定部位b1-b1’~bn-bn’的電壓V1~Vn並將其等進行比較,便可掌握金屬箔製造用鈦材的表面各部位之內質因素的參差。進而,藉由比較部位b1-b1’~bn-bn’的電壓V1 ~Vn ,可評估腐蝕的均一性及金屬箔製造滾筒的品質。The resistance of each part of the surface of the titanium material for metal foil production corresponds to the voltage of each part that is generated when a constant current I is supplied. Therefore, by measuring the voltages V1 to Vn of the parts b1-b1' to bn-bn' between a and a' contacted by the energized electrode probes 20A and 20B of the surface 11 and comparing them, it is possible to Grasp the variation of endoplasmic factors in various parts of the surface of titanium materials for metal foil manufacturing. Furthermore, by comparing the voltages V 1 to V n of the parts b1 - b1 ' to bn-bn', the uniformity of corrosion and the quality of the metal foil manufacturing roll can be evaluated.

例如,圖1中,在部位bn-bn’中存在巨觀模樣等不均質部位12時,部位bn-bn’之電壓Vn 係檢測出與其他部位之電壓不同的值,而可掌握於該部位bn-bn’存在不均質部位12之情況。For example, in FIG. 1, when there is an inhomogeneous portion 12 such as a macroscopic pattern in the portion bn-bn', the voltage Vn of the portion bn-bn' is detected as a value different from that of the other portions, and it can be grasped from this The site bn-bn' has the case where the uneven site 12 exists.

又,用以測定電壓Vi 之部位bi-bi’(i係選自1~n之整數)的排列方式,係如圖2所示地在a-a’之間,在連結某測定對象之部位bi-bi’與其他測定對象之部位bm-bm’(m係選自1~n之整數)之直線L1上,沿著金屬箔製造用鈦材的板寬方向配置。In addition, the arrangement of the positions bi-bi' (i is an integer selected from 1 to n) for measuring the voltage V i is between a-a' as shown in FIG. The part bi-bi' and the part bm-bm' (m is an integer selected from 1-n) of another measurement object are arrange|positioned along the board width direction of the titanium material for metal foil manufacture.

在針對部位bi-bi’檢測了電壓後,從直線L1往相對於板寬方向呈垂直之方向挪移一對通電電極探針20A、20B並使其等進行接觸。在從直線L1挪開後之位置上,測定配置於平行於直線L1之直線L2上之部位c1-c1’~cn-cn’之電壓V1 ’~Vn ’。直線L1與直線L2之間隔並無特別限定,例如宜依視為問題之巨觀模樣及缺陷大小之不同來設為與其等為同等。After detecting the voltage at the site bi-bi', the pair of energized electrode probes 20A and 20B are moved from the straight line L1 in the direction perpendicular to the plate width direction, and are brought into contact with each other. The voltages V 1 ' to V n ' of the positions c1-c1' to cn-cn' arranged on the straight line L2 parallel to the straight line L1 are measured at the positions moved away from the straight line L1. The interval between the straight line L1 and the straight line L2 is not particularly limited, and for example, it is preferable to set it as the same depending on the difference in the macroscopic pattern and the size of the defect that are considered to be problems.

藉由適當重複上述步驟,來針對供給有恆定電流I之表面11的複數個位置檢測複數個電壓V1 ~VnBy appropriately repeating the above steps, a plurality of voltages V 1 to V n are detected for a plurality of positions of the surface 11 to which the constant current I is supplied.

接著,算出複數個位置中相鄰的2個位置的電壓比。具體而言,例如在圖2中,部位bi-bi’(i係選自1~n之整數)之電壓Vi 係分別與鄰接之部位b(i-1)-b(i-1)’之電壓Vi-1 及部位b(i+1)-b(i+1)’之電壓Vi+1 進行比較,算出Vi /Vi-1 及Vi+1 /Vi (或Vi-1 /Vi 及Vi /Vi+1 )。至此,已說明算出金屬箔製造用鈦材的表面中相鄰的2個位置的電壓比之方法。Next, the voltage ratio of two adjacent positions among the plurality of positions is calculated. Specifically, for example, in FIG. 2 , the voltage V i of the part bi-bi' (i is an integer selected from 1 to n) is the same as that of the adjacent parts b(i-1)-b(i-1)', respectively Compare the voltage V i-1 of V i-1 with the voltage V i +1 of the part b(i+1)-b(i+1)' to calculate V i /V i-1 and V i+1 /V i (or V i-1 /V i and V i /V i+1 ). So far, the method of calculating the voltage ratio of two adjacent positions on the surface of the titanium material for metal foil production has been described.

(化學組成) 本實施形態之金屬箔製造用鈦材具有以下化學組成:以質量%計含有:Sn:0%以上且在2.0%以下、Zr:0%以上且在5.0%以下、Al:0%以上且在7.0%以下、N:0%以上且在0.100%以下、C:0%以上且在0.080%以下、H:0%以上且在0.0150%以下、O:0%以上且在1.000%以下、Fe:0%以上且在0.500%以下、Cr:0%以上且在0.500%以下、Ni:0%以上且在0.090%以下、Cu:0%以上且在1.5%以下及Mo:0%以上且在0.750%以下,且剩餘部分為Ti及不純物;並且Fe、Cr及Ni之合計含量為0%以上且在0.500%以下。(chemical components) The titanium material for metal foil production of the present embodiment has the following chemical composition: In mass %, Sn: 0% or more and 2.0% or less, Zr: 0% or more and 5.0% or less, Al: 0% or more and 5.0% or less 7.0% or less, N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less, Fe: 0% or more and 0.500% or less, Cr: 0% or more and 0.500% or less, Ni: 0% or more and 0.090% or less, Cu: 0% or more and 1.5% or less, and Mo: 0% or more and 0.750 % or less, and the remainder is Ti and impurities; and the total content of Fe, Cr, and Ni is 0% or more and 0.500% or less.

本實施形態之金屬箔製造用鈦材可含有Fe、Cr或Ni。Fe、Cr及Ni係β相穩定化元素,故若含有Fe、Cr及Ni就會變得容易形成β相。由於β相會較α相更優先腐蝕,在將表面具有包含β相之鈦材的鈦滾筒用於製造金屬箔時,β相會優先腐蝕而造成滾筒表面產生巨觀模樣。其結果,該巨觀模樣可能會轉印到金屬箔上。因此,Fe、Cr及Ni越少越好,例如Fe、Cr及Ni含量合計宜為0質量%以上且在0.500質量%以下。The titanium material for metal foil production of the present embodiment may contain Fe, Cr, or Ni. Fe, Cr, and Ni are β-phase stabilizing elements, so when Fe, Cr, and Ni are contained, the β-phase is easily formed. Since the β phase corrodes more preferentially than the α phase, when a titanium roller having a titanium material containing the β phase on the surface is used to manufacture a metal foil, the β phase corrodes preferentially, resulting in a macroscopic pattern on the surface of the roller. As a result, the macroscopic pattern may be transferred to the metal foil. Therefore, Fe, Cr, and Ni are preferably as few as possible. For example, the total content of Fe, Cr, and Ni is preferably 0 mass % or more and 0.500 mass % or less.

已知若Fe、Cr及Ni之濃度高,便會與Ti形成化合物。Fe、Cr及Ni譬如會與Ti一同形成TiFe、TiCr2 、Ti2 Ni。其中,相較於Fe及Cr,Ni較易形成Ti之化合物。因此,在熱軋延及退火中之Ni及Ti可擴散的溫度區中,早期會產生屬於形成Ti2 Ni前的階段之前驅階段,並形成Ni濃化的微觀區域。若形成Ni濃化的微觀區域,鈦材表面的硬度會產生參差而變得容易發生研磨不均的情況。結果便容易產生巨觀模樣。為了抑制如上述之Ni濃化,Ni含量例如係在0質量%以上且在0.090質量%以下。Ni含量宜為0.012質量%以上。其原因在於:作為特異現象,有在含有極微量的Ni時容易再結晶之行為,而在軋延步驟的加熱時或熱處理步驟中容易獲得整體厚度均一之金屬組織、例如等軸組織或再結晶組織。另,Ni含量宜為0.070質量%以下。It is known that if the concentrations of Fe, Cr and Ni are high, they form compounds with Ti. Fe, Cr, and Ni form TiFe, TiCr 2 , and Ti 2 Ni together with Ti, for example. Among them, compared with Fe and Cr, Ni is more likely to form a compound of Ti. Therefore, in the temperature region where Ni and Ti can be diffused during hot rolling and annealing, a precursor stage, which is a stage before Ti 2 Ni is formed, is formed at an early stage, and a micro region where Ni is concentrated is formed. When the Ni-concentrated microscopic region is formed, the hardness of the surface of the titanium material is uneven, and uneven polishing is likely to occur. As a result, it is easy to produce a macroscopic appearance. In order to suppress the Ni concentration as described above, the Ni content is, for example, 0 mass % or more and 0.090 mass % or less. The Ni content is preferably 0.012 mass % or more. The reason for this is that, as a special phenomenon, when a very small amount of Ni is contained, recrystallization tends to occur, and a metal structure with a uniform overall thickness, such as an equiaxed structure or recrystallization, is easily obtained during heating in the rolling step or in the heat treatment step. organization. In addition, the Ni content is preferably 0.070 mass % or less.

又,Cu亦會與Ti化合而形成Ti2 Cu。Cu之易與Ti化合的程度係與Fe及Cr程度相同。In addition, Cu also combines with Ti to form Ti 2 Cu. The degree to which Cu is easily combined with Ti is the same as that of Fe and Cr.

Fe含量例如係0.02質量%以上且在0.500質量%以下。雖然如上所述地Fe、Cr及Ni越少越好,但Fe含量例如亦可在0.040質量%以上。The Fe content is, for example, 0.02 mass % or more and 0.500 mass % or less. Although Fe, Cr, and Ni are as few as possible as described above, the Fe content may be, for example, 0.040 mass % or more.

另外,Fe、Cr及Ni係在鈦的凝固過程中往液相的分配量多於往固相的分配量之元素。因此,該等元素係容易在鈦材中偏析的元素。若該等元素偏析而導致化學成分呈不均質,鈦材的面狀態便會呈不均質。In addition, Fe, Cr, and Ni are elements whose distribution amount to the liquid phase is larger than that to the solid phase during the solidification of titanium. Therefore, these elements are elements that are easily segregated in the titanium material. If these elements segregate and cause the chemical composition to be inhomogeneous, the surface state of the titanium material will be inhomogeneous.

為了減低上述化學成分的不均質,本實施形態之金屬箔製造用鈦材宜含有Mo。Mo雖與Fe、Cr、Ni同樣係β相穩定化元素,但其與該等元素不同,係在鈦的凝固過程中往固相的分配量多於往液相的分配量之元素。藉由含有Mo,鈦材中的化學成分會均質化,從而鈦材表面的導電性變得均一。其結果,鈦材的面狀態呈均質,可更抑制產生巨觀模樣。In order to reduce the inhomogeneity of the above-mentioned chemical components, the titanium material for metal foil production of the present embodiment preferably contains Mo. Mo, like Fe, Cr, and Ni, is a β-phase stabilizing element, but unlike these elements, it is an element that distributes more to the solid phase than to the liquid phase during the solidification of titanium. By containing Mo, the chemical components in the titanium material are homogenized, and the conductivity of the surface of the titanium material becomes uniform. As a result, the surface state of the titanium material is homogeneous, and the generation of macroscopic patterns can be further suppressed.

Mo含量相對於Fe、Cr及Ni之以質量%計之合計含量,宜為0.5倍以上且在1.2倍以下。Mo含量相對於Fe、Cr及Ni之以質量%計之合計含量為0.5倍以上且在1.2倍以下,化學成分便會均質化而面狀態呈均質,可抑制產生巨觀模樣。並且,Mo含量相對於Fe、Cr及Ni之以質量%計之合計含量為0.5倍以上且在1.2倍以下,便可將β相之形成抑制在不顯現出α相與β相之腐蝕速度差異之影響的程度。其結果,可使金屬箔製造用之電解液中的鈦的蝕刻行為或銅的電積狀態更穩定。Mo含量相對於Fe、Cr及Ni之以質量%計之合計含量為0.7倍以上較佳。另,Mo含量相對於Fe、Cr及Ni之以質量%計之合計含量為1.0倍以下較佳。The Mo content is preferably 0.5 times or more and 1.2 times or less with respect to the total content in mass % of Fe, Cr, and Ni. When the Mo content is 0.5 times or more and 1.2 times or less the total content in mass % of Fe, Cr, and Ni, the chemical composition is homogeneous and the surface state is homogeneous, and the generation of macroscopic patterns can be suppressed. In addition, when the Mo content is 0.5 times or more and 1.2 times or less with respect to the total content in mass % of Fe, Cr, and Ni, the formation of the β phase can be suppressed so that the difference in corrosion rate between the α phase and the β phase does not appear. degree of influence. As a result, the etching behavior of titanium and the electrodeposition state of copper in the electrolytic solution for metal foil production can be more stabilized. The Mo content is preferably 0.7 times or more the total content in mass % of Fe, Cr, and Ni. Moreover, it is preferable that Mo content is 1.0 times or less with respect to the total content in mass % of Fe, Cr, and Ni.

例如,鈦材之Fe含量為0.0300質量%、Cr含量為0.010質量%且Ni含量為0.020質量%時,Fe、Cr及Ni之合計含量為0.060質量%。因此,此時Mo含量宜為0.030質量%以上且在0.072質量%以下。又,Mo並不一定要含有,故Mo含量的下限值為0質量%。For example, when the Fe content of the titanium material is 0.0300 mass %, the Cr content is 0.010 mass %, and the Ni content is 0.020 mass %, the total content of Fe, Cr and Ni is 0.060 mass %. Therefore, the Mo content at this time is preferably 0.030 mass % or more and 0.072 mass % or less. In addition, Mo does not necessarily need to be contained, so the lower limit of the Mo content is 0 mass %.

另外,本實施形態之金屬箔製造用鈦材可含有O、N、C及H。Moreover, the titanium material for metal foil manufacture of this embodiment may contain O, N, C and H.

O有助於提升鈦材強度,且有助於使表面硬度增加。但若鈦材強度變得過高,在將鈦材製成滾筒時會難以研磨。因此,金屬箔製造用鈦材中含有O時,O含量宜在1.000質量%以下。O含量較佳係在0.120質量%以下,更佳係在0.065質量%以下,在0.055質量%以下又更佳。O contributes to improving the strength of titanium and contributes to increasing the surface hardness. However, if the strength of the titanium material becomes too high, it will be difficult to grind the titanium material when it is made into a drum. Therefore, when O is contained in the titanium material for metal foil production, the O content is preferably 1.000 mass % or less. The O content is preferably 0.120 mass % or less, more preferably 0.065 mass % or less, and still more preferably 0.055 mass % or less.

N在α-Ti中的固溶極限較O小,故有易於與Ti一同形成氮化物的傾向。若形成氮化物,則在滾筒表面有時會產生由研磨所致之不均或因使用時之腐蝕所致之不均。因此,宜極力抑制含有N。N含量例如可設為0.100質量%以下,而較佳係在0.020質量%以下。The solid solution limit of N in α-Ti is smaller than that of O, so it tends to form nitrides together with Ti. When nitrides are formed, unevenness due to grinding or unevenness due to corrosion during use may occur on the surface of the drum. Therefore, it is advisable to suppress N content as much as possible. The N content can be, for example, 0.100 mass % or less, and preferably 0.020 mass % or less.

C在α-Ti中的固溶極限亦較O小,故有易於與Ti一同形成碳化物的傾向。若形成碳化物,則與氮化物的情形相同,在滾筒表面有時會產生由研磨所致之不均或因使用時之腐蝕所致之不均。因此,宜極力抑制含有C。C含量例如可設為0.080質量%以下,而較佳係在0.020質量%以下。The solid solution limit of C in α-Ti is also smaller than that of O, so it tends to form carbides together with Ti. When carbides are formed, unevenness due to grinding or unevenness due to corrosion during use may occur on the surface of the drum as in the case of nitrides. Therefore, C content should be suppressed as much as possible. The C content can be, for example, 0.080 mass % or less, and preferably 0.020 mass % or less.

H會與Ti一同形成氫化物。若形成氫化物,有時鈦板會脆化。另外,有時會因氫化物而導致產生巨觀模樣。因此,宜極力抑制含有H。H含量較佳係在0.013質量%以下。H will form hydrides with Ti. When a hydride is formed, the titanium plate may become brittle. In addition, a macroscopic pattern may occur due to hydrides. Therefore, H should be suppressed as much as possible. The H content is preferably 0.013 mass % or less.

O、N及C係與Mo同樣為在鈦的凝固過程中往固相的分配量多於往液相的分配量之元素。故而,針對上述Mo含量,亦可考慮O、N及C的含量來訂定。O, N, and C are elements that, like Mo, are more distributed to the solid phase than to the liquid phase during the solidification of titanium. Therefore, the content of Mo can also be determined in consideration of the content of O, N, and C.

本實施形態之金屬箔製造用鈦材亦可含有Cu、Sn、Zr或Al中之至少一者。The titanium material for metal foil manufacture of this embodiment may contain at least one of Cu, Sn, Zr, or Al.

本實施形態金屬箔製造用鈦材的化學組成中,剩餘部分可為Ti及不純物。所謂不純物若要具體例示,則有在精煉步驟混入的Cl、Na、Mg、Si及Ca、以及從廢料混入的Nb、Ta及V等,不純物量只要總量在0.5質量%以下則係無問題的程度。In the chemical composition of the titanium material for metal foil production in the present embodiment, the remainder may be Ti and impurities. Specific examples of the impurities include Cl, Na, Mg, Si, and Ca mixed in the refining step, and Nb, Ta, and V mixed from scraps, and so on. As long as the total amount of impurities is 0.5% by mass or less, there is no problem. Degree.

在本實施形態中,如上所述,V係作為不純物被含有。V係會延遲再結晶的元素。若含有過多V,在軋延步驟的加熱時或熱處理步驟中變得不易獲得整體厚度均一之金屬組織、例如等軸組織或再結晶組織。因此,在本實施形態中不添加V。In the present embodiment, as described above, the V series is contained as an impurity. The V series is an element that delays recrystallization. When too much V is contained, it becomes difficult to obtain a metal structure with a uniform thickness throughout, such as an equiaxed structure or a recrystallized structure, during heating in the rolling step or in the heat treatment step. Therefore, V is not added in this embodiment.

更具體而言,若也考慮到會含有的不純物等,則本實施形態之金屬箔製造用鈦材例如以質量%計可含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下及 O:0%以上且在0.400%以下。More specifically, in consideration of impurities and the like that may be contained, the titanium material for metal foil production according to the present embodiment may contain, for example, by mass %: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less and O: 0% or more and 0.400% or less.

另外,本實施形態之金屬箔製造用鈦材例如含有Fe、Cr、Ni及Mo, Ni含量為0質量%以上且在0.090質量%以下,並且 以質量基準計,Mo含量相對於Fe、Cr及Ni之合計含量為0.5倍以上且在1.2倍以下。In addition, the titanium material for metal foil production of the present embodiment contains, for example, Fe, Cr, Ni, and Mo, The Ni content is 0 mass % or more and 0.090 mass % or less, and The Mo content is 0.5 times or more and 1.2 times or less with respect to the total content of Fe, Cr, and Ni on a mass basis.

又,本實施形態之金屬箔製造用鈦材例如以質量%計可含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在0.400%以下、 Fe:0.02%以上且在0.500%以下、 Ni:0%以上且在0.090%以下及 Cu:0%以上且在1.5%以下,且 剩餘部分含有Ti及不純物。Moreover, the titanium material for metal foil manufacture of this embodiment may contain, for example, in mass %: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 0.400% or less, Fe: 0.02% or more and 0.500% or less, Ni: 0% or more and 0.090% or less and Cu: 0% or more and 1.5% or less, and The remainder contains Ti and impurities.

此外,本實施形態之金屬箔製造用鈦材例如以質量%計可含有由以下所構成群組構成之1種或2種以上元素且合計達0.2%以上且在5.0%以下: Sn:0.2%以上且在2.0%以下、 Zr:0.2%以上且在5.0%以下及 Al:0.2%以上且在3.0%以下, 並且含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在1.000%以下及 Fe:0%以上且在0.500%以下,且 剩餘部分含有Ti及不純物。In addition, the titanium material for metal foil production of the present embodiment may contain, for example, by mass %, one or two or more kinds of elements consisting of the following groups in a total amount of 0.2% or more and 5.0% or less: Sn: 0.2% or more and 2.0% or less, Zr: 0.2% or more and 5.0% or less and Al: 0.2% or more and 3.0% or less, and contains: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less and Fe: 0% or more and 0.500% or less, and The remainder contains Ti and impurities.

另外,本實施形態之金屬箔製造用鈦材例如含有大於1.8質量%且在7.0質量%以下之Al,且剩餘部分含有Ti及不純物,並且 以質量%計,令Al含量為[Al%]、Zr含量為[Zr%]、Sn含量為[Sn%]且令O含量為[O%]時,下述式(1)所示Al當量Aleq為7.0質量%以下: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] 式(1)。In addition, the titanium material for metal foil production of the present embodiment contains, for example, more than 1.8 mass % and 7.0 mass % or less of Al, and the remainder contains Ti and impurities, and In terms of mass %, when the Al content is [Al%], the Zr content is [Zr%], the Sn content is [Sn%], and the O content is [O%], the Al equivalent represented by the following formula (1) Aleq is 7.0 mass % or less: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] Formula (1).

又,上述說明之各元素含量的下限值為0質量%,而本實施形態之金屬箔製造用鈦材當然亦可不含上述各元素。 以上,說明了本實施形態金屬箔製造用鈦材的化學組成。In addition, although the lower limit of the content of each element described above is 0 mass %, it goes without saying that the titanium material for metal foil production of the present embodiment may not contain each of the above-mentioned elements. The chemical composition of the titanium material for metal foil production of the present embodiment has been described above.

以上說明之本實施形態金屬箔製造用鈦材,其表面的複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下,故相鄰部位彼此的化學組成的影響為均質。其結果,在相鄰部位不存在巨觀模樣,且在製造金屬箔時亦可抑制產生巨觀模樣。The above-described titanium material for metal foil production of the present embodiment has a voltage ratio of 0.95 or more and 1.05 or less at two adjacent positions among the plurality of positions on the surface, so the influence of the chemical composition of the adjacent parts is homogeneous. As a result, the macroscopic pattern does not exist in the adjacent portion, and the generation of the macroscopic pattern can also be suppressed when the metal foil is produced.

又,關於巨觀模樣,可利用#800之砂紙來研磨鈦板表面後,使用硝酸10質量%及氫氟酸5質量%溶液腐蝕表面,藉此進行觀察。於圖3、4顯示產生有巨觀模樣之鈦材表面的照片作為一例。又,圖3與圖4係互相不同的鈦板的照片。「巨觀模樣」係指以下部分:沿著軋延方向產生有數mm長度的筋條狀且顏色不同之部位。例如,圖4中,圖4(A)的箭頭所示位置生成有圖4(B)所示形狀的巨觀模樣。若鈦材產生此種巨觀模樣,則該巨觀模樣最終會轉印到所製造的金屬箔。In addition, the macroscopic pattern can be observed by polishing the surface of the titanium plate with #800 sandpaper, and then etching the surface with a solution of 10% by mass of nitric acid and 5% by mass of hydrofluoric acid. Figures 3 and 4 show photographs of the surface of the titanium material having a macroscopic appearance as an example. 3 and 4 are photographs of mutually different titanium plates. The "macroscopic pattern" refers to the following parts: the part where there are rib-like shapes of several mm in length along the rolling direction and the parts are different in color. For example, in FIG. 4, a macroscopic pattern of the shape shown in FIG. 4(B) is generated at the position indicated by the arrow in FIG. 4(A). If the titanium material produces such a macroscopic pattern, the macroscopic pattern will eventually be transferred to the manufactured metal foil.

如以上所說明,本實施形態之金屬箔製造用鈦材在用於金屬箔製造用之滾筒時可充分抑制產生巨觀模樣,故而適合作為金屬箔製造用之滾筒的材料。因此,本發明在其一面向上亦涉及使用本發明之金屬箔製造用鈦材製出之金屬箔製造滾筒。如上述之金屬箔製造滾筒抑制了巨觀模樣的產生,而可製造高品質的銅箔。As described above, the titanium material for metal foil manufacturing of the present embodiment can sufficiently suppress the generation of macroscopic patterns when used in a metal foil manufacturing roll, and is therefore suitable as a material for a metal foil manufacturing roll. Therefore, the present invention also relates to a metal foil manufacturing roller made of the titanium material for metal foil manufacturing of the present invention on one side. The above-mentioned metal foil manufacturing roll suppresses the generation of macroscopic patterns, and can manufacture high-quality copper foil.

參照圖5及6,說明使用本發明之金屬箔製造用鈦材製出之金屬箔製造滾筒。圖5係銅箔製造裝置的示意圖,其顯示金屬箔製造滾筒之一使用態樣,圖6係顯示本發明一實施形態之金屬箔製造滾筒的示意圖。銅箔製造裝置100,譬如係如圖5所示具備:電解槽110,蓄有硫酸銅溶液;電沉積滾筒120,以一部分會浸漬於硫酸銅溶液中之方式設於電解槽110內;及電極板130,在電解槽110內以浸漬於硫酸銅溶液中並與電沉積滾筒120之外周面按預定間隔相對向之方式設置。藉由在電沉積滾筒120與電極板130之間施加電壓,銅箔F會電沉積於電沉積滾筒120之外周面而生成。達預定厚度之銅箔F係藉由捲取部140從金屬箔製造滾筒120剝離,並一邊以導輥150引導一邊捲取於捲取輥160。5 and 6, the use of the metal foil manufacturing roller made of the titanium material for metal foil manufacturing of the present invention will be described. FIG. 5 is a schematic diagram of a copper foil manufacturing apparatus, which shows a usage state of a metal foil manufacturing roller, and FIG. 6 is a schematic diagram showing a metal foil manufacturing roller according to an embodiment of the present invention. For example, as shown in FIG. 5, the copper foil manufacturing apparatus 100 is provided with: an electrolytic tank 110 in which a copper sulfate solution is stored; an electrodeposition drum 120 is provided in the electrolytic tank 110 so that a part of it is immersed in the copper sulfate solution; and electrodes The plate 130 is immersed in the copper sulfate solution in the electrolytic tank 110 and is disposed opposite to the outer peripheral surface of the electrodeposition drum 120 at predetermined intervals. By applying a voltage between the electrodeposition roller 120 and the electrode plate 130 , the copper foil F is electrodeposited on the outer peripheral surface of the electrodeposition roller 120 to be generated. The copper foil F having a predetermined thickness is peeled off from the metal foil production drum 120 by the winding unit 140 , and is wound around the winding roll 160 while being guided by the guide roll 150 .

電沉積滾筒120具備:圓筒狀之內滾筒121;本實施形態之金屬箔製造用鈦材122,其沿著該內滾筒121的外周面被覆;熔接部123,其配置於該金屬箔製造用鈦材122的對接部;側板124,其設於內滾筒的側面;及旋轉軸125。本實施形態之金屬箔製造滾筒係以本實施形態之金屬箔製造用鈦材122與熔接部123來構成,該金屬箔製造用鈦材122係電沉積滾筒120之一部分且沿著圓筒狀之內滾筒121的外周面被覆,該熔接部123配置於該金屬箔製造用鈦材122的對接部。側板124係被覆於內滾筒121及金屬箔製造用鈦材122的軸方向的兩端。並且,旋轉軸125係以與內滾筒121的中心軸A為同軸的方式設於側板124。The electrodeposition drum 120 includes: a cylindrical inner drum 121; a titanium material 122 for metal foil production of the present embodiment, which is coated along the outer peripheral surface of the inner drum 121; The butt joint part of the titanium material 122 ; the side plate 124 , which is arranged on the side surface of the inner drum; and the rotating shaft 125 . The metal foil manufacturing roll of the present embodiment is constituted by the metal foil manufacturing titanium material 122 of the present embodiment and the welding part 123. The metal foil manufacturing titanium material 122 is a part of the electrodeposition roll 120 and extends along the cylindrical shape. The outer peripheral surface of the inner drum 121 is covered, and the welding part 123 is arranged at the butting part of the titanium material 122 for metal foil production. The side plates 124 are coated on both ends in the axial direction of the inner drum 121 and the titanium material 122 for metal foil production. In addition, the rotation shaft 125 is provided on the side plate 124 so as to be coaxial with the central axis A of the inner drum 121 .

本實施形態之金屬箔製造滾筒可利用周知方法製造,例如將本實施形態之金屬箔製造用鈦板材伸展設置於內滾筒的外側面,並熔接經加工成圓筒狀之金屬箔製造用鈦材的被相對的2個端部而製造。The metal foil manufacturing roller of this embodiment can be manufactured by a known method. For example, the titanium sheet for metal foil manufacturing of this embodiment is stretched and arranged on the outer surface of the inner roller, and the titanium material for metal foil manufacturing processed into a cylindrical shape is welded. are manufactured with 2 opposite ends.

本實施形態之金屬箔製造滾筒的尺並無特別限制,例如其直徑可為1m以上,亦可為2m以上,另亦可在5m以下。The ruler of the metal foil manufacturing roll of this embodiment is not specifically limited, For example, the diameter may be 1 m or more, 2 m or more, or 5 m or less.

如上述之金屬箔製造滾筒抑制了巨觀模樣的產生,而可製造高品質的銅箔。The above-mentioned metal foil manufacturing roll suppresses the generation of macroscopic patterns, and can manufacture high-quality copper foil.

以上說明之本實施形態之金屬箔製造用鈦材可利用任何方法來製造,例如亦可利用以下說明之本實施形態金屬箔製造用鈦材之製造方法來製造。The titanium material for metal foil production of the present embodiment described above can be produced by any method, for example, the production method of the titanium material for metal foil production of the present embodiment described below.

<金屬箔製造用鈦材之製造方法> 接下來,說明本實施形態金屬箔製造用鈦材之製造方法。本實施形態金屬箔製造用鈦材之製造方法具有以下步驟:利用連續鑄造手段來製造鈦鑄錠之步驟,該連續鑄造手段係將熔融後的鈦注入一上面及下面開口之可冷卻的鑄模內,且加熱前述鑄模內之熔融後的鈦之液面,並透過前述鑄模冷卻前述鈦使其凝固,並且使用夾具將凝固後的前述鈦往下方拉出;加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延來製造軋延板之步驟;及,在600℃以上且750℃以下之溫度下進行20分鐘以上且120分鐘以下時間之熱處理,且以20℃/分鐘以上的平均冷卻速度從熱處理溫度冷卻至500℃,並且以10℃/分鐘以下的平均冷卻速度從熱處理溫度冷卻至300℃以下之溫度之步驟。<Manufacturing method of titanium material for metal foil manufacturing> Next, the manufacturing method of the titanium material for metal foil manufacture of this embodiment is demonstrated. The method for producing a titanium material for metal foil production according to the present embodiment includes the following steps: a step of producing a titanium ingot by a continuous casting method in which molten titanium is poured into a coolable mold with upper and lower openings. , and heat the molten titanium level in the casting mold, cool the titanium through the casting mold to solidify it, and use a clamp to pull the solidified titanium downward; heat it to above 750°C and lower than the β metamorphosis The step of manufacturing a rolled sheet by rolling with a reduction ratio of 90% or more; and, performing a heat treatment at a temperature of 600°C or more and 750°C or less for 20 minutes or more and 120 minutes or less. , and cooling from the heat treatment temperature to 500°C at an average cooling rate of 20°C/min or more, and cooling from the heat treatment temperature to a temperature below 300°C at an average cooling rate of 10°C/min or less.

(鈦鑄錠之製造步驟) 首先,利用電子束熔解法(EBR:Electron Beam Remelting)或電漿熔解法(PAM:Plasma Arc Melting)來熔解具有上述化學成分之鈦,並製造鈦鑄錠。EBR係從電子束槍對以鈦為首之熔解原料照射電子束來熔解,PAM則係從電漿炬對以鈦為首之熔解原料照射電漿弧來熔解。相較於藉由在鈦製消耗電極與水冷銅鑄模內的熔融鈦之間的電弧來熔解電極之真空電弧熔解法(VAR:Vacuum Arc Remelting),EBR或PAM之在鑄模內存在熔融後的鈦的部分、亦即熔池較淺,凝固速度快,故可減輕Fe、Cr、Ni、O等的凝固偏析。藉由使用抑制了凝固偏析的鈦鑄錠,所製造之金屬箔製造用鈦材就會均質化。其結果,鈦材的面狀態呈均質,可抑制產生巨觀模樣。(Manufacturing steps of titanium ingot) First, titanium having the above-mentioned chemical composition is melted by an electron beam melting method (EBR: Electron Beam Remelting) or a plasma melting method (PAM: Plasma Arc Melting), and a titanium ingot is produced. EBR is melted by irradiating an electron beam to the melting raw material including titanium from an electron beam gun, and PAM is melted by irradiating a plasma arc to the melting raw material including titanium from a plasma torch. Compared with the vacuum arc melting method (VAR: Vacuum Arc Remelting), which melts the electrode by the arc between the titanium consumable electrode and the molten titanium in the water-cooled copper mold, the EBR or PAM has the molten titanium in the mold. The part of the molten metal, that is, the molten pool is shallow and the solidification speed is fast, so it can reduce the solidification segregation of Fe, Cr, Ni, O, etc. By using a titanium ingot in which solidification segregation is suppressed, the produced titanium material for metal foil production can be homogenized. As a result, the surface state of the titanium material is homogeneous, and the occurrence of macroscopic patterns can be suppressed.

對於鈦的熔解,為使熔池深度及形狀穩定,要使往鑄模內的鈦液面之入熱分布均勻且穩定,為此,較理想係應用能量源之照射掃描較快且容易的電子束熔解法(EBR)。 以下,針對本實施形態金屬箔製造用鈦材之製造方法所用之電子束熔解法(EBR)及電漿熔解法(PAM),分別詳細說明。For the melting of titanium, in order to stabilize the depth and shape of the molten pool, the heat distribution into the titanium liquid surface in the casting mold should be uniform and stable. Melting method (EBR). Hereinafter, the electron beam melting method (EBR) and the plasma melting method (PAM) used in the manufacturing method of the titanium material for metal foil manufacturing according to the present embodiment will be described in detail, respectively.

[電子束熔解法(EBR)] 電子束熔解法係以下方法:藉由在真空中從電子槍發射的電子束來熔解鈦等的金屬,且將熔融後的金屬注入水冷銅鑄模等鑄模中使其凝固,來製造鑄錠。一般而言,係使用無底鑄模一邊拉出一邊連續鑄造鑄錠。此時,係一邊透過對鑄模內的熔湯面照射電子束來加熱以維持鑄模內的液面一邊進行。[Electron Beam Melting (EBR)] The electron beam melting method is a method for producing an ingot by melting metals such as titanium by electron beams emitted from an electron gun in a vacuum, and pouring the melted metal into a mold such as a water-cooled copper mold to solidify it. Generally, an ingot is continuously cast while being drawn out using a bottomless casting mold. At this time, it is performed by irradiating an electron beam to the molten soup surface in a casting_mold|template, maintaining the liquid level in a casting_mold|template by heating.

為使熔池深度及形狀穩定且維持液面,宜以令鑄模內之往鑄模內照射之電子束輸出功率除以鑄模內面積所得之值、亦即每單位面積的照射量在150W/cm2 以下且使熔解速度在2.5ton/h以下之條件來熔解鈦。熔解速度較佳係0.5~2.0t/h。In order to stabilize the depth and shape of the molten pool and maintain the liquid level, it is advisable to divide the output power of the electron beam irradiated into the mold by the area of the mold, that is, the irradiation amount per unit area is 150W/ cm2 . Titanium is melted below and under the conditions that the melting rate is 2.5 ton/h or less. The melting rate is preferably 0.5~2.0t/h.

[電漿熔解法(PAM)] 電漿熔解法係以下方法:在氬氣環境等非活性氣體環境中,藉由從電漿炬發射的電漿弧來熔解鈦等的金屬,且將熔融後的金屬注入水冷銅鑄模等鑄模中使其凝固,來製造鑄錠。一般而言,係使用無底鑄模一邊拉出一邊連續鑄造鑄錠。此時,係一邊透過對鑄模內的熔湯面照射電漿弧來加熱以維持鑄模內的液面一邊進行。[Plasma Melting (PAM)] The plasma melting method is a method in which metals such as titanium are melted by a plasma arc emitted from a plasma torch in an inert gas environment such as an argon atmosphere, and the melted metal is poured into a casting mold such as a water-cooled copper mold. It is solidified to make an ingot. Generally, an ingot is continuously cast while being drawn out using a bottomless casting mold. At this time, it is performed by irradiating a plasma arc to the molten soup surface in a casting_mold|template, and maintaining the liquid level in a casting_mold|template.

為使熔池深度及形狀穩定且維持液面,宜以令往鑄模內照射之電漿輸出功率除以鑄模內面積所得之值、亦即每單位面積的照射量在380W/cm2 以下且使熔解速度在2.5ton/h以下之條件來熔解鈦。熔解速度較佳係0.5~2.0t/h。In order to stabilize the depth and shape of the molten pool and maintain the liquid level, it is advisable to divide the output power of the plasma irradiated into the mold by the area inside the mold, that is, the irradiation amount per unit area is below 380W/cm 2 and Titanium is melted under the condition that the melting rate is below 2.5 ton/h. The melting rate is preferably 0.5~2.0t/h.

於圖7、圖8顯示使用於EBR或PAM的鑄模40的水平截面之例。如圖7所示的圓形鑄模40A及如圖8所示的矩形鑄模40B係使用於EBR或PAM的鑄模的水平截面之代表例。在該水平截面中,鑄模40A的內部空間41A及鑄模40B的內部空間41B各自的單位cm2 之面積與單位cm之周長之比、亦即面積/周長宜為7.5cm以上且在22.5cm以下。藉此,由鑄模所帶來的鈦熔湯的冷卻速度變大,可更抑制凝固偏析。面積/周長較佳係在15.0cm以下,在11.0cm以下更佳,此種面積/周長之鑄模可明顯抑制凝固偏析。從生產性的觀點來看,面積/周長實質上以7.5cm以上為佳。又,水平截面例如為矩形形狀時,其4個角部C大多會被去角而形成多角形,因而要考慮圖8所示形狀來求算上述面積、周長。又,鑄模厚度並無特別限制,例如亦可小於300mm。An example of the horizontal cross section of the mold 40 used for EBR or PAM is shown in FIGS. 7 and 8 . The circular mold 40A shown in FIG. 7 and the rectangular mold 40B shown in FIG. 8 are representative examples of horizontal cross-sections of molds used for EBR or PAM. In this horizontal cross section, the ratio of the area per unit cm 2 of the inner space 41A of the casting mold 40A and the inner space 41B of the casting mold 40B to the perimeter per cm, that is, the area/perimeter length, is preferably 7.5 cm or more and 22.5 cm or less. Thereby, the cooling rate of the titanium molten metal by the casting mold becomes large, and solidification segregation can be suppressed more. The area/perimeter is preferably below 15.0cm, more preferably below 11.0cm, and the casting mold with such area/perimeter can obviously suppress solidification segregation. From the viewpoint of productivity, the area/perimeter length is substantially preferably 7.5 cm or more. Also, when the horizontal cross section is rectangular, for example, the four corners C are chamfered to form a polygon. Therefore, the area and the perimeter are calculated in consideration of the shape shown in FIG. 8 . Moreover, the thickness of a casting_mold|template is not specifically limited, For example, it may be less than 300 mm.

如上所述,EBR可容易移動電子束照射位置,因此適於維持鑄模內的熔湯面與熔湯池形狀穩定。從而,藉由使用電子束熔解,並在往鑄模內照射之電子束輸出功率中將每單位面積的照射量(Y)依面積/周長(X)來設為式(2)之範圍,便可更維持鑄模內的熔湯面與熔湯池形狀穩定。 Y=-3.8X+(135±25) ・・・式(2)As described above, the EBR can easily move the electron beam irradiation position, so it is suitable for maintaining the shape of the molten noodle and the molten pool in the mold stable. Therefore, by using electron beam melting, and setting the irradiation amount per unit area (Y) in accordance with the area/perimeter (X) in the electron beam output power irradiated into the mold to the range of the formula (2), it is possible to The shape of the molten noodle and the molten pool in the mold can be maintained more stable. Y=-3.8X+(135±25) ・・・Formula (2)

(扁胚製造步驟) 本實施形態金屬箔製造用鈦材之製造方法具有將鈦鑄錠進行熱加工來製造扁胚之扁胚製造步驟,在製造軋延板的步驟中,宜以上述扁胚取代鈦鑄錠來進行軋延。例如,亦可視需求,在軋延前透過周知方法對鈦鑄錠進行在熱處理下之鍛造或分塊軋延,來從鈦鑄錠製造扁胚。在圓柱形鑄錠時、或者就算為矩形鑄錠但有必要調整厚度、寬度等時,皆可實施本步驟。藉由使用該扁胚,在軋延步驟中可更均一地軋延,而可使金屬組織成為更均勻者。(Flat embryo manufacturing steps) The method for producing a titanium material for metal foil production according to the present embodiment includes a flat blank manufacturing step of hot-working a titanium ingot to produce a flat blank. In the step of producing a rolled sheet, the above-mentioned flat blank is preferably used instead of the titanium ingot. rolling. For example, flat billets may also be produced from titanium ingots by forging under heat treatment or block rolling by known methods prior to rolling, if desired. This step can be performed when a cylindrical ingot is cast, or when it is necessary to adjust the thickness, width, etc. even if it is a rectangular ingot. By using this flat blank, it is possible to roll more uniformly in the rolling step, so that the metal structure can be made more uniform.

(軋延步驟) 接著,直接軋延所製造之鈦鑄錠、或者將視需求而被熱加工成軋延用形狀之扁胚進行軋延,來製造軋延板。在本步驟中,將被軋延胚料加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延。針對加熱溫度及軋縮率,於以下進行說明。(rolling step) Next, the produced titanium ingot is directly rolled, or the flat billet that has been hot-worked into a rolling shape as required is rolled to produce a rolled sheet. In this step, the billet to be rolled is heated to a temperature higher than 750° C. and lower than the β transformation point, and rolling is performed so that the reduction ratio becomes 90% or higher. The heating temperature and the reduction ratio will be described below.

本步驟中之加熱溫度為750℃以上且低於β變態點。藉由加熱至750℃以上且低於β變態點的溫度,可充分使金屬組織等軸化,而可防止軋延板產生巨觀模樣。軋延溫度宜為200℃以上。並且,軋延溫度宜在(β變態點-50)℃以下。The heating temperature in this step is above 750°C and below the β transformation point. By heating to a temperature of 750° C. or higher and lower than the β transformation point, the metal structure can be sufficiently equiaxed, and the macroscopic pattern of the rolled sheet can be prevented. The rolling temperature is preferably above 200°C. In addition, the rolling temperature is preferably (β transformation point-50)°C or lower.

本步驟中之軋縮率為90%以上。藉由將軋縮率設為90%以上,可充分使粗大晶粒微細化並且軋延板的金屬組織會等軸化,而可防止產生巨觀模樣。本步驟中之軋縮率愈高,組織就變得愈佳,故只要配合所需之製品尺寸及製造磨機的特性來訂定即可。The reduction ratio in this step is more than 90%. By setting the reduction ratio to 90% or more, the coarse crystal grains can be sufficiently refined and the metallographic structure of the rolled sheet can be equiaxed, thereby preventing the occurrence of macroscopic patterns. The higher the reduction ratio in this step, the better the structure will be, so it only needs to be determined according to the required product size and the characteristics of the manufacturing mill.

另外,將鈦鑄錠加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延,便可對軋延板整體均質且充分地導入再結晶核。In addition, by heating the titanium ingot to a temperature of 750°C or higher and lower than the β transformation point, and rolling it so that the reduction ratio is 90% or higher, recrystallization nuclei can be introduced into the entire rolled sheet homogeneously and sufficiently. .

在此,本實施形態中「β變態點」意指在將鈦合金從β相單相區冷卻時會開始生成α相之境界溫度。β變態點可從狀態圖取得。狀態圖則可藉由例如CALPHAD(Computer Coupling of Phase Diagrams and Thermochemistry)法取得。具體而言,可使用Thermo-Calc Sotware AB公司之整合型熱力學計算系統Thermo-Calc及預定資料庫(TI3),藉由CALPHAD法取得鈦合金的狀態圖來算出β變態點。Here, the "β transformation point" in this embodiment means the boundary temperature at which the α phase starts to be generated when the titanium alloy is cooled from the β phase single-phase region. The beta metamorphosis point can be obtained from the state diagram. State diagrams can be obtained by, for example, CALPHAD (Computer Coupling of Phase Diagrams and Thermochemistry). Specifically, the integrated thermodynamic calculation system Thermo-Calc of Thermo-Calc Sotware AB and a predetermined database (TI3) can be used to obtain the state diagram of the titanium alloy by the CALPHAD method to calculate the β transformation point.

(熱處理步驟) 接著,將軋延板在600℃以上且750℃以下的溫度下進行20分鐘以上且120分鐘以下時間的熱處理,且以20℃/分鐘以上的平均冷卻速度從熱處理溫度冷卻至500℃,並且以10℃/分鐘以下的平均冷卻速度從熱處理溫度冷卻至300℃以下之溫度。藉由在600℃以上且750℃以下的溫度下進行20分鐘以上且120分鐘以下時間的熱處理,便可對軋延板整體形成均質的再結晶組織。並且,從熱處理溫度至500℃的平均冷卻速度為20℃/分鐘以上,便能降低以在冷卻過程中產生之形成第二相作為驅動力的元素分配,而抑制因元素分配所致之微觀成分分布的參差。另外,藉由以10℃/分鐘以下的速度從熱處理溫度冷卻至300℃以下的溫度,可減低源自因冷卻而生的熱收縮之殘留應變。其結果,可獲得成分分布及殘留應變呈均質之均質性高的鈦板。(heat treatment step) Next, the rolled sheet is subjected to heat treatment at a temperature of 600° C. or more and 750° C. or less for 20 minutes or more and 120 minutes or less, and is cooled from the heat treatment temperature to 500° C. at an average cooling rate of 20° C./min or more, and is The average cooling rate of 10°C/min or less is cooling from the heat treatment temperature to a temperature of 300°C or less. By performing heat treatment at a temperature of 600° C. or higher and 750° C. or lower for 20 minutes or more and 120 minutes or less, a homogeneous recrystallized structure can be formed in the entire rolled sheet. In addition, if the average cooling rate from the heat treatment temperature to 500°C is 20°C/min or more, the element distribution driven by the formation of the second phase generated during the cooling process can be reduced, and the microscopic composition caused by the element distribution can be suppressed. Variation in distribution. In addition, by cooling from the heat treatment temperature to a temperature of 300° C. or less at a rate of 10° C./min or less, residual strain due to thermal shrinkage caused by cooling can be reduced. As a result, a titanium plate with high homogeneity in which the component distribution and residual strain are homogeneous can be obtained.

(檢査步驟) 針對歷經熱處理步驟而得之鈦材,亦可利用上述方法進行檢査,來檢査表面的均質性。(check step) For the titanium material obtained through the heat treatment step, the above method can also be used for inspection to check the homogeneity of the surface.

由本實施形態金屬箔製造用鈦材之製造方法製出之鈦材,其化學組成及金屬組織被均質化。由此,由本實施形態金屬箔製造用鈦材之製造方法製出之鈦材,在以一對通電電極探針接觸其表面而供給有恆定電流之表面中,成對的電位檢測探針按固定探針間隔接觸上述表面的複數個位置而檢測出的複數個電壓中,相鄰的2個位置的電壓比達0.95以上且在1.05以下。其結果,在將由本實施形態金屬箔製造用鈦材之製造方法製出之鈦材使用於金屬箔製造用之滾筒時,可抑制產生巨觀模樣。 以上,已說明了本實施形態鈦板之製造方法。The chemical composition and metal structure of the titanium material produced by the method for producing a titanium material for metal foil production of the present embodiment are homogenized. Accordingly, in the titanium material produced by the method for producing a titanium material for metal foil production of the present embodiment, the paired potential detection probes are fixed on the surface of the titanium material to which a pair of energized electrode probes is in contact with the surface and supplied with a constant current. Among the plurality of voltages detected by the probes contacting the plurality of positions on the surface at intervals, the voltage ratio of the adjacent two positions is 0.95 or more and 1.05 or less. As a result, when the titanium material manufactured by the manufacturing method of the titanium material for metal foil manufacture of this embodiment is used for the roller for metal foil manufacture, generation|occurrence|production of a macroscopic pattern can be suppressed. The manufacturing method of the titanium plate of the present embodiment has been described above.

又,本實施形態之金屬箔製造用鈦材係如上述地在被收縮配合(shrink fit)於內滾筒上後,經研磨表面而成為金屬箔製造滾筒之表層(top skin)。若研磨時的負荷產生參差,則導入滾筒表面正下方之應變量有時會產生參差。若應變量產生參差,金屬箔製造滾筒表面的電阻率有時會改變。因此,研磨金屬箔製造滾筒時的負荷的變動範圍宜設為10%以下,較佳係在5%以下,在3%以下更佳。In addition, the titanium material for metal foil manufacturing of this embodiment is shrink-fitted on the inner drum as described above, and then the surface is ground to become the top skin of the metal foil manufacturing drum. If the load at the time of grinding varies, the amount of strain introduced directly under the surface of the drum may vary. If the amount of strain varies, the resistivity of the surface of the metal foil manufacturing roll may sometimes change. Therefore, the fluctuation range of the load at the time of polishing the metal foil to manufacture the drum is preferably 10% or less, preferably 5% or less, and more preferably 3% or less.

又,藉由使用金屬箔製造用鈦材製出之金屬箔製造滾筒來製造的金屬箔並無特別限定,例如係銅箔、鎳箔、鋁箔、鐵箔等。Moreover, the metal foil manufactured by using the metal foil manufacturing roll made of the titanium material for metal foil manufacturing is not specifically limited, For example, copper foil, nickel foil, aluminum foil, iron foil, etc. are mentioned.

以下,顯示實施例並且具體說明本發明實施形態。又,以下所示實施例僅為本發明之一例,本發明並非限定於下述例。Hereinafter, an Example is shown and embodiment of this invention is demonstrated concretely. In addition, the Example shown below is only an example of this invention, and this invention is not limited to the following example.

[實施例1] (製造鈦材) 首先,準備複數個具有不同化學組成的鈦的原料,以表1~6所示熔解方法熔解鈦的原料,製造出鈦鑄錠。[Example 1] (manufacturing titanium) First, a plurality of titanium raw materials having different chemical compositions were prepared, and the titanium raw materials were melted by the melting methods shown in Tables 1 to 6 to produce a titanium ingot.

[表1]

Figure 02_image001
[Table 1]
Figure 02_image001

[表2]

Figure 02_image003
[Table 2]
Figure 02_image003

[表3]

Figure 02_image005
[table 3]
Figure 02_image005

[表4]

Figure 02_image007
[Table 4]
Figure 02_image007

[表5]

Figure 02_image009
[table 5]
Figure 02_image009

[表6]

Figure 02_image011
[Table 6]
Figure 02_image011

在電子束熔解法中,以每單位面積的照射量(Y)依鑄模的面積/周長(X)而成為式(2)的範圍之方式,視鑄模形狀來調整往鑄模內照射之電子束輸出功率,並以式(2)之約中心值作為其目標值。惟,雖一部分包含使電子束照射輸出功率從式(2)之中心值改變的情況,但電子束熔解法中之電子束照射量皆設為150W/cm2 以下。另外,熔解速度皆係以達2.5ton/h以下之方式進行而將目標值設為1.0ton/h。 Y=-3.8X+(135±25)   ・・・式(2)In the electron beam melting method, the electron beam irradiated into the mold is adjusted according to the shape of the mold so that the irradiation amount (Y) per unit area falls within the range of the formula (2) according to the area/perimeter (X) of the mold output power, and take the approximate central value of formula (2) as its target value. However, although the electron beam irradiation output power was partially changed from the central value of the formula (2), the electron beam irradiation amount in the electron beam melting method was all set to 150 W/cm 2 or less. In addition, all the melting rates were performed so as to be 2.5 ton/h or less, and the target value was set to 1.0 ton/h. Y=-3.8X+(135±25) ・・・Formula (2)

在電漿熔解法中,往鑄模內照射之電漿輸出功率皆設為380W/cm2 以下。另外,熔解速度皆係以達2.5ton/h以下之方式進行而將目標值設為1.0ton/h。In the plasma melting method, the output power of the plasma irradiated into the mold is all set to 380 W/cm 2 or less. In addition, all the melting rates were performed so as to be 2.5 ton/h or less, and the target value was set to 1.0 ton/h.

在真空電弧熔解法中,係使用有底(下面並無開口)之直徑750mm的水冷銅鑄模,並熔解由鈦的原料所構成的電極。In the vacuum arc melting method, a water-cooled copper mold with a bottom (no openings below) of 750 mm in diameter is used, and electrodes made of a titanium raw material are melted.

鑄造熔解後的鈦之鑄模係使用表1~6所示者。表1~6所示「鑄模的內部空間的水平截面形狀」係鑄模的內側空間中的鑄模水平截面的大略形狀,「鑄模截面尺寸明細」顯示鑄模的內側空間之水平截面的直徑R、短邊A、長邊B、角部C、及其面積與周長。 另外,表1~6中「照射量」係鑄錠製造方法為EBR及PAM時往鑄模內的每單位面積的照射量。The molds for casting molten titanium were those shown in Tables 1 to 6. "Horizontal cross-sectional shape of the inner space of the mold" shown in Tables 1 to 6 is a rough shape of the horizontal cross-section of the mold in the inner space of the mold, and "Details of the cross-section of the mold" shows the diameter R and the short side of the horizontal cross-section of the inner space of the mold. A, long side B, corner C, and its area and perimeter. In addition, the "irradiation dose" in Tables 1 to 6 refers to the irradiation dose per unit area in the casting mold when the ingot manufacturing method is EBR and PAM.

對於所製出的鈦鑄錠,當其為圓柱形且為750mmφ時、及其為矩形且厚度在350mm以上時,係在藉由切削等來修整鑄件表面後,進行熱鍛造而作成厚度250mm的扁胚。鑄錠為矩形且厚度在260mm以下時,不進行熱鍛造,而藉由切削等來修整鑄件表面。將其等加熱至800℃且以軋縮率90%以上進行軋延,而製造出厚度8~15mm的軋延板。然後,將軋延板在700℃的溫度下熱處理30分鐘後,以從熱處理溫度至500℃的平均冷卻速度為20℃/分鐘且從熱處理溫度至300℃的平均冷卻速度達10℃/分鐘之方式來冷卻熱處理後的軋延板,製造出板狀鈦材。又,溫度控制係藉由氣流與加熱器來進行。For the produced titanium ingot, when it is cylindrical and 750 mmφ, and when it is rectangular and has a thickness of 350 mm or more, after trimming the surface of the casting by cutting or the like, hot forging is performed to make a thickness of 250 mm. flat embryo. When the ingot is rectangular and has a thickness of 260 mm or less, hot forging is not performed, but the surface of the ingot is trimmed by cutting or the like. This etc. are heated to 800 degreeC, and rolling is performed at a reduction ratio of 90% or more, and the rolled sheet of thickness 8-15mm is manufactured. Then, after heat treating the rolled sheet at a temperature of 700°C for 30 minutes, the average cooling rate from the heat treatment temperature to 500°C was 20°C/min and the average cooling rate from the heat treatment temperature to 300°C was 10°C/min. The method is used to cool the rolled sheet after heat treatment to produce a plate-shaped titanium material. In addition, temperature control is performed by airflow and a heater.

(製造金屬箔製造滾筒) 在將所製出的鈦材作成管狀後,使其收縮配合於圓柱狀鈦材(內滾筒)並研磨其表面,而製造出電沉積滾筒。研磨時的負荷的變動範圍設為在10%以下。(Manufacturing of metal foil manufacturing drum) After the produced titanium material is made into a tubular shape, it is shrink-fitted to a cylindrical titanium material (inner roll) and the surface thereof is ground to produce an electrodeposition roll. The fluctuation range of the load at the time of polishing is set to be 10% or less.

(分析/評估) 針對各實施例及比較例之鈦材,進行了平均化學組成、電壓比及巨觀模樣之評估。並且,針對使用該等鈦材製出之電沉積滾筒評估了電壓比。(Analysis/Assessment) The average chemical composition, voltage ratio, and macroscopic appearance were evaluated for the titanium materials of each Example and Comparative Example. Also, the voltage ratio was evaluated for electrodeposition rollers made of these titanium materials.

有關平均化學組成,O與N係利用LECO JAPAN CORPORATION製之分析裝置(機器名ON736),以非活性氣體熔解法進行了分析。詳言之,O係以非分散型紅外線吸收法來分析,N係以熱傳導法來分析。C係利用LECO JAPAN CORPORATION製之分析裝置(機器名CS444),以紅外線吸收法進行了分析。針對H,係利用股份公司堀場製作所製之分析機器(機器名EMGA-800M),以熱電導法進行了分析。針對Fe、Ni、Cr及Mo,則利用股份公司島津製作所製之分析機器(機器名ICPS8100),以ICP發射光譜分析法進行了分析。Regarding the average chemical composition, O and N were analyzed by an inert gas melting method using an analyzer (machine name ON736) manufactured by LECO JAPAN CORPORATION. Specifically, O is analyzed by a non-dispersive infrared absorption method, and N is analyzed by a thermal conduction method. The C series was analyzed by an infrared absorption method using an analyzer (machine name CS444) manufactured by LECO JAPAN CORPORATION. Regarding H, the analysis was performed by the thermoconductive method using an analysis machine (machine name EMGA-800M) manufactured by Horiba Seisakusho Co., Ltd. Fe, Ni, Cr and Mo were analyzed by ICP emission spectrometry using an analyzer (device name ICPS8100) manufactured by Shimadzu Corporation.

電壓比係按以下方法算出並加以評估。使一對通電電極探針接觸鈦材表面來供給恆定電流。接著,按如圖2所示排列方式使成對的電位檢測探針為30mm的探針間隔,並在直線L1方向上使成對的電位檢測探針接觸鈦材表面來測定電壓。接下來,將通電電極探針往垂直於直線L1的方向挪移30mm,沿著直線L2使成對的電位檢測探針進行接觸來測定電壓。重複進行上述作法,測定鈦材表面的電壓,且從所測定的電壓算出相鄰位置的電壓比。The voltage ratio was calculated and evaluated as follows. A pair of energized electrode probes were brought into contact with the surface of the titanium material to supply a constant current. Next, the paired potential detection probes were arranged at a probe interval of 30 mm as shown in FIG. 2 , and the paired potential detection probes were brought into contact with the surface of the titanium material in the direction of the straight line L1 to measure the voltage. Next, the energized electrode probes were moved 30 mm in the direction perpendicular to the straight line L1, and the paired potential detection probes were brought into contact along the straight line L2 to measure the voltage. The above procedure was repeated, the voltage on the surface of the titanium material was measured, and the voltage ratio of the adjacent positions was calculated from the measured voltage.

電壓比的評估係視電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率,按下述方式進行評估。The evaluation of the voltage ratio is based on the ratio of the data whose voltage ratio is less than 0.95 or more than 1.05 to the total number of data of the calculated voltage ratio, and is evaluated in the following manner.

優(A):電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率小於2% 佳(B):電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率為2%以上且小於5% 尚可(C):電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率為5%以上Excellent (A): The ratio of data with a voltage ratio less than 0.95 or greater than 1.05 to the total number of data with the calculated voltage ratio is less than 2% Good (B): The ratio of data with a voltage ratio of less than 0.95 or greater than 1.05 to the total number of data with the calculated voltage ratio is 2% or more and less than 5% Acceptable (C): The ratio of the data with the voltage ratio less than 0.95 or greater than 1.05 to the total number of data with the calculated voltage ratio is 5% or more

更進一步針對上述評估為優(A)之例,視所算出的電壓比的值按下述方式進行評估。Furthermore, with respect to the example of the above-mentioned evaluation being excellent (A), evaluation was performed as follows depending on the value of the calculated voltage ratio.

極佳(AAA):除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.98以上且在1.02以下 較佳(AA):除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.97以上且在1.03以下(不包括極佳的情況) 佳(A):除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.95以上且在1.05以下(不包括極佳及較佳的情況)Excellent (AAA): All voltage ratios are above 0.98 and below 1.02 except for voltage ratios less than 0.95 or greater than 1.05 Better (AA): All voltage ratios are above 0.97 and below 1.03 except for voltage ratios less than 0.95 or greater than 1.05 (excluding excellent cases) Best (A): All voltage ratios are above 0.95 and below 1.05 except for data with voltage ratios less than 0.95 or greater than 1.05 (excluding excellent and better cases)

針對巨觀模樣,對20片50×100mm尺寸的各發明例及比較例之鈦板表面,利用#800之砂紙進行研磨後,使用硝酸10%及氫氟酸5%溶液腐蝕表面,藉此進行了觀察。接著,以產生有在3mm以上長度的筋條狀模樣作為巨觀模樣,並且視產生比例按下述方式進行評估。For the macroscopic pattern, the surfaces of 20 50×100 mm titanium plates of each of the invention examples and comparative examples were ground with #800 sandpaper, and then the surfaces were etched with 10% nitric acid and 5% hydrofluoric acid solution. observed. Next, a rib-like pattern having a length of 3 mm or more was generated as a macroscopic pattern, and the evaluation was performed in the following manner depending on the generation rate.

優(A):產生比例為0.05個/片以下 佳(B):產生比例大於0.05個/片且在0.15個/片以下 尚可(C):產生比例大於0.15個/片 於表7~12列示上述評估結果。Excellent (A): The production ratio is less than 0.05 pieces/piece Good (B): The production ratio is greater than 0.05 pieces/piece and less than 0.15 pieces/piece Acceptable (C): The production ratio is greater than 0.15 pieces/piece The above evaluation results are listed in Tables 7-12.

[表7]

Figure 02_image013
[Table 7]
Figure 02_image013

[表8]

Figure 02_image015
[Table 8]
Figure 02_image015

[表9]

Figure 02_image017
[Table 9]
Figure 02_image017

[表10]

Figure 02_image019
[Table 10]
Figure 02_image019

[表11]

Figure 02_image021
[Table 11]
Figure 02_image021

[表12]

Figure 02_image023
[Table 12]
Figure 02_image023

如表1~12所示,使用以EBR或PAM熔解而製出的鑄錠來製造的鈦材,若面積/周長為22.5cm以下,則電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率小於2%,並且,除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.95以上且在1.05以下。而且,此種鈦材係抑制了表面的巨觀模樣者。用於製造鑄錠之鑄模的內側空間中的鑄模水平截面,若該截面之面積/周長為15.0cm以下,則電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率小於2%,並且,除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.97以上且在1.03以下。而且,此種鈦材係更抑制了表面的巨觀模樣者。若上述面積/周長為11.0cm以下,則電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率小於2%,並且,除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.98以上且在1.02以下。而且,此種鈦材係極端抑制了表面的巨觀模樣者。As shown in Tables 1 to 12, for titanium materials produced using ingots melted with EBR or PAM, if the area/perimeter is 22.5 cm or less, the voltage ratio is less than 0.95 or greater than 1.05 for the calculated data. The ratio of the total number of data of the voltage ratio is less than 2%, and, except for the data of the voltage ratio less than 0.95 or more than 1.05, all the voltage ratios are above 0.95 and below 1.05. Moreover, such a titanium material suppresses the macroscopic appearance of the surface. The horizontal cross-section of the casting mold in the inner space of the casting mold used to manufacture the ingot, if the area/perimeter of the cross-section is 15.0 cm or less, the data of the voltage ratio less than 0.95 or more than 1.05 to the total number of data of the calculated voltage ratio The ratio is less than 2%, and all voltage ratios are above 0.97 and below 1.03, except for data with voltage ratios below 0.95 or above 1.05. Moreover, this titanium material suppresses the macroscopic appearance of the surface. If the above area/perimeter is 11.0 cm or less, the ratio of the data with a voltage ratio of less than 0.95 or more than 1.05 to the total number of data of the calculated voltage ratio is less than 2%, and the data other than the voltage ratio of less than 0.95 or more than 1.05 , all voltage ratios are above 0.98 and below 1.02. Moreover, this titanium material extremely suppresses the macroscopic appearance of the surface.

另外,Mo含量相對於Fe、Cr及Ni之合計含量為0.5倍以上且在1.2倍以下時,電壓比小於0.95或大於1.05之數據相對於所算出的電壓比的數據總數的比率小於2%,並且,除了電壓比小於0.95或大於1.05以外的數據,所有電壓比皆在0.98以上且在1.02以下。而且,此種鈦材係極端抑制了表面的巨觀模樣者。In addition, when the Mo content is 0.5 times or more and 1.2 times or less with respect to the total content of Fe, Cr and Ni, the ratio of the data of the voltage ratio less than 0.95 or more than 1.05 to the total number of data of the calculated voltage ratio is less than 2%, And, except for the data with the voltage ratio less than 0.95 or more than 1.05, all the voltage ratios are above 0.98 and below 1.02. Moreover, this titanium material extremely suppresses the macroscopic appearance of the surface.

又,針對所製造之金屬箔製造滾筒,電壓比的評估結果係與鈦材的電壓比的評估結果同等,且滾筒表面的巨觀模樣的評價亦與鈦材表面的巨觀模樣的評估結果相同。因此,可知由金屬箔製造滾筒的製造過程對金屬箔製造用鈦材的內質因素所造成的影響微小。In addition, the evaluation results of the voltage ratio of the metal foil manufacturing rollers produced are the same as the evaluation results of the voltage ratio of the titanium material, and the evaluation results of the macroscopic pattern on the surface of the roller are also the same as the evaluation results of the macroscopic pattern on the surface of the titanium material. . Therefore, it turns out that the manufacturing process which manufactures a roll from a metal foil has little influence by the intrinsic factor of the titanium material for metal foil manufacture.

[實施例2] 變更Al含量,並以與實施例1同樣方式進行了鈦材之製造、金屬箔製造滾筒之製造及分析/評估。[Example 2] The Al content was changed, and in the same manner as in Example 1, production of a titanium material, production of a metal foil production roll, and analysis/evaluation were performed.

[表13]

Figure 02_image025
[Table 13]
Figure 02_image025

[表14]

Figure 02_image027
[Table 14]
Figure 02_image027

[表15]

Figure 02_image029
[Table 15]
Figure 02_image029

[表16]

Figure 02_image031
[Table 16]
Figure 02_image031

[表17]

Figure 02_image033
[Table 17]
Figure 02_image033

[表18]

Figure 02_image035
[Table 18]
Figure 02_image035

[表19]

Figure 02_image037
[Table 19]
Figure 02_image037

[表20]

Figure 02_image039
[Table 20]
Figure 02_image039

如表13~20所示,當以質量%計含有由以下所構成群組構成之1種或2種以上元素且合計達0.2%以上且在5.0%以下:Sn:0.2%以上且在2.0%以下、Zr:0.2%以上且在5.0%以下及Al:0.2%以上且在3.0%以下,並且含有:N:0%以上且在0.10%以下、C:0%以上且在0.08%以下、H:0%以上且在0.015%以下、O:0%以上且在1.0%以下及Fe:0%以上且在0.500%以下,且複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下,在此情況下,即抑制了表面的巨觀模樣。另外,當含有大於1.8質量%且在7.0質量%以下之Al,且Aleq為7.0質量%以下時,即抑制了表面的巨觀模樣。As shown in Tables 13 to 20, when one or two or more elements consisting of the following groups are contained in mass % in a total of 0.2% or more and 5.0% or less: Sn: 0.2% or more and 2.0% The following, Zr: 0.2% or more and 5.0% or less, Al: 0.2% or more and 3.0% or less, and containing: N: 0% or more and 0.10% or less, C: 0% or more and 0.08% or less, H : 0% or more and 0.015% or less, O: 0% or more and 1.0% or less, and Fe: 0% or more and 0.500% or less, and the voltage ratio of two adjacent positions among the plurality of positions is 0.95 or more and Below 1.05, in this case, the macroscopic pattern of the surface is suppressed. In addition, when Al is contained in an amount of more than 1.8 mass % and 7.0 mass % or less, and Aleq is 7.0 mass % or less, the macroscopic pattern of the surface is suppressed.

又,針對所製造之金屬箔製造滾筒,電壓比的評估結果係與鈦材的電壓比的評估結果同等,且滾筒表面的巨觀模樣的評價亦與鈦材表面的巨觀模樣的評估結果相同。In addition, the evaluation results of the voltage ratio of the metal foil manufacturing rollers produced are the same as the evaluation results of the voltage ratio of the titanium material, and the evaluation results of the macroscopic pattern on the surface of the roller are also the same as the evaluation results of the macroscopic pattern on the surface of the titanium material. .

[實施例3] 對於表21、22所示鈦鑄錠,當係矩形且厚度在350mm以上時,係在藉由切削等來修整鑄件表面後,進行熱鍛造而作成厚度250mm的扁胚。鑄錠為矩形且厚度在260mm以下時,不進行熱鍛造,而藉由切削等來修整鑄件表面。然後按表23~25所示軋延條件、熱處理及冷卻條件製造出鈦材。並且,進行了金屬箔製造滾筒之製造、分析/評估,而該等係以與實施例1同樣方法進行。[Example 3] When the titanium ingots shown in Tables 21 and 22 are rectangular and have a thickness of 350 mm or more, after trimming the surface of the ingot by cutting or the like, hot forging is performed to produce a flat ingot with a thickness of 250 mm. When the ingot is rectangular and has a thickness of 260 mm or less, hot forging is not performed, but the surface of the casting is trimmed by cutting or the like. Then, titanium materials were produced according to the rolling conditions, heat treatment and cooling conditions shown in Tables 23 to 25. Moreover, the manufacture, analysis/evaluation of the metal foil manufacturing roll were performed, and these were performed by the same method as Example 1.

表22~25所示β變態點係使用Thermo-Calc Sotware AB公司之整合型熱力學計算系統Thermo-Calc及預定資料庫(TI3),藉由CALPHAD法取得鈦合金的狀態圖而算出之值。The β transformation points shown in Tables 22-25 are the values calculated by obtaining the state diagram of the titanium alloy by the CALPHAD method using the integrated thermodynamic calculation system Thermo-Calc of Thermo-Calc Sotware AB and a predetermined database (TI3).

[表21]

Figure 02_image041
[Table 21]
Figure 02_image041

[表22]

Figure 02_image043
[Table 22]
Figure 02_image043

[表23]

Figure 02_image045
[Table 23]
Figure 02_image045

[表24]

Figure 02_image047
[Table 24]
Figure 02_image047

[表25]

Figure 02_image049
[Table 25]
Figure 02_image049

如表21~25所示,將鈦鑄錠加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延後,在600℃以上且750℃以下的溫度下進行20分鐘以上且120分鐘以下時間的熱處理,且以20℃/分鐘以上的平均冷卻速度從熱處理溫度冷卻至500℃,並且以10℃/分鐘以下的平均冷卻速度從熱處理溫度冷卻至300℃以下的溫度而製造出鈦材,當係上述情況時,該鈦材即為抑制了表面的巨觀模樣者。As shown in Tables 21 to 25, the titanium ingot is heated to a temperature of 750°C or higher and lower than the β transformation point, and rolled so that the reduction ratio becomes 90% or higher, and then the temperature is 600°C or higher and 750°C or lower. heat treatment at a temperature of 20 minutes or more and 120 minutes or less, and cool from the heat treatment temperature to 500°C at an average cooling rate of 20°C/min or more, and cool from the heat treatment temperature to 500°C at an average cooling rate of 10°C/min or less. The titanium material is produced at a temperature of 300° C. or lower, and in the case of the above, the titanium material is one that suppresses the macroscopic appearance of the surface.

又,針對所製造之金屬箔製造滾筒,電壓比的評估結果係與鈦材的電壓比的評估結果同等,且滾筒表面的巨觀模樣的評價亦與鈦材表面的巨觀模樣的評估結果相同。In addition, the evaluation results of the voltage ratio of the metal foil manufacturing rollers produced are the same as the evaluation results of the voltage ratio of the titanium material, and the evaluation results of the macroscopic pattern on the surface of the roller are also the same as the evaluation results of the macroscopic pattern on the surface of the titanium material. .

[實施例4] 如表26、27所示,變更往鑄模的內部空間的電子束照射量或往鑄模內的電漿照射量、及熔解速度,製造出鈦鑄錠。表26、27中的「照射量」在鈦鑄錠之製造方法為電子束熔解時係指往鑄模的內部空間的電子束照射量,在鈦鑄錠之製造方法為電漿熔解時係指往鑄模內的電漿照射量。[Example 4] As shown in Tables 26 and 27, a titanium ingot was produced by changing the dose of electron beam irradiation into the inner space of the mold, the dose of plasma irradiation into the mold, and the melting rate. "Irradiation dose" in Tables 26 and 27 refers to the dose of electron beam irradiated to the inner space of the mold when the titanium ingot production method is electron beam melting, and refers to the electron beam irradiation dose to the inner space of the mold when the titanium ingot production method is plasma melting. The amount of plasma exposure in the mold.

對於所製出的鈦鑄錠,當其為圓柱形且為750mmφ時、及其為矩形且厚度在350mm以上時,係在藉由切削等來修整鑄件表面後,進行熱鍛造而作成厚度250mm的扁胚。鑄錠為矩形且厚度在260mm以下時,不進行熱鍛造,而藉由切削等來修整鑄件表面。將其等加熱至800℃,製造出厚度8mm的軋延板。然後,將軋延板在700℃的溫度下熱處理30分鐘後,以從熱處理溫度至500℃的平均冷卻速度為20℃/分鐘且從熱處理溫度至300℃的平均冷卻速度達10℃/分鐘之方式來冷卻熱處理後的軋延板,製造出板狀鈦材。又,溫度控制係藉由氣流與加熱器來進行。於表28列示結果。又,表28所示之鈦材之平均化學組成IG1~IG9表示係與表22所示符號IG1~IG9為相同平均化學組成。For the produced titanium ingot, when it is cylindrical and 750 mmφ, and when it is rectangular and has a thickness of 350 mm or more, after trimming the surface of the casting by cutting or the like, hot forging is performed to make a thickness of 250 mm. flat embryo. When the ingot is rectangular and has a thickness of 260 mm or less, hot forging is not performed, but the surface of the ingot is trimmed by cutting or the like. This etc. were heated to 800 degreeC, and the rolled sheet of thickness 8mm was manufactured. Then, after heat treating the rolled sheet at a temperature of 700°C for 30 minutes, the average cooling rate from the heat treatment temperature to 500°C was 20°C/min and the average cooling rate from the heat treatment temperature to 300°C was 10°C/min. The method is used to cool the rolled sheet after heat treatment to produce a plate-shaped titanium material. In addition, temperature control is performed by airflow and a heater. The results are shown in Table 28. In addition, the average chemical compositions IG1 to IG9 of the titanium materials shown in Table 28 represent the same average chemical compositions as the symbols IG1 to IG9 shown in Table 22.

[表26]

Figure 02_image051
[Table 26]
Figure 02_image051

[表27]

Figure 02_image053
[Table 27]
Figure 02_image053

[表28]

Figure 02_image055
[Table 28]
Figure 02_image055

如表26~28所示,電子束熔解法中往鑄模的內部空間的電子束照射量為150W/cm2 以下,且熔解速度為2.5ton/h以下時,電壓比及巨觀模樣的評估結果極優異,且亦極端抑制了巨觀模樣。並且,電漿熔解法中往鑄模內的電漿照射量為380W/cm2 以下,且熔解速度為2.5ton/h以下時,電壓比及巨觀模樣的評估結果亦極優異,且亦極端抑制了巨觀模樣。As shown in Tables 26 to 28, when the electron beam irradiation dose to the inner space of the mold was 150 W/cm 2 or less, and the melting rate was 2.5 ton/h or less, the evaluation results of the voltage ratio and macroscopic shape It is extremely excellent, and it also extremely suppresses the appearance of the giant. In addition, in the plasma melting method, when the amount of plasma irradiation into the mold is 380 W/cm 2 or less, and the melting rate is 2.5 ton/h or less, the evaluation results of the voltage ratio and macroscopic pattern are also extremely excellent, and also extremely suppressed. It looks like a giant.

又,針對所製造之金屬箔製造滾筒,電壓比的評估結果係與鈦材的電壓比的評估結果同等,且滾筒表面的巨觀模樣的評價亦與鈦材表面的巨觀模樣的評估結果相同。In addition, the evaluation results of the voltage ratio of the metal foil manufacturing rollers produced are the same as the evaluation results of the voltage ratio of the titanium material, and the evaluation results of the macroscopic pattern on the surface of the roller are also the same as the evaluation results of the macroscopic pattern on the surface of the titanium material. .

以上,詳細說明了本發明之較佳實施形態,惟本發明不受該等例限定。顯而易見地,只要係具有本發明所屬技術領域之通識人士,皆可在申請專利範圍中所記載之技術思想範疇內思及各種變更例或修正例,並知悉該等亦理當歸屬本發明之技術範圍。The preferred embodiments of the present invention have been described above in detail, but the present invention is not limited to these examples. It is obvious that a person of ordinary skill in the technical field to which the present invention pertains can devise various modifications or amendments within the scope of the technical ideas described in the scope of the patent application, and knows that these also belong to the technology of the present invention. Scope.

10:金屬箔製造用鈦材 11:表面 12:不均質部位 20A,20B:通電電極探針 30A,30B:電位檢測探針 40,40A,40B:鑄模 41A,41B:內部空間 100:銅箔製造裝置 110:電解槽 120:電沉積滾筒 121:內滾筒 122:鈦材 123:熔接部 124:側板 125:旋轉軸 130:電極板 140:捲取部 150:導輥 160:捲取輥 A:中心軸(圖6)、短邊(圖8) B:長邊 C:角部 F:銅箔 I:恆定電流 L:探針間隔 L1 ,L2 :線 V1 ~Vn :電壓 a-a’:通電電極探針所接觸之表面之區間 b1-b1’~bn-bn’,c1-c1’~cn-cn’:部位10: Titanium material for metal foil production 11: Surface 12: Inhomogeneous parts 20A, 20B: Electrode probes 30A, 30B: Potential detection probes 40, 40A, 40B: Casting molds 41A, 41B: Internal space 100: Manufacturing of copper foil Apparatus 110: Electrolytic cell 120: Electrodeposition drum 121: Inner drum 122: Titanium material 123: Welding part 124: Side plate 125: Rotating shaft 130: Electrode plate 140: Coiling part 150: Guide roller 160: Coiling roller A: Center Shaft (Fig. 6), Short side (Fig. 8) B: Long side C: Corner F: Copper foil I: Constant current L: Probe interval L 1 , L 2 : Line V 1 to V n : Voltage a-a ': The interval b1-b1'~bn-bn', c1-c1'~cn-cn': part of the surface contacted by the energized electrode probe

圖1係概要圖,用以說明本發明一實施形態之金屬箔製造用鈦材或金屬箔製造滾筒的檢查方法。 圖2係金屬箔製造用鈦材之表面之概要圖,顯示本發明一實施形態之金屬箔製造用鈦材或金屬箔製造滾筒的檢查方法中,通電電極探針及電位檢測探針之配置之一例。 圖3係顯示在腐蝕後的鈦材表面觀察到的巨觀模樣之一例之顯微鏡照片。 圖4係顯示在腐蝕後的鈦板表面觀察到的巨觀模樣之一例之顯微鏡照片,且係為了顯示巨觀模樣的位置而強調出巨觀模樣之參考圖。 圖5係銅箔製造裝置的示意圖,其顯示金屬箔製造滾筒之一使用態樣。 圖6係顯示本發明一實施形態之金屬箔製造滾筒的示意圖。 圖7係截面圖,顯示電子束熔解法或電漿電弧熔解法所使用之鑄模的水平截面之一例。 圖8係截面圖,顯示電子束熔解法或電漿電弧熔解法所使用之鑄模的水平截面之另一例。FIG. 1 is a schematic diagram for explaining an inspection method of a titanium material for metal foil manufacturing or a metal foil manufacturing roller according to an embodiment of the present invention. 2 is a schematic view of the surface of the titanium material for metal foil production, showing the arrangement of the energized electrode probes and the potential detection probes in the method for inspecting the titanium material for metal foil production or the metal foil production drum according to an embodiment of the present invention An example. FIG. 3 is a micrograph showing an example of the macroscopic pattern observed on the surface of the titanium material after corrosion. Fig. 4 is a microscope photograph showing an example of the macroscopic pattern observed on the surface of the titanium plate after corrosion, and is a reference image in which the macroscopic pattern is emphasized in order to show the position of the macroscopic pattern. FIG. 5 is a schematic diagram of a copper foil manufacturing apparatus, which shows a usage state of one of the metal foil manufacturing rolls. Fig. 6 is a schematic diagram showing a metal foil manufacturing roll according to an embodiment of the present invention. Fig. 7 is a cross-sectional view showing an example of a horizontal cross-section of a mold used in the electron beam melting method or the plasma arc melting method. Fig. 8 is a cross-sectional view showing another example of a horizontal cross-section of a mold used in the electron beam melting method or the plasma arc melting method.

10:金屬箔製造用鈦材10: Titanium for metal foil manufacturing

11:表面11: Surface

12:不均質部位12: Inhomogeneous parts

20A,20B:通電電極探針20A, 20B: Energized electrode probes

30A,30B:電位檢測探針30A, 30B: Potential detection probe

I:恆定電流I: constant current

L:探針間隔L: probe spacing

V1 ~Vn :電壓V 1 ~V n : Voltage

a-a’:通電電極探針所接觸之表面之區間a-a': The interval of the surface contacted by the energized electrode probe

b1-b1’~bn-bn’:部位b1-b1'~bn-bn': part

Claims (13)

一種金屬箔製造用鈦材,具有以下化學組成: 以質量%計含有: Sn:0%以上且在2.0%以下、 Zr:0%以上且在5.0%以下、 Al:0%以上且在7.0%以下、 N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在1.000%以下、 Fe:0%以上且在0.500%以下、 Cr:0%以上且在0.500%以下、 Ni:0%以上且在0.090%以下、 Cu:0%以上且在1.5%以下及 Mo:0%以上且在0.750%以下,且 剩餘部分由Ti及不純物所構成;並且 Fe、Cr及Ni之合計含量為0%以上且在0.500%以下; 當使一對通電電極探針接觸鈦材來供給恆定電流,並且使成對的電位檢測探針按固定探針間隔接觸表面來測定前述表面之複數個位置的電壓時,前述複數個位置中相鄰的2個位置的電壓比為0.95以上且在1.05以下。A titanium material for metal foil manufacturing has the following chemical composition: Contains in mass %: Sn: 0% or more and 2.0% or less, Zr: 0% or more and 5.0% or less, Al: 0% or more and 7.0% or less, N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less, Fe: 0% or more and 0.500% or less, Cr: 0% or more and 0.500% or less, Ni: 0% or more and 0.090% or less, Cu: 0% or more and 1.5% or less and Mo: 0% or more and 0.750% or less, and The remainder consists of Ti and impurities; and The total content of Fe, Cr and Ni is more than 0% and less than 0.500%; When a pair of energized electrode probes are brought into contact with a titanium material to supply a constant current, and a pair of potential detection probes are brought into contact with the surface at fixed probe intervals to measure the voltages at a plurality of positions on the surface, the voltages at the plurality of positions are The voltage ratio of two adjacent positions is 0.95 or more and 1.05 or less. 如請求項1之金屬箔製造用鈦材,其含有Fe、Cr、Ni及Mo, Ni含量為0質量%以上且在0.090質量%以下,並且 以質量基準計,Mo含量相對於Fe、Cr及Ni之合計含量為0.5倍以上且在1.2倍以下。If the titanium material for metal foil manufacturing of claim 1 contains Fe, Cr, Ni and Mo, The Ni content is 0 mass % or more and 0.090 mass % or less, and The Mo content is 0.5 times or more and 1.2 times or less with respect to the total content of Fe, Cr, and Ni on a mass basis. 如請求項1或2之金屬箔製造用鈦材,其以質量%計含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在0.400%以下、 Fe:0.02%以上且在0.500%以下、 Ni:0%以上且在0.090%以下及 Cu:0%以上且在1.5%以下。If the titanium material for metal foil manufacturing of claim 1 or 2, it contains in mass %: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 0.400% or less, Fe: 0.02% or more and 0.500% or less, Ni: 0% or more and 0.090% or less and Cu: 0% or more and 1.5% or less. 如請求項1之金屬箔製造用鈦材,其以質量%計含有由以下所構成群組構成之1種或2種以上元素且合計達0.2%以上且在5.0%以下: Sn:0.2%以上且在2.0%以下、 Zr:0.2%以上且在5.0%以下及 Al:0.2%以上且在3.0%以下; 並且含有: N:0%以上且在0.100%以下、 C:0%以上且在0.080%以下、 H:0%以上且在0.0150%以下、 O:0%以上且在1.000%以下及 Fe:0%以上且在0.500%以下。As claimed in claim 1, the titanium material for metal foil manufacturing contains, in mass %, one or two or more elements consisting of the following groups, and the total amount is 0.2% or more and 5.0% or less: Sn: 0.2% or more and 2.0% or less, Zr: 0.2% or more and 5.0% or less and Al: 0.2% or more and 3.0% or less; and contains: N: 0% or more and 0.100% or less, C: 0% or more and 0.080% or less, H: 0% or more and 0.0150% or less, O: 0% or more and 1.000% or less and Fe: 0% or more and 0.500% or less. 如請求項1之金屬箔製造用鈦材,其含有大於1.8質量%且在7.0質量%以下之Al;並且 以質量%計,令Al含量為[Al%]、Zr含量為[Zr%]、Sn含量為[Sn%]且令O含量為[O%]時,下述式(1)所示Al當量Aleq為7.0質量%以下: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] 式(1)。The titanium material for metal foil manufacturing according to claim 1, which contains more than 1.8 mass % and less than 7.0 mass % of Al; and In terms of mass %, when the Al content is [Al%], the Zr content is [Zr%], the Sn content is [Sn%], and the O content is [O%], the Al equivalent represented by the following formula (1) Aleq is 7.0 mass % or less: Aleq=[Al%]+[Zr%]/6+[Sn%]/3+10×[O%] Formula (1). 如請求項1至5中任一項之金屬箔製造用鈦材,其係金屬箔製造滾筒用鈦材。The titanium material for metal foil manufacturing according to any one of claims 1 to 5, which is a titanium material for metal foil manufacturing rollers. 一種金屬箔製造用鈦材之製造方法,具有以下步驟: 利用連續鑄造手段來製造鈦鑄錠之步驟,該連續鑄造手段係將熔融後的鈦注入一上面及下面開口之可冷卻的鑄模內,且加熱前述鑄模內之熔融後的鈦之液面,並透過前述鑄模冷卻前述鈦使其凝固,並且使用夾具將凝固後的前述鈦往下方拉出; 將前述鈦鑄錠加熱至750℃以上且低於β變態點的溫度,並且以軋縮率達90%以上之方式進行軋延來製造軋延板之步驟;及 在600℃以上且750℃以下之溫度下進行20分鐘以上且120分鐘以下時間之熱處理,且以20℃/分鐘以上的平均冷卻速度從熱處理溫度冷卻至500℃,並且以10℃/分鐘以下的平均冷卻速度從熱處理溫度冷卻至300℃以下之溫度之步驟。A manufacturing method of titanium material for metal foil manufacturing, comprising the following steps: The step of manufacturing a titanium ingot by a continuous casting method that injects molten titanium into a coolable mold with openings on the upper and lower sides, and heats the molten titanium level in the mold, and Cooling the titanium through the casting mold to solidify it, and using a clamp to pull the solidified titanium downward; The step of heating the aforementioned titanium ingot to a temperature above 750° C. and below the beta transformation point, and rolling so that the reduction ratio reaches 90% or more to produce a rolled sheet; and Perform heat treatment at a temperature of 600°C or higher and 750°C or lower for 20 minutes or more and 120 minutes or less, and cool from the heat treatment temperature to 500°C at an average cooling rate of 20°C/min or more, and at 10°C/min or less. The average cooling rate is the step of cooling from the heat treatment temperature to a temperature below 300°C. 如請求項7之金屬箔製造用鈦材之製造方法,其具有熱加工前述鈦鑄錠來製造扁胚之步驟;並且 在前述製造軋延板之步驟中,以前述扁胚取代前述鈦鑄錠來進行軋延。The method for producing a titanium material for metal foil production as claimed in claim 7, comprising the step of thermally processing the titanium ingot to produce a flat blank; and In the aforementioned step of manufacturing the rolled sheet, the aforementioned flat billet is used instead of the aforementioned titanium ingot for rolling. 如請求項7或8之金屬箔製造用鈦材之製造方法,其中前述鑄造手段係電子束熔解法; 前述電子束熔解法中往前述鑄模的內部空間的電子束照射量為150W/cm2 以下,且前述鈦的熔解速度為2.5ton/h以下,對鈦照射前述電子束來熔解該鈦。The method for producing a titanium material for metal foil production according to claim 7 or 8, wherein the casting means is an electron beam melting method; and the electron beam irradiation dose to the inner space of the mold in the electron beam melting method is 150 W/cm 2 or less , and the melting rate of the titanium is 2.5 ton/h or less, and the titanium is irradiated with the electron beam to melt the titanium. 如請求項9之金屬箔製造用鈦材之製造方法,其中前述鑄模的內部空間的水平截面面積相對於前述鑄模的水平截面的內周周長之比且單位cm之X、與前述電子束熔解法中之前述電子束的照射量且單位W/cm2 之Y滿足下述式(2)之關係, Y=-3.8X+(135±25)  ・・・式(2)。The method for producing a titanium material for metal foil production according to claim 9, wherein the ratio of the horizontal cross-sectional area of the inner space of the casting mold to the inner circumference of the horizontal cross-section of the casting mold and X in the unit cm is the same as that in the electron beam melting method. The above-mentioned electron beam irradiation amount and Y in unit W/cm 2 satisfy the relationship of the following formula (2), Y=-3.8X+(135±25) ・・・ formula (2). 如請求項7或8之金屬箔製造用鈦材之製造方法,其中前述鑄造手段係電漿熔解法; 前述電漿熔解法中往前述鑄模內的電漿照射量為380W/cm2 以下,且前述鈦的熔解速度為2.5ton/h以下,對鈦照射前述電漿來熔解該鈦。The method for producing a titanium material for metal foil production according to claim 7 or 8, wherein the casting means is a plasma melting method; the plasma irradiation dose into the casting mold in the plasma melting method is 380 W/cm 2 or less, and The melting rate of the titanium is 2.5 ton/h or less, and the titanium is irradiated with the plasma to melt the titanium. 如請求項7至11中任一項之金屬箔製造用鈦材之製造方法,其中前述鑄模的內側空間的水平截面中,該水平截面之單位cm2 之面積與單位cm之周長之比為7.5cm以上且在22.5cm以下。The method for producing a titanium material for metal foil production according to any one of claims 7 to 11, wherein in the horizontal section of the inner space of the casting mold, the ratio of the area per unit cm 2 of the horizontal section to the perimeter per unit cm is 7.5 cm Above and below 22.5cm. 一種金屬箔製造滾筒,具有: 如請求項6之金屬箔製造用鈦材,係沿著圓筒狀內滾筒的外周面被覆;及 熔接部,係配置於前述鈦材的對接部。A metal foil manufacturing drum having: The titanium material for metal foil production as claimed in claim 6 is coated along the outer peripheral surface of the cylindrical inner drum; and The welded portion is disposed on the butted portion of the titanium material.
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