TW202146507A - Electroconductive composition - Google Patents
Electroconductive composition Download PDFInfo
- Publication number
- TW202146507A TW202146507A TW110113103A TW110113103A TW202146507A TW 202146507 A TW202146507 A TW 202146507A TW 110113103 A TW110113103 A TW 110113103A TW 110113103 A TW110113103 A TW 110113103A TW 202146507 A TW202146507 A TW 202146507A
- Authority
- TW
- Taiwan
- Prior art keywords
- conductive
- epoxy resin
- mass
- conductive filler
- particle size
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Conductive Materials (AREA)
- Epoxy Resins (AREA)
Abstract
Description
本發明關於一種屏蔽特性優異的導電性組成物。The present invention relates to a conductive composition having excellent shielding properties.
行動電話、平板終端等電子機器中,正謀求系統級封裝(System in Package (SIP)),其係源於小型化、高功能化之要求,將多數個半導體晶片收入一個封裝體中作為一個系統發揮作用。In electronic devices such as mobile phones and tablet terminals, a system-in-package (SIP) is being pursued, which is based on the requirements of miniaturization and high functionality, and multiple semiconductor chips are integrated into one package as a system. Play a role.
此種系統級封裝為了兼顧電子機器之小型輕量化與高功能化,電子零件的組裝密度一直在提高。然而,若提高組裝密度,則受到電磁波影響的電子零件亦會增加,恐因相鄰電子零件間之干涉而引起功能錯誤。This system-in-package has been increasing the assembly density of electronic components in order to take into account both the miniaturization, weight reduction and high functionality of electronic equipment. However, if the packing density is increased, the number of electronic components affected by electromagnetic waves will also increase, which may cause functional errors due to interference between adjacent electronic components.
對於所述問題,作為防止電子零件間之干涉的方法,已知之方法係在經塑模樹脂密封之電子零件間形成溝部(溝),並以導電性糊將此溝部埋住,藉此於電子零件與電子零件之間形成屏蔽層(所謂分段型屏蔽(compartment shield))。As a method of preventing interference between electronic components, there is a known method in which a groove (groove) is formed between electronic components sealed with a mold resin, and the groove is buried with a conductive paste, so as to prevent the interference between electronic components. A shield layer (so-called compartment shield) is formed between the parts and the electronic parts.
為了藉由上述方法獲得充分的屏蔽特性,需要將導電性糊填充至溝部的底面,而需要於導電性糊添加溶劑,使導電性糊低黏度化。In order to obtain sufficient shielding properties by the above method, it is necessary to fill the bottom surface of the groove with the conductive paste, and it is necessary to add a solvent to the conductive paste to reduce the viscosity of the conductive paste.
然而,已藉由添加溶劑而使導電性糊低黏度化的狀況下,在使導電性糊熱硬化時,溶劑會揮發,有時會於導電性糊之硬化物中產生空孔(void)(泡)。若於硬化物中產生空孔,則有無法充分屏蔽電磁波之虞。However, in the case where the viscosity of the conductive paste has been reduced by adding a solvent, when the conductive paste is thermally cured, the solvent may volatilize, and voids may be generated in the cured material of the conductive paste ( Bubble). If voids are formed in the cured product, there is a possibility that electromagnetic waves cannot be sufficiently shielded.
又,作為使導電性糊低黏度化之方法,除了添加溶劑之外,有考慮減少導電性填料之含量,但若減少導電性填料之含量,則屏蔽特性會有惡化的傾向。另一方面,若為了提高屏蔽特性而增加導電性填料之含量,則其對形成於塑模樹脂之溝部的填充性有惡化的傾向。即,屏蔽特性與對溝部之填充性為取捨特性,現正謀求要均衡改善此等特性。Further, as a method of reducing the viscosity of the conductive paste, in addition to adding a solvent, it is considered to reduce the content of the conductive filler, but if the content of the conductive filler is reduced, the shielding properties tend to deteriorate. On the other hand, when the content of the conductive filler is increased in order to improve the shielding properties, the fillability of the groove portion formed in the mold resin tends to deteriorate. That is, the shielding characteristics and the fillability to the grooves are trade-off characteristics, and it is required to improve these characteristics in a balanced manner.
先行技術文獻 專利文獻 專利文獻1:日本特開2004-55543號公報 專利文獻2:日本特開2016-126878號公報 專利文獻3:日本專利4037619號公報prior art literature Patent Literature Patent Document 1: Japanese Patent Laid-Open No. 2004-55543 Patent Document 2: Japanese Patent Laid-Open No. 2016-126878 Patent Document 3: Japanese Patent No. 4037619
發明概要 發明欲解決之課題 本發明係鑑於上述情形而成者,目的為提供一種導電性組成物,其對100MHz~1GHz之電磁波具有良好的屏蔽性,且對形成於塑模樹脂之溝部的填充性優異。Summary of Invention The problem to be solved by the invention The present invention was made in view of the above-mentioned circumstances, and an object of the present invention is to provide a conductive composition which has good shielding properties against electromagnetic waves of 100 MHz to 1 GHz, and which is excellent in filling properties of grooves formed in a mold resin.
此外,專利文獻1~3雖記載有導電性糊,但沒有關於屏蔽特性、對形成於塑模樹脂之溝部的填充性之記載。In addition, although
用以解決課題之手段 使本發明之導電性組成物為如下所述者:相對於包含二聚物酸型環氧樹脂5~20質量份之環氧樹脂100質量份,含有導電性填料400~600質量份;上述導電性填料含有:以雷射繞射散射式粒度分布測定法測得之平均粒徑(D50)5~8μm之導電性填料(A)、及平均粒徑(D50)2~3μm之導電性填料(B),且上述導電性填料(A)與上述導電性填料(B)之含有比例((A):(B))以質量比計為97:3~50:50。means of solving problems The conductive composition of the present invention contains 400 to 600 parts by mass of a conductive filler with respect to 100 parts by mass of the epoxy resin containing 5 to 20 parts by mass of the dimer acid-type epoxy resin; The conductive fillers contain: conductive fillers (A) with an average particle size (D50) of 5~8 μm measured by laser diffraction scattering particle size distribution measurement method, and conductive fillers (A) with an average particle size (D50) of 2~3 μm ( B), and the content ratio ((A):(B)) of the said conductive filler (A) and the said conductive filler (B) is 97:3~50:50 in mass ratio.
其中可使上述二聚物酸型環氧樹脂為二聚物酸之環氧丙基改質化合物。Among them, the above-mentioned dimer acid type epoxy resin can be a glycidyl modified compound of dimer acid.
其中可使上述環氧樹脂含有環氧丙基胺型環氧樹脂、及環氧丙基醚型環氧樹脂。Among them, the above epoxy resin may contain a glycidylamine type epoxy resin and a glycidyl ether type epoxy resin.
發明之效果 根據本發明之導電性組成物,其對形成於塑模樹脂之溝部的填充性優異,且可防止100MHz~1GHz之電磁波所致之電子零件間的干涉。effect of invention According to the electroconductive composition of the present invention, it is excellent in filling properties of the grooves formed in the mold resin, and can prevent interference between electronic components due to electromagnetic waves of 100 MHz to 1 GHz.
如上所述,本發明之導電性組成物係設為:相對於包含二聚物酸型環氧樹脂5~20質量份之環氧樹脂100質量份,含有導電性填料400~600質量份;導電性填料含有:以雷射繞射散射式粒度分布測定法測得之平均粒徑(D50)5~8μm之導電性填料(A)、及平均粒徑(D50)2~3μm之導電性填料(B),且導電性填料(A)與導電性填料(B)之含有比例((A):(B))以質量比計為97:3~50:50。As described above, the conductive composition of the present invention is set to contain 400 to 600 parts by mass of conductive filler with respect to 100 parts by mass of epoxy resin containing 5 to 20 parts by mass of dimer acid-type epoxy resin; The conductive fillers contain: conductive fillers (A) with an average particle size (D50) of 5~8 μm measured by laser diffraction scattering particle size distribution measurement method, and conductive fillers (A) with an average particle size (D50) of 2~3 μm ( B), and the content ratio ((A):(B)) of the conductive filler (A) and the conductive filler (B) is 97:3 to 50:50 in terms of mass ratio.
雖然此導電性組成物之用途並無特別限定,但適宜使用在系統級封裝中作為形成於經塑模樹脂密封之電子零件間之屏蔽層。Although the use of this conductive composition is not particularly limited, it is suitably used in a system-in-package as a shielding layer formed between electronic parts sealed with a molded resin.
二聚物酸型環氧樹脂以外之環氧樹脂,凡為分子內具有1個以上環氧基者即可,亦可併用2種以上。具體例可列舉:雙酚A型環氧樹脂、溴化環氧樹脂、雙酚F型環氧樹脂、酚醛型環氧樹脂、脂環式環氧樹脂、環氧丙基胺型環氧樹脂、環氧丙基醚型環氧樹脂、環氧丙基酯型型環氧樹脂、雜環式環氧樹脂等,於此等中又以含有環氧丙基胺型環氧樹脂、環氧丙基醚型環氧樹脂者為佳。Epoxy resins other than dimer acid-type epoxy resins may be those having one or more epoxy groups in the molecule, and two or more of them may be used in combination. Specific examples include: bisphenol A type epoxy resin, brominated epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, alicyclic epoxy resin, glycidylamine type epoxy resin, Glycidyl ether type epoxy resins, glycidyl ester type epoxy resins, heterocyclic epoxy resins, etc., among them, glycidylamine type epoxy resins, glycidyl Ether-type epoxy resins are preferred.
二聚物酸型環氧樹脂以外之環氧樹脂之環氧當量,雖並無特別限定,但較佳為1500g/eq以下、更佳為20~1000g/eq。環氧當量在上述範圍內時,易獲得耐熱性、黏性、密著性之平衡良好的導電性組成物。The epoxy equivalent of the epoxy resin other than the dimer acid type epoxy resin is not particularly limited, but is preferably 1500 g/eq or less, more preferably 20 to 1000 g/eq. When the epoxy equivalent is within the above range, it is easy to obtain a conductive composition having a good balance of heat resistance, viscosity, and adhesion.
二聚物酸型環氧樹脂,凡為分子內具有1個以上之環氧基的環氧樹脂且為已將二聚物酸改質者即可,可舉二聚物酸之環氧丙基改質化合物等為例,亦可併用2種以上。作為所述樹脂,例如可使用下述通式(1)、(2)所示者。Dimer acid-type epoxy resins are epoxy resins with one or more epoxy groups in the molecule and those that have been modified by dimer acid, such as glycidyl acid of dimer acid. As an example of a modified compound etc., you may use 2 or more types together. As the resin, for example, those represented by the following general formulae (1) and (2) can be used.
[化學式1] [Chemical formula 1]
式(1)、(2)中之n1~n5各自獨立表示3~9的整數。In formulas (1) and (2), n1 to n5 each independently represent an integer of 3 to 9.
n1表示3~9的整數、較佳為4~8的整數、更佳為5~7、尤宜為7。n2表示3~9的整數、較佳為5~9的整數、更佳為7或8、尤宜為7。n3表示3~9的整數、較佳為4~8的整數、更佳為6或7、尤宜為6。n4表示3~9的整數。n5表示3~9的整數、較佳為4~8的整數、更佳為5或6、尤宜為5。n1 represents an integer of 3 to 9, preferably an integer of 4 to 8, more preferably 5 to 7, particularly preferably 7. n2 represents an integer of 3 to 9, preferably an integer of 5 to 9, more preferably 7 or 8, particularly preferably 7. n3 represents an integer of 3 to 9, preferably an integer of 4 to 8, more preferably 6 or 7, particularly preferably 6. n4 represents an integer from 3 to 9. n5 represents an integer of 3 to 9, preferably an integer of 4 to 8, more preferably 5 or 6, particularly preferably 5.
藉由含有所述二聚物酸型環氧樹脂,導電性組成物的黏度、觸變指數(TI值)易變低,易獲得對形成於塑模樹脂之溝部的優異填充性。By containing the dimer acid-type epoxy resin, the viscosity and thixotropic index (TI value) of the conductive composition tend to be low, and it is easy to obtain excellent filling properties for the grooves formed in the molding resin.
二聚物酸型環氧樹脂之環氧當量雖無特別限定,但較佳為80~1500g/eq、更佳為200~1000g/eq。環氧當量在上述範圍內時,易獲得耐熱性、黏性、密著性之平衡良好的導電性組成物。Although the epoxy equivalent of the dimer acid-type epoxy resin is not particularly limited, it is preferably 80 to 1500 g/eq, more preferably 200 to 1000 g/eq. When the epoxy equivalent is within the above range, it is easy to obtain a conductive composition having a good balance of heat resistance, viscosity, and adhesion.
導電性填料(A)藉由平均粒徑為5~8μm,其分散性良好而可防止凝集,且與封裝體之接地電路之連通性、屏蔽特性良好。The conductive filler (A) has an average particle size of 5 to 8 μm, has good dispersibility, can prevent aggregation, and has good connectivity and shielding properties with the ground circuit of the package.
導電性填料(B)藉由平均粒徑為2~3μm,可填充平均粒徑為5~8μm之導電性填料彼此之間隙,因此可提升對100MHz~1GHz之電磁波的屏蔽性,並且獲得低黏度之導電性組成物。The conductive filler (B) can fill the gap between conductive fillers with an average particle size of 5 to 8 μm with an average particle size of 2 to 3 μm, thereby improving the shielding performance against electromagnetic waves of 100 MHz to 1 GHz and obtaining low viscosity. the conductive composition.
導電性填料之含量,若相對於環氧樹脂100質量份為400~600質量份則無特別限定,但較佳為450~550質量份。在上述範圍內時,易獲得屏蔽特性、對形成於塑模樹脂之溝部的填充性優異的導電性組成物。The content of the conductive filler is not particularly limited as long as it is 400 to 600 parts by mass with respect to 100 parts by mass of the epoxy resin, but it is preferably 450 to 550 parts by mass. Within the above range, it is easy to obtain a conductive composition having shielding properties and excellent fillability to the grooves formed in the mold resin.
導電性填料(A)與導電性填料(B)之含有比例((A):(B)),若以質量比計為97:3~50:50則無特別限定,但較佳為95:5~70:30。The content ratio ((A):(B)) of the conductive filler (A) and the conductive filler (B) is not particularly limited as long as the mass ratio is 97:3 to 50:50, but is preferably 95: 5~70:30.
導電性填料(A)及導電性填料(B)較佳為銅粉、銀粉、金粉、銀被覆銅粉或銀被覆銅合金粉,由此等之中可單獨使用1種,亦可併用2種以上,由減低成本的觀點來看,更佳為銅粉、銀被覆銅粉、或銀被覆銅合金粉。The conductive filler (A) and the conductive filler (B) are preferably copper powder, silver powder, gold powder, silver-coated copper powder or silver-coated copper alloy powder, and one of them may be used alone or two of them may be used in combination As mentioned above, from the viewpoint of cost reduction, copper powder, silver-coated copper powder, or silver-coated copper alloy powder is more preferable.
銀被覆銅粉係具有銅粉、及被覆該銅粉粒子之至少一部分的銀層或含銀層者,銀被覆銅合金粉係具有銅合金粉、及被覆該銅合金粒子之至少一部分的銀層或含銀層者。銅合金粒子係例如:鎳的含量為0.5~20質量%,且鋅的含量為1~20質量%,剩餘部分由銅構成,且剩餘部分的銅亦可包含不可避免之不純物。藉由如此地使用具有銀被覆層之銅合金粒子,易獲得屏蔽性及耐變色性優異之屏蔽封裝體。The silver-coated copper powder has copper powder and a silver layer or a silver-containing layer that coats at least a part of the copper powder particles, and the silver-coated copper alloy powder has copper alloy powder and a silver layer that coats at least a part of the copper alloy particles or those with silver layers. The copper alloy particles are, for example, the content of nickel is 0.5 to 20 mass %, the content of zinc is 1 to 20 mass %, the remainder is composed of copper, and the remaining copper may contain unavoidable impurities. By using the copper alloy particles having the silver coating layer in this way, a shielding package excellent in shielding properties and discoloration resistance can be easily obtained.
就導電性填料(A)的形狀之例而言,可列舉小片狀(鱗片狀)、樹枝狀、球狀、纖維狀、不定形狀(多面體)等,但由獲得電阻值更低、屏蔽性更提升之屏蔽層、並提高填充性之觀點來看,較佳為球狀。Examples of the shape of the conductive filler (A) include platelet-shaped (scaly), dendritic, spherical, fibrous, and indeterminate (polyhedral), but a lower resistance value and better shielding properties can be obtained by From the viewpoint of a higher shielding layer and improved fillability, spherical shape is preferable.
又,導電性填料(A)為球狀時,導電性填料(A)之振實密度(tap density)較佳為3.5~7.0g/cm3 。振實密度在上述範圍內時,屏蔽層之導電性易變得更良好。Moreover, when the conductive filler (A) is spherical, the tap density (tap density) of the conductive filler (A) is preferably 3.5 to 7.0 g/cm 3 . When the tap density is within the above range, the conductivity of the shielding layer tends to be better.
就導電性填料(B)的形狀之例而言,可列舉小片狀(鱗片狀)、樹枝狀、球狀、纖維狀、不定形狀(多面體)等,但由獲得電阻值更低、屏蔽性更提升之屏蔽層、並提高填充性之觀點來看,較佳為球狀。Examples of the shape of the conductive filler (B) include flakes (scaly), dendritic, spherical, fibrous, and indefinite (polyhedron), but lower resistance and shielding properties are obtained by From the viewpoint of a higher shielding layer and improved fillability, spherical shape is preferable.
又,導電性填料(B)為球狀時,導電性填料(B)之振實密度較佳為4.0~7.0g/cm3 。振實密度在上述範圍內時,屏蔽層之導電性易變得更良好。Moreover, when the conductive filler (B) is spherical, the tap density of the conductive filler (B) is preferably 4.0 to 7.0 g/cm 3 . When the tap density is within the above range, the conductivity of the shielding layer tends to be better.
於本發明之導電性組成物可使用環氧樹脂硬化劑。作為環氧樹脂硬化劑,可列舉:酚系硬化劑、咪唑系硬化劑、胺系硬化劑、陽離子系硬化劑等。此等可單獨使用1種,亦可併用2種以上。An epoxy resin hardener can be used for the electroconductive composition of this invention. As an epoxy resin hardener, a phenol type hardener, an imidazole type hardener, an amine type hardener, a cation type hardener, etc. are mentioned. These may be used individually by 1 type, and may use 2 or more types together.
作為酚系硬化劑,例如可列舉:苯酚酚醛、萘酚系化合物等。As a phenol type hardening|curing agent, a phenol novolak, a naphthol type compound, etc. are mentioned, for example.
作為咪唑系硬化劑,例如可列舉:咪唑、2-十一烷基咪唑、2-十七烷基咪唑、2-甲基咪唑、2-乙基咪唑、2-苯基咪唑、1-苯甲基-2-苯基咪唑、2-乙基-4-甲基-咪唑、1-氰乙基-2-十一烷基咪唑。Examples of imidazole-based curing agents include imidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, and 1-benzyl yl-2-phenylimidazole, 2-ethyl-4-methyl-imidazole, 1-cyanoethyl-2-undecylimidazole.
作為胺系硬化劑,例如可列舉:二伸乙三胺、三伸乙四胺等脂肪族多胺;間苯二胺、二胺基二苯甲烷、二胺二苯碸等芳香族多胺等。Examples of the amine-based curing agent include aliphatic polyamines such as diethylenetriamine and triethylenetetramine; aromatic polyamines such as m-phenylenediamine, diaminodiphenylmethane, and diaminediphenylene, and the like. .
作為陽離子系硬化劑,例如可列舉以下述為代表之鎓系化合物:三氟化硼之胺鹽、對甲氧基苯重氮鎓六氟磷酸鹽、二苯基錪六氟磷酸鹽、三苯基鋶、四正丁基鏻四苯基硼酸鹽、四正丁基鏻-o,o-二乙基二硫代磷酸鹽等。Examples of the cationic curing agent include onium-based compounds represented by the following: amine salts of boron trifluoride, p-methoxybenzenediazonium hexafluorophosphate, diphenyl iodonium hexafluorophosphate, triphenyl base perionium, tetra-n-butylphosphonium tetraphenyl borate, tetra-n-butylphosphonium-o,o-diethyldithiophosphate, etc.
硬化劑之含量,相對於環氧樹脂100質量份,較佳為0.3~40質量份、更佳為0.5~35質量份。硬化劑之含量為0.3質量份以上時,導電性組成物將會充分地硬化,導電性變得良好,易得到屏蔽效果優異之屏蔽層,硬化劑之含量為40質量份以下時,易得到保存安定性優異之導電性組成物。The content of the hardener is preferably 0.3 to 40 parts by mass, more preferably 0.5 to 35 parts by mass, relative to 100 parts by mass of the epoxy resin. When the content of the curing agent is 0.3 parts by mass or more, the conductive composition is sufficiently cured, the conductivity becomes good, and a shielding layer with excellent shielding effect is easily obtained, and when the content of the curing agent is 40 parts by mass or less, it is easy to store Conductive composition with excellent stability.
在不損害發明目的之範圍內,可於本發明之導電性組成物加入消泡劑、增稠劑、黏著劑、填充劑、阻燃劑、著色劑等公知的添加劑。Known additives such as defoaming agents, thickeners, adhesives, fillers, flame retardants, and colorants can be added to the conductive composition of the present invention within a range that does not impair the purpose of the invention.
為了使導電性組成物可藉由點膠(dispense)工法、真空印刷工法塗佈於封裝體之溝部,本發明之導電性組成物較佳為低黏度、且觸變指數(TI值)低者。In order to enable the conductive composition to be coated on the groove of the package by dispensing and vacuum printing, the conductive composition of the present invention is preferably one with low viscosity and low thixotropic index (TI value). .
於此,所謂點膠工法為:從注射器形狀的噴嘴先端擠出導電性組成物進行塗佈之方法。又,所謂真空印刷工法為:作為孔版印刷,利用在版上展開化學纖維的網布(screen)者,並對該網布以光學方式製作版膜將必要畫線以外的網目堵住而製成版,藉由於真空下透過該版膜的孔塗擦墨水,而於設置於版下之被印刷物的印刷面進行印刷之方法。Here, the so-called dispensing method is a method in which the conductive composition is extruded from the tip of a syringe-shaped nozzle and applied. In addition, the so-called vacuum printing method is: as stencil printing, using a screen with chemical fibers spread on a plate, and optically producing a screen film on the screen to block the meshes other than the necessary lines. The printing plate is a method of printing on the printing surface of the object to be printed under the plate by rubbing ink through the holes of the plate film under vacuum.
本發明之導電性組成物的黏度,宜因應用途、塗佈所使用之機器適宜調整,雖無特別限定,但就一般的基準而言,較佳為導電性組成物的溫度於25℃時為600dPa・s以下、更佳為500dPa・s以下。若為600dPa・s以下,點膠工法中之噴嘴的堵塞、真空印刷工法中之網布的填堵便不易產生,易獲得對溝部之優異填充性。黏度之測定方法可遵循JIS K7117-1,以單一圓筒形旋轉黏度計(所謂B型或BH型黏度計)使用轉子No.7以10rpm進行測定。此外,只要為單一圓筒形旋轉黏度計可測定之黏度,再低也沒問題。The viscosity of the conductive composition of the present invention should be appropriately adjusted according to the application and the machine used for coating. Although it is not particularly limited, in general terms, the temperature of the conductive composition is preferably 25°C. 600 dPa·s or less, more preferably 500 dPa·s or less. If it is less than 600 dPa·s, the nozzle clogging in the dispensing method and the clogging of the mesh in the vacuum printing method are not easy to occur, and it is easy to obtain excellent filling properties for the grooves. The measurement method of viscosity can follow JISK7117-1, and it can measure at 10 rpm with the rotor No. 7 with a single cylindrical rotational viscometer (so-called B type or BH type viscometer). In addition, as long as it is a viscosity that can be measured by a single cylindrical rotational viscometer, it does not matter how low it is.
本發明之導電性組成物的觸變指數(TI值),宜因應用途、塗佈所使用之機器適宜調整,雖無特別限定,就一般的基準而言,較佳為4.5以下。TI值為4.5以下時,易獲得對溝部之優異填充性,藉由真空印刷工法進行塗佈時之表面易變得平滑,不易形成隆起(bump)。藉此可達成系統級封裝的輪廓扁平化(low profile),可於組裝系統級封裝之裝置中有效活用空間。於此,可以下述式來求算TI值。 TI值=(以2rpm測得之黏度)/(以20rpm測得之黏度)The thixotropic index (TI value) of the conductive composition of the present invention should be appropriately adjusted according to the application and the machine used for coating. Although not particularly limited, it is preferably 4.5 or less as a general standard. When the TI value is 4.5 or less, it is easy to obtain excellent fillability to the groove portion, and the surface is easy to become smooth when applied by a vacuum printing method, and bumps are not easily formed. In this way, a low profile of the system-in-package can be achieved, and space can be effectively utilized in the device in which the system-in-package is assembled. Here, the TI value can be calculated by the following formula. TI value=(viscosity measured at 2rpm)/(viscosity measured at 20rpm)
本發明之導電性組成物,由防止空孔產生的觀點來看,宜不含溶劑。The conductive composition of the present invention preferably contains no solvent from the viewpoint of preventing generation of voids.
實施例 以下,基於實施例對本發明之內容進行詳細說明,但本發明不為以下所限。又,以下之「份」或「%」只要無特別聲明,則作為質量基準。Example Hereinafter, the content of the present invention will be described in detail based on examples, but the present invention is not limited to the following. In addition, the following "part" or "%" shall be regarded as the quality standard unless otherwise stated.
實施例、比較例 相對於以下所示之環氧樹脂100質量份,以表1~4所記載之比例摻合導電性填料及硬化劑並加以混合,而獲得導電性組成物。使用之各成分的詳細如以下所述。Examples and Comparative Examples With respect to 100 parts by mass of the epoxy resin shown below, a conductive filler and a curing agent were blended and mixed at the ratios described in Tables 1 to 4 to obtain a conductive composition. The details of each component used are as follows.
・環氧樹脂(a):環氧丙基胺型環氧樹脂,(股)ADEKA製「EP-3905S」,環氧當量=95g/eq ・環氧樹脂(b):環氧丙基醚型環氧樹脂,(股)ADEKA製「ED502」,環氧當量=320g/eq ・二聚物酸型環氧樹脂:使用上述式(2)中,n1=7、n2=7、n4=4、n5=5者。・Epoxy resin (a): Epoxypropylamine type epoxy resin, "EP-3905S" manufactured by ADEKA, epoxy equivalent = 95 g/eq ・Epoxy resin (b): glycidyl ether type epoxy resin, "ED502" manufactured by ADEKA, epoxy equivalent = 320 g/eq ・Dimer acid type epoxy resin: In the above formula (2), n1=7, n2=7, n4=4, and n5=5 were used.
・導電性填料(a):銀包銅粒子,D50=10μm,球狀 ・導電性填料(b):銀包銅粒子,D50=8μm,球狀 ・導電性填料(c):銀包銅粒子,D50=6μm,球狀 ・導電性填料(d):銀包銅粒子,D50=5μm,球狀 ・導電性填料(e):銀粒子,D50=4μm,球狀 ・導電性填料(f):銀包銅粒子,D50=3μm,球狀 ・導電性填料(g):銀粒子,D50=2μm,球狀 ・導電性填料(h):銀粒子,D50=1μm,球狀・Conductive filler (a): Silver-coated copper particles, D50=10μm, spherical ・Conductive filler (b): Silver-coated copper particles, D50=8μm, spherical ・Conductive filler (c): Silver-coated copper particles, D50=6μm, spherical ・Conductive filler (d): Silver-coated copper particles, D50=5μm, spherical ・Conductive filler (e): Silver particles, D50=4μm, spherical ・Conductive filler (f): Silver-coated copper particles, D50=3μm, spherical ・Conductive filler (g): Silver particles, D50=2μm, spherical ・Conductive filler (h): Silver particles, D50=1μm, spherical
・硬化劑(a):咪唑系硬化劑,四國化成工業(股)製「2E4MZ」 ・硬化劑(b):苯酚酚醛系硬化劑,荒川化學工業(股)製「TAMANOL 758」・Hardener (a): Imidazole-based hardener, "2E4MZ" manufactured by Shikoku Chemical Industry Co., Ltd. ・Hardener (b): Phenol novolac-based hardener, "TAMANOL 758" manufactured by Arakawa Chemical Industry Co., Ltd.
上述實施例及比較例之導電性組成物的評價如以下所述進行。結果表示於表1~4。The evaluation of the electroconductive composition of the said Example and the comparative example was performed as follows. The results are shown in Tables 1 to 4.
(1)導電性組成物之黏度 遵循JIS K7117-1以單一圓筒形旋轉黏度計(所謂B型黏度計)使用轉子No.7以10rpm測定出上述所得之導電性組成物在25℃下之黏度。(1) Viscosity of the conductive composition According to JIS K7117-1, the viscosity at 25 degreeC of the electroconductive composition obtained above was measured by the single cylinder rotational viscometer (so-called B-type viscometer) using the rotor No. 7 at 10 rpm.
(2)觸變指數(TI值) 遵循JIS K7117-1,以單一圓筒形旋轉黏度計(所謂B型黏度計)使用轉子No.7以2rpm及20rpm測定出上述所得之導電性組成物在25℃下之黏度。將所得之黏度值代入下述式,求出TI值。 TI值=(以2rpm測得之黏度)/(以20rpm測得之黏度)(2) Thixotropic Index (TI value) In accordance with JIS K7117-1, the viscosity at 25°C of the conductive composition obtained above was measured with a single cylindrical rotational viscometer (so-called B-type viscometer) using rotor No. 7 at 2 rpm and 20 rpm. The obtained viscosity value was substituted into the following formula, and the TI value was calculated|required. TI value=(viscosity measured at 2rpm)/(viscosity measured at 20rpm)
(3)電場屏蔽特性(100MHz,1GHz) 遵循IEC62333-1、IEC62333-2,以KEC法評價對100MHz及1GHz之電磁波的屏蔽特性。測定條件設為:溫度25℃、相對濕度30~50%之氣體環境。(3) Electric field shielding characteristics (100MHz, 1GHz) In accordance with IEC62333-1 and IEC62333-2, the shielding properties against electromagnetic waves of 100MHz and 1GHz were evaluated by the KEC method. The measurement conditions are set as a gas environment with a temperature of 25 °C and a relative humidity of 30 to 50%.
對厚度約100μm之聚醯亞胺薄膜使用Bar Film Applicator(BYK-Gardner公司製)印刷上述所得之導電性組成物後,藉由於80℃下加熱60分鐘,並進一步於160℃下加熱60分鐘而使其硬化,形成厚度約150μm之塗膜。將所得之塗膜裁剪成15cm之正方形作為樣品1。After printing the conductive composition obtained above with a Bar Film Applicator (manufactured by BYK-Gardner) on a polyimide film having a thickness of about 100 μm, it was heated at 80° C. for 60 minutes and further heated at 160° C. for 60 minutes. It was hardened to form a coating film with a thickness of about 150 μm. The obtained coating film was cut out into a square of 15 cm as
圖1係表示於KEC法所使用之系統之構成的示意圖。於KEC法所使用之系統係由下述構成:電磁波屏蔽效果測定裝置211a、頻譜分析儀221、進行10dB之衰減之衰減器222、進行3dB之衰減之衰減器223、前置放大器224。FIG. 1 is a schematic diagram showing the configuration of a system used in the KEC method. The system used in the KEC method is composed of an electromagnetic wave shielding
此外,頻譜分析儀221係使用Advantest股份公司製的U3741。又,前置放大器係使用Agilent Technologies公司製的HP8447F。In addition, as the
於電場波屏蔽效果評價裝置211a設有相對向之2個測定治具213。測定對象之樣品1係以被挾持於該測定治具213・213間的方式來設置。測定治具213中係採納TEM室(橫向電磁室,Transverse Electro Magnetic Cell)之尺寸分配,並形成為在與其傳送軸方向垂直的面內呈左右對稱分割的結構。惟,為了防止因樣品1的插入而形成短路,平板狀的中心導體214係呈與各測定治具213之間設有縫隙地配置。Two measuring
KEC法首先係使由頻譜分析儀221輸出之信號通過衰減器222而輸入至發送側之測定治具213。接著,使藉由接收側之測定治具213接收之信號通過衰減器223並以前置放大器224增幅後,藉由頻譜分析儀221測定信號等級。此外,頻譜分析儀221係以樣品1未設置於電磁波屏蔽效果測定裝置211a之狀態作為基準,輸出樣品1設置於電磁波屏蔽效果測定裝置211a時之減衰量。In the KEC method, first, the signal output from the
對100MHz之電磁波之屏蔽效果的評價,係將減衰量為70dB以上者評價為屏蔽效果優異。對1GHz之電磁波之屏蔽效果的評價,係將減衰量為63dB以上者評價為屏蔽效果優異。As for the evaluation of the shielding effect of the electromagnetic wave of 100 MHz, those with an attenuation amount of 70 dB or more were evaluated as being excellent in the shielding effect. In the evaluation of the shielding effect of electromagnetic waves of 1 GHz, those with an attenuation of 63 dB or more were evaluated as being excellent in the shielding effect.
(4)點膠工法之填充性
使用如圖2所示之樣品基板,藉由點膠工法製作出測定用之樣品2。作為樣品基板,係使用於基板10上形成有接地電路11,且藉由塑模樹脂12密封基板10及接地電路11,並於塑模樹脂12形成有溝部13者。使用Nordson ASYMTEK公司製的點膠機(dispenser)「S2-920N-P」、及閥「DV-8000」,於圖2所示之樣品基板的溝部13,按以下點膠條件塗佈導電性組成物而獲得樣品2。接著,藉由將所得之樣品2以80℃加熱60分鐘,並進一步以160℃加熱60分鐘使其硬化。針對所得之樣品2,於硬化前及硬化後使用依科視朗(YXLON International)公司製的X射線穿透裝置「Y.Cheetah μHD」,按以下測定條件觀察溝部13,確認空孔之有無。將未產生空孔者視作填充性優異並評價為「○」,將產生空孔者視作填充性差並評價為「×」。(4) Filling of dispensing method
Using the sample substrate shown in FIG. 2 , a sample 2 for measurement was produced by the dispensing method. As a sample substrate, the ground circuit 11 is formed on the
<點膠條件> 閥溫度:60℃ 基板溫度:60℃ 噴嘴內徑:100μm 點膠間隔:100μm 點膠速度:1.2mm/秒 <測定條件> 電壓:50kV 電流:80μA 電力:4W<Dispensing Conditions> Valve temperature: 60℃ Substrate temperature: 60℃ Nozzle inner diameter: 100μm Dispensing interval: 100μm Dispensing speed: 1.2mm/sec <Measurement conditions> Voltage: 50kV Current: 80μA Power: 4W
(5)點膠工法之量產性 製作上述樣品2時,於噴嘴無發生堵塞者,視作量產性優異並評價為「○」,於噴嘴發生堵塞者,視作量產性差評價為「×」。(5) Mass production of dispensing method When the above-mentioned sample 2 was produced, when the nozzle was not clogged, it was rated as "○" as being excellent in mass productivity, and when the nozzle was clogged, it was rated as "x" as being poor in mass productivity.
(6)真空印刷工法之填充性
使用圖3所示之樣品基板,藉由真空印刷工法製作出測定用之樣品3。作為樣品基板,係使用於基板10上形成有接地電路11,且藉由塑模樹脂12密封基板10及接地電路11,並於塑模樹脂12形成有溝部13者。使用Toray Engineering(股)製的真空印刷機「VE-700」,於圖3所示之樣品基板的溝部13,按以下印刷條件塗佈導電性組成物而獲得樣品3。接著,藉由將所得之樣品3以80℃加熱60分鐘,並進一步以160℃加熱60分鐘使其硬化。針對所得之樣品3,於硬化前及硬化後使用依科視朗(YXLON International)公司製的X射線穿透裝置「Y.Cheetah μHD」,按以下測定條件觀察溝部13,確認空孔之有無。將未產生空孔者視作填充性優異並評價為「○」,將產生空孔者視作填充性差並評價為「×」。(6) Fillability of vacuum printing method
Using the sample substrate shown in FIG. 3 , a
<印刷條件> 印壓:0.5MPa 刮刀角度:10° 刮刀速度:15mm/秒 間隙(clearance):2.0mm 真空度:0.13kPa 胺甲酸酯刮刀硬度:80度 <測定條件> 電壓:50kV 電流:80μA 電力:4W<Printing Conditions> Printing pressure: 0.5MPa Scraper angle: 10° Scraper speed: 15mm/sec Clearance: 2.0mm Vacuum degree: 0.13kPa Urethane scraper hardness: 80 degrees <Measurement conditions> Voltage: 50kV Current: 80μA Power: 4W
(7)真空印刷工法之量產性
製作上述樣品3時,將於真空印刷機之印刷版的網格(mesh)未產生填堵者,視作量產性優異並評價為「○」,將網格產生填堵者,視作量產性差並評價為「×」。(7) Mass production of vacuum printing method
When the above-mentioned
(8)真空印刷工法之俯視外觀
評價以下事項,即:在形成於上述樣品3之溝部13的開口部中,塑模樹脂12與填充於溝部13之導電性組成物是否形成平滑的面。具體而言,若塑模樹脂12形成之表面與導電性組成物形成之表面的差小於30μm,則視作俯視外觀優異並評價為「○」,若為30~60μm,則視作俯視外觀略差並評價為「△」,若為61μm以上,則視作俯視外觀差並評價為「×」。(8) Top view of vacuum printing method
It was evaluated whether or not the
[表1] [Table 1]
[表2] [Table 2]
[表3] [table 3]
[表4] [Table 4]
由表1所示結果來看,二聚物酸型環氧樹脂之含量在預定範圍內之實施例1-1~實施例1-4,其等任何的評價結果皆優異。另一方面,比較例1-1為不含二聚物酸型環氧樹脂之例,其導電性組成物的黏度及TI值高,於點膠工法、真空印刷工法之任一者中,填充性皆差。又,於真空印刷工法中,俯視外觀亦略差。又,比較例1-2為二聚物酸型環氧樹脂之含量超過上限值之例,其對100MHz及1GHz之電場屏蔽特性差。From the results shown in Table 1, Examples 1-1 to 1-4 in which the content of the dimer acid-type epoxy resin is within the predetermined range are excellent in any evaluation results. On the other hand, Comparative Example 1-1 is an example of an acid-type epoxy resin that does not contain dimer, and its conductive composition has high viscosity and TI value. Sex is bad. Moreover, in the vacuum printing method, the top view appearance is also slightly inferior. In addition, Comparative Example 1-2 is an example in which the content of the dimer acid-type epoxy resin exceeds the upper limit value, and the electric field shielding properties of 100 MHz and 1 GHz are poor.
由表2所示結果來看,導電性填料(A)與導電性填料(B)之含有比例在預定範圍內之實施例2-1~實施例2-4,其等任何的評價結果皆優異。另一方面,比較例2-1為單獨含有導電性填料(A)作為導電性填料之例,其對100MHz之電場屏蔽特性差。比較例2-2、2-3為導電性填料(A)與導電性填料(B)之含有比例在預定範圍外之例,其等黏度及TI值高,且於點膠工法、真空印刷工法之任一者中,填充性皆差。又,於真空印刷工法中,俯視外觀亦略差。From the results shown in Table 2, Examples 2-1 to 2-4 in which the content ratio of the conductive filler (A) and the conductive filler (B) are within the predetermined range are excellent in any evaluation results. . On the other hand, Comparative Example 2-1 is an example in which the conductive filler (A) is contained alone as the conductive filler, and the electric field shielding property of 100 MHz is poor. Comparative Examples 2-2 and 2-3 are examples in which the content ratio of the conductive filler (A) and the conductive filler (B) is outside the predetermined range, and their isoviscosity and TI value are high, and they are used in the dispensing method and the vacuum printing method. In any of them, the filling property was poor. Moreover, in the vacuum printing method, the top view appearance is also slightly inferior.
比較例2-4為單獨含有導電性填料(B)作為導電性填料之例,其對100MHz之屏蔽特性差。又,其導電性組成物的TI值高,且於真空印刷工法中之俯視外觀差。Comparative Example 2-4 is an example in which the conductive filler (B) is contained alone as the conductive filler, and the shielding property against 100 MHz is poor. Moreover, the TI value of the electroconductive composition was high, and the planar appearance in the vacuum printing method was inferior.
由表3所示結果來看,導電性填料之合計量在預定範圍內之實施例3-1、3-2,其等任何的評價結果皆優異。另一方面,比較例3-1為導電性填料之合計量小於下限值之例,其對100MHz及1GHz之屏蔽特性差。比較例3-2為導電性填料之合計量超過上限值之例,其導電性組成物之黏度高,於點膠工法、真空印刷工法之任一者中,填充性皆差。又,其導電性組成物之TI值高,且於真空印刷工法中之俯視外觀略差。From the results shown in Table 3, Examples 3-1 and 3-2 in which the total amount of the conductive fillers were within the predetermined range were excellent in any evaluation results. On the other hand, Comparative Example 3-1 was an example in which the total amount of the conductive fillers was less than the lower limit value, and the shielding properties against 100 MHz and 1 GHz were poor. Comparative Example 3-2 is an example in which the total amount of the conductive filler exceeds the upper limit, the viscosity of the conductive composition is high, and the filling property is poor in any of the dispensing method and the vacuum printing method. In addition, the TI value of the conductive composition was high, and the top-view appearance in the vacuum printing method was slightly inferior.
由表4所示結果來看,含有導電性填料(A)、導電性填料(B)之實施例4-1~實施例4-3,其等任何的評價結果皆優異。另一方面,比較例4-1為:含有平均粒徑小於導電性填料(A)之平均粒徑下限值之導電性填料,來替代導電性填料(A)之例,其導電性組成物之黏度高,且於點膠工法、真空印刷工法之任一者中,填充性皆差。又,於真空印刷工法中,俯視外觀亦略差。From the results shown in Table 4, Examples 4-1 to 4-3 containing the conductive filler (A) and the conductive filler (B) were excellent in any evaluation results. On the other hand, Comparative Example 4-1 is an example in which a conductive filler having an average particle diameter smaller than the lower limit of the average particle diameter of the conductive filler (A) is contained in place of the conductive filler (A), and the conductive composition is The viscosity is high, and the filling property is poor in either the dispensing method or the vacuum printing method. Moreover, in the vacuum printing method, the top view appearance is also slightly inferior.
比較例4-2為:含有平均粒徑超過導電性填料(A)之平均粒徑上限值之導電性填料,來替代導電性填料(A)之例,其對100MHz及1GHz之屏蔽特性差。又,因為導電性填料之平均粒徑大,所以在點膠工法中於噴嘴產生了填堵,在真空印刷工法中,於真空印刷機之印刷版的網格產生填堵,任一者之量產性皆差。Comparative Example 4-2 is an example in which a conductive filler with an average particle size exceeding the upper limit of the average particle size of the conductive filler (A) is contained instead of the conductive filler (A), and the shielding properties for 100 MHz and 1 GHz are poor. . In addition, because the average particle size of the conductive filler is large, the nozzle is blocked in the dispensing method, and in the vacuum printing method, the grid of the printing plate of the vacuum printing machine is blocked, any amount of Fertility is poor.
比較例4-3為:含有平均粒徑小於導電性填料(B)之平均粒徑下限值之導電性填料,來替代導電性填料(B)之例,其導電性組成物之黏度高,於點膠工法、真空印刷工法之任一者中,填充性皆差。又,於真空印刷工法中,俯視外觀亦略差。Comparative Example 4-3 is an example in which a conductive filler with an average particle size smaller than the lower limit of the average particle size of the conductive filler (B) is contained instead of the conductive filler (B), and the viscosity of the conductive composition is high, Fillability was poor in either the dispensing method or the vacuum printing method. Moreover, in the vacuum printing method, the top view appearance is also slightly inferior.
比較例4-4為:含有平均粒徑超過導電性填料(B)之平均粒徑上限值之導電性填料,來替代導電性填料(B)之例,其對100MHz之屏蔽特性差。Comparative Example 4-4 is an example in which a conductive filler having an average particle diameter exceeding the upper limit of the average particle diameter of the conductive filler (B) is contained instead of the conductive filler (B), and the shielding properties against 100 MHz are poor.
211a:電場波屏蔽效果評價裝置 213:測定治具 214:中心導體 221:頻譜分析儀 222:衰減器 223:衰減器 224:前置放大器 10:基板 11:接地電路 12:塑模樹脂 13:溝部211a: Electric field wave shielding effect evaluation device 213: Measuring jig 214: Center conductor 221: Spectrum Analyzer 222: Attenuator 223: Attenuator 224: Preamplifier 10: Substrate 11: Ground circuit 12: Molding resin 13: Groove
圖1係表示於KEC法所使用之系統之構成的圖。 圖2係用於評價點膠(dispense)工法中導電性組成物之填充性及量產性的樣品基板的示意截面圖。 圖3係用於評價真空印刷工法中導電性組成物之填充性、量產性及俯視外觀的樣品基板的示意截面圖。FIG. 1 is a diagram showing the configuration of a system used in the KEC method. FIG. 2 is a schematic cross-sectional view of a sample substrate for evaluating the fillability and mass-producibility of the conductive composition in the dispensing method. 3 is a schematic cross-sectional view of a sample substrate used for evaluating the fillability, mass productivity, and top-view appearance of the conductive composition in a vacuum printing method.
Claims (3)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020080744 | 2020-04-30 | ||
JP2020-080744 | 2020-04-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202146507A true TW202146507A (en) | 2021-12-16 |
TWI841833B TWI841833B (en) | 2024-05-11 |
Family
ID=78332377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110113103A TWI841833B (en) | 2020-04-30 | 2021-04-12 | Conductive composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7419505B2 (en) |
CN (1) | CN115380076A (en) |
TW (1) | TWI841833B (en) |
WO (1) | WO2021220711A1 (en) |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4558882B2 (en) | 2000-03-15 | 2010-10-06 | ハリマ化成株式会社 | Conductive silver paste for flexible circuit board formation |
JP2003141929A (en) * | 2001-10-30 | 2003-05-16 | Mitsui Mining & Smelting Co Ltd | Copper powder for copper paste |
JP4748279B2 (en) | 2006-04-13 | 2011-08-17 | 日立化成工業株式会社 | Conductive paste, and prepreg, metal foil-clad laminate, and printed wiring board using the same |
KR101725748B1 (en) | 2014-09-30 | 2017-04-10 | 다츠다 덴센 가부시키가이샤 | Conductive coating material for shielding package of electronic parts and method for producing shield package using same |
CN106537519B (en) * | 2015-02-27 | 2018-12-28 | 拓自达电线株式会社 | Conductive paste and the multilager base plate for using it |
KR102377472B1 (en) | 2015-03-10 | 2022-03-23 | 삼성전자주식회사 | Semiconductor packages and methods for fabricating the same |
JP2018009112A (en) * | 2016-07-14 | 2018-01-18 | タツタ電線株式会社 | Conductive coating material and method for producing shield package using the same |
-
2021
- 2021-03-31 CN CN202180030026.9A patent/CN115380076A/en active Pending
- 2021-03-31 WO PCT/JP2021/014032 patent/WO2021220711A1/en active Application Filing
- 2021-03-31 JP JP2022517572A patent/JP7419505B2/en active Active
- 2021-04-12 TW TW110113103A patent/TWI841833B/en active
Also Published As
Publication number | Publication date |
---|---|
JPWO2021220711A1 (en) | 2021-11-04 |
JP7419505B2 (en) | 2024-01-22 |
CN115380076A (en) | 2022-11-22 |
WO2021220711A1 (en) | 2021-11-04 |
TWI841833B (en) | 2024-05-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI654264B (en) | Conductive paint and method for manufacturing shielding package using the same | |
JP6992083B2 (en) | Shield package | |
JP6921573B2 (en) | Conductive paint and method for manufacturing shield packages using it | |
KR20020040631A (en) | Through-hole wiring board | |
TWI722136B (en) | Conductive paint and manufacturing method of shielding package body using the same | |
TW201809157A (en) | Electroconductive coating material and process for producing shielded packages using same | |
JP6831731B2 (en) | Conductive paint and manufacturing method of shield package using it | |
TWI778233B (en) | Conductive paint and manufacturing method of shielding package using the same | |
TW202146507A (en) | Electroconductive composition | |
TWI699409B (en) | Conductive composition for electromagnetic shielding, electromagnetic shielding layer formed of the same, circuit board laminate comprising the same, and method of forming electromagnetic shielding layer | |
WO2021250963A1 (en) | Method for manufacturing electromagnetic-wave blocking package by using conductive composition | |
JP7482093B2 (en) | Antenna integrated module | |
CN117757398A (en) | Joint filling silver adhesive and preparation method and application thereof | |
KR20090059297A (en) | Paste composition for forming bump | |
CN117545803A (en) | Thermally conductive composition | |
JP4888295B2 (en) | Conductive paste |