TW202144083A - Coating device, film production system, and film production method - Google Patents

Coating device, film production system, and film production method Download PDF

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TW202144083A
TW202144083A TW110104810A TW110104810A TW202144083A TW 202144083 A TW202144083 A TW 202144083A TW 110104810 A TW110104810 A TW 110104810A TW 110104810 A TW110104810 A TW 110104810A TW 202144083 A TW202144083 A TW 202144083A
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coating
substrate
film
contact portion
liquid
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TW110104810A
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TWI807256B (en
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大前通宏
山下裕司
村上正洋
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Vehicle Interior And Exterior Ornaments, Soundproofing, And Insulation (AREA)

Abstract

A bar coater is provided with a bar and a blower. The bar coats a substrate with a coating solution. The bar extends in the axial direction orthogonal to the flow direction of the substrate. An accumulation of liquid in which the coating solution is accumulated is formed between the bar and the substrate upstream of the bar in the flow direction. The blower applies pressure to a contact part of the substrate at which the substrate contacts the accumulation of liquid.

Description

塗敷裝置、薄膜之製造系統、及薄膜之製造方法Coating apparatus, film manufacturing system, and film manufacturing method

本發明涉及塗敷裝置、薄膜之製造系統、及薄膜之製造方法。The present invention relates to a coating apparatus, a film manufacturing system, and a film manufacturing method.

以往,作為用以將塗敷液塗佈至樹脂基材表面之塗敷裝置已知有棒塗機(例如參照專利文獻1)。 先前技術文獻 專利文獻Conventionally, a bar coater is known as a coating apparatus for coating a coating liquid on the surface of a resin substrate (for example, refer to Patent Document 1). prior art literature Patent Literature

專利文獻1:日本專利特開2019-115878號公報Patent Document 1: Japanese Patent Laid-Open No. 2019-115878

發明欲解決之課題 以如上述專利文獻1中記載之塗敷裝置來說,會有含氣泡之塗敷液被塗佈至基材之情形。The problem to be solved by the invention In the case of the coating apparatus described in the above-mentioned Patent Document 1, the coating liquid containing air bubbles may be coated on the substrate.

本發明提供可抑制含氣泡之塗敷液被塗佈至基材之塗敷裝置、薄膜之製造系統、及薄膜之製造方法。The present invention provides a coating apparatus capable of suppressing application of a coating solution containing bubbles to a substrate, a film manufacturing system, and a film manufacturing method.

用以解決課題之手段 本發明[1]包含一種塗敷裝置,其具備:塗敷構件,係用以將塗敷液塗佈至基材者,該塗敷構件朝與前述基材之行進方向正交之軸方向延伸,且在前述行進方向上之前述塗敷構件的上游側,會於前述塗敷構件與前述基材之間形成前述塗敷液蓄積而成的蓄積液;及按壓裝置,係按壓前述基材中與前述蓄積液接觸之接觸部分者。means of solving problems The present invention [1] includes an application device including an application member for applying a coating liquid to a substrate, the application member extending in an axial direction orthogonal to the traveling direction of the substrate , and on the upstream side of the coating member in the traveling direction, an accumulation liquid formed by accumulating the coating liquid is formed between the coating member and the base material; and a pressing device is used to press the base material. The contact part that comes into contact with the aforementioned accumulated liquid.

根據所述構成,當蓄積液內包含有氣泡時,藉由按壓裝置按壓接觸部分可從蓄積液擠出氣泡。According to the above configuration, when air bubbles are contained in the accumulating liquid, the air bubbles can be squeezed out from the accumulating liquid by pressing the contact portion by the pressing means.

藉此,可抑制含氣泡之塗敷液被塗佈至基材。Thereby, the coating liquid containing air bubbles can be suppressed from being applied to the base material.

本發明[2]包含如上述[1]之塗敷裝置,其中前述按壓裝置係藉由使氣流作用於前述接觸部分來按壓前述接觸部分。The present invention [2] includes the coating device according to the above-mentioned [1], wherein the pressing means presses the contact portion by causing an air flow to act on the contact portion.

根據所述構成,按壓裝置可不與接觸部分接觸便按壓接觸部分。According to the above configuration, the pressing means can press the contact portion without coming into contact with the contact portion.

藉此,可抑制基材與按壓構件摩擦,而可減低對基材造成損傷所致之外觀不良。Thereby, the friction between the base material and the pressing member can be suppressed, and the appearance defects due to damage to the base material can be reduced.

本發明[3]包含如上述[2]之塗敷裝置,其中前述按壓裝置具有朝前述接觸部分吹出前述氣流之噴嘴。The present invention [3] includes the coating device according to the above [2], wherein the pressing device has a nozzle for blowing the airflow toward the contact portion.

本發明[4]包含如上述[3]之塗敷裝置,其中前述噴嘴可在前述軸方向上移動。The present invention [4] includes the coating device according to the above [3], wherein the nozzle is movable in the axial direction.

根據所述構成,藉由在噴嘴正在吹出氣流之狀態下使噴嘴於軸方向上移動,可將蓄積液中之氣泡沿軸方向擠出。According to the above-described configuration, by moving the nozzle in the axial direction while the nozzle is blowing out the airflow, the air bubbles in the accumulated liquid can be squeezed out in the axial direction.

本發明[5]包含如上述[1]~[4]中任一項之塗敷裝置,其中前述塗敷構件為滾棒。The present invention [5] includes the coating device according to any one of the above [1] to [4], wherein the coating member is a roller.

本發明[6]包含一種薄膜之製造系統,其具備:擠製成形裝置,係將基材擠製成形者;塗敷裝置,係如上述[1]~[5]中任一項之塗敷裝置,其係將塗敷液塗佈至前述基材者;及延伸裝置,係將塗佈有前述塗敷液之前述基材予以延伸者。The present invention [6] includes a film manufacturing system comprising: an extrusion forming device for extruding a base material; and a coating device for coating as described in any one of the above [1] to [5] A device for applying a coating liquid to the substrate; and an extending device for extending the substrate on which the coating liquid is applied.

根據所述構成,因具備有上述塗敷裝置,故可抑制含氣泡之塗敷液被塗佈至基材。According to the above-described configuration, since the above-described coating device is provided, the coating liquid containing air bubbles can be suppressed from being coated on the substrate.

結果,可使薄膜之良率提升。As a result, the yield of the thin film can be improved.

本發明[7]包含一種薄膜之製造方法,其包含以下步驟:擠製成形步驟,係將基材擠製成形;塗佈步驟,係利用如上述[1]~[5]中任一項之塗敷裝置,將前述塗敷液塗佈至經前述擠製成形步驟而擠製成形之前述基材上;及延伸步驟,係將經前述塗佈步驟而塗佈有前述塗敷液之前述基材予以延伸。The present invention [7] includes a method for producing a film, which includes the following steps: an extrusion forming step, which is to extrude a base material; and a coating step, which utilizes any one of the above [1] to [5]. a coating device for coating the coating liquid on the substrate extruded through the extrusion forming step; and an extension step for applying the coating liquid to the substrate through the coating step material to be extended.

根據所述方法,可利用上述塗敷裝置將塗敷液塗佈至基材,故可抑制含氣泡之塗敷液被塗佈至基材。According to this method, since the coating liquid can be applied to the base material by the above-mentioned coating apparatus, the application of the coating liquid containing air bubbles to the base material can be suppressed.

結果,可使薄膜之良率提升。As a result, the yield of the thin film can be improved.

發明效果 根據本發明塗敷裝置、薄膜之製造系統、及薄膜之製造方法,可抑制含氣泡之塗敷液被塗佈至基材。Invention effect According to the coating apparatus, the manufacturing system of a thin film, and the manufacturing method of a thin film of this invention, it can suppress that the coating liquid containing a bubble is apply|coated to a base material.

1.薄膜之製造系統 針對薄膜F之製造系統1進行說明。1. Film manufacturing system The manufacturing system 1 of the thin film F is demonstrated.

如圖1所示,薄膜F具備基材S與被膜C。基材S在基材S之厚度方向上具有第1面S1及第2面S2。被膜C配置於基材S之第1面S1上。被膜C覆蓋基材S之第1面S1。被膜C亦可為易接著層。被膜C為易接著層時,薄膜F為易接著薄膜。易接著薄膜例如係用於行動機器、汽車導航裝置、個人電腦用螢幕、電視機等影像顯示裝置之偏光板。詳細而言,易接著薄膜係作為保護偏光板之偏光件的保護薄膜來使用。易接著薄膜係透過接著劑層與偏光件貼合。易接著薄膜係利用易接著層與偏光件貼合。As shown in FIG. 1 , the thin film F includes a base material S and a coating film C. As shown in FIG. The base material S has a first surface S1 and a second surface S2 in the thickness direction of the base material S. As shown in FIG. The film C is arranged on the first surface S1 of the substrate S. The film C covers the first surface S1 of the substrate S. The film C may also be an easily adhesive layer. When the coating film C is an easily bonding layer, the film F is an easily bonding film. The easy-to-bond film is, for example, a polarizer used in image display devices such as mobile devices, car navigation devices, personal computer screens, and televisions. Specifically, the easily adhesive film is used as a protective film for protecting the polarizer of a polarizing plate. The easily adhesive film is bonded to the polarizer through the adhesive layer. The easily bonding film is bonded to the polarizer using the easily bonding layer.

如圖2所示,薄膜F之製造系統1具備:擠製成形裝置2、第1延伸裝置4A、作為塗敷裝置之一例的棒塗機3、作為延伸裝置之一例的第2延伸裝置4B、切割加工裝置5、滾紋形成加工裝置6及捲取裝置7。As shown in FIG. 2, the production system 1 of the film F includes: an extrusion forming apparatus 2, a first stretching apparatus 4A, a bar coater 3 as an example of a coating apparatus, a second stretching apparatus 4B as an example of the stretching apparatus, The cutting processing device 5 , the knurling processing device 6 , and the winding device 7 are provided.

(1)擠製成形裝置 擠製成形裝置2係用以將基材S擠製成形(擠製成形步驟)。從擠製成形裝置2擠製出之基材S具有薄片形狀。(1) Extrusion forming device The extrusion forming apparatus 2 is used to extrude the base material S (extrusion forming step). The substrate S extruded from the extrusion forming apparatus 2 has a sheet shape.

基材S係由熱塑性樹脂構成。熱塑性樹脂可舉例如丙烯酸樹脂、聚烯烴樹脂、環狀聚烯烴樹脂、聚酯樹脂、聚碳酸酯樹脂、聚苯乙烯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、乙酸酯樹脂(二醋酸纖維素、三醋酸纖維素等)等。The base material S is made of thermoplastic resin. Examples of thermoplastic resins include acrylic resins, polyolefin resins, cyclic polyolefin resins, polyester resins, polycarbonate resins, polystyrene resins, polyamide resins, polyimide resins, acetate resins (diacetic acid cellulose, cellulose triacetate, etc.), etc.

製造作為偏光件之保護薄膜使用之易接著薄膜時,基材S之材料宜舉丙烯酸樹脂。In the manufacture of an easy-to-bond film used as a protective film of a polarizer, the material of the substrate S is preferably an acrylic resin.

又,製造作為偏光件之保護薄膜使用之易接著薄膜時,丙烯酸樹脂亦可為具有戊二酸酐結構之丙烯酸樹脂、具有內酯環結構之丙烯酸樹脂。具有戊二酸酐結構之丙烯酸樹脂及具有內酯環結構之丙烯酸樹脂具有高耐熱性、高透明性及高機械強度,故適於製造偏光度高且耐久性優異之偏光板。具有戊二酸酐結構之丙烯酸樹脂記載於日本專利特開2006-283013號公報、日本專利特開2006-335902號公報、日本專利特開2006-274118號公報中。具有內酯環結構之丙烯酸樹脂記載於日本專利特開2000-230016號公報、日本專利特開2001-151814號公報、日本專利特開2002-120326號公報、日本專利特開2002-254544號公報、日本專利特開2005-146084號公報中。In addition, when producing an easily adhesive film used as a protective film of a polarizer, the acrylic resin may be an acrylic resin having a glutaric anhydride structure or an acrylic resin having a lactone ring structure. Acrylic resins with a glutaric anhydride structure and acrylic resins with a lactone ring structure have high heat resistance, high transparency, and high mechanical strength, and are therefore suitable for producing polarizing plates with high degrees of polarization and excellent durability. Acrylic resins having a glutaric anhydride structure are described in Japanese Patent Laid-Open No. 2006-283013, Japanese Patent Laid-Open No. 2006-335902, and Japanese Patent Laid-Open No. 2006-274118. Acrylic resins having a lactone ring structure are described in Japanese Patent Laid-Open No. 2000-230016, Japanese Patent Laid-Open No. 2001-151814, Japanese Patent Laid-Open No. 2002-120326, Japanese Patent Laid-Open No. 2002-254544, In Japanese Patent Laid-Open No. 2005-146084.

又,基材S除了丙烯酸樹脂,亦可含有丙烯酸樹脂以外之其他熱塑性樹脂。藉由含有其他熱塑性樹脂,可消除丙烯酸樹脂之雙折射而獲得光學各向同性優異之易接著薄膜。且還可使易接著薄膜之機械強度提升。In addition, the base material S may contain other thermoplastic resins other than the acrylic resin in addition to the acrylic resin. By containing other thermoplastic resins, the birefringence of the acrylic resin can be eliminated to obtain an easy-bonding film with excellent optical isotropy. Moreover, the mechanical strength of the easy-to-bond film can also be improved.

此外,基材S亦可含有抗氧化劑、穩定劑、補強材、紫外線吸收劑、阻燃劑、抗靜電劑、著色劑、填充劑、塑化劑、滑劑、填料等添加劑。In addition, the substrate S may also contain additives such as antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants, and fillers.

(2)第1延伸裝置 第1延伸裝置4A係將藉由擠製成形步驟所得基材S在加熱後,朝基材S之行進方向MD予以延伸(第1延伸步驟)。(2) The first extension device The first stretching device 4A extends the base material S obtained by the extrusion forming step in the traveling direction MD of the base material S after heating (first stretching step).

(3)棒塗機 棒塗機3係對經擠製成形步驟而擠製成形之基材S之第1面S1塗佈塗敷液(塗佈步驟)。此外,於基材S之第1面S1,亦可在擠製成形步驟之後且在塗佈步驟之前施行電暈處理、電漿處理等表面處理。(3) Bar coater The bar coater 3 applies the coating liquid to the first surface S1 of the base material S extruded through the extrusion step (coating step). In addition, on the first surface S1 of the substrate S, surface treatments such as corona treatment and plasma treatment may also be performed after the extrusion forming step and before the coating step.

製造易接著薄膜時,塗敷液係用以形成易接著層之易接著組成物。The coating liquid is an easily bonding composition for forming an easily bonding layer when producing an easily bonding film.

易接著層含有黏結劑樹脂與微粒子。The easy-bond layer contains a binder resin and fine particles.

黏結劑樹脂可舉例如胺甲酸酯樹脂、環氧樹脂等熱硬化性樹脂,可舉例如丙烯酸樹脂、聚酯樹脂等熱塑性樹脂。易接著薄膜作為偏光件之保護薄膜使用時,黏結劑樹脂宜為熱硬化性樹脂。黏結劑樹脂可併用複數種。As a binder resin, thermosetting resins, such as a urethane resin and an epoxy resin, are mentioned, for example, and thermoplastic resins, such as an acrylic resin and a polyester resin, are mentioned, for example. When the easy-adhesive film is used as a protective film for the polarizer, the adhesive resin is preferably a thermosetting resin. A plurality of binder resins can be used in combination.

微粒子可舉例如氧化矽(silica)、氧化鈦(titania)、氧化鋁(alumina)、氧化鋯(zirconia)等氧化物;可舉例如碳酸鈣等碳酸鹽;可舉例如矽酸鈣、矽酸鋁、矽酸鎂等矽酸鹽;可舉例如滑石、高嶺土等矽酸鹽礦物;可舉例如磷酸鈣等磷酸鹽等。易接著薄膜作為偏光件之保護薄膜使用時,微粒子宜為氧化物,較宜為氧化矽。微粒子可併用複數種。Examples of fine particles include oxides such as silicon oxide (silica), titanium oxide (titania), aluminum oxide (alumina), and zirconia (zirconia); examples thereof include carbonates such as calcium carbonate; examples include calcium silicate, aluminum silicate, etc. , silicates such as magnesium silicate; for example, silicate minerals such as talc and kaolin; for example, phosphates such as calcium phosphate and the like. When the easy-adhesive film is used as a protective film for the polarizer, the fine particles are preferably oxide, preferably silicon oxide. A plurality of fine particles can be used in combination.

塗敷液(易接著組成物)含有樹脂成分、上述微粒子及分散介質。The coating liquid (easy-bonding composition) contains a resin component, the above-mentioned fine particles, and a dispersion medium.

樹脂成分係藉由後述延伸步驟而形成上述黏結劑樹脂之被膜(易接著層)。黏結劑樹脂為胺甲酸酯樹脂時,樹脂成分可舉例如水系胺甲酸酯樹脂。水系胺甲酸酯樹脂可舉例如屬胺甲酸酯樹脂之乳化物的非反應型水系胺甲酸酯樹脂,可舉例如屬經以封端劑保護異氰酸酯基之胺甲酸酯樹脂之乳化物的反應型水系胺甲酸酯樹脂等。黏結劑樹脂為胺甲酸酯樹脂時,塗敷液亦可含有胺甲酸酯硬化觸媒(三乙胺等)、異氰酸酯單體。The resin component forms the film (easy-bonding layer) of the above-mentioned binder resin by the stretching step described later. When the binder resin is a urethane resin, the resin component includes, for example, a water-based urethane resin. Examples of the water-based urethane resin include non-reactive water-based urethane resins which are emulsions of urethane resins, and examples include emulsions of urethane resins in which isocyanate groups are protected with a blocking agent. Reactive water-based urethane resin, etc. When the binder resin is a urethane resin, the coating liquid may contain a urethane curing catalyst (triethylamine, etc.) and an isocyanate monomer.

分散介質可舉例如水;可舉例如甲醇、乙醇等醇;可舉例如丙酮、甲基乙基酮等酮等。Examples of the dispersion medium include water; examples thereof include alcohols such as methanol and ethanol; and examples thereof include ketones such as acetone and methyl ethyl ketone.

(4)第2延伸裝置 第2延伸裝置4B係將經塗敷步驟塗佈之塗敷液乾燥。藉此,塗敷液會成為上述被膜C。且,第2延伸裝置4B係將形成有被膜C之基材S在加熱後朝基材S之寬度方向TD延伸(第2延伸步驟)。寬度方向TD係與行進方向MD正交。藉由第2延伸步驟,形成有被膜C之基材S被延伸,而可獲得上述薄膜F。(4) Second extension device The second stretching device 4B dries the coating liquid coated in the coating step. Thereby, the coating liquid becomes the coating film C described above. And the 2nd extending|stretching apparatus 4B draws the base material S on which the coating film C is formed in the width direction TD of the base material S after heating (2nd extending|stretching process). The width direction TD is orthogonal to the traveling direction MD. By the second stretching step, the substrate S on which the coating film C is formed is stretched, and the above-mentioned thin film F can be obtained.

(5)切割加工裝置 切割加工裝置5係將經延伸步驟延伸之薄膜F切斷成預定寬度(切割步驟)。(5) Cutting processing device The cutting device 5 cuts the film F stretched by the stretching step into a predetermined width (cutting step).

(6)滾紋形成加工裝置 滾紋形成加工裝置6係在藉由切割步驟而被切斷成預定寬度之薄膜F的寬度方向兩端形成滾紋(滾紋形成步驟)。滾紋係藉由雷射而形成。滾紋亦可藉由經加熱之壓紋輥來形成。(6) Knurling processing device The knurling forming processing apparatus 6 forms knurling at both ends in the width direction of the film F cut into a predetermined width by the cutting step (knurling forming step). The knurling is formed by laser. Knurling can also be formed by heated embossing rolls.

(7)捲取裝置 捲取裝置7係捲取經滾紋形成步驟形成有滾紋之薄膜F(捲取步驟)。藉由捲取步驟完成,可獲得薄膜F之捲材。(7) Coiling device The take-up device 7 takes up the film F having the knurling formed in the knurling step (winding-up step). By completing the winding step, a roll of the film F can be obtained.

2.棒塗機之詳細內容 如圖3所示,棒塗機3具備作為塗敷構件之一例的滾棒11、歧管塊12及作為按壓裝置之一例的鼓風機13。2. Details of the rod coater As shown in FIG. 3 , the bar coater 3 includes a roller 11 as an example of a coating member, a manifold block 12, and a blower 13 as an example of a pressing device.

(1)滾棒 滾棒11係於上述塗敷步驟中將塗敷液塗佈至基材S。滾棒11係朝軸方向延伸。軸方向係與基材S之寬度方向TD相同之方向。亦即,軸方向與基材S之行進方向MD正交。滾棒11配置於棒塗機3之上端部。換言之,滾棒11係在與軸方向及行進方向MD兩者正交之正交方向上,配置於棒塗機3之一端部。滾棒11具有圓柱形狀。(1) Roller The roller 11 applies the coating liquid to the substrate S in the above-mentioned coating step. The rollers 11 extend in the axial direction. The axial direction is the same direction as the width direction TD of the substrate S. That is, the axial direction is orthogonal to the advancing direction MD of the base material S. As shown in FIG. The roller bar 11 is arranged on the upper end of the bar coater 3 . In other words, the roller bar 11 is arranged at one end of the bar coater 3 in the orthogonal direction to both the axial direction and the advancing direction MD. The roller 11 has a cylindrical shape.

作為滾棒11,可舉例如軸桿上捲繞有線的線棒;可舉例如軸桿上形成有凹槽之無線棒等。線棒係在軸方向上於線間形成槽。As the rolling rod 11, for example, a wire rod having a wire wound around a shaft can be mentioned; The wire rods form grooves between the wires in the axial direction.

亦可對滾棒11實施例如鉻鍍敷、類鑽碳塗敷等之表面處理。塗敷液含有上述微粒子時,由使耐磨耗性提升之觀點來看,滾棒11宜為類鑽碳塗敷。The rolling rod 11 can also be subjected to surface treatment such as chrome plating, diamond-like carbon coating, and the like. When the coating liquid contains the above-mentioned fine particles, the roller rod 11 is preferably coated with diamond-like carbon from the viewpoint of improving the wear resistance.

滾棒11係相對於行進方向MD順向旋轉(參照圖3箭頭)。滾棒11的周速度較基材S之輸送速度更慢。藉此,在基材S朝行進方向MD輸送且滾棒11正在旋轉之狀態下,在行進方向MD上之滾棒11的上游側,會於滾棒11與基材S之間形成塗敷液蓄積而成的蓄積液L。將基材S中與蓄積液L接觸之部分定義為接觸部分P。接觸部分P在行進方向MD上具有上游端E1與下游端E2。上游端E1係在行進方向MD上遠離滾棒11。下游端E2係與滾棒11接觸。The rollers 11 are rotated in the forward direction with respect to the traveling direction MD (see arrows in FIG. 3 ). The peripheral speed of the roller 11 is slower than the conveying speed of the substrate S. Thereby, when the substrate S is conveyed in the traveling direction MD and the roller 11 is rotating, a coating liquid is formed between the roller 11 and the substrate S on the upstream side of the roller 11 in the traveling direction MD. The accumulated liquid L. A portion of the base material S that is in contact with the accumulated liquid L is defined as a contact portion P. The contact portion P has an upstream end E1 and a downstream end E2 in the traveling direction MD. The upstream end E1 is away from the roller bar 11 in the traveling direction MD. The downstream end E2 is in contact with the rolling rod 11 .

(2)歧管塊 歧管塊12配置於滾棒11之下方。在棒塗機3正在將塗佈液塗佈至基材S之狀態下,歧管塊12在正交方向上相對於基材S配置於滾棒11之相反側。歧管塊12支持滾棒11。歧管塊12係朝軸方向及正交方向延伸。歧管塊12具有歧管121、吐出口122及流徑123。(2) Manifold block The manifold block 12 is arranged below the roller bar 11 . In a state where the bar coater 3 is applying the coating liquid to the substrate S, the manifold block 12 is disposed on the opposite side of the roller bar 11 with respect to the substrate S in the orthogonal direction. The manifold block 12 supports the rollers 11 . The manifold block 12 extends in the axial direction and the orthogonal direction. The manifold block 12 has a manifold 121 , a discharge port 122 and a flow path 123 .

(2-1)歧管 歧管121係在正交方向上配置成遠離滾棒11。歧管121會蓄積塗佈液。(2-1) Manifold The manifold 121 is disposed away from the rollers 11 in the orthogonal direction. The manifold 121 accumulates the coating liquid.

(2-2)吐出口 吐出口122配置於歧管塊12之正交方向上之一端部。吐出口122係在行進方向MD上配置於滾棒11的上游側。吐出口122會吐出塗敷液。從吐出口122吐出之塗敷液係藉由滾棒11之旋轉而塗佈至基材S。(2-2) Discharge port The discharge port 122 is arranged at one end portion in the orthogonal direction of the manifold block 12 . The discharge port 122 is arranged on the upstream side of the roller 11 in the traveling direction MD. The discharge port 122 discharges the coating liquid. The coating liquid discharged from the discharge port 122 is applied to the substrate S by the rotation of the roller 11 .

(2-3)流徑 流徑123在正交方向上配置於歧管121與吐出口122之間。流徑123係連接歧管121與吐出口122。歧管121內之塗敷液係通過流徑123而從吐出口122吐出。(2-3) Flow path The flow path 123 is arranged between the manifold 121 and the discharge port 122 in the orthogonal direction. The flow path 123 connects the manifold 121 and the discharge port 122 . The coating liquid in the manifold 121 is discharged from the discharge port 122 through the flow path 123 .

(3)鼓風機 鼓風機13係在棒塗機3正在將塗布液塗佈至基材S之狀態下,使氣流作用於接觸部分P。換言之,鼓風機13係在基材S朝行進方向MD輸送且滾棒11正在旋轉之狀態下,使氣流作用於接觸部分P。鼓風機13係在正交方向上,相對於基材S從滾棒11之相反側使氣流作用於接觸部分P。藉由氣流作用於接觸部分P,接觸部分P會被氣流按壓,而在正交方向上往接近滾棒11之方向彎曲。亦即,鼓風機13會按壓接觸部分P。藉此,當蓄積液L內包含有氣泡時,可從蓄積液L擠出氣泡。藉由從蓄積液L擠出氣泡,可抑制含氣泡之塗敷液被塗佈至基材S。結果,可抑制因塗敷液中之氣泡造成塗敷不良。鼓風機13係不與接觸部分P接觸便按壓接觸部分P。藉由不與接觸部分P接觸便按壓接觸部分P,可抑制基材S與鼓風機13摩擦,而可減低對基材S造成損傷所致之外觀不良。詳細而言,鼓風機13具有壓縮機131與噴嘴132。(3) Blower The blower 13 causes the air flow to act on the contact portion P while the bar coater 3 is applying the coating liquid to the substrate S. In other words, the blower 13 causes the air flow to act on the contact portion P in a state in which the substrate S is conveyed in the traveling direction MD and the rollers 11 are rotating. The blower 13 acts on the contact portion P from the opposite side of the roller 11 with respect to the substrate S in the orthogonal direction. When the air flow acts on the contact portion P, the contact portion P is pressed by the air flow, and then bends in the direction of approaching the rolling rod 11 in the orthogonal direction. That is, the blower 13 presses the contact portion P. Thereby, when air bubbles are contained in the accumulation liquid L, the air bubbles can be extruded from the accumulation liquid L. By squeezing out the air bubbles from the accumulation liquid L, the coating liquid containing the air bubbles can be suppressed from being applied to the substrate S. As a result, coating defects due to air bubbles in the coating liquid can be suppressed. The blower 13 presses the contact portion P without contacting the contact portion P. As shown in FIG. By pressing the contact portion P without contacting the contact portion P, the friction between the substrate S and the blower 13 can be suppressed, and the appearance defect due to damage to the substrate S can be reduced. Specifically, the blower 13 includes a compressor 131 and a nozzle 132 .

(3-1)壓縮機 壓縮機131係透過配管而與噴嘴132連接。壓縮機131係朝噴嘴132輸送壓縮空氣。(3-1) Compressor The compressor 131 is connected to the nozzle 132 through piping. The compressor 131 delivers compressed air to the nozzle 132 .

(3-2)噴嘴 噴嘴132在正交方向上相對於基材S配置於滾棒11之相反側。噴嘴132在正交方向上相對於基材S配置於吐出口122之相反側。噴嘴132係將來自壓縮機131之壓縮空氣朝接觸部分P吹出。藉此,噴嘴132係朝接觸部分P吹出氣流。從噴嘴132吹出的氣流(壓縮空氣)會作用於接觸部分P。較佳為噴嘴132使氣流以較接觸部分P之行進方向MD上之上游端E1更強之方式,來作用於接觸部分P之行進方向MD上之上游端E1與下游端E2之間。較佳為噴嘴132使氣流以較行進方向MD上之接觸部分P之上游端E1更強之方式,來作用於接觸部分P之行進方向MD上之中央。藉此,鼓風機13會以較接觸部分P之行進方向MD上之上游端E1更強之方式,來按壓接觸部分P之行進方向MD上之中央。藉此,可使蓄積液L中之氣泡在行進方向MD上往遠離滾棒11之方向(行進方向MD之上游方向)靠近。(3-2) Nozzle The nozzle 132 is arranged on the opposite side of the roller 11 with respect to the substrate S in the orthogonal direction. The nozzle 132 is arranged on the opposite side of the discharge port 122 with respect to the substrate S in the orthogonal direction. The nozzle 132 blows the compressed air from the compressor 131 toward the contact portion P. Thereby, the nozzle 132 blows the air flow toward the contact portion P. As shown in FIG. The airflow (compressed air) blown from the nozzle 132 acts on the contact portion P. As shown in FIG. Preferably, the nozzle 132 causes the air flow to act between the upstream end E1 and the downstream end E2 of the contact portion P in the travel direction MD in a way that is stronger than the upstream end E1 in the travel direction MD of the contact portion P. Preferably, the nozzle 132 causes the air flow to act on the center of the contact portion P in the travel direction MD in a way that is stronger than the upstream end E1 of the contact portion P in the travel direction MD. Thereby, the blower 13 presses the center of the contact portion P in the travel direction MD in a stronger manner than the upstream end E1 of the contact portion P in the travel direction MD. Thereby, the air bubbles in the accumulating liquid L can be approached in the direction away from the roller 11 in the traveling direction MD (the upstream direction in the traveling direction MD).

在本實施形態中,噴嘴132可在正在吹出氣流之狀態下於軸方向上移動。藉此,可將蓄積液L中之氣泡沿軸方向擠出。噴嘴132可在軸方向上於基材S之一端部與另一端部之間往返移動。藉此,可從軸方向上之蓄積液L全部中擠出氣泡。In this embodiment, the nozzle 132 can be moved in the axial direction while blowing out the airflow. Thereby, the air bubbles in the accumulated liquid L can be squeezed out in the axial direction. The nozzle 132 can move back and forth between one end and the other end of the substrate S in the axial direction. Thereby, the air bubbles can be squeezed out from all the accumulated liquid L in the axial direction.

3.變形例 (1)噴嘴132亦可不移動。3. Variations (1) The nozzle 132 may not move.

例如,噴嘴132亦可朝軸方向延伸,且使氣流作用於軸方向上之接觸部分P全部。噴嘴132亦可在軸方向上擺動。For example, the nozzle 132 may also extend in the axial direction, and make the air flow act on the entire contact portion P in the axial direction. The nozzle 132 can also swing in the axial direction.

又,鼓風機13亦可具有複數個噴嘴132。複數個噴嘴132可在軸方向上排列。複數個噴嘴132各自亦可沿軸方向依序吹出氣流。In addition, the blower 13 may have a plurality of nozzles 132 . A plurality of nozzles 132 may be arranged in the axial direction. Each of the plurality of nozzles 132 can also blow out airflow in sequence along the axial direction.

又,鼓風機13亦可具有1個噴嘴132。1個噴嘴132可在軸方向上配置於滾棒11之中央。1個噴嘴132亦可以使蓄積液L中之氣泡往軸方向兩端移動之方式來吹出氣流。In addition, the blower 13 may have one nozzle 132. One nozzle 132 may be arranged in the center of the roller 11 in the axial direction. One nozzle 132 may blow the air flow so as to move the air bubbles in the accumulating liquid L to both ends in the axial direction.

(2)按壓裝置亦可與接觸部分P接觸來按壓接觸部分P。具體而言,如圖4所示,按壓裝置亦可具有與接觸部分P接觸之滾輪21。滾輪21係朝軸方向延伸。又,按壓裝置亦可具有與接觸部分P接觸之球件。球件亦可在軸方向上移動。(2) The pressing device may also be in contact with the contact portion P to press the contact portion P. Specifically, as shown in FIG. 4 , the pressing device may also have a roller 21 in contact with the contact portion P. As shown in FIG. The rollers 21 extend in the axial direction. In addition, the pressing device may have a ball which is in contact with the contact portion P. As shown in FIG. The ball can also move in the axial direction.

(3)棒塗機3之用途不限於擠製成形。例如,亦可從基材S之捲材釋出基材S,利用棒塗機3對釋出之基材S塗佈塗敷液。(3) The use of the bar coater 3 is not limited to extrusion molding. For example, the base material S may be released from the coil of the base material S, and the coating liquid may be applied to the released base material S by the bar coater 3 .

(4)塗敷裝置不限於棒塗機3。例如塗敷裝置可舉凹版塗佈機、接觸式塗佈機。(4) The coating device is not limited to the bar coater 3 . For example, the coating apparatus includes a gravure coater and a contact coater.

(5)塗敷裝置如圖5所示,亦可具備蓄積塗敷液之盤件31來取代歧管塊12。(5) The coating device, as shown in FIG. 5 , may be provided with a disk 31 for accumulating the coating liquid instead of the manifold block 12 .

(6)薄膜F之製造系統1亦可不具備第1延伸裝置4A。塗佈有塗敷液之基材S亦可藉由第2延伸裝置4B朝行進方向MD及寬度方向TD延伸(雙軸同時延伸)。薄膜F之製造系統1亦可不延伸基材S。亦即,薄膜F之製造系統1亦可不具備第1延伸裝置4A及第2延伸裝置4B。(6) The manufacturing system 1 of the film F may not include the first stretching device 4A. The base material S to which the coating liquid is applied may be extended in the traveling direction MD and the width direction TD by the second extending device 4B (biaxial simultaneous extension). The manufacturing system 1 of the film F may not extend the substrate S. That is, the manufacturing system 1 of the film F may not include the first stretching device 4A and the second stretching device 4B.

(7)薄膜F之製造系統1亦可具備遮蔽薄膜釋出裝置與貼合裝置,來取代滾紋形成加工裝置6,該遮蔽薄膜釋出裝置係釋出遮蔽薄膜者,該貼合裝置係將釋出之遮蔽薄膜貼合於薄膜F者。 另,上述發明雖提供作為本發明例示之實施形態,但僅為例示,不得作限定解釋。該技術領域之熟知此項技藝之人士明瞭可知本發明變形例包含於後述申請專利範圍中。 產業上之可利用性 本發明塗敷裝置、薄膜之製造系統、及薄膜之製造方法係利用於製造易接著薄膜等薄膜。(7) The manufacturing system 1 of the film F may also be provided with a masking film releasing device and a laminating device, instead of the knurling forming processing device 6, the masking film releasing device is one that releases the masking film, and the laminating device is a The released masking film is attached to the film F. In addition, although the above-mentioned invention provides the embodiment as an example of this invention, it is only an illustration, and should not be construed as a limitation. It will be apparent to those skilled in the art that modifications of the present invention are included in the scope of the patent application described later. industrial availability The coating apparatus, the manufacturing system of a thin film, and the manufacturing method of a thin film of this invention are utilized for manufacturing thin films, such as an easily bonding film.

1:製造系統 2:擠製成形裝置 3:棒塗機 4A:第1延伸裝置 4B:第2延伸裝置 5:切割加工裝置 6:滾紋形成加工裝置 7:捲取裝置 11:滾棒 12:歧管塊 13:鼓風機 21:滾輪 31:盤件 121:歧管 122:吐出口 123:流徑 131:壓縮機 132:噴嘴 C:被膜 E1:接觸部分之上游端 E2:接觸部分之下游端 F:薄膜 L:蓄積液 MD:行進方向 S:基材 S1:基材之第1面 S2:基材之第2面 TD:寬度方向 P:接觸部分1: Manufacturing system 2: Extrusion forming device 3: Bar coater 4A: 1st extension device 4B: 2nd extension device 5: Cutting and processing device 6: Knurling processing device 7: Coiling device 11: Roller 12: Manifold block 13: Blower 21: Roller 31: Plates 121: Manifold 122: Spit out 123: Flow Path 131: Compressor 132: Nozzle C: film E1: The upstream end of the contact part E2: Downstream end of contact part F: film L: accumulating fluid MD: direction of travel S: Substrate S1: The first side of the substrate S2: The second side of the substrate TD: width direction P: Contact part

圖1係藉由作為本發明一實施形態之薄膜之製造系統所製造之薄膜的截面圖。 圖2係薄膜之製造系統的概略構成圖。 圖3係用以說明圖2所示棒塗機的說明圖。 圖4係用以說明棒塗機之第1變形例的說明圖。 圖5係用以說明棒塗機之第2變形例的說明圖。FIG. 1 is a cross-sectional view of a film produced by a film production system as an embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a thin film manufacturing system. FIG. 3 is an explanatory diagram for explaining the bar coater shown in FIG. 2 . It is explanatory drawing for demonstrating the 1st modification of the bar coater. FIG. 5 is an explanatory diagram for explaining a second modification of the bar coater.

11:滾棒11: Roller

12:歧管塊12: Manifold block

13:鼓風機13: Blower

121:歧管121: Manifold

122:吐出口122: Spit out

123:流徑123: Flow Path

131:壓縮機131: Compressor

132:噴嘴132: Nozzle

E1:接觸部分之上游端E1: The upstream end of the contact part

E2:接觸部分之下游端E2: Downstream end of contact part

L:蓄積液L: accumulating fluid

S:基材S: Substrate

P:接觸部分P: Contact part

Claims (7)

一種塗敷裝置,特徵在於具備: 塗敷構件,係用以將塗敷液塗佈至基材者,該塗敷構件朝與前述基材之行進方向正交之軸方向延伸,且在前述行進方向上之前述塗敷構件的上游側,會於前述塗敷構件與前述基材之間形成前述塗敷液蓄積而成的蓄積液;及 按壓裝置,係按壓前述基材中與前述蓄積液接觸之接觸部分者。A coating device is characterized in that it has: An application member for applying a coating liquid to a substrate, the application member extending in an axial direction orthogonal to the advancing direction of the substrate and upstream of the application member in the advancing direction On the side, a liquid accumulation formed by accumulating the coating liquid will be formed between the coating member and the base material; and The pressing device is a device that presses the contact portion of the base material that is in contact with the accumulated liquid. 如請求項1之塗敷裝置,其中前述按壓裝置係藉由使氣流作用於前述接觸部分來按壓前述接觸部分。The coating device of claim 1, wherein the pressing means presses the contact portion by causing an air flow to act on the contact portion. 如請求項2之塗敷裝置,其中前述按壓裝置具有朝前述接觸部分吹出前述氣流之噴嘴。The coating device according to claim 2, wherein the pressing device has a nozzle for blowing the airflow toward the contact portion. 如請求項3之塗敷裝置,其中前述噴嘴可在前述軸方向上移動。The coating apparatus of claim 3, wherein the nozzle is movable in the axial direction. 如請求項1至4中任一項之塗敷裝置,其中前述塗敷構件為滾棒。The coating device according to any one of claims 1 to 4, wherein the aforementioned coating member is a roller. 一種薄膜之製造系統,特徵在於具備: 擠製成形裝置,係將基材擠製成形者; 塗敷裝置,係如請求項1至5中任一項之塗敷裝置,其係將塗敷液塗佈至前述基材者;及 延伸裝置,係將塗佈有前述塗敷液之前述基材予以延伸者。A film manufacturing system is characterized by having: Extrusion forming devices, which are those that extrude substrates; A coating device, which is the coating device according to any one of claims 1 to 5, which applies a coating liquid to the aforementioned substrate; and The stretching device is used to stretch the substrate coated with the coating liquid. 一種薄膜之製造方法,特徵在於包含以下步驟: 擠製成形步驟,係將基材擠製成形; 塗佈步驟,係利用如請求項1至5中任一項之塗敷裝置,將前述塗敷液塗佈至經前述擠製成形步驟而擠製成形之前述基材上;及 延伸步驟,係將經前述塗佈步驟而塗佈有前述塗敷液之前述基材予以延伸。A method of manufacturing a thin film, comprising the following steps: The extrusion forming step is to extrude the base material; The coating step is to use the coating device according to any one of claims 1 to 5 to apply the coating solution to the substrate extruded by the extrusion step; and In the extending step, the aforementioned substrate coated with the aforementioned coating liquid through the aforementioned coating step is extended.
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