TW202227271A - Method for producing film - Google Patents

Method for producing film Download PDF

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TW202227271A
TW202227271A TW110138402A TW110138402A TW202227271A TW 202227271 A TW202227271 A TW 202227271A TW 110138402 A TW110138402 A TW 110138402A TW 110138402 A TW110138402 A TW 110138402A TW 202227271 A TW202227271 A TW 202227271A
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coating liquid
coating
film
substrate
roller
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TW110138402A
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Chinese (zh)
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糸永果令
岡雨音
品川雅
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)

Abstract

A method for producing a film F comprises a coating step for coating a coating liquid on a substrate S using a bar 11, and a drying step for drying the coating liquid that has been coated on the substrate S. The coating liquid comprises a resin component, fine particles, and a dispersion medium that disperses the resin component and fine particles. The surface free energy of the bar 11 is higher than the surface tension of the coating liquid.

Description

薄膜之製造方法Manufacturing method of thin film

本發明涉及一種薄膜之製造方法。The present invention relates to a method for manufacturing a thin film.

以往,已知有一種薄膜之製造方法,其係將含有微粒子、樹脂成分及分散介質之塗敷液塗佈於基材,而於基材表面形成含有微粒子之被膜(例如參照專利文獻1)。 先前技術文獻 專利文獻 Conventionally, a method for producing a thin film is known in which a coating liquid containing fine particles, a resin component and a dispersion medium is applied to a substrate to form a film containing fine particles on the surface of the substrate (for example, see Patent Document 1). prior art literature Patent Literature

專利文獻1:日本專利特開2020-23170號公報Patent Document 1: Japanese Patent Laid-Open No. 2020-23170

發明欲解決之課題 以如上述之專利文獻1所記載之方法來說,期望將含有微粒子之塗敷液均勻塗佈於基材上。 The problem to be solved by the invention According to the method described in the above-mentioned Patent Document 1, it is desirable to uniformly apply a coating liquid containing fine particles on a substrate.

本發明提供一種薄膜之製造方法,其可將含有微粒子之塗敷液均勻塗佈於基材上。The present invention provides a method for producing a thin film, which can uniformly coat a coating liquid containing fine particles on a substrate.

用以解決課題之手段 本發明[1]包含一種薄膜之製造方法,其包含以下步驟:塗佈步驟,係使用塗敷構件將塗敷液塗佈於基材;及乾燥步驟,係使已塗佈於前述基材上之塗敷液乾燥;前述塗敷液含有微粒子、樹脂成分、以及用以使前述微粒子及前述樹脂成分分散之分散介質;前述塗敷構件之表面自由能高於前述塗敷液之表面張力。 means of solving problems The present invention [1] includes a method for producing a thin film, comprising the steps of: a coating step of applying a coating liquid to a substrate using a coating member; and a drying step of applying the coating solution on the substrate The coating solution is dried; the coating solution contains fine particles, a resin component, and a dispersion medium for dispersing the fine particles and the resin component; the surface free energy of the coating member is higher than the surface tension of the coating solution.

本發明[2]包含如上述[1]之薄膜之製造方法,其中前述塗敷構件之表面自由能為40mJ/m 2以上。 The present invention [2] includes the method for producing a thin film according to the above [1], wherein the surface free energy of the coating member is 40 mJ/m 2 or more.

本發明[3]包含如上述[1]或[2]之薄膜之製造方法,其中前述塗敷構件為滾棒。The present invention [3] includes the method for producing a thin film according to the above [1] or [2], wherein the coating member is a roller.

本發明[4]包含如上述[1]~[3]中任一項之薄膜之製造方法,其中前述塗敷構件業經類鑽碳塗覆。The present invention [4] includes the method for producing a thin film according to any one of the above [1] to [3], wherein the coating member is coated with diamond-like carbon.

本發明[5]包含如上述[1]~[4]中任一項之之薄膜之製造方法,其中前述塗敷構件之表面自由能與前述塗敷液之表面張力的差為14mN/m以上。The present invention [5] includes the method for producing a thin film according to any one of the above [1] to [4], wherein the difference between the surface free energy of the coating member and the surface tension of the coating liquid is 14 mN/m or more .

發明效果 根據本發明薄膜之製造方法,塗敷構件之表面自由能高於塗敷液之表面張力,因此塗敷構件容易被塗敷液濡濕。 Invention effect According to the method for producing the film of the present invention, the surface free energy of the coating member is higher than the surface tension of the coating liquid, so that the coating member is easily wetted by the coating liquid.

因此,即便在塗敷液含有微粒子之情況下,仍可將塗敷液均勻塗佈於基材上。Therefore, even when the coating liquid contains fine particles, the coating liquid can be uniformly coated on the substrate.

1.薄膜之製造系統 針對薄膜F之製造系統1進行說明。 1. Film manufacturing system The manufacturing system 1 of the thin film F is demonstrated.

如圖1所示,薄膜F具備基材S與被膜C。基材S在基材S之厚度方向上具有第1面S1及第2面S2。被膜C係配置於基材S之第1面S1上。被膜C係覆蓋基材S之第1面S1。被膜C亦可為易接著層。被膜C為易接著層時,薄膜F為易接著薄膜。易接著薄膜例如係使用於行動機器、汽車導航裝置、個人電腦用螢幕、電視機等影像顯示裝置之偏光板。詳細而言,易接著薄膜係作為保護偏光板之偏光件的保護薄膜來使用。易接著薄膜係透過接著劑層與偏光件貼合。易接著薄膜係利用易接著層與偏光件貼合。As shown in FIG. 1 , the thin film F includes a base material S and a coating film C. As shown in FIG. The base material S has a first surface S1 and a second surface S2 in the thickness direction of the base material S. As shown in FIG. The film C is arranged on the first surface S1 of the substrate S. The film C covers the first surface S1 of the substrate S. The film C may also be an easily adhesive layer. When the coating film C is an easily bonding layer, the film F is an easily bonding film. The easy-to-bond film is used, for example, as a polarizer for image display devices such as mobile devices, car navigation devices, personal computer screens, and televisions. Specifically, the easily adhesive film is used as a protective film for protecting the polarizer of a polarizing plate. The easily adhesive film is bonded to the polarizer through the adhesive layer. The easily bonding film is bonded to the polarizer using the easily bonding layer.

如圖2所示,薄膜F之製造系統1具備:擠製成形裝置2、第1延伸裝置4A、作為塗敷裝置之一例的棒塗機3、第2延伸裝置4B、開縫加工裝置5、滾紋形成加工裝置6及捲取裝置7。As shown in FIG. 2, the production system 1 of the film F includes: an extrusion forming apparatus 2, a first stretching apparatus 4A, a bar coater 3 as an example of a coating apparatus, a second stretching apparatus 4B, a slitting processing apparatus 5, The knurl forming processing device 6 and the winding device 7 are provided.

(1)擠製成形裝置 擠製成形裝置2係用以將基材S擠製成形(擠製成形步驟)。從擠製成形裝置2擠製出之基材S具有薄片形狀。 (1) Extrusion forming device The extrusion forming apparatus 2 is used to extrude the base material S (extrusion forming step). The substrate S extruded from the extrusion forming apparatus 2 has a sheet shape.

基材S係由熱塑性樹脂構成。熱塑性樹脂可列舉例如丙烯酸樹脂、聚烯烴樹脂、環狀聚烯烴樹脂、聚酯樹脂、聚碳酸酯樹脂、聚苯乙烯樹脂、聚醯胺樹脂、聚醯亞胺樹脂、乙酸酯樹脂(二醋酸纖維素、三醋酸纖維素等)等。The base material S is made of thermoplastic resin. The thermoplastic resins include, for example, acrylic resins, polyolefin resins, cyclic polyolefin resins, polyester resins, polycarbonate resins, polystyrene resins, polyamide resins, polyimide resins, acetate resins (diacetic acid cellulose, cellulose triacetate, etc.), etc.

在製造作為偏光件之保護薄膜所使用的易接著薄膜時,基材S之材料宜可舉丙烯酸樹脂。In the production of an easily bonding film used as a protective film of a polarizer, the material of the substrate S is preferably an acrylic resin.

又,在製造作為偏光件之保護薄膜所使用的易接著薄膜時,丙烯酸樹脂亦可為具有戊二酸酐結構之丙烯酸樹脂、具有內酯環結構之丙烯酸樹脂。具有戊二酸酐結構之丙烯酸樹脂及具有內酯環結構之丙烯酸樹脂具有高耐熱性、高透明性及高機械強度,故適於製造偏光度高且耐久性優異之偏光板。具有戊二酸酐結構之丙烯酸樹脂係記載於日本專利特開2006-283013號公報、日本專利特開2006-335902號公報、日本專利特開2006-274118號公報中。具有內酯環結構之丙烯酸樹脂係記載於日本專利特開2000-230016號公報、日本專利特開2001-151814號公報、日本專利特開2002-120326號公報、日本專利特開2002-254544號公報、日本專利特開2005-146084號公報中。Moreover, when manufacturing an easily bonding film used as a protective film of a polarizer, the acrylic resin may be an acrylic resin having a glutaric anhydride structure, or an acrylic resin having a lactone ring structure. Acrylic resins with a glutaric anhydride structure and acrylic resins with a lactone ring structure have high heat resistance, high transparency, and high mechanical strength, and are therefore suitable for producing polarizing plates with high degrees of polarization and excellent durability. The acrylic resin system which has a glutaric anhydride structure is described in Unexamined-Japanese-Patent No. 2006-283013, Unexamined-Japanese-Patent No. 2006-335902, and Unexamined-Japanese-Patent No. 2006-274118. Acrylic resins having a lactone ring structure are described in Japanese Patent Laid-Open No. 2000-230016, Japanese Patent Laid-Open No. 2001-151814, Japanese Patent Laid-Open No. 2002-120326, and Japanese Patent Laid-Open No. 2002-254544 , Japanese Patent Laid-Open No. 2005-146084.

又,基材S除了丙烯酸樹脂,亦可含有丙烯酸樹脂以外之其他熱塑性樹脂。藉由含有其他熱塑性樹脂,可消除丙烯酸樹脂之雙折射而獲得光學各向同性優異之易接著薄膜。且還可使易接著薄膜之機械強度提升。In addition, the base material S may contain other thermoplastic resins other than the acrylic resin in addition to the acrylic resin. By containing other thermoplastic resins, the birefringence of the acrylic resin can be eliminated to obtain an easy-bonding film with excellent optical isotropy. Moreover, the mechanical strength of the easy-to-bond film can also be improved.

此外,基材S亦可含有抗氧化劑、穩定劑、補強材、紫外線吸收劑、阻燃劑、抗靜電劑、著色劑、填充劑、塑化劑、滑劑、填料等添加劑。In addition, the substrate S may also contain additives such as antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants, and fillers.

(2)第1延伸裝置 第1延伸裝置4A係用以將基材S在加熱後,朝基材S之行進方向MD予以延伸(第1延伸步驟)。 (2) The first extension device The first extending device 4A is used to extend the substrate S in the traveling direction MD of the substrate S after heating (a first extending step).

(3)棒塗機 棒塗機3係使用作為塗敷構件之一例的滾棒11(參照圖3),將塗敷液塗佈於基材S之第1面S1(塗佈步驟)。關於滾棒11容後說明。此外,於基材S之第1面S1,亦可在擠製成形步驟之後且在塗佈步驟之前施行電暈處理、電漿處理等表面處理。 (3) Bar coater The bar coater 3 applies the coating liquid to the first surface S1 of the base material S using the roller 11 (refer to FIG. 3 ) as an example of the coating member (coating step). The roller bar 11 will be explained later. In addition, on the first surface S1 of the substrate S, surface treatments such as corona treatment and plasma treatment may also be performed after the extrusion forming step and before the coating step.

(4)第2延伸裝置 第2延伸裝置4B係用以使已塗佈於基材S上之塗敷液乾燥(乾燥步驟)。藉此,塗敷液會成為上述被膜C。且,第2延伸裝置4B係用以將形成有被膜C之基材S在加熱後朝基材S之寬度方向TD延伸(第2延伸步驟)。寬度方向TD係與行進方向MD正交。藉由第2延伸步驟,形成有被膜C之基材S被延伸,而可獲得上述薄膜F。 (4) Second extension device The second stretching device 4B is used to dry the coating liquid applied on the substrate S (drying step). Thereby, the coating liquid becomes the coating film C described above. And the 2nd extending|stretching apparatus 4B is used for extending|stretching the base material S on which the film C was formed in the width direction TD of the base material S after heating (2nd extending|stretching process). The width direction TD is orthogonal to the traveling direction MD. By the second stretching step, the substrate S on which the coating film C is formed is stretched, and the above-mentioned thin film F can be obtained.

(5)開縫加工裝置 開縫加工裝置5係用以將薄膜F切斷成預定寬度(開縫步驟)。 (5) Slitting processing device The slitting processing device 5 is used to cut the film F into a predetermined width (slitting step).

(6)滾紋形成加工裝置 滾紋形成加工裝置6係用以於切斷成預定寬度之薄膜F的寬度方向兩端形成滾紋(滾紋形成步驟)。滾紋係藉由雷射而形成。滾紋亦可藉由經加熱之壓紋輥來形成。 (6) Knurling processing device The knurling processing device 6 is used to form knurling on both ends in the width direction of the film F cut into a predetermined width (knurling forming step). The knurling is formed by laser. Knurling can also be formed by heated embossing rolls.

(7)捲取裝置 捲取裝置7係用以捲取形成有滾紋之薄膜F(捲取步驟)。藉由捲取步驟完成,可獲得薄膜F之捲材。 (7) Coiling device The winding device 7 is for winding the film F formed with the knurling (winding step). By completing the winding step, a roll of the film F can be obtained.

2.塗敷液之詳細內容 製造易接著薄膜時,塗敷液係用以形成易接著層之易接著組成物。 2. Details of the coating solution The coating liquid is an easily bonding composition for forming an easily bonding layer when producing an easily bonding film.

易接著層含有黏結劑樹脂與微粒子。The easy-bond layer contains a binder resin and fine particles.

黏結劑樹脂可舉例如熱硬化性樹脂及熱塑性樹脂。熱硬化性樹脂可舉例如胺甲酸酯樹脂、環氧樹脂。熱塑性樹脂可舉例如丙烯酸樹脂、聚酯樹脂。易接著薄膜作為偏光件之保護薄膜使用時,黏結劑樹脂宜為熱硬化性樹脂。黏結劑樹脂可併用複數種。As a binder resin, a thermosetting resin and a thermoplastic resin are mentioned, for example. As a thermosetting resin, a urethane resin and an epoxy resin are mentioned, for example. Examples of thermoplastic resins include acrylic resins and polyester resins. When the easy-adhesive film is used as a protective film for the polarizer, the adhesive resin is preferably a thermosetting resin. A plurality of binder resins can be used in combination.

微粒子可舉例如氧化物、碳酸鹽、矽酸鹽、矽酸鹽礦物、磷酸鹽。氧化物可舉例如氧化矽(silica)、氧化鈦(titania)、氧化鋁(alumina)、氧化鋯(zirconia)。碳酸鹽可舉例如碳酸鈣。矽酸鹽可舉例如矽酸鈣、矽酸鋁、矽酸鎂。矽酸鹽礦物可舉例如滑石、高嶺土。磷酸鹽可舉例如磷酸鈣。易接著薄膜作為偏光件之保護薄膜使用時,微粒子宜為氧化物,較宜為氧化矽。微粒子可併用複數種。Examples of fine particles include oxides, carbonates, silicates, silicate minerals, and phosphates. As an oxide, silicon oxide (silica), titanium oxide (titania), aluminum oxide (alumina), and zirconia (zirconia) are mentioned, for example. The carbonate may, for example, be calcium carbonate. The silicate may, for example, be calcium silicate, aluminum silicate, and magnesium silicate. The silicate minerals include, for example, talc and kaolin. As a phosphate, calcium phosphate is mentioned, for example. When the easy-adhesive film is used as a protective film for the polarizer, the fine particles are preferably oxide, preferably silicon oxide. A plurality of fine particles can be used in combination.

微粒子之平均一次粒徑例如小於被膜C之厚度。藉由微粒子之平均一次粒徑小於被膜C之厚度,可抑制微粒子從被膜C脫落。微粒子之平均一次粒徑例如為200nm以下,宜為150nm以下,較宜為100nm以下,較宜為80nm以下,較宜為60nm以下,較宜為50nm以下。The average primary particle size of the fine particles is smaller than the thickness of the coating film C, for example. Since the average primary particle size of the fine particles is smaller than the thickness of the film C, the fine particles can be suppressed from falling off from the film C. The average primary particle size of the fine particles is, for example, 200 nm or less, preferably 150 nm or less, more preferably 100 nm or less, more preferably 80 nm or less, more preferably 60 nm or less, and more preferably 50 nm or less.

微粒子之平均一次粒徑例如為10nm以上,宜為15nm以上,較宜為20nm以上。微粒子之平均一次粒徑若在上述下限值以上,在捲取薄膜F時便可抑制黏結。The average primary particle diameter of the fine particles is, for example, 10 nm or more, preferably 15 nm or more, and more preferably 20 nm or more. When the average primary particle size of the fine particles is at least the above lower limit value, when the film F is wound up, sticking can be suppressed.

微粒子之折射率宜近似基材S之折射率。基材S為丙烯酸樹脂時,微粒子之折射率例如小於1.5。The refractive index of the fine particles is preferably close to the refractive index of the substrate S. When the base material S is an acrylic resin, the refractive index of the fine particles is, for example, less than 1.5.

塗敷液(易接著組成物)含有樹脂成分、上述微粒子及分散介質。塗敷液係視需求含有添加物。關於添加物,可舉例如交聯劑、pH調整劑。The coating liquid (easy-bonding composition) contains a resin component, the above-mentioned fine particles, and a dispersion medium. The coating liquid contains additives as needed. As an additive, a crosslinking agent and a pH adjuster are mentioned, for example.

樹脂成分係藉由乾燥步驟,形成上述黏結劑樹脂之被膜。黏結劑樹脂為胺甲酸酯樹脂時,樹脂成分可舉例如水系胺甲酸酯樹脂。水系胺甲酸酯樹脂可舉例如非反應型水系胺甲酸酯樹脂及反應型水系胺甲酸酯樹脂。非反應型水系胺甲酸酯樹脂係胺甲酸酯樹脂之乳化物。反應型水系胺甲酸酯樹脂係經以封端劑保護異氰酸酯基之胺甲酸酯樹脂之乳化物。黏結劑樹脂為胺甲酸酯樹脂時,塗敷液亦可含有胺甲酸酯硬化觸媒、異氰酸酯單體。胺甲酸酯硬化觸媒可舉例如三乙胺。The resin component forms the coating film of the above-mentioned binder resin by the drying step. When the binder resin is a urethane resin, the resin component includes, for example, a water-based urethane resin. The water-based urethane resin includes, for example, a non-reactive water-based urethane resin and a reactive water-based urethane resin. Non-reactive water-based urethane resin is an emulsion of urethane resin. The reactive water-based urethane resin is an emulsion of the urethane resin in which the isocyanate group is protected by a blocking agent. When the binder resin is a urethane resin, the coating liquid may contain a urethane curing catalyst and an isocyanate monomer. As a urethane hardening catalyst, triethylamine is mentioned, for example.

樹脂成分之摻混比率以固體成分換算計,於塗敷液中例如為3質量%以上,宜為5質量%以上,較宜為7質量%以上。樹脂成分之摻混比率若在上述下限值以上,便可謀求縮短塗敷液之乾燥時間。The blend ratio of the resin component is, in terms of solid content, in the coating liquid, for example, 3 mass % or more, preferably 5 mass % or more, and more preferably 7 mass % or more. When the compounding ratio of a resin component is more than the said lower limit, the drying time of a coating liquid can be shortened.

樹脂成分之摻混比率以固體成分換算計,於塗敷液中例如為20質量%以下,宜為15質量%以下。樹脂成分之摻混比率若在上述上限值以下,便可使樹脂成分穩定分散在塗敷液中。The blend ratio of the resin component is, in terms of solid content, in the coating liquid, for example, 20% by mass or less, preferably 15% by mass or less. When the blending ratio of the resin component is at most the above upper limit value, the resin component can be stably dispersed in the coating liquid.

微粒子之摻混比率以固體成分換算計,相對於樹脂成分100質量份,例如為30質量份以上,宜為50質量份以上。微粒子之摻混比率若在上述下限值以上,便可謀求縮短塗敷液之乾燥時間。The blending ratio of the fine particles is, in terms of solid content, for example, 30 parts by mass or more, preferably 50 parts by mass or more, with respect to 100 parts by mass of the resin component. When the mixing ratio of the fine particles is at least the above lower limit value, the drying time of the coating liquid can be shortened.

微粒子之摻混比率以固體成分換算計,相對於樹脂成分100質量份,例如為150質量份以下,宜為120質量份以下,較宜為90質量份以下。微粒子之摻混比率若在上述上限值以下,便可使微粒子穩定分散在塗敷液中。The mixing ratio of the fine particles is, in terms of solid content, for example, 150 parts by mass or less, preferably 120 parts by mass or less, preferably 90 parts by mass or less, relative to 100 parts by mass of the resin component. When the mixing ratio of the fine particles is equal to or less than the above upper limit value, the fine particles can be stably dispersed in the coating liquid.

又,微粒子之摻混比率於塗敷液中例如為1質量%以上,宜為5質量%以上,且例如為10質量%以下。In addition, the mixing ratio of the fine particles in the coating liquid is, for example, 1 mass % or more, preferably 5 mass % or more, and, for example, 10 mass % or less.

分散介質係用以使微粒子及樹脂成分分散。分散介質可舉例如水、醇、酮。醇可舉例如甲醇、乙醇。酮可舉例如丙酮、甲基乙基酮。The dispersion medium is used to disperse the fine particles and the resin component. Examples of the dispersion medium include water, alcohol, and ketone. Examples of alcohols include methanol and ethanol. Examples of ketones include acetone and methyl ethyl ketone.

分散介質作為除了樹脂成分、微粒子及添加物以外的剩餘部分而被摻混於塗敷液中。分散介質之摻混比率於塗敷液中例如為30質量%以上,宜為40質量%以上,且例如80質量%以下,宜為70質量%以下,較宜為60質量%以下。The dispersion medium is blended in the coating liquid as the remainder other than the resin component, fine particles, and additives. The mixing ratio of the dispersion medium in the coating liquid is, for example, 30 mass % or more, preferably 40 mass % or more, and, for example, 80 mass % or less, preferably 70 mass % or less, and more preferably 60 mass % or less.

交聯劑係在乾燥步驟及第2延伸步驟中用以使樹脂成分交聯。樹脂成分為水系胺甲酸酯樹脂時,作為交聯劑可舉例如熱硬化型交聯劑。熱硬化型交聯劑可舉例如含㗁唑啉基之聚合物、含異氰酸酯基之聚合物。The crosslinking agent is used to crosslink the resin component in the drying step and the second stretching step. When the resin component is an aqueous urethane resin, the crosslinking agent includes, for example, a thermosetting crosslinking agent. Examples of the thermosetting crosslinking agent include oxazoline group-containing polymers and isocyanate group-containing polymers.

交聯劑之摻混比率以固體成分換算計,相對於樹脂成分100質量份例如為5質量份以上,宜為10質量份以上,且例如為30質量份以下。The blending ratio of the crosslinking agent is, in terms of solid content, for example, 5 parts by mass or more, preferably 10 parts by mass or more, and for example, 30 parts by mass or less with respect to 100 parts by mass of the resin component.

pH調整劑係用以調整塗敷液之pH。pH調整劑可舉公知之酸及鹼。The pH adjuster is used to adjust the pH of the coating solution. Well-known acids and bases are mentioned as pH adjusters.

塗敷液之pH例如為7.5以上。塗敷液之pH若在上述下限值以上,便可抑制凝集物發生。又,塗敷液之pH例如為9.0以下。塗敷液之pH若在上述上限值以下,便可抑制偏光板之耐濕熱性降低。The pH of the coating liquid is, for example, 7.5 or more. When the pH of the coating liquid is at least the above lower limit value, the occurrence of aggregates can be suppressed. In addition, the pH of the coating liquid is, for example, 9.0 or less. If the pH of the coating liquid is below the above-mentioned upper limit value, it is possible to suppress the decrease in the heat and humidity resistance of the polarizing plate.

若可確保塗敷液對基材S之濡溼性,塗敷液之表面張力便無限定。基材S為丙烯酸樹脂時,塗敷液之表面張力例如為30mN/m以上,宜為40mN/m以上,且例如為80mN/m以下,宜為70mN/m以下,較宜為60mN/m以下,更宜為50mN/m以下。藉由調整樹脂成分與分散介質之摻混比率,可調整塗敷液之表面張力。As long as the wettability of the coating liquid to the substrate S can be ensured, the surface tension of the coating liquid is not limited. When the base material S is an acrylic resin, the surface tension of the coating liquid is, for example, 30 mN/m or more, preferably 40 mN/m or more, and, for example, 80 mN/m or less, preferably 70 mN/m or less, more preferably 60 mN/m or less , more preferably below 50mN/m. By adjusting the mixing ratio of the resin component and the dispersion medium, the surface tension of the coating liquid can be adjusted.

塗敷液之表面張力可以後述實施例中記載之方法測定。The surface tension of the coating liquid can be measured by the method described in the examples described later.

3.棒塗機之詳細內容 如圖3所示,棒塗機3具備滾棒11與作為供給裝置之一例的歧管塊12。 3. Details of the rod coater As shown in FIG. 3 , the bar coater 3 includes a roll bar 11 and a manifold block 12 as an example of a supply device.

(1)滾棒 滾棒11係於上述塗佈步驟中用以將塗敷液塗佈於基材S。滾棒11係朝軸方向延伸。軸方向係與基材S之寬度方向TD相同之方向。亦即,軸方向係與基材S之行進方向MD正交。滾棒11係配置於棒塗機3之上端部。換言之,滾棒11係在與軸方向及行進方向MD兩者正交之正交方向上,配置於棒塗機3之一端部。滾棒11具有圓柱形狀。 (1) Roller The roller 11 is used for coating the coating liquid on the substrate S in the above coating step. The rollers 11 extend in the axial direction. The axial direction is the same direction as the width direction TD of the substrate S. That is, the axial direction is orthogonal to the advancing direction MD of the base material S. As shown in FIG. The roller bar 11 is arranged on the upper end of the bar coater 3 . In other words, the roller bar 11 is arranged at one end of the bar coater 3 in the orthogonal direction to both the axial direction and the advancing direction MD. The roller 11 has a cylindrical shape.

滾棒11可舉例如線棒及無線棒。線棒具有軸桿與捲繞於軸桿上之線。線棒在軸方向上具有形成於線間之溝。無線棒於表面具有凹溝。The roller bar 11 may be, for example, a wire bar or a cordless bar. The wire rod has a shaft and a wire wound on the shaft. The wire rod has grooves formed between the wires in the axial direction. The wireless rod has grooves on the surface.

滾棒11之表面自由能高於塗敷液之表面張力。因此,滾棒11容易被塗敷液濡溼。因此,即便在塗敷液含有微粒子之情況下,仍可將塗敷液於寬度方向上均勻塗佈於基材S上。The surface free energy of the roller 11 is higher than the surface tension of the coating liquid. Therefore, the roller 11 is easily wetted by the coating liquid. Therefore, even when the coating liquid contains fine particles, the coating liquid can be uniformly coated on the substrate S in the width direction.

具體上,滾棒11之表面自由能為40mJ/m 2以上,宜為50mJ/m 2以上,較宜為70mJ/m 2以上,較宜為90mJ/m 2以上。滾棒11之表面自由能的上限無限定。滾棒11之表面自由能例如為150mJ/m 2以下。 Specifically, the surface free energy of the rolling rod 11 is 40 mJ/m 2 or more, preferably 50 mJ/m 2 or more, preferably 70 mJ/m 2 or more, and more preferably 90 mJ/m 2 or more. The upper limit of the surface free energy of the rolling rod 11 is not limited. The surface free energy of the roller 11 is, for example, 150 mJ/m 2 or less.

滾棒11之表面自由能可以後述實施例中記載之方法測定。The surface free energy of the rolling rod 11 can be measured by the method described in the following examples.

滾棒11之表面自由能與塗敷液之表面張力的差例如為10mN/m以上,宜為14mN/m以上,較宜為20mN/m以上,較宜為35mN/m以上,較宜為50mN/m以上。滾棒11之表面自由能與塗敷液之表面張力的差若在上述下限值以上,便可將塗敷液更均勻地塗佈於基材S上。滾棒11之表面自由能與塗敷液之表面張力的差的上限值無限定。The difference between the surface free energy of the roller 11 and the surface tension of the coating liquid is, for example, 10 mN/m or more, preferably 14 mN/m or more, more preferably 20 mN/m or more, more preferably 35 mN/m or more, more preferably 50 mN /m or more. When the difference between the surface free energy of the roller 11 and the surface tension of the coating liquid is equal to or more than the above lower limit value, the coating liquid can be applied to the substrate S more uniformly. The upper limit of the difference between the surface free energy of the roller 11 and the surface tension of the coating liquid is not limited.

宜為對滾棒11施行表面處理。表面處理可舉例如硬鉻(HCr)鍍敷、類鑽碳(DLC)塗覆、鈦塗覆(氮化鈦塗覆)。滾棒11宜業經類鑽碳塗覆。藉由對滾棒11施行表面處理,滾棒11之表面自由能會增大,從而滾棒11更容易被塗敷液濡濕。因此,可將塗敷液更均勻地塗佈於基材S上。It is preferable to apply surface treatment to the rolling rod 11 . The surface treatment includes, for example, hard chromium (HCr) plating, diamond-like carbon (DLC) coating, and titanium coating (titanium nitride coating). The rolling rod 11 should preferably be coated with diamond-like carbon. By performing surface treatment on the roller 11, the surface free energy of the roller 11 is increased, so that the roller 11 is more easily wetted by the coating liquid. Therefore, the coating liquid can be applied to the base material S more uniformly.

較宜為對滾棒11除了上述表面處理外,還施行微凹坑(micro-dimple)處理。藉由對滾棒11施行微凹坑處理,滾棒11之表面自由能會更增大,從而滾棒11更容易被塗敷液濡濕。因此,可將塗敷液再更均勻地塗佈於基材S上。It is preferable to perform micro-dimple treatment on the roller bar 11 in addition to the above-mentioned surface treatment. The surface free energy of the rolling rod 11 is further increased by performing the micro-dimple treatment on the rolling rod 11, so that the rolling rod 11 is more easily wetted by the coating liquid. Therefore, the coating liquid can be applied to the substrate S more uniformly.

滾棒11之直徑例如為5mm(φ5)以上,宜為8mm以上。滾棒11之直徑若在上述下限值以上,便可確保滾棒11之剛性。藉此,滾棒11可抵抗基材S之張力,將塗敷液穩定地塗佈於基材S上。滾棒11之直徑例如為10mm(φ10)以下。滾棒11之直徑若在上述上限值以下,便可容易將塗敷液供給於滾棒11之表面整體,而可穩定地將塗敷液塗佈於基材S上。The diameter of the roller 11 is, for example, 5 mm (φ5) or more, preferably 8 mm or more. If the diameter of the rolling rod 11 is more than the above lower limit value, the rigidity of the rolling rod 11 can be ensured. Thereby, the roller 11 can resist the tension of the substrate S, and can stably coat the coating liquid on the substrate S. The diameter of the roller 11 is, for example, 10 mm (φ10) or less. If the diameter of the roller 11 is below the above-mentioned upper limit value, the coating liquid can be easily supplied to the entire surface of the roller 11, and the coating liquid can be applied to the substrate S stably.

滾棒11係相對於行進方向MD進行順向旋轉(參照圖3箭頭)。滾棒11之旋轉速度較基材S之輸送速度更快。藉此,在基材S朝行進方向MD輸送且滾棒11正在旋轉之狀態下,在行進方向MD上之滾棒11的上游側,會於滾棒11與基材S之間形成塗敷液蓄積而成的蓄積液L。The rollers 11 rotate in the forward direction with respect to the traveling direction MD (see arrows in FIG. 3 ). The rotation speed of the roller 11 is faster than the conveying speed of the substrate S. Thereby, when the substrate S is conveyed in the traveling direction MD and the roller 11 is rotating, a coating liquid is formed between the roller 11 and the substrate S on the upstream side of the roller 11 in the traveling direction MD. The accumulated liquid L.

以蓄積液L來說,所蓄積之塗敷液係藉由滾棒11之旋轉速度與基材S之輸送速度的速度差而被攪拌。藉此,蓄積液L之塗敷液會被施加剪切力。塗敷液含有交聯劑時,剪切力會使樹脂成分與交聯劑進行反應,而可能產生凝集物。In the case of the accumulated liquid L, the accumulated coating liquid is stirred by the speed difference between the rotational speed of the roller 11 and the conveyance speed of the substrate S. Thereby, a shearing force is applied to the coating liquid of the accumulated liquid L. When the coating liquid contains a cross-linking agent, the resin component and the cross-linking agent may react with the shearing force, and aggregates may be generated.

基於此點,若滾棒11之表面自由能高於塗敷液之表面張力,滾棒11便容易被塗敷液濡濕,因此可減低施加於蓄積液L之塗敷液的剪切力。因此,可抑制樹脂成分與交聯劑之反應。結果可抑制凝集物產生。Based on this, if the surface free energy of the roller 11 is higher than the surface tension of the coating liquid, the roller 11 is easily wetted by the coating liquid, so that the shear force applied to the coating liquid in the accumulation liquid L can be reduced. Therefore, the reaction of the resin component and the crosslinking agent can be suppressed. As a result, the production of aggregates can be suppressed.

相對於基材S之輸送速度,滾棒11之旋轉速度例如為100%以上,宜為120%以上,且例如為200%以下,宜為180%以下。The rotational speed of the rollers 11 is, for example, 100% or more, preferably 120% or more, for example, 200% or less, preferably 180% or less, relative to the conveyance speed of the substrate S.

(2)歧管塊 分歧管12係用以將塗敷液供給於滾棒11。歧管塊12配置於滾棒11之下方。在棒塗機3正在將塗敷液塗佈於基材S之狀態下,歧管塊12係在正交方向上相對於基材S配置於滾棒11之相反側。歧管塊12係用以支持滾棒11。歧管塊12係朝軸方向及正交方向延伸。歧管塊12具有歧管121、吐出口122及流徑123。 (2) Manifold block The branch pipe 12 is used to supply the coating liquid to the roller 11 . The manifold block 12 is arranged below the roller bar 11 . In a state where the bar coater 3 is applying the coating liquid to the substrate S, the manifold block 12 is arranged on the opposite side of the roller bar 11 with respect to the substrate S in the orthogonal direction. The manifold block 12 is used to support the rollers 11 . The manifold block 12 extends in the axial direction and the orthogonal direction. The manifold block 12 has a manifold 121 , a discharge port 122 and a flow path 123 .

(2-1)歧管 歧管121係在正交方向上配置成遠離滾棒11。歧管121係蓄積塗敷液。 (2-1) Manifold The manifold 121 is disposed away from the rollers 11 in the orthogonal direction. The manifold 121 stores the coating liquid.

(2-2)吐出口 吐出口122係配置於歧管塊12之正交方向上之一端部。吐出口122係在行進方向MD上配置於滾棒11的上游側。吐出口122係吐出塗敷液。從吐出口122吐出之塗敷液係被供給於滾棒11。被供給於滾棒11之塗敷液係藉由滾棒11之旋轉而塗佈於基材S上。 (2-2) Discharge port The discharge port 122 is disposed at one end portion in the orthogonal direction of the manifold block 12 . The discharge port 122 is arranged on the upstream side of the roller 11 in the traveling direction MD. The discharge port 122 discharges the coating liquid. The coating liquid discharged from the discharge port 122 is supplied to the roller 11 . The coating liquid supplied to the roller 11 is coated on the substrate S by the rotation of the roller 11 .

(2-3)流徑 流徑123係在正交方向上配置於歧管121與吐出口122之間。流徑123係連接歧管121與吐出口122。歧管121內之塗敷液係通過流徑123而從吐出口122吐出。 (2-3) Flow path The flow path 123 is arranged between the manifold 121 and the discharge port 122 in the orthogonal direction. The flow path 123 connects the manifold 121 and the discharge port 122 . The coating liquid in the manifold 121 is discharged from the discharge port 122 through the flow path 123 .

3.變形例 (1)棒塗機3之用途不限於擠製成形。例如,亦可從基材S之捲材釋出基材S,並利用棒塗機3對釋出之基材S塗佈塗敷液。 3. Variations (1) The use of the bar coater 3 is not limited to extrusion molding. For example, the base material S may be released from the coil of the base material S, and the coating liquid may be applied to the released base material S by the bar coater 3 .

(2)塗敷裝置不限於棒塗機3。例如塗敷裝置可舉凹版塗佈機、接觸式塗佈機。(2) The coating device is not limited to the bar coater 3 . For example, the coating apparatus includes a gravure coater and a contact coater.

(3)塗敷裝置如圖4所示,亦可具備蓄積塗敷液之盤件31作為供給裝置之一例來取代歧管塊12。(3) Coating Apparatus As shown in FIG. 4 , instead of the manifold block 12 , a disk 31 for accumulating the coating liquid may be provided as an example of the supplying apparatus.

(4)薄膜F之製造系統1亦可不具備第1延伸裝置4A。塗佈有塗敷液之基材S亦可藉由第2延伸裝置4B朝行進方向MD及寬度方向TD延伸(雙軸同步延伸)。薄膜F之製造系統1亦可不延伸基材S。亦即,薄膜F之製造系統1亦可不具備第1延伸裝置4A及第2延伸裝置4B。(4) The production system 1 of the film F may not include the first stretching device 4A. The base material S to which the coating liquid is applied may be stretched in the traveling direction MD and the width direction TD by the second stretching device 4B (biaxial simultaneous stretching). The manufacturing system 1 of the film F may not extend the substrate S. That is, the manufacturing system 1 of the film F may not include the first stretching device 4A and the second stretching device 4B.

(5)薄膜F之製造系統1亦可具備遮蔽薄膜釋出裝置與貼合裝置,來取代滾紋形成加工裝置6,該遮蔽薄膜釋出裝置係用以釋出遮蔽薄膜者,該貼合裝置係用以將釋出之遮蔽薄膜貼合於薄膜F者。(5) The manufacturing system 1 of the film F may also be provided with a masking film releasing device and a laminating device instead of the knurling forming processing device 6. The masking film releasing device is used to release the masking film, and the laminating device It is used to attach the released masking film to the film F.

實施例 接下來,根據實施例及比較例來說明本發明。本發明不受下述實施例所限。又,以下記載所用物性值、參數等具體數值,可替代成上述「用以實施發明之形態」中記載之與其等對應的物性值、參數等之上限值(「以下」所定義之數值)或下限值(「以上」所定義之數值)。 Example Next, this invention is demonstrated based on an Example and a comparative example. The present invention is not limited by the following examples. In addition, specific numerical values such as physical property values and parameters used in the description below may be substituted with the upper limit values of the physical property values, parameters, etc. corresponding to those described in the above-mentioned "Forms for Carrying Out the Invention" (the numerical values defined by "the following") or the lower limit (value as defined by "above").

1.塗敷液之調製 (1)塗敷液A 將水系胺甲酸酯樹脂(固體成分:35質量%)35.2質量份、氧化矽微粒子7.5質量份、交聯劑(含㗁唑啉基之聚合物,固體成分:25質量%)5.2質量份、1%氨水2.8質量份及純水49.3質量份混合,而獲得塗敷液A。 1. Preparation of coating solution (1) Coating liquid A Aqueous urethane resin (solid content: 35 mass %) 35.2 mass parts, silica fine particles 7.5 mass parts, crosslinking agent (oxazoline group-containing polymer, solid content: 25 mass %) 5.2 mass parts, Coating liquid A was obtained by mixing 2.8 parts by mass of 1% ammonia water and 49.3 parts by mass of pure water.

塗敷液A之表面張力為40mN/m。此外,塗敷液A之表面張力係使用接觸角計藉由懸滴法來測定。The surface tension of the coating liquid A was 40 mN/m. In addition, the surface tension of the coating liquid A was measured by the pendant drop method using a contact angle meter.

(2)塗敷液B 將水系胺甲酸酯樹脂之摻混份數變更成20.6質量份、將純水之摻混份數變更成63.9質量份,除此之外依與塗敷液A同樣方式獲得塗敷液B。 (2) Coating liquid B Coating liquid B was obtained in the same manner as coating liquid A, except that the mixing part of the aqueous urethane resin was changed to 20.6 parts by mass and the mixing part of pure water was changed to 63.9 parts by mass.

塗敷液B之表面張力為55mN/m。The surface tension of the coating liquid B was 55 mN/m.

(3)塗敷液C 將水系胺甲酸酯樹脂之摻混份數變更成12.8質量份、將純水之摻混份數變更成71.7質量份,除此之外依與塗敷液A同樣方式獲得塗敷液C。 (3) Coating liquid C Coating liquid C was obtained in the same manner as coating liquid A, except that the blending parts of the aqueous urethane resin were changed to 12.8 parts by mass and the blending parts of pure water were changed to 71.7 parts by mass.

塗敷液C之表面張力為70mN/m。The surface tension of the coating liquid C was 70 mN/m.

2.實施例及比較例 (1)實施例1 使用表1記載之具備施有表面處理之滾棒的塗敷裝置,將塗敷液A(表面張力:40mN/m)塗佈於由丙烯酸樹脂構成之基材並乾燥,而獲得薄膜。 2. Examples and Comparative Examples (1) Example 1 The coating liquid A (surface tension: 40 mN/m) was apply|coated to the base material which consists of acrylic resins using the coating apparatus provided with the roller bar with surface treatment as described in Table 1, and it dried to obtain a film.

此外,表1中,「DLC」意指類鑽碳塗覆。滾棒之表面自由能係從使用接觸角計所得測定值,藉由理論式(kitazaki and hata)來算出。In addition, in Table 1, "DLC" means diamond-like carbon coating. The surface free energy of the roller was calculated from the measured value using a contact angle meter by a theoretical formula (kitazaki and hata).

針對所得薄膜測定塗敷厚度之偏差及凝集物之個數。塗敷厚度之偏差及凝集物之個數係使用分光膜厚計(MCPD,大塚電子公司製)測定。將結果記載於表1。The variation in coating thickness and the number of aggregates were measured for the obtained film. The variation in coating thickness and the number of aggregates were measured using a spectroscopic film thickness meter (MCPD, manufactured by Otsuka Electronics Co., Ltd.). The results are shown in Table 1.

(2)實施例2~7、比較例1~11 使用表1~3記載之具備施有表面處理之滾棒的塗敷裝置,依與實施例1相同方式將表1~3記載之塗敷液塗佈於由丙烯酸樹脂構成之基材並乾燥,而獲得薄膜。 (2) Examples 2 to 7, Comparative Examples 1 to 11 Using the coating apparatus described in Tables 1 to 3, which is equipped with a roller bar with surface treatment, the coating liquids described in Tables 1 to 3 were applied to a base material composed of acrylic resin in the same manner as in Example 1, and dried. to obtain a thin film.

針對所得薄膜測定塗敷厚度之偏差及凝集物之個數。將結果記載於表1~3。The variation in coating thickness and the number of aggregates were measured for the obtained film. The results are described in Tables 1 to 3.

此外,表2中,「HCr」意指硬鉻鍍敷。表3中,「鈦」係指鈦塗覆。In addition, in Table 2, "HCr" means hard chrome plating. In Table 3, "titanium" refers to titanium coating.

[表1]

Figure 02_image001
[Table 1]
Figure 02_image001

[表2]

Figure 02_image003
[Table 2]
Figure 02_image003

[表3]

Figure 02_image005
此外,上述發明雖提供作為本發明例示之實施形態,但僅為例示,不得作限定解釋。該技術領域之熟知此項技藝之人士明瞭可知本發明變形例包含於後述申請專利範圍中。 產業上之可利用性 本發明薄膜之製造方法係利用於製造易接著薄膜等薄膜。 [table 3]
Figure 02_image005
In addition, although the above-mentioned invention provides the embodiment as an example of this invention, it is only an illustration, and should not be construed as a limitation. It will be apparent to those skilled in the art that modifications of the present invention are included in the scope of the patent application described later. INDUSTRIAL APPLICATION The manufacturing method of the thin film of this invention is utilized for manufacturing thin films, such as an easily bonding film.

1:薄膜之製造系統 2:擠製成形裝置 3:棒塗機 4A:第1延伸裝置 4B:第2延伸裝置 5:開縫加工裝置 6:滾紋形成加工裝置 7:捲取裝置 11:滾棒 12:歧管塊 31:盤件 121:歧管 122:吐出口 123:流徑 C:被膜 F:薄膜 L:蓄積液 S:基材 S1:第1面 S2:第2面 1: Film manufacturing system 2: Extrusion forming device 3: Bar coater 4A: 1st extension device 4B: 2nd extension device 5: Slitting processing device 6: Knurling processing device 7: Coiling device 11: Roller 12: Manifold block 31: Plates 121: Manifold 122: Spit out 123: Flow Path C: film F: film L: accumulating fluid S: Substrate S1: Side 1 S2: Side 2

圖1係藉由作為本發明一實施形態之薄膜之製造系統所製造之薄膜的截面圖。 圖2係薄膜之製造系統的概略構成圖。 圖3係用以說明圖2所示棒塗機的說明圖。 圖4係用以說明棒塗機之變形例的說明圖。 FIG. 1 is a cross-sectional view of a film produced by a film production system as an embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a thin film manufacturing system. FIG. 3 is an explanatory diagram for explaining the bar coater shown in FIG. 2 . FIG. 4 is an explanatory diagram for explaining a modification of the bar coater.

11:滾棒 11: Roller

12:歧管塊 12: Manifold block

121:歧管 121: Manifold

122:吐出口 122: Spit out

123:流徑 123: Flow Path

L:蓄積液 L: accumulating fluid

S:基材 S: Substrate

Claims (5)

一種薄膜之製造方法,包含以下步驟: 塗佈步驟,係使用塗敷構件將塗敷液塗佈於基材;及 乾燥步驟,係使已塗佈於前述基材上之塗敷液乾燥; 前述塗敷液含有樹脂成分、微粒子、以及用以使前述樹脂成分及前述微粒子分散之分散介質; 前述塗敷構件之表面自由能高於前述塗敷液之表面張力。 A method for manufacturing a thin film, comprising the following steps: The coating step is to use the coating member to coat the coating liquid on the substrate; and The drying step is to dry the coating liquid coated on the substrate; The coating liquid contains a resin component, fine particles, and a dispersion medium for dispersing the resin component and the fine particles; The surface free energy of the coating member is higher than the surface tension of the coating liquid. 如請求項1之薄膜之製造方法,其中前述塗敷構件之表面自由能為40mJ/m 2以上。 The method for producing a thin film according to claim 1, wherein the surface free energy of the coating member is 40 mJ/m 2 or more. 如請求項1或請求項2之薄膜之製造方法,其中前述塗敷構件為滾棒。The method for producing a film according to claim 1 or claim 2, wherein the coating member is a roller. 如請求項1至請求項3中任一項之薄膜之製造方法,其中前述塗敷構件業經類鑽碳塗覆。The method for producing a thin film according to any one of claims 1 to 3, wherein the aforementioned coating member is coated with diamond-like carbon. 如請求項1至請求項4中任一項之薄膜之製造方法,其中前述塗敷構件之表面自由能與前述塗敷液之表面張力的差為14mN/m以上。The method for producing a thin film according to any one of Claims 1 to 4, wherein the difference between the surface free energy of the coating member and the surface tension of the coating liquid is 14 mN/m or more.
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