TW202127576A - Rotating shaft and substrate supporting device including the same capable of enhancing the sealing performance of the rotary shaft sealing structure and improving the process stability of the device - Google Patents

Abstract

The present invention provides a rotating shaft and a substrate supporting device including the rotating shaft. The rotating shaft includes: a central rotating shaft provided with a vent pipe; a hollow outer shaft arranged on the periphery of the central rotating shaft, wherein a predetermined gap is formed between the hollow outer shaft and the central rotating shaft; an air guiding groove surrounding the inner wall of the hollow outer shaft and communicating with the vent pipe; an air supply pipe arranged on the hollow outer shaft and communicating with the air guiding groove; a pair of sealing ring protrusions arranged on the central rotating shaft, wherein an air inlet of the vent pipe is located between the pair of seal ring protrusions in the axial direction of the central rotating shaft; a pair of sealing ring grooves arranged on the hollow outer shaft, wherein the air guiding groove is located between the pair of sealing ring grooves in the axial direction of the central rotating shaft; and the sealing ring protrusions are embedded in the sealing ring grooves. By arranging the sealing ring protrusions and the sealing ring grooves in the vicinity of the air guiding groove and the air supply pipe in the rotating shaft, the present invention can enhance the sealing performance of the rotary shaft sealing structure and improve the process stability of the device, while ensuring that the central rotating shaft does not directly contact the hollow outer shaft.

Description

Rotating shaft and substrate supporting device including said rotating shaft

The present invention relates to the field of semiconductor manufacturing equipment, in particular to a rotating shaft and a substrate supporting device including the rotating shaft.

In the advanced process of semiconductor manufacturing, backside processing techniques such as etching, implantation, and laser annealing on the backside of the wafer are becoming increasingly widely used. In the above-mentioned backside processing technology, the protection of the device area on the front side of the wafer has an important effect on improving the wafer yield. If the front side of the wafer is directly placed on the processing device, the device area on the front side of the wafer may be affected by defects such as scratches, particle contamination or metal ion contamination, which will greatly reduce the wafer yield.

At present, some solutions have tried to float and clamp the wafer to rotate for the back side processing process. During processing processes such as cleaning the back of the wafer, the floating wafer front side will not directly contact the processing device, thereby avoiding the occurrence of abnormal defects. Among them, the solution of using jet blowing to float the wafer has great application prospects due to its higher clamping stability and good protection of the front surface of the wafer. In the existing jet blowing wafer floating solution, in addition to using the jet gas perpendicular to the placement surface to blow the wafer float, the oblique direction of the jet gas will also be used to form a faster flow rate between the wafer and the placement surface. Air flow, by the Bernoulli principle, attracts and keeps the wafer above the placement surface without being ejected The gas blows away. However, in the existing air jet blowing and floating scheme, due to the requirements for air jet cleanliness, in order to avoid the generation of particulate pollutants due to mechanical friction between different structures, the fixed structure and the rotating structure in the air supply pipeline cannot be located at their adjacent positions. Direct contact. The non-sealing of the above-mentioned adjacent positions will cause the air supply in the device to easily leak from the gap, thereby affecting the stability of the jet blowing floating wafer during the process.

Therefore, it is necessary to provide a new rotating shaft and a substrate supporting device including the rotating shaft to solve the above-mentioned problems.

In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a rotating shaft and a substrate supporting device including the rotating shaft, which are used to solve the problem of poor sealing of the rotating shaft sealing structure in the prior art and affecting process stability.

In order to achieve the above objects and other related objects, the present invention provides a rotating shaft, including:

A central rotating shaft, a vent pipe is arranged inside the central rotating shaft, the air inlet of the vent pipe is arranged on the outer wall of the central rotating shaft, and the air outlet of the vent pipe is arranged at one end in the axial direction of the central rotating shaft;

A hollow outer shaft, the hollow outer shaft is arranged on the periphery of the central shaft around the axial direction of the central shaft, and there is a set distance between the inner wall of the hollow outer shaft and the outer wall of the central shaft;

The inner wall of the hollow outer shaft is provided with an air guiding groove, the air guiding groove is arranged around the axial direction of the central rotating shaft and communicates with the air inlet of the air duct;

The hollow outer shaft is further provided with an air supply pipe, the air inlet of the air supply pipe is arranged on the outer wall of the hollow outer shaft, and the air outlet of the air supply pipe communicates with the air guide groove;

The central rotating shaft also has a pair of sealing ring projections arranged on the outer wall of the central rotating shaft around the axial direction of the central rotating shaft, and the air inlet of the air duct is on the central rotating shaft. Is located between the seal ring protrusions arranged in pairs; the hollow outer shaft also has seal ring grooves arranged in pairs, and the seal ring grooves are arranged in the hollow around the axial direction of the central shaft The inner wall of the outer shaft, and the air guiding groove is located between the sealing ring grooves arranged in a pair in the axial direction of the central rotating shaft; the sealing ring is convexly embedded in the sealing ring groove.

As an optional solution of the present invention, there are a plurality of the sealing ring protrusions and the sealing ring grooves and one-to-one correspondence.

As an optional solution of the present invention, there are a plurality of said air ducts, said air guide grooves and said air supply ducts, and a plurality of said air guide grooves are arranged along the center of the inner wall of the hollow outer shaft. The axial directions of the rotating shafts are arranged in sequence, and the air inlets of a plurality of the air ducts are arranged on the outer wall of the central rotating shaft in sequence along the axial direction of the central rotating shaft and correspond to the air guide grooves one-to-one.

As an optional solution of the present invention, the radial gap between the seal ring protrusion and the seal ring groove is smaller than the axial gap between the seal ring protrusion and the seal ring groove.

As an optional solution of the present invention, the height of the protrusion of the seal ring is smaller than the depth of the recess of the seal ring groove.

As an optional solution of the present invention, different areas in the seal ring groove have different depression depths, and the depth of the depression on the side of the seal ring groove close to the air guide groove is greater than that of the seal ring groove far away from the seal ring groove. The depth of the depression on one side of the air guide groove.

As an optional solution of the present invention, one end of the central rotating shaft is connected and fixed to the transmission device, and is driven by the transmission device to rotate around its axis.

As an optional solution of the present invention, part or all of the structure of the hollow outer shaft is composed of a pair of half shafts.

The present invention also provides a substrate supporting device, including:

A substrate chuck for receiving and fixing a substrate, the substrate chuck is provided with a first air injection tube and a second air injection tube, and the air outlets of the first air injection tube and the second air injection tube are provided on the substrate card The tray is used to receive the receiving surface of the substrate, the first air injection tube is used to spray air to the substrate and adsorb the substrate according to Bernoulli principle, and the second air injection tube is used to spray air to the substrate and float Lift up the substrate;

According to the rotating shaft of the present invention, the central rotating shaft of the rotating shaft connects and drives the substrate chuck to rotate, and the air outlet of the vent pipe of the rotating shaft connects the first air injection pipe and the second air injection pipe Air intake.

As an optional solution of the present invention, there are multiple air outlets of the first air injection pipe and the second air injection pipe.

As an optional solution of the present invention, the air jet direction of the air outlet of the first air jet pipe is inclined to the receiving surface, and is in line with the receiving surface. The air jet direction of the air outlet of the second air jet pipe is perpendicular to the receiving surface.

As an optional solution of the present invention, the substrate chuck is further provided with a positioning pin for clamping and fixing the substrate, the positioning pin is driven by an air cylinder, and the air cylinder is connected to all of the rotating shaft through a pneumatic tube driven by the air cylinder. The ventilation pipe.

As an optional solution of the present invention, the substrate chuck is further provided with a guide post for guiding and confining the substrate to a set position.

As described above, the present invention provides a rotating shaft and a substrate supporting device including the rotating shaft, which has the following beneficial effects:

The present invention introduces a new rotating shaft and a substrate support device containing the rotating shaft. The sealing ring convex and the sealing ring groove are arranged in the vicinity of the air guide groove and the air supply pipe in the rotating shaft to ensure that the central rotating shaft and the hollow While the outer shaft will not be in direct contact, it also enhances the sealing performance of the rotary shaft sealing structure and improves the process stability of the device.

101‧‧‧Central shaft

102‧‧‧Ventilation pipe

102a‧‧‧First air duct

102b‧‧‧Second ventilation pipe

102c‧‧‧Third air duct

102d‧‧‧Fourth ventilation pipe

103‧‧‧Hollow outer shaft

103a‧‧‧Half shaft

104‧‧‧Air guide groove

105‧‧‧Gas supply pipeline

106‧‧‧Sealing ring convex

107‧‧‧Seal ring groove

108‧‧‧Locating hole

109‧‧‧Locating block

110‧‧‧Connecting piece

200‧‧‧Substrate

201‧‧‧Substrate Chuck

201a‧‧‧Undertake surface

202‧‧‧First jet pipe

203‧‧‧Second jet pipe

204‧‧‧Locating pin

205‧‧‧Guide Post

300‧‧‧Rotating axis

301‧‧‧First air source

302‧‧‧Second Air Source

400‧‧‧Liquid supply nozzle

Fig. 1 is a perspective view of the rotating shaft provided in the first embodiment of the present invention.

FIG. 2 shows a top view of the rotating shaft provided in the first embodiment of the present invention.

Fig. 3 shows a side view of the rotating shaft provided in the first embodiment of the present invention.

FIG. 4 shows a cross-sectional view of the rotating shaft in the AA direction in FIG. 2 provided in the first embodiment of the present invention.

FIG. 5 is a cross-sectional view of the rotating shaft provided in the first embodiment of the present invention in the CC direction in FIG. 3.

FIG. 6 is an enlarged view of the rotating shaft provided in the first embodiment of the present invention in the area D in FIG. 5.

Fig. 7 is a front view of the central shaft provided in the first embodiment of the present invention.

FIG. 8 shows a top view of the central rotating shaft provided in the first embodiment of the present invention.

FIG. 9 is a cross-sectional view of the central rotating shaft in the UU direction in FIG. 7 provided in the first embodiment of the present invention.

FIG. 10 is a cross-sectional view of the central rotating shaft in the YY direction in FIG. 8 provided in the first embodiment of the present invention.

FIG. 11 is an enlarged view of the central rotating shaft provided in the first embodiment of the present invention in the area B in FIG. 7.

Fig. 12 is a front view of the half shaft provided in the first embodiment of the present invention.

FIG. 13 is a perspective view of the half shaft as viewed obliquely from below according to the first embodiment of the present invention.

FIG. 14 is a front cross-sectional view of the substrate supporting device provided in the second embodiment of the present invention.

The following describes the implementation of the present invention through specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

Please refer to Figure 1 to Figure 14. It should be noted that the illustrations provided in this embodiment only illustrate the basic idea of the present invention in a schematic manner, although the illustrations only show the components related to the present invention rather than the number, shape and number of elements in actual implementation. For size drawing, the shape, number, and ratio of each element can be changed at will during actual implementation, and the element layout form may also be more complicated.

Example one

Please refer to FIG. 1 to FIG. 13, this embodiment provides a rotating shaft. Figures 1 to 6 show the structure of the rotating shaft provided by this embodiment, in which Figure 1 is a perspective view of the rotating shaft, Figure 2 is a top view, Figure 3 is a side view, and Figure 4 is AA in Figure 2 FIG. 5 is a cross-sectional view in the CC direction in FIG. 3, and FIG. 6 is an enlarged view of the area D in FIG. 5.

As shown in Figures 1 to 5, the rotating shaft includes: a central rotating shaft 101, a vent pipe 102 is provided inside the central rotating shaft 101, and the air inlet of the vent pipe 102 is arranged on the outer wall of the central rotating shaft 101 The air outlet of the air duct 102 is arranged at one end of the central shaft 101 in the axial direction. Figures 7 to 11 separately show the structure of the central shaft 101 provided by this embodiment, wherein Figure 7 is a front view of the central shaft 101, Fig. 8 is a plan view thereof, Fig. 9 is a cross-sectional view in the UU direction in Fig. 7, Fig. 10 is a cross-sectional view in the YY direction in Fig. 8, and Fig. 11 is an enlarged view of the area B in Fig. 7. Specifically, as shown in FIGS. 4 and 5, there are multiple ventilation ducts 102 in this embodiment, including a first ventilation duct 102a, a second ventilation duct 102b, a third ventilation duct 102c, and a fourth ventilation duct 102d. The air inlets of the above-mentioned air ducts are sequentially arranged on the outer wall of the central shaft 101 along the axial direction of the central shaft 101, and their opening directions in the radial direction are different. As shown in FIG. 2, the air outlet of each vent pipe is arranged on the top of the central rotating shaft 101. It should be pointed out that in this embodiment, the central shaft 101 is placed vertically, so the axial direction of the central shaft 101 is the vertical direction. In other embodiments of the present invention, the central shaft 101 may also be Place in the horizontal direction or any other angle. In addition, the number of the ventilation pipes 102 can also be adjusted according to actual needs. It can also be seen in combination with FIG. 8 and FIG. 9 that the number of the air outlets of each of the ventilation ducts 102 at the top of the central rotating shaft 101 can also be set differently according to actual needs.

As an example, as shown in FIGS. 1 and 7, one end of the central rotating shaft 101 is connected and fixed to the transmission device, and is driven by the transmission device to rotate around its axis. As can be seen from Figures 1 and 7, the lower end of the central shaft 101 is provided with a connecting structure for connecting a transmission device (not shown in the figure), which is connected and fixed by the transmission device and drives the central shaft 101 around its axis. Rotate, so as to realize the rotation function of the rotating shaft.

As shown in Figures 1 to 6, the rotating shaft further includes a hollow outer shaft 103, which is arranged on the periphery of the central shaft 101 around the axial direction of the central shaft 101, and the hollow Outer shaft 103 There is a set distance between the inner wall and the outer wall of the central rotating shaft 101. As can be seen from the enlarged views of Figures 5 and 6, the hollow outer shaft 103 is not in direct contact with the central rotating shaft 101, but is connected at the top or bottom of the rotating shaft through bearings and other connecting parts. The connection can avoid particulate pollution caused by the mechanical friction between the hollow outer shaft 103 and the central rotating shaft 101 in the middle area of the rotating shaft, thereby improving the cleanliness of the rotating shaft structure.

As an example, as shown in Figs. 12 to 13, part or all of the structure of the hollow outer shaft 103 is formed by a pair of half shafts 103a. 12 is a front view of the half shaft 103a based on the air supply duct 105, and FIG. 13 is a perspective view of the half shaft 103a viewed obliquely from below. In this embodiment, the upper half of the hollow outer shaft 103, that is, the part where the first vent pipe 102a and the second vent pipe 102b are connected is formed by a pair of half-shafts 103a. The part is made up of multiple integrated ring structures stacked on top of each other.

As an example, as shown in FIGS. 4, 5, 12 and 13, the inner wall of the hollow outer shaft 103 is provided with an air guide groove 104, and the air guide groove 104 is arranged around the axial direction of the central shaft 101 , And communicate with the air inlet of the air duct 102. The hollow outer shaft 103 is further provided with an air supply pipe 105, the air inlet of the air supply pipe 105 is arranged on the outer wall of the hollow outer shaft 103, and the air outlet of the air supply pipe 105 communicates with the air guide groove 104.

Specifically, in this embodiment, there are a plurality of the air guide grooves 104 and the air supply pipe 105, and the plurality of air guide grooves 104 are on the inner wall of the hollow outer shaft 103 along the central rotating shaft 101. The axis directions are arranged in sequence, and more The air inlets of the air ducts 102 are arranged on the outer wall of the central shaft 101 along the axial direction of the central shaft 101 and correspond to the air guide grooves 104 one by one. That is, in the present invention, the air supply structure in the rotating shaft is compatible with the rotating structure through the connection of the air duct 102, the air guide groove 104 and the air supply pipe 105. The gas supplied by the air supply source can enter the rotating shaft from the air inlet of the air supply pipe 105, through the air supply pipe 105, the air guide groove 104 and the air pipe 102, from the air The air outlet of the pipe 102 is discharged.

As shown in Figures 4 to 13, the central shaft 101 also has a pair of sealing ring protrusions 106, which are arranged on the outer wall of the central shaft 101 around the axial direction of the central shaft 101, In addition, the air inlet of the air duct 102 is located between the sealing ring protrusions 106 arranged in pairs in the axial direction of the central rotating shaft 101; the hollow outer shaft 103 also has sealing ring grooves 107 arranged in pairs The sealing ring groove 107 is arranged on the inner wall of the hollow outer shaft 103 around the axial direction of the central shaft 101, and the air guide grooves 104 are arranged in pairs in the axial direction of the central shaft 101. Between the sealing ring grooves 107; the sealing ring protrusion 106 is embedded in the sealing ring groove 107. As shown in FIG. 6, the sealing ring protrusion 106 and the sealing ring groove 107 are multiple and correspond to each other one to one. Since in the present invention, the hollow outer shaft 103 and the central rotating shaft 101 are not in direct contact, in order to ensure that each of the air guide grooves 104 in the vertical direction has a certain sealing performance, and prevent air supply leakage caused by The process performance is not good. The present invention introduces the sealing ring protrusion 106 and the sealing ring groove 107 that are arranged in pairs and staggered, and a serpentine twist is formed between the sealing ring protrusion 106 and the sealing ring groove 107. Flow of It can improve the gas sealing performance between the hollow outer shaft 103 and the central rotating shaft 101.

As an example, as shown in FIG. 6, the radial gap (H1) between the seal ring protrusion 106 and the seal ring groove 107 is smaller than the axial direction between the seal ring protrusion 106 and the seal ring groove 107 Gap (W1/W2). When the air guide groove 104 flows into the axial gap through the radial gap, due to the large axial gap space, this will cause a large pressure loss, so that the flow rate of the gas follows all the passages through it. The sealing ring protrusion 106 and the sealing ring groove 107 are gradually reduced to achieve a good sealing effect.

Optionally, as shown in FIG. 6, the protrusion height of the sealing ring protrusion 106 is smaller than the recess depth of the sealing ring groove 107. It can be seen from FIG. 6 that by providing a deeper recess in the seal ring groove 107, the gas flowing out of the radial gap can enter the axial gap with a larger space, which strengthens the structure for The effect of reducing the flow rate, thereby enhancing the gas sealing performance.

Optionally, as shown in FIG. 6, different areas in the seal ring groove 107 have different recess depths, and the recess depth (H2) on the side of the seal ring groove 107 close to the air guide groove 104 is greater than the depth of the recess. The recess depth (H3) of the sealing ring groove 107 on the side away from the air guide groove 104. Specifically, in FIG. 6, in the air guide groove 104 at the upper and lower positions, the recess depth (H2) of the sealing ring groove 107 on the side close to the air guide groove 104 is greater than that far away from the air guide groove 104. Depth of depression on one side (H3). The deeper recess depth near the side of the air guide groove 104 can ensure a larger space to buffer the gas flow rate, while the shallower area ensures that a narrower radial can be set in the subsequent structure. Clearance, which ensures that the embedded structure of the sealing ring protrusion 106 and the sealing ring groove 107 near the air guiding groove 104 can have a better sealing effect on the adjacent air guiding groove 104.

In this embodiment, the upper half of the hollow outer shaft 103, that is, the part where the first vent pipe 102a and the second vent pipe 102b are connected, are formed by a pair of half shafts 103a. Because this embodiment only introduces the sealing structure of the sealing ring protrusion 106 and the sealing ring groove 107 in the part where the first air duct 102a and the second air duct 102b are connected. The interlaced structure determines that the upper half of the hollow outer shaft 103 needs to be formed by the entanglement of the two half shafts 103a, while the other areas can be directly formed by overlapping ring structures. Optionally, as shown in FIG. 13, a positioning hole 108 and a positioning block 109 are further provided on the half shaft 103 a for positioning when the two half shafts are locked. The half-shaft 103a shown in FIG. 13 is provided with a positioning block 109, and at the corresponding position of the other half-shaft is provided a positioning groove that can be inter-engaged with the positioning block 109. As shown in FIG. 1 and FIG. 3, after the two half shafts are entangled, they can also be fixed by the connecting piece 110. In this embodiment, the first vent pipe 102a and the second vent pipe 102b are supplied with clean gas that directly contacts the wafer and requires high cleanliness. Therefore, the sealing structure requires that no particulate matter is generated due to mechanical friction. Pollution; and the third air duct 102c and the fourth air duct 102d are supplied with driving gas used to drive the cylinder, which requires low cleanliness, so it can be closed by direct contact with a seal Structure, its air tightness is high. Of course, if only the cleanliness is considered, the other In the implementation case, it is also possible to replace all of them with a sealing structure composed of the sealing ring protrusion 106 and the sealing ring groove 107.

Example two

Please refer to FIG. 14, this embodiment provides a substrate supporting device including the rotating shaft described in the first embodiment.

The substrate supporting device includes:

A substrate chuck 201 for receiving and fixing a substrate 200, the substrate chuck 201 is provided with a first gas injection pipe 202 and a second gas injection pipe 203, the outlet of the first gas injection pipe 202 and the second gas injection pipe 203 The air port is provided on the substrate chuck 201 for receiving the receiving surface 201a of the substrate 200, and the first air injection pipe 202 is used for air injection to the substrate 200 and adsorb the substrate 200 by Bernoulli principle. The second air jet pipe 203 is used to jet air to the substrate 200 and blow up the substrate 200;

Like the rotating shaft 300 described in the first embodiment, the central rotating shaft of the rotating shaft 300 is connected to and drives the substrate chuck 201 to rotate, and the air outlet of the air duct of the rotating shaft 300 is connected to the first air injection pipe 202 And the air inlet of the second jet pipe 203.

It should be pointed out that FIG. 14 only schematically marks the positional relationship between the substrate chuck 201 and the rotating shaft 300. For the specific structure of the rotating shaft 300, please refer to the first embodiment.

As an example, as shown in FIG. 14, there are multiple air outlets of the first gas injection pipe 202 and the second gas injection pipe 203. Wherein, the air jet direction of the air outlet of the first air jet pipe 202 is inclined to the receiving surface 201a, and forms a set angle with the receiving surface 201a; the air outlet of the second air jet pipe 203 The air jet direction of the air port is perpendicular to the receiving surface 201a. The air jet passing through the air outlet of the first air jet pipe 202 can use the Bernoulli principle to adsorb and hold the substrate 200 above the placement surface without being blown away by the jet gas. The jet through the air outlet of the second jet pipe 203 can jet gas to float the substrate 200 to adjust the distance between the substrate 200 and the receiving surface 201a to keep it floating without touching the substrate 200.承面201a. As described in the first embodiment, the air supply of the first air injection pipe 202 and the second air injection pipe 203 comes from the first air pipe 102a and the second air pipe 102b, because they will directly contact the wafer The surface has higher requirements for cleanliness. The air supply of the above two sets of air ducts can be controlled separately, so that the substrate 200 can be stably maintained above the substrate chuck 201 during the process. In FIG. 14, the above two sets of air ducts are supplied with air by a first air source 301 and a second air source 302. In this embodiment, the cleaning liquid or etching liquid is also supplied through the liquid supply nozzle 400, and the wet cleaning or etching process is performed while the substrate 200 is kept rotating.

As an example, as shown in FIG. 14, the substrate chuck 201 is also provided with a positioning pin 204 for clamping and fixing the substrate 200, the positioning pin 204 is driven by an air cylinder, and the air cylinder is connected to the The air duct of the rotating shaft 300. As described in the first embodiment, the driving air supply of the cylinder comes from the third air duct 102c and the fourth air duct 102d, which have lower requirements for cleanliness, but higher requirements for air tightness. In this embodiment, the reason why two air ducts are needed to supply air to the cylinders is that the multiple positioning pins 204 and their driving cylinders on the substrate chuck 201 are arranged in groups according to two groups, which can be used A set of holding the substrate At 200 o'clock, the other group releases; and when the other group clamps the substrate 200, the previously clamped group releases the substrate 200. Through the above arrangement, the position where the edge of the substrate 200 is clamped can also be fully processed by wet cleaning and other processes. The air supply source of the cylinder connecting the third air duct 102c and the fourth air duct 102d is not shown in FIG. 14. Both the first gas source 301 and the second gas source 302 can be supplied with clean nitrogen or inert gas, and the flow rate is precisely controlled by MFC. The air supply from the air supply source of the cylinder is used to drive the air cylinder, which has lower requirements for flow control and cleanliness. It can be compressed air provided by equipment such as an air compressor, or it can be The gas source 301 and the second gas source 302 are the same gas source.

As an example, as shown in FIG. 14, the substrate chuck 201 is further provided with a guide post 205 for guiding and confining the substrate 200 to a set position. When the substrate 200 is lowered from above the substrate chuck 201, the tapered guide post 205 can guide the substrate 200 to a set position on the substrate chuck 201.

Through the substrate support device provided by this embodiment, not only can the substrate 200 be blown and floated above the substrate chuck 201 during the process without direct contact with it, but also through the sealing ring protrusion 106 and The arrangement of the sealing structure of the sealing ring groove 107 keeps a non-contact structure that does not produce particulate pollution, but also strengthens its sealing performance and increases the stability of the device to maintain the substrate 200 during the process. . It should be pointed out that what is exemplified in this embodiment is the case where the rotating shaft provided by the present invention is applied to the substrate support device of a single-chip wafer cleaning or etching equipment. In other embodiments of the invention, the rotating shaft can also be applied to other rotating devices that require high-cleanliness air supply.

In summary, the present invention provides a rotating shaft and a substrate supporting device including the rotating shaft. The rotating shaft includes a central rotating shaft. The central rotating shaft is provided with an air duct inside, and the air intake of the air duct The port is provided on the outer wall of the central shaft, the air outlet of the vent pipe is provided at one end in the axial direction of the central shaft; a hollow outer shaft, the hollow outer shaft is provided in the axial direction of the central shaft The outer periphery of the central shaft, and the inner wall of the hollow outer shaft and the outer wall of the central shaft have a set distance; the inner wall of the hollow outer shaft is provided with an air guide groove, and the air guide groove surrounds the The central rotating shaft is arranged in the axial direction and communicates with the air inlet of the air duct; the hollow outer shaft is also provided with an air supply duct, and the air inlet of the air supply duct is arranged on the outer wall of the hollow outer shaft, so The air outlet of the air supply pipe communicates with the air guide groove; the central rotating shaft also has a pair of sealing ring protrusions, and the sealing ring protrusions are arranged on the outer wall of the central rotating shaft around the axial direction of the central rotating shaft, In addition, the air inlet of the air duct is located between the sealing ring protrusions arranged in pairs in the axial direction of the central rotating shaft; the hollow outer shaft also has sealing ring grooves arranged in pairs, and the sealing ring Grooves are arranged on the inner wall of the hollow outer shaft around the axial direction of the central rotating shaft, and the air guide grooves are located between the sealing ring grooves arranged in pairs in the axial direction of the central rotating shaft; The sealing ring is convexly embedded in the sealing ring groove. In the present invention, the sealing ring convex and the sealing ring groove are arranged in the vicinity of the air guide groove and the air supply pipe in the rotating shaft, while ensuring that the central rotating shaft and the hollow outer shaft will not directly contact, at the same time, It also enhances the sealing performance of the rotating shaft sealing structure, and improves the process stability of the device.

The above-mentioned embodiments only exemplarily illustrate the principles and effects of the present invention, but are not used to limit the present invention. Anyone familiar with this technology can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or changes made by those with ordinary knowledge in the technical field without departing from the spirit and technical ideas disclosed in the present invention should still be covered by the scope of patent application of the present invention.

101‧‧‧Central shaft

102‧‧‧Ventilation pipe

102a‧‧‧First air duct

102b‧‧‧Second ventilation pipe

102c‧‧‧Third air duct

102d‧‧‧Fourth ventilation pipe

103‧‧‧Hollow outer shaft

105‧‧‧Gas supply pipeline

110‧‧‧Connecting piece

Claims (13)

A rotating shaft, including: A central rotating shaft, a vent pipe is arranged inside the central rotating shaft, the air inlet of the vent pipe is arranged on the outer wall of the central rotating shaft, and the air outlet of the vent pipe is arranged at one end in the axial direction of the central rotating shaft; A hollow outer shaft, the hollow outer shaft is arranged on the periphery of the central shaft around the axial direction of the central shaft, and there is a set distance between the inner wall of the hollow outer shaft and the outer wall of the central shaft; The inner wall of the hollow outer shaft is provided with an air guiding groove, the air guiding groove is arranged around the axial direction of the central rotating shaft and communicates with the air inlet of the air duct; The hollow outer shaft is further provided with an air supply pipe, the air inlet of the air supply pipe is arranged on the outer wall of the hollow outer shaft, and the air outlet of the air supply pipe communicates with the air guide groove; The central rotating shaft also has a pair of sealing ring projections arranged on the outer wall of the central rotating shaft around the axial direction of the central rotating shaft, and the air inlet of the air duct is on the central rotating shaft. Is located between the seal ring protrusions arranged in pairs; the hollow outer shaft also has seal ring grooves arranged in pairs, and the seal ring grooves are arranged in the hollow around the axial direction of the central shaft The inner wall of the outer shaft, and the air guiding groove is located between the sealing ring grooves arranged in a pair in the axial direction of the central rotating shaft; the sealing ring is convexly embedded in the sealing ring groove. The rotating shaft according to claim 1, wherein the seal ring protrusion and the seal ring groove are plural and correspond to each other one to one. The rotating shaft according to claim 1, wherein there are multiple air ducts, air guide grooves, and air supply ducts, and a plurality of air guide grooves are formed along the inner wall of the hollow outer shaft. The axial direction of the central rotating shaft is arranged in sequence, and the air inlets of a plurality of the air ducts are arranged in sequence along the axial direction of the central rotating shaft on the outer wall of the central rotating shaft and correspond to the air guide grooves one by one. The rotating shaft according to claim 1, wherein a radial gap between the seal ring protrusion and the seal ring groove is smaller than an axial gap between the seal ring protrusion and the seal ring groove. The rotating shaft according to claim 1, wherein the protrusion height of the seal ring protrusion is smaller than the recess depth of the seal ring groove. The rotating shaft according to claim 1, wherein different areas in the seal ring groove have different recess depths, and the depth of the recess on the side of the seal ring groove close to the air guide groove is greater than that of the seal ring groove The depth of the depression on the side away from the air guide groove. The rotating shaft according to claim 1, wherein one end of the central rotating shaft is connected and fixed to a transmission device, and is driven by the transmission device to rotate around its axis. The rotating shaft according to claim 1, wherein part or all of the structure of the hollow outer shaft is formed by a pair of half shafts. A substrate supporting device includes: A substrate chuck for receiving and fixing a substrate, the substrate chuck is provided with a first air injection tube and a second air injection tube, and the air outlets of the first air injection tube and the second air injection tube are provided on the substrate card The tray is used to receive the receiving surface of the substrate, the first air injection tube is used to spray air to the substrate and adsorb the substrate according to Bernoulli principle, and the second air injection tube is used to spray air to the substrate and float Lift up the substrate; According to the rotating shaft according to any one of claims 1 to 8, the central rotating shaft of the rotating shaft is connected to and drives the substrate chuck to rotate, and the air outlet of the air duct of the rotating shaft is connected to the first jet pipe And the air inlet of the second jet pipe. The substrate supporting device according to claim 9, wherein there are a plurality of air outlets of the first gas injection pipe and the second gas injection pipe. The substrate support device according to claim 10, wherein the air jet direction of the air outlet of the first air jet pipe is inclined to the receiving surface, And form a set angle with the receiving surface; the air jet direction of the air outlet of the second air injection pipe is perpendicular to the receiving surface. The substrate support device according to claim 9, wherein the substrate chuck is further provided with a positioning pin for clamping and fixing the substrate, the positioning pin is driven by an air cylinder, and the air cylinder is connected to the The vent pipe of the rotating shaft. The substrate support device according to claim 9, wherein the substrate chuck is further provided with a guide post for guiding and confining the substrate to a set position.

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